Display panel, manufacturing method therefor, and display apparatus

Abstract

A display panel, the display panel comprising an array substrate and an opposite substrate, the opposite substrate and the array substrate being arranged in a paired manner; the opposite substrate comprises a black matrix and a spacer arranged on the side of the black matrix facing the array substrate; a plurality of first spacer units are provided on the side of the array substrate facing the opposite substrate, at least one first spacer unit comprising a first shading portion and a first spacer portion located on the side of the first shading portion facing the opposite substrate; in the orthographic projection to the array substrate, the black matrix covers the spacer, the first shading portion covers the first spacer portion, and the black matrix covers the first shading portion.

Description

Display panel, manufacturing method thereof and display device TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of display, and in particular to a display panel, a manufacturing method thereof and a display device. BACKGROUND

[0002] Liquid crystal display (LCD) has many advantages such as thin body, power saving, no radiation, etc., and has been widely applied, such as liquid crystal television, smart phone, digital camera, tablet computer, computer screen or notebook computer screen, etc., and dominates the flat panel display field.

[0003] SUMMARY

[0004] In one aspect, a display panel is provided, comprising: an array substrate and a counter substrate, the counter substrate is provided in a cell with the array substrate; the counter substrate comprises: a black matrix and a spacer provided on a side of the black matrix facing the array substrate; wherein a side of the array substrate facing the counter substrate is provided with a plurality of first spacer units, at least one first spacer unit comprises: a first light shielding part and a first spacer part located on a side of the first light shielding part facing the counter substrate; in the orthographic projection to the array substrate, the black matrix covers the spacer, the first light shielding part covers the first spacer part, and the black matrix covers the first light shielding part.

[0005] In some embodiments, along a first direction, the first spacer unit comprises: a plurality of first dielectric layers and a plurality of second dielectric layers arranged alternately; the first direction is parallel to the direction in which the array substrate and the counter substrate are provided in a cell; the refractive index of the first dielectric layer is greater than the refractive index of the second dielectric layer.

[0006] In some embodiments, the sum of the number of layers of the first dielectric layer and the number of layers of the second dielectric layer ranges from 27 to 40.

[0007] In some embodiments, in the first direction, the ratio of the size of the first spacer part to the size of the first light shielding part ranges from 1 / 4 to 4.

[0008] In some embodiments, the size of the first dielectric layer in the first direction ranges from 10 nm to 100 nm; the size of the second dielectric layer in the first direction ranges from 10 nm to 300 nm.

[0009] In some embodiments, the refractive index of the first dielectric layer ranges from 1.7 to 2.2; the refractive index of the second dielectric layer ranges from 1.1 to 1.5.

[0010] In some embodiments, in a projection onto the array substrate, a boundary of the first spacer pad portion and a boundary of the first light-blocking portion have a first interval; a size of the first spacer pad portion in the first direction is substantially equal to the first interval.

[0011] In some embodiments, the first spacer pad unit further comprises a first fixing portion surrounding the first spacer pad portion and in contact with the first spacer pad portion and the first light-blocking portion.

[0012] In some embodiments, the first fixing portion comprises a first sub-fixing portion in contact with the first spacer pad portion and a second sub-fixing portion in contact with the first light-blocking portion; a ratio of a size of the first sub-fixing portion to a size of the first spacer pad portion in the first direction ranges from 0.5 to 0.8; and / or in a projection onto the array substrate, a distance between the second sub-fixing portion and a boundary of the first spacer pad portion is substantially equal to a distance between the second sub-fixing portion and a boundary of the first light-blocking portion.

[0013] In some embodiments, a material of the first light-blocking portion comprises a first type of metal; a material of the second fixing portion comprises a second type of metal; the first type of metal and the second type of metal are different.

[0014] In some embodiments, a planarization layer is disposed between the black matrix and the spacer; a side of the planarization layer away from the black matrix is provided with a plurality of second spacer pad units, each of the plurality of second spacer pad units comprising a second light-blocking portion and a spacer located on a side of the second light-blocking portion away from the planarization layer.

[0015] In some embodiments, the second spacer pad unit further comprises a second fixing portion surrounding the spacer and in contact with the spacer and the second light-blocking portion.

[0016] In some embodiments, in a projection onto the opposite substrate, the second fixing portion substantially coincides with a boundary of the second light-blocking portion away from a boundary of the spacer.

[0017] In some embodiments, a ratio of a size of the second fixing portion in the first direction to a size of the spacer in the first direction ranges from 0.05 to 0.1.

[0018] In some embodiments, the second fixing portion and the spacer are in an integral structure.

[0019] In another aspect, a method for manufacturing a display panel is provided. The method includes: forming a counter substrate; the counter substrate includes: a black matrix and a spacer disposed on a side of the black matrix; forming an array substrate; forming a plurality of first spacer units on a side of the array substrate; each of the plurality of first spacer units includes: a first light shielding portion and a first spacer portion disposed on a side of the first light shielding portion; and aligning the counter substrate and the array substrate, and the side of the counter substrate provided with the spacer faces the side of the array substrate provided with the first spacer portion; wherein in the orthographic projection onto the array substrate, the black matrix covers the spacer, the first light shielding portion covers the first spacer portion, and the black matrix covers the first light shielding portion.

[0020] In some embodiments, the forming a plurality of first spacer units on a side of the array substrate includes: forming an initial first spacer unit on a side of the array substrate; wherein the initial first spacer unit includes an initial first light shielding layer and an initial first spacer layer which are sequentially stacked; the initial first spacer layer is disposed on a side of the initial first light shielding layer away from the array substrate; forming a plurality of first mask patterns on a side of the initial first spacer unit away from the array substrate; etching the initial first light shielding layer and the initial first spacer layer based on the plurality of first mask patterns to form a plurality of first light shielding portions and a plurality of sub-initial first spacer layers; removing part of the first mask patterns to form a second mask pattern, the second mask pattern exposes a surrounding area of the sub-initial first spacer layer; etching the sub-initial first spacer layer based on the second mask pattern to form a first spacer portion; forming a first fixing portion, the first fixing portion surrounds the first spacer portion and is in contact with the first spacer portion and the first light shielding portion, to form a first spacer unit.

[0021] In some embodiments, the forming the plurality of first spacer units on one side of the array substrate comprises: forming initial first spacer units on one side of the array substrate, the initial first spacer units comprising a plurality of initial first dielectric layers and a plurality of initial second dielectric layers arranged alternately; wherein a refractive index of the initial first dielectric layers is greater than a refractive index of the initial second dielectric layers; forming a plurality of first mask patterns on a side of the initial first spacer units away from the array substrate; etching the plurality of initial first dielectric layers and the plurality of initial second dielectric layers based on the plurality of first mask patterns to form a plurality of intermediate first dielectric layers and a plurality of intermediate second dielectric layers; the plurality of intermediate first dielectric layers and the plurality of intermediate second dielectric layers comprising: a first preset film layer and a second preset film layer, the first preset film layer and the second preset film layer each comprising at least one intermediate first dielectric layer and at least one intermediate second dielectric layer, and the first preset film layer being closer to the array substrate than the second preset film layer; removing part of the first mask patterns to form second mask patterns, the second mask patterns exposing a surrounding area of the second preset film layer; etching the second preset film layer based on the plurality of second mask patterns to form the first spacer portions; the first preset film layer forming the first light-shielding portions to form first spacer units.

[0022] In some embodiments, a planarization layer is arranged between the black matrix and the spacers; a plurality of second spacer units are arranged on a side of the planarization layer away from the black matrix, each of the plurality of second spacer units comprising: a second light-shielding portion and a spacer located on a side of the second light-shielding portion away from the planarization layer.

[0023] The forming the second spacer units comprises: forming initial second spacer units on a side of the planarization layer away from the black matrix; wherein the initial second spacer units comprise an initial second light-shielding layer and an initial second spacer layer arranged in sequence; the initial second spacer layer is arranged on a side of the initial second light-shielding layer away from the planarization layer; forming a plurality of first mask patterns on a side of the initial second spacer units away from the planarization layer; etching the initial second light-shielding layer and the initial second spacer layer based on the plurality of first mask patterns to form a plurality of second light-shielding portions and a plurality of sub-initial second spacer layers; removing part of the first mask patterns to form second mask patterns, the second mask patterns exposing a surrounding area of the sub-initial second spacer layers; etching the sub-initial second spacer layers based on the second mask patterns to form spacers and simultaneously form second fixing portions; the second fixing portions surround the spacers and are in contact with the spacers and the second light-shielding portions to form second spacer units.

[0024] In yet another aspect, a display device is provided. The display device comprises the display panel according to any one of the above embodiments. BRIEF DESCRIPTION OF DRAWINGS

[0025] In order to more clearly illustrate the technical solutions in the present disclosure, the following will briefly introduce the drawings needed to be used in some embodiments of the present disclosure. Obviously, the drawings in the following description are only some drawings of the embodiments of the present disclosure, and other drawings can also be obtained by those skilled in the art according to these drawings. In addition, the drawings in the following description can be regarded as schematic diagrams, and are not limited to the actual size, actual process, actual timing of signals, etc. of the products involved in the embodiments of the present disclosure.

