Materials and configurations for improved protection of objective materials

Abstract

Passivation regions and device configurations are described herein. The passivation regions can be configured to seal against diffusion of an objective material from an underlying region into and / or through the passivation region. The passivation regions can also be configured to seal against diffusion of an externally sourced or ambient substance into and / or through the passivation region towards the underlying region.

Description

Docket No. T0090.0036.WG / / 069415 / 640457MATERIALS AND CONFIGURATIONS FOR IMPROVED PROTECTION OF OBJECTIVE MATERIALSCROSS-REFERENCE TO RELATED APPLICATIONS

[0001] The present application claims priority to U.S. Provisional Application Serial No. 63 / 713,171, titled “MATERIALS AND CONFIGURATIONS FOR IMPROVED PROTECTION OF OBJECTIVE MATERIALS,” filed October 29, 2024, the contents of which are incorporated herein by reference in their entirety and for all purposes.FIELD

[0002] The subject matter described herein relates generally to protection or passivation of an objective material, for example, the passivation of a lithium layer of a neutron generation device.BACKGROUND

[0003] Numerous applications exist where it is desirable to protect or passivate a material within a device. One such application is boron neutron capture therapy (BNCT), which represents a relatively new modality of treatment of a variety of types of cancer, including the most difficult types. BNCT is a technique that selectively aims to treat tumor cells while sparing the normal cells using a boron compound. A substance that contains boron is injected into a blood vessel, and the boron collects in tumor cells. The patient then receives radiation in the form of a neutron beam. The neutrons are produced by interaction of a proton beam with a neutron generation material, such as lithium or beryllium, that is positioned on a target substrate. The resulting neutron beam is moderated and focused on the patient, where the neutrons react with the boron to selectively kill the tumor cells.

[0004] The neutron generation material can be positioned as a layer, covering, or coating that can interact with certain types of particles or plasmas. Lithium is a conventional example, but it is a highly-reactive and corrosive metal that is difficult to handle in normal ambient conditions (e.g., air at room temperature such as found in general lab space, and the like). Lithium violently reacts with moisture, nitrogen and / or oxygen in atmospheric air and tarnishes and / or oxidizes rapidly. The lithium turns into nitride and hydroxide (e.g., lithium hydroxide (LiOH and LiOH- H2O), lithium nitride (LisN), and lithium carbonate (Li2CO3, a result of a secondary reactionDocket No. T0090.0036.WG / / 069415 / 640457 between LiOH and CO2)), which can delaminate from the substrate in the form of a dust. The air and moisture act as a catalyst for such reaction.

[0005] For safe handling, in one example the lithium may be attached to a substrate inside of a glovebox, and fdled with inert pure gas (e.g., argon). Transfer of the lithium from a glovebox to a working area requires the use of a “dry room,” where the amount of moisture in the air is low enough to prevent the lithium from oxidizing or tarnishing too significantly. However, humans working in the dry rooms introduce moisture naturally, eliminating benefits afforded by the dry room. Further, construction of dry rooms is complicated and expensive.

[0006] Attempts at addressing the above drawbacks have been met with limited or no success, depending on the particular application for which the lithium is used. Synthesis of Li N on a surface of a lithium target has been proposed. Disadvantages of such an approach include an inability to control thickness of the LisN layer and a high diffusion coefficient of lithium in LisN. Moreover, such an approach does not eliminate the risk of contamination or oxidation, even at ultra-high vacuum (UHV) conditions.

[0007] A thick layer of lithium covered or protected by a thin layer of stainless steel (SS) has also been proposed as a solution. Such an approach suffers from a limited time interval during which the lithium is protected and viable (e.g., only 10 minutes). Moreover, approaches associated with thick coatings applied on top of accelerator target materials result in a slow-down of accelerator particles and thus a lower yield or prevention entirely of the desired reaction.

[0008] An oxidation resistant layer of beryllium (Be) and / or aluminum (Al) has also been proposed. Drawbacks associated with such approaches include the high reactivity between lithium and aluminum when the two are in contact, and the quick diffusion of aluminum through the lithium. Further, beryllium is hazardous and difficult to work with.

[0009] For these and other reasons, needs exist for improved systems, devices, and methods that facilitate passivation of materials.SUMMARY

[0010] Example embodiments of systems, devices, and methods are described herein for protection or passivation of an objective material. A passivation region can be configured to seal against diffusion of the objective material from an underlying region into and / or through the passivation region. The passivation region can also be configured to seal against diffusion of anDocket No. T0090.0036.WD / / 069415 / 640457 externally sourced or ambient substance into and / or through the passivation region towards the underlying region. Passivation regions having single and multi-layer configurations are described. Example embodiments are described in the context of neutron generation applications where the objective material is lithium. Numerous materials and material combinations are described for use in the passivation region. The passivation region can be located between the objective material and the ambient environment. In addition, or alternatively, the passivation region can be located between the objective material and on underlying structure or substrate that supports the objective material.

[0011] Other systems, devices, methods, features, and advantages of the subject matter described herein will be or will become apparent to one with skill in the art upon examination of the following figures and detailed description. It is intended that all such additional systems, methods, features and advantages be included within this description, be within the scope of the subject matter described herein, and be protected by the accompanying claims. In no way should the features of the example embodiments be construed as limiting the appended claims, absent express recitation of those features in the claims.BRIEF DESCRIPTION OF FIGURES

[0012] The details of the subject matter set forth herein, both as to its structure and operation, may be apparent by study of the accompanying figures, in which like reference numerals refer to like parts. The components in the figures are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the subject matter. Moreover, all illustrations are intended to convey concepts, where relative sizes, shapes and other detailed attributes may be illustrated schematically rather than literally or precisely.

[0013] FIG. 1A is a schematic diagram of an example embodiment of a neutron beam system.

[0014] FIG. IB is a schematic diagram of another example embodiment of a neutron beam system.

[0015] FIG. 2 is a cross-sectional view depicting an example embodiment of a target assembly subsystem.

[0016] FIGs. 3A, 3B, and 3C are cross-sectional, front perspective, and rear perspective views depicting an example embodiment of a neutron generation target.Docket No. T0090.0036.WG / / 069415 / 640457

[0017] FIGs. 4A-4B are cross-sectional views depicting example embodiments of a neutron generation target.

[0018] FIG. 5 is a cross-sectional view depicting an example embodiment of a neutron generation target.

[0019] FIGs. 6A-6C are cross-sectional views depicting example embodiments of a neutron generation target.

[0020] FIGs. 7A-7B are cross-sectional views depicting example embodiments of a neutron generation target.

[0021] FIG. 8 is a cross-sectional view depicting an example embodiment of a neutron generation target.

[0022] FIGs. 9A-9C are cross-sectional views depicting example embodiments of a neutron generation target.

[0023] FIG. 9D is a perspective view depicting an example embodiment of a neutron generation target.DETAILED DESCRIPTION

[0024] Before the present subject matter is described in detail, it is understood that this disclosure is not limited to the particular embodiments described, as such may, of course, vary. It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only, and is not intended to be limiting, since the scope of the present disclosure will be limited only by the appended claims.

[0025] Neutron generation targets and other high energy devices or structures often have corrodible and / or mobile chemical constituents like lithium. Example embodiments of systems, devices, and methods are described herein for passivation or protection of these corrodible and / or mobile materials. For ease of discussion, the material for which it is the object to passivate or protect may be referred to herein as the objective material. A passivation region can be configured to hold or maintain the objective material in position by inhibiting diffusion of the objective material into (and entirely through) the passivation region. When located between the objective material and the ambient environment, the passivation region can also be configured to isolate the objective material from chemical substances in the ambient environment and thereby protect it from contaminants (e.g., air components such as nitrogen and oxygen, or waterDocket No. T0090.0036.WG / / 069415 / 640457 components such as hydrogen and oxygen) and other undesired corrosive reactions. When located between the objective material and the underlying base structure or substrate, the passivation region can also be configured to isolate the objective material from material of (e.g., constituting or formed within) the base structure or substrate that may diffuse into the objective material.

[0026] Applications within which the objective material is used can vary widely. Example embodiments of passivation are described herein for objective materials in this wide variety of applications. A non-exhaustive list of applications includes: reactors for research or energy generation and commercialization such as walls of fusion and fission reactors; particle accelerators (e.g., the walls of) used for medical applications (such as medical diagnostic systems, medical imaging systems, or radiation therapy systems), for scientific tools, for industrial or manufacturing processes (such as the manufacturing of semiconductor chips), for the alteration of material properties (such as surface treatment), for the irradiation of food, or for pathogen destruction in medical sterilization; and as a component of imaging systems such as for cargo or container inspection.

[0027] For ease of description, many embodiments described herein will be done so in the context of a radiation therapy system that uses a lithium objective material as a neutron generation material in a neutron generation target configured for use in BNCT. The embodiments can be used with other neutron generation materials such as beryllium (Be). The embodiments are not limited to neutron production nor BNCT applications.Example BNCT Applications

[0028] Turning in detail to the figures, FIG. 1 A is a schematic diagram of an example embodiment of a beam system 10 for use with embodiments of the present disclosure. In FIG. 1A, beam system 10 includes a source 12, a low-energy beamline (LEBL) 14, an accelerator 16 coupled to the low-energy beamline (LEBL) 14, and a high-energy beamline (HEBL) 16 extending from the accelerator 16 to a target 100. LEBL 14 is configured to transport a beam from source 12 to an input of accelerator 16, which in turn is configured to produce a beam by accelerating the beam transported by LEBL 14. HEBL 18 transfers the beam from an output of accelerator 40 to target 100. Target 100 can be a structure configured to produce a desired result in response to the stimulus applied by the incident beam, or can modify the nature of the beam.Docket No. T0090.0036.WG / / 069415 / 640457Target 100 can be a component of system 10 or can be a workpiece that is conditioned or manufactured, at least in part, by system 10.

[0029] FIG. IB is a schematic diagram illustrating another example embodiment of a neutron beam system 10 for use in boron neutron capture therapy (BNCT). Here, source 12 is an ion source and accelerator 16 is a tandem accelerator. Neutron beam system 10 includes a preaccelerator system 20, serving as a charged particle beam injector, high voltage (HV) tandem accelerator 16 coupled to pre-accelerator system 20, and HEBL 18 extending from tandem accelerator 16 to a neutron target assembly 200 housing target 100 (not shown). In this embodiment target 100 is configured to generate neutrons in response to impact by protons of a sufficient energy, and can be referred to as a neutron generation target. Neutron beam system 10 as well as pre-accelerator system 20 can also be used for other applications such as those other examples described herein, and is not limited to BNCT.

