Integrated electro-reflective device and manufacturing method therefor

Abstract

The present invention relates to the technical field of electro-reflection. Provided are an integrated electro-reflective device and a manufacturing method therefor. The fading process and coloring process of the integrated electro-reflective device involve the migration of metals between a working electrode assembly and a counter electrode assembly. A conductive filling layer is equivalent to an electrode layer of the counter electrode assembly. An insulating film layer having grooves is provided to confine the conductive filling layer in the counter electrode assembly within the insulating grooves, thereby defining the physical locations of the cyclic migration of metals. Therefore, an initial structure of the counter electrode assembly can be effectively maintained without forming dendrites or damaging a mesh-like physical structure, thereby prolonging the cycle life of the integrated electro-reflective device and improving the performance thereof.

Description

Integrated electrochromic device and manufacturing method thereof

[0001] The present application claims priority to the Chinese patent application No. 202411666475.4, filed on November 20, 2024, and entitled "Integrated electrochromic device and manufacturing method thereof", the content of which is incorporated herein by reference in its entirety.

[0002] The present application claims priority to the Chinese patent application No. 202510006545.1, filed on January 02, 2025, and entitled "Electrochromic device and control method", the content of which is incorporated herein by reference in its entirety.

[0003] The present application claims priority to the Chinese patent application No. 202410950025.1, filed on July 15, 2024, and entitled "Electrochromic film and installation method thereof", the content of which is incorporated herein by reference in its entirety. TECHNICAL FIELD

[0004] The present application relates to the technical field of electrochromic technology, in particular to an integrated electrochromic device and a manufacturing method thereof. BACKGROUND

[0005] In recent years, new electrochromic devices represented by reversible metal electrodeposition devices (RMED) have shown good spectral regulation effects and have been widely studied. They have excellent spectral regulation capabilities in visible light, infrared and other wavebands, and have unique advantages such as simple structure, low energy consumption, multi-color state regulation, etc., showing great application potential in intelligent windows, thermal management, information display and other fields.

[0006] Reversible metal electrodeposition devices dynamically control the deposition, dissolution and morphology change of metal layers by applying voltage to realize the optical performance regulation of electrochromic devices. Cycle stability is a key indicator for the commercialization of electrochromic devices, and factors such as operating voltage, structure, electrolyte, etc. will affect the cycle stability of RMED devices.

[0007] The existing integrated electrochromic devices still have deficiencies, and their structure and manufacturing method need to be further optimized to improve their performance. SUMMARY

[0008] In view of the above problems, the present application provides an integrated electrochromic device and a manufacturing method thereof, which optimizes the structure and manufacturing method to improve its performance. The specific scheme is as follows:

[0009] The first aspect of the present application provides an integrated electrochromic device, the integrated electrochromic device comprising:

[0010] a working electrode assembly and a counter electrode assembly arranged oppositely;

[0011] an electrolyte layer between the working electrode assembly and the counter electrode assembly;

[0012] the counter electrode assembly comprising a counter electrode substrate and an insulating film layer between the counter electrode substrate and the electrolyte layer;

[0013] wherein the insulating film layer has a groove, and a conductive filling layer in the groove.

[0014] The second aspect of the present application provides a manufacturing method of an integrated electrochromic device, the manufacturing method of the integrated electrochromic device comprising:

[0015] preparing a working electrode assembly and a counter electrode assembly, the counter electrode assembly comprising a counter electrode substrate and an insulating film layer between the counter electrode substrate and the electrolyte layer; wherein the insulating film layer has a groove, and a conductive filling layer in the groove;

[0016] forming an electrolyte layer between the working electrode assembly and the counter electrode assembly.

[0017] By the above technical solution, the present application provides an integrated electrochromic device and a manufacturing method thereof, the bleaching process and the coloring process of the integrated electrochromic device being the migration of metal between the working electrode assembly and the counter electrode assembly. The conductive filling layer is equivalent to the electrode layer of the counter electrode assembly, the insulating film layer with the groove is arranged to limit the conductive filling layer in the counter electrode assembly in the insulating groove, which limits the physical position of the cyclic migration of metal, so that the counter electrode assembly can effectively maintain the initial structure and will not form dendritic or grid physical structure damage, thereby improving the cycle life of the integrated electrochromic device and improving its performance. BRIEF DESCRIPTION OF DRAWINGS

[0018] The above and other features, advantages, and aspects of the present disclosure will become more apparent by describing in detail the following specific embodiments with reference to the attached drawings. Throughout the drawings, the same or similar reference numerals refer to the same or similar elements. It should be understood that the drawings are schematic, and the original and elements are not necessarily drawn according to the scale.

[0019] FIG. 1 is a structural schematic diagram of an integrated electrochromic device according to an embodiment of the present application;

[0020] FIG. 2 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0021] Fig. 3 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0022] Fig. 4 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0023] Fig. 5 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0024] Fig. 6 is a schematic diagram of a front projection pattern of a groove on a counter electrode substrate according to an embodiment of the present application;

[0025] Fig. 7 is a schematic diagram of another front projection pattern of a groove on a counter electrode substrate according to an embodiment of the present application;

[0026] Fig. 8 is a schematic diagram of another front projection pattern of a groove on a counter electrode substrate according to an embodiment of the present application;

[0027] Fig. 9 is a schematic diagram of another front projection pattern of a groove on a counter electrode substrate according to an embodiment of the present application;

[0028] Fig. 10 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0029] Fig. 11 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0030] Fig. 12 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0031] Fig. 13 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0032] Fig. 14 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0033] Fig. 15 is a schematic diagram of a connection between an integrated electrochromic device and a power supply controller according to an embodiment of the present application;

[0034] Fig. 16 is a structural schematic diagram of a conventional device power supply mode;

[0035] Fig. 17 is a structural schematic diagram of a power supply mode of an integrated electrochromic device according to an embodiment of the present application;

[0036] Fig. 18 is a power supply waveform diagram of two pairs of interfaces according to an embodiment of the present application;

[0037] Fig. 19 is another power supply waveform diagram of two pairs of interfaces according to an embodiment of the present application;

[0038] Fig. 20 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0039] Fig. 21 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0040] Fig. 22 is a power supply waveform diagram of a multi-segment voltage according to an embodiment of the present application;

[0041] Fig. 23 is a power supply waveform diagram of another multi-segment voltage according to an embodiment of the present application;

[0042] Fig. 24 is a structural schematic diagram of another integrated electrochromic device according to an embodiment of the present application;

[0043] Fig. 25 is a flowchart of a manufacturing method of an integrated electrochromic device according to an embodiment of the present application;

[0044] Fig. 26 is a partial structural schematic diagram corresponding to the manufacturing method of Fig. 25;

[0045] Fig. 27 is a spectral diagram of an integrated electrochromic device after cycling according to an embodiment of the present application;

[0046] Fig. 28 is a spectral diagram of another integrated electrochromic device after cycling according to an embodiment of the present application. DETAILED DESCRIPTION

[0047] The embodiments of the present application are described below with reference to the accompanying drawings. The terms used in the embodiments of the present application are only used to explain the embodiments of the present application, and are not intended to limit the present application. Those skilled in the art can know that the technical solutions provided by the embodiments of the present application are also applicable to similar technical problems as the technology develops and new scenarios appear. It should be noted that the positional terms appearing in the present application are based on the relative positional relationship shown in the drawings, and cannot be considered as an absolute limitation of the present application.