[0026] FIG. 1 is a structural diagram of a display device according to some embodiments of the present disclosure;

[0027] FIG. 2 is another structural diagram of a display device according to some embodiments of the present disclosure;

[0028] FIG. 3 is a structural diagram of a display panel according to some embodiments of the present disclosure;

[0029] FIG. 4 is a sectional view of the display panel provided in FIG. 3 along a sectional line CC;

[0030] FIG. 5 is another sectional view of the display panel provided in FIG. 3 along the sectional line CC;

[0031] FIG. 6 is a structural diagram of a first spacer-pixel unit according to some embodiments of the present disclosure;

[0032] FIG. 7 is a sectional view of the first spacer-pixel unit provided in FIG. 6 along a sectional line DD;

[0033] FIG. 8 is an enlarged view of E of the first spacer-pixel unit provided in FIG. 7;

[0034] FIG. 9 is a spectral diagram of the relationship between the number of layers of a medium layer and the reflectivity of the medium layer according to some embodiments of the present disclosure;

[0035] FIG. 10 is a flowchart of a preparation method of a display panel according to some embodiments of the present disclosure;

[0036] FIG. 11 is a flowchart of a preparation method of a first spacer-pixel unit according to some embodiments of the present disclosure;

[0037] FIG. 12 is a structural diagram corresponding to each step of the preparation method of the first spacer-pixel unit according to some embodiments of the present disclosure;

[0038] FIG. 13 is another structural diagram of a first spacer-pixel unit according to some embodiments of the present disclosure;

[0039] FIG. 14 is a sectional view of the first spacer-pixel unit provided in FIG. 13 along a sectional line FF;

[0040] FIG. 15 is another flow chart of a method of manufacturing a first spacer pad unit according to some embodiments of the present disclosure;

[0041] FIG. 16 is another structural diagram corresponding to each step of a method of manufacturing a first spacer pad unit according to some embodiments of the present disclosure;

[0042] FIG. 17 is a structural diagram of an opposing substrate according to some embodiments of the present disclosure;

[0043] FIG. 18 is another cross-sectional view of the display panel provided in FIG. 3 along the cross-sectional line CC;

[0044] FIG. 19 is a structural diagram of a second spacer pad unit according to some embodiments of the present disclosure;

[0045] FIG. 20 is another structural diagram of a second spacer pad unit according to some embodiments of the present disclosure;

[0046] FIG. 21 is a flow chart of a method of manufacturing a second spacer pad unit according to some embodiments of the present disclosure;

[0047] FIG. 22 is a structural diagram corresponding to each step of a method of manufacturing a second spacer pad unit according to some embodiments of the present disclosure. DETAILED DESCRIPTION

[0048] The technical solutions in some embodiments of the present disclosure will be described clearly and completely below with reference to the drawings. Obviously, the described embodiments are only some of the embodiments of the present disclosure, but not all the embodiments. Based on the embodiments provided in the present disclosure, all other embodiments obtained by a person of ordinary skill in the art belong to the scope of protection of the present disclosure.

[0049] Unless the context clearly requires otherwise, throughout the description and the claims, the term "comprise," and variations thereof (e.g., "comprises" and "comprising"), will be construed to be inclusive in a manner consistent with the term's plain meaning, namely, "including but not limited to." In describing the description, the terms "one embodiment," "some embodiments," "exemplary embodiments," "example," "specific example" or "some examples," and the like, mean that a particular feature, structure, material, or characteristic is included in at least one embodiment or example of the disclosure, but that it can not be included in other embodiments or examples. The illustrative appearance of the foregoing terms in various places in the description are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics can be combined in any suitable manner in one or more embodiments or examples.

[0050] Hereinafter, the terms "first", "second", etc. are used only for the purpose of description and should not be construed as indicating or implying relative importance or implying the number of the technical features indicated. Thus, the features defined with "first", "second" can explicitly or implicitly include one or more of the features. In the description of the embodiments of the disclosure, the meaning of "a plurality of" is two or more, unless otherwise specified.

[0051] In describing some embodiments, "coupled" and "connected," and variations thereof, can be used. The term "connected" should be interpreted broadly, for example, "connected" can be fixedly connected, or detachably connected, or integrated; can be directly connected, or indirectly connected through an intermediate medium. The term "coupled" indicates, for example, that two or more components have direct physical contact or electrical contact. The term "coupled" or "communicatively coupled" can also mean that two or more components do not have direct contact with each other, but still cooperate or interact with each other. The embodiments disclosed herein are not necessarily limited to the content herein.

[0052] "A, B, and C at least one of" has the same meaning as "at least one of A, B, or C", and includes the following combinations of A, B, and C: only A, only B, only C, a combination of A and B, a combination of A and C, a combination of B and C, and a combination of A, B, and C.

[0053] "A and / or B" includes the following three combinations: only A, only B, and a combination of A and B.

[0054] As used herein, "about," "approximately," or "around" includes the recited value and the average value within an acceptable range of deviation from the particular value, as determined by one of ordinary skill in the art considering the measurement at issue and the error in measurement associated with the particular quantity being measured (i.e., the limitations of the measurement system).

[0055] As used herein, "parallel," "perpendicular," and "equal" include the recited condition and conditions that approximate the recited condition, the approximation being within an acceptable range of deviation, as determined by one of ordinary skill in the art considering the measurement at issue and the error in measurement associated with the particular quantity being measured (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallel and near parallel, where near parallel can have an acceptable range of deviation of, for example, within 5°; "perpendicular" includes absolute perpendicular and near perpendicular, where near perpendicular can also have an acceptable range of deviation of, for example, within 5°. "Equal" includes absolute equality and near equality, where near equality can have an acceptable range of deviation of, for example, a difference between the two that is less than or equal to 5% of either.

[0056] It will be understood that when a layer or element is referred to as being "on" another layer or substrate, it can be directly on the other layer or substrate, or intervening layers can also be present.

[0057] Exemplary embodiments are described herein with reference to cross-sectional and / or plan view illustrations that are idealized examples of exemplary embodiments. In the drawings, the thickness of layers and regions are exaggerated for clarity. Accordingly, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and / or tolerances, are to be expected. Thus, the exemplary embodiments should not be construed as limited to the particular shapes of regions as illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, an etched region illustrated as a rectangle will typically have rounded or curved features. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region of a device and are not intended to limit the scope of the exemplary embodiments.

[0058] In some embodiments, as shown in FIG. 1, some embodiments of the present disclosure provide a display device 1000, which can be any device that displays whether in motion (e.g., video) or stationary (e.g., still images) and whether text, graphics, or images. More specifically, it is contemplated that the embodiments can be implemented in or in association with a variety of electronic devices such as, but not limited to, mobile telephones (e.g., cell phones), wireless devices, personal data assistants (PDAs), handheld or portable computers, GPS receivers / navigators, cameras, MP4 players, camcorders, game consoles, watches, clocks, calculators, television monitors, flat-panel displays, computer monitors, auto displays (e.g., odometer display, etc.), cockpit controls and / or displays, display of camera views (e.g., display of a rear view camera in a vehicle), electronic photographs, electronic billboards or signs, projectors, architectural structures, packaging, and aesthetic structures (e.g., display of images on a piece of jewelry) and the like. FIG. 1 illustrates the display device 1000 as a mobile telephone for purposes of example only.

[0059] For example, the display device 1000 can be a liquid crystal display (LCD). As shown in FIG. 2, the display device 1000 includes a display panel 100, a backlight 200, a housing 300, and a cover plate 310. The display panel 100 and the backlight 200 are disposed in the housing 300. The display panel 100 has an emission side E at which a display image can be viewed and a non-emission side opposite the emission side E. The backlight 200 is located at the non-emission side of the display panel 100 and is configured to provide a light source for the display panel 100. The cover plate 310 is located at the emission side E of the display panel 100 and is configured to protect the display panel 100.

[0060] As shown in FIGS. 3 and 4, FIG. 4 is a cross-sectional view of the display panel 100 along a cross-sectional line CC shown in FIG. 3. The display panel 100 includes a display area AA and a peripheral area BB located at at least one side of the display area AA. The display area AA is configured to have a plurality of pixels and a plurality of signal lines. The plurality of signal lines are electrically connected to the plurality of pixels. For example, each pixel includes a plurality of sub-pixels P of at least three colors, such as a first color sub-pixel, a second color sub-pixel, and a third color sub-pixel. The first color, the second color, and the third color are three primary colors (e.g., red, green, and blue).

[0061] As shown in FIG. 4, the display panel 100 includes an array substrate 10, an opposite substrate 20, and a liquid crystal layer 30 disposed between the array substrate 10 and the opposite substrate 20. The array substrate 10 and the opposite substrate 20 are sealed together by a sealant 31, thereby defining the liquid crystal layer 30 in a liquid crystal cell surrounded by the array substrate 10, the opposite substrate 20, and the sealant 31.

[0062] The array substrate 10 includes, for example, a first substrate 11 and a transistor layer 12 on a side of the first substrate 11 facing the counter substrate 20, the transistor layer 12 forming a plurality of transistors. Light emitted by the backlight 200 can pass through the array substrate 10 and irradiate the liquid crystal layer 30. The liquid crystal layer 30 includes liquid crystal molecules, and the deflection angle of the liquid crystal molecules is controlled by the plurality of transistors, which can control the intensity of light irradiating the counter substrate 20 through the liquid crystal layer 30, so that the display panel 100 can realize the display function.

[0063] The counter substrate 20 includes, for example, a second substrate 21 and a black matrix 22 on a side of the second substrate 21 facing the array substrate 10, and a color filter layer 23 defined by the black matrix 22. The color filter layer 23 includes, for example, a red filter, a green filter, and a blue filter, and is configured to filter light entering the color filter layer 23 to allow three primary color light used for color display to pass through, thereby realizing full-color display. The black matrix 22 is arranged between different color filters to separate the different color filters and prevent color mixing between the different color filters, thereby affecting the display effect.

