Stripping film rotating device and double-beam distribution system
By using a stripping membrane rotation device to separate the negative hydrogen beam into a positive proton beam and a negative hydrogen beam, the space and cost problems of rotating waste beam stations and pulse deflection magnets in existing technologies are solved, achieving efficient and low-cost beam distribution.
Patent Information
- Application Number
- CN202511034238.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-25
- Publication Date
- 2025-10-21
AI Technical Summary
In the existing technology, the rotating waste beam station of linear accelerators occupies a large space, is technically difficult and expensive, and the pulse power supply of the pulse deflection magnet is technically difficult and expensive, resulting in excessively high production and use costs.
A stripping membrane rotation device is adopted, which realizes the periodic deflection of the negative hydrogen beam through a rotating disk and a drive mechanism. The negative hydrogen beam is divided into a positive proton beam and a negative hydrogen beam by the stripping membrane, and then deflected upward and downward by deflecting magnets, respectively. This simplifies the system structure and reduces the dependence on rotating waste beam station and pulsed magnets.
This resulted in a simple system structure, small footprint, reduced production and usage costs, and improved system stability and operating efficiency.
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Figure CN120825864A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of particle acceleration, and in particular to a stripping film rotating device and a dual-beam distribution system. Background Art
[0002] Particle accelerators are widely used in a variety of fields, including scientific research, industrial applications, medical technology, energy development, and national defense security. Particle accelerators can be divided into linear accelerators and circular accelerators. Of the beams produced by linear accelerators, a portion needs to be deflected upward for target production of isotopes; the other portion needs to be deflected downward, stripped off at the injection zone via the main stripping membrane, and converted into protons, which are then injected into the fast-cycling synchrotron accelerator, thus achieving dual-purpose functionality. Protons, as fairly stable particles, are often used as probes. After acceleration, they are used to collide with other substances to study their structure and basic properties. Radioactive isotopes, as special therapeutic carriers in nuclear medicine, can use radiation to provide diagnostic information on the functions of specific human organs and to perform treatments.
[0003] At present, the commonly used method to achieve the dual purpose of a linear accelerator is to use a deflection magnet to continuously reverse the direction of the magnetic field by precisely matching the frequency of the pulse power supply, thereby splitting the negative hydrogen beam generated by the linear accelerator into two to meet different application requirements. However, during the transmission of the negative hydrogen beam, there is a large amount of gas stripping. When the negative hydrogen beam is deflected upward or downward, it is inevitable that some protons will be transmitted in the opposite direction. In the prior art, a high-repetition-rate rotating waste beam station is usually set up to collect and process these reverse-transmitted protons to ensure the stable operation and safety of the accelerator system.
[0004] However, setting up a rotating waste beam station is not only space-consuming and technically challenging, but also expensive and costly. Furthermore, the pulse power supply for the existing pulse deflection magnets is not only technically challenging but also exponentially more expensive.
[0005] Therefore, there is an urgent need for a stripping film rotating device and a dual beam distribution system to solve the above problems. Summary of the Invention
[0006] The object of the present invention is to provide a stripping film rotating device and a dual beam distribution system, which have a simple structure, occupy a small space, and reduce production costs and use costs.
[0007] To achieve the above objectives, the following technical solutions are provided:
[0008] Stripping film rotating device, comprising:
[0009] The vacuum box is provided with a vacuum chamber.
[0010] A rotating disk is arranged in the vacuum chamber and is rotatably connected to the vacuum box body. The rotating disk has a mounting hole and a through hole. The mounting hole and the through hole are arranged along the radial direction of the rotating disk. The stripping film is installed in the mounting hole. The vacuum box body is provided with a first beam pipe and a second beam pipe that are connected to the vacuum chamber. The first beam pipe and the second beam pipe are respectively arranged on both sides of the axial direction of the rotating disk. The first beam pipe and the second beam pipe are opposite to the mounting hole. The distance between the mounting hole and the center of the rotating disk is equal to the distance between the through hole and the center of the rotating disk.
[0011] The driving mechanism is configured to drive the rotating disk to rotate. The rotating disk is provided at an output end of the driving mechanism.
[0012] As an optional solution, there are multiple mounting holes, and the multiple mounting holes are arranged at intervals along the circumference of the rotating disk, and the through holes are provided in a one-to-one correspondence with the mounting holes.
