Transpterygoid implant and its processing technology

By performing variable-distance multi-stage sandblasting and acid etching on the anchoring part of the zygomatic implant and electrochemical polishing on the extension part, the problems of poor bonding of the anchoring part and easy bacterial growth in the extension part were solved, achieving a highly stable implant design with low infection risk.

CN122253097APending Publication Date: 2026-06-23WEIHAI DUOPULE MEDICAL EQUIP CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
WEIHAI DUOPULE MEDICAL EQUIP CO LTD
Filing Date
2026-03-30
Publication Date
2026-06-23

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Abstract

The application relates to the technical field of dental implants, in particular to a trans-zygomatic implant and a processing technology thereof, and the processing technology comprises variable-distance multi-stage sand blasting and acid etching surface treatment on an anchoring part with threads of the trans-zygomatic implant and electrochemical polishing surface treatment on an extension part without threads. The trans-zygomatic implant is treated by variable-distance multi-stage sand blasting combined with acid etching, so that a uniform micron-level rough base and a multi-stage micropore structure can be formed on the titanium surface, osteoblast adhesion and differentiation are facilitated, the early bone combination speed is accelerated, the combination strength is improved, the early implant loosening risk is reduced, the extension part of the trans-zygomatic implant is treated by electrochemical polishing, a smooth surface can be obtained, plaque adhesion and bacterial colonization are greatly reduced, the implant peri-implantitis risk is reduced, and soft tissue adhesion is promoted; the dual optimization of bone anchoring and tissue adhesion is realized, and the long-term function and health of the trans-zygomatic implant under complex stress are guaranteed.
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Description

Technical Field

[0001] This invention relates to the field of dental implant technology, and in particular to a transzygomatic implant and its processing technology. Background Technology

[0002] Dental implant technology is now very mature. The core process involves implanting an artificial tooth root into the alveolar bone, using osseointegration to replace the missing tooth root, and then installing a crown to restore chewing function. However, for patients with severe maxillary bone atrophy, it is necessary to avoid the atrophied maxilla and utilize the strong zygomatic bone of the face as a new implant support point, providing a stable mechanical support for the entire row of maxillary teeth—this is known as perzygomatic implantation. Perzygomatic implants differ from traditional root implants. They enter through the alveolar ridge crest, not relying on the thin remaining alveolar bone, but directly through the maxillary sinus, ultimately anchoring in the zygomatic body, achieving a restorative effect very similar to that of natural teeth in terms of function, structure, and aesthetics. Due to the overall length of the perzygomatic implant, it has both an anchoring portion that contacts the zygomatic bone and an extension portion that contacts the periodontal tissues inside the oral cavity, thus distinguishing perzygomatic implants and their processing methods from traditional root implants.

[0003] Chinese Patent Publication No. CN107349022A discloses an acid etching process for creating small pores on implants. Its technical feature is that the implant surface is roughened by sandblasting, and then tiny pores are created through acid etching to promote implant-bone integration. However, for transzygomatic implants that need to be anchored in the bone and pass through a long area of ​​periodontal tissue, the surface roughness of each part should correspond to its functional location. The anchoring part in contact with the zygomatic bone requires a rougher surface design to ensure a tighter bond with the bone, thus withstanding the significant lever pressure from the long neck and preventing implant loosening due to prolonged vigorous chewing. The extension portion passing through periodontal tissue requires a smoother surface design to facilitate the growth of surrounding cells, forming a tight envelope and reducing bacterial growth. Summary of the Invention

[0004] To address these issues, the present invention provides a transzygomatic implant and its processing technology, which solves the problems of existing transzygomatic implant technologies having poor contact and integration with the bone in the anchoring part, making it difficult to withstand greater pressure, and poor encapsulation with periodontal tissue in the extension part, making it prone to bacterial growth.