[0030] Pre-accelerator system 20 is configured to transport the ion beam from ion source 12 to the input (e.g., an input aperture) of tandem accelerator 16, and thus also acts as LEBL 14. Tandem accelerator 16, which is powered by a high voltage power supply 42 coupled thereto, can produce a proton beam with an energy generally equal to twice the voltage applied to the accelerating electrodes positioned within accelerator 16. The energy level of the proton beam can be achieved by accelerating the beam of negative hydrogen ions from the input of accelerator 16 to the innermost high-potential electrode, stripping two electrons from each ion, and then accelerating the resulting protons downstream by the same applied voltage.

[0031] HEBL 18 can transfer the proton beam from the output of accelerator 16 to the target within neutron target assembly 200 positioned at the end of a branch 70 of the beamline extending into a patient treatment room. System 10 can be configured to direct the proton beam to any number of one or more targets and associated treatment areas. In this embodiment, the HEBL 18 includes three branches 70, 80 and 90 that can extend into three different patient treatment rooms, where each branch can terminate in a target assembly 200 and downstream beam shaping apparatus (not shown). HEBL 18 can include a pump chamber 51, quadrupole magnets 52 and 72 to prevent de-focusing of the beam, dipole or bending magnets 56 and 58 to steer the beam into treatment rooms, beam correctors 53, diagnostics such as current monitors 54 and 76, a fast beam position monitor 55 section, and a scanning magnet 74.Docket No. T0090.0036.WG / / 069415 / 640457

[0032] The design of HEBL 18 depends on the configuration of the treatment facility (e.g., a single-story configuration of a treatment facility, a two-story configuration of a treatment facility, and the like). The beam can be delivered to target assembly (e.g., positioned near a treatment room) 200 with the use of bending magnet 56. Quadrupole magnets 72 can be included to then focus the beam to a certain size at the target. Then, the beam passes one or more scanning magnets 74, which provides lateral movement of the beam onto the target surface in a desired pattern (e.g., spiral, curved, stepped in rows and columns, combinations thereof, and others). The beam lateral movement can help achieve smooth and even time-averaged distribution of the proton beam on the lithium target, preventing overheating and making the neutron generation as uniform as possible within the lithium layer.

[0033] After entering scanning magnets 74, the beam can be delivered into a current monitor 76, which measures beam current. Target assembly 200 can be physically separated from the HEBL volume with a gate valve 77. The main function of the gate valve is separation of the vacuum volume of the beamline from the target while loading the target and / or exchanging a used target for a new one. In embodiments, the beam may not be bent by 90 degrees by a bending magnet 56, it rather goes straight to the right of FIG. IB, then enters quadrupole magnets 52, which are located in the horizontal beamline. The beam could be subsequently bent by another bending magnet 58 to a needed angle, depending on the building and room configuration. Otherwise, bending magnet 58 could be replaced with a Y-shaped magnet in order to split the beamline into two directions for two different treatment rooms located on the same floor.

[0034] FIG. 2 is a cross-sectional view drawing depicting an example embodiment of a target assembly subsystem 200 of the neutron beam system 10 shown in FIG. IB. In this embodiment, neutron generation target 100 is enclosed between a cap 202 and a vacuum or near vacuum interior region 210 of HEBL 18. An arrow B shows the direction of the charged particle (e.g., proton) beam that first impacts the face of upstream side 112. The beam travels from right-to-left as depicted in FIG. 2. References to “upstream” and “downstream” positions herein are done so with reference to the direction of beam travel. For example, target 100 is upstream of cap 202, and cap 202 is downstream of target 100. Cooling of target 100 can be accomplished on the opposite downstream side 114 (from which the neutron beam exits target 100). Cap 202 can be bolted to HEBL 18, thus providing both a vacuum tight seal 206 between target 100 and vacuumDocket No. T0090.0036.WG / / 069415 / 640457 region 210 of HEBL 18, and a water-tight seal 205 between target 100 and coolant inlet 204 and outlets 208.Example Embodiments of Passivation Regions

[0035] FIG. 3 A is a cross-sectional view depicting an example embodiment of a passivated neutron generation target 100 for BNCT. FIGs. 3B and 3C are perspective views of an upstream side 112 and a downstream side 114, respectively, of target 100. Target 100 includes the objective material in a region 110. Several examples of objective materials are lithium (e.g., naturally abundant lithium or lithium-7) and beryllium. In a position upstream (e.g., above) of region 110, target 100 includes a passivation region 302 configured to protect region 110, such as by inhibiting diffusion as described herein. Passivation region 302 and region 110 can be configured in a variety of different shapes, including, for example, those that are planar, concave, convex, rounded, spherical or hemispherical, conical, irregular, and / or any combinations thereof.

[0036] In this embodiment region 110 is configured as a planar neutron generation layer coupled to a substrate structure 120 on a first (or upstream) surface 121 of substrate 120. In other examples region 110 may be a region of deposit, a filled well, a multi-layered structure, or a three-dimensional polygonal or globular body, to name a few. A proton beam propagating in direction B (e.g., from tandem accelerator 16 along HEBL 18 (not shown)) passes through passivation region 302 and then interacts with layer 110 to produce neutrons that, in turn, pass through substrate 120 and exit from downstream side 1 14 of target 100. The neutron generation process converts the objective material (e.g., lithium) into a radioactive isotope (e.g., of beryllium, 7Be).

[0037] Substrate 120 can be configured for heat removal to dissipate the high energy level of the incident proton beam. Passivation region 302 and neutron generation layer 110 preferably have a total thickness that enables protons to exit layer 110 relatively soon after the proton energy drops below the threshold of the nuclear reaction for neutron formation (e.g., 1.88 MeV for lithium-7). This avoids further energy dissipation in layer 110, which is inefficient and leads to heating of layer 110 without neutron production. Protons can penetrate through neutron generation material layer 110 to substrate 120 and dissipate their remaining energy in substrate 120 or partly in substrate 120 and partly in another component located downstream of target 100. Substrate 120 can be made of a material having a high thermal conductivity, such as, for example, copper (Cu), copper-diamond powder composites, CVD diamond, and the like. Target 100 can include one orDocket No. T0090.0036.WG / / 069415 / 640457 more materials to inhibit blistering, such as a tantalum layer between layer 100 and substrate 120. Downstream side 114 of substrate 120 can be actively cooled by a coolant flow through channels 122, designed to remove the heat (e.g., about 25 kilowatt (kW) heat power). Channels 122 can have a spiral configuration as depicted in FIG. 3C, or another configuration as desired.

[0038] The objective material of layer 110 may be a highly mobile or diffusive material like lithium. Passivation region 302 can be configured to inhibit (e.g., seal, against, substantially inhibit or prevent altogether) diffusion of the internal objective material of layer 110 in a downstream -to-upstream direction into or through region 302, where it may come into contact with another substance or the ambient environment. Inhibition of diffusion of the objective material can be accomplished by one or more different materials in one or more layers (e.g., one, two, three, four, five, or more) of region 302. In some example embodiments, passivation region 302 has a coefficient of diffusion for the objective material of 1 x 103square centimeters per second (cm2 / s) or less, while in other embodiments region 302 can have a coefficient of diffusion for the objective material that is 1 x 1044cm2 / s or less, and in still other embodiments region 302 can have a coefficient of diffusion for the objective material that is 1 x 105cm2 / s or less. Example embodiments of passivation region 302, where the objective material is lithium, can have a coefficient of diffusion for lithium that is 5 x 104cm2 / s or less, and in some embodiments a coefficient of diffusion for lithium that is 5 x 10’15cm2 / s or less. All aforementioned coefficients are measured at 25 degrees Celsius and can be a characteristic of any one or more of the materials or layers (e.g., layer 310 and / or layer 410) of region 302, or characteristic of region 302 as a whole. For ease of description, this characteristic of inhibiting diffusion of the objective material may be referred to herein as a objective barrier characteristic. In the embodiment of FIGs. 3A-3C, layer 310 is configured to exhibit this objective barrier characteristic.

[0039] In embodiments employing lithium as the objective material, this characteristic may also be referred to as a lithium barrier characteristic. The lithium barrier characteristic can be exhibited in passivation region 302 by various different materials. Examples of such materials usable with any and all embodiments described herein are (or can include) one or more of molybdenum, tungsten, and chromium, and compounds or mixtures including: one of molybdenum, tungsten, and chromium; two of molybdenum, tungsten, and chromium; or all three of molybdenum, tungsten, and chromium. Further examples of materials exhibiting theDocket No. T0090.0036.WG / / 069415 / 640457 lithium barrier characteristic of region 302 are (or can include) a carbide or other material including carbon. Examples of such carbon materials for passivation region 302 are the following including all variants thereof: diamond-like carbon, (ultra)nanocrystalline diamond, binary carbides (e.g., silicon carbide (SiC), boron carbide (B4C), and the like), interstitial carbides (e.g., tungsten carbide (WC), titanium carbide (TiC), and the like), cemented carbides (e.g., tungsten titanium carbide (WTiC) and the like), transition metal carbides (e.g., titanium carbide, vanadium carbide (VC), niobium carbide (NbC), and the like), and covalent carbides (e g., silicon carbide (SiC) and the like). Other materials that are known to inhibit diffusion of lithium may be used without departing from the scope of the present disclosure. Similarly, these or other materials can be used for embodiments where the objective material is different from lithium, such as, e.g., beryllium, without departing from the scope of the present disclosure.

[0040] Preferably the lithium barrier material does not directly contaminate or corrode the lithium, and is not (or does not include) a material such as aluminum, or alloys of aluminum. In some embodiments, the lithium barrier material is not beryllium nor a combination of beryllium and a metal such as aluminum. In some embodiments, the lithium barrier material (e.g., at the time of fabrication) is not a lithium-containing material such as lithium fluoride or lithium sulfide. In some embodiments, the lithium barrier material is not magnesium fluoride nor a polymer. In some embodiments, the lithium barrier material can include carbon as described, and in other embodiments the material that exhibits the lithium barrier characteristic is a material other than and does not include carbon (C), like diamond-like carbon and (ultra)nanocrystalline diamond.

