Substrate storage container

Abstract

A substrate storage container 1 comprising: a container body 2; a lid body 3; ventilation passages 98, 99 capable of communicating a substrate storage space 27 with a space outside the container body 2; and a gas injection nozzle part 8 having a plurality of opening parts 841 for supplying gas flowing into the ventilation passages 98, 99 to the substrate storage space 27. The plurality of opening parts 641 are opened in a direction toward a collision position T so that the gas supplied from the plurality of opening parts 841 collides at the collision position T, the collision position T being located closer to an other-end part 22 of the container body 2 than to the center C of a substrate W stored in the container body 2 and being located on a virtual line L1 connecting a one-end part 21 and the other-end part 22 of the container body 2 and passing through the center of the substrate W.

Description

Substrate storage container

[0001] The present invention relates to a substrate storage container used for storing, preserving, transporting, and shipping substrates such as semiconductor wafers, reticles, and printed circuit boards.

[0002] 2. Description of the Related Art Conventionally, substrate storage containers for storing various substrates have been known that include a container body and a lid.

[0003] One end of the container body has a container body opening. The other end of the container body has a closed cylindrical wall. A substrate storage space is formed within the container body. The substrate storage space is surrounded by the wall and is capable of storing substrates. The lid is detachable from the container body opening and is capable of closing the container body opening. The side substrate support portions are provided on the wall in pairs within the substrate storage space. When the container body opening is not closed by the lid, the side substrate support portions are capable of supporting the edges of adjacent substrates in a state where they are arranged side by side and spaced a predetermined distance apart.

[0004] A front retainer (lid-side substrate support portion) is provided on a portion of the lid that faces the substrate storage space when the container body opening is closed. The front retainer is capable of supporting the edge of the substrate when the container body opening is closed by the lid. A rear-side substrate support portion is provided on the wall portion so as to form a pair with the front retainer. The rear-side substrate support portion is capable of supporting the edge of the substrate. When the container body opening is closed by the lid, the rear-side substrate support portion cooperates with the front retainer to support the substrate, thereby supporting the substrates in a state in which adjacent substrates are spaced apart and aligned in parallel at a predetermined distance.

[0005] Patent No. 6977217 Patent No. 6400534

[0006] In a substrate storage container having a scavenging hole, which is a vent hole that connects the substrate storage space with the outside of the substrate storage container, clean dry air (CDA) or nitrogen (N2) is used as a purge gas with the lid removed, and the purge gas is supplied from a load port outside the substrate storage container through a through-hole from the bottom surface (outer surface) of the container body to a gas ejection nozzle installed on the inner surface of the substrate storage container, thereby performing gas purging.

[0007] However, in conventional gas purging, the direction of the purge gas ejected from the gas ejection nozzle is not fixed, and the gas may flow to a position away from the substrate surface or the purge gas may not reach the periphery of the substrate, resulting in variations in humidity depending on the region of the substrate surface. As a result, there remains a concern that the purge gas replacement inside the substrate storage container may not be performed sufficiently.

[0008] An object of the present invention is to provide a substrate storage container that can suppress variations in humidity between regions on the substrate surface.

[0009] The present invention relates to a substrate storage container comprising: a container body having an opening periphery at one end where a container body opening is formed and a cylindrical wall portion having a closed other end, wherein the inner surface of the wall forms a substrate storage space capable of storing substrates and communicating with the container body opening; a lid body that is detachable from the container body opening and can close the container body opening; an air passage that can communicate the substrate storage space with a space outside the container body; and a gas ejection nozzle portion having a plurality of openings that supply gas that has flowed into the air passage to the substrate storage space, wherein the plurality of openings are open in a direction toward a collision position such that gases supplied from the plurality of openings collide with each other at the collision position, which is closer to the other end of the container body than the center of the substrates stored in the container body, and is on an imaginary line connecting one end and the other end of the container body that passes through the center of the substrates.

[0010] Preferably, a plurality of the gas ejection nozzle sections are provided, and the openings of each gas ejection nozzle section are open in a direction toward the collision position. Preferably, the gas ejection nozzle section has a predetermined direction outflow section that causes the gas to flow from the openings toward the surface of the substrate.

[0011] It is also preferable that the device is provided with a gas flow rate equalizer that enables gas to flow out of the plurality of openings at a uniform flow rate, and that the gas flow rate equalizer has a gas retention chamber, a pre-gas outflow holding chamber, and an inter-chamber partition that blocks linear communication between the gas retention chamber and the pre-gas outflow holding chamber and forms an inter-chamber flow path that connects the gas retention chamber and the pre-gas outflow holding chamber.

[0012] The gas flow rate equalizing unit preferably has a partition wall that divides the pre-gas outflow holding chamber into a plurality of pre-gas outflow holding chambers. The plurality of pre-gas outflow holding chambers preferably have a uniform volume. The gas retention chamber is preferably divided into a plurality of gas retention chambers by partitions between the chambers.

