Substrate rotating frame structure for sensor ion beam sputter coating equipment

Abstract

The invention relates to the technical field of ion beam sputter coating, in particular to a substrate rotating frame structure for sensor ion beam sputter coating equipment, which comprises a rotating rod, a mounting disc is fixedly mounted at the upper end of the rotating rod, and a plurality of rotating shafts are vertically and rotatably mounted on the mounting disc. Cross-shaped supporting plates are fixedly mounted at the lower ends of the multiple rotating shafts, sensor substrates are mounted on the cross-shaped supporting plates, rotating columns are fixedly mounted at the upper ends of the rotating shafts, spiral grooves are formed in the side faces of the rotating columns, and an electric control air cylinder is fixedly mounted on the mounting disc through a support. A plurality of transmission rods are installed on an output shaft of the electric control air cylinder through a lifting disc. Through mutual cooperation of the electric control air cylinder, the lifting disc, the transmission rod, the rotating column, the spiral groove and the rotating shaft, the cross-shaped supporting plate is driven to rotate by 180 degrees, automatic overturning of the sensor substrate is achieved, operation is easy, time and labor are saved, and the sensor substrate coating efficiency is effectively improved.

Description

Technical Field

[0001] The invention relates to the technical field of ion beam sputtering coating, and in particular to a substrate rotating frame structure used for sensor ion beam sputtering coating equipment. Background Art

[0002] Ion beam sputtering coating utilizes gas discharge to partially ionize the gas or evaporated material. While the gas ions or evaporated material ions bombard the evaporated material or its reaction material on the substrate, it has the characteristics of fast deposition speed of ion plating and ion clean surface of sputtering plating. The film has strong adhesion and good diffraction. In the sensor manufacturing process, ion beam sputtering coating is a commonly used surface treatment technology to form a uniform, high-quality film on the surface of the sensor substrate. The substrate rotating frame is an important component for supporting the sensor substrate. It is connected to the rotating mechanism in the coating equipment. During the coating process, it can drive the sensor substrate to rotate, improve the uniformity of the coating, and ensure the coating quality.

[0003] During the coating process, the sensor substrate usually needs to be coated on both sides. In the prior art, when coating the sensor substrate installed on the substrate rotating frame, only one side of the substrate can be coated at a time. When the other side needs to be coated, the equipment needs to be stopped, the substrate needs to be manually flipped over, and then the other side of the substrate needs to be coated again. The operation is very troublesome. At the same time, the start and stop of the equipment seriously reduces the coating efficiency of the sensor substrate. Summary of the invention

[0004] The purpose of the present invention is to solve the following shortcomings in the prior art: when it is necessary to coat the other side, the equipment needs to be stopped, the substrate needs to be manually flipped over, and then the other side of the substrate needs to be coated again, which is very troublesome. At the same time, the start and stop of the equipment seriously reduces the coating efficiency of the sensor substrate. A substrate rotating frame structure for sensor ion beam sputtering coating equipment is proposed.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] A substrate rotating frame structure for sensor ion beam sputtering coating equipment comprises a rotating rod, a mounting plate is fixedly mounted on the upper end of the rotating rod, a connecting flange is fixedly mounted on the lower end, a plurality of rotating holes are opened on the mounting plate, a plurality of rotating holes are vertically rotatably mounted with rotating shafts, a cross supporting plate is fixedly mounted on the lower end of the plurality of rotating shafts, and a sensor substrate is mounted on the cross supporting plate through an adsorption assembly;

[0007] A rotating column is fixedly installed on the upper end of the rotating shaft, and a spiral groove is opened on the side of the rotating column, and the number of spiral turns of the spiral groove is half a turn. An electric control cylinder is fixedly installed on the mounting plate through a bracket, and a lifting plate is fixedly installed on the output shaft of the electric control cylinder. A plurality of transmission rods are fixedly installed on the side of the lifting plate, and the end of the transmission rod away from the lifting plate is slidably inserted in the spiral groove.

[0008] As a preferred solution, the adsorption assembly includes two adsorption tubes which are slidably installed under the cross support plate through supporting components, two suction cups respectively connected to the two adsorption tubes, two sealing plates which are respectively sealed and slidably installed in the two adsorption tubes through telescopic springs, and two vertical rods which are respectively vertically fixed on the two sealing plates, the sensor substrate is located between the two suction cups, and the cross support plate is provided with a locking assembly for limiting the horizontal movement of the adsorption tube.

