Urinal cleaning and drainage system and cleaning and drainage method

Abstract

The present invention prevents accumulation of foreign matters in a horizontal pipe.　A cleaning water supply system 20 is provided with a chemical liquid supply device 30, and is also provided with a surfactant supply system 60 for supplying a surfactant to a horizontal pipe 42. The wastewater discharged into the horizontal pipe 42 is mixed with the surfactant, and the wastewater is consequently foamed. The flow of the foam generated in the horizontal pipe 42 is slow compared with the flow of unfoamed wastewater; therefore, the amount of time the foam remains in the horizontal pipe 42 is increased. As a result, the amount of time the chemical liquid remains is also increased, and the effects of the chemical liquid, such as cleaning, deodorization, sterilization, and prevention of uric scale deposition, in the horizontal pipe 42 are improved.

Description

Urinal flushing and drainage system and flushing and drainage method

[0001] The present invention relates to a flushing and draining system and a flushing and draining method for a urinal, which is provided with a flushing water supply system that supplies flushing water to the urinal and a drainage pipe system that drains wastewater that has passed through the urinal.

[0002] Flush toilets are generally treated with chemicals for the purposes of cleaning, deodorizing, sterilizing, etc. Various methods for this chemical treatment are used, and the devices disclosed in Patent Documents 1 and 2 below are known to be capable of reducing the frequency of replacement and consumption of chemicals supplied to flush toilets.

[0003] The devices shown in Patent Documents 1 and 2 relate to devices that automatically supply a chemical liquid to a flush toilet (particularly a urinal) for the purposes of cleaning, deodorizing, sterilizing, etc. every time cleansing water flows into the urinal. More specifically, the devices shown in Patent Documents 1 and 2 have a cleansing water passage connected to a cleansing water pipe that leads to a discharge port that discharges cleansing water into the urinal, and cleansing water is taken into a container holding a chemical liquid via an intake port facing this cleansing water passage, where it is mixed with the chemical liquid. Thereafter, when the supply of cleansing water flowing through the cleansing water pipe ends, the pressure in the cleansing water pipe drops, and the cleansing water mixed with the chemical liquid is sent out to the cleansing water pipe. In this way, the chemical liquid is supplied to the urinal, and the urinal is cleansed, deodorized, sterilized, etc.

[0004] However, when chemical liquid is supplied to the primary piping that makes up the flush water piping, there are issues such as the fact that the chemical liquid will be consumed even if a water leak occurs in one of the multiple urinals, that a check valve must be installed along the way because the piping is connected to the drinking water piping, and that the chemical liquid supply mechanism that supplies the chemical liquid to the primary piping is always kept under a specified high pressure, so the chemical liquid supply mechanism that supplies the chemical liquid to it must also have a correspondingly high pressure resistance.

[0005] In response to this, the technologies disclosed in Patent Documents 1 and 2, which supply chemical solution to the secondary piping of the flush water piping, solve the problems with the structure for supplying chemical solution to this type of primary piping, but the devices shown in Patent Documents 1 and 2 utilize the pressure change that accompanies the change in flow rate between the start and end of the flush water flow. However, in recent years, water-saving toilet equipment that reduces the flow rate of flush water as much as possible has become more widespread, and there are cases where a sufficient pressure difference cannot be secured between the start and end of the flush water flow.

[0006] Patent Document 3 proposes a chemical liquid supply device for a urinal in which a flush water sensor is provided in the secondary piping, and when the flush water sensor detects the flow of flush water in the secondary piping, a pump of a chemical liquid discharge mechanism is driven to supply chemical liquid into the secondary piping. According to the technology in Patent Document 3, chemical liquid is supplied when the flush water sensor detects that flush water has flowed into the secondary piping, so the required amount of chemical liquid can be supplied even in water-saving toilet equipment.

[0007] However, in all of the technologies in Patent Documents 1 to 3, flush water is flushed and a chemical solution is supplied to the urinal every time the urinal is used. Therefore, if the urinal is used frequently, even if a chemical solution is supplied, it is quickly washed away along with the flush water, and the cleaning, deodorizing, sterilizing, etc. effects of the chemical solution may not be sufficient in the drainage pipe system (particularly the horizontal pipe), not to mention inside the urinal.

