Flash radiotherapy dose control method and apparatus, and electronic device

By calculating beam pulse parameters with different pulse widths in the beam control system and using the beam monitoring system to determine the beam dose and time, and outputting a level control signal, the problem of precise control of high beam pulse frequency and large single-pulse dose in FLASH radiotherapy is solved, and precise and stable dose control is achieved.

WO2026066087A1PCT designated stage Publication Date: 2026-04-02ZHONGJIU FLASH MEDICAL TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-04-30
Publication Date
2026-04-02

AI Technical Summary

Technical Problem

Existing technologies make it difficult to achieve precise control of high beam pulse frequency and large single-pulse dose in FLASH radiotherapy, resulting in significant challenges in dose control.

Method used

By calculating the number of beam pulses with different pulse widths, the total beam output time, and the frequency in the beam control system, and using the beam monitoring system to determine whether the beam dose and time have reached the threshold, a level control signal is output to the beam generation system to achieve precise control.

Benefits of technology

It improves the safety and reliability of beam pulse dose control, reduces signal transmission complexity, and enhances the stability and intelligence of dose control.

✦ Generated by Eureka AI based on patent content.

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Abstract

Provided are a FLASH radiotherapy dose control method and apparatus, and an electronic device. The method comprises: calculating the number of delivered pulses of at least two beam pulses having different pulse widths, the total beam delivery time, and the beam repetition frequency of the beam pulses, issuing the beam repetition frequency to a beam generation system, and issuing a set beam termination dose threshold, a pulse conversion dose threshold obtained by means of calculation, and a beam termination time threshold to a beam sampling controller; determining whether a real beam delivery dose is greater than or equal to the pulse conversion dose threshold; determining, on the basis of the determination result, whether to output a level control signal for adjusting the pulse width to the beam generation system; then determining whether the real beam delivery dose is greater than or equal to a beam termination dose threshold, and at the same time, determining whether a real beam delivery time is greater than or equal to the beam termination time threshold; and determing, on the basis of the determination result, whether to output a level control signal for beam termination to the beam generation system. The accuracy of FLASH beam dose control is improved.
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Description

FLASH radiotherapy dose control method, device and electronic equipment TECHNICAL FIELD

[0001] The present application relates to the FLASH radiotherapy dose control technical field, and particularly relates to a FLASH radiotherapy dose control method, device and electronic equipment. BACKGROUND

[0002] FLASH radiotherapy is a new radiotherapy technology for killing tumor cells and reducing normal tissue toxic side effects by implementing super high dose rate particle ray irradiation on tumors in a very short time. Taking electronic FLASH radiotherapy as an example, in an electronic linear accelerator, the beam current of electron rays is usually generated in the form of pulses, and in order to realize the super high dose rate electron rays, the pulse frequency and single pulse dose must be increased, and the increase of the beam pulse frequency and single pulse dose brings great difficulty to the accurate control of the irradiation dose.

[0003] In order to meet the FLASH treatment mode, a large dose must be realized in a short time, and the beam frequency and single pulse dose must be increased as much as possible. In terms of realizing accurate irradiation dose, high pulse dose pulse frequency is meaningful for super high dose rate, but it has no actual meaning for high precision control, and therefore research must be carried out from the direction of single pulse dose. Therefore, the single pulse dose must be small, or at least the single pulse dose at the end of the beam must be small, to ensure the accuracy of the total beam dose, and it is necessary to require the existence of large dose pulse and small dose pulse in the beam control process, which involves the conversion time and mode, and specifically includes: amplitude, pulse width, if the amplitude adjustment may affect the beam energy size; and through the pulse width adjustment, it is difficult to achieve steep rising edge and falling edge. However, the prior art lacks a method for realizing accurate control of the irradiation dose by controlling the single pulse dose, and therefore in order to overcome the above technical problems, a dose control method suitable for the FLASH mode is proposed.

[0004] Therefore, the prior art still needs further development. SUMMARY

[0005] The present application aims at overcoming the above technical deficiencies, and provides a FLASH radiotherapy dose control method, device and electronic equipment to solve the problems in the prior art.

[0006] In order to achieve the above technical purpose, according to a first aspect of the present application, the present application provides a FLASH radiotherapy dose control method, which is applied to a FLASH radiotherapy system, and the FLASH radiotherapy system comprises a beam control system, a beam generation system and a beam monitoring system.

[0007] The FLASH radiotherapy dose control method comprises a multi-pulse control mode, and the multi-pulse control mode comprises:

[0008] S100, calculating, in a beam control system, the number of beam pulses, the total beam-out time, and the beam-out frequency of the beam pulses of at least two different pulse widths;

[0009] S200, delivering the beam-out frequency to a beam generation system, and delivering the pulse width of the beam pulses of at least two different pulse widths, the dose rate of the multi-pulse control mode, and the currently used source specification pre-set in the beam control system to the beam generation system and a beam sampling controller in a beam monitoring system;

[0010] S300, the beam sampling controller judges whether the actual beam-out dose is greater than or equal to a pulse conversion dose threshold value, and determines whether to output a level control signal for adjusting the pulse width to the beam generation system according to the judgment result.

[0011] Specifically, the S300 further comprises:

[0012] The beam sampling controller in the beam monitoring system judges whether the actual beam-out dose is greater than or equal to the stop beam dose threshold value of the multi-pulse control mode, and simultaneously judges whether the actual beam-out time is greater than or equal to the stop beam time threshold value, and determines whether to output a level control signal for stopping the beam-out to the beam generation system according to the judgment result.

[0013] Specifically, the beam pulses of at least two different pulse widths comprise at least a first beam pulse and a second beam pulse;

[0014] The pulse width of the beam pulses of at least two different pulse widths comprises:

[0015] The pulse width of the first beam pulse is a first preset pulse width, and the pulse width of the second beam pulse is a second preset pulse width, and the first preset pulse width is greater than the second preset pulse width.

[0016] Specifically, the S100 comprises:

[0017] The number of beam pulses D of the first beam pulse and the second beam pulse is calculated through the stop beam dose threshold value of the multi-pulse control mode pre-set in the beam control system.

[0018] The total beam-out time T of the first beam pulse and the second beam pulse is calculated by the pre-set beam-off dose threshold and dose rate of the multi-pulse control mode in the beam control system, and the specific calculation formula is as follows:

[0019] T=DoseSET / DoseRate;

[0020] Wherein, DoseSET is the pre-set beam-off dose threshold of the multi-pulse control mode in the beam control system, and DoseRate is the pre-set dose rate of the multi-pulse control mode in the beam control system.

[0021] The calculation formula of the beam-out frequency F is F=D / T.

[0022] Specifically, the number of beam-out D of the first beam pulse and the second beam pulse is calculated by the pre-set beam-off dose threshold of the multi-pulse control mode in the beam control system, which comprises:

[0023] Selecting the single-pulse dose Dose1 of the first beam pulse and the single-pulse dose Dose2 of the second beam pulse under the current used source specification;

[0024] The number of beam-out is calculated by the pre-set beam-off dose threshold of the multi-pulse control mode in the beam control system and the single-pulse dose Dose1 of the first beam pulse and the single-pulse dose Dose2 of the second beam pulse, and the specific calculation method is as follows:

[0025] DoseSET / Dose1=X……DoseRemain1;

[0026] DoseRemain1 / Dose2=Y……DoseRemain2;

[0027] The number of beam-out D is:

[0028] D=X+Y+1;

[0029] Wherein, DoseSET is the pre-set beam-off dose threshold of the multi-pulse control mode in the beam control system, X is the number of beam-out of the first beam pulse, Y is the number of beam-out of the second beam pulse, DoseRemain1 is the remaining dose after calculating the number of beam-out of the first beam pulse by the beam-off dose threshold of the multi-pulse control mode, and DoseRemain2 is the remaining dose after calculating the number of beam-out of the second beam pulse by DoseRemain1.

