Method of manufacturing optical integrated circuit

The method for manufacturing optical integrated circuits adjusts refractive index based on feature detection and lookup tables to achieve desired circuit characteristics without temperature control, addressing complexity and energy consumption issues.

JP2026011204APending Publication Date: 2026-01-23HAMAMATSU PHOTONICS KK
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Patent Information

Application Number
JP2024111608
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-07-11
Publication Date
2026-01-23

AI Technical Summary

Technical Problem

The complexity and increased energy consumption of optical integrated circuits due to the need for temperature control to adjust circuit characteristics pose challenges in achieving desired operation without relying on temperature adjustment.

Method used

A method for manufacturing optical integrated circuits that involves detecting and calculating features of the time waveform or wavelength spectrum of inspection light, using a lookup table to adjust the refractive index of waveguides based on design values, allowing the circuit to operate with desired characteristics without temperature adjustment.

Benefits of technology

Enables the production of optical integrated circuits that can operate with desired circuit characteristics by accurately adjusting the refractive index of waveguides, reducing processing variations and energy consumption.

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Abstract

To provide a manufacturing method of an optical integrated circuit capable of obtaining the optical integrated circuit operable with desired circuit characteristics without depending on temperature adjustment.SOLUTION: The method includes a detection step S01 of inputting the inspection light L to the optical integrated circuit S and detecting the inspection light L output from the optical integrated circuit S, a calculation step S01 of calculating a feature quantity of a time waveform or a feature quantity of a waveform spectrum of the inspection light L detected in the detection step S02, and a processing step S02 of performing refractive-index adjustment processing on the waveguides Se on the basis of a comparison result between the feature quantity calculated in the calculation step S04 and a preset designed value of the feature quantity.SELECTED DRAWING: Figure 8
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