[0041] In some embodiments, the objective barrier material does not form a eutectic combination (a combination having a melting point less than the melting points of the constituent materials taken individually) with the objective material. When the objective material is lithium, some embodiments can omit materials that form a eutectic combination with lithium, such as aluminum, silver, gold, bismuth, palladium, or zinc, or alloys of aluminum, silver, gold, bismuth, palladium, or zinc.

[0042] Region 302 can also be configured to seal against the intrusion and diffusion of externally-sourced substances (e.g., substances from the ambient environment such as air, moisture, any one or combination of oxygen, nitrogen, carbon dioxide, hydrogen, or other gases, etc.) in an upstream-to-downstream direction into or through region 302. Should such substancesDocket No. T0090.0036.WG / / 069415 / 640457 penetrate into target 100 then those substances can potentially contaminate or react with (e.g., oxidize) the objective material in layer 110. For ease of description, this characteristic may be referred to herein as an ambient barrier characteristic. The ambient barrier characteristic can be exhibited in an environment with normal air pressure (e.g., one atmosphere (atm)), higher pressure environments, or lower pressure environments (e.g., a vacuum or near vacuum).

[0043] The ambient barrier characteristic can be exhibited in passivation region 302 by various different materials. Examples of such materials are (or can include) a nitride or other material including nitrogen. Examples of nitrides for passivation region 302 are the following group 4, 5, and 6 nitrides including variants thereof: titanium nitrides (e.g., TiN), vanadium nitrides (e.g., VN, V2N), chromium nitrides (e.g., CrN, CnN), zirconium nitrides (e.g., ZrN), niobium nitrides (e.g., NbN), molybdenum nitrides (e g., MoN), hafnium nitrides (e.g., HfN), tantalum nitrides (e.g., TaN), and tungsten nitrides (e.g., WN). Further examples include combinations of the foregoing group 4, 5, and 6 nitrides such as, but not limited to: tantalum titanium nitrides (e.g., TaTiN), tantalum vanadium nitrides (e.g., TaVN), tantalum chromium nitrides (e.g., TaCrN), tantalum zirconium nitrides (e.g., TaZrN), tantalum niobium nitrides (e.g., TaNbN), tantalum molybdenum nitrides (e.g., TaMoN), tantalum hafnium nitrides (e.g., TaHfN), tantalum tungsten nitrides (e.g., TaWN), titanium vanadium nitrides (e.g., TiVN, TiV2N), titanium chromium nitrides (e.g., TiCrN, TiC N), titanium zirconium nitrides (e.g., TiZrN), titanium niobium nitrides (e.g., TiNbN), titanium molybdenum nitrides (e.g., TiMoN), titanium hafnium nitrides (e.g., TiHfN), titanium tungsten nitrides (e.g., TiWN), vanadium chromium nitrides (e.g., VCrN, VCT2N), vanadium zirconium nitrides (e.g., VZrN), vanadium niobium nitrides (e.g., VNbN), vanadium molybdenum nitrides (e.g., VMoN), vanadium hafnium nitrides (e.g., VHfN), vanadium tungsten nitrides (e.g., VaWN), chromium zirconium nitrides (e.g., CrZrN), chromium niobium nitrides (e.g., CrNbN), chromium molybdenum nitrides (e.g., CrMoN), chromium hafnium nitrides (e.g., CrHfN), chromium tungsten nitrides (e.g., CrWN), zirconium niobium nitrides (e.g., ZrNbN), zirconium molybdenum nitrides (e.g., ZrMoN), zirconium hafnium nitrides (e.g., ZrHfN), zirconium tungsten nitrides (e.g., ZrWN), niobium molybdenum nitrides (e.g., NbMoN), niobium hafnium nitrides (e.g., NbHfN), niobium tungsten nitrides (e.g., NbWN), molybdenum hafnium nitrides (e.g., MoHfN), molybdenum tungsten nitrides (e.g., MoWN), hafnium tungsten nitrides (e.g., HfWN), and combinations thereof such as TiMoTaN, TiWN, MoWN, and TiMoWN. Still further examples of nitrides for passivation region 302 areDocket No. T0090.0036.WG / / 069415 / 640457 the following including variants thereof: boron nitrides (e.g., BN), aluminum nitrides (e.g., AIN), silicon nitrides (e.g., Si3N4), gallium nitrides (e.g., GaN), germanium nitrides (e.g., Ge3N4), indium nitrides (e.g., InN), scandium nitrides (e.g., ScN), iron nitrides (e.g., Fe2N, FesN4, Fe4N, FevNs, FeieN ), zinc nitrides (e.g., Z N2), yttrium nitrides (e.g., YN), beryllium nitrides (e.g., BesN), magnesium nitrides (e.g., MgsN), calcium nitrides (e g., Ca3N), strontium nitrides (e.g., SnN), barium nitrides (e.g., BasN), lanthanum nitrides (e.g., LaN), cerium nitrides (e.g., CeN), praseodymium nitrides (e.g., PrN), neodymium nitrides (e.g., NdN), promethium nitrides (PmN), samarium nitrides (e.g., SmN), europium nitrides (e.g., EuN), gadolinium nitrides (e.g., GdN), terbium nitrides (e.g., TbN), dysprosium nitrides (e.g., DyN), holmium nitrides (e.g., HoN), erbium nitrides (e.g., ErN), thulium nitrides (e.g., TmN), ytterbium nitrides (e.g., YbN), lutetium nitrides (e.g., LuN), and combinations of the foregoing, such as InGaN, to name a few.

[0044] Further examples of materials exhibiting the ambient barrier characteristic of region 302 are (or can include) a carbide or other material including carbon. Examples of such carbon materials for passivation region 302 are the following including all variants thereof: diamondlike carbon, (ultra)nanocrystalline diamond, binary carbides (e.g., silicon carbide (SiC), boron carbide (B4C), and the like), interstitial carbides (e.g., tungsten carbide (WC), titanium carbide (TiC), and the like), cemented carbides (e.g., tungsten titanium carbide (WTiC) and the like), transition metal carbides (e.g., titanium carbide, vanadium carbide (VC), niobium carbide (NbC), and the like), and covalent carbides (e.g., silicon carbide (SiC) and the like).

[0045] Other materials that are known to inhibit or prevent diffusion of contaminants of the objective material may be used without departing from the scope of the present disclosure.

[0046] In some example embodiments, the ambient barrier characteristic can have a gas permeability (measured in (cubic centimeters (cc) x millimeters (mm)) / (square meters (m2) x day x atmosphere (atm)) at 25 degrees C) for oxygen, nitrogen, and carbon dioxide that is 100 or less, preferably 3.1 or less. In some example embodiments, in addition to either of these gas permeabilities, the ambient barrier characteristic can have a water vapor transmission rate (WTVR) (measured in (grams (g) x mm) / (m2x day) at 100 degrees Fahrenheit and 90% relative humidity) that is 0.6 or less, more preferably 0.09 or less.

[0047] The objective barrier characteristic and the ambient barrier characteristic need not be permanent, but rather can exhibit their properties for substantial duration so as to inhibit or slow diffusion for a length of time (e.g., one hour or more, one day or more, one week or more, oneDocket No. T0090.0036.WG / / 069415 / 640457 month or more) that is practically effective for the particular application, which can vary as stated herein. Embodiments of passivation regions 302 disclosed herein can be used to protect the neutron generation material for an extended period of time of one or more months.

[0048] Passivation region 302 can be immediately adjacent to and in contact with layer 110 or can be separated by one or more other layers or regions. In the embodiment of FIGs. 3A-3C passivation region 302 is configured with only one layer 310 (e.g., molybdenum, tungsten, or chromium) exhibiting the objective barrier characteristic, or passivation region 302 is configured with only one layer but that layer exhibits both the objective barrier characteristic and the ambient barrier characteristic (e.g., by a material that exhibits both characteristics, or by a combination of materials each exhibiting one or both of the characteristics).

[0049] FIG. 4A is a cross-sectional view depicting another example embodiment of a neutron generation target 100 with passivation region 302. In this embodiment, region 302 includes passivation layer 310 (positioned upstream of layer 110 as in the preceding embodiment) and an additional passivation layer 410 that is positioned upstream of and adjacent to layer 310. Layer 410 can be referred to as upstream layer 410 and layer 310 can be referred to as downstream layer 310. Upstream layer 410 can be placed on a first upstream surface of downstream layer 310, which in turn can be placed on a first upstream surface of layer 110. One or more additional layers or films may be present in region 302 (e.g., bringing total to three, four, five, or more), such as the intervening layer described with respect to FIG. 4B.

[0050] In the embodiment of FIG. 4A, downstream layer 310 exhibits the lithium barrier characteristic and inhibits lithium of layer 110 from diffusing upwards to layer 410. Layer 310 can be, for example, molybdenum, tungsten, chromium, or any of the other materials exhibiting the lithium barrier characteristic disclosed herein. Upstream passivation layer 410 exhibits the ambient barrier characteristic, and inhibits the intrusion and diffusion of externally-sourced substances that may contaminate or corrode the lithium of layer 110. Layer 410 can be, for example, tantalum nitride, or any of the other materials exhibiting the ambient barrier characteristic described herein. Thus the dual layer configuration of region 302 permits layer 410 to be composed of a substance with superior sealing or barrier properties but that might otherwise corrode the lithium of layer 110, reducing the effectiveness of the lithium’s neutron generation capability. Layer 310 acts as a non-reactive barrier inhibiting movement of lithium into contact with layer 410, thus minimizing any damaging or otherwise undesirable reactions.Docket No. T0090.0036.WG / / 069415 / 640457Such a configuration is particularly desirable when the objective material is highly mobile, as is the case with lithium.

[0051] In some example embodiments, the thickness of passivation region 302 (e.g., the thickness of layer 310 if present alone, or the combined thickness of layers 310 and 410) does not exceed three (3) microns in BNCT applications to minimize energy reduction of incoming protons, although region 302 is not limited to such. In other embodiments, region 302 does not exceed ten (10) microns in thickness, and in still other embodiments region 302 does not exceed 50 microns in thickness. The particular thickness of choice depends on the application, e.g., acceleration voltage or other potential difference, etc. For regions 302 with multiple layers (e.g., 310 and 410), the thickness of each layer depends upon the specific application and desired degree of inhibition of diffusion. Accordingly, broad ranges of thickness are within the scope of the present disclosure.

