Ultraviolet lithography lens and lithography machine

Abstract

The invention discloses an ultraviolet lithography lens and a lithography machine, and relates to the technical field of optics, and the ultraviolet lithography lens comprises a plurality of lenses which are sequentially arranged from an object side to an image side; the plurality of lenses comprise a first lens with positive focal power, a second lens with positive focal power, a third lens with positive focal power, a fourth lens with positive focal power, a fifth lens with negative focal power, a sixth lens with negative focal power, a seventh lens with positive focal power, an eighth lens with positive focal power and a ninth lens with positive focal power; a tenth lens with positive focal power, an eleventh lens with negative focal power, a twelfth lens with positive focal power, a thirteenth lens with positive focal power, a fourteenth lens with positive focal power and a fifteenth lens with negative focal power; wherein the plurality of lenses are all arranged to be spherical lenses; according to the technical scheme provided by the invention, the installation and adjustment difficulty and cost of the ultraviolet lithography lens can be greatly reduced while the precision is maintained.

Description

Technical Field

[0001] The present invention relates to the field of optical technology, and in particular to an ultraviolet lithography lens and a lithography machine. Background Art

[0002] In recent years, with the further development of UV lithography lenses, the semiconductor industry has a higher and higher demand for UV lithography lenses. However, in order to ensure high resolution, UV lithography lenses currently use more aspherical lenses. Due to the irregular shape of aspherical lenses, they cannot be shared with other UV lithography lenses, making installation and adjustment difficult and costly.

[0003] Therefore, how to reduce the difficulty and cost of UV lithography lens assembly and adjustment while maintaining accuracy has become an urgent problem to be solved in this field. Summary of the invention

[0004] The main purpose of the present invention is to provide an ultraviolet lithography lens and a lithography machine, aiming to reduce the difficulty and cost of ultraviolet lithography lens installation and adjustment while maintaining accuracy.

[0005] To achieve the above-mentioned purpose, the ultraviolet lithography lens provided by the present invention has an object side and an image side which are arranged opposite to each other along the optical axis direction. The ultraviolet lithography lens comprises a plurality of lenses arranged in sequence from the object side to the image side, and the plurality of lenses comprise a first lens with positive optical power, a second lens with positive optical power, a third lens with positive optical power, a fourth lens with positive optical power, a fifth lens with negative optical power, a sixth lens with negative optical power, a seventh lens with positive optical power, an eighth lens with positive optical power, a ninth lens with positive optical power, a tenth lens with positive optical power, an eleventh lens with negative optical power, a twelfth lens with positive optical power, a thirteenth lens with positive optical power, a fourteenth lens with positive optical power, and a fifteenth lens with negative optical power; wherein the plurality of lenses are all arranged as spherical lenses.

[0006] In one embodiment, the first lens is a meniscus lens, and the object side surface of the first lens is concave, the second lens is a meniscus lens, and the object side surface of the second lens is concave, the third lens is a meniscus lens, and the object side surface of the third lens is convex, the fourth lens is a meniscus lens, and the object side surface of the fourth lens is convex, the fifth lens is a meniscus lens, and the object side surface of the fifth lens is convex, the sixth lens is a biconcave lens, the seventh lens is a meniscus lens, and the object side surface of the seventh lens is concave, the eighth lens is a biconvex lens, the ninth lens is a biconvex lens, the tenth lens is a biconvex lens, the eleventh lens is a biconcave lens, the twelfth lens is a biconvex lens, the thirteenth lens is a biconvex lens, the fourteenth lens is a meniscus lens, and the object side surface of the fourteenth lens is convex, and the fifteenth lens is a biconcave lens.

