Undulator assembly, laser and optical imaging system

Abstract

The embodiment of the invention provides an undulator assembly, a laser and an optical imaging system, and relates to the technical field of laser. The optical power of the laser output by the undulator assembly can be adjusted, and when the undulator assembly is applied to the laser, the optical power of the laser output by the laser can be adjusted. The undulator assembly comprises a first undulator, a first regulation and control magnet and a second undulator. The first regulating magnet is arranged between the first undulator and the second undulator. The first regulating magnet is provided with a first magnetic center; an electron beam received by the undulator assembly sequentially passes through the first undulator, the first regulation and control magnet and the second undulator. And the first regulation and control magnet is used for shifting the movement track of the electron beam by a first angle by changing the position of the first magnetic center.

Description

Technical Field

[0001] This application relates to the field of laser technology, and in particular, to an undulator assembly, a laser, and an optical imaging system. Background Art

[0002] Lasers can be applied in technologies such as laser scanning, laser processing, lidar, etc. Among them, the optical power of the laser output by the laser is one of the important parameters of the laser. At present, free electron lasers (FELs) have attracted the attention of those skilled in the art because they can output lasers with relatively high optical power.

[0003] The principle of light emission of a free electron laser is to convert the kinetic energy of electrons into photons, and then generate a laser. In existing free electron lasers, the optical power of the output laser is relatively high, but the optical power of the output laser cannot be adjusted, which limits the application of the free electron laser in laser scanning and laser processing. Summary of the Invention

[0004] Embodiments of this application provide an undulator assembly, a laser, and an optical imaging system. The optical power of the laser output by the undulator assembly can be adjusted. When the undulator assembly is applied to a laser, the optical power of the laser output by the laser can be adjusted.

[0005] In a first aspect, an undulator assembly is provided. The undulator assembly includes: a first undulator, a first control magnet, and a second undulator. The first control magnet is disposed between the first undulator and the second undulator. The first control magnet has a first magnetic center; the electron beam received by the undulator assembly sequentially passes through the first undulator and the first control magnet. Among them, a first control magnet is disposed between the first undulator and the second undulator. The first control magnet is used to offset the motion trajectory of the electron beam by a first angle by changing the position of the first magnetic center. Among them, the magnetic field can generate a Lorentz force on the electron beam. When the electron beam just passes through the first magnetic center of the first control magnet, the Lorentz force generated by the first control magnet on the electron beam is 0, and the first angle by which the motion trajectory of the electron beam is offset is 0; when the electron beam does not pass through the first magnetic center of the first control magnet, the first control magnet generates a Lorentz force on the electron beam. Therefore, the first angle by which the motion trajectory of the electron beam is offset is not 0. The offset electron beam can enter or not enter the second undulator, thereby changing the optical power of the laser output by the undulator assembly, making the optical power of the laser output by the undulator assembly adjustable. When the undulator assembly is applied to a laser, the optical power of the laser output by the laser can be adjusted.

[0006] Optionally, the first regulating magnet includes a plurality of magnetic poles; the first regulating magnet is specifically configured to change the position of the first magnetic center by moving the position of at least one of the plurality of magnetic poles or adjusting the magnetic flux of at least one of the plurality of magnetic poles. In this optional manner, two methods for changing the position of the first magnetic center are provided. The first method is to change the position of the first magnetic center by moving the position of at least one of the plurality of magnetic poles. The second method is to change the position of the first magnetic center by adjusting the magnetic flux of at least one of the plurality of magnetic poles.

[0007] Optionally, the first regulating magnet is configured to receive a first signal and move the position of at least one of the plurality of magnetic poles under the action of the first signal.

[0008] Optionally, the first regulating magnet includes at least one position control device, and at least one magnetic pole is coupled to at least one position control device in a one-to-one correspondence; the position control device is configured to receive the first signal and move the position of the magnetic pole coupled to the position control device according to the first signal. In this optional manner, when changing the position of one magnetic pole can control the change of the first magnetic center of the first regulating magnet, the first regulating magnet includes one position control device, and this one position control device is coupled to the magnetic pole whose position needs to be moved. When changing the positions of a plurality of magnetic poles can control the change of the first magnetic center of the first regulating magnet, the first regulating magnet includes a plurality of position control devices, and the plurality of position control devices are coupled to the plurality of magnetic poles whose positions need to be moved in a one-to-one correspondence.

[0009] Optionally, the first regulating magnet is configured to receive a second signal and adjust the magnetic flux of at least one of the plurality of magnetic poles under the action of the second signal.

[0010] Optionally, the first regulating magnet includes at least one power source, and at least one magnetic pole is coupled to at least one power source in a one-to-one correspondence; the power source is configured to receive the second signal and change the voltage value transmitted to the magnetic pole coupled to the power source according to the second signal to adjust the magnetic flux of the magnetic pole coupled to the power source. In this optional manner, when adjusting the magnetic flux of one magnetic pole can control the change of the first magnetic center of the first regulating magnet, the first regulating magnet includes one power source, and this one power source is coupled to the magnetic pole whose magnetic flux needs to be adjusted. When adjusting the magnetic fluxes of a plurality of magnetic poles can control the change of the first magnetic center of the first regulating magnet, the first regulating magnet includes a plurality of power sources, and the plurality of power sources are coupled to the plurality of magnetic poles whose magnetic fluxes need to be adjusted in a one-to-one correspondence.

[0011] Optionally, the undulator assembly is used to output laser based on the electron beam; the frequency of the second signal received by the power supply is equal to the frequency of the laser. In this optional mode, the frequency of the second signal is equal to the frequency of the laser output by the undulator assembly. The undulator assembly can adjust the optical power pulse by pulse, and the adjustment of the optical power of the laser by the undulator assembly is relatively fine.

[0012] Optionally, the undulator assembly further includes a third undulator; the third undulator is located on the side of the first undulator away from the second undulator, or the third undulator is located on the side of the second undulator away from the first undulator.

[0013] Optionally, the undulator assembly further includes a second regulating magnet and a fourth undulator; the fourth undulator is located on the side of the second undulator away from the first undulator; the second regulating magnet is located between the second undulator and the fourth undulator; the second regulating magnet has a second magnetic center; the second regulating magnet is used to offset the motion trajectory of the electron beam by a second angle by changing the position of the second magnetic center. In this optional mode, the undulator assembly includes multiple undulators and multiple regulating magnets, and the multiple regulating magnets can perform a wide-range and fine adjustment on the optical power of the laser output by the undulator assembly.

[0014] Optionally, the undulator assembly is configured to output laser based on an electron beam; the first angle is greater than the critical deflection angle; the optical power of the laser output by the undulator assembly is a first value; when the first angle is greater than 0 and less than or equal to the critical deflection angle, the optical power of the laser output by the undulator assembly is a second value; when the first angle is 0, the optical power of the laser output by the undulator assembly is a third value; the third value is greater than the second value which is greater than the first value. In this optional mode, the first angle is 0; the optical power of the laser output by the undulator assembly is the third value. Since the first angle is 0, the electron beam can enter the second undulator, and the traveling direction of the electron beam in the second undulator remains unchanged and coincides with the magnetic center direction of the second undulator, and radiation light with a fixed wavelength can be generated. Moreover, the radiation light with a fixed wavelength maintains the original energy modulation state of the electron beam. The electron beam interacts with the radiation light with a fixed wavelength, causing the radiation light with a fixed wavelength to be amplified in gain and finally emitted. At this time, the optical power of the laser output by the undulator assembly is the largest, which is the third value. When the first angle is greater than the critical deflection angle, the electron beam can enter or not enter the second undulator. The traveling direction of the electron beam in the second undulator changes, the energy modulation state of the electron beam by the radiation light with a fixed wavelength changes, and the radiation light with a fixed wavelength is no longer amplified in gain. The optical power of the laser output by the undulator assembly is specifically the optical power of the radiation light emitted from the first undulator, and the optical power of the laser output by the undulator assembly is the smallest, which is the first value. When the first angle is greater than 0 and less than or equal to the critical deflection angle, the electron beam can enter the second undulator. The traveling directions of some electrons in the electron beam in the second undulator do not change, and radiation light with a fixed wavelength can be generated. Moreover, the radiation light with a fixed wavelength can maintain the original energy modulation state of some electrons in the electron beam. Some electrons in the electron beam interact with the radiation light with a fixed wavelength, causing the radiation light with a fixed wavelength to be amplified in gain and finally emitted, such that the optical power of the laser output by the undulator assembly is the second value. The second value is greater than the first value and less than the third value.

