Dual galvanometer square head and its calibration method

Abstract

An embodiment of the present invention discloses a double galvanometer square head and its calibration method. It includes a first laser emission component, a second laser emission component, a first galvanometer component, a second galvanometer component, a field lens mechanism and a base. The first galvanometer component and the second galvanometer component are symmetrically arranged with respect to the center line of the base in the vertical direction. The laser emission component emits a first laser beam and a second laser beam. The first laser beam forms an optical path A on the working surface after being reflected by the first galvanometer component and refracted by the field lens mechanism. The second laser beam forms an optical path B on the working surface after being reflected by the second galvanometer component and refracted by the field lens mechanism. The incident section of the optical path A and the incident section of the optical path B are located on the same horizontal plane. The first galvanometer component and the second galvanometer component are integrated into the same galvanometer square head and share a field lens mechanism, and the optical path A and the optical path B are adjusted to make the foci of the two optical paths coincide.

Description

Technical Field

[0001] The present invention relates to the technical field of laser processing, and particularly relates to a double galvanometer square head and a calibration method thereof. Background Art

[0002] Compared with a single galvanometer square head, the double galvanometer square head has a larger working area and processing efficiency. The existing double galvanometer square head is formed by assembling two single galvanometer square heads to work simultaneously. Since the two single galvanometer units are controlled separately, when the two galvanometer units jointly process the same workpiece, the accuracy is relatively low and processing errors are likely to occur.

[0003] The existing galvanometer calibration method can only ensure that the light is vertically incident on the working plane after passing through the square head, and cannot ensure that the focus points coincide when the two groups of optical paths move to the same processing area. Summary of the Invention

[0004] In view of this, the present invention provides a double galvanometer square head and a calibration method thereof, which are used to solve the problem of difficult to ensure processing accuracy in the prior art.

[0005] A double galvanometer square head includes a laser emission component, a first galvanometer component, a second galvanometer component, a field lens mechanism and a base. The first galvanometer component, the second galvanometer component and the field lens are all installed on the base. The laser emission component emits a first laser beam and a second laser beam. The first laser beam enters the double galvanometer square head and forms optical path A on the working surface after being reflected by the first galvanometer component and refracted by the field lens mechanism. The second laser beam enters the double galvanometer square head from another angle and forms optical path B on the working surface after being reflected by the second galvanometer component and refracted by the field lens mechanism. The first galvanometer component and the second galvanometer component are symmetrically arranged with respect to the center line of the base in the vertical direction, so that the optical path A and the optical path B are symmetrically centered on the central axis of the double galvanometer square head in the vertical direction. The working surfaces of the first laser beam and the second laser beam are located on the same horizontal plane and coincide.

[0006] Optionally, both the first laser beam and the second laser beam are vertically incident on the galvanometer mirrors.

[0007] Optionally, the first galvanometer component includes a first X galvanometer mirror, a first X galvanometer adjustment knob for driving the first X galvanometer mirror, a first Y galvanometer mirror and a first Y galvanometer adjustment knob for driving the first Y galvanometer mirror;

[0008] The second galvanometer component includes a second X galvanometer mirror, a second X galvanometer adjustment knob for driving the second X galvanometer mirror, a second Y galvanometer mirror and a second Y galvanometer adjustment knob for driving the second Y galvanometer mirror.

[0009] Optionally, the base is provided with a first X retention hole, a first Y retention hole, a second X retention hole, a second Y retention hole, a first laser incident hole, a second laser incident hole, and a field lens mounting hole;

[0010] After the first X galvanometer mirror and the first X galvanometer adjustment knob are assembled, they are installed in the first X retention hole. After the first Y galvanometer mirror and the first Y galvanometer adjustment knob are assembled, they are installed in the first Y retention hole. After the second X galvanometer mirror and the second X galvanometer adjustment knob are assembled, they are installed in the second X retention hole. After the second Y galvanometer mirror and the second Y galvanometer adjustment knob are assembled, they are installed in the second Y retention hole. The first laser beam enters the interior of the double galvanometer head through the first laser incident hole, and the second laser beam enters the interior of the double galvanometer head through the second laser incident hole. The field lens mechanism is installed in the field lens mounting hole.