[0048] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the present application is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0049] Referring to Fig. 1, Fig. 1 is a structural schematic diagram of an integrated electrochromic device according to an embodiment of the present application. The integrated electrochromic device according to the embodiment of the present application comprises: a working electrode assembly 11 and a counter electrode assembly 12 arranged oppositely.

[0050] An electrolyte layer 13 is located between the working electrode assembly 11 and the counter electrode assembly 12.

[0051] The counter electrode assembly 12 comprises a counter electrode substrate 14 and an insulating film layer 15 between the counter electrode substrate 14 and the electrolyte layer 13.

[0052] The insulating film layer 15 has a groove, and a conductive filling layer 16 is located in the groove.

[0053] Specifically, in the embodiment of the present application, the bleaching process and the coloring process of the integrated electrochromic device are the migration of metal between the working electrode assembly 11 and the counter electrode assembly 12. The conductive filling layer 16 is equivalent to the electrode layer of the counter electrode assembly 12. By arranging the insulating film layer 15 with a groove, the conductive filling layer 16 in the counter electrode assembly 12 is limited in the insulating groove, the physical position of the metal cycle migration is limited, and therefore the counter electrode assembly 12 can effectively maintain the initial structure and will not form dendritic or grid physical structure damage, thereby improving the cycle life of the integrated electrochromic device and improving its performance.

[0054] It should be noted that in the embodiment of the present application, the groove of the insulating film layer 15 can coat the side wall of the conductive filling layer 16, or in some cases the conductive paste of the conductive filling layer 16 will shrink in volume, resulting in that the groove of the insulating film layer 15 does not coat the side wall of the conductive filling layer 16.

[0055] Optionally, the material of the counter electrode substrate 14 includes but is not limited to one or more of glass, quartz, polyethylene terephthalate and its derivatives, polyethylene naphthalate and its derivatives, cyclic olefin copolymer and its derivatives, cellulose triacetate and its derivatives, polyether sulfone resin and its derivatives, polyimide and its derivatives, polycarbonate and its derivatives, and other compounds.

[0056] Optionally, the material of the electrolyte layer 13 includes but is not limited to one or more of a metal source, an ionic liquid, and a high molecular compound, a solvent, and an additive. The metal source is selected from one or more of silver chloride, silver bromide, silver iodide, silver acetate, silver nitrate, silver perchlorate, silver perbromate, silver periodate, silver sulfate, silver cyanide, silver sulfide, silver hexafluorophosphate, silver tetrafluoroborate, silver tetrachloroaluminate, silver triflate, silver bistrifluoromethanesulfonylimide, copper fluoride, copper chloride, copper bromide, copper iodide, copper cyanide, copper sulfate, copper acetate, copper aluminate, cuprous fluoride, cuprous chloride, cuprous bromide, cuprous iodide, cuprous cyanide, gold chloride, gold cyanide, gold sulfide, aurous chloride, aurous sulfide, nickel chloride, nickel sulfate, cobalt chloride, platinum chloride.

[0057] In an optional embodiment of the present application, referring to FIG. 2, FIG. 2 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application. The working electrode assembly 11 in the embodiment of the present application comprises a working electrode substrate 17.

[0058] A crystal nucleus layer 18 is located between the working electrode substrate 17 and the electrolyte layer 13.

[0059] A conductive layer 19 is located between the crystal nucleus layer 18 and the working electrode substrate 17.

[0060] Specifically, the material of the working electrode substrate 17 in the embodiment of the present application includes but is not limited to one or more of the following compounds: glass, quartz, polyethylene terephthalate and its derivatives, polyethylene naphthalate and its derivatives, cyclic olefin copolymer and its derivatives, cellulose triacetate and its derivatives, polyether sulfone resin and its derivatives, polyimide and its derivatives, polycarbonate and its derivatives, etc.

[0061] The conductive layer 19 includes but is not limited to one or more of the following materials: indium tin oxide (chemical formula: ITO), aluminum zinc oxide (chemical formula: AZO), fluorine-doped tin oxide (chemical formula: FTO), nano-copper wire, nano-silver wire, nano-aluminum wire, metal copper grid, metal silver grid, metal aluminum grid, indium tin oxide-copper multilayer composite, indium tin oxide-silver multilayer composite, indium tin oxide-aluminum multilayer composite, graphene, carbon nanotube, nano-silver paste, etc. The conductive layer 19 is formed on the working electrode substrate by methods such as magnetron sputtering, screen printing, ion beam evaporation, and chemical deposition, etc.

[0062] The crystal nucleus layer 18 includes but is not limited to gold, silver, platinum, palladium, rhodium, iridium, osmium, ruthenium, carbon, silicon, titanium nitride, tantalum nitride, etc. The crystal nucleus layer 18 is formed on the conductive layer 19 by methods such as magnetron sputtering, screen printing, ion beam evaporation, and chemical deposition, etc. The thickness of the crystal nucleus layer 18 ranges from 1 nm to 50 nm, preferably from 1 nm to 20 nm, and more preferably from 1 nm to 10 nm. It should be noted that the crystal nucleus layer 18 can be a continuous film layer or an island-like distribution.

[0063] The crystal nucleus layer 18 formed on the conductive layer 19 serves as the electrode layer of the working electrode assembly 11, which helps to maintain high electrode transmittance after modification, and also helps to realize the reversible deposition of metal.

[0064] In an optional embodiment of the present application, referring to FIG. 3, FIG. 3 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application. The working electrode assembly 11 in the embodiment of the present application includes a working electrode substrate 17.

[0065] A crystal nucleus layer 18 is located between the working electrode substrate 17 and the electrolyte layer 13.

[0066] Specifically, in the embodiment of the present application, when the material with high conductivity is used to prepare the crystal nucleus layer 18, the conductive layer 19 does not need to be arranged, and at this time, the crystal nucleus layer 18 serves as the electrode layer of the working electrode assembly 11, thereby reducing the cost and simplifying the process flow.

[0067] In an optional embodiment of the present application, the depth of the groove is less than or equal to the thickness of the insulating film layer 15.

[0068] Specifically, in the embodiment of the present application, as shown in FIGS. 1-3, the depth of the groove is less than the thickness of the insulating film layer 15. Referring to FIG. 4, FIG. 4 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application. As shown in FIG. 4, the depth of the groove is equal to the thickness of the insulating film layer 15. It can be understood that at this time, the groove penetrates the insulating film layer 15.

