Touch sensor and method for manufacturing the same

Abstract

A touch sensor according to an embodiment of the present invention includes: a substrate layer; a first sensing electrode row and a second sensing electrode row alternately arranged on the substrate layer; a first trace extending from the left end of the first sensing electrode row, the first trace including periodically arranged curved portions; a second trace extending from the right end of the second sensing electrode row, the second trace including periodically arranged curved portions; a first floating trace adjacent to the outermost first trace in the first trace; and a second floating trace adjacent to the outermost second trace in the second trace.

Description

[0001] Cross - reference to Related Applications and Claim for Priority

[0002] This application claims priority to Korean Patent Application No. 10 - 2020 - 0001539, filed on January 6, 2020, with the Korean Intellectual Property Office (KIPO), the entire disclosure of which is incorporated herein by reference. Background Art 1. Field of the Technology

[0004] The present invention relates to a touch sensor and a method of manufacturing the same. More specifically, the present invention relates to a touch sensor including a sensing electrode and a trace, and a method of manufacturing the touch sensor.

[0005] 2. Related Art

[0006] With the development of information technology, various demands for display devices having thinner dimensions, lighter weights, higher power consumption efficiency, etc. are increasing. The display device may include a flat panel display device such as a liquid crystal display (LCD) device, a plasma display panel (PDP) device, an electroluminescent display device, an organic light - emitting diode (OLED) display device, etc.

[0007] A touch panel or a touch sensor capable of inputting a user's guidance by selecting an instruction displayed on a screen with a finger or an input tool has also been developed. The touch panel or the touch sensor may be combined with a display device, so that a display and an information input function may be implemented in one electronic device.

[0008] Recently, with the development of image display devices having large - sized screens, the area of the touch sensor disposed under the display screen may also increase. In this case, a large number of sensing electrodes are included in a single touch sensor, and thus the area of an exposure device and / or an exposure mask for forming an electrode pattern also increases. However, a predetermined process device may not be easily modified.

[0009] In addition, in the manufacture of a thin - film type touch sensor, when sensing electrodes are simultaneously formed or transferred in a large - scale area, defects such as tearing and wrinkling of a base film may occur.

[0010] For example, as disclosed in Korean Patent Application Publication No. 2014 - 0092366, various image display devices combined with a touch screen panel including a touch sensor have recently been developed. However, an appropriate process for an image display device having a large - sized screen has not been proposed. Summary of the Invention

[0011] According to one aspect of the present invention, there is provided a touch sensor having improved process reliability and efficiency.

[0012] According to one aspect of the present invention, there is provided a method of manufacturing a touch sensor with improved process reliability and efficiency.

[0013] According to one aspect of the present invention, there is provided an image display device including a touch sensor.

[0014] The above aspects of the present inventive concept will be achieved by the following features or configurations:

[0015] (1) A touch sensor, comprising: a substrate layer; a first row of sensing electrodes and a second row of sensing electrodes alternately arranged on the substrate layer; a first trace extending from the left end of the first row of sensing electrodes, the first trace including periodically arranged curved portions; a second trace extending from the right end of the second row of sensing electrodes, the second trace including periodically arranged curved portions; a first floating trace adjacent to the outermost first trace in the first trace; and a second floating trace adjacent to the outermost second trace in the second trace.

[0016] (2) The touch sensor according to (1) above, wherein the first floating trace includes a plurality of first floating traces having different lengths.

[0017] (3) The touch sensor according to (2) above, wherein the first floating trace becomes shorter in the direction toward the left side of the substrate layer.

[0018] (4) The touch sensor according to (1) above, wherein the second floating trace includes a plurality of second floating traces having different lengths.

[0019] (5) The touch sensor according to (4) above, wherein the second floating trace becomes shorter in the direction toward the right side of the substrate layer.

[0020] (6) The touch sensor according to (1) above, further comprising: sensing column electrodes disposed between the adjacent first row of sensing electrodes and the second row of sensing electrodes; and bridge electrodes electrically connecting the adjacent sensing column electrodes among the sensing column electrodes.

[0021] (7) The touch sensor according to (6) above, further comprising column traces connected to the sensing column electrodes included in the terminal region of the substrate layer among the sensing column electrodes.

[0022] (8) The touch sensor according to (1) above, wherein each of the first trace and the second trace has a stepped shape.