[0005] To achieve the above objectives, the present invention provides a processing method for transzygomatic implants, comprising, The raw titanium rod is machined to form implant parts, and the surface oil is removed by steam cleaning. The implant processing parts are fixed by the implant tooling and the extension is covered. The anchoring part is then subjected to variable-distance multi-stage sandblasting. The anchoring part of the implant processing part that has undergone variable pitch multi-stage sandblasting is acid-etched, and the anchoring part is sealed and protected by protective tooling after acid etching. The protective tooling, along with its internal sealing and shielding anchoring part, is fixed, and the extension part is electrochemically polished. Remove the protective fixture from the anchoring part, clean it, seal and sterilize it to complete the surface processing of the zygomatic implant; Among them, variable-pitch multi-stage sandblasting includes primary sandblasting and secondary sandblasting. The primary sandblasting distance is higher than the secondary sandblasting distance. Roughness Ra is detected after primary sandblasting, and roughness Rz is detected after secondary sandblasting.

[0006] Furthermore, the variable-pitch multi-stage sandblasting process performed on the anchoring part includes, Configure the mixed abrasive and set the blasting pressure; The anchoring part is sandblasted at a preset first-level sandblasting distance; The roughness Ra of the anchoring part after the first stage of sandblasting is tested, and the preset second stage sandblasting distance is adjusted based on the test results. The anchoring part is subjected to secondary sandblasting at a preset secondary sandblasting distance; The roughness Rz of the anchoring part after the second-stage sandblasting is tested, and the third-stage sandblasting is determined based on the test results. The anchoring part is subjected to tertiary sandblasting at the corrected secondary sandblasting distance, and the roughness Rz is tested and the determination of whether to perform tertiary sandblasting is carried out until the test results reach the standard range.

[0007] Furthermore, the mixed abrasive is a mixture of coarse and fine abrasives of the same type, with a weight ratio of fine abrasive to coarse abrasive of 17:3.

[0008] Furthermore, a primary roughness standard range is set in the roughness Ra detection and judgment process. If the primary roughness Ra is within the primary roughness standard range, then proceed directly to the secondary sandblasting treatment; If the primary roughness Ra is not within the primary roughness standard range, the preset secondary sandblasting distance is adjusted according to the primary roughness Ra, and then secondary sandblasting is performed with the adjusted secondary sandblasting distance. Specifically, when the primary roughness Ra is lower than the primary roughness standard range, the adjusted secondary sandblasting distance is reduced, and when the primary roughness Ra is higher than the primary roughness standard range, the adjusted secondary sandblasting distance is increased.

[0009] Furthermore, if the primary roughness Ra is not within the primary roughness standard range, the primary blasting distance will be corrected based on the primary roughness Ra. When the primary roughness Ra is lower than the primary roughness standard range, the corrected primary blasting distance will be reduced; when the primary roughness Ra is higher than the primary roughness standard range, the corrected primary blasting distance will be increased.

[0010] Furthermore, the preset first-stage sandblasting distance is in the range of 220-250mm, and the preset second-stage sandblasting distance is in the range of 100-120mm. Both the first-stage and second-stage sandblasting distances are set with adjustable ranges. If the adjustment correction value exceeds the adjustable range, the boundary value of the adjustable range will be used. The adjustable range of the first-stage sandblasting distance is 180-280mm, and the adjustable range of the second-stage sandblasting distance is 80-140mm.

[0011] Furthermore, a two-level roughness standard range is set in the roughness Rz detection and judgment process. If the secondary roughness Rz is within the standard range of the secondary roughness, then the variable pitch multi-stage sandblasting process is considered complete. If the secondary roughness Rz is not within the standard range of the secondary roughness, the secondary blasting distance is corrected according to the secondary roughness Rz, and the tertiary blasting is performed with the corrected secondary blasting distance. Specifically, when the secondary roughness Rz is lower than the standard range of the secondary roughness, the secondary blasting distance is reduced, and when the secondary roughness Rz is higher than the standard range of the secondary roughness, the secondary blasting distance is increased.