[0015] Optionally, the critical deflection angle is positively correlated with the wavelength of the laser and negatively correlated with the gain length of the first undulator.

[0016] Optionally, the critical deflection angle satisfies the following relationship: where λ is the wavelength of the laser, and L G is the gain length of the first undulator.

[0017] In a second aspect, a laser is provided, which includes an injector, an accelerator, and the undulator assembly according to any one of the above first aspects; the injector is configured to generate a low-speed electron beam and transmit the low-speed electron beam to the accelerator; the accelerator is configured to increase the speed of the low-speed electron beam, generate an electron beam, and transmit the electron beam to the undulator assembly; the undulator assembly is configured to output laser based on the electron beam.

[0018] Optionally, the laser further includes an optical power detection device and a processing device; the optical power detection device is configured to receive the laser and generate a feedback electrical signal according to the optical power of the laser; the processing device is configured to receive the feedback electrical signal, determine a first signal or a second signal applied to the undulator assembly, and a third signal applied to the injector according to the feedback electrical signal; the injector is specifically configured to generate a low-speed electron beam according to the third signal; the first regulation magnet in the undulator assembly is configured to receive the first signal or the second electrical signal applied to the undulator assembly, and change the position of the first magnetic center according to the first signal or the second signal; wherein, the first signal is used to indicate moving the position of at least one of the multiple magnetic poles in the first regulation magnet, and the second signal is used to indicate adjusting the magnetic flux of at least one of the multiple magnetic poles in the first regulation magnet.

[0019] In a third aspect, an optical imaging system is provided, including a projection device and a laser as described in any one of the above second aspects; the projection device is configured to transmit the laser output by the laser to a specified position.

[0020] Optionally, the optical imaging system further includes a beam shaping device; the beam shaping device is configured to shape the laser and transmit the shaped laser to the projection device; the projection device is specifically configured to transmit the shaped laser to a specified position.

[0021] Optionally, the optical imaging system further includes an optical power detection device and a processing device; the optical power detection device is configured to receive the shaped laser and generate a feedback electrical signal according to the optical power of the shaped laser; the processing device is configured to receive the feedback electrical signal, generate a fourth signal and a fifth signal according to the feedback electrical signal, transmit the fourth signal to the beam shaping device, and transmit the fifth signal to the laser; the fifth signal includes the first signal or the second signal applied to the undulator assembly in the laser and the third signal applied to the injector in the laser; the beam shaping device is specifically configured to shape the laser according to the fourth signal.

[0022] Wherein, for the technical effects brought by any possible implementation manner in the second aspect to the third aspect, reference may be made to the technical effects brought by different implementation manners in the above first aspect, which will not be elaborated here. Description of the Drawings

[0023] Figure 1 It is a schematic structural diagram of an undulator assembly provided by an embodiment of the present application;

[0024] Figure 2 is Figure 1 The optical power curve graph of the laser output by the undulator assembly shown;

[0025] Figure 3Schematic structural diagram of the regulation magnet provided by the embodiment of the present application;

[0026] Figure 4 Schematic structural diagram of the regulation magnet provided by another embodiment of the present application;

[0027] Figure 5 Schematic structural diagram of the regulation magnet provided by yet another embodiment of the present application;

[0028] Figure 6 Schematic structural diagram of the undulator assembly provided by another embodiment of the present application;

[0029] Figure 7 Schematic structural diagram of the undulator assembly provided by yet another embodiment of the present application;

[0030] Figure 8 For Figure 6 And Figure 7 Optical power curve graph of the laser output by the undulator assembly shown;

[0031] Figure 9 Schematic structural diagram of the undulator assembly provided by still another embodiment of the present application;

[0032] Figure 10 Schematic structural diagram of the laser provided by the embodiment of the present application;

[0033] Figure 11 Schematic structural diagram of the optical imaging system provided by the embodiment of the present application. Detailed implementation manners

[0034] Next, the technical solutions in the embodiments of the present application will be described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments.

[0035] Unless otherwise defined, all technical terms used herein have the same meaning as commonly understood by those of ordinary skill in the art. In the embodiments of this application, "at least one" means one or more, and "a plurality" means two or more. "And / or" describes the association relationship of associated objects and indicates that three relationships can exist. For example, A and / or B can represent: A exists alone, A and B exist simultaneously, and B exists alone, where A and B can be singular or plural. The character " / " generally indicates that the associated objects before and after are in an "or" relationship. "At least one (item)" or its similar expression refers to any combination of these items, including any combination of single item(s) or plural item(s). For example, at least one (item) of a, b, or c can represent: a, b, c, a and b, a and c, b and c, or a, b, and c, where a, b, and c can be single or multiple. Additionally, in the embodiments of this application, terms such as "first" and "second" do not limit the quantity and order.

[0036] In addition, in the embodiments of this application, orientation terms such as "upper" and "lower" are defined relative to the orientation in which the components in the drawings are schematically placed. It should be understood that these directional terms are relative concepts, and they are used for relative description and clarification, and they can change correspondingly according to the change of the orientation in which the components in the drawings are placed.

[0037] In the embodiments of this application, words such as "exemplary" or "for example" are used to represent examples, illustrations, or explanations. Any embodiment or design solution described as "exemplary" or "for example" in the embodiments of this application should not be construed as being more preferred or having more advantages than other embodiments or design solutions. Rather, the use of words such as "exemplary" or "for example" is intended to present relevant concepts in a specific manner.

[0038] Next, the technical solutions in the embodiments of this application will be described with reference to the accompanying drawings in the embodiments of this application. Obviously, the described embodiments are only a part of the embodiments of this application, rather than all of the embodiments.

[0039] An optical imaging system can be applied to technologies such as laser scanning, laser processing, and lidar. The optical imaging system includes a laser (also called a light source) and a projection device. The laser is used to output laser light, and the projection device is used to transmit the laser light output by the laser to a specified position. Among them, when the optical imaging system needs to output laser light with a relatively high optical power, the laser in the optical imaging system is usually a free electron laser (FEL). The optical power of the laser output by the free electron laser can reach the kilowatt level, and the wavelength range of the laser is from 1 nanometer (nm) to 200 nm.

[0040] The emission principle of a free electron laser is to convert the kinetic energy of electrons into photons, thereby generating laser light. Its main working principles are classified into the following categories: self-amplified spontaneous emission (SASE) principle, high gain harmonic generation (HGHG) principle, direct seeding principle, and echo-enabled harmonic generation (EEHG) principle.

