Composition, surface treatment agent, article, method for producing article, and compound

Abstract

Provided is a composition capable of forming a surface treatment layer having excellent water repellency.　Provided is a composition which contains a first compound and a second compound. The first compound is a compound having a group represented by formula (T) and a group represented by formula (S). The second compound is a compound represented by formula (B1) or formula (E1).　Formula (T): (R1)3M1-Q1-(SiR2 2-O)p1. Formula (S): -Si(R6)nL3-n. Formula (B1): T11-Q12-R16-Q13-T12.Formula (E1):(Re1)3Me1-Ze1-Me2(Re2)3. Here, reference symbols in the formulae are as defined in the description.

Description

Composition, surface treatment agent, article, method for manufacturing article, and compound

[0001] The present disclosure relates to compositions, surface treatments, articles, methods for making articles, and compounds.

[0002] In recent years, in order to improve appearance and visibility, technologies for making the surfaces of optical articles less susceptible to fingerprints and technologies for making them easier to remove dirt have become widespread in eyeglass lenses, wearable devices, touch panel displays, etc. As a specific method for improving performance such as appearance and visibility, a method of performing surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes a specific siloxane group-containing silane compound having a divalent linear organopolysiloxane group and a hydrolyzable silyl group.

[0004] International Publication No. 2023 / 017830

[0005] Surface treatment agents are required to have further improved fingerprint wiping properties.

[0006] The present disclosure has been made in consideration of the above circumstances, and aims to provide a composition and a surface treatment agent capable of forming a surface treatment layer with excellent water repellency, an article having a surface treatment layer with excellent water repellency, and a method for manufacturing the same.

[0007] The present disclosure includes the following aspects. <1> A composition containing a first compound and a second compound, wherein the first compound is a compound having a group represented by the following formula (T) and a group represented by the following formula (S), and the second compound is a compound represented by the following formula (B1) or the following formula (E1). (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １-R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and n is an integer of 0 to 2. (T １１ ) ｑ１１ -Q １２ -R １６ -Q １３ - (T １２ ) ｑ１２ ...(B1) where T １１ and T １２ are each independently a hydrogen atom, an alkyl group, an alkenyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently a hydrogen atom, an alkyl group, or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２are each independently an alkyl group, p11 are each independently an integer of 0 to 500, q11 are each independently an integer of 1 to 3, q12 are each independently an integer of 1 to 3, R １６ is an alkylene group, and Q １２ represents a single bond or a (q11+1)-valent linking group other than an alkylene group, １３ is a single bond or a (q12+1)-valent linking group excluding an alkylene group, provided that the compound represented by formula (B1) has a hydrocarbon chain having 18 or more carbon atoms. (R ｅ１ ) ３ M ｅ１ -Z ｅ１ -M ｅ２ (R ｅ２ ) ３ ...(E1) where R ｅ１ and R ｅ２ are each independently an alkyl group or (R ｅ４ ) ３ M ｅ１ -R ｅ５ - and R ｅ４ are each independently an alkyl group; R ｅ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M ｅ１ and M ｅ２ are each independently Si, Sn, Ge or C, ｅ１ represents a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. <2> The second compound is a compound represented by the following formula (B1), １１ and T １２ are each independently a hydrogen atom, an alkyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ <3> The composition according to <1>, wherein the T is a group represented by -. １２ <4> The composition according to <1> or <2>, wherein Q is a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group. １２ and Q １３are each independently a group represented by the following formula (Q1): ２１ -R ２１ -M １２ R １３ ３－ｑ２１ (-**) ｑ２１ …(Q1) However, Q ２１ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２１ is a single bond or an alkylene group, provided that Q ２１ When is a single bond, R ２１ is a single bond, and M １２ is Si, Sn, Ge or C, R １３ are each independently a hydrogen atom or an alkyl group, q21 is an integer of 1 to 3, * is R １６ ** is the bonding position with T １１ or T １２ <5> The composition according to any one of <1> to <4>, wherein the first compound contains an alkylene group having 19 or more carbon atoms. <6> The composition according to any one of <1> to <5>, wherein the first compound is represented by the following formula (A1): (T １ ) ｑ１ -Q ２ -R ７ -Q ３ -Si(R ６ ) ｎ L ３－ｎ ...(A1) where T １ is a group represented by the formula (T), and Q ２ represents a single bond or a (q1+1)-valent linking group other than an alkylene group, ３ is a single bond or a divalent linking group other than an alkylene group, and R ７represents an alkylene group having 19 or more carbon atoms, and q1 represents an integer of 1 to 3. <7> Q ２ is a group represented by the following formula (Q2): (**) ｑ１ -M ２ R ３ ３－ｑ１ -R ２２ -Q ２２ -* ... (Q2) However, M ２ is Si, Sn, Ge or C, R ３ are each independently a hydrogen atom or an alkyl group, ２２ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２２ is a single bond or an alkylene group, and q1 is an integer of 1 to 3. * is R ７ ** is the bonding position with T １ <8> Q ３ is a group represented by the following formula (Q3): ２３ -R ２３ -** ... (Q3) However, Q ２３ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２３ is a single bond or an alkylene group, * is R ７ ** is the bonding position with Si(R ６ ) ｎ L ３－ｎand the bonding position is a bonding position with the compound. <9> The composition according to any one of <1> to <8>, wherein the mass ratio of the first compound to the second compound is 5:95 to 95:5. <10> The composition according to any one of <1> to <9>, further comprising a liquid medium. <11> A surface treatment agent comprising the composition according to any one of <1> to <10>. <12> A method for producing an article, comprising treating a substrate with the surface treatment agent according to <11> to produce an article having a surface treatment layer formed on the substrate. <13> An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to <11>. <14> The article according to <13>, which is an optical member. <15> The article according to <13> or <14>, which is a display or a touch panel. <16> A compound represented by the following formula (B3): T １１ -Q １２ -R ３１ -Q １３ -T １２ ...(B3) However, T １１ is (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently an alkyl group or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, R ３１ is an alkylene group having 19 or more carbon atoms, and Q １２ and Q １３are each independently a single bond or a divalent linking group other than an alkylene group, １２ is a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

[0008] The present disclosure provides a composition and a surface treatment agent capable of forming a surface treatment layer with excellent water repellency, an article having a surface treatment layer with excellent water repellency, and a method for producing the same.

[0009] In the present disclosure, when a numerical range is indicated using "to", the numerical values ​​before and after "to" are included as the minimum and maximum values, respectively. In the present disclosure, when a numerical range is indicated in a stepped manner, the upper or lower limit value of one numerical range may be replaced with the upper or lower limit value of another stepped numerical range. Furthermore, in the numerical ranges described herein, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In the present disclosure, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In the present disclosure, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. In the present disclosure, the term "organo(poly)siloxane residue" refers to an organosiloxane residue or organopolysiloxane residue. In the present disclosure, "Me" represents a methyl group, and "Et" represents an ethyl group. In the present disclosure, when a chemical formula contains a plurality of identical symbols, the identical symbols may represent the same structure as each other, or may represent different structures within a specified range.

