Deep moisturizing mask and preparation method thereof

Abstract

The invention relates to a facial mask (IPC classification number: A61K8 / 49), in particular to a deep moisturizing facial mask and a preparation method thereof. The invention provides a deep moisturizing mask which comprises deep moisturizing essence and mask base cloth, the mask base cloth is infiltrated in the deep moisturizing essence, and the deep moisturizing essence at least comprises the following raw materials in percentage by weight: a phase A: a polyhydric alcohol compound, a chelating agent, a moisturizing agent, allantoin, a thickening agent and p-hydroxyacetophenone, a phase B: a phase C: a polyhydric alcohol compound, a chelating agent, a moisturizing agent, allantoin, a thickening agent and p-hydroxyacetophenone, and a phase D: a polyhydric alcohol compound, a chelating agent, a moisturizing agent, allantoin, a thickening agent and p-hydroxyacetophenone; a phase B: a pH regulator; a phase C: a micromolecule humectant, a film-forming humectant, a first skin conditioner, a second skin conditioner, a third skin conditioner, inositol and a dendrobium extract; and the phase D is an auxiliary agent. The mask prepared by the invention can urgently moisturize the skin within a short time, is fresh and cool in texture, not sticky and greasy, and high in air permeability, and can tighten the skin after being used up, so that the skin is tender and fresh for a long time.

Description

Technical Field

[0001] The present invention relates to a facial mask (IPC classification number: A61K8 / 49), and particularly relates to a deep moisturizing facial mask and a preparation method thereof. Background Art

[0002] Dry skin is likely to cause many skin problems. Therefore, it is often necessary to use some skin care products to care for and maintain the skin. Moisturizing cosmetics have always been the mainstream in the skin care product market, playing an important role in improving people's living standards and being favored by consumers. With the increasing demand, its market prospect is broad, and the future development trend is still centered around the new and highly efficient moisturizers and the reasonable combination and application of moisturizers. Deep moisturizing products refer to substances that can penetrate into the epidermis and even the dermis of the skin to act. Its mechanism is to maintain and strengthen the water absorption capacity and barrier function of the stratum corneum through a series of biological actions, maintain the water content of the stratum corneum, and thus prevent skin dryness.

[0003] As a carrier of beauty care products, facial masks usually have the following disadvantages: (1) Many nutrient components in the facial mask cannot be fully absorbed by the skin, resulting in waste; (2) The affinity between the facial mask and the skin is not strong enough, and the nutrient components are only temporarily absorbed by the skin; (3) The osmotic pressure of the nutrient components on the skin surface is not strong enough for the absorption tension of the skin pores; (4) The concentration of the moisturizing components in the existing moisturizing facial masks is high, and the moisturizing effect is easily affected by the environmental humidity.

[0004] Patent application CN201511015644.9 discloses a deep moisturizing sleeping facial mask. The prepared moisturizing sleeping facial mask can moisturize and whiten the skin. However, for the deep moisturizing facial mask prepared by this invention, the raw materials are simple, so the moisturizing effect has great limitations. In addition, a large amount of high-molecular moisturizers are used, and it is difficult to enter the deep layer of the skin to moisturize the skin, and it is still easy to cause skin dryness. Patent application CN202010862251.6 discloses a food-grade deep moisturizing and anti-aging facial mask and a preparation method thereof. In this application, a large number of precious extracts are used. Due to their generally large molecular weights, they will cause a burden on the skin and lead to poor absorption effects, which is not conducive to the use of young people. The prior art has not solved the above technical problems simultaneously. Summary of the Invention

[0005] The present invention prepares a deep moisturizing facial mask, which can not only urgently moisturize the skin in a short time, but also whiten the skin and improve the damaged states such as rough and dull skin. The texture of this facial mask is fresh and non-greasy, with strong air permeability, making the skin persistently tender and fresh while having the effect of firming the skin.

