Reaction kettle

Abstract

The utility model provides a reaction kettle. A reaction kettle body of the reaction kettle is provided with a closed space; the stirring device is positioned in the closed space of the reaction kettle body and is used for stirring reaction turbid liquid in the reaction kettle body; the base is arranged on the inner wall of the closed space of the reaction kettle body; the surface of the metal film tube is provided with a diamagnetic coating, and the diamagnetic coating is used for inhibiting magnetic adsorption of a chelating agent to the metal film tube; the metal film tube is arranged on the base and is used for filtering a reaction turbid solution in the reaction kettle body to obtain a reaction clear solution. The diamagnetic coating is arranged on the surface of the metal film tube of the reaction kettle, and the diamagnetic coating is used for inhibiting the magnetic adsorption effect of the chelating agent on the metal film tube, so that the chelating agent is prevented from being adsorbed on the surface of the metal film tube and in the filtering holes of the metal film tube to influence the filtering effect of the metal film tube. When the metal film pipe is cleaned, the metal film pipe can be easily cleaned, the cleaning frequency of the metal film pipe is reduced, and the productivity of the reaction kettle is improved.

Description

Technical Field

[0001] The present application relates to the technical field of chemical equipment, and in particular to a reaction kettle. Background Art

[0002] Reactor is a common chemical equipment, which can be used to produce many chemical products, such as caprolactam products. Caprolactam products are an important organic chemical raw material. The main use is to produce polyamide slices through polymerization, which can be further processed into nylon fiber, engineering plastics, plastic film, etc. Cyclohexanone ammoximation reaction is a key process in caprolactam production. The process is carried out in a reactor. Titanium silicon molecular sieve (TS-1) is used as a catalyst, tert-butyl alcohol is used as a solvent, cyclohexanone, hydrogen peroxide and gas ammonia are used as raw materials, and cyclohexanone oxime is generated in a kettle reactor with a stirrer. The metal membrane tube of the reactor is used to filter TS-1. The filtered reaction clear liquid is sent to the subsequent process, and the turbid liquid containing the catalyst is recycled back to the reactor for reuse. The separation equipment of titanium silicon molecular sieve and reaction liquid is one of the core equipment of cyclohexanone ammoximation technology. At present, the widely used is the built-in or external metal sintered membrane, that is, the metal membrane tube. The filtration pore size of the metal membrane tube is 5μm, and the filtration efficiency of TS-1 is greatly affected by the catalyst particle size and the oximation process. As the oximation reaction proceeds, the particle size of TS-1 decreases from the initial 90-100 μm to below 5 μm due to collisions between the TS-1 and the stirring paddle, which can easily lead to clogging of the filter holes of the metal membrane tube. In addition, the raw hydrogen peroxide contains chelating stabilizers (also called chelating agents). After chelating metal ions, they are adsorbed into the filter holes due to magnetic adsorption. During backwashing, due to magnetic adsorption, the chelating agents are difficult to wash away from the filter holes and the surface of the metal membrane tube, which also causes clogging of the filter holes. Due to the above two reasons, the flux of the metal membrane tube is reduced, and the metal membrane tube needs to be cleaned frequently, which affects the progress of the ammoximation reaction and reduces the production capacity of the reactor. Utility Model Content

[0003] The purpose of the embodiments of the present application is to provide a reactor to solve the problem that the filter holes of the metal membrane tube of the reactor are clogged and affect the production capacity of the reactor.

[0004] The embodiment of the present application adopts the following technical solution: a reaction kettle, comprising:

[0005] A reactor body having a closed space;

[0006] A stirring device, located in the enclosed space of the reactor body, for stirring the reaction turbid liquid in the reactor body;

[0007] A base, which is arranged on the inner wall of the closed space of the reactor body;

[0008] A metal membrane tube having an anti-magnetic coating on its surface, wherein the anti-magnetic coating is used to inhibit the magnetic adsorption of the chelating agent to the metal membrane tube; the metal membrane tube is arranged on the base, and is used to filter the reaction turbid liquid in the reactor body to obtain a reaction clear liquid, wherein the reaction clear liquid is located in the metal membrane tube.

