Compound, anti-reflective film comprising same, and display device

Abstract

Provided are a compound represented by Chemical Formula 1, an anti-reflective film including the same, and a display device including the anti-reflective film. (In the formula, the substituents in Chemical Formula 1 are as defined in the specification. ) [Chemical Formula 1] # imgabs0 #

Description

Technical Field

[0001] The present disclosure relates to a compound, an anti-reflection film including the compound, and a display device including the anti-reflection film. Background Art

[0002] In the field of new displays using light-emitting materials (eg, quantum dots, organic / inorganic phosphors, etc.) as well as conventional liquid crystal displays (such as LCDs, etc.), anti-reflection films are applied to improve external light reflection caused by scatterers.

[0003] In order to prevent external light reflection and emission from panel constituent materials, the dye type anti-reflection film uses a dye that absorbs and blocks light in a specific absorption wavelength region.

[0004] In particular, in the field of new displays, research is underway to introduce an anti-reflection film to which functions such as (particularly, blue) brightness loss suppression and color correction are added. Specifically, dyes that absorb and block mixed light of purple light / cyan light / neon light / near-infrared light to minimize degradation of the RGB color purity of the panel and reduce light reflectivity in the entire absorption wavelength region can be applied to the anti-reflection film.

[0005] In this regard, cyanine-based dyes, azo-based dyes, and the like are known, but may absorb light only in a short wavelength region, and also have problems in light resistance reliability. Summary of the invention

[0006] Technical issues

[0007] One embodiment provides a compound having excellent properties such as solubility, release resistant property, and migration inhibition while ensuring photostable reliability.

[0008] Another embodiment provides an antireflection film including the compound.

[0009] Another embodiment provides a display device including the anti-reflection film.

[0010] Technical Solution

[0011] One embodiment provides a compound represented by Chemical Formula 1.

[0012] [Chemical formula 1]

[0013]

[0014] In Chemical Formula 1,

[0015] M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a hydroxide metal atom or a metal oxide atom;

[0016] R 1 To R 8 are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group;

[0017] R 9 To R 28 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and

[0018] R 9 To R 28 At least one of the groups is a C1 to C20 alkoxy group having a terminal substituted with a (meth)acrylate group.

[0019] M may be V(=O), Cu, Co, Zn or Ag.

[0020] R 1 To R 8 They may be hydrogen atoms.

[0021] R 9 To R 13 At least two of R 14 To R 18 One or two or more of R 19 To R 23 At least two of the 24 To R 28 One or two or more of the may be independently substituted or unsubstituted C1 to C20 alkoxy groups, wherein R 9 To R 28 At least one of the may be substituted with a (meth)acrylate group at a terminal.

[0022] In R 9 To R 13 In the above, two or more functional groups which are substituted or unsubstituted C1 to C20 alkoxy groups may be bonded to each other at the ortho position, and in R 19 To R 23 In the above, two or more functional groups which are substituted or unsubstituted C1 to C20 alkoxy groups may be bonded to each other at ortho positions.

[0023] The compound can be represented by Chemical Formula 1-1 or 1-2:

[0024] [Chemical formula 1-1]

[0025]

[0026] In Chemical Formula 1-1,

[0027] R 31 To R 38 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and

[0028] R 31 To R 38 At least one of them is a C1 to C20 alkyl group having a terminal substituted with (meth)acrylate;

[0029] [Chemical formula 1-2]

[0030]

[0031] In Chemical Formula 1-2,

[0032] R 41 To R 46 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and

[0033] R 41 To R 46 At least one of the groups is a C1 to C20 alkyl group having a terminal substituted with a (meth)acrylate.

[0034] R 31 To R 38 At least two of them may be C1 to C10 alkyl groups having a terminal substituted with (meth)acrylate.

[0035] In R 31 To R 38 In the above, the functional group other than the C1 to C10 alkyl group having a terminal substituted with a (meth)acrylate may be a C4 to C10 branched alkyl group.

[0036] R 41 To R 46At least two of them may be C1 to C10 alkyl groups having a terminal substituted with (meth)acrylate.

[0037] In R 41 To R 46 In the above, the functional group other than the C1 to C10 alkyl group having a terminal substituted with a (meth)acrylate may be a C4 to C10 branched alkyl group.

[0038] The compound may be selected from the group comprising:

[0039] [Chemical formula 1-1-1]

[0040]

[0041] [Chemical formula 1-1-2]

[0042]

[0043] [Chemical formula 1-1-3]

[0044]

[0045] [Chemical formula 1-1-4]

[0046]

[0047] [Chemical formula 1-1-5]

[0048]

[0049] [Chemical formula 1-1-6]

[0050]

[0051] [Chemical formula 1-1-7]

[0052]

[0053] [Chemical formula 1-1-8]

[0054]

[0055] [Chemical formula 1-2-1]

[0056]

[0057] [Chemical formula 1-2-2]

[0058]

[0059] [Chemical formula 1-2-3]

[0060]

[0061] [Chemical formula 1-2-4]

[0062]

[0063] [Chemical formula 1-2-5]

[0064]

[0065] [Chemical formula 1-2-6]

[0066]

[0067] [Chemical formula 1-2-7]

[0068]

[0069] [Chemical formula 1-2-8]

[0070]

[0071] [Chemical formula 1-2-9]

[0072]

[0073] [Chemical formula 1-2-10]

[0074]

[0075] The maximum absorption wavelength (λmax) of the compound may be 420 nm to 440 nm.

[0076] The compound may be a color material used for electronic materials.

[0077] Another embodiment provides an antireflection film including the compound.

[0078] The anti-reflection film may include an adhesive layer and an anti-reflection layer formed on the adhesive layer, and the compound may be included in the adhesive layer.

[0079] The anti-reflection film may include an adhesive layer, a dye-containing layer, and an anti-reflection layer formed on the dye-containing layer, and the compound may be included in the adhesive layer, the dye-containing layer, or both.

[0080] Another embodiment provides a display device including the anti-reflection film.

[0081] Other embodiments of the invention are included in the detailed description below.

[0082] Beneficial Effects

[0083] According to the above-mentioned embodiments, the compound has excellent properties such as solubility, release resistance and migration inhibition, while ensuring light resistance reliability. Therefore, a display device including the compound of the above-mentioned embodiment in an anti-reflection film can have suppressed brightness loss and improved panel color reproducibility. BRIEF DESCRIPTION OF THE DRAWINGS

[0084] Figure 1 and Figure 2 are schematic diagrams each independently showing an antireflection film according to one embodiment.

[0085] Figure 3 and Figure 4 are schematic diagrams each independently showing a display device according to an embodiment. DETAILED DESCRIPTION

[0086] Hereinafter, embodiments of the present invention are described in detail. However, these embodiments are exemplary, and the present disclosure is not limited thereto.

[0087] As used herein, when a specific definition is not otherwise provided, “alkyl” refers to a C1 to C20 alkyl group, “alkenyl” refers to a C2 to C20 alkenyl group, “cycloalkenyl” refers to a C3 to C20 cycloalkenyl group, “heterocycloalkenyl” refers to a C3 to C20 heterocycloalkenyl group, “aryl” refers to a C6 to C20 aryl group, “aralkyl” refers to a C6 to C20 aralkyl group, “alkylene” refers to a C1 to C20 alkylene group, “arylene” refers to a C6 to C20 arylene group, “alkylarylene” refers to a C6 to C20 alkylarylene group, “heteroarylene” refers to a C3 to C20 heteroarylene group, and “alkyleneoxy” refers to a C1 to C20 alkyleneoxy group.

[0088] As used herein, when no specific definition is otherwise provided, “substituted” means that at least one hydrogen atom is replaced by a halogen atom (F, Cl, Br or I), a hydroxyl group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, an azido group, a carbamimido group, a hydrazine group, a hydrazo group, a carbonyl group, a carbamoyl group, a thiol group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C20 aryl group, a C3 to C20 cycloalkyl group, a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, a C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C20 heteroaryl group, or a combination thereof.

[0089] Furthermore, as used herein, when a specific definition is not otherwise provided, “hetero” means that a chemical formula includes at least one hetero atom of at least one of N, O, S, and P.

[0090] As used herein, when no specific definition is otherwise provided, “(meth)acrylate” refers to both “acrylate” and “methacrylate”, and “(meth)acrylic acid” refers to both “acrylic acid” and “methacrylic acid”.

[0091] As used herein, when no specific definition is otherwise provided, the term "combination" means mixing or copolymerization.

[0092] As used herein, when no definition is otherwise provided, when a chemical bond is not drawn at a position where a chemical bond should be drawn, then a hydrogen is bonded at that position.

[0093] When describing a numerical range in the present specification, “X to Y” means “X or more and Y or less” (X≤ and ≤Y).