[0030] Specifically, the single-pulse dose Dose2 of the second beam pulse is controlled within the first pre-set threshold, so that the error between the actual beam-out dose and the beam-off dose threshold of the multi-pulse control mode is less than the first pre-set threshold.

[0031] Specifically, the pulse conversion dose threshold is calculated by a single pulse dose Dose1 of the first beam current pulse and a number of beam outputs X of the first beam current pulse, and the specific calculation method is as follows:

[0032] DoseSET1=X*Dose1;

[0033] Wherein, DoseSET1 is the pulse conversion dose threshold.

[0034] Specifically, the beam-off dose threshold of the multi-pulse control mode preset in the beam current control system and the calculated beam-off time threshold are sent to the beam sampling controller in the beam current monitoring system, and the specific method comprises:

[0035] The beam-off time threshold is calculated by the total beam output time T of the first beam current pulse and the second beam current pulse and the preset time margin T0, and the specific calculation method is as follows:

[0036] T1=T+T0;

[0037] Wherein, T1 is the beam-off time threshold.

[0038] Specifically, the beam sampling controller judges whether the real beam output dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and the specific method comprises:

[0039] If the real beam output dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller outputs the level control signal for adjusting the pulse width to the beam generation system within the first preset time, and the beam generation system adjusts the pulse width within the first preset time.

[0040] If the real beam output dose is less than the pulse conversion dose threshold, the beam sampling controller does not output the level control signal for adjusting the pulse width to the beam generation system.

[0041] Specifically, the beam sampling controller judges whether the real beam output dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and the specific method further comprises:

[0042] The beam sampling controller converts the electrical signal collected by the beam probe in the beam current monitoring system into a numerical value corresponding to the electrical signal through analog-digital conversion;

[0043] According to the current specification of the applicator, the corresponding calibration coefficient is obtained, and the real beam output dose is calculated according to the numerical value of the corresponding electrical signal and the calibration coefficient;

[0044] The calibration coefficient is used for calibrating the correspondence between the numerical value of the electric signal collected by the beam probe and the real beam-out dose value.

[0045] Specifically, the determining whether to output the level control signal for stopping the beam-out to the beam generation system according to the judgment result comprises:

[0046] If the real beam-out dose is greater than or equal to the beam-off dose threshold of the multi-pulse control mode, or the real beam-out time is greater than or equal to the beam-off time threshold, the beam sampling controller outputs the level control signal for stopping the beam-out to the beam generation system within a first preset time, and the beam generation system closes the beam-out enable port within the first preset time to stop the beam-out.

[0047] If the real beam-out dose is less than the beam-off dose threshold of the multi-pulse control mode, and the real beam-out time is less than the beam-off time threshold, the beam sampling controller does not output the level control signal for stopping the beam-out to the beam generation system.

[0048] Specifically, the FLASH radiotherapy dose control method further comprises a single-pulse control mode, and the single-pulse control mode adopts a fixed pulse width for dose output, and the single-pulse control mode comprises:

[0049] S1000, calculating the number of beam-out, the total beam-out time, and the beam-out frequency of the beam pulse with a fixed pulse width in the beam control system;

[0050] S2000, issuing the beam-out frequency to the beam generation system, issuing the dose rate of the single-pulse control mode with the fixed pulse width preset in the beam control system to the beam generation system, and issuing the currently used source specification preset in the beam control system to the beam sampling controller in the beam monitoring system;

[0051] S3000, the beam sampling controller judges whether the real beam-out dose is greater than or equal to the beam-off dose threshold of the single-pulse control mode, and simultaneously judges whether the real beam-out time is greater than or equal to the beam-off time threshold, and determines whether to output the level control signal for stopping the fixed pulse beam-out to the beam generation system according to the judgment result.

[0052] Specifically, the determining whether to output the level control signal for stopping the fixed pulse beam-out to the beam generation system according to the judgment result comprises:

[0053] If the real beam output dose is greater than or equal to the stop beam dose threshold of the single pulse control mode, or the real beam output time is greater than or equal to the stop beam time threshold, the beam sampling controller outputs a level control signal for stopping the fixed pulse beam output to the beam generation system within the first preset time, and the beam generation system closes the beam output enable port within the first preset time to stop the beam output;

[0054] If the real beam output dose is less than the stop beam dose threshold of the single pulse control mode, and the real beam output time is less than the stop beam time threshold, the beam sampling controller does not output a level control signal for stopping the fixed pulse beam output to the beam generation system.

[0055] According to a second aspect of the present application, a FLASH radiotherapy device is provided, comprising:

[0056] The beam control system comprises a human-computer interaction interface and a controller, and is used for calculating the number of beam outputs, the total beam output time, and the beam output frequency of beam pulses of at least two different pulse widths, and issuing the beam output frequency to the beam generation system within the first preset time, and issuing the pulse width of the beam pulses of the at least two different pulse widths and the dose rate of the multi-pulse control mode to the beam generation system in advance, and issuing the stop beam dose threshold of the multi-pulse control mode, the currently used source specification, and the pulse conversion dose threshold and the stop beam time threshold calculated to the beam sampling controller in the beam monitoring system;

[0057] The beam generation system comprises a gun power supply, a klystron power supply, a microwave excitation source, a klystron, and an accelerating tube, and is used for receiving and completing the instructions issued by the beam control system and the beam monitoring system within the first preset time;

[0058] The beam monitoring system comprises a beam probe and a beam sampling controller, and is used for judging whether the real beam output dose is greater than or equal to the pulse conversion dose threshold, determining whether to output a level control signal for adjusting the pulse width to the beam generation system according to the judgment result, then judging whether the real beam output dose is greater than or equal to the stop beam dose threshold of the multi-pulse control mode, and simultaneously judging whether the real beam output time is greater than or equal to the stop beam time threshold, and determining whether to output a level control signal for stopping the beam output to the beam generation system according to the judgment result.