[0052] FIG. 4B is a cross-sectional view drawing depicting another example embodiment of a neutron generation target 100 with multi-layer passivation. Here, region 302 includes three passivation layers, downstream layer 310, upstream layer 410, and an intermediate layer 450 located between layers 310 and 410. Intermediate layer 450 can promote adhesion, assist in stress relief (e.g., as a polymer, shape memory alloy, etc.), or perform other functions between layer 310 and layer 410. Intermediate layer 830 can also prevent diffusion of substances between layer 310 and layer 410. In some embodiments, the layers can be deposited sequentially such that downstream layer 310 is deposited on an upstream surface of neutron generation material 110, intermediate layer 450 is deposited on an upstream surface of layer 310, and upstream layer 410 is deposited on an upstream surface of intermediate layer 450. Layers 310, 410, and / or 450 can be positioned (e.g., on layer 110) through any applicable manufacturing technique, such as deposition (e.g., chemical vapor deposition), sputtering, or with the use of adhesive, mechanical force, or other mechanism for attachment. A desired thickness of intermediate layer 450 depends upon the specific application and environment for the neutron generation target. Accordingly, varied thicknesses are within the scope of the present disclosure.

[0053] FIGs. 5-7B will be used to describe additional example embodiments with passivation. These embodiments have either a single passivation layer in region 302 (FIG. 7A) or two passivation layers in region 302. However the embodiments of FIGs. 5-7B can each be configured with one, two, three or more passivation layers within region 302.Docket No. T0090.0036.WG / / 069415 / 640457

[0054] FIG. 5 is cross-sectional view depicting an additional example embodiment of a neutron generation target 100 where the passivation covers both top and side surfaces of the neutron generation layer 110. Here, passivation region 302 includes layers 310 and 410 deposited (or otherwise positioned) over the topmost upstream surface 111 A of neutron generation layer 110, as well as over the lateral side surfaces 11 IB and 111C (which can be the same side surface, e.g., as in the case of a round target 100). Both layers 310 and 410 terminate at a location downstream of (e.g., beneath) downstream surface 121. In this embodiment the lateral sides 11 IB and 111C of layer 110 are flush with the sides of substrate 120, although this may vary. Further, while the passivation layers 310 and 410 are depicted as thinning as they extend from the upstream surface 111 A to the side surfaces 11 IB and 111C, their thickness can be maintained (e.g., equal or even coverage) over all surfaces.

[0055] FIGs. 6A-6C are cross-sectional views depicting additional example embodiments of target 100 with passivation. In these embodiments, substrate 120 includes sidewalls 602B and 602C that partially enclose an interior volume, such as a recess or cavity, in which the neutron generation material 110 is deposited or otherwise placed. A downstream surface of material 110 is coupled to upstream surface 121 of the recess of substrate 120, such as through adhesion, an interference fit, or other manner of attachment. The recess in substrate 120 can be machined or etched into substrate 120. Substrate 120 can also (or alternatively) be of a multi-piece construction where the relatively taller sidewall portions 602B (adjacent 11 IB) and 602C (adjacent 111C) are attached to the central portion 602D to form the recess. In these embodiments, side protection is provided to layer 110 primarily by substrate 120

[0056] In the embodiment of FIG. 6A, passivation region 302 includes two passivation layers 310 and 410, both of which are also located within the recess in substrate 120. In some embodiments, a furthest upstream surface 411 of region 302 (e.g., of layer 402) can be flush with a furthest upstream surface 611 of substrate 120, as shown in FIG. 6A. In the embodiment of FIG. 6B, layer 110 is again placed within the recess, and passivation region 302 again includes two passivation layers 310 and 410. But in this example both of passivation layers 310 and 410 are located above layer 110 and the recess in substrate 120. Here, the furthest upstream surface 111A of layer 110 is flush with furthest upstream surface 611 of substrate 120, although embodiments can vary. In the embodiment of FIG. 6C, layer 110 and downstream passivation layer 310 are positioned within the recess, while upstream passivation layer 410 is located aboveDocket No. T0090.0036.WG / / 069415 / 640457 layer 310 and the recess in substrate 120. Here, the furthest upstream surface 31 1 of layer 310 is flush with furthest upstream surface 611 of substrate 120 but, again, embodiments can vary. In embodiments with an intermediate layer 450, that layer 450 can be positioned within the recess with layers 310 and 410 (FIG. 6A), above the recess with layers 310 and 410 (FIG. 6B), or either within the recess or above the recess (as is permitted in the embodiment of FIG. 6C).

[0057] FIGs. 7A and 7B are cross-sectional views depicting additional example embodiments of neutron generation target 100. In the embodiment of FIG. 7A, layer 110 is located on upstream surface 611 of substrate 120. Passivation region 302 includes layer 310 positioned over layer 110 such that all surfaces 111A, 11 IB, and 111C are covered. In the embodiment of FIG. 7B, region 302 includes layer 310 positioned over layer 110 such that all surfaces 111 A, 11 IB, and 111C are covered, and layer 410 positioned over layer 310 such that all surfaces of layer 310 are covered. Stated differently, layer 310 encapsulates layer 110, and layer 410 encapsulates both layers 310 and 110. These embodiments are relatively easy to manufacture, for example, using sequential deposition steps for each of the layers (e.g., 110, 310, and 410) without the formation of a recess.

[0058] FIG. 8 is a cross-sectional view of another example embodiment. Here, target 100 is configured in similar fashion to the embodiment of FIG. 4A but with the locations of layer 310 and 410 switched (inverted) with each other to form passivation region 302. Here, the material(s) exhibiting the ambient barrier characteristic of layer 410 also exhibits the objective barrier characteristic and can be placed downstream adjacent to layer 110. The material(s) exhibiting the objective barrier characteristic of layer 310 also exhibits the ambient barrier characteristic and can be placed upstream of layer 410, resulting in the inverted configuration shown. For example, layer 310 can include or be formed of molybdenum, tungsten, chromium, and combinations thereof, while layer 410 can include or be formed of a nitrogen containing material such as tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, and the like, or layer 410 can include or be formed of a carbon containing material such as any and all of those described herein. In certain embodiments, layer 410 in this inverted configuration does not include a carbon containing material.

[0059] Target 100 can have multiple distinct passivation regions 302. For example, in addition to placement of a passivation region 302-1 on the upstream side of layer 110, target 100 can also have a passivation region 302-2 located on a downstream side of layer 110 to inhibit diffusion ofDocket No. T0090.0036.WG / / 069415 / 640457 the objective material downstream into substrate 110 or another portion of target 100 and / or to inhibit diffusion of other target or substrate material into layer 110. FIGs. 9A-9C depict additional example embodiments of neutron generation targets 100 having a first passivation region 302-1 and a second passivation region 302-2. FIG. 9A is a cross-sectional view where target 100 is configured in similar fashion to the embodiment of FIG. 4A with layers 310-1 and 410-1 forming first passivation region 302-1, but further includes a second passivation region 302-2 including layer 310-2, located between neutron generation layer 110 and the underlying substrate 120. FIG. 9B is a cross-sectional view where second passivation region 302-2 also includes layer 410-2 located between layer 310-2 and substrate 120. Second (downstream) passivation region 302-2 can be configured in accordance with any of the embodiments of the first (upstream) passivation region 302 described herein, including all structures, arrangements, materials, material exclusions, and material combinations described herein (e.g., materials exhibiting ambient barrier characteristics, materials exhibiting objective barrier characteristics, molybdenum, tungsten, chromium, the nitrogen containing materials described herein, and the carbon containing materials described herein, etc.). Layer 310-2 can exhibit the objective barrier characteristic similar to certain embodiments of layer 310 already described herein, layer 410-2 can exhibit the ambient barrier characteristic similar to certain embodiments of layer 410 already described herein, one or both of layers 310-2 and 410-2 can exhibit both ambient and objective barrier characteristics as described herein, and the placement of layers 310-2 and 410-2 can be as shown in FIG. 9B or inverted (similar to layers 310 and 410 in FIG. 8).

[0060] FIG. 9C is a cross-sectional view of target 100 similar to the embodiment described with respect to FIG. 7B but having a second passivation region 302-2 along the downstream side of layer 110. Here, layers 110, 310-1 and 410-1 are located on upstream surface 911 of layer 310- 2. Layer 310-2 is located on an upstream surface of layer 410-2 and both are generally planar (e.g., flat and level) layers on substrate 120. FIG. 9D is a perspective view of the embodiment described with respect to FIG. 9C, showing a disc-shaped target 100 with the layers of region 302-2 located on the upstream side of substrate 120. Passivation layer 410-1 is located on the upstream surface of layer 310-2, passivation layer 310-1 is located just beneath layer 410-1, and neutron generation layer 110 is located beneath layer 310-1 and above layer 310-2. Each of layers 410-1, 310-1, and 110 have a generally circular shaped perimeter with progressively decreasing diameter respectively. Layers 310-1 and 110 are shown with dashed lines to indicateDocket No. T0090.0036.WG / / 069415 / 640457 they are obscured from direct view by layer 410-1 . Tn this configuration neutron generation layer 110 is surrounded by and encapsulated within passivation regions 302-1 and 302-2, specifically layers 310-1 and 310-2 thereof. Such an arrangement minimizes contamination risk of the objective material of layer 110, as well as minimizing diffusion of the objective material away from its original position in layer 110. In alternative embodiments, region 302-1 can be one, two, or three or more distinct layers, while in each case region 302-2 can be one, two, or three or more distinct layers, with the two regions 302-1 and 302-2 encapsulating the objective material of layer 110. The layer of the regions in contact with the objective material of layer 110 (e.g., layers 310-1 and 310-2 as shown here), can each have the same or similar material compositions, including any of the materials and material combinations for passivation regions disclosed herein. Such a configuration will allow the layers to more readily adhere wherever contact occurs. Alternatively, the layers immediately adjacent layer 110 can have different materials or material combinations (e.g., layer 310-1 can be predominately molybdenum, tungsten, and / or chromium while layer 310-2 can be predominantly a nitride).