[0010] [Composition] The composition of the present disclosure is a composition containing a first compound and a second compound, wherein the first compound is a compound having a group (T) and a group (S) described below, and the second compound is a compound (B1) or a compound (E1) described below.

[0011] By using the composition of the present disclosure as a surface treatment agent, a surface treatment layer with excellent liquid repellency can be formed. The reason for this is unclear, but is presumed to be as follows. The first compound has a group (S) that has high adhesion to the substrate, so that a surface treatment layer that adheres to the substrate surface can be formed. In addition, since the group (T) of the first compound is arranged on the air interface side of the surface treatment layer, the surface treatment layer has excellent water repellency and oil repellency, and fingerprint wiping properties are improved. When the second compound is compound (B1), the group T that has high affinity with the group (T) can be formed. １１ and a relatively long-chain alkylene group R １６ When the present composition containing the first compound and the second compound is adhered to the surface of a substrate, the group (T) of the first compound having low surface tension and the group T of the second compound are bonded to the surface of a substrate. １１ In this case, when the second compound is the compound (B1), the alkylene group R １６ is arranged in the direction from the air interface to the surface of the substrate. １６ Along the line, the group (T) is likely to be arranged on the air interface side and the group (S) is likely to be arranged on the substrate side. Furthermore, when the second compound is compound (E1), compound (E1) has a high affinity with the group (T) of the first compound, and the first compound, together with compound (E1), is likely to be arranged with the group (T) side on the air interface side and the group (S) side on the substrate side. As a result, multiple first compounds are aligned on the substrate surface, resulting in excellent water and oil repellency and improved fingerprint wiping properties. Furthermore, the uniform orientation of the first compounds allows them to be arranged at high density on the substrate surface, thereby further improving durability, such as abrasion resistance. The second compound may be compound (B1) alone, compound (E1) alone, or a combination of compound (B1) and compound (E1). The above-mentioned effects are also exhibited when compound (B1) and compound (E1) are combined. Below, each component constituting the composition will be described in detail.

[0012] <First Compound> The first compound is a compound having a group represented by the following formula (T) and a group represented by the following formula (S): (R １ ) ３ M １ -Q １ -(SiR ２ ２-O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

[0013] R １ is an alkyl group, or (R ４ ) ３ M １ -R ５ - is. R １ The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R １ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0014] The above R ４ The alkyl group of the above R １ In order to further improve the liquid repellency, R４ The alkyl group in M ​​is preferably a methyl group or an ethyl group, and more preferably a methyl group. １ is Si, Sn, Ge or C. In terms of availability of raw materials, M １ is preferably Si or C.

[0015] The above R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. ５ The alkylene group of R may be linear or branched. ５ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２- etc. ５ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. ５ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or an alkylene group having 1 to 5 carbon atoms, and even more preferably an oxygen atom or an alkylene group having 1 to 4 carbon atoms.

[0016] Q １ is a single bond, an oxygen atom, or an alkylene group. １ The alkylene group may be linear or branched. １ The alkylene group in Q is preferably a linear alkylene group, more preferably a linear alkylene group having 1 to 6 carbon atoms. １ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - etc. １ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or a straight-chain alkylene group having 1 to 6 carbon atoms, and even more preferably an oxygen atom or a straight-chain alkylene group having 1 to 4 carbon atoms.

[0017] (SiR ２ ２ -O) ｐ１ represents an organo(poly)siloxane residue. ２The alkyl group in R may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. ２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0018] p1 is an integer of 0 to 500. From the viewpoint of improving liquid repellency, p1 is preferably 1 to 500, more preferably 3 to 350, even more preferably 3 to 200, particularly preferably 9 to 50, extremely preferably 11 to 30, and most preferably 11 to 25. On the other hand, from the viewpoint of improving durability, p1 is preferably 0 to 25, more preferably 0 to 10, even more preferably 0 to 2, particularly preferably 0 to 1, and extremely preferably 0.

[0019] The group (T) may be a group consisting of only hydrocarbons, or may be a group containing one or more elements selected from O, Si, Sn, and Ge.

[0020] The number of groups (T) in the first compound may be 1 or more, and preferably 1 to 3. When the first compound has two or more groups (T), it may have a structure in which one atom has multiple groups (T) as substituents, for example, as in the following group (T1): T ｑ１ -M ２ R ３ ３－ｑ１ -* (T1) where T is a group represented by the formula (T), and M ２ is Si, Sn, Ge or C, R ３ are each independently a hydrogen atom or an alkyl group, and q1 is an integer of 2 to 3. ２ R ３ ３－ｑ１ Q ２ constitutes part or all of the

[0021] The above M ２ is Si, Sn, Ge or C. In terms of availability of raw materials, M２ is preferably Si or C. ３ The alkyl group of R １ The alkyl group may be the same as the alkyl group in the above, and preferred embodiments are also the same.

[0022] Examples of the group (T1) include the following groups: where p is an integer of 1 to 500. Also, * indicates the bonding position to other groups.

[0023]

[0024] In the group (S), R ６ is a hydrocarbon group. ６ Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R ６ The hydrocarbon group is preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and more preferably a methyl group.

[0025] Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH through a hydrolysis reaction. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0026] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, dialkylamino groups, and isocyanato groups (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0027] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. Ｂ The hydrolyzable group represented by the formula (I) has the same meaning as the hydrolyzable group represented by L described above, and the preferred embodiments are also the same.

[0028] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. From the viewpoint of less outgassing during coating and superior storage stability of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms, and more preferably an ethoxy group or a methoxy group.

[0029] Each n is independently an integer of 0 to 2. n is preferably 0 or 1, and more preferably 0. The presence of a plurality of Ls strengthens the adhesion of the surface treatment layer to the substrate. When n is 1 or less, the plurality of Ls present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that the plurality of Ls are the same. When n is 2, the plurality of Rs present in one molecule ６ may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of R ６ are preferably the same.

[0030] The first compound preferably contains an alkylene group having 19 or more carbon atoms. It is presumed that the inclusion of such a relatively long-chain alkylene group in the first compound facilitates the formation of a densely aligned array of first compounds in the surface treatment layer, in which the group (S) is located on the substrate surface side and the group (T) is located on the air interface side. As a result, the liquid repellency and fingerprint wiping ability are further improved, and the abrasion resistance is also improved.

[0031] In an alkylene group having 19 or more carbon atoms, the upper limit of the carbon number is not particularly limited, but may be, for example, 100 or less, and is preferably 36 or less from the viewpoint of ease of production of the first compound. The alkylene group having 19 or more carbon atoms may be linear or branched, but is preferably a linear alkylene group from the viewpoint of facilitating high-density alignment of the first compound. In the case of a branched alkylene group, the number of carbon atoms excluding the branch carbons (the number of secondary carbons connected) is preferably 19 or more.

