Pump-out system

Abstract

The invention relates to a pump-out system. The pump-out system (100) comprises: a plurality of pumps (111, 112, 121... 128); two chamber connections (160) for coupling a plurality of vacuum chambers (151... 157); a circuit system which connects the plurality of pumps (111, 112, 121... 128) to one another and to the plurality of chamber connections (160) and is designed to provide a plurality of operating modes, of which: a first operating mode is designed to pump out the two chamber connections (160) independently of one another; and a second operating mode is designed to pump out the plurality of chamber connections (160) together.

Description

[0001] Pumping system

[0002] Various embodiments relate to a pumping system, for example a pumping system for a vacuum system having vacuum areas that can be separated from one another.

[0003] In general, workpieces or substrates can be processed, e.g. machined, coated, heated, etched and / or structurally modified. One method for coating a substrate is cathode sputtering. By means of sputtering (i.e. by means of a sputtering process), one or more layers can be deposited on a substrate. For this purpose, a plasma-forming gas can be ionized using a cathode, whereby a material to be deposited (the so-called target material) of the cathode can be sputtered using the plasma thus formed. The sputtered target material can then be brought to a substrate where it can be deposited and form a layer. The target material can be provided as a replaceable component, the so-called target.

[0004] For this purpose, the workpiece or substrate to be processed can be introduced into a vacuum system and processed within it. An example of such a vacuum system is a so-called continuous flow system, which has several vacuum chambers arranged one after the other. Using one of the several vacuum chambers, the workpiece or substrate can be transported into the vacuum system, and the workpiece or substrate can be processed in another vacuum chamber. For pumping out, there are conventionally a wide variety of different pumping concepts, which are usually adapted to the specific requirements in order to minimize pumping costs.

[0005] According to various aspects, a pumping system for a vacuum system with multiple vacuum chambers is provided which is more universally applicable, e.g. easier to scalable, and has more functionality than conventional pumping concepts. It was clearly recognized that conventional pumping concepts are often only transferable to a very limited extent and have limited functionality due to their specific adaptation. One of the shortcomings of conventional pumping concepts is that pumping operation and coating operation are difficult, if not impossible, to carry out simultaneously. For example, it was recognized that pumping concepts have several manifolds for pumping out, but each manifold is only ever assigned to one group of vacuum chambers, which can be pumped out via the manifold.However, this functionally limits the operation of the group of vacuum chambers to the point where they can only be pumped out together and therefore not individually or sequentially.

[0006] According to various embodiments, a pumping system for a vacuum system with multiple vacuum chambers is provided, which allows multiple chamber connections to be pumped independently of one another in a first operating mode; and the multiple chamber connections to be pumped jointly in a second operating mode. The pumping system thus enables greater flexibility. Among other things, simultaneous pumping and coating operations can be realized for the group of vacuum chambers. Alternatively or additionally, two separate pumping lines can be implemented, between which a vacuum chamber can be transferred. Clearly, one of the pumping lines can contribute to maintaining a high vacuum, and the other of the pumping lines can be used to bring a vacuum chamber from atmospheric pressure to high vacuum.

[0007] According to various embodiments, a pumping system is thus provided in which there is a functional coupling between pumping and coating. For example, a pumping system is provided for this purpose which has a plurality of collecting lines that are separately connected to the vacuum chambers. Thus, according to various aspects, the pumping system enables, for example, one of the plurality of vacuum chambers to be ventilated or pumped while another of the plurality of vacuum chambers is evacuated, so that a process pressure prevails in it. For example, maintenance work can be carried out in the ventilated chamber or substrates or workpieces can be transferred into or out of the system, whereas coatings or coating preparation operations (e.g., firing of magnetrons) can be carried out in the evacuated chamber.

[0008] It shows

[0009] Figures 1A to 2D each show different aspects of a pumping system according to different embodiments in a schematic view.

[0010] In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top," "bottom," "front," "back," "fore," "rear," etc., is used with reference to the orientation of the described figure(s). Since components of embodiments can be positioned in a number of different orientations, the directional terminology is for purposes of illustration and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention.It is understood that the features of the various exemplary embodiments described herein may be combined with one another unless specifically stated otherwise. The following detailed description is therefore not to be construed in a limiting sense, and the scope of the present invention is defined by the appended claims.

[0011] Throughout this description, the terms "connected," "attached," and "coupled" are used to describe both a direct and an indirect connection (e.g., resistive and / or electrically conductive, e.g., an electrically conductive connection), a direct or indirect connection, and a direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals where appropriate.

[0012] According to various embodiments, the term "coupled" or "coupling" can be understood in the sense of a (e.g. mechanical, hydrostatic, thermal and / or electrical), e.g. direct or indirect, connection and / or interaction. Several elements can, for example, be coupled to one another along an interaction chain, along which the interaction can be exchanged, e.g. a fluid (then also referred to as fluidically coupled). For example, two coupled elements can exchange an interaction with one another, e.g. a mechanical, hydrostatic, thermal and / or electrical interaction. A coupling of several vacuum components (e.g. valves, pumps, chambers, etc.) to one another can comprise that they are coupled to one another in a fluid-conducting manner or at least by means of an actuator. According to various embodiments, "coupled" can be understood in the sense of a mechanical (e.g. physical orA coupling can be understood as a physical coupling, e.g., by means of direct physical contact. A coupling can be configured to transmit a mechanical interaction (e.g., force, torque, etc.).

[0013] The actual state of an entity (e.g., a device, a system, or a process) can be understood as the actual or sensorily detectable state of the entity. The desired state of the entity can be understood as the desired state, i.e., a specification. Control can be understood as an intentional influencing of the current state (also referred to as the actual state) of the entity (also referred to as control intervention). The current state can be changed according to the specification (also referred to as the desired state), e.g., by changing one or more operating parameters (then also referred to as manipulated variables) of the entity, e.g., by means of an actuator. Regulation can be understood as controlling, whereby a change in state is additionally counteracted by disturbances. For this purpose, the actual state is compared with the desired state, and the entity is influenced in such a way, e.g.,by means of an actuator, so that the deviation of the actual state from the desired state is minimized. In contrast to pure forward-directed sequential control, the control thus implements a continuous influence of the output variable on the input variable, which is effected by the so-called control loop (also referred to as feedback). In other words, this can be understood as meaning that, alternatively or in addition to open-loop control (or actuation), closed-loop control can be used, or, alternatively or in addition to open-loop control, closed-loop control can be used.

[0014] The term "actuator" (e.g., having an actuator) can be understood as a converter configured to influence a state, a process (e.g., a coating process), or a device in response to actuation of the actuator. The actuator can convert a control signal supplied to it (by means of which the actuation takes place) into mechanical movements or changes in physical quantities such as pressure or temperature. An electromechanical (also referred to as electromotive) actuator can, for example, be configured to convert electrical energy into mechanical energy (e.g., through movement) in response to actuation. An actuator can be configured to influence the actual state (also referred to as the operating point) (e.g., the manipulated variable).

[0015] The term "control device" can be understood as any type of logic-implementing entity, which may, for example, comprise circuitry and / or a processor capable of executing software stored in a storage medium, firmware, or a combination thereof, and issuing instructions based thereon. The control device can, for example, be configured using code segments (e.g., software) to control the operation of a system (e.g., its operating point), e.g., a machine or a system, e.g., at least its kinematic chain.

[0016] If reference is made herein to control, this (e.g. a pumping sequence) can be implemented by means of code segments which can be stored, for example, in a data memory belonging to the control device. The code segments can be stored in a suitable manner in the data memory, for example as a list (e.g. table), series of values, as an algorithm, etc. A data memory (more generally also referred to as a storage medium) can, for example, be a non-transitory data memory. The data memory can, for example, comprise or be formed from a hard disk and / or at least one semiconductor memory (such as read-only memory, random access memory and / or flash memory). The read-only memory can, for example, be an erasable programmable read-only memory (can also be referred to as EPROM).The random access memory can be a non-volatile random access memory (also called NVRAM - "non-volatile random access memory").

[0017] "Fluid-separated" refers herein to a separation of two regions (e.g., vacuum chambers, a vacuum chamber and a line, etc.) within the vacuum system, due to which fluid exchange between the two regions is inhibited, e.g., blocked. For example, two fluid-separated regions are separated from each other in such a way that fluid exchange between them is inhibited, e.g., blocked. According to various embodiments, a vacuum chamber can be provided by means of a chamber housing in which one or more chambers can be provided. The chamber housing can, for example, be coupled (e.g., gas-conducting) to a pump arrangement, e.g., a vacuum pump arrangement, for providing a negative pressure or a vacuum (vacuum chamber housing), and can be configured so that it can withstand the effects of air pressure in the pumped-out state.The pump arrangement, which comprises, for example, at least one vacuum pump (e.g., a high-vacuum pump, e.g., a turbomolecular pump), can make it possible to pump out a portion of the gas from the interior of a processing chamber, e.g., from the processing space, within the vacuum chamber. Accordingly, one or more vacuum chambers can be provided in a chamber housing. In other words, the chamber housing can be configured as a vacuum chamber housing, or a coating chamber can be configured as a vacuum chamber.

[0018] For sputtering, the sputtering target can be arranged in a vacuum processing chamber (also referred to as a vacuum chamber for simplicity), so that sputtering can take place in a vacuum. For this purpose, the ambient conditions (the process parameters) within the vacuum processing chamber (e.g., process pressure, temperature, gas composition, etc.) can be set or regulated during sputtering. For example, a working gas can be provided within the vacuum processing chamber, which designates the plasma-forming gas or the plasma-forming gas mixture. The vacuum processing chamber can, for example, be designed to be airtight, dusttight, and / or vacuum-tight, so that a gas atmosphere with a predefined composition (also referred to as the working atmosphere) or a predefined pressure (also referred to as the working pressure or process pressure) can be provided within the vacuum processing chamber (e.g., according to a setpoint).The vacuum chamber may be configured to contain a vacuum (i.e. a pressure less than 0.3 bar) and / or a pressure in a range of approximately 1 mbar to approximately 10. 3 mbar (in other words fine vacuum) or less, e.g. a pressure in a range of approximately 10 3 mbar to approximately 10 7 mbar (in other words high vacuum) or less, e.g. a pressure of less than high vacuum, e.g. less than approximately 10 7 mbar (in other words, ultra-high vacuum). The lowest pressure achievable in the vacuum chamber is also referred to as the residual vacuum.

[0019] It should be understood that what is described herein for sputtering can apply analogously to any other coating process, e.g., physical vapor deposition. In general, physical vapor deposition (e.g., sputtering) involves transferring the chemical composition of the target or coating material into the layer to be formed.

