Multi-arc ion plating auxiliary tool and multi-arc ion plating equipment

Abstract

The multi-arc ion plating auxiliary tool comprises a supporting rod, a main rotating disc, a supporting disc, a shielding disc and a piece loading rod, the main rotating disc and the supporting disc are coaxially and correspondingly fixed to the two ends of the supporting rod, the main rotating disc can rotate in the circumferential direction of the supporting rod, the auxiliary rotating disc is rotationally installed on the end face, facing the supporting disc, of the main rotating disc, and the auxiliary rotating disc can be driven by the main rotating disc to rotate in the circumferential direction of the axis of the auxiliary rotating disc. The shielding discs are arranged between the main rotating disc and the supporting disc at equal intervals in the axis direction of the supporting rod. One end of the loading rod is rotationally connected to the auxiliary rotating disc, the other end of the loading rod sequentially penetrates through the shielding disc and then is rotationally connected to the supporting disc, and the loading rod is rotationally connected with the shielding disc. The utility model further provides multi-arc ion plating equipment. According to the utility model, the compatibility of multi-target sharing is provided, the installation is simple, the use is convenient, the coating uniformity is ensured, the application range is further widened, the process precision is ensured, the production efficiency is improved, and the production cost is reduced.

Description

Technical Field

[0001] This utility model relates to the field of multi-arc ion plating technology, and in particular to an auxiliary tooling and equipment for multi-arc ion plating. Background Technology

[0002] Multi-arc ion plating technology employs multiple independent arc sources to excite the corresponding target material, significantly improving the arc deposition rate compared to traditional vacuum arc (single-arc source) ion plating technology. The arc spots generated by each cathode target move randomly on the target surface, forming discrete high-density plasma clusters. This discontinuous plasma distribution leads to significant fluctuations in ion flux within the space, resulting in substantial differences in film deposition rates across different regions of the substrate, thus greatly affecting coating uniformity. In contrast, the traditional vacuum single-arc ion plating process using a single evaporation source exhibits a more continuous plasma distribution than multi-arc ion plating, and the single plating surface makes uniformity easier to control.

[0003] To address the coating uniformity defects in multi-arc ion plating, Chinese patent application CN114875358A discloses a vacuum composite coating equipment and its usage method. This equipment includes a vacuum chamber, an arc discharge module, a gas ion source, a high-power magnetron discharge module, a workpiece rotation system, and a heating system. This patent utilizes the clean plasma from an arc-enhanced structure or a gas ion source to efficiently clean the workpiece, and employs high-power pulsed magnetron sputtering technology to generate high-intensity clean metal plasma to bombard and activate the interface, thus preparing a transition layer. While this patent can significantly improve the density and structural uniformity of the coating, it is only suitable for auxiliary deposition in processes using multiple targets of the same material where cross-contamination between targets is unlikely. Preparing films with different materials requires frequent furnace openings and target replacements, resulting in high labor costs; and it cannot fully meet the coating requirements of different workpieces. Utility Model Content

[0004] In order to solve the technical problems existing in the above-mentioned technologies, it is necessary to provide a multi-arc ion plating auxiliary tooling.

[0005] A multi-arc ion plating auxiliary fixture includes a support rod, a main rotating disk, a support disk, a shielding disk, and a component mounting rod;

[0006] The main rotating disk and the support disk are coaxially fixed at the two ends of the support rod. The main rotating disk can rotate around the support rod. The auxiliary rotating disk is rotatably installed on the end face of the main rotating disk facing the support disk. The auxiliary rotating disk can rotate around its own axis under the drive of the main rotating disk.

[0007] The shielding discs are arranged at equal intervals between the main rotating disc and the support disc along the axial direction of the support rod.

[0008] One end of the mounting rod is rotatably connected to the auxiliary rotating disk, and the other end of the mounting rod passes through the shielding disk in sequence and is rotatably connected to the support disk. The mounting rod and the shielding disk are rotatably connected.

[0009] Preferably, the inner wall of the main rotating disk engages with the outer wall of the auxiliary rotating disk, so that the main rotating disk can synchronously drive the auxiliary rotating disk to rotate when it rotates.