[0023] (9) The touch sensor according to (1) above, wherein the bent portions in the first trace and the second trace have a diagonal shape.

[0024] (10) A method of manufacturing a touch sensor, comprising: forming, by a patterning process using a photomask, a first row of sensing electrodes, a second row of sensing electrodes, a first sub-trace extending from the left end of the first row of sensing electrodes, a first floating sub-trace disposed around the first sub-trace, a second sub-trace extending from the right end of the second row of sensing electrodes, and a second floating sub-trace disposed around the second sub-trace on a substrate layer; and repeating the patterning process by moving the photomask.

[0025] (11) The method according to (10) above, wherein a plurality of the first floating sub-traces are formed along a leftward direction with respect to the first sub-trace by the patterning process, and a plurality of the second floating sub-traces are formed along a rightward direction with respect to the second sub-trace by the patterning process.

[0026] (12) The method according to (11) above, wherein the first sub-trace formed in the n-th patterning process is connected to the first floating sub-trace adjacent to the first sub-trace among the first floating sub-traces formed in the (n + 1)-th patterning process, and n is an integer greater than or equal to 2.

[0027] (13) The method according to (11) above, wherein the first floating sub-trace adjacent to the first sub-trace among the first floating sub-traces formed in the n-th patterning process is connected to the outermost first floating sub-trace among the first floating sub-traces formed in the (n + 1)-th patterning process, and n is an integer greater than or equal to 2.

[0028] (14) The method according to (11) above, wherein the second sub-trace formed in the n-th patterning process is connected to the second floating sub-trace adjacent to the second sub-trace among the second floating sub-traces formed in the (n + 1)-th patterning process, and n is an integer greater than or equal to 2.

[0029] (15) The method according to (11) above, wherein the second floating sub-trace adjacent to the second sub-trace among the second floating sub-traces formed in the n-th patterning process is connected to the outermost second floating sub-trace among the second floating sub-traces formed in the (n + 1)-th patterning process, and n is an integer greater than or equal to 2.

[0030] (16) The method according to (11) above, wherein sensing column electrodes spaced apart from each other are further formed between the first row of sensing electrodes and the second row of sensing electrodes by the patterning process.

[0031] (17) A window stack structure includes: a window substrate; the touch sensor according to the above-described embodiment stacked on the window substrate; and a polarization layer disposed between the window substrate and the touch sensor or on the touch sensor.

[0032] (18) An image display device includes: a display panel; and the touch sensor according to the above-described embodiment stacked on the display panel.

[0033] According to an embodiment of the present invention, in the manufacture of a large-area touch sensor, a photomask may be used to sequentially pattern or transfer a sensing electrode block including a plurality of sensing electrode rows. Therefore, a large-area touch sensor can be effectively manufactured without changing or adding exposure / patterning equipment.

[0034] In an exemplary embodiment, traces extending from the sensing electrode rows may be alternately distributed on two lateral portions of the touch sensor. In addition, when forming the sensing electrode block by moving the photomask, a patterning process may be performed such that traces included in adjacent sensing electrode blocks may be connected or merged with each other. Therefore, the traces may be formed together with the sensing electrodes while increasing the patterning or alignment margin for forming the traces. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 is a schematic top plan view showing a photomask according to an exemplary embodiment.

[0036] Figures 2 to 6 is a schematic top plan view showing a method of manufacturing a touch sensor according to an exemplary embodiment.

[0037] Figure 7 is a schematic cross-sectional view showing a window stack structure and an image display device according to an exemplary embodiment. DETAILED DESCRIPTION

[0038] According to an exemplary embodiment of the present invention, a touch sensor and a method of manufacturing the same are provided, the touch sensor including traces connected by a stitch-type method. In addition, a window stack structure and an image display device including the touch sensor are provided.

[0039] Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. However, those skilled in the art will understand that such embodiments described with reference to the accompanying drawings are provided to further understand the spirit of the present invention and do not limit the subject matter to be protected to that disclosed in the specific description and the appended claims.

[0040] In the drawings, two directions parallel to the same plane are defined as a first direction and a second direction. For example, the first direction may correspond to a row direction, and the second direction may correspond to a column direction.

[0041] Terms such as "first", "second", "third", "left", and "right" used herein are intended to relatively represent different regions, steps, and elements, rather than representing an absolute order and position.

