Circulating cleaning and maintenance system for vacuumizing device and use method

By combining the circulating airflow driven by the vacuum pump with the liquid supply unit, the problems of poor cleaning effect and high cost of vacuum pumping devices are solved, achieving efficient and low-cost cleaning and maintenance, and ensuring the stable operation of the equipment.

WO2026007571A1PCT designated stage Publication Date: 2026-01-08SUZHOU JIADELU MECHANICAL & ELECTRICAL TECHNOLOGY CO LTD

Patent Information

Application Number
PCT/CN2025/096722
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2024-07-05
Filing Date
2025-05-23
Publication Date
2026-01-08

AI Technical Summary

Technical Problem

Existing vacuum pumping devices suffer from problems such as poor cleaning effect, high cost, and significant environmental impact during the cleaning process. Traditional methods cannot effectively clean the media adhering to the inside.

Method used

Using the vacuum pump itself as a power source, a high-speed circulating airflow is formed through the circulation pipe, which disperses the cleaning fluid into the airflow to thoroughly clean the vacuum device. Combined with the liquid supply unit, cleaning fluid and maintenance fluid are provided to achieve automated control.

Benefits of technology

It achieves efficient and low-cost cleaning results, reduces the amount of cleaning fluid used, minimizes environmental impact, and improves the automation level and operational stability of the equipment.

✦ Generated by Eureka AI based on patent content.

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Abstract

A circulating cleaning and maintenance system for a vacuumizing device, the circulating cleaning and maintenance system comprising a vacuumizing unit and a liquid supply unit, wherein the vacuumizing unit comprises a vacuumizing device composed of at least a vacuum pump, an air inlet of the vacuum pump is connected, via a main-path air intake pipe, to an area where a medium to be evacuated is located, a main air intake valve is provided on the main-path air intake pipe, and an air outlet is connected to a main-path air output pipe and is provided with a main air output valve; an external air intake pipe is provided between the main air intake valve and the vacuum pump, and an atmospheric intake valve is arranged on the external air intake pipe; a circulating pipe is provided on one side of the vacuum pump, and a circulating valve is provided on the circulating pipe; and the liquid supply unit is configured to provide a cleaning liquid or a maintenance liquid to the vacuumizing unit. Further disclosed in the present invention is a use method for the circulating cleaning and maintenance system for a vacuumizing device. According to the present invention, the vacuum pump itself is used as a power source for cleaning, and in cooperation with the circulating pipe, forms a circulating airflow flowing at a high speed, so as to stir and disperse the cleaning liquid into the airflow to completely flush and clean the vacuum pump. A cleaning effect is good, the cost is low, the use time is short, and fully automated cleaning and maintenance can be achieved.
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Description

Vacuum device circulating cleaning and maintenance system and use method TECHNICAL FIELD

[0001] The present application relates to the technical field of vacuum pump equipment, in particular to a vacuum device circulating cleaning and maintenance system and use method. BACKGROUND

[0002] In industrial processing and manufacturing, media composed of a large amount of waste gas and fine particles are often generated, especially in film processing, photovoltaic manufacturing and pharmaceutical packaging processes, unstable low molecular polymers and pharmaceutical powders are generated; in order to prevent these media from affecting the quality of production and processing, the above-mentioned media needs to be removed from the processing area by a vacuum device during production.

[0003] However, due to the high temperature of the vacuum device during operation, when the vacuum device stops running, some media will adhere to the inside of the vacuum device as the temperature decreases, in order to ensure the hygiene and stable operation of the vacuum device, it needs to be cleaned regularly.

