A photolithography machine guide structure

Abstract

The present invention discloses a guide structure for a photolithography machine, comprising: a conversion mechanism, the conversion mechanism comprising: a support plate and a first cylinder, the support plate having an X-axis direction and a Y-axis direction, the first cylinder being transmission-connected to the support plate; a first conveying mechanism, the first conveying mechanism comprising: a first motor and a plurality of roller shafts, the plurality of roller shafts being transmission-connected to the first motor, the support plate allowing the upper surfaces of the plurality of roller shafts to pass through; and a second conveying mechanism, the second conveying mechanism comprising: a second cylinder, a second motor, and a plurality of conveying assemblies, the second cylinder being transmission-connected to the plurality of conveying assemblies, the support plate allowing the upper surfaces of the plurality of conveying assemblies to pass through, the second motor being transmission-connected to the plurality of conveying assemblies. The present invention can ensure the alignment accuracy of photolithography and improve the qualified rate of products.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography machine positioning, and in particular to a photolithography machine guide structure. Background Art

[0002] Photolithography machines are critical equipment in the semiconductor industry, often hailed as its crown jewel. Transistors in integrated circuits are fabricated on wafers through a photolithography process. This process determines the line width of semiconductor circuits, and consequently, the chip's performance and power consumption. Overlay accuracy essentially refers to the alignment accuracy between the patterns in the previous and subsequent photolithography steps. Excessive misalignment can negatively impact product yield.

[0003] With existing technology, it is difficult to position the plate in the photolithography machine, and the alignment accuracy of the photolithography cannot be guaranteed, resulting in a low product qualification rate. Summary of the Invention

[0004] In view of the above-mentioned problem of difficult plate positioning in existing photolithography machines, the present invention aims to provide a photolithography machine guide structure that can ensure the alignment accuracy of photolithography and improve the product qualification rate.

[0005] The specific technical solutions are as follows:

[0006] A guide structure for a photolithography machine includes: a conversion mechanism, the conversion mechanism including: a support plate and a first cylinder, the support plate has an X-axis direction and a Y-axis direction, the first cylinder is in transmission connection with the support plate, and the first cylinder is used to drive the support plate to move up and down;

[0007] a first conveying mechanism, the first conveying mechanism comprising: a first motor and a plurality of roller shafts, the plurality of roller shafts being respectively connected to the first motor in a transmission manner, the upper surfaces of the plurality of roller shafts passing through the support plate, the plurality of roller shafts being used to convey the product along the X-axis direction;

[0008] The second conveying mechanism includes: a second cylinder, a second motor and a plurality of conveying components, the second cylinder is respectively connected to the plurality of conveying components, the second cylinder is used to drive the plurality of conveying components to move up and down, the support plate is for the upper surface of the plurality of conveying components to pass through, the second motor is respectively connected to the plurality of conveying components, the second motor is used to drive the plurality of conveying components to operate, and the plurality of conveying components are used to convey the product along the Y-axis direction.

[0009] The above-mentioned lithography machine guiding structure, wherein each of the roller shafts includes: a roller and several rollers, the first motor is connected to the roller for transmission, the several rollers are arranged on the roller, the several rollers are respectively fixedly connected to the roller, and the several rollers are coaxially arranged with the roller, the upper surfaces of the several rollers are all on the same first plane, the support plate is for the upper surfaces of the several rollers to pass through, and the several rollers are used to transport the product to move along the X-axis direction.

[0010] The above-mentioned lithography machine guiding structure, wherein each of the conveying components includes: a driving wheel, several driven wheel groups and a conveyor belt, the second motor is connected to the driving wheel in a transmission connection, several driven wheel groups and the driving wheel are connected to the conveyor belt in a transmission connection, the upper surfaces of several conveyor belts are all on the same second plane, the support plates are respectively used for the upper surfaces of several conveyor belts to pass through, and several conveyor belts are used to convey the products to move along the Y-axis direction.

[0011] The above-mentioned lithography machine guiding structure, wherein each of the driven wheel groups includes: three driven wheels, the upper surface of one driven wheel is higher than the upper surfaces of the other two driven wheels, and the three driven wheels are all connected to the conveyor belt in a transmission manner.

[0012] The above-mentioned lithography machine guide structure, wherein each of the conveying components further includes:

[0013] a conveyor belt mounting plate, the second cylinder being in driving connection with the conveyor belt mounting plate, the second cylinder being used for driving the conveyor assembly to move up and down;

[0014] A plurality of mounting frames are provided on the conveyor belt mounting plate, and the plurality of driven wheels and the driving wheel are rotatably connected to the plurality of mounting frames respectively.