[0009] As a preferred solution, the support component includes two support rails horizontally fixedly mounted on the cross support plate through fixed blocks and two moving blocks slidably mounted on the two support rails respectively, and the two moving blocks are fixedly connected to the adsorption tube.

[0010] As a preferred solution, the locking assembly includes two locking blocks fixedly mounted on the lower surface of the cross support plate and a locking rod fixedly mounted on the upper end of the vertical rod. The two locking blocks are provided with locking grooves at one end close to the vertical rod, and the two ends of the locking rod can be respectively inserted into the two locking grooves.

[0011] As a preferred solution, a slide rail is horizontally fixedly installed on the lower surface of the cross support plate, a slider is slidably sleeved on the slide rail, a centrifugal block with an isosceles trapezoidal longitudinal section is fixedly installed on the lower surface of the slider, return springs are fixedly installed on both side surfaces of the slider, two return springs are sleeved on the slide rail, one end of the two return springs away from the slider is fixedly connected to the cross support plate, a stop block is fixedly installed on the lower surface of the centrifugal block, two inclined surfaces of the centrifugal block are downward, and the two locking rods are located on the sliding path of the centrifugal block.

[0012] As a preferred solution, a U-shaped fixing frame with thermal conductivity is fixedly installed on the lower surface of the cross support plate through two connecting columns, and limiting grooves are provided at both ends of the fixing frame. The two sides of the sensor substrate are respectively slidably inserted in the two limiting grooves, and rechargeable batteries are symmetrically fixedly installed on the cross support plate. The positive and negative poles of the rechargeable batteries are respectively provided with a positive terminal and a negative terminal. Heating resistors are installed on the two connecting columns through a lifting assembly, and the two heating resistors are in contact with the upper end of the fixing frame. Current connectors are fixedly installed at both ends of the heating resistors, and the two current connectors are connected to the positive terminal and the negative terminal through a conductive assembly.

[0013] As a preferred solution, the lifting assembly includes a memory spring sleeved on the connecting column and a lifting block vertically slidably sleeved on the connecting column, and two ends of the memory spring are fixedly connected to the lifting block and the fixed frame respectively.

[0014] As a preferred solution, the conductive assembly includes a moving rod horizontally slidably mounted on the lifting block, a U-shaped conductive rod fixedly mounted at one end of the moving rod, a straight conductive rod fixedly mounted at the other end of the moving rod, and a transmission component for driving the moving rod to move, the two current connectors are in sliding contact with the U-shaped conductive rod and the straight conductive rod respectively, the positive electrode connector is located between the U-shaped conductive rods, and one end of the negative electrode connector is in sliding contact with the lower surface of the straight conductive rod.

[0015] As a preferred solution, the transmission component includes a baffle rod horizontally fixedly mounted on the side of the moving rod, a support rod fixedly mounted on the centrifugal block and an elastic rod vertically fixedly mounted on the support rod, and the baffle rod is located on the moving path of the elastic rod.

[0016] As a preferred solution, a connecting rod is fixedly mounted on the lifting block, a heat conducting block is fixedly mounted on one end of the connecting rod away from the lifting block, two protruding parts are provided on the upper end of the fixed frame, and the heat conducting block is located below the protruding parts.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] 1. After the coating on one side of the sensor substrate is completed, the cross support plate can be driven to rotate 180° through the cooperation of the electric cylinder, lifting plate, transmission rod, rotating column, spiral groove and rotating shaft, so as to realize the automatic flipping of the sensor substrate. There is no need to stop the equipment for manual flipping. The operation is simple, time-saving and labor-saving, and the coating efficiency of the sensor substrate is effectively improved.

[0019] 2. The sensor substrate is adsorbed on the cross support plate through the adsorption tube and the suction cup. When the rotating rod is rotating, under the action of centrifugal force, the centrifugal block will release the adsorption force of the suction cup close to the coated side of the sensor substrate and drive the suction cup to separate from the substrate. At the same time, the suction cup close to the coated side of the sensor substrate away from the sensor substrate will adsorb the sensor substrate under the cooperation of the telescopic spring, sealing plate, vertical rod and locking assembly to support the sensor substrate. During the coating process, the coated side of the sensor substrate is prevented from contacting with the suction cup to affect the coating quality of the sensor substrate.

