A method for manufacturing an interlayer gradient transition layer of thermal barrier coating by EB-PVD

Abstract

This invention belongs to the field of thermal barrier coating (EB-PVD) technology, and relates to a method for preparing an interlayer gradient transition layer in EB-PVD. The invention first deposits MCrAlY metallic material, followed by the deposition of YSZ, rare earth zirconates, and high-entropy ceramic materials, combining physical vapor deposition (PVD) and ion beam bombardment. Simultaneously, high-energy ion bombardment of the deposition surface further enhances the deposition rate. A YSZ gradient structure transition layer is deposited on the surface of the metal binder layer, and a gradient element transition layer is deposited at the interface between the YSZ layer and the rare earth zirconate or high-entropy ceramic layer. The ion-assisted deposition process can improve the deposition rate of the EB-PVD process, accurately control the coating composition, reduce the preheating temperature, decrease interlayer residual stress during coating preparation and thermal cycling, further improve the bonding strength of the thermal barrier coating, and ultimately extend the service life of the coating.

Description

Technical Field

[0001] This invention belongs to the field of thermal barrier coating technology and relates to a method for preparing an interlayer gradient transition layer EB-PVD in thermal barrier coating. Background Technology

[0002] Thermal barrier coatings (TBCs) can effectively improve the temperature resistance of turbine blades, thereby increasing engine thrust and efficiency. TBCs mainly consist of two parts: a metal binder layer and a ceramic surface layer. The metal binder layer has excellent oxidation resistance and serves to connect the substrate and the ceramic surface layer; currently, NiPtAl and MCrAlY systems are the primary materials. The ceramic surface layer has excellent thermal insulation capabilities and acts as the insulation layer of the TBC; a classic ceramic surface layer material is yttrium-stabilized zirconia (YSZ) ceramic.

[0003] Currently, the main technologies for preparing thermal barrier coating ceramic surfaces include atmospheric plasma spraying (APS) and electron beam physical vapor deposition (EB-PVD). Thermal barrier coatings prepared by atmospheric plasma spraying have a layered structure and good thermal insulation performance, but their strain tolerance is poor. During the service of engine turbine rotor blades, due to the high temperature and high speed service conditions, the large deformation of the substrate causes large thermal stress to be generated between the substrate and the thermal barrier coating. The layered thermal barrier coating prepared by atmospheric plasma spraying will peel off and fail due to thermal stress.

[0004] Thermal barrier coatings prepared by EB-PVD process possess a unique columnar crystal structure with a large strain tolerance. During substrate deformation, the columnar crystal structure can alleviate thermal stress between the coating and the substrate, effectively extending the coating's service life. However, due to the interface between the vertically aligned columnar crystal structure and the metal bonding layer, and the performance differences between the two ceramic layers, stress concentration occurs during thermal cycling, significantly reducing the coating's service life. Therefore, the study of thermal barrier coating materials has become a key issue in the development of aero-engines. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a method for preparing an EB-PVD gradient transition layer between thermal barrier coatings. The purpose is to solve the problem of insufficient service life of thermal barrier coatings by depositing a YSZ gradient structure transition layer on the surface of the metal bonding layer and depositing a gradient element transition layer at the interface between the YSZ layer and the rare earth zirconate or high entropy ceramic layer, thereby improving the high strain tolerance of the thermal barrier coating interface and providing excellent thermal shock resistance.

