Air isolation apparatus and substrate processing device

Abstract

The present application discloses an air isolation apparatus and a substrate processing device. The air isolation apparatus is used for being arranged at an inlet of a process cavity so as to prevent gas outside the process cavity from entering the process cavity. The air isolation apparatus comprises: a gas extraction component, used for generating negative pressure to extract gas; and an exhaust mechanism, provided with a first substrate conveying port, the first substrate conveying port being matched with the inlet and used for enabling a substrate to enter the process cavity through the first substrate conveying port and a substrate conveying inlet, wherein a plurality of first exhaust holes are formed in the inner top of the first substrate conveying port, a plurality of second exhaust holes are formed in the inner bottom of the first substrate conveying port, and the first exhaust holes and the second exhaust holes are respectively connected to the gas extraction component and used for extracting gas in the first substrate conveying port at the same time so as to block gas outside the process cavity from entering the process cavity through the substrate conveying inlet. The isolation effect of the internal and external environments of an annealing cavity is improved, and air is prevented from entering the annealing cavity and affecting the annealing effect of substrates.

Description

Air isolation device and substrate processing equipment Technical Field

[0001] The present application relates to the field of semiconductor equipment, and further relates to an air isolation device and substrate processing equipment. Background Art

[0002] In semiconductor processing, annealing is a common substrate thermal treatment process used to achieve various effects on deposited films to improve their electrical properties. For example, annealing can be used to activate dopants, densify deposited films, or alter the state of growing films.

[0003] During the annealing process, the oxygen content in the annealing chamber will directly affect the annealing effect. Therefore, during the annealing process, the external environment of the annealing chamber needs to be isolated from the internal environment of the annealing chamber to prevent external air from entering the annealing chamber and affecting the annealing effect.

[0004] Patent document with application number 201910784396.6 discloses an annealing chamber with an isolation door panel.

[0005] The annealing chamber includes an exhaust device, an air intake device, a cold plate, and a hot plate. The air intake device is installed on one side of the annealing chamber, and the exhaust device is installed on the other side of the annealing chamber, opposite the air intake device. The exhaust device includes an isolation door plate, a nitrogen delivery device, an exhaust plate, and a wafer delivery port. The isolation door plate is movably mounted at the wafer delivery port to isolate external air from entering the annealing chamber. The nitrogen delivery device is mounted on the top of the exhaust device and connected to an external nitrogen delivery pipeline. The exhaust plate is mounted on the bottom of the exhaust device, with multiple exhaust holes evenly distributed on the exhaust plate. An air intake bar is provided above the exhaust plate, which is connected to the nitrogen delivery device. When nitrogen is introduced into the nitrogen delivery device, nitrogen is fed in through the air intake bar and discharged through the exhaust holes, forming an air curtain flowing from top to bottom at the wafer delivery port, thereby isolating external air from entering the annealing chamber and improving the annealing effect of the substrate. However, when the substrate moves into or out of the wafer conveying port, the substrate will block the flow of air from top to bottom, causing airflow turbulence at the wafer conveying port and affecting the isolation effect of the exhaust device on the internal and external environments of the annealing chamber. Summary of the Invention

[0006] In response to the above technical problems, the purpose of this application is to improve the isolation effect of the internal and external environments of the annealing chamber to prevent air from entering the annealing chamber and affecting the annealing effect of the substrate.

[0007] In order to achieve the above objectives, the present application provides an air isolation device and a substrate processing equipment.

[0008] In some embodiments, the air isolation device is used to be installed at the substrate delivery inlet of the process chamber to prevent gas outside the process chamber from entering the process chamber, including: an exhaust component for generating negative pressure to extract gas; an exhaust mechanism, wherein the exhaust mechanism is provided with a first substrate delivery port, and the first substrate delivery port cooperates with the substrate delivery inlet to allow the substrate to enter the process chamber through the first substrate delivery port and the substrate delivery inlet; wherein, a plurality of first exhaust holes are provided at the inner top of the first substrate delivery port, and a plurality of second exhaust holes are provided at the inner bottom of the first substrate delivery port, and the first exhaust holes and the second exhaust holes are respectively connected to the exhaust component for simultaneously extracting gas in the first substrate delivery port to prevent gas outside the process chamber from entering the process chamber through the substrate delivery inlet.