[0010] Preferably, there are at least two auxiliary rotating disks, each of which is evenly distributed around the support rod. The outer wall of each auxiliary rotating disk meshes with the inner wall of the main rotating disk, and each auxiliary rotating disk does not contact the others.

[0011] Preferably, both the secondary rotating disk and the support disk are rotatably mounted with connecting sleeves that allow the end of the support rod to be inserted.

[0012] Preferably, the connecting sleeve and the support rod are fixed by a locking pin.

[0013] Preferably, the bottom of the main rotating disk is provided with a connecting base.

[0014] Preferably, the shielding disk includes a disk body, a positioning disk, and a circular pressure plate; the upper end of the positioning disk is recessed inward to form a groove, the disk body is built into the groove, and the circular pressure plate is fixed to the upper end of the positioning disk to clamp the disk body between the positioning disk and the circular pressure plate.

[0015] Preferably, the disc body, positioning disc, and circular pressure plate are all made of CC composite material.

[0016] Preferably, the disc body and the positioning disc are rotatably connected to the mounting rod.

[0017] It is also necessary to provide a multi-arc ion plating equipment.

[0018] A multi-arc ion plating equipment includes the multi-arc ion plating auxiliary tooling described above.

[0019] Compared with the prior art, the multi-arc ion plating auxiliary tooling and multi-arc ion plating equipment provided by this utility model have the following beneficial effects:

[0020] 1. Adopting a multi-layer structure design, the main rotating disk drives the secondary rotating disk to rotate, realizing the revolution and rotation of the loading rod. This overcomes the problem of low reliability of traditional fixtures in fixing workpieces, improves the stability and motion accuracy of the workpiece, and significantly improves the uniformity of the coating thickness, with the thickness difference not exceeding 8%. This solves the problem of uneven coating thickness in traditional multi-arc ion plating processes.

[0021] 2. By introducing the use of CC composite electromagnetic shielding plate, the transmission of auxiliary deposition bias voltage between different partition platforms is effectively suppressed, eliminating the problem of mutual interference and contamination of film particles caused by bias voltage attraction between targets, greatly reducing the probability of cross-contamination between targets leading to poisoning, while not hindering the transmission of negative bias voltage on the metal support rod, ensuring the deposition efficiency of coating between each independent partition.

[0022] 3. The main rotating disk drives the secondary rotating disk to rotate, enabling the workpiece to rotate stably. The rotational motion, through centrifugal force, can promptly throw off large droplets that are not firmly bonded, effectively reducing the density of large particles on the film surface. This significantly improves the problem of film performance degradation caused by the large particle effect and enhances film density and bonding strength.

[0023] 4. This device supports the installation of different targets between layers, enabling different targets to undergo independent coating processes, significantly reducing the high labor costs caused by frequent target replacements and improving production efficiency. Attached Figure Description

[0024] To more clearly illustrate the technical solutions of the embodiments of this utility model, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a front view structural diagram of the present invention.

[0026] Figure 2 This utility model Figure 1 A schematic diagram of the cross-sectional structure of AA.

[0027] Figure 3 This utility model Figure 1 A schematic diagram of the axonal structure.

[0028] Figure 4 This utility model Figure 1 A schematic diagram of the axonal structure from another angle.

[0029] In the diagram: support rod 01, main rotating disk 02, support disk 03, shielding disk 04, disk body 41, positioning disk 42, circular pressure plate 43, mounting rod 05, connecting sleeve 06, connecting base 07, secondary rotating disk 08. Detailed Implementation

[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present utility model.

[0031] In the description of this utility model, it should be understood that the terms "upper", "middle", "outer", "inner", "lower", etc., which indicate orientation or positional relationship, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the components or elements referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0032] Please refer to Figures 1 to 4 In one embodiment, the present invention provides a multi-arc ion plating auxiliary fixture, including a support rod 01, a main rotating disk 02, a support disk 03, a shielding disk 04, and a mounting rod 05;

[0033] The main rotating disk 02 and the support disk 03 are coaxially fixed to the two ends of the support rod 01. The support rod 01 is fastened to the main rotating disk 02 and the support disk 03 with bolts and pins, which can be disassembled and replaced in time as needed, saving maintenance time and material costs for reprocessing. The main rotating disk 02 can rotate around the support rod 01. The main rotating disk 02 can be driven to rotate by a drive motor. The auxiliary rotating disk 08 is rotatably installed on the end face of the main rotating disk 02 facing the support disk 03. The auxiliary rotating disk 08 can rotate around its own axis under the drive of the main rotating disk 02.