[0009] In some embodiments, the reactor further comprises:

[0010] The outlet pipe has one end connected to the metal film tube and the other end extending through the wall of the reactor body to the outside of the reactor so as to discharge the reaction clear liquid in the metal film tube.

[0011] In some embodiments, the base includes a mounting plate, one end of which is disposed on an inner wall of the enclosed space of the reactor body, and the other end of which extends toward the center of the enclosed space of the reactor.

[0012] In some embodiments, one end of the metal film tube is detachably disposed on the mounting plate, and the other end of the metal film tube is connected to one end of the outlet tube.

[0013] In some embodiments, at least two of the mounting plates are arranged on the inner wall of the enclosed space of the reactor, and there are multiple metal film tubes. A card slot corresponding to the metal film tube is arranged on the upper plate surface and / or the lower plate surface of each of the mounting plates, and one end of the metal film tube is fixed to the card slot.

[0014] In some embodiments, the metal film tube is arranged perpendicular to the plate surface of the mounting plate.

[0015] In some embodiments, at least two layers of the mounting plates are arranged up and down on the inner wall of the closed space of the reactor.

[0016] In some embodiments, the reactor further comprises:

[0017] A pressure gauge, which is arranged on the reactor and has an air inlet valve port, the air inlet valve port is used to connect to a gas source so that the gas source can pressurize the reactor; the gas source is also connected to a pressure reducing valve so as to adjust the pressure output by the gas source by adjusting the opening of the pressure reducing valve;

[0018] An exhaust valve is arranged at the top of the reactor and is used to exhaust the gas in the reactor to relieve the pressure of the reactor.

[0019] The beneficial effects of the embodiments of the present application are:

[0020] By setting anti-magnetic on the surface of the metal film tube of the reactor and suppressing the magnetic adsorption of the chelating agent on the metal film tube by anti-magnetic coating, the chelating agent is prevented from being adsorbed on the surface of the metal film tube and in the filter holes of the metal film tube to affect the filtering effect of the metal film tube. When cleaning the metal film tube, the metal film tube can be cleaned more easily, the cleaning frequency of the metal film tube is reduced, and the production capacity of the reactor is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the related technologies, the drawings required for use in the embodiments or the related technical descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0022] Figure 1 This is a schematic diagram of the structure of the reactor of this application;

[0023] Figure 2 This is a schematic diagram of the cross-sectional structure of the reactor of this application;

[0024] Figure 3 This is a schematic diagram of the structure of the metal film tube of this application.

[0025] Figure numerals: 1. Reactor; 2. Metal membrane tube; 3. Stirring device; 4. Base; 5. Coating. DETAILED DESCRIPTION

[0026] Various aspects and features of the present application are described herein with reference to the accompanying drawings.

[0027] It should be understood that various modifications may be made to the embodiments of the present application. Therefore, the above description should not be considered as limiting, but only as an example of the embodiments. Other modifications within the scope and spirit of the present application will occur to those skilled in the art.

[0028] The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the present application and, together with the general description of the present application given above and the detailed description of the embodiments given below, serve to explain the principles of the present application.

[0029] These and other characteristics of the present application will become apparent from the following description of a preferred form of embodiment given as a non-limiting example with reference to the accompanying drawings.

[0030] It should also be understood that although the present application has been described with reference to some specific examples, those skilled in the art will be able to readily implement many other equivalent forms of the present application.

[0031] The above and other aspects, features and advantages of the present application will become more apparent in view of the following detailed description when taken in conjunction with the accompanying drawings.

[0032] Specific embodiments of the present application are described hereinafter with reference to the accompanying drawings; however, it should be understood that the embodiments applied for are merely examples of the present application, which may be implemented in a variety of ways. Well-known and / or repeated functions and structures are not described in detail to avoid unnecessary or redundant details that obscure the present application. Therefore, the specific structural and functional details applied for herein are not intended to be limiting, but merely serve as a basis and representative basis for the claims to teach those skilled in the art to use the present application in a variety of ways with substantially any suitable detailed structure.

[0033] This specification may use the phrases "in one embodiment," "in another embodiment," "in yet another embodiment," or "in other embodiments," all of which may refer to one or more of the same or different embodiments according to the present application.