[0009] The substrate processing equipment comprises: an annealing chamber provided with a substrate conveying inlet; and the above-mentioned air isolation device, which is installed at the substrate conveying inlet.

[0010] Compared with the prior art, this application has the following beneficial effects:

[0011] The present application constructs a plurality of first exhaust holes on the inner top of the first substrate conveying port of the air isolation device, and constructs a plurality of second exhaust holes on the inner bottom of the first substrate conveying port. The first exhaust holes and the second exhaust holes simultaneously exhaust air, so that the first exhaust holes form an upward airflow in the upper half of the first substrate conveying port, and the second exhaust holes form a downward airflow in the lower half of the first substrate conveying port, thereby increasing the isolation effect of the internal and external environments of the process chamber, preventing air from entering the interior of the process chamber, and thus affecting the substrate processing effect.

[0012] Summary of the Figures

[0013] The features and performance of the present application are further described by the following examples and drawings.

[0014] The preferred embodiments will be described below in a clear and understandable manner with reference to the accompanying drawings to further illustrate the above-mentioned characteristics, technical features, advantages and implementation methods of the present invention.

[0015] FIG1 is a schematic diagram of an air isolation device according to an embodiment of the present application;

[0016] FIG2a is a top perspective view of FIG1;

[0017] FIG2b is a cross-sectional view of FIG2a along section line aa;

[0018] 3a to 3c are cross-sectional views of three embodiments of FIG. 2b along section line bb;

[0019] FIG4 is a schematic diagram of an air isolation device according to an embodiment of the present application;

[0020] FIG5 is a full cross-sectional view of FIG4;

[0021] FIG6 is a left side view of FIG4;

[0022] FIG7 is a schematic diagram of a substrate processing device according to an embodiment of the present application; and

[0023] FIG8 is a cross-sectional view taken along section line cc of FIG7.

[0024] Preferred embodiment of this application

[0025] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the specific embodiments of the present invention will be described below with reference to the accompanying drawings. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings and other embodiments can be obtained based on these drawings without inventive work.

[0026] To simplify the drawings, only portions relevant to the invention are schematically depicted in each figure; they do not represent the actual structure of the product. Furthermore, to simplify the drawings and facilitate understanding, in some figures, only one component with the same structure or function is schematically depicted or labeled. In this document, "one" not only means "only one" but also "more than one."

[0027] It should be noted that, unless otherwise specified or limited, the terms "mounted," "connected," and "connected" should be understood broadly. For example, they can refer to fixed, detachable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediary; and internal communication between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0028] In addition, in the description of the present application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0029] As shown in Figure 1, an air isolation device 100 according to an embodiment of the present application is disclosed. Combined with Figures 7 and 8, the air isolation device 100 is used to be installed at the substrate delivery inlet 210 of the process chamber 200 to prevent gas (for example, air) outside the process chamber 200 from entering the process chamber 200.

[0030] Specifically, the air isolation device 100 includes an exhaust component 110 and an exhaust mechanism 120. The exhaust component 110 is used to generate negative pressure to extract gas, such as an exhaust pump. The exhaust mechanism 120 is provided with a first substrate delivery port 121. The first substrate delivery port 121 cooperates with the substrate delivery inlet 210 to allow the substrate 400 to enter the process chamber 200 through the first substrate delivery port 121 and the substrate delivery inlet 210. Among them, the inner top 1211 of the first substrate delivery port 121 is provided with a plurality of first exhaust holes 122, and the inner bottom 1212 of the first substrate delivery port 121 is provided with a plurality of second exhaust holes 123. The first exhaust holes 122 and the second exhaust holes 123 are respectively connected to the exhaust component 110 to simultaneously extract gas from the first substrate delivery port 121 to prevent gas outside the process chamber 200 from entering the process chamber 200 through the substrate delivery inlet 210.