[0094] In the present specification, when describing a range other than a numerical range, "X to Y" means "from X to Y."

[0095] In this specification, the "maximum absorption wavelength (λ max )" refers to the wavelength at which the maximum absorbance occurs when the absorbance is measured for a solution of the compound (dye) at a concentration of 10 ppm in cyclohexanone. The above maximum absorbance can be measured according to methods known to those skilled in the art.

[0096] In this specification, the xenon test chamber (Q-SUN) was used to test the 2 The light transmittance at the maximum absorption wavelength of the dye before and after irradiating the display device was measured under the conditions of [irradiation temperature: 63°C, irradiation time: 500 hours, irradiation direction: irradiation toward the anti-reflection film], and then the change in light transmittance was evaluated to evaluate the "light resistance reliability".

[0097] As used herein, when a specific definition is not otherwise provided, "**" refers to a point of attachment to the same or different atom or chemical formula.

[0098] One embodiment provides a compound represented by Chemical Formula 1.

[0099] [Chemical formula 1]

[0100]

[0101] In Chemical Formula 1,

[0102] M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a hydroxide metal atom or an oxide metal atom;

[0103] R1 To R 8 are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group;

[0104] R 9 To R 28 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and

[0105] R 9 To R 28 At least one of the groups is a C1 to C20 alkoxy group having a terminal substituted with a (meth)acrylate group.

[0106] In a typical liquid crystal display (LCD), light emitted from a white light source passes through an RGB color filter of each pixel to form sub-pixels of each color and combine them, thereby realizing colors within the RGB range.

[0107] Recently, new displays using light-emitting materials (e.g., quantum dots, organic / inorganic phosphors, etc.) that emit the color of each sub-pixel are being developed. In this regard, methods of exciting the light-emitting material (such as blue, green, red, etc.) of each sub-pixel are being suggested, such as a method using a UV light source, a method using a blue light source, etc.

[0108] At the same time, in order to improve the reflection of external light caused by scatterers in new displays as well as conventional liquid crystal displays, anti-reflection films are introduced, and in particular, in the field of new displays, research is being conducted on the introduction of anti-reflection films to which (especially blue) brightness loss suppression functions, color correction functions, etc. are added.

[0109] Specifically, the dye applied to the anti-reflection film can be a dye that absorbs and blocks mixed light of purple light (absorption wavelength region: 350nm to 450nm) / cyan light (absorption wavelength region: 480nm to 520nm) / neon light (absorption wavelength region: 530nm to 670nm) / near infrared light (absorption wavelength region: 605nm to 790nm) and reduces the light reflectivity of the entire absorption wavelength region to minimize the degradation of the RGB color purity of the panel. In addition, for the dye applied to the anti-reflection film, it is necessary to use a dye that ensures the reliability of light transmittance changes according to conditions such as light resistance, heat resistance, moisture resistance, etc.

[0110] In this regard, cyanine-based dyes, azo-based dyes, and the like are known, which can absorb only light in a short wavelength region and also have problems in light resistance reliability.

[0111] The compound of one embodiment, which is a porphyrin-based dye type, can absorb light at wavelengths over three or more regions in mixed light by one compound.

[0112] Although described in more detail later, the compound of one embodiment can absorb light at wavelengths of 350nm to 480nm and 500nm to 550nm, wherein, since the compound has a maximum absorption wavelength at 420nm to 440nm in the absorption wavelength region, the degradation of the brightness (particularly, in the blue region) of an anti-reflective film and a display device containing the compound can be minimized and light resistance reliability can be ensured.

[0113] On the other hand, conventionally known porphyrin-based dyes have disadvantages of reduced solubility, release resistance, etc., and color shift.

[0114] The compound of one embodiment is a porphyrin dye type, but a C1 to C20 alkoxy group is introduced into R 9 To R 28 In order to improve solubility. 9 To R 28 A (meth)acrylate group is introduced into the terminal of at least one functional group in order to suppress color transfer and improve release resistance.

[0115] In summary, a compound of one embodiment of one of the porphyrin-based dyes can absorb light on three or more wavelength regions in mixed light to minimize the degradation of the RGB color purity of the panel and reduce the light reflectivity of the entire absorption wavelength region, and ultimately suppress the brightness loss of a display device including the compound of one embodiment in an anti-reflection film and improve the color reproducibility of the panel.

[0116] Furthermore, by introducing a functional group, which is a C1 to C20 alkoxy group substituted with a (meth)acrylate group at the terminal, into R 9 To R 28 At least one of the above embodiments can overcome the disadvantages of porphyrin dyes and achieve excellent properties such as solubility, light resistance reliability, release resistance, and migration inhibition.

[0117] Hereinafter, the compounds of the embodiments will be described in more detail.

[0118] M may be V(=O), Cu, Co, Zn or Ag.

[0119] In particular, when the above-mentioned M is V(=O), it can contribute to improving characteristics such as light resistance reliability, release resistance, and migration suppression.

[0120] R 1 To R 8 They may be hydrogen atoms.

[0121] When one or more polar functional groups are introduced into the benzene ring of a porphyrin-based dye, properties such as solubility, release resistance, and migration inhibition can be improved.

[0122] Specifically, R 9 To R 13 At least two of R 14 To R 18 One or two or more of R 19 To R 23 At least two of the 24 To R 28 One or two or more of the may be independently substituted or unsubstituted C1 to C20 alkoxy groups, wherein R 9 To R 28 At least one of the may be substituted with a (meth)acrylate group at a terminal.

[0123] In this paper, R 9 To R 13 Two or more functional groups which are substituted or unsubstituted C1 to C20 alkoxy groups in the above-mentioned group may be bonded to each other at the ortho position, and R 19 To R 23 Two or more functional groups which are substituted or unsubstituted C1 to C20 alkoxy groups in the alkoxy group may be bonded to each other at ortho positions.

[0124] More specifically, the compound may be represented by Chemical Formula 1-1 or 1-2:

[0125] [Chemical formula 1-1]

[0126]

[0127] In Chemical Formula 1-1,

[0128] R 31 To R 38 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and

[0129] R 31 To R 38 At least one of them is a C1 to C20 alkyl group having a terminal substituted with (meth)acrylate;

[0130] [Chemical formula 1-2]

[0131]

[0132] In chemical formula 1-2,

[0133] R 41 To R 46 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and

[0134] R 41 To R 46 At least one of the groups is a C1 to C20 alkyl group having a terminal substituted with a (meth)acrylate.

[0135] When the compound of the above embodiment is represented by Chemical Formula 1-1, R 31 To R 38 At least two of the R 31 To R 38 In the above, the functional group other than the C1 to C10 alkyl group whose terminal is substituted with (meth)acrylate may be a C4 to C10 branched alkyl group.

[0136] When the compound of the above embodiment is represented by Chemical Formula 1-2, R 41 To R 46 At least two of the R 41 To R 46 In the above, the functional group other than the C1 to C10 alkyl group whose terminal is substituted with (meth)acrylate may be a C4 to C10 branched alkyl group.

[0137] The compound of the above embodiment may be selected from the group consisting of: [Chemical Formula 1-1-1]

[0138]

[0139] [Chemical formula 1-1-2]

[0140]

[0141] [Chemical formula 1-1-3]

[0142]

[0143] [Chemical formula 1-1-4]

[0144]

[0145] [Chemical formula 1-1-5]

[0146]

[0147] [Chemical formula 1-1-6]

[0148]

[0149] [Chemical formula 1-1-7]

[0150]

[0151] [Chemical formula 1-1-8]

[0152]

[0153] [Chemical formula 1-2-1]

[0154]

[0155] [Chemical formula 1-2-2]

[0156]

[0157] [Chemical formula 1-2-3]

[0158]

[0159] [Chemical formula 1-2-4]

[0160]

[0161] [Chemical formula 1-2-5]

[0162]

[0163] [Chemical formula 1-2-6]

[0164]

[0165] [Chemical formula 1-2-7]

[0166]

[0167] [Chemical formula 1-2-8]

[0168]

[0169] [Chemical formula 1-2-9]

[0170]

[0171] [Chemical formula 1-2-10]

[0172]

[0173] The compound of one embodiment may absorb light at wavelengths of 350 nm to 480 nm and 500 nm to 550 nm, wherein the maximum absorption wavelength (λmax) may be 425 nm to 440 nm, and specifically, 425 nm to 435 nm.

[0174] Considering the spectrum of the blue light source, in order to improve the color reproducibility of the panel, it is desirable to effectively absorb the light in the short wavelength region (about 430nm or greater) of the blue light source. In other words, since the maximum absorption wavelength of the dye applied to the anti-reflection film is closer to 430nm, the light in the short wavelength region of the blue light source can be effectively absorbed.

