TCS concentration measurement apparatus, system and method, and semiconductor processing device

Abstract

Provided are a TCS concentration measurement apparatus (100), system and method, and a semiconductor processing device, the apparatus comprising a first gas delivery unit (110), a concentration measurement unit (120), a verification unit (130) and a first purge unit (140). The advantages of the apparatus lie in that the first gas delivery unit (110) is in communication with the concentration measurement unit (120), and a mass spectrometer having higher precision and lower latency is used to measure the TCS concentration, so as to improve the precision and effect of TCS concentration measurement; and the first gas delivery unit (110) is in communication with the verification unit (130) and, by condensing and weighing a mixed gas, the weight of a condensed liquid and the total flow rate of a condensed gas are obtained and the TCS concentration is calculated by means of the weight of the condensed liquid and the total flow rate of the condensed gas, so as to verify a detection result from a mass spectrometry detection element (123), thereby improving the reliability of the detection result.

Description

A TCS concentration detection device, system, method and semiconductor process equipment TECHNICAL FIELD

[0001] The present application relates to the technical field of bubbling equipment, and particularly relates to a TCS concentration detection device, system, method and semiconductor process equipment. BACKGROUND

[0002] TCS bubblers are widely used in silicon carbide epitaxial equipment and silicon epitaxial equipment in the semiconductor industry. In such equipment, TCS (trichlorosilane) is an important raw material, and its concentration is an important parameter of the epitaxial process. The present application detects the concentration of TCS in the mixed H2 output by the bubbler to ensure that the bubbler can adapt to various epitaxial machines.

[0003] At present, the TCS bubbler concentration detection process in semiconductor factories is generally as follows: after the TCS bubbler is bubbled by the pressure-controlled and flow-controlled H2, the mixed gas of TCS and H2 is output, and after passing through the pressure control module and the flow control module at the epitaxial machine end, it is transported to the concentration sensor for detection of the TCS concentration. In addition, the concentration sensor used in this detection process is generally an optical sensor.

[0004] However, the concentration sensor is generally an optical sensor, which has the problems of high detection delay and low precision. In addition, the existing TCS bubbler concentration detection process does not have a process for verifying the concentration sensor, and the detection structure provided by the concentration sensor cannot confirm its accuracy.

[0005] At present, there is no effective solution to the problems of high detection delay, low precision and inability to verify the detection result in the related art. SUMMARY

[0006] The present application aims to solve the problems of high detection delay, low precision and inability to verify the detection result in the related art by providing a TCS concentration detection device, system, method and semiconductor process equipment.

[0007] To achieve the above-mentioned purpose, the technical scheme adopted by the present application is as follows:

[0008] In a first aspect, the present application provides a TCS concentration detection device, comprising:

[0009] A first gas conveying unit, which is in communication with the gas mixing device and is used to obtain and convey the mixed gas conveyed by the gas mixing device;

[0010] A concentration detection unit, which is in communication with the first gas conveying unit and the tail gas treatment device respectively, and is used to perform mass spectrometric analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0011] a verification unit, in communication with the first gas delivery unit, the tail gas treatment device, for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas to verify the first concentration information;

[0012] a first purging unit, in communication with the verification unit, the tail gas treatment device, for purging the pipeline of the verification unit, the tail gas treatment device.

[0013] In a second aspect, the present application provides a TCS concentration detection system, comprising:

[0014] the TCS concentration detection device according to the first aspect;

[0015] a gas mixing device, in communication with the TCS concentration detection device, for delivering mixed gas to the TCS concentration detection device;

[0016] a tail gas treatment device, in communication with the TCS concentration detection device, the gas mixing device, for treating tail gas.

[0017] In some embodiments, the gas mixing device comprises:

[0018] a liquid supply unit, in communication with a liquid source, for delivering liquid TCS;

[0019] a carrier gas supply unit, in communication with a carrier gas source, for delivering carrier gas;

[0020] a mixing unit, in communication with the liquid supply unit, the carrier gas supply unit, the TCS concentration detection device, a waste liquid treatment device, for storing liquid TCS and carrier and performing bubble reaction on the liquid TCS to generate mixed gas;

[0021] a second gas delivery unit, in communication with the mixing unit, the TCS concentration detection device, for delivering mixed gas;

[0022] a second purging unit, in communication with a purging gas source, the liquid supply unit, the carrier gas supply unit, the second gas delivery unit, for purging the pipeline of the liquid supply unit, the carrier gas supply unit, the second gas delivery unit;

[0023] a first vacuum unit, in communication with a power gas source, the second purging unit, the mixing unit, for vacuum treatment of the overall device.

[0024] In some embodiments, the tail gas treatment device comprises:

[0025] a second vacuum unit, in communication with the TCS concentration detection device, for vacuum treatment of the TCS concentration detection device;

[0026] a tail gas treatment unit, in communication with the TCS concentration detection device and the gas mixing device, for treatment of the exhaust gas discharged from the TCS concentration detection device and the gas mixing unit.

[0027] In a third aspect, the present application further provides a semiconductor process equipment, comprising:

[0028] the TCS concentration detection device according to the first aspect; or

[0029] the TCS concentration detection system according to the second aspect.

[0030] In a fourth aspect, the present application further provides a TCS concentration detection method, applied to the TCS concentration detection device according to the first aspect or the TCS concentration detection system according to the second aspect, comprising:

[0031] a first gas delivery unit for obtaining and delivering the mixed gas delivered by the gas mixing device;

[0032] a concentration detection unit for mass spectrometric analysis of the mixed gas to obtain first concentration information of the mixed gas;

[0033] a verification unit for condensation and weighing of the mixed gas to obtain second concentration information of the mixed gas;

[0034] by comparing the second concentration information and the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual situation.

[0035] In a fifth aspect, the present application further provides a TCS concentration detection method, applied to the TCS concentration detection system according to the second aspect, comprising:

[0036] a liquid supply unit for delivering liquid to the TCS concentration detection device;

[0037] a carrier gas supply unit for delivering carrier gas to the TCS concentration detection device;

[0038] a mixing unit for bubble reaction of the liquid TCS and generation of mixed gas;

[0039] a second gas delivery unit for delivering the mixed gas;

[0040] The first gas conveying unit is configured to obtain and convey mixed gas conveyed by the gas mixing device.

[0041] The concentration detection unit is configured to perform mass spectrometry on the mixed gas to obtain first concentration information of the mixed gas.

[0042] The verification unit is configured to perform condensation weighing on the mixed gas to obtain second concentration information of the mixed gas.

[0043] By comparing the second concentration information and the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual situation.

[0044] Compared with the prior art, the technical scheme has the following technical effects:

[0045] The TCS concentration detection device, system, method and semiconductor process equipment of the present application have the following technical effects: BRIEF DESCRIPTION OF DRAWINGS

[0046] FIG. 1 is a schematic diagram of the frame of the TCS concentration detection device according to the embodiment of the present application;

[0047] FIG. 2 is a schematic diagram of the frame of the first gas conveying unit according to the embodiment of the present application;

[0048] FIG. 3 is a schematic diagram of the frame of the concentration detection unit according to the embodiment of the present application;

[0049] FIG. 4 is a schematic diagram of the frame of the verification unit according to the embodiment of the present application;

[0050] FIG. 5 is a schematic diagram of the frame of the first purging unit according to the embodiment of the present application;

[0051] FIG. 6 is a schematic diagram of the frame of the TCS concentration detection system according to the embodiment of the present application;

[0052] FIG. 7 is a schematic diagram of the frame of the gas mixing device according to the embodiment of the present application;

[0053] FIG. 8 is a schematic diagram of the frame of the liquid supply unit, carrier gas supply unit, mixing unit and second gas conveying unit according to the embodiment of the present application;

[0054] Fig. 9 is a schematic diagram of a frame of a second purge unit according to an embodiment of the present application;

[0055] Fig. 10 is a schematic diagram of a frame of a first vacuum unit according to an embodiment of the present application;

[0056] Fig. 11 is a schematic diagram of a frame of a tail gas treatment device according to an embodiment of the present application;

[0057] Fig. 12 is a schematic diagram of a frame of a second vacuum unit and a tail gas treatment unit according to an embodiment of the present application;

[0058] Fig. 13 is a schematic diagram of one specific embodiment of a TCS concentration detection system according to an embodiment of the present application. DETAILED DESCRIPTION

[0059] In order to make the objects, technical solutions, and advantages of the present application clearer, the present application will be described and illustrated in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application. Based on the embodiments provided by the present application, all other embodiments obtained by a person of ordinary skill in the art without creative effort belong to the scope of the present application.

[0060] It is obvious that the accompanying drawings in the following description are only some examples or embodiments of the present application, and a person of ordinary skill in the art can apply the present application to other similar scenarios without creative effort based on the accompanying drawings. In addition, it can be understood that although the efforts made in the development process can be complex and lengthy, some design, manufacture or production changes based on the technical content disclosed in the present application are only routine technical means for a person of ordinary skill in the art related to the content disclosed in the present application, and should not be understood as insufficient disclosure of the content disclosed in the present application.

[0061] In the present application, the phrase "embodiment" means that the specific features, structures or properties described in connection with the embodiment can be included in at least one embodiment of the present application. The appearance of this phrase at various places in the specification does not necessarily mean the same embodiment, nor is it an independent or alternative embodiment to other embodiments. A person of ordinary skill in the art explicitly and implicitly understands that the embodiments described in the present application can be combined with other embodiments without conflict.

[0062] Embodiment 1

[0063] This embodiment relates to a TCS concentration detection device in the present application.

[0064] An illustrative embodiment of the present application is shown in FIG. 1, a TCS concentration detection device 100, comprising a first gas conveying unit 110, a concentration detection unit 120, a verification unit 130 and a first purging unit 140. Among them, the first gas conveying unit 110 is in communication with the gas mixing device, used to obtain and convey the mixed gas conveyed by the gas mixing device; the concentration detection unit 120 is in communication with the first gas conveying unit 110 and the tail gas treatment device respectively, used to perform mass spectrometry on the mixed gas to obtain the first concentration information of the mixed gas; the verification unit 130 is in communication with the first gas conveying unit 110 and the tail gas treatment device 300 respectively, used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas to verify the first concentration information; the first purging unit 140 is in communication with the verification unit 130 and the tail gas treatment device respectively, used to purge the verification unit 130 and the tail gas treatment device.

[0065] It should be noted that the first end and the second end of the unit (element) in the present application are the two ends of the length direction thereof.

[0066] As shown in FIG. 2, the first gas conveying unit 110 comprises a first gas conveying element 111, a second gas conveying element 112 and a third gas conveying element 113. Among them, the first gas conveying element 111 is in communication with the gas mixing device 200, used to obtain and convey the mixed gas conveyed by the gas mixing device; the second gas conveying element 112 is in communication with the first gas conveying element 111 and the concentration detection unit 120 respectively, used to convey the mixed gas to the concentration detection unit 120; the third gas conveying element 113 is in communication with the first gas conveying element 111 and the verification unit 130 respectively, used to convey the mixed gas to the verification unit 130.