[0034] In order to solve the problems in the background technology, the present application embodiment provides a reaction kettle 1. Figure 1 , Figure 2 and Figure 3 As shown, the reactor 1 can be a tank with a closed space. The reactor 1 comprises:

[0035] The reactor body has a closed space. For example, the reactor body can be a tank body with a closed space, which can be used for the reaction of materials to produce corresponding products. For example, the reactor body can be used for cyclohexanone ammoximation reaction to produce caprolactam products. The closed space of the reactor body has a certain pressure, so that the reaction turbid liquid in the reactor body can be filtered through the filter holes of the metal membrane tube 2 under the action of pressure.

[0036] The stirring device 3 is located in the enclosed space of the reactor body and is used to stir the reaction turbid liquid in the reactor body. The stirring device 3 may include a stirring head, a stirring rod and a motor. One end of the stirring rod is located outside the reactor body and connected to the motor. The other end of the stirring rod is located inside the reactor body and connected to the stirring head. The motor drives the stirring rod and the stirring head to rotate to stir the material in the reactor body and improve the uniformity of the material and the reaction efficiency.

[0037] The base 4 is arranged on the inner wall of the closed space of the reactor body and is used to install the metal membrane tube 2.

[0038] Metal film tube 2, such as Figure 3As shown, the surface of the metal film tube 2 has an anti-magnetic coating 5, wherein the anti-magnetic coating 5 is used to suppress the magnetic adsorption of the chelating agent to the metal film tube 2. The anti-magnetic coating 5 can be sprayed onto the surface of the metal film tube 2, or it can be set on the surface of the metal film tube 2 in other ways. For example, the anti-magnetic coating 5 can be set on the outer surface of the metal film tube 2 by spraying. The anti-magnetic coating 5 can be formed by electrostatically spraying polytetrafluoroethylene powder onto the outer surface of the metal film tube 2.

[0039] During the spraying process, an anti-magnetic coating 5 can also be sprayed on the wall of the filter hole of the metal membrane tube 2. The anti-magnetic coating 5 plays a barrier role. When the chelating agent is close to the surface of the metal membrane tube 2, since the surface of the metal membrane tube 2 and the filter hole both have a layer of anti-magnetic coating 5 that has no magnetic adsorption ability, the chelating agent will no longer be adsorbed on the surface of the metal membrane tube 2 and the filter hole.

[0040] Even if the filter hole is not sprayed with the anti-magnetic coating 5, since the filter hole is very small, after the surface of the metal film tube 2 has the pit magnetic coating 5, the chelating agent can only contact the filter hole. Combined with the specific production scenario, the chelating agent in the reaction turbid liquid is constantly stirred. After the surface of the metal film tube 2 has the anti-magnetic coating 5, it is difficult for the chelating agent to form an adhesion relationship with the filter hole with a very small area, because the contact area between the two is very small, and the chelating agent can easily detach from the metal film tube 2 under the action of stirring. In addition, since the magnetic adsorption area between the chelating agent and the filter hole becomes very small, the adsorption force between the two also becomes very small, so even if the chelating agent can be adsorbed at the filter hole, when the metal film tube 2 is cleaned, it is also easy to wash off the chelating agent on the metal film tube 2.

[0041] Polytetrafluoroethylene (PTFE) material has the characteristics of acid and alkali resistance and resistance to various organic solvents, and is almost insoluble in all solvents. At the same time, polytetrafluoroethylene has the characteristics of high temperature resistance and its friction coefficient is extremely low. Therefore, the coating 5 formed by spraying the PTFE material has good performance of acid and alkali resistance and resistance to various organic solvents. In addition, the coating 5 formed by the PTFE material has a low friction coefficient, which makes it difficult for the chelating agent and the titanium silicon molecular sieve (TS-1) to adhere to and fix with the coating 5, avoiding the chelating agent and the titanium silicon molecular sieve from adhering to the surface of the metal membrane tube 2 to form a blockage on the filter hole.

[0042] When the metal membrane tube 2 filters the reaction turbid liquid, the reaction turbid liquid is filtered from the outside of the metal membrane tube 2 through the filter holes to form a reaction clear liquid which enters the metal membrane tube 2. Therefore, only the outer surface of the metal membrane tube 2 can be sprayed and an anti-magnetic coating 5 can be formed on the outer surface of the metal membrane tube 2.