[0175] The compound of one embodiment can absorb light of 350nm to 480nm and 500nm to 550nm wavelength. In particular, compared with commonly known porphyrin dyes, the compound of one embodiment can have a maximum absorption wavelength (λmax) moving to the long wavelength region, and therefore ranges from 425nm to 440nm, and specifically, 425nm to 435nm.

[0176] Therefore, the compound of one embodiment can effectively absorb light in the short wavelength region of the blue light source, thereby effectively improving the color reproducibility of the panel and ensuring light resistance reliability. In addition, the brightness loss of the display device including the compound of one embodiment in the anti-reflection film can be suppressed and the improved panel color reproducibility is shown.

[0177] The compound of one embodiment may be a colored material for electronic materials.

[0178] In this document, "electronic materials" are not particularly limited, but may be materials used in: ordinary liquid crystal display devices such as liquid crystal displays (LCDs); light-emitting display devices using light-emitting materials such as quantum dots, organic / inorganic phosphors, etc.; image sensors such as charge coupled devices (CCDs) and CMOS (complementary metal oxide semiconductor) image sensors; electronic or electrical components such as prepregs, resin sheets, build-up materials, non-conductive films, metal foil-clad laminates, and printed wiring boards; and the like.

[0179] Specifically, the compound of one embodiment may be a dye applied to an antireflection film for a general liquid crystal display device, a light-emitting display device, etc. In particular, the compound of one embodiment is applied to an antireflection film of a light-emitting display device to suppress brightness loss and improve panel color reproducibility.

[0180] Another embodiment provides an antireflection film including the compound.

[0181] Based on the solid content, the anti-reflection film may include the compound of one embodiment in an amount of 0.001 wt % to 0.5 wt %. Within this range, it is easy to adjust the panel color tone of the display device to which the anti-reflection film is applied, and the dye can be mixed with another dye having a different absorption region to improve black visibility (neutral black).

[0182] The anti-reflection film includes an adhesive layer and an anti-reflection layer formed on the adhesive layer, and the compound of one embodiment may be included in the adhesive layer.

[0183] In addition, the antireflection film includes an adhesive layer, a dye-containing layer, and an antireflection layer formed on the dye-containing layer, and the compound of one embodiment may be included in the adhesive layer, the dye-containing layer, or both.

[0184] That is, in the stacked structure of the antireflection film according to the above embodiment, the compound of the above embodiment may be included in the adhesive layer, or may be included in a separate dye-containing layer. (See Figure 1 and Figure 2 )

[0185] The anti-reflection layer may consist of only the low-refractive layer or may include the low-refractive layer.

[0186] The low-refractive layer can reduce the reflectivity of the anti-reflection film due to a difference in refractive index between a substrate and / or a high-refractive layer described later.

[0187] The low refractive layer may include a curable binder resin, a fluorine-containing monomer, and fine particles (eg, hollow silica) having an average particle size of 5 nm to 300 nm, and the thickness of the low refractive layer may be 0.01 μm to 0.15 μm. The refractive index of the low refractive layer may be 1.20 to 1.40.

[0188] By further forming a functional coating on one surface of the low-refractive layer (i.e., on the upper surface of the low-refractive layer), additional functions can be imparted to the anti-reflective film. The functional coating may include an anti-fingerprint layer, an antistatic layer, a hard coating, an anti-glare layer, a barrier layer, etc., but is not limited thereto.

[0189] The anti-reflection layer may also include a high refractive layer.

[0190] The high refractive layer is formed between the substrate and the low refractive layer to be described later, and has a refractive index between the substrate and the low refractive layer, thereby reducing the reflectivity of the anti-reflection layer. The high refractive layer is directly formed with the substrate and the low refractive layer respectively. "Directly formed" means that there is no other layer between the layers.

[0191] The high refractive layer has a thickness of 0.05 to 20 μm, a refractive index of 1.45 to 2, and a haze value specified in JIS-K7361 that is the same as or differs from that of the substrate by 10% or less, which is excellent in transparency and excellent in antireflection characteristics.

[0192] The hard coating layer increases the hardness of the anti-reflection layer so that even if the anti-reflection layer is used on the outermost surface of the display device, scratches may not be generated. It is not necessary to provide the hard coating layer. If the target hardness is ensured in the high or low refractive layer, the hard coating layer can be omitted.

[0193] A hard coating layer may be formed between the substrate and the high-refractive layer or between the substrate and the low-refractive layer.

[0194] The hard coating layer may be a cured layer formed by uniformly mixing ultrafine metal oxide particles having an average particle size of 1 nm to 30 nm and a particle size distribution range of less than or equal to ±5 nm in a cured binder. The hard coating layer may have a thickness of 1 μm to 15 μm, and a refractive index of the hard coating layer may be greater than or equal to 1.54.

[0195] The anti-reflection layer may have a thickness of 50 μm to 500 μm, for example, 50 μm to 300 μm, for example, 50 μm to 150 μm. When the anti-reflection layer has a thickness within the above range, it may be easily applied to a display device.

[0196] An adhesive layer may be formed on a lower surface of the anti-reflection layer to adhere an optical member such as a display to a panel, etc. As described above, the adhesive layer may include the compound represented by Chemical Formula 1 (dye).

[0197] The adhesive layer may have a glass transition temperature of -70° C. to 0° C., for example, -65° C. to -20° C. When the glass transition temperature of the adhesive layer is within the above range, adhesion to the panel may be improved.

[0198] The adhesive layer may be a thermosetting adhesive layer or a photocurable adhesive layer. Desirably, since the adhesive layer becomes a thermosetting adhesive layer, it is not necessary to consider the influence of ultraviolet rays caused by the absorption wavelength of the compound (dye) represented by Chemical Formula 1, thereby facilitating the manufacture of the adhesive layer. The "thermosetting adhesive layer" may include not only an adhesive layer cured by a predetermined heat treatment at 40°C to 100°C, but also an adhesive layer cured at room temperature (e.g., 20°C to 30°C).

[0199] The adhesive layer may be formed of a composition for an adhesive layer including an adhesive resin and a curing agent.

[0200] As long as the glass transition temperature of the adhesive layer can be ensured, the type of adhesive resin is not limited. For example, the adhesive resin can be a silicone resin, a polyurethane resin, a (meth) acrylic resin, etc., but desirably, a (meth) acrylic adhesive resin can be used.

[0201] The adhesive resin may have a glass transition temperature of -70° C. to 0° C. (desirably, -65° C. to -20° C.) When the glass transition temperature of the adhesive resin has the above range, adhesion to the panel may be improved.

[0202] The adhesive resin may have a weight average molecular weight of 500,000 g / mol to 2,000,000 g / mol, for example, 800,000 g / mol to 1,500,000 g / mol. When the weight average molecular weight of the adhesive resin has the above range, adhesion to the panel may be improved.

[0203] The adhesive resin may include a copolymer, desirably, a random copolymer of at least one of: a (meth)acrylic monomer having an alkyl group, a (meth)acrylic monomer having a hydroxyl group, a (meth)acrylic monomer having an aromatic group, a (meth)acrylic monomer having an alicyclic group, and a (meth)acrylic monomer having a heteroalicyclic group.

[0204] The (meth) acrylic acid monomer with an alkyl group may include a (meth) acrylic acid ester with an unsubstituted C1 to C10 alkyl group. Specifically, the (meth) acrylic acid monomer with an alkyl group may include one or more of the following: methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, tert-butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, nonyl (meth) acrylate, and decyl (meth) acrylate, but is not limited thereto. These monomers may be included individually or in a combination of two or more. The (meth) acrylic acid monomer with an alkyl group may be included in an amount of 60wt% to 99.99wt% (e.g., 60wt% to 90wt%, e.g., 80wt% to 99.9wt%) of the monomer mixture.

[0205] The (meth) acrylic monomer with hydroxyl group may include one or more of the following: a (meth) acrylic monomer with a C1 to C20 alkyl group having at least one hydroxyl group, a (meth) acrylic monomer with a C3 to C20 cycloalkyl group having at least one hydroxyl group, and a (meth) acrylic monomer with a C6 to C20 aromatic group having at least one hydroxyl group. Specifically, the (meth) acrylic monomer with a hydroxyl group may desirably be a (meth) acrylic monomer with a C1 to C20 alkyl group having at least one hydroxyl group, and may include one or more of (meth) 2-hydroxyethyl acrylate, (meth) 2-hydroxypropyl acrylate, (meth) 2-hydroxybutyl acrylate, (meth) 4-hydroxybutyl acrylate, (meth) 6-hydroxyhexyl acrylate, (meth) 1-chloro-2-hydroxypropyl acrylate. These monomers may be included individually or in a combination of two or more. The (meth) acrylic monomer with a hydroxyl group may be included in an amount of 0.01wt% to 20wt% (e.g., 0.1wt% to 10wt%) of the monomer mixture.