[0020] According to various embodiments, a substrate can be a plate-shaped substrate. For example, the substrate can comprise or be formed from at least one of the following: a ceramic, a glass, a semiconductor (e.g., amorphous, polycrystalline, or single-crystalline semiconductor, such as silicon), a metal, and / or a polymer (e.g., plastic). For example, the substrate can be a glass plate (e.g., so-called float glass), and can optionally be or become coated. A substrate can, for example, have an extension transverse to the transport direction of more than approximately 1 m (meter), e.g., approximately 2 m, e.g., approximately 3 m. A substrate can, for example, have an extension along the transport direction of more than approximately 1 m (meter), e.g., approximately 2 m, e.g., approximately 3 m, e.g., approximately 4 m (6 m, 12 m, 18 m). Accordingly, the components of the processing system described herein, e.g.,their planes and / or rollers, must be dimensioned. Vacuum pumps are generally used to generate a vacuum, with vacuum pumps being differentiated from one another according to their working pressure range. A vacuum pump of the first type (also referred to as a forevacuum pump or fore-pump for short) is designed to generate a forevacuum on the inlet side during operation when its outlet side is exposed to the earth's atmospheric pressure (also referred to as the pressure of the earth's atmosphere). A vacuum pump of the second type (also referred to as a high forevacuum pump) is designed to generate a high vacuum on the inlet side during operation when its outlet side is exposed to the forevacuum.

[0021] One or more vacuum pumps (also referred to simply as pumps) can optionally be part of a multi-stage pumping train, the stages of which are also referred to as pumping stages, or at least one pumping stage. The pumping train descriptively refers to the chain of interactions (e.g., comprising pumps, lines, and / or valves), whose inlet draws in the gas (e.g., via a chamber connection) and whose outlet discharges the drawn-in gas. A "pumping stage" is understood herein to mean a device that can comprise one or a combination of several vacuum pumps of the same type, which are, for example, suitable for operating in the same pressure range (also referred to as the working pressure range). For example, a pumping stage can be configured to change, e.g., reduce, a pressure from a first pressure value to a second pressure value.

[0022] A backing pump stage (also referred to as a backing pump stage or backing vacuum stage) comprises one or more backing pumps (e.g., a rotary vane pump or other positive-displacement vacuum pump). A high-vacuum pump stage (also referred to as a high-vacuum stage or final pump stage) comprises one or more high-vacuum pumps (e.g., a turbomolecular pump). The pump train can comprise one or more positive-displacement vacuum pumps as backing pumps and, upstream of these, one or more turbomolecular vacuum pumps (also referred to as turbomolecular pumps) as high-vacuum pumps.

[0023] For example, a pumping system can have one or more pumping stages. Each pumping stage can perform specific functions to continuously improve the vacuum generation process and optimize the final vacuum level. For example, a first of the several pumping stages, also referred to as the forevacuum stage, can be designed for the rough or medium pressure range. It can, for example, be configured to quickly reduce the vacuum level in the vacuum chamber and to efficiently reduce a gas volume and thus a pressure within the vacuum chamber, e.g. to a vacuum, e.g. a rough vacuum (e.g. a pressure between 500 mbar and 1 mbar). This can relieve the load on a pumping stage upstream of the first pumping stage (from the perspective of the vacuum chamber), e.g. in the high or ultra-high vacuum range, and its performance can be optimized. For example, the first pumping stage can have one or more pumps of the first type, such as a forevacuum pump.A backing pump is understood to mean, for example, a diaphragm pump, a rotary vane pump, and / or the like. However, it is understood that pumps of the first type are not limited to backing pumps and can also be other pumps and / or pumps of a different type, such as fine vacuum pumps or the like.

[0024] For example, a second of the plurality of pumping stages, referred to herein as a high vacuum stage by way of example, can be configured to provide a high vacuum and / or an ultra-high vacuum. The second pumping stage can, for example, be connected in series with the first pumping stage (e.g., the second pumping stage can be connected between the first pumping stage and the vacuum chamber) or be independent of the first pumping stage (e.g., connected in parallel with it). For example, the high vacuum stage can further reduce a pressure within a vacuum chamber after the forevacuum stage has reduced the pressure to a certain value (e.g., within the fine vacuum). For example, the second pumping stage can have one or more pumps of a second type, such as high vacuum pumps. A high vacuum pump is understood, for example, to be a turbomolecular pump and / or the like.It is understood, however, that pumps of the second type are not limited to high vacuum pumps, and may also be other pumps and / or pumps of other types, such as fine vacuum pumps, ultra-high vacuum pumps or the like.

[0025] A "pump train" is understood herein to mean a vacuum pump and / or a network of several vacuum pumps connected in series (e.g., providing several pump stages), through which gas is extracted (e.g., by means of a chamber connection), e.g., to evacuate a vacuum chamber. For example, a pump train can have several pump stages (e.g., connecting them to one another) that are configured to ensure efficient and continuous evacuation of the vacuum chamber. For example, in a pump train that has several pumps, the several pumps can be connected in series and configured to cooperate. For example, each of the several pumps can be assigned to one of the several pump stages. For example, a pump train can have a pump of the first type and a pump of the second type connected in series with the pump of the first type.For example, multiple pump trains can lead to a single pump and / or gas reservoir. For example, a pump train can have only one pump stage.

[0026] For example, the vacuum chamber can be evacuated along the pump train by passing the gas or vapor particles from one pump to the next and gradually removing them from the chamber. Multiple pump trains can have the same starting point (e.g., the vacuum chamber) and the same end point (e.g., at atmospheric pressure, or a common line), which is why they are also referred to as parallel pump trains.

[0027] The terms "circuit", "interconnected" and "switched" in connection with fluid power components (e.g. vacuum pumps, actuators, lines, pump stages, pump trains, etc.) refer herein to the coupling of the components relative to one another (e.g. in analogy to electrical engineering), for example with regard to one or more than one fluid-conducting path provided by means of the coupling. During operation, fluid exchange can occur along each fluid-conducting path and / or a pressure difference (e.g. pressure increasing along the path) can be provided, for example from an inlet side of the fluid-conducting path (also referred to as the starting point) to an outlet side of the fluid-conducting path (also referred to as the end point). Examples of the inlet side of a fluid-conducting path include: a chamber connection (e.g. connection flange thereof), a pump (e.g. its inlet side), the interior of a vacuum chamber.Examples of the output side of a fluid-conducting path include: the Earth's atmosphere, a pump (e.g., its input side), a line (e.g., its output side). A fluid-conducting path that runs through one or more pumps can, for example, provide a pump train from the input side to the output side. The terms "connected in parallel" (also referred to as parallel connection) and "connected in series" (also referred to as series connection) refer to two alternatives for coupling the components relative to one another. If two components are "connected in series", they are arranged one behind the other along the fluid-conducting path, so that during operation they exchange fluid, for example, along the fluid-conducting path (also referred to as fluid exchange).For this purpose, of the two components connected in series, a first component can have an input side and a second component can have an output side, wherein the fluid-conducting path leads from the output side of the second component to the input side of the first component. If two components (e.g., first component and second component) are "connected in parallel," two fluid-conducting paths (e.g., first path and second path) are provided, which merge into one another at their starting point and / or end point (also referred to as branching). The first path runs through the first component and past the second component (i.e., not through it). The second path runs through the second component and past the first component (i.e., not through it).

[0028] For example, each of a plurality of pumps in the parallel circuit can operate independently of the others. For example, pumps of the same pumping stage can be connected in parallel. For example, pumps of different pumping stages can be connected in parallel. For example, pumps of different pumping trains can be connected in parallel. For example, the pumps connected in series can each reduce a pressure in the vacuum chamber one after the other. For example, the pumps of one pumping train can be connected in series. For example, the pumps of different pumping trains can be connected in series if the different pumping trains are connected in series.

[0029] Examples of vacuum pumps are explained below. A gas-transferring vacuum pump (also called a gas transfer vacuum pump) transports gas particles either in a closed working space (also called a positive displacement vacuum pump) or by transferring momentum to the gas particles (e.g., through impacts). Examples of gas-transfer backing pumps include: diaphragm pumps, reciprocating piston vacuum pumps, rotary vane pumps, blocking vane vacuum pumps, Roots pumps, screw vacuum pumps, molecular pumps, or liquid jet pumps and liquid ring pumps. Examples of high-vacuum pumps include: the turbomolecular pump (TMP), which is of the gas-transfer type, and of the gas-binding type: getter pumps, sublimation pumps, condensation pumps (e.g., a cryopump), or adsorption pumps (a sorption pump in which the gas is bound to the inner surface of a highly porous material by physical adsorption).A gas binding type vacuum pump (also called a gas binding vacuum pump or gas binding vacuum pump) achieves its pumping effect by binding the gas particles to a solid surface (e.g. sorbing them, also called sorption) and thus reducing the pressure at the inlet.

[0030] The term "interconnection system" (also referred to as a connection system or line system) refers herein to a system of fluid power components (e.g., lines and actuators, e.g., valves, and the like), by means of which a plurality of pumps and / or a plurality of chamber connections are coupled together. A pair of adjacent components (e.g., two lines, actuator and line, pump and line) can be coupled together by means of flanges (or other connectors) mounted on one another. The interconnection system can be brought into a plurality of mutually different states by setting one or more actuators, each state providing an operating mode. Each of the actuators can be configured to be set in response to change the resistance experienced by a fluid exchange between two fluid power components, e.g.,to block or to release the blockage (also referred to as releasing). For example, an actuator by means of which two pumps are coupled to one another can be brought into a first state, blocking gas exchange between the two pumps, and brought into a second state, releasing the gas exchange. For example, the plurality of lines and the plurality of valves serve as connecting paths between the vacuum chambers and vacuum pumps. The valves make it possible, for example, to control and thus regulate the flow rate of gases and vapors through the lines into (or out of) the various chambers and pumps. Lines are understood here to mean all common fluid-conducting examples of lines: pipes (also referred to as pipelines), hoses (also referred to as hose lines) or the like. Lines that are connected in parallel to one another (e.g.run parallel to each other), can for example end at the same starting point and / or the same end point. Two lines that are connected in series are arranged one after the other in such a way that a fluid that flows through the first of the two lines also flows, for example partially (e.g. completely) through a second of the two lines. Splitting or branching a line here means that a line splits into several (sub-)lines. The (sub-)lines (e.g. two of the several (sub-)lines) can run parallel to each other, e.g. if they end at the same point, e.g. if they converge again.

[0031] A line that is connected in parallel to another fluid power component (e.g., pump, actuator, or the like) clearly provides a bypass (also referred to as a "bypass") of the fluid power component (then also referred to as a bypass line). For example, the connection system can have one or more bypass lines. For example, a bypass line can have a fluid-conducting connection, such as a pipe or hose, that is connected in parallel to a vacuum pump (e.g., runs alongside it). For example, the vacuum pump can be shunted by means of the bypass line, analogous to electrical engineering. For example, two fluid-conducting paths can branch off from a starting point (then also referred to as branches), each path ending in the same end point (e.g., a manifold), one path being provided by the bypass line and the other path being provided by the vacuum pump.Thus, the two branches run parallel to each other. For example, a vacuum pump can be arranged along the first of the two branches (e.g., the first branch can run through the vacuum pump). Thus, the second branch is connected parallel to the vacuum pump and can form a bypass, by means of which the vacuum pump can be bypassed (analogous to a shunt in electrical engineering).