[0061] References to region 302 shall include both instances of region 302-1 and 302-2 unless otherwise noted or logically implausible. Similarly, references to layers 310 and 410 shall include layers 310-1 and 310-2, and layers 410-1 and 410-2, respectively, unless otherwise noted or logically implausible.

[0062] In the embodiments herein where a portion of passivation regions 302-1 and / or 302-2 are in contact with layer 110 as well as a different portion of target 100, then that portion of passivation regions 302-1 and / or 302-2 should adhere and / or cohere with both layer 110 and that different portion of target 100 such that peeling or unsticking does not occur. For example, in the embodiments described with respect to FIGs. 6B and 7A, layer 310 is in contact with both layer 110 and substrate 120, and should demonstrate significant adhesion with both layer 110 and substrate 120 (e.g., if layer 110 is predominantly lithium and substrate 120 is predominately copper, then the material of layer 310 should adhere with both lithium and copper). In the embodiments described with respect to FIGs. 5, 6A, 6C, and 7B, layer 310 is again in contact with both layer 110 and substrate 120, and layer 410 is in contact with substrate 120. Thus, for example, layer 310 should demonstrate significant adhesion with both layer 110 and substrate 120, and layer 410 should demonstrate significant adhesion with layer 310 and substrate 120.Docket No. T0090.0036.WG / / 069415 / 640457Significant adhesion and / or cohesion is demonstrated by maintaining attachment between the materials during fabrication, shipping, and use.

[0063] In the embodiments of FIGs. 3A and 4A-9E, the various layers (e.g., layers 110, 310, 410, and / or 450) are shown with thicknesses that are not to scale in relation to each other and in relation to the thickness of substrate 120, with the emphasis instead placed on the relative position of the layers with respect to each other. Further, to the extent the layers (e.g., layers 110, 310, 410, and / or 450) are shown as having various cross-sectional profiles, such as rectangular side profiles with sharp edges (e.g., FIGs. 3A, 4A, 4B, 6A-6C, 8, 9A-9B), or globular shaped profiles with rounded edges (e.g., FIGs. 5, 7A-7B, 9C and 9D), or definitive linear boundaries between layers, those representations are examples only and can vary according to the needs of the particular application. Each embodiment described herein can be configured with layers having any cross-sectional profile, blended or definitive linear or non-linear boundaries, and / or any combination thereof.

[0064] Among other benefits, the example embodiments described herein can dramatically simplify the transfer of the objective material (e.g., lithium) from a production location (e.g., lab space, dry room, glovebox, or others) to a working environment (e.g., to produce neutrons for BNCT applications). In applications in which the objective material is a plasma-facing component, an upstream (e.g., upstream-most) passivation layer of the passivation region may be configured such that it interacts with the plasma without polluting the plasma. Alternatively, the upper passivation layer can be configured to burn away during an initial plasma interaction or chamber wall conditioning. In such embodiments, the objective material remains exposed to the plasma for interaction purposes, and the one or more passivation layers will have successfully provided a protective coating for transfer of the objective material from a production location to a working environment.

[0065] The passivation regions of embodiments described herein can form a relatively thin passivation covering. The ideal thickness of passivation region 302 is dependent on the particular application, which can vary as set forth herein. For example, in some embodiments the thickness (measured upstream-downstream along the beam axis, see e.g., numeral 303 in FIGs. 3A, 4A, and 4B) of the entire passivation region 302 is 100 microns or less. In some embodiments, the thickness of passivation region 302 is 50 microns or less. In certain applications, like BNCT, even thinner passivation regions 302 are desirable, although not required. For example, theDocket No. T0090.0036.WG / / 069415 / 640457 thickness of passivation region 302 can be 10 microns or less, five (5) microns or less, three (3) microns or less, one (1) micron or less, or 800 nm or less, with the dimensional range being that which most suits the needs of the particular application.

[0066] The thickness of the objective material can be as desired to meet the needs of the application. In BNCT applications, the desired thickness may depend on the incident proton energy, and may, for example, range between 10 microns and 300 microns. In an example embodiment where the energy of the incident proton beam is 1.88 MeV to 3 MeV, thickness of the lithium layer may be 10-200 microns, and in an example embodiment where the energy of the incident proton beam is 2.25 MeV to 2.75 MeV, thickness of the lithium layer may be 40-150 microns. In one example embodiment, a lithium layer has a thickness of between 40-150 microns, with a two-layer passivation region 302 located over it. The downstream layer 310 can be, for example, molybdenum, tungsten, and / or chromium (or the other materials described herein) and the upstream layer 410 can be a nitrogen-containing material like tantalum nitride or the other examples described herein. The thickness of region 302 can vary along with the range of different cross-sectional structures for region 302 described herein. In certain example embodiments, layer 310 has a thickness in the range of 100-600 nanometers (nm), in some of which embodiments layer 310 has a thickness of 200-400 nm. In these and other embodiments, layer 410 can have a thickness in the range of 100-1000 nm, 200-400 nm, 300-500 nm, 400-600 nm, or 500-800 nm.

[0067] In some example embodiments, passivation region 302 (e.g., all or a portion thereof such as layer 310, 410, 450, etc.) can be removed during operation of the system in which it is placed. For example, in BNCT applications, incidence of the particle beam on passivation region 302 can cause region 302 to be removed (e.g., ablated or burned) from target 100 during operation. The removal can be the result of elevation in temperature in region 302 as a result of the highly energetic particle beam. The resulting neutron generation reaction can also facilitate this degradation of region 302. Removal of region 302 can increase the efficiency of neutron generation by the neutron generation layer 110 by reducing the energy loss experienced by incoming particles slowing down through passivation region 302. The particle beam may be moved (e.g., rastered) over the target surface, and all or part of region 302 may be removed over the fractional region of the surface of the target where incidence of the particle beam on theDocket No. T0090.0036.WG / / 069415 / 640457 target is at the relative highest level (e.g., duration) as compared to surrounding regions of the target.

[0068] The embodiments described herein can also find applicability in battery design and manufacturing. The rapidly developing lithium batteries industry suffers from limitations of the sensitivity of lithium to humid atmospheres. The embodiments described herein can be applied where the device being protected or passivated is a metallic lithium anode of a battery. The embodiments can simplify and decrease the cost of fabricating the metallic lithium anode, which is stable in the ambient atmosphere (e.g., air) and dendrite free.

[0069] For all embodiments of passivation region 302 (whether located upstream to the objective material, downstream to the objective material, or both) disclosed herein, the recitation of a material (e.g., an element, a combination of elements, a compound, a combination of compounds) is intended to convey possession of any and all embodiments where such material is eligible for inclusion within the passivation region 302 and any and all embodiments where such material affirmatively excluded (i.e., absence from) from the passivation region 302. As such claim language having a negative limitation excluding any material from those eligible materials recited herein is expressly within the scope of this disclosure and possession of the inventors hereof.

[0070] Various aspects of the present subject matter are set forth below, in review of, and / or in supplementation to, the embodiments described thus far, with the emphasis here being on the interrelation and interchangeability of the following embodiments. In other words, an emphasis is on the fact that each feature of the embodiments can be combined with each and every other feature unless explicitly stated otherwise or logically implausible.

[0071] In various embodiments, a neutron generation target includes a neutron generation target, including: a substrate; a neutron generation region positioned over the substrate; and a passivation region positioned over the neutron generation region, where the neutron generation region includes an objective material configured to generate neutrons and the passivation region is configured to seal against diffusion of the objective material into the passivation region, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and chromium, and where the passivation region includes a second material including nitrogen.Docket No. T0090.0036.WG / / 069415 / 640457

[0072] In some embodiments, the passivation region has a coefficient of diffusion for the objective material of l x 10 -13 square centimeters per second (cm2 / s) or less.

[0073] In some embodiments, the passivation region has a coefficient of diffusion for the objective material that is 1 x 10 -14 cm2 / s or less.

[0074] In some embodiments, the passivation region has a coefficient of diffusion for the objective material that is 1 x 10 -15 cm2 / s or less.

[0075] In some embodiments, the objective material is lithium, and the passivation region has a coefficient of diffusion for lithium that is 5 x 10-14 cm2 / s or less.

[0076] In some embodiments, the objective material is lithium, and the passivation region has a coefficient of diffusion for lithium that is 5 x 10-15 cm2 / s or less.

[0077] In some embodiments, the passivation region includes tantalum nitride.

[0078] In some embodiments, the passivation region includes at least one of a chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

[0079] In some embodiments, the passivation region includes lithium, and does not include lithium fluoride, lithium sulfide, lithium nitride, lithium oxide, nor lithium hydroxide.

[0080] In some embodiments, the passivation region includes a layer in contact with the objective material, and the layer does not include aluminum nor beryllium.

[0081] In some embodiments, the passivation region has a thickness of 10 microns or less.

[0082] In some embodiments, the passivation region has a thickness of three microns or less.

[0083] In some embodiments, the target is configured for use in a boron neutron capture therapy (BNCT) procedure.

[0084] In some embodiments, the target is configured to generate neutrons when exposed to a proton beam having an energy between 1.88 and 3.0 mega-electron volts (MeV).

[0085] In some embodiments, the passivation region is configured to be removed during operation.Docket No. T0090.0036.WG / / 069415 / 640457

[0086] In some embodiments, the objective material includes lithium.

[0087] In some embodiments, the passivation region does not include a eutectic combination of the objective material and another material.

[0088] In many embodiments, a neutron generation target is provided that includes: a substrate; a neutron generation region positioned over the substrate and including an objective material configured to generate neutrons; and a passivation region positioned over the neutron generation region and including a first layer and a second layer, where the first layer is between the second layer and the neutron generation region, where the first layer is configured to seal against diffusion of the objective material into the passivation region and includes molybdenum, tungsten, or chromium.

[0089] In some embodiments, the first layer has a coefficient of diffusion for the objective material of 1 x 10 -13 square centimeters per second (cm2 / s) or less.

[0090] In some embodiments, the first layer has a coefficient of diffusion for the objective material that is 1 x 10 -14 cm2 / s or less.

[0091] In some embodiments, the first layer has a coefficient of diffusion for the objective material that is 1 x 10 -15 cm2 / s or less.

[0092] In some embodiments, the objective material is lithium, and the first layer has a coefficient of diffusion for lithium that is 5 x 10-14 cm2 / s or less.