[0067] Specifically, the first end of the first gas conveying element 111 is in communication with the gas mixing device, and the second end of the first gas conveying element 111 is in parallel connection with the second gas conveying element 112 and the third gas conveying element 113; the first end of the second gas conveying element 112 is in communication with the second end of the first gas conveying element 111, and the second end of the second gas conveying element 112 is in communication with the concentration detection unit 120; the first end of the third gas conveying element 113 is in communication with the second end of the first gas conveying element 111, and the second gas conveying element 112 and the third gas conveying element 113 are in parallel connection, and the second end of the third gas conveying element 113 is in communication with the verification unit 130.

[0068] In some embodiments thereof, the first gas conveying element 111 comprises but is not limited to a stainless steel pipe; the second gas conveying element 112 comprises but is not limited to a stainless steel pipe; and the third gas conveying element 113 comprises but is not limited to a stainless steel pipe.

[0069] Further, the first gas delivery unit 110 further comprises a first control valve element, a second control valve element, a first pressure control element, a first flow control element, and a first pressure monitoring element. The first control valve element is arranged on the second gas delivery element 112 and configured to control the flow of the second gas delivery element; the second control valve element is arranged on the third gas delivery element 113 and configured to control the flow of the third gas delivery element 113; the first pressure control element is arranged on the first gas delivery element 111 and configured to adjust the pressure of the first gas delivery element 111; the first flow control element is arranged on the first gas delivery element 111 and configured to adjust the flow of the first gas delivery element 111; and the first pressure monitoring element is in communication with the first gas delivery element 111 and configured to monitor the pressure of the first gas delivery element 111 in real time.

[0070] It should be noted that the first flow control element is arranged downstream of the first pressure control element, and the first pressure monitoring element is arranged downstream of the first pressure control element and upstream of the first flow control element.

[0071] In some embodiments, the first control valve element comprises but is not limited to a diaphragm valve (e.g., a first pneumatic diaphragm valve); the second control valve element comprises but is not limited to a diaphragm valve (e.g., a second pneumatic diaphragm valve); the first pressure control element comprises but is not limited to a PC pressure controller; the first flow control element comprises but is not limited to a gas mass flow controller; and the first pressure monitoring element comprises but is not limited to a pressure sensor.

[0072] As shown in FIG. 3, the concentration detection unit 120 comprises a fourth gas delivery element 121, a fifth gas delivery element 122, and a mass spectrometry detection element 123. The fourth gas delivery element 121 is in communication with the first gas delivery unit 110 and configured to obtain and deliver the mixed gas; the fifth gas delivery element 122 is in communication with the fourth gas delivery element 121 and the exhaust treatment device, respectively, and configured to deliver the exhaust gas to the exhaust treatment device; and the mass spectrometry detection element 123 is in communication with the fourth gas delivery element 121 and the exhaust treatment device, respectively, and configured to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas.

[0073] Specifically, the first end of the fourth gas delivery element 121 is in communication with the second end of the second gas delivery element 112, and the second end of the fourth gas delivery element 121 is in communication with the mass spectrometry detection element 123; the first end of the fifth gas delivery element 122 is in communication with the fourth gas delivery element 121, and the second end of the fifth gas delivery element 122 is in communication with the exhaust treatment device.

[0074] In some embodiments, the fourth gas delivery element 121 comprises but is not limited to a stainless steel pipe; and the fifth gas delivery element 122 comprises but is not limited to a stainless steel pipe.

[0075] In some embodiments, the mass spectrometry detection element 123 includes, but is not limited to, a mass spectrometer.

[0076] It should be noted that the gas flow that the mass spectrometry detection element 123 can pass through is limited, and in the case that the mixed gas flow delivered by the fourth gas delivery element 121 is too much, the fifth gas delivery element 122 can function as a bypass discharge.

[0077] Further, the concentration detection unit 120 further includes a third control valve element and a first one-way valve element. The third control valve element is arranged in the fourth gas delivery element 121 for controlling the flow of the fourth gas delivery element 121; the first one-way valve element is arranged in the fifth gas delivery element 122 for preventing the gas in the fifth gas delivery element 122 from flowing backward.

[0078] In some embodiments, the third control valve element includes, but is not limited to, a diaphragm valve (such as a third pneumatic diaphragm valve); the first one-way valve element includes, but is not limited to, a one-way valve (such as a first one-way valve).

[0079] As shown in FIG. 4, the verification unit 130 includes a sixth gas delivery element 131, a condensation element 132, a seventh gas delivery element 133, a liquid delivery element 134, a storage element 135, a flow detection element 136, and a weight detection element 137. The sixth gas delivery element 131 is in communication with the first gas delivery unit 110 and the first purge unit 140, respectively, for obtaining and delivering mixed gas; the condensation element 132 is in communication with the sixth gas delivery element 131 for condensing the mixed gas and obtaining condensed gas and condensed liquid; the seventh gas delivery element 133 is in communication with the condensation element 132, the first purge unit 140, and the tail gas treatment device 300, respectively, for delivering the condensed gas to the tail gas treatment device; the liquid delivery element 134 is in communication with the condensation element 132 for obtaining and delivering the condensed liquid; the storage element 135 is in communication with the liquid delivery element 134 for storing the condensed liquid; the flow detection element 136 is arranged in the seventh gas delivery element 133 for detecting the flow of the condensed gas; and the weight detection element 137 is arranged at the bottom of the storage element 135 for detecting the mass of the condensed liquid in the storage element 135.

[0080] Specifically, the first end of the sixth gas conveying element 131 is in communication with the second end of the third gas conveying element 113, and the second end of the sixth gas conveying element 131 is in communication with the gas inlet end of the condensing element 132; the first end of the seventh gas conveying element 133 is in communication with the gas outlet of the condensing tank, and the second end of the seventh gas conveying element 133 is in communication with the tail gas treatment device 300; the first end of the liquid conveying element 134 is in communication with the liquid outlet of the condensing tank, and the second end of the liquid conveying element 134 is in communication with the storage element 135; the storage element 135 is in communication with the liquid conveying element 134, and is used for collecting the condensed liquid generated in the condensing element 132.

[0081] In some embodiments, the sixth gas conveying element 131 includes but is not limited to a stainless steel pipe; the seventh gas conveying element 133 includes but is not limited to a stainless steel pipe; the liquid conveying element 134 includes but is not limited to a stainless steel pipe; the storage element 135 includes but is not limited to a storage bottle; the flow detection element 136 includes but is not limited to a flow meter; and the weight detection element 137 includes but is not limited to an electronic balance.

[0082] Specifically, the condensing element 132 includes a condensing tank, a refrigerating device, a first cooling liquid pipeline element and a second cooling liquid pipeline element. The condensing tank is in communication with the third gas conveying element 113, the tail gas treatment device 300 and the storage element 135 through the sixth gas conveying element 131, the seventh gas conveying element 133 and the liquid conveying element 134 respectively, and is used for condensing the mixed gas to obtain condensed gas and condensed liquid; the first end of the first cooling liquid pipeline element is in communication with the condensing tank, and the second end of the first cooling liquid pipeline element is in communication with the refrigerating device; the first end of the second cooling liquid pipeline element is in communication with the refrigerating device, and the second end of the second cooling liquid pipeline element is in communication with the condensing tank; the refrigerating device can convey cooling liquid to the condensing tank, and cool the cooling liquid after heat exchange, so as to realize the recycling use of the cooling liquid.

[0083] More specifically, the condensing tank further includes a gas inlet, a gas outlet, a liquid outlet, a first cooling port and a second cooling port. The gas inlet is arranged at the top of the condensing tank, and is used for being in communication with the second end of the sixth gas conveying element 131; the gas outlet is arranged at the top of the condensing tank, and is used for being in communication with the seventh gas conveying element 133; the liquid outlet is arranged at the bottom of the condensing tank, and is used for being in communication with the liquid conveying element 134; the first cooling port is arranged at the side wall of the condensing tank, and is used for being in communication with the first cooling liquid pipeline element; and the second cooling port is arranged at the side wall of the condensing tank, and is used for being in communication with the second cooling liquid pipeline element.

[0084] It should be noted that the temperature in the condensing tank is -15℃ to -5℃; preferably, the temperature in the condensing tank is -10℃.

[0085] In some embodiments, the condensing tank includes, but is not limited to, a stainless steel tank; the chiller includes, but is not limited to, a chiller refrigerator; the first cooling liquid pipeline element includes, but is not limited to, a stainless steel pipe; and the second cooling liquid pipeline element includes, but is not limited to, a stainless steel pipe.

[0086] Further, the verifying unit 130 further includes a fourth control valve element, a fifth control valve element, a second one-way valve element, a sixth control valve element, a seventh control valve element, and a second pressure monitoring element. The fourth control valve element is arranged at the gas inlet end of the condensing element 132, for controlling the flow between the sixth gas conveying element 131 and the condensing element 132; the fifth control valve element is arranged at the gas outlet end of the condensing element 132, for controlling the flow between the seventh gas conveying element 133 and the condensing element 132; the second one-way valve element is arranged at the seventh gas conveying element 133, for preventing the gas in the seventh gas conveying element 133 from flowing backward; the sixth control valve element is arranged at the liquid outlet end of the condensing element 132, for controlling the flow between the condensing element 132 and the liquid conveying element 134; the seventh control valve element is arranged at the liquid conveying element 134, for controlling the flow of the liquid conveying element 134; and the second pressure monitoring element is arranged at the seventh gas conveying element 133, for monitoring the pressure of the seventh gas conveying element 133 in real time.

[0087] It should be noted that the second one-way valve element is located downstream of the fifth control valve element; and the second pressure monitoring element is located downstream of the second one-way valve element.

[0088] In some embodiments, the fourth control valve element includes, but is not limited to, a diaphragm valve (such as a fourth pneumatic diaphragm valve); the fifth control valve element includes, but is not limited to, a diaphragm valve (such as a fifth pneumatic diaphragm valve); the second one-way valve element includes, but is not limited to, a one-way valve (such as a second one-way valve); the sixth control valve element includes, but is not limited to, a diaphragm valve (such as a first manual diaphragm valve); the seventh control valve element includes, but is not limited to, a diaphragm valve (such as a second manual diaphragm valve); and the second pressure monitoring element includes, but is not limited to, a pressure sensor.