[0013] As an optional solution, the shape of one of the through holes is different from the shapes of the other through holes.
[0014] As an optional solution, the box includes:
[0015] The housing has an opening at one end.
[0016] The cover body is arranged to cover the opening, the cover body and the shell together form the vacuum chamber, and the shell and the cover body are detachably connected.
[0017] As an optional solution, the stripping film rotating device further includes:
[0018] A bottom plate and a reinforcement member, the box body is arranged on the bottom plate, and the reinforcement member is connected to the bottom plate and / or the box body.
[0019] As an optional solution, the stripping film rotating device further includes:
[0020] A mounting plate and a plurality of limiting mechanisms, wherein the base plate is arranged on the mounting plate, the limiting mechanisms are arranged on the mounting plate, and the plurality of limiting mechanisms are arranged at intervals along the circumference of the base plate, and the limiting mechanisms can abut against the base plate to limit the relative position of the base plate and the mounting plate.
[0021] As an optional solution, the limiting mechanism includes:
[0022] A limiting seat and a limiting member, wherein the limiting seat is arranged on the mounting plate, and the limiting member is threadedly connected to the limiting seat and can abut against the bottom plate.
[0023] As an optional solution, the stripping film rotating device further includes a support seat, the mounting plate is disposed on the support seat, and the distance between the mounting plate and the support seat in the vertical direction is adjustable.
[0024] As an optional solution, the stripping film rotating device further includes an adjusting mechanism, which is arranged between the mounting plate and the supporting seat, and the adjusting mechanism includes:
[0025] The mounting base and the adjusting member are connected to the support base, and the other one is connected to the mounting plate. The adjusting member is threadedly connected to the mounting base. The adjusting mechanism can adopt manual adjustment or electric adjustment.
[0026] The dual beam distribution system includes a linear accelerator, a deflection magnet, and the above-mentioned stripping film rotating device. The linear accelerator is arranged upstream of the stripping film rotating device, and the deflection magnet is arranged downstream of the stripping film rotating device.
[0027] Compared with the prior art, the present invention has the following beneficial effects:
[0028] The stripping film rotating device provided by the present invention has a rotary drive mechanism that drives the rotating disk to rotate, and the negative hydrogen beam generated by the linear accelerator enters the vacuum chamber through the first beam pipe. When the negative hydrogen beam passes through the through hole, it will directly pass through the rotating disk and flow out through the second beam pipe. It will then be deflected downward by the deflection magnet, ready to be injected into the fast cycle synchrotron accelerator and stripped into protons by the main stripping film. When the negative hydrogen beam passes through the mounting hole equipped with the stripping film, it will be stripped into a positively charged proton beam, flow out through the second beam pipe, and then be deflected upward by the deflection magnet, and then used in the isotope device. The stripping film rotating device provided in this embodiment has a deflection magnet connected to a DC power supply, which can realize the periodic upward transmission of the negative hydrogen beam and the downward transmission of the proton beam. Compared with the prior art that requires the setting of a rotating waste beam station, a pulsed magnet, and a power supply, it has the advantages of simple structure, small space occupation, and reduced production and use costs.
[0029] The dual-beam distribution system provided by the present invention can occupy a small space and reduce production costs and use costs by applying the above-mentioned stripping film rotating device. BRIEF DESCRIPTION OF THE DRAWINGS
[0030] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in describing the embodiments of the present invention. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the contents of the embodiments of the present invention and these drawings without any creative work.
[0031] Figure 1 A first structural schematic diagram of a peeling film rotating device provided in an embodiment of the present invention;
[0032] Figure 2 A second structural schematic diagram of the peeling film rotating device provided in an embodiment of the present invention;
[0033] Figure 3 A schematic diagram of a portion of the structure of a peeling film rotating device provided in an embodiment of the present invention;
[0034] Figure 4 A schematic structural diagram of a rotating disk provided in an embodiment of the present invention;
[0035] Figure 5 A schematic diagram of the beam spot movement distance provided by an embodiment of the present invention.