[0032] The first compound is preferably a compound represented by the following formula (A1) from the viewpoint of further improving liquid repellency, fingerprint wiping removability, and abrasion resistance. １ ) ｑ１ -Q ２ -R ７ -Q ３ -Si(R ６ ) ｎ L ３－ｎ ...(A1) where T １ is a group represented by the formula (T), and Q ２ represents a single bond or a (q1+1)-valent linking group other than an alkylene group, ３ is a single bond or a divalent linking group other than an alkylene group, and R ７ is an alkylene group having 19 or more carbon atoms, q1 is an integer of 1 to 3, and R ６ , L and n are the same as those in the group (S).

[0033] R ７ is a group containing an alkylene group having 19 or more carbon atoms. ７ The number of carbon atoms in R is preferably 19 to 100, and more preferably 19 to 36. ７The alkylene group of R may be linear or branched. ７ is preferably a straight-chain alkylene group.

[0034] The above Q ２ is preferably a group represented by the following formula (Q2): (**) ｑ１ -M ２ R ３ ３－ｑ１ -R ２２ -Q ２２ -* ... (Q2) However, M ２ is Si, Sn, Ge or C, R ３ are each independently a hydrogen atom or an alkyl group, ２２ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２２ is a single bond or an alkylene group, and q1 is an integer of 1 to 3. * is R ７ ** is the bonding position with T １ This is the bonding position with

[0035] M ２ is Si, Sn, Ge or C, and in terms of availability of raw materials, M ２ is preferably Si or C. In addition, from the viewpoint of the stability of the compound, T １ M ２ When the atom at the bonding position with M is an oxygen atom, ２ is preferably Si. ３ The alkyl group of R １ The alkyl groups are the same as those in the alkyl groups in M. ２ If C, then R ３ is preferably a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. ２ When is Si, Sn or Ge, R ３is preferably an alkyl group having 1 to 10 carbon atoms.

[0036] The above Q ３ is preferably a group represented by the following formula (Q3): ２３ -R ２３ -** ... (Q3) However, Q ２３ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２３ is a single bond or an alkylene group, * is R ７ ** is the bonding position with Si(R ６ ) ｎ L ３－ｎ This is the bonding position with

[0037] R ２２ and R ２３ The alkylene group in R may be linear or branched, but is preferably a linear alkylene group in that the first compound is easily aligned at high density. ２２ and R ２３ The number of carbon atoms in the alkylene group may be 1 or more. The number of carbon atoms may be 1 to 100, 1 to 36, or 1 to 12.

[0038] "-R ２２ -Q ２２ -R ７ -Q ２３ -R ２３ Examples of the group represented by "-" include the following: where n1 is an integer of 18 or more, and * is M ２ R ３ ３－ｑ１ ** is the bonding position with Si(R ６ ) ｎ L ３－ｎ This is the bonding position with

[0039]

[0040] Specific examples of the first compound include the following, where n2 is an integer of 0 to 500. In addition, in the formula below, the carbon atom at one end of the alkylene group is assigned the number "1," and the carbon atom at the other end is assigned the number of carbon atoms in the alkylene group (e.g., 19, 21, 29, 36, etc.).

[0041]

[0042]

[0043] (Method for Producing First Compound) The method for producing the first compound is not particularly limited. One example is a method in which the following compound (C1) and compound (C2) are reacted to obtain compound (C3), and then a reactive silyl group is introduced into the double bond of compound (C3). X １ -R ４１ -CH=CH ２ …(C1) X ２ -R ４３ -T １ ...(C2) T １ -R ４３ -R ４１ -CH=CH ２ …(C3) However, X １ and X ２ is a halogen atom on one side and MgX (X is a halogen atom) on the other side, and R ４１ and R ４３ each independently represents a group between a carbon-carbon bond, such as -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, or -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or an alkylene group which may have a phenylene group. ４３ -R ４１ -CH=CH ２ After the reaction, the "Q ２ -R ７ -Q ３ The reaction conditions for the above reaction can be seen in the examples described below.

[0044] <Second Compound> The second compound is a compound represented by the following formula (B1) or (E1): (T １１ ) ｑ１１ -Q １２ -R １６ -Q １３ - (T １２ ) ｑ１２ ...(B1) where T １１ and T １２ are each independently a hydrogen atom, an alkyl group, an alkenyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently a hydrogen atom, an alkyl group, or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, q11 are each independently an integer of 1 to 3, q12 are each independently an integer of 1 to 3, R １６ is an alkylene group, and Q １２ represents a single bond or a (q11+1)-valent linking group other than an alkylene group, １３ is a single bond or a (q12+1)-valent linking group excluding an alkylene group, provided that the compound represented by formula (B1) has a hydrocarbon chain having 18 or more carbon atoms. (R ｅ１ ) ３ M ｅ１ -Z ｅ１ -M ｅ２ (R ｅ２ ) ３...(E1) where R ｅ１ and R ｅ２ are each independently an alkyl group or (R ｅ４ ) ３ M ｅ１ -R ｅ５ - and R ｅ４ are each independently an alkyl group; R ｅ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M ｅ１ and M ｅ２ are each independently Si, Sn, Ge or C, ｅ１ represents a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms.

[0045] (Compound (B1)) T １１ and T １２ are each independently a hydrogen atom, an alkyl group, an alkenyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ - is a group represented by T １１ and T １２ The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. T １１ and T １２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving the liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred. １１ and T １２ The alkenyl group in the formula (I) includes the above alkyl groups in which any carbon atom-carbon atom bond is a double bond. The alkenyl group has 2 or more carbon atoms, preferably 2 to 10. Specific examples of the alkenyl group include a vinyl group, an allyl group, and a propenyl group.

[0046] R １１ is a hydrogen atom, an alkyl group, or (R １４ ) ３ M １１ -R １５ - is. R １１ and R １４ The alkyl group of the above T １１ and T １２ In order to further improve the liquid repellency, R １１ and R １４ The alkyl group in M ​​is preferably a methyl group or an ethyl group, and more preferably a methyl group. １１ is Si, Sn, Ge or C. In terms of availability of raw materials, M １１ is preferably Si or C.

[0047] In addition, the above R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. １５ The alkylene group of R may be linear or branched. １５ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２-, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. １５ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. １５ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or an alkylene group having 1 to 5 carbon atoms, and even more preferably an oxygen atom or an alkylene group having 1 to 4 carbon atoms.

[0048] Q １１ is a single bond, an oxygen atom, or an alkylene group. １１ The alkylene group may be linear or branched. １１ The alkylene group in Q is preferably a linear alkylene group, more preferably a linear alkylene group having 1 to 6 carbon atoms. １１ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - etc. １１From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or a straight-chain alkylene group having 1 to 6 carbon atoms, and even more preferably an oxygen atom or a straight-chain alkylene group having 1 to 4 carbon atoms.

