A thin film deposition apparatus

Abstract

The application provides a thin film deposition device in the technical field of thin film deposition, which comprises a workbench, a vacuum tank, a vacuum cover, a quartz tube, an outer cover cylinder, a coil assembly, a gas supply mechanism, a gas extraction mechanism, a sample stage mechanism, a knocking mechanism and a lifting mechanism. Working gas can be ionized in an inductive coupling area to form a plasma, so that various active species are generated from the working gas, and reactions occur between the active species or between the active species and monomers, so as to facilitate the deposition of a polymer film on the surface of sample microspheres in the subsequent process, and the film plating effect of the product is improved. The knocking mechanism is installed on the workbench, passes through the vacuum tank and is attached to the sample stage mechanism, so that the knocking mechanism knocks the sample stage mechanism, thereby causing the multiple sample microspheres placed in the sample stage mechanism to vibrate, avoiding the adhesion of the multiple sample microspheres and improving the film plating effect of the sample microspheres.

Description

Technical Field

[0001] This invention belongs to the field of thin film deposition technology, and specifically relates to a thin film deposition apparatus. Background Technology

[0002] In related technologies, when performing a coating process on a sample, the sample is usually placed in a vacuum environment and a working gas is flowed to the sample so that a thin film is deposited on the surface of the sample.

[0003] Prior art (Chinese Invention Patent, Authorization Announcement No.: CN120366747B) discloses a thin film deposition apparatus, including a heating mechanism, a guide ring, an insulating ring, a lifting mechanism, a rotating mechanism, and a controller. The heating mechanism includes a heating tray for supporting and heating the substrate. The lifting mechanism drives the heating tray and guide ring to rise for the first thin film deposition. The rotating mechanism drives the heating tray to rotate, causing the guide ring to rest on the insulating ring. The lifting mechanism drives the heating tray to descend, separating the heating tray and guide ring. The rotating mechanism drives the heating tray to rotate. The lifting mechanism drives the heating tray to rise for the second thin film deposition. The relative position of the substrate and the heating tray differs during the second deposition from that during the first. By using only one stage of lifting and rotating mechanisms, the apparatus achieves the rotation of the heating tray and the relative rotation of the substrate and the heating tray, improving the uniformity of the thin film deposition and simplifying the structure.

[0004] In this prior art, when multiple samples are coated, they tend to stick together, which reduces the coating effect. Furthermore, the activity of the working gas flowing towards the samples is relatively uniform, thus affecting the coating effect. Summary of the Invention

[0005] To address the problem in existing technologies where multiple samples tend to stick together during coating, thus reducing the coating effect, this invention provides a thin film deposition apparatus. This apparatus employs a tapping mechanism mounted on a worktable, passing through a vacuum chamber and fitting snugly against a sample stage mechanism. The tapping mechanism taps the sample stage mechanism, causing vibrations in the multiple sample microspheres placed within it, preventing adhesion and improving the coating effect. Simultaneously, the working gas is ionized within the inductive coupling region, generating various active species. These species react with each other or with monomers, facilitating subsequent deposition of a polymer film on the sample microsphere surface, further enhancing the coating effect. The specific technical solution is as follows:

[0006] A thin film deposition apparatus includes: a worktable, a vacuum chamber, a vacuum cover, a quartz tube, an outer casing, a coil assembly, a gas supply mechanism, a gas extraction mechanism, a sample stage mechanism, a striking mechanism, and a lifting mechanism. The vacuum chamber is a hollow cavity with an opening at the top and is mounted on the worktable. The vacuum cover is fastened to the top of the vacuum chamber. The quartz tube is mounted on the top of the vacuum cover and is connected to the vacuum chamber. The outer casing is mounted on the top of the vacuum cover, and at least a portion of the quartz tube is located inside the outer casing. The coil assembly is mounted inside the outer casing and is wound around the outside of the quartz tube. The gas supply mechanism is mounted on the worktable and is connected to the top of the quartz tube. The gas extraction mechanism is mounted on the worktable and is connected to the vacuum chamber. The sample stage mechanism is located inside the vacuum chamber and below the quartz tube. The striking mechanism is mounted on the worktable, passes through the vacuum chamber, and is in contact with the sample stage mechanism. The lifting mechanism is mounted inside the worktable and is connected to the sample stage mechanism.

[0007] In addition, the thin film deposition apparatus in the above-mentioned technical solution provided by the present invention may also have the following additional technical features:

[0008] In the above technical solution, the thin film deposition apparatus further includes: a first observation window, a second observation window, a first mounting bracket, a first mounting hole, a camera assembly, a third observation window, and a cold light source; the first observation window is mounted on the vacuum cover; the second observation window is mounted on the vacuum cover and is located to one side of the first observation window; the first mounting bracket is mounted on the second observation window; the first mounting hole is elongated, and at least two first mounting holes are disposed within the first mounting bracket; the camera assembly is mounted on at least two first mounting holes, and the camera assembly is opposite to the second observation window; the third observation window is mounted on the vacuum cover; and the cold light source is mounted within the third observation window.

[0009] In the above technical solution, the lifting mechanism includes: a second mounting frame, a first motor frame, a first motor body, a lead screw, a lifting plate, a support column, and a guide rod; the second mounting frame is located inside the worktable and is mounted on the top of the worktable; the first motor frame is mounted on the bottom of the second mounting frame; the first motor body is mounted on the first motor frame; the lead screw has an external thread on its outer wall, is located inside the second mounting frame, and is connected to the first motor body; the lifting plate has a threaded hole with an internal thread, is located inside the second mounting frame, and the lead screw passes through the threaded hole of the lifting plate; the support column is mounted on the lifting plate, passes through the bottom of the worktable and the vacuum tank in sequence, and is connected to the sample stage mechanism; two guide rods are located inside the second mounting frame, one end of each guide rod is connected to the second mounting frame, the other end of each guide rod is connected to the worktable, the two guide rods pass through the lifting plate, and are located on both sides of the lead screw; wherein, the external thread and the internal thread are inside the guide rod, and the lead screw is located inside the support column.

[0010] In the above technical solution, the lifting mechanism further includes: a switch mounting bracket, a second mounting hole, a proximity switch, a blocking plate, a steel ruler, and a pointer; the switch mounting bracket is installed on one side of the second mounting bracket; the second mounting hole is elongated and is located inside the switch mounting bracket; two proximity switches are installed inside the second mounting hole, with a gap between them, and both proximity switches are electrically connected to the first motor body; the blocking plate is L-shaped and is installed on the lifting plate, with the blocking plate opposite to one of the proximity switches; the steel ruler is installed on the other side of the second mounting bracket; the pointer is installed on the lifting plate, with the pointer opposite to the steel ruler; wherein, the pointer and the blocking plate are at the same height.