[0206] The (meth) acrylic monomer having an aromatic group may include a (meth) acrylic ester having a C6 to C20 aromatic group or a C7 to C20 aralkyl group. Specifically, the (meth) acrylic monomer having an aromatic group may include, but is not limited to, phenyl (meth) acrylate, benzyl (meth) acrylate, and the like. The (meth) acrylic monomer having an aromatic group may be included in an amount of 0 wt % to 50 wt % (e.g., 0 wt % to 20 wt %) of the monomer mixture.

[0207] In the present specification, when an alicyclic group and an alkyl group are mixed in these monomers, it is classified as a (meth)acrylic monomer having an alicyclic group.

[0208] The (meth) acrylic monomer having an alicyclic group may be a (meth) acrylic ester having a C5 to C20 monocyclic or heterocyclic alicyclic group, and may include at least one of cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentyl (meth) acrylate, methylcyclohexyl (meth) acrylate, and dicyclopentenyl (meth) acrylate. The (meth) acrylic monomer having an alicyclic group may be included in an amount of 0 wt % to 50 wt % (e.g., 1 wt % to 30 wt % or 1 wt % to 20 wt %) of the monomer mixture.

[0209] The (meth) acrylic monomer having a heteroalicyclic group may include a (meth) acrylic ester having a C4 to C9 heteroalicyclic group containing at least one of nitrogen, oxygen or sulfur. Specifically, the (meth) acrylic monomer having a heteroalicyclic group may include (meth) acryloyl morpholine, but is not limited thereto. The (meth) acrylic monomer having a heteroalicyclic group may be included in an amount of 0wt% to 50wt% (e.g., 0wt% to 10wt%) of the monomer mixture.

[0210] The adhesive resin may include a (meth) acrylic copolymer containing the following monomer mixture: 70 wt % to 99.99 wt % (e.g., 90 wt % to 99.5 wt %) of a (meth) acrylic monomer having an alkyl group, 0.01 wt % to 30 wt % (e.g., 0.5 wt % to 10 wt %) of a (meth) acrylic monomer having a hydroxyl group. When each monomer constituting the adhesive resin has the above range, adhesive strength can be easily ensured.

[0211] The curing agent may include an isocyanate curing agent. Based on 100 parts by weight of the adhesive resin, the curing agent may be included in an amount of 0.01 to 20 parts by weight (e.g., 0.01 to 10 parts by weight, e.g., 0.1 to 4 parts by weight). When the curing agent has the above range, the composition can be cross-linked to form an adhesive layer and prevent the transparency reduction and poor reliability caused by its excessive use.

[0212] The composition may also include conventional additives such as silane coupling agents, antioxidants, tackifying resins, plasticizers, antistatic agents, rework agents, and curing catalysts. Based on 100 parts by weight of the adhesive resin, the silane coupling agent may be included in an amount of 0.01 to 20 parts by weight (e.g., 0.01 to 10 parts by weight, e.g., 0.1 to 4 parts by weight). When the silane coupling agent has the above range, adhesion may be controlled and reliability defects may be prevented.

[0213] The composition for the adhesive layer may be a solvent-free type or may further contain a conventional organic solvent to improve coating properties.

[0214] The adhesive layer may have a thickness of 1 μm to 50 μm (eg, 5 μm to 25 μm). When the adhesive layer has a thickness within the above range, it may be easily used in a display device.

[0215] According to another embodiment, a display device including an anti-reflection film is provided. For example, a display device including an anti-reflection film and a layer containing quantum dots may be provided.

[0216] For example, the display device may further include a light source, a color filter, and a substrate.

[0217] For example, the display device may have a stacked structure in which a layer containing quantum dots may be disposed on a light source, a color filter may be disposed on the layer containing quantum dots, a substrate may be disposed on the color filter, and an antireflection film may be disposed on the substrate (see Figure 3 and Figure 4 ).

[0218] For example, the light source may be a blue light source.

[0219] For example, the substrate may be a glass substrate.

[0220] The components constituting the quantum dot-containing layer may include, in addition to the quantum dots, a binder resin, a reactive unsaturated compound, a photopolymerization initiator, a diffusing agent, and other additives which will be described later.

[0221] The quantum dots may have a full width at half maximum (FWHM) in the range of 20 nm to 100 nm (e.g., 20 nm to 50 nm). When the quantum dots have a full width at half maximum (FWHM) in this range, the quantum dots have high color purity and thus have an effect on increasing color reproducibility when used as a colored material in a color filter.

[0222] The quantum dots may be organic materials, inorganic materials, or a mixture (hybrid) of organic and inorganic materials.

[0223] The quantum dots may each independently include a core and a shell surrounding the core, and in this article, the core and the shell may have the following structures, such as each independently including a core of group II-IV, group III-V, etc., core / shell, core / first shell / second shell, alloy, alloy / shell, etc., but are not limited thereto.

[0224] For example, the core may include at least one material selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof, but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not necessarily limited thereto.

[0225] In one embodiment, since environmental concerns have greatly increased worldwide recently and regulations on toxic materials have also been strengthened, cadmium-free luminescent materials (InP / ZnS) with little low quantum efficiency (quantum yield) but environmentally friendly are used to replace luminescent materials with cadmium-like cores, but are not necessarily limited to this.

[0226] The quantum dot having a core / shell structure may have an entire size (average particle diameter) including a shell of 1 nm to 15 nm (eg, 5 nm to 15 nm), but the structure thereof is not particularly limited.

[0227] For example, the quantum dots can be red quantum dots, green quantum dots, or a combination thereof. For example, the quantum dots can include both green quantum dots and red quantum dots. In this case, the green quantum dots can be included in an amount greater than the red quantum dots. The red quantum dots can have an average particle size of 10 nm to 15 nm. The green quantum dots can have an average particle size of 5 nm to 8 nm.

[0228] At the same time, for the dispersion stability of quantum dots, dispersants can be used together. Dispersants can help light conversion materials such as quantum dots to be uniformly dispersed in curable compositions and include nonionic, anionic or cationic dispersants. Specifically, dispersants can include polyalkylene glycols or their esters, polyoxyalkylenes, polyol ester alkylene oxide addition products, alcohol alkylene oxide addition products, sulfonates, sulfonates, carboxylates, carboxylates, alkylamide alkylene oxide addition products, and alkylamines. They can be used individually or as a mixture of two or more. Based on the solid content of light conversion materials such as quantum dots, dispersants can be used in an amount of 0.1wt% to 100wt% (e.g., 10wt% to 20wt%).

[0229] The quantum dots may be included in an amount of 1 to 40 parts by weight (e.g., 1 to 10 parts by weight) based on 100 parts by weight of the components constituting the layer containing the quantum dots. When the quantum dots are included within the above range, the light conversion efficiency is improved without damaging the pattern characteristics and the development characteristics, thereby obtaining excellent processability.

[0230] The binder resin may include acrylic resin, epoxy resin, or a combination thereof.

[0231] The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including at least one acrylic acid repeating unit.

[0232] The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer including at least one carboxyl group. Examples of the monomer include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

[0233] The first ethylenically unsaturated monomer may be included in an amount of 5 wt % to 50 wt %, for example, 10 wt % to 40 wt %, based on the total amount of the acrylic binder resin.

[0234] The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether, etc.; an unsaturated carboxylic acid ester compound such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, etc.; an unsaturated carboxylic acid aminoalkyl ester compound such as 2-aminoethyl (meth)acrylate, 2-dimethylaminoethyl (meth)acrylate, etc.; a carboxylic acid vinyl ester compound such as vinyl acetate, vinyl benzoate, etc.; an unsaturated carboxylic acid glycidyl ester compound such as glycidyl (meth)acrylate, etc.; a vinyl cyanide compound such as (meth)acrylonitrile, etc.; an unsaturated amide compound such as (meth)acrylamide, etc.; etc. These monomers may be used alone or in a mixture of two or more.

[0235] Specific examples of acrylic resins may be polybenzyl methacrylate, (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / styrene copolymer, (meth) acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, etc., but are not limited thereto. These may be used alone or in mixtures of two or more.

[0236] The acrylic resin may have a weight average molecular weight of about 1,000 g / mol to about 15,000 g / mol. When the acrylic resin has a weight average molecular weight within this range, close contact characteristics with a substrate and physical and chemical properties are improved, and viscosity is suitable.

[0237] The epoxy resin may be a thermally polymerizable monomer or oligomer, and may include a compound having a carbon-carbon unsaturated bond and a carbon-carbon cyclic bond.

[0238] The epoxy resin may also include bisphenol A epoxy resin, bisphenol F epoxy resin, phenol novolac epoxy resin, cyclic aliphatic epoxy resin, and aliphatic polyglycidyl ether, but is not necessarily limited thereto.