[0015] The above-mentioned lithography machine guide structure further includes:

[0016] a first baffle, the first baffle being arranged above the supporting plate and being used to limit the movement position of the product in the X-axis direction;

[0017] The second baffle is arranged above the supporting plate, and the second baffle is used to limit the moving position of the product in the Y-axis direction.

[0018] The above-mentioned lithography machine guiding structure, wherein the conversion mechanism also includes: a plurality of support plate connecting rods and a movable plate, the movable plate is transmission-connected to the first cylinder, the movable plate is fixedly connected to the support plate through a plurality of the support plate connecting rods, and the plurality of the support plate connecting rods are all vertically arranged.

[0019] The above-mentioned lithography machine guiding structure, wherein the support plate is provided with a plurality of first through grooves and a plurality of second through grooves, the plurality of first through grooves are respectively used for the upper surfaces of the plurality of rollers to pass through, and the plurality of second through grooves are respectively used for the upper surfaces of the plurality of conveyor belts to pass through.

[0020] The above-mentioned lithography machine guide structure further includes:

[0021] A roller bearing seat mounting plate, the roller bearing mounting plate being arranged at one end of the supporting plate, one end of each of the plurality of rollers being rotatably connected to the roller bearing seat mounting plate via a first bearing seat;

[0022] a motor mounting plate, the motor mounting plate being arranged at the other end of the supporting plate, the first motor being arranged on the motor mounting plate, and the other ends of the plurality of rollers respectively passing through the motor mounting plate;

[0023] A roller support plate, the roller support plate being arranged on a side of the motor mounting plate away from the roller bearing seat mounting plate, the other ends of the plurality of rollers being rotatably connected to the roller support plate via the second bearing seat;

[0024] A fixed plate, the two ends of which are respectively fixedly connected to the lower end of the roller bearing seat mounting plate and the lower end of the motor mounting plate, the movable plate is movably arranged below the fixed plate, and the plurality of support plate connecting rods all pass through the fixed plate;

[0025] A plurality of support rods, both ends of which are fixedly connected to the roller bearing seat mounting plate and the motor mounting plate respectively.

[0026] The above-mentioned lithography machine guiding structure further includes: a motor speed regulator, which is arranged on the motor mounting plate, and is respectively connected to the first motor and the second motor signals, and is used to adjust the transmission speed of the first motor and the second motor respectively.

[0027] Compared with the prior art, the above technical solution has the following positive effects:

[0028] The present invention drives a support plate downward by a first cylinder so that the upper surface of the support plate is lower than the upper surfaces of a plurality of roller shafts, and then drives the plurality of roller shafts to rotate by a first motor so that the product moves along the X-axis direction, and the first baffle limits the product to complete the positioning of the product in the X-axis direction, and drives the support plate upward by the first cylinder so that the upper surface of the support plate is higher than the upper surfaces of the plurality of roller shafts, and drives the conveying assembly upward by a second cylinder so that the upper surface of the conveying assembly is higher than the upper surface of the support plate, and drives the conveying assembly to run by a second motor so that the product moves along the Y-axis direction, and the second baffle limits the product to complete the positioning of the product in the Y-axis direction, thereby ensuring that the photolithography machine has a consistent grasping position when grasping the product. The present invention realizes the positioning of the product in the photolithography machine, can ensure the alignment accuracy of the photolithography, and improves the qualified rate of the product. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 This is a top view of the overall structure of a guide structure of a photolithography machine according to the present invention;

[0030] Figure 2 This is a cross-sectional view of the overall structure of a guide structure of a photolithography machine according to the present invention;

[0031] Figure 3 This is an exploded view of the overall structure of a guide structure of a lithography machine according to the present invention;

[0032] Figure 4 This is a structural schematic diagram of a conveying component in a guide structure of a photolithography machine according to the present invention;

[0033] In the accompanying drawings: 1. support plate; 2. first cylinder; 3. first motor; 4. roller shaft; 5. second cylinder; 6. second motor; 7. conveying assembly; 8. roller; 9. roller; 10. driving wheel; 11. conveyor belt; 12. driven wheel; 13. conveyor belt mounting plate; 14. mounting frame; 15. first baffle; 16. second baffle; 17. support plate connecting rod; 18. moving plate; 19. first through slot; 20. second through slot; 21. roller bearing seat mounting plate; 22. motor mounting plate; 23. roller support plate; 24. fixed plate; 25. support rod; 26. motor speed regulator; 27. drag chain connecting block. DETAILED DESCRIPTION

[0034] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, but they are not intended to limit the present invention.