[0064] The counter substrate 20 further includes, for example, a planarization layer 25 on a side of the black matrix 22 and the color filter layer 23 away from the second substrate 21, and a spacer 26 on a side of the planarization layer 25 away from the second substrate 21, the spacer 26 being configured to maintain the thickness of the liquid crystal layer 30. In the orthographic projection onto the array substrate 10, the black matrix 22 covers the spacer 26.

[0065] The first alignment layer 13 is arranged on a side of the transistor layer 12 of the array substrate 10 facing the counter substrate 20, and the second alignment layer 27 is arranged on a surface of the counter substrate 20 facing the array substrate 10, the first alignment layer 13 and the second alignment layer 27 being configured to give the liquid crystal molecules an initial direction. The first alignment layer 13 and the second alignment layer 27 are both made of, for example, polyimide.

[0066] The liquid crystal layer 30 is arranged on a side of the planarization layer 25 away from the second substrate 21, and the planar surface of the planarization layer 25 is conducive to the arrangement of the liquid crystal molecules at a predetermined angle. The surface of the counter substrate 20 is not flat due to the presence of the spacer 26, and the second alignment layer 27 covers the spacer 26, so that there is a problem of poor alignment of the liquid crystal around the spacer 26. The black matrix 22 covers the spacer 26 in the orthographic projection onto the array substrate 10, so that the black matrix 22 can block the light with poor alignment, thereby improving the display quality of the display panel 100.

[0067] In addition, in the process of assembling the array substrate 10 and the opposite substrate 20, since the opposite substrate 20 needs to be pressed, the pressing of the opposite substrate 20 can cause the deformation of the spacers 26, which can cause the dislocation of the spacers 26 and scratch the first alignment layer 13 around the spacers 26, and can also cause the poor alignment of the liquid crystal molecules.

[0068] It should be noted that the first alignment layer 13 around the spacers 26 can be understood as the first alignment layer 13 surrounding the spacers 26 in the orthographic projection to the array substrate 10.

[0069] In order to solve the light leakage caused by the poor alignment of the liquid crystal molecules around the spacers 26 due to the scratch of the first alignment layer 13 around the spacers 26, the width of the black matrix 22 needs to be increased, and the increase of the width of the black matrix 22 can reduce the aperture ratio of the display panel 100.

[0070] Based on this, in some embodiments, as shown in FIG. 5, the display panel 100 further includes a plurality of first spacer units 40, the plurality of first spacer units 40 are located on the side of the array substrate 10 facing the opposite substrate 20, and at least one first spacer unit 40 includes a first light shielding part 41 and a first spacer part 42 located on the side of the first light shielding part 41 away from the array substrate 10.

[0071] For example, the first light shielding part 41 is located on the side of the transistor layer 12 away from the first substrate 11, the first spacer part 42 is located on the side of the first light shielding part 41 away from the first substrate 11, and the first alignment layer 13 is located on the side of the first spacer part 42 away from the first substrate 11.

[0072] By arranging the first spacer part 42, in the process of assembling the array substrate 10 and the opposite substrate 20, the spacers 26 are assembled on the side of the first spacer part 42 away from the first substrate 11, and when the pressing of the opposite substrate 20 causes the deformation of the spacers 26, the spacers 26 will not touch the array substrate 10, so as not to scratch the first alignment layer 13 around the spacers 26, and the problem of the poor alignment of the liquid crystal molecules caused by the scratch of the first alignment layer 13 can be solved.

[0073] In addition, in the process of pressing the opposite substrate 20, if the deformation of the spacers 26 causes the dislocation of the spacers 26, not only the first alignment layer 13 around the spacers 26 will be scratched, but also the transistor layer 12 can be damaged. By arranging the first spacer unit 40, the spacers 26 will not cause the damage of the transistor layer 12, so as to ensure the good performance of the transistor.

[0074] In some examples, as shown in FIGS. 5 and 6, in the orthographic projection to the array substrate 10, the first light shielding part 41 covers the first spacer part 42, and the black matrix 22 covers the first light shielding part 41.

[0075] As shown in FIGS. 6 and 7, the size d1 of the first light shielding portion 41 in the second direction X is greater than the size d2 of the first spacer portion 42 in the second direction X, i.e., d1>d2. The size d1 of the first light shielding portion 41 in the second direction X is less than the size d3 of the black matrix 22 in the second direction X, i.e., d1<d3. Here, the second direction X is a direction parallel to the plane in which the surface of the array substrate 10 away from the first spacer unit 40 (i.e., the lower surface of the array substrate 10 in the figure) lies.

[0076] Because the presence of the first spacer portion 42 makes the surface on which the liquid crystal layer 30 is disposed uneven, there is a problem of poor alignment of liquid crystals around the first spacer portion 42. Moreover, in the process of assembling the array substrate 10 and the counter substrate 20, when there is a problem of the spacer 26 scratching the first alignment layer 13 and the second alignment layer 27, it will further cause poor alignment of liquid crystal molecules around the first spacer portion 42 and cause light leakage. By disposing the first light shielding portion 41 to cover the first spacer portion 42 in the orthographic projection onto the array substrate 10, the first light shielding portion 41 can shield the light around the first spacer portion 42, effectively solving the problem of light leakage caused by poor alignment of liquid crystals around the first spacer portion 42. In this way, it is not necessary to further increase the width of the black matrix 22 to shield this part of light leakage, thereby effectively ensuring the aperture ratio of the display panel 100.

[0077] Because the size d1 of the first light shielding portion 41 in the second direction X is less than the size d3 of the black matrix 22 in the second direction X, the disposition of the first light shielding portion 41 will not affect the aperture ratio of the display panel 100. Therefore, by disposing the first spacer unit 40, the problem of light leakage caused by poor alignment of liquid crystal molecules can be effectively solved, and it is not necessary to increase the width of the black matrix 22, thereby effectively ensuring the aperture ratio of the display panel 100.

[0078] In some embodiments, as shown in FIG. 5, in the process of assembling the array substrate 10 and the counter substrate 20, because the intermolecular bonding force between the first spacer portion 42 and the first light shielding portion 41 is weak, the adhesion between the first spacer portion 42 and the first light shielding portion 41 is insufficient, and there is a problem of peeling of the first spacer portion 42. Moreover, in the process of preparing the display panel 100, after the first spacer portion 42 is formed, a cleaning process is further included, which is used to remove impurities such as particles on the display panel 100 and keep the display panel 100 clean. In this cleaning process, because the size of the first spacer portion 42 is small and the adhesion between the first spacer portion 42 and the first light shielding portion 41 is insufficient, there is a risk of washing off the first spacer portion 42.

[0079] Based on this, in some embodiments, as shown in FIG. 8, which is a partial enlarged view of E in FIG. 7, along the first direction Y, the first spacer unit 40 comprises: a plurality of first medium layers 40a and a plurality of second medium layers 40b arranged alternately; the refractive index of the first medium layer 40a is greater than the refractive index of the second medium layer 40b. The first direction Y is parallel to the direction in which the array substrate 10 and the opposite substrate 20 are arranged in pairs, that is, the thickness direction of the display panel 100.

[0080] It can be understood that the first direction Y and the second direction X intersect, for example, the first direction Y and the second direction X are perpendicular to each other.

[0081] For example, as shown in FIG. 8, along the first direction Y, one second medium layer 40b is arranged between every two adjacent first medium layers 40a, and one first medium layer 40a is arranged between every two adjacent second medium layers 40b, the refractive index of the first medium layer 40a is greater than the refractive index of the second medium layer 40b. That is, the first spacer unit 40 is formed by stacking medium layers with refractive indexes of “high-low-high-low…”.

[0082] For example, the first spacer unit 40 can also be formed by stacking medium layers with refractive indexes of “low-high-low-high…”.

[0083] It can be understood that, along the first direction Y, the first light shielding part 41 comprises: a plurality of first medium layers 40a and a plurality of second medium layers 40b arranged alternately, and the first spacer part 42 comprises: a plurality of first medium layers 40a and a plurality of second medium layers 40b arranged alternately.

[0084] By arranging the first spacer unit 40 to comprise a plurality of first medium layers 40a and a plurality of second medium layers 40b arranged alternately, the first medium layer 40a and the second medium layer 40b are both inorganic films, and the intermolecular force between the inorganic films in contact is strong. Therefore, at the junction of the first light shielding part 41 and the first spacer part 42, the first light shielding part 41 and the first spacer part 42 have strong intermolecular forces between them, which can improve the adhesion between the first light shielding part 41 and the first spacer part 42, effectively solving the problem of peeling of the first spacer part 42.

[0085] In some embodiments, as shown in FIG. 7 and FIG. 8, the sum of the number of layers of the first medium layer 40a and the number of layers of the second medium layer 40b ranges from 27 to 40.

[0086] For example, the sum of the number of layers of the first medium layer 40a and the number of layers of the second medium layer 40b is 27, 29, 32, 35, 36, 37, 39 or 40, etc., which is not limited here.

[0087] To further illustrate the relationship between the sum of the different layers of the first dielectric layer 40a and the second dielectric layer 40b and the reflectivity in the wavelength range of 380nm-780nm, the following examples 1-5 are provided.