[0007] In one embodiment, the refractive index of the first lens is n1, the refractive index of the second lens is n2, the refractive index of the third lens is n3, the refractive index of the fourth lens is n4, the refractive index of the fifth lens is n5, the refractive index of the sixth lens is n6, the refractive index of the seventh lens is n7, the refractive index of the eighth lens is n8, the refractive index of the ninth lens is n9, the refractive index of the tenth lens is n10, the refractive index of the eleventh lens is n11, the refractive index of the twelfth lens is n12, the refractive index of the thirteenth lens is n13, the refractive index of the fourteenth lens is n14, and the refractive index of the fifteenth lens is n15, wherein : 1.48≤n1≤1.50, 1.51≤n2≤1.53, 1.48≤n3≤1.50, 1.61≤n4≤1.63, 1.61≤n5≤1.63, 1.61≤n6≤1.63, 1.48≤n7≤1.50, 1.49≤n8≤1.51, 1.49≤n9≤1.51, 1.49≤n10≤1.51, 1.57≤n11≤1.59, 1.49≤n12≤1.51, 1.51≤n13≤1.53, 1.51≤n14≤1.53, 1.57≤n15≤1.59.

[0008] In one embodiment, the Abbe constant of the first lens is v1, the Abbe constant of the second lens is v2, the Abbe constant of the third lens is v3, the Abbe constant of the fourth lens is v4, the Abbe constant of the fifth lens is v5, the Abbe constant of the sixth lens is v6, the Abbe constant of the seventh lens is v7, the Abbe constant of the eighth lens is v8, the Abbe constant of the ninth lens is v9, the Abbe constant of the tenth lens is v10, the Abbe constant of the eleventh lens is v11, the Abbe constant of the twelfth lens is v12, the Abbe constant of the thirteenth lens is v13, the Abbe constant of the fourteenth lens is v14, and the Abbe constant of the fifteenth lens is v15. The number is v15, among which: 70.3≤v1≤70.5, 63.2≤v2≤63.4, 70.3≤v3≤70.5, 36.3≤v4≤36.5, 36.3≤v5≤36.5, 363≤v6≤36.5, 70.3≤v7≤70.5, 81.5≤v8≤81.7, 81.5≤v9≤81.7, 81.5≤v10≤81.7, 40.8≤v11≤41.0, 81.5≤v12≤81.7, 63.2≤v13≤63.4, 63.2≤v14≤63.4, 40.8≤v15≤41.0.

[0009] In one embodiment, the thickness of the first lens is d1, the thickness of the second lens is d2, the thickness of the third lens is d3, the thickness of the fourth lens is d4, the thickness of the fifth lens is d5, the thickness of the sixth lens is d6, the thickness of the seventh lens is d7, the thickness of the eighth lens is d8, the thickness of the ninth lens is d9, the thickness of the tenth lens is d10, the thickness of the eleventh lens is d11, the thickness of the twelfth lens is d12, the thickness of the thirteenth lens is d13, the thickness of the fourteenth lens is d14, and the thickness of the fifteenth lens is d15, wherein: 29.47 mm≤d1≤30.47 mm, 28.87 mm≤d2≤29.87 mm, 18.7 mm≤d3≤ 19.7mm, 29.32mm≤d4≤30.32mm, 10.95mm≤d5≤11.95mm, 12.02mm≤d6≤13.02mm, 23.28mm≤d7≤24.28mm, 28.5mm≤d8≤29.5mm, 27.57mm≤d9≤28.57m m, 23.49mm≤d10≤24.49mm, 16.49mm≤d11≤17.49mm, 21.29mm≤d12≤22.29mm, 19.4mm≤d13≤20.4mm, 28.07mm≤d14≤29.07mm, 6.73mm≤d15≤7.73mm.

[0010] In one embodiment, the distance between the first lens and the second lens is L1, the distance between the second lens and the third lens is L2, the distance between the third lens and the fourth lens is L3, the distance between the fourth lens and the fifth lens is L4, the distance between the fifth lens and the sixth lens is L5, the distance between the sixth lens and the seventh lens is L6, the distance between the seventh lens and the eighth lens is L7, the distance between the eighth lens and the ninth lens is L8, the distance between the ninth lens and the tenth lens is L9, the distance between the tenth lens and the eleventh lens is L10, the distance between the eleventh lens and the twelfth lens is L11, the distance between the twelfth lens and the thirteenth lens is L12, the distance between the thirteenth lens and the fourteenth lens is L13, and the distance between the fourteenth lens and the fifteenth lens is L14, wherein : 12.53mm≤L1≤13.53mm, 0.38mm≤L2≤0.48mm, 0.25mm≤L3≤0.35mm, 2.45mm≤L4≤2.55m m, 25.16mm≤L5≤26.16mm, 38.13mm≤L6≤39.13mm, 22.22mm≤L7≤23.22mm, 81.05mm≤L8 ≤82.05mm, 7.74mm≤L9≤8.74mm, 5.01mm≤L10≤6.01mm, 76.66mm≤L11≤77.66mm, 2.12m m≤L12≤2.22mm, 0.38mm≤L13≤0.48mm, 8.63mm≤L14≤9.63mm, 52.82mm≤L15≤53.82mm.