[0036] Reference numerals:
[0037] 100. Stripping film rotating device;
[0038] 10. Box body; 1001. Vacuum chamber; 11. Shell; 12. Cover; 121. Communication hole; 13. Lifting ring;
[0039] 20. Rotating disk; 21. Mounting hole; 22. Through hole;
[0040] 30. Driving mechanism;
[0041] 41. First beam pipe; 42. Second beam pipe;
[0042] 51. Bottom plate; 52. Reinforcement member;
[0043] 60. Mounting plate;
[0044] 70. Limiting mechanism; 71. Limiting seat; 72. Limiting member;
[0045] 80. Adjustment mechanism; 81. Mounting seat; 82. Adjustment member;
[0046] 90. Support seat;
[0047] 200. Peeling film. DETAILED DESCRIPTION
[0048] To make the above-mentioned objects, features, and advantages of the present application more clearly understood, the specific embodiments of the present application are described in detail below with reference to the accompanying drawings. The following description sets forth many specific details to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways than those described herein, and those skilled in the art can make similar improvements without violating the scope of the present application. Therefore, the present application is not limited to the specific embodiments disclosed below.
[0049] In the description of this application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing this application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.
[0050] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of technical features indicated. Therefore, a feature specified as "first" or "second" may explicitly or implicitly include at least one of such features. In the description of this application, if the term "plurality" appears, "plurality" means at least two, for example, two, three, etc., unless otherwise specifically defined.
[0051] In this application, unless otherwise specified or limited, the terms "mounted," "connected," "connected," "fixed," etc., should be interpreted broadly. For example, these terms may refer to fixed connections, removable connections, or integration; mechanical connections or electrical connections; direct connections or indirect connections through an intermediary; and internal communication between two components or interaction between two components, unless otherwise specified. Those skilled in the art will understand the specific meanings of these terms in this application based on the specific circumstances.
[0052] In this application, unless otherwise expressly specified or limited, if a first feature is described as being "above" or "below" a second feature, or similar descriptions, this may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, when a first feature is described as being "above," "above," or "above" a second feature, it may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is at a higher level than the second feature. When a first feature is described as being "below," "below," or "below" a second feature, it may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature is at a lower level than the second feature.
[0053] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be an intermediate element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be an intermediate element. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only embodiment.
[0054] This embodiment provides a dual-beam distribution system, which includes a linear accelerator and a deflection magnet. The linear accelerator is used to generate a negative hydrogen beam. The deflection magnet continuously reverses the direction of the magnetic field by precisely matching the frequency of a pulse power supply, thereby splitting the negative hydrogen beam generated by the linear accelerator into two. One portion of the beam is deflected upward by the deflection magnet and is used to produce isotopes in an isotope device; the other portion of the beam is deflected downward by the deflection magnet and is prepared to be injected into a fast-cycling synchrotron accelerator for conversion into protons.
[0055] During the transmission of the negative hydrogen beam, a significant amount of gas stripping occurs. When the negative hydrogen beam deflects upward or downward, some protons inevitably travel in the opposite direction. Existing technology typically uses a high-repetition-rate rotating waste beam station to collect and process these reverse-traveled protons to ensure the stable operation and safety of the accelerator system.
[0056] However, setting up a rotating waste beam station is not only space-consuming and technically challenging, but also expensive and costly. Furthermore, the pulse power supply for the existing pulse deflection magnets is not only technically challenging but also exponentially more expensive.
[0057] In order to solve the above problems, Figure 1-Figure 3As shown, the dual beam distribution system provided in this embodiment further includes a stripping film rotating device 100 , the linear accelerator is arranged upstream of the stripping film rotating device 100 , and the deflection magnet is arranged downstream of the stripping film rotating device 100 . Specifically, the stripping film rotating device 100 includes a box body 10, a rotating disk 20 and a driving mechanism 30. The box body 10 is provided with a vacuum chamber 1001. The rotating disk 20 is arranged in the vacuum chamber 1001 and is rotatably connected to the vacuum box body 10. The rotating disk 20 has a mounting hole 21 and a through hole 22. The mounting hole 21 and the through hole 22 are arranged along the radial direction of the rotating disk 20. The stripping film 200 is installed in the mounting hole 21. The vacuum box body 10 is provided with a first beam pipe 41 and a second beam pipe 42 that are connected to the vacuum chamber 1001. The first beam pipe 41 and the second beam pipe 42 are respectively arranged on both sides of the axial direction of the rotating disk 20. The first beam pipe 41 and the second beam pipe 42 are opposite to the mounting hole 21. The distance between the mounting hole 21 and the center of the rotating disk 20 is equal to the distance between the through hole 22 and the center of the rotating disk 20. The rotating disk 20 is arranged at the output end of the driving mechanism 30, and the driving mechanism 30 is used to drive the rotating disk 20 to rotate. The driving mechanism 30 may be an existing motor or hydraulic cylinder.