[0032] A "chamber connection" is understood herein to mean an interface which is designed to be connected to a vacuum chamber (e.g., to a chamber wall of the chamber housing delimiting the vacuum chamber), for example, is connected thereto. A preferred implementation of the chamber connection can comprise one or more flanges (also referred to as chamber connection flanges) which can be mounted on the vacuum chamber, e.g., a first chamber connection flange (also referred to as forevacuum connection flange), into which a forevacuum line opens, and / or a second chamber connection flange (also referred to as high vacuum connection flange), into which a high vacuum pump (or a high vacuum line) opens. A chamber connection flange (e.g., forevacuum connection flange) can be provided, for example, by means of an end section of a pipeline. A chamber connection flange (e.g.,A high-vacuum connection flange can, for example, be or become provided by a pump (e.g., high-vacuum pump), e.g., on its inlet side (e.g., its flange). For example, the inlet-side flange of the high-vacuum pump can be part of the second chamber connection flange. For example, the pump, e.g., its chamber connection flange, can be mounted directly to the chamber housing on the inlet side (i.e., its inlet side) and mounted to a pipeline on the outlet side. What is described for a flange of the chamber connection can apply analogously to any other implementation for connecting a vacuum chamber, e.g., for connection by means of clamping, screwing, plugging, by means of a bayonet lock, etc.

[0033] Various embodiments of the chamber connection have, for example, a (e.g. round) opening (also referred to as chamber connection opening) and a sealing surface (e.g. of the flange) surrounding the opening. The sealing surface can, for example, have or be adjacent to a circumferential groove in which a seal (e.g. polymer seal, copper seal, etc.) can be or can be received. A fluid line of the connection system (e.g. of a pipeline or a pump) can, for example, open into the chamber connection opening. The chamber connection opening can, for example, if the chamber connection is connected to the vacuum chamber, be adjacent to an opening of the vacuum chamber (e.g. its chamber housing, e.g. a chamber wall thereof). The chamber connection opening can, for example, if the chamber connection is connected to the vacuum chamber, connect the connection system (e.g. a fluid line and / or a pump thereof) to the vacuum chamber (e.g.their opening and / or chamber interior) in a fluid-conducting manner.

[0034] The term "pumping out" in connection with a chamber connection (e.g., the phrase "pumping out a chamber connection" or the phrase "pumping out a chamber connection") is understood herein to mean that gas is withdrawn from the chamber connection, e.g., through the chamber connection. Such pumping out comprises, for example, pumping out through the chamber connection, e.g., pumping out a component connected to the chamber connection (e.g., vacuum chamber) through the chamber connection, or at least pumping out a volume inherent in the chamber connection.

[0035] A "pumpdown sequence" is understood herein to be a time-controlled sequence of adjacent "phases," each of which may include one or more control actions used to create or regulate the vacuum in a vacuum chamber or vacuum system in a specific manner. Each "phase" in the pumpdown sequence may include specific actions and time periods aimed at improving the vacuum within the various phases and achieving the desired final vacuum level.

[0036] For ease of understanding, reference is made herein to a pumping system coupled to multiple vacuum chambers. In this regard, it should be understood that what is described for the pumping system can also apply to a pumping system provided individually, whereby what is described for the vacuum chambers can then apply analogously to the chamber connections of the pumping system.

[0037] Fig. 1A shows various aspects of a pumping system 100. The pumping system 100 may include a first pump 110 and a second pump 120. For example, the first pump 110 may represent a first pumping stage, e.g., belonging to this, e.g., being this. For example, the second pump 120 may represent a second pumping stage, e.g., belonging to this, e.g., being this.

[0038] For example, the first pump 110 may be a pump of the first type, e.g., a backing pump or the like. Alternatively or additionally, the second pump 120 may be a pump of the second type, e.g., a high-vacuum pump or the like. For example, the first pump 110 and the second pump 120 may be pumps of the same type (e.g., the first or second type).

[0039] The pumping system 100 further includes two chamber ports 160 configured to couple the pumping system 100 to two vacuum chambers (not shown). For example, each of the two chamber ports can be coupled to exactly one of the two vacuum chambers.

[0040] The pumping system 100 further comprises a connection system 130 configured to establish or disconnect a fluid-conducting connection between the first pump 110, the second pump 120, and the plurality of chamber connections 160 according to an operating mode. For example, the connection system 130 may comprise a plurality of lines and a plurality of valves. These are schematically illustrated by way of example in Figures 2A to 2D.

[0041] For example, the interconnection system 130 can be operated in a first operating mode, also referred to herein as the pump-down mode. In this mode, the interconnection system 130 can be configured to pump down the vacuum chambers connected to the two chamber ports 160 independently of one another.

[0042] In pumping mode, for example, the two pumps 110, 120 can be connected in parallel to each other with the two chamber connections 160 in a fluid-conducting manner.

[0043] Fig. 1B shows various aspects of the pumping system 100 from Fig. 1A, wherein the interconnection system 130 is operated, by way of example, in the pumping mode. Arrows illustrate the path of a fluid from the plurality of chamber connections 160 to the first pump 110 and to the second pump 120. For example, the first pump 110 can be fluidly connected to a first of the two chamber connections 160, and by means of this, for example, also to a first of the two vacuum chambers. For example, the second pump 120 can be fluidly connected to a second of the two chamber connections 160, and by means of this, for example, also to a second of the two vacuum chambers. For example, the first and second pumps 110, 120 form pumping lines parallel to one another in the pumping mode. For example, the interconnection system 130 is configured such that the first and second pumps 110, 120 do not exchange any fluid (e.g., a gas) with one another in the pumping mode.

[0044] This makes it possible, for example, to provide a first pressure (e.g., a rough vacuum) within the first vacuum chamber and a second pressure (e.g., a high vacuum) that differs from the first pressure within the second vacuum chamber. This allows, for example, substrates or materials to be introduced via the first vacuum chamber. Alternatively or additionally, the first vacuum chamber can be evacuated after maintenance. Furthermore, this makes it possible, for example, to prepare or carry out sputtering processes (e.g., preheating a magnetron) within a second vacuum chamber while the first chamber is being evacuated. This can increase process efficiency, for example.

[0045] It is understood that if the second pump is a high vacuum pump, an additional pump may be connected downstream (from the chamber's perspective) to prevent damage to the pump. The additional pump may, for example, provide a suitable pressure (e.g., a rough vacuum) at an output of the second pump. The additional pump may, for example, belong to the first pumping stage like the first pump, but be different from the first pump. For example, the first pump may be a first pump of the first type and the additional pump a second pump of the first type. For example, the first pump and the additional pump may be connected in parallel.

[0046] For example, the interconnection system 130 can be operated in a second operating mode, also referred to herein as processing mode. In this mode, the interconnection system 130 can be configured to jointly evacuate the vacuum chambers connected to the two chamber ports 160.

[0047] In processing mode, for example, the two pumps 110, 120 can be connected in series. For example, both of the two chamber connections 160 can be fluidly connected to both the second pump 120 and the first pump 110 (e.g., through the second pump 120).

[0048] Fig. 1C shows various aspects of the pumping system 100 from Fig. 1A, with the interconnection system 130 being operated in processing mode, for example. Arrows illustrate the path of a fluid from the multiple chamber connections 160, first to the second pump 120 and then to the first pump 110.

[0049] For example, the second pump 120 can be fluidly connected to the two chamber connections 160, and by means of these, for example, also to the two vacuum chambers. For example, the first pump 110 can be fluidly connected to the second pump 120. Thus, a fluid connection can be formed from the first pump 110 to the two chamber connections 160 through the second pump 120. For example, the first and second pumps 110, 120 form a common pump train in processing mode. For example, the interconnection system 130 is configured such that the first and second pumps 110, 120 do not exchange any fluid (e.g., a gas) with each other in pump-out mode.

[0050] This makes it possible, for example, to provide a common pressure within the first vacuum chamber and the second vacuum chamber. This allows the two vacuum chambers to be pumped efficiently.

[0051] For example, in pump-down mode, the second pump can also pump from the second vacuum chamber into a dead volume, e.g., into a closed volume that is separated from the first pump 110 by a valve and otherwise has no other outlet. For example, the valve can be opened in pump-down mode to establish a fluid-conducting connection to the first pump. Additionally, a valve between the first pump 110 and the first of the two chamber connections 160 can be closed, and a valve between the second pump 120 and the first of the two chamber connections 160 can be opened.

[0052] It should be noted that the pumps shown in Fig. 1A to Fig. 1C can each represent a pumping stage. As described herein, a pumping stage can have one or more pumps of the same type. The first pump can therefore also be understood as one or more pumps of the first type and / or the second pump can also be understood as one or more pumps of the second type. For example, in high-vacuum pumps, it can be advantageous if each chamber has its own high-vacuum pump. In this case, the second pump can be understood, for example, as two pumps of the second type, which can open into the same first pump.

[0053] Figures 2A to 2D refer to an exemplary implementation of the pumping system 100, the interconnection system of which provides the aspects explained herein (e.g., operating modes). The exemplary interconnection system has two parallel manifolds that merge into one another at both ends, thus providing a self-contained conduit path, and each manifold is coupled to a vacuum chamber. This implementation makes it possible to separate the manifolds from one another, so that, for example, different pressures are provided in them, between which a chamber connection can be transferred. In this regard, it can be understood that what has been described for the functions of the pumping system 100 can apply analogously to other implementations that result, for example, from modifications.For example, more or fewer manifolds can be used, more or fewer backing pumps (e.g. per pump stage and / or pump train), more or fewer high vacuum pumps (e.g. per pump stage and / or pump train).

[0054] Fig.2A shows various aspects of the pumping system 100 according to various embodiments.

[0055] The pumping system 100 can, for example, have a first pump of the first type 111 and a second pump of the first type 112. The two pumps of the first type 111, 112 can, for example, form a first pumping stage. The first pump 110 from Figures 1A to 1C can, for example, represent and / or be represented by the two pumps of the first type 111, 112. For example, and for a better understanding, it is assumed below that the pumps of the first type are "backing pumps" and are referred to as such. However, it is understood that the pumps of the first type can also be pumps of a type other than backing pumps.