[0089] As shown in FIG. 5, the first purging unit 140 comprises an eighth gas conveying element 141, a ninth gas conveying element 142, a tenth gas conveying element 143, an eleventh gas conveying element 144, a twelfth gas conveying element 145, a thirteenth gas conveying element 146 and a fourteenth gas conveying element 147. Among them, the eighth gas conveying element 141 is in communication with a purging gas source for obtaining and conveying purging gas; the ninth gas conveying element 142 is in communication with the eighth gas conveying element 141 and the gas inlet structure of the verification unit 130 respectively for conveying purging gas to the verification unit; the tenth gas conveying element 143 is in communication with the gas inlet structure of the verification unit 130 and the tail gas treatment device respectively for conveying waste gas; the eleventh gas conveying element 144 is in communication with the eighth gas conveying element 141 and the gas outlet structure of the verification unit 130 respectively for conveying purging gas; the twelfth gas conveying element 145 is in communication with the gas outlet structure of the verification unit 130 and the tail gas treatment device respectively for conveying waste gas; the thirteenth gas conveying element 146 is in communication with the eighth gas conveying element 141 and the liquid outlet structure of the verification unit 130 respectively for conveying purging gas; and the fourteenth gas conveying element 147 is in communication with the liquid outlet structure of the verification unit 130 and the tail gas treatment device respectively for conveying waste gas.

[0090] It should be noted that the purging gas is high-purity argon.

[0091] Specifically, the first end of the eighth gas delivery element 141 is in communication with the purge gas source, the second end of the eighth gas delivery element 141 is in communication with the ninth gas delivery element 142, the eleventh gas delivery element 144 and the thirteenth gas delivery element 146 respectively; the first end of the ninth gas delivery element 142 is in communication with the second end of the eighth gas delivery element 141, the second end of the ninth gas delivery element 142 is in communication with the sixth gas delivery element 131, and the communication between the ninth gas delivery element 142 and the sixth gas delivery element 131 is located upstream of the fourth control valve element; the first end of the tenth gas delivery element 143 is in communication with the sixth gas delivery element 131, and the communication between the tenth gas delivery element 143 and the sixth gas delivery element 131 is located upstream of the fourth control valve element, the second end of the tenth gas delivery element 143 is in communication with the tail gas treatment device; the first end of the eleventh gas delivery element 144 is in communication with the second end of the eighth gas delivery element 141, the second end of the eleventh gas delivery element 144 is in communication with the seventh gas delivery element 133, and the communication between the eleventh gas delivery element 144 and the seventh gas delivery element 133 is located downstream of the fifth control valve element; the first end of the twelfth gas delivery element 145 is in communication with the seventh gas delivery element 133, and the communication between the twelfth gas delivery element 145 and the seventh gas delivery element 133 is located downstream of the fifth control valve element, the second end of the twelfth gas delivery element 145 is in communication with the tail gas treatment device; the first end of the thirteenth gas delivery element 146 is in communication with the second end of the eighth gas delivery element 141, the second end of the thirteenth gas delivery element 146 is in communication with the liquid delivery element 134, and the communication between the thirteenth gas delivery element 146 and the liquid delivery element 134 is located between the sixth control valve element and the seventh control valve element; the first end of the fourteenth gas delivery element 147 is in communication with the liquid delivery element 134, and the communication between the fourteenth gas delivery element 147 and the liquid delivery element 134 is located between the sixth control valve element and the seventh control valve element, the second end of the fourteenth gas delivery element 147 is in communication with the tail gas treatment device.

[0092] In some embodiments, the eighth gas delivery element 141 includes but is not limited to a stainless steel pipe; the ninth gas delivery element 142 includes but is not limited to a stainless steel pipe; the tenth gas delivery element 143 includes but is not limited to a stainless steel pipe; the eleventh gas delivery element 144 includes but is not limited to a stainless steel pipe; the twelfth gas delivery element 145 includes but is not limited to a stainless steel pipe; the thirteenth gas delivery element 146 includes but is not limited to a stainless steel pipe; the fourteenth gas delivery element 147 includes but is not limited to a stainless steel pipe.

[0093] Further, the first purging unit 140 further comprises an eighth control valve element, a third one-way valve element, a fourth one-way valve element, a ninth control valve element, a tenth control valve element, a fifth one-way valve element, a sixth one-way valve element, an eleventh control valve element, a twelfth control valve element, a seventh one-way valve element, an eighth one-way valve element, a thirteenth control valve element and a third pressure monitoring element. The eighth control valve element is arranged on the ninth gas conveying element 142 and is configured to control the flow of the ninth gas conveying element 142; the third one-way valve element is arranged on the ninth gas conveying element 142 and is configured to prevent the gas in the ninth gas conveying element 142 from flowing reversely; the fourth one-way valve element is arranged on the tenth gas conveying element 143 and is configured to prevent the gas in the tenth gas conveying element 143 from flowing reversely; the ninth control valve element is arranged on the tenth gas conveying element 143 and is configured to control the flow of the tenth gas conveying element 143; the tenth control valve element is arranged on the eleventh gas conveying element 144 and is configured to control the flow of the eleventh gas conveying element 144; the fifth one-way valve element is arranged on the eleventh gas conveying element 144 and is configured to prevent the gas in the eleventh gas conveying element 144 from flowing reversely; the sixth one-way valve element is arranged on the twelfth gas conveying element 145 and is configured to prevent the twelfth gas conveying element 145 from flowing reversely; the eleventh control valve element is arranged on the twelfth gas conveying element 145 and is configured to control the flow of the twelfth gas conveying element 145; the twelfth control valve element is arranged on the thirteenth gas conveying element 146 and is configured to control the flow of the thirteenth gas conveying element 146; the seventh one-way valve element is arranged on the thirteenth gas conveying element 146 and is configured to prevent the gas in the thirteenth gas conveying element 146 from flowing reversely; the eighth one-way valve element is arranged on the fourteenth gas conveying element 147 and is configured to prevent the gas in the fourteenth gas conveying element 147 from flowing reversely; the thirteenth control valve element is arranged on the fourteenth gas conveying element 147 and is configured to control the flow of the fourteenth gas conveying element; and the third pressure monitoring element is in communication with the eighth gas conveying element 141 and is configured to monitor the pressure of the eighth gas conveying element 141 in real time.

[0094] It should be noted that the third one-way valve element is located downstream of the eighth control valve element; the ninth control valve element is located downstream of the fourth one-way valve element; the fifth one-way valve element is located downstream of the tenth control valve element; the eleventh control valve element is located downstream of the sixth one-way valve element; the seventh one-way valve element is located downstream of the twelfth control valve element; and the thirteenth control valve element is located downstream of the eighth one-way valve element.

[0095] In some embodiments, the eighth control valve element includes, but is not limited to, a diaphragm valve (such as the sixth pneumatic diaphragm valve); the third one-way valve element includes, but is not limited to, a one-way valve (such as the third one-way valve); the fourth one-way valve element includes, but is not limited to, a one-way valve (such as the fourth one-way valve); the ninth control valve element includes, but is not limited to, a diaphragm valve (such as the seventh pneumatic diaphragm valve); the tenth control valve element includes, but is not limited to, a diaphragm valve (such as the eighth pneumatic diaphragm valve); the fifth one-way valve element includes, but is not limited to, a one-way valve (such as the fifth one-way valve); the sixth one-way valve element includes, but is not limited to, a one-way valve (such as the sixth one-way valve); the eleventh control valve element includes, but is not limited to, a diaphragm valve (such as the ninth pneumatic diaphragm valve); the twelfth control valve element includes, but is not limited to, a diaphragm valve (such as the tenth pneumatic diaphragm valve); the seventh one-way valve element includes, but is not limited to, a one-way valve (such as the seventh one-way valve); the eighth one-way valve element includes, but is not limited to, a one-way valve (such as the eighth one-way valve); the thirteenth control valve element includes, but is not limited to, a diaphragm valve (such as the eleventh pneumatic diaphragm valve); and the third pressure monitoring element includes, but is not limited to, a pressure sensor.

[0096] The use method of the present embodiment is as follows:

[0097] (I) Gas analysis

[0098] The first pressure control element and the first flow control element are opened to adjust the pressure and flow of the mixed gas conveyed in the first gas conveying element 111, so as to stabilize the mixed gas in the first gas conveying element 111; the first control valve element and the third control valve element are opened, and the mixed gas is conveyed to the mass spectrum detection element 123 through the first gas conveying element 111, the second gas conveying element 112 and the fourth gas conveying element 121, so that the mixed gas can be detected by the mass spectrum detection element 123, thereby obtaining the concentration of the TCS gas in the mixed gas and obtaining the first concentration information.

[0099] (II) Condensation

[0100] The second control valve element and the fourth control valve element are opened, so that the first gas conveying element 111, the sixth gas conveying element 131 and the condensation element 132 are communicated with each other, so that the mixed gas flows into the condensation element 132, and the condensation element 132 condenses the mixed gas and obtains condensed liquid and condensed gas.

[0101] (III) Condensed liquid collection

[0102] The sixth control valve element and the seventh control valve element are opened, so that the condensation element 132, the liquid conveying element 134 and the storage element 135 are communicated with each other, so that the condensed liquid flows into the inside of the storage element 135.

[0103] (IV) Condensed gas measurement

[0104] The fifth control valve element is opened, so that the condensing element 132 is in communication with the seventh gas conveying element 133, and the flow detection element 136 can detect the total flow of the condensed gas flowing through the seventh gas conveying element 133, so as to obtain the total flow of the condensed gas;

[0105] (five) Purging

[0106] The twelfth control valve element and the thirteenth control valve element are opened, so that the eighth gas conveying element 141, the thirteenth gas conveying element 146, the liquid conveying element 134, the fourteenth gas conveying element 147 and the tail gas treatment device 300 are in communication, so as to purge the liquid conveying element 134;

[0107] (six) Condensed liquid measurement

[0108] The staff separates the storage element 135 from the liquid conveying element 134, and places the storage element 135 on the weight detection element 137, so as to obtain the weight of the condensed liquid in the storage element 135;

[0109] (seven) Verification

[0110] The second concentration information is calculated by the total flow of the condensed gas and the weight of the condensed liquid, and the second concentration information is compared with the first concentration information, so as to determine whether the result detected by the mass spectrometry detection element 123 is consistent with the actual result.

[0111] The advantages of the embodiment are that the first gas conveying unit is in communication with the concentration detection unit, a mass spectrometer with higher precision and lower delay is used to detect the TCS concentration, so as to improve the precision and effect of the TCS concentration detection; the first gas conveying unit is in communication with the verification unit, the weight of the condensed liquid and the total flow of the condensed gas are obtained by condensing and weighing the mixed gas, and the TCS concentration is calculated by the weight of the condensed liquid and the total flow of the condensed gas, so as to verify the result detected by the mass spectrometry detection element, and improve the reliability of the detection result.

[0112] Embodiment 2

[0113] The embodiment relates to the TCS concentration detection system in the application.