[0239] Commercially available products of the compound may be YX4000, YX4000H, YL6121H, YL6640 or YL6677 of Yuka Shell Epoxy Co., Ltd.; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025 or EOCN-1027 of Nippon Kayaku Co., Ltd. and EPIKOTE 180S75 of Yuka Shell Epoxy Co., Ltd.; bisphenol A epoxy resins such as EPIKOTE 1001, 1002, 1003, 1004, 1007, 1009, 1010 and 828 of Yuka Shell Epoxy Co., Ltd.; bisphenol F epoxy resins such as EPIKOTE 1010 of Yuka Shell Epoxy Co., Ltd. 807 and 834; phenol novolac epoxy resins such as EPIKOTE 152, 154 or 157H65 of Yuka Shell Epoxy Co., Ltd. and EPPN 201, 202 of Nippon Kayaku Co. Ltd.; cycloaliphatic epoxy resins such as CY175, CY177 and CY179 of CIBA-GEIGY AG Corp.; ERL-4234, ERL-4299, ERL-4221 and ERL-4206 of UCC; Showdyne 509 of Showa Denko K.K.; Araldite CY-182 of CIBA-GEIGY AG Corp.; CY-192 and CY-184 of Dainippon Ink & Chemicals Inc.; EPICLON of Yuka Shell Epoxy Co. 200 and 400, EPIKOTE871, 872 and EP1032H60, ED-5661 and ED-5662 of Celanese Coating Corporation; the aliphatic polyglycidyl ether can be EPIKOTE 190P and 191P of Yuka Shell Epoxy Co.; EPOLITE 100MF of Kyoeisha Yushi KagakuKogyo Co., Ltd., EPIOL TMP of Nihon Yushi KK, etc.

[0240] The binder resin may be included in an amount of 1 to 40 parts by weight (e.g., 5 to 20 parts by weight) based on 100 parts by weight of the components constituting the layer containing quantum dots. When the binder resin is included within the above range, excellent sensitivity, developability, resolution, and linearity of the pattern may be obtained.

[0241] The reactive unsaturated compound may be used by mixing a monomer or an oligomer generally used in conventional photocurable compositions and thermosetting compositions.

[0242] The reactive unsaturated compound may be an acrylate compound. For example, at least one of ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol dimethacrylate or a mixture thereof may be used.

[0243] The reactive unsaturated compounds may be treated with anhydrides to improve developability.

[0244] The reactive unsaturated compound may be included in an amount of 1 to 10 parts by weight (e.g., 1 to 5 parts by weight) based on 100 parts by weight of the components constituting the layer containing quantum dots. When the reactive unsaturated compound is included within the above range, curing occurs sufficiently during exposure in the pattern forming process, resulting in excellent reliability, heat resistance, light resistance, chemical resistance, resolution, and close contact characteristics of the pattern.

[0245] The photopolymerization initiator may be an acetophenone compound, a benzophenone compound, a thioxanthone compound, a benzoin compound, an oxime compound, or the like.

[0246] Examples of acetophenone compounds may include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like.

[0247] Examples of benzophenone compounds may include benzophenone, benzoyl benzoate, benzoyl benzoate methyl ester, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

[0248] Examples of the thioxanthone compounds may include thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and the like.

[0249] Examples of the benzoin-based compound may include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, and the like.

[0250] Examples of the triazine compound may include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine. -triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-phenylvinyl-s-triazine, 2-(naphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2,4-bis(trichloromethyl)-6-sunflower-s-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxyphenylvinyl)-s-triazine, etc.

[0251] Examples of oxime compounds may be O-acyloxime compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, and the like. Specific examples of O-acyloxime compounds can be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-one oxime-O-acetate, 1-(4-phenylsulfanylphenyl)-butan-1-one oxime-O-acetate, and the like.

[0252] In addition to these compounds, the photopolymerization initiator may further include carbazole compounds, diketone compounds, sulfonium borate compounds, diazo-based compounds, imidazole compounds, biimidazole compounds, fluorene compounds, and the like.

[0253] The photopolymerization initiator may be used together with a photosensitizer that can cause a chemical reaction by absorbing light and being excited and then transferring its energy.

[0254] Examples of the photosensitizer may be tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like.

[0255] The photopolymerization initiator may be included in an amount of 0.1 to 10 parts by weight (e.g., 0.1 to 5 parts by weight) based on 100 parts by weight of the components constituting the layer containing the quantum dots. When the photopolymerization initiator is included within the above range, the balance between sensitivity and developability during exposure is improved, thereby obtaining a pattern with excellent resolution without a residual film.

[0256] The quantum-dot-containing layer may also contain a diffusing agent.

[0257] For example, the diffusing agent may include barium sulfate (BaSO 4 ), calcium carbonate (CaCO 3 ), titanium dioxide (TiO 2 ), zirconium oxide (ZrO 2 ), or a combination thereof.

[0258] The diffusing agent reflects light that is not absorbed in the above quantum dots, so that the reflected light can be absorbed again in the quantum dots. In other words, the diffusing agent increases the amount of light absorbed in the quantum dots and thus improves the light conversion efficiency of the curable composition.

[0259] The diffusing agent may have an average particle size (D 50 ). When the diffusing agent has an average particle size within this range, a more excellent light scattering effect can be obtained, and the light conversion efficiency can be improved.

[0260] The diffusing agent may be included in an amount of 0.1 wt % to 20 wt % (e.g., 0.1 wt % to 5 wt %) based on 100 parts by weight of the solid content of the components constituting the layer containing the quantum dots. When the diffusing agent is included in an amount of less than 0.1 wt % based on 100 parts by weight of the components constituting the layer containing the quantum dots, it is difficult to expect the effect of improving the light conversion efficiency by using the diffusing agent, and when the diffusing agent is included in an amount of more than 20 wt %, the pattern characteristics may be deteriorated.

[0261] In order to improve the stability and dispersibility of the quantum dots, the layer containing the quantum dots may further include thiol additives.

[0262] Thiol additives can replace the shell surface of quantum dots, improve the dispersion stability of quantum dots in solvents, and stabilize quantum dots.

[0263] Depending on its structure, the thiol additive may have one or more (eg, 2 to 10, for example, 2 to 4) thiol groups (—SH) at the terminal.

[0264] For example, the thiol additive may include at least two functional groups represented by Chemical Formula 2:

[0265] [Chemical formula 2]

[0266]

[0267] In chemical formula 2,

[0268] L 7 and L 8 Each is independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group.

[0269] For example, the thiol-based additive may be represented by Chemical Formula 3.

[0270] [Chemical formula 3]

[0271]

[0272] In chemical formula 3,

[0273] L 7 and L 8 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group, and

[0274] u1 and u2 are each independently an integer of 0 or 1.

[0275] For example, in Chemical Formula 2 and Chemical Formula 3, L 7 and L 8 Each may independently be a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

[0276] Specific examples of thiol additives can be selected from: pentaerythritol tetrakis (3-mercaptopropionate) represented by Chemical Formula 2a, trimethylolpropane tris (3-mercaptopropionate) represented by Chemical Formula 2b, pentaerythritol tetrakis (thioglycolate) represented by Chemical Formula 2c, trimethylolpropane tris (2-thioglycolate) represented by Chemical Formula 2d, glycol di-3-mercaptopropionate represented by Chemical Formula 2e, and combinations thereof.

[0277] [Chemical formula 2a]

[0278]

[0279] [Chemical formula 2b]

[0280]

[0281] [Chemical formula 2c]

[0282]

[0283] [Chemical formula 2d]

[0284]

[0285] [Chemical formula 2e]

[0286]

[0287] The thiol additive may be included in an amount of 0.1 to 10 parts by weight (e.g., 0.1 to 5 parts by weight) based on 100 parts by weight of the components constituting the layer containing the quantum dots. When the thiol additive is included within this range, the stability of the photoconversion material such as the quantum dots may be improved, and the thiol group in the component reacts with the acrylic group of the resin or monomer to form a covalent bond, thereby improving the heat resistance of the photoconversion material such as the quantum dots.

[0288] The layer containing quantum dots may further include a polymerization inhibitor, which includes a hydroquinone compound, a catechol compound, or a combination thereof. Since the layer containing quantum dots also includes a hydroquinone compound, a catechol compound, or a combination thereof, after printing (coating) the composition containing quantum dots, crosslinking at room temperature may be prevented during exposure.

[0289] For example, the hydroquinone compound, the catechol compound or a combination thereof may include hydroquinone, methyl hydroquinone, methoxy hydroquinone, tert-butyl hydroquinone, 2,5-di-tert-butyl hydroquinone, 2,5-bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, tert-butylcatechol, 4-methoxyphenol, pyrogallol, 2,6-di-tert-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylamino-O,O')aluminum or a combination thereof, but are not necessarily limited thereto.