[0011] In one embodiment, the ultraviolet lithography lens further includes an aperture, and the aperture is disposed between the eighth lens and the ninth lens.

[0012] In one embodiment, the total optical length of the UV lithography lens is l, where l≤800 mm.

[0013] In one embodiment, the object-side numerical aperture of the UV lithography lens is NA, NA=0.13.

[0014] The present invention also provides a photolithography machine, which includes a workbench, a mask, an ultraviolet photolithography lens as described above, and an ultraviolet light source. The workbench is used to place a substrate to be processed; the mask is arranged above the workbench; the ultraviolet photolithography lens is arranged between the mask and the workbench; the ultraviolet light source is used to emit ultraviolet light toward the substrate, and the ultraviolet light passes through the mask and the ultraviolet photolithography lens in sequence to reach the substrate.

[0015] The technical solution of the present invention changes the propagation direction of the light beam by comprehensively setting the matching relationship between the optical focal length and shape of each lens, which is more conducive to imaging the light beam on the image plane, and all lenses are set to be spherical lenses. The manufacturing process of spherical lenses is relatively simple, the production cost is low, and the tools and technical requirements required for installation are low. While maintaining accuracy, the difficulty and cost of installing and adjusting the ultraviolet lithography lens are greatly reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0017] Figure 1 A schematic structural diagram of an embodiment of an ultraviolet lithography lens provided by the present invention;

[0018] Figure 2 for Figure 1 MTF curve of mid-UV lithography lens;

[0019] Figure 3 for Figure 1 Spot diagram of a mid-UV lithography lens;

[0020] Figure 4 for Figure 1 Schematic diagram of the distortion curve of a mid-UV lithography lens.

[0021] Description of Figure Numbers:

[0022] 1000, UV photolithography lens; 101, first lens; 102, second lens; 103, third lens; 104, fourth lens; 105, fifth lens; 106, sixth lens; 107, seventh lens; 108, eighth lens; 109, ninth lens; 110, tenth lens; 111, eleventh lens; 112, twelfth lens; 113, thirteenth lens; 114, fourteenth lens; 115, fifteenth lens; 201, aperture;

[0023] 2000, mask; 3000, substrate to be processed.

[0024] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0026] It should be noted that if the embodiments of the present invention involve directional indications (such as up, down, left, right, front, back, etc.), the directional indications are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indication will also change accordingly.

[0027] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features limited to "first" and "second" may explicitly or implicitly include at least one of the features. In addition, if "and / or" or "and / or" appears in the full text, its meaning includes three parallel solutions. Taking "A and / or B" as an example, it includes solution A, solution B, or solutions that satisfy both A and B. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the ability of ordinary technicians in this field to implement. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0028] In order to ensure high resolution, current UV photolithography lenses use more aspherical lenses. However, due to the irregular shape of aspherical lenses, they cannot be shared with other UV photolithography lenses, making installation and adjustment difficult and costly.