[0069] In the embodiment of the present application, the depth of the groove is reasonably designed based on the bonding force between the conductive filling layer 16 and the counter electrode substrate 14. For example, when the slurry with large bonding force to the counter electrode substrate 14 is used to prepare the conductive filling layer 16, in order to increase the slurry content, the conductive filling layer 16 after preparation can be directly in contact with the counter electrode substrate 14.

[0070] In an optional embodiment of the present application, the thickness of the conductive filling layer 16 is less than or equal to the depth of the groove.

[0071] Specifically, in the embodiment of the present application, as shown in FIGS. 1-4, the thickness of the conductive filling layer 16 is less than the depth of the groove, which ensures that the insulating film layer 15 with the groove can well define the geometric profile of the conductive filling layer 16, form a concave conductive filling layer 16 as the electrode layer of the counter electrode assembly 12, and limit the physical position of the metal circulation migration, so that the counter electrode assembly 12 can effectively maintain the initial structure and will not form dendritic or grid physical structure damage, thereby improving the cycle life of the integrated electrochromic device and improving its performance. In other words, the design of the insulating film layer 15 with the groove can limit the dendritic caused by the migration circulation and improve the cycle life of the device under the condition of limiting the geometric profile of the conductive filling layer 16.

[0072] In an optional embodiment of the present application, referring to FIG. 5, FIG. 5 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application. The surface of the conductive filling layer 16 facing the electrolyte layer 13 is a curved surface, and the curved surface protrudes or is recessed toward the side of the electrolyte layer 13. It should be noted that in FIG. 5, the curved surface protruding toward the side of the electrolyte layer 13 is taken as an example for illustration.

[0073] Specifically, in the embodiment of the present application, the edge of the conductive filling layer 16 is micro-concave and the middle is micro-convex, which can also achieve the constraint of similar electrode shape. In the embodiment of the present application, the shape of the surface of the conductive filling layer 16 facing the electrolyte layer 13 is not strictly limited and can be determined according to actual conditions. As shown in FIG. 5, because the contact surface is a curved surface, the contact surface length of the conductive filling layer 16 and the electrolyte layer 13 is greater than the groove width L1, thereby increasing the contact area of the conductive filling layer 16 and the electrolyte layer 13 in the whole groove, and a higher migration rate can be achieved when the device is cycled.

[0074] In an optional embodiment of the present application, referring to FIG. 6, FIG. 6 is a schematic diagram of the orthographic projection of a groove on the counter electrode substrate provided by the embodiment of the present application, referring to FIG. 7, FIG. 7 is a schematic diagram of the orthographic projection of another groove on the counter electrode substrate provided by the embodiment of the present application, referring to FIG. 8, FIG. 8 is a schematic diagram of the orthographic projection of another groove on the counter electrode substrate provided by the embodiment of the present application, and referring to FIG. 9, FIG. 9 is a schematic diagram of the orthographic projection of another groove on the counter electrode substrate provided by the embodiment of the present application. The orthographic projection of the groove on the counter electrode substrate 14 is a grid-shaped pattern.

[0075] Specifically, in the embodiment of the present application, the grid-shaped pattern can be of any shape, which can be regular or irregular, and can be a straight line or a curved line. In other words, the boundary line of the orthographic projection of the groove on the counter electrode substrate 14 includes a straight line and / or a curved line. As shown in FIG. 6, the grid-shaped pattern is a square, and the boundary line is a straight line. The structure brings the characteristics and advantages that the pattern is the most common rectangle, easy to process; each intersection has four line segments intersecting, which has higher redundancy for local disconnection caused by local disconnection; as shown in FIG. 7, the grid-shaped pattern is a hexagon, and the boundary line is a straight line. The structure brings the characteristics and advantages that it imitates the honeycomb structure, and the hexagon can save the amount of conductive filling layer 16 material under the same conditions; as shown in FIG. 8, the grid-shaped pattern is a rectangle, and the boundary line is a straight line. The structure brings the characteristics and advantages that compared with FIG. 6, one intersection line is reduced, the transmission area is increased, and the optical properties such as transmittance and haze are improved; as shown in FIG. 9, the grid-shaped pattern is a combination of various regular and irregular shapes, and the boundary line has both straight lines and curved lines. The structure brings the characteristics and advantages that disordered grids will reduce the generation of moire patterns in some perspective scenes.

[0076] In the embodiment of the present application, the patterned groove is formed by hot embossing, UV embossing or photolithography process on the surface of the insulating film layer 15. As shown in FIG. 5, the grid pattern has a line diameter L1 ranging from 1 μm to 100 μm (it can be understood that the width of the groove ranges from 1 μm to 100 μm, or it can be understood that the width of the conductive filling layer 16 ranges from 1 μm to 100 μm), a groove depth L2 ranging from 1 μm to 20 μm, and a line distance L3 ranging from 20 μm to 500 μm (it can be understood that the distance between the conductive filling layers 16 separated by the groove ranges from 20 μm to 500 μm).

[0077] It should be noted that the solid line in FIGS. 6-9 represents the area of the groove.

[0078] In an optional embodiment of the present application, referring to FIG. 10, which is a structural schematic diagram of another integrated electroluminescent device provided by the embodiment of the present application, the insulating film layer 15 includes a plurality of target units.

[0079] The target unit includes oppositely arranged first and second strip-shaped barriers 20 and 21, and the area between the first and second strip-shaped barriers 20 and 21 is the area of the groove.

[0080] Specifically, in the embodiment of the present application, the strip-shaped barriers arranged at both ends of the conductive filling layer 16 can also achieve the constraint of similar electrode shape, and in the embodiment of the present application, the orthogonal projection pattern of the groove on the electrode substrate 14 is not strictly limited, but can be determined according to the actual situation. The structure shown in FIG. 10 has the feature that the conductive filling layer 16 fills part of the groove to achieve the patterning of migration or save the material usage of the conductive filling layer 16.

[0081] In an optional embodiment of the present application, referring to FIG. 11, which is a structural schematic diagram of another integrated electroluminescent device provided by the embodiment of the present application, the conductive filling layer 16 includes a plurality of sub-conductive filling layers arranged in sequence; the materials of the adjacent two sub-conductive filling layers are different.

[0082] Specifically, in the embodiments of the present application, the conductive filling layer 16 is taken as an example for illustration, which includes three sub-conductive filling layers arranged in sequence. The conductive filling layer 16 includes but is not limited to the following: a nano-conductive paste, including one or more conductive pastes such as silver paste, silver-coated copper paste, platinum-coated silver paste, copper paste or graphene paste, is filled into the groove by means of squeegee coating, and the conductive filling layer 16 is formed after solidification. Meanwhile, the above-mentioned paste can be filled in multiple layers and solidified in multiple layers to obtain a multi-layer filling structure. The conductive filling layer 16 has a mesh surface conductivity due to the use of a mesh structure and conductive paste, and the surface resistance is less than 10 Ω / sq. The structure shown in FIG. 11 has the feature that different materials can be used to form multiple sub-conductive filling layers in the same groove to achieve different functions, such as black sub-conductive filling layers for wire blackening, inert sub-conductive filling layers for wire protection, and high-conductivity sub-conductive filling layers for improving surface resistance, etc.