[0006] The technical solution of this invention is: A method for preparing an interlayer gradient transition layer (EB-PVD) of a thermal barrier coating includes the following steps: Step 1: Perform water blowing, washing, soaking, and drying on the substrate surface. The substrate surface is sandblasted with water, then rinsed with tap water, followed by ultrasonic cleaning, soaking in deionized water and organic solvents, and then dried. Step 2: Prepare a metal bonding layer on the substrate surface to obtain a sample. The preparation process can be one of chemical vapor deposition, plasma spraying, or vacuum arc plating. Step 3, target loading: Select a ceramic target and load it into the crucible of the deposition chamber of the electron beam physical vapor deposition equipment. Lay the corresponding ceramic target in and around the crucible. The target can be high-entropy ceramic, medium-entropy ceramic or commercial YSZ, etc. Step 4, Preparation of Coating and Interlayer Gradient Transition Layer: The target material is heated and evaporated using an electron beam gun in an electron beam physical vapor deposition (EPV) system. After the vacuum level stabilizes, the target material is evaporated using ion beam-assisted EPV, with the appropriate beam current intensity selected to ensure simultaneous evaporation of all elements in the target material. This process yields the corresponding interlayer gradient transition layer and ceramic coating on the rotating sample. The deposition process parameters are selected as follows: The substrate temperature is 900-1000℃, such as 950±5℃, 950±10℃, 950±15℃, 950±20℃, 950±25℃, 950±30℃, 950±35℃, 950±40℃, 950±45℃; the high-entropy ceramic evaporation gun beam current intensity is 1.60-1.80A, such as 1.70±0.02A, 1.70±0.04A, 1.70±0.06A, 1.70±0.08A; the medium-entropy metal evaporation gun beam current... The intensity is 1.40-1.60A, such as 1.50±0.02A, 1.50±0.04A, 1.50±0.06A, or 1.50±0.08A; the beam intensity of the YSZ target is 1.50-1.70A, such as 1.60±0.02A, 1.60±0.04A, 1.60±0.06A, or 1.60±0.08A; it should be understood that the above values ​​include, but are not limited to, the listed values, and any other value points within the range are also applicable.

[0007] There are two types of coating layer gradient transition layer preparation: one is to deposit a YSZ gradient structure transition layer on the surface of the metal bonding layer, and the other is to deposit a gradient structure transition layer between a YSZ layer and a rare earth zirconate or between a YSZ layer and a high-entropy ceramic layer. A YSZ gradient structure transition layer is deposited on the surface of the metal bonding layer. The process involves a YSZ target beam current intensity of 1.80-2.00 A, such as 1.90±0.02 A, 1.90±0.04 A, 1.90±0.06 A, or 1.90±0.08 A; a substrate temperature of 950-1050℃, such as 1000±5℃, 1000±10℃, 1000±15℃, 1000±20℃, 1000±25℃, 1000±30℃, 1000±35℃, 1000±40℃, or 1000±45℃; and an evaporation time of 3-5 min. It should be understood that the above values ​​include, but are not limited to, the listed values, and any other values ​​within the range are also applicable.

[0008] A gradient transition layer is deposited at the interface between the YSZ layer and the rare-earth zirconate or high-entropy ceramic layer: the process involves a high-entropy ceramic evaporator current intensity of 2.00-2.20 A, such as 2.10±0.02 A, 2.10±0.04 A, 2.10±0.06 A, or 2.10±0.08 A; and a rare-earth zirconate evaporator current intensity of 1.70-2.00 A, such as 1.85±0.02 A, 1.85±0.04 A, 1.85±0.06 A, 1.85±0.08 A, or 1.80 A. 5±0.10A, 1.85±0.12A, 1.85±0.13A; substrate temperature 950-1050℃, or 1000±5℃, 1000±10℃, 1000±15℃, 1000±20℃, 1000±25℃, 1000±30℃, 1000±35℃, 1000±40℃, 1000±45℃; evaporation time 3-5min; it should be understood that the above values ​​include, but are not limited to, the listed values, and any other value points within the range are equally applicable.

[0009] Step 5: After cooling to room temperature, open the vacuum chamber to prepare a thermal barrier coating with a gradient structure transition layer on the sample.

[0010] In step three, the ceramic target material is laid in and around the crucible in an area that is 10-30 mm above the crucible diameter and 10-30 mm in height. This ensures that the target material is evenly covered after melting, and the evaporation stability is easier to control.