[0029] Based on this, the present invention proposes a UV lithography lens 1000. Figure 1In one embodiment of the present invention, the ultraviolet lithography lens 1000 has an object side and an image side which are arranged opposite to each other along the optical axis direction. The ultraviolet lithography lens 1000 includes a plurality of lenses arranged in sequence from the object side to the image side, and the plurality of lenses include a first lens 101 with positive optical power, a second lens 102 with positive optical power, a third lens 103 with positive optical power, a fourth lens 104 with positive optical power, a fifth lens 105 with negative optical power, a sixth lens 106 with negative optical power, a seventh lens 107 with positive optical power, an eighth lens 108 with positive optical power, a ninth lens 109 with positive optical power, a tenth lens 110 with positive optical power, an eleventh lens 111 with negative optical power, a twelfth lens 112 with positive optical power, a thirteenth lens 113 with positive optical power, a fourteenth lens 114 with positive optical power, and a fifteenth lens 115 with negative optical power; wherein the plurality of lenses are all configured as spherical lenses.

[0030] The technical solution of the present invention changes the propagation direction of the light beam by comprehensively setting the matching relationship between the optical focal length and shape of each lens, which is more conducive to the imaging of the light beam on the image plane, and sets all lenses as spherical lenses. The manufacturing process of spherical lenses is relatively simple, the production cost is low, and the tools and technical requirements required for installation are low. While maintaining accuracy, the difficulty and cost of assembling and adjusting the ultraviolet lithography lens 1000 are greatly reduced.

[0031] In one embodiment, the first lens 101 is a concave-convex lens, and the object side surface of the first lens 101 is a concave surface, the second lens 102 is a concave-convex lens, and the object side surface of the second lens 102 is a concave surface, the third lens 103 is a concave-convex lens, and the object side surface of the third lens 103 is a convex surface, the fourth lens 104 is a concave-convex lens, and the object side surface of the fourth lens 104 is a convex surface, the fifth lens 105 is a concave-convex lens, and the object side surface of the fifth lens 105 is a convex surface, and the sixth lens 106 is a concave-convex lens. The seventh lens 107 is a concave lens, the object side surface of the seventh lens 107 is a concave surface, the eighth lens 108 is a biconvex lens, the ninth lens 109 is a biconvex lens, the tenth lens 110 is a biconvex lens, the eleventh lens 111 is a biconcave lens, the twelfth lens 112 is a biconvex lens, the thirteenth lens 113 is a biconvex lens, the fourteenth lens 114 is a concave lens, the object side surface of the fourteenth lens 114 is a convex surface, and the fifteenth lens 115 is a biconcave lens. In this way, by combining different lenses and matching the shapes of different lenses, the resolution of the ultraviolet lithography lens 1000 is improved and the lithography effect is optimized.

[0032] In one embodiment, the refractive index of the first lens 101 is n1, the refractive index of the second lens 102 is n2, the refractive index of the third lens 103 is n3, the refractive index of the fourth lens 104 is n4, the refractive index of the fifth lens 105 is n5, the refractive index of the sixth lens 106 is n6, the refractive index of the seventh lens 107 is n7, the refractive index of the eighth lens 108 is n8, the refractive index of the ninth lens 109 is n9, the refractive index of the tenth lens 110 is n10, the refractive index of the eleventh lens 111 is n11, the refractive index of the twelfth lens 112 is n12, the refractive index of the thirteenth lens 113 is n13, and the refractive index of the fourteenth lens 114 is n 14. The refractive index of the fifteenth lens 115 is n15, wherein: 1.48≤n1≤1.50, 1.51≤n2≤1.53, 1.48≤n3≤1.50, 1.61≤n4≤1.63, 1.61≤n5≤1.63, 1.61≤n6≤1.63, 1.48≤n7≤1.50, 1.49≤n8≤1.51, 1.49≤n9≤1.51, 1.49≤n10≤1.51, 1.57≤n11≤1.59, 1.49≤n12≤1.51, 1.51≤n13≤1.53, 1.51≤n14≤1.53, 1.57≤n15≤1.59. The performance of the ultraviolet lithography lens 1000 is significantly improved by rationally setting and selecting the refractive index of the lens material.