[0006] To solve the above problems, a first aspect of the present invention provides a deep moisturizing facial mask, comprising a deep moisturizing essence and a facial mask base fabric. The facial mask base fabric is immersed in the deep moisturizing essence. The deep moisturizing essence, by weight percentage, at least comprises the following raw materials:

[0007] Phase A: polyol compounds 1-8%, chelating agent 0.01-0.08%, allantoin 0.01-0.1%, thickening agent 0.01-0.6%, p-hydroxyacetophenone 0.1-1%, and the balance is made up of solvent;

[0008] Phase B: pH regulator 0.01-0.08%;

[0009] Phase C: small molecule moisturizing agent 0.01-1%, film-forming moisturizing agent 0.01-0.8%, first skin conditioner 0.1-3%, second skin conditioner 0.1-0.5%, third skin conditioner 0.1-0.8%, inositol 0.1-0.5%, myo-inositol 0.1-0.7%, Dendrobium extract 0.1-0.6%;

[0010] Phase D: auxiliary agent 0.001-0.02%.

[0011] As a preferred embodiment, the Dendrobium extract is Dendrobium officinale polysaccharide.

[0012] As a preferred embodiment, the polyol compounds are alcohol compounds with a hydroxyl number ≥ 2.

[0013] As a preferred embodiment, the polyol compounds are one or more of butylene glycol, propylene glycol, glycerol, and 1,2-hexanediol.

[0014] As a preferred embodiment, the polyol compounds are a mixture of propylene glycol and glycerol.

[0015] As a preferred embodiment, the weight ratio of propylene glycol to glycerol is 1:(1-3).

[0016] As a preferred embodiment, the chelating agent is disodium ethylenediaminetetraacetate.

[0017] As a preferred embodiment, the thickening agent is one or more of carbomer and xanthan gum.

[0018] As a preferred embodiment, the thickening agent is a mixture of carbomer and xanthan gum.

[0019] As a preferred embodiment, the weight ratio of carbomer to xanthan gum is 1:(1-5).

[0020] As a preferred embodiment, the weight ratio of carbomer to xanthan gum is 5:2.

[0021] As a preferred embodiment, the solvent is water.

[0022] As a preferred embodiment, the pH regulator is sodium hydroxide.

[0023] As a preferred embodiment, the small molecule humectant is a branched-chain hydroxy compound with a weight-average molecular weight Mw ≤ 120.

[0024] As a preferred embodiment, the small molecule humectant comprises at least one of 1,2-hexanediol, octanoyl hydroxamic acid, and 1,3-propanediol.

[0025] As a preferred embodiment, the small molecule humectant is a mixture of 1,2-hexanediol, octanoyl hydroxamic acid, and 1,3-propanediol.

[0026] As a preferred embodiment, the small molecule humectant is commercially available, such as Shanghai Haoyun Trading Co., Ltd.

[0027] As a preferred embodiment, the film-forming humectant mainly comprises a mixture of sodium hyaluronate, Tremella fuciformis fruit body extract (the active ingredients include tremella polysaccharide, etc.), water, and butanediol.

[0028] As a preferred embodiment, the film-forming humectant is commercially available, such as Shanghai Yiye Biotechnology Co., Ltd.

[0029] Since the branched-chain hydroxy compound with a weight-average molecular weight Mw ≤ 120 contains hydroxyl groups, has a small molecular weight, strong permeability, and is relatively easy to enter the intercellular space of keratinocytes and has a good affinity with the skin. However, when the amount of the branched-chain hydroxy compound with a weight-average molecular weight Mw ≤ 120 used is excessive, it will cause a feeling of irritation. When the surrounding environment is water-deficient, it will absorb the moisture of the skin and only has an immediate moisturizing effect. In addition, it has a weak improvement on the skin's own barrier performance. The applicant unexpectedly found through experiments that through the synergistic effect of the small molecule humectant and the film-forming humectant containing sodium hyaluronate and Tremella fuciformis fruit body extract, the irritation caused by the branched-chain hydroxy compound with a weight-average molecular weight Mw ≤ 120 to the skin is alleviated. At the same time, the film-forming humectant containing sodium hyaluronate and Tremella fuciformis fruit body extract has a relatively high viscosity at a low concentration, and a large number of hydrophilic groups can bind a large amount of water. Therefore, even in a dry environment, it will not absorb water from the skin and has a good effect of softening and forming a film on the skin.