[0008] In view of this, the present applicant has proposed a technology for controlling the operation of a pump so that the chemical solution is delivered during a predetermined period when the urinal is used less frequently, as disclosed in Patent Document 4. The chemical solution supplied to the urinal via the secondary piping flows into the drainage pipe system (particularly, in the horizontal pipe) connected to the urinal, but because it is supplied during a period when the urinal is used less frequently, the components of the chemical solution can be retained in the horizontal pipe for a long period of time.

[0009] Japanese Patent Publication No. 49-21541 Japanese Patent Application Laid-Open No. 2003-96873 Japanese Patent Application Laid-Open No. 2019-157343 Japanese Patent Application Laid-Open No. 2023-35998

[0010] According to the technology of Patent Document 4, the chemical solution is supplied during times when the frequency of use is low, so even when used in a water-saving urinal that uses less flush water, the retention time of the chemical solution in the drainage pipe system, including the horizontal pipe, is longer compared to a configuration in which the chemical solution is supplied each time the urinal is used, and the effects of cleaning, deodorizing, sterilizing, preventing the adhesion of urinary stones, etc. in the urinal drainage pipe system are higher. However, it goes without saying that the higher the effect, the more desirable it is.

[0011] The present invention has been made in consideration of the above, and its object is to provide a urinal flushing and drainage system and flushing and drainage method that can further enhance the effects of cleaning, deodorizing, sterilizing, and preventing urinary stone adhesion in the urinal drainage pipe system, particularly the horizontal pipe.

[0012] In order to solve the above problems, the urinal flushing and drainage system of the present invention is a urinal flushing and drainage system having a flushing water supply system that supplies flushing water to the urinal and a drainage pipe system that drains wastewater that has passed through the urinal, and is equipped with: a chemical liquid supply device provided in the flushing water supply system to supply a chemical liquid into the flushing water piping through which the flushing water flows; and a surfactant supply system provided in the drainage pipe system to supply a surfactant into a horizontal pipe in the drainage pipe system.

[0013] It is preferable that the ink jet recording device further comprises a drive control unit that controls the timing of supplying at least the surfactant.

[0014] It is preferable that the surfactant supply system has a surfactant storage section that stores the surfactant, and a surfactant introduction mechanism that guides the surfactant from the surfactant storage section to the horizontal drawing pipe, and that the drive control section operates the surfactant introduction mechanism at a predetermined timing that is set in advance.

[0015] It is preferable that the drive control unit operates the surfactant introduction mechanism during times when the urinal is used less frequently.

[0016] It is preferable that the chemical liquid supply device has a chemical liquid storage section that stores the chemical liquid, and a chemical liquid introduction mechanism that introduces the chemical liquid from the chemical liquid storage section into the cleaning water pipe, and that the drive control section operates the chemical liquid introduction mechanism at a predetermined timing that is set in advance.

[0017] The drive control unit preferably operates the chemical liquid introduction mechanism during times when the urinal is used less frequently.

[0018] The surfactant is preferably a nonionic surfactant.

[0019] It is preferable that the drainage pipe system further includes a urinary scale removing agent supply system for supplying a urinary scale removing agent into the horizontal pipe.

[0020] It is preferable that the urinary stone removing agent supply system has a urinary stone removing agent storage section that stores the urinary stone removing agent, and a urinary stone removing agent introduction mechanism that introduces the urinary stone removing agent from the urinary stone removing agent storage section to the horizontal pipe, and that the drive control section is configured to operate the urinary stone removing agent introduction mechanism when the amount of urinary stone adhesion in the horizontal pipe is equal to or greater than a predetermined amount.

[0021] It is preferable that the horizontal pipe has a urinary stone adhesion amount measuring device for measuring the amount of urinary stone adhesion in the horizontal pipe, and measurement data by the urinary stone adhesion amount measuring device is transmitted to the drive control unit.

[0022] It is preferable that the urinary stone adhesion amount measuring device is configured to include at least one of a camera that takes pictures inside the horizontal pipe and a distance sensor that measures the diameter of the flow section within the horizontal pipe through which liquid can pass.

[0023] The method for flushing and draining a urinal of the present invention includes supplying a chemical solution into a flush water pipe through which flush water flows, mixing the chemical solution with the flush water and supplying the mixture to the urinal, supplying a surfactant into a horizontal pipe in a drainage pipe system through which wastewater that has passed through the urinal flows, and foaming the wastewater containing the chemical solution that has flowed into the horizontal pipe before being discharged. In this case, it is preferable to supply the chemical solution and the surfactant during times when the urinal is least frequently used.