[0088] Example 1, the total thickness of the first dielectric layer 40a and the second dielectric layer 40b ranges from 2000nm to 2200nm, taking 27 layers as an example, the thickness of a single layer of the first dielectric layer 40a ranges from 40nm to 85nm, and the thickness of a single layer of the second dielectric layer 40b ranges from 75nm to 140nm.

[0089] Example 2, the total thickness of the first dielectric layer 40a and the second dielectric layer 40b ranges from 1800nm to 2000nm, taking 25 layers as an example, the thickness of a single layer of the first dielectric layer 40a ranges from 40nm to 85nm, and the thickness of a single layer of the second dielectric layer 40b ranges from 75nm to 140nm.

[0090] Example 3, the total thickness of the first dielectric layer 40a and the second dielectric layer 40b ranges from 1500nm to 1800nm, taking 21 layers as an example, the thickness of a single layer of the first dielectric layer 40a ranges from 40nm to 85nm, and the thickness of a single layer of the second dielectric layer 40b ranges from 75nm to 140nm.

[0091] Example 4, the total thickness of the first dielectric layer 40a and the second dielectric layer 40b ranges from 1300nm to 1500nm, taking 17 layers as an example, the thickness of a single layer of the first dielectric layer 40a ranges from 40nm to 85nm, and the thickness of a single layer of the second dielectric layer 40b ranges from 75nm to 140nm.

[0092] Example 5, the total thickness of the first dielectric layer 40a and the second dielectric layer 40b ranges from 900nm to 1300nm, taking 13 layers as an example, the thickness of a single layer of the first dielectric layer 40a ranges from 40nm to 85nm, and the thickness of a single layer of the second dielectric layer 40b ranges from 75nm to 140nm.

[0093] As shown in FIG. 9, FIG. 9 is a spectrum diagram of the relationship between the number of layers of the medium layer and the reflectivity of the medium layer, wherein the medium layer represents the first medium layer 40a and the second medium layer 40b. As can be seen from FIG. 9, when the number of layers of the medium layer reaches 27, the reflectivity of the medium layer in the wavelength range of 380nm-780nm can reach 100%, and when the number of layers of the medium layer is less than 27, the reflectivity of the medium layer is less than 100%. When the reflectivity of the medium layer reaches 100%, the medium layer has the effect of light shielding and can be used to form the first spacer 40. By setting the sum of the number of layers of the first medium layer 40a and the number of layers of the second medium layer 40b to be in the range of 27-40, the first spacer 40 formed has a better light shielding effect. At the same time, the problem of warping of the medium layer due to stress can be avoided when the number of layers of the medium layer is too large, for example, more than 40 layers.

[0094] In some examples, as shown in FIG. 7, in the first direction Y, the ratio of the size d4 of the first spacer portion 42 to the size d5 of the first light shielding portion 41 is in the range of 1 / 4-4.

[0095] For example, in the first direction Y, the ratio of the size d4 of the first spacer portion 42 to the size d5 of the first light shielding portion 41 is 1 / 4, 2 / 4, 3 / 4, 1, 2, 3, or 4, etc., which is not limited here.

[0096] By setting the ratio of the size d4 of the first spacer portion 42 to the size d5 of the first light shielding portion 41 in the range of 1 / 4-4, the support function of the first spacer portion 42 and the better light shielding effect of the first light shielding portion 41 can be achieved.

[0097] In some examples, as shown in FIG. 8, the size d6 of the first medium layer 40a in the first direction Y is in the range of 10nm-100nm; and the size d7 of the second medium layer 40b in the first direction Y is in the range of 10nm-300nm.

[0098] For example, the size d6 of the first medium layer 40a in the first direction Y is 10nm, 20nm, 30nm, 40nm, 50nm, 60nm, 70nm, 80nm, 90nm, or 100nm, etc., which is not limited here. The size d7 of the second medium layer 40b in the first direction Y is 10nm, 30nm, 60nm, 100nm, 120nm, 140nm, 160nm, 200nm, 230nm, or 300nm, etc., which is not limited here.

[0099] For example, the total size of the first medium layer 40a and the second medium layer 40b in the first direction Y is 1.5μm-3.2μm. The total size of the first medium layer 40a and the second medium layer 40b in the first direction Y refers to the total thickness of the first medium layer 40a and the second medium layer 40b.

[0100] By setting the size d6 of the first dielectric layer 40a in the first direction Y to be in the range of 10 nm to 100 nm and the size d7 of the second dielectric layer 40b in the first direction Y to be in the range of 10 nm to 300 nm, the first dielectric layer 40a and the second dielectric layer 40b are made into dielectric layers with a reflectivity of 100% based on the principle of thin film interference. Thin film interference is an optical phenomenon referring to the reflection and refraction of light in a thin film. When light passes through a thin film, reflection and transmission occur, causing different wavelengths of light to interfere with each other. By arranging the plurality of first dielectric layers 40a and the plurality of second dielectric layers 40b, total reflection of light occurs, forming a dielectric layer with a reflectivity of 100%.

[0101] In some examples, as shown in FIG. 8, the refractive index of the first dielectric layer 40a is in the range of 1.7 to 2.2, and the refractive index of the second dielectric layer 40b is in the range of 1.1 to 1.5.

[0102] For example, the refractive index of the first dielectric layer 40a is 1.7, 1.8, 1.9, 2.0, 2.1, or 2.2, without limitation. The refractive index of the second dielectric layer 40b is 1.1, 1.2, 1.3, 1.4, or 1.5, without limitation.

[0103] For example, the material of the first dielectric layer 40a is selected from at least one of Nb2O5, SiN, TiO2, ZnS, and Ta2O5. The refractive index of ZnS is 2.4, the refractive index of Nb2O5 is 2.3, the refractive index of Ta2O5 is 2.1, the refractive index of TiO2 is 2.35, and the refractive index of SiN is 1.8.

[0104] For example, the material of the second dielectric layer 40b is selected from at least one of SiO2, MgF2, AlF3, LiF, and Al2O3. The refractive index of MgF2 is 1.38, the refractive index of SiO2 is 1.46, the refractive index of AlF3 is 1.35, and the refractive index of Al2O3 is 1.63.

[0105] For example, the material of the first dielectric layer 40a and the material of the second dielectric layer 40b are selected from resin materials with different refractive indexes.

[0106] The first dielectric layer 40a with a refractive index in the range of 1.7 to 2.2 is formed by at least one of Nb2O5, SiN, TiO2, ZnS, and Ta2O5, and the second dielectric layer 40b with a refractive index in the range of 1.1 to 1.5 is formed by at least one of SiO2, MgF2, AlF3, LiF, and Al2O3, to form the first dielectric spacer unit 40 with strong adhesion between the first light-blocking portion 41 and the first dielectric spacer portion 42.

[0107] In some examples, as shown in FIGS. 6 and 7, in the orthographic projection toward the array substrate 10, the boundary M1 of the first spacer portion 42 and the boundary M2 of the first light shielding portion 41 have a first interval d8; the size d4 of the first spacer portion 42 in the first direction Y is substantially equal to the first interval d8, i.e., d4≈d8.

[0108] For example, as shown in FIG. 7, the size d4 of the first spacer portion 42 in the first direction Y is the height of the first spacer portion 42. That is, the ratio of the height of the first spacer portion 42 to the width of the portion of the first light shielding portion 41 beyond the first spacer portion 42 is substantially equal.

[0109] By setting the size d4 of the first spacer portion 42 in the first direction Y to be substantially equal to the first interval d8, the first light shielding portion 41 has a better light shielding effect on the liquid crystal molecules around the first spacer portion 42 that are oriented poorly, effectively solving the problem of the poor display quality of the display panel 100 caused by the poor orientation of the liquid crystal molecules at the edge of the first spacer portion 42. Moreover, as shown in FIGS. 5 and 7, in the case where the first light shielding portion 41 has a better light shielding effect, the size d1 of the first light shielding portion 41 in the second direction X is ensured to be smaller than the size d3 of the black matrix 22 in the second direction X, i.e., d1<d3, so that the arrangement of the first light shielding portion 41 does not affect the light extraction efficiency of the display panel 100.

[0110] The following illustrates a method for manufacturing a display panel, as shown in FIGS. 5 and 8, the array substrate 10 of the display panel 100 is provided with a first spacer unit 40 on the side facing the opposite substrate 20, and the first spacer unit 40 includes a plurality of first dielectric layers 40a and a plurality of second dielectric layers 40b arranged alternately.

[0111] In some embodiments, as shown in FIG. 10, the method for manufacturing a display panel includes steps S1-S4.

[0112] S1, as shown in FIG. 5, the opposite substrate 20 is formed, and the opposite substrate 20 includes a black matrix 22 and a spacer 26 arranged on one side of the black matrix 22.

[0113] For example, as shown in FIG. 5, the opposite substrate 20 includes a second substrate 21 and a black matrix 22 on the side of the second substrate 21 facing the array substrate 10, and a plurality of color filter layers 23 defined by the black matrix 22. The opposite substrate 20 further includes a planarization layer 25 and a spacer 26, and the planarization layer 25 is on the side of the black matrix 22 and the color filter layers 23 away from the second substrate 21. For the structure of the opposite substrate 20, refer to the above description, which will not be repeated here.

[0114] S2, as shown in FIG. 5, the array substrate 10 is formed.

[0115] Exemplarily, as shown in FIG. 5, the array substrate 10 comprises: a first substrate 11 and a transistor layer 12 located on the side of the first substrate 11 facing the opposite substrate 20, the transistor layer 12 forms a plurality of transistors.