[0013] It is also preferable that a gas supply flow path is formed that communicates with all of the gas retention chambers. It is also preferable that the gas ejection nozzle has a nozzle chamber that communicates with an opening, and that the nozzle chamber communicates with the pre-gas outflow holding chamber via a hydrophobic membrane. It is also preferable that the nozzle chamber communicates with all of the openings and all of the pre-gas outflow holding chambers. It is also preferable that the openings are formed corresponding to each of the multiple substrates stored in the substrate storage space.

[0014] It is also preferable that the container be provided with a columnar protrusion having the gas ejection nozzle portion and the gas flow rate equalization portion, the base of the protrusion being inserted into a hole formed in the wall portion of the container body, which forms the air passage and is provided with a sealing member, and the tip side portion of the protrusion being fixed to the wall portion of the container body, thereby fixing the protrusion to the container body.

[0015] According to the present invention, it is possible to provide a substrate storage container that can suppress variations in humidity between regions on the substrate surface.

[0016] 1 is an exploded perspective view showing a state in which a plurality of substrates W are stored in a substrate storage container 1 according to an embodiment of the present invention. FIG. 2 is an upper perspective view showing a container body 2 of the substrate storage container 1 according to an embodiment of the present invention. FIG. 3 is a bottom perspective view showing the container body 2 of the substrate storage container 1 according to an embodiment of the present invention. FIG. 4 is a side cross-sectional view showing the container body 2 taken along line A-A in FIG. 3. FIG. 5 is a perspective view showing a protrusion 8 of the substrate storage container 1. FIG. 6 is an exploded perspective view showing the flow of purge gas inside a protrusion main body 81 that constitutes the protrusion 8 of the substrate storage container 1. FIG. 7 is a rear perspective cross-sectional view showing the protrusion 8 of the substrate storage container 1. FIG. 8 is a front perspective cross-sectional view showing the protrusion 8 of the substrate storage container 1. FIG. 9 is a side view showing a nozzle chamber forming portion 84 that constitutes the protrusion 8 of the substrate storage container 1. FIG. 10 is a view explaining the direction of purge gas flowing out from the opening of the protrusion 8 of the substrate storage container 1.

[0017] [Overall Configuration of Substrate Storage Container 1] The substrate storage container 1 according to this embodiment will now be described with reference to the drawings. Fig. 1 is an exploded perspective view showing a state in which a plurality of substrates W are stored in the substrate storage container 1. Fig. 2 is an upper perspective view showing the container body 2 of the substrate storage container 1. Fig. 3 is a lower perspective view showing the container body 2 of the substrate storage container 1. Fig. 4 is a side cross-sectional view showing the container body 2 taken along line A-A in Fig. 3.

[0018] For ease of explanation, the direction from the container body 2 (described below) toward the lid 3 (the direction from the upper right to the lower left in FIG. 1 ) is defined as the front direction D11, and the opposite direction is defined as the rear direction D12, and these are collectively defined as the front-to-rear direction D1. Furthermore, the direction from the lower wall 24 (described below) toward the upper wall 23 (the upward direction in FIG. 1 ) is defined as the upward direction D21, and the opposite direction is defined as the downward direction D22, and these are collectively defined as the up-down direction D2. Furthermore, the direction from the second side wall 26 (described below) toward the first side wall 25 (the direction from the lower right to the upper left in FIG. 1 ) is defined as the leftward direction D31, and the opposite direction is defined as the rightward direction D32, and these are collectively defined as the left-right direction D3. Arrows indicating these directions are shown in the main drawings.

[0019] The substrates W (see FIG. 1) stored in the substrate storage container 1 are disc-shaped silicon wafers, glass wafers, sapphire wafers, etc., and are thin wafers used in industry. In this embodiment, the substrates W are silicon wafers with a diameter of 300 mm.

[0020] 1 to 4, substrate storage container 1 is used to store substrates W made of silicon wafers as described above and transport them in processes within a factory, or as a shipping container for transporting substrates by land, air, sea, or other transportation means, and is composed of a container body 2 and a lid 3. Container body 2 includes substrate support plate-shaped portions 5 serving as side substrate support portions, and a rear substrate support portion 6. Lid 3 includes a front retainer (not shown) serving as a lid-side substrate support portion.

[0021] The container body 2 has a cylindrical wall portion 20 with a container body opening 21 formed at one end and a closed other end. A substrate storage space 27 is formed within the container body 2. The substrate storage space 27 is surrounded by the wall portion 20. A substrate support plate-shaped portion 5 is disposed in the portion of the wall portion 20 that forms the substrate storage space 27. As shown in FIG. 1 , the substrate storage space 27 can store a plurality of substrates W.

[0022] The substrate support plate parts 5 are interior components arranged in pairs within the substrate storage space 27, and are removably fixed to the wall part 20. The substrate support plate parts 5 abut against the edges of the substrates W, thereby supporting the edges of the substrates W while arranging adjacent substrates W in parallel with a predetermined distance between them. A rear substrate support part 6 is provided on the rear side of the substrate support plate part 5 and is molded integrally with the substrate support plate part 5.