[0041] However, the optical power of the laser output by existing free electron lasers is often not adjustable and cannot meet the requirements of optical imaging systems for the stability of the laser.

[0042] Therefore, an embodiment of the present application provides a undulator assembly, which can be disposed in a free electron laser. In the free electron laser, specifically, the undulator assembly receives an electron beam and converts the kinetic energy of the electrons in the electron beam into photons, thereby generating laser light.

[0043] Refer to Figure 1 As shown, an embodiment of the present application provides a schematic structural diagram of the undulator assembly 10. The undulator assembly 10 includes: an undulator 11-1 (also referred to as the first undulator), a regulating magnet 12-1 (also referred to as the first regulating magnet), and an undulator 11-2 (also referred to as the second undulator). Among them, the regulating magnet 12-1 is disposed between the undulator 11-1 and the undulator 11-2; the regulating magnet 11-1 has a first magnetic center; the electron beam (electron beam) eb sequentially passes through the undulator 11-1 and the regulating magnet 12-1.

[0044] Exemplarily, the undulator assembly 10 is used to output laser based on the electron beam eb; the principle is as follows: the undulator 11-1 includes a set of magnets with alternating magnetic poles, and this set of magnets can generate a periodically varying magnetic field along the z-axis direction, where the direction of the periodically varying magnetic field is along the y-axis direction; the undulator 11-2 includes a set, and this set of magnets can generate a periodically varying magnetic field along the z-axis direction, where the direction of the periodically varying magnetic field is along the y-axis direction. The electron beam eb enters the undulators 11-1 and 11-2 with alternating magnetic poles, and under the influence of the periodically varying magnetic field, it performs a torsional pendulum motion in the plane formed by the x-axis and the z-axis, and due to the torsional pendulum motion, electromagnetic radiation (light) is spontaneously generated in the z-axis direction. By reasonably selecting the parameters of the electron beam eb and the undulator, it is possible to make the radiation light with a fixed wavelength satisfy the resonance relationship and be continuously amplified. Among them, the fixed wavelength is related to the parameters of the undulator. Specifically, the radiation light with a fixed wavelength in the radiation light emitted by each pair of magnets that the electron beam eb passes through will undergo coherent superposition in the z-axis direction, and the radiation light with a fixed wavelength will also interact with the electron beam eb itself in the undulator, modulating the electron beam eb into an electron beam slice with a spatial structure. The spacing of the modulated electron beam slices is the fixed wavelength, thereby further enhancing the coherent radiation until saturation, generating free electron laser, that is, laser.

[0045] Exemplarily, the regulation magnet 12-1 is arranged between the undulator 11-1 and the undulator 11-2. The position of the first magnetic center of the regulation magnet 12-1 is position Loc1, and the coordinates of position Loc1 are (x1, y1, z1). After the electron beam eb exits from the undulator 11-1, the initial motion trajectory is to be transmitted along the z-axis direction. When the coordinates in the plane formed by the x-axis and the y-axis are (x1, y1), the electron beam eb will pass through the first magnetic center of the regulation magnet 12-1. The first magnetic center of the regulation magnet 12-1 will not generate a Lorentz force on the electron beam eb, and the electron beam eb will be transmitted along the initial motion trajectory to the undulator 11-2 and finally output laser.

[0046] In order to make the optical power of the laser output by the undulator assembly 10 adjustable, the regulation magnet 12-1 is used to offset the motion trajectory of the electron beam eb by the first angle α by changing the position of the first magnetic center. Exemplarily, referring to Figure 1As shown, the position of the first magnetic center of the regulating magnet 12-1 changes. For example, the position of the first magnetic center changes from position Loc1 to position Loc2, where the coordinates of position Loc2 are (x1, y2, z1). After the electron beam eb exits from the undulator 11-1, it will not pass through the first magnetic center of the regulating magnet 12-1. The first magnetic center of the regulating magnet 12-1 can generate a Lorentz force on the electron beam eb, thereby offsetting the movement trajectory of the electron beam eb. After the movement trajectory of the electron beam eb is offset, the optical power of the laser output by the undulator assembly 10 will change.

[0047] Exemplarily, the first angle α is an angle without directionality. The first angle α is related to the position change of the first magnetic center of the regulating magnet 12-1. When the position of the first magnetic center changes from position Loc1 to position Loc2, by calculating the offset between position Loc1 and position Loc2 and combining the focal length of the regulating magnet 12-1, the value of the first angle α can be calculated according to the trigonometric function relationship.

[0048] Exemplarily, referring to Figure 2 as shown, Figure 2 the abscissa shown is the z-axis, and the ordinate is Figure 1 the optical power of the laser output by the undulator assembly 10 shown. Among them, the first angle α of the offset of the movement trajectory of the electron beam eb is negatively correlated with the optical power of the laser output by the undulator assembly 10.

[0049] Specifically, referring to Figure 2 Curve three, the first angle α is 0; the optical power of the laser output by the undulator assembly 10 is the third value P3. Since the first angle α is 0, the electron beam eb can enter the undulator 11-2. The traveling direction of the electron beam eb in the undulator 11-2 remains unchanged and coincides with the magnetic center direction of the undulator 11-2, and can generate radiation light with a fixed wavelength. Moreover, the radiation light with a fixed wavelength maintains the original energy modulation state of the electron beam eb. The electron beam eb interacts with the radiation light with a fixed wavelength, causing the radiation light with a fixed wavelength to be amplified in gain and finally exit. At this time, the optical power of the laser output by the undulator assembly 10 is the largest, which is the third value P3.

[0050] Specifically, referring to Figure 2For curve 1, the first angle α is greater than the critical deflection angle; the optical power of the laser output by the undulator assembly 10 is the first value P1. Since the first angle α is greater than the critical deflection angle, the electron beam eb may or may not enter the undulator 11-2. The traveling direction of the electron beam eb in the undulator 11-2 changes, and the energy modulation state of the electron beam eb by the radiation light with a fixed wavelength changes. The radiation light with a fixed wavelength is no longer gain-amplified. The optical power of the laser output by the undulator assembly 10 is specifically the optical power of the radiation light emitted from the undulator 11-1, and the optical power of the laser output by the undulator assembly 10 is the first value P1.

[0051] Specifically, referring to Figure 2 For curve 2, the first angle α is greater than 0 and less than or equal to the critical deflection angle; the optical power of the laser output by the undulator assembly 10 is the second value P2. At this time, since the first angle α is greater than 0 and less than or equal to the critical deflection angle, the electron beam eb can enter the undulator 11-2. Among them, the traveling directions of some electrons in the electron beam eb in the undulator 11-2 do not change, and radiation light with a fixed wavelength can be generated. The radiation light with a fixed wavelength can maintain the original energy modulation state of some electrons in the electron beam eb. Some electrons in the electron beam eb interact with the radiation light with a fixed wavelength, causing the radiation light with a fixed wavelength to be gain-amplified and finally emitted, so that the optical power of the laser output by the undulator assembly 10 is the second value P2. The second value P2 is greater than the first value P1, and the second value P2 is less than the third value P3.

[0052] Exemplarily, the critical deflection angle is positively correlated with the wavelength of the laser output by the undulator assembly 10, and the critical deflection angle is negatively correlated with the gain length of the undulator 11-1.

[0053] Specifically, the critical deflection angle satisfies the following relationship: where λ is the wavelength of the laser, and L G is the gain length of the undulator 11-1. For example, when the wavelength of the laser is 20 nm and the gain length of the undulator 11-1 is 3 meters (m), the critical deflection angle can be calculated to be approximately equal to 82 microradians (μrad).