[0058] The deflection magnet is a trident deflection magnet. The structures and working principles of the trident deflection magnet and the linear accelerator are both prior art and will not be described in detail in this embodiment.
[0059] During operation, the rotary drive mechanism 30 drives the rotating disk 20 to rotate, and the negative hydrogen beam generated by the linear accelerator enters the vacuum chamber 1001 through the first beam pipe 41. When the negative hydrogen beam passes through the through hole 22, it will directly pass through the rotating disk 20 and flow out through the second beam pipe 42. It is then deflected downward by the deflection magnet, ready to be injected into the fast cycle synchrotron accelerator and stripped into protons for the main stripping film; when the negative hydrogen beam passes through the mounting hole 21 equipped with the stripping film 200, it will be stripped into a positively charged proton beam, flow out through the second beam pipe 42, and then deflected upward by the deflection magnet and then used in the isotope device. The stripping film rotating device 100 provided in this embodiment has a DC power supply connected to the deflection magnet, which can realize the periodic upward transmission of the negative hydrogen beam and the downward transmission of the proton beam. Compared with the prior art that requires the installation of a rotating waste beam station, a pulsed magnet, and a power supply, it has the advantages of simple structure, small space occupation, and reduced production and use costs.
[0060] like Figure 3 and Figure 4As shown, in this embodiment, the number of mounting holes 21 is ten, and the ten mounting holes 21 are arranged at intervals along the circumference of the rotating disk 20, and the through holes 22 are set in a one-to-one correspondence with the mounting holes 21. In normal operation mode, after the negative hydrogen beam and the rotational speed of the rotating stripping film 200 are stabilized, only the stripping film 200 on one mounting hole 21 and the through hole 22 opposite thereto are used, while the other stripping films 200 and the through holes 22 are idle. When a certain stripping film 200 is damaged or needs to be replaced, the negative hydrogen beam can be re-debugged to allow the negative hydrogen beam to pass through the mounting holes 21 of other spare stripping films 200. This not only effectively avoids the loss of negative hydrogen beam, but also improves the stability of the stripping film rotating device 100. In other embodiments, the number of mounting holes 21 can also be one, two, three or more, and the number of through holes 22 is set in a one-to-one correspondence with the number of mounting holes 21.
[0061] Optionally, the shape of one of the through holes 22 is different from the shapes of the other through holes 22. This arrangement provides a reference for the positions of the mounting holes 21 and the through holes 22. The through holes 22 of different shapes mark the relative positions of the through holes 22 and the mounting holes 21. When a release film 200 needs to be replaced, the position of the release film 200 can be quickly identified.
[0062] Optionally, the box body 10 includes a shell 11 and a cover 12, one end of the shell 11 has an opening, and the cover 12 covers the opening. The cover 12 and the shell 11 together form a vacuum chamber 1001. The shell 11 and the cover 12 are detachably connected, which facilitates the rapid disassembly and assembly of the shell 11 and the cover 12, and further facilitates the installation of the rotating disk 20.
[0063] Optionally, the cover 12 is provided with a communication hole 121 that communicates with the vacuum chamber 1001. There are two communication holes 121, one of which is used to communicate with the negative pressure device to evacuate the vacuum chamber 1001; the other communication hole 121 is a monitoring port to monitor the operation of the rotating disk 20 in the vacuum chamber 1001.
[0064] Optionally, the peeling film rotating device 100 further includes a support base 90 , the mounting plate 60 is disposed on the support base 90 , and the support base 90 is used to carry the box body 10 .
[0065] Optionally, the box body 10 further includes a lifting ring 13, which is provided on the shell 11. By providing the lifting ring 13, a lifting device can be hung on the lifting ring 13, and then the box body 10 can be lifted, transferred, etc. through the lifting device.
[0066] Optionally, the peeling film rotating device 100 further includes a bottom plate 51 and a reinforcing member 52 . The box body 10 is disposed on the bottom plate 51 . The reinforcing member 52 is connected to the bottom plate 51 and / or the box body 10 to improve the strength of the box body 10 .