[0012] Furthermore, the acid etching treatment of the anchoring portion of the implant includes, The anchoring part of the implant was ultrasonically cleaned with acetone solution for 10 minutes and ultrasonically cleaned with ethanol solution for 10 minutes. The anchoring part of the implant was rinsed with deionized water and then dried with nitrogen. The anchoring part of the implant is acid-etched with an acid etching solution at a temperature of 60°C for 10-20 minutes to create a micron-level pitted rough surface on the anchoring part of the implant.

[0013] Furthermore, the electrochemical polishing treatment of the extension portion of the implant includes, An electrolyte solution was prepared using a volume ratio of 55% ethylene glycol, 25% lactic acid, 8% perchloric acid, and 12% anhydrous ethanol. The extension of the implant is immersed in an electrolyte for electrochemical polishing. The voltage is controlled at 18-22V, the electrolyte temperature is controlled at 5-15℃, and the electrolysis time is 3-6 minutes. The cathode material is made of 316 stainless steel plate, the anode clamp is made of grade 4 pure titanium TA4G material, and the electrolyte is stirred by air. The implant parts were neutralized with an alkaline solution and then ultrasonically cleaned with deionized water for 5 minutes.

[0014] The present invention also provides a zygomatic implant processed by the above-mentioned zygomatic implant processing technology, comprising a threaded anchoring part and a threadless extension part, wherein the anchoring part is subjected to variable pitch multi-stage sandblasting and acid etching surface treatment, and the extension part is subjected to electrochemical polishing surface treatment.

[0015] Compared with the prior art, the beneficial effects of the present invention are as follows: targeting the osseointegration characteristics of the anchoring part of the zygomatic implant, variable-pitch multi-stage sandblasting is used to form a uniform and stable micron-level rough substrate on the surface of the titanium matrix. Then, acid etching treatment is used to further optimize the surface morphology, remove the contamination layer and form a multi-level microporous structure, which significantly improves the surface energy and biohydrophilicity, and is more conducive to osteoblast adhesion, spreading and differentiation. It can significantly accelerate the early osseointegration speed, improve the osseointegration strength, and reduce the risk of early implant loosening. It is especially suitable for long and high-stress zygomatic implants.

[0016] For the tissue contact characteristics of the zygomatic implant extension, electrochemical polishing is employed to obtain a uniform and dense passivated surface. This effectively removes microscopic scratches, burrs, and smears left from machining, significantly reducing surface roughness and creating a smooth interface with high cleanliness and biocompatibility. The smooth electrochemically polished surface greatly reduces plaque adhesion, soft deposits, and bacterial colonization, lowering the risk of periodontal inflammation and peri-implantitis, and facilitating soft tissue fit. Simultaneously, electrochemical polishing does not alter the dimensional accuracy or mechanical properties of the implant, resulting in enhanced surface corrosion resistance, clinical comfort, and ease of cleaning and maintenance. Balancing aesthetics and functionality, it provides a reliable guarantee for the long-term stable use of implant restorations. Attached Figure Description

[0017] Figure 1 This is a flowchart of the processing technology for the zygomatic implant in this embodiment; Figure 2 This is a flowchart of the variable-pitch multi-stage sandblasting process in this embodiment; Figure 3 This is a schematic diagram of the zygomatic implant structure in this embodiment.

[0018] Reference numerals: 1. Anchoring part, 2. Extension part, 3. Neck. Detailed Implementation

[0019] To make the objectives and advantages of the present invention clearer, the present invention will be further described below with reference to embodiments; it should be understood that the specific embodiments described herein are merely for explaining the present invention and are not intended to limit the present invention.

[0020] Preferred embodiments of the present invention will now be described with reference to the accompanying drawings. Those skilled in the art should understand that these embodiments are merely illustrative of the technical principles of the present invention and are not intended to limit the scope of protection of the present invention.

[0021] It should be noted that in the description of this invention, the terms "upper", "lower", "left", "right", "inner", "outer", etc., which indicate directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings. This is only for the convenience of description and is not intended to indicate or imply that the device or element must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation of this invention.