[0290] The hydroquinone compound, the catechol compound or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the form of a dispersion may be included in an amount of 0.001 to 1 parts by weight (e.g., 0.01 to 0.1 parts by weight) based on 100 parts by weight of the components constituting the layer including quantum dots and fluorescent dyes or the layer containing quantum dots (excluding fluorescent dyes). When the stabilizer is included within the above range, the problem of aging at room temperature can be solved, and sensitivity reduction and surface peeling can be prevented.

[0291] In addition to the thiol-based additive and the polymerization inhibitor, the quantum dot-containing layer may further include malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a fluorine-based surfactant, or a combination thereof.

[0292] In addition, the quantum dot-containing layer may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, an epoxy group, etc., to improve its close contact property with the substrate.

[0293] Examples of silane coupling agents may include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, etc. These may be used alone or in mixtures of two or more.

[0294] The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the silane coupling agent is included within this range, close contact characteristics, storage characteristics, and the like may be improved.

[0295] Furthermore, if necessary, the quantum dot-containing layer may further include a surfactant, for example, a fluorine-based surfactant, to improve coating and prevent defects.

[0296] Examples of fluorinated surfactants include BM Chemie Inc. and MEGAFACE F from Dainippon Ink Kagaku Kogyo Co.,Ltd. F F and F FULORAD by Sumitomo 3M Co., Ltd. FULORAD FULORAD and FULORAD SURFLON from ASAHI Glass Co.,Ltd. SURFLON SURFLON SURFLON and SURFLON and Toray Silicone Co., Ltd. and etc.; F-482, F-484, F-478, F-554, etc. from DIC Co., Ltd.

[0298] The fluorine-based surfactant may be included in an amount of 0.001 to 5 parts by weight based on 100 parts by weight of the components constituting the layer containing the quantum dots. When the fluorine-based surfactant is included within this range, excellent wetting and coating uniformity on the glass substrate may be ensured, but stains may not be generated.

[0299] Furthermore, a certain amount of other additives such as antioxidants and stabilizers may also be added to the quantum dot-containing layer within a range that does not impair physical properties.

[0300] The method of manufacturing each quantum dot-containing layer may include: coating a curable composition including the above-mentioned components and the like on a substrate to form a pattern by an inkjet spraying method (S1); and curing the pattern (S2).

[0301] (S1) Pattern formation

[0302] The curable composition is coated on a substrate in a thickness of 0.5 to 10 μm in an inkjet dispersion method. According to the inkjet dispersion, a pattern can be formed by repeatedly dispersing desired colors one by one or dispersing desired colors at the same time to simplify the process.

[0303] (S2) Solidification

[0304] A cured resin film can be obtained by curing the obtained pattern. At this time, a thermal curing process may be preferred as a curing method. The thermal curing process may be a process in which the solvent in the curable composition is first removed by heating at a temperature of about 100° C. or more for about 3 minutes, and then cured by heating at a temperature of 160° C. to 300° C., and more desirably, at a temperature of 180° C. to 250° C. for about 30 minutes.

[0305] In addition, each layer containing quantum dots can be manufactured without inkjet. In this case, the manufacturing method includes: using a suitable method such as spin coating, roller coating, spray coating, etc., a curable composition containing the above components is coated on a substrate subjected to a predetermined pretreatment with a thickness of, for example, 0.5 μm to 10 μm, and the resultant is irradiated with light to form a pattern required for a color filter. As a light source for irradiation, UV, electron beam or X-ray can be used, and for example, UV in a region of 190nm to 450nm (specifically, 200nm to 400nm) can be irradiated. In the irradiation process, a photoresist mask can also be used. After the irradiation process is performed in this way, the composition layer irradiated by the light source is treated with a developer. At this time, the unexposed portion of the composition layer is dissolved to form the pattern required for the color filter. By repeating the process according to the number of desired colors, a color filter with a desired pattern can be obtained. In addition, when the image pattern obtained by developing in the above process is heated again or cured by irradiation with actinic rays, crack resistance and solvent resistance can be improved.

[0306] The curable composition may further comprise a solvent.

[0307] The solvent may include the following compounds: alcohols, such as methanol, ethanol, etc.; glycol ethers, such as ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether, etc.; ceilulose acetate, such as methyl ceilulose acetate, ethyl ceilulose acetate, diethyl ceilulose acetate, etc.; carbitols, such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, etc.; propylene glycol alkyl ether acetates, such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate. Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-amyl ketone, 2-heptanone, etc.; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, etc.; lactic acid alkyl esters such as methyl lactate, ethyl lactate, etc.; hydroxyacetic acid alkyl esters such as methyl hydroxyacetate, ethyl hydroxyacetate, butyl hydroxyacetate, etc.; acetate alkoxyalkyl esters such as methoxymethyl acetate, methoxyethyl acetate, methoxybutyl acetate, ethyl acetate, etc. 3-hydroxypropionic acid alkyl esters, such as 3-hydroxypropionic acid methyl ester, 3-hydroxypropionic acid ethyl ester, etc.; 3-alkoxypropionic acid alkyl esters, such as 3-methoxypropionic acid methyl ester, 3-methoxypropionic acid ethyl ester, 3-ethoxypropionic acid ethyl ester, 3-ethoxypropionic acid methyl ester, etc.; 2-hydroxypropionic acid alkyl esters, such as 2-hydroxypropionic acid methyl ester, 2-hydroxypropionic acid ethyl ester, 2-hydroxypropionic acid propyl ester, etc.; 2-alkoxypropionic acid alkyl esters, such as 2-methoxypropionic acid methyl ester, 2-methoxypropionic acid ethyl ester, 2- Ethoxypropionic acid ethyl ester, 2-ethoxypropionic acid methyl ester, etc.; 2-hydroxy-2-methylpropionic acid alkyl esters, such as 2-hydroxy-2-methylpropionic acid methyl ester, 2-hydroxy-2-methylpropionic acid ethyl ester, etc.; 2-alkoxy-2-methylpropionic acid alkyl esters, such as 2-methoxy-2-methylpropionic acid methyl ester, 2-ethoxy-2-methylpropionic acid ethyl ester, etc.; esters, such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, 2-hydroxy-3-methylbutyric acid methyl ester, etc.; or ketoesters, such as ethyl pyruvate, etc. In addition, N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl celulose acetate, and dimethyl adipate may also be used, but are not limited thereto.

[0308] For example, the solvent may desirably be a glycol ether, such as ethylene glycol monoethyl ether, diethylene glycol methyl ethyl ether, and the like; ethylene glycol alkyl ether acetate, such as ethyl celulose acetate, and the like; esters, such as 2-hydroxyethyl propionate, and the like; carbitols, such as diethylene glycol monomethyl ether, and the like; propylene glycol alkyl ether acetate, such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, and the like; alcohols, such as ethanol, and the like; or combinations thereof.

[0309] For example, the solvent may include propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dimethyl ether, dimethylacetamide, 2-butoxyethanol, N-methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone, dimethyl adipate, or a combination thereof.

[0310] The solvent may be contained in a balance amount based on the total amount of the curable composition.

[0311] Invention Mode

[0312] Hereinafter, the present invention is described in more detail with reference to Examples. However, these Examples should not be construed as limiting the scope of the present invention in any sense.

[0313] (synthesis example)

[0314] Synthesis Example 1: Synthesis of Intermediate 1

[0315]

[0316] 3,4-dihydroxybenzaldehyde (20g, 0.14mol), 1-bromo-2-ethylhexane (84g, 0.43mol), potassium carbonate (60g, 0.43mol) and 160ml of DMF were added to 500ml of RBF and stirred for 3 hours after heating to 140°C. When the reaction was completed, the resultant was extracted by using ethyl acetate after lowering the temperature to room temperature. After extraction, the extract obtained therefrom was separated by column chromatography to synthesize intermediate 1.

[0317] Synthesis Example 2: Synthesis of Intermediate 2

[0318]

[0319] Intermediate 2 was synthesized in the same manner as in Synthesis Example 1, except that 4-hydroxybenzaldehyde was used instead of 3,4-dihydroxybenzaldehyde.

[0320] Synthesis Example 3: Synthesis of Intermediate 3

[0321]

[0322] Intermediate 3-1 was synthesized in the same manner as in Synthesis Example 1, except that 6-bromo-1-hexanol was used instead of 1-bromo-2-ethylhexane.

[0323]

[0324] Intermediate 3-1 (15 g, 0.044 mol), trimethylamine (11.21 g, 0.11 mol) and 300 ml of dichloromethane were added thereto, followed by stirring in an ice bath. Methacryloyl chloride (11.11 g, 0.11 mol) was added thereto dropwise.

