Safety management system based on face recognition

Abstract

The invention relates to the technical field of safety management, and particularly discloses a safety management system based on face recognition, which is used for solving the problem of insufficient cooperative processing of air conditioner airflow safety management and air return and exhaust utilization during arsine leakage in existing clean room airflow management. Comprising a photoetching production module, an air treatment set, a return air adjustment module, an arsine detection sensor, a face recognition system, an exhaust fan, a fresh air handling unit, five air return and exhaust channels, four air supply channels and an air discharge and recovery channel. An air return and exhaust adjustment scheme and a safe area air supply scheme are provided when arsine leaks; personnel permissions of areas with different cleanliness levels are managed through the face recognition technology, air supply of safe areas is adjusted in real time, negative pressure and air exhaust are automatically adjusted when arsine leakage occurs, the fresh air and return air mixing proportion is dynamically adjusted based on the air age, and air conditioner energy consumption is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of security management, and more specifically, to a security management system based on face recognition. Background Art

[0002] The air conditioning supply, return and exhaust involved in the present invention do not involve the production exhaust inside the lithography production equipment, do not include its organic exhaust, and are limited to the air in the working area outside the equipment and instruments in the working area.

[0003] In semiconductor factories that produce wafers, clean rooms are used to ensure the cleanliness, temperature and humidity of the air in the production environment of the wafers. Clean air conditioning units need to ensure the air cleanliness, temperature and humidity stability of each area, and effectively control the accumulation of pollutants to meet the strict environmental requirements of precision production equipment such as lithography machines. However, semiconductor factories have strict requirements on cleanliness, energy consumption is as high as 1163W / ㎡, and the ventilation frequency is greater than or equal to 100 times / h. In ISO6 clean rooms, the airflow is organized in the form of vertical unidirectional flow according to the wind speed of the design specifications. In order to maintain positive pressure and cleanliness and overcome 2-3 level filtration resistance (about 700Pa), the ventilation frequency of a room with a size of 12m×8m×3m is even as high as 300-400 times / h. Therefore, energy consumption is a thorny problem for the air conditioning system of semiconductor factories. At the same time, although air circulation can reduce the consumption of fresh air, the pollutant concentration control effect is not good. The complete introduction of fresh air dilution airflow to fully dilute the dirty airflow to achieve the required cleanliness involves the treatment of fresh air load, and the energy saving effect is not good (air age); and in the treatment of return and exhaust air in different cleanliness levels, the filtration load is high, the efficiency is low, and the waste of resources is significant. Face recognition technology can realize the authority management of personnel entering different cleanliness levels and real-time number monitoring, so as to dynamically adjust the demand for air supply, return air and exhaust air to save energy and improve the accuracy of air cleanliness control. Face recognition can also detect abnormal behavior in areas with higher cleanliness requirements to prevent unauthorized personnel from entering sensitive areas and ensure the safety of the production environment. Arsine leakage is an extremely serious safety accident in the semiconductor plant area of ​​wafer production. Effective air conditioning airflow management can reduce the severity of the consequences of the safety accident of arsine leakage. In the existing clean room airflow management, there are deficiencies in the coordinated processing of air conditioning airflow safety management and return and exhaust air utilization during arsine leakage. How to solve the current deficiencies based on face recognition technology and return and exhaust airflow allocation has become a technical problem that needs to be solved urgently. Summary of the invention

[0004] In order to overcome the above-mentioned defects of the prior art, the present invention provides a security management system based on face recognition, which utilizes face recognition technology to manage the personnel authority of areas with different clean levels, adjusts the air supply in the safe area in real time, automatically adjusts the negative pressure and exhaust when arsine leaks, and dynamically adjusts the new return air mixing ratio based on the air age to reduce air conditioning energy consumption.