[0043] The metal membrane tube 2 is arranged on the base 4, and is used to filter the reaction turbid liquid in the reactor body to obtain a reaction clear liquid, wherein the reaction clear liquid is located in the metal membrane tube 2. That is, the reaction turbid liquid passes through the filter holes on the metal membrane tube 2 from the outside of the metal membrane tube 2 to form a reaction clear liquid and enter the metal membrane tube 2.

[0044] The embodiment of the present application sets anti-magnetism on the surface of the metal film tube 2 of the reactor 1, and suppresses the magnetic adsorption of the chelating agent on the metal film tube 2 through the anti-magnetic coating 5, so as to prevent the chelating agent from being adsorbed on the surface of the metal film tube 2 and in the filter holes of the metal film tube 2 to affect the filtering effect of the metal film tube 2. When cleaning the metal film tube 2, the metal film tube 2 can be cleaned more easily, reducing the cleaning frequency of the metal film tube 2 and improving the production capacity of the reactor 1.

[0045] In some embodiments, the reactor 1 further comprises:

[0046] The outlet pipe (not shown in the figure) has one end connected to the metal film tube 2 and the other end extending through the wall of the reactor body to the outside of the reactor 1 to discharge the reaction clear liquid in the metal film tube 2. A separate outlet pipe can be provided for each metal film tube 2, or a main outlet pipe can be used and a plurality of branch pipes can be provided on the main outlet pipe, each branch pipe being connected to a corresponding metal film tube 2.

[0047] In some embodiments, Figure 2 As shown, the base 4 includes a mounting plate, one end of which is arranged on the inner wall of the enclosed space of the reactor body, and the other end of which extends toward the center of the enclosed space of the reactor body 1. The mounting plate can be a flat plate, and one end of which can be welded and fixed to the inner wall of the enclosed space of the reactor body. Of course, it can also be fixed to the inner wall of the enclosed space of the reactor body in other ways. The mounting plate extends toward the center of the enclosed space of the reactor 1, so that a plurality of mounting positions for mounting the metal film tube 2 can be formed on the mounting plate, so that a plurality of metal film tubes 2 can be mounted on the mounting plate, thereby improving the filtration efficiency of the metal film tube 2 on the reaction turbid liquid.

[0048] In some embodiments, one end of the metal film tube 2 is detachably arranged on the mounting plate, and the other end of the metal film tube 2 is connected to one end of the outlet tube. The metal film tube 2 is detachably mounted on the base 4, which facilitates the installation and removal of the metal film tube 2 and improves the installation and removal efficiency of the reactor 1. For example, a card slot can be set on the base 4, and one end of the metal film tube 2 is fixed on the card slot. Of course, it can be understood that other structural methods can also be used to achieve the detachable connection between the metal film tube 2 and the base 4. This is only used as an example and does not constitute a limitation on the scope of protection of the claims.

[0049] In some embodiments, at least two mounting plates are provided on the inner wall of the enclosed space of the reactor 1. There are multiple metal film tubes 2, and each of the upper and / or lower surfaces of the mounting plates is provided with a slot corresponding to the metal film tube 2, and one end of the metal film tube 2 is fixed in the slot. For example, multiple slots can be provided only on the upper surface of the mounting plate, and the number of the slots corresponds to the number of metal film tubes 2, and one end of the metal film tube 2 is fixed in the slot on the upper surface of the mounting plate. Similarly, multiple slots can also be provided only on the lower surface of the mounting plate, and the number of the slots corresponds to the number of metal film tubes 2, and one end of the metal film tube 2 is fixed in the slot on the lower surface of the mounting plate. Of course, one or more slots can also be provided on the upper and lower surfaces of the mounting plate at the same time, and the number of the slots corresponds to the number of metal film tubes 2, and one end of the metal film tube 2 is fixed in the slot on the lower surface of the mounting plate. The metal film tubes 2 can be, but are not limited to, evenly arranged on the mounting plate.

[0050] In some embodiments, Figure 1 As shown, the metal film tube 2 is arranged perpendicular to the plate surface of the mounting plate, which is convenient for installation and removal. Of course, the metal film tube 2 can also be arranged obliquely or horizontally on the mounting plate according to specific production needs, as long as the reaction turbid liquid can be filtered through the metal film tube 2.