[0004] There are mainly two kinds of traditional cleaning methods, one is to disassemble the vacuum device and clean and maintain the inside of the vacuum device by a cleaning device, the cleaning liquid conveying power of this method is provided by the external cleaning device, so that the flow of the cleaning liquid is limited by the internal rotating blade structure of the vacuum device, the cleaning time is extremely long, and the dirt is easy to remain in the dead angle of the vacuum device after cleaning; the other method is to inject cleaning liquid into the vacuum device under the running state, and use the high-speed running vacuum device to contact the cleaning liquid for rapid cleaning, this method is fast, but due to the short contact time between the cleaning liquid and the vacuum device, it cannot guarantee the cleaning effect of the vacuum device, and if the supply amount of the cleaning liquid is increased, the cleaning cost will be greatly increased, and a large amount of cleaning liquid discharged into the air will also increase the impact on the environment.

[0005] Therefore, in view of the deficiencies of the prior art, it is necessary to design a vacuum device circulating cleaning and maintenance system and use method to solve the above problems.

[0006] It should be noted that the above introduction to the technical background is only to facilitate the clear and complete description of the technical scheme of the present application, and to facilitate the understanding of those skilled in the art, and the above content cannot be considered as known to those skilled in the art only because the above content is described in the background of the present application. SUMMARY

[0007] In order to overcome the deficiencies in the prior art, the present application aims to disclose a vacuum device circulating cleaning and maintenance system and use method for ensuring the stable operation of the vacuum device.

[0008] The application discloses a circulating cleaning and maintenance system for a vacuumizing device, which comprises a vacuumizing unit and a liquid supply unit, wherein:

[0009] The vacuumizing unit comprises a vacuumizing device composed of at least one vacuum pump, an air inlet of the vacuum pump is connected to a medium area to be vacuumized through a main air inlet pipe for air extraction and impurity removal, an air inlet total valve is arranged on the main air inlet pipe, an air outlet of the vacuum pump is connected with a main air outlet pipe, and an air outlet total valve is arranged on the main air outlet pipe; a circulating pipe is arranged on one side of the vacuum pump, two ends of the circulating pipe are connected with the air inlet and the air outlet of the vacuum pump respectively, and a circulating valve is arranged on the circulating pipe.

[0010] The liquid supply unit comprises a cleaning liquid supply device for supplying cleaning liquid, an output end of the cleaning liquid supply device is communicated with the main air inlet pipe and located between the air inlet total valve and the air inlet of the vacuum pump.

[0011] The above structure utilizes the vacuum pump itself as a power source, forms a circulating air flow through the circulating pipe, and stirs the added cleaning liquid into the circulating air flow by the high-speed rotating vacuum pump, so that the vacuumizing device is cleaned comprehensively and thoroughly.

[0012] Preferably, the liquid supply unit further comprises a maintenance liquid supply device for supplying maintenance liquid, an output end of the maintenance liquid supply device is communicated with the main air inlet pipe and located between the air inlet total valve and the air inlet of the vacuum pump.

[0013] Preferably, an external air inlet pipe is arranged between the air inlet total valve and the vacuum pump, and an air inlet valve is arranged on the external air inlet pipe.

[0014] Preferably, the vacuumizing unit in the circulating cleaning and maintenance system can be two groups or more, the vacuumizing units are arranged side by side, and the liquid supply unit is connected to each group of vacuumizing units. Different vacuumizing units can be switched to clean and maintain the vacuum pumps in the vacuumizing units without stopping the air extraction and impurity removal operation on the medium area to be vacuumized.

[0015] Preferably, a branch filter for filtering impurities is further arranged on the circulating pipe, and two circulating valves are arranged at two ends of the branch filter. The branch filter can avoid impurities from entering the vacuumizing device again through the circulating channel to cause secondary pollution, and the circulating valves at two ends of the branch filter can make the branch filter more convenient to disassemble and maintain.

[0016] Preferably, a main filter is arranged on the main air inlet pipe away from the vacuum pump on the side of the air inlet total valve, so as to collect fine impurities in the air flow and reduce the cleaning frequency of the vacuumizing unit.

