Color filter and forming method thereof

Abstract

The invention discloses a color filter and a forming method thereof, and the method comprises the steps: providing a light-transmitting substrate which comprises a display region and a frame region surrounding the display region; a black matrix layer is formed on the light-transmitting substrate, the black matrix layer is internally provided with a plurality of opening units which are located in the display area and arranged periodically and open grooves located in the frame area, the open grooves surround the opening units, and the opening units and the open grooves are exposed out of the light-transmitting substrate; color layers are formed in the opening units; forming a protective layer on the black matrix layer and the color layer; a shielding layer is formed on the surface of the protective layer on the frame area, the shielding layer has a first projection on the surface of the light-transmitting substrate, the slot has a second projection on the surface of the light-transmitting substrate, the second projection and the first projection are at least partially overlapped, and the shielding layer is beneficial to improving the light-transmitting problem and enlarging a process window.

Description

Technical Field

[0001] The present invention relates to the field of liquid crystal display, and in particular to a color filter and a method for forming the same. Background Art

[0002] With the advancement and development of science and technology, liquid crystal displays have been widely used. Among them, thin film transistor liquid crystal displays (TFT-LCD) have gradually occupied the display field due to their low power consumption, excellent picture quality and high production yield.

[0003] The TFT-LCD is composed of two pieces of glass, with a color filter on the top and a TFT (Thin Film Transistor) on the bottom, with a layer of liquid crystal in the middle, and a complete display module with components such as polarizer, backlight and drive circuit. Among them, the color filter (CF) is a key component of the TFT-LCD, which is used to make the LCD produce color images. It is mainly composed of a transparent glass substrate, a black matrix layer (BM) and a color photoresist layer.

[0004] However, the performance of existing color filters needs to be further improved. Summary of the invention

[0005] The technical problem solved by the present invention is to provide a color filter and a method for forming the same, so as to improve the performance of the formed color filter.

[0006] To solve the above technical problems, the technical solution of the present invention provides a color filter, comprising: a light-transmitting substrate, the light-transmitting substrate comprising a display area and a frame area surrounding the display area; a black matrix layer located on the light-transmitting substrate, the black matrix layer having a plurality of periodically arranged opening units located on the display area and grooves located on the frame area, the grooves surrounding a plurality of the opening units, and both the plurality of the opening units and the grooves exposing the light-transmitting substrate; a color layer located within the plurality of the opening units; a protective layer located on the black matrix layer and the color layer; a shielding layer located on the surface of the protective layer on the frame area, the shielding layer having a first projection on the surface of the light-transmitting substrate, the grooves having a second projection on the surface of the light-transmitting substrate, and the second projection at least partially overlapping with the first projection.

[0007] Optionally, the opening units are arranged in an array along a first direction, and each of the opening units includes a first opening, a second opening and a third opening arranged along a second direction, and the first direction is perpendicular to the second direction.

[0008] Optionally, the color layer includes a first photoresist layer located in the first opening, a second photoresist layer located in the second opening, and a third photoresist layer located in the third opening.

[0009] Optionally, the groove has a first width, and the first width ranges from greater than or equal to 5 μm; and the distance between the groove and a plurality of the opening units ranges from 50 μm to 300 μm.

[0010] Optionally, the second projection is located within the range of the first projection; the groove has a first width, the shielding layer has a second width, and the difference between the second width and the first width ranges from 6 μm to 10 μm.

[0011] Optionally, the material of the shielding layer includes a black matrix material; the black matrix material includes chromium or resin.

[0012] Optionally, the shielding layer has a thickness ranging from 1.0 μm to 1.1 μm.

[0013] Optionally, it also includes: a plurality of support columns located on the surface of the protective layer on the black matrix layer.

[0014] Correspondingly, the technical solution of the present invention also provides a method for forming a color filter, comprising: providing a light-transmitting substrate, the light-transmitting substrate comprising a display area and a frame area surrounding the display area; forming a black matrix layer on the light-transmitting substrate, the black matrix layer having a number of periodically arranged opening units located on the display area and grooves located on the frame area, the grooves surrounding a number of the opening units, and both the number of the opening units and the grooves exposing the light-transmitting substrate; forming a color layer in the number of the opening units; forming a protective layer on the black matrix layer and the color layer; forming a shielding layer on the surface of the protective layer on the frame area, the shielding layer having a first projection on the surface of the light-transmitting substrate, the grooves having a second projection on the surface of the light-transmitting substrate, and the second projection and the first projection at least partially overlap.