[0024] According to the present invention, a surfactant supply system is provided that supplies a surfactant into a horizontal pipe in a drainage pipe system. In the present invention, the flushing water supplied to the urinal is mixed with a chemical supplied from a chemical supply device, and therefore the wastewater in the horizontal pipe contains components of this chemical. The wastewater discharged into the horizontal pipe mixes with the surfactant, causing the wastewater to foam. The flow of the foam generated in the horizontal pipe is slower than the flow of wastewater when foam is not generated, so the time spent in the horizontal pipe is longer. This also extends the time the chemical remains, improving the effects of the chemical, such as cleaning, deodorizing, sterilizing, and preventing urinary stone buildup inside the horizontal pipe.

[0025] Fig. 1 is a schematic diagram showing an overview of a urinal flushing and draining system according to one embodiment of the present invention. Fig. 2 is a diagram for explaining the structure of a urinal trap. Fig. 3 is a schematic diagram showing an overview of a urinal flushing and draining system according to another embodiment of the present invention. Fig. 4 is a diagram for explaining the configuration of a urinary stone removing agent supply system in the other embodiment shown in Fig. 3.

[0026] An embodiment of the present invention will now be described with reference to the drawings. Figure 1 is a diagram showing the schematic configuration of a urinal flushing and draining system 1 according to one embodiment of the present invention. Figure 1 shows an example in which three urinals 10 to 12 are arranged in parallel on a wall surface, and the urinal flushing and draining system 1 of this embodiment comprises a flush water supply system 20 that supplies flush water to the urinals 10 to 12, a drainage pipe system 40 that drains wastewater that has passed through the urinals 10 to 12, and a drive control unit 50.

[0027] The cleaning water supply system 20 has a cleaning water pipe 21 having a primary side pipe 210 and secondary side pipes 211a to 211c, and valves 22a to 22c interposed between the primary side pipe 210 and the secondary side pipes 211a to 211c.

[0028] The cleaning water supply system 20 is provided with a chemical liquid supply device 30. In this embodiment, it has a chemical liquid storage section 31 formed from a tank, and a chemical liquid introduction mechanism 32. The chemical liquid introduction mechanism 32 is configured to have a chemical liquid supply pump 321 for sending out the chemical liquid from the chemical liquid storage section 31, and chemical liquid introduction pipes 322a to 322c connected to the secondary side pipes 211a to 211c of the cleaning water pipe 21.

[0029] The chemical liquid supply device 30 is controlled by the drive control unit 50, and operates the chemical liquid supply pump 321 at a predetermined timing. The predetermined timing may be any time, but is preferably set to a time period when the urinals 10-12 are less frequently used. For example, in the case of a toilet installed in a commercial or office building, the operation of the chemical liquid supply pump 321 is controlled so that the chemical liquid is supplied during a time period such as nighttime, outside business hours (for example, once or multiple times between midnight and 5:00).

[0030] As an example of control to deliver the chemical solution at a predetermined timing, a timer built into the drive control unit 50 can be used. For example, the chemical solution supply pump 321 can be set to operate once or multiple times at 1:00 AM every day. Furthermore, in cases where toilets are rarely used on weekends, such as in an office building, the chemical solution supply pump 321 can be set to operate multiple times late at night on Friday nights to supply a larger amount of chemical solution. This increases the chemical solution concentration in the urinals 10-12 and in the drain pipes 41a-41c and horizontal pipe 42 of the drain pipe system 40, thereby suppressing the proliferation of bacteria and other germs in the drain pipe system 40 even when the system is not used on Saturdays or Sundays.

[0031] The chemical solution pumped out by the chemical solution supply pump 321 is supplied to the secondary side pipes 211a to 211c via chemical solution inlet pipes 322a to 322c, but the ends of the secondary side pipes 211a to 211c face the inside of the urinals 10 to 12 (for example, the toilet bowl portion). Therefore, the chemical solution supplied to the secondary side pipes 211a to 211c is sent to the urinals 10 to 12, and is further supplied into the horizontal pipe 42 connected to the drain pipes 41a to 41c and 41a to 41d of the drain pipe system 40. In this way, the timing when the chemical solution is supplied to the urinals 10 to 12 is during a period when the urinals 10 to 12 are not used frequently, thereby reducing the chance that the chemical solution that reaches the drain pipe system 40 will be washed away by flush water. As a result, even if the amount of chemical liquid delivered from the chemical liquid storage section 31 is small, the chemical liquid can be retained in the drainage piping system 40 for a long period of time, and the amount of chemical liquid used can be reduced while improving the sterilizing effect, etc., of the chemical liquid within the drainage piping system 40. Furthermore, the chemical liquid is supplied regardless of whether flush water flows from the flush water piping 21 to the urinals 10-12. Therefore, even in water-saving urinals 10-12, a predetermined amount of chemical liquid can be reliably supplied to the drainage piping system 40.