[0049] (SiR １２ ２ -O) ｐ１１ represents an organo(poly)siloxane residue. １２ The alkyl group in R may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. １２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0050] p11 is an integer of 0 to 500. From the viewpoint of improving liquid repellency, p11 is preferably 1 to 500, more preferably 3 to 350, even more preferably 3 to 200, particularly preferably 9 to 50, extremely preferably 11 to 30, and most preferably 11 to 25. On the other hand, from the viewpoint of improving durability, p1 is preferably 0 to 25, more preferably 0 to 10, even more preferably 0 to 2, particularly preferably 0 to 1, and extremely preferably 0.

[0051] q11 and q12 are T １１ and T １２ Each independently represents an integer of 1 to 3. １１ When there are a plurality of groups, one atom may have a plurality of groups (T １１ ) may be a structure having T １１ ｑ１１ -M １２ R １３ ３－ｑ１１ -* ... (T11) where M １２ is Si, Sn, Ge or C, R １３are each independently a hydrogen atom or an alkyl group, and q11 is an integer of 2 to 3. １２ R １３ ３－ｑ１１ is the above Q １２ constitutes part or all of the

[0052] T １２ When there are a plurality of groups, one atom may have a plurality of groups (T １２ ) may be a structure having T １２ ｑ１２ -M １２ R １３ ３－ｑ１２ -* ... (T12) where M １３ is Si, Sn, Ge or C, R １４ are each independently a hydrogen atom or an alkyl group, and q12 is an integer of 2 to 3. １２ R １３ ３－ｑ１１ is the above Q １３ It constitutes part or all of the T １２ is preferably a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

[0053] Examples of the group (T11) and the group (T12) include the following groups: where p is an integer of 1 to 500. Also, * indicates the bonding position to other groups.

[0054]

[0055] R １６ is an alkylene group. When the second compound contains the relatively long-chain alkylene group, the first compound is more likely to be aligned and arranged at high density in the surface treatment layer. １６ is an alkylene group. １６ The alkylene group in R preferably has 18 or more carbon atoms. １６In the formula (I), the upper limit of the number of carbon atoms is not particularly limited, but may be, for example, 100 or less, and is preferably 36 or less from the viewpoint of ease of production of the second compound. In the second compound, the number of carbon atoms in the alkylene group having 18 or more carbon atoms may be linear or branched, but linear alkylene groups are preferred from the viewpoint of facilitating high-density alignment of the first compound. In the case of a branched alkylene group, the number of carbon atoms including the carbon atoms in the branch is preferably 19 or more.

[0056] Q １２ and Q １３ are each independently a single bond or a divalent linking group. １２ and Q １３ are each preferably independently a group represented by the following formula (Q1): ２１ -R ２１ -M １２ R １３ ３－ｑ２１ (-**) ｑ２１ …(Q1) However, Q ２１ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２１ is a single bond or an alkylene group, provided that Q ２１ When is a single bond, R ２１ is a single bond, and M １２ is Si, Sn, Ge or C, R １３ are each independently a hydrogen atom or an alkyl group, q21 is an integer of 1 to 3, * is R １６ ** is the bonding position with T １１ or T １２ This is the bonding position with

[0057] -Q in compound (B1) １２ -R １６ -Q １３Examples of - include the following: where n1 is an integer of 18 or more, and * is T １１ ** is the bonding position with T １２ This is the bonding position with

[0058]

[0059] In compound (B1), R １６ is an alkylene group having 19 or more carbon atoms is a novel compound. That is, the compound represented by the following formula (B3) is a novel compound that can be suitably applied to the surface treatment agent of the present disclosure. Compound represented by the following formula (B3). T １１ -Q １２ -R ３１ -Q １３ -T １２ ...(B3) However, T １１ is (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently an alkyl group or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, R ３１ is an alkylene group having 19 or more carbon atoms, and Q １２ and Q １３ are each independently a single bond or a divalent linking group other than an alkylene group, １２is a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

[0060] (Method for producing compound (B1)) The method for producing compound (B1) is not particularly limited. One example is a method of reacting the following compound (D1) with compound (D2): X １１ -R ５１ -T １１ ... (D1) X １２ -R ５２ -T １２ ...(D2) However, X １１ - and X １２ is a halogen atom on one side and MgX (X is a halogen atom) on the other side, and R ５１ and R ５２ each independently represents a group between a carbon-carbon bond, such as -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, or -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or an alkylene group which may have a phenylene group. ５１ -R ５２ is the "Q" of compound (B1). １２ -R １６ -Q １３ The reaction conditions for the above reaction can be seen in the examples described below.

[0061] Specific examples of the compound (B1) include the following.

[0062]

[0063]

[0064] (Compound (E1)) In the above formula (E1), R ｅ１ and R ｅ２ are each independently an alkyl group or (R ｅ４ ) ３ M ｅ１ -R ｅ５ - is. R ｅ１ and Rｅ２ The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R ｅ１ and R ｅ２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0065] R ｅ４ are each independently an alkyl group. ｅ４ The alkyl group in the above R ｅ１ and R ｅ２ The alkyl groups are the same as those in the above.

[0066] R ｅ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. ｅ５ The alkylene group of R may be linear or branched. ｅ５ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２-, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. ｅ５ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. ｅ５ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or an alkylene group having 1 to 5 carbon atoms, and even more preferably an oxygen atom or an alkylene group having 1 to 4 carbon atoms.

[0067] M ｅ１ and M ｅ２ are each independently Si, Sn, Ge or C. In view of the availability of raw materials, M ｅ１ and M ｅ２ is preferably Si or C.

[0068] Z ｅ１ represents a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. ｅ１ The alkylene group of Z may be linear or branched. ｅ１ The alkylene group of Z is preferably a linear alkylene group. ｅ１ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - etc. ｅ１ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or a straight-chain alkylene group having 1 to 6 carbon atoms, and even more preferably an oxygen atom or a straight-chain alkylene group having 1 to 4 carbon atoms.

[0069] The compound (E1) may be obtained by synthesis or may be a commercially available product. Specific examples of the compound (E1) include the following.

[0070]

[0071] <Mass Ratio of First Compound to Second Compound> In the composition of the present disclosure, the mass ratio of the first compound to the second compound is preferably 5:95 to 95:5. From the viewpoint of better fingerprint wiping properties, the mass ratio is more preferably 10:90 to 90:10, even more preferably 10:90 to 70:30, and particularly preferably 10:90 to 50:50.

[0072] <Liquid Medium> The composition of the present disclosure may contain a liquid medium. When a liquid medium is contained, the composition of the present disclosure may be in a liquid state, and may be a solution or a dispersion.

[0073] The liquid medium is preferably an organic solvent.

[0074] Examples of organic solvents include compounds consisting of only hydrogen atoms and carbon atoms, and compounds consisting of only hydrogen atoms, carbon atoms, and oxygen atoms, and specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Among these, the organic solvent is preferably a hydrocarbon organic solvent or an ester organic solvent.