[0015] Optionally, the method further includes: forming a plurality of support columns on the surface of the protective layer on the black matrix layer.

[0016] Optionally, a plurality of the support columns are formed after the shielding layer is formed.

[0017] Optionally, the opening units are arranged in an array along a first direction, and each of the opening units includes a first opening, a second opening and a third opening arranged along a second direction, and the first direction is perpendicular to the second direction; the method for forming the color layer includes: forming a first photoresist layer in the first opening; forming a second photoresist layer in the second opening; and forming a third photoresist layer in the third opening.

[0018] Optionally, the first photoresist layer is also formed on the black matrix layer between the first openings adjacent to each other in the first direction; the second photoresist layer is also formed on the black matrix layer between the second openings adjacent to each other in the first direction; and the third photoresist layer is also formed on the black matrix layer between the third openings adjacent to each other in the first direction.

[0019] Optionally, the method for forming the first photoresist layer includes: coating a first color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the first color photoresist material layer using a first mask; removing the unexposed area of ​​the first color photoresist material layer by development; and baking the developed first color photoresist material layer to solidify the pattern.

[0020] Optionally, the method for forming the second photoresist layer includes: coating a second color photoresist material on the light-transmitting substrate to form a second color photoresist material layer; exposing the second color photoresist material layer using a second mask; removing the unexposed area of ​​the second color photoresist material layer by development; and baking the developed second color photoresist material layer to solidify the pattern.

[0021] Optionally, the method for forming the third photoresist layer includes: coating a third color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the third color photoresist material layer using a third mask; removing unexposed areas of the third color photoresist material layer by development; and baking the developed third color photoresist material layer to solidify the pattern.

[0022] Optionally, the groove has a first width, and the first width ranges from greater than or equal to 5 μm; and the distance between the groove and a plurality of the opening units ranges from 50 μm to 300 μm.

[0023] Optionally, the second projection is located within the range of the first projection; the groove has a first width, the shielding layer has a second width, and the difference between the second width and the first width ranges from 6 μm to 10 μm.

[0024] Optionally, the material of the shielding layer includes a black matrix material; the black matrix material includes chromium or resin.

[0025] Optionally, the shielding layer has a thickness ranging from 1.0 μm to 1.1 μm.

[0026] Compared with the prior art, the technical solution of the embodiment of the present invention has the following beneficial effects:

[0027] In the method for forming a color filter provided by the technical solution of the present invention, a shielding layer is formed on the surface of the protective layer on the frame area, the shielding layer has a first projection on the surface of the transparent substrate, and the groove has a second projection on the surface of the transparent substrate. The second projection and the first projection at least partially overlap, so that light is blocked by the shielding layer after passing through the groove. The shielding layer is beneficial to improving the light transmission problem. At the same time, the groove can be set to a position closer to the display area to achieve a better isolation effect on water vapor and electricity, and there are fewer restrictions on the position, width, etc. of the gate layer on the thin film transistor substrate side of the liquid crystal display panel, which is beneficial to improving the performance of the color filter while increasing the process window.

[0028] Furthermore, the slot has a first width, the shielding layer has a second width, and the difference between the second width and the first width ranges from 6 μm to 10 μm, which is beneficial to improving the light shielding ability of the shielding layer and improving the light transmission problem.

[0029] In the color filter provided by the technical solution of the present invention, the shielding layer is located on the surface of the protective layer on the frame area, the shielding layer has a first projection on the surface of the transparent substrate, the groove has a second projection on the surface of the transparent substrate, the second projection and the first projection at least partially overlap, so that light is blocked by the shielding layer after passing through the groove, the shielding layer is beneficial to improving the light transmission problem, and at the same time, the groove can be set to a position closer to the display area to achieve a better isolation effect on water vapor and electricity, and there are fewer restrictions on the position, width, etc. of the gate layer on the thin film transistor substrate side of the liquid crystal display panel, which is beneficial to improving the performance of the color filter while increasing the process window.

