Film provided with heating wire having metal pattern and manufacturing method thereof

Abstract

The present invention relates to: a film provided with a heating wire having a metal pattern; and a manufacturing method thereof, wherein a metal layer having a metal pattern is formed by depositing a conductive metal on a transparent substrate, and the metal layer is made to function as a heating wire by supplying same with power. According to the present invention, the metal pattern can be made to function as a heating wire to prevent fogging and thereby ensure visibility.

Description

Film having a heating wire with a metal pattern and a method for manufacturing the same

[0001] The present invention relates to a film equipped with a heating wire and a method for manufacturing the same, and more particularly, to a film equipped with a heating wire and a method for manufacturing the same, wherein a metal layer having a metal pattern formed by depositing a conductive metal on a transparent substrate and supplying power to the metal layer so as to act as a heating wire is formed.

[0002] Water droplets and fog frequently form on glass and plastic surfaces in buildings, bathroom windows, and automobiles. When these droplets or fog form, they cause diffuse reflection, reducing the surface's transmittance and blurring the field of vision, reducing visibility.

[0003] Much research has been conducted to prevent water droplets from forming on glass or plastic, thereby reducing visibility. Specifically, methods such as supplying hot air to the surface of glass or plastic or attaching heating coils to the surface have been utilized.

[0004] However, this method requires a separate device to supply hot air, which increases costs and poses a productivity issue. Furthermore, attaching the heating coil to the surface of glass or plastic makes it difficult to apply in applications requiring transparency due to the heating coil.

[0005] Meanwhile, a method exists for securing optical transparency by layering a metal mesh structure formed by etching onto a transparent substrate. However, achieving excellent optical properties requires a fine and dense mesh, which poses challenges.

[0006] The present invention is intended to solve such a problem, and the problem to be solved by the present invention is to provide a film having a heat wire having a metal pattern formed by depositing a conductive metal on a transparent substrate, and supplying power to the metal layer to act as a heat wire, and a method for manufacturing the same.

[0007] A film having a heating wire having a metal pattern according to the present invention comprises: a transparent substrate; and a metal layer having a metal pattern formed by depositing a conductive metal on one surface of the substrate; wherein the metal layer is characterized in that it functions as a heating wire by being connected to a power terminal.

[0008] It is preferable that the above-mentioned material comprises glass or a flexible polymer.

[0009] The metal forming the above metal pattern may include one or more elements selected from nickel (Ni), chromium (Cr), iron (Fe), copper (Cu), platinum (Pt), gold (Au), thallium (Ta), and titanium (Ti).

[0010] It is preferable that the metal pattern of the above metal layer have a size of 0.1 ㎛ to 100 ㎛.

[0011] The shape of the above metal pattern can be formed in various shapes, including polygons or circles, including triangles, squares, pentagons, hexagons, octagons, decagons, and dodecagons.

[0012] The above metal pattern may be formed by partially overlapping polygons or circles, including triangles, squares, pentagons, hexagons, octagons, decagons, and dodecagons.

[0013] A method for manufacturing a film having a heat wire having a metal pattern according to the present invention is characterized by including a pattern mask generation step of generating a pattern mask having a predetermined pattern; a substrate preparation step of preparing a transparent substrate; a metal layer formation step of forming a metal layer having the predetermined pattern on top of the transparent substrate; and a heat wire formation step of forming a heat wire by applying power to the metal layer.

[0014] In the above pattern mask generation step, a pattern mask having a polygonal or circular pattern including a triangle, a square, a pentagon, a hexagon, an octagon, a decagon, and a dodecagon is generated.

[0015] The metal layer forming step comprises a metal layer deposition step of depositing a metal on top of the transparent substrate to deposit a metal layer; a photoresist applying step of applying photoresist on top of the deposited metal layer; a photolithography step of forming a pattern mask having a predetermined pattern formed on top of the photoresist and then irradiating light; a metal pattern forming step of etching the metal layer to form a predetermined metal pattern; and a photoresist removing step of removing the photoresist.

[0016] The above metal layer forming step may further include a plasma treatment step of plasma treating a portion of the transparent substrate where the metal pattern is not formed.

[0017] The above metal pattern forming step can form a metal pattern using a dry etching method.

[0018] According to the film equipped with a heating wire having a metal pattern according to the present invention, a metal layer having a metal pattern formed by depositing a conductive metal on a transparent substrate and supplying power to the metal layer so that the metal pattern acts as a heating wire has the effect of preventing fogging and thereby ensuring visibility.

[0019] FIG. 1 is a schematic plan view of a film having a heating wire having a metal pattern according to one embodiment of the present invention.

