Tail gas absorption device and method

Abstract

The present invention discloses a tail gas absorption device, comprising: a first reactor, a second reactor, a first high-level tank and a second high-level tank; wherein the first reactor is used for chemical reaction; the exhaust port of the first reactor is connected to the air inlet of the first high-level tank through a pipeline; the exhaust port of the first high-level tank is connected to the air inlet of the second reactor through a pipeline; the second reactor is filled with absorption liquid, which is responsible for tail gas absorption; the exhaust port of the second reactor is connected to the air inlet of the second high-level tank through a pipeline; the second high-level tank is filled with absorption liquid, which is responsible for tail gas absorption and replacement of absorption liquid; the discharge port of the second high-level tank is connected to the liquid replacement port of the second reactor through a pipeline. The present invention discloses a tail gas absorption method using the above device. The tail gas absorption device and method of the present invention have the advantages of wide applicability, good airtightness, good absorption effect, prevention of gas leakage when replacing absorption liquid, and prevention of back suction.

Description

Technical Field

[0001] The invention belongs to the technical field of chemical reaction equipment, and in particular relates to a tail gas absorption device and method. Background Art

[0002] In the chemical industry, more and more attention is paid to environmental protection issues. In the chemical production process, irritating and toxic gases such as ammonia, hydrogen chloride, chlorine, hydrogen sulfide, and dimethyl sulfide are often used. The treatment and emission of tail gas has always been a challenge in the chemical production field.

[0003] In traditional chemical production, the chemical tail gas in the reactor is usually directly guided through a pipeline to water, alkali washing tower and other absorption devices for treatment before being discharged into the atmosphere. This tail gas absorption device has the following main defects:

[0004] 1) Transient absorption of tail gas often fails to completely absorb the toxic and harmful substances in the tail gas;

[0005] 2) It is inconvenient to replace the absorption liquid when it reaches saturation, and it is easy to cause toxic gas leakage during replacement;

[0006] 3) The tail gas from the reactor directly enters the absorption device through a pipeline, which may easily cause back-absorption of the absorption liquid. Summary of the invention

[0007] The technical problem to be solved by the present invention is to provide a tail gas absorption device and method, which has the advantages of wide applicability, good airtightness, good absorption effect, prevention of gas leakage when replacing absorption liquid, and prevention of back suction.

[0008] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0009] A tail gas absorption device comprises: a first reaction kettle, a second reaction kettle, a first high-level tank and a second high-level tank; wherein:

[0010] The first reactor is used for chemical reaction; an exhaust port is provided at the top of the first reactor, the exhaust port of the first reactor is connected to the air inlet of the first high-level tank through a pipeline, and a first valve is installed at the exhaust port of the first reactor;

[0011] The air inlet of the first high-level tank is located at the upper part of the first high-level tank, and an exhaust port is provided at the bottom of the first high-level tank; the exhaust port of the first high-level tank is connected to the air inlet of the second reactor through a pipeline;

[0012] The second reactor is filled with an absorption liquid, which is responsible for tail gas absorption; the air inlet of the second reactor is located at the upper part of the second reactor, and the air inlet of the second reactor extends to the bottom of the second reactor through a pipeline in the second reactor to form a first bottom-inserted pipe port; the upper part of the second reactor is provided with an exhaust port and a liquid replacement port; the exhaust port of the second reactor is connected to the air inlet of the second high-level tank through a pipeline, and the exhaust port of the second reactor is installed with a second valve;

[0013] The second high-level tank is filled with absorption liquid, which is responsible for tail gas absorption and replacement of absorption liquid; the air inlet of the second high-level tank is located at the upper part of the second high-level tank, and the air inlet of the second high-level tank extends to the bottom of the second high-level tank through a pipeline in the second high-level tank to form a second bottom-inserted pipe port; a discharge port is provided at the bottom of the second high-level tank; the discharge port of the second high-level tank is connected to the liquid exchange port of the second reactor through a pipeline, and the discharge port of the second high-level tank is installed with a third valve.

[0014] Specifically, the exhaust gas generated in the first reactor is guided from the exhaust port of the first reactor through a pipeline to the air inlet of the first high-level tank, and enters the first high-level tank; then guided from the exhaust port of the first high-level tank through a pipeline to the air inlet of the second reactor, and discharged from the first bottom pipe port, and absorbed by the absorption liquid in the second reactor.

[0015] Specifically, the first reactor also has a feed inlet for inputting reaction materials, a discharge port for outputting reaction materials, and a stirring device for stirring reaction materials. Preferably, the exhaust port of the first reactor is arranged at the top of the first reactor. Preferably, the feed inlet of the first reactor is arranged at the top of the first reactor. Preferably, the discharge port of the first reactor is arranged at the bottom of the first reactor.