[0023] The rear substrate support portion 6 is provided on the wall portion 20 so as to form a pair with a front retainer (not shown) described later within the substrate storage space 27. The rear substrate support portion 6 can support the rear portions of the edges of the plurality of substrates W by abutting against the edges of the plurality of substrates W.

[0024] The lid 3 is detachable from the opening periphery 28 that forms the container body opening 21, and is capable of closing the container body opening 21. A front retainer (not shown) is provided on the lid 3 at a portion that faces the substrate storage space 27 when the container body opening 21 is closed by the lid 3. The front retainer is disposed inside the substrate storage space 27 so as to form a pair with the rear substrate support portion 6.

[0025] When the container body opening 21 is closed by the lid 3, the front retainer can support the front portions of the edges of the substrates W by abutting against the edges of the substrates W. When the container body opening 21 is closed by the lid 3, the front retainer supports the substrates W in cooperation with the rear substrate support portion 6, thereby holding adjacent substrates W in a parallel arrangement with a predetermined distance between them.

[0026] The substrate storage container 1 is made of a resin such as a plastic material, and unless otherwise specified, examples of the resin material include thermoplastic resins such as polycarbonate, cycloolefin polymer, polyetherimide, polyetherketone, polybutylene terephthalate, polyetheretherketone, and liquid crystal polymer, as well as alloys of these. To impart conductivity to these molding material resins, conductive materials such as carbon fiber, carbon powder, carbon nanotubes, and conductive polymers are selectively added. Glass fiber, carbon fiber, and the like can also be added to increase rigidity.

[0027] 1 to 4, the wall portion 20 of the container body 2 has a rear wall 22, an upper wall 23, a lower wall 24, a first side wall 25, and a second side wall 26. The rear wall 22, the upper wall 23, the lower wall 24, the first side wall 25, and the second side wall 26 are made of the above-mentioned materials and are integrally molded.

[0028] The first side wall 25 and the second side wall 26 face each other, and the upper wall 23 and the lower wall 24 face each other. The rear end of the upper wall 23, the rear end of the lower wall 24, the rear end of the first side wall 25, and the rear end of the second side wall 26 are all connected to the rear wall 22. The front end of the upper wall 23, the front end of the lower wall 24, the front end of the first side wall 25, and the front end of the second side wall 26 form an opening periphery 28 that defines the container body opening 21, which has a substantially rectangular shape.

[0029] The opening periphery 28 is provided at one end of the container body 2, and the rear wall 22 is located at the other end of the container body 2. The container body 2 has a box-like outer shape formed by the outer surfaces of the walls 20. The inner surfaces of the walls 20, i.e., the inner surfaces of the rear wall 22, the upper wall 23, the lower wall 24, the first side wall 25, and the second side wall 26, form a substrate storage space 27 surrounded thereby. The container body opening 21 formed in the opening periphery 28 is surrounded by the walls 20 and communicates with the substrate storage space 27 formed inside the container body 2. A maximum of 25 substrates W can be stored in the substrate storage space 27.

[0030] Latch engagement recesses 231A, 231B, 241A, and 241B recessed outward from the board storage space 27 are formed in the upper wall 23 and the lower wall 24 near the opening periphery 28. A total of four latch engagement recesses 231A, 231B, 241A, and 241B are formed, one near each of the left and right ends of the upper wall 23 and the lower wall 24.

[0031] Ribs 235 are formed integrally with the upper wall 23 on the outer surface of the upper wall 23. The ribs 235 increase the rigidity of the container body 2. A top flange 236 is fixed to the center of the upper wall 23. The top flange 236 is a member that is hung on and suspended from the substrate storage container 1 when the substrate storage container 1 is suspended in an AMHS (automated wafer transport system), PGV (wafer substrate transport vehicle), or the like.

[0032] A bottom plate 244 is fixed to the lower wall 24. The bottom plate 244 has a substantially rectangular plate shape and is arranged facing substantially the entire lower surface that constitutes the outer surface of the lower wall 24, and is fixed to the lower wall 24.

[0033] Two types of through-holes, air supply holes 242 and exhaust holes 243, are formed near the four corners of the bottom wall 24. In this embodiment, the two through-holes in the front part of the bottom wall 24 are exhaust holes 243 for discharging gas from inside the container body 2, and the two through-holes in the rear part are air supply holes 242 for supplying gas into the container body 2.

[0034] An air supply filter 98 serving as an additional component is disposed in the through-hole serving as the air supply hole 242, and an exhaust filter 99 is disposed in the through-hole serving as the exhaust hole 243. That is, the gas flow paths inside the air supply filter 98 and the exhaust filter 99 form part of an air passage that can communicate between the substrate storage space 27 and the space outside the container body 2. The air supply filter 98 and the exhaust filter 99 are disposed on the wall 20, and gas can pass through the air supply filter 98 and the exhaust filter 99 between the space outside the container body 2 and the substrate storage space 27 via a filter (not shown). Purge gas supplied to the air supply filter 98 is configured to be supplied to the substrate storage space 27. The exhaust filter 99 is configured to allow gas to pass from the substrate storage space 27 to the space outside the container body 2.