[0020] FIG. 2 is a schematic plan view of a film having a heating wire having a metal pattern according to another embodiment of the present invention.

[0021] Figure 3 is a process flow diagram of one embodiment of a method for manufacturing a film equipped with a heating wire having a metal pattern according to the present invention.

[0022] FIG. 4 is a drawing for explaining a metal layer forming step of a method for manufacturing a film equipped with a heating wire having a metal pattern according to the present invention.

[0023] The advantages and features of the present invention, and the methods for achieving them, will become clearer with reference to the embodiments described in detail below together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below and may be implemented in various different forms. These embodiments are provided only to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention, and the present invention is defined only by the scope of the claims. Like reference numerals designate like elements throughout the specification.

[0024] Hereinafter, the present invention will be described in detail with reference to the drawings.

[0025] FIG. 1 is a schematic plan view of a film (100) equipped with a heating wire having a metal pattern according to one embodiment of the present invention, and FIG. 2 is a schematic plan view of a film (100) equipped with a heating wire having a metal pattern according to another embodiment of the present invention.

[0026] Fig. 1 shows an embodiment in which metal patterns do not overlap, and Fig. 2 shows an embodiment in which metal patterns overlap.

[0027] As shown in FIGS. 1 and 2, a film (100) having a heating wire having a metal pattern according to one embodiment of the present invention comprises a transparent substrate (110), a metal layer (120), a first electrode (131), a second electrode (132), and a power supply unit (140).

[0028] It is formed on one side of the above-mentioned substrate (110) and comprises a metal layer (120) having a metal pattern of a predetermined shape.

[0029] At this time, the substrate (410) may be transparent, such as glass or polymer, and the material may include one or more elements selected from SiO2 and Al2O3. In addition, the substrate (110) is not limited to being hard, and may also be a flexible material that can be deformed, such as by bending or folding.

[0030] The above metal layer (120) is formed on one surface of the above substrate (110) and has a metal pattern of a predetermined shape.

[0031] It is preferable that the above metal layer (120) be made of a material that is not easily corroded in an external environment, and may include one or more elements selected from nickel (Ni), chromium (Cr), iron (Fe), copper (Cu), platinum (Pt), gold (Au), thallium (Ta), and titanium (Ti).

[0032] It is preferable that the metal pattern of the above metal layer (120) has a size of 0.1 ㎛ to 100 ㎛.

[0033] The shape of the metal pattern of the above metal layer (120) can be formed in various forms, such as polygons or circles, including triangles, squares, pentagons, hexagons, octagons, decagons, and dodecagons. In this case, polygons or circles, including triangles, squares, pentagons, hexagons, octagons, decagons, and dodecagons, may partially overlap to form a metal pattern.

[0034] The first electrode (131) and the second electrode (132) are connected to the metal layer (120) having the metal pattern, and receive power from the power supply unit (140) to pass current through the metal layer (120) having the metal pattern, thereby allowing the metal layer (120) having the metal pattern to operate as a heating wire.

[0035] Meanwhile, it is preferable to treat the surface of the non-metallized portion of the upper portion of the transparent substrate (110) where no metal pattern is formed using plasma. The plasma treatment treats the portion of the surface of the substrate (110) where no metal pattern is formed using RF plasma in a vacuum state.

[0036] In this way, when plasma treatment is performed on a part of the surface of the substrate (110) where a metal pattern is not formed, there is an effect of more effectively preventing the fogging phenomenon.

[0037] FIG. 3 is a process flow diagram of one embodiment of a method for manufacturing a film equipped with a heating wire having a metal pattern according to the present invention, and FIG. 4 is a drawing for explaining a metal layer forming step of a method for manufacturing a film equipped with a heating wire having a metal pattern according to the present invention.

[0038] As illustrated in FIG. 3, a method (300) for manufacturing a film having a heat wire having a metal pattern according to one embodiment of the present invention comprises a pattern mask creation step (S310), a substrate preparation step (S320), a metal layer formation step (S330), and a heat wire formation step (S340).

[0039] The above pattern mask generation step (S310) generates a pattern mask having a predetermined pattern.

[0040] The above pattern mask generation step (S310) generates a pattern mask having a polygonal or circular pattern including a triangle, a square, a pentagon, a hexagon, an octagon, a decagon, and a dodecagon.

[0041] In the substrate preparation step (S320), a transparent substrate on which a metal pattern will be formed is prepared after a pattern mask is created. At this time, the substrate may be transparent, such as glass or polymer, and the material may include one or more elements selected from SiO2 and Al2O3.