[0011] In step four, the ion beam-assisted energy is between 100 and 500 eV, such as: 300±20 eV, 300±40 eV, 300±50 eV, 300±60 eV, 300±80 eV, 300±100 eV, 300±120 eV, 300±140 eV, 300±150 eV, 300±160 eV, and 300±180 eV. It should be understood that the above values ​​include, but are not limited to, the listed values; any other values ​​within the range are also applicable.

[0012] In step four, the vacuum level of the electron beam physical vapor deposition equipment is <5×10⁻⁶. -4 mbar.

[0013] Preferably, in step one, the water blowing pressure is 0.15-0.25 MPa; the blowing time is 15-30 min; and the sand particle size is 120-200 mesh.

[0014] Preferably, after water blowing in step one, the substrate surface is rinsed with tap water for 15-30 minutes.

[0015] Preferably, after water blowing in step one, the substrate is immersed in 8-15% water-based cleaning agent and ultrasonically cleaned for 5-20 minutes.

[0016] Preferably, after water blowing in step one, the substrate is immersed in deionized water for 20-40 minutes.

[0017] Preferably, in step one, the cleaning and drying process involves immersing the substrate in an organic solvent for 20-40 minutes. The organic solvent is ethanol of analytical grade.

[0018] Preferably, the substrate is dried at a temperature of 60°C to 100°C for 20 to 40 minutes.

[0019] The chemical vapor deposition in step two prepares a NiPtAl metal bonding layer; the plasma spraying and vacuum arc plating prepare an MCrAlY metal bonding layer.

[0020] The chemical vapor deposition temperature is 950-1100℃, the deposition pressure is 100-400 mbar, and the deposition time is 240-300 min. The chemical vapor deposition flow rate is 5-20 L / min.

[0021] The plasma spraying distance is controlled at 50-100mm, the spraying power at 20-60kW, the Ar gas flow rate at 30-50L / min, the N2 flow rate at 10-20L / min, and the powder feed rate at 20-30g / min. The spraying time is 15-30min.

[0022] The vacuum arc plating voltage is 600-650V, the current is 15-20A, and the deposition time is 150-200min; the substrate bias voltage is 10-30V, and the vacuum degree is <1×10⁻⁶. -2 Pa.

[0023] In step four, the vacuum level of the electron beam physical vapor deposition equipment is <5×10⁻⁶. -4 mbar.

[0024] The matrix composition is a nickel-based single-crystal high-temperature alloy.

[0025] Preferably, in step four, the preparation process of the interlayer gradient transition layer requires the introduction of a guide gas consisting of a mixture of Ar and O2, with a flow rate ratio of 1:2. In addition, O2 is introduced during the coating preparation process at a flow rate of 20-50 ccm.

[0026] The beneficial effects of this invention are: This invention presents an EB-PVD method for preparing an interlayer gradient transition layer in thermal barrier coatings. By depositing a YSZ gradient structure transition layer on the surface of a metal binder layer, the structure of the metal binder layer gradually transitions to the columnar crystalline structure of the ceramic surface layer, which can greatly alleviate the accumulation and release of thermal stress during thermal cycling. In addition, a gradient element transition layer is deposited at the interface between the YSZ layer and the rare earth zirconate or high entropy ceramic layer, allowing the YSZ elements to gradually transition to the rare earth zirconate or high entropy ceramic layer. This further alleviates the accumulation and release of thermal stress at the interface during thermal cycling, improves the high strain tolerance of the thermal barrier coating interface, solves the problem of insufficient service life of thermal barrier coatings, and provides excellent thermal shock resistance. Attached Figure Description

[0027] To more clearly illustrate the technical solutions implemented in this invention, the accompanying drawings used in this invention will be briefly described below. Obviously, the drawings described below are merely some embodiments of this invention. Those skilled in the art can obtain other drawings based on these drawings without any creative effort.