[0022] Furthermore, it should be noted that, in the description of this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0023] Please see Figures 1 to 2 As shown, this embodiment provides a processing technology for a transzygomatic implant, including: Step S1: The raw material titanium rod is fed into the implant processing equipment for mechanical processing to form an implant part, and the surface oil of the implant part is removed by steam cleaning. The raw material titanium rod is selected as Grade 4 pure titanium TA4G. The machined implant components include a threaded anchoring part and a non-threaded extension part.

[0024] Step S2: Fix the implant processing part with the implant tooling, cover the extension of the implant processing part, and perform variable-distance multi-stage sandblasting on the anchoring part of the implant processing part. Variable pitch multi-stage sandblasting includes, Step S21: Configure the mixed abrasive and set the sandblasting pressure. Mix 85% fine abrasive and 15% coarse abrasive by weight to form a mixed abrasive. In this embodiment, 120-mesh white corundum is selected as the fine abrasive and 46-mesh white corundum is selected as the coarse abrasive. The sandblasting pressure is set to 0.5 MPa. Step S22, primary sandblasting: the anchoring part of the implant is fully covered and sandblasted at a uniform speed at a preset primary sandblasting distance. Step S23, Level 1 Inspection: Perform roughness Ra inspection on the anchoring part of the implant after Level 1 sandblasting to obtain the Level 1 roughness Ra. Determine the Level 1 roughness Ra according to the Level 1 roughness standard range. If the primary roughness Ra is within the primary roughness standard range, then proceed directly to the secondary sandblasting treatment; If the primary roughness Ra is not within the primary roughness standard range, the secondary sandblasting distance is adjusted according to the primary roughness Ra, and then the secondary sandblasting treatment is performed with the adjusted secondary sandblasting distance. The primary sandblasting distance is then corrected according to the primary roughness Ra to ensure the accurate processing of the next batch of implant parts. The adjustment and correction methods for the primary sandblasting distance and the secondary sandblasting distance are the same, that is, L1a=L1+[L1×W1×(Ra1-Ras) / Ras]; L2a=L2+[L2×W2×(Ra1-Ras) / Ras]; In the formula, L1 is the preset first-level sandblasting distance, L1a is the adjusted first-level sandblasting distance, L2 is the preset second-level sandblasting distance, L2a is the adjusted second-level sandblasting distance, Ra1 is the measured value of the first-level roughness Ra of the anchoring part of the implant processing part, Ras is the median value of the first-level roughness standard range, W1 is the first-level sandblasting adjustment coefficient, which is 0.15 in this embodiment, and W2 is the second-level sandblasting adjustment coefficient, which is 0.45 in this embodiment.

[0025] In this embodiment, the Ra value of the first-level roughness standard range is 3-5μm, the preset first-level sandblasting distance is 220-250mm, and in step S23, an adjustable range of 180-280mm for the first-level sandblasting distance is also set. When correcting and adjusting the first-level sandblasting distance, it cannot exceed the adjustable range. If it exceeds the adjustable range, the boundary value of the adjustable range shall be followed.

[0026] Step S24, secondary sandblasting, the anchoring part of the implant processing part is fully covered by sandblasting at a preset secondary sandblasting distance; Step S25, Secondary Inspection: The roughness Rz of the anchoring part of the implant after secondary sandblasting is measured to obtain the secondary roughness Rz. The secondary roughness Rz is then judged according to the standard range of secondary roughness. If the secondary roughness Rz is within the secondary roughness standard range, then the variable pitch multi-stage sandblasting process is completed, and step S3 is executed; If the secondary roughness Rz is not within the secondary roughness standard range, the secondary sandblasting distance is corrected according to the secondary roughness Rz to ensure the accurate processing of the next batch of implant parts; at the same time, the tertiary sandblasting is performed with the corrected secondary sandblasting distance. The adjustment method for secondary sandblasting is as follows: L2c=L2+[L2×W2×(Rz2-Rzs) / Rzs]; In the formula, L2 is the preset secondary sandblasting distance, L2c is the adjusted secondary sandblasting distance in the secondary test, Rz2 is the measured value of the secondary roughness Rz of the anchoring part of the implant, and Rzs is the median value of the standard range of secondary roughness. In this embodiment, the Rz value of the secondary roughness standard range is 18-30μm, the preset secondary sandblasting distance is 100-120mm, and the adjustable range of the secondary sandblasting distance is 80-140mm. If the distance exceeds the adjustable range, the boundary value of the adjustable range shall be used.