[0059] According to a third aspect of the present application, an electronic device is provided, comprising a memory and a processor, wherein the memory stores computer readable instructions, and the computer readable instructions are executed by the processor to implement the FLASH radiotherapy dose control method. Advantages

[0060] The present application realizes the purpose of precisely controlling the FLASH beam dose by calculating the number of beam pulses, the total beam-out time, the beam-out frequency of the beam pulses of at least two different pulse widths in the beam current control system, judging whether the real beam-out dose is greater than or equal to the pulse conversion dose threshold value through the beam monitoring system, and determining whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, then judging whether the real beam-out dose is greater than or equal to the stop beam dose threshold value, and simultaneously judging whether the real beam-out time is greater than or equal to the stop beam time threshold value, and determining whether to output the level control signal for stopping the beam-out to the beam generation system according to the judgment result, greatly improving the safety of the beam pulse dose control, solving the problem that the FLASH beam pulse frequency is high, the single pulse dose is large, and the beam-out dose is difficult to precisely control in the FLASH beam, realizing the precise control of the FLASH beam dose from the aspects of the beam-out dose and the beam-out time, and using the level control signal for signal transmission, which can quickly respond to the change of the beam dose, does not need complex communication interface or protocol, is easy to realize, greatly reduces the complexity of the signal transmission process, and further improves the stability and reliability of the FLASH beam dose control, greatly improves the intelligent degree, safety and reliability of the present application. BRIEF DESCRIPTION OF DRAWINGS

[0061] Fig. 1 is a flowchart of the FLASH radiotherapy dose control method provided in the specific embodiment of the present application;

[0062] Fig. 2 is a system composition diagram of the FLASH radiotherapy system provided in the specific embodiment of the present application;

[0063] Fig. 3 is a composition diagram of the FLASH radiotherapy device provided in the specific embodiment of the present application. DETAILED DESCRIPTION

[0064] In order to enable the personnel in the art to better understand the technical solutions of the present application, the technical solutions of the present application are described clearly and completely below in combination with the drawings of the present application, and other similar embodiments obtained by the personnel in the art without making creative efforts on the basis of the embodiments in the present application shall all belong to the protection scope of the present application. In addition, the direction words mentioned in the following embodiments, such as “up”, “down”, “left”, “right” and the like are only the directions of the drawings, therefore, the direction words used are used for illustration but not for limiting the present application.

[0065] The present application is further described below in combination with the drawings and the preferred embodiments.

[0066] Please refer to FIG. 1, the embodiment provides a FLASH radiotherapy dose control method, the FLASH radiotherapy dose control method is applied to a FLASH radiotherapy system, the FLASH radiotherapy system includes a beam control system, a beam generation system and a beam monitoring system;

[0067] It should be noted that the beam control system is provided with a plurality of pulse control mode stop dose threshold, a plurality of pulse control mode dose rate, a single pulse control mode stop dose threshold, a single pulse control mode dose rate, a currently used applicator specification, a first preset threshold, a first preset time, a first preset pulse width, a second preset pulse width, a fixed pulse width, a preset time margin.

[0068] It can be understood that the present application does not limit the specific values of the plurality of pulse control mode stop dose threshold, the plurality of pulse control mode dose rate, the single pulse control mode stop dose threshold, the single pulse control mode dose rate, the currently used applicator specification, the first preset threshold, the first preset time, the first preset pulse width, the second preset pulse width, the fixed pulse width, the preset time margin, as long as it can be applied to the FLASH radiotherapy dose control method proposed in the present application.

[0069] Preferably, the present application sets the plurality of pulse control mode stop dose threshold to 60 Gy, the present application sets the plurality of pulse control mode dose rate to 200 Gy / S, the present application sets the single pulse control mode stop dose threshold to 30 Gy, the present application sets the single pulse control mode dose rate to 50 Gy / S, the present application sets the currently used applicator diameter to 10 cm, the present application sets the currently used applicator angle to 0°, the present application sets the first preset pulse width to 5 μs, the present application sets the second preset pulse width to 0.1 μs, the present application sets the fixed pulse width to 0.1 μs, the present application sets the first preset threshold to 0.1 Gy, the present application sets the first preset time to 500 μs, and the present application sets the preset time margin to 50 ms. The above settings are obtained by a large number of experiments by those skilled in the art, which can further improve the accuracy of FLASH beam dose control and greatly improve the usability and reliability of the present application.

[0070] The FLASH radiotherapy dose control method includes a plurality of pulse control modes, and the plurality of pulse control modes include:

[0071] S100, calculating the number of beam pulses, the total beam time and the beam pulse frequency of at least two different pulse widths in the beam control system;

[0072] Specifically, the at least two beam current pulses with different pulse widths include at least a first beam current pulse and a second beam current pulse.

[0073] The pulse widths of the at least two beam current pulses with different pulse widths include:

[0074] The pulse width of the first beam current pulse is a first preset pulse width, and the pulse width of the second beam current pulse is a second preset pulse width, wherein the first preset pulse width is greater than the second preset pulse width.

[0075] Specifically, the calculation of the number of pulses, the total beam-out time, and the beam-out frequency of the at least two beam current pulses with different pulse widths in the beam current control system includes:

[0076] The number of pulses D of the first beam current pulse and the second beam current pulse is calculated by a stop beam dose threshold of a multi-pulse control mode preset in the beam current control system.

[0077] The total beam-out time T of the first beam current pulse and the second beam current pulse is calculated by a stop beam dose threshold and a dose rate of a multi-pulse control mode preset in the beam current control system, and the specific calculation formula is as follows:

[0078] T=DoseSET / DoseRate;

[0079] Wherein, DoseSET is a stop beam dose threshold of a multi-pulse control mode preset in the beam current control system, and DoseRate is a dose rate of a multi-pulse control mode preset in the beam current control system.

[0080] The calculation formula of the beam-out frequency F is F=D / T.

[0081] It can be understood that the number of pulses refers to the number of pulses emitted from the beam source, and the beam-out frequency refers to the number of times the beam current pulse is continuously emitted per unit time. After the beam current control system calculates the beam-out frequency F, the beam-out frequency parameter F is sent to the beam generation system, and at the same time, the beam current control system sends at least two pulse width parameters, i.e., the first preset pulse width of the first beam current pulse and the second preset pulse width of the second beam current pulse, to the beam generation system for beam-out.

[0082] Specifically, the calculation of the number of pulses D of the first beam current pulse and the second beam current pulse by a stop beam dose threshold of a multi-pulse control mode preset in the beam current control system includes:

[0083] The single-pulse dose Dose1 of the first beam current pulse and the single-pulse dose Dose2 of the second beam current pulse under the currently used applicator specification are selected.

[0084] The number of beam pulses is calculated by the pre-set stop beam dose threshold of the multi-pulse control mode in the beam control system and the single pulse dose Dose1 of the first beam pulse and the single pulse dose Dose2 of the second beam pulse, and the calculation method is as follows:

[0085] DoseSET / Dose1=X……DoseRemain1;

[0086] DoseRemain1 / Dose2=Y……DoseRemain2;

[0087] The number of beam pulses D is:

[0088] D=X+Y+1;

[0089] Wherein, DoseSET is the stop beam dose threshold of the multi-pulse control mode set in the beam control system, X is the number of beam pulses of the first beam pulse, Y is the number of beam pulses of the second beam pulse, DoseRemain1 is the remaining dose after calculating the number of beam pulses of the first beam pulse by the stop beam dose threshold of the multi-pulse control mode, and DoseRemain2 is the remaining dose after calculating the number of beam pulses of the second beam pulse by DoseRemain1.

[0090] It can be understood that the specifications of the applicator include the diameter and angle of the applicator, and the single pulse dose of different beam pulses for different applicator specifications can be measured by experiments. Since the specifications of the applicator will affect the dose distribution of the beam, it is necessary to find the corresponding single pulse dose Dose1 of the first beam pulse under the specifications of the applicator and the corresponding single pulse dose Dose2 of the second beam pulse under the specifications of the applicator, so that the stop beam dose threshold DoseSET of the multi-pulse control mode pre-set in the beam control system can be realized by a plurality of large pulse width first beam pulses plus a plurality of small pulse width second beam pulses. DoseRemain2 is the remaining dose after calculating the number of beam pulses of the second beam pulse by DoseRemain1. Since DoseRemain2 is less than the single pulse dose Dose2 of the second beam pulse, a small pulse width second beam pulse is needed at the end to meet the requirement of the total dose of the beam, i.e. the stop beam dose threshold.