[0325] After stirring the mixture for 2 hours, the resultant was extracted with dichloromethane, and then concentrated and dried to obtain Intermediate 3.

[0326] Synthesis Example 4: Synthesis of Intermediate 4

[0327]

[0328] Intermediate 4-1 was synthesized in the same manner as in Synthesis Example 3, except that 4-hydroxybenzaldehyde was used instead of 3,4-dihydroxybenzaldehyde.

[0329]

[0330] Intermediate 4 was synthesized in the same manner as in Synthesis Example 3, except that Intermediate 4-1 was used instead of Intermediate 3-1.

[0331] (Example)

[0332] Example 1: Synthesis of the compound represented by Chemical Formula 1-1-1

[0333] [Chemical formula 1-1-1]

[0334] (1) After heating to 130° C., intermediate 1 (3 eq), intermediate 3 (1 eq), 10 volumes of propionic acid and pyrrole (4 eq) were added to 500 ml of RBF and stirred for 6 hours. When the reaction was completed, after lowering the temperature to room temperature, 100 g of acetone was added thereto, followed by stirring. The solid compound produced therein was filtered with a filter, washed with acetone, and dried to synthesize a metal-free porphyrin intermediate.

[0335] (2) The metal-free porphyrin intermediate (1 eq), 10 volumes of DMF and vanadium oxide (10 eq) were added to 500 ml of RBF, and then stirred at 140° C. overnight to complete the reaction. After lowering the temperature, the resultant was extracted with ethyl acetate. The extract obtained was separated and purified by column chromatography. After drying, a compound represented by Chemical Formula 1-1-1 was obtained.

[0336] [Chemical formula 1-1-1]

[0337]

[0338] ([M+H]1830.13)

[0339] Example 2: Synthesis of the compound represented by Chemical Formula 1-1-2

[0340] The compound represented by Chemical Formula 1-1-2 was synthesized in the same manner as in Example 1, except that Intermediate 1 (2 eq) and Intermediate 3 (2 eq) were used instead of Intermediate 1 (3 eq) and Intermediate 3 (1 eq).

[0341] [Chemical formula 1-1-2]

[0342]

[0343] ([M+H]1928.09)

[0344] Example 3: Synthesis of the compound represented by Chemical Formula 1-1-3

[0345] The compound represented by Chemical Formula 1-1-3 was synthesized in the same manner as in Example 1, except that Intermediate 1 (1 eq) and Intermediate 3 (3 eq) were used instead of Intermediate 1 (3 eq) and Intermediate 3 (1 eq).

[0346] [Chemical formula 1-1-3]

[0347]

[0348] ([M+H]2040.07)

[0349] Example 4: Synthesis of the compound represented by Chemical Formula 1-1-4

[0350] The compound represented by Chemical Formula 1-1-4 was synthesized in the same manner as in Example 1, except that Intermediate 1 (0 eq, ie, Intermediate 1 was not used) and Intermediate 3 (4 eq) were used instead of Intermediate 1 (3 eq) and Intermediate 3 (1 eq).

[0351] [Chemical formula 1-1-4]

[0352]

[0353] ([M+H]2152.05)

[0354] Example 5: Synthesis of the compound represented by Chemical Formula 1-2-1

[0355] The compound represented by Chemical Formula 1-2-1 was synthesized in the same manner as in Example 1, except that Intermediate 1 (2 eq), Intermediate 2 (1 eq), Intermediate 3 (0 eq, i.e., Intermediate 1 was not used) and Intermediate 4 (1 eq) were used instead of Intermediate 1 (3 eq) and Intermediate 3 (1 eq).

[0356] [Chemical formula 1-2-1]

[0357]

[0358] ([M+H]1503.88)

[0359] Example 6: Synthesis of the compound represented by Chemical Formula 1-2-6

[0360] A compound represented by Chemical Formula 1-2-6 was synthesized in the same manner as in Example 5, except that copper acetate (2 eq) was used instead of vanadium oxide.

[0361] [Chemical formula 1-2-6]

[0362]

[0363] ([M+H]1499.87)

[0364] Comparative Example 1: Synthesis of the compound represented by chemical formula A

[0365] The compound represented by Chemical Formula A was synthesized in the same manner as in Example 1, except that Intermediate 1 (2 eq), Intermediate 2 (1 eq), Intermediate 3 (0 eq, i.e. Intermediate 1 was not used) were used instead of Intermediate 1 (3 eq) and Intermediate 3 (1 eq).

[0366] [Chemical formula A]

[0367]

[0368] ([M+H]1447.89)

[0369] Comparative Example 2: Synthesis of the compound represented by Chemical Formula B

[0370] The compound represented by Chemical Formula B was synthesized in the same manner as in Example 1, except that 3,4-butoxybenzaldehyde (2 eq) and 4-butoxybenzaldehyde (2 eq) were used instead of Intermediate 1 (3 eq) and Intermediate 3 (1 eq).

[0371] [Chemical formula B]

[0372]

[0373] ([M+H]1111.52)

[0374] (evaluate)

[0375] Evaluation 1: Evaluation of compound properties

[0376] (1) Absorption wavelength range and maximum absorption wavelength

[0377] Each compound of Examples 1 to 6 and Comparative Examples 1 and 2 was mixed with a diluent solvent (PGMEA) to prepare a dilution solution with a concentration of 0.005 wt%, which was analyzed by using an ultraviolet-visible spectrometer (model name: UV-2550, manufacturer: Shimadzu Scientific Instruments) to obtain an absorption spectrum. In the absorption spectrum of each compound, the maximum absorption wavelength (λ max ) and are provided in Table 1.

[0378] (2) Solubility

[0379] The maximum weight of each compound dissolved in 10 g of PGMEA was measured according to Examples 1 to 6 and Comparative Examples 1 and 2. Specifically, the maximum weight of the compound dissolved in PGMEA was calculated as a percentage based on the total weight of the obtained solution, and the results are provided as solubility in Table 1.

[0380] [Table 1]

[0381] Maximum absorption wavelength (nm) Solubility (%) Example 1 431 10％ Example 2 432 10％ Example 3 432 8％ Example 4 431 8％ Example 5 428 10％ Example 6 420 3％ Comparative Example 1 429 3％ Comparative Example 2 428 2％

[0382] Referring to Table 1, the compounds according to Examples 1 to 6 and Comparative Examples 1 and 2 generally exhibited a maximum absorption wavelength at 420 nm to 440 nm. However, unlike the compounds according to Comparative Examples 1 and 2, the compounds according to Examples 1 to 6 (wherein a C1 to C20 alkoxy functional group substituted with a (meth)acrylate group at the terminal is introduced into R of Chemical Formula 1) 9 To R 28 at least one of the above) exhibits at least 2-fold (up to 5-fold) improved solubility.

[0383] (Manufacturing of anti-reflection film)

[0384] Example 7

[0385] 100 parts by weight of a monomer mixture including 99 parts by weight of n-butyl acrylate and 1 part by weight of 2-hydroxyethyl acrylate and 150 parts by weight of ethyl acetate were placed in a 1L reactor equipped with a condenser to conveniently control the temperature, wherein nitrogen was refluxed, and while the flask was stirred, nitrogen was injected therein for 1 hour to replace oxygen in the reactor with nitrogen, and then the reactor was maintained at 70°C. 0.06 parts by weight of 2,2'-azobisisobutyronitrile as an initiator was added thereto, and then reacted for 8 hours to prepare a solution containing a (meth)acrylic copolymer. The (meth)acrylic copolymer has a Tg of -46°C and a weight average molecular weight of 1,100,000 g / mol. Subsequently, ethyl acetate was added thereto to prepare a 19.4wt% (meth)acrylic copolymer solution. Based on 100 parts by weight of the solid content of the (meth)acrylic copolymer, 0.193 parts by weight of an XDI-based isocyanate crosslinking agent (75% of the solid content, TD-75, Soken Chemical Co., Ltd.), 0.154 parts by weight of 3-glycidoxypropyltrimethoxysilane (KBM-403, ShinEtsu Chemical Co.) as a silane coupling agent, and 0.06 parts by weight of the compound according to Example 1 were mixed. Subsequently, 25 parts by weight of methyl ethyl ketone was added thereto to prepare an adhesive layer composition.

[0386] The adhesive layer composition was directly coated on the bottom surface of a PET film, which was a base film of an antireflection layer (an antireflection layer formed by sequentially stacking a hard coating layer, a high refractive layer, and a low refractive layer on the upper surface of the PET film, reflectivity: 0.2%, DNP, LLC) with a rod coater, and then dried in a 90° C. oven for 4 minutes to form a 20 μm thick antireflection film.

[0387] Example 8

[0388] An antireflection film was formed in the same manner as in Example 7, except that the compound of Example 2 was used instead of the compound of Example 1.