[0020] 3. During the rotation of the rotating rod, under the action of the centrifugal block, the moving rod is driven to move, so that the U-shaped conductive rod contacts the positive terminal, thereby forming a closed loop between the heating resistor and the rechargeable battery. The heating resistor is energized to increase temperature, and the heat is transferred to the sensor substrate through the fixed frame, so that the temperature of the sensor substrate increases during the sputtering process, which is beneficial to reduce the film stress, increase the adhesion of the film material, and improve the coating quality.

[0021] 4. When the temperature of the sensor substrate rises to a certain value, the memory spring drives the heating resistor to separate from the fixed frame, and at the same time drives the straight conductive rod to separate from the negative terminal, disconnecting the circuit to stop heating the sensor substrate. At the same time, the lifting block drives the heat conductive block to contact the fixed frame, and the heat conductive block absorbs the heat from the fixed frame, thereby cooling the sensor substrate. The reduction in the temperature of the sensor substrate helps to form a denser thin film layer, further improving the coating quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 A schematic diagram of the three-dimensional structure of a substrate rotating frame structure for a sensor ion beam sputtering coating device proposed by the present invention;

[0023] Figure 2 for Figure 1 The enlarged structural diagram at A in the middle;

[0024] Figure 3 It is a left-view stereoscopic structural diagram of the rotating shaft, the cross support plate, the adsorption assembly and the sensor substrate;

[0025] Figure 4 It is a right-side perspective structural diagram of the rotating shaft, the cross support plate, the adsorption assembly and the sensor substrate;

[0026] Figure 5 Schematic diagram of the partial three-dimensional structure of the rotating shaft, the cross support plate, the adsorption assembly and the sensor substrate;

[0027] Figure 6 for Figure 5 The enlarged structural diagram at B in the middle;

[0028] Figure 7 It is a schematic diagram of a three-dimensional partial cross-sectional structure of an adsorption tube and a suction cup;

[0029] Figure 8 It is a schematic diagram of the three-dimensional structure of a rechargeable battery, a heating resistor, a fixing frame and a conductive component;

[0030] Fig. 9 It is a schematic diagram of the three-dimensional structure of the conductive component.

[0031] In the figure: 1 rotating rod, 2 mounting plate, 3 connecting flange, 4 rotating shaft, 5 cross support plate, 6 sensor substrate, 7 rotating column, 8 spiral groove, 9 electric control cylinder, 10 lifting plate, 11 transmission rod, 12 adsorption tube, 13 suction cup, 14 telescopic spring, 15 sealing plate, 16 vertical rod, 17 supporting rail, 18 moving block, 19 locking block, 20 locking rod, 21 locking groove, 22 slide rail, 23 slider, 24 centrifugal block, 25 block, 26 connecting column, 27 fixing frame, 28 rechargeable battery, 29 positive electrode connector, 30 negative electrode connector, 31 heating resistor, 32 current connector, 33 memory spring, 34 lifting block, 35 moving rod, 36 U-shaped conductive rod, 37 straight conductive rod, 38 block rod, 39 support rod, 40 elastic rod, 41 connecting rod, 42 heat conductive block, 43 reset spring. DETAILED DESCRIPTION

[0032] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0033] Reference Figure 1-Figure 9 A substrate rotating frame structure for sensor ion beam sputtering coating equipment comprises a rotating rod 1, a mounting plate 2 is fixedly mounted on the upper end of the rotating rod 1, a connecting flange 3 is fixedly mounted on the lower end, a plurality of rotating holes are opened on the mounting plate 2, a rotating shaft 4 is vertically rotatably mounted in each of the plurality of rotating holes, a cross supporting plate 5 is fixedly mounted on the lower end of each of the plurality of rotating shafts 4, a sensor substrate 6 is mounted on the cross supporting plate 5 through an adsorption assembly, the bottom end of the rotating rod 1 is connected to the rotating mechanism of the coating equipment through the connecting flange 3, during the coating process, the rotating rod 1 is driven to rotate by the rotating mechanism of the coating equipment, and then the plurality of sensor substrates 6 are driven to rotate around the rotating rod 1 through the mounting plate 2 and the rotating shaft 4, thereby ensuring the uniformity of the coating.