[0042] The term "patterning" used herein includes an exposure process and an etching process using a photomask.

[0043] Figure 1 is a schematic top plan view showing a photomask according to an exemplary embodiment.

[0044] Referring to Figure 1 , the photomask 50 may include a blank portion 55, sensing row pattern portions 60 and 70, a sensing column pattern portion 80, and trace pattern portions 90, 92, 95, and 97.

[0045] The blank portion 55 may refer to the portion of the photomask 50 other than the sensing row pattern portions 60 and 70, the sensing column pattern portion 80, and the trace pattern portions 90, 92, 95, and 97.

[0046] In some embodiments, the blank portion 55 may be used as a transmissive portion during a light process or an exposure process, while the remaining portion of the photomask 50 may be used as a light-blocking portion. In this case, the sensing row pattern portions 60 and 70, the sensing column pattern portion 80, and the trace pattern portions 90, 92, 95, and 97 may be transferred to a photoresist layer (e.g., a positive photoresist layer) to form a photoresist pattern, and the photoresist pattern may be used as an etching mask to etch a conductive layer to form an electrode pattern of a touch sensor.

[0047] In some embodiments, the blank portion 55 may be used as a light-blocking portion, while the remaining portion of the photomask 50 may be used as a transmissive portion. In this case, a photoresist pattern may be formed using a negative photoresist layer, to which the sensing row pattern portions 60 and 70, the sensing column pattern portion 80, and the trace pattern portions 90, 92, 95, and 97 are transferred.

[0048] In an exemplary embodiment, the photomask 50 may include a plurality of sensing row pattern portions 60 and 70. In some embodiments, the photomask 50 may include a first sensing row pattern portion 60 and a second sensing row pattern portion 70.

[0049] The sensing row pattern portions 60 and 70 may include a plurality of sensing row electrode portions 62 and connection pattern portions 64. The sensing row electrode portions 62 may be integrally connected to the connection pattern portions 64 to extend in a first direction (e.g., the row direction). The plurality of sensing row pattern portions 60 and 70 may be arranged along a second direction (e.g., the column direction).

[0050] The sensing column pattern portions 80 may each be provided as sensing column unit electrode portions that are independently spaced apart from each other. The sensing column pattern portions 80 may be arranged between the sensing row electrode portions 62 that are adjacent to each other.

[0051] The sub-trace line pattern portions 90 and 95 may be connected to one end of the sensing row pattern portions 60 and 70.

[0052] In an exemplary embodiment, the first sub-trace line pattern portion 90 may be connected to one end of the first sensing row pattern portion 60. The second sub-trace line pattern portion 95 may be connected to one end of the second sensing row pattern portion 70.

[0053] The sub-trace line pattern portions 90 and 95 may be distributed and alternately provided on two side portions of the photomask 50. For example, the first sub-trace line pattern portion 90 is connected to the left end of the first sensing row pattern portion 60, and the second sub-trace line pattern portion 95 may be connected to the right end of the second sensing row pattern portion 70.

[0054] The first floating sub-trace line pattern portion 92 may be provided to be adjacent to the first sub-trace line pattern portion 90 in the leftward direction. In an exemplary embodiment, two first floating sub-trace line pattern portions 92 may be spaced apart from the first sub-trace line pattern portion 90 and arranged in the leftward direction.

[0055] The second floating sub-trace line pattern portion 97 may be provided to be adjacent to the second sub-trace line pattern portion 95 in the rightward direction. In an exemplary embodiment, two second floating sub-trace line pattern portions 97 may be spaced apart from the second sub-trace line pattern portion 95 and arranged in the rightward direction.

[0056] The terms "left" and "right" used herein are intended to relatively represent two horizontal and opposite directions, rather than being interpreted as absolute directions.

[0057] In Figure 1 two sensing row pattern portions 60 and 70 are included in the photomask 50, but 2n (n is a natural number) sensing row pattern portions may be included in the photomask 50. In this case, the first sensing row pattern portion 60 and the second sensing row pattern portion 70 are alternately arranged along the second direction, and the first sub-trace line pattern portion 90 and the second sub-trace line pattern portion 95 may be alternately arranged on the left side portion and the right side portion of the photomask 50 along the second direction.

[0058] Figures 2 to 6 is a schematic top plan view showing a method of manufacturing a touch sensor according to an exemplary embodiment.