[0011] In the above technical solution, the sample stage mechanism includes: a mounting plate, a support frame assembly, a second motor body, a crucible body, a pad, and a striking plate; the mounting plate is located inside the vacuum chamber and is connected to the support column; the support frame assembly is mounted on the mounting plate; the second motor body is mounted inside the support frame assembly; the crucible body is located above the support frame assembly and is connected to the second motor body; the pad is mounted on one side wall of the support frame assembly; the striking plate is connected to the pad and is opposite to the striking mechanism.

[0012] In the above technical solution, the support frame assembly includes: a support frame body, a support plate, positioning blocks, a motor plate, positioning protrusions, and a handle; the support frame body is mounted on the mounting plate; two support plates are respectively mounted on both sides of the top of the support frame body; multiple positioning blocks are disposed on the support plates, and there is a gap between adjacent positioning blocks; the motor plate is located between the two support plates, and a second motor body is mounted on the bottom of the motor plate; at least two positioning protrusions are respectively connected to both sides of the motor plate, and at least two positioning protrusions are respectively placed on the two support plates, and the positioning protrusions are located between adjacent positioning blocks; the handle is connected to the motor plate.

[0013] In the above technical solution, the striking mechanism includes: a third mounting bracket, an electromagnet, a striking rod, a guide sleeve, an adjusting nut, and a spring; the third mounting bracket is mounted on the workbench and is located on one side of the vacuum tank; an iron core is provided inside the electromagnet, and the electromagnet is installed inside the third mounting bracket; one end of the striking rod is connected to the iron core, and the other end of the striking rod passes through the side wall of the vacuum tank, and the other end of the striking rod is opposite to the striking plate; the guide sleeve is mounted on the side wall of the vacuum tank and is wrapped around the outside of the striking rod; the adjusting nut is fitted on the outside of the striking rod; the spring is wrapped around the outside of the striking rod, one end of the spring is in contact with the guide sleeve, and the other end of the spring is in contact with the adjusting nut.

[0014] In the above technical solution, the gas extraction mechanism includes: a fourth mounting bracket, a molecular pump, a gas delivery pipe, an electric gate valve, and a vacuum pump; the fourth mounting bracket is installed inside the worktable; the molecular pump is installed on the fourth mounting bracket; the gas delivery pipe is installed inside the worktable, passing through the top of the worktable, with the top of the gas delivery pipe located inside the vacuum tank, and the gas delivery pipe is located above the molecular pump; the electric gate valve is installed inside the worktable, located between the molecular pump and the gas delivery pipe, and the electric gate valve is simultaneously in contact with the output end of the molecular pump and the gas delivery pipe; the vacuum pump is installed on the outside of the worktable, and the vacuum pump is connected to the vacuum tank.

[0015] In the above technical solution, the air extraction mechanism further includes: a shielding net, mounting columns, and a baffle; the shielding net is located inside the vacuum tank and is installed on the top of the air guide pipe; multiple mounting columns are installed inside the vacuum tank and are arranged around the outside of the air guide pipe; the baffle is connected to multiple mounting columns and is located above the air guide pipe.

[0016] In the above technical solution, the gas supply mechanism includes: a gas supply frame, flow controllers, gas pipelines, and electromagnetic shut-off valves; the gas supply frame is installed on the workbench; three flow controllers are installed on the gas supply frame; one end of the gas pipeline is connected to the output end of the three flow controllers simultaneously, and the other end of the gas pipeline is connected to the top of the quartz tube; three electromagnetic shut-off valves are installed on the gas supply frame, and the three electromagnetic shut-off valves are respectively connected to the input end of the three flow controllers, and the three electromagnetic shut-off valves are respectively connected to three gas sources.

[0017] The thin film deposition apparatus of the present invention has the following advantages compared with the prior art:

[0018] 1. By installing the coil assembly inside the outer casing and winding it around the outside of the quartz tube, an inductive coupling region is formed when the coil assembly is energized. This allows the working gas to be ionized within this region when it flows into the quartz tube, creating plasma. This plasma generates various active species within the working gas, facilitating reactions between these species or between the species and monomers. This process promotes the subsequent deposition of a polymer film on the sample microspheres, improving the coating effect. 2. By mounting a tapping mechanism on the worktable, passing through the vacuum chamber, and fitting it against the sample stage mechanism, the tapping mechanism strikes the sample stage mechanism, causing multiple sample microspheres placed within it to vibrate. This prevents the microspheres from sticking together, further improving the coating effect.

[0019] 2. By setting multiple elongated first mounting holes within a first mounting frame, the camera assembly is mounted on these holes and positioned opposite a second observation window. This allows the first mounting frame to support the camera assembly and enables it to move within the first mounting holes, adjusting the relative position between the camera assembly and the second observation window. The camera assembly then captures images of the sample microspheres' coating process through the second observation window, monitoring the coating status and determining if the microspheres are in a normal state during the coating process. Furthermore, this allows for timely intervention when microspheres adhere, ensuring the optimal coating effect.

[0020] 3. By connecting the lead screw to the first motor body, the lifting plate is positioned within the second mounting bracket, and the lead screw passes through the threaded hole of the lifting plate to achieve a threaded connection between the lead screw and the lifting plate. This allows the first motor body to drive the lead screw to rotate, which in turn drives the lifting plate to move up and down, thereby adjusting the height of the lifting plate. By installing support columns on the lifting plate, the support columns pass sequentially through the bottom of the worktable and the vacuum tank, and are connected to the sample stage mechanism. This allows the lifting plate to move up and down, which in turn drives the sample stage mechanism to move up and down via the support columns, thereby adjusting the height of the sample stage mechanism.

[0021] 4. By mounting a blocking plate on the lifting plate and positioning it opposite a proximity switch, the lifting plate moves the blocking plate up and down, thus blocking the proximity switch and causing it to trigger the first motor to stop. This controls the distance the lifting plate moves up and down. By mounting a steel ruler on the other side of the second mounting bracket and mounting a pointer on the lifting plate, positioning the pointer opposite the steel ruler, the lifting plate and pointer move up and down synchronously. This allows the height of the lifting plate to be measured using the steel ruler, enabling precise control of the sample stage mechanism's height.

[0022] 5. By mounting the support frame assembly on the mounting plate, installing the second motor body inside the support frame assembly, and connecting the crucible body to the second motor body, the support frame assembly supports the second motor body, thereby enabling the second motor body to drive the crucible body to rotate. This allows the crucible body to drive multiple sample microspheres to rotate when multiple sample microspheres are placed inside the crucible body, thus preventing the sample microspheres from sticking together and improving the coating effect on the sample microspheres.