[0031] In actual application, as shown in Figures 7 and 8, the substrate 400 enters the process chamber 200 for processing along its conveying direction m, sequentially passing through the first substrate delivery port 121 and the substrate delivery port 210 of the process chamber 200. Simultaneously, the first exhaust holes 122 and the second exhaust holes 123 exhaust air, respectively, forming airflows s1 and s2 (see Figures 3a and 3b) flowing horizontally from the two sides (substrate inlet and outlet) of the first substrate delivery port 121 into the first substrate delivery port 121. Vertically, airflow s3 flows from the center of the first substrate delivery port 121 toward the inner top 1211 of the first substrate delivery port 121, and airflow s4 flows from the center of the first substrate delivery port 121 toward the inner bottom 1212 of the first substrate delivery port 121. While the substrate 400 is being transported through the first substrate delivery port 121 along the transport direction m, the first exhaust holes 122 extract gas from above the substrate 400 to form airflow s3, and the second exhaust holes 123 extract gas from below the substrate 400 to form airflow s4. Therefore, the air isolation device 100 forms an upward-flowing air curtain in the upper half of the first substrate delivery port 121 and a downward-flowing air curtain in the lower half. The upper and lower air curtains are independent of each other, ensuring that the normal flow of the original airflow is not obstructed while the substrate 400 passes through the first substrate delivery port 121, thereby enhancing the air isolation device 100's isolation effect on the internal and external environments of the process chamber 200. The process chamber 200 includes, but is not limited to, an annealing chamber.

[0032] Preferably, as shown in Figures 2a and 2b, the exhaust mechanism 120 includes a main exhaust channel 126 and a multi-stage branch exhaust channel 127, one end of the main exhaust channel 126 is connected to the exhaust component 110, and each first exhaust hole 122 and each second exhaust hole 123 are respectively connected to the other end of the corresponding main exhaust channel 126 through the corresponding multi-stage branch exhaust channel 127, so that the pipe resistance from each first exhaust hole 122 and each second exhaust hole 123 to the main exhaust channel 126 is consistent.

[0033] Specifically, the exhaust mechanism 120 includes an upper plate 124 and a lower plate 125 . The upper plate 124 is disposed above the lower plate 125 . A strip-shaped gap is defined between the bottom of the upper plate 124 and the top of the lower plate 125 to form the first substrate delivery port 121 .

[0034] Preferably, as shown in Figures 2a and 2b, a main exhaust channel 1261 and a multi-stage branch exhaust channel 127 are provided within the upper plate 124. One end of the main exhaust channel 1261 is connected to the exhaust component 110, and the other end of the main exhaust channel 1261 is connected to each first exhaust hole 122 via the multi-stage branch exhaust channel 127. The total exhaust pressure provided by the exhaust component 110 is gradually dispersed by the multi-stage branch exhaust channel 127 and ultimately evenly distributed to each first exhaust hole 122, so that each first exhaust hole 122 has a substantially consistent exhaust volume. In addition, the plurality of first exhaust holes 122 are arranged sequentially along the width direction n of the first substrate conveying port 121. The first exhaust holes 122 are configured as elongated strips extending along the width direction n of the first substrate conveying port 121, thereby increasing the exhaust range of the first exhaust holes 122 along the width direction n of the first substrate conveying port 121, thereby enhancing the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200.

[0035] Specifically, as shown in FIG2b , the multi-stage branch exhaust channel 127 includes: a first-stage branch exhaust channel 1271, a second-stage branch exhaust channel 1272, a third-stage branch exhaust channel 1273, and a fourth-stage branch exhaust channel 1274, which are arranged in parallel from the main exhaust channel 1261 to the first exhaust hole 122 (arranged from top to bottom in the figure) and extend along the width direction n. In this example, the main exhaust channel 1261 is divided into two branches by the first-stage branch exhaust channel 1271, four branches by the two second-stage branch exhaust channels 1272, eight branches by the four third-stage branch exhaust channels 1273, and finally sixteen branches by the eight fourth-stage branch exhaust channels 1274. Each branch is connected to the first exhaust hole 122, thereby ensuring that the pipe resistance from each first exhaust hole 122 to the main exhaust channel 1261 is the same, thereby making the exhaust in the first substrate transfer port 121 more uniform in its width direction n, thereby enhancing the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200.