[0093] In some embodiments, the objective material is lithium, and the first layer has a coefficient of diffusion for lithium that is 5 x 10-15 cm2 / s or less.

[0094] In some embodiments, the first layer includes a compound or mixture of molybdenum and tungsten.

[0095] In some embodiments, the first layer includes a compound or mixture of molybdenum and chromium.

[0096] In some embodiments, the first layer includes a compound or mixture of chromium and tungsten.

[0097] In some embodiments, the first layer does not include aluminum nor beryllium.

[0098] In some embodiments, the second layer is configured to seal against the diffusion of an ambient substance into the passivation region.

[0099] In some embodiments, the second layer is configured to seal against the diffusion of a substance from the atmosphere into the passivation region.Docket No. T0090.0036.WG / / 069415 / 640457

[0100] In some embodiments, the second layer is configured to seal against the diffusion of oxygen, nitrogen, and water into the passivation region.

[0101] In some embodiments, the second layer is configured to seal against the diffusion of an ambient substance through the second layer of the passivation region and into contact with the first layer.

[0102] In some embodiments, the second layer includes nitrogen.

[0103] In some embodiments, the second layer has a gas permeability for oxygen, nitrogen, and carbon dioxide that is 100 or less, measured in (cubic centimeters x millimeters) / (square meters x day x atmosphere).

[0104] In some embodiments, the second layer has a gas permeability for oxygen, nitrogen, and carbon dioxide that is 3.1 or less, measured in (cubic centimeters x millimeters) / (square meters x day x atmosphere).

[0105] In some embodiments, the second layer has a water vapor transmission rate (WTVR) that is 0.6 or less, measured in (grams x millimeters) / (square meters x day).

[0106] In some embodiments, the second layer includes a nitride.

[0107] In some embodiments, the second layer is in contact with the first layer.

[0108] In some embodiments, the passivation region includes an intermediate layer between the second layer and the first layer.

[0109] In some embodiments, the passivation region has a thickness of 10 microns or less.

[0110] In some embodiments, the passivation region has a thickness of three microns or less.

[0111] In some embodiments, the target is configured for use in a boron neutron capture therapy (BNCT) procedure.

[0112] In some embodiments, the target is configured to generate neutrons when exposed to a proton beam having an energy between 1.88 and 3.0 mega-electron volts (MeV).

[0113] In some embodiments, at least a portion of the passivation region is configured to be removed during operation.

[0114] In some embodiments, the objective material includes lithium.

[0115] In many embodiments, a method of manufacturing a target for boron neutron capture therapy is provided, the method including: applying a neutron generation region to a substrate; and applying a passivation region over the neutron generation region, where the neutron generation region includes an objective material configured to generate neutrons and theDocket No. T0090.0036.WG / / 069415 / 640457 passivation region is configured to seal against the diffusion of the objective material into the passivation region, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and chromium, and where the passivation region includes a second material including nitrogen.

[0116] In some embodiments, a first layer of the passivation region is configured to seal against the diffusion of the objective material into the passivation region.

[0117] In some embodiments, the method further includes applying a second layer of the passivation region over the first layer.

[0118] In some embodiments, the second layer is in contact with the first layer and / or the first layer is in contact with the neutron generation region.

[0119] In many embodiments, a method of producing neutrons is provided, the method including: applying a particle beam to a target such that particles from the particle beam traverse a passivation region and generate neutrons upon impacting a neutron generation region of the target, where the passivation region is configured to seal against diffusion of a material of the neutron generation region into the passivation region, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and chromium, and the passivation region includes a second material including nitrogen; and continuing application of the particle beam to the target such that at least a portion of the passivation region is removed.

[0120] In some embodiments, the passivation region includes a first layer and a second layer, and where at least a portion of both the first layer and the second layer are removed by continued application of the particle beam in a region of the target.

[0121] In some embodiments, the method is performed as part of a boron neutron capture therapy (BNCT) procedure.

[0122] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including lithium; and a passivation region positioned over the first region, where the passivation region includes nitrogen.

[0123] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including lithium; and a passivation region positioned over the first region, where the passivation region includes molybdenum, tungsten, or chromium.

[0124] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material; and a passivation regionDocket No. T0090.0036.WG / / 069415 / 640457 positioned over the first region and including a first layer and a second layer, where the first layer includes a first material that includes at least one of molybdenum, tungsten, and chromium, and where the second layer includes a second material including nitrogen.

[0125] In some embodiments, the first layer is positioned between the second layer and the first region.

[0126] In some embodiments, the second layer is positioned between the first layer and the first region.

[0127] In some embodiments, the second material includes a nitride.

[0128] In some embodiments, the second material includes at least one of a tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

[0129] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material, where the objective material is configured to generate neutrons; and a layer positioned between the first region and the substrate, where the layer includes nitrogen.

[0130] In some embodiments, the layer includes a nitride.

[0131] In some embodiments, the layer includes at least one of a tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

[0132] In some embodiments, the objective material is lithium or beryllium.Docket No. T0090.0036.WG / / 069415 / 640457

[0133] In some embodiments, the device is configured as a neutron generation target for a boron neutron capture therapy system.

[0134] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material, where the objective material is configured to generate neutrons; and a layer positioned between the first region and the substrate, where the layer includes at least one of molybdenum, tungsten, or chromium.

[0135] In some embodiments, the objective material is lithium or beryllium.

[0136] In some embodiments, the device is configured as a neutron generation target for a boron neutron capture therapy system.

[0137] In many embodiments, a neutron beam system is provided that includes: an accelerator; a beamline extending from the accelerator to a neutron generation target configured in accordance with any of the embodiments described herein.

[0138] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including lithium; and a passivation region positioned over the first region, where the passivation region includes carbon.

[0139] In some embodiments, the passivation region includes a carbide.

[0140] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material; and a passivation region positioned over the first region and including a first layer and a second layer, where the first layer includes a first material that includes at least one of molybdenum, tungsten, and chromium, and where the second layer includes a second material including carbon.

[0141] In some embodiments, the first layer is between the second layer and the first region.

[0142] In some embodiments, the second layer is between the first layer and the first region.

[0143] In some embodiments, the second material includes a carbide.

[0144] In some embodiments, the second material includes at least one of a binary carbide, an interstitial carbide, a cemented carbide, a transition metal carbide, or a covalent carbide.

[0145] In some embodiments, the second material includes at least one of diamond-like carbon, (ultra)nanocrystalline diamond, silicon carbide, boron carbide, tungsten carbide, titanium carbide, tungsten titanium carbide, vanadium carbide, or niobium carbide.

[0146] In many embodiments, a neutron generation target is provided that includes: a substrate; a neutron generation region positioned over the substrate; and a passivation regionDocket No. T0090.0036.WG / / 069415 / 640457 positioned over the neutron generation region, where the neutron generation region includes an objective material configured to generate neutrons and the passivation region is configured to seal against diffusion of the objective material into the passivation region, where the passivation region is adhered to both the substrate and the neutron generation region.

[0147] In some embodiments, the passivation region includes a first layer and a second layer, where the first layer is adhered to both the neutron generation region and the substrate, where the second layer is adhered to the substrate, and where the first layer and second layer are adhered together.

[0148] In some embodiments, the passivation region includes at least one of nitrogen, carbon, molybdenum, tungsten, and chromium.

[0149] In many embodiments, a neutron generation target is provided that includes: a substrate; a neutron generation region positioned over the substrate; and a passivation region positioned over the neutron generation region, where the neutron generation region includes an objective material configured to generate neutrons and the passivation region is configured to seal against diffusion of the objective material into the passivation region, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and vanadium, and where the passivation region includes a second material including nitrogen.

[0150] In some embodiments, the passivation region has a coefficient of diffusion for the objective material of l x 10 -13 square centimeters per second (cm2 / s) or less.

[0151] In some embodiments, the passivation region has a coefficient of diffusion for the objective material that is 1 x 10 -14 cm2 / s or less.

[0152] In some embodiments, the passivation region has a coefficient of diffusion for the objective material that is 1 x 10 -15 cm2 / s or less.

[0153] In some embodiments, the objective material is lithium, and the passivation region has a coefficient of diffusion for lithium that is 5 x 10-14 cm2 / s or less.

[0154] In some embodiments, the objective material is lithium, and the passivation region has a coefficient of diffusion for lithium that is 5 x 10-15 cm2 / s or less.

[0155] In some embodiments, the passivation region includes tantalum nitride.

[0156] In some embodiments, the passivation region includes at least one of a chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadiumDocket No. T0090.0036.WG / / 069415 / 640457 nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

[0157] In some embodiments, the passivation region includes lithium, and does not include lithium fluoride, lithium sulfide, lithium nitride, lithium oxide, nor lithium hydroxide.

[0158] In some embodiments, the passivation region includes a layer in contact with the objective material, and the layer does not include aluminum nor beryllium.

[0159] In some embodiments, the passivation region has a thickness of 10 microns or less.

[0160] In some embodiments, the passivation region has a thickness of three microns or less.

[0161] In some embodiments, the target is configured for use in a boron neutron capture therapy (BNCT) procedure.

[0162] In some embodiments, the target is configured to generate neutrons when exposed to a proton beam having an energy between 1.88 and 3.0 mega-electron volts (MeV).

[0163] In some embodiments, the passivation region is configured to be removed during operation.

[0164] In some embodiments, the objective material includes lithium.

[0165] In some embodiments, the passivation region does not include a eutectic combination of the objective material and another material.

[0166] In many embodiments, a neutron generation target is provided that includes: a substrate; a neutron generation region positioned over the substrate and including an objective material configured to generate neutrons; and a passivation region positioned over the neutron generation region and including a downstream layer and an upstream layer, where the downstream layer is configured to seal against diffusion of the objective material into the passivation region and includes molybdenum, tungsten, or vanadium.

[0167] In some embodiments, the downstream layer has a coefficient of diffusion for the objective material of 1 x 10 -13 square centimeters per second (cm2 / s) or less.

[0168] In some embodiments, the downstream layer has a coefficient of diffusion for the objective material that is 1 x 10 -14 cm2 / s or less.Docket No. T0090.0036.WG / / 069415 / 640457

[0169] In some embodiments, the downstream layer has a coefficient of diffusion for the objective material that is 1 x 10 -15 cm2 / s or less.