[0023] 6. By positioning the positioning protrusion with two adjacent positioning blocks and placing the positioning protrusion on the support plate, the support frame body supports the motor plate and the second motor body through the support plate. This allows the positioning protrusion to be placed between two different positioning blocks to adjust the relative position of the crucible body and the quartz tube, thereby improving the applicability of the product.

[0024] 7. By mounting the third mounting bracket on the worktable and installing the electromagnet inside the third mounting bracket, the third mounting bracket supports the electromagnet, allowing the iron core to reciprocate within the electromagnet when it is energized. By connecting one end of the striking rod to the iron core and passing the other end of the striking rod through the side wall of the vacuum chamber, with the other end of the striking rod facing the striking plate, the iron core drives the striking rod to reciprocate within the vacuum chamber as the iron core reciprocates within the electromagnet. This allows the striking rod to strike the striking plate, preventing multiple sample microspheres from sticking together and thus improving the coating effect on the sample microspheres.

[0025] 8. First, start the vacuum pump to extract the air from the vacuum chamber and bring it to the predetermined vacuum level. Then, start the electric gate valve to connect the molecular pump to the gas delivery pipe. Next, start the molecular pump to extract the air from the vacuum chamber and bring it to the ultimate vacuum level. This allows the sample microspheres to be coated in a high vacuum environment, thus improving the user experience of the product.

[0026] 9. By installing multiple mounting columns inside the vacuum tank and surrounding the outside of the gas delivery pipe, and simultaneously connecting a baffle to the multiple mounting columns and positioning the baffle above the gas delivery pipe, the multiple mounting columns support the baffle, thereby shielding the gas delivery pipe from debris falling into the gas delivery pipe and thus preventing debris from entering the molecular pump and causing damage to the molecular pump.

[0027] 10. By connecting one end of the gas pipeline to the output of three flow controllers simultaneously, and connecting the other end of the gas pipeline to the top of the quartz tube, the three flow controllers can control the flow rate of gas from the three gas sources into the gas pipeline, thereby improving the accuracy of the working gas flow control for sample microsphere coating and thus improving the coating effect on the sample microspheres. Attached Figure Description

[0028] Figure 1 This is one of the perspective views of a thin film deposition apparatus according to the present invention;

[0029] Figure 2 for Figure 1 Enlarged view of a portion at point A;

[0030] Figure 3 for Figure 1 A magnified view of section B;

[0031] Figure 4 This is a second perspective view of a thin film deposition apparatus according to the present invention;

[0032] Figure 5for Figure 4 A magnified view of a portion at point C;

[0033] Figure 6 for Figure 4 A magnified view of a portion at point D;

[0034] Figure 7 This is a third perspective view of a thin film deposition apparatus according to the present invention;

[0035] Figure 8 for Figure 7 A magnified view of a portion at point E;

[0036] Figure 9 for Figure 7 A magnified view of a portion at point F;

[0037] Figure 10 This is a perspective view of the sample stage mechanism and the striking mechanism of the present invention;

[0038] Figure 11 for Figure 10 A magnified view of a portion of point G;

[0039] Figure 12 for Figure 10 A magnified view of a portion at point H;

[0040] in, Figures 1 to 12 The correspondence between the reference numerals and component names in the attached drawings is as follows:

[0041] 10 Workbench, 11 Vacuum Jar, 12 Vacuum Cover, 13 Quartz Tube, 14 Outer Cover, 15 Coil Assembly, 16 Gas Supply Mechanism, 161 Gas Supply Rack, 162 Flow Controller, 163 Gas Pipeline, 164 Electromagnetic Shut-off Valve, 17 Pumping Mechanism, 171 Fourth Mounting Bracket, 172 Molecular Pump, 173 Gas Guide Pipe, 174 Electric Gate Valve, 175 Vacuum Pump, 176 Shielding Net, 177 Mounting Column, 178 Baffle, 18 Sample Stage Mechanism, 181 Mounting Plate, 182 Support Frame Assembly, 1821 Support Frame Body, 1822 Support Plate, 1823 Positioning Block, 1824 Motor Plate, 1825 Positioning Protrusion, 1826 Handle, 183 Second Motor Body, 184 Crucible Main body, 185 pad, 186 striking plate, 19 striking mechanism, 191 third mounting bracket, 192 electromagnet, 193 iron core, 194 striking rod, 195 guide sleeve, 196 adjusting nut, 197 spring, 20 lifting mechanism, 201 second mounting bracket, 202 first motor bracket, 203 first motor body, 204 lead screw, 205 lifting plate, 206 support column, 207 light bar, 208 switch fixing bracket, 209 second mounting hole, 210 proximity switch, 211 shielding plate, 212 steel ruler, 213 pointer, 22 first observation window, 23 second observation window, 24 first mounting bracket, 25 first mounting hole, 26 camera assembly, 27 third observation window, 28 cold light source. Detailed Implementation

[0042] The following are specific implementation cases and appendices. Figures 1 to 12 The present invention will be further described, but the present invention is not limited to these embodiments.

[0043] A thin film deposition apparatus, such as Figures 1 to 12As shown, the thin film deposition apparatus includes: a worktable 10, a vacuum chamber 11, a vacuum cover 12, a quartz tube 13, an outer casing 14, a coil assembly 15, a gas supply mechanism 16, a gas extraction mechanism 17, a sample stage mechanism 18, a tapping mechanism 19, and a lifting mechanism 20; the vacuum chamber 11 is a hollow cavity with an opening at the top, and the vacuum chamber 11 is mounted on the worktable 10; the vacuum cover 12 is fastened to the top of the vacuum chamber 11; the quartz tube 13 is mounted on the top of the vacuum cover 12, and the quartz tube 13 is connected to the vacuum chamber 11; the outer casing 14 is mounted on the top of the vacuum cover 12, and at least part of the quartz tube 13 is located inside the outer casing 14; the coil assembly 15 is mounted on... The outer casing 14 houses the coil assembly 15, which is wound around the outside of the quartz tube 13. A gas supply mechanism 16 is mounted on the worktable 10 and connected to the top of the quartz tube 13. A vacuum extraction mechanism 17 is mounted on the worktable 10 and connected to the vacuum tank 11. A sample stage mechanism 18 is located inside the vacuum tank 11 and below the quartz tube 13. A striking mechanism 19 is mounted on the worktable 10, passes through the vacuum tank 11, and is in contact with the sample stage mechanism 18. A lifting mechanism 20 is mounted inside the worktable 10 and connected to the sample stage mechanism 18.