[0036] Similarly, referring again to FIG2b , a main exhaust channel 1262 and a multi-stage branch exhaust channel 128 are provided inside the lower plate 125. One end of the main exhaust channel 1262 merges with the main exhaust channel 1261 and is connected to the exhaust component 110 via a connecting pipe 129. The other end of the main exhaust channel 1262 is dispersed step by step by the multi-stage branch exhaust channels 128 and ultimately communicates with each second exhaust hole 123. The multi-stage branch exhaust channel 128 includes: a first-stage branch exhaust channel 1281, a second-stage branch exhaust channel 1282, a third-stage branch exhaust channel 1283, and a fourth-stage branch exhaust channel 1284, which are sequentially arranged in parallel from the main exhaust channel 1262 to the second exhaust hole 123 (arranged from bottom to top in the figure) and extend along the width direction n. The connection method of the first-stage branch exhaust channel 1281, the second-stage branch exhaust channel 1282, the third-stage branch exhaust channel 1283, and the fourth-stage branch exhaust channel 1284 are similar to those of the multi-stage branch exhaust channel 127 and will not be described in detail here. In addition, the arrangement and shape of the second exhaust holes 123 are similar to those of the first exhaust holes 122 . The plurality of second exhaust holes 123 are arranged in sequence along the width direction n of the first substrate conveying port 121 and are constructed into a long strip shape extending along the width direction n of the first substrate conveying port 121 .

[0037] Preferably, in the air isolation device 100 according to one embodiment of the present application, the first exhaust holes 122 are arranged in at least two rows along the transport direction m of the substrate 400, and the second exhaust holes 123 are arranged in at least two rows along the transport direction m of the substrate 400. The positions of the first exhaust holes in each row correspond to the positions of the second exhaust holes in each row, or the positions of the first exhaust holes in each row and the second exhaust holes in each row are staggered along the transport direction m of the substrate.

[0038] Specifically, in the example shown in Figure 3a, the first exhaust holes 122 are arranged into two columns along the transmission direction m of the substrate 400, which are recorded as the first column of first exhaust holes 1221 and the second column of first exhaust holes 1222, and the second exhaust holes 123 are arranged into two columns along the transmission direction m of the substrate 400, which are recorded as the first column of second exhaust holes 1231 and the second column of second exhaust holes 1232, respectively, wherein the first column of first exhaust holes 1221 corresponds to the first column of second exhaust holes 1231, and the second column of first exhaust holes 1222 corresponds to the second column of second exhaust holes 1232. In the example shown in FIG3b , the first exhaust holes 122 are arranged in two rows along the transport direction m of the substrate 400, denoted as the first row of first exhaust holes 1223 and the second row of first exhaust holes 1224. The second exhaust holes 123 are arranged in two rows along the transport direction m of the substrate 400, denoted as the first row of second exhaust holes 1233 and the second row of second exhaust holes 1234. The first row of first exhaust holes 1223, the first row of second exhaust holes 1233, the second row of first exhaust holes 1224, and the second row of second exhaust holes 1234 are staggered along the transport direction m. It should be noted that in this embodiment, the upper plate 124 is internally constructed with multiple sets of multi-stage branch exhaust channels 127. Referring to FIG2a , the first row of first exhaust holes 1221 and the second row of first exhaust holes 1222 are each connected to the main exhaust channel 126 via a set of multi-stage branch exhaust channels 127. Similarly, multiple groups of multi-stage branch exhaust channels 128 are constructed inside the lower plate 125, and the first row of second exhaust holes 1231 and the second row of second exhaust holes 1232 are connected to the main exhaust channel 126 through a group of multi-stage branch exhaust channels 128.