[0028] Figure 1 In this embodiment, a YSZ gradient structure transition layer is deposited on the surface of the metal bonding layer; Figure 2 This example demonstrates the transition layer between the YSZ layer and the top gradient element. Figure 3 The example is illustrated with a strength comparison bar chart; Figure 4 This is a bar chart comparing the thermal life of the examples; Figure 5 This is a schematic diagram of the two types of gradient structure transition layers prepared in this invention; Figure 6 This is a schematic diagram of the crucible and the ceramic target material laid around it in this invention; In the figure, 1 is the substrate, 2 is the metal binder layer, 3 is the YSZ layer, 4 is the high-entropy ceramic layer or rare earth zirconate or medium-entropy ceramic, 5 is the YSZ gradient structure transition layer deposited on the surface of the metal binder layer, and 6 is the gradient element transition layer. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0030] The features of various aspects of the embodiments of the present invention will now be described in detail. In the following detailed description, numerous specific details are set forth to provide a thorough understanding of the invention. However, it will be apparent to those skilled in the art that the invention can also be practiced without these specific details. The following description of the embodiments is merely intended to provide a better understanding of the invention by illustrating examples. The invention is not limited to any specific setups and methods provided below, but covers all improvements, substitutions, etc., to product structures and methods without departing from the spirit of the invention. In the various drawings and the following description, well-known structures and techniques are not shown to avoid unnecessarily obscuring the invention.

[0031] The method flow of the present invention will now be described in detail with reference to the accompanying drawings and embodiments: The present invention discloses a method for preparing an EB-PVD interlayer gradient transition layer for thermal barrier coatings, comprising the following steps: The substrate surface is sandblasted and cleaned; a metal bonding layer is prepared on the substrate surface to obtain the sample. The preparation process can be one of chemical vapor deposition, plasma spraying, or vacuum arc plating. Target loading: Select a target and load it into the crucible of the deposition chamber of the electron beam physical vapor deposition equipment. Lay the corresponding ceramic target material around the crucible. The target material can be high-entropy ceramic, medium-entropy ceramic, or commercial YSZ, etc. Coating and interlayer gradient transition layer preparation: The target material is heated and evaporated by the electron beam gun in the electron beam physical vapor deposition equipment. After the vacuum degree stabilizes, the target material is evaporated by ion beam-assisted electron beam physical vapor deposition. At the same time, the appropriate beam current intensity of the evaporation gun is selected to evaporate all elements in the target material simultaneously. The corresponding interlayer gradient transition layer and ceramic coating are obtained on the rotating sample. The deposition process parameters are selected as follows: First, through process experiments, the following beam current intensities were determined: 1.6-1.8 A for high-entropy ceramic evaporation guns; 1.4-1.6 A for medium-entropy metal evaporation guns; 1.5-1.7 A for YSZ target materials; and 900-1000℃ for the substrate. There are two types of coating layer gradient transition layer preparation: one is to deposit a YSZ gradient structure transition layer on the surface of the metal bonding layer, and the other is the interface between the YSZ layer and the rare earth zirconate or high entropy ceramic layer.

[0032] A YSZ gradient structure transition layer was deposited on the surface of the metal bonding layer. The process involved a YSZ target beam current intensity of 1.8-2.0 A, a substrate temperature of 1050℃, and an evaporation time of 3-5 min. A gradient element transition layer is deposited at the interface between the YSZ layer and the rare-earth zirconate or high-entropy ceramic layer. The process involves a high-entropy ceramic evaporator with a beam current intensity of 2.0-2.2 A; a rare-earth zirconate evaporator with a beam current intensity of 1.7-2.0 A; a substrate temperature of 1050℃; and an evaporation time of 3-5 min. After cooling to room temperature, the vacuum chamber is opened, thus preparing a thermal barrier coating with a transition layer on the sample.