[0114] As shown in FIG. 6, a TCS concentration detection system comprises the TCS concentration detection device 100, the gas mixing device 200 and the tail gas treatment device 300 as described in embodiment 1. The gas mixing device 200 is in communication with the TCS concentration detection device 100 and the waste liquid treatment device respectively, and is used to convey the mixed gas to the TCS concentration detection device 100; the tail gas treatment device 300 is in communication with the TCS concentration detection device 100 and the gas mixing device 200 respectively, and is used to treat the tail gas.

[0115] As shown in FIG. 7, the gas mixing device 200 comprises a liquid supply unit 210, a carrier gas supply unit 220, a mixing unit 230, a second gas delivery unit 240, a second purge unit 250, and a first vacuum unit 260. Among them, the liquid supply unit 210 is in communication with the liquid source respectively, for delivering liquid TCS; the carrier gas supply unit 220 is in communication with the carrier gas source respectively, for delivering carrier gas; the mixing unit 230 is in communication with the liquid supply unit 210, the carrier gas supply unit 220, and the TCS concentration detection device 100 respectively, for storing liquid TCS and carrier gas and carrying out bubble reaction on the liquid TCS to generate mixed gas; the second gas delivery unit 240 is in communication with the mixing unit 230 and the TCS concentration detection device 100 respectively, for obtaining and delivering mixed gas to the TCS concentration detection device; the second purge unit 250 is in communication with the purge gas source, the liquid supply unit 210, the carrier gas supply unit 220, and the second gas delivery unit 240 respectively, for purging the liquid supply unit 210, the carrier gas supply unit 220, and the second gas delivery unit 240; the first vacuum unit 260 is in communication with the power gas source, the mixing unit 230, the second purge unit 250, and the tail gas treatment device 300 respectively, for vacuum treatment of the overall device.

[0116] As shown in FIG. 8, the liquid supply unit 210 comprises a liquid supply element 211. Among them, the liquid supply element 211 is in communication with the liquid source, the mixing unit 230, and the second purge unit 250 respectively, for delivering liquid TCS to the mixing unit 230.

[0117] Specifically, the first end of the liquid supply element 211 is in communication with the liquid source, and the second end of the liquid supply element 211 is in communication with the mixing unit 230.

[0118] In some embodiments thereof, the liquid supply element 211 comprises, but is not limited to, a stainless steel pipe.

[0119] Further, the liquid supply unit 210 further comprises a fourteenth control valve element. Among them, the fourteenth control valve element is arranged on the liquid supply element 211, for controlling the flow of the liquid supply element 211.

[0120] In some embodiments thereof, the fourteenth control valve element comprises, but is not limited to, a diaphragm valve.

[0121] Specifically, the fourteenth control valve element comprises a third manual diaphragm valve and a twelfth pneumatic diaphragm valve. Among them, the third manual diaphragm valve is arranged on the liquid supply element 211; the twelfth pneumatic diaphragm valve is arranged on the liquid supply element 211 and is located downstream of the third manual diaphragm valve.

[0122] As shown in FIG. 8, the carrier gas supply unit 220 comprises a carrier gas supply element 221. The carrier gas supply element 221 is in communication with the carrier gas source, the mixing unit 230 and the second purge unit 250, respectively, for delivering carrier gas to the mixing unit 230.

[0123] It should be noted that the carrier gas is H2.

[0124] Specifically, the first end of the carrier gas supply element 221 is in communication with the carrier gas source, and the second end of the carrier gas supply element 221 is in communication with the mixing unit 230.

[0125] In some embodiments, the carrier gas supply element 221 comprises, but is not limited to, a stainless steel tube.

[0126] Further, the carrier gas supply unit 220 further comprises a fifteenth control valve element, a ninth one-way valve element, a second pressure control element, a second flow control element and a fourth pressure monitoring element. The fifteenth control valve element is arranged on the carrier gas supply element 221 for controlling the flow of the carrier gas supply element 221; the ninth one-way valve element is arranged on the carrier gas supply element 221 for preventing the reverse flow of the carrier gas supply element 221; the second pressure control element is arranged on the carrier gas supply element 221 for adjusting the pressure of the carrier gas supply element 221; the second flow control element is arranged on the carrier gas supply element 221 for adjusting the flow of the carrier gas supply element 221; and the fourth pressure monitoring element is in communication with the carrier gas supply element 221 for real-time monitoring of the pressure of the carrier gas supply element 221.

[0127] It should be noted that the ninth one-way valve element is located downstream of the second manual diaphragm valve and upstream of the fifteenth pneumatic diaphragm valve; the second pressure control element is located downstream of the second manual diaphragm valve and upstream of the ninth one-way valve element; the second flow control element is located downstream of the second pressure control element and upstream of the ninth one-way valve element; and the fourth pressure monitoring element is located downstream of the second pressure control element and upstream of the second flow control element.

[0128] In some embodiments, the fifteenth control valve element comprises, but is not limited to, a diaphragm valve (such as a fourth manual diaphragm valve and a thirteenth pneumatic diaphragm valve), the thirteenth pneumatic diaphragm valve is located downstream of the fourth manual diaphragm valve; the ninth one-way valve element comprises, but is not limited to, a one-way valve (such as a ninth one-way valve); the second pressure control element comprises, but is not limited to, a PC pressure regulator; the second flow control element comprises, but is not limited to, a gas mass flow controller; and the fourth pressure monitoring element comprises, but is not limited to, a pressure sensor.

[0129] As shown in FIG. 8, the mixing unit 230 comprises a mixing element 231. The mixing element 231 is in communication with the liquid supply unit 210, the carrier gas supply unit 220, the second gas delivery unit 240, the first vacuum unit 260, the TCS concentration detection device 100, and the waste liquid treatment device, respectively, for performing a bubbling reaction on the liquid TCS and generating a mixed gas.

[0130] Specifically, the mixing element 231 is in communication with the liquid supply element 211, the carrier gas supply element 221, the second gas delivery unit 240, and the first vacuum unit 260, respectively, for performing a bubbling reaction on the liquid TCS delivered into the mixing element 231, and generating a mixed gas of the gaseous TCS and H2.

[0131] More specifically, the mixing element 231 further comprises a liquid supplement inlet, a carrier gas inlet, a mixed gas outlet, a waste liquid outlet, a cooling inlet, and a cooling outlet. The liquid supplement inlet is formed at the top of the mixing element 231 and in communication with the second end of the liquid supply element 211; the carrier gas inlet is formed at the top of the mixing element 231 and in communication with the second end of the carrier gas supply element 221; the mixed gas outlet is formed at the top of the mixing element 231 and in communication with the second gas delivery unit 240; the waste liquid outlet is formed at the bottom wall of the side wall of the mixing element 231 and in communication with the waste liquid treatment device; the cooling inlet is formed at the side wall of the mixing element 231 and in communication with the chiller refrigerator through a pipeline; and the cooling outlet is formed at the side wall of the mixing element 231 and in communication with the chiller refrigerator through a pipeline.

[0132] It should be noted that the cooling inlet and the cooling outlet can circulate the cooling liquid between the mixing element 231 and the chiller refrigerator, so as to maintain the stability inside the mixing element 231.

[0133] It should be noted that the volume of the mixing element 231 is 20L-30L; preferably, the volume of the mixing element 231 is 25L.

[0134] It should be noted that in actual operation, the volume of the liquid TCS inside the mixing element 231 is 16L-23L; preferably, the volume of the liquid TCS inside the mixing element 231 is 19L-20L.

[0135] In some embodiments, the mixing element 231 comprises, but is not limited to, a bubbling barrel.

[0136] Further, the mixing unit 230 further comprises a sixteenth control valve element, a liquid level monitoring element, and a temperature monitoring element. The sixteenth control valve element is arranged in the mixing element 231, and is configured to control the flow of the mixing element 231 with the liquid supply unit 210, the carrier gas supply unit 220, the second gas delivery unit 240, and the waste liquid treatment device. The liquid level monitoring element is arranged inside the mixing element 231, and is configured to monitor the liquid level inside the mixing element 231 in real time. The temperature monitoring element is arranged inside the mixing element 231, and is configured to monitor the liquid temperature inside the mixing element 231 in real time.

[0137] In some embodiments, the sixteenth control valve element includes, but is not limited to, a diaphragm valve (e.g., a fifth manual diaphragm valve, a sixth manual diaphragm valve, a seventh manual diaphragm valve, and an eighth manual diaphragm valve). The fifth manual diaphragm valve is arranged at the liquid supplement inlet of the mixing element 231, and is configured to control the flow of the mixing element 231 with the liquid supply element 211. The sixth manual diaphragm valve is arranged at the carrier gas inlet of the mixing element 231, and is configured to control the flow of the mixing element 231 with the carrier gas supply element 221. The seventh manual diaphragm valve is arranged at the gas mixing outlet of the mixing element 231, and is configured to control the flow of the mixing element 231 with the second gas delivery unit 240. The eighth manual diaphragm valve is arranged at the waste liquid outlet of the mixed gas, and is configured to control the flow of the mixing element 231 with the waste liquid treatment device.

[0138] In some embodiments, the liquid level monitoring element includes, but is not limited to, a liquid level sensor. The temperature monitoring element includes, but is not limited to, a temperature sensor.

[0139] As shown in FIG. 8, the second gas delivery unit 240 comprises a fifteenth gas delivery element 241. The fifteenth gas delivery element 241 is in communication with the mixing unit 230, the second purge unit 250, and the TCS concentration detection device 100, and is configured to obtain and deliver the mixed gas to the TCS concentration detection device 100.

[0140] Specifically, the first end of the fifteenth gas delivery element 241 is in communication with the gas mixing outlet of the mixing element 231, and the second end of the fifteenth gas delivery element 241 is in communication with the first end of the first gas delivery element 111.

[0141] In some embodiments, the fifteenth gas delivery element 241 includes, but is not limited to, a stainless steel tube.

[0142] Further, the second gas delivery unit 240 further comprises a seventeenth control valve element and a fifth pressure monitoring element. The seventeenth control valve element is arranged in the fifteenth gas delivery element 241, and is configured to control the flow of the fifteenth gas delivery element 241. The fifth pressure monitoring element is in communication with the fifteenth gas delivery element 241, and is configured to monitor the pressure of the fifteenth gas delivery element 241 in real time.

[0143] In some embodiments, the seventeenth control valve element includes, but is not limited to, a diaphragm valve (e.g., the ninth manual diaphragm valve and the fourteenth pneumatic diaphragm valve). In this case, the fourteenth pneumatic diaphragm valve is located upstream of the ninth manual diaphragm valve.

[0144] It should be noted that the fifth pressure monitoring element is located downstream of the fourteenth pneumatic diaphragm valve and upstream of the ninth manual diaphragm valve.

[0145] In some embodiments, the fifth pressure monitoring element includes, but is not limited to, a pressure sensor.