[0056] The pumping system 100 can, for example, have a plurality of second-type pumps 121...128. The plurality of second-type pumps 121...128 can, for example, form a second pumping stage. The second pump 120 from Figures 1A to 1C can, for example, represent and / or be represented by the plurality of second-type pumps 121...128. For example, it is assumed below, by way of example and for better understanding, that the second-type pumps are "high-vacuum pumps" and are referred to as such. However, it is understood that the second-type pumps can also be pumps of a type other than high-vacuum pumps.

[0057] The pumping system 100 can, for example, be coupled to a plurality of vacuum chambers 151...157. The plurality of vacuum chambers 151...157 can be optionally fluidically separated from one another or fluidically connected, e.g., by means of valves 139 (also referred to as substrate transfer valves). The valves 139 between the chambers are also referred to herein as chamber valves 139. For example, the plurality of vacuum chambers 151...157 can have one or more regions, with each region being assigned a high-vacuum pump. For example, a first vacuum chamber 151, a third vacuum chamber 153, a fifth vacuum chamber 155, and a seventh vacuum chamber 157 of the plurality of vacuum chambers 151...157 can each have a region. For example, a second vacuum chamber 152, a fourth vacuum chamber 154, and a sixth vacuum chamber 156 of the plurality of vacuum chambers 151...157 can each have a region.157 each have a first region 152a, 154a, 156a and a second region 152b, 154b, 156b. For example, the two regions of a chamber can each be fluidically connected to one another and thus form a single region in terms of vacuum technology. Consequently, the two associated high-vacuum pumps in these chambers can each be clearly understood as a single high-vacuum pump. This is illustrated in Fig. 2A by the fact that they open directly into the same lines without additional valves or pumps.

[0058] The pumping system 100 can, for example, have a plurality of chamber connections 160 for coupling the pumping system 100, e.g., the interconnection system 130, to the plurality of vacuum chambers 151...157. For example, each chamber connection of the plurality of chamber connections 160 can be coupled to a corresponding vacuum chamber of the plurality of vacuum chambers 151...157.

[0059] The pumping system 100 may further comprise a connection system 130. The connection system 130 may comprise a plurality of lines and a plurality of valves by means of which the two backing pumps 111, 112 and the plurality of high-vacuum pumps 121... 128 are coupled to one another.

[0060] For example, the two backing pumps 111, 112 can be connected in parallel. For example, the first backing pump 111 can be coupled via a first line 131 of the plurality of lines, referred to for illustrative purposes as the first collecting line 131, and via a second line 132 of the plurality of lines, referred to for illustrative purposes as the second collecting line 132. The first and second lines 111, 112 can be connected in parallel.

[0061] For example, the first backing pump 111 can be coupled to the first manifold 131 by means of a valve, also referred to as the first backing valve 137a. Alternatively or additionally, the first backing pump 111 can be coupled to the second manifold 132 by means of a valve, also referred to as the third backing valve 138a. Alternatively or additionally, the second backing pump 112 can be coupled to the first manifold 131 by means of a valve, also referred to as the second backing valve 137b. Alternatively or additionally, the second backing pump 112 can be coupled to the second manifold 132 by means of a valve, also referred to as the fourth backing valve 138b.

[0062] For example, each of the plurality of chamber ports 160 can be coupled to the first manifold 111 by means of a valve of the plurality of valves, also referred to as a first bypass valve, and, for example, an associated line of the plurality of lines, also referred to as a first bypass line. Alternatively or additionally, each of the plurality of chamber ports 160 can be coupled to the second manifold 112 by means of a valve of the plurality of valves, also referred to as a second bypass valve, and, for example, an associated line of the plurality of lines, also referred to as a second bypass line. For example, the bypass valves can each enable a direct fluid-conducting connection between the respective vacuum chamber and the first and second vacuum lines (e.g., when they are open).

[0063] For example, each of the multiple chamber connections 160 can be coupled to the first collecting line 111 by means of a valve of the multiple valves, also referred to as the first pump valve 135, and, for example, an associated line of the multiple lines, also referred to as the first pump line, by means of at least one associated high-vacuum pump 121...128. For example, the associated high-vacuum pump 121...128 can be arranged between the chamber connection of the multiple chamber connections and the first pump valve 135, e.g., along the first pump line.

[0064] Alternatively or additionally, each of the multiple chamber connections 160 can be coupled to the second collecting line 112 by means of a valve of the multiple valves, also referred to as a second pump valve 136, and, for example, an associated line of the multiple lines, also referred to as a second pump line, by means of at least one associated high-vacuum pump 121...128. For example, the associated high-vacuum pump 121...128 can be arranged between the chamber connection of the multiple chamber connections and the second pump valve 136, e.g., along the first pump line.

[0065] For example, the vacuum chambers of the plurality of vacuum chambers having two regions can be coupled to two high-vacuum pumps. Furthermore, high-vacuum pumps coupled to the same vacuum chamber can be coupled to the same first pump valve 135 and the same second pump valve 136. For example, the second vacuum chamber has a first region 152a coupled to a first high-vacuum pump 121 and a second region 152b coupled to a second high-vacuum pump 122. For example, the first and second high-vacuum pumps 121, 122 can be connected in parallel and functionally considered one high-vacuum pump for the second vacuum chamber. The first and second high-vacuum pumps 121, 122 are coupled to the respective first pump valve and the respective second pump valve 135, 136.

[0066] The interconnection system 130 can be operated according to a plurality of operating modes. For example, valves can be opened and / or closed according to an operating mode selected from the plurality of operating modes.

[0067] Fig. 2A shows, by way of example, the pumping system 100 in a first operating mode of the multiple operating modes, also referred to as processing mode, in which the multiple vacuum chambers 151 ... 157 are pumped together. This mode can be used, for example, when a vacuum system comprising the pumping system 100 described herein in various aspects is used for coating substrates or workpieces or the like. By way of example, the first forevacuum valve 137a and the third forevacuum valve 138a are open, so that the first forevacuum pump 111 is fluidly coupled to the first and second collecting lines 131, 132. By way of example, the second forevacuum valve 137b and the fourth forevacuum valve 138b are open, so that the second forevacuum pump 112 is fluidly coupled to the first and second collecting lines 131, 132.This allows, for example, a rough vacuum to be provided within the two manifolds and applied to the first and second pump valves 135, 136. This can, for example, promote damage-free operation of the multiple high-vacuum pumps.

[0068] For example, the first pump valves 135, through which the plurality of vacuum chambers 151...157 are each connected to the first collecting line 131, can be opened. This results in a fluid-conducting connection between each of the plurality of vacuum chambers 151...157 and the first collecting line 131. This enables the respective vacuum chamber to be pumped out by means of the associated high-vacuum pump 121...128 and the first collecting line 131.

[0069] For example, the second pump valves 136, through which the plurality of vacuum chambers 151...157 are each connected to the second collecting line 132, can be opened. This results in a fluid-conducting connection between each of the plurality of vacuum chambers 151...157 and the second collecting line 132. This enables the respective vacuum chamber to be pumped out by means of the associated high-vacuum pump and the second collecting line 132.

[0070] In processing mode, the first and second bypass valves 133, 134 can each be closed. Furthermore, the chamber valves 139 between the vacuum chambers can be open, thereby fluidly connecting them to each other.

[0071] Fig. 2B shows, by way of example, the pumping system 100 in a second of the multiple operating modes, also referred to as maintenance mode. For example, the third vacuum chamber 153 and the fifth vacuum chamber 155 are to be ventilated while the other vacuum chambers can continue to operate. This enables, for example, maintenance of the third and fifth vacuum chambers 153, 155.

[0072] The operating state will be described below using the example of the third vacuum chamber 153 and the adjacent second and fourth vacuum chambers 152, 154. It is understood that the description can be applied analogously to the fifth vacuum chamber 155, with the fourth and sixth vacuum chambers 154, 156 each being adjacent to it.

[0073] For example, all valves coupled to the third vacuum chamber 153 can be closed. For example, the chamber valve 139, by means of which the third vacuum chamber 153 is coupled to the second vacuum chamber 152, can be closed. For example, the chamber valve 139, by means of which the third vacuum chamber 153 is coupled to the fourth vacuum chamber 154, can be closed. Furthermore, the first and second bypass valves 133, 134, which directly connect the third vacuum chamber 153 to the first and second collecting lines 131, 132, can be closed. Furthermore, the first and second pump valves 135, 136, which (indirectly) connect the third vacuum chamber 153 to the first and second collecting lines 131, 132 by means of a high-vacuum pump 123 of the plurality of high-vacuum pumps 121...128 (hereinafter referred to as the third high-vacuum pump 123), can be closed. This allows the two manifolds and the third vacuum chamber to be fluidly separated from each other.

[0074] For example, the two bypass valves 133, 134 and the two pump valves 135, 136 of the second and fourth vacuum chambers 152, 154 can be switched as in the processing mode. Furthermore, the four pre-vacuum valves 137a, 137b, 138a, and 138b can be opened so that the second and fourth vacuum chambers can be pumped out via the two manifolds 131, 132.

[0075] According to various aspects, the pumping system 100 can be used to pump out the vacuum chambers. An associated operating mode of the plurality of operating modes can, for example, be referred to as a pumping mode. For example, the pumping mode can be carried out in the form of a pumping sequence having multiple phases. For example, a pre-vacuum can be provided in the first phase. This enables, for example, the operation of the high-vacuum pump. Subsequently, in a second phase, a high vacuum (e.g., by means of the high-vacuum pump) can be provided. For example, the first phase of the pumping sequence can end when a first predetermined pressure value (e.g., within the third vacuum chamber) is reached. Alternatively or additionally, the second phase of the pumping sequence can begin when a second predetermined pressure value (e.g., within the third vacuum chamber) is reached.For example, the first and second pressure values ​​may be the same or different from each other. For example, the first and second pressure values ​​may be predetermined (e.g., predefined).

[0076] Fig. 2C shows, by way of example, the pumping system 100 in a pumping mode. The first phase of the pumping sequence is shown as an example. For example, the third vacuum chamber 153 and the fifth vacuum chamber 155 can be pumped (e.g., after they have been vented, see Fig. 2B), while the other vacuum chambers can continue to operate. This enables, for example, preparing or performing processes in the first, second, fourth, sixth, and seventh vacuum chambers 151, 152, 154, 156, and 157.

[0077] The operating state will be described below using the example of the third vacuum chamber 153 and the adjacent second and fourth vacuum chambers 152, 154. It is understood that the description can be applied analogously to the fifth vacuum chamber 155, with the fourth and sixth vacuum chambers 154, 156 each being adjacent to it.

[0078] For example, the first backing valve 137a can be open, whereby the first collecting line 131 and the first backing pump 111 are fluidly connected to one another. Furthermore, the second backing valve 137b can be closed, whereby the first collecting line 131 and the second backing pump 112 are fluidly separated from one another. For example, the third backing valve 138a can be closed, whereby the second collecting line 132 and the first backing pump 111 are fluidly separated from one another. Furthermore, the fourth backing valve 138b can be open, whereby the second collecting line 132 and the fourth backing pump 112 are fluidly connected to one another.