[0030] Furthermore, the slot has a first width, the shielding layer has a second width, and the difference between the second width and the first width ranges from 6 μm to 10 μm, which is beneficial to improving the light shielding ability of the shielding layer and improving the light transmission problem. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figures 1 to 4 It is a structural schematic diagram of a color filter forming process;

[0032] Figures 5 to 12 It is a structural schematic diagram of each step of a method for forming a color filter according to an embodiment of the present invention. DETAILED DESCRIPTION

[0033] It should be noted that the terms “surface” and “on” in this specification are used to describe relative positional relationships in space and are not limited to direct contact.

[0034] As described in the background art, the performance of the color filter formed by the prior art needs to be further improved. Now, a method for forming a color filter is described and analyzed.

[0035] Figures 1 to 4 It is a structural schematic diagram of the color filter formation process.

[0036] Please refer to Figure 1 and Figure 2 , Figure 1 for Figure 2 A top view of the structure. Figure 2 for Figure 1 A cross-sectional structural schematic diagram along the DD1 direction in FIG. 1 is provided, wherein a light-transmitting substrate 100 is provided, wherein the light-transmitting substrate 100 includes a display area A and a frame area B located outside the display area; a black matrix layer 101 is formed on the light-transmitting substrate 100, wherein the black matrix layer 101 has a plurality of openings 102 located on the display area, and grooves 103 located on the frame area, wherein the grooves 103 surround the plurality of openings 102, and the plurality of openings 102 are arranged in an array along a first direction X, wherein both the openings 102 and the grooves 103 expose the light-transmitting substrate 100.

[0037] Please refer to Figure 3 and Figure 4 , Figure 3 for Figure 4 The top view of the protective layer 105 is omitted. Figure 4 for Figure 3 In the schematic cross-sectional structure diagram along the DD1 direction, a color layer 104 is formed on the surface of the black matrix layer 101 and in some of the openings 102 on the display area A; a protective layer 105 is formed on the black matrix layer 102 and the color layer 104; and a plurality of support columns 106 are formed on the protective layer 105.

[0038] In the above color filter structure, the groove 103 is used to isolate the influence of the environment on the performance of the liquid crystal display panel (such as water vapor and electrical interference). Subsequently, frame glue will be coated on the frame area B to bond and solidify the color filter and the thin film transistor substrate to form a liquid crystal display panel.

[0039] However, the slot 103 will leak light and affect the visual effect. Therefore, the gate layer (gate) of the thin film transistor substrate is required to be used as a light shielding layer in addition to being a common electrode (VCOM) to reduce the influence of the inner slot 103 on light transmission, thereby putting forward more restrictions on the position and width of the gate layer. When the gate layer is used as a light shielding layer, its width is required to be larger than the width of the inner slot 103, but the light shielding layer of some products is relatively small and it is difficult to meet the shielding requirements.

[0040] In order to solve the above problems, the present invention provides a color filter and a method for forming the same, wherein the groove is used to isolate the influence of the environment on the performance of the liquid crystal display panel (such as water vapor and electrical interference), and the light is blocked by the shielding layer after passing through the groove. The shielding layer is beneficial to improving the light transmission problem. At the same time, the groove can be set to a position closer to the display area to achieve a better water vapor and electricity isolation effect, and there are fewer restrictions on the position, width, etc. of the gate layer on the thin film transistor substrate side of the liquid crystal display panel, which is beneficial to improving the performance of the color filter while increasing the process window.

[0041] In order to make the above-mentioned objects, features and beneficial effects of the present invention more obvious and easy to understand, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0042] Figures 5 to 12 It is a structural schematic diagram of each step of a method for forming a color filter according to an embodiment of the present invention.

[0043] Please refer to Figure 5 and Figure 6 , Figure 5 for Figure 6 A top view of the structure. Figure 6 for Figure 5 The cross-sectional structural diagram along the EE1 direction in FIG. 1 is a schematic diagram showing a light-transmitting substrate 200, wherein the light-transmitting substrate 200 includes a display area i and a frame area ii surrounding the display area i.

[0044] In this embodiment, the light-transmitting substrate 200 is a glass substrate.

[0045] The display area i is used to define the position of an effective light-transmitting area, and the frame area ii is used to define the position of a non-light-transmitting area such as a frame glue coating area.