[0005] To achieve the above object, the present invention provides the following technical solutions: A safety management system based on face recognition, including a photolithography production module, an air treatment group, a return air adjustment module, an arsine detection sensor, a face recognition system, an exhaust fan, a fresh air unit, a diversion device, five return air channels, an exhaust air channel, five air supply channels and a waste heat recovery channel. The photolithography production module has a pretreatment and cleaning area, a photolithography coating area, an exposure area, a development and post-treatment area, and the return air adjustment module includes a particle filtering section, a dust filtering section, a temperature and humidity adjustment section, a return air mixing section, and an exhaust gas emission section. The air treatment group includes a first air filtering unit, a second filtering unit, a first return air mixing unit, an electrostatic filtering unit, a harmful gas filtering unit, a second return air mixing unit, an air circulation purification unit, a partition control unit, and a harmful gas deep purification unit , waste heat recovery unit and air exhaust port. The arsine detection sensor detects the arsine leakage signal, starts the face recognition system, identifies the identity and location of the personnel in the leakage area, sends emergency evacuation instructions to the personnel in the leakage area and guides them to evacuate to the designated safe area. At the same time, the air supply channel in the leakage area is closed. Based on the preset dynamic air supply formula, the air supply in the safe area is increased first to meet the air parameter requirements of the safe area. The exhaust equipment on the exhaust channel is set to full speed mode, and arsine is discharged through the exhaust gas discharge section and the air exhaust port at the same time. At the same time, the negative pressure is set to -20Pa to -30Pa within 15 meters of the leakage point to create directional airflow isolation, start the harmful gas deep purification unit, and temporarily close the waste heat recovery unit. The preset dynamic air supply formula is: ; Where: is the dynamic air supply volume, The basic air supply is set based on the minimum air supply design demand for each area. is the number of personnel, is the personnel activity coefficient, is the cleanliness grade coefficient, is the adjustment coefficient.

[0006] As a further scheme of the present invention, the five air supply channels include a first air supply channel, a second air supply channel, a third air supply channel, a fourth air supply channel, and a fifth air supply channel, and the air supply channels thereof are respectively the first air supply, the second air supply, the third air supply, the fourth air supply, and the fifth air supply; the five return air channels include a first return air channel, a second return air channel, a third return air channel, a fourth return air channel, and a fifth return air channel, and the return air thereof are respectively the first return air, the second return air, the third return air, the fourth return air, and the fifth return air.

[0007] As a further solution of the present invention, the first return air channel is formed by the photolithography coating area and the first return air mixing unit and the electrostatic filtering unit being connected in one direction in sequence through the air duct, and is used to transport the first return air; In the first air supply channel, the cleanliness level of the first air supply is ISO3, the temperature control accuracy is ±0.1℃, the humidity control accuracy is ±2%, and the target air age is 1.5 minutes. It is used to supply air to the photolithography coating area.

[0008] As a further solution of the present invention, the second return air channel is formed by the exposure area being connected to the first air filter unit, the second filter unit, and the first return air mixing unit in sequence in one direction through the air duct, and is used to transport the second return air; In the second air supply channel, the cleanliness level of the second air supply is ISO2, the temperature control accuracy is ±0.05°C, the humidity control accuracy is ±1%, and the target air age is 1 minute, which is used to supply air to the exposure area.

[0009] As a further solution of the present invention, the third return air channel is formed by the development and post-processing area being connected with the second return air mixing unit and the air circulation purification unit in one direction through the air duct, and is used to transport the third return air; In the third air supply channel, the cleanliness level of the third air supply is ISO4, the temperature control accuracy is ±0.2℃, the humidity control accuracy is ±3%, and the target air age is 4 minutes. It is used to supply air to the development and post-processing areas.

[0010] As a further solution of the present invention, the fourth return air channel is formed by the pre-treatment and cleaning areas being connected to the partition control unit through the air duct in one direction, and is used to transport the fourth return air; In the fourth air supply channel, the cleanliness level of the fourth air supply is ISO8, the temperature control accuracy is ±0.5℃, the humidity control accuracy is ±5%, and the target air age is 7 minutes. It is used to supply air to the pretreatment and cleaning areas.