[0091] Specifically, the single pulse dose Dose2 of the second beam pulse is controlled within a first pre-set threshold, so that the error between the actual beam dose and the stop beam dose threshold of the multi-pulse control mode is less than the first pre-set threshold.

[0092] It should be noted that the first preset threshold is preferably 0.1 Gy in the present application, that is, to control the error between the actual beam dose and the stop beam dose threshold of the multi-pulse control mode set by the user within 0.1 Gy, therefore, when adapting to different specifications of applicators, the beam dose of the small pulse width, that is, the single pulse dose of the second beam pulse, is less than 0.1 Gy under different specifications of applicators, so as to ensure that the final actual beam dose is closer to the preset stop beam dose, further reduce the beam dose error of the beam pulse, and greatly improve the accuracy and stability of the FLASH beam pulse dose control.

[0093] S200, the beam frequency is sent to the beam generation system, and the pulse width of at least two different pulse width beam pulses and the dose rate of the multi-pulse control mode preset in the beam control system are sent to the beam generation system; and the current applicator specification preset in the beam control system is sent to the beam sampling controller in the beam monitoring system;

[0094] It can be understood that the beam control system can complete the delivery of the beam delivery instruction, the beam monitoring system can complete the delivery of the beam stop, pulse width adjustment and other instructions, the beam generation system can complete the corresponding instruction action according to the instructions of the beam control system and the beam monitoring system, and the beam monitoring system can realize multi-zone detection of the ultra-high dose rate electron beam, convert the electron beam into an electrical signal, and configure the action instruction of the electrical signal. The above-mentioned beam control system, beam generation system and beam monitoring system jointly constitute a highly integrated and coordinated beam dose control system, improve the accuracy of electron beam pulse dose control, and greatly improve the safety and reliability of the present application.

[0095] S300, the beam sampling controller judges whether the actual beam dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result.

[0096] Specifically, the S300 further comprises:

[0097] The stop beam dose threshold of the multi-pulse control mode and the stop beam time threshold obtained by calculation preset in the beam control system are sent to the beam sampling controller in the beam monitoring system, and it is judged whether the actual beam dose is greater than or equal to the stop beam dose threshold of the multi-pulse control mode, at the same time, the beam sampling controller judges whether the actual beam time is greater than or equal to the stop beam time threshold, and determines whether to output the level control signal for stopping the beam to the beam generation system according to the judgment result.

[0098] Specifically, the pulse conversion dose threshold is calculated by a single pulse dose Dose1 of the first beam current pulse and a number of beam outputs X of the first beam current pulse, and the specific calculation method is as follows:

[0099] DoseSET1=X*Dose1;

[0100] Wherein, DoseSET1 is the pulse conversion dose threshold.

[0101] Specifically, the beam-off dose threshold of the multi-pulse control mode preset in the beam current control system and the calculated beam-off time threshold are sent to the beam sampling controller in the beam monitoring system, and the specific method comprises:

[0102] The beam-off time threshold is calculated by the total beam output time T of the first beam current pulse and the second beam current pulse and the preset time margin T0, and the specific calculation method is as follows:

[0103] T1=T+T0;

[0104] Wherein, T1 is the beam-off time threshold.

[0105] It can be understood that, in order to improve the safety of beam dose control, the beam current control system not only sets the beam-off dose threshold of the multi-pulse control mode, but also ensures the safety of beam output from the perspective of beam output time, for example, after setting the dose rate and the beam-off dose threshold of the multi-pulse control mode in the beam current control system, the total beam output time T is calculated, and a time margin T0 is added to the total beam output time T to obtain the beam-off time threshold T1. The preset time margin T0 is set to 50ms in the present application. If the beam monitoring system monitors that the real beam output time of the beam generation system reaches the beam-off time threshold T1, the beam output is immediately stopped, so that the safety of beam output is realized from the aspects of beam output dose and beam output time, and the safety and accuracy of beam pulse beam output dose control are greatly improved.

[0106] Specifically, the beam sampling controller judges whether the real beam output dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and the specific method comprises:

[0107] If the real beam output dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller outputs the level control signal for adjusting the pulse width to the beam generation system within a first preset time, and the beam generation system adjusts the pulse width within the first preset time.

[0108] If the real beam output dose is less than the pulse conversion dose threshold, the beam sampling controller does not output the level control signal for adjusting the pulse width to the beam generation system.

[0109] It needs to be further explained that the beam current generation system and the beam current monitoring system in the application need to complete the issuing and execution of the instructions within the first preset time, and the sum of the first preset time of the process of the beam current monitoring system issuing instructions and the beam current generation system executing instructions is less than the interval time of two first beam current pulses, that is, the interval time of the large pulse, that is, the interval time between the end of this pulse and the generation of the next pulse; so as to ensure that each instruction has enough time to be completely received and processed, and then ensure that the pulse width adjustment signal can be issued to the beam current generation system before the next large pulse is generated and the small pulse beam output preparation is completed. The first preset time in the application is set to 500us, which means that the beam current sampling controller must complete signal processing and output in a very short time, and at the same time, the beam current generation system must also complete the reception and execution of the instructions in a very short time, to ensure timely pulse conversion and controllable exposure dose. At the same time, the beam current generation system is directly controlled by the beam current monitoring system through the level control signal, compared with the communication control connection through the beam current control system, without complex communication protocol, reducing the complexity of the system, and having faster response speed, being able to quickly respond and adjust the beam current parameters, further improving the timeliness, stability and controllability of the beam current dose.

[0110] It needs to be explained here that the stop beam dose threshold of the multi-pulse control mode in the application is the total dose of the beam current pulse set by the user, and the pulse conversion dose threshold is the total dose of the first beam current pulse calculated in the beam current control system. In order to realize accurate control of the beam current dose, the total dose of the first beam current pulse, that is, the pulse conversion dose threshold, and the total dose of the set beam current pulse, that is, the stop beam dose threshold of the multi-pulse control mode, need to be issued to the beam current sampling controller in the beam current monitoring system to monitor whether the current beam current dose of the beam current pulse reaches the pulse conversion dose threshold in real time. If the pulse conversion dose threshold is reached, it is judged whether the current beam current dose reaches the stop beam dose threshold, and then it is judged whether to stop the beam output, which greatly improves the accuracy and safety of the beam current pulse dose control.

[0111] Specifically, the beam current sampling controller judges whether the real beam output dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam current generation system according to the judgment result, and further comprises:

[0112] The beam current sampling controller obtains the numerical value corresponding to the electrical signal by analog-to-digital conversion on the electrical signal collected by the beam current probe;

[0113] According to the currently used exposure source specification, the corresponding calibration coefficient is obtained, and the real beam output dose is calculated according to the numerical value of the corresponding electrical signal and the calibration coefficient;

[0114] The calibration coefficient is used to calibrate the correspondence between the numerical value of the electric signal collected by the beam probe and the real beam-out dose value.