[0059] Reference Figure 2 , by using the photomask 50 described in reference Figure 1 , an electrode pattern can be patterned on the substrate layer 100 (e.g., a first patterning process).

[0060] The substrate layer 100 may include glass or a transparent resin film. The transparent resin film may include, for example, cyclic olefin polymer (COP), polyethylene terephthalate (PET), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyallyl ester, polyimide (PI), cellulose acetate propionate (CAP), polyethersulfone (PES), triacetyl cellulose (TAC), polycarbonate (PC), cyclic olefin copolymer (COC), polymethyl methacrylate (PMMA), etc.

[0061] Through the first patterning process, the first sensing row pattern portion 60 and the second sensing row pattern portion 70 of the photomask 50 can be transferred into the first sensing electrode row 110 and the second sensing electrode row 120, respectively. The first sensing electrode row 110 and the second sensing electrode row 120 may each include a first sensing row electrode 112 and a connection portion 114. The first sensing row electrode 112 and the connection portion 114 can be transferred from the sensing row electrode portion 62 and the connection pattern portion 64 of the photomask 50, respectively.

[0062] The sensing column pattern portion 80 of the photomask 50 can be transferred into a sensing column electrode 130 having a unit electrode shape spaced apart from each other.

[0063] The first sub-trace pattern portion 90 and the second sub-trace pattern portion 95 of the photomask 50 can be transferred into a first sub-trace 140 and a second sub-trace 150, respectively.

[0064] The first sub-trace 140 can be connected to the left end of the first sensing electrode row 110, and the second sub-trace 150 can be connected to the right end of the second sensing electrode row 120.

[0065] The first floating sub-trace 145 transferred from the first floating sub-trace pattern portion 92 of the photomask 50 can be disposed in the leftward direction of the first sub-trace 140. The second floating sub-trace 155 transferred from the second floating sub-trace pattern portion 97 of the photomask 50 can be disposed in the rightward direction of the second sub-trace 150.

[0066] Reference Figure 3, the patterning process (e.g., the second patterning process) can be performed again by moving the photomask 50 along the second direction by a distance corresponding to the length of the photomask 50.

[0067] In the second patterning process, a first row of sensing electrodes 110 and a second row of sensing electrodes 120 can be added along the second direction. Additionally, sensing column electrodes 130 can be added between the first row of sensing electrodes 110 and the second row of sensing electrodes 120.

[0068] In an exemplary embodiment, the first sub-trace 140 formed in the first patterning process can be connected to the first floating sub-trace 145 formed in the second patterning process. Additionally, the first floating sub-trace 145 adjacent to the first sub-trace 140 in the first floating sub-traces 145 formed in the first patterning process can be connected to the outermost first floating sub-trace 145 formed in the second patterning process.

[0069] Furthermore, the second sub-trace 150 formed in the first patterning process can be connected to the second floating sub-trace 155 formed in the second patterning process. Additionally, the second floating sub-trace 155 adjacent to the second sub-trace 150 in the second floating sub-traces 155 formed in the first patterning process can be connected to the outermost second floating sub-trace 155 formed in the second patterning process.

[0070] Reference Figure 4 , the patterning process (e.g., the third patterning process) can be performed again by moving the photomask 50 along the second direction by a distance corresponding to the length of the photomask 50.

[0071] In the third patterning process, a first row of sensing electrodes 110 and a second row of sensing electrodes 120 can be added along the second direction. Additionally, sensing column electrodes 130 can be added between the first row of sensing electrodes 110 and the second row of sensing electrodes 120.

[0072] In an exemplary embodiment, the first sub-trace 140 formed in the second patterning process can be connected to the first floating sub-trace 145 formed in the third patterning process. Additionally, the first floating sub-trace 145 adjacent to the first sub-trace 140 in the first floating sub-traces 145 formed in the second patterning process can be connected to the outermost first floating sub-trace 145 formed in the third patterning process.

[0073] In addition, the second sub-trace 150 formed in the second patterning process can be connected to the second floating sub-trace 155 formed in the third patterning process. Additionally, the second floating sub-trace 155 adjacent to the second sub-trace 150 in the second floating sub-trace 155 formed in the second patterning process can be connected to the outermost second floating sub-trace 155 formed in the third patterning process.