[0034] A rotating column 7 is fixedly installed on the upper end of the rotating shaft 4, and a spiral groove 8 is opened on the side of the rotating column 7. The number of spiral turns of the spiral groove 8 is half a turn. An electric control cylinder 9 is fixedly installed on the mounting plate 2 through a bracket. A lifting plate 10 is fixedly installed on the output shaft of the electric control cylinder 9. A plurality of transmission rods 11 are fixedly installed on the side of the lifting plate 10. The end of the transmission rod 11 away from the lifting plate 10 is slidably inserted in the spiral groove 8.

[0035] One end of the transmission rod 11 is connected to the output shaft of the electric control cylinder 9 through the lifting plate 10. When the transmission rod 11 moves vertically downward, one end of the transmission rod 11 will slide in the spiral groove 8. Under the limit of the spiral groove 8, it will drive the rotating column 7 to rotate. Since the number of spiral turns of the spiral groove 8 is half a turn, when the transmission rod 11 moves from the upper end of the spiral groove 8 to the lower end of the spiral groove 8, it will drive the rotating column 7 to rotate 180°.

[0036] The adsorption assembly includes two adsorption tubes 12 which are slidably installed under the cross support plate 5 through supporting components, two suction cups 13 respectively connected to the two adsorption tubes 12, two sealing plates 15 which are respectively sealed and slidably installed in the two adsorption tubes 12 through telescopic springs 14, and two vertical rods 16 which are respectively vertically fixed on the two sealing plates 15. The sensor substrate 6 is located between the two suction cups 13, and a locking assembly for limiting the horizontal movement of the adsorption tube 12 is provided on the cross support plate 5.

[0037] The sealing plate 15 is sealingly slidably installed in the adsorption tube 12, and the suction cup 13 is connected to the inside of the adsorption tube 12. When the sensor substrate 6 is adsorbed, the vertical rod 16 is first pressed to drive the sealing plate 15 to move vertically downward, the telescopic spring 14 is compressed, and then the sensor substrate 6 is attached to the suction cup 13, and the vertical rod 16 is released. Under the action of the elastic force of the telescopic spring 14, the sealing plate 15 will move vertically upward in the adsorption tube 12. At this time, the space formed between the sensor substrate 6, the adsorption tube 12 and the sealing plate 15 becomes larger, thereby generating negative pressure, and the sensor substrate 6 is adsorbed on the suction cup 13.

[0038] The supporting components include two support rails 17 horizontally fixedly installed on the cross support plate 5 through fixed blocks and two moving blocks 18 slidably mounted on the two support rails 17 respectively. The two moving blocks 18 are fixedly connected to the adsorption tube 12. The adsorption tube 12 is slidably installed on the two support rails 17 through the moving blocks 18, so that it can slide horizontally under the cross support plate 5.

[0039] The locking assembly includes two locking blocks 19 fixedly mounted on the lower surface of the cross support plate 5 and a locking rod 20 fixedly mounted on the upper end of the vertical rod 16. The two locking blocks 19 are provided with locking grooves 21 at one end close to the vertical rod 16. The two ends of the locking rod 20 can be respectively inserted into the two locking grooves 21. When the suction cup 13 and the adsorption tube 12 adsorb the sensor substrate 6, the locking rod 20 is just located directly below the locking block 19, and the vertical rod 16 will drive the locking rod 20 to be inserted into the locking groove 21 opened in the locking block 19. The adsorption tube 12 is limited to move horizontally on the support rail 17 by the locking block 19 and the locking rod 20, thereby preventing the sensor substrate 6 from being offset during the coating process.

[0040] A slide rail 22 is horizontally fixedly installed on the lower surface of the cross support plate 5, and a slider 23 is slidably sleeved on the slide rail 22. A centrifugal block 24 with an isosceles trapezoidal longitudinal section is fixedly installed on the lower surface of the slider 23. Reset springs 43 are fixedly installed on both side surfaces of the slider 23. The two reset springs 43 are both sleeved on the slide rail 22. The ends of the two reset springs 43 away from the slider 23 are fixedly connected to the cross support plate 5. A stopper 25 is fixedly installed on the lower surface of the centrifugal block 24. The two inclined surfaces of the centrifugal block 24 are both facing downward, and the two locking rods 20 are both located on the sliding path of the centrifugal block 24.