[0146] As shown in FIG. 9, the second purge unit 250 includes a sixteenth gas delivery element 251, a seventeenth gas delivery element 252, an eighteenth gas delivery element 253, a nineteenth gas delivery element 254, and a twentieth gas delivery element 255. In this case, the sixteenth gas delivery element 251 is in communication with a purge gas source for delivering purge gas; the seventeenth gas delivery element 252 is in communication with the sixteenth gas delivery element 251 and the liquid supply unit 210, respectively, for delivering purge gas to the liquid supply unit 210; the eighteenth gas delivery element 253 is in communication with the sixteenth gas delivery element 251 and the carrier gas supply unit 220, respectively, for delivering purge gas to the carrier gas supply unit 220; the nineteenth gas delivery element 254 is in communication with the sixteenth gas delivery element 251 and the second gas delivery unit 240, respectively, for delivering purge gas to the second gas delivery unit 240; and the twentieth gas delivery element 255 is in communication with the sixteenth gas delivery element 251 and the first vacuum unit 260, respectively, for delivering purge gas to the first vacuum unit 260.

[0147] It should be noted that the purge gas is high-purity argon.

[0148] Specifically, the first end of the sixteenth gas delivery element 251 is in communication with the purge gas source, the second end of the sixteenth gas delivery element 251 is in communication with the seventeenth gas delivery element 252, the eighteenth gas delivery element 253, the nineteenth gas delivery element 254, and the twentieth gas delivery element 255, respectively; the first end of the seventeenth gas delivery element 252 is in communication with the second end of the sixteenth gas delivery element 251, the second end of the seventeenth gas delivery element 252 is in communication with the liquid supply element 211, and the communication between the seventeenth gas delivery element 252 and the liquid supply element 211 is located downstream of the twelfth pneumatic diaphragm valve; the first end of the eighteenth gas delivery element 253 is in communication with the second end of the sixteenth gas delivery element 251, the second end of the eighteenth gas delivery element 253 is in communication with the carrier gas supply element 221, and the communication between the eighteenth gas delivery element 253 and the carrier gas supply element 221 is located downstream of the thirteenth pneumatic diaphragm valve; the first end of the nineteenth gas delivery element 254 is in communication with the second end of the sixteenth gas delivery element 251, the second end of the nineteenth gas delivery element 254 is in communication with the fifteenth gas delivery element 241, and the communication between the nineteenth gas delivery element 254 and the fifteenth gas delivery element 241 is located upstream of the fourteenth pneumatic diaphragm valve; the first end of the twentieth gas delivery element 255 is in communication with the second end of the sixteenth gas delivery element 251, and the second end of the twentieth gas delivery element 255 is in communication with the first vacuum unit 260.

[0149] In some embodiments, the sixteenth gas delivery element 251 comprises, but is not limited to, a stainless steel tube; the seventeenth gas delivery element 252 comprises, but is not limited to, a stainless steel tube; the eighteenth gas delivery element 253 comprises, but is not limited to, a stainless steel tube; the nineteenth gas delivery element 254 comprises, but is not limited to, a stainless steel tube; and the twentieth gas delivery element 255 comprises, but is not limited to, a stainless steel tube.

[0150] Further, the second purging unit 250 further comprises an eighteenth control valve element, a tenth one-way valve element, a nineteenth control valve element, a twentieth control valve element, a twenty-first control valve element, a twenty-second control valve element, and a sixth pressure monitoring element. The eighteenth control valve element is arranged on the sixteenth gas conveying element 251 to control the flow of the sixteenth gas conveying element 251; the tenth one-way valve element is arranged on the sixteenth gas conveying element 251 to prevent the gas inside the sixteenth gas conveying element 251 from flowing backward; the nineteenth control valve element is arranged on the seventeenth gas conveying element 252 to control the flow of the seventeenth gas conveying element 252; the twentieth control valve element is arranged on the eighteenth gas conveying element 253 to control the flow of the eighteenth gas conveying element 253; the twenty-first control valve element is arranged on the nineteenth gas conveying element 254 to control the flow of the nineteenth gas conveying element 254; the twenty-second control valve element is arranged on the twentieth gas conveying element 255 to control the flow of the twentieth gas conveying element 255; and the sixth pressure monitoring element is in communication with the sixteenth gas conveying element 251 to monitor the pressure of the sixteenth gas conveying element 251 in real time.

[0151] It should be noted that the tenth one-way valve element is located downstream of the eighth manual diaphragm valve and upstream of the seventeenth pneumatic diaphragm valve; and the communication position of the sixth pressure monitoring element with the sixteenth gas conveying element 251 is located downstream of the seventeenth pneumatic diaphragm valve.

[0152] In some embodiments, the eighteenth control valve element includes but is not limited to a diaphragm valve (such as the tenth manual diaphragm valve and the fifteenth pneumatic diaphragm valve), the fifteenth pneumatic diaphragm valve is located downstream of the tenth manual diaphragm valve; the tenth one-way valve element includes but is not limited to a one-way valve (such as the tenth one-way valve); the nineteenth control valve element includes but is not limited to a diaphragm valve (such as the sixteenth pneumatic diaphragm valve); the twentieth control valve element includes but is not limited to a diaphragm valve (such as the seventeenth pneumatic diaphragm valve); the twenty-first control valve element includes but is not limited to a diaphragm valve (such as the eighteenth pneumatic diaphragm valve); the twenty-second control valve element includes but is not limited to a diaphragm valve (such as the nineteenth pneumatic diaphragm valve); and the sixth pressure monitoring element includes but is not limited to a pressure sensor.

[0153] As shown in FIG. 10, the first vacuum unit 260 includes a first vacuum pump element 261, a twenty-first gas delivery element 262, a twenty-second gas delivery element 263, and a twenty-third gas delivery element 264. Among them, the first vacuum pump element 261 is in communication with the second purge unit 250, for forming a vacuum negative pressure at the end of the second purge unit 250; the twenty-first gas delivery element 262 is in communication with the power gas source and the first vacuum pump element 261 respectively, for delivering power gas; the twenty-second gas delivery element 263 is in communication with the first vacuum pump element 261 and the tail gas treatment device 300 respectively, for delivering waste gas; the twenty-third gas delivery element 264 is in communication with the mixing unit 230 and the tail gas treatment device 300 respectively, for delivering waste gas.

[0154] Specifically, the first vacuum pump element 261 is in communication with the second end of the twentieth gas delivery element 255, for forming a vacuum negative pressure at the second end of the twentieth gas delivery element 255.

[0155] In some embodiments, the first vacuum pump element 261 includes but is not limited to a Venturi vacuum pump.

[0156] Specifically, the first end of the twenty-first gas delivery element 262 is in communication with the power gas source, and the second end of the twenty-first gas delivery element 262 is in communication with the first vacuum pump element 261; the first end of the twenty-second gas delivery element 263 is in communication with the first vacuum pump element 261, and the second end of the twenty-second gas delivery element 263 is in communication with the tail gas treatment device 300; the first end of the twenty-third gas delivery element 264 is in communication with the twenty-second gas delivery element 263, and the second end of the twenty-third gas delivery element 264 is in communication with the mixing element 231.

[0157] In some embodiments, the twenty-first gas delivery element 262 includes but is not limited to a stainless steel pipe; the twenty-second gas delivery element 263 includes but is not limited to a stainless steel pipe; and the twenty-third gas delivery element 264 includes but is not limited to a stainless steel pipe.

[0158] Further, the first vacuum unit 260 further includes a pressure relief valve element and a seventh pressure monitoring element. Among them, the pressure relief valve element is arranged in the twenty-third gas delivery element 264, for relieving pressure to the mixing unit 230; the seventh pressure monitoring element is in communication with the twentieth gas delivery element 255, for monitoring the pressure of the twentieth gas delivery element 255 in real time.

[0159] It should be noted that when the pressure inside the twenty-third gas delivery element 264 exceeds 100 psi, the pressure relief valve element can relieve the pressure inside the mixing element 231.

[0160] In some embodiments, the pressure relief valve element includes but is not limited to a safety valve.

[0161] It should be noted that the communication position of the seventh pressure monitoring element with the twentieth gas conveying element 255 is located downstream of the twenty-second control valve element.

[0162] In some embodiments thereof, the seventh pressure monitoring element includes but is not limited to a pressure sensor.

[0163] As shown in FIG. 11, the tail gas treatment device 300 includes a second vacuum unit 310 and a tail gas treatment unit 320. Among them, the second vacuum unit 310 communicates with the TCS concentration detection device 100, and is used for vacuum treatment of the TCS concentration detection device 100; the tail gas treatment unit 320 communicates with the TCS concentration detection device 100, the gas mixing device 200, and is used for treating the exhaust gas discharged by the TCS concentration detection device 100 and the gas mixing unit 230.

[0164] As shown in FIG. 12, the second vacuum unit 310 includes a second vacuum pump element 311, a twenty-fourth gas conveying element 312, a twenty-fifth gas conveying element 313 and a twenty-sixth gas conveying element 314. Among them, the second vacuum pump element 311 communicates with the TCS concentration detection device 100, and is used for forming a vacuum negative pressure at the end of the TCS concentration detection device 100; the twenty-fourth gas conveying element 312 respectively communicates with the concentration detection unit 120 of the TCS concentration detection device 100 and the second vacuum pump element 311, and is used for conveying exhaust gas; the twenty-fifth gas conveying element 313 respectively communicates with the verification unit 130 of the TCS concentration detection device 100 and the twenty-fourth gas conveying element 312, and is used for conveying exhaust gas; the twenty-sixth gas conveying element 314 respectively communicates with the second vacuum pump element 311 and the tail gas treatment unit 320, and is used for conveying exhaust gas.

[0165] Specifically, the second vacuum pump element 311 communicates with the TCS concentration detection device 100 and the tail gas treatment unit 320 through the twenty-fourth gas conveying element 312 and the twenty-sixth gas conveying element 314, respectively, and is used for forming a vacuum negative pressure at the end of the twenty-fourth gas conveying element 312.

[0166] In some embodiments thereof, the second vacuum pump element 311 includes but is not limited to a vacuum pump.

[0167] Specifically, a first end of the twenty-fourth gas delivery element 312 is in communication with the mass spectrum detection element 123, and a second end of the twenty-fourth gas delivery element 312 is in communication with the second vacuum pump element 311; a first end of the twenty-fifth gas delivery element 313 is in communication with the tenth gas delivery element 143, the twelfth gas delivery element 145, and the fourteenth gas delivery element 147 respectively, a second end of the twenty-fifth gas delivery element 313 is in communication with the twenty-fourth gas delivery element 312, and the communication position of the twenty-fifth gas delivery element 313 and the twenty-fourth gas delivery element 312 is located upstream of the second vacuum pump element 311; a first end of the twenty-sixth gas delivery element 314 is in communication with the second vacuum pump element 311, and a second end of the twenty-sixth gas delivery element 314 is in communication with the tail gas treatment unit 320.