[0074] As described above, the patterning process of the photomask 50 can be reused so that the sensing electrode rows 110 and 120 and the sensing column electrodes 130 can be sequentially added while extending the traces to be connected to each other in a stitching method.

[0075] For example, the sub-trace formed in the nth (n is an integer greater than or equal to 2) patterning process can be connected to the inner floating sub-trace among the floating sub-traces formed in the (n + 1)th patterning process. In addition, the inner floating sub-trace formed in the nth patterning process can be connected to the outermost floating sub-trace formed in the (n + 1)th patterning process.

[0076] Reference Figure 5 , the above patterning process can be repeated to form the first trace 160 and the second trace 170 extending from the left end of the first sensing electrode row 110 and the right end of the second sensing electrode row 120, respectively. The first trace 160 and the second trace 170 can be formed by a combination of the sub-traces 140 and 150 and the floating sub-traces 145 and 155.

[0077] The first floating trace 165 can be disposed around the outermost first trace 160 in the first trace 160. The second floating trace 175 can be disposed around the outermost second trace 170 in the second trace 170.

[0078] In some embodiments, as Figure 5 shown, a plurality of first floating traces 165 having different lengths can be disposed on the left side portion of the substrate layer 100. For example, the length of the first floating trace 165 can become smaller in the direction toward the left side of the substrate layer 100.

[0079] A plurality of second floating traces 175 having different lengths can be disposed on the right side portion of the substrate layer 100. For example, the length of the second floating trace 175 can become smaller in the direction toward the right side of the substrate layer 100.

[0080] The floating traces 165 and 175 can be disposed on two side portions of the touch sensor and can be used as noise shielding wirings or ground wirings.

[0081] Trace lines 160 and 170 and floating trace lines 165 and 175 may include curved portions B, as shown by the dashed circles. Accordingly, trace lines 160 and 170 and floating trace lines 165 and 175 have a stepped shape, and thus the integration efficiency of the trace lines can be improved.

[0082] In an exemplary embodiment, the curved portions B may be periodically arranged in each of the trace lines 160 and 170 or the floating trace lines 165 and 175. The curved portion B may have, for example, a slanted line shape.

[0083] For example, an end portion patterning process may be additionally performed such that the end portions of the trace lines 160 and 170 may be formed in a termination region TR indicated by the dashed rectangle in Figure 5 The termination region TR is indicated by the dashed rectangle in.

[0084] Accordingly, a first end portion 167 of the first trace line 160 may be formed, and a second end portion 177 of the second trace line 170 may be formed. A column trace line 180 connected to the sense column electrode 130 disposed in the termination region TR among the sense column electrodes 130 may be formed while forming the first end portion 167 and the second end portion 177.

[0085] Referring to Figure 6 , an insulating layer 190 covering the sense electrode rows 110 and 120, the sense column electrodes 130, the trace lines 160, 170, and 180, and the floating trace lines 165 and 175 may be formed (a clear illustration of the insulating layer 190 is omitted for convenience of description).

[0086] A bridge electrode 195 may be formed on the insulating layer 190 to electrically connect the sense column electrodes 130 adjacent in the second direction. The bridge electrode 195 may be formed to penetrate the insulating layer 190 and may be connected to the adjacent sense column electrodes 130.

[0087] The sense column electrodes 130 arranged in the second direction and spaced apart from each other may be connected to each other by the bridge electrode 195 such that sense electrode columns may be defined. A plurality of sense electrode columns may be arranged along the first direction.

[0088] According to the above-described embodiment of the present invention, a sense electrode block including a plurality of sense electrode rows 110 and 120 may be patterned or transferred sequentially using a photomask. Accordingly, a large-area touch sensor may be manufactured without changing or expanding an exposure / patterning device.

[0089] In addition, traces 160 and 170 extending from sensing electrode rows 110 and 120 may be alternately distributed on two side portions of the touch sensor. When forming the sensing electrode blocks by moving a photomask, a patterning process may be performed such that sub-traces and floating sub-traces included in adjacent sensing electrode blocks may be connected or merged with each other. Accordingly, traces 160 and 170 may be effectively formed together with the sensing electrodes while increasing the patterning or alignment margin for forming the traces.

[0090] Figure 7 is a schematic cross-sectional view showing a window stack structure and an image display device according to an exemplary embodiment.