[0033] The control processes for different types of coatings are shown in Table 1 below: Table 1

[0034] Based on the table above, seven sets of experiments were completed. The data show that the bonding strength of coatings 1#-6# is greater than 55MPa, while the bonding strength of the comparative method without the preparation of the gradient process layer is less than 50MPa. The introduction of the gradient transition layer significantly improves the bonding strength by 10% and has a certain improvement on the thermal cycling performance of the coating under the same conditions.

[0035] The preparation processes of targets #1, #4, and #6 in the table are described in detail below as examples, with specific process descriptions: Example 1: (1) Sandblasting treatment: The surface of the sample was treated with water blowing to remove contaminants. The sample was a high-temperature alloy. The water blowing pressure was 0.2 MPa; the blowing time was 20 min; and the sand particle size was 200 mesh.

[0036] (2) Cleaning: After water blowing sand, rinse the sample surface with tap water for 15 minutes, then immerse the sample in 10% water-based cleaning agent and ultrasonically clean for 10 minutes, and finally immerse the sample in deionized water for 30 minutes. (3) Dehydration and drying: Immerse the sample in ethanol for 30 min, then take it out and put it in an oven to dry at 80°C; (4) Preparation of the metal substrate: The NiPtAl metal substrate was prepared by chemical vapor deposition at a deposition temperature of 1050℃ and a deposition pressure of 200mbar. The deposition time was 260 min. The flow rate of the chemical vapor deposition was 10 L / min.

[0037] (5) Target loading: Select YSZ target material and load it into the crucible of the deposition chamber of the electron beam physical vapor deposition equipment. Lay the corresponding ceramic target material in and around the crucible. (6) Preparation of coating and interlayer gradient transition layer: YSZ target material is heated and evaporated by electron beam gun in electron beam physical vapor deposition equipment until the vacuum degree is stable and <5×10 -4 The target material was evaporated using ion beam-assisted electron beam physical vapor deposition (IBE) at an energy of 300 eV. A YSZ gradient transition layer was deposited on the surface of the metal binder layer. The process involved a YSZ target beam current of 1.8 A, a substrate temperature of 1050 °C, and an evaporation time of 4 min. Subsequently, a 1.6 A evaporation gun with a corresponding beam current was selected to simultaneously evaporate all elements in the target material, resulting in the formation of the corresponding interlayer gradient transition layer and ceramic coating on a rotating sample.

[0038] Example 2: (1) Sandblasting treatment: The surface of the sample was treated with water blowing to remove contaminants. The sample was a high-temperature alloy. The water blowing pressure was 0.2 MPa; the blowing time was 20 min; and the sand particle size was 200 mesh.

[0039] (2) Cleaning: After water blowing sand, rinse the sample surface with tap water for 15 minutes, then immerse the sample in 10% water-based cleaning agent and ultrasonically clean for 10 minutes, and finally immerse the sample in deionized water for 30 minutes. (3) Dehydration and drying: Immerse the sample in ethanol for 30 min, then take it out and put it in an oven to dry at 80°C; (4) Preparation of the metal substrate: The NiPtAl metal substrate was prepared by chemical vapor deposition at a deposition temperature of 1050℃ and a deposition pressure of 200mbar. The deposition time was 260 min. The flow rate of the chemical vapor deposition was 10 L / min.