[0039] Preferably, referring again to FIG. 1 , the interior of the first substrate delivery port 121 is further configured with a first inner sidewall 1213 and a second inner sidewall 1214 disposed opposite each other along two horizontal sides perpendicular to the transport direction m of the substrate 400 (i.e., two sides in the width direction n). The first inner sidewall 1213 is provided with a plurality of third exhaust holes (not shown), and the second inner sidewall 1214 is provided with a plurality of fourth exhaust holes (not shown). The third exhaust holes and the fourth exhaust holes are respectively connected to the exhaust component 110 for simultaneously extracting gas from the first substrate delivery port 121 to prevent gas from outside the process chamber 200 from entering the process chamber 200 through the substrate delivery port 210.

[0040] Preferably, as shown in FIG3c , the air isolation device 100 further includes a gas supply component 130 and a gas supply mechanism 140. The gas supply component 130 is configured to provide a predetermined gas, such as nitrogen. The gas supply mechanism 140 is located on a side of the exhaust mechanism 120 away from the substrate delivery inlet 210. The gas supply mechanism 140 is provided with a second substrate delivery inlet 141, which is connected to the first substrate delivery inlet 121. The inner top 1411 of the second substrate delivery inlet 141 is provided with a plurality of first gas supply holes 142, and the inner bottom 1412 of the second substrate delivery inlet 141 is provided with a plurality of second gas supply holes 143. The first gas supply holes 142 and the second gas supply holes 143 are respectively connected to the gas supply component 130, and are configured to simultaneously supply gas flows s5 and s6 into the second substrate delivery inlet 141, thereby preventing gas from outside the process chamber 200 from entering the process chamber 200 through the substrate delivery inlet 210.

[0041] In this embodiment, an air supply mechanism 140 is added to the side of the exhaust mechanism 120 away from the substrate delivery inlet 210 of the process chamber 200, so that the second substrate delivery port 141 forms an air curtain on the side of the first substrate delivery port 121 away from the substrate delivery inlet 210, so that the air isolation device 100 forms a double airflow barrier at the substrate delivery inlet 210, thereby increasing the isolation effect of the air isolation device 100 on the internal and external environments of the process chamber 200.

[0042] Preferably, the interior of the second substrate delivery port 141 is further configured with a third inner sidewall and a fourth inner sidewall (not shown) disposed opposite each other along two horizontal sides perpendicular to the conveying direction m of the substrate 400 (i.e., two sides in the width direction n). The third inner sidewall is provided with a plurality of third gas supply holes, and the fourth inner sidewall is provided with a plurality of fourth gas supply holes. The third gas supply holes and the fourth gas supply holes are respectively connected to the gas supply component 130 to simultaneously supply airflow into the second substrate delivery port 141, thereby preventing gas outside the process chamber 200 from entering the process chamber through the substrate delivery inlet 210.

[0043] Preferably, as shown in Figure 4, the air isolation device 100 further includes a diverter mechanism 150. The diverter mechanism 150 is used to simultaneously connect multiple exhaust mechanisms 120 to the air extraction component 110. A total airflow channel 151 and a multi-stage branch airflow channel 152 are provided inside the diverter mechanism 150. One end of the total airflow channel 151 is connected to the air extraction component 110, and the other end of the total airflow channel 151 is connected to each exhaust mechanism 120 through the multi-stage branch airflow channel 152. The total exhaust pressure provided by the air extraction component 110 is dispersed step by step by the multi-stage branch airflow channel 152 and is finally evenly distributed to each exhaust mechanism 120, so that each exhaust mechanism 120 has a substantially consistent exhaust volume.

[0044] In this embodiment, multiple exhaust mechanisms 120 are simultaneously connected to the exhaust component 110 through the diversion mechanism 150 to eliminate the difference in pipe resistance between the exhaust component 110 and different exhaust mechanisms 120, so that each exhaust mechanism 120 has a uniform exhaust volume, and each exhaust mechanism 120 can be installed at the substrate delivery inlet 210 of different process chambers 200, thereby keeping the process environment of each process chamber 200 consistent and improving the processing effect of the substrate 400.