[0033] In one embodiment, the Abbe constant of the first lens 101 is v1, the Abbe constant of the second lens 102 is v2, the Abbe constant of the third lens 103 is v3, the Abbe constant of the fourth lens 104 is v4, the Abbe constant of the fifth lens 105 is v5, the Abbe constant of the sixth lens 106 is v6, the Abbe constant of the seventh lens 107 is v7, the Abbe constant of the eighth lens 108 is v8, the Abbe constant of the ninth lens 109 is v9, the Abbe constant of the tenth lens 110 is v10, the Abbe constant of the eleventh lens 111 is v11, the Abbe constant of the twelfth lens 112 is v12, the Abbe constant of the thirteenth lens 113 is v13, and the Abbe constant of the fourteenth lens 114 is v15. The Abbe constant of the fifteenth lens 115 is v14, and the Abbe constant of the fifteenth lens 115 is v15, wherein: 70.3≤v1≤70.5, 63.2≤v2≤63.4, 70.3≤v3≤70.5, 36.3≤v4≤36.5, 36.3≤v5≤36.5, 363≤v6≤36.5, 70.3≤v7≤70.5, 81.5≤v8≤81.7, 81.5≤v9≤81.7, 81.5≤v10≤81.7, 40.8≤v11≤41.0, 81.5≤v12≤81.7, 63.2≤v13≤63.4, 63.2≤v14≤63.4, and 40.8≤v15≤41.0. Such an arrangement can significantly reduce chromatic aberration and improve imaging quality.

[0034] In one embodiment, the thickness of the first lens 101 is d1, the thickness of the second lens 102 is d2, the thickness of the third lens 103 is d3, the thickness of the fourth lens 104 is d4, the thickness of the fifth lens 105 is d5, the thickness of the sixth lens 106 is d6, the thickness of the seventh lens 107 is d7, the thickness of the eighth lens 108 is d8, the thickness of the ninth lens 109 is d9, the thickness of the tenth lens 110 is d10, the thickness of the eleventh lens 111 is d11, the thickness of the twelfth lens 112 is d12, the thickness of the thirteenth lens 113 is d13, the thickness of the fourteenth lens 114 is d14, and the thickness of the fifteenth lens 115 is d15, wherein: 29.47 mm ≤ d1 ≤ 30.47 mm, 28.87 mm m≤d2≤29.87mm, 18.7mm≤d3≤19.7mm, 29.32mm≤d4≤30.32mm, 10.95mm≤d5≤11.95mm, 12.02mm≤d6≤13.02mm, 23.28mm≤d7≤24.28mm, 28.5mm≤d8≤29.5mm, 27.57m m≤d9≤28.57mm, 23.49mm≤d10≤24.49mm, 16.49mm≤d11≤17.49mm, 21.29mm≤d12≤22.29mm, 19.4mm≤d13≤20.4mm, 28.07mm≤d14≤29.07mm, 6.73mm≤d15≤7.73mm.

[0035] In one embodiment, the distance between the first lens 101 and the second lens 102 is L1, the distance between the second lens 102 and the third lens 103 is L2, the distance between the third lens 103 and the fourth lens 104 is L3, the distance between the fourth lens 104 and the fifth lens 105 is L4, the distance between the fifth lens 105 and the sixth lens 106 is L5, the distance between the sixth lens 106 and the seventh lens 107 is L6, the distance between the seventh lens 107 and the eighth lens 108 is L7, the distance between the eighth lens 108 and the ninth lens 109 is L8, the distance between the ninth lens 109 and the tenth lens 110 is L9, the distance between the tenth lens 110 and the eleventh lens 111 is L10, the distance between the eleventh lens 111 and the twelfth lens 112 is L11, the distance between the twelfth lens 112 and the thirteenth lens 113 is L12, and the distance between the thirteenth lens 113 and the fourteenth lens The distance between the fourteenth lens 114 and the fifteenth lens 115 is L13, and the distance between the fourteenth lens 114 and the fifteenth lens 115 is L14, wherein: 12.53mm≤L1≤13.53mm, 0.38mm≤L2≤0.48mm, 0.25mm≤L3≤0.35mm, 2.45mm≤L4≤2.55mm, 25.16mm≤L5≤26.16mm, 38.13mm≤L6≤39.13mm, 22.22mm≤ L7≤23.22mm, 81.05mm≤L8≤82.05mm, 7.74mm≤L9≤8.74mm, 5.01mm≤L10≤6.01mm, 76.66mm≤L11≤77.66mm, 2.12mm≤L12≤2.22mm, 0.38mm≤L13≤0.48mm, 8.63mm≤L14≤9.63mm, 52.82mm≤L15≤53.82mm. Such a configuration makes the entire system more compact, convenient for installation and maintenance, reduces the impact of the external environment on the system, and improves the stability and reliability of the ultraviolet lithography lens 1000.