[0083] In an optional embodiment of the present application, referring to FIG. 12, FIG. 12 is a structural schematic diagram of another integrated electrochromic device provided by the embodiments of the present application, referring to FIG. 13, FIG. 13 is a structural schematic diagram of another integrated electrochromic device provided by the embodiments of the present application, referring to FIG. 14, FIG. 14 is a structural schematic diagram of another integrated electrochromic device provided by the embodiments of the present application. The working electrode assembly 11 provided by the embodiments of the present application includes: a working electrode substrate 17; a conductive layer 19 located between the working electrode substrate 17 and the electrolyte layer 13; and the conductive layer 19, the electrolyte layer 13 and the conductive filling layer 16 are arranged in sequence from top to bottom.

[0084] As shown in FIGS. 12-14, grooves are formed on the conductive layer 19 and the electrolyte layer 13 from left to right on one side and from top to bottom, exposing the conductive filling layer 16 to form a plurality of first electrodes M1; adjacent to the first electrode M1, grooves are formed on the conductive filling layer 16 and the electrolyte layer 13 from bottom to top, exposing the conductive layer 19 to form a plurality of second electrodes M2, so that the first electrodes M1 and the second electrodes M2 are alternately distributed. In some embodiments, grooves are alternately formed from right to left on the opposite side to form alternately distributed first electrodes M1 and second electrodes M2.

[0085] In some embodiments, the width of each first electrode M1 and each second electrode M2 ranges from 0.5 mm to 50 mm, and optionally, the width can range from 1 mm to 5 mm in consideration of the processing efficiency and aesthetics of the integrated electrochromic device, and the width can be set according to requirements.

[0086] Specifically, in the embodiment of the present application, based on the first electrode M1 and the second electrode M2 formed in the alternating phase distribution, the interface connection with the power supply controller can be alternately connected in the alternating phase, so that the potential difference between the upper and lower substrates on both sides of the device can be maintained at the same value, and the same potential difference can significantly improve the deposition speed and deposition uniformity on both sides, and no additional device or module is needed, thereby effectively reducing the cost of device manufacturing.

[0087] Further, referring to FIG. 15, FIG. 15 is a schematic diagram of the connection between the integrated electro-optical device and the power supply controller according to the embodiment of the present application. The port is arranged on each first electrode M1 and each second electrode M2.

[0088] The port on each first electrode M1 is connected to the interface of the control power supply controller through the corresponding bus bar P1, and the port on each second electrode M2 is connected to the interface of the control power supply controller through the corresponding bus bar P1.

[0089] Among them, a plurality of bus bars P1 are connected in parallel to the interface of the power supply controller, and the first electrode M1 on the same side is connected to the interface of the same power supply controller through the corresponding bus bar P1, and the second electrode M2 on the same side is connected to the interface of the power supply controller through the corresponding bus bar P1. The first electrode M1 and the second electrode M2 are connected to different interfaces of the power supply controller.

[0090] It should be noted that the plurality of interfaces of the integrated electro-optical device and the power supply controller are alternately switched and powered to maintain the potential difference between the two electrodes on both sides of the device consistent.

[0091] In some embodiments, the material of the bus bar P1 includes a conductive matrix material and an insulating layer material, which can significantly improve the current transmission efficiency, ensure the safety of the system, improve the durability of the equipment, and optimize the overall performance and cost-effectiveness.

[0092] Therefore, in the embodiment of the present application, the two pairs of interfaces are alternately powered, which can maintain the potential difference between the upper and lower substrates on both sides of the integrated electro-optical device at the same value, and the same potential difference can keep the deposition speed on both sides consistent to significantly improve the deposition uniformity of the device. Moreover, only the simple design of the electrodes and the bus bar of the integrated electro-optical device is needed, without the need for additional detection modules or the need to split the device to reduce the display effect to improve the deposition uniformity.

[0093] In some embodiments, the size of the integrated electro-optical device is 50cm*50cm, and of course it can also be other sizes, which can be set according to the needs.

[0094] In addition, the power supply mode of the integrated electrochromic device according to the embodiment of the application can be compared with the power supply mode of the conventional device. FIG. 16 is a structural schematic diagram of the power supply mode of the conventional device, and FIG. 17 is a structural schematic diagram of the power supply mode of an integrated electrochromic device according to the embodiment of the application, which adopts an interface alternate switching power supply mode. Three points A, B and C are selected at the same positions of the conventional device and the integrated electrochromic device according to the embodiment of the application, so that the deposition uniformity of the device is obtained through the transmittance of A, B and C. That is, the transmittance of A, B and C is measured after the device is colored for 2 minutes under the same voltage, and the results are shown in Table 1.

[0095] Table 1

[0096] Therefore, the device structure and the power supply mode provided by the embodiment of the application can significantly improve the deposition uniformity of the device.

[0097] In an optional embodiment of the application, the power supply controller supplies power to the first electrode M1 when the target interface of the power supply controller is opened, and supplies power to the second electrode M2 when the first reverse polarity interface of the power supply controller is opened. The first reverse polarity interface refers to an interface whose polarity is opposite to that of the target interface and which is located on the opposite side of the target interface. The specific control logic is that the target interface of the power supply controller is controlled to be opened to supply power to the first electrode M1, and the first reverse polarity interface of the power supply controller is controlled to be opened to supply power to the second electrode M2.

[0098] It should be noted that the power supply controller has multiple interfaces that can be used to connect different electrodes. Specifically,

[0099] The target interface refers to the first interface that is opened by the power supply controller. Therefore, controlling the target interface of the power supply controller to be opened means that the first power supply port of the power supply controller is activated or opened, so that the integrated electrochromic device can be supplied with power. The busbar P1 is an electrical conductor that connects the power supply controller and the electrode, and it conducts the current output by the power supply controller to the electrode. The first electrode M1 is connected to the target interface through the busbar P1. After the target interface is opened, the current flows to the first electrode M1 through the busbar P1. After the target interface is opened, the power supply controller provides power, which is supplied to the first electrode M1 through the busbar P1 connected to the first electrode M1. In addition, the first reverse polarity interface is similar to the first interface. Controlling the first reverse polarity interface of the power supply controller to be opened means that another port of the power supply controller is also activated, so that the second electrode M2 can be supplied with power. When the first reverse polarity interface is opened, the power supply controller transmits the current to the second electrode M2 through the busbar P1. This ensures that the second electrode M2 can also be supplied with power and work or perform tasks like the first electrode M1.