[0075] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, and ethylene glycol monoethyl ether acetate. ester, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, and dipropylene glycol monobutyl. ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0076] Examples of the organic solvent include halogen-based organic solvents, nitrogen-containing compounds, sulfur-containing compounds, siloxane compounds, and fluorine-containing organic solvents.

[0077] Specific examples of halogen-based organic solvents include dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0078] Examples of the nitrogen-containing compound include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0079] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0080] Examples of the siloxane compound include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0081] Examples of the fluorine-containing organic solvent include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３ ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited) and other alkyl perfluoroalkyl ethers (the perfluoroalkyl group and the alkyl group may be linear or branched), and CF ３ CH ２ OCF ２ CHF ２(for example, Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (for example, 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (for example, Amorea (registered trademark) AS-300 manufactured by AGC Corporation)).

[0082] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium may be 90 to 99.99 mass%, 95 to 99.98 mass%, 97 to 99.97 mass%, or 98 to 99.95 mass%, relative to the total amount of the composition of the present disclosure.

[0083] <Other Components> In addition to the first compound, the second compound, and the liquid medium, the composition of the present disclosure may contain other components to the extent that the effects of the present disclosure are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0084] The catalyst may be any appropriate acid or base, transition metal (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, urea compounds), etc. Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine, diethylamine, aniline, and pyridine.

[0085] Other components also include metal compounds having a hydrolyzable group (hereinafter, metal compounds having a hydrolyzable group are also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include those represented by the following formulas (M1) to (M3).

[0086] M (X ｂ１ ) ｍ１１ (X ｂ２ ) ｍ１２ (X ｂ３ ) ｍ１３ ... (M1) Si (X ｂ４ ) (X ｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ …(M3)

[0087] In formula (M1), M represents a trivalent or tetravalent metal atom. ｂ１ Each of X independently represents a hydrolyzable group. ｂ２ Each of X independently represents a siloxane skeleton-containing group. ｂ３ each independently represents a hydrocarbon chain-containing group, m11 is an integer of 2 to 4, m12 and m13 are each independently an integer of 0 to 2, when M is a trivalent metal atom, m11 + m12 + m13 is 3, and when M is a tetravalent metal atom, m11 + m12 + m13 is 4.

[0088] In formula (M2), X ｂ４ represents a hydrolyzable silane oligomer residue. ｂ５ each independently represents a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0089] In formula (M3), X ｂ６ and X ｂ７ each independently represents a hydrolyzable group or a hydroxyl group. ｂ１ represents a divalent organic group.

[0090] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0091] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (S) is [—Si(R ６ ) ｎ L ３－ｎ Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the formula (1).

[0092] X ｂ２ The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include: ＊ -(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0093] X ｂ３The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be a straight chain or a branched chain, with a straight chain being preferred. The hydrocarbon chain may be a saturated hydrocarbon chain or an unsaturated hydrocarbon chain, with a saturated hydrocarbon chain being preferred. The number of carbon atoms in the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, and more preferably a methyl group, an ethyl group, or a propyl group.

[0094] Preferably, m1 is 3 or 4.

[0095] As the compound represented by formula (M1), compounds represented by the following formulas (M1-1) to (M1-5) in which M is Si are preferred, and the compound represented by formula (M1-1) is more preferred. As the compound represented by formula (M1-1), tetraethoxysilane, tetramethoxysilane, and triethoxymethylsilane are preferred.

[0096] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0097] In formula (M2), X ｂ４The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group and an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O-*, etc. Here, * represents a bonding site with an adjacent atom.

[0098] In formula (M2), X ｂ５ The hydrolyzable group represented by the formula (S) is [—Si(R ６ ) ｎ L ３－ｎ Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the formula (1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. X ｂ５ As the group, a hydrolyzable group is preferred.

[0099] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0100] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and X ｂ７Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group and an isocyanato group are preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group and an ethoxy group are more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0101] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH ２ CH２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) -, -C ６ H ４ - are some examples.

[0102] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３ , (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0103] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0104] The total content of the first compound, the second compound, and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass before heating and the mass after heating for 4 hours in a convection dryer under conditions of a temperature 50°C higher than the boiling point of the solvent contained in the composition.

[0105] [Surface Treatment Agent] The surface treatment agent of the present disclosure is the above-described composition. The surface treatment agent of the present disclosure may contain a liquid medium as needed, and may contain other components in addition to the first compound, the second compound, and the liquid medium. By containing the specific first compound and second compound, the surface treatment agent of the present disclosure can form a surface treatment layer that is excellent in water repellency and fingerprint wiping removability.

[0106] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0107] The surface treatment layer may be formed on a portion of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the first compound contained in the composition of the present disclosure is contained in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and a dehydration condensation reaction of the silanol groups has progressed. The second compound does not have a reactive silyl group, so it is difficult to adhere to the substrate. The second compound may be present in the surface treatment layer in a compatible state with the first compound, or at least a portion of the second compound may be removed, for example, by a post-process after the formation of the surface treatment layer.

[0108] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0109] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0110] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, beverage containers, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0111] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0112] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0113] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0114] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0115] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0116] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0117] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0118] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0119] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0120] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0121] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0122] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0123] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0124] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0125] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0126] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0127] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0128] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0129] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific element source in the same boat, placing silica and a specific element source in separate boats and co-evaporating them, or similarly placing them in separate boats and alternatingly depositing them. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0130] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0131] Specific examples of the silicon-containing compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0132] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0133] The liquid medium may be the same as the liquid medium that may be contained in the composition of the present disclosure.

[0134] The content of the liquid medium is preferably 80 to 99.99% by mass, more preferably 90 to 99.9% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0135] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0136] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0137] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0138] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0139] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0140] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0141] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0142] Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0143] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0144] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0145] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Example 1 is a comparative example, and Examples 2 to 26 are working examples.

[0146] Synthesis Example 1 Synthesis of Compound (1) THF (tetrahydrofuran, 10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), and chlorodimethylsilane (10 g) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred at 25°C for 24 hours. Low-boiling point components were distilled off under reduced pressure to obtain 12 g of compound (1). The structure of compound (1) was confirmed from the following NMR data.

[0147]

[0148] 1 ​H-NMR (400 MHz, CDCl3) δ 3.40 (t, J = 6.9 Hz, 2H), 1.92 - 1.74 (m, 2H), 1.46 - 1.06 (m, 30H), 0.88 - 0.71 (m, 2H), 0.40 (s, 6H).

[0149] Synthesis Example 2: Synthesis of Compound (2) THF (10 g) and a 1 M THF solution of methyl magnesium chloride (40 mL) were added to compound (1) (12 g), and the mixture was stirred at 25° C. for 1 hour. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 8 g of compound (2). The structure of compound (2) was confirmed by the following NMR data.

[0150]

[0151] 1 H-NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (m, 2H), 1.46 - 1.06 (m, 30H), 0.47 (t, J = 7.6 Hz, 2H), -0.03(s, 9H).