[0035] Figure 1 This is a top view of the overall structure of a guide structure of a lithography machine according to the present invention. Figure 2 This is a cross-sectional view of the overall structure of a guide structure of a lithography machine according to the present invention. Figure 3 This is an exploded view of the overall structure of a photolithography machine guide structure of the present invention. Figure 4This is a structural diagram of a conveying component in a guide structure of a lithography machine according to the present invention, as shown in FIG. Figures 1 to 4 As shown, a preferred embodiment of the lithography machine guide structure is shown, including: a conversion mechanism, a first conveying mechanism and a second conveying mechanism, the conversion mechanism includes: a pallet 1 and a first cylinder 2, the pallet 1 has an X-axis direction and a Y-axis direction, the first cylinder 2 is transmission-connected to the pallet 1, and the first cylinder 2 is used to drive the pallet 1 to move up and down, the first conveying mechanism includes: a first motor 3 and a plurality of roller shafts 4, the plurality of roller shafts 4 are respectively transmission-connected to the first motor 3, the pallet 1 is for the upper surface of the plurality of roller shafts 4 to pass through, and the plurality of roller shafts 4 are used to convey the product to move along the X-axis direction, the second conveying mechanism includes: a second cylinder 5, a second motor 6 and a plurality of conveying components 7, the second cylinder 5 is respectively transmission-connected to the plurality of conveying components 7, the second cylinder 5 is used to drive the plurality of conveying components 7 to move up and down, the pallet 1 is for the upper surface of the plurality of conveying components 7 to pass through, the second motor 6 is respectively transmission-connected to the plurality of conveying components 7, the second motor 6 is used to drive the plurality of conveying components 7 to operate, and the plurality of conveying components 7 are used to convey the product to move along the Y-axis direction.

[0036] Further, as a preferred embodiment, each roller shaft 4 includes: a roller 8 and several rollers 9, the first motor 3 is connected to the roller 8 for transmission, the several rollers 9 are all arranged on the roller 8, the several rollers 9 are respectively fixedly connected to the roller 8, and the several rollers 9 are coaxially arranged with the roller 8, the upper surfaces of the several rollers 9 are all on the same first plane, the support plate 1 is for the upper surfaces of the several rollers 9 to pass through, and the several rollers 9 are used to convey the product to move along the X-axis direction.

[0037] Furthermore, as a preferred embodiment, each conveying assembly 7 includes: a driving wheel 10, several driven wheel groups and a conveyor belt 11, the second motor 6 is connected to the driving wheel 10, the several driven wheel groups and the driving wheel 10 are connected to the conveyor belt 11, the upper surfaces of the several conveyor belts 11 are all on the same second plane, the pallets 1 are respectively provided for the upper surfaces of the several conveyor belts 11 to pass through, and the several conveyor belts 11 are used to convey products along the Y-axis direction.

[0038] Furthermore, as a preferred embodiment, each driven wheel group includes: three driven wheels 12, the upper surface of one driven wheel 12 is higher than the upper surfaces of the other two driven wheels 12, and the three driven wheels 12 are all transmission-connected to the conveyor belt 11.

[0039] Furthermore, as a preferred embodiment, each conveying assembly 7 also includes: a conveyor belt mounting plate 13 and a plurality of mounting brackets 14, the second cylinder 5 is transmission-connected to the conveyor belt mounting plate 13, the second cylinder 5 is used to drive the conveying assembly 7 to move up and down, the plurality of mounting brackets 14 are all arranged on the conveyor belt mounting plate 13, and the plurality of driven wheels 12 and the driving wheel 10 are rotationally connected to the plurality of mounting brackets 14 respectively.

[0040] Furthermore, as a preferred embodiment, the guide structure of the lithography machine also includes: a first baffle 15 and a second baffle 16, the first baffle 15 is arranged above the support plate 1, and the first baffle 15 is used to limit the movement position of the product in the X-axis direction, and the second baffle 16 is arranged above the support plate, and the second baffle 16 is used to limit the movement position of the product in the Y-axis direction.

[0041] The above are only preferred embodiments of the present invention and are not intended to limit the implementation and protection scope of the present invention.

[0042] The present invention also has the following implementation modes based on the above:

[0043] In further embodiments of the present invention, please continue to refer to Figures 1 to 4 As shown, the conversion mechanism also includes: a plurality of support plate connecting rods 17 and a movable plate 18. The movable plate 18 is transmission-connected to the first cylinder 2. The movable plate 18 is fixedly connected to the support plate 1 through a plurality of support plate connecting rods 17. The plurality of support plate connecting rods 17 are all vertically arranged.