[0116] S3, as shown in FIG. 11 and FIG. 12, a plurality of first spacer units 40 are formed on one side of the array substrate 10; each of the plurality of first spacer units 40 comprises: a first light shielding part 41 and a first spacer part 42 located on one side of the first light shielding part 41.

[0117] In some examples, as shown in FIG. 11 and FIG. 12, forming a plurality of first spacer units 40 on one side of the array substrate 10 comprises steps: S31-S35.

[0118] S31: forming an initial first spacer unit 400 on one side of the array substrate 10, the initial first spacer unit 400 comprises a plurality of initial first dielectric layers 4a and a plurality of initial second dielectric layers 4b arranged alternately, wherein the refractive index of the initial first dielectric layer 4a is greater than the refractive index of the initial second dielectric layer 4b.

[0119] Exemplarily, the part of the plurality of initial first dielectric layers 4a and the plurality of initial second dielectric layers 4b arranged alternately close to the array substrate 10 is defined as an initial first light shielding layer 410, and the remaining part is defined as an initial first spacer layer 420. The initial first light shielding layer 410 comprises at least one first dielectric layer 4a and at least one initial second dielectric layer 4b. The initial first spacer layer 420 comprises at least one first dielectric layer 4a and at least one initial second dielectric layer 4b.

[0120] Exemplarily, the initial first dielectric layer 4a and the initial second dielectric layer 4b are formed by electron beam evaporation or magnetron sputtering.

[0121] Then, a mask layer 51 is formed on one side of the initial first spacer unit 400 by using a deposition process. For example, the mask layer 51 is a hard mask layer, and the material of the hard mask layer comprises indium tin oxide.

[0122] After that, a photoresist layer 52 is formed on the side of the mask layer 51 away from the array substrate 10. For example, the photoresist layer 52 is formed by using a coating process.

[0123] S32, a plurality of first mask patterns 511 are formed on the side of the initial first spacer unit 400 away from the array substrate 10.

[0124] Exemplarily, in the orthographic projection to the array substrate 10, the first mask pattern 511 can be circular, square or elliptical. The first mask pattern 511 is related to the shape of the pre-formed first light shielding part 41, and the first light shielding part 41 is formed based on the first mask pattern 511.

[0125] For example, the first mask pattern 511 has a first light shielding width H1. When the first mask pattern 511 is circular, the first light shielding width H1 can be the diameter of the first mask pattern 511; when the first mask pattern 511 is square, the first light shielding width H1 can be the length or width of the first mask pattern 511; when the first mask pattern 511 is elliptical, the first light shielding width H1 can be the minor axis diameter or the major axis diameter of the first mask pattern 511.

[0126] For example, the step of forming the mask layer 51 into the first mask pattern 511 includes S321 and S322.

[0127] S321, the photoresist layer 52 is formed into a first sub-photoresist layer 521, and the shape of the first sub-photoresist layer 521 is substantially consistent with the shape of the pre-formed first mask pattern 511.

[0128] The light shielding width of the first sub-photoresist layer 521 is substantially equal to the first light shielding width H1 of the pre-formed first mask pattern 511. The light shielding width of the first sub-photoresist layer 521 and the size d1 of the first light shielding part 41 in the second direction X are related, and the first light shielding part 41 in the second direction X can be obtained based on the light shielding width of the first sub-photoresist layer 521.

[0129] S322, the mask layer 51 is formed into the first mask pattern 511 which is substantially consistent with the shape of the first sub-photoresist layer 521.

[0130] For example, the mask layer 51 is formed into the first mask pattern 511 by using a wet etching process.

[0131] S33, based on the plurality of first mask patterns 511, the plurality of initial first dielectric layers 4a and the plurality of initial second dielectric layers 4b are etched to form a plurality of intermediate first dielectric layers 4a1 and a plurality of intermediate second dielectric layers 4b1; the plurality of intermediate first dielectric layers 4a1 and the plurality of intermediate second dielectric layers 4b1 include a first preset film layer 4101 and a second preset film layer 420a, the first preset film layer 4101 and the second preset film layer 420a each include at least one intermediate first dielectric layer 4a1 and at least one intermediate second dielectric layer 4b1, and the first preset film layer 4101 is closer to the array substrate 10 than the second preset film layer 420a.

[0132] It can be understood that the initial first light shielding layer 410 forms the first preset film layer 4101, and the initial first spacer layer 420 forms the second preset film layer 420a.

[0133] Exemplarily, the dry etching process is used to etch the plurality of initial first dielectric layers 4a and the plurality of initial second dielectric layers 4b arranged alternately. The initial first light shielding layer 410 is formed as a first preset film layer 4101, and the initial first spacer layer 420 is formed as a second preset film layer 420a at the same time.

[0134] S34: A part of the first mask pattern 511 is removed to form a second mask pattern 5111, and the second mask pattern 5111 exposes the surrounding area of the second preset film layer 420a.

[0135] Exemplarily, in the orthographic projection of the array substrate 10, the second mask pattern 5111 can be circular, square or elliptical. The second mask pattern 5111 is related to the shape of the pre-formed first spacer 42, and the first spacer 42 is formed based on the second mask pattern 5111.

[0136] For example, the second mask pattern 5111 has a second light shielding width H2. When the second mask pattern 5111 is circular, the second light shielding width H2 can be the diameter of the second mask pattern 5111; when the second mask pattern 5111 is square, the second light shielding width H2 can be the length or width of the second mask pattern 5111; when the second mask pattern 5111 is elliptical, the second light shielding width H2 can be the minor axis diameter or the major axis diameter of the second mask pattern 5111.

[0137] Exemplarily, the specific steps of forming the first mask pattern 511 into the second mask pattern 5111 include S341 and S342.

[0138] S341: The first sub-photolithography layer 521 is formed into a second sub-photolithography layer 5211. The shape of the second sub-photolithography layer 5211 is substantially consistent with the shape of the pre-formed second mask pattern 5111.

[0139] Exemplarily, the size of the second sub-photolithography layer 5211 in the second direction X is the light shielding width of the second sub-photolithography layer 5211, and the light shielding width of the second sub-photolithography layer 5211 is substantially equal to the second light shielding width H2 of the second mask pattern 5111.

[0140] The light shielding width of the second sub-photolithography layer 5211 is related to the size d2 of the first spacer 42 in the second direction X, and the first spacer 42 with the size d2 in the second direction X can be obtained from the light shielding width of the second sub-photolithography layer 5211.

[0141] S342: The first mask pattern 511 is formed into the second mask pattern 5111 which is substantially consistent with the shape of the second sub-photolithography layer 5211.

[0142] Exemplarily, the first mask pattern 511 is formed into a second mask pattern 5111 by using a wet etching process.

[0143] S35, etching the second preset film layer 420a based on the plurality of second mask patterns 5111 to form the first spacer 42; the first preset film layer 4101 forms the first light shielding part 41 to form the first spacer unit 40.

[0144] Exemplarily, the specific steps of forming the first spacer 42 from the second preset film layer 420a include S351-S353.

[0145] S351, etching the second preset film layer 420a to form the first spacer 42.

[0146] Exemplarily, the second preset film layer 420a is formed into the first spacer 42 by using a dry etching process. By controlling the dry etching time, the dry etching size in the first direction Y can be controlled, and the dry etching size in the first direction Y is the size d4 of the first spacer 42 in the first direction Y.

[0147] S352, stripping the second sub-photolithography glue layer 5211.

[0148] S353, stripping the second mask pattern 5111 to form the first spacer unit 40.

[0149] S4, as shown in FIG. 5, the display panel 100 is formed by aligning the array substrate 10 and the opposite substrate 20.

[0150] The side of the opposite substrate 20 provided with the spacers 26 faces the side of the array substrate 10 provided with the first spacers 42; wherein in the orthographic projection to the array substrate 10, the black matrix 22 covers the spacers 26, the first light shielding part 41 covers the first spacers 42, and the black matrix 22 covers the first light shielding part 41.

[0151] The display panel 100 including the first spacer unit 40 is formed by the above steps S1-S4. The first spacer unit 40 includes a plurality of first dielectric layers 40a and a plurality of second dielectric layers 40b arranged alternately. The first dielectric layer 40a and the second dielectric layer 40b are both inorganic films, and the intermolecular force between the inorganic films in contact is strong. Therefore, at the junction of the first light shielding part 41 and the first spacer 42, the first light shielding part 41 and the first spacer 42 have strong intermolecular force therebetween, which can improve the adhesion between the first light shielding part 41 and the first spacer 42, and effectively solve the problem of peeling of the first spacer 42.

[0152] Further, compared with the step of forming the first light-shielding portion 41 and the first spacer portion 42, the above steps S31-S35 form the first light-shielding portion 41 and the first spacer portion 42 in a self-alignment manner, so that the alignment deviation of the first light-shielding portion 41 and the first spacer portion 42 can be reduced, the size d1 of the first light-shielding portion 41 in the second direction X is small, and in the orthographic projection to the array substrate 10, the black matrix 22 can cover the first light-shielding portion 41, and the arrangement of the first light-shielding portion 41 does not reduce the aperture ratio of the display panel 100.