[0054] Exemplarily, the regulating magnet 12-1 offsets the movement trajectory of the electron beam eb by a first angle α by changing the position of the first magnetic center. Specifically, the regulating magnet 12-1 includes multiple magnetic poles. For example, the regulating magnet 12-1 is a dipole magnet, and the regulating magnet 12-1 includes two magnetic poles. For example, the regulating magnet 12-1 is a quadrupole magnet, and the regulating magnet 12-1 includes four magnetic poles. For example, the regulating magnet 12-1 is a hexapole magnet, and the regulating magnet 12-1 includes six magnetic poles. For example, the regulating magnet 12-1 is an octupole magnet, and the regulating magnet 12-1 includes eight magnetic poles. The regulating magnet 12-1 is specifically configured to change the position of the first magnetic center by moving the position of at least one of the multiple magnetic poles or adjusting the magnetic flux of at least one of the multiple magnetic poles.

[0055] Exemplarily, taking the quadrupole magnet as an example, when the position and magnetic flux of each magnetic pole in the quadrupole magnet are determined, the position of the magnetic center of the quadrupole magnet is determined. Then, keeping the magnetic flux unchanged and moving the position of at least one of the four magnetic poles, the position of the magnetic center of the quadrupole magnet will change; keeping the positions of the four magnetic poles unchanged and adjusting the magnetic flux of at least one of the four magnetic poles, the position of the magnetic center of the quadrupole magnet will also change.

[0056] Specifically, the regulating magnet 12-1 is configured to receive a first signal and move the position of at least one of the four magnetic poles under the action of the first signal. Refer to Figure 3 as shown in Figure 3 is Figure 1 a cross-sectional view of the regulating magnet 12-1 along AA' shown in Figure 3 Taking the quadrupole magnet as an example for the regulating magnet shown, wherein the regulating magnet 12-1 includes four magnetic poles, namely magnetic pole 121-1, magnetic pole 121-2, magnetic pole 121-3, and magnetic pole 121-4, and each magnetic pole includes an iron core and a coil.

[0057] Exemplarily, refer to Figure 3 as shown in, the regulating magnet 12-1 further includes an outer frame 123. The cross-sectional view of the outer frame 123 is rectangular, and the four magnets are respectively located on one side of the rectangle. Among them, applying the same voltage to the coils in each of the four magnetic poles can generate a magnetic field within the outer frame 123 of the regulating magnet 12-1. For example, the position of the first magnetic center of the regulating magnet 12-1 is Loc1. Without changing the voltage applied to the coils of each magnetic pole, moving the position of at least one of the magnetic poles 121-1, magnetic pole 121-2, magnetic pole 121-3, and magnetic pole 121-4 under the action of the first signal can cause the magnetic field of the regulating magnet 12-1 to change, that is, the position of the first magnetic center of the regulating magnet 12-1 changes.

[0058] Specifically, refer to Figure 3As shown, the regulating magnet 12-1 includes at least one position control device, and at least one magnetic pole is coupled to at least one position control device in a one-to-one correspondence. Among them, Figure 3 the regulating magnet 12-1 shown includes four magnetic poles. For example, when it is necessary to move the position of the magnetic pole 121-2 in the regulating magnet 12-1, the regulating magnet 12-1 includes a position control device 122-2, and the position control device 122-2 is coupled to the magnetic pole 121-2; for example, when it is necessary to move the positions of the magnetic poles 121-1 and 122-1 in the regulating magnet 12-1, the regulating magnet 12-1 includes the position control device 122-1 and the position control device 122-2, the position control device 122-1 is coupled to the magnetic pole 121-1, and the position control device 122-2 is coupled to the magnetic pole 121-2; for example, when it is necessary to move the positions of the 4 magnetic poles in the regulating magnet 12-1, the regulating magnet 12-1 includes 4 position control devices, and the 4 position control devices are coupled to the 4 magnetic poles in a one-to-one correspondence, that is, the position control device 122-1 is coupled to the magnetic pole 121-1, the position control device 122-2 is coupled to the magnetic pole 121-2, the position control device 122-3 is coupled to the magnetic pole 121-3, and the position control device 122-4 is coupled to the magnetic pole 121-4.

[0059] Among them, the position control device receives a first signal and moves the position of the magnetic pole coupled to the position control device according to the first signal. Exemplarily, the position control device includes any one of the following: a piezoelectric-based displacement generating device, a mechanical-based displacement generating device, and a micro-electro-mechanical system (MEMS)-based displacement generating device.

[0060] Specifically, in one example, as Figure 4 shown, for example, it can be that the regulating magnet 12-1 includes a position control device 122-2, the position control device 122-2 is coupled to the magnetic pole 121-2, the first signal includes information indicating that the magnetic pole 121-2 moves a first length in a first direction, where the magnetic pole 121-2 is located on the second side of the frame 123, and the first direction is perpendicular to the second side of the frame 123. The position control device 122-2 receives the first signal and moves the position of the magnetic pole 121-2 along the first direction by the first length according to the first signal, and finally changes the position of the first magnetic center of the regulating magnet 12-1 from the position Loc1 to the position Loc2.

[0061] Exemplarily, when the four-stage iron focal length is selected to be 10 m and the first length of the movement of the magnetic pole 121-2 is adjusted to be 100 micrometers (μm), then the first angle α can be calculated to be equal to 10 μrad. When the critical deflection angle is 82 μrad, the first angle is less than the critical deflection angle, and the optical power value of the laser output by the undulator assembly 10 can be, for example,Figure 2 The second value P2 shown.

[0062] In another example, for instance, the regulating magnet 12-1 may include a position control device 122-1 and a position control device 122-2. The position control device 122-1 is coupled to the magnetic pole 121-1, and the position control device 122-2 is coupled to the magnetic pole 121-2. The first signal includes information indicating that the magnetic pole 121-1 moves a second length in the second direction and information indicating that the magnetic pole 121-2 moves a first length in the first direction. Here, the magnetic pole 121-1 is located on the first side of the frame 123, the second direction is perpendicular to the first side of the frame 123, the magnetic pole 121-2 is located on the second side of the frame 123, and the first direction is perpendicular to the second side of the frame 123. Then, the position control device 122-1 receives the first signal and moves the position of the magnetic pole 121-1 a second length in the second direction according to the first signal; the position control device 122-2 receives the first signal and moves the position of the magnetic pole 121-2 a first length in the first direction according to the first signal. Thereby, the position of the first magnetic center of the regulating magnet 12-1 is changed.

[0063] In some other embodiments, such as Figure 3 or Figure 4 shown, the regulating magnet 12-1 includes 4 position control devices. In some cases, the positions of the four magnetic poles can be moved simultaneously. In some other cases, when only the movement of the magnetic pole 121-2 needs to be indicated, the first signal may include information indicating that the magnetic pole 121-2 moves a first length in the first direction and information indicating that the magnetic poles 121-1, 121-3, and 121-4 do not move. The position control device 122-2 receives the first signal and moves the position of the magnetic pole 121-2 a first length in the first direction according to the first signal; the position control device 122-1 receives the first signal and does not move the position of the magnetic pole 121-1 according to the first signal; the position control device 122-3 receives the first signal and does not move the position of the magnetic pole 121-3 according to the first signal; the position control device 122-4 receives the first signal and does not move the position of the magnetic pole 121-4 according to the first signal. Finally, the position of the first magnetic center of the regulating magnet 12-1 is changed from the position Loc1 to the position Loc2.