[0100] The target interface of the power supply controller is disconnected, the first reverse polarity interface of the power supply controller is disconnected, the homopolar interface of the power supply controller is turned on, and the second reverse polarity interface of the power supply controller is turned on according to a transformation period. The homopolar interface of the power supply controller is turned on to supply power to the second electrode M2, and the second reverse polarity interface of the power supply controller is turned on to supply power to the first electrode M1. The homopolar interface refers to an interface with the same polarity as the target interface. The second reverse polarity interface refers to an interface with a polarity opposite to that of the homopolar interface and located on the opposite side of the homopolar interface. The specific control logic is as follows: according to the transformation period, the target interface and the first reverse polarity interface of the power supply controller are controlled to be disconnected, and the homopolar interface of the power supply controller is controlled to be turned on to supply power to the second electrode M2, and the second reverse polarity interface of the power supply controller is controlled to be turned on to supply power to the first electrode M1.

[0101] It should be noted that after the target interface and the first reverse polarity interface are turned on to supply power to the first electrode M1 and the second electrode M2 respectively, the positions of the working electrode and the counter electrode can be continuously and alternately transformed according to the transformation period to supply power to the device, that is, when a transformation period is reached, the target interface and the first reverse polarity interface that are being turned on are disconnected, at this time the homopolar interface of the power supply controller is controlled to be turned on to supply power to the second electrode M2 through the bus bar and the second reverse polarity interface on the opposite side, and the fourth interface of the power supply controller is controlled to be turned on to supply power to the first electrode M1 through the bus bar P1 and the first electrode M1 on the opposite side. It should be noted that the power supply controller can switch the power supply mode at any time according to the needs, such as constant voltage power supply, constant current power supply, etc. Alternatively, the transformation period can be 0.1 ms-100 s, preferably 1 ms-1 s, and the specific value can be set according to the needs.

[0102] The target interface of the power supply controller is opened, the first reverse polarity interface of the power supply controller is opened, the homopolar interface of the power supply controller is disconnected, and the second reverse polarity interface of the power supply controller is disconnected, which are determined according to the transformation period. When the target interface of the power supply controller is opened, power is supplied to the first electrode M1. When the first reverse polarity interface of the power supply controller is opened, power is supplied to the second electrode M2. The specific control logic is as follows: according to the transformation period, the homopolar interface of the power supply controller is disconnected, the second reverse polarity interface of the power supply controller is disconnected, the first reverse polarity interface of the power supply controller is opened to supply power to the second electrode M2, and the target interface of the power supply controller is opened to supply power to the first electrode M1. It should be noted that the control logic of this process can be correspondingly referred to the control logic of the first electrode M1 and the second electrode M2 described above, which will not be described here again. After all the steps are executed, the first step needs to be returned to execute, so that the power supply controller continuously alternates and transforms work.

[0103] Specifically, FIG. 18 is a power supply waveform diagram of two pairs of interfaces provided by an embodiment of the present application; and FIG. 19 is another power supply waveform diagram of two pairs of interfaces provided by an embodiment of the present application. Both FIG. 18 and FIG. 19 are 1V constant voltage power supply, and each pair of single power supply time is 5ms. The power supply voltage and transformation period can be adjusted arbitrarily according to the needs of the integrated electrochromic light reflecting device.

[0104] As can be seen from the above description, the control logic of the integrated electrochromic light reflecting device provided by the embodiment of the present application is as follows: the target interface and the first reverse polarity interface of the power supply controller are opened, power is supplied to the corresponding electrodes through the bus bar P1 connected with the first electrode M1 and the second electrode M2 respectively, then according to the transformation period, the target interface and the first reverse polarity interface of the power supply controller are disconnected, the homopolar interface and the second reverse polarity interface are opened, power is supplied to the corresponding electrodes through the bus bar P1 connected with the second electrode M2 and the first electrode M1 respectively, finally according to the transformation period, the homopolar interface and the second reverse polarity interface of the power supply controller are disconnected, and the first step is returned to open the target interface and the first reverse polarity interface again to continue to supply power to the electrodes. Therefore, through the strategy of alternating power supply and periodic interface switching, the system can be stably operated while the energy efficiency is optimized, the heat management capability is improved, the reliability and safety of the system are increased, the flexibility of the system is improved, different power supply demands can be adapted to, and additional detection modules are not needed, thereby effectively reducing the cost of the device.

[0105] Therefore, it can be seen that the control logic provided by the embodiment of the present application can maintain four interfaces, i.e. the first interface, the second interface, the third interface and the fourth interface, for the power supply of the integrated electrochromic light reflecting device. In order to facilitate understanding, the control method process of the integrated electrochromic light reflecting device of the present application can be described in multiple specific application scenarios.

[0106] The first interface of the power supply controller is turned on, and the first electrode M1 is supplied with power through the bus bar P1 connected to the first electrode M1, and the second interface of the power supply controller is controlled to be turned on, and the second electrode M2 is supplied with power through the bus bar P1 connected to the second electrode M2. The polarities of the first interface and the second interface are opposite.

[0107] After a certain period of time, in order to maintain constant current supply, the first interface and the second interface are disconnected, the third interface of the power supply controller is turned on, and the second electrode M2 is supplied with power through the bus bar P1 connected to the second electrode M2, and the fourth interface of the power supply controller is turned on, and the first electrode M1 is supplied with power through the bus bar P1 connected to the first electrode M1. The polarities of the third interface and the fourth interface are opposite.

[0108] After another certain period of time, the third interface and the first interface are disconnected, and then the first interface of the power supply controller is turned on again, and the first electrode M1 is supplied with power through the bus bar P1 connected to the first electrode M1, and the second interface of the power supply controller is controlled to be turned on, and the second electrode M2 is supplied with power through the bus bar P1 connected to the second electrode M2, thereby forming a cycle, so that the positions of the working electrode and the counter electrode can be continuously and alternately changed to supply power to the device.

[0109] Alternatively, in another embodiment of a specific application scenario, first, the power supply controller turns on the first interface to supply power to the first electrode M1 through the bus bar P1 connected to the first electrode M1, and turns on the third interface to supply power to the second electrode M2 through the bus bar P1 connected to the second electrode M2. It should be noted that the polarities of the first interface and the second interface are opposite, which ensures the correct direction of the current.

[0110] After a period of time of power supply, in order to maintain constant current supply, the power supply controller disconnects the second interface and the third interface, and turns on the second interface and the fourth interface. At this time, the second interface supplies power through the bus bar connected to the second electrode M2, and the fourth interface supplies power through the bus bar connected to the first electrode M1, and the polarities of the second interface and the fourth interface are opposite.

[0111] After a period of time, the power supply controller again disconnects the second interface and the fourth interface, and then reopens the first interface and the third interface to restore the previous power supply state, thereby forming a cycle.

[0112] This periodic process ensures constant power supply to the counter electrode, while alternately changing the power supply polarity of the electrode to maintain the balance and stability of the potential difference on both sides of the device.