[0168] In some embodiments, the twenty-fourth gas delivery element 312 includes but is not limited to a stainless steel pipe; the twenty-fifth gas delivery element 313 includes but is not limited to a stainless steel pipe; and the twenty-sixth gas delivery element 314 includes but is not limited to a stainless steel pipe.

[0169] As shown in FIG. 12, the tail gas treatment unit 320 includes a tail gas treatment element 321. The tail gas treatment element 321 is in communication with the TCS concentration detection device 100 and the mixing unit 230 respectively, and is used for treating the exhaust gas discharged by the TCS concentration detection device 100 and the mixing unit 230.

[0170] Specifically, the tail gas treatment element 321 is in communication with the seventh gas delivery element 133 and the twenty-sixth gas delivery element 314 respectively, and is used for collecting and treating the exhaust gas.

[0171] In some embodiments, the tail gas treatment element 321 includes but is not limited to a scrubber.

[0172] The use method of the embodiment is as follows:

[0173] (I) Liquid supply

[0174] The fourteenth control valve element and the sixteenth control valve element are opened, so that the liquid source is in communication with the mixing element 231 through the liquid supply element 211, and the liquid TCS can be delivered to the mixing element 231;

[0175] (II) Carrier gas supply

[0176] The fifteenth control valve element and the sixteenth control valve element are opened, so that the carrier gas source is in communication with the mixing element 231 through the carrier gas supply element 221, and the carrier gas can be delivered to the mixing element 231; the second pressure control element and the second flow control element are opened, so that the pressure and flow of the carrier gas delivered in the carrier gas supply element 221 are adjusted;

[0177] (Three) mixed gas delivery

[0178] The seventeenth control valve element and the sixteenth control valve element are opened, so that the mixing element 231 communicates with the first gas delivery element 111 through the fifteenth gas delivery element 241;

[0179] (Four) gas analysis

[0180] The first pressure control element and the first flow control element are opened to adjust the pressure and flow of the mixed gas delivered in the first gas delivery element 111, so as to stabilize the mixed gas in the first gas delivery element 111; the first control valve element and the third control valve element are opened to deliver the mixed gas to the mass spectrum detection element 123 through the first gas delivery element 111, the second gas delivery element 112 and the fourth gas delivery element 121, so that the mass spectrum detection element 123 can detect the mixed gas, thereby obtaining the concentration of the TCS gas in the mixed gas and obtaining the first concentration information;

[0181] (Five) condensation

[0182] The second control valve element and the fourth control valve element are opened to make the first gas delivery element 111, the sixth gas delivery element 131 and the condensation element 132 communicate with each other, so that the mixed gas flows into the condensation element 132, and the condensation element 132 condenses the mixed gas and obtains condensed liquid and condensed gas;

[0183] (Six) condensed liquid collection

[0184] The sixth control valve element and the seventh control valve element are opened to make the condensation element 132, the liquid delivery element 134 and the storage element 135 communicate with each other, so that the condensed liquid flows into the inside of the storage element 135;

[0185] (Seven) condensed gas measurement

[0186] The fifth control valve element is opened to make the condensation element 132 communicate with the seventh gas delivery element 133, and the flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, thereby obtaining the total flow of the condensed gas;

[0187] (Eight) first purge

[0188] The twelfth control valve element and the thirteenth control valve element are opened to make the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147 and the tail gas treatment device 300 communicate, so as to purge the liquid delivery element 134;

[0189] (Nine) condensed liquid measurement

[0190] The worker separates the storage element 135 from the liquid delivery element 134, and places the storage element 135 on the weight detection element 137, so as to obtain the weight of the condensed liquid inside the storage element 135;

[0191] (10) Verification

[0192] The second concentration information is calculated by the total flow of the condensed gas and the weight of the condensed liquid, and the result detected by the mass spectrum detection element 123 is compared with the actual result by comparing the second concentration information with the first concentration information, so as to determine whether the result detected by the mass spectrum detection element 123 is consistent with the actual result.

[0193] (11) Second Purging

[0194] In the case where subsequent TCS concentration verification is required, the whole device needs to be purged, that is, the eighteenth control valve element, the nineteenth control valve element, the twentieth control valve element, the twenty-first control valve element, and the twenty-second control valve element are opened, and the purging gas flows through the sixteenth gas delivery element 251, the seventeenth gas delivery element 252, the eighteenth gas delivery element 253, the nineteenth gas delivery element 254, and the twentieth gas delivery element 255 to the liquid supply element 211, the carrier gas supply element 221, and the fifteenth gas delivery element 241, so as to purge the whole pipeline and improve the cleanliness of the whole pipeline.

[0195] The advantage of the embodiment is that the gas mixing device and the TCS concentration detection device are connected, the gas mixing device can realize the bubbling reaction of the liquid TCS to generate mixed gas, and the TCS concentration detection device can detect the TCS concentration in the mixed gas; in addition, the tail gas treatment device is connected with the gas mixing device and the TCS concentration detection device, so as to treat the waste gas generated by the gas mixing device and the TCS concentration detection device.

[0196] Embodiment 3

[0197] The embodiment relates to a TCS concentration detection method.

[0198] A TCS concentration detection method is applied to the TCS concentration detection device 100 as described in Embodiment 1 or the TCS concentration detection system as described in Embodiment 2, and comprises the following steps.

[0199] The first gas delivery unit 110 is used for obtaining and delivering the mixed gas delivered by the gas mixing device 200;

[0200] The concentration detection unit 120 is used for performing mass spectrum analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0201] The verification unit 130 is used for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas;

[0202] By comparing the second concentration information and the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit 120 is consistent with the actual situation.

[0203] Specifically, the TCS concentration detection method refers to Embodiment 1.

[0204] More specifically, the TCS concentration detection method of the present embodiment is as follows:

[0205] (1) Turn on the first pressure control element and the first flow control element to adjust the pressure and flow rate of the mixed gas conveyed in the first gas conveying element 111, so as to ensure the stability of the mixed gas in the first gas conveying element 111;

[0206] (2) Turn on the first pneumatic diaphragm valve and the third pneumatic diaphragm valve, and convey the mixed gas to the mass spectrometry detection element 123 through the first gas conveying element 111, the second gas conveying element 112 and the fourth gas conveying element 121;

[0207] (3) The mass spectrometry detection element 123 can detect the mixed gas, so as to obtain the concentration of the TCS gas in the mixed gas and obtain the first concentration information;

[0208] (4) Turn on the second pneumatic diaphragm valve and the fourth pneumatic diaphragm valve to make the first gas conveying element 111, the sixth gas conveying element 131 and the condensing element 132 communicate with each other, so as to make the mixed gas flow into the condensing element 132, and the condensing element 132 condenses the mixed gas and obtains condensed liquid and condensed gas;

[0209] (5) Turn on the sixth pneumatic diaphragm valve and the seventh pneumatic diaphragm valve to make the condensing element 132, the liquid conveying element 134 and the storage element 135 communicate with each other, so as to make the condensed liquid flow into the inside of the storage element 135;

[0210] (6) Turn on the fifth pneumatic diaphragm valve to make the condensing element 132 communicate with the seventh gas conveying element 133, and the flow detection element 136 can detect the condensed gas flowing through the seventh gas conveying element 133, so as to obtain the total flow rate of the condensed gas;

[0211] (7) Turn on the twelfth pneumatic diaphragm valve and the thirteenth pneumatic diaphragm valve to make the eighth gas conveying element 141, the thirteenth gas conveying element 146, the liquid conveying element 134, the fourteenth gas conveying element 147 and the tail gas treatment device 300 communicate with each other, so as to purge the liquid conveying element 134;

[0212] (8) The worker separates the storage element 135 from the liquid delivery element 134, and places the storage element 135 on the weight detection element 137, so as to obtain the weight of the condensed liquid inside the storage element 135;

[0213] (9) The second concentration information is calculated by the total flow of the condensed gas and the weight of the condensed liquid, and the first concentration information is compared with the second concentration information, so as to determine whether the result detected by the mass spectrum detection element 123 is consistent with the actual result.

[0214] Embodiment 4

[0215] This embodiment relates to the TCS concentration detection method in the application.

[0216] A TCS concentration detection method applied to the TCS concentration detection system as described in Embodiment 2, comprising:

[0217] The gas mixing device 200 is used to obtain liquid TCS, carrier gas, mix to form mixed gas, and deliver the mixed gas to the TCS concentration detection device 100;

[0218] The first gas delivery unit 110 is used to obtain and deliver the mixed gas delivered by the gas mixing device 200;

[0219] The concentration detection unit 120 is used to perform mass spectrum analysis on the mixed gas to obtain the first concentration information of the mixed gas;

[0220] The verification unit 130 is used to condense and weigh the mixed gas to obtain the second concentration information of the mixed gas;

[0221] The first concentration information obtained by the concentration detection unit 120 is compared with the second concentration information to determine whether the first concentration information is consistent with the actual result.

[0222] Specifically, the gas mixing device 200 used to obtain liquid TCS, carrier gas, mix to form mixed gas, and deliver the mixed gas to the TCS concentration detection device 100 comprises:

[0223] The liquid supply unit 210 is used to deliver liquid to the TCS concentration detection device 100;

[0224] The carrier gas supply unit 220 is used to deliver carrier gas to the TCS concentration detection device 100;

[0225] The mixing unit 230 is used to perform bubble reaction on the liquid TCS and generate mixed gas;

[0226] The second gas delivery unit 240 is used to deliver the mixed gas.

[0227] Specifically, the TCS concentration detection method refers to Embodiment 2.

[0228] More specifically, on the basis of Embodiment 3, the TCS concentration detection method of the present embodiment further comprises:

[0229] (1) manually opening the third manual diaphragm valve and the fifth manual diaphragm valve, and opening the fourteenth pneumatic diaphragm valve, so that the liquid source is communicated with the mixing element 231 through the liquid supply element 211, and the liquid TCS can be delivered to the mixing element 231;

[0230] (2) manually opening the fourth manual diaphragm valve and the sixth manual diaphragm valve, and opening the fifteenth pneumatic diaphragm valve, so that the carrier gas source is communicated with the mixing element 231 through the carrier gas supply element 221, and the carrier gas can be delivered to the mixing element 231;

[0231] (3) opening the second pressure control element and the second flow control element, so as to adjust the pressure and flow of the carrier gas delivered in the carrier gas supply element 221;

[0232] (4) manually opening the seventh manual diaphragm valve and the ninth manual diaphragm valve, and opening the sixteenth pneumatic diaphragm valve, so that the mixing element 231 is communicated with the first gas delivery element 111 through the fifteenth gas delivery element 241.

[0233] Among them, (1)-(4) of the present embodiment are performed before (1)-(9) of Embodiment 3. That is, (1)-(9) of Embodiment 3 are numbered as (5)-(13) in the present embodiment.