[0011] As a further solution of the present invention, the fifth return air channel is formed by the electrostatic filter unit, the harmful gas filter unit, and the second return air mixing unit being connected in one direction through an air duct, and is used to transport the fifth return air; The fifth air supply channel is formed by the air circulation purification unit being connected with the partition control unit and the diversion device through the air duct, and is used to transport the circulating air adjusted by the return air adjustment device to the partition control unit.

[0012] As a further solution of the present invention, the partition control unit is connected to the fresh air unit, and the fresh air unit is used to supply fresh air transmitted to the partition control unit. In the partition control unit, the mixing ratio of fresh air and return air is based on the difference between the target air age and the real-time monitored air age, and is obtained by a preset fresh air ratio adaptive adjustment formula. The preset fresh air ratio adaptive adjustment formula is: ; Where: It is used to adjust the opening of the valve in the fresh air duct. The basic fresh air ratio is set according to the positive pressure value and cleanliness level requirements of each area. is the sensitivity adjustment coefficient, which is obtained based on the historical data analysis of the valve response speed in the actual fresh air duct and return air duct. , are the target air age and the actual monitored air age, respectively. The actual monitored air age is obtained by the gas tracer method. The return air ratio is , used to adjust the opening of the valve body in the return air duct.

[0013] As a further solution of the present invention, the exhaust channel is formed by connecting the partition control unit with the harmful gas deep purification unit, which is used to transport exhaust air. The harmful gas deep purification unit, the waste heat recovery unit, and the air discharge port are unidirectionally connected to form a waste heat recovery channel.

[0014] As a further solution of the present invention, the harmful gas filtering unit is a composite filter formed by combining an activated carbon filter and a HEPA filter.

[0015] As a further solution of the present invention, the first return air mixing unit and the second return air mixing unit adaptively adjust the mixed air ratio based on the change of the fresh air load to control the working conditions of each return air, reduce the fresh air load, and indirectly reduce the energy consumption caused by the fresh air load. The first return air mixing unit mixes the return air provided by the photolithography coating area and the exposure area. The photolithography coating area and the exposure area have high requirements for air cleanliness, which are ISO level 3 and ISO level 2 respectively. The cleanliness, temperature and humidity, and air age are monitored in real time, and the ratio of these two parts of return air is adjusted to ensure that the air quality delivered to these areas meets the standards. When the fresh air load is in the peak area In this case, the demand for fresh air is reduced by increasing the return air volume from the photolithography coating area. The return air from the photolithography coating area is processed, and the proportion of return air from the photolithography coating area that needs to be increased is calculated based on the requirements of cleanliness, temperature and humidity, and air age, and the dependence on the return air from the exposure area is reduced, thereby optimizing the return air utilization effect; the second return air mixing unit is responsible for mixing the second return air and the fifth return air for development and post-processing, and dynamically adjusts the proportion of these two parts of return air according to air quality requirements and actual load conditions. When the fresh air load is large, the return air volume from the development and post-processing areas is increased first to reduce the use of fresh air.

[0016] In order to solve the technical problems existing in the prior art, the present invention proposes the technical effect of the system: the present invention uses face recognition technology to manage the authority of personnel entering areas of different clean levels, and monitors the number of personnel in real time, and dynamically increases the air supply in the safe area according to the personnel, so as to detect unauthorized illegal entry, prevent personnel from violating regulations, and ensure the safety of the production environment. When arsine leaks, the negative pressure within 15 meters of the leakage point is adjusted, full-speed exhaust is started, and gas is treated through exhaust gas emission and deep purification units to reduce the impact of leakage accidents. At the same time, the return air and fresh air ratio is controlled by air age to maintain a balance between air circulation and fresh air load, thereby achieving energy saving while optimizing cleanliness control. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A schematic diagram of the system of the present invention; In the figure: A, photolithography production module; B, return air adjustment module; C, pre-treatment and cleaning area; D, photolithography coating area; E, exposure area; F, development and post-treatment area; W, air treatment group; 1, first air filtration unit; 2, second filtration unit; 3, first return air mixing unit; 4, electrostatic filtration unit; 5, harmful gas filtration unit; 6, second return air mixing unit; 7, air circulation purification unit; 8, partition control unit; 9, harmful gas deep purification unit; 10, waste heat recovery unit; 31, particle filtration section; 32, fine dust filtration section; 33, temperature and humidity adjustment section; 34, return air mixing section; 35, exhaust gas emission section. DETAILED DESCRIPTION