[0115] It needs to be further explained that, regarding the calibration coefficient in the beam monitoring system, which is usually used to calibrate the correspondence between the electric signal value collected by the beam probe and the real beam-out dose value, the calibration coefficient is related to the selected source specification and the pulse width of the beam pulse, and the real beam-out dose can be tested using a dose film or a calibrated probe, while the electric signal value collected by the beam probe is recorded, so that the calibration coefficient between the electric signal collection value of the beam pulse of the beam probe and the real beam-out dose value of different specifications of the source under different beam pulse widths can be calibrated. These calibration coefficients will be sent to the beam sampling controller by the beam sampling controller when the selected source and the set beam pulse width are selected, and used to calculate the real beam-out dose value.

[0116] Specifically, the method comprises:

[0117] If the real beam-out dose is greater than or equal to the stop beam dose threshold of the multi-pulse control mode, or the real beam-out time is greater than or equal to the stop beam time threshold, the beam sampling controller outputs the stop beam level control signal to the beam generation system within the first preset time, and the beam generation system closes the beam enable port within the first preset time to stop the beam.

[0118] If the real beam-out dose is less than the stop beam dose threshold of the multi-pulse control mode, and the real beam-out time is less than the stop beam time threshold, the beam sampling controller does not output the stop beam level control signal to the beam generation system.

[0119] It can be understood that in the multi-pulse control mode, during the beam-out process, the beam generation system first starts the beam-out in a large pulse width, i.e. the state of the first beam pulse, the beam sampling controller in the beam monitoring system acquires the converted electrical signal of the beam in real time and performs analog-digital conversion to obtain the numerical value of the electrical signal, the beam sampling controller calculates the real beam-out dose according to the calibrated coefficient tested out, when the real beam-out dose is greater than or equal to the pulse conversion dose threshold value, the beam sampling controller will output the electrical level control signal for adjusting the pulse width to the beam generation system within 500μs, after receiving the electrical level control signal, the beam generation system will change the beam-out pulse width to the second beam pulse, i.e. the small pulse width state within 500μs, at this time, the beam monitoring system will continuously monitor whether the numerical value of the beam-out dose is greater than or equal to the stop beam dose threshold value of the multi-pulse control mode in real time, when the real beam-out dose is greater than or equal to the stop beam dose threshold value of the multi-pulse control mode, the beam sampling controller will output the electrical level control signal for stopping the beam within 500μs. It should be noted that the beam monitoring system monitors the real beam-out time in real time from the beginning of the beam-out, when the real beam-out time is greater than or equal to the stop beam time threshold value, the beam sampling controller will output the electrical level control signal for stopping the beam within 500μs, at this time, the beam generation system will close the beam enable port within 500μs to stop the beam-out. The beam-out dose and the beam-out time are used to control the stop beam, i.e. when any one of the beam-out dose and the beam-out time meets the condition, the beam can be stopped, which greatly improves the accuracy and safety of the FLASH beam-out dose control of the present application.

[0120] Please refer to FIG. 2, the specific working principle of the multi-pulse control mode will be explained below through a specific example:

[0121] S1: the user sets the stop beam dose threshold value of the multi-pulse control mode to be 60Gy, the dose rate to be 200Gy / S, the selected applicator diameter to be 10cm, the angle to be 0°, and the preset time margin T0 to be 50ms through the interactive interface, at this time, the controller confirms the first beam pulse single pulse dose Dose1 of the applicator with the diameter of 10cm and the angle of 0° to be 2.3Gy and the second beam pulse single pulse dose Dose2 to be 0.08Gy according to the set applicator specification, then calculates the beam number D:

[0122] 60 / 2.3=26……0.2;

[0123] 0.2 / 0.08=2……0.04;

[0124] D=26+2+1=29;

[0125] The beam-out time T is calculated as:

[0126] T=60 / 200=0.3s;

[0127] The beam frequency F is calculated as:

[0128] F = 29 / 0.3 = 96.7 Hz;

[0129] The beam frequency F is rounded up to 97 Hz;

[0130] S2: The controller sends the calculated beam frequency F, the first preset pulse width W1 (5 μs, i.e., a large pulse width), and the second preset pulse width W2 (0.1 μs, i.e., a small pulse width) to the beam generation system;

[0131] S3: The controller sends the calibration coefficient, the pulse conversion dose threshold DoseSET1 (59.8 Gy), the beam-off dose threshold DoseSET, and the beam-off time threshold to the beam sampling controller. After the parameters are sent successfully, the beam control system prompts that the beam-out condition is met.

[0132] S4: The user clicks the beam-out button to trigger the electron beam-out switch, and the electron beam starts to be output at a large pulse width (W1, 5 μs).

[0133] S5: After the beam starts to be output, the beam probe monitors the beam signal in real time and converts it into an electrical signal to the beam sampling controller. The beam sampling controller converts the electrical signal into a real beam dose value in real time through analog-to-digital conversion and the calibration coefficient.

[0134] S6: When the real-time beam dose value calculated by the beam sampling controller is greater than or equal to the pulse conversion dose threshold DoseSET1 (59.8 Gy), the beam sampling controller outputs an adjusted pulse width level control signal to the beam generation system within 500 μs. After receiving the level control signal, the beam generation system changes the beam-out pulse width to a second beam pulse, i.e., a small pulse width W2 (0.1 μs), within 500 μs.

[0135] S7: The calculated stop beam time threshold T1 is 0.35s, when the real-time beam dose value calculated by the beam sampling controller is greater than or equal to the stop beam dose threshold DoseSET (60Gy), or when the real-time beam time monitored by the beam sampling controller is greater than or equal to the stop beam time threshold T1 (0.35s), the beam sampling controller will output a stop beam level control signal to the beam generation system within 500μs, and the beam generation system will stop the beam output within 500μs after receiving the level control signal, finally realizing the precise control of the beam dose. The sum of the time required for the beam control system and the beam monitoring system to issue instructions and the time required for the beam generation system to execute the instructions is less than the interval time between two first beam pulses, i.e. the interval time between the end of the current pulse and the generation of the next pulse; thereby ensuring that each instruction has sufficient time to be completely received and processed, and further ensuring that the pulse width adjustment signal can be issued to the beam generation system and the small pulse beam output preparation can be completed before the next large pulse is generated.

[0136] Specifically, the FLASH radiotherapy dose control method further comprises a single pulse control mode, wherein a fixed pulse width is used for dose output in the single pulse control mode, and the single pulse control mode comprises:

[0137] S1000, calculating the number of beam pulses, the total beam output time, and the beam pulse output frequency of the fixed pulse width in the beam control system;

[0138] S2000, issuing the beam output frequency to the beam generation system, issuing the fixed pulse width and the dose rate of the single pulse control mode preset in the beam control system to the beam generation system, and issuing the currently used source applicator specification preset in the beam control system to the beam sampling controller in the beam monitoring system;

[0139] S3000, the beam sampling controller judges whether the real beam dose is greater than or equal to the stop beam dose threshold of the single pulse control mode, and simultaneously judges whether the real beam output time is greater than or equal to the stop beam time threshold, and determines whether to output a level control signal for stopping the fixed pulse beam output to the beam generation system according to the judgment result.

[0140] Specifically, the determination of whether to output a level control signal for stopping the fixed pulse beam output to the beam generation system according to the judgment result comprises:

[0141] If the real beam output dose is greater than or equal to the stop beam dose threshold of the single pulse control mode, or the real beam output time is greater than or equal to the stop beam time threshold, the beam sampling controller outputs a level control signal to stop the fixed pulse beam output to the beam generation system within a first preset time, and the beam generation system closes the beam enable port within the first preset time to stop the beam output;

[0142] If the real beam output dose is less than the stop beam dose threshold of the single pulse control mode, and the real beam output time is less than the stop beam time threshold, the beam sampling controller does not output a level control signal to stop the fixed pulse beam output to the beam generation system.