[0030] The present invention improves the absorption and moisturizing effects of a deep moisturizing facial mask through the synergistic effect of a branched-chain hydroxy compound with a weight-average molecular weight Mw ≤ 120 and a film-forming moisturizer containing sodium hyaluronate and Tremella fuciformis Berk. extract. By maintaining the weight ratio of the small-molecule moisturizer to the film-forming moisturizer at 3:1, the optimal absorption and moisturizing effects are achieved.

[0031] As a preferred embodiment, the weight ratio of the small-molecule moisturizer to the film-forming moisturizer is 3:1.

[0032] As a preferred embodiment, the first skin conditioner at least contains a carbohydrate isomer.

[0033] As a preferred embodiment, the first skin conditioner further contains at least a mixture of glucosylglycerol, xylitol glucoside, anhydroxylitol, fructose, xylitol, carbohydrate isomer, and water.

[0034] As a preferred embodiment, the first skin conditioner is commercially available, such as Shanghai Faeenkai Industry Co., Ltd.

[0035] As a preferred embodiment, the second skin conditioner at least contains biogum-1.

[0036] As a preferred embodiment, the raw materials of the second skin conditioner further include a mixture of p-hydroxyacetophenone, a moisturizer, and water.

[0037] As a preferred embodiment, the second skin conditioner is commercially available, such as Shanghai Jiaye Industry Co., Ltd.

[0038] As a preferred embodiment, the third skin conditioner at least includes a plant extract.

[0039] As a preferred embodiment, the raw materials of the plant extract are at least a mixture of Centella asiatica extract, Polygonum cuspidatum root extract, Scutellaria baicalensis root extract, Camellia sinensis leaf extract, Glycyrrhiza glabra root extract, Chamomilla recutita flower extract, and Rosmarinus officinalis leaf extract.

[0040] As a preferred embodiment, the third skin conditioner further includes at least water and butanediol. It is commercially available, such as Shanghai Ruimu Chemical Technology Co., Ltd.

[0041] As a preferred embodiment, the weight ratio of the first skin conditioner, the second skin conditioner, and the third skin conditioner is 1:(0.1 - 0.5):(0.2 - 0.6).

[0042] As a preferred embodiment, the weight ratio of the first skin conditioner, the second skin conditioner, and the third skin conditioner is 1:0.2:0.3.

[0043] As a preferred embodiment, the auxiliary is one or more of a fragrance and a solubilizer.

[0044] As a preferred embodiment, the auxiliary is a mixture of a fragrance and a solubilizer.

[0045] As a preferred embodiment, the fragrance is sandalwood essence.

[0046] As a preferred embodiment, the solubilizer is a mixture of PPG-26-buteth-26, PEG-40 hydrogenated castor oil, and water.

[0047] As a preferred embodiment, the solubilizer is commercially available, for example, Miao Sen (Shanghai) Chemical Technology Co., Ltd.

[0048] The second aspect of the present invention provides a method for preparing a deep moisturizing mask:

[0049] (1) Add phase A to the emulsifying pot, stir and heat up to 80 - 85°C. Stir evenly and cool to 40 - 45°C;

[0050] (2) Add phase B to the emulsifying pot in step (1) and stir evenly;

[0051] (3) Add phase C to the emulsifying pot, stir and heat up to 80 - 85°C, stir evenly, and cool to 45 - 50°C;

[0052] (4) Slowly pump the raw materials in the emulsifying pot in step (2) into the emulsifying pot in step (1), stir and homogenize for 4 - 6 min to obtain the deep moisturizing essence;

[0053] (5) Take 25 - 30 mL of the deep moisturizing essence and soak the mask base cloth in it, then seal the package.

[0054] Beneficial effects:

[0055] (1) By limiting the weight ratio of the first skin conditioner containing glucoside compounds, the second skin conditioner containing biosaccharide gum-1, and the third skin conditioner containing plant extracts to 1:0.2:0.35, the present invention enhances the skin's absorption effect of nutrients, improves the skin's own barrier performance, improves the damaged state such as rough and dull skin, and keeps the stratum corneum in a certain water content and a stable and healthy state.

[0056] (2) When the weight ratio of carbomer to xanthan gum is limited to 5:2 in the present invention, the stability of the product is improved. Meanwhile, the texture of the facial mask is fresh and non-greasy, and it has strong air permeability.