[0067] Optionally, the stripping film rotating device 100 also includes a mounting plate 60 and a plurality of limiting mechanisms 70. The bottom plate 51 is arranged on the mounting plate 60, and the limiting mechanisms 70 are arranged on the mounting plate 60. The plurality of limiting mechanisms 70 are arranged at intervals along the circumference of the bottom plate 51. The limiting mechanisms 70 can abut against the bottom plate 51 to limit the relative position of the bottom plate 51 and the mounting plate 60 to prevent the box body 10 from shifting.
[0068] Specifically, the limiting mechanism 70 includes a limiting seat 71 and a limiting member 72. The limiting seat 71 is set on the mounting plate 60. The limiting member 72 is threadedly connected to the limiting seat 71 and can abut against the base plate 51. The limiting member 72 can be abutted against the base plate 51 by adjusting the amount to which each limiting member 72 is screwed into the thread of the limiting seat 71. The structure is simple and the adjustment is convenient.
[0069] Optionally, the size of the mounting plate 60 relative to the support base 90 in the vertical direction is adjustable to adjust the position of the box 10 in the vertical direction, thereby allowing the negative hydrogen beam to accurately enter the first beam pipe 41.
[0070] Specifically, the stripping film rotating device 100 also includes an adjusting mechanism 80, which is arranged between the mounting plate 60 and the support seat 90. The adjusting mechanism 80 includes a mounting seat 81 and an adjusting member 82. One of the mounting seat 81 and the adjusting member 82 is connected to the support seat 90, and the other is connected to the mounting plate 60. The adjusting member 82 is threadedly connected to the mounting seat 81. By adjusting the amount by which the adjusting member 82 is screwed into the thread of the mounting seat 81, the vertical distance between the mounting plate 60 and the support seat 90 can be adjusted, thereby adjusting the vertical position of the box body 10. The structure is simple and the adjustment is convenient.
[0071] In this embodiment, the problem of high-precision phase matching between the negative hydrogen beam and the stripping film rotating device 100 is taken into consideration. The pulse width of the negative hydrogen beam generated by the linear accelerator, that is, the single pulse of the negative hydrogen beam has a certain length, so it takes a certain amount of time to pass through the stripping film rotating device 100. While the negative hydrogen beam passes through the rotating disk 20, the rotating disk 20 also maintains a rotational motion, so the mounting hole 21 and the stripping film 200 both have a certain lateral width, that is, the mounting hole 21 extends along the circumference of the rotating disk 20. The lateral widths of the mounting hole 21 and the stripping film 200 are in a matching relationship with the pulse width of the negative hydrogen beam, the distance from the mounting hole 21 to the center of the rotating disk 20, and the rotation speed of the rotating disk 20. Specifically, as Figure 5As shown, the product of the distance from the mounting hole 21 to the center of the rotating disk 20 and the pulse width and angular frequency of the negative hydrogen beam is the beam spot movement distance. The maximum size of the mounting hole 21 in the circumferential direction of the rotating disk 20 is the beam spot movement distance plus the lateral size of the negative hydrogen beam plus the safety consideration distance.
[0072] Because the stripping film rotating device 100 rotates as the negative hydrogen beam passes through the stripping film 200, the area of the stripping film 200 that the negative hydrogen beam passes through is significantly increased, significantly reducing the peak temperature of the stripping film 200. Furthermore, because the negative hydrogen beam passes through the stripping film 200 in a single pass, the peak temperature of the stripping film 200 does not exceed 600K, fully meeting operational requirements.
[0073] The film stripping rotating device 100 of this embodiment takes into account the requirement of high repetition frequency. Specifically, the frequency of the negative hydrogen beam of the linear accelerator is 50 Hz. To match the 50 Hz frequency of the linear accelerator, the rotation speed of the film stripping rotating device 100 needs to reach 1500 rpm.
[0074] Note that throughout this specification, references to terms such as "some embodiments" and "other embodiments" indicate that the specific features, structures, materials, or characteristics described in conjunction with those embodiments or examples are included in at least one embodiment or example of the present invention. Throughout this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be incorporated in any suitable manner in any one or more embodiments or examples.