[0152] Synthesis Example 3: Synthesis of Compound (3) THF (10 g) and magnesium (0.21 g) were added to compound (2) (1 g) and stirred at 50° C. for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.6 g of compound (3). The structure of compound (3) was confirmed by the following NMR data.

[0153]

[0154] 1 H-NMR (400 MHz, CDCl3) δ 1.25 (s, 32H), 0.98 - 0.74 (m, 3H), 0.47 (dd, J = 10.0, 5.7 Hz, 2H), -0.03 (s, 9H).

[0155] ​​Synthesis Example 4 Synthesis of Compound (4) Dichloromethane (10 g), 1,1,1,3,3-pentamethyldisiloxane (15 g), and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 50 mg) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred at 25°C for 24 hours. After removing the low-boiling point components by distillation under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 12 g of compound (4). The structure of compound (4) was confirmed by the following NMR data.

[0156]

[0157] 1 H-NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (m, 2H), 1.49 - 1.04 (m, 30H), 0.50 (t, J = 7.6 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0158] Synthesis Example 5: Synthesis of Compound (5) THF (10 g) and magnesium (0.21 g) were added to compound (4) (1 g) and stirred at 50° C. for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.6 g of compound (5). The structure of compound (5) was confirmed by the following NMR data.

[0159]

[0160] 1 H-NMR (400 MHz, CDCl3) δ 1.25 (s, 32H), 0.98 - 0.80 (m, 3H), 0.50 (t, J = 7.5 Hz, 2H), 0.06 (d, J = 1.1 Hz, 15H).

[0161] ​​Synthesis Example 6 Synthesis of Compound (6) THF (10 g) and copper(II) chloride (0.05 g) were added to 1,18-dibromooctadecane (1.0 g) and stirred at 25°C. Trimethylsilylmethylmagnesium chloride (20% ethyl ether solution, 1 M) (20 mL) was then added and stirred at 60°C for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.8 g of compound (6). The structure of compound (6) was confirmed by the following NMR data.

[0162]

[0163] 1 H-NMR (400 MHz, CDCl3) δ 1.25 (s, 36H), 0.47 (dd, J = 9.6, 5.1 Hz, 4H), 0.14--0.22 (m, 18H).

[0164] Synthesis Example 7 Synthesis of Compound (7) THF (10 g) and magnesium (0.13 g) were added to 1-bromononane (1.0 g), and the mixture was stirred at 50°C for 4 hours. The reaction solution was filtered, and then compound (2) (1.0 g) and copper(II) chloride (0.05 g) were added, followed by stirring at 50°C for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. 1.1 g of compound (7) was obtained by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane). The structure of compound (7) was confirmed by the following NMR data.

[0165]

[0166] 1 H-NMR (400 MHz, CDCl3) δ 1.29 (s, 50H), 0.98 - 0.80 (m, 3H), 0.50 (t, J = 7.8 Hz, 2H),-0.03 (s, 9H).

[0167] ​​Synthesis Example 8: Synthesis of Compound (8) To compound (4) (1 g), THF (10 g), pentyl magnesium bromide (18% THF, 1 M) (15 mL), and copper (II) chloride (0.05 g) were added, and the mixture was stirred at 50° C. for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.5 g of compound (8). The structure of compound (8) was confirmed by the following NMR data.

[0168]

[0169] 1 H-NMR (400 MHz, CDCl3) δ 1.50 - 1.20 (m, 42H), 0.98 - 0.80 (m, 3H), 0.50 (t, J = 7.5 Hz, 2H), 0.06 (d, J = 1.1 Hz, 15H).

[0170] Synthesis Example 9: Synthesis of Compound (9) To 18-bromo-1-octadecene (10 g), THF (30 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), triacetoxymethylsilane (0.05 g), and trichlorosilane (5.0 g) were added, and the mixture was stirred at 25°C for 24 hours. After the low-boiling point components were distilled off under reduced pressure, THF (30 g) and ethyl magnesium bromide (13% THF solution, 1 mol / L) (90 mL) were added, and the mixture was stirred at 30°C for 3 hours. Hydrochloric acid and hexane were added for extraction, and the low-boiling point components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 4.6 g of compound (9). The structure of compound (9) was confirmed by the following NMR data.

[0171]

[0172] 1 ​​H-NMR (400 MHz, CDCl3) δ 3.42 (t, J = 4.7 Hz, 2H), 1.75 (tt, J = 7.5, 4.6 Hz, 2H), 1.53 - 1.08 (m, 30H), 0.96 (t, J = 7.7 Hz, 9H), 0.58 - 0.40 (m, 8H).

[0173] Synthesis Example 10: Synthesis of Compound (10) THF (40 g) and magnesium (0.8 g) were added to 9-bromo-1-nonene (5 g), and the mixture was stirred at 50°C for 4 hours. After filtering the reaction solution, compound (9) (4.0 g) and copper(II) chloride (0.05 g) were added, and the mixture was stirred at 50°C for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. After that, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 3.7 g of compound (10). The structure of compound (10) was confirmed by the following NMR data.

[0174]

[0175] 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.2, 7.0 Hz, 1H), 5.17 - 4.81 (m, 2H), 2.13 - 1.96 (m, 2H), 1.48 - 0.85 (m, 55H), 0.66 - 0.37 (m, 8H).

[0176] Synthesis Example 11: Synthesis of compound (11) To a solution of compound (10) (1.0 g) in dichloromethane (10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 5 mg), aniline (3 mg), and trimethoxysilane (1.0 g) were added, and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 1.2 g of compound (11). The structure of compound (11) was confirmed by the following NMR data.

[0177]

[0178] 1 ​​H-NMR (400 MHz, CDCl3) δ 3.58 (s, 9H), 1.53 - 1.13 (m, 50H), 0.96 (t, J = 7.7 Hz, 9H), 0.74 - 0.31 (m, 10H).

[0179] Synthesis Example 12 Synthesis of Compound (12) THF (20 g) and magnesium (1.1 g) were added to 11-bromo-1-undecene (10 g) and the mixture was stirred at 60° C. for 2 hours. The reaction solution was filtered to obtain 30 g of compound (12). The concentration of the product was confirmed to be 0.8 M by titration with 1,10-phenanthroline.

[0180]

[0181] Synthesis Example 13 Synthesis of Compound (13) THF (10 g), compound (12) (0.8 M) (10 mL), and copper(II) chloride (0.05 g) were added to compound (4) (1 g), and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.5 g of compound (13). The structure of compound (13) was confirmed by the following NMR data.

[0182]

[0183] 1 H-NMR (400 MHz, CDCl3) δ 5.81 (ddt, J = 16.9, 10.1, 6.7 Hz, 1H), 5.08 - 4.82 (m, 2H), 2.13 - 1.93 (m, 2H), 1.54 - 1.00 (m, 50H), 0.63 - 0.41 (m, 2H), 0.25 - -0.19 (m, 15H).

[0184] ​Synthesis Example 14 Synthesis of Compound (14) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (13) (0.5 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.6 g of compound (14). The structure of compound (14) was confirmed by the following NMR data.