[0045] Preferably, as shown in Figures 5 and 6, the multi-stage branch airflow channel 152 includes: a plurality of branch airflow channels sequentially arranged between the total airflow channel 151 and the plurality of exhaust mechanisms 120. Wherein, each branch airflow channel has a first interface and a second interface, the first interface being used to connect the upper channel or the total airflow channel of the current branch airflow channel (if the current branch airflow channel is the first-level branch airflow channel, then its upper channel is the total airflow channel, and the first interface is used to connect the current branch airflow channel with the total airflow channel), and the second interface being used to connect the lower channel or the exhaust mechanism of the current branch airflow channel (if the current branch airflow channel is the last-level branch airflow channel, then its lower channel is the exhaust mechanism, and the second interface is used to connect the current branch airflow channel with the exhaust mechanism). In addition, the number of the second interfaces is greater than the number of the first interfaces, so that the air pressure provided to the first interface by its upper channel or the total airflow channel through the second interface of the current branch airflow channel is distributed to multiple lower channels or multiple exhaust mechanisms.

[0046] Specifically, the multi-stage branch airflow channel 152 includes a primary branch airflow channel 1521 having a first interface 1531 and at least two second interfaces 1532. The first interface 1531 is used to connect to the main airflow channel 151, and the second interface 1532 is used to connect to the exhaust mechanism 120. The straight-line distance from each second interface 1532 to the first interface 1531 is the same.

[0047] Preferably, the multi-stage branch airflow channel 152 further includes: a plurality of secondary branch airflow channels 1522, each of which corresponds one-to-one to the second interface 1532, and each secondary branch airflow channel 1522 is connected to the primary branch airflow channel 1521 through the corresponding second interface 1532. Each secondary branch airflow channel 1522 has at least two third interfaces 1541, and the third interfaces 1541 are used to connect to the exhaust mechanism 120. The straight-line distance from each third interface 1541 to the corresponding second interface 1532 is the same.

[0048] Preferably, the multi-stage branch airflow channel 152 further includes: a plurality of tertiary branch airflow channels 1523, each of which corresponds one-to-one to the third interface 1541, and each tertiary branch airflow channel 1523 is connected to the corresponding secondary branch airflow channel 1522 through the corresponding third interface 1541. Each tertiary branch airflow channel 1523 has at least two fourth interfaces 1551, and each fourth interface 1551 is used to connect to the main exhaust channel 126 of the corresponding exhaust mechanism 120. The straight-line distance from each fourth interface 1551 to the corresponding third interface 1541 is the same.

[0049] Specifically, the diverter mechanism 150 includes a first diverter plate 153, a second diverter plate 154, and a third diverter plate 155. The first, second, and third diverter plates 153, 154, 155 are sequentially stacked, and a vertically extending cavity is constructed between the first and second diverter plates 153, 154 to form a primary branch airflow channel 1521. Several vertically extending cavities are constructed between the second and third diverter plates 154, 155 to form a plurality of secondary branch airflow channels 1522. Several vertically extending cavities are constructed within the third diverter plate 155 to form a plurality of tertiary branch airflow channels 1523.

[0050] Preferably, the first interface 1531 is provided in the middle of the first diverter plate 153, and is used to connect the primary branch airflow channel 1521 with the total airflow channel 151; the two second interfaces 1532 are sequentially provided on the side of the second diverter plate 154 close to the first diverter plate 153 in the vertical direction, and the straight-line distances from each second interface 1532 to the first interface 1531 are the same, and are used to connect the corresponding secondary branch airflow channel 1522 with the primary branch airflow channel 1521; the four third interfaces 1541 are sequentially provided on the third diverter plate 155 close to the second diverter plate 153 in the vertical direction. The third ports 1541 are located on one side of the third diverter plate 155, and the straight-line distance from each third port 1541 to the corresponding second port 1532 is the same, thereby connecting the tertiary branch airflow channel 1523 with the corresponding secondary branch airflow channel 1522. Eight fourth ports 1551 are vertically arranged on the side of the third diverter plate 155 away from the second diverter plate 154, and the straight-line distance from each fourth port 1551 to the corresponding third port 1541 is the same. Each fourth port 1551 connects the tertiary branch airflow channel 1523 with the corresponding exhaust mechanism 120 via a connecting pipe 129. Furthermore, referring to FIG. 4 , a pressure detection port 1291 is provided on the connecting pipe 129 between the diverter mechanism 150 and each exhaust mechanism 120 for connecting to a barometer to monitor the air pressure entering each exhaust mechanism 120 from the diverter mechanism 150. In this embodiment, the total air flow channel 151 is equally divided into two branches by the first-level branch air flow channel 1521, then equally divided into four branches by the two second-level branch air flow channels 1522, and finally equally divided into eight branches by the four third-level branch air flow channels 1523, and are respectively connected to the exhaust mechanism 120, so that the path from each exhaust mechanism 120 to the total air flow channel 151 is the same, and thus the pipe resistance from each exhaust mechanism 120 to the total air flow channel 151 is the same.