[0046] Please continue to refer to Figure 5 and Figure 6A black matrix layer 201 is formed on the light-transmitting substrate 200, wherein the black matrix layer 201 has a plurality of periodically arranged opening units 202 located on the display area i and a groove 203 located on the frame area ii, wherein the groove 203 surrounds a plurality of the opening units 202, and both the plurality of the opening units 202 and the groove 203 expose the light-transmitting substrate 200.

[0047] In this embodiment, the slot 203 has a first width L1, and the first width L1 is greater than or equal to 5 μm.

[0048] It should be noted that the width described herein is a dimension perpendicular to the extension direction. For example, the first width is a dimension perpendicular to the extension direction of the slot 203 .

[0049] In this embodiment, the distance D1 between the slot 203 and the plurality of opening units 202 ranges from 50 μm to 300 μm. Here, the distance between the slot 203 and the plurality of opening units 202 is small, which can achieve a better isolation effect on water vapor and electricity, and the setting of the shielding layer 206 does not affect the light transmission of the display area i.

[0050] In this embodiment, the black matrix layer 201 is made of chrome or resin with low reflectivity, and is used to separate photoresist layers of different primary colors to enhance color contrast.

[0051] In this embodiment, the opening units 202 are arranged in an array along a first direction X, and each of the opening units 202 includes a first opening 2021 , a second opening 2022 , and a third opening 2023 arranged along a second direction Y. The first direction X and the second direction Y are perpendicular to each other.

[0052] The opening units 202 are arranged according to the arrangement of the color filters to be formed.

[0053] In this embodiment, the color filter is arranged in stripes, and the first photoresist layer, the second photoresist layer and the third photoresist layer form the smallest pixel unit. The first opening 2021 is used to form the first photoresist layer, the second opening 2022 is used to form the second photoresist layer, and the third opening 2023 is used to form the third photoresist layer.

[0054] In other embodiments, the color filter formed may also be arranged in other ways, such as mosaic arrangement (also called diagonal arrangement), triangle arrangement (also called delta arrangement), square arrangement, etc. Therefore, the arrangement and shape of the opening unit may be set according to the arrangement of the color filter to be formed.

[0055] Please refer to Figure 7 and Figure 8 , Figure 7 for Figure 8 A top view of the structure. Figure 8 for Figure 7 The cross-sectional structure schematic diagram along the EE1 direction shows that a color layer 204 is formed in a plurality of the opening units 202 .

[0056] Specifically, the method for forming the color layer 204 includes: forming a first photoresist layer 2041 in the first opening 2021 ; forming a second photoresist layer 2042 in the second opening 2022 ; and forming a third photoresist layer 2042 in the third opening 2023 .

[0057] It should be noted here that the first photoresist layer 2041 is not only formed in the first opening 2021, but also formed on the portion of the black matrix layer 201 adjacent to the first opening 2021, the second photoresist layer 2042 is not only formed in the second opening 2022, but also formed on the portion of the black matrix layer 201 adjacent to the second opening 2022, and the third photoresist layer 2043 is not only formed in the third opening 2023, but also formed on the portion of the black matrix layer 201 adjacent to the third opening 2023, which is beneficial to improving the process window of the first photoresist layer 2041, the second photoresist layer 2042 and the third photoresist layer 2043; in addition, the first photoresist layer 2041, the second photoresist layer 2042 and the third photoresist layer 2043 are isolated by the black matrix layer 201 to avoid color mixing abnormalities.

[0058] In this embodiment, the first photoresist layer 2041 is also formed on the black matrix layer 201 between the first openings 2021 adjacent to each other in the first direction X; the second photoresist layer 2042 is also formed on the black matrix layer 201 between the second openings 2022 adjacent to each other in the first direction X; and the third photoresist layer 2043 is also formed on the black matrix layer 201 between the third openings 2023 adjacent to each other in the first direction X.

[0059] In another embodiment, the first photoresist layer is formed only in the first opening, the second photoresist layer is formed only in the second opening, and the third photoresist layer is formed only in the third opening.

[0060] The first photoresist layer 2041 , the second photoresist layer 2042 and the third photoresist layer 2043 are respectively one of the three primary color photoresist materials of red (R), green (G) and blue (B), and the colors of the first photoresist layer 2041 , the second photoresist layer 2042 and the third photoresist layer 2043 are different from each other.