[0044] By mounting the vacuum container 11 on the workbench 10 and fastening the vacuum cover 12 to the top of the vacuum container 11, the workbench 10 supports the vacuum container 11, thereby sealing the vacuum container 11 with the vacuum cover 12. By mounting the quartz tube 13 on the top of the vacuum cover 12 and connecting the quartz tube 13 to the vacuum container 11, the vacuum cover 12 supports the quartz tube 13, thereby connecting the quartz tube 13 to the interior of the vacuum container 11. By mounting the outer cover 14 on the top of the vacuum cover 12 and placing at least a portion of the quartz tube 13 within the outer cover 14, the outer cover 14 protects the quartz tube 13. By installing the coil assembly 15 inside the outer casing 14 and winding the coil assembly 15 around the outside of the quartz tube 13, the outer casing 14 supports the coil assembly 15. When the coil assembly 15 is energized, it can form an inductive coupling region. This allows the working gas to be ionized within the inductive coupling region when it flows into the quartz tube 13, forming plasma. This generates various active species in the working gas, and these active species react with each other or with monomers, facilitating the subsequent deposition of a polymer film on the surface of the sample microspheres. By installing the gas supply mechanism 16 on the workbench 10 and connecting the gas supply mechanism 16 to the top of the quartz tube 13, the gas supply mechanism 16 injects working gas into the quartz tube 13, thereby enabling the working gas to be ionized in the inductive coupling area formed by the quartz tube 13 and the coil assembly 15 being energized; by installing the air extraction mechanism 17 inside the workbench 10 and connecting the air extraction mechanism 17 to the vacuum tank 11, the air extraction mechanism 17 can extract the air from the vacuum tank 11, thereby creating a vacuum state inside the vacuum tank 11. By placing the sample stage mechanism 18 inside the vacuum tank 11 and below the quartz tube 13, the multiple sample microspheres contained in the sample stage mechanism 18 are placed in a vacuum environment during coating, thereby improving the uniformity of subsequent coating of the sample microspheres. This allows the ionized working gas to flow to the sample stage mechanism 18, thus enabling the coating of the multiple sample microspheres contained in the sample stage mechanism 18. By mounting the tapping mechanism 19 on the worktable 10, passing through the vacuum tank 11, and ensuring that the tapping mechanism 19 is in contact with the sample stage mechanism 18, the following steps are achieved: The tapping mechanism 19 can tap the sample stage mechanism 18, thereby causing the multiple sample microspheres contained in the sample stage mechanism 18 to vibrate, so as to avoid the sample microspheres from sticking together and thus improve the coating effect on the sample microspheres. By installing the lifting mechanism 20 in the worktable 10 and connecting the lifting mechanism 20 to the sample stage mechanism 18, the lifting mechanism 20 can drive the sample stage mechanism 18 to move in the vacuum tank 11, thereby adjusting the distance between the sample microspheres and the quartz tube 13 in the sample stage mechanism 18, and thus adjusting the coating effect on the sample microspheres, so as to improve the user experience of the product.

[0045] In practical use, multiple sample microspheres are first placed inside the sample stage mechanism 18. Then, the lifting mechanism 20 is activated, causing the sample stage mechanism 18 to move up and down within the vacuum chamber 11, thereby adjusting the distance between the sample microspheres and the quartz tube 13. Next, the evacuation mechanism 17 is activated, causing it to extract the air from the vacuum chamber 11, thus creating a vacuum. Then, the coil assembly 15 is energized, causing the area surrounding the coil assembly 15 to form an inductive coupling region. Finally, the gas supply mechanism 16 is activated, causing it to supply gas to the sample stage mechanism 18. Working gas is injected into the quartz tube 13 to ionize the working gas in the inductive coupling region, thereby generating various active species. The ionized working gas then flows to the sample stage mechanism 18 to coat multiple sample microspheres within the sample stage mechanism 18, allowing the working gas to deposit on the surface of the sample microspheres to form a polymer film. Simultaneously, the tapping mechanism 19 is activated to tap the sample stage mechanism 18, causing the multiple sample microspheres to vibrate, thus preventing adhesion between the sample microspheres and improving the coating effect of the sample microspheres.

[0046] With the above structure, by installing the coil assembly 15 inside the outer casing 14 and winding the coil assembly 15 around the outside of the quartz tube 13, the coil assembly 15 can form an inductive coupling region when energized. This allows the working gas to be ionized within the inductive coupling region when it flows into the quartz tube 13, forming plasma. This generates various active species in the working gas, enabling reactions between these species or between the active species and monomers, facilitating the subsequent deposition of a polymer film on the sample microsphere surface and improving the coating effect. By installing the tapping mechanism 19 on the worktable 10, passing through the vacuum tank 11, and fitting it against the sample stage mechanism 18, the tapping mechanism 19 taps the sample stage mechanism 18, causing multiple sample microspheres placed within the sample stage mechanism 18 to vibrate. This prevents the sample microspheres from sticking together, thereby improving the coating effect on the sample microspheres.

[0047] Specifically, the RF power supply is mounted on the workbench 10 and is electrically connected to the coil assembly 15.

[0048] In embodiments of the present invention, such as Figure 2 and Figure 6As shown, the thin film deposition apparatus further includes: a first observation window 22, a second observation window 23, a first mounting bracket 24, a first mounting hole 25, a camera assembly 26, a third observation window 27, and a cold light source 28; the first observation window 22 is mounted on the vacuum cover 12; the second observation window 23 is mounted on the vacuum cover 12 and is located on one side of the first observation window 22; the first mounting bracket 24 is mounted on the second observation window 23; the first mounting hole 25 is elongated, and at least two first mounting holes 25 are disposed within the first mounting bracket 24; the camera assembly 26 is mounted on at least two first mounting holes 25 and is opposite to the second observation window 23; the third observation window 27 is mounted on the vacuum cover 12; and the cold light source 28 is mounted within the third observation window 27.

[0049] By installing the first observation window 22 on the vacuum cover 12, the staff can observe the inside of the vacuum tank 11 through the first observation window 22, so as to observe the coating effect of the sample microspheres. By installing the second observation window 23 on the vacuum cover 12 and the first mounting bracket 24 on the second observation window 23, the vacuum cover 12 supports the second observation window 23, thereby enabling the second observation window 23 to support the first mounting bracket 24. By setting multiple elongated first mounting holes 25 within a first mounting bracket 24, a camera assembly 26 is mounted on these holes, with the camera assembly 26 facing a second observation window 23. This allows the first mounting bracket 24 to support the camera assembly 26 and enables it to move within the first mounting holes 25, adjusting its relative position to the second observation window 23. This allows the camera assembly 26 to photograph the coating process of the sample microspheres through the second observation window 23, monitoring the coating status and determining if the microspheres are in a normal state during the coating process. Furthermore, if microspheres adhere, timely intervention is possible to ensure effective coating. A third observation window 27 is mounted on the vacuum cover 12, and a cold light source 28 is installed within the third observation window 27. This allows the cold light source 28 to illuminate the interior of the vacuum chamber 11, improving the imaging effect of the camera assembly 26 on the sample microsphere coating process.