[0057] (3) Through the synergistic effect of PPG-26-butanol polyether-26, PEG-40 hydrogenated castor oil solubilizer and small molecule humectants in the present invention, while improving the skin absorption effect, the emulsification stability of the deep moisturizing essence is also improved, ensuring the stability of the product at high and low temperatures. Even when the product is kept at -5°C to 40°C for 24 hours, there will be no layering, precipitation or discoloration.

[0058] (4) By adding sandalwood essence in the system in the present invention, the odor of the deep moisturizing facial mask is improved, and no irritating odor is generated in the product.

[0059] (5) By adding polysaccharide from dendrobium officinale and compounding it with a small molecule humectant containing a branched-chain hydroxyl compound with a weight average molecular weight Mw ≤ 120 and a film-forming humectant containing sodium hyaluronate and tremella fruiting body extract, the absorption and moisturizing effects of the deep moisturizing facial mask are improved.

[0060] (6) This application effectively reduces the use concentration of the moisturizing components in the moisturizing facial mask and solves the problem that the moisturizing effect of small molecule polyols is easily affected by environmental humidity. The facial mask product can still maintain a high moisturizing and water-locking ability under high humidity conditions. Description of the Drawings

[0061] Figure 1 It is the effect diagram of the scavenging effect of polysaccharide from dendrobium officinale on DPPH free radicals.

[0062] Figure 2 It is the effect diagram of the effect of polysaccharide from dendrobium officinale on cell migration and wound healing.

[0063] Figure 3 It is the test result diagram of the moisture absorption rate of polysaccharide from dendrobium officinale and sodium hyaluronate.

[0064] Figure 4 It is the test result diagram of the moisture retention rate of polysaccharide from dendrobium officinale and sodium hyaluronate. Detailed Embodiments

[0065] Embodiment

[0066] Embodiment 1

[0067] Embodiment 1 of the present invention provides a deep moisturizing facial mask, which includes a deep moisturizing essence and a facial mask base cloth. The facial mask base cloth is immersed in the deep moisturizing essence. The raw materials of the deep moisturizing essence, by weight percentage, include:

[0068] Phase A: 5% polyol compounds, 0.02% chelating agent, 0.05% allantoin, 0.28% thickening agent, 0.3% p-hydroxyacetophenone, the balance made up with water;

[0069] Phase B: 0.04% pH regulator;

[0070] Phase C: 0.6% small molecule humectant, 0.2% film-forming humectant, 1% first skin conditioner, 0.2% second skin conditioner, 0.3% third skin conditioner, 0.35% inositol, 0.1% cyclohexanehexol, 0.2% Dendrobium extract;

[0071] Phase D: 0.01% auxiliary agent.

[0072] The polyol compounds are a mixture of propylene glycol and glycerol. The weight ratio of propylene glycol to glycerol is 3:2.

[0073] The chelating agent is disodium ethylenediaminetetraacetate, purchased from Shanghai Gaowei Trading Co., Ltd.

[0074] The allantoin is purchased from Shanghai Yanzhen Trading Co., Ltd.

[0075] The thickening agent is a mixture of carbomer and xanthan gum. The weight ratio of carbomer to xanthan gum is 5:2. The xanthan gum is purchased from Shanghai Faienkai Industrial Co., Ltd.; the carbomer is purchased from Shanghai Zhaoheng Industrial Co., Ltd.

[0076] The pH regulator is sodium hydroxide.

[0077] The small molecule humectant is a branched-chain hydroxy compound with a weight-average molecular weight Mw ≤ 120.

[0078] The small molecule humectant is a mixture of 1,2-hexanediol, octanoyl hydroxamic acid, and 1,3-propanediol. The weight ratio of 1,2-hexanediol, octanoyl hydroxamic acid, and 1,3-propanediol is 1:1:1.

[0079] The film-forming humectant, whose raw materials include a mixture of sodium hyaluronate, Tremella fuciformis Berk. fruit body extract (the active ingredient includes Tremella polysaccharide), water, and butanediol, is purchased from Shanghai Yiye Biotechnology Co., Ltd.