[0113] Therefore, in summary, the power supply controller alternately supplies power through different interfaces in each period, ensuring that the power supply polarity changes constantly, avoiding long-term single power supply to a certain electrode direction, thereby maintaining the balance and stability of the current.

[0114] In addition, the integrated electrochromic device provided by the embodiment of the present application can also be formed by pre-embedding bus bars to form two pairs of electrodes on both sides. Referring to FIG. 20, FIG. 20 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application. Referring to FIG. 21, FIG. 21 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application.

[0115] The left side from top to bottom is a conductive layer, a first bus bar, a first insulating layer, a third bus bar, and a conductive filling layer. The right side from top to bottom is a conductive layer, a second bus bar, a second insulating layer, a fourth bus bar, and a conductive filling layer.

[0116] The power supply controller can supply power to the integrated electrochromic device in multiple segments of voltage (or current) in one period. For details, refer to the contents shown in FIG. 22 and FIG. 23. FIG. 22 is a power supply waveform diagram of multiple segments of voltage provided by the embodiment of the present application. FIG. 23 is another power supply waveform diagram of multiple segments of voltage provided by the embodiment of the present application.

[0117] In an optional embodiment of the present application, referring to FIG. 24, FIG. 24 is a structural schematic diagram of another integrated electrochromic device provided by the embodiment of the present application. The integrated electrochromic device provided by the embodiment of the present application is integrally arranged with a solar cell panel T1. The integrated electrochromic device has a dimming area AA.

[0118] The orthogonal projection of the solar cell panel T1 on a first plane does not overlap with the orthogonal projection of the dimming area AA on the first plane. The first plane is the plane where the integrated electrochromic device is located.

[0119] Specifically, in the embodiment of the present application, the solar cell panel T1 and the integrated electrochromic device are an integral structure, that is, the solar cell panel T1 and the integrated electrochromic device are not two independent parts, but an integral structure formed by encapsulation, for example, but not limited to. Therefore, when installing the integrated electrochromic device provided by the embodiment of the present application, the integrated electrochromic device can be installed as a completely uniform film, greatly reducing the installation difficulty, and allowing users to easily install the integrated electrochromic device of the overall structure on any glass or other carrier.

[0120] In the embodiment of the present application, the solar cell panel T1 provides the integrated electrochromic device with the electrical energy required for its operation, and does not need an external battery to provide the electrical energy required for its operation. In the case where the integrated electrochromic device can work normally, the purpose of not needing an external battery is achieved.

[0121] In an optional embodiment of the present application, the integrated electrochromic device provided by the embodiment of the present application further comprises a controller. The controller is configured to control the working state of the solar panel T1 in which the solar panel T1 supplies power to the integrated electrochromic device.

[0122] Specifically, when the sunlight is incident on the solar panel T1, the solar panel T1 generates electric energy, and the electric energy can be used to drive the integrated electrochromic device to change its state via the controller.

[0123] In an optional embodiment of the present application, the integrated electrochromic device provided by the embodiment of the present application further comprises an external battery interface, and an external battery is electrically connected to the working electrode assembly and the counter electrode assembly via the external battery interface.

[0124] Specifically, in the embodiment of the present application, the controller is further configured to control the working state of the external battery in which the external battery supplies power to the integrated electrochromic device. When the sunlight is incident on the solar panel T1, the solar panel T1 generates electric energy, and the electric energy can be used to drive the integrated electrochromic device to change its state via the controller. Alternatively, the electric energy generated by the solar panel T1 is stored in the external battery, and the external battery is discharged to drive the integrated electrochromic device to change its state via the controller.

[0125] That is, the integrated electrochromic device provided by the embodiment of the present application can be equipped with an external battery or not.

[0126] Further, in the case of being equipped with an external battery, the integrated electrochromic device can work normally in the case that the solar panel T1 cannot work effectively. For example, in the case that the solar panel T1 cannot work effectively in a rainy day, the external battery can provide the integrated electrochromic device with the electric energy required for its working, so that the integrated electrochromic device can work normally.

[0127] Further, as shown in FIG. 24, since the orthogonal projection of the solar panel T1 on the first plane does not overlap with the orthogonal projection of the light adjusting region AA on the first plane in the integrated electrochromic device provided by the embodiment of the present application, it is obvious that the area of the light adjusting region AA of the integrated electrochromic device will not be affected, and the light adjusting region AA of the integrated electrochromic device can be fully utilized.

[0128] In an optional embodiment of the present application, the solar panel T1 in the integrated electrochromic device provided by the embodiment of the present application is located at at least one side edge of the integrated electrochromic device.

[0129] The number and position of the solar cell panel T1 can be determined according to actual conditions, and can be determined from the aspects of aesthetics, service life, etc.

[0130] For example, in order to improve the service life of the integrated electrochromic device, at least two solar cell panels T1 are arranged, so that in the case that one of the solar cell panels T1 fails, the other solar cell panel T1 can normally provide the integrated electrochromic device with the required power for operation.

[0131] For example, in order to improve the appearance effect of the integrated electrochromic device, the solar cell panel T1 is arranged at the edge of the integrated electrochromic device, so as to form four black edges, thereby improving the aesthetics of the overall appearance of the integrated electrochromic device.

[0132] It should be noted that the shape of the integrated electrochromic device provided in the embodiment of the present application can be various, and the solar cell panel T1 and the integrated electrochromic device can also have various shapes. However, no matter what selection is made, the solar cell panel T1 cannot block the dimming area AA of the integrated electrochromic device, and the solar cell panel T1 is arranged at at least one side edge of the integrated electrochromic device, or at other packaging structures that do not affect the dimming area AA.

[0133] Based on the above-mentioned embodiment of the present application, in another embodiment of the present application, a manufacturing method of an integrated electrochromic device is also provided. Referring to FIG. 25, FIG. 25 is a flowchart of a manufacturing method of an integrated electrochromic device according to an embodiment of the present application. The manufacturing method of the integrated electrochromic device provided in the embodiment of the present application comprises the following steps:

[0134] S101: preparing a working electrode assembly 11 and a counter electrode assembly 12, the counter electrode assembly 12 comprising a counter electrode substrate 14 and an insulating film layer 15 between the counter electrode substrate 14 and the electrolyte layer 13; wherein the insulating film layer 15 has a groove, and a conductive filling layer 16 is located in the groove.

[0135] S102: forming an electrolyte layer 13 between the working electrode assembly 11 and the counter electrode assembly 12.

[0136] Specifically, one implementation of the integrated electrochromic device is prepared as follows:

[0137] A layer of ITO is deposited on a PET substrate (equivalent to a working electrode substrate 17) as a conductive layer 19 by a magnetron sputtering method, and the surface resistance is 40 Ω / sq.