[0079] This allows the third vacuum chamber 153 to be pumped out via one of the two manifolds, e.g. the first manifold 131, while the other manifold, e.g. the second manifold 132, can be used to pump out the second and fourth vacuum chambers 152, 154.

[0080] For this purpose, for example, the first bypass valve 133 of the third vacuum chamber 153 can be opened, thereby providing a fluid-conducting connection from the third vacuum chamber to the first backing pump 111. For example, the path from the first backing pump 111 through the first backing valve 137a and the first bypass valve 133 and to the chamber connection 160, which is connected to the third vacuum chamber 153, forms a first pumping line. By means of this connection or this pumping line, a rough vacuum can be provided in the third vacuum chamber 153. Furthermore, the second bypass valve 134, the first pumping valve 135, and the second pumping valve 136 can be closed.Furthermore, for example, the second pump valve 136 of the second and fourth vacuum chambers 152, 154 can be opened, thereby providing a fluid-conducting connection from the second and fourth vacuum chambers 152, 154 to the second backing pump through the respective high-vacuum pumps 121, 122, 124, and 125. This allows, for example, the second and fourth vacuum chambers 152, 154 to be pumped out by means of the respective high-vacuum pumps and the second backing pump. Furthermore, the first and second bypass valves 133, 134 and the first pump valve 135 can be closed.

[0081] For example, the path from the second backing pump 112 to the second vacuum chamber 152 forms a second pump train. The second pump train runs from the second backing pump 112, through the fourth backing valve 138, through the second pump valve 136 of the second vacuum chamber 152, and through the high vacuum pumps 121 and 122 coupled to the second vacuum chamber, to the second vacuum chamber 152. The second pump train runs, for example, parallel to the first pump train. For example, the first and second pump trains are fluidly separated from each other.

[0082] For example, analogous to the second pump train, a third pump train can be formed from the second backing pump 112 to the fourth vacuum chamber 154. The third pump train can, for example, run parallel to the first pump train.

[0083] Fig. 2D shows the pumping system 100 in pumping mode by way of example. The second phase of the pumping sequence is shown by way of example. For example, the third vacuum chamber 153 and the fifth vacuum chamber 155 can continue to be pumped (e.g., after the first phase of the pumping sequence is completed), while the other vacuum chambers can continue to operate. This enables, for example, preparing or performing processes in the first, second, fourth, sixth, and seventh vacuum chambers 151, 152, 154, 156, 157.

[0084] This will be described below using the example of the third vacuum chamber 153 and the adjacent second and fourth vacuum chambers 152, 154. It is understood that the description can be applied analogously to the fifth vacuum chamber 155, with the fourth and sixth vacuum chambers 154, 156 each being adjacent to it.

[0085] For example, the four forevacuum valves 137a, 137b, 138a, and 138b can be switched as in the first phase of the pump-down sequence, see also Fig. 2C and the associated description.

[0086] This allows the third vacuum chamber 153 to be further pumped out via one of the two manifolds, e.g. the first manifold 131 (e.g. following the first phase), while the other manifold, e.g. the second manifold 132, can be used to pump out the second and fourth vacuum chambers 152, 154.

[0087] For this purpose, for example, the second pump valve 135 of the third vacuum chamber 153 can be opened, whereby a fluid-conducting connection from the third vacuum chamber to the first pre-vacuum pump 111 is provided by means of the high vacuum pump 123 associated with the third vacuum chamber 153.

[0088] For example, the path from the first backing pump 111 through the first backing valve 137a, the first pump valve 135, and the high vacuum pump 123 associated with the third vacuum chamber 153, and to the chamber connection 160 connected to the third vacuum chamber 153, forms a fourth pump line. By means of this connection or this fourth pump line, for example, by means of the associated high vacuum pump 123, a high vacuum can be provided in the third vacuum chamber 153. Furthermore, the first bypass valve 133, the second bypass valve 134, and the second pump valve 136 can be closed. Furthermore, for example, the first and second bypass valves 133, 134, the first and second pumping valves 135, 136 and the chamber valves 139 of the second and fourth vacuum chambers 152, 154 can be switched as in the first phase of the pumping sequence, see also Fig. 2C and the associated description.This allows the second and third pumping trains to be formed, as previously described. For example, the fourth pumping train can run parallel to the second and third pumping trains. For example, the fourth pumping train is fluidly separated from the second and third pumping trains.

[0089] Various aspects relate to a pumping system for a vacuum system that has separable vacuum areas.

[0090] For example, conventional glass systems may have one or two forevacuum lines, also referred to herein as manifolds, but lack the possibility of functionally separating pumping and magnetron operation.

[0091] Fig. 3A illustrates various aspects of a pumping system 100 according to various embodiments by way of example. A multi-part chamber connection 160 is illustrated, which has a plurality of flanges 170 (also referred to as chamber connection flanges 170), of which a first chamber connection flange is arranged on the output side of a second pump 120 and a second chamber connection flange is arranged on the output side of a bypass line 127 (e.g., forevacuum line) parallel to the second pump 120. For example, the second pump 120 (e.g., a housing of the second pump 120) can have the first chamber connection flange 170, which is mounted on a flange 170k of the vacuum chamber 150 (also referred to as chamber flange 170k). For example, each flange (e.g. the chamber flange 170k and / or the chamber connection flange 170) may have a plurality of mounting openings 171, 171k, by means of which the flanges (and thus also the second pump 120) are mounted to one another (e.g.screwed together).

[0092] The chamber connection 160 can, for example, be coupled to a vacuum chamber 150 (e.g., several chamber flanges 170k thereof), as shown by way of example in Fig. 3B.

[0093] For example, each chamber flange 170k may have an opening of the vacuum chamber 150 (or the like), e.g., be formed as such an opening (e.g., in a chamber wall or a chamber lid). For example, the second pump 120 (e.g., a housing thereof) may be attached to an edge of the chamber flange 170k surrounding the opening, e.g., using the plurality of mounting openings 171. This allows, for example, the second vacuum pump 120 to open directly into the vacuum chamber 150, as illustrated by way of example in Fig. 3B.

[0094] According to various embodiments, a pumping and vacuum separation of individual vacuum chambers is therefore provided herein according to the provided separation devices, e.g., valve chambers. This separation makes it possible, for example, to switch on and burn in magnetrons in the respective vacuum chambers while maintenance and / or pumping is still ongoing in other vacuum chambers.

[0095] According to various embodiments, a pumping system is provided which has at least two backing lines connected in parallel and two backing pumps which are coupled to two backing lines by means of the backing lines. The two backing lines can each have lockable valves, whereby each pump can be individually fluidically connected to or fluidically separated from each vacuum line. According to various embodiments, this enables, for example, any vacuum chamber, e.g., between two valve chambers, to be operated individually. For example, one of several operating modes can be selected for each vacuum chamber. The several operating modes can include, for example, "IN OPERATION" (also referred to as processing mode), "MAINTENANCE" and / or "PUMPING" (also referred to as pumping mode).

[0096] According to various embodiments, this also makes it possible to operate multiple vacuum chambers without requiring a separate vacuum pump for each vacuum chamber. This makes it possible, for example, to reduce the number of vacuum pumps required to implement the operating modes (e.g., "IN OPERATION," "MAINTENANCE," and / or "PUMPING"). In particular, with more than two vacuum chambers, this allows for greater design flexibility, for example, with regard to positioning the vacuum pumps, and / or lower material requirements compared to conventional vacuum systems.

[0097] Various examples are described below, which relate to what has been described above and illustrated in the figures. To improve understanding, the reference numerals are also used in the examples.

[0098] Example 1 is a pumping system that may include: multiple pumps; multiple (e.g., two) chamber ports 10 for coupling multiple vacuum chambers; a wiring system 130 that couples the multiple pumps to each other and to the chamber ports, and that is configured to provide multiple operating modes. Of the multiple operating modes, a first operating mode, also referred to as a pumping mode, is configured, for example, to pump the two chamber ports independently of one another; and a second operating mode, also referred to as a processing mode, is configured, for example, to pump the multiple chamber ports together.

[0099] In the first operating mode, a vacuum chamber can be pumped down to a rough vacuum (e.g., starting from atmospheric pressure) and / or pumped down from a rough vacuum to a high vacuum. The interconnection system can, for example, comprise multiple lines and / or multiple valves.

[0100] Example 2 is a pumping system according to Example 1, wherein the first operating mode is configured to connect two of the plurality of pumps (e.g. a (first) backing pump and a (first) high vacuum pump) in parallel to one another or to separate them from one another in a vacuum-tight manner, e.g. so that the high vacuum pump is coupled on the output side to a closed volume (also referred to as dead volume) and, for example, pumps against this (e.g. when the second pump valve associated with the (first) high vacuum pump is closed).

[0101] Example 3 is a pumping system according to example 1 or 2, the second operating mode is set up to connect the two pumps (e.g. a (first) backing pump and a (second) high vacuum pump) in series with each other.

[0102] Example 4 is a pumping system according to one of examples 1 or 3, wherein the first operating mode is configured to provide two pumping lines parallel to one another by means of the plurality of pumps.

[0103] Example 5 is a pumping system according to one of examples 1 or 4, wherein the second operating mode is configured to provide two pumping lines opening into one of the plurality of pumps (e.g., a backing pump).

[0104] Example 6 is a pumping system 100 according to Example 5, wherein of the pumping trains: a first pumping train comprises a first of the plurality of pumps (eg, the (eg, first) backing pump) and / or is connected to a first of the plurality of chamber ports, and a second pumping train comprises a second of the plurality of pumps (eg, the (first) high vacuum pump) and / or is connected to a second of the plurality of chamber ports.

[0105] Example 7 is a pumping system according to any one of Examples 1 to 6, wherein the second operating mode is configured to fluidly couple the plurality of chamber ports to one another through one (e.g., the first or second) of the plurality of pumps. For example, the fluid coupling may be provided through the high-vacuum pumps.

[0106] Example 8 is a pumping system according to any one of Examples 1 to 7, wherein the first mode of operation is configured to provide a greater temporal pressure change at a first of the plurality of chamber ports than at a second of the plurality of chamber ports.

[0107] Example 9 is a pumping system according to any one of Examples 1 to 8, wherein the first mode of operation is configured to implement a pumping sequence providing a (e.g., the) temporal pressure change at one of the plurality of chamber ports (e.g., the first chamber port) that results in a fore-vacuum pressure at the end of a first phase of the pumping sequence and in a high-vacuum pressure at the end of a second phase of the pumping sequence.

[0108] Example 10 is a pumping system according to any one of Examples 1 to 9, wherein the second operating mode is configured to provide a fluid-conducting connection between two of the plurality of chamber ports (e.g., the first and second chamber ports) (through one of the plurality of pumps), and wherein the first operating mode is configured to cancel (e.g., disconnect) the fluid-conducting connection between two of the plurality of chamber ports (e.g., the first and second chamber ports).