[0011] Optionally, the first laser incident hole, the first X retention hole, the first Y retention hole, and the field lens mounting hole communicate to form a first cavity for the passage of the optical path A;

[0012] The second laser incident hole, the second X retention hole, the second Y retention hole, and the field lens mounting hole communicate to form a second cavity for the passage of the optical path B;

[0013] The first cavity and the second cavity converge at the field lens mounting hole.

[0014] Optionally, the laser emission assembly includes a first laser emission assembly and a second laser emission assembly. The first laser emission assembly includes a first laser and a first optical path adjustment assembly, and the first optical path adjustment assembly is used to adjust the incident angle of the first laser beam when it passes through the first laser incident hole. The second laser emission assembly includes a second laser and a second optical path adjustment assembly, and the second optical path adjustment assembly is used to adjust the incident angle of the second laser beam when it passes through the second laser incident hole.

[0015] Optionally, the first optical path adjustment assembly includes a first X mirror and a first Y mirror, which are respectively used to adjust the reflection angles of the first laser beam in the X direction and the Y direction; the second optical path adjustment assembly includes a second X mirror and a second Y mirror, which are respectively used to adjust the reflection angles of the second laser beam in the X direction and the Y direction.

[0016] A calibration method for the double galvanometer head described in any one of the foregoing, the steps including:

[0017] S01. After the double galvanometer square head is powered on, the first galvanometer assembly and the second galvanometer assembly return to zero. The first laser beam and the second laser beam are both perpendicularly incident into the double galvanometer square head. The first galvanometer assembly and the second galvanometer assembly are respectively adjusted so that both the first laser beam and the second laser beam can be perpendicularly incident on the galvanometer;

[0018] S02. Install the double galvanometer square head, set the working distance of the field lens as the initial working surface, determine the first focal plane where the focus of the first laser beam is located and the second focal plane where the focus of the second laser beam is located, judge the distances between the first focal plane, the second focal plane and the initial working surface, and set the focal plane with a smaller distance from the initial working surface as the actual working plane. Adjust the parallelism of the other laser beam so that it is also focused on the actual working plane;

[0019] S03. Find the mechanical center of the double galvanometer square head, and mark the projection point of the mechanical center of the double galvanometer square head on the actual working plane;

[0020] S04. Adjust the first galvanometer assembly and the second galvanometer assembly so that the focus of the first laser beam and the focus of the second laser beam coincide, and make the focus of the first laser beam and the focus of the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface;

[0021] S05. Perform Box correction on the first laser beam and the second laser beam respectively;

[0022] S06. If the Box of the first laser beam and the Box of the second laser beam do not coincide, repeat steps S04 - S05 until the Box of the first laser beam and the Box of the second laser beam completely coincide.

[0023] Optionally, the laser emission assembly includes a laser and an optical path adjustment assembly. The optical path adjustment assembly, the first galvanometer assembly and the second galvanometer assembly are all provided with a coarse adjustment mechanism and a fine adjustment mechanism;

[0024] The operation of making the focus of the first laser beam and the focus of the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface is as follows:

[0025] First, coarsely adjust the first galvanometer assembly and the second galvanometer assembly so that it can be visually seen that the focus of the first laser beam and the focus of the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface;

[0026] Secondly, the first laser beam and the second laser beam respectively make marks on the working plane, and observe whether the two marks coincide with the mechanical center point of the double galvanometer head. If they do not coincide, finely adjust the optical path adjustment component so that the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double galvanometer head on the actual working surface.

[0027] Optionally, when finely adjusting the optical path adjustment component, ensure that the first laser beam and the second laser beam are incident into the double galvanometer head in parallel.

[0028] Implementing the embodiments of the present invention will have the following beneficial effects:

[0029] By adopting the above double galvanometer head, the first galvanometer assembly and the second galvanometer assembly are integrated into the same galvanometer head, sharing a field lens mechanism, and then the optical path A and the optical path B can be respectively adjusted through the first galvanometer assembly and the second galvanometer assembly to make the focal points of the two optical paths coincide, thereby improving the processing accuracy. Description of the Drawings

[0030] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0031] Among them:

[0032] Figure 1 is one of the embodiments of the double galvanometer head provided by the present invention.