[0185]

[0186] 1 H-NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.54 - 1.00 (m, 54H), 0.77 - 0.61 (m, 2H), 0.50 (t, J = 7.3 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0187] Synthesis Example 15 Synthesis of Compound (15) THF (40 g) and magnesium (0.9 g) were added to 18-bromo-1-octadecene (10 g) and the mixture was stirred at 60°C for 2 hours. The reaction solution was filtered to obtain 50 g of compound (15). The concentration of the product was confirmed to be 0.4 M by titration with 1,10-phenanthroline.

[0188]

[0189] Synthesis Example 16: Synthesis of Compound (16) THF (10 g), compound (15) (0.4 M) (20 mL), and copper(II) chloride (0.05 g) were added to compound (4) (1 g), and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.4 g of compound (16). The structure of compound (16) was confirmed by the following NMR data.

[0190]

[0191] 1 ​​H-NMR (400 MHz, CDCl3) δ 5.81 (ddt, J = 16.9, 10.2, 6.7 Hz, 1H), 5.22 - 4.68 (m, 2H), 2.21 - 1.85 (m, 2H), 1.54 - 1.00 (m, 64H), 0.50 (t, J = 7.1 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0192] Synthesis Example 17 Synthesis of Compound (17) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (16) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (17). The structure of compound (17) was confirmed by the following NMR data.

[0193]

[0194] 1 H-NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.54 - 1.00 (m, 68H), 0.77 - 0.61 (m, 2H), 0.50 (t, J = 7.6 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0195] Synthesis Example 18: Synthesis of Compound (18) THF (10 g), compound (12) (0.8 M) (10 mL), and copper(II) chloride (0.05 g) were added to compound (2) (1 g), and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.4 g of compound (18). The structure of compound (18) was confirmed by the following NMR data.

[0196]

[0197] 1 ​​H-NMR (400 MHz, CDCl3) δ 5.82 (ddt, J = 16.9, 10.2, 6.7 Hz, 1H), 5.09 - 4.78 (m, 2H), 2.04 (q, J = 7.1 Hz, 2H), 1.46 - 1.06 (m, 50H), 0.47 (t, J = 7.7 Hz, 2H), -0.03(s, 9H).

[0198] Synthesis Example 19 Synthesis of Compound (19) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (18) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (19). The structure of compound (19) was confirmed by the following NMR data.

[0199]

[0200] 1 H-NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.46 - 1.06 (m, 54H), 0.72 - 0.59 (m, 2H), 0.48 (d, J = 8.0 Hz, 2H), -0.03(s, 9H).

[0201] [Compounds (20) to (21)] The following compounds were prepared as compounds (20) to (21).

[0202]

[0203] Synthesis Example 22: Synthesis of compound (22) The following compound (22) was obtained by the synthesis method described in WO 2024 / 262627. NMR analysis revealed that the average value of n was 5.

[0204]

[0205] Synthesis Example 23: Synthesis of compound (23) The following compound (23) was obtained by the synthesis method described in WO 2024 / 262627. NMR analysis revealed that the average value of n was 5.

[0206] ​

[0207] Synthesis Example 24: Synthesis of compound (24) The following compound (24) was obtained by the synthesis method described in WO 2024 / 262627. NMR analysis revealed that the average value of n was 5.

[0208]

[0209] Synthesis Example 25: Synthesis of compound (25) A THF solution of the following compound (25) was obtained by the synthesis method described in WO 2024 / 262627. The concentration of the product was confirmed to be 0.8 M by titration with 1,10-phenanthroline.

[0210]

[0211] Synthesis Example 26 Synthesis of Compound (26) THF (10 g), compound 25 (0.8 M) (10 mL), and copper(II) chloride (0.05 g) were added to compound 24 (1 g), and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.5 g of compound 26. NMR analysis revealed that the average value of n was 5.

[0212]

[0213] 1 H-NMR (400 MHz, CDCl3) δ 6.01-5.51 (m, 1H), 5.25 - 4.65 (m, 2H), 2.22 - 1.84 (m, 2H), 1.54 - 1.00 (m, 50H), 0.72-0.31 (m, 2H), 0.25 - -0.19 (m, 57H).

[0214] ​Synthesis Example 27 Synthesis of Compound (27) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (26) (0.5 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (27). NMR analysis revealed that the average value of n was 5.

[0215]

[0216] 1 H-NMR (400 MHz, CDCl3) δ: 3.49 (s, 9H), 1.81 - 0.97 (m, 54H), 0.65 - 0.35 (m, 4H), 0.09 -0.12 (m, 57H).

[0217] Synthesis Example 28: Synthesis of compound (28) The following compound (28) was obtained by the synthesis method described in WO 2024 / 214748.

[0218]

[0219] Synthesis Example 29: Synthesis of compound (29) The following compound (29) was obtained by the synthesis method described in WO 2024 / 214748.

[0220]

[0221] Synthesis Example 30 Synthesis of Compound (30) THF (10 g) and Mg (0.5 g) were added to Compound 24 (1 g), and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.4 g of Compound 30. NMR analysis revealed that the average value of n was 5.

[0222]

[0223] 1 ​​H-NMR (400 MHz, CDCl3)δ 1.61 - 1.14 (m, 32H), 0.97 - 0.77 (m, 3H), 0.61 (t, J = 8.4 Hz, 2H), 0.30 - -0.22 (m, 57H).

[0224] [Compound (31)] Commercially available 1,1,1,3,5,7,7,7-octamethyl-3,5-bis(trimethylsilanyloxy)tetrasiloxane was used.

[0225]

[0226] [Preparation of surface treatment agent and manufacturing of article] The first compound and the second compound were mixed, and heptane was further added as a liquid medium to obtain a surface treatment agent with a solid content of 20 mass %. Note that the "content ratio of the second compound" in Table 1 indicates the mass of the second compound relative to the total mass of the first compound and the second compound.

[0227] Next, the substrate was subjected to a surface treatment using a surface treatment agent. A dry coating method was used as the surface treatment method. Chemically strengthened glass was used as the substrate. 30 g of silicon dioxide was placed as a deposition source in a copper hearth in a vacuum deposition apparatus ("VTR-350M" manufactured by ULVAC Kiko Co., Ltd.). The glass substrate was placed in the vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 5 × 10 －３ The hearth was then evacuated to a pressure of 10 Pa or less. The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited on the surface of the substrate, producing a substrate with a silicon oxide layer having a thickness of approximately 20 nm. 0.5 g of each surface treatment agent was placed in a molybdenum boat in a vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 1 × 10 －３ The boat containing the surface treatment agent was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate with a silicon oxide layer. The substrate on which the compound or composition had been deposited was heat-treated at 140°C for 30 minutes and washed with ethanol to obtain an article having a surface treatment layer on the surface of the substrate.

[0228] <Initial Contact Angle (Water Repellency)> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The 2θ method was used to calculate the water contact angle.