[0035] [Protrusion 8] The rear wall 22 has a protrusion 8 (see FIG. 5) that serves as a gas ejection nozzle. As shown in FIG. 6, the protrusion 8 has a protrusion main body 81, an inner wall 82, a hydrophobic membrane 83, and a nozzle chamber forming portion 84, which are fixed to each other in this order to form the protrusion 8.

[0036] Two protrusions 8 are provided as a pair. The base 819 of the protrusion main body 81, which has an annular groove 8191 formed therein and an O-ring, which is a sealing member (not shown), fitted into the groove 8191, is fixed to the bottom wall 24 of the container main body 2 by being inserted into holes formed in the bottom wall 24 of the container main body 2 near the two air intake holes 242, one each, using an insertion structure so as to airtightly communicate with the air passage inside the air intake filter section 98. A sealing member (not shown) that seals the base 819 is also provided in the holes formed in the bottom wall 24 of the container main body 2. In addition, the upper part of the protrusion 8, which is the tip side of the protrusion 8, is fixed to the rear wall 22 that constitutes the wall section 20 by snap fitting, welding, or the like.

[0037] With this configuration, the pair of protrusions 8 protrude in a rib-like manner from the rear wall 22 toward the container body opening 21 as shown in Figure 11, and extend parallel to each other from the upper end to the lower end of the rear wall 22. The protrusions 8 have a hollow columnar shape.

[0038] The protrusion 8 has a plurality of openings 841 that supply gas that has flowed into the air passage, which is a gas flow path inside the air supply filter section 98 and can connect the substrate storage space 27 to the space outside the container body 2, to the substrate storage space 27, and a gas flow rate equalization section that allows gas to flow out from the plurality of openings 841 at a uniform flow rate.

[0039] Specifically, the gas flow rate equalizing section is located between the opening 841 and an air passage (a gas flow path inside the air supply filter section 98) that can communicate between the substrate storage space 27 and the space outside the container body 2. The gas flow rate equalizing section has a gas retention chamber 801, a pre-gas-outflow holding chamber 804, inter-chamber partitions (a main body-side partition 812 and an inner wall-side partition 822) that form an inter-chamber flow path 806 that communicates the gas retention chamber 801 and the pre-gas-outflow holding chamber 804 by blocking linear communication between the gas retention chamber 801 and the pre-gas-outflow holding chamber 804, and a nozzle chamber 803.

[0040] 8 and 9 , the gas retention chamber 801 is defined by a space surrounded by the protrusion main body 81, the inner wall 82, and chamber partitions (the main body partition 812 and the inner wall partition 822). The pre-gas outflow holding chamber 804 is defined by a space surrounded by the protrusion main body 81, the inner wall 82, a hydrophobic film 83 provided to block the through-hole formed in the inner wall 82, and the chamber partitions (the main body partition 812 and the inner wall partition 822). The nozzle chamber 803 is defined by a space surrounded by the inner wall 82, the hydrophobic film 83 provided to block the through-hole formed in the inner wall 82, and the nozzle chamber forming portion 84.

[0041] 6 and 7 , the gas retention chamber 801 is divided into a plurality of gas retention chambers by inter-chamber partitions 811 provided at predetermined intervals in the vertical direction. The inter-chamber partitions 811 do not completely separate the gas retention chamber 801, thereby preventing the purge gas from flowing between the plurality of gas retention chambers, but form a gas flow space 8011 between the partitions 811 and the internal wall portion 82. This allows the purge gas to flow between vertically adjacent gas retention chambers.

[0042] In the gas flow space 8011, the gas retention chambers 801 are not linearly connected in the vertical direction from the bottom to the top of the protruding portion 8. Specifically, an inter-chamber partition 823 extending from the inner wall portion 82 toward the inside of the gas retention chamber 801 is provided on the inner wall portion 82. Therefore, the purge gas that flows into the gas retention chamber 801 from the air passage of the air supply filter portion 98 passes through the portion of the gas retention chamber 801 that is connected to all of the gas retention chambers, which is formed as a crank-shaped gas supply flow path 8011 by the inter-chamber partitions 811 and 823, and flows from the bottom to the top of the gas retention chamber 801.

[0043] As shown in Figures 6 and 7, the pre-gas-outflow holding chamber 804 is divided into multiple pre-gas-outflow holding chambers by partition walls 813 provided at predetermined intervals in the vertical direction. The partition walls 813 completely divide the pre-gas-outflow holding chamber 804, preventing the purge gas from flowing between the multiple pre-gas-outflow holding chambers. Therefore, the purge gas that has flowed into each pre-gas-outflow holding chamber flows into the nozzle chamber 803 through the hydrophobic membrane 83. As shown in Figures 6 and 7, the multiple pre-gas-outflow holding chambers divided by the partition walls 813 have a uniform volume.