[0027] Step S26, third-level sandblasting: the anchoring part of the implant is fully covered by sandblasting at the corrected second-level sandblasting distance, and the second-level inspection in step S25 is repeated until the second-level roughness Rz reaches the second-level roughness standard range.

[0028] In step S2 of this embodiment, the roughness of the anchoring part of the implant can be precisely controlled by variable-pitch multi-stage sandblasting without changing the sandblasting pressure or replacing the abrasive. The surface roughness Ra value of the anchoring part of the implant is controlled by the first-stage sandblasting at a long distance, and the surface roughness Rz value of the anchoring part of the implant is increased by the second-stage sandblasting, so that the surface of the anchoring part of the implant is flat and has uniform deep pit anchor points, which is conducive to the bone integration of the anchoring part.

[0029] Step S3: Acid etching is performed on the anchoring part of the implant after the variable pitch multi-stage sandblasting process, and the anchoring part of the implant after acid etching is cleaned and dried. After cleaning and drying, the anchoring part is sealed and protected by protective tooling. Acid etching includes, Step S31, ultrasonic cleaning: The anchoring part of the implant is ultrasonically cleaned with acetone solution for 10 minutes and ultrasonically cleaned with ethanol solution for 10 minutes. Step S32: Rinse the anchoring part of the implant with deionized water and dry the anchoring part of the implant with nitrogen. Step S33: The anchoring part of the implant is acid-etched with acid etching solution. The temperature of the acid etching solution is set to 60°C and the etching time is 10-20 minutes to form a micron-level pitted rough surface on the anchoring part of the implant. In this embodiment, the etching solution is H2SO4:HCl = 1:1 (volume ratio).

[0030] Step S4: Fix the protective fixture together with its internal sealing and shielding anchoring part, and perform electrochemical polishing on the extension part of the implant processing part. Electrochemical polishing treatment includes, Step S41: Prepare the electrolyte by volume ratio of 55% ethylene glycol, 25% lactic acid, 8% perchloric acid, and 12% anhydrous ethanol. Step S42: Immerse the extension of the implant processing part in the electrolyte for electrochemical polishing. The voltage is controlled at 18-22V, the electrolyte temperature is controlled at 5-15℃, and the electrolysis time is 3-6min. In this embodiment, the cathode material is 316 stainless steel plate, the anode clamp is made of grade 4 pure titanium TA4G material, and the electrolyte is stirred with air. Step S43: Neutralize the implant processing parts with an alkaline solution and ultrasonically clean the implant processing parts with deionized water for 5 minutes.

[0031] Step S5: Remove the protective fixture from the anchoring part of the implant processing component, clean the implant processing component, and seal and sterilize it to complete the processing of the zygomatic implant.

[0032] Step S51: Use ultrapure water for ultrasonic cleaning for 10-15 minutes, then change the water and ultrasonic cleaning for 5 minutes. Step S52: Dehydrate with ethanol for 5 minutes and then dry with nitrogen gas; Step S53: After heat sealing with a medical bag, perform high-pressure steam sterilization for 10-20 minutes.

[0033] Please continue reading. Figure 3 As shown, this embodiment also provides a zygomatic implant manufactured by the above-mentioned processing technology, including a threaded anchoring part 1 and an unthreaded extension part 2. The anchoring part 1 is subjected to variable-pitch multi-stage sandblasting and acid etching surface treatment, and the extension part 2 is subjected to electrochemical polishing surface treatment. In this embodiment, the end of the extension part 2 is also provided with a neck 3 for connecting each implant component. The surface processing method of the neck 3 is the same as that of the extension part 2.