[0050] Specifically, camera assembly 26 employs CCD video monitoring technology.

[0051] In embodiments of the present invention, such as Figure 9 and Figure 10As shown, the lifting mechanism 20 includes: a second mounting frame 201, a first motor frame 202, a first motor body 203, a lead screw 204, a lifting plate 205, a support column 206, and a guide bar 207; the second mounting frame 201 is located inside the worktable 10 and is mounted on the top of the worktable 10; the first motor frame 202 is mounted on the bottom of the second mounting frame 201; the first motor body 203 is mounted on the first motor frame 202; the lead screw 204 has an external thread on its outer wall, is located inside the second mounting frame 201, and is connected to the first motor body 203; the lifting plate 205 has a threaded hole, and an internal thread is provided inside the threaded hole. The threaded lifting plate 205 is located inside the second mounting bracket 201, and the lead screw 204 passes through the threaded hole of the lifting plate 205; the support column 206 is installed on the lifting plate 205, and the support column 206 passes through the bottom of the worktable 10 and the vacuum tank 11 in sequence, and the support column 206 is connected to the sample stage mechanism 18; two optical bars 207 are located inside the second mounting bracket 201, one end of the two optical bars 207 is connected to the second mounting bracket 201, and the other end of the two optical bars 207 is connected to the worktable 10. The two optical bars 207 pass through the lifting plate 205, and the optical bars 207 are located on both sides of the lead screw 204; wherein, the external thread and the internal thread are inside, and the lead screw 204 is located inside the support column 206.

[0052] By mounting the second mounting machine on top of the workbench 10, mounting the first motor frame 202 on the bottom of the second mounting frame 201, and mounting the first motor body 203 on the first motor frame 202, the workbench 10 supports the second mounting frame 201, thereby enabling the second mounting frame 201 to support the first motor body 203 through the first motor frame 202, thus improving the stability of the first motor body 203; by connecting the lead screw 204 to the first motor body 203, the lifting plate 205 is located inside the second mounting frame 201, and the lead screw 204 passes through the thread of the lifting plate 205. A hole is provided to enable the lead screw 204 to be threadedly connected to the lifting plate 205, so that when the first motor body 203 drives the lead screw 204 to rotate, the lead screw 204 drives the lifting plate 205 to move up and down, thereby adjusting the height of the lifting plate 205; by installing the support column 206 on the lifting plate 205, the support column 206 passes through the bottom of the worktable 10 and the vacuum tank 11 in sequence, and the support column 206 is connected to the sample stage mechanism 18, so that when the lifting plate 205 moves up and down, the lifting plate 205 drives the sample stage mechanism 18 to move up and down through the support column 206, thereby adjusting the height of the sample stage mechanism 18. By connecting one end of the two optical rods 207 to the second mounting bracket 201 and the other end of the two optical rods 207 to the worktable 10, and allowing the two optical rods 207 to pass through the lifting plate 205, the second mounting bracket 201 and the worktable 10 cooperate to support the two optical rods 207, thereby enabling the lifting plate 205 to move up and down along the two optical rods 207, thus improving the stability of the up and down movement of the lifting plate 205; by placing the lead screw 204 inside the support column 206, the lead screw 204 can rotate inside the support column 206, thereby making the lead screw 204 hidden inside the support column 206, thus making the product structure more compact.

[0053] Specifically, a polytetrafluoroethylene (PTFE) guide sleeve is installed inside the vacuum tank 11 and is wrapped around the outside of the support column 206 so that the PTFE guide sleeve slides and seals the support column 206, thereby ensuring the sealing between the support column 206 and the vacuum tank 11 when the support column 206 moves up and down.

[0054] In embodiments of the present invention, such as Figure 9As shown, the lifting mechanism 20 further includes: a switch mounting bracket 208, a second mounting hole 209, a proximity switch, a shielding plate 211, a steel ruler 212, and a pointer 213; the switch mounting bracket 208 is mounted on one side of the second mounting bracket 201; the second mounting hole 209 is elongated and is located inside the switch mounting bracket 208; two proximity switches are mounted inside the second mounting hole 209, with a gap between them, and both proximity switches are electrically connected to the first motor body 203; the shielding plate 211 is L-shaped and is mounted on the lifting plate 205, and is opposite to one of the proximity switches; the steel ruler 212 is mounted on the other side of the second mounting bracket 201; the pointer 213 is mounted on the lifting plate 205, and is opposite to the steel ruler 212; wherein, the pointer 213 and the shielding plate 211 are at the same height.

[0055] By mounting the switch mounting bracket 208 on one side of the second mounting bracket 201, setting the elongated second mounting hole 209 inside the switch mounting bracket 208, and mounting two proximity switches inside the second mounting hole 209, the second mounting bracket 201 supports the two proximity switches, allowing the proximity switches to move within the second mounting hole 209 to adjust the distance between the two proximity switches. By mounting the blocking plate 211 on the lifting plate 205 and positioning the blocking plate 211 opposite to the proximity switch, the lifting plate 205 drives the blocking plate 211 to move up and down, thereby blocking one proximity switch and causing the proximity switch to trigger the first motor body 203 to stop working, thus controlling the distance the lifting plate 205 moves up and down. By installing the steel ruler 212 on the other side of the second mounting bracket 201, and installing the pointer 213 on the lifting plate 205, with the pointer 213 facing the steel ruler 212, the lifting plate 205 and the pointer 213 can move up and down synchronously, thereby measuring the height of the lifting plate 205 through the steel ruler 212, and thus achieving precise control of the height of the sample stage mechanism 18; by making the pointer 213 and the shield 211 at the same height, the operator can adjust the distance between the two proximity switches by the data pointed to by the pointer 213, thereby precisely controlling the distance of the lifting plate 205 moving up and down.

[0056] In embodiments of the present invention, such as Figure 10 and Figure 11As shown, the sample stage mechanism 18 includes: a mounting plate 181, a support frame assembly 182, a second motor body 183, a crucible body 184, a pad 185, and a striking plate 186; the mounting plate 181 is located inside the vacuum tank 11 and is connected to the support column 206; the support frame assembly 182 is mounted on the mounting plate 181; the second motor body 183 is mounted inside the support frame assembly 182; the crucible body 184 is located above the support frame assembly 182 and is connected to the second motor body 183; the pad 185 is mounted on one side wall of the support frame assembly 182; the striking plate 186 is connected to the pad 185 and is opposite to the striking mechanism 19.