[0044] The hydrophobic film 83 is fixed in a state where it is fitted into a recess formed on the front side of the inner wall 82 around a plurality of through holes 821 formed in the inner wall 82. The hydrophobic film 83 is made of a hydrophobic film that does not change its flow resistance even when it gets wet when cleaning the container body 2 of the substrate storage container 1. Specifically, the hydrophobic film 83 is made of a porous film or sheet that is breathable and hydrophobic, or a coated product with hydrophobic properties, and in this embodiment, a PTFE film is used.

[0045] No partitions or partition walls are provided inside the nozzle chamber 803. Therefore, it is formed as a single chamber that continues continuously from the lower end to the upper end. As shown in FIG. 10 , a plurality of openings 841 are formed in the front side of the nozzle chamber forming section 84 in which the nozzle chamber 803 is formed. The number of openings 841 corresponds to the number of substrates W that can be stored in the substrate storage space 27; specifically, 25 openings 841 are formed. The nozzle chamber 803 communicates with all of the openings 841 and, via the hydrophobic membrane 83, communicates with all of the pre-gas-outlet holding chambers that are partitioned by the partition walls 813.

[0046] 10, inclined eaves 842, which incline downward in the direction D22 as they extend in the forward direction D11, are provided above the openings 841 and protrude further in the forward direction D11 than the lower sides of the openings 841. The inclined eaves 842 extend parallel to each other and are configured in a positional relationship such that an extension line of the inclined eaves 842 intersects with the upper surface W1 of the substrate W at a position between the periphery and the center of the upper surface W1, so that the purge gas G flowing out from the openings 841 can flow toward the upper surface W1, which is the surface of the substrate W, as shown by the arrows in FIG.

[0047] The inclined eaves 842 prevents the cleaning liquid from flowing into the nozzle chamber 803 from the opening 841 when cleaning the container body 2. The inclined eaves 842 also constitutes a predetermined direction outflow portion that causes gas to flow out from the opening 841 in the downward direction D22.

[0048] 11 , in the openings 841 of the left-side protrusion 8, which are provided in a pair, the centers of the curved openings 841 are open toward the collision position T so that the purge gas G flowing out of each opening 841 flows toward the collision position T. Similarly, in the openings 841 of the right-side protrusion 8, which are provided in a pair, the centers of the curved openings 841 are open toward the collision position T so that the purge gas G flowing out of each opening 841 flows toward the collision position T. As a result, the purge gas G flowing out of the openings 841 of the left and right protrusions 8 is configured to collide with each other at the collision position T.

[0049] The collision position T is closer to the back wall 22, which is closer to the other end of the container body 2, than the center C of the substrate W stored in the container body 2, and is located on an imaginary line L1 that passes through the center C of the substrate W and connects the container body opening 21 at one end of the container body 2 to the back wall 22 at the other end. At this collision position T, the purge gas G flowing out from the openings 841 of the left and right protrusions 8 collide with each other at the collision position T and flows along the upper surface W1 of the substrate W and along the imaginary line L1 toward the center of the container body opening 21 in the left-right direction D3. At this time, a portion of the purge gas G flowing toward the center of the container body opening 21 in the left-right direction D3 spreads left and right, flowing not only near the imaginary line L1 on the upper surface W1 of the substrate W, but also equally to the left and right of the imaginary line L1. Therefore, the flow of the purge gas G is maintained stably directed in these directions.

[0050] 1 , the lid body 3 has a generally rectangular shape that generally matches the shape of the opening periphery 28 of the container body 2. The lid body 3 is detachable from the opening periphery 28 of the container body 2, and by attaching the lid body 3 to the opening periphery 28, the lid body 3 can close the container body opening 21 in a positional relationship in which it is surrounded by the opening periphery 28.

[0051] An annular sealing member 4 is attached to the inner surface of the lid 3 (the back surface of the lid 3 shown in FIG. 1 ), which faces the surface of a step (sealing surface 281) formed immediately in the rear direction D12 of the opening peripheral edge 28 when the lid 3 is closing the container body opening 21, so as to go around the outer periphery of the lid 3. The sealing member 4 is arranged so as to go around the lid 3. The sealing member 4 is made of various thermoplastic elastomers such as elastically deformable polyesters and polyolefins, fluororubber, silicone rubber, etc.

[0052] When the lid 3 is attached to the opening periphery 28, the sealing member 4 is sandwiched between the sealing surface 281 of the container body 2 and the inner surface of the lid 3 and elastically deforms. That is, with the sealing member 4 interposed between the lid 3 and the container body 2, the lid 3 can close the container body opening 21 while the lid 3 and the opening periphery 28 are spaced apart without coming into contact with each other. When the lid 3 is removed from the opening periphery 28, the substrate W can be inserted into and removed from the substrate storage space 27 within the container body 2.