[0109] For example, the first operating mode is designed to separate the two chamber connections from each other in a vacuum-tight manner.

[0110] Example 11 is a pumping system according to any one of Examples 1 or 10, wherein the plurality of pumps comprises two backing pumps and the interconnection system comprises two parallel manifolds, each manifold coupling the two backing pumps together.

[0111] Example 12 is a pumping system according to any one of Examples 1 or 11, wherein the interconnection system comprises two parallel manifolds, each of which couples two backing pumps of the plurality of pumps together.

[0112] Example 13 is a pumping system 100 according to any one of Examples 1 to 12, wherein each of the plurality of chamber ports 160 has a plurality of connection flanges coupled in parallel to one another by means of the interconnection system.

[0113] This allows, for example, switching from a rough vacuum pump to a high vacuum pump and back again. Alternatively or additionally, this allows the activation of a second pump stage.

[0114] Example 14 is a pumping system according to any one of Examples 1 to 13, wherein the plurality of pumps comprises a (e.g., the) first backing pump and (e.g., the) second backing pump; and wherein the interconnection system comprises two manifolds (e.g., a first and a second manifold) coupled in parallel to each other, e.g., fluidically, and coupling the first backing pump 111 and the second backing pump to each other (e.g., independently of each other, fluidically).

[0115] For example, the first pump of the preceding examples is the first backing pump of Example 14. Example 15 is a pumping system according to Example 14, wherein the interconnection system optionally further comprises, for each of the chamber ports, at least one bypass line coupling the chamber port (e.g., a connection flange thereof) to (e.g., exactly) one of the two manifolds, e.g., in parallel with one (e.g., high vacuum pump) of the plurality of pumps (e.g., coupled to or providing the chamber port).

[0116] Example 16 is a pumping system according to example 14 or 15, wherein the plurality of pumps comprises a (e.g., first) high-vacuum pump coupled to a first chamber port of the plurality of chamber ports or providing a connection flange thereof; and wherein the first operating mode is configured to establish a fluid-conducting connection between the first backing pump and the first chamber port:

[0117] • past the first high-vacuum pump (e.g., by means of the first bypass line connected to the first chamber connection in parallel with the first high-vacuum pump) to provide a pre-vacuum pressure at the first chamber connection, for example, during the first phase of the pumping sequence; and / or

[0118] • by means of the first high vacuum pump (e.g. by means of a first pumping line which connects the first backing pump in series with the high vacuum pump) for providing a second pressure which is lower than the first pressure at the first chamber connection, preferably during the second phase of the pumping sequence.

[0119] For example, the second pump in the previous examples is the first high vacuum pump.

[0120] Example 17 is a pumping system according to any one of Examples 14 to 16, wherein the plurality of pumps comprises a second high vacuum pump (different from the first high vacuum pump) coupled to a second chamber port (different from the first chamber port) of the plurality of chamber ports.

[0121] Example 18 is a pumping system according to Example 17, wherein the first operating mode is configured to: establish a fluid-conducting connection between the second backing pump and the second chamber port, by means of the second high vacuum pump to provide a high vacuum pressure to the second chamber port (e.g., during the first and second phases of the pumping sequence), and to, for example, fluidly separate the first and second manifolds from each other.

[0122] Example 19 is a pumping system according to example 17 or 18, wherein the second operating mode is configured to fluidly couple the second backing pump to the second chamber connection, for example by means of the second high-vacuum pump to provide the high vacuum pressure at the second chamber connection, e.g., at the fourth vacuum chamber 154.

[0123] Example 20 is a pumping system that is configured, for example, according to any one of Examples 1 to 19 and / or may include: two pumping stages, of which a first pumping stage is configured to provide a first pressure, and a second pumping stage is configured to provide a second pressure less than the first pressure; a first chamber port for coupling to a first vacuum chamber; a second chamber port for coupling to a second vacuum chamber;a connection system which couples the two pumping stages to one another and to the first chamber connection and the second chamber connection, and which is configured to provide a plurality of operating modes, of which, for example: a first operating mode (also referred to as pump-out mode) is configured to provide the first pressure at the first chamber connection and the second pressure at the second chamber connection when the first pumping stage and the second pumping stage exchange gas with one another (e.g., are connected in series); and a second operating mode (also referred to as processing mode) is configured to provide a fluid-conducting connection between the first chamber connection and the second chamber connection through the second pumping stage;

[0124] In the first operating mode, a vacuum chamber can be pumped down to a rough vacuum (e.g., starting from atmospheric pressure) and / or pumped down from a rough vacuum to a high vacuum. The interconnection system 130 can, for example, comprise multiple lines and / or multiple valves.

[0125] For example, a connection from the first pumping stage to a chamber connection can be referred to as a pumping line. For example, a pumping line can run through the second pumping stage or parallel to it.

[0126] Example 21 is a pump-down system according to example, wherein the first operating mode is configured to provide a temporal pressure change at the first chamber port that is greater than a difference between the first pressure and the second pressure; and wherein the first operating mode is configured to implement a pump-down sequence that provides the temporal pressure change at the first chamber port that results in the first pressure at the end of a first phase of the pump-down sequence and the second pressure at the end of a second phase of the pump-down sequence.

[0127] This allows, for example, switching from a rough vacuum pump to a high vacuum pump and back again. Alternatively or additionally, this allows the activation of a second pump stage.

[0128] Example 22 is a pumping system according to example 20 or 21, wherein the first operating mode is configured to: separate the fluid-conducting connection between the first chamber port and the second chamber port.

[0129] For example, the first operating mode may further be configured to fluidically separate the first chamber connection and the second chamber connection from each other.

[0130] Example 23 is a pumping system according to any one of examples 20 or 22, wherein the first pumping stage comprises a first pump of the first type (e.g., a first backing pump), and wherein the first operating mode is configured to: fluidly couple the first pump of the first type to the first chamber port (e.g., to form a pumping train), for example: past the second pumping stage to provide the first pressure at the first chamber port (e.g., a first pumping train can thus be formed that runs past the second pumping stage), e.g., during the first phase of the pumping sequence; and / or by means of the second pumping stage to provide the second pressure at the first chamber port (e.g., a fourth pumping train can thus be formed that runs through the second pumping stage), e.g., during the second phase of the pumping sequence.

[0131] Example 24 is a pumping system according to any one of Examples 20 to 23, wherein the first pumping stage comprises a second pump of a first type (e.g., a second backing pump).

[0132] Example 25 is a pumping system according to Example 24, wherein the first operating mode is configured to fluidly couple the second pump of the first type to the second chamber port, using the second pumping stage to provide the second pressure at the first chamber port (e.g., during the first and second phases of the pumping sequence). Thus, for example, a second pumping train can be formed. The second pumping train can run parallel to the first pumping train.

[0133] For example, the first operating mode can optionally be further configured to fluidically disconnect a connection from the second pump of the first type to the second chamber port, which connection runs past the second pumping stage. Example 26 is a pumping system according to example 24 or 25, wherein the second operating mode is configured to fluidly couple the second pump of the first type to the second chamber port, e.g., by means of the second pumping stage to provide the second pressure at the second chamber port.

[0134] Example 27 is a pumping system according to any one of Examples 20 to 26, wherein the second pumping stage comprises a first pump of a second type (e.g., a first high vacuum pump).

[0135] Example 28 is a pumping system according to Example 27, wherein the first operating mode (e.g., during the second phase of the pumping sequence) is configured to fluidly couple the first pump of the second type to the first chamber port to provide the second pressure at the first chamber port. Thus, for example, the first pumping train can be formed.

[0136] For example, the first operating mode can optionally be further configured to fluidically couple the first pump of the second type, the first pump stage (e.g., the first pump of the first type), and the first chamber connection to one another, e.g., by connecting the first pump of the first type, the first pump of the second type, and the first chamber connection in series.

[0137] Example 29 is a pumping system according to example 27 or 28, wherein the second operating mode is configured to fluidly couple the first pump of the second type to the first chamber port to provide the second pressure at the first chamber port.

[0138] For example, the second operating mode can be configured to fluidically couple the first pump of the second type, the first pump stage (e.g., the first pump of the first type and the second pump of the first type), and the first chamber connection. For example, the first pump stage (e.g., the first pump of the first type and the second pump of the first type), the first pump of the second type, and the first chamber connection can be connected in series (e.g., serially).

[0139] Example 30 is a pumping system according to any one of Examples 20 to 29, wherein the second pumping stage comprises a second pump of a second type (e.g., a second high-vacuum pump), wherein the first operating mode (e.g., during the first and second phases of the pumping sequence) is configured to fluidly couple the second pump of a second type to the second chamber port to provide the second pressure at the second chamber port. Thus, for example, the second pumping train can be formed, which can, for example, be connected in parallel to the first and fourth pumping trains.

[0140] Example 31 is a pumping system according to Example 30, wherein the first operating mode (e.g., during the first and second phases of the pumping sequence) is configured to fluidly couple the second pump of the second type, the first pumping stage (e.g., the second pump of the first type), and the second chamber connection. For example, the first pumping stage (e.g., the second pump of the first type), the second pump of the second type, and the second chamber connection can be connected in series (e.g., serially).

[0141] Example 32 is a pumping system according to any one of Examples 20 to 31, wherein the first pumping stage comprises a first pump of the first type and a second pump of the first type (e.g., the first and second backing pumps).

[0142] Example 33 is a pumping system 100 according to Example 32, wherein the first operating mode is configured to: separate a fluid-conducting connection (e.g., in the form of two manifolds) between the first pump of the first type and the second pump of the second type.

[0143] For example, a first connection between the first pump of the first type and the fluid-conducting connection (e.g., to the second collecting line) can be separated (e.g., by means of a valve (e.g., a third backing valve). For example, a second connection between the second pump of the first type and the fluid-conducting connection (e.g., to the first collecting line) can be separated (e.g., by means of a valve (e.g., a second backing valve).

[0144] Example 34 is a pumping system according to example 32 or 33, wherein the second operating mode is configured to fluidly connect the first and second pumps of the first type to one another by means of two independent connections (e.g., by means of two manifolds).

[0145] According to various embodiments, the aspects described in Examples 1 to 19 may apply analogously to Examples 20 to 34 and vice versa.