[0229] <Fingerprint Wiping Efficiency> A 1 kg weight equipped with a 2 cm diameter red rubber stopper to serve as the fingerprint stamp was prepared. Next, 70 μL of artificial fingerprint fluid (manufactured by Isekyu Co., Ltd.) was dropped onto a waste cloth, and the fingerprint stamp was left to adhere to the artificial fingerprint fluid for 1 minute. To remove excess artificial fingerprint fluid from the fingerprint stamp, the fingerprint stamp was left to adhere to a new waste cloth for 20 seconds. The article with the surface treatment layer formed was then placed on a hot plate adjusted to 23°C. The fingerprint stamp was stamped onto the surface treatment layer. The article with the artificial fingerprint fluid attached was placed on a sliding device (product name "HHS-2000", manufactured by Shinto Scientific Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter with an area of ​​1 cm square using double-sided tape, and the article was then placed on the sliding device. The artificial fingerprint fluid attached to the surface treatment layer was wiped off five times with the wiping cloth in one direction under a load of 100 g. The haze of the area wiped five times was measured using a haze meter (product name "NDH7000SP", Nippon Denshoku Industries Co., Ltd.). The evaluation criteria are as follows: A: Haze value less than 0.05%. B: Haze value 0.05% or more but less than 0.5%. C: Haze value 0.5% or more.

[0230]

[0231] As shown in Table 1, the articles of Examples 2 to 26, in which a surface treatment agent containing the first compound and the second compound was used, showed further improvements in water repellency and fingerprint wiping property compared to Example 1, in which only the first compound was used.

[0232] The composition and surface treatment agent of the present disclosure can be used for substrates in, for example, display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, nanoimprint technology, and the like. The composition and surface treatment agent can also be used for bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. The composition and surface treatment agent can also be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The composition and surface treatment agent can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The composition and surface treatment agent can also be used for antifouling treatments for jigs, interior walls, piping, and the like in factories. The composition and surface treatment agent can also be used for goggles, eyeglasses, helmets, pachinko machines, fibers, umbrellas, playground equipment, and soccer balls. The composition and surface treatment agent can also be used as an anti-adhesion agent for various packaging materials such as food packaging materials, cosmetic packaging materials, the inside of pots, etc. The composition and surface treatment agent can also be used for car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, anti-reflection films, and other optical components.

[0233] This application claims priority based on Japanese Patent Application No. 2024-107364 filed on July 3, 2024, and Japanese Patent Application No. 2024-232226 filed on December 27, 2024, the disclosures of which are incorporated herein in their entireties.

Claims

1. A composition containing a first compound and a second compound, wherein the first compound is a compound having a group represented by the following formula (T) and a group represented by the following formula (S), and the second compound is a compound represented by the following formula (B1) or (E1). (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and n is an integer of 0 to 2. (T １１ ) ｑ１１ -Q １２ -R １６ -Q １３ - (T １２ ) ｑ１２ ...(B1) where T １１ and T １２ are each independently a hydrogen atom, an alkyl group, an alkenyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently a hydrogen atom, an alkyl group, or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, q11 are each independently an integer of 1 to 3, q12 are each independently an integer of 1 to 3, R １６ is an alkylene group, and Q １２ represents a single bond or a (q11+1)-valent linking group other than an alkylene group, １３ is a single bond or a (q12+1)-valent linking group excluding an alkylene group, provided that the compound represented by formula (B1) has a hydrocarbon chain having 18 or more carbon atoms. (R ｅ１ ) ３ M ｅ１ -Z ｅ１ -M ｅ２ (R ｅ２ ) ３ ...(E1) where R ｅ１ and R ｅ２ are each independently an alkyl group or (R ｅ４ ) ３ M ｅ１ -R ｅ５ - and R ｅ４ are each independently an alkyl group; R ｅ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M ｅ１ and M ｅ２ are each independently Si, Sn, Ge or C, ｅ１ represents a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms.

2. The second compound is a compound represented by the following formula (B1), １１ and T １２ are each independently a hydrogen atom, an alkyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ The composition according to claim 1, wherein the group is a group represented by -.

3. Said T １２ The composition according to claim 1 or 2, wherein is a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

4. Q １２ and Q １３ *-Q is a group represented by the following formula (Q1): ２１ -R ２１ -M １２ R １３ ３－ｑ２１ (-**) ｑ２１ …(Q1) However, Q ２１ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２１ is a single bond or an alkylene group, provided that Q ２１ When is a single bond, R ２１ is a single bond, and M １２ is Si, Sn, Ge or C, R １３ are each independently a hydrogen atom or an alkyl group, q21 is an integer of 1 to 3, * is R １６ ** is the bonding position with T １１ or T １２ This is the bonding position with 5. The composition according to claim 1 or 2, wherein the first compound contains an alkylene group having 19 or more carbon atoms.

6. The composition according to claim 1 or 2, wherein the first compound is represented by the following formula (A1): (T １ ) ｑ１ -Q ２ -R ７ -Q ３ -Si(R ６ ) ｎ L ３－ｎ ...(A1) where T １ is a group represented by the formula (T), and Q ２ represents a single bond or a (q1+1)-valent linking group other than an alkylene group, ３ is a single bond or a divalent linking group other than an alkylene group, and R ７ represents an alkylene group having 19 or more carbon atoms; and q1 represents an integer of 1 to 3.

7. Q ２ The composition according to claim 6, wherein is a group represented by the following formula (Q2): (**) ｑ１ -M ２ R ３ ３－ｑ１ -R ２２ -Q ２２ -* ... (Q2) However, M ２ is Si, Sn, Ge or C, R ３ are each independently a hydrogen atom or an alkyl group, and Q ２２ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２２ is a single bond or an alkylene group, and q1 is an integer of 1 to 3. * is R ７ ** is the bonding position with T １ This is the bonding position with 8. Q ３ The composition according to claim 6, wherein *-Q is a group represented by the following formula (Q3): ２３ -R ２３ -** ... (Q3) However, Q ２３ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２３ is a single bond or an alkylene group, * is R ７ ** is the bonding position with Si(R ６ ) ｎ L ３－ｎ This is the bonding position with 9. The composition according to claim 1 or 2, wherein the mass ratio of the first compound to the second compound is 5:95 to 95:

5.

10. The composition of claim 1 or 2, further comprising a liquid medium.

11. A surface treatment agent comprising the composition according to claim 1 or 2.

12. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 11; and manufacturing an article having a surface treatment layer formed on the substrate.

13. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 11.

14. The article of claim 13, which is an optical component.

15. The article according to claim 13, which is a display or a touch panel.

16. A compound represented by the following formula (B3): T １１ -Q １２ -R ３１ -Q １３ -T １２ ...(B3) However, T １１ is (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently an alkyl group or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, R ３１ is an alkylene group having 19 or more carbon atoms, １２ and Q １３ are each independently a single bond or a divalent linking group other than an alkylene group, １２ is a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

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