[0064] Among them, when the frequency of the laser output by the undulator assembly 10 is less than or equal to 1 kilohertz (kHz), the switching period of the position control device is 1 millisecond (ms), that is, the frequency of the first signal is 1 kHz, and the frequency of the first signal is equal to the frequency of the laser output by the undulator assembly 10. In this way, the optical power of the laser output by the undulator assembly 10 can be adjusted pulse by pulse. When the frequency of the laser output by the undulator assembly 10 is greater than or equal to 1 kilohertz (kHz), and the switching period of the position control device is 1 ms, at this time, the laser output by the undulator assembly 10 is adjusted in groups of every m, where m is equal to the switching period of the position control device divided by the period of the laser output by the undulator assembly 10, and the frequency of the first signal is less than the frequency of the laser output by the undulator assembly 10.

[0065] In some other examples, the regulating magnet 12-1 is configured to receive a second signal and adjust the magnetic flux of at least one of the plurality of magnetic poles under the action of the second signal.

[0066] Referring to Figure 5 As shown, taking a four-stage iron as an example, the regulating magnet 12-1 includes four magnetic poles, namely magnetic pole 121-1, magnetic pole 121-2, magnetic pole 121-3, and magnetic pole 121-4. Each magnetic pole includes an iron core and a coil.

[0067] Exemplarily, referring to Figure 5 As shown, the regulating magnet 12-1 further includes an outer frame 123. The cross-section of the outer frame 123 is rectangular, and the four magnets are respectively located on one side of the rectangle. Specifically, a base is provided on the outer frame 123. Among them, the magnetic pole 121-1 is located on the base 124-1 of the first side of the rectangular outer frame, the magnetic pole 121-2 is located on the base 124-2 of the second side of the rectangular outer frame, the magnetic pole 121-3 is located on the base 124-3 of the third side of the rectangular outer frame, and the magnetic pole 121-4 is located on the base 124-4 of the fourth side of the rectangular outer frame. Among them, applying the same voltage to the coils in each of the four magnetic poles can generate a magnetic field inside the outer frame 123 of the regulating magnet 12-1. The first magnetic center of the regulating magnet 12-1 is located at the center of the rectangular outer frame 123, and the position of the first magnetic center is Loc1. Without moving the positions of the four magnetic poles, by changing the magnetic flux of at least one of the magnetic poles 121-1, 121-2, 121-3, and 121-4, the magnetic field of the regulating magnet 12-1 can be changed, that is, the position of the first magnetic center of the regulating magnet 12-1 is changed.

[0068] Specifically, referring to Figure 5 As shown, the regulating magnet 12-1 includes at least one power source, and at least one magnetic pole is coupled to at least one power source in a one-to-one correspondence. Among them, Figure 3The shown regulating magnet 12-1 includes four magnetic poles. For example, when only the magnetic flux of the magnetic pole 121-2 in the regulating magnet 12-1 needs to be adjusted, the regulating magnet 12-1 includes a power supply 125-2, and the power supply 125-2 is coupled to the magnetic pole 121-2; for example, when the magnetic fluxes of the magnetic pole 121-2 and the magnetic pole 122-3 in the regulating magnet 12-1 need to be adjusted, the regulating magnet 12-1 includes a power supply 125-2 and a power supply 125-3, the power supply 125-2 is coupled to the magnetic pole 121-2, and the power supply 125-3 is coupled to the magnetic pole 121-3; for example, when the magnetic fluxes of the 4 magnetic poles in the regulating magnet 12-1 need to be adjusted, the regulating magnet 12-1 includes 4 power supplies, and the 4 power supplies are coupled to the 4 magnetic poles in one-to-one correspondence, that is, the power supply 125-1 is coupled to the magnetic pole 121-1, the power supply 125-2 is coupled to the magnetic pole 121-2, the power supply 125-3 is coupled to the magnetic pole 121-3, and the power supply 125-4 is coupled to the magnetic pole 121-4.

[0069] Wherein, the power supply is configured to receive a second signal, change the voltage value transmitted to the magnetic pole coupled to the power supply according to the second signal, so as to adjust the magnetic flux of the magnetic pole coupled to the power supply. Exemplarily, the second signal is specifically an electrical signal.

[0070] Specifically, in one example, as Figure 5 shown, for example, the regulating magnet 12-1 may include a power supply 125-2, the power supply 125-2 is coupled to the magnetic pole 121-2, and the second signal includes information indicating a decrease in the magnetic flux of the magnetic pole 121-2. The power supply 125-2 receives the second signal and changes the voltage value transmitted to the magnetic pole 121-2 according to the second signal, so as to reduce the magnetic flux of the magnetic pole 121-2. Finally, the position of the first magnetic center of the regulating magnet 12-1 changes from the position Loc1 to the position Loc2.

[0071] In another example, the regulating magnet 12-1 includes a power supply 125-2 and a power supply 125-3, the power supply 125-2 is coupled to the magnetic pole 121-2, the power supply 125-3 is coupled to the magnetic pole 121-3, and the second signal includes information indicating a decrease in the magnetic flux of the magnetic pole 121-2 and information indicating an increase in the magnetic flux of the magnetic pole 121-3. The power supply 125-2 receives the second signal and changes the voltage value transmitted to the magnetic pole 121-2 according to the second signal, so as to reduce the magnetic flux of the magnetic pole 121-2; the power supply 125-3 receives the second signal and changes the voltage value transmitted to the magnetic pole 121-3 according to the second signal, so as to increase the magnetic flux of the magnetic pole 121-3. Finally, the position of the first magnetic center of the regulating magnet 12-1 changes.

[0072] In some other embodiments, as Figure 5As shown, the regulating magnet 12-1 includes 4 power supplies, and in some cases, the magnetic fluxes of four magnetic poles can be adjusted simultaneously. In some other cases, when only the magnetic flux of the magnetic pole 121-2 needs to be adjusted, the first signal includes information indicating a decrease in the magnetic flux of the magnetic pole 121-2 and information indicating that the magnetic fluxes of the magnetic poles 121-1, 121-3, and 121-4 remain unchanged. The power supply 125-2 receives the second signal and changes the voltage value transmitted to the magnetic pole 121-2 according to the second signal so that the magnetic flux of the magnetic pole 121-2 decreases; the power supply 125-1 receives the second signal and does not change the voltage value transmitted to the magnetic pole 121-1 according to the second signal so that the magnetic flux of the magnetic pole 121-1 remains unchanged; the power supply 125-3 receives the second signal and does not change the voltage value transmitted to the magnetic pole 121-3 according to the second signal so that the magnetic flux of the magnetic pole 121-3 remains unchanged; the power supply 125-4 receives the second signal and does not change the voltage value transmitted to the magnetic pole 121-4 according to the second signal so that the magnetic flux of the magnetic pole 121-4 remains unchanged. Finally, the position of the first magnetic center of the regulating magnet 12-1 is changed from the position Loc1 to the position Loc2.

[0073] Wherein, the switching frequency of the power supply can be greater than or equal to 1 MHz. Then, when the frequency of the laser output by the undulator assembly 10 is less than or equal to 1 kHz, or when the frequency of the laser output by the undulator assembly 10 is greater than or equal to 1 MHz, the frequency of the second signal can be controlled to be equal to the frequency of the laser output by the undulator assembly 10, thereby realizing the adjustment of the optical power of the laser output by the undulator assembly 10 pulse by pulse.