[0041] The centrifugal block 24 slides on the slide rail 22 through the slider 23. In the initial state, under the action of the elastic force of the two return springs 43, the centrifugal block 24 is located in the middle of the slide rail 22 and directly above the sensor substrate 6. When the rotating rod 1 drives the sensor substrate 6 to rotate, the cross support plate 5 will rotate around the rotating rod 1. At this time, the centrifugal block 24 generates centrifugal force during rotation. Under the action of the centrifugal force, the centrifugal block 24 will move toward the coating side of the sensor substrate 6. During the movement, the inclined surface of the centrifugal block 24 will contact the locking rod 20. Under the action of the inclined surface, the vertical rod 16 is driven to move vertically downward through the locking rod 20. The locking rod 20 will first move out of the locking groove 21 and drive the sealing plate 15 to move in the adsorption tube 12. At this time, the pressure between the sealing plate 15, the adsorption tube 12 and the sensor substrate 6 will gradually recover. The adsorption force of the suction cup 13 on the sensor substrate 6 gradually weakens, and the locking rod 20 will move along the inclined surface of the centrifugal block 24 to the lower end of the centrifugal block 24. At this time, the adsorption force of the suction cup 13 on the sensor substrate 6 is the smallest, and then the locking rod 20 will contact the block 25. Under the obstruction of the block 25, the centrifugal block 24 will drive the locking rod 20 to move horizontally. At this time, a horizontal force is applied to the adsorption tube 12, thereby driving the suction cup 13 to separate from the sensor substrate 6, and the adsorption tube 12 and the suction cup 13 on the coating side of the sensor substrate 6 are adsorbed together with the sensor substrate 6, thereby fixing the sensor substrate 6 directly under the cross support plate 5. During the coating process, the suction cup 13 on the coating side of the sensor substrate 6 is prevented from contacting the sensor substrate 6, which hinders the coating on one side of the sensor substrate 6 and affects the coating quality of the sensor substrate 6.

[0042] A U-shaped fixed frame 27 with thermal conductivity is fixedly installed on the lower surface of the cross support plate 5 through two connecting columns 26. Limit grooves are provided at both ends of the fixed frame 27. The two sides of the sensor substrate 6 are slidably inserted in the two limit grooves. A rechargeable battery 28 is symmetrically fixedly installed on the cross support plate 5. The positive and negative poles of the rechargeable battery 28 are respectively provided with a positive terminal 29 and a negative terminal 30. A heating resistor 31 is installed on the two connecting columns 26 through a lifting assembly (the heating resistor 31 is a prior art and is not introduced in detail here). The two heating resistors 31 are both in contact with the upper end of the fixed frame 27. Current connectors 32 are fixedly installed at both ends of the heating resistor 31. The two current connectors 32 are connected to the positive terminal 29 and the negative terminal 30 through a conductive assembly.

[0043] The two sides of the sensor substrate 6 are slidably inserted on the fixed frame 27. The fixed frame 27 limits the sensor substrate 6 to prevent the sensor substrate 6 from swinging under the action of centrifugal force. The heating resistor 31 is a resistor whose temperature will increase after current is passed through it. Since the heating resistor 31 is in contact with the fixed frame 27, when the rechargeable battery 28 inputs current to the heating resistor 31, the temperature of the heating resistor 31 will increase. At the same time, since the fixed frame 27 has thermal conductivity, the fixed frame 27 will transfer the temperature of the heating resistor 31 to the sensor substrate 6. During the sputtering process, the temperature of the sensor substrate 6 increases, which is beneficial to reduce the film stress, increase the adhesion of the film material, and improve the coating quality.

[0044] The lifting assembly includes a memory spring 33 mounted on the connecting column 26 and a lifting block 34 vertically slidably mounted on the connecting column 26. The two ends of the memory spring 33 are fixedly connected to the lifting block 34 and the fixed frame 27 respectively. The memory spring 33 is a spring made of memory metal. Within a certain temperature range, the memory spring 33 will not deform. When the temperature exceeds the appropriate temperature range, the memory spring 33 will undergo tensile deformation. The lifting block 34 is slidably mounted on the connecting column 26 through the memory spring 33. At this time, the heating resistor 31 is in contact with the fixed frame 27. When the temperature is too high, the memory spring 33 will undergo tensile deformation, thereby driving the lifting block 34 to move vertically upward, and driving the heating resistor 31 to separate from the fixed frame 27, thereby stopping heating the fixed frame 27.