[0091] Reference Figure 7 , according to the exemplary embodiment described above, the window stack structure 250 may include a window substrate 230, a polarization layer 210, and a touch sensor 200.

[0092] The window substrate 230 may include a flexible resin film formed of, for example, polyimide or a glass film such as ultra-thin glass (UTG). In one embodiment, a light-shielding pattern 235 may be formed on a peripheral portion of the surface of the window substrate 230. The light-shielding pattern 235 may include a color-printed pattern and may have a single-layer or multi-layer structure. A bezel portion or a non-display area of the image display device may be defined by the light-shielding pattern 235.

[0093] The polarization layer 210 may include a coating-type polarizer or a polarizing plate. The coating-type polarizer may include a liquid crystal coating, which may include a crosslinkable liquid crystal compound and a dichroic dye. In this case, the polarization layer 210 may include an alignment layer for providing alignment of the liquid crystal coating layer.

[0094] For example, the polarizing plate may include a polyvinyl alcohol-based polarizer and a protective film attached to at least one surface of the polyvinyl alcohol-based polarizer.

[0095] The polarization layer 210 may be directly attached to the surface of the window substrate 230 or may be attached via a first adhesive layer 220.

[0096] The touch sensor 200 may include a large-area structure obtained through a plurality of patterning processes according to the exemplary embodiment described above. The touch sensor 200 may be included in the window stack structure 250 as a film or a panel. In one embodiment, the touch sensor 200 may be combined with the polarization layer 210 via a second adhesive layer 225.

[0097] As Figure 7As shown, from the viewer's side, the window substrate 230, the polarization layer 210, and the touch sensor 200 can be sequentially positioned. In this case, the sensing electrodes of the touch sensor 200 can be disposed below the polarization layer 210, such that the electrode pattern can be effectively prevented from being noticed by the viewer.

[0098] In one embodiment, the touch sensor 200 can be directly transferred to the window substrate 230 or the polarization layer 210. In one embodiment, from the viewer's side, the window substrate 230, the touch sensor 200, and the polarization layer 210 can be sequentially positioned.

[0099] As described above, the window substrate 230, the touch sensor 200, and the polarization layer 210 can be provided as a single stacked structure. However, the touch sensor 200 can be provided as an independent structure, or a structure combined with the window substrate 230 or the polarization layer 210.

[0100] The image display device can include a display panel 360 and a window stack structure 250 disposed on the display panel.

[0101] The display panel 360 can include a pixel electrode 310, a pixel defining layer 320, a display layer 330, a counter electrode 340, and a encapsulation layer 350 disposed on a panel substrate 300.

[0102] A pixel circuit including a thin film transistor (TFT) can be formed on the panel substrate 300, and an insulating layer can be formed to cover the pixel circuit. The pixel electrode 310 can be electrically connected to, for example, the drain electrode of the TFT on the insulating layer.

[0103] The pixel defining layer 320 can be formed on the insulating layer, and the pixel electrode 310 can be exposed through the pixel defining layer 320, such that the pixel regions can be defined. The display layer 330 can be formed on the pixel electrode 310, and the display layer 330 can include, for example, a liquid crystal layer or an organic light emitting layer.

[0104] The counter electrode 340 can be disposed on the pixel defining layer 320 and the display layer 330. The counter electrode 340 can be used as, for example, a common electrode or a cathode of the image display device. The encapsulation layer 350 can be disposed on the counter electrode 340 to protect the display panel 360.

[0105] In some embodiments, the display panel 360 and the window stack structure 250 can be combined with each other through the adhesive layer 260. For example, the thickness of the adhesive layer 260 can be greater than the thickness of each of the first adhesive layer 220 and the second adhesive layer 225. At a temperature in the range of -20°C to 80°C, the viscoelasticity of the adhesive layer 260 can be about 0.2 MPa or less. In this case, noise from the display panel 360 can be blocked, and the interfacial stress during bending can be reduced, so that damage to the window stack structure 250 can be avoided. In one embodiment, the viscoelasticity of the adhesive layer 260 can be in the range of about 0.01 MPa to about 0.15 MPa.

[0106] According to an exemplary embodiment, even if the area of the display panel 360 increases, the touch sensor 200 including a large sensing area or an effective area can be easily applied without excessively changing the process equipment or excessively increasing the cost.