[0032] Such a chemical liquid supply device 30 can supply chemical liquid to a plurality of urinals 10 to 12 with one device, and for example, "Sanitizer MK777" (product name) manufactured by Nippon Calmic Co., Ltd. can be used.

[0033] The drainage pipe system 40 has drainage pipes 41a to 41c connected to traps 10b, 11b, 12b provided at the bottom of each urinal 10 to 12 (see Figure 2), as well as a horizontal pipe 42 connected to the drainage pipes 41a to 41c. The horizontal pipe 42 is laid below the floor slab at a gradient of approximately 1 / 50 to 1 / 100, and a drainage standpipe 45 is connected to the end of this horizontal pipe 42. Note that the urinals 10 to 12 to which the drainage pipe system 40 of this embodiment is connected are not limited to water-saving types, and the shape of the trap is not limited to that shown in the figure.

[0034] A surfactant supply system 60 is connected to the horizontal draw pipe 42 to supply a surfactant into the horizontal draw pipe 42. The surfactant supply system 60 has a surfactant storage section 61 and a surfactant introduction mechanism 62. The surfactant storage section 61 is formed from a tank or the like that can store a predetermined amount of surfactant. Because the chemical solution having a bactericidal effect or the like that is supplied by the chemical solution supply device 30 contains an organic acid, it is preferable to use, as the surfactant, a nonionic surfactant such as polyoxyethylene alkyl ether, which foams well even when used in combination with an organic acid.

[0035] The surfactant introduction mechanism 62 comprises a surfactant supply pump 621 for pumping surfactant from the surfactant storage section 61 and a surfactant introduction pipe 622 connected to the horizontal pull pipe 42. Specifically, the upstream end 42a of the horizontal pull pipe 42 located further upstream from the urinal 12 to which it is connected at the most upstream side of the horizontal pull pipes 42 is opened as a cleaning port for cleaning the inside of the horizontal pull pipe 42, and is normally closed by a cover member 43. Therefore, instead of the cover member 43, a joint-equipped cover member 430 having a through-hole (not shown) penetrating in the thickness direction and a joint pipe 430a rising from the periphery of the through-hole is attached to the cleaning port. This allows for easy connection by simply connecting the end of the surfactant introduction pipe 622 to the joint pipe 430a.

[0036] The surfactant introduction mechanism 62 is controlled by the drive control unit 50, and operates the surfactant supply pump 621 at a predetermined timing. The predetermined timing may be any time, but, like the chemical liquid supply pump 321 described above, it is preferably set to a time period when the urinals 10-12 are not used frequently. For example, in the case of toilets installed in commercial or office buildings, the operation of the surfactant supply pump 621 is controlled so that the surfactant is delivered during a time period outside business hours, such as at night (for example, once or multiple times between midnight and 5:00). More preferably, the drive control unit 50 controls the supply of the chemical liquid to the flush water pipe 21 (secondary-side pipes 211a-211c) and the supply of the surfactant to the horizontal pipe 42 so that both are delivered during a time period when the urinals 10-12 are not used frequently. If the chemical solution is supplied during times when the urinals 10-12 are used less frequently, as described above, the chemical solution will remain in the drainage pipe system 40, particularly the horizontal pipe 42, for a longer period of time. However, by introducing a surfactant into the horizontal pipe 42 during this time, the wastewater containing the chemical solution will foam, and the chemical solution will remain in the horizontal pipe 42 for a longer period of time, thereby further improving the sterilization effect, etc.