[0018] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0019] Example 1. In order to solve the technical problems mentioned in the background technology, a specific implementation scheme of the system proposed by the present invention is now provided.

[0020] like Figure 1 As shown, a security management system based on face recognition proposed by the present invention includes a photolithography production module A, an air treatment group W and a return air adjustment module B, and also includes an arsine detection sensor, a face recognition system, an exhaust fan, a fresh air unit, a diversion device, five return air channels, an exhaust air channel, five air supply channels and a waste heat recovery channel. The photolithography production module A has a pretreatment and cleaning area C, a photolithography coating area D, an exposure area E, and a development and post-processing area F. The return air adjustment module B includes a particle filtering section 31, a dust filtering section 32, a temperature and humidity adjustment section 33, a return air mixing section 34, and an exhaust gas emission section 35. The air treatment group W includes a first air filtering unit 1, a second filtering unit 2, a first return air mixing unit 3, an electrostatic filtering unit 4, a harmful gas filtering unit 5, a second return air mixing unit 6, and an air circulation purification unit. 7. Zoning control unit 8, harmful gas deep purification unit 9, waste heat recovery unit 10 and air discharge port. Arsenic detection sensor detects arsenic leakage signal, starts face recognition system, identifies the identity and location of personnel in leakage area, sends emergency evacuation instructions to personnel in leakage area and guides designated evacuation routes to safe areas. At the same time, close the air supply channel in leakage area. Based on the preset dynamic air supply formula, increase the air supply in safe area first to meet the air parameter requirements in safe area. Set the exhaust equipment on the exhaust channel to full speed mode, discharge arsenic through air discharge port at the same time, set negative pressure to -20Pa to -30Pa within 15 meters of leakage point, create directional airflow isolation, start harmful gas deep purification unit 9, temporarily close waste heat recovery unit 10. The preset dynamic air supply formula is: ; Where: is the dynamic air supply volume, The basic air supply is set based on the minimum air supply design demand for each area. is the number of personnel, is the personnel activity coefficient, is the cleanliness grade coefficient, is the adjustment coefficient.

[0021] It should be noted that the five air supply channels include the first air supply channel, the second air supply channel, the third air supply channel, the fourth air supply channel, and the fifth air supply channel, and their air supplies are the first air supply, the second air supply, the third air supply, the fourth air supply, and the fifth air supply, respectively; the five return air channels include the first return air channel, the second return air channel, the third return air channel, the fourth return air channel, and the fifth return air channel, and their return airs are the first return air, the second return air, the third return air, the fourth return air, and the fifth return air, respectively.

[0022] It should be noted that the first return air channel is formed by the photolithography coating area D and the first return air mixing unit 3 and the electrostatic filtering unit 4 being connected in one direction in sequence through the air duct, and is used to transport the first return air; In the first air supply channel, the cleanliness level of the first air supply is ISO3, the temperature control accuracy is ±0.1°C, the humidity control accuracy is ±2%, and the target air age is 1.5 minutes. It is used to supply air to the photolithography coating area D.

[0023] It should be noted that the second return air channel is formed by the exposure area E and the first air filter unit 1, the second filter unit 2, and the first return air mixing unit 3 being connected in one direction in sequence through the air duct, and is used to transport the second return air. In the second air supply channel, the cleanliness level of the second air supply is ISO2, the temperature control accuracy is ±0.05°C, the humidity control accuracy is ±1%, and the target air age is 1 minute, which is used to supply air to exposure area E.