[0033] Figure 2 is as Figure 1 shown in the structural explosion diagram of the embodiment.

[0034] Figure 3 is the path schematic diagram of the optical path A and the optical path B in the embodiment shown in Question 1.

[0035] Figure 4 is as Figure 1 shown in the bottom view (excluding the field lens) of the embodiment.

[0036] In the figure: 10 - base, 11 - first X retention hole, 12 - first Y retention hole, 13 - second X retention hole, 14 - second Y retention hole, 15 - first laser incident hole, 16 - second laser incident hole, 17 - field lens mounting hole, 211 - first X mirror, 212 - first Y mirror, 22 - first X galvanometer mirror, 23 - first X galvanometer adjustment knob, 24 - first Y galvanometer mirror, 25 - first Y galvanometer adjustment knob, 311 - second X mirror, 312 - second Y mirror, 32 - second X galvanometer mirror, 33 - second X galvanometer adjustment knob, 34 - second Y galvanometer mirror, 35 - second Y galvanometer adjustment knob, 40 - field lens mechanism, 50 - actual working plane. Detailed implementation mode

[0037] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0038] Please refer to the attached Figure 1 and the attached Figure 2 As one of the embodiments provided by the present invention, a double galvanometer square head includes a laser emission component, a first galvanometer component, a second galvanometer component, a field lens mechanism 40 and a base 10. The first galvanometer component, the second galvanometer component and the field lens are all installed on the base 10. The laser emission component emits a first laser beam and a second laser beam respectively. The first laser beam forms an optical path A on the working surface after being reflected by the first galvanometer component and refracted and focused by the field lens mechanism 40. The second laser beam forms an optical path B on the working surface after being reflected by the second galvanometer component and refracted and focused by the field lens mechanism 40. The incident section of the optical path A and the incident section of the optical path B are located on the same horizontal plane.

[0039] Optionally, the first galvanometer component and the second galvanometer component are symmetrically arranged with respect to the vertical center line of the base 10. Therefore, when the first laser beam and the second laser beam are also symmetrically incident with respect to the vertical center line of the base 10, the optical path A and the optical path B are symmetric. Correspondingly, the incident section of the optical path A and the incident section of the optical path B are parallel to each other and spaced apart.

[0040] Compared with a single galvanometer square head, the optical path of the double galvanometer square head provided by the present invention has the advantages of large scanning range, high processing efficiency, compact structure, etc., and can be widely applied to the laser processing industry.

[0041] Optionally, the base 10 is provided with galvanometer retention holes, laser incident holes and a field lens mounting hole 17. The first galvanometer component and the second galvanometer component are installed in the galvanometer retention holes, and the field lens mechanism 40 is installed in the field lens mounting hole 17.

[0042] Furthermore, the galvanometer retaining holes include a first X retaining hole 11 , a first Y retaining hole 12 , a second X retaining hole 13 , and a second Y retaining hole 14 , and the laser incident hole includes a first laser incident hole 15 and a second laser incident hole 16 .

[0043] Optionally, the first galvanometer assembly includes a first X galvanometer lens 22, a first X galvanometer adjustment button 23 for driving the first X galvanometer lens 22, a first Y galvanometer lens 24, and a first Y galvanometer adjustment button 25 for driving the first Y galvanometer lens 24; the second galvanometer lens assembly includes a second X galvanometer lens 32, a second X galvanometer adjustment button 33 for driving the second X galvanometer lens 32, a second Y galvanometer lens 34, and a second Y galvanometer adjustment button 35 for driving the second Y galvanometer lens 34.

[0044] Correspondingly, the first X vibrating mirror 22 and the first X vibrating mirror adjusting button 23 are correspondingly installed in the first X fixing hole 11, the first Y vibrating mirror 24 and the first Y vibrating mirror adjusting button 25 are correspondingly installed in the first Y fixing hole 12, the second X vibrating mirror 32 and the second X vibrating mirror adjusting button 33 are correspondingly installed in the second X fixing hole 13, and the second Y vibrating mirror 34 and the second Y vibrating mirror adjusting button 35 are correspondingly installed in the second Y fixing hole 14.