[0037] In this embodiment, when the drive control unit 50 operates the chemical liquid supply pump 321, the chemical liquid is supplied to the flush water pipe 21 (secondary pipes 211a-211c). Flush water (tap water or recycled water) flows in the flush water pipe 21, and the chemical liquid is mixed with this flush water. The chemical liquid has effects such as cleaning, deodorizing, and sterilizing, so by supplying it to the urinals 10-12 together with the flush water, the inner surfaces of the urinals 10-12 are sterilized, etc. The flush water containing the chemical liquid that has flowed into the urinals 10-12 flows out as wastewater into the drain pipes 41a-41c and horizontal pipe 42 via traps 10b, 11b, 12b.

[0038] Meanwhile, the drive control unit 50 operates the surfactant supply pump 621 at a predetermined timing, preferably during the time periods when the urinals 10-12 are least frequently used, as described above. This introduces the surfactant into the horizontal draw pipe 42 and mixes it with the wastewater in the horizontal draw pipe 42. Because this wastewater contains a chemical solution with bactericidal effects, when the surfactant is mixed and foams, the components of the chemical solution remain in the horizontal draw pipe 42 for a longer period than when the water is not foaming. As a result, the effect of the chemical solution in the horizontal draw pipe 42 is more pronounced, and the effect of suppressing the accumulation of urinary stones, which increases over time, is also enhanced.

[0039] Next, another embodiment of the present invention will be described with reference to Figures 3 and 4. In this embodiment, in addition to the configuration of the above embodiment, a urinary stone removing agent supply system 70 is provided in the drainage pipe system 40. The urinary stone removing agent supply system 70 comprises a urinary stone removing agent storage unit 71 and a urinary stone removing agent introduction mechanism 72. The urinary stone removing agent storage unit 71 is formed, for example, from a tank, and the urinary stone removing agent introduction mechanism 72 comprises a urinary stone removing agent supply pump 721 for discharging the urinary stone removing agent from the urinary stone removing agent storage unit 71 and a urinary stone removing agent introduction pipe 722 connected to the horizontal drainage pipe 42. Unlike surfactants, the urinary stone removing agent is supplied into the horizontal drainage pipe 42 only frequently when the amount of urinary stone adhering to the horizontal drainage pipe 42 is equal to or greater than a predetermined amount. Therefore, the urinary stone removing agent introduction mechanism 72 does not need to be permanently installed in the urinary stone removing agent flushing and drainage system 1 of this embodiment, and may be installed only when necessary. Furthermore, the surfactant storage section 61 constituting the surfactant supply system 60 can be replaced with a urinary scale removing agent storage section 71, and the surfactant introduction mechanism 62 can be substituted as a urinary scale removing agent introduction mechanism 72. The urinary scale removing agent may be a known one, and the type is not limited.

[0040] In this embodiment, when the amount of urinary stones adhering in the horizontal pipe 42 is equal to or greater than a predetermined amount, the drive control unit 50 supplies a urinary stone removing agent into the horizontal pipe 42, which activates the urinary stone removing agent introduction mechanism 72. Therefore, it is preferable that the urinary stone removing agent supply system 70 is equipped with a urinary stone adhesion amount measuring device 73 for measuring whether the amount of urinary stones adhering in the horizontal pipe 42 is equal to or greater than a predetermined amount, and that the drive control unit 50 receives measurement data from the urinary stone adhesion amount measuring device 73, and activates the urinary stone removing agent introduction mechanism 72 when the measurement data indicates that the amount of urinary stone adhesion is equal to or greater than the predetermined amount.

[0041] The urinary stone adhesion amount measuring device 73 may be a camera that takes pictures inside the horizontal pipe 42, a distance sensor that measures the diameter of the flow section through which liquid can pass inside the horizontal pipe 42, or the like. At least one of these sensors may be provided, or multiple sensors may be provided. When multiple sensors are provided, for example, the amount of adhesion can be measured more accurately by comparing image information from the camera with data from the distance sensor.

[0042] According to this embodiment, as in the above embodiment, under normal circumstances, foaming of the wastewater with a surfactant increases the effectiveness of the chemical solution in the drainage pipe system 40, particularly in the horizontal pipe 42, and the period until the amount of urinary stone adhesion reaches a predetermined level can be extended compared to the conventional method, but when the urinary stone adhesion amount measuring device 73 determines that the amount of urinary stone adhesion is equal to or greater than the predetermined level, the drive control unit 50 operates the urinary stone removal agent introduction mechanism 72 to quickly introduce the urinary stone removal agent. Therefore, according to this embodiment, accumulation of urinary stone, generation of foul odors, etc. can be more effectively suppressed.