[0045] The conductive component includes a moving rod 35 horizontally slidably mounted on the lifting block 34, a U-shaped conductive rod 36 fixedly mounted at one end of the moving rod 35, a straight conductive rod 37 fixedly mounted at the other end of the moving rod 35, and a transmission component for driving the moving rod 35 to move. The two current connectors 32 are in sliding contact with the U-shaped conductive rod 36 and the straight conductive rod 37 respectively. The positive connector 29 is located between the U-shaped conductive rods 36. One end of the negative connector 30 is in sliding contact with the lower surface of the straight conductive rod 37. The transmission component includes a baffle 38 horizontally fixedly mounted on the side of the moving rod 35, a support rod 39 fixedly mounted on the centrifugal block 24, and an elastic rod 40 vertically fixedly mounted on the support rod 39. The baffle 38 is located on the moving path of the elastic rod 40.

[0046] The U-shaped conductive rod 36 and the straight conductive rod 37 slide horizontally on the lifting block 34 through the moving rod 35, and the current connectors 32 connected at both ends of the heating resistor 31 slide in contact with the U-shaped conductive rod 36 and the straight conductive rod 37 respectively. In the initial state, the positive terminal 29 is located in the middle of the two ends of the U-shaped conductive rod 36 and does not contact the U-shaped conductive rod 36, while the negative terminal 30 contacts the lower surface of the straight conductive rod 37, and the current loop between the rechargeable battery 28 and the heating resistor 31 is disconnected. Under the action of centrifugal force, the centrifugal block 24 will drive the elastic rod 40 to contact the baffle rod 38 during the movement, and drive the moving rod 35 to move to one side through the baffle rod 38, thereby driving one end of the U-shaped conductive rod 36 to contact the positive terminal 29. When the moving rod 35 cannot move, the elastic rod 40 will bend and deform until it is separated from the baffle rod 38, so that during the coating process of the sensor substrate 6, a closed loop is formed between the heating resistor 31 and the rechargeable battery 28, and the heating resistor 31 is energized and heated.

[0047] A connecting rod 41 is fixedly installed on the lifting block 34, and a heat-conducting block 42 is fixedly installed on one end of the connecting rod 41 away from the lifting block 34. Two protruding parts are provided on the upper end of the fixed frame 27, and the heat-conducting block 42 is located below the protruding parts. When the lifting block 34 moves vertically upward, the heat-conducting block 42 will be driven by the connecting rod 41 to contact one end of the fixed frame 27. The heat-conducting block 42 has a certain heat-conducting effect. When the heat-conducting block 42 contacts the fixed frame 27, the temperature on the fixed frame 27 will be absorbed by the heat-conducting block 42, thereby cooling the fixed frame 27.

[0048] In the present invention, the sensor substrate 6 is installed on the cross support plate 5 through the adsorption tube 12 and the suction cup 13. During the sputtering coating process, the sensor substrate 6 drives the rotating rod 1 to rotate, thereby driving multiple sensor substrates 6 to rotate through the mounting plate 2 and multiple rotating shafts 4 to ensure the uniformity of the coating.

[0049] When the coating on one side of the sensor substrate 6 is completed, the lifting plate 10 can be driven by the electric control cylinder 9 to move vertically downward. The lifting plate 10 will simultaneously drive multiple transmission rods 11 to move vertically downward. One end of the transmission rod 11 will drive the rotating column 7 to rotate through the spiral groove 8, thereby driving the cross support plate 5 to rotate 180° through the rotating shaft 4. The cross support plate 5 will drive the sensor substrate 6 to flip 180°, thereby realizing automatic flipping of the sensor substrate 6. There is no need to stop the equipment for manual flipping, which is simple to operate, saves time and effort, and effectively improves the coating efficiency of the sensor substrate 6.

[0050] When the cross support plate 5 rotates around the rotating rod 1, the centrifugal block 24 will move toward the coating side of the sensor substrate 6 under the action of centrifugal force. During the movement, the centrifugal block 24 will release the lock of the adsorption tube 12 located on the coating side of the sensor substrate 6, thereby driving the adsorption tube 12 and the suction cup 13 to separate from the sensor substrate 6, while the suction cup 13 and the adsorption tube 12 facing away from the coating side of the sensor substrate 6 are adsorbed together with the sensor substrate 6 to support the sensor substrate 6. During the coating process, the suction cup 13 located on the coating side of the sensor substrate 6 is prevented from contacting the sensor substrate 6, which hinders the coating on one side of the sensor substrate 6 and affects the coating quality of the sensor substrate 6.