[0234] Embodiment 5

[0235] The present embodiment relates to a semiconductor process equipment in the present application.

[0236] The semiconductor process equipment comprises the TCS concentration detection device 100 as described in Embodiment 1, or the TCS concentration detection system as described in Embodiment 2.

[0237] The semiconductor process equipment further comprises a liquid source, a carrier gas source, a power gas source, and a waste liquid treatment device. Among them, the liquid source includes but is not limited to a TCS liquid tank; the carrier gas source includes but is not limited to an H2 tank; the power gas source includes but is not limited to a helium tank; and the waste liquid treatment device includes but is not limited to a water purifier.

[0238] The use method and advantages of the present embodiment are the same as those of Embodiment 1 or Embodiment 2, which will not be repeated here.

[0239] Embodiment 6

[0240] The present embodiment relates to one specific implementation of the TCS concentration detection system and method of the present application.

[0241] As shown in FIG. 13, the first gas delivery unit 110 includes pneumatic diaphragm valves (PV09, PV10), a PC pressure regulator (PC1), a flow controller (MFC1), a pressure sensor (PT4); the concentration detection unit 120 includes a pneumatic diaphragm valve (PV19), a check valve (CV10), a mass spectrometer (MS); the verification unit 130 includes a condenser (Cond), a chiller (Chiller), pneumatic diaphragm valves (PV15, PV16), manual diaphragm valves (MV09, MV10), a check valve (CV09), a pressure sensor (PT5), a cylinder (Cylinder), an electronic balance (EB), a flow meter (MFM); the first purge unit 140 includes pneumatic diaphragm valves (PV11, PV12, PV13, PV14, PV17, PV18), check valves (CV03, CV04, CV05, CV06, CV07, CV08), a pressure sensor (PT6); the liquid supply unit 210 includes a manual diaphragm valve (MV02), a pneumatic diaphragm valve (PV02); the carrier gas supply unit 220 includes a manual diaphragm valve (MV04), a pneumatic diaphragm valve (PV04), a check valve (CV02), a PC pressure regulator (PC2), a flow controller (MFC2), a pressure sensor (PT3); the mixing unit 230 includes a bubbler (TEMPERATURE CONTROLLED VESSEL), manual diaphragm valves (MV05, MV06, MV07, MV08), a level sensor (LEVEL SENSOR), a temperature sensor (TEMPERATURE SENSOR); the second gas delivery unit 240 includes a pneumatic diaphragm valve (PV03), a manual diaphragm valve (MV03), a pressure sensor (PT0); the second purge unit 250 includes a manual diaphragm valve (MV01), pneumatic diaphragm valves (PV01, PV05, PV06, PV07, PV08), a pressure sensor (PT1); the first vacuum unit 260 includes a vacuum pump (VG1), a pressure sensor (PT2), a safety valve (SV); the second vacuum unit 310 includes a vacuum pump (VG2); the off-gas treatment unit 320 includes a scrubber (SCRUBBER).

[0242] Specifically, the TCS concentration detection method of the present embodiment is as follows:

[0243] Manually open MV02, MV05, open PV02, so that the liquid source communicates with TEMPERATURE CONTROLLED VESSEL through liquid supply element 211, and liquid TCS can be delivered to TEMPERATURE CONTROLLED VESSEL; manually open MV04, MV07, open PV04, so that the carrier gas source communicates with TEMPERATURE CONTROLLED VESSEL through carrier gas supply element 221, and carrier gas can be delivered to TEMPERATURE CONTROLLED VESSEL; open PC2, MFC2, so as to adjust the pressure and flow of the carrier gas delivered in carrier gas supply element 221; manually open MV06, MV03, open PV03, so that TEMPERATURE CONTROLLED VESSEL communicates with first gas delivery element 111 through fifteenth gas delivery element 241; open PC1, MFC1, adjust the pressure and flow of the mixed gas delivered in first gas delivery element 111, so as to ensure the stability of the mixed gas in first gas delivery element 111; open PV09, PV19, deliver the mixed gas to MS through first gas delivery element 111, second gas delivery element 112, and fourth gas delivery element 121; MS can detect the mixed gas, so as to obtain the concentration of TCS gas in the mixed gas, and obtain first concentration information; open PV10, PV15, so that first gas delivery element 111, sixth gas delivery element 131, and Cond communicate with each other, so that the mixed gas flows into Cond, and Cond condenses the mixed gas and obtains condensed liquid and condensed gas; open MV09, MV10, so that Cond, liquid delivery element 134, and Cylinder communicate with each other, so that the condensed liquid flows into the interior of Cylinder; open PV16, so that Cond communicates with seventh gas delivery element 133, and MFM can detect the condensed gas flowing through seventh gas delivery element 133, so as to obtain the total flow of the condensed gas; open PV17, PV18, so that eighth gas delivery element 141, thirteenth gas delivery element 146, liquid delivery element 134, fourteenth gas delivery element 147, and SCRUBBER communicate with each other, so as to purge liquid delivery element 134; the staff separates Cylinder from liquid delivery element 134, and places Cylinder on EB, so as to obtain the weight of the condensed liquid in Cylinder; calculate second concentration information through the total flow of the condensed gas and the weight of the condensed liquid, and compare the second concentration information with the first concentration information, so as to determine whether the result detected by MS is consistent with the actual result.

[0244] Any combination of the technical features in the above-described embodiments can be made, and for the sake of brevity, not all possible combinations are described, however, as long as there is no conflict, any combination of the technical features should be considered within the scope of the present disclosure.

[0245] The above-described embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the patent scope of the present application. It should be pointed out that, for ordinary skilled persons in the art, several modifications and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the patent protection scope of the present application should be subject to the appended claims.

Claims

1. A TCS concentration detection device, characterized by, The application relates to a gas concentration detection device, comprising: a first gas conveying unit in communication with a gas mixing device, used for obtaining and conveying mixed gas conveyed by the gas mixing device; a concentration detection unit in communication with the first gas conveying unit and a tail gas treatment device, used for performing mass spectrum analysis on the mixed gas to obtain first concentration information of the mixed gas; a verification unit in communication with the first gas conveying unit and the tail gas treatment device, used for performing condensation and weighing on the mixed gas to obtain second concentration information of the mixed gas, so as to verify the first concentration information; a first purging unit in communication with the verification unit and the tail gas treatment device, used for purging the verification unit and the tail gas treatment device.

2. The TCS concentration detection apparatus according to claim 1, characterized by The first gas conveying unit comprises: a first gas conveying element in communication with the gas mixing device, used for obtaining and conveying mixed gas conveyed by the gas mixing device; a second gas conveying element in communication with the first gas conveying element and the concentration detection unit, used for conveying the mixed gas to the concentration detection unit; a third gas conveying element in communication with the first gas conveying element and the verification unit, used for conveying the mixed gas to the verification unit; and / or The concentration detection unit comprises: a fourth gas conveying element in communication with the first gas conveying unit, used for obtaining and conveying the mixed gas; a fifth gas conveying element in communication with the fourth gas conveying element and the tail gas treatment device, used for conveying waste gas to the tail gas treatment device; a mass spectrum detection element in communication with the fourth gas conveying element and the tail gas treatment device, used for performing mass spectrum analysis on the mixed gas to obtain first concentration information of the mixed gas; and / or The verification unit comprises: a sixth gas conveying element in communication with the first gas conveying unit and the first purging unit, used for obtaining and conveying the mixed gas; a condensation element in communication with the sixth gas conveying element, used for condensing the mixed gas and obtaining condensed gas and condensed liquid; a seventh gas conveying element in communication with the condensation element, the first purging unit and the tail gas treatment device, used for conveying the condensed gas to the tail gas treatment device; a liquid conveying element in communication with the condensation element, used for obtaining and conveying the condensed liquid; a storage element in communication with the liquid conveying element, used for storing the condensed liquid; a flow detection element arranged on the seventh gas conveying element, used for detecting the flow of the condensed gas; a weight detection element arranged at the bottom of the storage element, used for detecting the mass of the condensed liquid in the storage element; and / or The first purging unit comprises: an eighth gas delivery element, which is in communication with the purge gas source, for obtaining and delivering the purge gas; a ninth gas delivery element, which is in communication with the eighth gas delivery element and the gas inlet structure of the verification unit, respectively, for delivering the purge gas to the verification unit; a tenth gas delivery element, which is in communication with the gas inlet structure of the verification unit and the exhaust gas treatment device, respectively, for delivering the exhaust gas; an eleventh gas delivery element, which is in communication with the eighth gas delivery element and the gas outlet structure of the verification unit, respectively, for delivering the purge gas; a twelfth gas delivery element, which is in communication with the gas outlet structure of the verification unit and the exhaust gas treatment device, respectively, for delivering the exhaust gas; a thirteenth gas delivery element, which is in communication with the eighth gas delivery element and the liquid outlet structure of the verification unit, respectively, for delivering the purge gas; a fourteenth gas delivery element, which is in communication with the liquid outlet structure of the verification unit and the exhaust gas treatment device, respectively, for delivering the exhaust gas.