[0146] Example 35 is a pumping system that is configured, for example, according to any one of Examples 1 to 34 and / or may include: two pumping stages, of which a first pumping stage is configured to provide a first pressure, and a second pumping stage is configured to provide a second pressure less than the first pressure; a plurality of first chamber ports for coupling to a respective first vacuum chamber; a plurality of second chamber ports for coupling to a respective second vacuum chamber;a circuit system that couples the two pumping stages to each other and to the plurality of first chamber ports and the plurality of second chamber ports, and that is configured to provide a plurality of operating modes, of which, for example: a first operating mode is configured to provide the first pressure at the first chamber ports and the second pressure at the second chamber ports when the first pumping stage and the second pumping stage exchange gas with each other; and a second operating mode is configured to provide a fluid-conducting connection between at least one of the plurality of first chamber ports and at least one of the plurality of second chamber ports through the second pumping stage.

[0147] Example 36 is a pumping system which, for example, is configured according to one of Examples 1 to 35 and / or may comprise: a plurality of pumps; a first chamber connection for coupling to a first vacuum chamber; a second chamber connection for coupling to a second vacuum chamber; a connection system which couples the plurality of pumps to one another and to the first chamber connection and the second chamber connection and which is configured to provide a plurality of operating modes, of which, for example: a first operating mode is configured to provide, by means of the plurality of pumps, two mutually parallel (e.g., fluid-separated and / or independent) pumping lines, of which a first (e.g., multi-stage) pumping line (e.g., of the high-vacuum type, e.g., providing a high vacuum) is adjacent to the first chamber connection (e.g., extracting gas therefrom) and a second (e.g., multi-stage) pumping line (e.g., separated therefrom)of the high vacuum type or pre-vacuum type, e.g. providing a rough vacuum) is applied to the second chamber port (e.g. extracting gas therefrom); and a second operating mode is configured to provide a fluid-conducting connection between the first chamber port and the second chamber port through at least one of the plurality of pumps.

[0148] Example 37 is a pumping system that is configured, for example, according to any one of Examples 1 to 36 and / or can comprise: a plurality of pumps that comprise a backing pump, a first high-vacuum pump, and a second high-vacuum pump; a connection system that couples the plurality of pumps to one another and that is configured to provide a plurality of operating modes, of which: a first operating mode is configured to provide, by means of the backing pump and the first high-vacuum pump, a first multi-stage pump train that is parallel to the second high-vacuum pump (e.g.fluid-separated and / or independent thereof) when the second high-vacuum pump is in operation and / or exposed to a forevacuum; and a second operating mode is configured to provide the first multi-stage pump train by means of the forevacuum pump and the first high-vacuum pump and to provide a second multi-stage pump train by means of the forevacuum pump and the second high-vacuum pump.

[0149] Example 38 is a pumping system according to any one of Examples 1 to 37, wherein the plurality of pumps comprises one or more roughing pumps and / or one or more high vacuum pumps.

[0150] Example 39 is a pumping system according to any one of Examples 1 to 38, wherein the plurality of pumps, e.g., per chamber port, comprise one or more than one high vacuum pump, which, e.g., provides a connection flange of the chamber port.

[0151] Example 40 is a pumping system according to any one of Examples 1 to 39, wherein one or more than one backing pump of the plurality of pumps is arranged on the output side of the interconnection system.

[0152] Example 41 is a pumping system according to any one of Examples 1 to 40, wherein one or more than one high vacuum pump of the plurality of pumps is arranged on the input side of the interconnection system.

[0153] Example 42 is a vacuum arrangement comprising: the pumping system according to any one of Examples 1 to 41, a plurality of vacuum chambers (e.g., arranged one behind the other in a row and / or arranged one behind the other along a transport path), each vacuum chamber being coupled to (e.g., exactly) one chamber connection of the pumping system; preferably, a transport device for transporting a substrate, e.g., through the plurality of vacuum chambers and / or along a transport path.

[0154] Example 43 is the vacuum arrangement according to Example 42, wherein the plurality of vacuum chambers have a plurality of substrate transfer openings, each substrate transfer opening coupling two immediately adjacent vacuum chambers of the plurality of vacuum chambers to one another (e.g., along the transport path and / or at the end face); preferably, per substrate transfer opening, a substrate transfer valve by means of which the substrate transfer opening can be sealed (e.g., so that gas exchange through the substrate transfer opening is blocked).

[0155] Example 44 is the vacuum assembly according to Example 42 or 43, further comprising: a plurality of processing devices, each processing device being arranged in one of the plurality of vacuum chambers.

[0156] Example 45 is the vacuum arrangement according to any one of Examples 1 to 44, arranged according to any one of the appended claims.

[0157] Example 46 is a method for pumping down a vacuum arrangement, e.g., a vacuum arrangement according to any one of Examples 1 to 45. The method may comprise: determining one of a plurality of operating modes as a selected operating mode, of which:

[0158] • a first operating mode is arranged to pump two chamber connections (160) independently of each other; and

[0159] • a second operating mode is configured to pump the two chamber ports (160) together; and controlling a circuit system which couples a plurality of pumps to one another and to the two chamber ports (160) and which is configured to provide the plurality of operating modes in accordance with the selected operating mode.

[0160] For example, controlling the interconnection system may include controlling one or more than one actuator of the interconnection system, for example an actuator configured to change a valve and / or a flow controller.

[0161] Example 47 is a method according to Example 46, wherein the method in the first operating mode comprises (i.e. wherein the controlling according to the first operating mode comprises): controlling the interconnection system (e.g. an actuator thereof, which is configured) to separate a (e.g. first) fluid-conducting connection between the two chamber connections. This enables, for example, two vacuum chambers connected to the two chamber connections to be pumped out independently of one another. For example, the controlling according to the first operating mode can comprise: controlling the interconnection system (e.g. an actuator thereof, which is configured) to close one or more valves by means of which the two chamber connections are fluid-conductingly connected to one another.

[0162] Example 48 is a method according to example 46 or 47, wherein the method, when the first operating mode is determined as the selected operating mode, further comprises: determining a pressure (or a value representing this) at a first of the two chamber connections and comparing the determined pressure with a predetermined pressure value (also referred to as reference pressure); wherein the actuation of the circuit system according to the first operating mode is based on a result of the comparison, for example comprising (e.g., when it is determined that the determined pressure is greater than the predetermined pressure value): actuating the circuit system (e.g., an actuator thereof, which is configured) to provide a (second) fluid-conducting connection between the first chamber connection and a first vacuum pump of the first type (e.g.,a forevacuum pump) of the plurality of vacuum pumps and / or for providing a first pressure (which, for example, represents a forevacuum) at the chamber connection of the two chamber connections. For example, the actuation according to the first operating mode can optionally further comprise: actuating the circuit system (e.g., an actuator thereof, which is configured) to disconnect a (third) fluid-conducting connection between the first chamber connection of the two chamber connections and a first vacuum pump of a second type (e.g., a high-vacuum pump) of the plurality of vacuum pumps to protect the first vacuum pump of a second type.

[0163] For example, the interconnection system can be controlled to open a bypass line between the first chamber connection and the first pump of the first type (e.g., by means of a valve), thereby forming the (second) fluid-conducting connection between the first chamber connection and the first vacuum pump of the first type. For example, the interconnection system can be controlled to close another valve connecting the first vacuum chamber to the first pump of the second type.

[0164] Example 49 is a method according to Example 48, wherein the method in the first operating mode comprises: if it is determined that the determined pressure is less than a predetermined value: controlling the interconnection system (e.g., an actuator thereof configured) to provide the (third) fluid-conducting connection between the first chamber port and the first vacuum pump of the second type (e.g., a backing pump) and / or to provide a second pressure (e.g., representing a high vacuum) that is less than the first pressure at the chamber port of the two chamber ports. For example, the interconnection system can be controlled to close the bypass line between the first chamber port and the first pump of the first type (e.g., by means of the valve), thereby disconnecting the (second) fluid-conducting connection.For example, the interconnection system can be controlled to open the other valve connecting the first vacuum chamber to the first pump of the second type. For example, the first pump of the second type can be fluidly coupled to a line that opens into the first pump of the first type, so that the first pump of the second type pumps toward the first pump of the first type.

[0165] Example 50 is a method according to any one of examples 46 to 49, wherein the method, in the first operating mode, further comprises: controlling the interconnection system (e.g., an actuator thereof configured) to provide a (fourth) fluid-conducting connection between the second chamber port of the plurality of chamber ports and a second vacuum pump of a second type (e.g., a high-vacuum pump) of the plurality of vacuum pumps and / or to provide a third pressure at the second chamber port. For example, the third pressure may be equal to the second pressure.

[0166] For example, a bypass line forming a (sixth) fluid-conducting connection between the second vacuum chamber and a second pump of the first type of the plurality of vacuum pumps can be closed by means of a valve. For example, another valve connecting the second vacuum chamber to the second pump of the second type can be opened (e.g., to provide the (fourth) fluid-conducting connection). For example, the second pump of the second type can be fluid-conductingly coupled to a line that opens into the second pump of the first type, so that the second pump of the second type pumps toward the second pump of the first type.

[0167] Example 51 is a method according to any one of examples 46 to 50, wherein the method in the second operating mode further comprises (ie wherein the controlling according to the second operating mode comprises): controlling the interconnection system (e.g., an actuator thereof, which is configured) to provide a fluid-conducting connection (e.g., the first fluid-conducting connection) between the first and second vacuum chambers and / or to jointly pump out the first and second vacuum chambers. For example, controlling the interconnection system can comprise: controlling the interconnection system (e.g., an actuator thereof, which is configured) to open one or more valves, by means of which the two chamber connections are fluid-conductingly connected to one another.

[0168] Example 52 is a control device comprising one or more processors configured to perform the method according to any one of Examples 46 to 51. For example, the control device may be configured to control a vacuum arrangement, e.g., a vacuum arrangement according to any one of Examples 1 to 45.

[0169] Example 53 is a computer program configured to (e.g., when executed by a processor, cause the processor to) perform the method of any one of Examples 46 to 51. For example, the computer program may be configured to control a vacuum assembly, e.g., a vacuum assembly according to any one of Examples 1 to 45.

[0170] Example 54 is a computer-readable medium storing instructions configured, when executed by a processor, to cause the processor to perform the method of any one of Examples 46 to 51. For example, the instructions may be configured to control a vacuum assembly, e.g., a vacuum assembly according to any one of Examples 1 to 45.

[0171] The following examples facilitate the implementation of the multiple operating modes. Example 55 is configured according to any one of Examples 1 to 54, wherein the multiple pumps comprise a first backing pump and a second backing pump.

[0172] Example 56 is configured according to any one of Examples 1 to 55, wherein the interconnection system comprises one or more than one manifold (e.g., two manifolds) and / or a plurality of valves by means of which the plurality of pumps are preferably coupled to one another and to the two chamber ports.

[0173] Example 57 is configured according to any one of examples 1 to 56, wherein the interconnection system is configured to provide the plurality of operating modes by means of the valves.

[0174] Example 58 is configured according to any one of Examples 1 to 57, wherein the two manifolds are coupled in parallel to each other, each manifold coupling the first backing pump and the second backing pump to each other.