[0017] The preferred technical scheme is that a three-way valve is used to replace the combination of the intake total valve and the adjacent circulation valve at the end of the main intake pipe, and a three-way valve is used to replace the combination of the exhaust total valve and the adjacent circulation valve at the end of the main exhaust pipe.

[0018] The application discloses a use method of a circulating cleaning and maintenance system of a vacuumizing device.

[0019] S1, the vacuum pump is closed, then the circulation valve is opened and other valves except the circulation valve are closed, so that the vacuum pump and the circulation pipe form a closed circulation gas path.

[0020] S2, the vacuum pump is started, and a certain amount of cleaning liquid is delivered to the vacuumizing unit by controlling the liquid supply unit, so that cleaning is started; the cleaning liquid enters the circulation gas path and is driven by a high-speed circulating airflow in the circulation gas path to perform high-speed circulating flushing on the vacuum pump, so that the cleaning effect is improved.

[0021] S3, after the cleaning is completed, the vacuum pump is closed, the intake total valve or the air intake valve is opened, the exhaust total valve is opened, and then the vacuum pump is started to dry the inside of the vacuumizing unit.

[0022] S4, after the above steps are completed, the vacuum pump is closed, the intake total valve and the exhaust total valve are in an open state, and the remaining valves in the above steps are closed, so that the vacuum pump is connected to the medium area to be vacuumized again.

[0023] The preferred technical scheme is that after the drying is completed in step S3, the following steps are further included.

[0024] S301, after the drying is completed, the vacuum pump is closed, then the circulation valve is opened and other valves except the circulation valve are closed, so that the vacuum pump and the circulation pipe form a closed circulation gas path again, and then the vacuum pump is started, and a certain amount of maintenance liquid is delivered to the vacuumizing unit by controlling the liquid supply unit, so that maintenance is started.

[0025] The preferred technical scheme is that the opening and closing of the intake total valve, the exhaust total valve, the air intake valve, the circulation valve and the liquid supply unit can be automatically controlled through the control console, so that the degree of automation of the equipment is improved and the labor cost is reduced.

[0026] Due to the use of the above technical scheme, the circulating cleaning and maintenance system of the vacuumizing device and the use method have the following beneficial effects.

[0027] The vacuum pump is used as a cleaning power source, and a high-speed circulating airflow is formed in cooperation with the circulation pipe, so that the cleaning liquid is stirred into the airflow and the inside of the vacuum pump is comprehensively flushed and cleaned, the cleaning effect is good, and the time is short.

[0028] The use amount of the cleaning liquid and the maintenance liquid is reduced by using the circulating cleaning and maintenance, so that the cleaning and maintenance cost is reduced, and the cleaning operation and the maintenance operation can be freely switched by controlling the liquid supply unit. BRIEF DESCRIPTION OF DRAWINGS

[0029] Fig. 1 is a flow chart of the method for using the vacuum device circulating cleaning and maintenance system of the present application;

[0030] Fig. 2 is a schematic diagram of the structure of the vacuum device circulating cleaning and maintenance system of the present application in Example 1;

[0031] Fig. 3 is a schematic diagram of the structure of the vacuum device circulating cleaning and maintenance system of the present application in Example 2;

[0032] Fig. 4 is a schematic diagram of the structure of the vacuum device circulating cleaning and maintenance system of the present application in Example 3;

[0033] Fig. 5 is a schematic diagram of the structure of the vacuum device circulating cleaning and maintenance system of the present application in Example 4.

[0034] In the above drawings, 100, region of medium to be pumped; 1, vacuum pumping unit; 11, vacuum pump; 12, main path air inlet pipe; 12a, air inlet total valve; 12b, main path filter; 13, main path air outlet pipe; 13a, air outlet total valve; 14, external air inlet pipe; 14a, air inlet valve; 15, circulating pipe; 15a, circulating valve; 15b, branch path filter; 16, three-way valve; 2, liquid supply unit; 21, cleaning liquid supply device; 22, maintenance liquid supply device. DETAILED DESCRIPTION

[0035] The implementation of the present application will be described in detail by specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the content disclosed in the description.

