Method and CVD reactor for cleaning process gases
WO2026052583A1PCT designated stage Publication Date: 2026-03-12AIXTRON AG
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-09-02
- Publication Date
- 2026-03-12
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Figure EP2025074851_12032026_PF_FP_ABST
Abstract
The invention relates to a method for processing a used gas produced during the operation of a CVD reactor (4), including all auxiliary gas flows, which used gas is first cleaned in a processing device (40) or disposed of in a gas scrubber (25). The processed used gas is qualitatively and quantitatively analysed for impurities in an analysis device (19). Based on the analysis result obtained here and the knowledge from the method step in which the gas was used, a sorting device (17) sorts the cleaned used gas into different containers (12, 13, 14) as recycling gas, wherein each container (12, 13, 14) is assigned an application class which indicates in which process step in a CVD reactor this recycling gas can be reused as carrier gas. The reuse of the gas is characterised by the fact that any residual impurities present in the used gas do not adversely affect the process.
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Citation Information
Patent Citations
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