[0075] The above are merely preferred embodiments of the present invention and the technical principles employed. Those skilled in the art will appreciate that the present invention is not limited to the specific embodiments described herein, and that various obvious changes, readjustments, and substitutions are possible for those skilled in the art without departing from the scope of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments and may include many other equivalent embodiments without departing from the scope of the present invention. The scope of the present invention is determined by the scope of the appended claims.
Claims
1. A peeling film rotating device, characterized in that: include: The box (10) is provided with a vacuum chamber (1001); A rotating disk (20) is arranged in the vacuum chamber (1001) and is rotatably connected to the housing (10). The rotating disk (20) is provided with a mounting hole (21) and a through hole (22). The mounting hole (21) and the through hole (22) are arranged along the radial direction of the rotating disk (20). The stripping film (200) is installed in the mounting hole (21). The housing (10) is provided with a first beam pipe (41) and a second beam pipe (42) which are connected to the vacuum chamber (1001). The first beam pipe (41) and the second beam pipe (42) are respectively arranged on both sides of the axial direction of the rotating disk (20). The first beam pipe (41) and the second beam pipe (42) are opposite to the mounting hole (21). The distance between the mounting hole (21) and the center of the rotating disk (20) is equal to the distance between the through hole (22) and the center of the rotating disk (20). A driving mechanism (30), wherein the rotating disk (20) is arranged at an output end of the driving mechanism (30), and the driving mechanism (30) is used to drive the rotating disk (20) to rotate.
2. The peeling film rotating device according to claim 1, characterized in that There are a plurality of mounting holes (21), and the plurality of mounting holes (21) are spaced apart along the circumference of the rotating disk (20). The through holes (22) are arranged in a one-to-one correspondence with the mounting holes (21).
3. The peeling film rotating device according to claim 2, characterized in that The shape of one of the through holes (22) is different from the shapes of the other through holes (22).
4. The peeling film rotating device according to claim 1, wherein The box (10) comprises: A housing (11), wherein one end of the housing (11) is open; A cover (12) is provided to cover the opening, the cover (12) and the shell (11) together form the vacuum chamber (1001), and the shell (11) and the cover (12) are detachably connected.
5. The peeling film rotating device according to claim 1, wherein The stripping film rotating device also includes: A bottom plate (51) and a reinforcement member (52), wherein the box body (10) is arranged on the bottom plate (51), and the reinforcement member (52) is connected to the bottom plate (51) and / or the box body (10).
6. The peeling film rotating device according to claim 5, characterized in that The stripping film rotating device also includes: A mounting plate (60) and a plurality of limiting mechanisms (70), wherein the base plate (51) is arranged on the mounting plate (60), and the limiting mechanisms (70) are arranged on the mounting plate (60), and the plurality of limiting mechanisms (70) are arranged at intervals along the circumference of the base plate (51), and the limiting mechanisms (70) can abut against the base plate (51) to limit the relative position of the base plate (51) and the mounting plate (60).
7. The peeling film rotating device according to claim 6, characterized in that The limiting mechanism (70) comprises: A limiting seat (71) and a limiting member (72), wherein the limiting seat (71) is arranged on the mounting plate (60), and the limiting member (72) is threadedly connected to the limiting seat (71) and can abut against the bottom plate (51).
8. The peeling film rotating device according to claim 6, wherein: The stripping film rotating device further comprises a support seat (90), the mounting plate (60) is arranged on the support seat (90), and the vertical distance between the mounting plate (60) and the support seat (90) is adjustable.
9. The peeling film rotating device according to claim 8, characterized in that: The stripping film rotating device further comprises an adjusting mechanism (80), wherein the adjusting mechanism (80) is arranged between the mounting plate (60) and the supporting seat (90), and the adjusting mechanism (80) comprises: A mounting seat (81) and an adjusting member (82), one of the mounting seat (81) and the adjusting member (82) is connected to the support seat (90), the other of the two is connected to the mounting plate (60), and the adjusting member (82) is threadedly connected to the mounting seat (81).
10. A dual beam distribution system, comprising a linear accelerator and a deflection magnet, characterized in that: It also includes the stripping film rotating device according to any one of claims 1 to 9, wherein the linear accelerator is arranged upstream of the stripping film rotating device, and the deflection magnet is arranged downstream of the stripping film rotating device.
Citation Information
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