[0036] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship commonly placed when the product of the present application is used, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "horizontal", "vertical", "overhanging", and the like do not mean that the components must be absolutely horizontal or overhanging, but can be slightly inclined. For example, "horizontal" only means that its direction is relatively more horizontal than "vertical", and does not mean that the structure must be completely horizontal, but can be slightly inclined.

[0037] In the description of the present application, it is also necessary to explain that, unless otherwise explicitly specified and limited, the terms "set", "install", "connect", "connect" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrally connected, it can be mechanically connected, or it can be electrically connected, it can be directly connected, or it can be indirectly connected through an intermediate medium, it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances Embodiment

[0038] As shown in Figure 2, a circulating cleaning and maintenance system of the vacuum device is disclosed in the present application, which is used to ensure that the vacuum device stably removes impurities from the medium area 100 to be pumped. The circulating cleaning and maintenance system comprises a vacuum pumping unit 1 and a liquid supply unit 2. The main components of the above-mentioned application will be described in detail as follows:

[0039] As shown in Figure 2, the vacuum pumping unit 1 comprises a vacuum device composed of a vacuum pump 11. It should be noted that the above structure is only exemplary and not limiting. In the present embodiment, the vacuum device is composed of a vacuum pump 11, but in other embodiments, the vacuum device can also be a pump group composed of two or more vacuum pumps 11 in series or parallel. The air inlet of the vacuum pump 11 is connected to the medium area 100 to be pumped through the main air inlet pipe 12 for air removal. The main air inlet pipe 12 is provided with an air inlet total valve 12a. The air outlet of the vacuum pump 11 is connected with the main air outlet pipe 13, and the main air outlet pipe 13 is provided with an air outlet total valve 13a. An external air inlet pipe 14 is provided between the air inlet total valve 12a and the vacuum pump 11. The external air inlet pipe 14 is provided with an air inlet valve 14a. The circulating pipe 15 is provided on one side of the vacuum pump 11. The two ends of the circulating pipe 15 are connected with the air inlet and air outlet of the vacuum pump 11 respectively. The circulating valve 15a is provided on the circulating pipe 15.

[0040] As shown in Figure 2, the liquid supply unit 2 comprises a cleaning liquid supply device 21 for providing cleaning liquid and a maintenance liquid supply device 22 for providing maintenance liquid. The output end of the cleaning liquid supply device 21 is communicated with the main air inlet pipe 12 and located between the air inlet total valve 12a and the air inlet of the vacuum pump 11. The output end of the maintenance liquid supply device 22 is communicated with the main air inlet pipe 12 and located between the air inlet total valve 12a and the air inlet of the vacuum pump 11. It should be noted that in the present embodiment, the liquid supply unit 2 comprises the cleaning liquid supply device 21 and the maintenance liquid supply device 22, but in other embodiments, the liquid supply unit 2 can only comprise the cleaning liquid supply device 21.

[0041] Referring to Figures 1 and 2, the use method of the circulating cleaning and maintenance system of the vacuum device disclosed in the present application is as follows:

[0042] S1, close the vacuum pump 11, then open the circulation valve 15a and close other valves except the circulation valve 15a, so that the vacuum pump 11 and the circulation pipe 15 form a closed circulation gas path.

[0043] S2, open the vacuum pump 11, and control the liquid supply unit 2 to deliver a certain amount of cleaning liquid to the vacuum pumping unit 1, and start cleaning.

[0044] S3, after the vacuum pump 11 is washed by the cleaning liquid for a period of time, it is closed, the inlet valve 12a or the air inlet valve 14a is opened, and the outlet valve 13a is opened, and then the vacuum pump 11 is started to dry the inside of the vacuum pumping unit 1.