3. The TCS concentration detection apparatus according to claim 2, characterized by The first gas delivery unit further comprises: a first control valve element, which is arranged on the second gas delivery element, for controlling the flow of the second gas delivery element; and / or The first gas delivery unit further comprises: a second control valve element, which is arranged on the third gas delivery element, for controlling the flow of the third gas delivery element; and / or The first gas delivery unit further comprises: a first pressure control element, which is arranged on the first gas delivery element, for adjusting the gas pressure of the first gas delivery element; and / or The first gas delivery unit further comprises: a first flow control element, which is arranged on the first gas delivery element, for adjusting the gas flow of the first gas delivery element; and / or The first gas delivery unit further comprises: a first pressure monitoring element, which is in communication with the first gas delivery element, for monitoring the pressure in the first gas delivery element in real time; and / or The concentration detection unit further comprises: a third control valve element, which is arranged on the fourth gas delivery element, for controlling the flow of the fourth gas delivery element; and / or The concentration detection unit further comprises: a first one-way valve element, which is arranged on the fifth gas delivery element, for preventing the reverse flow of the gas in the fifth gas delivery element; and / or The verification unit further comprises: a fourth control valve element, which is arranged on the sixth gas delivery element, for controlling the flow between the sixth gas delivery element and the condensation element; and / or The verification unit further comprises: a fifth control valve element, which is arranged on the seventh gas delivery element, for controlling the flow between the seventh gas delivery element and the condensation element; and / or The verification unit further comprises: A second one-way valve element is arranged in the seventh gas delivery element, for preventing backflow of gas in the seventh gas delivery element; and / or The verification unit further comprises: A sixth control valve element is arranged in the liquid delivery element, for controlling flow between the condensing element and the liquid delivery element; and / or The verification unit further comprises: A seventh control valve element is arranged in the liquid delivery element, for controlling flow of the liquid delivery element; and / or The verification unit further comprises: A second pressure monitoring element is arranged in the seventh gas delivery element, for monitoring pressure of the seventh gas delivery element in real time; and / or The first purging unit further comprises: An eighth control valve element is arranged in the ninth gas delivery element, for controlling flow of the ninth gas delivery element; and / or The first purging unit further comprises: A third one-way valve element is arranged in the ninth gas delivery element, for preventing backflow of gas in the ninth gas delivery element; and / or The first purging unit further comprises: A fourth one-way valve element is arranged in the tenth gas delivery element, for preventing backflow of gas in the tenth gas delivery element; and / or The first purging unit further comprises: A ninth control valve element is arranged in the tenth gas delivery element, for controlling flow of the tenth gas delivery element; and / or The first purging unit further comprises: A tenth control valve element is arranged in the eleventh gas delivery element, for controlling flow of the eleventh gas delivery element; and / or The first purging unit further comprises: A fifth one-way valve element is arranged in the eleventh gas delivery element, for preventing backflow of gas in the eleventh gas delivery element; and / or The first purging unit further comprises: A sixth one-way valve element is arranged in the twelfth gas delivery element, for preventing backflow of the twelfth gas delivery element; and / or The first purging unit further comprises: An eleventh control valve element is arranged in the twelfth gas delivery element, for controlling flow of the twelfth gas delivery element; and / or The first purging unit further comprises: A twelfth control valve element is arranged in the thirteenth gas delivery element, for controlling flow of the thirteenth gas delivery element; and / or The first purging unit further comprises: A seventh one-way valve element is arranged in the thirteenth gas delivery element, for preventing backflow of gas in the thirteenth gas delivery element; and / or The first purging unit further comprises: An eighth one-way valve element is arranged in the fourteenth gas delivery element, for preventing backflow of gas in the fourteenth gas delivery element; and / or The first purging unit further comprises: a thirteenth control valve element disposed on the fourteenth gas delivery element for controlling the flow of the fourteenth gas delivery element; and / or the first purging unit further comprises: a third pressure monitoring element in communication with the eighth gas delivery element for monitoring the pressure of the eighth gas delivery element in real time.

4. A TCS concentration detection system characterized by, comprises: The TCS concentration detection device according to any one of claims 1-3; a gas mixing device in communication with the TCS concentration detection device and the waste liquid treatment device for delivering mixed gas to the TCS concentration detection device; a tail gas treatment device in communication with the TCS concentration detection device and the gas mixing device for treating tail gas.

5. The TCS concentration detection system of claim 4, wherein, the gas mixing device comprises: a liquid supply unit in communication with a liquid source for delivering liquid TCS; a carrier gas supply unit in communication with a carrier gas source for delivering carrier gas; a mixing unit in communication with the liquid supply unit, the carrier gas supply unit, the TCS concentration detection device, and the waste liquid treatment device for storing liquid TCS and carrier gas and performing a bubbling reaction on the liquid TCS to generate mixed gas; a second gas delivery unit in communication with the mixing unit and the TCS concentration detection device for obtaining and delivering mixed gas to the TCS concentration detection device; a second purging unit in communication with a purging gas source, the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit for purging the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit; a first vacuum unit in communication with a power gas source, the mixing unit, the second purging unit, and the tail gas treatment device for performing vacuum treatment on the overall device; and / or the tail gas treatment device comprises: a second vacuum unit in communication with the TCS concentration detection device for performing vacuum treatment on the TCS concentration detection device; a tail gas treatment unit in communication with the TCS concentration detection device and the gas mixing device for treating exhaust gas discharged from the TCS concentration detection device and the gas mixing unit.

6. The TCS concentration detection system of claim 5, wherein, the liquid supply unit comprises: a liquid supply element in communication with a liquid source, the mixing unit, and the second purging unit for delivering liquid TCS to the mixing unit; and / or the carrier gas supply unit comprises: a carrier gas supply element in communication with a carrier gas source, the mixing unit, and the second purging unit for delivering carrier gas to the mixing unit; and / or the mixing unit comprises: a mixing element in communication with the liquid supply unit, the carrier gas supply unit, the second gas delivery unit, the first vacuum unit, the TCS concentration detection device, and the waste liquid treatment device, respectively, for performing a bubbling reaction on the liquid TCS and generating a mixed gas; and / or the second gas delivery unit includes: a fifteenth gas delivery element in communication with the mixing unit, the second purge unit, and the TCS concentration detection device, respectively, for obtaining and delivering the mixed gas to the TCS concentration detection device; and / or the second purge unit includes: a sixteenth gas delivery element in communication with a purge gas source for delivering a purge gas; a seventeenth gas delivery element in communication with the sixteenth gas delivery element and the liquid supply unit, respectively, for delivering the purge gas to the liquid supply unit; an eighteenth gas delivery element in communication with the sixteenth gas delivery element and the carrier gas supply unit, respectively, for delivering the purge gas to the carrier gas supply unit; a nineteenth gas delivery element in communication with the sixteenth gas delivery element and the second gas delivery unit, respectively, for delivering the purge gas to the second gas delivery unit; a twentieth gas delivery element in communication with the sixteenth gas delivery element and the first vacuum unit, respectively, for delivering the purge gas to the first vacuum unit; and / or the first vacuum unit includes: a first vacuum pump element in communication with the second purge unit for forming a vacuum negative pressure at an end of the second purge unit; a twenty-first gas delivery element in communication with a power gas source and the first vacuum pump element, respectively, for delivering a power gas; a twenty-second gas delivery element in communication with the first vacuum pump element and the exhaust gas treatment device, respectively, for delivering an exhaust gas; a twenty-third gas delivery element in communication with the mixing unit and the exhaust gas treatment device, respectively, for delivering the exhaust gas; and / or the second vacuum unit includes: a second vacuum pump element in communication with the TCS concentration detection device for forming a vacuum negative pressure at an end of the TCS concentration detection device; a twenty-fourth gas delivery element in communication with the concentration detection unit of the TCS concentration detection device and the second vacuum pump element, respectively, for delivering the exhaust gas; a twenty-fifth gas delivery element in communication with the verification unit of the TCS concentration detection device and the second vacuum pump element, respectively, for delivering the exhaust gas; a twenty-sixth gas delivery element in communication with the second vacuum pump element and the exhaust gas treatment unit, respectively, for delivering the exhaust gas; and / or the exhaust gas treatment unit includes: A tail gas treatment element, which is in communication with the TCS concentration detection device and the gas mixing device respectively, and is used for treating the exhaust gas discharged by the TCS concentration detection device and the gas mixing device.

7. The TCS concentration detection system of claim 6, wherein, The liquid supply unit further comprises: A fourteenth control valve element, which is arranged in the liquid supply element and is used for controlling the flow of the liquid supply element; and / or The carrier gas supply unit further comprises: A fifteenth control valve element, which is arranged in the carrier gas supply element and is used for controlling the flow of the carrier gas supply element; and / or The carrier gas supply unit further comprises: A ninth one-way valve element, which is arranged in the carrier gas supply element and is used for preventing the reverse flow of the gas in the carrier gas supply element; and / or The carrier gas supply unit further comprises: A second pressure control element, which is arranged in the carrier gas supply element and is used for adjusting the pressure of the carrier gas supply element; and / or The carrier gas supply unit further comprises: A second flow control element, which is arranged in the carrier gas supply element and is used for adjusting the flow of the carrier gas supply element; and / or The carrier gas supply unit further comprises: A fourth pressure monitoring element, which is in communication with the carrier gas supply element and is used for monitoring the pressure of the carrier gas supply element in real time; and / or The mixing unit further comprises: A sixteenth control valve element, which is arranged in the mixing element and is used for controlling the flow of the mixing element, the liquid supply unit, the carrier gas supply unit, the second gas conveying unit and the waste liquid treatment device; and / or The second gas conveying unit further comprises: A seventeenth control valve element, which is arranged in the fifteenth gas conveying element and is used for controlling the flow of the fifteenth gas conveying element; and / or The second gas conveying unit further comprises: A fifth pressure monitoring element, which is in communication with the fifteenth gas conveying element and is used for monitoring the pressure of the fifteenth gas conveying element in real time; and / or The second purging unit further comprises: An eighteenth control valve element, which is arranged in the sixteenth gas conveying element and is used for controlling the flow of the sixteenth gas conveying element; and / or The second purging unit further comprises: A tenth one-way valve element, which is arranged in the sixteenth gas conveying element and is used for preventing the reverse flow of the gas in the sixteenth gas conveying element; and / or The second purging unit further comprises: A nineteenth control valve element, which is arranged in the seventeenth gas conveying element and is used for controlling the flow of the seventeenth gas conveying element; and / or The second purging unit further comprises: A twentieth control valve element, which is arranged in the eighteenth gas conveying element and is used for controlling the flow of the eighteenth gas conveying element; and / or The second purging unit further comprises: a twenty-first control valve element disposed on the nineteenth gas delivery element for controlling the flow of the nineteenth gas delivery element; and / or The second purge unit further comprises: a twenty-second control valve element disposed on the twentieth gas delivery element for controlling the flow of the twentieth gas delivery element; and / or The second purge unit further comprises: a sixth pressure monitoring element in communication with the sixteenth gas delivery element for monitoring the pressure of the sixteenth gas delivery element in real time; and / or The first vacuum unit further comprises: a pressure relief valve element disposed on the twenty-third gas delivery element for relieving pressure on the mixing unit; and / or The first vacuum unit further comprises: a seventh pressure monitoring element in communication with the twentieth gas delivery element for monitoring the pressure of the twentieth gas delivery element in real time.

8. A semiconductor process equipment comprising: the TCS concentration detection device according to any one of claims 1-3; or the TCS concentration detection system according to any one of claims 4-7.

9. A TCS concentration detection method applied to the TCS concentration detection device according to any one of claims 1-3 or the TCS concentration detection system according to any one of claims 4-7, comprising: a first gas delivery unit for obtaining and delivering mixed gas delivered by a gas mixing device; a concentration detection unit for performing mass spectrometry on the mixed gas to obtain first concentration information of the mixed gas; a verification unit for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas; comparing the second concentration information and the first concentration information to determine whether the first concentration information obtained by the concentration detection unit is consistent with the actual value.

10. A TCS concentration detection method applied to the TCS concentration detection system according to any one of claims 4-7, comprising: a gas mixing device for obtaining liquid TCS, carrier gas, mixing to form mixed gas, and delivering the mixed gas to the TCS concentration detection device; a first gas delivery unit for obtaining and delivering mixed gas delivered by the gas mixing device; a concentration detection unit for performing mass spectrometry on the mixed gas to obtain first concentration information of the mixed gas; a verification unit for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas; comparing the second concentration information and the first concentration information to determine whether the first concentration information obtained by the concentration detection unit is consistent with the actual value.

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