[0061] In this embodiment, the first photoresist layer 2041 is red, the second photoresist layer 2042 is green, and the third photoresist layer 2043 is blue.

[0062] In this embodiment, the method for forming the first photoresist layer 2041 includes: coating a first color photoresist material on the transparent substrate 200 to form a first color photoresist material layer (not shown in the figure); exposing the first color photoresist material layer using a first mask (not shown in the figure); removing the unexposed area of ​​the first color photoresist material layer by development; and baking the developed first color photoresist material layer to solidify the pattern.

[0063] In this embodiment, the method for forming the second photoresist layer 2042 includes: coating a second color photoresist material on the transparent substrate 200 to form a second color photoresist material layer (not shown in the figure); exposing the second color photoresist material layer using a second mask (not shown in the figure); removing the unexposed area of ​​the second color photoresist material layer by development; and baking the developed second color photoresist material layer to solidify the pattern.

[0064] In this embodiment, the method for forming the third photoresist layer 2043 includes: coating a third color photoresist material on the light-transmitting substrate to form a third color photoresist material layer (not shown in the figure); exposing the third color photoresist material layer using a third mask; removing the unexposed area of ​​the third color photoresist material layer by development; and baking the developed third color photoresist material layer to solidify the pattern.

[0065] In this embodiment, the coating process includes a spin coating process.

[0066] Please refer to Fig. 9 and Fig.10 , Fig.10 for Fig. 9 The top view of the protective layer 205 is omitted. Figure 8 for Figure 7 Schematic diagram of the cross-sectional structure along the EE1 direction, a protective layer 205 is formed on the black matrix layer 201 and the color layer 204; a shielding layer 206 is formed on the surface of the protective layer 205 on the frame area ii, and the shielding layer 206 has a first projection on the surface of the transparent substrate 200, and the groove 203 (such as Figure 6 As shown in the figure, there is a second projection on the surface of the light-transmitting substrate 200, and the second projection and the first projection at least partially overlap.

[0067] At this point, the groove 203 is used to isolate the impact of the environment on the performance of the liquid crystal display panel (such as water vapor and electrical interference). The light is blocked by the shielding layer 206 after passing through the groove 203. The shielding layer 206 is beneficial to improving the light transmission problem. At the same time, the groove 203 can be set to a position closer to the display area i to achieve a better water vapor and electricity isolation effect, and there are fewer restrictions on the position, width, etc. of the gate layer on the thin film transistor substrate side of the liquid crystal display panel, which is beneficial to improving the performance of the color filter while increasing the process window.

[0068] In this embodiment, the second projection is located within the range of the first projection, so that after the light passes through the slot, it can be completely or mostly blocked by the shielding layer.

[0069] Preferably, the slot 203 has a first width L1, the shielding layer 206 has a second width L2, and the difference between the second width L2 and the first width L1 is in the range of 6 μm to 10 μm. Limiting the difference between the second width L2 and the first width L1 is conducive to improving the light shielding ability of the shielding layer 206 and improving the light transmission problem.

[0070] In this embodiment, the material of the shielding layer 206 includes a black matrix material; the black matrix material includes low-reflectivity chromium or resin.

[0071] In this embodiment, the thickness of the shielding layer 206 is in the range of 1.0 μm to 1.1 μm. The reason for selecting the thickness range of the shielding layer 206 is to prevent the thickness from being too high and affecting the packaging of the liquid crystal display panel while having a good light shielding effect.

[0072] Please refer to Fig.11 and Fig.12 , Fig.11 for Fig.12 The schematic diagram of the top view of the protective layer 205 is omitted. Fig.12 for Fig.11 In the cross-sectional structural diagram along the EE1 direction, a plurality of support columns 207 are formed on the surface of the protective layer 205 on the black matrix layer 201.

[0073] Specifically, the support pillars 207 are located on the black matrix layer 201 between adjacent first openings 2021 , or between adjacent second openings 2022 , or between adjacent third openings 2023 in the first direction X.

[0074] In this embodiment, a plurality of support pillars 207 are formed after the shielding layer 206 is formed.