[0045] S301, after the drying is completed, the vacuum pump 11 is closed, then the circulation valve 15a is opened and other valves except the circulation valve 15a are closed, so that the vacuum pump 11 and the circulation pipe 15 form a closed circulation gas path again, and then the vacuum pump 11 is started and the liquid supply unit 2 is controlled to deliver a certain amount of maintenance liquid to the vacuum pumping unit 1, and start maintenance.

[0046] S4, after the above steps are completed, the vacuum pump 11 is closed, the inlet valve 12a and the outlet valve 13a are opened, and the remaining valves in the above are closed, and the vacuum pumping device formed by the vacuum pump 11 is reconnected to the medium area 100 to be pumped. Embodiment

[0047] As shown in FIG. 1 and FIG. 3, the difference from the first embodiment is that an air inlet pipe 14 is provided between the inlet valve 12a and the vacuum pump 11, and the air inlet valve 14a is provided on the air inlet pipe 14; in step S3, the inlet valve 12a is kept closed, and the air inlet valve 14a is opened to communicate with the outside through the air inlet pipe 14; the circulation pipe 15 is provided with a branch filter 15b for filtering impurities; the number of circulation valves 15a is two, and the two circulation valves 15a are respectively arranged at both ends of the branch filter 15b, which is used to avoid the impurities entering the vacuum pumping device again to cause secondary pollution through the circulation channel; at the same time, it is convenient for disassembly and maintenance of the branch filter; the main inlet pipe 12 away from the vacuum pump 11 side of the inlet valve 12a is provided with a main filter 12b for collecting fine impurities in the gas flow, reducing the cleaning frequency of the vacuum pumping unit. Embodiment

[0048] As shown in FIG. 1 and FIG. 4, the difference from the first embodiment is that the vacuum pumping unit 1 in the circulation cleaning and maintenance system can be two or more groups, and the vacuum pumping units 1 are arranged side by side, and each group of vacuum pumping units 1 is connected with a liquid supply unit 2, and when cleaning, different vacuum pumping units 1 can be switched to clean, so as to ensure the continuous operation of the medium area 100 to be pumped. Embodiment

[0049] As shown in Figs. 1, 2 and 5, the difference from the first embodiment is that the combination of the intake main valve 12a and the adjacent circulation valve 15a is replaced by the three-way valve 16 at the end of the intake main pipe 12; and the combination of the exhaust main valve 13a and the adjacent circulation valve 15a is replaced by the three-way valve 16 at the end of the exhaust main pipe 13.

[0050] The above embodiments are only illustrative of the principles and effects of the present application, and are not intended to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes made by those skilled in the art without departing from the spirit and technical ideas disclosed by the present application should be covered by the claims of the present application.

Claims

1. A vacuum device circulation cleaning maintenance system for ensuring stable treatment of a medium area to be evacuated by evacuation of impurities, characterized in that: The circulating cleaning and maintaining system comprises a vacuum pumping unit (1) and a liquid supply unit (2), wherein: The vacuum pumping unit (1) comprises a vacuum pumping device composed of at least one vacuum pump (11), an air inlet of the vacuum pump (11) is connected to a medium area to be pumped for air pumping and impurity removal through a main air inlet pipe (12), a main air inlet valve (12a) is arranged on the main air inlet pipe (12), an air outlet of the vacuum pump (11) is connected with a main air outlet pipe (13), a main air outlet valve (13a) is arranged on the main air outlet pipe (13); a circulating pipe (15) is arranged on one side of the vacuum pump (11), two ends of the circulating pipe (15) are connected with the air inlet and the air outlet of the vacuum pump (11) respectively, and a circulating valve (15a) is arranged on the circulating pipe (15); The liquid supply unit (2) comprises a cleaning liquid supply device (21) for providing cleaning liquid, an output end of the cleaning liquid supply device (21) is communicated with the main air inlet pipe (12) and located between the main air inlet valve (12a) and the air inlet of the vacuum pump (11).