[0138] Based on the conductive layer 19, a 10 nm thick Au material crystal nucleus layer 18 is deposited on the basis of the method of gold target material combined with magnetron sputtering, forming an electrode layer of the working electrode assembly 11 composed of the crystal nucleus layer 18 and the conductive layer 19. Since the Au material has good conductivity, the final surface resistance is 10 Ω / sq. At the same time, the visible light transmittance of the electrode layer of the working electrode assembly 11 is 65%, and the haze is 1.1%.

[0139] As shown in FIG. 26, a 10 μm thick UV curing adhesive is coated on the PET substrate (equivalent to the counter electrode substrate 14) as an insulating film layer 15. By pressing the unhardened UV curing adhesive with the stamping mold 22, UV curing is performed after pressing, and the stamping grid is obtained after demolding. The size characteristics of the stamping grid are that the groove depth L2 is 7 μm, the line distance L3 is 150 μm, and the line width L1 is 8 μm.

[0140] The conductive silver paste is scraped into the interior of the groove of the stamping grid by scraping, and the silver paste is cured in the interior of the groove by drying to form a conductive filling layer 16, and the filling height is less than or equal to the groove depth L2. The conductive silver paste is composed of 90% by mass of nano-silver powder, and the remaining components are high molecular compounds, solvents, additives, etc. The final metal grid electrode layer of the counter electrode assembly 12 has a surface resistance of 1 Ω / sq, a visible light transmittance of 78%, and a haze of 2%.

[0141] The metal grid electrode layer of the counter electrode assembly 12 and the electrode layer of the working electrode assembly 11 are unwound by the respective corresponding rollers, and the slurry for preparing the electrolyte layer 13 is dropped between them by the feeding pump. The metal source of the electrolyte layer 13 is silver chloride, and other components include ionic liquid, UV curing high molecular compound and additive. A pair of composite rollers are used for counter-compression, and a sandwich structure of an integrated electrochromic device is obtained after UV curing.

[0142] Referring to FIG. 27, which is a spectral diagram of the integrated electrochromic device after cycling according to an embodiment of the present application. The integrated electrochromic device prepared based on the above process still maintains the initial grid shape after 3000 cycles under the driving of a direct current power supply, and no dendrite is grown at the metal grid electrode layer of the counter electrode assembly 12. The fade state is at 650 nm, the transmittance only attenuates by 1.5% after 3000 cycles, and the transmittance only attenuates by 2.5% after 5000 cycles.

[0143] Alternatively, another implementation manner of preparing the integrated electrochromic device is as follows:

[0144] A layer of ITO is deposited on the PET substrate (equivalent to working electrode substrate 17) as a conductive layer 19 by magnetron sputtering, with a surface resistance of 40 Ω / sq.

[0145] Based on the conductive layer 19, a 10 nm thick crystal nucleus layer 18 of Au material is deposited on the conductive layer 19 by a method combining a gold target and magnetron sputtering, forming an electrode layer of the working electrode assembly 11 composed of the crystal nucleus layer 18 and the conductive layer 19. Since the Au material has good conductivity, the final surface resistance is 10 Ω / sq. At the same time, the visible light transmittance of the electrode layer of the working electrode assembly 11 is measured to be 65%, and the haze is 1.1%.

[0146] As shown in FIG. 26, a 10 μm thick layer of UV-curable glue is coated on the PET substrate (equivalent to the counter electrode substrate 14) as an insulating film layer 15 by coating. The unhardened UV-curable glue is pressed by the stamping mold 22, and after UV curing, the stamping grid is obtained after demolding. The size characteristics of the stamping grid are that the groove depth L2 is 7 μm, the line distance L3 is 150 μm, and the line width L1 is 8 μm.

[0147] The conductive Ag paste is first scraped, then the conductive C paste is scraped, and then the conductive Ag paste is scraped again. The Ag-C-Ag three-layer conductive structure is used to replace the single-layer conductive silver paste. The three-layer conductive structure is cured in the inside of the groove by drying to form a conductive filling layer 16, and the filling height is less than or equal to the groove depth L2.

[0148] The metal mesh electrode layer of the counter electrode assembly 12 and the electrode layer of the working electrode assembly 11 are unwound by the respective corresponding rollers, and the slurry for preparing the electrolyte layer 13 is dropped between them by the feeding pump. The metal source of the electrolyte layer 13 is silver chloride, and other components include ionic liquid, UV-curable polymer compound and additives. A pair of composite rollers is used for counter-compression, and after UV curing, an integrated electrochromic device with a sandwich structure is obtained.

[0149] Referring to FIG. 28, FIG. 28 is a spectral diagram of another integrated electrochromic device after cycling according to an embodiment of the present application. The integrated electrochromic device prepared based on the above process is still maintained in the initial grid shape after 3000 cycles under the driving of a direct current power supply, and no dendrite is grown at the metal mesh electrode layer of the counter electrode assembly 12. The bleached state is at 650 nm, the transmittance is attenuated by only 1.2% after 3000 cycles, and the transmittance is attenuated by only 1.3% after 5000 cycles.

[0150] From the above description, it can be known that the bleaching process and the coloring process of the integrated electrochromic device provided by the embodiment of the present application are the migration of the metal between the working electrode assembly 11 and the counter electrode assembly 12. The conductive filling layer 16 is equivalent to the electrode layer of the counter electrode assembly 12. By arranging the insulating film layer 15 with the groove, the conductive filling layer 16 in the counter electrode assembly 12 is limited in the insulating groove, the physical position of the migration of the metal is limited, and therefore the counter electrode assembly 12 can effectively maintain the initial structure and will not be damaged by forming dendritic or grid physical structures, thereby improving the cycle life of the integrated electrochromic device and improving the performance thereof.

[0151] In addition, the groove of the insulating film layer 15 can rely on many processing modes, and various patterns and opening rates can be realized by relying on photolithography, imprinting and etching, and good optical and electrical properties are taken into account. The filling mode of the conductive filling layer 16 can combine different powders or multi-layer powders to realize multi-component or multi-functional conductive framework in a single groove pattern, while high yield and low cost are taken into account; that is, the characteristics of the filling slurry can be arbitrarily changed to design the optical or electrochemical properties of the integrated electrochromic device. The working electrode substrate 17 and the counter electrode substrate 14 can realize flexibility and continuous production, which will greatly reduce the industrialization cost of the integrated electrochromic device.

[0152] The integrated electrochromic device and the manufacturing method thereof provided by the present application are described in detail above, and the principles and implementation manners of the present application are described by applying specific examples in the present text; the above description of the embodiments is only used to help understand the method and the core idea of the present application; meanwhile, according to the idea of the present application, the specific implementation manners and application ranges will be changed by the general technical personnel in the field; in view of the above, the content of the specification should not be understood as the limitation of the present application.

[0153] It should be noted that the same and similar parts among the various embodiments in the specification can be mutually referred to. It should also be noted that, in the present text, relationship terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between the entities or operations. Moreover, the term “includes”, “contains” or any other variant thereof is intended to cover non-exclusive inclusion, so that the process, method, article or equipment including a series of elements, or the elements inherent in the process, method, article or equipment, or the elements inherent in the process, method, article or equipment. Without more limitations, the element defined by the statement “including one…” does not exclude the presence of another identical element in the process, method, article or equipment including the element.