[0057] By positioning the mounting plate 181 inside the vacuum chamber 11 and connecting it to the support column 206, the support column 206 can drive the mounting plate 181 to move up and down, thereby adjusting the height of the mounting plate 181. By mounting the support frame assembly 182 on the mounting plate 181, installing the second motor body 183 inside the support frame assembly 182, and connecting the crucible body 184 to the second motor body 183, the support frame assembly 182 supports the second motor body 183, thereby enabling the second motor body 183 to drive the crucible body 184 to rotate. This allows the crucible body 184 to drive multiple sample microspheres to rotate when multiple sample microspheres are placed inside the crucible body 184, preventing the sample microspheres from sticking together and improving the coating effect on the sample microspheres. By installing the pad 185 on one side wall of the support frame assembly 182, connecting the striking plate 186 to the pad 185, and positioning the striking plate 186 opposite to the striking mechanism 19, the support frame assembly 182 supports the striking plate 186 through the pad 185. This allows the striking mechanism 19 to strike the support frame assembly 182 through the striking plate 186, thereby increasing the striking area of ​​the striking mechanism 19 on the support frame assembly 182 and improving the user experience of the product.

[0058] In embodiments of the present invention, such as Figure 11As shown, the support frame assembly 182 includes: a support frame body 1821, a support plate 1822, positioning blocks 1823, a motor plate 1824, positioning protrusions 1825, and a handle 1826; the support frame body 1821 is mounted on the mounting plate 181; two support plates 1822 are respectively mounted on both sides of the top of the support frame body 1821; multiple positioning blocks 1823 are disposed on the support plates 1822, and there is a gap between adjacent positioning blocks 1823; the motor plate 1824 is located between the two support plates 1822, and a second motor body 183 is mounted on the bottom of the motor plate 1824; at least two positioning protrusions 1825 are respectively connected to both sides of the motor plate 1824, and at least two positioning protrusions 1825 are respectively placed on the two support plates 1822, and the positioning protrusions 1825 are located between adjacent positioning blocks 1823; the handle 1826 is connected to the motor plate 1824.

[0059] By installing two support plates 1822 on both sides of the top of the support frame body 1821, and setting multiple positioning blocks 1823 on the support plates 1822 with a gap between adjacent positioning blocks 1823, the support frame body 1821 is supported by the two support plates 1822 for the multiple positioning blocks 1823; by placing the motor plate 1824 between the support plates 1822 and installing the second motor body 183 at the bottom of the motor plate 1824, the motor plate 1824 can support the second motor body 183; by positioning multiple protrusions 1825 respectively on both sides of the motor plate 1824... The connection involves placing multiple positioning protrusions 1825 on two support plates 1822, with the positioning protrusions 1825 positioned between two adjacent positioning blocks 1823. This allows the support plates 1822 to support the motor plate 1824 via the positioning protrusions 1825, thereby enabling the two adjacent positioning blocks 1823 to position the positioning protrusions 1825 and the motor plate 1824. By connecting the handle 1826 to the motor plate 1824, the operator can use the handle 1826 to pick up and drop the motor plate 1824, the second motor body 183, and the crucible body 184, facilitating the replacement of sample microspheres.

[0060] By adopting the above structure, the positioning protrusion 1825 is positioned by two adjacent positioning blocks 1823 and the positioning protrusion 1825 is placed on the support plate 1822, so that the support frame body 1821 supports the motor plate 1824 and the second motor body 183 through the support plate 1822. This allows the positioning protrusion 1825 to be placed between two different positioning blocks 1823 to adjust the relative position of the crucible body 184 and the quartz tube 13, thereby improving the applicability of the product.

[0061] In embodiments of the present invention, such as Figure 3 and Figure 10As shown, the striking mechanism 19 includes: a third mounting bracket 191, an electromagnet 192, a striking rod 194, a guide sleeve 195, an adjusting nut 196, and a spring 197; the third mounting bracket 191 is mounted on the workbench 10 and is located on one side of the vacuum tank 11; an iron core 193 is provided inside the electromagnet 192, and the electromagnet 192 is mounted inside the third mounting bracket 191; one end of the striking rod 194 is connected to the iron core 193, and the striking rod 194... The other end of the striking rod 194 passes through the side wall of the vacuum tank 11, and the other end of the striking rod 194 is opposite to the striking plate 186; the guide sleeve 195 is installed on the side wall of the vacuum tank 11, and the guide sleeve 195 is wrapped around the outside of the striking rod 194; the adjusting nut 196 is fitted on the outside of the striking rod 194; the spring 197 is wrapped around the outside of the striking rod 194, one end of the spring 197 is in contact with the guide sleeve 195, and the other end of the spring 197 is in contact with the adjusting nut 196.

[0062] By mounting the third mounting bracket 191 on the workbench 10 and installing the electromagnet 192 inside the third mounting bracket 191, the third mounting bracket 191 supports the electromagnet 192, so that when the electromagnet 192 is energized, the iron core 193 can reciprocate within the electromagnet 192. By connecting one end of the striking rod 194 to the iron core 193 and having the other end of the striking rod 194 pass through the side wall of the vacuum tank 11 and be opposite to the striking plate 186, when the iron core 193 reciprocates within the electromagnet 192, the iron core 193 drives the striking rod 194 to reciprocate within the vacuum tank 11, thereby enabling the striking rod 194 to strike the striking plate 186, thus preventing multiple sample microspheres from sticking together and improving the coating effect on the sample microspheres. By installing the guide sleeve 195 on the side wall of the vacuum tank 11 and wrapping the guide sleeve 195 around the outside of the striking rod 194, the vacuum tank 11 supports the guide sleeve 195, thereby guiding the striking rod 194 and improving the stability of the striking rod 194's movement. By fitting the adjusting nut 196 on the outside of the striking rod 194, with one end of the spring 197 in contact with the guide sleeve 195 and the other end of the spring 197 in contact with the adjusting nut 196, when the striking rod 194 moves toward the striking plate 186, the striking rod 194 compresses the spring 197 through the adjusting nut 196. This ensures that when the striking rod 194 moves away from the striking plate 186, the spring 197 resets and drives the striking rod 194 to move, thus improving the user experience of the product. Meanwhile, by fitting the adjusting nut 196 onto the outside of the striking rod 194, the clamping force of the adjusting nut 196 on the spring 197 can be adjusted by adjusting the position of the adjusting nut 196 on the striking rod 194, thereby improving the applicability of the product.