2. A vacuum device circulating service system according to claim 1, wherein: The liquid supply unit (2) further comprises a maintaining liquid supply device (22) for providing maintaining liquid, an output end of the maintaining liquid supply device (22) is communicated with the main air inlet pipe (12) and located between the main air inlet valve (12a) and the air inlet of the vacuum pump (11).

3. A vacuum device circulating service system according to claim 1, wherein: The main air inlet valve (12a) and the vacuum pump (11) are connected with an external air inlet pipe (14) which is connected to the air, and an air inlet valve (14a) is arranged on the external air inlet pipe (14).

4. A vacuum device circulating service system according to claim 1, wherein: The vacuum pumping unit (1) in the circulating cleaning and maintaining system can be two or more groups, the vacuum pumping units (1) are arranged side by side, and the liquid supply unit (2) is connected to each group of the vacuum pumping units (1).

5. A vacuum device circulating cleaning maintenance system according to claim 1, wherein: The circulating pipe (15) is further provided with a branch filter (15b) for filtering impurities; the number of the circulating valves (15a) is two, and the two circulating valves (15a) are arranged at two ends of the branch filter (15b) respectively.

6. A vacuum device circulating service system according to claim 1, wherein: The main air inlet pipe (12) on the side away from the vacuum pump (11) of the main air inlet valve (12a) is provided with a main air inlet filter (12b).

7. A vacuum pump circulating service system according to claim 1 wherein: A three-way valve (16) is used to replace the combination of the main air inlet valve (12a) and the adjacent circulating valve (15a) at the end of the main air inlet pipe (12); and a three-way valve (16) is used to replace the combination of the main air outlet valve (13a) and the adjacent circulating valve (15a) at the end of the main air outlet pipe (13).

8. A method of using a vacuum pump circulating cleaning maintenance system according to any one of claims 1 to 7, characterized in that The method comprises the following steps: S1, the vacuum pump (11) is closed, then the circulating valve (15a) is opened and other valves except the circulating valve (15a) are closed, so that the vacuum pump (11) and the circulating pipe (15) form a closed circulating air path; S2, the vacuum pump (11) is started, and the liquid supply unit (2) is controlled to deliver a certain amount of cleaning liquid to the vacuum pumping unit (1) to start cleaning; S3, after the cleaning, the vacuum pump (11) is closed, the intake valve (12a) or the air intake valve (14a) is opened, and the exhaust valve (13a) is opened, then the vacuum pump (11) is started to dry the inside of the vacuum unit (1); S4, after the above step is completed, the vacuum pump (11) is closed, the intake valve (12a) and the exhaust valve (13a) are opened, and the remaining valves are closed.

9. The method of claim 8, wherein the vacuum device is a vacuum cleaner. After the step S3 is completed, the following step is further included: S301, after the drying is completed, the vacuum pump (11) is closed, then the circulation valve (15a) is opened and the other valves are closed, the vacuum pump (11) and the circulation pipe (15) form a closed circulation gas path again, then the vacuum pump (11) is started, and the liquid supply unit (2) is controlled to deliver a certain amount of maintenance liquid to the vacuum unit (1), and the maintenance is started.

10. The method of claim 8, wherein: The opening and closing of the intake valve (12a), the exhaust valve (13a), the air intake valve (14a), the circulation valve (15a) and the liquid supply unit (2) can be automatically controlled by program software.

Citation Information

Patent Citations

  • Vacuum system and pipeline cleaning method

    CN113351591A

  • Circulating cleaning and maintaining system for vacuumizing device and using method of circulating cleaning and maintaining system

    CN118669297A

  • Vacuum pump cleaning system and diffusion furnace

    CN216741902U

  • Roots vacuum pump cleaning device in biodiesel production

    CN218282904U

  • Vacuumizing device with novel circulating cleaning and maintaining structure

    CN222848322U

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