[0074] In some examples, referring to Figure 6 as shown, Figure 6 is a schematic structural diagram of the undulator assembly 10 provided by another embodiment of the present application. Among them, compared with Figure 1 the undulator assembly 10 shown, Figure 6 the undulator assembly 10 shown further includes: an undulator 11-3 (also referred to as the third undulator); the undulator 11-3 is located on the side of the undulator 11-2 away from the undulator 11-1. The electron beam eb can pass through the undulator 11-1 and the regulating magnet 12-1.

[0075] Exemplarily, referring to Figure 7 as shown, Figure 7 is a schematic structural diagram of the undulator assembly provided by another embodiment of the present application. Among them, compared with Figure 6 the undulator assembly 10 shown, Figure 7 in the undulator assembly 10 shown, the undulator 11-3 is located on the side of the undulator 11-1 away from the undulator 11-2. The electron beam eb can pass through the undulator 11-3, the undulator 11-1, and the regulating magnet 12-1.

[0076] Referring to Figure 8 as shown Figure 8 wherein the abscissa shown is the z-axis and the ordinate is the optical power of the laser output by the undulator assembly 10. Among them, Figure 8 Curve 1, Curve 2, and Curve 3 shown correspond to Figure 6 the undulator assembly 10 shown Figure 7 Curve 1, Curve 4, and Curve 5 shown correspond to Figure 7 the undulator assembly shown

[0077] Specifically, referring to Figure 8 Curve 4 of Figure 6 or Figure 7 in the undulator assembly 10 shown, when the first angle α by which the control magnet 12-1 deflects the movement trajectory of the electron beam eb is 0, the optical power of the laser output by the undulator assembly 10 is the fourth value P4. Among them, Figure 6 the electron beam eb shown passes through the undulator 11-1, the control magnet 12-1, the undulator 11-2, and the undulator 11-3 in sequence, Figure 7 the electron beam eb shown passes through the undulator 11-3, the undulator 11-1, the control magnet 12-1, and the undulator 11-3 in sequence. Among them, the traveling direction of the electron beam eb in the undulator 11-1 coincides with the changing direction of the magnetic center of the undulator 11-1, the traveling direction of the electron beam eb in the undulator 11-2 coincides with the changing direction of the magnetic center of the undulator 11-2, the traveling direction of the electron beam eb in the undulator 11-3 coincides with the changing direction of the magnetic center of the undulator 11-3. Each swing and turn of the electron beam eb in the undulator 11-1, the undulator 11-2, and the undulator 11-3 generates radiation light. The radiation light with a fixed wavelength in the radiation light maintains the original energy modulation state of the electron beam eb, so that the radiation light with a fixed wavelength is amplified by gain and finally exits. And at this time, the optical power of the laser output by the undulator assembly 10 is the largest, which is the fourth value P4.

[0078] Referring to Figure 8 Curve 5 shown, in Figure 6 the undulator assembly 10 shown, when the first angle α by which the control magnet 12-1 deflects the movement trajectory of the electron beam eb is greater than the critical deflection angle; the optical power of the laser output by the undulator assembly 10 is the fifth value P5. Among them, the electron beam eb passes through the undulator 11-1 and the control magnet 12-1 in sequence, and the electron beam eb can enter or not enter the undulator 11-2 and the undulator 11-3. The traveling direction of the electron beam eb in the undulator 11-2 and the undulator 11-3 changes, the energy modulation state of the electron beam eb by the radiation light with a fixed wavelength changes, and the radiation light with a fixed wavelength is no longer amplified by gain, Figure 6The optical power of the laser output by the undulator assembly 10 shown is specifically the optical power of the radiation light emitted from the undulator 11-1. At this time, Figure 6 The optical power of the laser output by the undulator assembly 10 shown is the minimum, which is the fifth value P5.

[0079] Refer to Figure 8 Curve six shown. In Figure 6 In the undulator assembly 10 shown, in the first angle α at which the control magnet 12-1 deflects the movement trajectory of the electron beam eb is greater than 0 and less than or equal to the critical deflection angle; the optical power of the laser output by the undulator assembly 10 is the sixth value P6. Among them, the electron beam eb passes through the undulator 11-1 and the control magnet 12-1 in sequence. The electron beam eb can enter the undulators 11-2 and 11-3. The traveling directions of some electrons in the electron beam eb do not change in the undulators 11-2 and 11-3, and radiation light with a fixed wavelength can be generated. The radiation light with a fixed wavelength can maintain the original energy modulation state of some electrons in the electron beam eb. Some electrons in the electron beam eb interact with the radiation light with a fixed wavelength, causing the radiation light with a fixed wavelength to be amplified and finally emitted, so that Figure 6 The optical power of the laser output by the undulator assembly 10 shown is the sixth value P6. The sixth value P6 is greater than the fifth value P5, and the sixth value P6 is less than the fourth value P4.

[0080] Exemplarily, Figure 6 The adjustment range of the optical power of the laser output by the undulator assembly 10 shown is the fourth value P4 minus the fifth value P5.

[0081] Refer to Figure 8 Curve seven shown. In Figure 7 In the undulator assembly 10 shown, in the first angle α at which the control magnet 12-1 deflects the movement trajectory of the electron beam eb is greater than the critical deflection angle; the optical power of the laser output by the undulator assembly 10 is the seventh value P7. Among them, the electron beam eb passes through the undulators 11-3, 11-1 and the control magnet 12-1 in sequence. The electron beam eb may or may not enter the undulator 11-2. The traveling direction of the electron beam eb changes in the undulator 11-2. The energy modulation state of the electron beam eb is changed by the radiation light with a fixed wavelength, and the radiation light with a fixed wavelength is no longer amplified, Figure 7 The optical power of the laser output by the undulator assembly 10 shown is specifically the optical power of the radiation light emitted from the undulator 11-1. At this time, Figure 7 The optical power of the laser output by the undulator assembly 10 shown is the minimum, which is the seventh value P7.

[0082] Refer to Figure 8 Curve eight shown. Figure 7In the undulator assembly 10 shown, in the first angle α where the control magnet 12-1 deflects the movement trajectory of the electron beam eb is greater than 0 and less than or equal to the critical deflection angle; the optical power of the laser output by the undulator assembly 10 is the eighth value P8. Among them, the electron beam eb passes through the undulator 11-3, the undulator 11-1 and the control magnet 12-1 in sequence, the electron beam eb can enter the undulator 11-2, the traveling directions of some electrons in the electron beam eb do not change in the undulator 11-2, and radiation light with a fixed wavelength can be generated, and the radiation light with a fixed wavelength can maintain the original energy modulation state of some electrons in the electron beam eb. Some electrons in the electron beam eb interact with the radiation light with a fixed wavelength, so that the radiation light with a fixed wavelength is amplified in gain and finally exits, such that Figure 7 the optical power of the laser output by the undulator assembly 10 shown is the eighth value P8, the eighth value P8 is greater than the seventh value P7, and the eighth value P8 is less than the fourth value P4.

[0083] Exemplarily, Figure 7 the adjustment range of the optical power of the laser output by the undulator assembly 10 shown is the fourth value P4 minus the seventh value P7.

[0084] Among them, Figure 6 the deflection of the movement trajectory of the electron beam eb by the control magnet 12-1 shown can affect the undulator 11-2 and the undulator 11-3, while Figure 7 the deflection of the movement trajectory of the electron beam eb by the control magnet 12-1 shown only affects the undulator 11-2, so the seventh value P7 is greater than the fifth value P5. Figure 6 the adjustment range of the optical power of the laser output by the undulator assembly 10 shown is greater than Figure 7 the adjustment range of the optical power of the laser output by the undulator assembly 10 shown. Referring to Figure 8 it can be known that when there are multiple undulators in the undulator assembly 10, the closer the control magnet 12-1 is set to the receiving side of the undulator assembly 10, the greater the adjustment range of the optical power of the laser output by the undulator assembly 10; the closer the control magnet 12-1 is set to the output side of the undulator assembly 10, the smaller the adjustment range of the optical power of the laser output by the undulator assembly 10.