[0080] The first skin conditioner contains a mixture of glucosylglycerol, xylitylglucoside, anhydroxylitol, fructose, xylitol, carbohydrate isomers, and water.

[0081] The first skin conditioner is purchased from Shanghai Faienkai Industrial Co., Ltd.

[0082] The second skin conditioner contains a mixture of biogum-1, p-hydroxyacetophenone, humectant, and water.

[0083] The second skin conditioner was purchased from Shanghai Jiaye Industrial Co., Ltd.

[0084] The third skin conditioner includes a mixture of centella asiatica extract, polygonum cuspidatum root extract, scutellaria baicalensis root extract, tea extract, glabra glycyrrhiza root extract, chamomilla recutita flower extract, rosmarinus officinalis leaf extract, water, and butylene glycol.

[0085] The third skin conditioner was purchased from Shanghai Ruimu Chemical Technology Co., Ltd.

[0086] The auxiliary agent is a mixture of an aromatic agent and a solubilizer. The aromatic agent is 0.003% and the aromatic agent is 0.007%.

[0087] The aromatic agent is pink sandalwood essence and was purchased from Yunnan Lilian Biotechnology Co., Ltd.

[0088] The solubilizer is a mixture of PPG-26-buteth-26, PEG-40 hydrogenated castor oil, and water.

[0089] The solubilizer was purchased from Miaosen (Shanghai) Chemical Technology Co., Ltd.

[0090] The dendrobium extract is dendrobium officinale polysaccharide and is sourced from Jinhua Shouxian Valley Pharmaceutical Co., Ltd.

[0091] The second aspect of this example provides a method for preparing a deep moisturizing facial mask:

[0092] (1) Add phase A to the emulsifying pot, stir and heat up to 82°C. Stir evenly and cool to 42°C;

[0093] (2) Add phase B to the emulsifying pot in step (1) and stir evenly;

[0094] (3) Add phase C to the emulsifying pot, stir and heat up to 82°C, stir evenly, and cool to 46°C;

[0095] (4) Slowly pump the raw materials in the emulsifying pot in step (2) into the emulsifying pot in step (1), stir and homogenize for 45 minutes to obtain the deep moisturizing essence;

[0096] (5) Take 26 mL of the deep moisturizing essence and immerse the facial mask base cloth into it, then package and seal.

[0097] Performance test:

[0098] 1. Appearance: Colorless transparent liquid

[0099] 2. Aroma: Chinese medicine fragrance (pink sandalwood RC2007356)

[0100] 3. Measured pH: 5.00 - 6.00

[0101] 4. Relative density 20°C / 20°C 1.00 ± 0.02

[0102] 5. Heat resistance: Keep at (40 ± 1)°C for 24 h, and there is no obvious difference from before the test after returning to room temperature.

[0103] 6. Cold resistance: Keep at (-8 ± 2)°C for 24 h, and there is no obvious difference from before the test after returning to room temperature.

[0104] 7. The results of the stability test are shown in the following table. The essence of Example 1 is placed at room temperature (25°C), low temperature (5°C), and high temperature (50°C) for 48 h respectively, and then the viscosity, pH, and relative density (relative to water) of the sample are measured.

[0105]

[0106]

[0107] 8. Efficacy test of Dendrobium officinale polysaccharide

[0108] The DPPH free radical scavenging effect and wound healing promotion effect of Dendrobium officinale polysaccharide were measured, and the results are shown in Figure 1 and Figure 2 . The results show that the DPPH free radical scavenging effect and wound healing promotion effect of Dendrobium officinale polysaccharide are obvious, and it can be added as an efficacy raw material to the moisturizing mask to play a skin care role.

[0109] 9. Moisture absorption rate and moisture retention rate

[0110] The moisture absorption rate and moisture retention rate of Dendrobium officinale polysaccharide and sodium hyaluronate were measured, and the results are shown in Figure 3 and Figure 4 .

