Method for preparing double-layer rectangular hole micro-nano structure generating asymmetric transmission
A technology of asymmetric transmission and micro-nano structure, which is applied in the field of preparation of double-layer rectangular hole micro-nano structure, can solve the problems of difficult calibration of rectangular holes, and achieve the effect of reducing experimental costs, low requirements for operators, and reducing costs
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2018-11-13
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of micro-nano optics, and in particular relates to a method for preparing a double-layer rectangular hole micro-nano structure that produces asymmetric transmission. Background technique
[0002] Natural chiral molecules are widely used in the field of biomedicine, but the signal of natural chiral molecules is very weak, which has caused great obstacles to the further research and utilization of natural chiral molecules. At present, the detection of natural chiral molecules is mainly through the asymmetric transmission (Asymmetric Transmission, AT) signal of the molecule. However, due to the weak chirality of natural chiral molecules, the asymmetric transmission signal is also very weak. Detection is difficult. The current solution is mainly to increase the chiral signal by combining artificial metal micro-nanostructures with strong asymmetric transport effects and natural chiral molecules.
[0003] Artifi...
Examples
Embodiment 1
[0033] The embodiment of the present application discloses a preparation method of a double-layered rectangular hole micro-nano structure that produces asymmetric transmission, including the following steps: designing graphics, preparing a substrate, nickel plating, gold plating, dielectric layer plating, gold plating and bombardment.
[0034] Specifically: step 1, design graphics: use a graphics generator to design double-layer rectangular hole micro-nano structure graphics; the rectangular hole is an oblique rectangular hole, and the angle between the long side of the rectangular hole and a side on the same side of the glass substrate 1 is 22.5° .
[0035] Step 2, prepare the substrate: prepare the ITO glass substrate 1 and wash and dry it;
[0036] The specific operation is: prepare an ITO glass with a size of 20.0mm long × 20.0mm wide × 2.0mm thick, put the prepared ITO glass into the washing solution for cleaning, and then use deionized water, acetone and absolute alcohol...