[0153] In the step of forming the first light-shielding portion 41 and the first spacer portion 42, the first light-shielding portion 41 and the first spacer portion 42 are formed in two steps, that is, first, the initial first light-shielding layer 410 is deposited, then the initial first light-shielding layer 410 is formed into the first light-shielding portion 41, the initial first spacer layer 420 is formed on the side of the first light-shielding portion 41 away from the array substrate 10, and then the initial first spacer layer 420 is formed into the first spacer portion 42. Therefore, the first light-shielding portion 41 and the first spacer portion 42 need to be aligned, and there is an alignment deviation. Therefore, when the first light-shielding portion 41 is formed, the size d1 of the first light-shielding portion 41 in the second direction X needs to be increased. Therefore, in the orthographic projection to the array substrate 10, in order for the black matrix 22 to cover the first light-shielding portion 41, the size d3 of the black matrix 22 in the second direction X needs to be increased, which affects the aperture ratio of the display panel 100.

[0154] In some embodiments, as shown in FIGS. 13 and 14, the material of the first light-shielding portion 41 includes a first type of metal, and the material of the first spacer portion 42 includes resin.

[0155] For example, the first type of metal includes molybdenum or copper.

[0156] In some examples, as shown in FIGS. 13 and 14, the first spacer unit 40 further includes a first fixing portion 43, and the first fixing portion 43 surrounds the first spacer portion 42 and is in contact with the first spacer portion 42 and the first light-shielding portion 41.

[0157] Since the first fixing portion 43 is arranged in a ring shape around the first spacer portion 42 and is in contact with the first spacer portion 42 and the first light-shielding portion 41, the first fixing portion 43 has the effect of reinforcing the first spacer portion 42 and the first light-shielding portion 41, and can effectively solve the problem of the first spacer portion 42 falling off.

[0158] In some examples, as shown in FIG. 13 and FIG. 14, the first fixing part 43 comprises a first sub-fixing part 431 and a second sub-fixing part 432 connected together, the first sub-fixing part 431 is in contact with the first spacer part 42, and the second sub-fixing part 432 is in contact with the first light shielding part 432. In the first direction Y, the ratio of the size d11 of the first sub-fixing part 431 to the size d4 of the first spacer part 42 ranges from 0.5 to 0.8. In the orthographic projection toward the array substrate 10, the distance d81 between the second sub-fixing part 432 and the boundary M3 of the first spacer part 42 and the boundary M1 of the first spacer part 42 is approximately equal to the distance d82 between the second sub-fixing part 432 and the boundary M3 of the first spacer part 42 and the boundary M1 of the first light shielding part 41, i.e., d81≈d82.

[0159] It should be noted that the size d11 of the first sub-fixing part 431 is the distance between the surface of the first sub-fixing part 431 close to the first light shielding part 41 and the surface of the first sub-fixing part 431 away from the first light shielding part 41.

[0160] For example, the first sub-fixing part 431 and the second sub-fixing part 432 are in an integrated structure. The part in contact with the first spacer part 42 is the first sub-fixing part 431, and the part in contact with the first light shielding part 432 is the second sub-fixing part 432. By providing the first fixing part 43 in an integrated structure, the first sub-fixing part 431 and the second sub-fixing part 432 can be formed at the same time, simplifying the manufacturing process of the first sub-fixing part 431 and the second sub-fixing part 432. The integrated structure of the first fixing part 43 is relatively stable, can increase the connecting force between the first spacer part 42 and the first light shielding part 41, and effectively solves the problem of the first spacer part 42 falling off.

[0161] For example, the ratio of the size d11 of the first sub-fixing part 431 to the size d4 of the first spacer part 42 is 0.5, 0.6, 0.7, or 0.8, etc., which is not limited here.

[0162] By setting the ratio of the size d11 of the first sub-fixing part 431 to the size d4 of the first spacer part 42 in the first direction Y to range from 0.5 to 0.8, and in the orthographic projection toward the array substrate 10, the distance d81 between the second sub-fixing part 432 and the boundary M3 of the first spacer part 42 and the boundary M1 of the first spacer part 42 is approximately equal to the distance d82 between the second sub-fixing part 432 and the boundary M3 of the first spacer part 42 and the boundary M1 of the first light shielding part 41, so that the first fixing part 43 can reinforce the first spacer part 42 and the first light shielding part 41, and effectively solve the problem of the first spacer part 42 falling off.

[0163] In some embodiments, as shown in FIG. 13 and FIG. 14, the material of the first fixing part 43 comprises a second type of metal.

[0164] Exemplarily, the second type of metal of the first fixing portion 43 is different from the first type of metal of the first light shielding portion 41, for example, the second type of metal is indium tin oxide or aluminum, which is not limited herein.

[0165] Exemplarily, the second type of metal of the first fixing portion 43 is the same as the first type of metal of the first light shielding portion 41, for example, the second type of metal of the first fixing portion 43 and the first type of metal of the first light shielding portion 41 are both molybdenum.

[0166] Since the material of the first light shielding portion 41 includes the first type of metal, by setting the material of the first fixing portion 43 to include the second type of metal, the metal material has a strong intermolecular binding force with the metal material, so that the first fixing portion 43 of the second type of metal has a stable fixing effect on the first spacer 40. Moreover, compared with the case that the material of the first type of metal and the material of the second type of metal are different metal materials, when the material of the first type of metal and the material of the second type of metal are the same, the intermolecular binding force between them is stronger, and the fixing effect on the first spacer 40 is stronger.

[0167] The following illustrates a preparation method of the first spacer 40, as shown in FIGS. 15 and 16, the first spacer 40 includes the first fixing portion 43. The preparation method of the first spacer 40 includes steps R1-R6.

[0168] R1, forming an initial first spacer 400 on one side of the array substrate 10.

[0169] The initial first spacer 400 includes an initial first light shielding layer 410 and an initial first spacer layer 420 which are sequentially stacked, and the initial first spacer layer 420 is arranged on the side of the initial first light shielding layer 410 away from the array substrate 10.

[0170] Exemplarily, the material of the initial first light shielding layer 410 includes metal, for example, the material of the initial first light shielding layer 410 adopts molybdenum. The material of the initial first spacer layer 420 includes resin.

[0171] Then, a mask layer 51 is formed on the side of the initial first spacer layer 420 away from the array substrate 10.

[0172] After that, a photoresist layer 52 is formed on the side of the mask layer 51 away from the array substrate 10.

[0173] R2, forming a plurality of first mask patterns 511 on the side of the initial first spacer 400 away from the array substrate 10.

[0174] Exemplarily, the content of forming the mask layer 51 into the first mask pattern 511 can refer to step S32, which will not be described herein again.

[0175] R3, etching the initial first light shielding layer 410 and the initial first spacer layer 420 based on the plurality of first mask patterns 511 to form a plurality of first light shielding portions 41 and a plurality of sub-initial first spacer layers 4201.

[0176] For example, the initial first light shielding layer 410 and the initial first spacer layer 420 are etched by an inductively coupled plasma etching process, the initial first light shielding layer 410 forms the first light shielding portions 41, and the initial first spacer layer 420 forms the sub-initial first spacer layers 4201 at the same time.

[0177] R4, removing part of the first mask patterns 511 to form second mask patterns 5111, the second mask patterns 5111 expose the surrounding areas of the sub-initial first spacer layers 4201.

[0178] For example, the content of forming the first mask patterns 511 into the second mask patterns 5111 can refer to step S34, which will not be described here.

[0179] R5, etching the sub-initial first spacer layers 4201 based on the second mask patterns 5111 to form first spacer portions 42.

[0180] Then, the second sub-photocuring layer 5211 and the second mask patterns 5111 are peeled off.

[0181] R6, forming first fixed portions 43, the first fixed portions 43 surround the first spacer portions 42 and are in contact with the first spacer portions 42 and the first light shielding portions 41, forming first spacer units 40.

[0182] For example, the step of forming the first fixed portions 43 includes R61 and R62.

[0183] R61, forming a metal layer 430 on the side of the first spacer portions 42 away from the array substrate 10.

[0184] For example, the metal layer 430 is formed by a deposition process, and the material of the metal layer 430 includes indium tin oxide.

[0185] R62, forming the metal layer 430 into the first fixed portions 43 to form the first spacer units 40.

[0186] For example, the first fixed portions 43 are formed by etching the metal layer 430 by an etching process.

[0187] The structure of the first fixed portions 43 can refer to the above content, which will not be described here.

[0188] The first spacer unit 40 including the first fixing portion 43 is formed by the above steps R1-R6. The first fixing portion 43 has the effect of reinforcing the first spacer portion 42 and the first light shielding portion 41, and can effectively solve the problem of the first spacer portion 42 falling off.

[0189] Further, the first light shielding portion 41 and the first spacer portion 42 are formed by the above steps R1-R6 in a self-alignment manner. In this way, the alignment deviation of the first light shielding portion 41 and the first spacer portion 42 can be reduced, so that the size d1 of the first light shielding portion 41 in the second direction X is small, and in the orthographic projection onto the array substrate 10, the black matrix 22 can cover the first light shielding portion 41, and the arrangement of the first light shielding portion 41 will not reduce the aperture ratio of the display panel 100.

[0190] In some embodiments, as shown in FIGS. 5 and 17, in order to shield the light leakage caused by the poor liquid crystal molecule orientation caused by the poor anchoring of the second orientation layer 27 around the spacers 26, the black matrix 22 is needed to shield light, and the black matrix 22 and the spacers 26 are formed in steps. The size W2 of the black matrix 22 in the second direction X needs to be greater than the size W1 of the spacers 26 in the second direction X, i.e., W2>W1. The difference between the size W2 of the black matrix 22 in the second direction X and the size W1 of the spacers 26 in the second direction X needs to be designed according to the following three points: (1) the size a of the poor liquid crystal molecule orientation area in the second direction X; (2) the alignment deviation b in the process of forming the black matrix 22 and the spacers 26 in steps; (3) the deviation c when the black matrix 22 is patterned. That is, W2=W1+(a+b+c)×2.