[0154] The foregoing description of the disclosed embodiments enables a person skilled in the art to make or use the application. Modifications of these embodiments will occur to persons of skill in the art, and that the appended claims are intended to cover all such modifications that do not depart from the true spirit and scope of the application. Therefore, the application is not limited to the embodiments shown but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An integrated electrochromic device, characterized by The integrated electrochromic device comprises: a working electrode assembly and a counter electrode assembly arranged oppositely; an electrolyte layer between the working electrode assembly and the counter electrode assembly; the counter electrode assembly comprises a counter electrode substrate and an insulating film layer between the counter electrode substrate and the electrolyte layer; wherein the insulating film layer has a groove, and a conductive filling layer is arranged in the groove.

2. The integrated electrochromic device of claim 1, wherein, The depth of the groove is less than or equal to the thickness of the insulating film layer.

3. The integrated electrochromic device of claim 1, wherein, The thickness of the conductive filling layer is less than or equal to the depth of the groove.

4. The integrated electrochromic device of claim 1, wherein, The surface of the conductive filling layer facing the electrolyte layer is a curved surface, which is convex or concave towards the side of the electrolyte layer.

5. The integrated electrochromic device of claim 1, wherein, The orthographic projection of the groove on the counter electrode substrate is a grid-shaped pattern.

6. The integrated electrochromic device of claim 5, wherein, The width of the groove ranges from 1 μm to 100 μm. The depth of the groove ranges from 1 μm to 20 μm.

7. The integrated electrochromic device of claim 5, wherein the at least one of the first and second electrodes is a transparent electrode. The boundary lines of the orthographic projection of the groove on the counter electrode substrate include straight lines and / or curved lines.

8. The integrated electrochromic device of claim 1, wherein, The insulating film layer comprises a plurality of target units. The target unit comprises a first strip-shaped barrier wall and a second strip-shaped barrier wall arranged oppositely, and the area between the first strip-shaped barrier wall and the second strip-shaped barrier wall is the area of the groove.

9. The integrated electrochromic device of any of claims 1-8, wherein, The conductive filling layer comprises a plurality of sub-conductive filling layers arranged in sequence. The materials of adjacent two layers of the sub-conductive filling layers are different.

10. The integrated electrochromic device of any of claims 1-8, wherein, The working electrode assembly comprises: a working electrode substrate; a crystal nucleus layer between the working electrode substrate and the electrolyte layer.

11. The integrated electrochromic device of claim 10, wherein, The working electrode assembly further comprises: a conductive layer between the crystal nucleus layer and the working electrode substrate.

12. The integrated electrochromic device of claim 1, wherein, The working electrode assembly comprises: a working electrode substrate; a conductive layer between the working electrode substrate and the electrolyte layer; and the conductive layer, the electrolyte layer, and the conductive filling layer are arranged in sequence from top to bottom. Wherein, on the conductive layer and the electrolyte layer from left to right on one side and from top to bottom, grooves are formed to expose the conductive filling layer and form a plurality of first electrodes; adjacent to the first electrodes, grooves are formed on the conductive filling layer and the electrolyte layer from bottom to top to expose the conductive layer and form a plurality of second electrodes, so that the first electrodes and the second electrodes are alternately distributed.

13. The integrated electrochromic device of claim 12, wherein, On the opposite side, grooves are alternately formed from right to left to form alternately distributed first electrodes and second electrodes.

14. The integrated electrochromic device of claim 12, wherein, The width of each first electrode and each second electrode ranges from 0.5 mm to 50 mm.

15. The integrated electrochromic device of claim 12, wherein, Each first electrode and each second electrode is provided with a port. The port on each first electrode is connected to the interface of a control power supply controller through a corresponding bus bar, and the port on each second electrode is connected to the interface of the control power supply controller through a corresponding bus bar. Wherein, a plurality of bus bars are connected in parallel to the interface of the power supply controller, and the first electrodes on the same side are connected to the interface of the same power supply controller through corresponding bus bars, the second electrodes on the same side are connected to the interface of the power supply controller through corresponding bus bars, and the first electrodes and the second electrodes are connected to different interfaces of the power supply controller.

16. The integrated electrochromic device of claim 15, wherein, The target interface of the power supply controller is opened to supply power to the first electrode, and the first reverse polarity interface of the power supply controller is opened to supply power to the second electrode; wherein the first reverse polarity interface refers to an interface opposite in polarity to the target interface and located on the opposite side of the target interface; The target interface of the power supply controller is opened, the first reverse polarity interface of the power supply controller is opened, the same polarity interface of the power supply controller is opened, and the second reverse polarity interface of the power supply controller is opened according to the transformation period, the same polarity interface of the power supply controller is opened to supply power to the second electrode, and the second reverse polarity interface of the power supply controller is opened to supply power to the first electrode; wherein the same polarity interface refers to an interface with the same polarity as the target interface; and the second reverse polarity interface refers to an interface opposite in polarity to the same polarity interface and located on the opposite side of the same polarity interface; The target interface of the power supply controller is opened, the first reverse polarity interface of the power supply controller is opened, the same polarity interface of the power supply controller is opened, and the second reverse polarity interface of the power supply controller is opened according to the transformation period, the same polarity interface of the power supply controller is opened to supply power to the second electrode, and the second reverse polarity interface of the power supply controller is opened to supply power to the first electrode; wherein the same polarity interface refers to an interface with the same polarity as the target interface; and the second reverse polarity interface refers to an interface opposite in polarity to the same polarity interface and located on the opposite side of the same polarity interface; 17. The integrated electrochromic device of claim 1, wherein, The integrated electrochromic device is integrated with a solar cell panel; The integrated electrochromic device has a light adjustment region; The orthogonal projection of the solar cell panel on a first plane does not overlap with the orthogonal projection of the light adjustment region on the first plane; and the first plane is the plane on which the integrated electrochromic device is located.

18. The integrated electrochromic device of claim 17, wherein, The integrated electrochromic device further comprises an external battery interface, and an external battery is electrically connected to the working electrode assembly and the counter electrode assembly based on the external battery interface; and / or the integrated electrochromic device further comprises a controller configured to control the working state of the solar cell panel supplying power to the integrated electrochromic device.

19. A method of fabricating an integrated electrochromic device, comprising: The manufacturing method of the integrated electrochromic device comprises: Preparation of a working electrode assembly and a counter electrode assembly, the counter electrode assembly comprising a counter electrode substrate and an insulating film layer between the counter electrode substrate and the electrolyte layer; wherein the insulating film layer has a groove, and a conductive filling layer is located in the groove; Forming an electrolyte layer between the working electrode assembly and the counter electrode assembly.

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