Method for preparing double-layer rectangular hole micro-nano structure generating asymmetric transmission
A technology of asymmetric transmission and micro-nano structure, which is applied in the field of preparation of double-layer rectangular hole micro-nano structure, can solve the problems of difficult calibration of rectangular holes, and achieve the effect of reducing experimental costs, low requirements for operators, and reducing costs
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[0033] The embodiment of the present application discloses a preparation method of a double-layered rectangular hole micro-nano structure that produces asymmetric transmission, including the following steps: designing graphics, preparing a substrate, nickel plating, gold plating, dielectric layer plating, gold plating and bombardment.
[0034] Specifically: step 1, design graphics: use a graphics generator to design double-layer rectangular hole micro-nano structure graphics; the rectangular hole is an oblique rectangular hole, and the angle between the long side of the rectangular hole and a side on the same side of the glass substrate 1 is 22.5° .
[0035] Step 2, prepare the substrate: prepare the ITO glass substrate 1 and wash and dry it;
[0036] The specific operation is: prepare an ITO glass with a size of 20.0mm long × 20.0mm wide × 2.0mm thick, put the prepared ITO glass into the washing solution for cleaning, and then use deionized water, acetone and absolute alcohol...
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