[0040] (5) Target loading: Select YSZ target and high-entropy ceramic target and load them into the crucible of the deposition chamber of the electron beam physical vapor deposition equipment. Lay the corresponding ceramic target in and around the crucible. (6) Preparation of coating and interlayer gradient transition layer: YSZ and high-entropy target material are heated and evaporated by electron beam gun in electron beam physical vapor deposition equipment until the vacuum degree is stable and <5×10 -4The target material was evaporated using ion beam-assisted electron beam physical vapor deposition (IBE) at an ion beam assisted energy of 400 eV. A YSZ gradient transition layer was deposited on the surface of the metal binder layer. The process involved a YSZ target beam current of 1.8 A, a substrate temperature of 1050 °C, and an evaporation time of 4 min. Subsequently, a 1.6 A evaporation gun with a corresponding beam current was selected to simultaneously evaporate all elements in the YSZ target. After the YSZ coating was prepared, a gradient element transition layer was deposited at the interface between the YSZ layer and the high-entropy ceramic layer. The process involved a high-entropy ceramic evaporation gun with a beam current of 2.1 A, a substrate temperature of 1050 °C, and an evaporation time of 4 min. Subsequently, a 1.8 A evaporation gun with a corresponding beam current was selected to simultaneously evaporate all elements in the high-entropy target. After the high-entropy coating was prepared, the corresponding interlayer gradient transition layer and ceramic coating were obtained on a rotating sample.

[0041] Example 3: (1) Sandblasting treatment: The surface of the sample was treated with water blowing to remove contaminants. The sample was a high-temperature alloy. The water blowing pressure was 0.2 MPa; the blowing time was 20 min; and the sand particle size was 200 mesh.

[0042] (2) Cleaning: After water blowing sand, rinse the sample surface with tap water for 15 minutes, then immerse the sample in 10% water-based cleaning agent and ultrasonically clean for 10 minutes, and finally immerse the sample in deionized water for 30 minutes. (3) Dehydration and drying: Immerse the sample in ethanol for 30 min, then take it out and put it in an oven to dry at 80°C; (4) Preparation of the metal substrate: The MCrAlY metal substrate was prepared by vacuum arc plating. The vacuum arc plating voltage was 625V, the current was 18A, and the deposition time was 180min. The substrate bias voltage was 20V, and the vacuum degree was <1×10⁻⁶. -2 Pa.

[0043] (5) Target loading: Select YSZ target and high-entropy ceramic target and load them into the crucible of the deposition chamber of the electron beam physical vapor deposition equipment. Lay the corresponding ceramic target in and around the crucible. (6) Preparation of coating and interlayer gradient transition layer: YSZ and rare earth zirconate targets are heated and evaporated by electron beam gun in electron beam physical vapor deposition equipment until the vacuum degree is stable and <5×10 -4The target material was evaporated using ion beam-assisted electron beam physical vapor deposition (IBE) at an ion beam assisted energy of 400 eV. A YSZ gradient transition layer was deposited on the surface of the metal binder layer: the process involved a YSZ target beam current of 1.8 A, a substrate temperature of 1050 °C, and an evaporation time of 4 min; subsequently, a 1.6 A evaporation gun with a corresponding beam current was selected to simultaneously evaporate all elements in the YSZ target. After the YSZ coating was prepared, a gradient element transition layer was deposited at the interface between the YSZ layer and the rare earth zirconate ceramic layer: the process involved a rare earth zirconate evaporation gun with a beam current of 1.8 A, a substrate temperature of 1050 °C, and an evaporation time of 4 min; subsequently, a 1.5 A evaporation gun with a corresponding beam current was selected to simultaneously evaporate all elements in the high entropy target. After the high entropy coating was prepared, the corresponding interlayer gradient transition layer and ceramic coating were obtained on a rotating sample.

[0044] To compare with conventional electron beam physical vapor deposition control methods, multiple experiments were conducted, and typical comparison examples are as follows: Comparative example: (1) Sandblasting treatment: The surface of the sample was treated with water blowing to remove contaminants. The sample was a high-temperature alloy. The water blowing pressure was 0.2 MPa; the blowing time was 20 min; and the sand particle size was 200 mesh.

[0045] (2) Cleaning: After water blowing sand, rinse the sample surface with tap water for 15 minutes, then immerse the sample in 10% water-based cleaning agent and ultrasonically clean for 10 minutes, and finally immerse the sample in deionized water for 30 minutes. (3) Dehydration and drying: Immerse the sample in ethanol for 30 min, then take it out and put it in an oven to dry at 80°C; (4) Preparation of the metal substrate: The MCrAlY metal substrate was prepared by vacuum arc plating. The vacuum arc plating voltage was 625V, the current was 18A, and the deposition time was 180min. The substrate bias voltage was 20V, and the vacuum degree was <1×10⁻⁶. -2 Pa.