[0170] In some embodiments, the objective material is lithium, and the downstream layer has a coefficient of diffusion for lithium that is 5 x 10-14 cm2 / s or less.

[0171] In some embodiments, the objective material is lithium, and the downstream layer has a coefficient of diffusion for lithium that is 5 x 10-15 cm2 / s or less.

[0172] In some embodiments, the downstream layer includes a compound or mixture of molybdenum and tungsten.

[0173] In some embodiments, the downstream layer includes a compound or mixture of molybdenum and vanadium.

[0174] In some embodiments, the downstream layer includes a compound or mixture of vanadium and tungsten.

[0175] In some embodiments, the downstream layer does not include aluminum nor beryllium.

[0176] In some embodiments, the upstream layer is configured to seal against the diffusion of an ambient substance into the passivation region.

[0177] In some embodiments, the upstream layer is configured to seal against the diffusion of a substance from the atmosphere into the passivation region.

[0178] In some embodiments, the upstream layer is configured to seal against the diffusion of oxygen, nitrogen, and water into the passivation region.

[0179] In some embodiments, the upstream layer is configured to seal against the diffusion of an ambient substance through the upstream layer of the passivation region and into contact with the downstream layer.

[0180] In some embodiments, the upstream layer includes nitrogen.

[0181] In some embodiments, the upstream layer has a gas permeability for oxygen, nitrogen, and carbon dioxide that is 100 or less, measured in (cubic centimeters x millimeters) / (square meters x day x atmosphere).

[0182] In some embodiments, the upstream layer has a gas permeability for oxygen, nitrogen, and carbon dioxide that is 3.1 or less, measured in (cubic centimeters x millimeters) / (square meters x day x atmosphere).

[0183] In some embodiments, the upstream layer has a water vapor transmission rate (WTVR) that is 0.6 or less, measured in (grams x millimeters) / (square meters x day).Docket No. T0090.0036.WG / / 069415 / 640457

[0184] In some embodiments, the upstream layer includes a nitride.

[0185] In some embodiments, the upstream layer is in contact with the downstream layer.

[0186] In some embodiments, the passivation region includes an intermediate layer between the upstream layer and the downstream layer.

[0187] In some embodiments, the passivation region has a thickness of 10 microns or less.

[0188] In some embodiments, the passivation region has a thickness of three microns or less.

[0189] In some embodiments, the target is configured for use in a boron neutron capture therapy (BNCT) procedure.

[0190] In some embodiments, the target is configured to generate neutrons when exposed to a proton beam having an energy between 1.88 and 3.0 mega-electron volts (MeV).

[0191] In some embodiments, at least a portion of the passivation region is configured to be removed during operation.

[0192] In some embodiments, the objective material includes lithium.

[0193] In many embodiments, a method of manufacturing a target for boron neutron capture therapy is provided, the method including: applying a neutron generation region to a substrate; and applying a passivation region over the neutron generation region, where the neutron generation region includes an objective material configured to generate neutrons and the passivation region is configured to seal against the diffusion of the objective material into the passivation region, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and vanadium, and where the passivation region includes a second material including nitrogen.

[0194] In some embodiments, a downstream layer of the passivation region is configured to seal against the diffusion of the objective material into the passivation region.

[0195] In some embodiments, the method further includes applying an upstream layer of the passivation region over the downstream layer.

[0196] In some embodiments, the upstream layer is in contact with the downstream layer and / or the downstream layer is in contact with the neutron generation region.

[0197] In many embodiments, a method of producing neutrons is provided that includes: applying a particle beam to a target such that particles from the particle beam traverse a passivation region and generate neutrons upon impacting a neutron generation region of the target, where the passivation region is configured to seal against diffusion of a material of theDocket No. T0090.0036.WG / / 069415 / 640457 neutron generation region into the passivation region, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and vanadium, and the passivation region includes a second material including nitrogen; and continuing application of the particle beam to the target such that at least a portion of the passivation region is removed.

[0198] In some embodiments, the target is configured in accordance with any of the embodiments described herein.

[0199] In some embodiments, the passivation region includes an upstream layer and a downstream layer, and where both the upstream layer and the downstream layer are removed by continued application of the particle beam in a region of the target.

[0200] In some embodiments, the method is performed as part of a boron neutron capture therapy (BNCT) procedure.

[0201] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including lithium; and a passivation region positioned over the first region, where the passivation region includes nitrogen.

[0202] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including lithium; and a passivation region positioned over the first region, where the passivation region includes molybdenum, tungsten, or vanadium.

[0203] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material; and a passivation region positioned over the first region and including a downstream layer and an upstream layer, where the passivation region includes a first material that includes at least one of molybdenum, tungsten, and vanadium, and where the passivation region includes a second material including nitrogen.

[0204] In some embodiments, the upstream layer includes the first material and the downstream layer includes the second material.

[0205] In some embodiments, the downstream layer includes the first material and the upstream layer includes the second material.

[0206] In some embodiments, the second material includes a nitride.

[0207] In some embodiments, the second material includes at least one of a tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadiumDocket No. T0090.0036.WG / / 069415 / 640457 nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

[0208] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material; and a layer positioned between the first region and the substrate, where the layer includes nitrogen.

[0209] In some embodiments, the layer includes a nitride.

[0210] In some embodiments, the layer includes at least one of a tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

[0211] In some embodiments, the objective material is lithium or beryllium.

[0212] In some embodiments, the target is configured as a neutron generation target for a boron neutron capture therapy system.

[0213] In many embodiments, a device is provided that includes: a substrate; a first region positioned over the substrate and including an objective material; and a layer positioned between the first region and the substrate, where the layer includes at least one of molybdenum, tungsten, or vanadium.

[0214] In some embodiments, the objective material is lithium or beryllium.

[0215] In some embodiments, the device is configured as a neutron generation target for a boron neutron capture therapy system.

[0216] In many embodiments, a neutron beam system is provided that includes: an accelerator; a beamline extending from the accelerator to a neutron generation target configured in accordance with any of the embodiments described herein.Docket No. T0090.0036.WG / / 069415 / 640457

[0217] It should be noted that all features, elements, components, functions, and steps described with respect to any embodiment provided herein are intended to be freely combinable and substitutable with those from any other embodiment. If a certain feature, element, component, function, or step is described with respect to only one embodiment, then it should be understood that that feature, element, component, function, or step can be used with every other embodiment described herein unless explicitly stated otherwise. This paragraph therefore serves as antecedent basis and written support for the introduction of claims, at any time, that combine features, elements, components, functions, and steps from different embodiments, or that substitute features, elements, components, functions, and steps from one embodiment with those of another, even if the following description does not explicitly state, in a particular instance, that such combinations or substitutions are possible. It is explicitly acknowledged that express recitation of every possible combination and substitution is overly burdensome, especially given that the permissibility of each and every such combination and substitution will be readily recognized by those of ordinary skill in the art.

[0218] As used herein and in the appended claims, the singular forms “a,” “an,” and “the” include plural referents unless the context clearly dictates otherwise.

[0219] While the embodiments are susceptible to various modifications and alternative forms, specific examples thereof have been shown in the drawings and are herein described in detail. It should be understood, however, that these embodiments are not to be limited to the particular form disclosed, but to the contrary, these embodiments are to cover all modifications, equivalents, and alternatives falling within the spirit of the disclosure. Furthermore, any features, functions, steps, or elements of the embodiments may be recited in or added to the claims, as well as negative limitations that define the inventive scope of the claims by features, functions, steps, or elements that are not within that scope.

Claims

Docket No. T0090.0036.WG / / 069415 / 640457CLAIMSWhat is claimed is:

1. A neutron generation target, comprising: a substrate; a neutron generation region positioned over the substrate; and a passivation region positioned over the neutron generation region, wherein the neutron generation region comprises an objective material configured to generate neutrons and the passivation region is configured to seal against diffusion of the objective material into the passivation region, wherein the passivation region comprises a first material that comprises at least one of molybdenum, tungsten, and chromium, and wherein the passivation region comprises a second material comprising nitrogen.

2. The target of claim 1, wherein the passivation region has a coefficient of diffusion for the objective material of 1 x 10 '13square centimeters per second (cm2 / s) or less.

3. The target of claim 1, wherein the passivation region has a coefficient of diffusion for the objective material that is 1 x 10 '14cm2 / s or less.

4. The target of claim 1, wherein the passivation region has a coefficient of diffusion for the objective material that is 1 x 1015cm2 / s or less.

5. The target of claim 1, wherein the objective material is lithium, and wherein the passivation region has a coefficient of diffusion for lithium that is 5 x 10’14cm2 / s or less.

6. The target of claim 1, wherein the objective material is lithium, and wherein the passivation region has a coefficient of diffusion for lithium that is 5 x 10’15cm2 / s or less.

7. The target of any of claims 1-6, wherein the passivation region comprises tantalum nitride.Docket No. T0090.0036.WG / / 069415 / 6404578. The target of any of claims 1 -6, wherein the passivation region comprises at least one of a chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

9. The target of any of claims 1-6, wherein the passivation region comprises lithium, and does not comprise lithium fluoride, lithium sulfide, lithium nitride, lithium oxide, nor lithium hydroxide.

10. The target of any of claims 1-6, wherein the passivation region comprises a layer in contact with the objective material, and the layer does not comprise aluminum nor beryllium.

11. The target of any of claims 1-10, wherein the passivation region has a thickness of 10 microns or less.

12. The target of any of claims 1-10, wherein the passivation region has a thickness of three microns or less.

13. The target of any of claims 1-12, configured for use in a boron neutron capture therapy (BNCT) procedure.

14. The target of claim 13, configured to generate neutrons when exposed to a proton beam having an energy between 1.88 and 3.0 mega-electron volts (MeV).

15. The target of any of claims 1-14, wherein the passivation region is configured to be removed during operation.Docket No. T0090.0036.WG / / 069415 / 64045716. The target of any of claims 1 -15, wherein the objective material comprises lithium.

17. The target of any of claims 1-16 wherein the passivation region does not comprise a eutectic combination of the objective material and another material.