[0044] In a further embodiment of the present invention, a plurality of first through slots 19 and a plurality of second through slots 20 are provided on the support plate 1. The plurality of first through slots 19 are respectively for the upper surfaces of the plurality of rollers 9 to pass through, and the plurality of second through slots 20 are respectively for the upper surfaces of the plurality of conveyor belts 11 to pass through.

[0045] In a further embodiment of the present invention, the guide structure of the lithography machine also includes: a roller bearing seat mounting plate 21, the roller bearing mounting plate 21 is arranged at one end of the support plate 1, and one end of a plurality of rollers 8 is rotatably connected to the roller bearing seat mounting plate 21 through the first bearing seat.

[0046] In a further embodiment of the present invention, the lithography machine guide structure also includes: a motor mounting plate 22, the motor mounting plate 22 is arranged at the other end of the support plate 1, the first motor 3 is arranged on the motor mounting plate 22, and the other ends of the plurality of rollers 8 pass through the motor mounting plate 22 respectively.

[0047] In a further embodiment of the present invention, the guide structure of the lithography machine also includes: a roller support plate 23, the roller support plate 23 is arranged on the side of the motor mounting plate 22 away from the roller bearing seat mounting plate 21, and the other ends of the multiple rollers 8 are respectively rotatably connected to the roller support plate 23 through the second bearing seat.

[0048] In a further embodiment of the present invention, the guide structure of the lithography machine also includes: a fixed plate 24, the two ends of which are respectively fixedly connected to the lower end of the roller bearing seat mounting plate 21 and the lower end of the motor mounting plate 22, the movable plate 18 is movably arranged below the fixed plate 24, and several support plate connecting rods 17 all pass through the fixed plate 24.

[0049] In a further embodiment of the present invention, the photolithography machine guide structure further includes: a plurality of support rods 25 , and both ends of the plurality of support rods 25 are fixedly connected to the roller bearing seat mounting plate 21 and the motor mounting plate 22 respectively.

[0050] In a further embodiment of the present invention, the lithography machine guide structure also includes: a motor speed regulator 26, the motor speed regulator 26 is arranged on the motor mounting plate 22, the motor speed regulator 26 is respectively connected to the first motor 3 and the second motor 6 signal, and the motor speed regulator 26 is respectively used to adjust the transmission speed of the first motor 3 and the second motor 6.

[0051] Preferably, a drag chain connecting block 27 is provided on the support plate 1 .

[0052] The working method process of the present invention is described below:

[0053] Step S1: The first cylinder 2 drives the support plate 1 to move downward so that the upper surface of the support plate 1 is lower than the upper surfaces of the plurality of roller shafts 4;

[0054] Step S2: The first motor 3 drives the plurality of roller shafts 4 to rotate, causing the product to move along the X-axis direction until the product abuts against the first baffle 15. The first baffle 15 limits the product position, completing the product positioning in the X-axis direction.

[0055] Step S3: The first cylinder 2 drives the support plate 1 to move upward, so that the upper surface of the support plate 1 is higher than the upper surfaces of the plurality of roller shafts 4;

[0056] Step S4: The second cylinder 5 drives the conveying assembly 7 to move upward, so that the upper surface of the conveying assembly 7 is higher than the upper surface of the pallet 1;

[0057] Step S5: The second motor 6 drives the conveying assembly 7 to move the product along the Y-axis until the product abuts against the second baffle 16. The second baffle 16 limits the product to complete the positioning of the product in the Y-axis direction.

[0058] The non-simultaneous and separate movements of the first conveying mechanism and the second conveying mechanism of the present invention can enable the product to move along one axis without being affected by the conveying mechanism of the other axis, thereby ensuring the positioning accuracy of the product during conveyance.

[0059] The present invention realizes the positioning of the product in the photolithography machine, thereby ensuring the consistency of the grasping position when the photolithography machine grasps the product, can ensure the alignment accuracy of the photolithography, and improve the qualified rate of the product.

[0060] The above description is only a preferred embodiment of the present invention and does not limit the implementation mode and protection scope of the present invention. For those skilled in the art, it should be aware that all solutions obtained by equivalent substitutions and obvious changes made using the description and illustrations of the present invention should be included in the protection scope of the present invention.