[0191] The size W1 of the black matrix 22 in the second direction X affects the aperture ratio of the display panel 100. Therefore, reducing the size W2 of the black matrix 22 in the second direction X can increase the aperture ratio of the display panel 100.

[0192] In some examples, as shown in FIG. 18, the planarization layer 25 is arranged between the black matrix 22 and the spacers 26. The planarization layer 25 is provided with a plurality of second spacer units 60 on the side away from the black matrix 22, and at least one second spacer unit 60 includes a second light shielding portion 61 and a spacer 26 located on the side of the second light shielding portion 61 away from the array substrate 10.

[0193] For example, since the planarization layer 25 will be etched in a dry etching process, a buffer layer 24 resistant to dry etching is arranged on the side of the planarization layer 25 away from the second substrate 21. The buffer layer 24 can protect the planarization layer 25 when the second spacer unit 60 is formed by a dry etching process in the subsequent steps. The second light shielding portion 61 is arranged on the side of the buffer layer 24 away from the second substrate 21, and the spacer 26 is arranged on the side of the second light shielding portion 61 away from the second substrate 21.

[0194] Exemplarily, the material of the second light shielding portion 61 includes molybdenum or copper.

[0195] Exemplarily, the second spacer unit 60 can be formed in a self-alignment manner. The preparation method of the second spacer unit 60 will be described in the subsequent content, and will not be described here.

[0196] By arranging the second light shielding portion 61, the second light shielding portion 61 can shield the light leakage caused by the poor alignment of the liquid crystal molecules around the spacer 26. As shown in FIGS. 18 and 19, the second light shielding portion 61 and the spacer 26 are formed in a self-alignment manner, which can eliminate the alignment deviation in the step-by-step formation of the black matrix 22 and the spacer 26. Then, the difference between the size W3 of the second light shielding portion 61 in the second direction X and the size W1 of the spacer 26 in the second direction X only needs to be designed according to the following two points: (1) the size a of the poor alignment area of the liquid crystal molecules in the second direction X; and (2) the deviation c of the second light shielding portion 61 in the patterning. That is, W3 = W1 + (a + c) x 2.

[0197] Therefore, the size W3 of the second light shielding portion 61 in the second direction X does not need to consider the alignment deviation b in the step-by-step formation, and the size W3 of the second light shielding portion 61 in the second direction X can be smaller. Moreover, the size W2 of the black matrix 22 in the second direction X also does not need to consider the alignment deviation b in the step-by-step formation of the black matrix 22 and the spacer 26. Therefore, compared with the case where the second light shielding portion 61 and the spacer 26 are not formed in a self-alignment manner, the size W2 of the black matrix 22 in the second direction X can be reduced, which can improve the aperture ratio of the display panel 100 and improve the display quality of the display panel 100.

[0198] However, in the process of aligning the array substrate 10 and the opposite substrate 20, due to the insufficient adhesion between the second light shielding portion 61 and the spacer 26, there is a risk that the spacer 26 will fall off.

[0199] In some embodiments, as shown in FIG. 20, the second spacer unit 60 further includes a second fixing portion 63, which surrounds the spacer 26 and is in contact with the spacer 26 and the second light shielding portion 61.

[0200] Since the second fixing portion 63 is arranged in a ring shape around the spacer 26 and is in contact with the spacer 26 and the second light shielding portion 61, the second fixing portion 63 has the effect of reinforcing the spacer 26 and the second light shielding portion 61, which can effectively solve the problem of the spacer 26 falling off.

[0201] In some embodiments, as shown in FIG. 20, in the orthographic projection to the opposite substrate 20, the boundary of the second fixing portion 63 away from the spacer 26 substantially coincides with the boundary of the second light shielding portion 61.

[0202] That is, the distance W4 of the second fixing portion 63 away from the border of the spacer 26 and the spacer 26 in the second direction X is approximately equal to the distance W5 of the second light shielding portion 61 away from the border of the spacer 26 and the spacer 26 in the second direction X, i.e. W4≈W5.

[0203] By setting the border of the second fixing portion 63 away from the border of the spacer 26 in the orthographic projection to the opposite substrate 20 approximately coincides with the border of the second light shielding portion 61, the contact area between the second fixing portion 63 and the second light shielding portion 61 is large enough, so that the second fixing portion 63 and the second light shielding portion 61 have strong adhesion force, to improve the performance of the second fixing portion 63 reinforcing the interaction between the spacer 26 and the second light shielding portion 61.

[0204] In some embodiments, as shown in FIG. 20, the ratio of the size W6 of the second fixing portion 63 in the first direction Y to the size W7 of the spacer 26 in the first direction Y is in the range of 0.05-0.1.

[0205] For example, the ratio of the size W6 of the second fixing portion 63 in the first direction Y to the size W7 of the spacer 26 in the first direction Y is 0.05, 0.06, 0.07, 0.08, 0.09 or 0.1, etc., which is not limited here.

[0206] By setting the ratio of the size W6 of the second fixing portion 63 in the first direction Y to the size W7 of the spacer 26 in the first direction Y in the range of 0.05-0.1, the second fixing portion 63 and the spacer 26 have strong adhesion force, to improve the performance of the second fixing portion 63 reinforcing the interaction between the spacer 26 and the second light shielding portion 61.

[0207] In some embodiments, as shown in FIG. 20, the second fixing portion 63 and the spacer 26 are an integral structure.

[0208] For example, the material of the spacer 26 includes resin, and the material of the second fixing portion 63 is the same as that of the spacer 26.

[0209] That is, the second fixing portion 63 is formed synchronously when the spacer 26 is formed. In this way, the spacer 26 and the second fixing portion 63 have strong connection force, so that the second fixing portion 63 has good reinforcing effect on the spacer 26 and the second light shielding portion 61.

[0210] The following illustrates a preparation method of the second spacer unit 60, as shown in FIGS. 21 and 22, the second spacer unit 60 includes the second fixing portion 63. The preparation method of the second spacer unit 60 includes steps T1-T5.

[0211] T1, forming an initial second spacer unit 600 on the side of the planarization layer 25 away from the black matrix 22.

[0212] The initial second spacer unit 600 includes an initial second light-blocking layer 610 and an initial second spacer layer 620 which are sequentially stacked, and the initial second spacer layer 620 is disposed on a side of the initial second light-blocking layer 610 away from the planarization layer 25.

[0213] For example, the material of the initial second light-blocking layer 610 includes metal, for example, the material of the initial second light-blocking layer 610 is molybdenum. The material of the initial second spacer layer 620 includes resin.

[0214] For example, the buffer layer 24 is first formed on a side of the opposing substrate 20, and then the initial second spacer unit 600 is formed.

[0215] Then, the mask layer 51 is formed on a side of the initial second spacer unit 600 away from the planarization layer 25.

[0216] After that, the photoresist layer 52 is formed on a side of the mask layer 51 away from the opposing substrate 20.

[0217] T2, a plurality of first mask patterns 511 are formed on a side of the initial second spacer unit 600 away from the planarization layer 25.

[0218] For example, the content of forming the mask layer 51 into the first mask pattern 511 can refer to the content of step S32, which will not be repeated here.

[0219] T3, based on the plurality of first mask patterns 511, the initial second light-blocking layer 610 and the initial second spacer layer 620 are etched to form a plurality of second light-blocking portions 61 and a plurality of sub-initial second spacer layers 6201.

[0220] For example, the initial second light-blocking layer 610 and the initial second spacer layer 620 are etched by using a dry etching process, the initial second light-blocking layer 610 forms the second light-blocking portion 61, and the initial second spacer layer 620 forms the sub-initial second spacer layer 6201.

[0221] T4, part of the first mask pattern 511 is removed to form a second mask pattern 5111, and the second mask pattern 5111 exposes the surrounding area of the sub-initial second spacer layer 6201.

[0222] For example, the content of forming the first mask pattern 511 into the second mask pattern 5111 can refer to the content of step S34, which will not be repeated here.

[0223] T5, based on the second mask pattern 5111, the sub-initial second spacer layer 6201 is etched to form the spacer 26, and at the same time, the second fixing portion 63 is formed, the second fixing portion 63 surrounds the spacer 26 and is in contact with the spacer 26 and the second light-blocking portion 61, and the second spacer unit 60 is formed.

[0224] For example, the second sub-initial second spacer layer 6201 is etched, and the spacer 26 and the second fixing portion 63 are formed by controlling the etching depth.

[0225] The etching depth refers to the etching size in the first direction Y. The etching size in the first direction Y is the difference between the size W7 of the spacer 26 in the first direction Y and the size W6 of the second fixing portion 63 in the first direction Y.

[0226] That is, the spacer 26 and the second fixing portion 63 are simultaneously formed by one etching process, which not only simplifies the manufacturing process, but also makes the connecting force between the spacer 26 and the second fixing portion 63 stronger, thereby effectively solving the problem of the spacer 26 falling off.

[0227] Then, the second sub-photoresist layer 5211 and the second mask pattern 5111 are peeled off.

[0228] The structure of the second fixing portion 63 can refer to the above description, and will not be described here.

[0229] The second spacer unit 60 including the second fixing portion 63 is formed through the above steps T1-T5, the second fixing portion 63 has the function of reinforcing the second light shielding portion 61 and the spacer 26, and can effectively solve the problem of the spacer 26 falling off.