[0016] Specifically, the first high-level tank is located above the first reactor and the second reactor in the vertical direction. The exhaust port of the first high-level tank is higher than the air inlet of the second reactor. Preferably, the exhaust port of the first high-level tank is also higher than the exhaust port of the first reactor. Using the first high-level tank as a buffer container between the second reactor and the first reactor can effectively prevent the absorption liquid from being sucked back into the first reactor, thereby contaminating the materials in the first reactor.

[0017] Preferably, the exhaust port of the first high-level tank is provided with a valve. Preferably, the air inlet of the first high-level tank is arranged at the top of the first high-level tank.

[0018] Preferably, the air inlet of the second reactor is equipped with a first one-way valve, which allows air to pass from the exhaust port of the first header tank to the air inlet of the second reactor, but prevents air from passing from the air inlet of the second reactor to the exhaust port of the first header tank. The first one-way valve can further prevent the absorption liquid from being sucked back into the pipeline, thereby contaminating the pipeline.

[0019] Specifically, the second reactor also has a feed inlet for inputting the absorption liquid, a discharge port for outputting the absorption liquid, and a stirring device for stirring the absorption liquid. The tail gas discharged from the first bottom-insulated pipe port is first absorbed by the absorption liquid in the second reactor. The stirring device can increase the contact area between the absorption liquid and the air, which helps to further absorb the toxic gas that escapes into the upper space of the second reactor. Preferably, the air inlet of the second reactor is located at the top of the second reactor. Preferably, the discharge port of the second reactor is located at the bottom of the second reactor. Preferably, the feed inlet of the second reactor is located at the top of the second reactor. Preferably, the liquid exchange port of the second reactor is located at the top of the second reactor.

[0020] Preferably, the second reactor has a nitrogen inlet for inputting nitrogen. By inputting nitrogen, the residual toxic gas in the second reactor can be guided to the second high-level tank for absorption. At the same time, the saturated absorption liquid in the second reactor can be discharged, and the absorption liquid in the second high-level tank can be transported to the second reactor, which can prevent the leakage of toxic gas when replacing the absorption liquid.

[0021] Specifically, the second high-level tank is located above the second reactor in the vertical direction. The discharge port of the second high-level tank is higher than the liquid exchange port of the second reactor. The absorption liquid in the second high-level tank can be transported to the second reactor through the pipeline between the discharge port of the second high-level tank and the liquid exchange port of the second reactor by the weight of the material itself.

[0022] Preferably, the air inlet of the second high-level tank is located at the top of the second high-level tank.

[0023] Specifically, the air inlet of the second header tank is equipped with a second one-way valve, which allows air to pass from the exhaust port of the second reactor to the air inlet of the second header tank, but prevents air from passing from the air inlet of the second header tank to the exhaust port of the second reactor. The second one-way valve can prevent the absorption liquid in the second header tank from being sucked back into the pipeline or the second reactor.

[0024] Specifically, the second high-level tank also has a feed port for inputting the absorption liquid, and a stirring device for stirring the absorption liquid.

[0025] Specifically, the pipelines between the first reactor and the first header tank, between the first header tank and the second reactor, and between the second reactor and the second header tank are hard pipelines that can withstand a pressure of 0.5-1.0 MPa.

[0026] Preferably, the hard pipeline is made of steel-lined polytetrafluoroethylene pipe.

[0027] In order to solve the above problems, the present invention also provides a tail gas absorption method, which comprises:

[0028] The aforementioned tail gas absorption device is used to transport the toxic gas generated in the first reactor to the first high-level tank via a pipeline, and then to the second reactor via a pipeline, and is absorbed by the absorption liquid in the second reactor; when the absorption liquid in the second reactor is close to or reaches absorption saturation, the first valve is closed, and the absorption liquid in the second reactor is discharged from the discharge port of the second reactor, and then the second valve is closed and the third valve is opened, and the absorption liquid in the second high-level tank is transported to the second reactor, and then the third valve is closed and the second valve and the first valve are opened to continue the tail gas absorption operation.

[0029] Preferably, the second reactor has a nitrogen inlet for inputting nitrogen; after closing the first valve, nitrogen is input into the second reactor through the nitrogen inlet, and the residual toxic gas in the second reactor is guided to the second high-level tank for absorption, and then the absorption liquid in the second reactor is discharged from the discharge port of the second reactor. By inputting nitrogen, the leakage of toxic gas can be further prevented when replacing the absorption liquid.