[0085] Exemplarily, Figure 6 or Figure 7 the undulator assembly 10 shown may include more undulators, and the embodiments of the present application do not limit this. For example, Figure 6 in the undulator assembly 10 shown, other undulators may also be provided on the side of the undulator 11-3 away from the undulator 11-2, and other undulators may also be provided on the side of the undulator 11-1 away from the undulator 11-2. Again, for example, Figure 7In the undulator assembly 10 shown, other undulators can also be provided on the side of the undulator 11-1 away from the undulator 11-1, and other undulators can also be provided on the side of the undulator 11-3 away from the undulator 11-1.

[0086] Exemplarily, when the undulator assembly 10 includes three or more undulators, in order to increase the adjustment range of the optical power of the laser output by the undulator assembly 10 and achieve fine adjustment within a large range, two or more control magnets are provided in the undulator assembly 10. Specifically, referring to Figure 9 shown, among which, compared with Figure 1 the undulator assembly 10 shown, Figure 9 the undulator assembly 10 shown also includes a control magnet 12-2 (also referred to as the second control magnet) and an undulator 11-4 (also referred to as the fourth undulator); the undulator 11-4 is located on the side of the undulator 11-2 away from the undulator 11-1; the control magnet 12-2 is located between the undulator 11-2 and the undulator 11-4; the control magnet 12-2 has a second magnetic center.

[0087] Among them, the control magnet 12-2 is used to offset the movement trajectory of the electron beam eb by a second angle β by changing the position of the second magnetic center. Exemplarily, the control magnet 12-2 includes a plurality of magnetic poles. Specifically, the control magnet 12-2 is used to change the position of the second magnetic center by moving the position of at least one of the plurality of magnetic poles or adjusting the magnetic flux of at least one of the plurality of magnetic poles. Among them, when the control magnet 12-2 changes the position of the second magnetic center by moving the position of at least one of the plurality of magnetic poles, the cross-sectional view of the control magnet 12-2 along BB' can refer to Figure 3 shown. Specifically, the control magnet 12-2 also receives a first signal, and under the action of the first signal, moves the position of at least one of the plurality of magnetic poles in the control magnet 12-2, which will not be elaborated here; when the control magnet 12-2 changes the position of the second magnetic center by adjusting the magnetic flux of at least one of the plurality of magnetic poles, the cross-sectional view of the control magnet 12-2 along BB' can refer to Figure 5 shown. Specifically, the control magnet 12-2 also receives a second signal, and under the action of the second signal, adjusts the position of at least one of the plurality of magnetic poles in the control magnet 12-2, which will not be elaborated here.

[0088] Exemplarily, in Figure 9 the undulator assembly 10 shown including the control magnet 12-1 and the control magnet 12-2, the optical power of the laser output by the undulator assembly 10 can be adjusted within a large range, and the adjustment accuracy is relatively high.

[0089] In some embodiments, Figure 9The undulator assembly 10 shown also includes an undulator 11-3, where the undulator 11-3 can be disposed between the undulator 11-2 and the regulation magnet 12-2; alternatively, the undulator 11-3 can be disposed on the side of the undulator 11-4 away from the regulation magnet 12-2; or the undulator 11-3 can be disposed on the side of the undulator 11-1 away from the regulation magnet 12-1.

[0090] In some other embodiments, when the undulator assembly 10 includes k undulators, the undulator assembly 10 will include k-1 regulation magnets, and one regulation magnet is disposed between every two adjacent undulators, so that the optical power of the laser output by the undulator assembly 10 can be finely adjusted within a relatively large range.

[0091] Exemplarily, referring to Figure 10 shown, an embodiment of the present application provides a schematic structural diagram of a laser 60, where the laser 60 includes an injector 20, an accelerator 30, and the undulator assembly 10 as described above Figure 1 or Figure 6 or Figure 7 or Figure 9 shown.

[0092] Among them, the injector 20 is used to generate a low-speed electron beam and transmit the low-speed electron beam to the accelerator 30. The accelerator 30 is used to increase the speed of the low-speed electron beam, generate an electron beam, and transmit the electron beam to the undulator assembly 10. Exemplarily, usually the speed of the electron beam eb generated by the accelerator 30 is equal to the speed of light. The undulator assembly 10 is used to output a laser based on the electron beam eb.

[0093] In some examples, the laser 60 further includes an optical power detection device 40 and a processing device 50. Exemplarily, the optical power detection device 40 is used to receive the laser output by the undulator assembly 10, generate a feedback electrical signal according to the optical power of the laser, and transmit the feedback electrical signal to the processing device 50. The processing device 50 is used to receive the feedback electrical signal, determine a first signal or a second signal applied to the undulator assembly 10, and a third signal applied to the injector 20 according to the feedback electrical signal, and transmit the first signal or the second signal to the undulator assembly 10, and transmit the third signal to the injector 20. The injector 20 is specifically used to generate a low-speed electron beam according to the third signal; Exemplarily, when the third signal is different, the number of electrons in the low-speed electron beam generated by the injector 20 is different.

[0094] The undulator assembly 10 receives a first signal or a second signal. Specifically, the regulating magnet 12-1 in the undulator assembly 10 is configured to receive the first signal or the second electrical signal applied to the undulator assembly 10, and change the position of the first magnetic center of the regulating magnet 12-1 according to the first signal or the second signal. Among them, the first signal is used to indicate moving the position of at least one of the multiple magnetic poles in the regulating magnet 12-1, and the second signal is used to indicate adjusting the magnetic flux of at least one of the multiple magnetic poles in the regulating magnet 12-1.

[0095] Exemplarily, when the regulating magnet 12-1 as shown is provided in the undulator assembly 10, Figure 3 the processing device 50 determines the first signal applied to the undulator assembly 10 according to the feedback electrical signal. The undulator assembly 10 receives the first signal. Specifically, the regulating magnet 12-1 in the undulator assembly 10 receives the first signal, and under the action of the first signal, moves the position of at least one of the multiple magnetic poles in the regulating magnet 12-1. When the regulating magnet 12-1 as shown is provided in the undulator assembly 10, Figure 5 the processing device 50 determines the second signal applied to the undulator assembly 10 according to the feedback electrical signal. The undulator assembly 10 receives the second signal. Specifically, the regulating magnet 12-1 in the undulator assembly 10 receives the second signal, and under the action of the second signal, adjusts the position of at least one of the multiple magnetic poles in the regulating magnet 12-1.

[0096] In some other embodiments, referring to Figure 11 as shown, an embodiment of the present application provides a schematic structural diagram of an optical imaging system 100. Among them, the optical imaging system 100 includes a projection device 70 and a laser 60 as shown above Figure 10 The laser 60 is used to output laser light, and the projection device 70 is used to transmit the laser light output by the laser 60 to a specified position. Exemplarily, the projection device 70 includes optical elements such as mirrors and lenses.

[0097] In some embodiments, referring to Figure 11 as shown, the optical imaging system 100 further includes a beam shaping device 80. Among them, the beam shaping device 80 is used to shape the laser light output by the laser 60 and transmit the shaped laser light to the projection device 70. The projection device 70 is specifically used to transmit the shaped laser light to a specified position. Among them, the beam shaping device 40 can be used to shape the spot shape, spot size, spot uniformity, etc. of the laser light. For example, if the spot shape of the laser light output by the laser 60 is circular, the beam shaping device 80 can be used to shape the laser light with a circular spot shape into laser light with a rectangular spot shape, and the projection device 70 transmits the laser light with a rectangular spot shape to a specified position.