[0051] As shown in Figures 7 and 8, a substrate processing device 10 according to an embodiment of the present application is disclosed. The substrate processing device 10 includes an annealing chamber 300, an air intake device 340, and an air isolation device 100 of any of the above-mentioned embodiments. The annealing chamber 300 is provided with a substrate delivery inlet 310, and a hot plate 320 and a cold plate 330 are provided inside the annealing chamber 300 for heat treatment of the substrate 400. The air intake device 340 is connected to a process gas source 350 for delivering process gas, such as hydrogen, to the interior of the process chamber 200. The air isolation device 100 is installed at the substrate delivery inlet 310 of the annealing chamber 300 to isolate the internal and external environments of the annealing chamber 300 and prevent air from entering the interior of the annealing chamber 300, thereby affecting the annealing effect of the substrate 400. In addition, the exhaust mechanism 120 in the air isolation device 100 is also used to discharge the above-mentioned process gas during the annealing process to maintain a stable airflow in the annealing chamber 300.

[0052] It should be noted that the above embodiments can be freely combined as needed. The above are only preferred embodiments of the present invention. For those skilled in the art, without departing from the principles of the present invention, several improvements and modifications can be made, and these improvements and modifications should also be considered as the scope of protection of the present invention.

Claims

1. An air isolation device, used to be installed at the substrate delivery entrance of a process chamber to prevent the gas outside the process chamber from entering the process chamber, characterized in that: include: A gas extraction component, used to generate negative pressure to extract gas; An exhaust mechanism is provided with a first substrate delivery port, the first substrate delivery port cooperates with the substrate delivery entrance, and is used to allow the substrate to enter the process chamber through the first substrate delivery port and the substrate delivery entrance; wherein, A plurality of first exhaust holes are provided at the inner top of the first substrate conveying port, and a plurality of second exhaust holes are provided at the inner bottom of the first substrate conveying port. The first exhaust holes and the second exhaust holes are respectively connected to the exhaust component for simultaneously extracting the gas in the first substrate conveying port to prevent the gas outside the process chamber from entering the process chamber through the substrate conveying inlet.

2. The air isolation device according to claim 1, characterized in that: The exhaust mechanism includes a main exhaust channel and a multi-stage branch exhaust channel. One end of the main exhaust channel is connected to the air extraction component. Each first exhaust hole and each second exhaust hole are respectively connected to the other end of the corresponding main exhaust channel through the corresponding multi-stage branch exhaust channel, so that the pipe resistance from each first exhaust hole and each second exhaust hole to the main exhaust channel is consistent.

3. The air isolation device according to claim 1, characterized in that: The plurality of first exhaust holes are arranged in at least two rows along the transport direction of the substrate; The plurality of second exhaust holes are arranged in at least two rows along the transport direction of the substrate; wherein, The positions of the first exhaust holes in each column correspond to the positions of the second exhaust holes in each column, or the positions of the first exhaust holes in each column and the second exhaust holes in each column are staggered along the transport direction of the substrate.

4. The air isolation device according to claim 1, characterized in that: The interior of the first substrate conveying port is constructed with a first inner side wall and a second inner side wall oppositely disposed along two horizontal sides perpendicular to the conveying direction of the substrate, wherein: The first inner side wall is provided with a plurality of third exhaust holes, and the second inner side wall is provided with a plurality of fourth exhaust holes. The third exhaust holes and the fourth exhaust holes are respectively connected to the exhaust component, and are used to simultaneously extract the gas in the first substrate delivery port to prevent the gas outside the process chamber from entering the process chamber through the substrate delivery port.