[0024] It should be noted that the third return air channel is formed by the development and post-processing area F being connected with the second return air mixing unit 6 and the air circulation purification unit 7 through a one-way air duct, and is used to transport the third return air; In the third air supply channel, the cleanliness level of the third air supply is ISO4, the temperature control accuracy is ±0.2℃, the humidity control accuracy is ±3%, and the target air age is 4 minutes. It is used to supply air to the development and post-processing area F.

[0025] It should be noted that the fourth return air channel is formed by the pre-treatment and cleaning areas C being connected to the partition control unit 8 in one direction through the air duct, and is used to transport the fourth return air; In the fourth air supply channel, the cleanliness level of the fourth air supply is ISO8, the temperature control accuracy is ±0.5℃, the humidity control accuracy is ±5%, and the target air age is 7 minutes. It is used to supply air to the pretreatment and cleaning area C.

[0026] It should be noted that the fifth return air channel is formed by the electrostatic filter unit 4 being connected with the harmful gas filter unit 5 and the second return air mixing unit 6 in one direction through the air duct, and is used to transport the fifth return air; The fifth air supply channel is formed by the air circulation purification unit 7 being connected with the partition control unit 8 and the diversion device through the air duct, and is used to transport the circulating air adjusted by the return air adjustment device B to the partition control unit 8.

[0027] It should be noted that the partition control unit 8 is connected to the fresh air unit, and the fresh air unit is used to supply fresh air transmitted to the partition control unit 8. In the partition control unit 8, the mixing ratio of fresh air and return air is based on the difference between the target air age and the real-time monitored air age, and is obtained by a preset fresh air ratio adaptive adjustment formula. The preset fresh air ratio adaptive adjustment formula is: ; Where: It is used to adjust the opening of the valve in the fresh air duct. The basic fresh air ratio is set according to the positive pressure value and cleanliness level requirements of each area. is the sensitivity adjustment coefficient, which is obtained based on the historical data analysis of the valve response speed in the actual fresh air duct and return air duct. , are the target air age and the actual monitored air age, respectively. The actual monitored air age is obtained by the gas tracer method. The return air ratio is , used to adjust the opening of the valve body in the return air duct.

[0028] It should be noted that the exhaust passage is formed by connecting the partition control unit 8 with the harmful gas deep purification unit 9, which is used to transport exhaust air. The harmful gas deep purification unit 9, the waste heat recovery unit 10, and the air discharge port are unidirectionally connected to form a waste heat recovery passage.

[0029] It should be noted that the harmful gas filtering unit 5 is a composite filter formed by combining an activated carbon filter and a HEPA filter.

[0030] The present invention utilizes face recognition technology to manage the authority of personnel entering areas of different cleanliness levels, and monitors the number of personnel in real time. It increases the air supply in the safe area dynamically according to the personnel, can detect unauthorized illegal entry, prevent personnel from violating regulations, and ensure the safety of the production environment. When arsine leaks, it adjusts the negative pressure within 15 meters of the leak point, starts full-speed exhaust, and processes the gas through exhaust gas emission and deep purification units to reduce the impact of leakage accidents. At the same time, the return air and fresh air ratio is controlled by air age to maintain a balance between air circulation and fresh air load, thereby achieving energy saving while optimizing cleanliness control.