[0036] In one embodiment, the UV lithography lens 1000 further includes an aperture 201, which is disposed between the eighth lens 108 and the ninth lens 109. This arrangement can control the amount of light entering the lens and effectively control the propagation path of the UV light.

[0037] In one embodiment, the total optical length of the UV lithography lens 1000 is l, where l≤800 mm. This arrangement makes the entire system more compact and convenient for installation and maintenance.

[0038] In one embodiment, the object-side numerical aperture of the ultraviolet lithography lens 1000 is NA, NA = 0.13. With such a configuration, the ultraviolet lithography lens 1000 has a higher resolution and can capture details with higher precision.

[0039] The present invention also provides a photolithography machine, which includes a workbench, a mask plate 2000, an ultraviolet photolithography lens 1000 as described above, and an ultraviolet light source. The workbench is used to place a substrate 3000 to be processed; the mask plate 2000 is arranged above the workbench; the ultraviolet photolithography lens 1000 is arranged between the mask plate 2000 and the workbench; the ultraviolet light source is used to emit ultraviolet light toward the substrate, and the ultraviolet light passes through the mask plate 2000 and the ultraviolet photolithography lens 1000 in sequence to reach the substrate.

[0040] The technical solution of the present invention changes the propagation direction of the light beam by comprehensively setting the matching relationship between the optical focal length and shape of each lens, which is more conducive to the imaging of the light beam on the image plane, and sets all lenses as spherical lenses. The manufacturing process of spherical lenses is relatively simple, the production cost is low, and the tools and technical requirements required for installation are low. While maintaining accuracy, the difficulty and cost of assembling and adjusting the ultraviolet lithography lens 1000 are greatly reduced.

[0041] In one embodiment of the present invention, the basic parameters of the UV lithography lens 1000 are as follows:

[0042]

[0043]

[0044] In this embodiment, the total optical length of the lithography lens is not greater than 800 mm; the magnification is 0.5X; the object-side numerical aperture NA=0.13; the distortion is less than 300 nm; the telecentricity is less than 0.5°; the observation area is 22 mm×22 mm; the wavelength of ultraviolet light is 365±2.5 nm; and the lens operating temperature is 20±1°C.

[0045] See also Figure 2 , Figure 2 : This is the MTF curve diagram of the ultraviolet lithography lens of this embodiment. Different lines in the diagram represent light rays in each field of view. From the diagram, the curve is relatively smooth and compact. The MTF value represented by the curve is very high, basically reaching above 0.4, indicating that the aberration of the lens has been well corrected.

[0046] See also Figure 3 , Figure 3 is a point diagram of the ultraviolet lithography lens of this embodiment, showing the distribution of the intersection points of different light rays and the image plane in several given fields of view. Figure 3 It can be seen that the ultraviolet lithography lens provided in this embodiment can achieve good imaging quality.

[0047] See also Figure 4 , Figure 4 is a schematic diagram of the distortion curve of the ultraviolet lithography lens of this embodiment, Figure 4It can be seen that the field curvature values ​​of the embodiments are all within the range of ±8 μm, the distortion is within the range of 0.3 μm, and both the field curvature and astigmatism are well corrected.