5. The air isolation device according to claim 1, characterized in that: Also includes: A gas supply component, used for providing preset gas; The air supply mechanism is located on a side of the exhaust mechanism away from the substrate delivery inlet, and the air supply mechanism is provided with a second substrate delivery inlet, which is connected to the first substrate delivery inlet; wherein, A plurality of first gas supply holes are provided at the inner top of the second substrate conveying port, and a plurality of second gas supply holes are provided at the inner bottom of the second substrate conveying port. The first gas supply holes and the second gas supply holes are respectively connected to the gas supply components, and are used to simultaneously supply airflow into the second substrate conveying port to prevent the gas outside the process chamber from entering the process chamber through the substrate conveying inlet.

6. The air isolation device according to claim 5, characterized in that: The interior of the second substrate conveying port is constructed with a third inner side wall and a fourth inner side wall oppositely disposed along two horizontal sides perpendicular to the conveying direction of the substrate, wherein: The third inner side wall is provided with a plurality of third gas supply holes, and the fourth inner side wall is provided with a plurality of fourth gas supply holes. The third gas supply holes and the fourth gas supply holes are respectively connected to the gas supply components, and are used to simultaneously supply airflow into the second substrate delivery port to prevent the gas outside the process chamber from entering the process chamber through the substrate delivery port.

7. The air isolation device according to claim 1, characterized in that: Also includes: The diversion mechanism is used to connect multiple exhaust mechanisms to the air extraction component at the same time. The diversion mechanism is provided with a total airflow channel and a multi-stage branch airflow channel. One end of the total airflow channel is connected to the air extraction component, and the other end of the total airflow channel is connected to each exhaust mechanism through the multi-stage branch airflow channel to make the pipe resistance from each exhaust mechanism to the air extraction component consistent.

8. The air isolation device according to claim 7, characterized in that: The multi-level branch airflow channel includes: a plurality of branch airflow channels arranged in sequence between the total airflow channel and the plurality of exhaust mechanisms, wherein each branch airflow channel has a first interface and a second interface, the first interface is used to connect the upper channel of the current branch airflow channel or the total airflow channel, the second interface is used to connect the lower channel of the current branch airflow channel or the exhaust mechanism, and the number of the second interfaces is greater than the number of the first interfaces.

9. The air isolation device according to claim 7, characterized in that: The multi-stage branch air flow channel includes: A first-level branch airflow channel, wherein the first-level branch airflow channel has a first interface and at least two second interfaces, the first interface is used to connect to the total airflow channel, and the second interface is used to connect to the exhaust mechanism; wherein the straight-line distance from each second interface to the first interface is the same.

10. The air isolation device according to claim 9, characterized in that: The multi-stage branch air flow channel also includes: Several secondary branch air flow channels, the secondary branch air flow channels correspond one-to-one to the second interface, and each of the secondary branch air flow channels is connected to the primary branch air flow channel through the corresponding second interface, and each of the secondary branch air flow channels has at least two third interfaces, and the third interface is used to connect the exhaust mechanism; wherein the straight-line distance from each third interface to the corresponding second interface is the same.

11. The air isolation device according to claim 10, characterized in that: The multi-stage branch air flow channel also includes: Several three-level branch air flow channels, the three-level branch air flow channels correspond one-to-one to the third interface, and each of the three-level branch air flow channels is connected to the corresponding two-level branch air flow channel through the corresponding third interface, and each of the three-level branch air flow channels has at least two fourth interfaces, and the fourth interface is used to connect the exhaust mechanism; wherein the straight-line distance from each fourth interface to the corresponding third interface is the same.

12. A substrate processing device, characterized in that: include: An annealing chamber, wherein the annealing chamber is provided with a substrate delivery entrance; as well as, The air isolation device according to any one of claims 1 to 11 is installed at the substrate conveying entrance.

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