[0031] Example 2. In order to further optimize the coordination of the overall technical solution, the system proposed by the present invention is further used to dynamically adjust the return air mixing ratio of the first return air mixing unit 3 and the second return air mixing unit 6 according to the return air parameters of each area in real time under the background of fresh air load fluctuation. The specific implementation plan is described as follows: The first return air mixing unit 3 and the second return air mixing unit 6 adaptively adjust the mixed air ratio based on the change of the fresh air load and the return air parameters of each area to control the ratio of each return air, reduce the fresh air load, and reduce the energy consumption caused by the fresh air load. The first return air mixing unit 3 mixes the return air provided by the photolithography coating area D and the exposure area E. The photolithography coating area D and the exposure area E have high requirements for air cleanliness, which are ISO level 3 and ISO level 2 respectively. The cleanliness, temperature, humidity and air age are monitored in real time, and the ratio of these two parts of return air is adjusted to ensure that the air quality delivered to these areas meets the standards, so that the proportion of return air with higher cleanliness in the return air parameters of each return air is increased. When the fresh air load is in the peak area, when the return air temperature, humidity and cleanliness of the photolithography coating area D change by no more than 2.5% from the set value, the return air volume from the photolithography coating area D is increased to reduce Less fresh air demand, adjust the ratio through the historical supply and return air parameters and fresh air load, according to the machine learning model to learn the law of the change of the return air volume ratio of the photolithography coating area D with the fresh air load while meeting the air parameter requirements of each area, obtain the return air volume adjustment ratio of the photolithography coating area D, so as to optimize the return air utilization effect; the second return air mixing unit 6 is responsible for mixing the second return air and the fifth return air of the development and post-processing area F, and dynamically adjusts the ratio of these two parts of the return air according to the air quality requirements and actual load conditions. The same adjustment mechanism of the first return air mixing unit 3 uses the machine learning model to learn the corresponding law of the return air ratio of the development and post-processing area F with the change of the fresh air load, and then obtains the return air ratio of the development and post-processing area F. When the fresh air load is large, the return air volume from the development and post-processing area F is increased first to reduce the use of fresh air. The actuators in the first return air mixing unit 3 and the second return air mixing unit 6 are adjusted in time according to the obtained return air volume adjustment ratio.

[0032] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

[0033] Finally: The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A security management system based on face recognition, comprising a photolithography production module (A), an air handling group (W) and a return air adjustment module (B), characterized in that: The system also includes an arsine detection sensor, a face recognition system, an exhaust fan, a fresh air unit, a diversion device, five return air channels, an exhaust air channel, five air supply channels and a waste heat recovery channel. The photolithography production module (A) has a pre-treatment and cleaning area (C), a photolithography coating area (D), an exposure area (E), a development and post-treatment area (F). The return air adjustment module (B) includes a particle filtering section (31), a fine dust filtering section (32), a temperature and humidity adjustment section (33), a return air mixing section (34), and an exhaust gas emission section (35). The air treatment group (W) includes a first air filtering unit (1), a second filtering unit (2), a first return air mixing unit (3), an electrostatic filtering unit (4), a harmful gas filtering unit (5), a second return air mixing unit (6), an air circulation purification unit (7), a partition control unit (8), and a harmful gas The deep purification unit (9), the waste heat recovery unit (10) and the air discharge port, the arsine detection sensor detects the arsine leakage signal, starts the face recognition system, identifies the identity and location of the personnel in the leakage area, sends an emergency evacuation order to the personnel in the leakage area and guides them to evacuate to the designated safe area, and at the same time closes the air supply channel in the leakage area, and based on the preset dynamic air supply formula, gives priority to increasing the air supply in the safe area so that it meets the air parameter requirements of the safe area, sets the exhaust equipment on the exhaust channel to full speed mode, and discharges arsine through the exhaust gas discharge section (35) and the air discharge port at the same time, and sets the negative pressure within 15 meters of the leakage point to -20Pa to -30Pa, creates directional airflow isolation, starts the harmful gas deep purification unit (9), and temporarily closes the waste heat recovery unit (10). The preset dynamic air supply formula is: ； Where: is the dynamic air supply volume, The basic air supply is set based on the minimum air supply design demand for each area. is the number of personnel, is the personnel activity coefficient, is the cleanliness grade coefficient, is the adjustment coefficient.

2. A security management system based on face recognition according to claim 1, characterized in that: The five air supply channels include the first air supply channel, the second air supply channel, the third air supply channel, the fourth air supply channel, and the fifth air supply channel, and the air supply channels thereof are the first air supply, the second air supply, the third air supply, the fourth air supply, and the fifth air supply, respectively. The five return air channels include the first return air channel, the second return air channel, the third return air channel, the fourth return air channel, and the fifth return air channel, and the return air thereof are the first return air, the second return air, the third return air, the fourth return air, and the fifth return air, respectively.