[0034] In this embodiment, the zygomatic implant employs different treatment schemes for the functionality of each part. For the osseointegration characteristics of the anchoring part of the zygomatic implant, variable-distance multi-stage sandblasting is used to form a uniform and stable micron-level rough substrate on the titanium matrix surface. Acid etching is then used to further optimize the surface morphology, remove the contamination layer, and form a multi-level microporous structure, which significantly improves the surface energy and biohydrophilicity, making it more conducive to osteoblast adhesion, spreading, and differentiation. This can significantly accelerate the early osseointegration speed, improve the osseointegration strength, and reduce the risk of early implant loosening, which is especially suitable for long-length, high-stress zygomatic implants. For the tissue contact characteristics of the zygomatic implant extension, electrochemical polishing is employed to obtain a uniform and dense passivated surface. This effectively removes microscopic scratches, burrs, and smears left from machining, significantly reducing surface roughness and creating a smooth interface with high cleanliness and biocompatibility. The smooth electrochemically polished surface greatly reduces plaque adhesion, soft deposits, and bacterial colonization, lowering the risk of periodontal inflammation and peri-implantitis, and facilitating soft tissue fit. Simultaneously, electrochemical polishing does not alter the dimensional accuracy or mechanical properties of the implant, resulting in enhanced surface corrosion resistance, clinical comfort, and ease of cleaning and maintenance. Balancing aesthetics and functionality, it provides a reliable guarantee for the long-term stable use of implant restorations.

[0035] The technical solution of the present invention has been described above with reference to the preferred embodiments shown in the accompanying drawings. However, it will be readily understood by those skilled in the art that the scope of protection of the present invention is obviously not limited to these specific embodiments. Without departing from the principles of the present invention, those skilled in the art can make equivalent changes or substitutions to the relevant technical features, and the technical solutions after these changes or substitutions will all fall within the scope of protection of the present invention.

[0036] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A processing method for a transzygomatic implant, characterized in that, include, The raw titanium rod is machined to form implant parts, and the surface oil is removed by steam cleaning. The implant processing part is fixed by the implant tooling and the extension is covered, and the anchoring part is subjected to variable distance multi-stage sandblasting. The anchoring part of the implant processing part after the variable pitch multi-stage sandblasting is subjected to acid etching treatment, and the anchoring part is sealed and protected by protective tooling after acid etching treatment. The protective tooling, together with its internal sealing and shielding anchoring part, is fixed, and the extension part is subjected to electrochemical polishing treatment; Remove the protective tooling from the anchoring part, clean it, seal and sterilize it to complete the surface processing of the zygomatic implant; The variable-pitch multi-stage sandblasting includes primary sandblasting and secondary sandblasting. The primary sandblasting distance is higher than the secondary sandblasting distance. Roughness Ra is detected after primary sandblasting, and roughness Rz is detected after secondary sandblasting.

2. The processing technology of the zygomatic implant according to claim 1, characterized in that, The variable-pitch multi-stage sandblasting process for the anchoring part includes, Configure the mixed abrasive and set the blasting pressure; The anchoring part is sandblasted at a preset first-level sandblasting distance; The roughness Ra of the anchoring part after the first stage of sandblasting is tested, and the preset second stage sandblasting distance is adjusted based on the test results. The anchoring part is subjected to secondary sandblasting at a preset secondary sandblasting distance; The roughness Rz of the anchoring part after the second-stage sandblasting is tested, and the third-stage sandblasting is determined based on the test results. The anchoring part is subjected to tertiary sandblasting at the corrected secondary sandblasting distance, and the roughness Rz is tested and the determination of whether to perform tertiary sandblasting is carried out until the test results reach the standard range.

3. The processing technology of the zygomatic implant according to claim 2, characterized in that, The mixed abrasive is a mixture of coarse and fine abrasives of the same type, with a weight ratio of fine abrasive to coarse abrasive of 17:

3.