[0143] It should be further explained that in the single pulse control mode, the beam generation system starts the beam output in a fixed pulse state, the beam sampling controller in the beam monitoring system acquires the real-time beam conversion electrical signal and performs analog-to-digital conversion to obtain the numerical value of the electrical signal, and the beam sampling controller calculates the real beam output dose according to the tested calibration coefficient. At this time, the beam monitoring system monitors the beam output dose and the beam output time in real time from the beginning of the beam output. When it is monitored that the real beam output dose is greater than or equal to the stop beam dose threshold of the single pulse control mode, or the real beam output time is greater than or equal to the stop beam time threshold, the beam sampling controller will output a level control signal to stop the beam within 500μs. At this time, the beam generation system will close the beam enable port within 500μs to stop the beam output.

[0144] The specific working principle of the single pulse control mode will be described below through a specific example:

[0145] S11: Set the stop beam dose threshold of the single pulse control mode to 30Gy, the dose rate to 50Gy / S, the selected applicator diameter to 10cm, the angle to 0°, and the preset time margin T0 to 50ms through the interactive interface. At this time, the controller confirms the single pulse dose Dose3 of the fixed beam pulse of the applicator with a diameter of 10cm and an angle of 0° according to the set applicator specification, which is 0.08Gy. Then the number of beams D is calculated as:

[0146] D=30 / 0.08=375;

[0147] The beam time T is calculated as:

[0148] T=30 / 50=0.6s;

[0149] The beam frequency F is calculated as:

[0150] F=375 / 0.6=625Hz;

[0151] The controller sends the calculated pulse width control frequency, i.e. the beam-out frequency 625 Hz, and the fixed pulse width W3 of 0.1 μs to the beam generation system;

[0152] S21: The beam-out frequency 625 Hz is sent to the beam generation system, and the fixed pulse width 0.1 μs and the dose rate 50 Gy / S pre-set in the beam control system are sent to the beam generation system; and the currently used applicator specification pre-set in the beam control system is sent to the beam sampling controller in the beam monitoring system.

[0153] S31: The beam sampling controller determines whether the real beam-out dose is greater than or equal to the pulse stop dose threshold 30 Gy, and simultaneously determines whether the real beam-out time is greater than or equal to the stop time threshold 650 ms, and according to the determination result, determines whether to output the level control signal for stopping the fixed pulse beam-out to the beam generation system. The stop time threshold is calculated by summing the beam-out time T and the pre-set time margin T0. When the real-time beam-out dose value calculated by the beam sampling controller is greater than or equal to the stop dose threshold 30 Gy, or when the beam sampling controller monitors that the real beam-out time is greater than or equal to the stop time threshold 650 ms, the beam sampling controller will output the stop level control signal to the beam generation system within 500 μs, and the beam generation system will stop the beam-out within 500 μs after receiving the level control signal, thereby realizing accurate control of the beam dose.

[0154] It can be understood that, compared with the multi-pulse control mode, the fixed pulse control mode is equivalent to that the pulse width of the beam generation system is fixed to the second pre-set pulse width, i.e. only small pulses are used to apply the total dose.

[0155] It should be noted that the present application calculates the number of beam pulses, the total beam-out time, the beam-out frequency of the beam pulses of at least two different pulse widths in the beam control system, and determines whether the real beam-out dose is greater than or equal to the pulse conversion dose threshold value through the beam monitoring system, determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the determination result, realizes the purpose of accurately controlling the beam-out dose of the FLASH beam, and then determines whether the real beam-out dose is greater than or equal to the stop beam dose threshold value, and simultaneously determines whether the real beam-out time is greater than or equal to the stop beam time threshold value, and according to the determination result, determines whether to output the level control signal for stopping the beam-out to the beam generation system, greatly improves the safety of the beam pulse dose control, solves the problem that the beam pulse frequency is high, the single pulse dose is large, and the beam-out dose is difficult to accurately control in the FLASH beam, realizes the accurate control of the FLASH beam-out dose from the aspects of the beam-out dose and the beam-out time, and simultaneously uses the level control signal for signal transmission, can quickly respond to the change of the beam dose, does not need a complex communication interface or protocol, is easy to realize, greatly reduces the complexity of the signal transmission process, further improves the stability and reliability of the FLASH beam dose control, and greatly improves the intelligent degree, safety and reliability of the present application.

[0156] Please refer to FIG. 3, the present embodiment provides a FLASH radiotherapy device, comprising:

[0157] The beam control system 100 comprises a man-machine interface and a controller, and is used for calculating the number of beam pulses, the total beam-out time, and the beam-out frequency of the beam pulses of at least two different pulse widths, and issuing the beam-out frequency to the beam generation system within a first preset time, and issuing the pulse width of the beam pulse of at least two different pulse widths, the dose rate of the multi-pulse control mode to the beam generation system, and issuing the stop beam dose threshold value of the multi-pulse control mode, the current source specification, and the pulse conversion dose threshold value and the stop beam time threshold value calculated through the beam sampling controller in the beam monitoring system to the beam generation system;

[0158] The beam generation system 200 comprises a gun power supply, a klystron power supply, a microwave excitation source, a klystron, and an accelerating tube, and is used for receiving and completing the instructions issued by the beam control system and the beam monitoring system within the first preset time;

[0159] The beam monitoring system 300 comprises a beam probe and a beam sampling controller, is used for judging whether the real beam-out dose is greater than or equal to a pulse conversion dose threshold value, determining whether to output a level control signal for adjusting the pulse width to the beam generation system according to a judgment result, then judging whether the real beam-out dose is greater than or equal to a stop beam dose threshold value of a multi-pulse control mode, simultaneously judging whether the real beam-out time is greater than or equal to a stop beam time threshold value, and determining whether to output a level control signal for stopping the beam-out to the beam generation system according to a judgment result.

[0160] It can be understood that the user sets the output parameters of the electron gun power supply, the klystron power supply and the microwave excitation source according to the beam pulse width parameters, the beam pulse frequency parameters issued by the beam control system and the debugging experience.

[0161] It should be noted that the present application realizes the purpose of precisely controlling the beam-out dose of the FLASH beam by calculating the beam-out number, the total beam-out time and the beam-out frequency of the beam pulse with at least two different pulse widths in the beam control system, judging whether the real beam-out dose is greater than or equal to a pulse conversion dose threshold value by the beam monitoring system, determining whether to output a level control signal for adjusting the pulse width to the beam generation system according to a judgment result, then judging whether the real beam-out dose is greater than or equal to a stop beam dose threshold value, simultaneously judging whether the real beam-out time is greater than or equal to a stop beam time threshold value, and determining whether to output a level control signal for stopping the beam-out to the beam generation system according to a judgment result, greatly improves the safety of the beam pulse dose control, solves the problem that the beam pulse frequency is high, the single pulse dose is large and the beam-out dose is difficult to be precisely controlled in the FLASH beam, realizes the precise control of the FLASH beam-out dose from the aspects of the beam-out dose and the beam-out time, simultaneously uses the level control signal for signal transmission, can quickly respond to the change of the beam dose, does not need a complex communication interface or protocol, is easy to realize, greatly reduces the complexity of the signal transmission process, further improves the stability and reliability of the FLASH beam dose control, greatly improves the intelligent degree, the safety and the reliability of the present application.