[0075] Correspondingly, the embodiment of the present invention also provides a color filter formed by the above method, please continue to refer to Figure 11 to Figure 12 The color filter comprises: a transparent substrate 200, wherein the transparent substrate 200 comprises a display area i and a frame area ii surrounding the display area i; a black matrix layer 201 located on the transparent substrate 200, wherein the black matrix layer 201 has a plurality of periodically arranged opening units 202 located on the display area i (such as Figure 5 or Figure 6 ) and the slot 203 located on the frame area ii (as shown Figure 5 or Figure 6 As shown), the groove 203 surrounds a number of the opening units 202, and the number of the opening units 202 and the groove 203 both expose the light-transmitting substrate 200; the color layer 204 is located in the number of the opening units 202; the protective layer 205 is located on the black matrix layer 201 and the color layer 204; the shielding layer 206 is located on the surface of the protective layer 205 on the frame area ii, and the shielding layer 206 has a first projection on the surface of the light-transmitting substrate 200, and the groove 203 has a second projection on the surface of the light-transmitting substrate 200, and the second projection is located within the range of the first projection.

[0076] At this point, the groove 203 is used to isolate the impact of the environment on the performance of the liquid crystal display panel (such as water vapor and electrical interference). The light is blocked by the shielding layer 206 after passing through the groove 203. The shielding layer 206 is beneficial to improving the light transmission problem. At the same time, the groove 203 can be set to a position closer to the display area i to achieve a better water vapor and electricity isolation effect, and there are fewer restrictions on the position, width, etc. of the gate layer on the thin film transistor substrate side of the liquid crystal display panel, which is beneficial to improving the performance of the color filter while increasing the process window.

[0077] In this embodiment, the opening units 202 are arranged in an array along a first direction X, and each of the opening units 202 includes a first opening 2021 , a second opening 2022 , and a third opening 2023 arranged along a second direction Y. The first direction X and the second direction Y are perpendicular to each other.

[0078] In this embodiment, the color layer 204 includes a first photoresist layer 2041 located in the first opening 2021 , a second photoresist layer 2042 located in the second opening 2022 , and a third photoresist layer 2043 located in the third opening 2023 .

[0079] In this embodiment, the slot 203 has a first width L1, and the first width L1 is greater than or equal to 5 μm.

[0080] In this embodiment, the distance D1 between the slot 203 and a plurality of the opening units 202 ranges from 50 μm to 300 μm.

[0081] In this embodiment, the second projection is located within the range of the first projection, so that after the light passes through the slot, it can be completely or mostly blocked by the shielding layer.

[0082] Preferably, the slot 203 has a first width L1, the shielding layer 206 has a second width L2, and the difference between the second width L2 and the first width L1 is in the range of 6 μm to 10 μm. Limiting the difference between the second width L2 and the first width L1 is conducive to improving the light shielding ability of the shielding layer 206 and improving the light transmission problem.

[0083] In this embodiment, the material of the shielding layer 206 includes a black matrix material; the black matrix material includes low-reflectivity chromium or resin.

[0084] In this embodiment, the thickness of the shielding layer 206 is in a range of 1.0 μm to 1.1 μm.

[0085] In this embodiment, the color filter further includes: a plurality of support pillars 207 located on the surface of the protection layer 205 on the black matrix layer 201 .

[0086] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the scope defined by the claims.

Claims

1. A color filter, characterized in that: include: A light-transmitting substrate, the light-transmitting substrate comprising a display area and a frame area surrounding the display area; a black matrix layer located on the light-transmitting substrate, wherein the black matrix layer has a plurality of periodically arranged opening units located on the display area and a groove located on the frame area, wherein the groove surrounds a plurality of the opening units, and both the plurality of the opening units and the groove expose the light-transmitting substrate; A color layer located in a plurality of the opening units; A protective layer located on the black matrix layer and the color layer; The shielding layer is located on the surface of the protective layer on the frame area, the shielding layer has a first projection on the surface of the transparent substrate, the groove has a second projection on the surface of the transparent substrate, and the second projection and the first projection at least partially overlap.

2. The color filter according to claim 1, wherein: The opening units are arranged in an array along a first direction, and each of the opening units includes a first opening, a second opening and a third opening arranged along a second direction, and the first direction is perpendicular to the second direction.

3. The color filter according to claim 2, wherein: The color layer includes a first photoresist layer located in the first opening, a second photoresist layer located in the second opening, and a third photoresist layer located in the third opening.