[0048] The above description is only an exemplary embodiment of the present invention, and does not limit the patent scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification and drawings under the technical concept of the present invention, or directly / indirectly applied in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A UV lithography lens, characterized in that: The ultraviolet lithography lens has an object side and an image side which are arranged opposite to each other along an optical axis direction. The ultraviolet lithography lens includes a plurality of lenses arranged in sequence from the object side to the image side, and the plurality of lenses include a first lens with positive optical power, a second lens with positive optical power, a third lens with positive optical power, a fourth lens with positive optical power, a fifth lens with negative optical power, a sixth lens with negative optical power, a seventh lens with positive optical power, an eighth lens with positive optical power, a ninth lens with positive optical power, a tenth lens with positive optical power, an eleventh lens with negative optical power, a twelfth lens with positive optical power, a thirteenth lens with positive optical power, a fourteenth lens with positive optical power, and a fifteenth lens with negative optical power; wherein the plurality of lenses are all configured as spherical lenses.

2. The ultraviolet lithography lens as claimed in claim 1, characterized in that: The first lens is a concave-convex lens, and the object-side surface of the first lens is concave; the second lens is a concave-convex lens, and the object-side surface of the second lens is concave; the third lens is a concave-convex lens, and the object-side surface of the third lens is convex; the fourth lens is a concave-convex lens, and the object-side surface of the fourth lens is convex; the fifth lens is a concave-convex lens, and the object-side surface of the fifth lens is convex; the sixth lens is a biconcave lens; the seventh lens is a concave-convex lens, and the object-side surface of the seventh lens is concave; the eighth lens is a biconvex lens; the ninth lens is a biconvex lens; the tenth lens is a biconvex lens; the eleventh lens is a biconcave lens; the twelfth lens is a biconvex lens; the thirteenth lens is a biconvex lens; the fourteenth lens is a concave-convex lens, and the object-side surface of the fourteenth lens is convex; and the fifteenth lens is a biconcave lens.

3. The ultraviolet lithography lens as claimed in claim 1, characterized in that: The refractive index of the first lens is n1, the refractive index of the second lens is n2, the refractive index of the third lens is n3, the refractive index of the fourth lens is n4, the refractive index of the fifth lens is n5, the refractive index of the sixth lens is n6, the refractive index of the seventh lens is n7, the refractive index of the eighth lens is n8, the refractive index of the ninth lens is n9, the refractive index of the tenth lens is n10, the refractive index of the eleventh lens is n11, the refractive index of the twelfth lens is n12, the refractive index of the thirteenth lens is n13, the refractive index of the fourteenth lens is n14, and the refractive index of the fifteenth lens is n15. The refractive index is n15, where: 1.48≤n1≤1.50, 1.51≤n2≤1.53, 1.48≤n3≤1.50, 1.61≤n4≤1.63, 1.61≤n5≤1.63, 1.61≤n6≤1.63, 1.48≤n7≤1.50, 1.49≤n8≤1.51, 1.49≤n9≤1.51, 1.49≤n10≤1.51, 1.57≤n11≤1.59, 1.49≤n12≤1.51, 1.51≤n13≤1.53, 1.51≤n14≤1.53, and 1.57≤n15≤1.

59.

4. The ultraviolet lithography lens as claimed in claim 3, characterized in that: The Abbe constant of the first lens is v1, the Abbe constant of the second lens is v2, the Abbe constant of the third lens is v3, the focal Abbe constant of the fourth lens is v4, the Abbe constant of the fifth lens is v5, the Abbe constant of the sixth lens is v6, the Abbe constant of the seventh lens is v7, the Abbe constant of the eighth lens is v8, the Abbe constant of the ninth lens is v9, the Abbe constant of the tenth lens is v10, the Abbe constant of the eleventh lens is v11, the Abbe constant of the twelfth lens is v12, the Abbe constant of the thirteenth lens is v13, and the Abbe constant of the fourteenth lens is v14. The Abbe constant of the fifteenth lens is v15, wherein: 70.3≤v1≤70.5, 63.2≤v2≤63.4, 70.3≤v3≤70.5, 36.3≤v4≤36.5, 36.3≤v5≤36.5, 363≤v6≤36.5, 70.3≤v7≤70.5, 81.5≤v8≤81.7, 81.5≤v9≤81.7, 81.5≤v10≤81.7, 40.8≤v11≤41.0, 81.5≤v12≤81.7, 63.2≤v13≤63.4, 63.2≤v14≤63.4, and 40.8≤v15≤41.