[0111] a. Method for measuring moisture absorption rate: Use ammonium sulfate saturated solution to control the humidity and keep it at RH81%. Weigh 0.1 g of sodium hyaluronate powder and Dendrobium officinale powder of the same weight respectively, place them in a small petri dish, and put them into a desiccator. After 72 hours, when the sample reaches moisture absorption equilibrium, accurately weigh the sample weight, repeat 3 times, and calculate the water absorption rate according to the following formula, where M1 is the dry weight of the sample before moisture absorption (g), and M2 is the weight of the sample after moisture absorption (g).

[0112] Moisture absorption rate = (M2 - M1) / M1 * 100%.

[0113] b. Method for measuring moisture retention rate: Accurately weigh 0.5 g of the sample at room temperature, put it into a weighing bottle, add deionized water with a mass fraction of 10% of the sample amount, and place it in a desiccator containing dry silica gel. The placement time is 2 / 4 / 6 h. Weigh the moisture weight after water loss and the weight of the added deionized water after the sample is placed respectively. Calculate the moisture retention rate according to the following formula, where Hn is the moisture weight after water loss (g) and H0 is the weight of the added deionized water (g).

[0114] Moisture retention rate = Hn / H0 * 100%.

[0115] It can be seen from the data that the essence provided by the examples has stable performance. At the same time, both polysaccharides from Dendrobium officinale and sodium hyaluronate have high moisture absorption rates and moisture retention rates, which can enable the deep moisturizing mask provided by the examples to maintain a high moisture locking ability under high humidity conditions.

Claims

1. A deep moisturizing facial mask, comprising a deep moisturizing essence and a facial mask base cloth, characterized in that, The deep moisturizing essence, by weight percentage, the raw materials at least include: Phase A: 1-8% of polyhydric alcohol compounds, 0.01-0.08% of chelating agent, 0.01-0.1% of allantoin, 0.01-0.6% of thickening agent, 0.1-1% of p-hydroxyacetophenone, and the solvent makes up the balance; Phase B: 0.01-0.08% of pH regulator; Phase C: 0.01-1% of small molecule moisturizer, 0.01-0.8% of film-forming moisturizer, 0.1-3% of the first skin conditioner, 0.1-0.5% of the second skin conditioner, 0.1-0.8% of the third skin conditioner, 0.1-0.5% of inositol hexaphosphate, 0.1-0.7% of inositol; Phase D: 0.001-0.02% of auxiliary agent.

2. The deep moisturizing facial mask according to claim 1, characterized in that The polyhydric alcohol compounds are alcohol compounds with a hydroxyl number ≥ 2.

3. The deep moisturizing facial mask according to claim 1, characterized in that The raw materials of Phase C also include 0.1-0.6% of Dendrobium extract.

4. The deep moisturizing facial mask according to claim 1, characterized in that, The small molecule moisturizer is a branched-chain hydroxyl compound with a weight-average molecular weight Mw ≤ 120.

5. The deep moisturizing facial mask according to claim 1, wherein The weight ratio of the small molecule moisturizer to the film-forming moisturizer is 1:(0.2-0.5).

6. The deep moisturizing facial mask according to claim 1, characterized in that The weight ratio of the first skin conditioner, the second skin conditioner, and the third skin conditioner is 1:(0.1-0.5):(0.2-0.6).

7. The deep moisturizing facial mask according to claim 1, characterized in that, The auxiliary agent is one or more of fragrance and solubilizer.

8. The deep moisturizing facial mask according to claim 1 or 7, characterized in that, The auxiliary agent is a mixture of fragrance and solubilizer.

9. The deep moisturizing facial mask according to claim 1, wherein The third skin conditioner at least includes plant extract.

10. A method for preparing the deep moisturizing facial mask according to any one of claims 1-9, characterized in that the steps Including: (1) Add Phase A to the emulsifying pot, stir and heat up to 80-85°C; stir evenly and cool to 40-45°C; (2) Add Phase B to the emulsifying pot in step (1) and stir evenly; (3) Add Phase C to the emulsifying pot, stir and heat up to 80-85°C, stir evenly and cool to 45-50°C; (4) Slowly pump the raw materials in the emulsifying pot in step (2) into the emulsifying pot in step (1), stir and homogenize for 4-6 min to obtain the deep moisturizing essence; (5) Take 25-30 mL of the deep moisturizing essence and immerse the mask base cloth into it, then package and seal.

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