[0045] Optionally, the laser emitting assembly includes a first laser emitting assembly and a second laser emitting assembly, the first laser emitting assembly includes a first laser and a first optical path adjustment assembly, the first optical path adjustment assembly uses the reflection of light to adjust the incident angle of the first laser beam when it passes through the first laser incident hole 15, and the second laser emitting assembly includes a second laser and a second optical path adjustment assembly, and the second optical path adjustment assembly is used to adjust the incident angle of the second laser beam when it passes through the second laser incident hole 16.

[0046] Furthermore, the first optical path adjustment component includes a first X-mirror 211, a first Y-mirror 212, a second X-mirror 311, and a second Y-mirror 312. The function of the reflector is to adjust the deflection angle of the laser beam optical path by reflecting the laser beam emitted by the laser, thereby controlling the incident angle of the laser beam. Most laser beams emitted by the laser generator will be offset, and the addition of an angle adjustment device makes the incident angle of the laser beam controllable, which is beneficial to the calibration of the optical path system.

[0047] Optionally, the laser incident hole, the galvanometer retention hole and the field mirror grid hole are interconnected to form a cavity, and the cavity is used for the optical path A and the optical path B to pass through. Laser processing needs to be avoided as much as possible in a relatively open space, where dust in the air interferes with the processing effect. The cavity provides a relatively air-isolated space for the optical path, which can reduce the interference effect of dust in the air and improve the quality of laser processing.

[0048] Optionally, the first optical path adjustment component, the second optical path adjustment component, the first X galvanometer adjustment knob 23, the first Y galvanometer adjustment knob 25, the second X galvanometer adjustment knob 33, and the second Y galvanometer adjustment knob 35 are all provided with a coarse adjustment mechanism and a fine adjustment mechanism. The coarse adjustment mechanism has a lower adjustment accuracy and a larger adjustment range, which is suitable for the preliminary calibration of the laser beam. The fine adjustment mechanism has a higher adjustment accuracy and a smaller adjustment range, which is suitable for the further calibration of the laser beam.

[0049] Optionally, the working surfaces of the first laser beam and the second laser are located on the same horizontal plane and coincide. The two laser beams work on the same processing surface and the working surfaces completely coincide, and the two laser beams can be controlled separately. On the basis that the processing quality of the two laser beams is guaranteed respectively, the processing efficiency of the double galvanometer square head provided by the present invention is doubled.

[0050] Optionally, the distance between the galvanometer assembly and the field lens is correspondingly increased in the present invention, and the distance of a single optical path after being refracted by the galvanometer assembly and entering the field lens is increased, so that the processing area of the entire double galvanometer square head is increased, and the processing range of the double galvanometer square head is further improved.

[0051] The steps of the optical path calibration method of the double galvanometer square head include:

[0052] S01. After the double galvanometer square head is powered on, the first galvanometer assembly and the second galvanometer assembly return to zero. The first laser beam and the second laser beam are both vertically incident into the double galvanometer square head, and the first galvanometer assembly and the second galvanometer assembly are respectively adjusted so that the first laser beam and the second laser beam can both be vertically incident on the galvanometer;

[0053] S02. Set the working distance of the field lens as the initial working surface, determine the first focal plane where the focus of the first laser beam is located and the second focal plane where the focus of the second laser beam is located, judge the distances between the first focal plane, the second focal plane and the initial working surface, and set the focal plane with a smaller distance from the initial working surface as the actual working plane 50, and adjust the parallelism of the other laser beam so that it also focuses on the actual working plane 50;

[0054] S03. Find the mechanical center of the double galvanometer square head, and mark the projection point of the mechanical center of the double galvanometer square head on the actual working plane 50;

[0055] S04. Adjust the first galvanometer assembly and the second galvanometer assembly so that the focus of the first laser beam and the focus of the second laser beam coincide, and make the focus of the first laser beam and the focus of the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface;

[0056] S05. Perform Box correction on the first laser beam and the second laser beam respectively;

[0057] S06. If the Boxes of the first laser beam and the second laser beam do not coincide, repeat steps S04 - S05 until the Boxes of the first laser beam and the second laser beam completely coincide.

[0058] BOX calibration is also the calibration of the laser processing range, mainly a comparison between the laser processing size and the actual size. The calibration parameters are mainly the parameters of the laser processing square head motor.