18. A neutron generation target, comprising: a substrate; a neutron generation region positioned over the substrate and comprising an objective material configured to generate neutrons; and a passivation region positioned over the neutron generation region and comprising a first layer and a second layer, wherein the first layer is between the second layer and the neutron generation region, wherein the first layer is configured to seal against diffusion of the objective material into the passivation region and comprises molybdenum, tungsten, or chromium.

19. The target of claim 18, wherein the first layer has a coefficient of diffusion for the objective material of 1 x 10 "13square centimeters per second (cm2 / s) or less.

20. The target of claim 18, wherein the first layer has a coefficient of diffusion for the objective material that is 1 x 10 "14cm2 / s or less.

21. The target of claim 18, wherein the first layer has a coefficient of diffusion for the objective material that is 1 x 10 "15cm2 / s or less.

22. The target of claim 18, wherein the objective material is lithium, and wherein the first layer has a coefficient of diffusion for lithium that is 5 x 10'14cm2 / s or less.

23. The target of claim 18, wherein the objective material is lithium, and wherein the first layer has a coefficient of diffusion for lithium that is 5 x 10'15cm2 / s or less.Docket No. T0090.0036.WG / / 069415 / 64045724. The target of any of claims 18-23, wherein the first layer comprises a compound or mixture of molybdenum and tungsten.

25. The target of any of claims 18-23, wherein the first layer comprises a compound or mixture of molybdenum and chromium.

26. The target of any of claims 18-23, wherein the first layer comprises a compound or mixture of chromium and tungsten.

27. The target of any of claims 18-23, wherein the first layer does not comprise aluminum nor beryllium.

28. The target of any of claims 18-27, wherein the second layer is configured to seal against the diffusion of an ambient substance into the passivation region.

29. The target of any of claims 18-27, wherein the second layer is configured to seal against the diffusion of a substance from the atmosphere into the passivation region.

30. The target of any of claims 18-27, wherein the second layer is configured to seal against the diffusion of oxygen, nitrogen, and water into the passivation region.

31. The target of any of claims 18-27, wherein the second layer is configured to seal against the diffusion of an ambient substance through the second layer of the passivation region and into contact with the first layer.

32. The target of any of claims 18-31, wherein the second layer comprises nitrogen.

33. The target of any of claims 18-32, wherein the second layer has a gas permeability for oxygen, nitrogen, and carbon dioxide that is 100 or less, measured in (cubic centimeters x millimeters) / (square meters x day x atmosphere).Docket No. T0090.0036.WG / / 069415 / 64045734. The target of any of claims 18-32, wherein the second layer has a gas permeability for oxygen, nitrogen, and carbon dioxide that is 3.1 or less, measured in (cubic centimeters x millimeters) / (square meters x day x atmosphere).

35. The target of any of claims 18-34, wherein the second layer has a water vapor transmission rate (WTVR) that is 0.6 or less, measured in (grams x millimeters) / (square meters x day).

36. The target of any of claims 18-34, wherein the second layer comprises a nitride.

37. The target of any of claims 18-36, wherein the second layer is in contact with the first layer.

38. The target of any of claims 18-36, wherein the passivation region comprises an intermediate layer between the second layer and the first layer.

39. The target of any of claims 18-38, wherein the passivation region has a thickness of 10 microns or less.

40. The target of any of claims 18-38, wherein the passivation region has a thickness of three microns or less.

41. The target of any of claims 18-40, configured for use in a boron neutron capture therapy (BNCT) procedure.

42. The target of claim 41, configured to generate neutrons when exposed to a proton beam having an energy between 1.88 and 3.0 mega-electron volts (MeV).

43. The target of any of claims 18-41, wherein at least a portion of the passivation region is configured to be removed during operation.Docket No. T0090.0036.WG / / 069415 / 64045744. The target of any of claims 18-43, wherein the objective material comprises lithium.

45. A method of manufacturing a target for boron neutron capture therapy, comprising: applying a neutron generation region to a substrate; and applying a passivation region over the neutron generation region, wherein the neutron generation region comprises an objective material configured to generate neutrons and the passivation region is configured to seal against the diffusion of the objective material into the passivation region, wherein the passivation region comprises a first material that comprises at least one of molybdenum, tungsten, and chromium, and wherein the passivation region comprises a second material comprising nitrogen.

46. The method of claim 45, wherein a first layer of the passivation region is configured to seal against the diffusion of the objective material into the passivation region.

47. The method of claim 46, further comprising applying a second layer of the passivation region over the first layer.

48. The method of claim 47, wherein the second layer is in contact with the first layer and / or the first layer is in contact with the neutron generation region.

49. The method of claim 48, wherein the neutron generation region and passivation region are configured in accordance with any of claims 18-44.

50. The method of claim 48, wherein the neutron generation region and passivation region are configured in accordance with any of claims 1-17.

51. A method of producing neutrons, comprising:Docket No. T0090.0036.WG / / 069415 / 640457 applying a particle beam to a target such that particles from the particle beam traverse a passivation region and generate neutrons upon impacting a neutron generation region of the target, wherein the passivation region is configured to seal against diffusion of a material of the neutron generation region into the passivation region, wherein the passivation region comprises a first material that comprises at least one of molybdenum, tungsten, and chromium, and the passivation region comprises a second material comprising nitrogen; and continuing application of the particle beam to the target such that at least a portion of the passivation region is removed.

52. The method of claim 51, wherein the target is configured in accordance with claims 1-44.

53. The method of claim 51, wherein the passivation region comprises a first layer and a second layer, and wherein at least a portion of both the first layer and the second layer are removed by continued application of the particle beam in a region of the target.

54. The method of any of claims 51-53, performed as part of a boron neutron capture therapy (BNCT) procedure.

55. A device, comprising: a substrate; a first region positioned over the substrate and comprising lithium; and a passivation region positioned over the first region, wherein the passivation region comprises nitrogen.

56. A device, comprising: a substrate; a first region positioned over the substrate and comprising lithium; and a passivation region positioned over the first region, wherein the passivation region comprises molybdenum, tungsten, or chromium.Docket No. T0090.0036.WG / / 069415 / 64045757. A device, comprising: a substrate; a first region positioned over the substrate and comprising an objective material; and a passivation region positioned over the first region and comprising a first layer and a second layer, wherein the first layer comprises a first material that comprises at least one of molybdenum, tungsten, and chromium, and wherein the second layer comprises a second material comprising nitrogen.

58. The device of claim 57, wherein the first layer is positioned between the second layer and the first region.

59. The device of claim 57, wherein the second layer is positioned between the first layer and the first region. .

60. The device of any of claims 57-59, wherein the second material comprises a nitride.

61. The device of any of claims 57-59, wherein the second material comprises at least one of a tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

62. A device, comprising: a substrate; a first region positioned over the substrate and comprising an objective material, wherein the objective material is configured to generate neutrons; andDocket No. T0090.0036.WG / / 069415 / 640457 a layer positioned between the first region and the substrate, wherein the layer comprises nitrogen.

63. The device of claim 62, wherein the layer comprises a nitride.

64. The device of claim 62, wherein the layer comprises at least one of a tantalum nitride, chromium nitride, gallium nitride, aluminum nitride, indium nitride, boron nitride, silicon nitride, germanium nitride, zinc nitride, iron nitride, molybdenum nitride, tungsten nitride, vanadium nitride, zirconium nitride, titanium nitride, scandium nitride, yttrium nitride, beryllium nitride, magnesium nitride, calcium nitride, strontium nitride, barium nitride, lanthanum nitride, cerium nitride, praseodymium nitride, neodymium nitride, promethium nitride, samarium nitride, europium nitride, gadolinium nitride, terbium nitride, dysprosium nitride, holmium nitride, erbium nitride, thulium nitride, ytterbium nitride, and lutetium nitride.

65. The device of any of claims 62-64, wherein the objective material is lithium or beryllium.

66. The device of claim 65, configured as a neutron generation target for a boron neutron capture therapy system.

67. A device, comprising: a substrate; a first region positioned over the substrate and comprising an objective material, wherein the objective material is configured to generate neutrons; and a layer positioned between the first region and the substrate, wherein the layer comprises at least one of molybdenum, tungsten, or chromium.

68. The device of claim 67, wherein the objective material is lithium or beryllium.

69. The device of claim 68, configured as a neutron generation target for a boron neutron capture therapy system.Docket No. T0090.0036.WG / / 069415 / 64045770. A neutron beam system, comprising: an accelerator; a beamline extending from the accelerator to a neutron generation target configured in accordance with any of claims 1-44.

71. A device, comprising: a substrate; a first region positioned over the substrate and comprising lithium; and a passivation region positioned over the first region, wherein the passivation region comprises carbon.

72. The device of claim 71, wherein the passivation region comprises a carbide.

73. A device, comprising: a substrate; a first region positioned over the substrate and comprising an objective material; and a passivation region positioned over the first region and comprising a first layer and a second layer, wherein the first layer comprises a first material that comprises at least one of molybdenum, tungsten, and chromium, and wherein the second layer comprises a second material comprising carbon.

74. The device of claim 72, wherein the first layer is between the second layer and the first region.

75. The device of claim 72, wherein the second layer is between the first layer and the first region.

76. The device of any of claims 73-75, wherein the second material comprises a carbide.Docket No. T0090.0036.WG / / 069415 / 64045777. The device of any of claims 73-75, wherein the second material comprises at least one of a binary carbide, an interstitial carbide, a cemented carbide, a transition metal carbide, or a covalent carbide.

78. The device of any of claims 73-75, wherein the second material comprises at least one of diamond-like carbon, (ultra)nanocrystalline diamond, silicon carbide, boron carbide, tungsten carbide, titanium carbide, tungsten titanium carbide, vanadium carbide, or niobium carbide.

79. A neutron generation target, comprising: a substrate; a neutron generation region positioned over the substrate; and a passivation region positioned over the neutron generation region, wherein the neutron generation region comprises an objective material configured to generate neutrons and the passivation region is configured to seal against diffusion of the objective material into the passivation region, wherein the passivation region is adhered to both the substrate and the neutron generation region.

80. The target of claim 79, where the passivation region comprises a first layer and a second layer, wherein the first layer is adhered to both the neutron generation region and the substrate, wherein the second layer is adhered to the substrate, and wherein the first layer and second layer are adhered together.

81. The target of claim 79, wherein the passivation region comprises at least one of nitrogen, carbon, molybdenum, tungsten, and chromium.

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