0.

5. The ultraviolet lithography lens as claimed in claim 1, characterized in that: The thickness of the first lens is d1, the thickness of the second lens is d2, the thickness of the third lens is d3, the thickness of the fourth lens is d4, the thickness of the fifth lens is d5, the thickness of the sixth lens is d6, the thickness of the seventh lens is d7, the thickness of the eighth lens is d8, the thickness of the ninth lens is d9, the thickness of the tenth lens is d10, the thickness of the eleventh lens is d11, the thickness of the twelfth lens is d12, the thickness of the thirteenth lens is d13, the thickness of the fourteenth lens is d14, and the thickness of the fifteenth lens is d15, wherein: 29.47 mm≤d1≤30.47 mm, 28.87 mm≤d2≤29.87 mm , 18.7mm≤d3≤19.7mm, 29.32mm≤d4≤30.32mm, 10.95mm≤d5≤11.95mm, 12.02mm≤d6≤13.02mm, 23.28mm≤d7≤24.28mm, 28.5mm≤d8≤29.5mm, 27.57mm≤d9≤2 8.57mm, 23.49mm≤d10≤24.49mm, 16.49mm≤d11≤17.49mm, 21.29mm≤d12≤22.29mm, 19.4mm≤d13≤20.4mm, 28.07mm≤d14≤29.07mm, 6.73mm≤d15≤7.73mm.

6. The ultraviolet lithography lens as claimed in claim 5, characterized in that: The distance between the first lens and the second lens is L1, the distance between the second lens and the third lens is L2, the distance between the third lens and the fourth lens is L3, the distance between the fourth lens and the fifth lens is L4, the distance between the fifth lens and the sixth lens is L5, the distance between the sixth lens and the seventh lens is L6, the distance between the seventh lens and the eighth lens is L7, the distance between the eighth lens and the ninth lens is L8, the distance between the ninth lens and the tenth lens is L9, the distance between the tenth lens and the eleventh lens is L10, the distance between the eleventh lens and the twelfth lens is L11, the distance between the twelfth lens and the thirteenth lens is L12, the distance between the thirteenth lens and the fourteenth lens is L13, and the distance between the first lens and the twelfth lens is L14. The distance between the fourteenth lens and the fifteenth lens is L14, wherein: 12.53 mm ≤ L1 ≤ 13.53 mm, 0.38 mm ≤ L2 ≤ 0.48 mm, 0.25 mm ≤ L3 ≤ 0.35 mm, 2.45 mm ≤ L4 ≤ 2.55 mm, 25.16 mm ≤ L5 ≤ 26.16 mm, 38.13 mm ≤ L6 ≤ 39.13 mm, 22.22 mm ≤ L7 ≤ 23.22 mm m, 81.05mm≤L8≤82.05mm, 7.74mm≤L9≤8.74mm, 5.01mm≤L10≤6.01mm, 76.66mm≤L11≤77.66mm , 2.12mm≤L12≤2.22mm, 0.38mm≤L13≤0.48mm, 8.63mm≤L14≤9.63mm, 52.82mm≤L15≤53.82mm.

7. The ultraviolet lithography lens as claimed in claim 1, characterized in that: The ultraviolet lithography lens also includes an aperture, and the aperture is arranged between the eighth lens and the ninth lens.

8. The ultraviolet lithography lens as claimed in claim 1, characterized in that: The total optical length of the ultraviolet lithography lens is l, where l≤800mm.

9. The ultraviolet lithography lens as claimed in claim 1, characterized in that: The object side numerical aperture of the ultraviolet photolithography lens is NA, NA=0.

13.

10. A photolithography machine, characterized in that: The lithography machine comprises: A workbench for placing the substrate to be processed; A mask plate is arranged above the workbench; The ultraviolet lithography lens according to any one of claims 1 to 9, wherein the ultraviolet lithography lens is disposed between the mask and the workbench; and The ultraviolet light source is used to emit ultraviolet light toward the substrate, and the ultraviolet light passes through the mask and the ultraviolet photolithography lens in sequence to reach the substrate.

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