[0046] (5) Coating preparation: YSZ and high-entropy target material are heated and evaporated using an electron beam gun in an electron beam physical vapor deposition (EPD) system. A 1.6A evaporation gun with the appropriate beam current intensity is selected to evaporate the YSZ target material. After the YSZ coating is prepared, a 1.5A evaporation gun with the appropriate beam current intensity is selected to evaporate each element in the rare earth zirconate target material simultaneously. After the coating is prepared, a ceramic coating is obtained on a rotating sample.

[0047] As can be seen from the above embodiments, the present invention designs and prepares a gradient transition layer between thermal barrier coating layers, as shown in the schematic diagram below. Figure 5 As shown, a gradient transition is achieved between interlayer elements and the microstructure, wherein the gradient transition layer between the YSZ layer and the metal bonding layer is as follows: Figure 5(b) illustrates how the metal bonding layer structure gradually transitions to the columnar crystalline structure of the ceramic surface layer, which can greatly alleviate the accumulation and release of thermal stress during thermal cycling. Furthermore, a gradient element transition layer, such as..., is deposited at the interface between the YSZ layer and the rare-earth zirconate or high-entropy ceramic layer. Figure 5 (a) Schematic diagram, which allows the YSZ element to transition to rare earth zirconate or high-entropy ceramic layer in a gradient, further alleviating the accumulation and release of thermal stress at the interface during thermal cycling, improving the high strain tolerance of the thermal barrier coating interface, solving the problem of insufficient service life of thermal barrier coating, and providing excellent thermal shock resistance.

[0048] Furthermore, by selecting an auxiliary ion source suitable for the deposition requirements of EB-PVD technology and combining physical vapor deposition (PVD) with ion beam bombardment, high-energy ions bombard the deposition surface during deposition, activating the surface environment and altering the composition and structure of the deposited film. This ensures that the requirements for both increased deposition rate and optimal preheating temperature are met. Ion-assisted deposition (IAD) can improve the deposition rate of EB-PVD, accurately control the coating composition, and increase the preheating temperature.

[0049] The comparison results are as follows Figure 1 Figure 2 As shown, compared with the comparative example, Examples 1, 2, and 3 exhibit a clear gradient transition layer 5 between YSZ and the metal adhesive layer, and a gradient element transition layer 6 between YSZ and the top ceramic surface layer. Compared with the comparative example, Examples 1, 2, and 3 show a corresponding increase in bonding strength and a further improvement in coating thermal life.

[0050] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in the present invention, and these modifications or substitutions should be covered within the protection scope of the present invention.

Claims

1. A method for preparing an interlayer gradient transition layer (EB-PVD) of a thermal barrier coating, characterized in that: Includes the following steps: Step 1: The substrate surface is subjected to water blowing sanding, cleaning, soaking, and drying treatment; Step 2: Prepare a metal bonding layer on the substrate surface to obtain a sample. The preparation process can be one of chemical vapor deposition, plasma spraying, or vacuum arc plating. Step 3, target loading: Select a ceramic target and load it into the crucible of the deposition chamber of the electron beam physical vapor deposition equipment. Lay the corresponding ceramic target in and around the crucible. The target can be high-entropy ceramic, medium-entropy ceramic or YSZ. Step 4, Preparation of Coating and Interlayer Gradient Transition Layer: The target material is heated and evaporated using an electron beam gun in an electron beam physical vapor deposition (EPV) system. After the vacuum level stabilizes, the target material is evaporated using ion beam-assisted EPV, with the appropriate beam current intensity selected for the evaporation gun to ensure simultaneous evaporation of all elements in the target material. The corresponding interlayer gradient structure transition layer and ceramic coating are obtained on the rotating sample. The parameters are selected as follows: Matrix temperature 900-1000℃; high-entropy ceramic evaporation gun beam current intensity 1.6-1.8A; medium-entropy metal evaporation gun beam current intensity 1.4-1.6A; YSZ target beam current intensity 1.5-1.7A; Step 5: After cooling to room temperature, open the vacuum chamber to prepare a thermal barrier coating with a gradient structure transition layer on the sample.