[0389] Example 9

[0390] An antireflection film was formed in the same manner as in Example 7, except that the compound of Example 3 was used instead of the compound of Example 1.

[0391] Example 10

[0392] An antireflection film was formed in the same manner as in Example 7, except that the compound of Example 4 (represented by Chemical Formula 1-4) was used instead of the compound of Example 1.

[0393] Embodiment 11

[0394] An antireflection film was formed in the same manner as in Example 7, except that the compound of Example 5 was used instead of the compound of Example 1.

[0395] Example 12

[0396] An antireflection film was formed in the same manner as in Example 7, except that the compound of Example 6 was used instead of the compound of Example 1.

[0397] Comparative Example 3

[0398] An antireflection film was formed in the same manner as in Example 7, except that the compound of Comparative Example 1 was used instead of the compound of Example 1.

[0399] Comparative Example 4

[0400] An antireflection film was formed in the same manner as in Example 7, except that the compound of Comparative Example 1 was used instead of the compound of Example 2.

[0401] Evaluation 2: Evaluation of anti-reflection film performance

[0402] (1) Sample preparation

[0403] In order to examine whether the light resistance reliability of a film of a panel to which quantum dots are applied is improved, each antireflection film according to Examples 1 to 7 and Comparative Examples 1 and 2 was laminated on the other surface of a glass plate in which a layer containing quantum dots was on one surface to obtain a sample.

[0404] (2) Light resistance reliability

[0405] [Light source: xenon lamp, irradiation intensity: 0.35W / cm 2 , irradiation temperature: 63°C, irradiation time: 500 hours, irradiation direction: irradiation from the antireflection film side], the light resistance reliability of the antireflection film on the sample was evaluated by measuring the change in light transmittance of each compound at the maximum absorption wavelength before and after irradiation of each compound in a xenon test chamber (Q-SUN), and the results are shown in Table 2. The light transmittance change was calculated according to Equation 1 and then expressed as ΔEab as a standard of color change 1 *.

[0406] [Equation 1] ΔEab 1 *={(ΔL*)2+(Δa*)2+(Δb*)2}x 1 / 2

[0407] For reference, ΔEab according to Eq. 1 1 The smaller the *, the better the light resistance reliability.

[0408] (3) Release resistance

[0409] 3 ml of PGMEA (propylene glycol methyl ether acetate) was applied to each antireflection film of the sample, and then kept on a hot plate at 85° C. for 135 s. The color values ​​before and after PGMEA treatment were measured by using MCPD (Otsuka Electronics Co., Ltd.) equipment. The release resistance was calculated according to Equation 2, and then ΔEab as a color change standard was provided. 2 *. The results are shown in Table 2.

[0410] [Equation 2] ΔEab 2 *={(ΔL*)2+(Δa*)2+(Δb*)2}x 1 / 2

[0411] For reference, ΔEab according to Equation 2 2 *The smaller the value, the better the release resistance.

[0412] (4) Migration

[0413] The PSA film was attached to each antireflection film of the sample and then kept at 85° C. for 24 hours. The color value of the PSA film before and 24 hours after attachment to the antireflection film was measured by using an MCPD (Otsuka Electronics Co., Ltd.) device. ΔEab was calculated. 3 *As a color change standard, and the results are shown in Table 2.

[0414] [Equation 3] ΔEab 3 *={(ΔL*)2+(Δa*)2+(Δb*)2}x 1 / 2

[0415] For reference, ΔEab according to Equation 3 3 *The smaller the value, the better the migration inhibition property.

[0416] [Table 2]

[0417]

[0418] Referring to Table 2, the antireflection films according to Examples 7 to 12 all exhibited excellent light resistance reliability, release resistance, and migration inhibition characteristics compared to the antireflection films according to Comparative Examples 3 and 4. This confirms that by introducing a C1 to C20 alkoxy functional group substituted with a (meth)acrylate group at the terminal into R 9 To R 28In at least one of the above, the antireflection film overcomes the disadvantages of porphyrin-based dyes and achieves excellent characteristics such as light resistance reliability, release resistance, migration inhibition, etc.

[0419] Although the present invention has been described in conjunction with what are currently considered to be practical exemplary embodiments, it should be understood that the present invention is not limited to the disclosed embodiments, but on the contrary, the present invention is intended to cover various modifications and equivalent arrangements included in the spirit and scope of the appended claims. Therefore, the above embodiments should be understood to be exemplary and not to limit the present invention in any way.

[0420] [Explanation of Reference Numerals]

[0421] 10. Blue light source

[0422] 20 Layers containing quantum dots

[0423] 30 Color Filters

[0424] 40 substrate

[0425] 50 adhesive layer

[0426] 60 Dye-containing layer

[0427] 70 Anti-reflective layer

[0428] 80 Anti-reflective film

[0429] 100 display device.

Claims

1. A compound represented by Chemical Formula 1: [Chemical formula 1] In Chemical Formula 1, M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a hydroxide metal atom or an oxide metal atom; R 1 To R 8 are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group; R 9 To R 28 are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and R 9 To R 28 At least one of the groups is a C1 to C20 alkoxy group having a terminal substituted with a (meth)acrylate group.

2. The compound according to claim 1, wherein M is V(=O), Cu, Co, Zn or Ag.

3. The compound according to claim 1, wherein R 1 To R 8 They are all hydrogen atoms.

4. The compound according to claim 1, wherein R 9 To R 13 At least two of R 14 To R 18 One or two or more of R 19 To R 23 At least two of the 24 To R 28 One or two or more of each of them is a substituted or unsubstituted C1 to C20 alkoxy group, in, R 9 To R 28 At least one of them is substituted with a (meth)acrylate group at the terminal.

5. The compound according to claim 4, wherein R 9 To R 13 wherein two or more functional groups which are substituted or unsubstituted C1 to C20 alkoxy groups are bonded to each other at ortho positions, R 19 To R 23 Two or more functional groups which are substituted or unsubstituted C1 to C20 alkoxy groups are bonded to each other at ortho positions.

6. The compound according to claim 5, wherein The compound is represented by Chemical Formula 1-1 or 1-2: [Chemical formula 1-1] In Chemical Formula 1-1, R 31 To R 38 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and R 31 To R 38 At least one of them is a C1 to C20 alkyl group having a terminal substituted with (meth)acrylate; [Chemical formula 1-2] In Chemical Formula 1-2, R 41 To R 46 are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group, or a substituted or unsubstituted C6 to C20 aryl group; and R 41 To R 46 At least one of the groups is a C1 to C20 alkyl group having a terminal substituted with a (meth)acrylate.

7. The compound according to claim 6, wherein R 31 To R 38 At least two of the are C1 to C10 alkyl groups having a terminal substituted with a (meth)acrylate.

8. The compound according to claim 7, wherein In R 31 To R 38 In the above, the functional group other than the C1 to C10 alkyl group having a terminal substituted with a (meth)acrylate is a C4 to C10 branched alkyl group.

9. The compound according to claim 6, wherein R 41 To R 46 At least two of the are C1 to C10 alkyl groups having a terminal substituted with a (meth)acrylate.

10. The compound according to claim 9, wherein In R 41 To R 46 In the above, the functional group other than the C1 to C10 alkyl group having a terminal substituted with a (meth)acrylate is a C4 to C10 branched alkyl group.

11. The compound according to claim 1, wherein The compound is selected from the group consisting of: [Chemical formula 1-1-1] [Chemical formula 1-1-2] [Chemical formula 1-1-3] [Chemical formula 1-1-4] [Chemical formula 1-1-5] [Chemical formula 1-1-6] [Chemical formula 1-1-7] [Chemical formula 1-1-8] [Chemical formula 1-2-1] [Chemical formula 1-2-2] [Chemical formula 1-2-3] [Chemical formula 1-2-4] [Chemical formula 1-2-5] [Chemical formula 1-2-6] [Chemical formula 1-2-7] [Chemical formula 1-2-8] [Chemical formula 1-2-9] [Chemical formula 1-2-10] 12. The compound according to claim 1, wherein The maximum absorption wavelength (λmax) of the compound is 420 nm to 440 nm.

13. The compound according to claim 1, wherein The compound is a colored material used for electronic materials.

14. An antireflection film comprising the compound according to any one of claims 1 to 13.

15. The antireflection film according to claim 14, wherein The anti-reflection film includes an adhesive layer and an anti-reflection layer formed on the adhesive layer, and The compound is contained in the adhesive layer.

16. The antireflection film according to claim 14, wherein The anti-reflection film comprises an adhesive layer, a dye-containing layer and an anti-reflection layer on the dye-containing layer, and The compound is included in the adhesive layer, the dye-containing layer, or both.

17. A display device comprising the anti-reflection film according to claim 14.

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