4. The processing technology of the zygomatic implant according to claim 2, characterized in that, A primary roughness standard range is set in the roughness Ra test and judgment. If the primary roughness Ra is within the primary roughness standard range, then proceed directly to the secondary sandblasting treatment; If the primary roughness Ra is not within the primary roughness standard range, the preset secondary sandblasting distance is adjusted according to the primary roughness Ra, and then secondary sandblasting is performed with the adjusted secondary sandblasting distance. Specifically, when the primary roughness Ra is lower than the primary roughness standard range, the adjusted secondary sandblasting distance is reduced, and when the primary roughness Ra is higher than the primary roughness standard range, the adjusted secondary sandblasting distance is increased.

5. The processing technology of the zygomatic implant according to claim 4, characterized in that, If the primary roughness Ra is not within the primary roughness standard range, the primary blasting distance will be corrected based on the primary roughness Ra. When the primary roughness Ra is lower than the primary roughness standard range, the corrected primary blasting distance will be reduced. When the primary roughness Ra is higher than the primary roughness standard range, the corrected primary blasting distance will be increased.

6. The processing technology of the zygomatic implant according to claim 5, characterized in that, The preset first-stage sandblasting distance is in the range of 220-250mm, and the preset second-stage sandblasting distance is in the range of 100-120mm. Both the first-stage and second-stage sandblasting distances are set with adjustable ranges. If the adjustment correction value exceeds the adjustable range, the boundary value of the adjustable range will be used. The adjustable range of the first-stage sandblasting distance is 180-280mm, and the adjustable range of the second-stage sandblasting distance is 80-140mm.

7. The processing technology of the zygomatic implant according to claim 2, characterized in that, A two-level roughness standard range is set in the roughness Rz detection and judgment. If the secondary roughness Rz is within the standard range of the secondary roughness, then the variable pitch multi-stage sandblasting process is considered complete. If the secondary roughness Rz is not within the standard range of the secondary roughness, the secondary blasting distance is corrected according to the secondary roughness Rz, and the tertiary blasting is performed with the corrected secondary blasting distance. Specifically, when the secondary roughness Rz is lower than the standard range of the secondary roughness, the secondary blasting distance is reduced, and when the secondary roughness Rz is higher than the standard range of the secondary roughness, the secondary blasting distance is increased.

8. The processing technology of the zygomatic implant according to claim 1, characterized in that, Acid etching treatment of the anchoring portion of the implant includes... The anchoring part of the implant was ultrasonically cleaned with acetone solution for 10 minutes and ultrasonically cleaned with ethanol solution for 10 minutes. The anchoring part of the implant was rinsed with deionized water and then dried with nitrogen. The anchoring part of the implant is acid-etched with an acid etching solution at a temperature of 60°C for 10-20 minutes to create a micron-level pitted rough surface on the anchoring part of the implant.

9. The processing technology of the zygomatic implant according to claim 1, characterized in that, Electrochemical polishing of the extension portion of the implant includes, An electrolyte solution was prepared using a volume ratio of 55% ethylene glycol, 25% lactic acid, 8% perchloric acid, and 12% anhydrous ethanol. The extension of the implant is immersed in an electrolyte for electrochemical polishing. The voltage is controlled at 18-22V, the electrolyte temperature is controlled at 5-15℃, and the electrolysis time is 3-6 minutes. The cathode material is made of 316 stainless steel plate, the anode clamp is made of grade 4 pure titanium TA4G material, and the electrolyte is stirred by air. The implant parts were neutralized with an alkaline solution and then ultrasonically cleaned with deionized water for 5 minutes.

10. A zygomatic implant manufactured using the processing technique for zygomatic implants according to any one of claims 1-9, characterized in that, It includes a threaded anchoring part and a threadless extension part, wherein the anchoring part is subjected to variable-pitch multi-stage sandblasting and acid etching surface treatment, and the extension part is subjected to electrochemical polishing surface treatment.

Citation Information

Patent Citations

  • Acid etching technology for forming small holes on implant

    CN107349022A