[0162] In a preferred embodiment, the present application further provides an electronic device, comprising:

[0163] The computer device can be a server, a terminal, or any other electronic device having necessary computing and / or processing capabilities. In one embodiment, the computer device can include a processor, a memory, a network interface, a communication interface, and the like connected by a system bus. The processor of the computer device can be configured to provide necessary computing, processing, and / or control capabilities. The memory of the computer device can include a non-volatile storage medium and an internal memory. The non-volatile storage medium can store an operating system, a computer program, and the like therein or thereon. The internal memory can provide an environment for running the operating system and the computer program in the non-volatile storage medium. The network interface and the communication interface of the computer device can be configured to connect and communicate with external devices through a network. The computer program, when executed by the processor, performs the steps of the method of the present application.

[0164] The present application can be implemented as a computer readable storage medium having a computer program stored thereon, which, when executed by a processor, causes the steps of the method of the embodiments of the present application to be performed. In one embodiment, the computer program is distributed over a plurality of computer devices or processors coupled by a network, such that the computer program is stored, accessed, and executed by one or more computer devices or processors in a distributed manner. A single method step / operation, or two or more method steps / operations, can be performed by a single computer device or processor, or by two or more computer devices or processors. One or more method steps / operations can be performed by one or more computer devices or processors, and one or more other method steps / operations can be performed by one or more other computer devices or processors. One or more computer devices or processors can perform a single method step / operation, or perform two or more method steps / operations.

[0165] It will be appreciated by those skilled in the art that the method steps of the present application can be instructed by a computer program to relevant hardware such as a computer device or a processor, which can be stored in a non-transitory computer readable storage medium, and which, when executed, causes the steps of the present application to be performed. Depending on the circumstances, any reference herein to a memory, storage, database, or other medium can include non-volatile and / or volatile memory. Examples of non-volatile memory include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), flash memory, magnetic tapes, floppy disks, magneto-optical data storage devices, optical data storage devices, hard disks, solid-state disks, and the like. Examples of volatile memory include random access memory (RAM), external cache memory, and the like.

[0166] It should be noted that the present application realizes the purpose of precisely controlling the dose of the FLASH beam by calculating the number of beam pulses, the total beam-out time, the beam-out frequency of the beam pulses of at least two different pulse widths in the beam control system, determining whether the real dose of the beam-out is greater than or equal to the pulse conversion dose threshold by the beam monitoring system, and determining whether to output the level control signal for adjusting the pulse width to the beam generation system according to the determination result, then determining whether to output the level control signal for stopping the beam-out to the beam generation system according to the determination result by determining whether the real dose of the beam-out is greater than or equal to the stop dose threshold and simultaneously determining whether the real beam-out time is greater than or equal to the stop time threshold, greatly improving the safety of the dose control of the beam pulse, solving the problem that the dose of the FLASH beam is difficult to be precisely controlled due to the high frequency of the beam pulse, the large single pulse dose and the dose of the FLASH beam, realizing the precise control of the dose of the FLASH beam from the two aspects of the dose of the beam-out and the beam-out time, and using the level control signal for signal transmission, which can quickly respond to the change of the dose of the beam, does not need a complex communication interface or protocol, is easy to realize, greatly reduces the complexity of the signal transmission process, and further improves the stability and reliability of the dose control of the FLASH beam, greatly improves the intelligent degree, safety and reliability of the present application.

[0167] The technical features described above can be combined arbitrarily. Although all possible combinations of the technical features are not described, any combination of the technical features should be considered to be covered by the present specification, as long as there is no contradiction in the combination.

[0168] The specific embodiments of the present application described above do not constitute a limitation on the scope of protection of the present application. Any various other corresponding changes and modifications made according to the technical concept of the present application should be included in the scope of protection of the claims of the present application.

Claims

1. A method of FLASH radiotherapy dose control, characterized in that, The FLASH radiotherapy dose control method is applied to a FLASH radiotherapy system, and the FLASH radiotherapy system comprises a beam control system, a beam generation system and a beam monitoring system. The FLASH radiotherapy dose control method comprises a multi-pulse control mode, and the multi-pulse control mode comprises: S100, calculating, in the beam control system, the number of beam pulses, the total beam-on time and the beam-on frequency of the beam pulses of at least two different pulse widths; S200, sending the beam-on frequency to the beam generation system, and sending the pulse width of the beam pulses of at least two different pulse widths and the dose rate of the multi-pulse control mode to the beam generation system, which are preset in the beam control system; and sending the currently used source specification preset in the beam control system to the beam sampling controller in the beam monitoring system; S300, the beam sampling controller judges whether the actual beam-on dose is greater than or equal to the pulse conversion dose threshold value, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result.

2. The FLASH radiotherapy dose control method of claim 1, wherein, The S300 further comprises: sending the beam-on dose threshold value of the multi-pulse control mode and the calculated beam-off time threshold value to the beam sampling controller in the beam monitoring system, judging whether the actual beam-on dose is greater than or equal to the beam-on dose threshold value of the multi-pulse control mode, and simultaneously, the beam sampling controller judges whether the actual beam-on time is greater than or equal to the beam-off time threshold value, and determines whether to output the level control signal for stopping beam-on to the beam generation system according to the judgment result.

3. The FLASH radiotherapy dose control method of claim 1, wherein, The at least two different pulse width beam pulses at least comprise a first beam pulse and a second beam pulse; The pulse width of the at least two different pulse width beam pulses comprises: The pulse width of the first beam pulse is a first preset pulse width, and the pulse width of the second beam pulse is a second preset pulse width, and the first preset pulse width is greater than the second preset pulse width.

4. The FLASH radiotherapy dose control method of claim 3, wherein, The calculation of the number of beam pulses, the total beam-on time and the beam-on frequency of the beam pulses of at least two different pulse widths in the beam control system comprises: calculating the number of beam pulses D of the first beam pulse and the second beam pulse through the beam-on dose threshold value of the multi-pulse control mode preset in the beam control system; calculating the total beam-on time T of the first beam pulse and the second beam pulse through the beam-on dose threshold value and the dose rate of the multi-pulse control mode preset in the beam control system, and the specific calculation formula is as follows: T=DoseSET / DoseRate; wherein, DoseSET is the beam-on dose threshold value of the multi-pulse control mode set in the beam control system, and DoseRate is the dose rate of the multi-pulse control mode set in the beam control system; The calculation formula of the beam-on frequency F is: F=D / T.

5. The FLASH radiotherapy dose control method of claim 4, wherein, The calculation of the number of beam pulses D of the first beam pulse and the second beam pulse through the beam-on dose threshold value of the multi-pulse control mode preset in the beam control system comprises: selecting a single pulse dose Dose1 of a first beam pulse and a single pulse dose Dose2 of a second beam pulse under a current used applicator specification; calculating the number of beams by a pre-set beam-off dose threshold of the multi-pulse control mode in the beam control system and the single pulse dose Dose1 of the first beam pulse and the single pulse dose Dose2 of the second beam pulse, and the specific calculation method is as follows: DoseSET / Dose1=X……DoseRemain1; DoseRemain1 / Dose2=Y……DoseRemain2; the number of beams D is: D=X+Y+1; wherein, DoseSET is the beam-off dose threshold of the multi-pulse control mode set in the beam control system, X is the number of beams of the first beam pulse, Y is the number of beams of the second beam pulse, DoseRemain1 is the remaining dose after calculating the number of beams of the first beam pulse by the beam-off dose threshold of the multi-pulse control mode, and DoseRemain2 is the remaining dose after calculating the number of beams of the second beam pulse by DoseRemain1.