[0098] Exemplarily, in some embodiments, the optical imaging system 100 includes an optical power detection device 101 and a processing device 102; and the optical power detection device 101 integrates the function of the optical power detection device 40 in the laser 60, and the processing device 102 integrates the function of the processing device 40 in the laser 60.

[0099] Exemplarily, the optical power detection device 101 is configured to receive the shaped laser, generate a feedback electrical signal according to the optical power of the shaped laser, and transmit the feedback electrical signal to the processing device 102; the processing device 102 is configured to receive the feedback electrical signal, generate a fourth signal and a fifth signal according to the feedback electrical signal, transmit the fourth signal to the beam shaping device 80, and transmit the fifth signal to the laser 60; wherein the fifth signal includes a first signal or a second signal applied to the undulator assembly 10 in the laser 60 and a third signal applied to the injector 20 in the laser 60. The beam shaping device 80 is specifically configured to shape the laser according to the fourth signal to generate a shaped optical signal.

[0100] Although the present application has been described in conjunction with specific features and their embodiments, it is obvious that various modifications and combinations can be made without departing from the spirit and scope of the present application. Accordingly, this specification and the drawings are merely exemplary illustrations of the present application defined by the appended claims, and are considered to cover any and all modifications, variations, combinations or equivalents within the scope of the present application. Obviously, those skilled in the art can make various changes and modifications to the present application without departing from the spirit and scope of the present application. Thus, if these modifications and variations of the present application fall within the scope of the claims of the present application and their equivalent technologies, the present application is also intended to include these changes and modifications.

Claims

1. A undulator assembly, characterized in that, the undulator assembly includes: a first undulator, a first regulating magnet, and a second undulator; the first regulating magnet is disposed between the first undulator and the second undulator; the first regulating magnet has a first magnetic center; the electron beam received by the undulator assembly sequentially passes through the first undulator and the first regulating magnet; wherein, the first regulating magnet is configured to offset the motion trajectory of the electron beam by a first angle by changing the position of the first magnetic center.

2. The undulator assembly according to claim 1, characterized in that, the first regulating magnet includes a plurality of magnetic poles; the first regulating magnet is specifically configured to change the position of the first magnetic center by moving the position of at least one of the plurality of magnetic poles, or adjusting the magnetic flux of at least one of the plurality of magnetic poles.

3. The undulator assembly according to claim 2, characterized in that, the first regulating magnet is configured to receive a first signal and move the position of at least one of the plurality of magnetic poles under the action of the first signal.

4. The undulator assembly according to claim 3, characterized in that, the first regulating magnet includes at least one position control device, and the at least one magnetic pole is coupled to the at least one position control device in a one-to-one correspondence; the position control device is configured to receive the first signal and move the position of the magnetic pole coupled to the position control device according to the first signal.

5. The undulator assembly according to claim 2, characterized in that, the first regulating magnet is configured to receive a second signal and adjust the magnetic flux of at least one of the plurality of magnetic poles under the action of the second signal.

6. The undulator assembly according to claim 5, characterized in that, the first regulating magnet includes at least one power supply, and the at least one magnetic pole is coupled to the at least one power supply in a one-to-one correspondence; the power supply is configured to receive the second signal and change the voltage value transmitted to the magnetic pole coupled to the power supply according to the second signal to adjust the magnetic flux of the magnetic pole coupled to the power supply.

7. The undulator assembly according to claim 6, characterized in that, the undulator assembly is configured to output laser based on the electron beam; the frequency of the second signal received by the power supply is equal to the frequency of the laser.

8. The undulator assembly according to any one of claims 1-7, characterized in that, the undulator assembly further includes a third undulator; the third undulator is located on a side of the first undulator away from the second undulator, or the third undulator is located on a side of the second undulator away from the first undulator.

9. The undulator assembly according to any one of claims 1-7, characterized in that, the undulator assembly further includes a second regulating magnet and a fourth undulator; the fourth undulator is located on a side of the second undulator away from the first undulator; the second regulating magnet is located between the second undulator and the fourth undulator; the second regulating magnet has a second magnetic center; The second control magnet is configured to offset the movement trajectory of the electron beam by a second angle by changing the position of the second magnetic center.

10. The undulator assembly according to any one of claims 1-9, characterized in that, The undulator assembly is configured to output laser light based on the electron beam; The first angle is greater than the critical deflection angle; the optical power of the laser light output by the undulator assembly is a first value; The first angle is greater than 0 and less than or equal to the critical deflection angle, and the optical power of the laser light output by the undulator assembly is a second value; The first angle is 0, and the optical power of the laser light output by the undulator assembly is a third value; The third value is greater than the second value which is greater than the first value.

11. The undulator assembly according to claim 10, wherein The critical deflection angle is positively correlated with the wavelength of the laser light, and the critical deflection angle is negatively correlated with the gain length of the first undulator.

12. The undulator assembly according to claim 11, wherein The critical deflection angle satisfies the following relationship: where λ is the wavelength of the laser, and L G is the gain length of the first undulator.

13. A laser, characterized in that, It includes an injector, an accelerator, and the undulator assembly according to any one of claims 1-12; The injector is configured to generate a low-speed electron beam and transmit the low-speed electron beam to the accelerator; The accelerator is configured to increase the speed of the low-speed electron beam, generate the electron beam, and transmit the electron beam to the undulator assembly; The undulator assembly is configured to output laser light based on the electron beam.

14. The laser according to claim 13, characterized in that, The laser further includes an optical power detection device and a processing device; The optical power detection device is configured to receive the laser light and generate a feedback electrical signal according to the optical power of the laser light; The processing device is configured to receive the feedback electrical signal, determine a first signal or a second signal applied to the undulator assembly, and a third signal applied to the injector according to the feedback electrical signal; The injector is specifically configured to generate the low-speed electron beam according to the third signal; The first control magnet in the undulator assembly is configured to receive the first signal or the second electrical signal applied to the undulator assembly, and change the position of the first magnetic center according to the first signal or the second signal; wherein, the first signal is used to indicate moving the position of at least one of the multiple magnetic poles in the first control magnet, and the second signal is used to indicate adjusting the magnetic flux of at least one of the multiple magnetic poles in the first control magnet.

15. An optical imaging system, characterized in that, It includes a projection device and the laser according to claim 13 or 14; The projection device is configured to transmit the laser light output by the laser to a specified position.

16. The optical imaging system according to claim 15, characterized in that, The optical imaging system further includes a beam shaping device; The beam shaping device is configured to shape the laser light and transmit the shaped laser light to the projection device; The projection device is specifically configured to transmit the shaped laser light to a specified position.

17. The optical imaging system according to claim 16, wherein, The optical imaging system further includes an optical power detection device and a processing device; The optical power detection device is configured to receive the shaped laser light and generate a feedback electrical signal according to the optical power of the shaped laser light; The processing device is configured to receive the feedback electrical signal, generate a fourth signal and a fifth signal according to the feedback electrical signal, transmit the fourth signal to the beam shaping device, and transmit the fifth signal to the laser; the fifth signal includes a first signal or a second signal applied to the undulator assembly in the laser and a third signal applied to the injector in the laser; The beam shaping device is specifically configured to shape the laser according to the fourth signal.

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