[0043] In the above explanation, the chemical liquid supply device 30 has been described as an example of a device that supplies chemical liquid at a predetermined timing, but even if a chemical liquid supply device is used that is a type that is installed individually corresponding to the number of urinals 10 to 12 installed (for example, ``Sanitizer MK7'' (product name) manufactured by Nippon Calmic Co., Ltd.), that is, a type that uses each urinal 10 to 12 and mixes chemical liquid into the flush water by utilizing the pressure difference when the flush water flows, the installation of the above-mentioned surfactant supply system 60 can of course contribute to extending the action time of the chemical liquid in the horizontal pipe 42.

[0044] REFERENCE SIGNS LIST 1 Urinal flushing and drainage system 10, 11, 12 Urinal 20 Flushing water supply system 21 Flushing water piping 30 Chemical liquid supply device 40 Drainage pipe system 42 Horizontal pipe 50 Drive control unit 60 Surfactant supply system 70 Urinary stone remover supply system

Claims

1. A urinal flushing and drainage system having a flushing water supply system that supplies flushing water to a urinal and a drainage pipe system that carries wastewater that has passed through the urinal, comprising: a chemical liquid supply device provided in the flushing water supply system to supply a chemical liquid into the flushing water piping through which the flushing water flows; and a surfactant supply system provided in the drainage pipe system to supply a surfactant into a horizontal pipe in the drainage pipe system.

2. The urinal flushing and drainage system according to claim 1, further comprising a drive control unit that controls the timing of supplying at least the surfactant.

3. A urinal flushing and drainage system as described in claim 2, wherein the surfactant supply system has a surfactant storage section that stores the surfactant, and a surfactant introduction mechanism that guides the surfactant from the surfactant storage section to the horizontal pipe, and the drive control section operates the surfactant introduction mechanism at a predetermined timing.

4. The urinal flushing and drainage system according to claim 3, wherein the drive control unit operates the surfactant introduction mechanism during times when the urinal is used less frequently.

5. A urinal flushing and drainage system as described in claim 2, wherein the chemical liquid supply device has a chemical liquid storage section that stores the chemical liquid, and a chemical liquid introduction mechanism that introduces the chemical liquid from the chemical liquid storage section into the flush water piping, and the drive control section operates the chemical liquid introduction mechanism at a predetermined timing.

6. The urinal flushing and drainage system according to claim 5, wherein the drive control unit operates the chemical liquid introduction mechanism during times when the urinal is used less frequently.

7. The urinal flushing and drainage system according to claim 1, wherein the surfactant is a nonionic surfactant.

8. A urinal flushing and drainage system according to claim 2, wherein the drainage pipe system is further provided with a urinal scale remover supply system for supplying a urinal scale remover into the horizontal pipe.

9. A urinal flushing and drainage system as described in claim 8, wherein the urinary stone removing agent supply system comprises a urinary stone removing agent storage section that stores the urinary stone removing agent, and a urinary stone removing agent introduction mechanism that introduces the urinary stone removing agent from the urinary stone removing agent storage section to the horizontal pipe, and the drive control section operates the urinary stone removing agent introduction mechanism when the amount of urinary stone adhering in the horizontal pipe is equal to or greater than a predetermined amount.

10. A urinal flushing and drainage system as claimed in claim 9, further comprising a urinary stone adhesion amount measuring device for measuring the amount of urinary stone adhesion in the horizontal pipe, and wherein measurement data from the urinary stone adhesion amount measuring device is transmitted to the drive control unit.

11. A urinal flushing and drainage system as described in claim 10, wherein the urinary stone adhesion measuring device is configured to include at least one of a camera that photographs the inside of the horizontal pipe and a distance sensor that measures the diameter of the flow section within the horizontal pipe through which liquid can pass.

12. A method for flushing and draining a urinal, comprising: supplying a chemical solution into a flushing water pipe through which flushing water flows, mixing the chemical solution with the flushing water and supplying the mixture to a urinal; supplying a surfactant into a horizontal pipe in a drainage pipe system through which wastewater that has passed through the urinal flows; and foaming and discharging the wastewater containing the chemical solution that has flowed into the horizontal pipe.

13. The urinal flushing and draining method according to claim 12, wherein the chemical solution and the surfactant are supplied during times when the urinal is least frequently used.

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