[0034] Among them, the shielding disk 04 is arranged at equal intervals along the axis of the support rod 01 between the main rotating disk 02 and the support disk 03; the shielding disk 04 forms several independent partitions at different heights, and there is no electromagnetic interference between the partitions and the partition platforms. This effectively solves the problem of target material "poisoning" caused by cross-infection of target material evaporation ions in the traditional process. It makes it possible to use multiple targets with independent parameter control at the same time for different coating processes, saving equipment cleaning costs and labor costs for replacing targets.

[0035] One end of the mounting rod 05 is rotatably connected to the secondary rotating disk 08, and the other end of the mounting rod 05 passes through the shielding disk 04 and is rotatably connected to the support disk 03. The mounting rod 05 and the shielding disk 04 are rotatably connected. To facilitate the passage of the mounting rod 05, corresponding mounting holes are provided on the secondary rotating disk 08. To ensure the rotation of the mounting rod 05 and the secondary rotating disk 08, bearings can be used. The secondary rotating disk 08 also provides corresponding mounting holes for the support rod 01 to pass through. These mounting holes fit tightly with the support rod 01, and high-temperature sealing mud can be applied later to ensure the shielding effect between the layers.

[0036] Correspondingly, in order to facilitate the clamping of workpieces, a fixture can also be installed on the mounting rod 05. As for the specific structure of the fixture, it is existing technology and will not be described again.

[0037] In one embodiment, the inner wall of the main rotating disk 02 meshes with the outer wall of the auxiliary rotating disk 08, so that the rotation of the main rotating disk 02 can synchronously drive the rotation of the auxiliary rotating disk 08. When the main rotating disk 02 rotates, the meshing transmission between the main rotating disk 02 and the auxiliary rotating disk 08 enables the workpiece to stably perform both revolution and rotational motion. The rotational motion, through centrifugal force, can promptly dislodge large droplets that are not firmly bonded, effectively reducing the density of large particles on the film surface. This significantly improves the problem of film performance degradation caused by the large particle effect, and increases the film density and bonding strength. It also significantly improves the uniformity of the coating thickness, with a thickness difference of no more than 8%, solving the problem of uneven coating thickness in traditional multi-arc ion plating processes.

[0038] In a more optimized approach, there are at least two auxiliary rotating disks 08. Taking three auxiliary rotating disks 08 as an example, each auxiliary rotating disk 08 is evenly distributed around the support rod 01. The outer wall of each auxiliary rotating disk 08 meshes with the inner wall of the main rotating disk 02, and each auxiliary rotating disk 08 does not contact each other.

[0039] In one embodiment, a connecting sleeve 06, which allows the end of the support rod 01 to be inserted, is rotatably mounted on both the secondary rotating disk 08 and the support disk 03. The connecting sleeve 06 and the secondary rotating disk 08, as well as the connecting sleeve 06 and the support disk 03, can be rotatably connected by bearings.

[0040] Correspondingly, the connecting sleeve 06 and the support rod 01 are fixed by a locking pin, which can limit the displacement in the axial direction to prevent the connecting sleeve 06 from separating from the support rod 01; and can limit the displacement in the radial direction to prevent relative rotation between the connecting sleeve 06 and the support rod 01.

[0041] In one embodiment, a connecting base 07 is provided at the bottom of the main rotating disk 02 for easy connection and installation. The connecting base 07 is fixed to the main rotating disk 02 with bolts, and can be disassembled and replaced in a timely manner as needed, saving maintenance time and material costs for reprocessing.

[0042] In one embodiment, the shielding disk 04 includes a disk body 41, a positioning disk 42, and a circular pressure plate 43. The upper end of the positioning disk 42 is recessed inward to form a groove, and the disk body 41 is placed inside the groove. The circular pressure plate 43 is fixed to the upper end of the positioning disk 42 to clamp the disk body 41 between the positioning disk 42 and the circular pressure plate 43. During use, the positioning disk 42 fits tightly with the furnace cavity and does not rotate under normal circumstances.