4. The color filter according to claim 1, wherein: The groove has a first width, and the first width is greater than or equal to 5 μm; the distance between the groove and a plurality of the opening units is in a range of 50 μm to 300 μm.

5. The color filter according to claim 1, wherein: The second projection is located within the range of the first projection; the slot has a first width, the shielding layer has a second width, and the difference between the second width and the first width ranges from 6 μm to 10 μm.

6. The color filter according to claim 1, wherein: The material of the shielding layer includes a black matrix material; the black matrix material includes chromium or resin.

7. The color filter according to claim 1, wherein: The shielding layer has a thickness ranging from 1.0 μm to 1.1 μm.

8. The color filter according to claim 1, wherein: Also includes: A plurality of support columns are located on the surface of the protection layer on the black matrix layer.

9. A method for forming a color filter, characterized in that: include: Providing a light-transmitting substrate, the light-transmitting substrate comprising a display area and a frame area surrounding the display area; forming a black matrix layer on the light-transmitting substrate, wherein the black matrix layer has a plurality of periodically arranged opening units located on the display area and a groove located on the frame area, wherein the groove surrounds a plurality of the opening units, and both the plurality of the opening units and the groove expose the light-transmitting substrate; forming a color layer in a plurality of the opening units; forming a protective layer on the black matrix layer and the color layer; A shielding layer is formed on the surface of the protection layer on the frame area, the shielding layer has a first projection on the surface of the transparent substrate, the groove has a second projection on the surface of the transparent substrate, and the second projection at least partially overlaps with the first projection.

10. The method for forming a color filter according to claim 9, wherein: Also includes: A plurality of support columns are formed on the surface of the protection layer on the black matrix layer.

11. The method for forming a color filter according to claim 10, wherein: A plurality of support pillars are formed after forming the shielding layer.

12. The method for forming a color filter according to claim 9, wherein: The opening units are arranged in an array along a first direction, and each of the opening units includes a first opening, a second opening and a third opening arranged along a second direction, and the first direction is perpendicular to the second direction; The method for forming the color layer includes: forming a first photoresist layer in the first opening; forming a second photoresist layer in the second opening; and forming a third photoresist layer in the third opening.

13. The method for forming a color filter according to claim 12, wherein: The first photoresist layer is also formed on the black matrix layer between the first openings adjacent to each other in the first direction; the second photoresist layer is also formed on the black matrix layer between the second openings adjacent to each other in the first direction; and the third photoresist layer is also formed on the black matrix layer between the third openings adjacent to each other in the first direction.

14. The method for forming a color filter according to claim 12, wherein: The method for forming the first photoresist layer includes: coating a first color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the first color photoresist material layer using a first mask; removing the unexposed area of ​​the first color photoresist material layer by development; and baking the developed first color photoresist material layer to solidify the pattern.

15. The method for forming a color filter according to claim 12, wherein: The method for forming the second photoresist layer includes: coating a second color photoresist material on the light-transmitting substrate to form a second color photoresist material layer; exposing the second color photoresist material layer using a second mask; removing the unexposed area of ​​the second color photoresist material layer by development; and baking the developed second color photoresist material layer to solidify the pattern.

16. The method for forming a color filter according to claim 12, wherein: The method for forming the third photoresist layer includes: coating a third color photoresist material on the light-transmitting substrate to form a third color photoresist material layer; exposing the third color photoresist material layer using a third mask; removing the unexposed area of ​​the third color photoresist material layer by development; and baking the developed third color photoresist material layer to solidify the pattern.

17. The method for forming a color filter according to claim 9, wherein: The groove has a first width, and the first width is greater than or equal to 5 μm; the distance between the groove and a plurality of the opening units is in a range of 50 μm to 300 μm.

18. The method for forming a color filter according to claim 9, wherein: The second projection is located within the range of the first projection; the slot has a first width, the shielding layer has a second width, and the difference between the second width and the first width ranges from 6 μm to 10 μm.

19. The method for forming a color filter according to claim 9, wherein: The material of the shielding layer includes a black matrix material; the black matrix material includes chromium or resin.

20. The method for forming a color filter according to claim 9, wherein: The shielding layer has a thickness ranging from 1.0 μm to 1.1 μm.

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