2. The method according to claim 1, characterized in that: The preparation of the interlayer gradient transition layer in step four is divided into two types: one is to deposit a YSZ gradient structure transition layer on the surface of the metal bonding layer, and the other is to deposit a gradient structure transition layer between a YSZ layer and a rare earth zirconate or between a YSZ layer and a high-entropy ceramic layer. The process for depositing a YSZ gradient structure transition layer on the surface of the metal bonding layer is as follows: YSZ target beam current intensity 1.8-2.0A; substrate temperature 950-1050℃; evaporation time 3-5min; The process for depositing a gradient structure transition layer at the interface between the YSZ layer and the rare earth zirconate or high-entropy ceramic layer is as follows: high-entropy ceramic evaporator beam intensity 2.0-2.2A; rare earth zirconate evaporator beam intensity 1.7-2.0A; substrate temperature 950-1050℃; evaporation time 3-5min.

3. The method according to claim 1, characterized in that: In step three: the ceramic target material is laid in and around the crucible in an area of ​​10-30 mm above the crucible diameter and at a height of 10-30 mm.

4. The method according to claim 1, characterized in that: In step four, the ion beam assist energy is between 100-500 eV.

5. The method according to claim 1, characterized in that: In step four, the vacuum level of the electron beam physical vapor deposition equipment is <5×10⁻⁶. -4 mbar.

6. The method according to claim 1, characterized in that: In step one, the water blowing pressure is 0.15-0.25 MPa; the blowing time is 15-30 min; and the sand particle size is 120-200 mesh.

7. The method according to claim 1, characterized in that: After sandblasting with water in step one, rinse the substrate surface with tap water for 15-30 minutes.

8. The method according to claim 1, characterized in that: In step one, the drying process involves drying the substrate at a temperature of 60℃~100℃ for 20~40 minutes.

9. The method according to claim 1, characterized in that: The chemical vapor deposition in step two prepares a NiPtAl metal bonding layer; the plasma spraying and vacuum arc plating prepare an MCrAlY metal bonding layer.

10. The method according to claim 9, characterized in that: The chemical vapor deposition temperature is 950-1100℃, the deposition pressure is 100-400 mbar, the deposition time is 240-300 min, and the chemical vapor deposition flow rate is 5-20 L / min.

11. The method according to claim 9, characterized in that: The plasma spraying distance is controlled at 50-100mm, the spraying power is 20-60kW, the spraying gas Ar flow rate is 30-50 L / min, the N2 flow rate is 10-20 L / min, the powder feeding speed is 20-30g / min, and the spraying time is 15-30min.

12. The method according to claim 9, characterized in that: The vacuum arc plating voltage is 600-650V, the current is 15-20A, and the deposition time is 150-200min; the substrate bias voltage is 10-30V, and the vacuum degree is <1×10⁻⁶. -2 Pa.

13. The method according to claim 1, characterized in that: In step four, the vacuum level of the electron beam physical vapor deposition equipment is <5×10⁻⁶. -4 mbar.

14. The method according to claim 1, characterized in that: The matrix composition is a nickel-based single-crystal high-temperature alloy.

15. The method according to claim 1, characterized in that: In step four, during the preparation of the interlayer gradient transition layer, a mixture of Ar and O2 is introduced as the guiding gas, with a flow rate ratio of 1:

2. In addition, O2 is introduced during the coating preparation process at a flow rate of 20-50 ccm.

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