Claims

1. A photolithography machine guide structure, characterized in that: include: A conversion mechanism, the conversion mechanism comprising: a support plate and a first cylinder, the support plate having an X-axis direction and a Y-axis direction, the first cylinder being in transmission connection with the support plate, and the first cylinder being used to drive the support plate to move up and down; a first conveying mechanism, the first conveying mechanism comprising: a first motor and a plurality of roller shafts, the plurality of roller shafts being respectively connected to the first motor in a transmission manner, the upper surfaces of the plurality of roller shafts passing through the support plate, the plurality of roller shafts being used to convey the product along the X-axis direction; The second conveying mechanism includes: a second cylinder, a second motor and a plurality of conveying assemblies, wherein the second cylinder is respectively connected to the plurality of conveying assemblies in a transmission manner, and the second cylinder is used to drive the plurality of conveying assemblies to move up and down, and the upper surfaces of the plurality of conveying assemblies pass through the support plate, and the second motor is respectively connected to the plurality of conveying assemblies in a transmission manner, and the second motor is used to drive the plurality of conveying assemblies to operate, and the plurality of conveying assemblies are used to convey the product along the Y-axis direction; Each of the conveying assemblies includes: a driving wheel, a plurality of driven wheel groups and a conveyor belt, the second motor is in driving connection with the driving wheel, the plurality of driven wheel groups and the driving wheel are in driving connection with the conveyor belt, the upper surfaces of the plurality of conveyor belts are all on the same second plane, the upper surfaces of the plurality of conveyor belts are respectively passed through by the support plates, and the plurality of conveyor belts are used to convey the products along the Y-axis direction; Each of the driven wheel groups comprises: three driven wheels, the upper surface of one driven wheel is higher than the upper surfaces of the other two driven wheels, and the three driven wheels are all drivingly connected to the conveyor belt; Each of the conveying assemblies further comprises: a conveyor belt mounting plate, the second cylinder being in driving connection with the conveyor belt mounting plate, the second cylinder being used for driving the conveyor assembly to move up and down; A plurality of mounting frames are provided on the conveyor belt mounting plate, and the plurality of driven wheels and the driving wheel are rotatably connected to the plurality of mounting frames respectively.

2. The photolithography machine guide structure according to claim 1, characterized in that: Each of the roller shafts includes: a roller and several rollers, the first motor is connected to the roller for transmission, the several rollers are arranged on the roller, the several rollers are respectively fixedly connected to the roller, and the several rollers are coaxially arranged with the roller, the upper surfaces of the several rollers are all on the same first plane, the support plate is for the upper surfaces of the several rollers to pass through, and the several rollers are used to convey the product to move along the X-axis direction.

3. The photolithography machine guide structure according to claim 1, characterized in that: Also includes: a first baffle, the first baffle being arranged above the supporting plate and being used to limit the movement position of the product in the X-axis direction; The second baffle is arranged above the supporting plate, and the second baffle is used to limit the moving position of the product in the Y-axis direction.

4. The photolithography machine guide structure according to claim 2, characterized in that: The conversion mechanism also includes: a plurality of support plate connecting rods and a movable plate, the movable plate is transmission-connected to the first cylinder, the movable plate is fixedly connected to the support plate through the plurality of support plate connecting rods, and the plurality of support plate connecting rods are all vertically arranged.

5. The photolithography machine guide structure according to claim 1, characterized in that: The support plate is provided with a plurality of first through slots and a plurality of second through slots, wherein the plurality of first through slots are respectively used for the upper surfaces of the plurality of rollers to pass through, and the plurality of second through slots are respectively used for the upper surfaces of the plurality of conveyor belts to pass through.

6. The photolithography machine guide structure according to claim 4, characterized in that: Also includes: A roller bearing seat mounting plate, the roller bearing mounting plate being arranged at one end of the supporting plate, one end of each of the plurality of rollers being rotatably connected to the roller bearing seat mounting plate via a first bearing seat; a motor mounting plate, the motor mounting plate being arranged at the other end of the supporting plate, the first motor being arranged on the motor mounting plate, and the other ends of the plurality of rollers respectively passing through the motor mounting plate; A roller support plate, the roller support plate being arranged on a side of the motor mounting plate away from the roller bearing seat mounting plate, the other ends of the plurality of rollers being rotatably connected to the roller support plate via the second bearing seat; A fixed plate, the two ends of which are respectively fixedly connected to the lower end of the roller bearing seat mounting plate and the lower end of the motor mounting plate, the movable plate is movably arranged below the fixed plate, and the plurality of support plate connecting rods all pass through the fixed plate; A plurality of support rods, both ends of which are fixedly connected to the roller bearing seat mounting plate and the motor mounting plate respectively.

7. The photolithography machine guide structure according to claim 6, characterized in that: Also includes: A motor speed regulator is provided on the motor mounting plate, the motor speed regulator is respectively connected to the first motor and the second motor signal, and the motor speed regulator is respectively used to adjust the transmission speed of the first motor and the second motor.

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