[0063] In embodiments of the present invention, such as Figure 7 As shown, the pumping mechanism 17 includes: a fourth mounting bracket 171, a molecular pump 172, a gas delivery pipe 173, an electric gate valve 174, and a vacuum pump 175; the fourth mounting bracket 171 is installed inside the workbench 10; the molecular pump 172 is installed on the fourth mounting bracket 171; the gas delivery pipe 173 is installed inside the workbench 10, passing through the top of the workbench 10, with the top of the gas delivery pipe 173 located inside the vacuum tank 11, and the gas delivery pipe 173 is located above the molecular pump 172; the electric gate valve 174 is installed inside the workbench 10, located between the molecular pump 172 and the gas delivery pipe 173, and the electric gate valve 174 is simultaneously in contact with the output end of the molecular pump 172 and the gas delivery pipe 173; the vacuum pump 175 is installed on the outside of the workbench 10, and the vacuum pump 175 is connected to the vacuum tank 11.

[0064] By installing the fourth mounting bracket 171 inside the workbench 10 and mounting the molecular pump 172 on the fourth mounting bracket 171, the fourth mounting bracket 171 supports the molecular pump 172, thereby improving the stability of the molecular pump 172. By passing the gas guide tube 173 through the top of the workbench 10, with the top of the gas guide tube 173 located inside the vacuum tank 11 and above the molecular pump 172, the workbench 10 supports the gas guide tube 173, thereby connecting the gas guide tube 173 with the interior of the vacuum tank 11. By installing the electric gate valve 174 inside the workbench 10, positioning it between the molecular pump 172 and the gas guide pipe 173, and ensuring that the electric gate valve 174 is simultaneously in contact with both the output end of the molecular pump 172 and the gas guide pipe 173, the workbench 10 supports the electric gate valve 174. This allows the electric gate valve 174 to control the on / off connection between the gas guide pipe 173 and the molecular pump 172, enabling the molecular pump 172 to evacuate air from the vacuum tank 11 through the gas guide pipe 173, thus creating a vacuum state inside the vacuum tank 11. By installing the vacuum pump 175 outside the workbench 10 and connecting it to the vacuum tank 11, the vacuum pump 175 can extract air from the vacuum tank 11, achieving a predetermined vacuum level inside the vacuum tank 11, which then facilitates the extraction of air from the vacuum tank 11 by the molecular pump 172.

[0065] Using the above structure, firstly, the vacuum pump 175 is started to extract the air from the vacuum tank 11, so that the vacuum tank 11 reaches a predetermined vacuum level; then, the electric gate valve 174 is started to connect the molecular pump 172 to the gas delivery pipe 173; then, the molecular pump 172 is started to extract the air from the vacuum tank 11, so that the molecular pump 172 reaches the ultimate vacuum level, thereby enabling the sample microspheres to be coated in a high vacuum environment, thereby improving the user experience of the product.

[0066] In embodiments of the present invention, such as Figure 10 and Figure 12 As shown, the vacuum pumping mechanism 17 further includes: a shielding net 176, mounting posts 177, and a baffle 178; the shielding net 176 is located inside the vacuum tank 11 and is installed on the top of the air guide pipe 173; multiple mounting posts 177 are installed inside the vacuum tank 11 and are arranged around the outside of the air guide pipe 173; the baffle 178 is connected to multiple mounting posts 177 and is located above the air guide pipe 173.

[0067] By installing multiple mounting posts 177 inside the vacuum tank 11, with the posts 177 surrounding the outside of the gas guide tube 173, and connecting a baffle 178 to the posts 177 simultaneously and positioning the baffle 178 above the gas guide tube 173, the posts 177 support the baffle 178, thereby shielding the gas guide tube 173 from debris falling into it. This prevents debris from entering the molecular pump 172 and thus avoids damage to it. Furthermore, by installing a shielding net 176 on top of the gas guide tube 173, debris is prevented from entering the tube, further preventing damage to the molecular pump 172 and improving the user experience.

[0068] In embodiments of the present invention, such as Figure 6 As shown, the gas supply mechanism 16 includes: a gas supply frame 161, flow controllers 162, gas pipelines 163, and electromagnetic shut-off valves 164; the gas supply frame 161 is mounted on the workbench 10; three flow controllers 162 are mounted on the gas supply frame 161; one end of the gas pipeline 163 is connected to the output end of the three flow controllers 162, and the other end of the gas pipeline 163 is connected to the top of the quartz tube 13; three electromagnetic shut-off valves 164 are mounted on the gas supply frame 161, and the three electromagnetic shut-off valves 164 are respectively connected to the input end of the three flow controllers 162, and the three electromagnetic shut-off valves 164 are respectively connected to three gas sources.

[0069] By mounting the gas supply frame 161 on the workbench 10, mounting three flow controllers 162 on the gas supply frame 161, and mounting the solenoid shut-off valve 164 on the gas supply frame 161, the gas supply frame 161 supports the three flow controllers 162 and the three solenoid shut-off valves 164, thereby improving the stability of the three flow controllers 162 and the three solenoid shut-off valves 164. By connecting the three solenoid shut-off valves 164 to three gas sources respectively, and connecting the three solenoid shut-off valves 164 to the input terminals of the three flow controllers 162 respectively, the solenoid shut-off valves 164 can control whether the gas from the gas sources flows into the flow controllers. By connecting one end of the gas pipeline 163 to the output terminals of the three flow controllers 162 simultaneously, and connecting the other end of the gas pipeline 163 to the top of the quartz tube 13, the three flow controllers 162 can control the flow rate of the gas from the three gas sources into the gas pipeline 163 respectively, thereby improving the accuracy of the working gas flow control for sample microsphere coating, and thus improving the coating effect of the sample microspheres.

[0070] Specifically, the outer wall of the vacuum chamber 11 is provided with a sampling port to facilitate the replacement of sample microspheres by the operator. An operating door is rotatably connected to the vacuum chamber 11 and fits snugly against the sampling port, allowing the operating door to open or close the sampling port, thereby ensuring the vacuum of the vacuum chamber 11. One end of an operating rod is rotatably connected to the sampling port and passes through the operating door. A handwheel is fitted onto the outside of the operating rod and fits snugly against the operating door, allowing the operating door to be pressed tightly against the sampling port by turning the handwheel, thus improving the seal between the operating door and the sampling port.

[0071] In the description of this invention, the term "a plurality of" refers to two or more. Unless otherwise explicitly defined, the terms "upper," "lower," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. The terms "connection," "installation," "fixing," etc., should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection or an indirect connection through an intermediate medium. For those skilled in the art, the specific meaning of the above terms in this invention can be understood according to the specific circumstances.