[0059] The BOX calibration of the processing head includes ordinary calibration and multi - point calibration. Ordinary calibration mainly includes parameter calibrations such as square, trapezoid, parallelogram, etc. Fill in the corresponding parameters on the calibration interface for laser engraving, compare the obtained pattern with the standard pattern to determine the parameters that need to be adjusted, and record them as the adjusted parameters to complete the ordinary calibration. Multi - point calibration is to first use the laser coordinates to mark the corresponding matrix points, and then borrow the high - precision platform to collect the data relative to the platform and calculate by inverse - solving the laser coordinates. Generally, multi - point calibration collects more data points and calibrates the entire processing area. Compared with ordinary calibration, the calibration accuracy of multi - point calibration is higher.

[0060] Furthermore, the laser emission component includes a laser and an optical path adjustment component. The optical path adjustment component, the first galvanometer component, and the second galvanometer component are all equipped with coarse - adjustment mechanisms and fine - adjustment mechanisms;

[0061] Specifically, the operation to make the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double - galvanometer square head on the actual working surface is as follows:

[0062] First, coarsely adjust the first galvanometer component and the second galvanometer component so that visibly, the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double - galvanometer square head on the actual working surface. This step can ensure that the coincidence accuracy of the three is within 100 μm;

[0063] Secondly, the first laser beam and the second laser beam respectively make marks on the working plane, observe whether the two marks coincide with the mechanical center point of the double - galvanometer square head. If they do not coincide, finely adjust the optical path adjustment component so that the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double - galvanometer square head on the actual working surface. This step can ensure that the coincidence accuracy of the three is within 10 μm.

[0064] Correspondingly, when finely adjusting the first optical path adjustment component and the second optical path adjustment component, ensure that the first laser beam and the second laser beam are incident into the double - galvanometer square head parallel to each other.

[0065] After the above calibration method, the scanning ranges of the two galvanometers of the square head coincide. When the two galvanometers are processed separately, the accuracy meets the requirements and is the same as that of a single galvanometer square head. When working in parallel, the processing accuracy at the splicing part is high, which is better than the accuracy of simultaneous processing of two single galvanometer square heads.

[0066] The above-disclosed are only the preferred embodiments of the present invention. Of course, the scope of the rights of the present invention cannot be limited thereby. Therefore, equivalent changes made according to the claims of the present invention still fall within the scope covered by the present invention.

Claims

1. A calibration method for a double galvanometer square head, characterized in that: The double galvanometer square head includes a laser emission component, a first galvanometer component, a second galvanometer component, a field lens mechanism and a base. The first galvanometer component, the second galvanometer component and the field lens mechanism are all installed on the base. The laser emission component emits a first laser beam and a second laser beam. The first laser beam enters the double galvanometer square head and forms optical path A on the working surface after being reflected by the first galvanometer component and refracted by the field lens mechanism. The second laser beam enters the double galvanometer square head from another angle and forms optical path B on the working surface after being reflected by the second galvanometer component and refracted by the field lens mechanism. The first galvanometer component and the second galvanometer component are symmetrically arranged with respect to the central axis of the base in the vertical direction, so that optical path A and optical path B are symmetric about the central axis of the double galvanometer square head in the vertical direction. The working surfaces of the first laser beam and the second laser are located on the same horizontal plane and coincide. The steps of the method include: S01. After the double galvanometer square head is powered on, the first galvanometer component and the second galvanometer component return to zero. The first laser beam and the second laser beam are both vertically incident into the double galvanometer square head. The first galvanometer component and the second galvanometer component are respectively adjusted so that the first laser beam and the second laser beam can both be vertically incident on the galvanometer mirrors; S02. Install the double galvanometer square head. Set the working distance of the field lens mechanism as the initial working surface. Determine the first focal plane where the focus of the first laser beam is located and the second focal plane where the focus of the second laser beam is located. Judge the distances between the first focal plane, the second focal plane and the initial working surface. Set the focal plane with a smaller distance from the initial working surface as the actual working plane. Adjust the parallelism of the other laser beam so that it is also focused on the actual working plane; S03. Find the mechanical center of the double galvanometer square head and mark the projection point of the mechanical center of the double galvanometer square head on the actual working surface; S04. Adjust the first galvanometer component and the second galvanometer component so that the focus of the first laser beam and the focus of the second laser beam coincide, and make the focus of the first laser beam and the focus of the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface; S05. Perform Box correction on the first laser beam and the second laser beam respectively; S06. If the Box of the first laser beam and the Box of the second laser beam do not coincide, repeat steps S04 - S05 until the Box of the first laser beam and the Box of the second laser beam completely coincide.