[0230] Further, the second light shielding portion 61 and the spacer 26 are formed through the above steps T1-T5 in a self-alignment manner, which can reduce the alignment deviation between the second light shielding portion 61 and the spacer 26, so that the size W3 of the second light shielding portion 61 in the second direction X is small, and in the orthographic projection to the array substrate 10, the black matrix 22 can cover the second light shielding portion 61, and the setting of the second light shielding portion 61 will not reduce the aperture ratio of the display panel 100.

[0231] As shown in FIG. 1, some embodiments of the present disclosure further provide a display device 1000, which comprises the display panel 100 according to any one of the above embodiments, and further comprises a driving chip configured to drive the display panel 100 to display.

[0232] The display device may, for example, be a mobile phone, a tablet computer, a personal digital assistant (PDA), a vehicle-mounted computer, a wearable display device, or the like. The specific form of the display device is not specially limited in the embodiments of the present disclosure. The display device 1000 comprises the display panel 100 provided in any one of the above embodiments. Therefore, the display device 1000 provided in the embodiments of the present disclosure has all the beneficial effects of the display panel 100 provided in any one of the above embodiments, and will not be described here.

[0233] The above description is merely that of a specific implementation of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art who thinks of changes or replacements within the technical scope disclosed by the present disclosure should be covered within the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be subject to the protection scope of the claims.

Claims

1. A display panel, comprising: an array substrate; a counter substrate disposed opposite to the array substrate; the counter substrate comprising: a black matrix and a spacer disposed on a side of the black matrix facing the array substrate; wherein a side of the array substrate facing the counter substrate is provided with a plurality of first spacer units, at least one first spacer unit comprising: a first light shielding portion and a first spacer portion located on a side of the first light shielding portion facing the counter substrate; in a projection onto the array substrate, the black matrix covers the spacer, the first light shielding portion covers the first spacer portion, and the black matrix covers the first light shielding portion. In a first direction, the first spacer unit comprises: a plurality of first dielectric layers and a plurality of second dielectric layers arranged alternately; the first direction is parallel to a direction in which the array substrate and the counter substrate are disposed opposite to each other; a refractive index of the first dielectric layer is greater than a refractive index of the second dielectric layer; a sum of a number of layers of the first dielectric layer and a number of layers of the second dielectric layer ranges from 27 to 40; in the first direction, a ratio of a size of the first spacer portion to a size of the first light shielding portion ranges from 1 / 4 to 4. 5.The display panel according to any one of claims 2 to 4, wherein: a size of the first dielectric layer in the first direction ranges from 10 nm to 100 nm; and a size of the second dielectric layer in the first direction ranges from 10 nm to 300 nm. 6.The display panel according to any one of claims 2 to 5, wherein: a refractive index of the first dielectric layer ranges from 1.7 to 2.2; and a refractive index of the second dielectric layer ranges from 1.1 to 1.

5. In the projection onto the array substrate, a boundary of the first spacer portion and a boundary of the first light shielding portion have a first interval; a size of the first spacer portion in the first direction is substantially equal to the first interval. The first spacer unit further comprises: a first fixing portion surrounding the first spacer portion and in contact with the first spacer portion and the first light shielding portion. The first fixing portion comprises: a first sub-fixing portion and a second sub-fixing portion connected to each other, the first sub-fixing portion being in contact with the first spacer portion, and the second sub-fixing portion being in contact with the first light shielding portion; in the first direction, a ratio of a size of the first sub-fixing portion to a size of the first spacer portion ranges from 0.5 to 0.8; and / or, in the projection onto the array substrate, an interval between a boundary of the second sub-fixing portion away from the first spacer portion and a boundary of the first spacer portion is substantially equal to an interval between a boundary of the second sub-fixing portion away from the first spacer portion and a boundary of the first light shielding portion. A material of the first light shielding portion comprises a first type of metal; a material of the second fixing portion comprises a second type of metal; the first type of metal and the second type of metal are different. A planarization layer is disposed between the black matrix and the spacer. ​ ​ ​ ​ ​ 2. The display panel of claim 1, wherein, ​ ​ 3. The display panel of claim 2, wherein, ​ 4. The display panel of claim 2 or 3, wherein, ​ ​ ​ ​ ​ ​ ​ 7. The display panel according to any one of claims 2 to 6, wherein ​ 8. The display panel of claim 1, wherein, ​ 9. The display panel of claim 8, wherein, ​ ​ ​ 10. The display panel of claim 7 or 8, wherein, ​ 11. The display panel according to any one of claims 1 to 10, wherein ​ The planarization layer is provided with a plurality of second spacer units on a side away from the black matrix, and at least one second spacer unit comprises a second light shielding portion and a spacer located on a side of the second light shielding portion away from the planarization layer.

12. The display panel of claim 11, wherein, The second spacer unit further comprises a second fixing portion surrounding the spacer and in contact with the spacer and the second light shielding portion.

13. The display panel of claim 12, wherein, In a projection onto the opposing substrate, a boundary of the second fixing portion away from the spacer substantially coincides with a boundary of the second light shielding portion.

14. The display panel according to any one of claims 11 to 13, wherein, A ratio of a size of the second fixing portion in a first direction to a size of the spacer in the first direction ranges from 0.05 to 0.

1.

15. The display panel according to any one of claims 11 to 14, wherein, The second fixing portion and the spacer are in an integrated structure.

16. A manufacturing method of a display panel, comprising: forming an opposing substrate; the opposing substrate comprising a black matrix and a spacer provided on a side of the black matrix; forming an array substrate; forming a plurality of first spacer units on a side of the array substrate, each of the plurality of first spacer units comprising a first light shielding portion and a first spacer portion located on a side of the first light shielding portion; aligning the opposing substrate and the array substrate, and a side of the opposing substrate provided with the spacer faces a side of the array substrate provided with the first spacer portion; wherein, in a projection onto the array substrate, the black matrix covers the spacer, the first light shielding portion covers the first spacer portion, and the black matrix covers the first light shielding portion.

17. The method of producing a display panel according to claim 16, wherein the forming of the plurality of first spacer units on the side of the array substrate comprises: forming an initial first spacer unit on the side of the array substrate, wherein the initial first spacer unit comprises an initial first light shielding layer and an initial first spacer layer sequentially stacked; the initial first spacer layer is provided on a side of the initial first light shielding layer away from the array substrate; forming a plurality of first mask patterns on a side of the initial first spacer unit away from the array substrate; etching the initial first light shielding layer and the initial first spacer layer based on the plurality of first mask patterns to form a plurality of first light shielding portions and a plurality of sub-initial first spacer layers; removing part of the first mask patterns to form second mask patterns, the second mask patterns expose a surrounding area of the sub-initial first spacer layer; etching the sub-initial first spacer layer based on the second mask patterns to form a first spacer portion; forming a first fixing portion surrounding the first spacer portion and in contact with the first spacer portion and the first light shielding portion to form a first spacer unit.

18. The method of producing a display panel according to claim 16, wherein, the forming of the plurality of first spacer units on the side of the array substrate comprises: forming an initial first spacer unit on the side of the array substrate, the initial first spacer unit comprising a plurality of initial first dielectric layers and a plurality of initial second dielectric layers alternately arranged; wherein a refractive index of the initial first dielectric layer is greater than a refractive index of the initial second dielectric layer; forming a plurality of first mask patterns on a side of the initial first spacer unit away from the array substrate; etching a plurality of initial first dielectric layers and a plurality of initial second dielectric layers based on the plurality of first mask patterns, to form a plurality of intermediate first dielectric layers and a plurality of intermediate second dielectric layers; the plurality of intermediate first dielectric layers and the plurality of intermediate second dielectric layers comprise: a first preset film layer and a second preset film layer, the first preset film layer and the second preset film layer each comprise at least one intermediate first dielectric layer and at least one intermediate second dielectric layer, and the first preset film layer is closer to the array substrate than the second preset film layer; part of the first mask pattern is removed to form a second mask pattern, the second mask pattern exposes a surrounding area of the second preset film layer; etching the second preset film layer based on the plurality of second mask patterns to form the first spacer; the first preset film layer forms the first light shielding portion, and forms a first spacer unit.

19. The method of producing a display panel according to claim 16, wherein, A planarization layer is arranged between the black matrix and the spacer; a plurality of second spacer units are arranged on a side of the planarization layer away from the black matrix, each second spacer unit in the plurality of second spacer units comprises: a second light shielding portion and a spacer located on a side of the second light shielding portion away from the planarization layer; forming the second spacer unit comprises: forming an initial second spacer unit on a side of the planarization layer away from the black matrix; wherein the initial second spacer unit comprises an initial second light shielding layer and an initial second spacer layer arranged in sequence; the initial second spacer layer is arranged on a side of the initial second light shielding layer away from the planarization layer; a plurality of first mask patterns are formed on a side of the initial second spacer unit away from the planarization layer; etching the initial second light shielding layer and the initial second spacer layer based on the plurality of first mask patterns to form a plurality of second light shielding portions and a plurality of sub-initial second spacer layers; part of the first mask pattern is removed to form a second mask pattern, the second mask pattern exposes a surrounding area of the sub-initial second spacer layer; etching the sub-initial second spacer layer based on the second mask pattern to form a spacer, and simultaneously forming a second fixed portion; the second fixed portion surrounds the spacer and is in contact with the spacer and the second light shielding portion, forming a second spacer unit.

20. A display device, comprising: the display panel of any one of claims 1-15; a driving chip configured to drive the display panel to display.

Images