[0051] When the cross support plate 5 drives the sensor substrate 6 to flip 180°, the centrifugal block 24 will move toward the other side of the sensor substrate 6 under the action of centrifugal force, and in the process of movement, it will first drive the adsorption tube 12 and the suction cup 13 separated from the sensor substrate 6 to move toward the sensor substrate 6 until the suction cup 13 contacts the sensor substrate 6, the adsorption tube 12 stops moving, and the centrifugal block 24 continues to move toward the other adsorption tube 12. At this time, the centrifugal block 24 will be separated from the locking rod 20 on the adsorption tube 12. Under the action of the elastic force of the telescopic spring 14, the vertical rod 16 drives the locking rod 20 to move vertically upward and insert it into the locking groove 21 provided on the locking block 19, and the sealing plate 15 moves vertically upward in the adsorption tube 12, thereby adsorbing the sensor substrate 6 and the suction cup 13 together, and when the centrifugal block 24 contacts the locking rod 20 on the other adsorption tube 12, the adsorption between the other suction cup 13 and the sensor substrate 6 will be released, and the suction cup 13 and the adsorption tube 12 will be driven away from the sensor substrate 6.

[0052] During the movement of the centrifugal block 24, the elastic rod 40 will be driven to contact the blocking rod 38, and the moving rod 35 will be driven to move to one side through the blocking rod 38, thereby driving one end of the U-shaped conductive rod 36 to contact the positive terminal 29. When the moving rod 35 cannot move, the elastic rod 40 will bend and deform until it is separated from the blocking rod 38. Therefore, during the coating process of the sensor substrate 6, a closed loop is formed between the heating resistor 31 and the rechargeable battery 28. The heating resistor 31 is energized to heat up and transfers the heat to the sensor substrate 6 through the fixed frame 27, so that the temperature of the sensor substrate 6 increases during the sputtering process, which is beneficial to reduce the film stress, increase the adhesion of the film material, and improve the coating quality.

[0053] When the temperature of the sensor substrate 6 is too high, the memory spring 33 will be stretched and deformed. At this time, the heating resistor 31 will be driven to move vertically upward through the lifting block 34, and the heating resistor 31 will be driven to separate from the fixed frame 27, and the heating of the fixed frame 27 will be stopped. At the same time, the heating resistor 31 will drive the two current connectors 32 to move vertically upward, and one of the current connectors 32 will be separated from the negative electrode connector 30. At this time, the circuit is disconnected to stop heating the sensor substrate 6. At the same time, the lifting block 34 will drive the heat conductive block 42 to separate from the fixed frame 27 through the connecting rod 41. The heat conductive block 42 will absorb the heat from the fixed frame 27, thereby cooling the sensor substrate 6. The reduction in the temperature of the sensor substrate 6 helps to form a relatively dense thin film layer, further improving the coating quality. The memory spring 33 will not return to its original state until the temperature of the sensor substrate 6 drops to the rated temperature.

[0054] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A substrate rotating frame structure for a sensor ion beam sputtering coating device, comprising a rotating rod (1), characterized in that: The upper end of the rotating rod (1) is fixedly mounted with a mounting plate (2), and the lower end is fixedly mounted with a connecting flange (3); the mounting plate (2) is provided with a plurality of rotating holes, and a rotating shaft (4) is vertically rotatably mounted in each of the plurality of rotating holes; a cross support plate (5) is fixedly mounted at the lower end of each of the plurality of rotating shafts (4); a sensor substrate (6) is mounted on the cross support plate (5) via an adsorption assembly; A rotating column (7) is fixedly mounted on the upper end of the rotating shaft (4), a spiral groove (8) is provided on the side of the rotating column (7), and the number of spiral turns of the spiral groove (8) is half a turn. An electric control cylinder (9) is fixedly mounted on the mounting plate (2) through a bracket, and a lifting plate (10) is fixedly mounted on the output shaft of the electric control cylinder (9). A plurality of transmission rods (11) are fixedly mounted on the side of the lifting plate (10), and one end of the transmission rod (11) away from the lifting plate (10) is slidably inserted into the spiral groove (8).