3. A security management system based on face recognition according to claim 2, characterized in that: The first return air channel is formed by the photolithography coating area (D) and the first return air mixing unit (3) and the electrostatic filtering unit (4) being connected in one direction in sequence through the air duct, and is used for conveying the first return air; In the first air supply channel, the cleanliness level of the first air supply is ISO3, the temperature control accuracy is ±0.1°C, the humidity control accuracy is ±2%, and the target air age is 1.5 minutes. It is used to supply air to the photolithography coating area (D).

4. A security management system based on face recognition according to claim 2, characterized in that: The second return air channel is formed by the exposure area (E) and the first air filter unit (1), the second filter unit (2), and the first return air mixing unit (3) being connected in one direction in sequence through the air duct, and is used for conveying the second return air. In the second air supply channel, the cleanliness level of the second air supply is ISO2, the temperature control accuracy is ±0.05°C, the humidity control accuracy is ±1%, and the target air age is 1 minute, which is used to supply air to the exposure area (E).

5. The security management system based on face recognition according to claim 2 is characterized in that: The third return air channel is formed by the development and post-processing area (F) being connected to the second return air mixing unit (6) and the air circulation purification unit (7) in one direction through an air duct, and is used for conveying the third return air; In the third air supply channel, the cleanliness level of the third air supply is ISO4, the temperature control accuracy is ±0.2℃, the humidity control accuracy is ±3%, and the target air age is 4 minutes. It is used to supply air to the development and post-processing area (F).

6. A security management system based on face recognition according to claim 2, characterized in that: The fourth return air channel is formed by the pre-treatment and cleaning area (C) through the air duct unidirectionally connected to the partition control unit (8), and is used to transport the fourth return air; In the fourth air supply channel, the cleanliness level of the fourth air supply is ISO8, the temperature control accuracy is ±0.5℃, the humidity control accuracy is ±5%, and the target air age is 7 minutes. It is used to supply air to the pretreatment and cleaning area (C).

7. A security management system based on face recognition according to claim 2, characterized in that: The fifth return air channel is formed by the electrostatic filter unit (4) being connected to the harmful gas filter unit (5) and the second return air mixing unit (6) in one direction through an air duct, and is used for conveying the fifth return air; The fifth air supply channel is formed by the air circulation purification unit (7) being connected to the partition control unit (8) and the diversion device through the air duct, and is used to convey the circulating air adjusted by the return air adjustment device (B) to the partition control unit (8).

8. A security management system based on face recognition according to claim 7, characterized in that: The partition control unit (8) is connected to the fresh air unit, and the fresh air unit is used to supply fresh air to the partition control unit (8). In the partition control unit (8), the mixing ratio of fresh air and return air is based on the difference between the target air age and the real-time monitored air age, and is obtained by a preset fresh air ratio adaptive adjustment formula. The preset fresh air ratio adaptive adjustment formula is: ； Where: It is used to adjust the opening of the valve in the fresh air duct. The basic fresh air ratio is set according to the positive pressure value and cleanliness level requirements of each area. is the sensitivity adjustment coefficient, which is obtained based on the historical data analysis of the valve response speed in the actual fresh air duct and return air duct. , are the target air age and the actual monitored air age, respectively. The actual monitored air age is obtained by the gas tracer method. The return air ratio is , used to adjust the opening of the valve body in the return air duct.

9. The security management system based on face recognition according to claim 1 is characterized in that: The exhaust passage is formed by connecting the partition control unit (8) and the harmful gas deep purification unit (9) and is used to convey exhaust air. The harmful gas deep purification unit (9), the waste heat recovery unit (10) and the air discharge port are unidirectionally connected to form the waste heat recovery passage.

10. The security management system based on face recognition according to claim 1, characterized in that: The harmful gas filtering unit (5) is a composite filter formed by combining an activated carbon filter and a HEPA filter.

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