[0053] A latch mechanism is provided in the lid 3. The latch mechanism is provided near both left and right ends of the lid 3, and as shown in Fig. 1, includes two upper latch portions 32A, 32A that can protrude in an upward direction D21 from the upper edge of the lid 3, and two lower latch portions 32B, 32B that can protrude in a downward direction D22 from the lower edge of the lid 3. The two upper latch portions 32A, 32A are located near both left and right ends of the upper edge of the lid 3, and the two lower latch portions 32B, 32B are located near both left and right ends of the lower edge of the lid 3.

[0054] An operating portion 33 is provided on the outer surface of the lid body 3. By operating the operating portion 33 from the front side of the lid body 3, the upper latch portions 32A, 32A and the lower latch portions 32B, 32B can be made to protrude from the upper and lower edges of the lid body 3, or can be made to not protrude from the upper and lower edges. The upper latch portions 32A, 32A protrude in the upward direction D21 from the upper edge of the lid body 3 and engage with the latch engagement recesses 231A, 231B of the container body 2, and the lower latch portions 32B, 32B protrude in the downward direction D22 from the lower edge of the lid body 3 and engage with the latch engagement recesses 241A, 241B of the container body 2, thereby fixing the lid body 3 to the container body opening 21 of the container body 2.

[0055] A recess (not shown) is formed on the inside of the cover 3 (the rearward direction D12 side of the cover 3 in FIG. 1 ) and recessed outward (in the forward direction D11) from the board storage space 27. A front retainer (not shown) is fixed to the recess.

[0056] The front retainer (not shown) has a front retainer board receiving portion (not shown). The front retainer board receiving portion (not shown) is arranged in a single central location in the left-right direction D3. The front retainer board receiving portion is not limited to a single central location in the left-right direction D3, but may be arranged in multiple locations, for example, two pairs spaced a predetermined distance apart. Twenty-five pairs of front retainer board receiving portions arranged in this manner are provided in parallel in the vertical direction. When a substrate W is stored in the substrate storage space 27 and the lid 3 is closed, the front retainer board receiving portion supports the edge of the edge of the substrate W.

[0057] Effects of the embodiment The substrate storage container 1 according to the present embodiment configured as described above can provide the following effects: The substrate storage container 1 according to the present embodiment includes a container body 2 having an opening periphery 28 with a container body opening 21 formed at one end and a cylindrical wall 20 with the other end closed, the inner surface of the wall 20 defining a substrate storage space 27 capable of storing substrates W and communicating with the container body opening 21, a lid 3 that is detachable from the container body opening 21 and can close the container body opening 21, an air passage (a gas flow path inside the air supply filter 98 and the exhaust filter 99) that can communicate the substrate storage space 27 with the space outside the container body 2, and a gas flow path that flows into the air passage. and a protrusion 8 as a gas ejection nozzle portion having a plurality of openings 841 for supplying the purge gas G, which is the gas supplied from the plurality of openings 841, to the substrate storage space 27, and the plurality of openings 841 are open in a direction toward the collision position T so that the purge gas G, which is the gas supplied from the plurality of openings 841, collides with each other at the collision position T on an imaginary line L1 connecting the container body opening 21 as one end of the container body 2 and the rear wall 22 as the other end, which passes through the center C of the substrate W.

[0058] With this configuration, the purge gas G flowing out from the openings 841 of the left and right protrusions 8, which are multiple openings, collide with each other at the collision position T. This collision causes the purge gas G to flow along the upper surface W1 of the substrate W and along the imaginary line L1 toward the center of the container body opening 21 in the left-right direction D3. The purge gas G flows primarily in a straight line along the imaginary line L1, but due to the collision of purge gas G from the left and right diagonally rearward at the collision position T, part of the purge gas G that attempts to flow in a straight line along the imaginary line L1 spreads to the left and right. This process is repeated along the imaginary line L1 until it reaches the center of the container body opening 21 in the left-right direction D3. The flow of the purge gas G is stably maintained in the predetermined direction.

[0059] This allows the purge gas G to flow stably near the upper surface W1 of the substrate W, and also allows the purge gas G to spread all over the upper surface W1 of the substrate W, right up to the periphery. This makes it possible to prevent humidity variations from occurring in different regions on the upper surface W1 of the substrate W. As a result, the purge gas replacement inside the substrate storage container 1 can be performed sufficiently over the entire upper surface W1 of the substrate W.

[0060] Furthermore, according to the substrate storage container 1 of this embodiment, a plurality of protrusions 8 serving as gas ejection nozzles are provided, and the openings 841 of each protrusion 8 are open in the direction toward the collision position T. With this configuration, the openings 841 can be arranged in each of the plurality of protrusions 8, and the layout can be easily arranged so that the purge gases G collide symmetrically with each other at the collision position T.

[0061] Furthermore, according to the substrate storage container 1 of this embodiment, the protrusion 8 serving as the gas ejection nozzle has an inclined eaves 842 serving as a predetermined direction outlet portion that causes purge gas G as a gas to flow from the opening 841 toward the upper surface W1, which is the surface of the substrate W. This configuration makes it possible to cause the purge gas G to flow from the opening 841 along the upper surface W1 of the substrate W, and to prevent the purge gas G from flowing at a position away from the upper surface W1 of the substrate W. Furthermore, when cleaning the container body 2, it is possible to prevent a cleaning liquid from flowing into the nozzle chamber 803 from the opening 841.