[0042] In the metal layer forming step (S330), a metal layer having a pattern of a predetermined shape is formed on the upper part of the transparent substrate using a pattern mask.

[0043] As illustrated in FIG. 4, the metal layer forming step (S330) includes a metal layer deposition step (S331), a photoresist application step (S332), a photolithography step (S333), a metal pattern forming step (S334), and a photoresist removal step (S335).

[0044] In the metal layer deposition step (S331), a metal is deposited on top of a transparent substrate (110) to deposit a metal layer (120). At this time, glass or a flexible polymer may be used as the transparent substrate (110). The metal deposited on top of the transparent substrate (110) may include one or more elements selected from nickel (Ni), chromium (Cr), iron (Fe), copper (Cu), platinum (Pt), gold (Au), thallium (Ta), and titanium (Ti).

[0045] In the photoresist application step (S332), photoresist (130) is applied on top of the metal layer (120).

[0046] In the photolithography step (S333), a pattern mask having a pattern formed on the upper portion of the photoresist (130) is formed and then light is irradiated.

[0047] In the metal pattern formation step (S334), the metal layer (120) is etched to form a metal pattern. At this time, it is preferable to mainly use a dry etching method for the etching.

[0048] In the photoresist removal step (S335), the photoresist is removed according to a known method.

[0049] Although not illustrated in FIG. 4, a plasma treatment step may further be included in which a portion of the transparent substrate (110) on which the metal pattern is not formed is subjected to plasma treatment using RF plasma in a vacuum state. In this way, when a portion of the surface of the substrate (110) on which the metal pattern is not formed is subjected to plasma treatment, there is an effect of further improving the anti-fogging effect.

[0050] In the heat wire formation step (S340), power is applied to the metal layer so that the metal pattern acts as a heat wire.

Claims

1. Transparent substrate; and A metal layer having a metal pattern formed by depositing a conductive metal on one surface of the above-mentioned substrate; A film having a heating wire having a metal pattern characterized in that the metal layer acts as a heating wire when a power terminal is connected thereto.

2. In the first paragraph, the description is A film having a metal pattern comprising a heating element comprising glass or a flexible polymer.

3. In the first paragraph, the metal forming the metal pattern is A film having a heating wire having a metal pattern characterized by including at least one element selected from nickel (Ni), chromium (Cr), iron (Fe), copper (Cu), platinum (Pt), gold (Au), thallium (Ta), and titanium (Ti).

4. In the first paragraph, the metal pattern of the metal layer A film having a heat wire having a metal pattern characterized by a size of 0.1㎛ to 100㎛.

5. In the first paragraph, the shape of the metal pattern is A film having a heat wire having a metal pattern characterized by being polygonal or circular, including triangles, squares, pentagons, hexagons, octagons, decagons and dodecagons.

6. In the fifth paragraph, the metal pattern A film having a heat wire having a metal pattern characterized in that polygons or circles, including triangles, squares, pentagons, hexagons, octagons, decagons and dodecagons, are formed by overlapping each other.

7. A pattern mask generation step for generating a pattern mask having a predetermined pattern; Substrate preparation stage for preparing transparent substrate; A metal layer forming step of forming a metal layer having the predetermined pattern on top of the transparent substrate; and A method for manufacturing a film having a heating wire having a metal pattern, characterized in that it includes a heating wire forming step of forming a heating wire by applying power to the metal layer.

8. In the 7th paragraph, the pattern mask generation step A method for manufacturing a film having a metal pattern provided with a heating wire, characterized in that it is a step of generating a pattern mask having a polygonal or circular pattern including a triangle, a square, a pentagon, a hexagon, an octagon, a decagon, and a dodecagon.

9. In the 7th paragraph, the metal layer forming step A metal layer deposition step of depositing a metal layer by depositing a metal on top of the transparent substrate; A photoresist application step of applying photoresist on top of the deposited metal layer; A photolithography step of forming a pattern mask having a predetermined pattern formed on the upper part of the photoresist and then irradiating light; A metal pattern forming step of forming a predetermined metal pattern by etching the metal layer through etching; and A method for manufacturing a film having a heat wire having a metal pattern, characterized in that it comprises a photoresist removal step of removing the photoresist.

10. In the 9th paragraph, the metal layer forming step Among the above transparent materials, the part where the metal pattern is not formed is plasma A metal pattern characterized by further comprising a plasma treatment step for treating the metal pattern. A method for manufacturing a film equipped with a heating wire.

11. In the 9th paragraph, the metal pattern forming step A metal pattern characterized by forming a metal pattern using a dry etching method. A method for manufacturing a film equipped with a heating wire.

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