2. A substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 1, characterized in that: The adsorption assembly comprises two adsorption tubes (12) each slidably mounted below a cross support plate (5) via a support component, two suction cups (13) respectively connected to the two adsorption tubes (12), two sealing plates (15) each slidably mounted in the two adsorption tubes (12) via a telescopic spring (14), and two vertical rods (16) respectively fixedly mounted vertically on the two sealing plates (15), the sensor substrate (6) being located between the two suction cups (13), and a locking assembly for limiting horizontal movement of the adsorption tube (12) being provided on the cross support plate (5).

3. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 2, characterized in that: The support component comprises two support rails (17) horizontally fixedly mounted on the cross support plate (5) via fixed blocks and two moving blocks (18) respectively slidably sleeved on the two support rails (17), and the two moving blocks (18) are both fixedly connected to the adsorption tube (12).

4. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 2, characterized in that: The locking assembly comprises two locking blocks (19) fixedly mounted on the lower surface of the cross support plate (5) and a locking rod (20) fixedly mounted on the upper end of the vertical rod (16); a locking groove (21) is formed at one end of the two locking blocks (19) close to the vertical rod (16); and two ends of the locking rod (20) can be respectively inserted into the two locking grooves (21).

5. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 4, characterized in that: A slide rail (22) is horizontally fixedly installed on the lower surface of the cross support plate (5), a slider (23) is slidably sleeved on the slide rail (22), a centrifugal block (24) with an isosceles trapezoidal longitudinal section is fixedly installed on the lower surface of the slider (23), return springs (43) are fixedly installed on both sides of the slider (23), two return springs (43) are sleeved on the slide rail (22), one end of the two return springs (43) away from the slider (23) is fixedly connected to the cross support plate (5), a stopper (25) is fixedly installed on the lower surface of the centrifugal block (24), two inclined surfaces of the centrifugal block (24) are downward, and the two locking rods (20) are located on the sliding path of the centrifugal block (24).

6. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 5, characterized in that: A U-shaped fixing frame (27) with thermal conductivity is fixedly mounted on the lower surface of the cross support plate (5) via two connecting columns (26); both ends of the fixing frame (27) are provided with limiting grooves; the two sides of the sensor substrate (6) are respectively slidably inserted into the two limiting grooves; a rechargeable battery (28) is symmetrically fixedly mounted on the cross support plate (5); the positive and negative electrodes of the rechargeable battery (28) are respectively provided with a positive electrode connector (29) and a negative electrode connector (30); heating resistors (31) are mounted on the two connecting columns (26) via a lifting assembly; the two heating resistors (31) are in contact with the upper end of the fixing frame (27); current connectors (32) are fixedly mounted on both ends of the heating resistor (31); the two current connectors (32) are connected to the positive electrode connector (29) and the negative electrode connector (30) via a conductive assembly.

7. A substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 6, characterized in that: The lifting assembly comprises a memory spring (33) sleeved on a connecting column (26) and a lifting block (34) sleeved vertically and slidably on the connecting column (26), and two ends of the memory spring (33) are fixedly connected to the lifting block (34) and the fixed frame (27) respectively.

8. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 7, characterized in that: The conductive assembly comprises a moving rod (35) horizontally slidably mounted on a lifting block (34), a U-shaped conductive rod (36) fixedly mounted on one end of the moving rod (35), a straight conductive rod (37) fixedly mounted on the other end of the moving rod (35), and a transmission component for driving the moving rod (35) to move, the two current connectors (32) are in sliding contact with the U-shaped conductive rod (36) and the straight conductive rod (37) respectively, the positive electrode connector (29) is located between the U-shaped conductive rods (36), and one end of the negative electrode connector (30) is in sliding contact with the lower surface of the straight conductive rod (37).

9. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 8, characterized in that: The transmission component comprises a blocking rod (38) fixedly mounted horizontally on the side of the moving rod (35), a supporting rod (39) fixedly mounted on the centrifugal block (24), and an elastic rod (40) fixedly mounted vertically on the supporting rod (39), wherein the blocking rod (38) is located on the moving path of the elastic rod (40).

10. The substrate rotating frame structure for sensor ion beam sputtering coating equipment according to claim 7, characterized in that: A connecting rod (41) is fixedly mounted on the lifting block (34), a heat conducting block (42) is fixedly mounted on one end of the connecting rod (41) away from the lifting block (34), two protruding parts are provided on the upper end of the fixing frame (27), and the heat conducting block (42) is located below the protruding parts.

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