[0062] Furthermore, the substrate storage container 1 according to this embodiment is provided with a gas flow rate equalization section (gas retention chamber 801, pre-gas outflow holding chamber 804) that enables gas to flow out at a uniform flow rate from a plurality of openings 841, and the gas flow rate equalization section has the gas retention chamber 801, the pre-gas outflow holding chamber 804, and inter-chamber partitions (main body side partition 812, inner wall side partition 822) that form an inter-chamber flow path 806 that connects the gas retention chamber 801 and the pre-gas outflow holding chamber 804 by blocking linear communication between the gas retention chamber 801 and the pre-gas outflow holding chamber 804.

[0063] With this configuration, the purge gas retained in the gas retention chamber 801 flows through the inter-chamber flow path 806 into each of the plurality of pre-gas outflow holding sub-chambers of the pre-gas outflow holding chamber 804, flows into the nozzle chamber 803 where it is retained, and can be uniformly discharged from each of the plurality of openings 841 of the nozzle chamber forming portion 84. As a result, the purge gas can be uniformly supplied from the plurality of openings 841 to the substrates W stored in the substrate storage space 27.

[0064] Furthermore, according to the substrate storage container 1 of this embodiment, the gas flow rate equalizing unit has a partition wall 813 that divides the pre-gas-outflow holding chamber 804 into multiple pre-gas-outflow holding chambers. This configuration allows the purge gas that flows into the pre-gas-outflow holding chamber 804 to be divided among the multiple pre-gas-outflow holding chambers and temporarily retained therein. This allows the purge gas to be temporarily retained even if there is a difference in the amount of purge gas that flows into the multiple pre-gas-outflow holding chambers, and the purge gas that has been temporarily retained and uniformed in each pre-gas-outflow holding chamber then flows into the nozzle chamber 803. This makes it possible to prevent the purge gas that flows into the nozzle chamber 803 from strongly flowing out of the predetermined opening 841.

[0065] Furthermore, according to the substrate storage container 1 according to this embodiment, the plurality of pre-gas-outflow holding chambers have a uniform volume, which makes it possible to minimize differences in the amount of purge gas flowing from a predetermined pre-gas-outflow holding chamber through the hydrophobic membrane 83 into the nozzle chamber 803.

[0066] Furthermore, according to the substrate storage container 1 according to this embodiment, the gas retention chamber 801 is partitioned into a plurality of gas retention chambers by inter-chamber partitions 811. This configuration can prevent the purge gas that has flowed into the lower end of the gas retention chamber 801 from reaching the upper end of the gas retention chamber 801 with force. This makes it possible to prevent a large amount of purge gas from flowing to the upper end of the gas retention chamber 801.

[0067] Furthermore, according to the substrate storage container 1 of this embodiment, a gas flow space 8011 is formed as a gas supply flow path that communicates with all of the gas retention chambers. With this configuration, the purge gas that has flowed into the gas retention chamber 801 can be communicated with all of the gas retention chambers, and can flow from each gas retention chamber to each pre-gas-outlet holding chamber that constitutes the pre-gas-outlet holding chamber 804.

[0068] Furthermore, according to the substrate storage container 1 of this embodiment, the protrusion 8 serving as the gas ejection nozzle has a nozzle chamber 803 that communicates with the opening 841, and the nozzle chamber 803 communicates with the pre-gas-outflow holding chamber 804 via the hydrophobic membrane 83. With this configuration, when the container body 2 of the substrate storage container 1 is cleaned, the hydrophobic membrane 83 does not change the flow resistance and can prevent the cleaning liquid from flowing into the pre-gas-outflow holding chamber 804.

[0069] Furthermore, according to the substrate storage container 1 according to this embodiment, the nozzle chamber 803 communicates with all of the openings 841 and all of the pre-gas-outflow holding compartments that make up the pre-gas-outflow holding chamber 804. This configuration allows the purge gas that has flowed into all of the pre-gas-outflow holding compartments that make up the pre-gas-outflow holding chamber 804 to flow into the nozzle chamber 803 that communicates with all of the openings 841.

[0070] Furthermore, according to the substrate storage container 1 of this embodiment, the openings 841 are formed corresponding to each of the multiple substrates W stored in the substrate storage space 27. With this configuration, the purge gas flowing out from one opening 841 is assigned to one substrate W, making it possible to reliably flow the purge gas to each substrate W one by one.

[0071] Furthermore, the substrate storage container 1 according to this embodiment is provided with a columnar protrusion 8 having a gas ejection nozzle portion and a gas flow rate equalizer portion, and the base 819 of the protrusion 8 is inserted into a hole formed in the wall portion 20 of the container body 2, which hole forms an air passage and is provided with a sealing member, and the tip side portion of the protrusion 8 is fixed to the wall portion 20 of the container body 2, thereby fixing the protrusion 8 to the container body 2. With this configuration, the protrusion 8 can be fixed to the container body 2 easily and reliably.