2. The calibration method according to claim 1, wherein: Both the first laser beam and the second laser beam are vertically incident on the galvanometer mirror plates.

3. The calibration method according to claim 2, wherein: The first galvanometer component includes a first X galvanometer mirror plate, a first X galvanometer adjustment knob for driving the first X galvanometer mirror plate, a first Y galvanometer mirror plate and a first Y galvanometer adjustment knob for driving the first Y galvanometer mirror plate; The second galvanometer assembly includes a second X galvanometer mirror, a second X galvanometer adjustment knob for driving the second X galvanometer mirror, a second Y galvanometer mirror, and a second Y galvanometer adjustment knob for driving the second Y galvanometer mirror.

4. The calibration method according to claim 3, characterized in that: The base is provided with a first X retention hole, a first Y retention hole, a second X retention hole, a second Y retention hole, a first laser incident hole, a second laser incident hole, and a field lens mounting hole; After the first X galvanometer mirror and the first X galvanometer adjustment knob are assembled, they are installed in the first X retention hole. After the first Y galvanometer mirror and the first Y galvanometer adjustment knob are assembled, they are installed in the first Y retention hole. After the second X galvanometer mirror and the second X galvanometer adjustment knob are assembled, they are installed in the second X retention hole. After the second Y galvanometer mirror and the second Y galvanometer adjustment knob are assembled, they are installed in the second Y retention hole. The first laser beam enters the interior of the double galvanometer square head through the first laser incident hole, and the second laser beam enters the interior of the double galvanometer square head through the second laser incident hole. The field lens mechanism is installed in the field lens mounting hole.

5. The calibration method according to claim 4, wherein: The first laser incident hole, the first X retention hole, the first Y retention hole, and the field lens mounting hole communicate to form a first cavity for the passage of the optical path A; The second laser incident hole, the second X retention hole, the second Y retention hole, and the field lens mounting hole communicate to form a second cavity for the passage of the optical path B; The first cavity and the second cavity converge at the field lens mounting hole.

6. The calibration method according to claim 5, wherein: The laser emission assembly includes a first laser emission assembly and a second laser emission assembly. The first laser emission assembly includes a first laser and a first optical path adjustment assembly. The first optical path adjustment assembly is used to adjust the incident angle of the first laser beam when passing through the first laser incident hole. The second laser emission assembly includes a second laser and a second optical path adjustment assembly. The second optical path adjustment assembly is used to adjust the incident angle of the second laser beam when passing through the second laser incident hole.

7. The calibration method according to claim 6, wherein: The first optical path adjustment assembly includes a first X mirror and a first Y mirror, which are respectively used to adjust the reflection angles of the first laser beam in the X direction and the Y direction; the second optical path adjustment assembly includes a second X mirror and a second Y mirror, which are respectively used to adjust the reflection angles of the second laser beam in the X direction and the Y direction.

8. The calibration method according to claim 1, wherein: The laser emission assembly includes a laser and an optical path adjustment assembly. The optical path adjustment assembly, the first galvanometer assembly, and the second galvanometer assembly are all provided with a coarse adjustment mechanism and a fine adjustment mechanism; The operation of making the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface is as follows: First, coarsely adjust the first galvanometer assembly and the second galvanometer assembly so that it is visually observable that the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double galvanometer square head on the actual working surface; Secondly, the first laser beam and the second laser beam respectively make marks on the working plane, and observe whether the two marks coincide with the mechanical center point of the double galvanometer head. If they do not coincide, finely adjust the optical path adjustment component so that the focal points of the first laser beam and the second laser beam coincide with the projection point of the mechanical center of the double galvanometer head on the actual working surface.

9. The calibration method according to claim 8, wherein: When finely adjusting the optical path adjustment component, ensure that the first laser beam and the second laser beam are incident into the double galvanometer head in parallel with each other.

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