[0051] In some embodiments, Figure 1 As shown, at least two layers of the mounting plates are arranged in an upper and lower arrangement on the inner wall of the closed space of the reactor 1. By arranging multiple layers of mounting plates on the inner wall of the closed space of the reactor 1, the reaction turbid liquid can be filtered in layers, thereby improving the filtration of the reaction turbid liquid in the closed space at different heights of the reactor 1 and improving the filtering effect. In addition, the arrangement of multiple layers of mounting plates can also correspond to arranging more metal film tubes 2 on the mounting plates, further improving the filtering efficiency of the reaction turbid liquid.

[0052] In some embodiments, the reactor 1 further comprises:

[0053] A pressure gauge (not shown in the figure) is arranged on the reactor 1 and has an air inlet valve port, which is used to connect to a gas source so that the gas source can pressurize the reactor 1. The gas source is also connected to a pressure reducing valve to adjust the pressure output by the gas source by adjusting the opening of the pressure reducing valve. When it is necessary to pressurize the enclosed space of the reactor 1, the air inlet valve port on the pressure gauge is opened; when it is necessary to adjust the pressure of the enclosed space of the reactor 1, the pressure output of the gas source can be adjusted by adjusting the opening of the pressure reducing valve.

[0054] An exhaust valve (not shown in the figure) is arranged at the top of the reactor 1 and is used to discharge the gas in the reactor 1 to relieve the pressure of the reactor 1. After the reactor 1 completes the corresponding reaction, the exhaust valve can be opened to discharge the gas in the enclosed space of the reactor 1 through the exhaust valve, thereby relieving the pressure of the reactor 1.

[0055] Multiple embodiments of the present application are described in detail above, but the present application is not limited to these specific embodiments. Those skilled in the art can make various variations and modifications to the embodiments based on the concept of the present application, and these variations and modifications should all fall within the scope of protection required by the present application.

Claims

1. A reaction kettle, characterized in that: include: A reactor body having a closed space; A stirring device, located in the enclosed space of the reactor body, for stirring the reaction turbid liquid in the reactor body; A base, which is arranged on the inner wall of the closed space of the reactor body; A metal membrane tube having an anti-magnetic coating on its surface, wherein the anti-magnetic coating is used to inhibit the magnetic adsorption of the chelating agent to the metal membrane tube; the metal membrane tube is arranged on the base, and is used to filter the reaction turbid liquid in the reactor body to obtain a reaction clear liquid, wherein the reaction clear liquid is located in the metal membrane tube.

2. The reactor according to claim 1, characterized in that: The reactor also includes: The outlet pipe has one end connected to the metal film tube and the other end extending through the wall of the reactor body to the outside of the reactor so as to discharge the reaction clear liquid in the metal film tube.

3. The reactor according to claim 2, characterized in that: The base comprises a mounting plate, one end of which is arranged on the inner wall of the enclosed space of the reactor body, and the other end of which extends toward the center of the enclosed space of the reactor.

4. The reactor according to claim 3, characterized in that: One end of the metal film tube is detachably arranged on the mounting plate, and the other end of the metal film tube is connected to one end of the outlet tube.

5. The reaction kettle according to claim 4, characterized in that: At least two mounting plates are arranged on the inner wall of the enclosed space of the reactor, and there are multiple metal film tubes. A slot corresponding to the metal film tube is arranged on the upper plate surface and / or the lower plate surface of each mounting plate, and one end of the metal film tube is fixed to the slot.

6. The reactor according to claim 4, characterized in that: The metal film tube is arranged perpendicular to the plate surface of the mounting plate.

7. The reactor according to claim 3, characterized in that: At least two layers of the mounting plates are arranged up and down on the inner wall of the closed space of the reactor.

8. The reactor according to claim 1, characterized in that: The reactor also includes: A pressure gauge, which is arranged on the reactor and has an air inlet valve port, the air inlet valve port is used to connect to a gas source so that the gas source can pressurize the reactor; the gas source is also connected to a pressure reducing valve so as to adjust the pressure output by the gas source by adjusting the opening of the pressure reducing valve; An exhaust valve is arranged at the top of the reactor and is used to exhaust the gas in the reactor to relieve the pressure of the reactor.

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