Claims

1. A touch sensor, comprising: Substrate layer; First rows of sensing electrodes and second rows of sensing electrodes alternately arranged on the substrate layer; A first trace extending from the left end of the first row of sensing electrodes, the first trace including periodically arranged curved portions; A second trace extending from the right end of the second row of sensing electrodes, the second trace including periodically arranged curved portions; A first floating trace adjacent to the outermost first trace in the first trace and located in the leftward direction relative to the outermost first trace; and A second floating trace adjacent to the outermost second trace in the second trace and located in the rightward direction relative to the outermost second trace, wherein the first floating trace and the second floating trace are spaced apart from each other by the first rows of sensing electrodes, the second rows of sensing electrodes, the first trace, and the second trace therebetween.

2. The touch sensor according to claim 1, wherein the first floating trace comprises a plurality of first floating traces having different lengths.

3. The touch sensor according to claim 2, wherein the first floating traces become shorter in a direction toward the left side of the substrate layer.

4. The touch sensor according to claim 1, wherein the second floating trace comprises a plurality of second floating traces having different lengths.

5. The touch sensor according to claim 4, wherein the second floating traces become shorter in a direction toward the right side of the substrate layer.

6. The touch sensor according to claim 1, further comprising: Sensing column electrodes provided between the first rows of sensing electrodes and the second rows of sensing electrodes adjacent to each other; And Bridge electrodes electrically connecting adjacent sensing column electrodes among the sensing column electrodes.

7. The touch sensor according to claim 6, further comprising column traces connected to the sensing column electrodes included in the termination region of the substrate layer.

8. The touch sensor according to claim 1, wherein each of the first trace and the second trace has a stepped shape.

9. The touch sensor according to claim 1, wherein the bent portions included in the first trace and the second trace have a slanted line shape.

10. A method of manufacturing a touch sensor, comprising: Through a patterning process using a photomask, a first row of sensing electrodes, a second row of sensing electrodes, a first sub-trace extending from the left end of the first row of sensing electrodes, a first floating sub-trace provided around the first sub-trace, a second sub-trace extending from the right end of the second row of sensing electrodes, and a second floating sub-trace provided around the second sub-trace are formed on the substrate layer; and The patterning process is repeated by moving the photomask, wherein the first floating sub-trace is arranged in the leftward direction relative to the first sub-trace and the second floating sub-trace is arranged in the rightward direction relative to the second sub-trace, and the first floating sub-trace and the second floating sub-trace are spaced apart from each other by the first rows of sensing electrodes, the second rows of sensing electrodes, the first sub-trace, and the second sub-trace therebetween.

11. The method according to claim 10, wherein a plurality of the first floating sub-traces arranged along a leftward direction with respect to the first sub-trace are formed by the patterning process, and a plurality of the second floating sub-traces arranged along a rightward direction with respect to the second sub-trace are formed by the patterning process.

12. The method according to claim 11, wherein the first sub-trace formed in the nth patterning process is connected to the first floating sub-trace adjacent to the first sub-trace in the first floating sub-traces formed in the (n + 1)th patterning process, and n is an integer greater than or equal to 2.

13. The method according to claim 11, wherein the first floating sub-trace adjacent to the first sub-trace in the first floating sub-traces formed in the nth patterning process is connected to the outermost first floating sub-trace in the first floating sub-traces formed in the (n + 1)th patterning process, and n is an integer greater than or equal to 2.

14. The method according to claim 11, wherein the second sub-trace formed in the nth patterning process is connected to the second floating sub-trace adjacent to the second sub-trace in the second floating sub-traces formed in the (n + 1)th patterning process, and n is an integer greater than or equal to 2.

15. The method according to claim 11, wherein the second floating sub-trace adjacent to the second sub-trace in the second floating sub-traces formed in the nth patterning process is connected to the outermost second floating sub-trace in the second floating sub-traces formed in the (n + 1)th patterning process, and n is an integer greater than or equal to 2.

16. The method according to claim 11, wherein sensing column electrodes spaced apart from each other are further formed between the first sensing electrode row and the second sensing electrode row by the patterning process.

17. A window stack structure, comprising: Window substrate; The touch sensor according to claim 1, stacked on the window substrate; And A polarization layer located between the window substrate and the touch sensor or provided on the touch sensor.

18. An image display device, comprising: Display panel; And The touch sensor according to claim 1, stacked on the display panel.

Images