[0072] In the description of this invention, the terms "one embodiment," "some embodiments," "specific embodiment," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of the invention. In this invention, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0073] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A thin film deposition apparatus, characterized in that, The thin film deposition apparatus includes: Workbench; A vacuum container, which is a hollow cavity with an opening at the top, is mounted on the workbench; A vacuum cover, which is fastened to the top of the vacuum container; A quartz tube is mounted on top of the vacuum cover and is connected to the vacuum container; An outer casing is mounted on top of the vacuum cover, and at least a portion of the quartz tube is located inside the outer casing. A coil assembly, which is installed inside the outer casing and wound around the outside of the quartz tube; A gas supply mechanism is installed on the workbench and is connected to the top of the quartz tube. A vacuum pump is installed inside the workbench and is connected to the vacuum tank. A sample stage mechanism is located inside the vacuum chamber and below the quartz tube; A striking mechanism is mounted on the worktable, passes through the vacuum tank, and is in contact with the sample stage mechanism; A lifting mechanism is installed inside the workbench and is connected to the sample stage mechanism; A first observation window is installed on the vacuum cover; A second observation window is installed on the vacuum cover and is located on one side of the first observation window; A first mounting bracket is mounted on the second observation window; The first mounting hole is elongated, and at least two of the first mounting holes are provided in the first mounting bracket. A camera assembly, the camera assembly being mounted on at least two of the first mounting holes, and the camera assembly being opposite to the second viewing window; A third observation window is installed on the vacuum cover; A cold light source, which is installed inside the third observation window; The lifting mechanism includes: A second mounting bracket is located inside the workbench and is mounted on the top of the workbench; A first motor frame is mounted on the bottom of a second mounting bracket; The first motor body is mounted on the first motor frame; A lead screw, the outer wall of which is provided with external threads, the lead screw is located in the second mounting bracket, and the lead screw is connected to the first motor body; A lifting plate, wherein a threaded hole is provided in the lifting plate and an internal thread is provided in the threaded hole, the lifting plate is located in the second mounting frame, and the lead screw passes through the threaded hole of the lifting plate; A support column is installed on the lifting plate, and the support column passes through the bottom of the worktable and the vacuum tank in sequence, and the support column is connected to the sample stage mechanism; Two optical bars are located inside the second mounting frame. One end of each optical bar is connected to the second mounting frame, and the other end of each optical bar is connected to the worktable. The two optical bars pass through the lifting plate and are located on both sides of the lead screw. The external thread is adapted to the internal thread, and the lead screw is located inside the support column; The sample stage mechanism includes: Mounting plate, which is located inside the vacuum tank and is connected to the support column; A support frame assembly, which is mounted on the mounting plate; The second motor body is installed inside the support frame assembly; The crucible body is located above the support frame assembly and is connected to the second motor body; A pad, the pad being mounted on one side wall of the support frame assembly; A striking plate, which is connected to the pad block and is opposite to the striking mechanism; The support frame assembly includes: A support frame body, which is mounted on the mounting plate; Support plates, two of which are respectively installed on both sides of the top of the support frame body; Positioning blocks, a plurality of the positioning blocks are disposed on the support plate, and there is a gap between two adjacent positioning blocks; A motor plate, the motor plate being located between the two support plates, and the second motor body being mounted on the bottom of the motor plate; Positioning protrusions, at least two of the positioning protrusions are respectively connected to both sides of the motor plate, at least two of the positioning protrusions are respectively placed on the two support plates, and the positioning protrusions are located between two adjacent positioning blocks. The positioning protrusions are placed between two different positioning blocks to adjust the relative position of the crucible body and the quartz tube. The handle is connected to the motor plate and is used to pick up the motor plate, the second motor body and the crucible body.

2. The thin film deposition apparatus according to claim 1, characterized in that, The lifting mechanism also includes: A switch mounting bracket, which is mounted on one side of the second mounting bracket; The second mounting hole is elongated and is located inside the switch mounting bracket. Two proximity switches are installed in the second mounting hole, with a gap between them, and the two proximity switches are electrically connected to the first motor body. A shield, the shield being L-shaped, is mounted on the lifting plate and is opposite to one of the proximity switches; A steel ruler, which is mounted on the other side of the second mounting bracket; A pointer is mounted on the lifting plate and is opposite to the steel ruler. The pointer and the shield are at the same height.

3. The thin film deposition apparatus according to claim 1, characterized in that, The striking mechanism includes: A third mounting bracket is mounted on the workbench and is located on one side of the vacuum tank; An electromagnet, wherein an iron core is provided inside the electromagnet, and the electromagnet is installed in the third mounting bracket; A striking rod, one end of which is connected to the iron core, and the other end of which passes through the side wall of the vacuum tank and is opposite to the striking plate; A guide sleeve is installed on the side wall of the vacuum tank and is arranged around the outside of the striking rod; An adjusting nut, which is fitted onto the outside of the striking rod; A spring is wound around the outside of the striking rod, one end of the spring is in contact with the guide sleeve, and the other end of the spring is in contact with the adjusting nut.

4. The thin film deposition apparatus according to claim 1, characterized in that, The air extraction mechanism includes: A fourth mounting bracket is installed inside the workbench; A molecular pump, which is mounted on the fourth mounting bracket; A gas delivery tube is installed inside the workbench, passes through the top of the workbench, has its top located inside the vacuum tank, and is positioned above the molecular pump. An electric gate valve is installed inside the workbench, located between the molecular pump and the gas delivery pipe, and simultaneously in contact with the output end of the molecular pump and the gas delivery pipe. A vacuum pump is installed on the outside of the workbench and is connected to the vacuum tank.

5. A thin film deposition apparatus according to claim 4, characterized in that, The air extraction mechanism also includes: A shielding net is located inside the vacuum tank and is installed on top of the gas guide pipe; Mounting columns, a plurality of said mounting columns are installed inside said vacuum tank, and the plurality of said mounting columns are arranged around the outside of said gas guide tube; A baffle is connected to multiple mounting posts and is located above the air duct.

6. A thin film deposition apparatus according to claim 1, characterized in that, The gas supply mechanism includes: An air supply frame is installed on the workbench; Flow controllers, three of which are mounted on the gas supply frame; A gas pipeline, one end of which is connected to the output terminals of the three flow controllers, and the other end of which is connected to the top of the quartz tube. Three electromagnetic shut-off valves are installed on the gas supply frame. The three electromagnetic shut-off valves are respectively connected to the input terminals of the three flow controllers and are respectively connected to the three gas sources.

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