[0175] Example 59 is configured according to any one of Examples 1 to 58, wherein the interconnection system comprises: at least one (ie, one or more than one) manifold and, per manifold of the at least one manifold, two valves (e.g., backing valves) into which the manifold opens (e.g., coupling them together, e.g., running from one of the valves to the other of the valves).

[0176] Example 60 is configured according to any one of Examples 1 to 59, wherein the interconnection system comprises: at least one (ie, one or more than one) manifold and, for each manifold of the at least one manifold, one bypass line per chamber port of the plurality (e.g., two) chamber ports, wherein the bypass line opens into the manifold and into the chamber port (e.g., coupling them together, e.g., running from the manifold to the chamber port) and / or comprises a valve (e.g., bypass valve).

[0177] Example 61 is configured according to any one of Examples 1 to 60, wherein the interconnection system comprises: at least one (i.e., one or more than one) manifold and, for each manifold of the at least one manifold, a valve (e.g., pump valve) associated with the manifold; wherein the plurality of pumps, e.g., per chamber port of the chamber ports, comprise one or more than one high-vacuum pump coupled to the chamber port and / or coupled to the manifold by means of the valve (e.g., pump valve) associated with the manifold.

[0178] Example 62 is configured according to any one of Examples 1 to 61, wherein the interconnection system comprises: at least one (i.e., one or more than one) manifold and, for each manifold of the at least one manifold, a valve (e.g., pump valve) associated with the manifold; wherein the chamber ports comprise: at least one chamber port, for which the plurality of pumps comprise two (e.g., connected in parallel to one another) high-vacuum pumps, each high-vacuum pump being coupled to the chamber port and coupled to the manifold by means of the valve (e.g., pump valve) associated with the manifold.

[0179] Example 63 is configured according to any one of Examples 1 to 62, wherein the plurality of pumps comprises at least one (ie, one or more than one) backing pump, wherein the interconnection system comprises: at least one (ie, one or more than one) manifold and, for each manifold of the at least one manifold, one valve (e.g., backing valve) per backing pump of the at least one backing pump, which valve couples the manifold to the backing pump (e.g., into which the manifold opens).

[0180] Example 64 is configured according to any one of Examples 1 to 63, wherein the plurality of pumps comprises at least one (i.e., one or more than one) backing pump, e.g., a first backing pump and a second backing pump, and / or wherein the plurality of pumps comprises, e.g., one high-vacuum pump per chamber connection of the chamber connections; wherein the interconnection system comprises: at least one (i.e., one or more than one) collecting line (e.g., per backing pump) and, for each collecting line of the at least one collecting line, a valve (e.g., pump valve), by means of which the high-vacuum pump is coupled to the collecting line.

[0181] Example 65 is configured according to any one of Examples 1 to 64, wherein the plurality of pumps comprises at least one (i.e., one or more than one) backing pump, e.g., a first backing pump and a second backing pump, and / or wherein the interconnection system comprises at least one (i.e., one or more than one) manifold, e.g., a first manifold and / or a second manifold; wherein preferably the first manifold is coupled (e.g., by means of a backing valve) to the first backing pump and / or (e.g., by means of a backing valve) to the second backing pump; and / or wherein preferably the second manifold is coupled (e.g., by means of a backing valve) to the first backing pump and / or (e.g., by means of a backing valve) to the second backing pump.

[0182] Example 66 is configured according to any one of Examples 1 to 65, wherein the plurality of pumps comprises at least a first pump (e.g., backing pump) and a second pump (e.g., backing pump); and / or wherein the interconnection system comprises two valves per chamber port of the two chamber ports, a first valve coupling the chamber port to the first pump and a second valve coupling the chamber port to the second pump.

[0183] Example 67 is configured according to any one of examples 1 to 66, wherein the first operating mode is configured to pump through a first of the chamber ports by means of a first pump (e.g., backing pump) and independently thereof through a second of the chamber ports by means of a second pump (e.g., backing pump), e.g., when pumping through a third of the chamber ports by means of the second pump.

[0184] Example 68 is configured according to any one of examples 1 to 67, wherein the second operating mode is configured to pump through the chamber ports together by means of the first pump (or e.g., optionally by means of the second pump), e.g., when pumping through a third of the chamber ports by means of the second pump.

Claims

Patent claims 1. Pumping system (100), comprising: • a plurality of pumps (111, 112, 121... 128) comprising a first pump (111) and a second pump (112); • several chamber connections (160) for coupling several vacuum chambers (151... 157); • a connection system which couples the plurality of pumps (111, 112, 121...128) to one another and to the two chamber connections (160) and which has two valves per chamber connection of the two chamber connections, of which a first valve couples the chamber connection to the first pump (111) and a second valve couples the chamber connection to the second pump (112); • wherein the interconnection system is configured to provide a plurality of operating modes, of which: o a first operating mode is configured to pump through a first of the chamber ports (160) by means of the first pump (111) and independently of this through a second of the chamber ports (160) by means of the second pump (112); and o a second operating mode is configured to pump through the first and second of the chamber ports (160) jointly by means of the first pump (111).

2. Pumping system (100) according to claim 1, wherein: • the first operating mode is designed to connect two of the plurality of pumps (111; 121, 122, 124, 125, 127, 128) in parallel to one another or to separate them from one another in a vacuum-tight manner, and / or • the second operating mode is designed to connect the two pumps (111, 123, 126) in series with each other.

3. Pumping system (100) according to claim 1 or 2, wherein: • the first operating mode is designed to provide two pump lines parallel to one another by means of the plurality of pumps (111, 112, 121... 128); and / or • the second operating mode is configured to provide two pump lines opening into the first pump of the plurality of pumps (111, 112, 121... 128).

4. Pumping system (100) according to claim 3, wherein of the pumping lines: • a first pump train comprises the first pump of the plurality of pumps (111, 112, 121 ... 128) and / or is connected to a first of the plurality of chamber connections (160) and • a second pump train comprises the second of the plurality of pumps (111, 112, 121...128) and / or is connected to a second of the plurality of chamber connections (160).

5. The pumping system (100) according to any one of claims 1 to 4, wherein the first operating mode is configured to pump through the second of the chamber ports (160) and through a third of the chamber ports (160) jointly by means of the second pump (112); and wherein the second operating mode is configured to pump through the first and second of the chamber ports (160) jointly by means of the first pump (111) and to pump through a third of the chamber ports (160) by means of the second pump (112).

6. Pumping system (100) according to one of claims 1 to 5, wherein the first operating mode is configured to provide a greater temporal pressure change at the first chamber port of the plurality of chamber ports (160) than at the second chamber port of the plurality of chamber ports (160).

7. Pumping system (100) according to one of claims 1 to 6, wherein the first operating mode is configured to implement a pumping sequence that provides a temporal pressure change at one of the plurality of chamber ports (160) that results in a pre-vacuum pressure at the end of a first phase of the pumping sequence and in a high vacuum pressure at the end of a second phase of the pumping sequence.

8. Pumping system (100) according to one of claims 1 to 7, • wherein the second operating mode is configured to provide a fluid-conducting connection between two of the plurality of chamber ports (160); and • wherein the first operating mode is configured to remove the fluid-conducting connection between two of the plurality of chamber connections (160) and preferably to separate the two chamber connections (160) from one another in a vacuum-tight manner.

9. Pumping system (100) according to one of claims 1 to 8, wherein each of the plurality of chamber connections (160) has a plurality of connection flanges which are coupled in parallel to one another by means of the interconnection system.

10. Pumping system (100) according to one of claims 1 to 9, • wherein the first pump (111) comprises a first backing pump (111) and the second pump (112) comprises a second backing pump (112); and / or • wherein the interconnection system comprises two manifolds (131, 132) coupled in parallel to one another, each manifold coupling the first backing pump (111) and the second backing pump (112) to one another.

11. Pumping system (100) according to claim 10, • wherein the interconnection system further comprises, for each of the chamber connections (160), at least one bypass line (133, 134) per manifold of the two manifolds (131, 132), which bypass line couples the chamber connection to the manifold, preferably in parallel to a high vacuum pump of the plurality of pumps.

12. Pumping system (100) claim 10 or 11, • wherein the plurality of pumps (111, 112, 121 ...128) comprise a high vacuum pump (123) coupled to a first chamber port of the plurality of chamber ports (160) or providing a connection flange thereof; and • wherein the first operating mode is designed to establish a fluid-conducting connection between the first backing pump (111) and the first chamber connection, preferably: o past the first high-vacuum pump (123) to provide a pre-vacuum pressure at the first chamber port, preferably during the first phase of the pumping sequence; and / or o by means of the first high-vacuum pump (123) to provide a second pressure, which is lower than the first pressure, at the first chamber port, preferably during the second phase of the pumping sequence.

13. Pumping system (100) according to one of claims 10 to 12, the interconnection system comprising: for each of the two manifolds, a first fore-vacuum valve (137a) coupling the manifold to the first pump, and a second fore-vacuum valve (137b) coupling the manifold to the second pump.

14. Pumping system (100) according to one of claims 10 to 13, • wherein the plurality of pumps (111, 112, 121 ...128) comprise a second high vacuum pump (124) coupled to a second chamber port of the plurality of chamber ports (160).

15. Pumping system (100) according to claim 14, • wherein the first operating mode is configured to: o establish a fluid-conducting connection between the second backing pump (112) and the second chamber connection, by means of the second high-vacuum pump (124) for providing a high vacuum pressure to the second chamber connection, and o preferably fluidly separate the first and second collecting lines (131, 132) from each other; and / or • wherein the second operating mode is arranged: o to fluidly couple the second backing pump (112) to the second chamber connection, preferably by means of the second high vacuum pump (124) for providing the high vacuum pressure at the second chamber connection.

16. Vacuum arrangement, comprising: • the pumping system according to one of claims 1 to 15, • several vacuum chambers, each of which is coupled to (e.g. exactly) one chamber connection of the pumping system; and • preferably a transport device for transporting a substrate through the plurality of vacuum chambers.

17. A method comprising: • Determining one of several operating modes as the selected operating mode, of which: o a first operating mode is set up to pump through a first chamber connection (160) by means of a first pump (111) and independently of this through a second chamber connection (160) by means of a second pump (112); and o a second operating mode is set up to pump through the first chamber connection (160) and the second chamber connection (160) together by means of the first pump (111); • Controlling a circuit system which couples a plurality of pumps comprising the first pump (111) and the second pump (112) to each other and to two chamber ports (160) comprising the first and second chamber ports, and which is configured to provide the plurality of operating modes according to the selected operating mode.

18. A computer program arranged, when executed by a processor, to cause the processor to perform the method according to claim 17.

19. A computer-readable medium having stored thereon instructions adapted, when executed by a processor, to cause the processor to perform the method of claim 17.

20. Control device comprising one or more processors configured to perform the method according to claim 17.

Images