[0043] More specifically, the disk 41, positioning disk 42, and annular pressure plate 43 are all made of CC composite material. By introducing CC composite material, the transmission of auxiliary deposition bias voltage between different partition platforms is effectively suppressed, eliminating the problem of mutual interference and contamination of film particles caused by bias voltage attraction between targets, greatly reducing the probability of cross-contamination and poisoning between targets, while not hindering the transmission of negative bias voltage on the metal support rod 01, ensuring the deposition efficiency of simultaneous coating between each independent partition.

[0044] Accordingly, to ensure the normal rotation of the loading rod 05, the disc body 41 and the positioning disc 42 are rotatably connected to the loading rod 05. A rotatable bearing is used to achieve the rotatable connection between the loading rod 05 and the disc body 41 and the positioning disc 42, ensuring the stability of the loading rod's movement, reducing workpiece sway, and ensuring the uniformity of the coating.

[0045] In one embodiment, the present invention also provides a multi-arc ion plating apparatus, including the multi-arc ion plating auxiliary tooling.

[0046] The above-disclosed embodiments are merely preferred embodiments of the present utility model and should not be construed as limiting the scope of the present utility model. Those skilled in the art can understand that implementing all or part of the above-described embodiments and making equivalent changes in accordance with the claims of the present utility model are still within the scope of the utility model.

Claims

1. A multi-arc ion plating auxiliary fixture, characterized in that: Includes support rods, main rotating disk, support plate, shielding plate, and assembly rods; The main rotating disk and the support disk are coaxially fixed at the two ends of the support rod. The main rotating disk can rotate around the support rod. The auxiliary rotating disk is rotatably installed on the end face of the main rotating disk facing the support disk. The auxiliary rotating disk can rotate around its own axis under the drive of the main rotating disk. The shielding discs are arranged at equal intervals between the main rotating disc and the support disc along the axial direction of the support rod. One end of the mounting rod is rotatably connected to the auxiliary rotating disk, and the other end of the mounting rod passes through the shielding disk in sequence and is rotatably connected to the support disk. The mounting rod and the shielding disk are rotatably connected.

2. The multi-arc ion plating auxiliary fixture according to claim 1, characterized in that: The inner wall of the main rotating disk meshes with the outer wall of the auxiliary rotating disk, so that the main rotating disk can synchronously drive the auxiliary rotating disk to rotate when it rotates.

3. The multi-arc ion plating auxiliary fixture according to claim 2, characterized in that: There are at least two auxiliary rotating disks, each of which is evenly distributed around the support rod. The outer wall of each auxiliary rotating disk meshes with the inner wall of the main rotating disk, and the auxiliary rotating disks do not contact each other.

4. The multi-arc ion plating auxiliary fixture according to claim 3, characterized in that: Both the secondary rotating disk and the support disk are rotatably mounted with connecting sleeves that allow the end of the support rod to be inserted.

5. The multi-arc ion plating auxiliary fixture according to claim 4, characterized in that: The connecting sleeve and the support rod are fixed together by a locking pin.

6. The multi-arc ion plating auxiliary fixture according to claim 1, characterized in that: The bottom of the main rotating disk is provided with a connecting base.

7. The multi-arc ion plating auxiliary fixture according to claim 1, characterized in that: The shielding disk includes a disk body, a positioning disk, and a circular pressure plate; the upper end of the positioning disk is recessed inward to form a groove, the disk body is built into the groove, and the circular pressure plate is fixed to the upper end of the positioning disk to clamp the disk body between the positioning disk and the circular pressure plate.

8. The multi-arc ion plating auxiliary fixture according to claim 7, characterized in that: The disc body, positioning disc, and circular pressure plate are all made of CC composite material.

9. The multi-arc ion plating auxiliary fixture according to claim 7, characterized in that: The disc body and positioning disc are rotatably connected to the mounting rod.

10. A multi-arc ion plating equipment, characterized in that: The auxiliary tooling for multi-arc ion plating as described in any one of claims 1-9.

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