[0072] [Modifications] The present invention is not limited to the above-described embodiment, and modifications are possible within the technical scope described in the claims.

[0073] For example, in the embodiment, the configurations of the protrusion main body, internal wall, hydrophobic film, nozzle chamber forming portion, etc. that constitute the protrusion are not limited to the configurations of the protrusion main body 81, internal wall 82, hydrophobic film 83, nozzle chamber forming portion 84, etc. that constitute the protrusion 8. For example, the number of protrusions may be one, three or more, instead of two.

[0074] Furthermore, the shapes of the container body and lid body, and the number and dimensions of substrates W that can be stored in the container body are not limited to the shapes of the container body 2 and lid body 3, and the number and dimensions of substrates W that can be stored in the container body 2 in this embodiment.

[0075] DESCRIPTION OF SYMBOLS 1 Substrate storage container 2 Container body 3 Lid 5 Side substrate support portion 6 Back side substrate support portion 8 Projection portion (gas ejection nozzle portion) 20 Wall portion 21 Container body opening (one end portion) 22 Back wall (other end portion) 25 First side wall (side wall) 26 Second side wall (side wall) 27 Substrate storage space 83 Hydrophobic film 801 Gas retention chamber (gas flow rate equalization portion) 803 Nozzle chamber 804 Pre-gas outflow holding chamber (gas flow rate equalization portion) 811 Partition between sub-chambers 812 Main body side partition (chamber partition) 813 Partition wall 819 Base 822 Inner wall side partition (chamber partition) 841 Opening 842 Sloped eaves (predetermined direction outflow portion) 8011 Gas circulation space C Center L1 Virtual line T Collision position W Substrate W1 Top surface

Claims

1. A substrate storage container comprising: a container body having a cylindrical wall portion with an opening peripheral portion formed at one end and a container body opening, and the other end being closed, wherein a substrate storage space capable of storing a substrate is formed by the inner surface of the wall portion and communicates with the container body opening; a lid that is detachable from the container body opening and capable of closing the container body opening; a ventilation path capable of communicating the substrate storage space with the space outside the container body; and a gas ejection nozzle portion having a plurality of openings for supplying the gas flowing into the ventilation path to the substrate storage space, wherein the plurality of openings are such that the gas supplied from the plurality of openings collides at a collision position closer to the other end of the container body than the center of the substrate stored in the container body, and at a collision position on an imaginary line connecting one end and the other end of the container body passing through the center of the substrate, and the openings are open in a direction toward the collision position.

2. The substrate storage container according to claim 1, wherein a plurality of the gas ejection nozzle portions are provided, and the openings of each gas ejection nozzle portion are open in a direction toward the collision position.

3. The substrate storage container according to claim 1, wherein the gas ejection nozzle portion has a predetermined direction outflow portion for flowing the gas from the opening toward the surface of the substrate.

4. The substrate storage container according to claim 1, further comprising a gas flow rate equalization portion capable of flowing the gas at a uniform flow rate from the plurality of openings, wherein the gas flow rate equalization portion includes a gas retention chamber, a gas retention chamber before outflow, and a chamber partition wall that forms a chamber-to-chamber flow path for communicating the gas retention chamber and the gas retention chamber before outflow by shielding a linear communication between the gas retention chamber and the gas retention chamber before outflow.

5. The substrate storage container according to claim 4, wherein the gas flow rate equalization portion has a partition wall that partitions the gas retention chamber before outflow into a plurality of gas retention sub-chambers before outflow.

6. The substrate storage container according to claim 5, wherein the plurality of gas retention sub-chambers before outflow have a uniform volume.

7. The substrate storage container according to claim 4, wherein the gas retention chamber is partitioned into a plurality of gas retention sub-chambers by a sub-chamber partition wall.

8. The substrate storage container according to claim 7, wherein a gas supply flow path communicating with all the gas retention sub-chambers is formed.

9. The substrate storage container according to claim 5, wherein the gas ejection nozzle portion has a nozzle portion chamber communicating with the opening, and the nozzle portion chamber communicates with the gas retention chamber before outflow through a hydrophobic film.

10. The substrate storage container according to claim 9, wherein the nozzle chamber communicates with all the openings and all the gas outflow pre-holding chambers.

11. The substrate storage container according to claim 1, wherein the openings are formed corresponding to each of the plurality of substrates stored in the substrate storage space.

12. The substrate storage container according to claim 4, comprising a columnar protruding portion having the gas ejection nozzle portion and the gas flow rate equalization portion, wherein a base portion of the protruding portion is inserted into a hole formed in the wall portion of the container body to form the ventilation path and provided with a seal member, and a tip side portion of the protruding portion is fixed to the wall portion of the container body, whereby the protruding portion is fixed to the container body.

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