6. The FLASH radiotherapy dose control method of claim 5, wherein, controlling the single pulse dose Dose2 of the second beam pulse within a first pre-set threshold, so that the error between the actual beam-off dose and the beam-off dose threshold of the multi-pulse control mode is less than the first pre-set threshold.

7. The FLASH radiotherapy dose control method of claim 5, wherein, calculating the pulse conversion dose threshold by the single pulse dose Dose1 of the first beam pulse and the number of beams X of the first beam pulse, and the specific calculation method is as follows: DoseSET1=X*Dose1; wherein, DoseSET1 is the pulse conversion dose threshold.

8. The FLASH radiotherapy dose control method of claim 4, wherein, the beam-off dose threshold of the multi-pulse control mode pre-set in the beam control system and the calculated beam-off time threshold are sent to the beam sampling controller in the beam monitoring system, and the specific calculation method is as follows: calculating the beam-off time threshold by the total beam-off time T of the first beam pulse and the second beam pulse and a pre-set time margin T0, and the specific calculation method is as follows: T1=T+T0; wherein, T1 is the beam-off time threshold.

9. The FLASH radiotherapy dose control method of claim 1, wherein, the beam sampling controller judges whether the actual beam-off dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and the specific calculation method is as follows: if the actual beam-off dose is greater than or equal to the pulse conversion dose threshold, the beam sampling controller outputs the level control signal for adjusting the pulse width to the beam generation system within a first pre-set time, and the beam generation system adjusts the pulse width within the first pre-set time; if the actual beam-off dose is less than the pulse conversion dose threshold, the beam sampling controller does not output the level control signal for adjusting the pulse width to the beam generation system.

10. The FLASH radiotherapy dose control method of claim 9, wherein, the beam sampling controller judges whether the actual beam-off dose is greater than or equal to the pulse conversion dose threshold, and determines whether to output the level control signal for adjusting the pulse width to the beam generation system according to the judgment result, and the specific calculation method is as follows: The beam current sampling controller obtains the numerical value corresponding to the electrical signal by analog-digital conversion on the electrical signal collected by the beam probe in the beam monitoring system; The corresponding calibration coefficient is obtained according to the currently used applicator specification, and the real beam-out dose is calculated according to the numerical value of the corresponding electrical signal and the calibration coefficient; The calibration coefficient is used to calibrate the corresponding relationship between the numerical value of the electrical signal collected by the beam probe and the real beam-out dose value.

11. The FLASH radiotherapy dose control method of claim 2, wherein, The determination of whether to output the level control signal for stopping the beam-out to the beam generation system according to the judgment result comprises: If the real beam-out dose is greater than or equal to the stop beam dose threshold value of the multi-pulse control mode, or the real beam-out time is greater than or equal to the stop beam time threshold value, the beam current sampling controller outputs the level control signal for stopping the beam-out to the beam generation system within a first preset time, and the beam generation system closes the beam enable port within the first preset time to stop the beam-out; If the real beam-out dose is less than the stop beam dose threshold value of the multi-pulse control mode, and the real beam-out time is less than the stop beam time threshold value, the beam current sampling controller does not output the level control signal for stopping the beam-out to the beam generation system.

12. The FLASH radiotherapy dose control method of claim 1, wherein, The FLASH radiotherapy dose control method further comprises a single-pulse control mode, and the single-pulse control mode adopts a fixed pulse width for dose output, and the single-pulse control mode comprises: S1000, calculating the number of beam-out, total beam-out time, and beam-out frequency of the beam current pulse with a fixed pulse width in the beam control system; S2000, sending the beam-out frequency to the beam generation system, and sending the fixed pulse width, dose rate of the single-pulse control mode, and the currently used applicator specification preset in the beam control system to the beam current sampling controller in the beam monitoring system; S3000, the beam current sampling controller judges whether the real beam-out dose is greater than or equal to the stop beam dose threshold value of the single-pulse control mode, and simultaneously judges whether the real beam-out time is greater than or equal to the stop beam time threshold value, and determines whether to output the level control signal for stopping the fixed pulse beam-out to the beam generation system according to the judgment result.

13. The FLASH radiotherapy dose control method of claim 12, wherein, The determination of whether to output the level control signal for stopping the fixed pulse beam-out to the beam generation system according to the judgment result comprises: If the real beam-out dose is greater than or equal to the stop beam dose threshold value of the single-pulse control mode, or the real beam-out time is greater than or equal to the stop beam time threshold value, the beam current sampling controller outputs the level control signal for stopping the fixed pulse beam-out to the beam generation system within a first preset time, and the beam generation system closes the beam enable port within the first preset time to stop the beam-out; If the real beam-out dose is less than the stop beam dose threshold value of the single-pulse control mode, and the real beam-out time is less than the stop beam time threshold value, the beam current sampling controller does not output the level control signal for stopping the fixed pulse beam-out to the beam generation system.

14. A FLASH radiotherapy device characterized in that, The FLASH radiotherapy dose control method comprises any one of claims 1 to 13. The beam control system (100) comprises a human-computer interaction interface and a controller, and is used for calculating the number of beam pulses, the total beam-out time, and the beam-out frequency of at least two different pulse width beam pulses, and issuing the beam-out frequency to the beam generation system within a first preset time, and issuing the pulse width of the at least two different pulse width beam pulses and the dose rate of the multi-pulse control mode to the beam generation system, and issuing the stop dose threshold of the multi-pulse control mode, the currently used applicator specification, the pulse conversion dose threshold obtained by calculation, and the stop time threshold to the beam sampling controller in the beam monitoring system; The beam generation system (200) comprises a gun power supply, a klystron power supply, a microwave excitation source, a klystron, and an accelerating tube, and is used for receiving and completing the instructions issued by the beam control system and the beam monitoring system within the first preset time; The beam monitoring system (300) comprises a beam detector and a beam sampling controller, and is used for judging whether the actual beam-out dose is greater than or equal to the pulse conversion dose threshold, determining whether to output a level control signal for adjusting the pulse width to the beam generation system according to the judgment result, then judging whether the actual beam-out dose is greater than or equal to the stop dose threshold of the multi-pulse control mode, and simultaneously judging whether the actual beam-out time is greater than or equal to the stop time threshold, and determining whether to output a level control signal for stopping beam-out to the beam generation system according to the judgment result.

15. An electronic device, comprising: comprise: a memory; and a processor, wherein the memory stores computer readable instructions, and the computer readable instructions are executed by the processor to implement the FLASH radiotherapy dose control method according to any one of claims 1 to 13.

Citation Information

Patent Citations

  • Medical accelerator, energy monitoring and adjustment devices of medical accelerator and radiotherapy equipment

    CN109999373A

  • Flash beam dose control method and related equipment

    CN118283908A

  • FLASH radiotherapy dose control method, FLASH radiotherapy dose control device and electronic equipment

    CN118892624A

  • Methods and systems for using and controlling higher dose rate ionizing radiation in short time intervals

    US20220323793A1