[0030] Preferably, when the tail gas absorption operation is continued, the absorption liquid can be re-injected into the second high-level tank for the next absorption liquid replacement operation.

[0031] The tail gas absorption device and method provided by the present invention has a first high-level tank between the first reactor responsible for chemical reaction and the second reactor responsible for absorbing tail gas, which can effectively prevent the back suction of the absorption liquid. The height difference between the first high-level tank and the second reactor in the vertical direction is also conducive to preventing back suction.

[0032] The tail gas absorption device and method provided by the present invention have a bidirectional connection between the second reactor and the second high-level tank. When the absorption liquid in the second reactor needs to be replaced, the absorption liquid stored in the second high-level tank can be conveniently transported to the second reactor. The absorption liquid can be replaced by adjusting the second valve and the third valve, which can effectively avoid the leakage of toxic gases during liquid replacement.

[0033] The tail gas absorption device and method provided by the present invention have better tail gas absorption effect through continuous absorption by the second reaction kettle and the second high-level tank.

[0034] The tail gas absorption device and method provided by the present invention have wide applicability and are suitable for absorbing most gases including ammonia, hydrogen chloride, chlorine, hydrogen sulfide and dimethyl sulfide.

[0035] The tail gas absorption device provided by the present invention has a simple structure and is easy to operate.

[0036] In this application, "high-level tank" refers to a tank that can pressurize and deliver materials only by relying on the weight of the materials themselves. The high-level tank is usually located at a high point in the system relative to adjacent components or other components in the system. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 It is a schematic structural diagram of a specific embodiment of the tail gas absorption device of the present invention.

[0038] Description of symbols in the accompanying drawings:

[0039] R1 is the first reactor;

[0040] R2 is the second reactor;

[0041] H1 is the first high-level trough;

[0042] H2 is the second highest trough;

[0043] 2a, 3a, and 4a are air inlets;

[0044] 1b, 2b, and 3b are air outlets;

[0045] 3c is the first bottom plugging pipe opening;

[0046] 4c is the second bottom plug pipe opening;

[0047] 1d, 3d, and 4d are discharge ports;

[0048] 1e, 3e, and 4e are feed ports;

[0049] 3f is the material change port;

[0050] 3g is the nitrogen input port;

[0051] 5a is the first valve;

[0052] 5b is the second valve;

[0053] 5c is the third valve;

[0054] 5d is the fourth valve;

[0055] 6a is a first one-way valve;

[0056] 6b is a second one-way valve. DETAILED DESCRIPTION

[0057] The technical solution of the present invention will be described clearly and completely below. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0058] Embodiment 1

[0059] like Figure 1 As shown, a tail gas absorption device includes: a first reactor R1, a second reactor R2, a first high-level tank H1 and a second high-level tank H2. The first reactor R1 is used for chemical reaction, and an exhaust port 1b is provided at the upper part of the first reactor R1. The exhaust port 1b of the first reactor R1 is connected to the air inlet 2a of the first high-level tank through a pipeline, and the exhaust port 1b of the first reactor R1 is installed with a first valve 5a; the air inlet 2a of the first high-level tank H1 is located at the upper part of the first high-level tank H1, and an exhaust port 2b is provided at the bottom of the first high-level tank H1; the exhaust port 2b of the first high-level tank H1 is connected to the air inlet 3a of the second reactor R2 through a pipeline; the second reactor R2 is filled with absorption liquid, which is responsible for tail gas absorption; the air inlet 3a of the second reactor R2 is located at the upper part of the second reactor R2, and the air inlet 3a of the second reactor R2 extends to the bottom of the second reactor R2 through a pipeline in the second reactor R2 to form a first bottom-inserted pipe port 3c; an exhaust port 3b and a liquid exchange port 3f are provided at the upper part of the second reactor R2; the exhaust port 3b of the second reactor R2 is connected to the air inlet 4a of the second high-level tank H2 through a pipeline, and the exhaust port 3b of the second reactor R2 is installed with a second valve 5b; the second high-level tank H2 is filled with absorption liquid, which is responsible for tail gas absorption and replacement of the absorption liquid; the air inlet 4a of the second high-level tank H2 is located at the upper part of the second high-level tank H2, and the air inlet 4a of the second high-level tank H2 extends to the bottom of the second high-level tank H2 through a pipeline in the second high-level tank H2 to form a second bottom-inserted pipe port 4c; a discharge port 4d is provided at the bottom of the second high-level tank H2; the discharge port 4d of the second high-level tank H2 is connected to the liquid exchange port 3f of the second reactor R2 through a pipeline, and the discharge port 4d of the second high-level tank H2 is installed with a third valve 5c.

[0060] In the tail gas absorption device of this embodiment, the first reactor R1 is responsible for chemical reaction, and the second reactor R2 is mainly responsible for absorbing tail gas. A first high-level tank H1 is set between the two to play a buffering role, which can effectively prevent the back suction of the absorption liquid. A two-way connection is made between the second reactor R2 and the second high-level tank H2. When the absorption liquid in the second reactor R2 needs to be replaced, the absorption liquid stored in the second high-level tank H2 can be easily transported to the second reactor R2. When replacing the absorption liquid, the second valve 5b can be adjusted to close and the third valve 5c can be adjusted to open. The absorption liquid stored in the second high-level tank H2 can pass through the discharge port 4d of the second high-level tank H2 and the third valve 5c in turn along the pipeline into the liquid replacement port 3f of the second reactor R2, which can effectively avoid the leakage of toxic gases during liquid replacement.

[0061] like Figure 1 As shown, in the tail gas absorption device, the tail gas generated in the first reactor R1 is guided from the exhaust port 1b of the first reactor R1 to the air inlet 2a of the first high-level tank H1 through the pipeline, and enters the first high-level tank H1; then, the tail gas is guided from the exhaust port 2b of the first high-level tank H1 to the air inlet 3a of the second reactor R2 through the pipeline, and is discharged from the first bottom-inserted pipe port 3c extending from the air inlet 3a to the bottom of the reactor, and is absorbed by the absorption liquid in the second reactor R2. The absorption liquid in the second reactor R2 is stirred by a stirring device, which is conducive to improving the absorption efficiency of toxic gases. When the absorption liquid is close to or reaches saturation, a small amount of toxic gas will escape to the upper space of the second reactor R2, and is guided to the air inlet 4a of the second high-level tank H2 through the exhaust port 3 of the second reactor R2 through the pipeline, and is discharged from the second bottom-inserted pipe port 4c extending from the air inlet 4a to the bottom of the reactor, and is absorbed by the absorption liquid in the second high-level tank H2. At this time, the absorption liquid in the second reactor R2 needs to be replaced. The replacement operation is as follows: the absorption liquid in the second reactor R2 is discharged through the discharge port 3d of the second reactor R2, and then the third valve 5c is opened to transfer the absorption liquid in the second high-level tank H2 to the second reactor R2, so as to replace the absorption liquid in the second reactor R2. Then the third valve 5c is closed, and new absorption liquid is input into the second high-level tank H2 through the feed port 4e of the second high-level tank H2. The sealing performance of the liquid replacement operation is good, which can effectively prevent the leakage of toxic gas during liquid replacement.

[0062] The first reactor R1 also has a feed port 1e for inputting reaction materials, a discharge port 1d for outputting reaction materials, and a stirring device for stirring the reaction materials. Figure 1The stirring paddle in the first reactor R1 is shown in the figure. As a preferred embodiment, the exhaust port 1b of the first reactor R1 is arranged at the top of the first reactor R1, which is conducive to the discharge of toxic gases generated in the reactor. As a preferred embodiment, the feed port 1e of the first reactor R1 is arranged at the top of the first reactor R1, which is conducive to the feeding operation. As a preferred embodiment, the discharge port 1d of the first reactor R1 is arranged at the bottom of the first reactor, which is conducive to the material in the first reactor R1 to discharge the reactor by gravity.

[0063] The connecting pipe between the discharge port 1d of the first reactor R1 and the feed port 2a of the first high-level tank H1 is provided with a first valve 5a, and the poisonous gas in the first reactor R1 is regulated to be transported to the first high-level tank H1 by opening / closing the first valve 5a. As a preferred embodiment, the first valve 5a is a regulating valve, which can adjust the speed of the gas flow by controlling the opening of the valve.

[0064] The first high-level tank H1 is located above the first reactor R1 and the second reactor R2 in the vertical direction. Figure 1 As shown in FIG. 1 , as a preferred embodiment, the exhaust port 2b of the first high-level tank H1 is higher than the air inlet 3a of the second reactor R2. Figure 1 As shown, as a preferred embodiment, the exhaust port 2b of the first high-level tank H1 is also higher than the exhaust port 1b of the first reactor R1. The vertical height difference between the first high-level tank H1 and the second reactor R2 is also conducive to preventing back suction. Using the first high-level tank H1 as a buffer container between the second reactor R2 and the first reactor R1 can effectively prevent the absorption liquid from being sucked back into the first reactor R1, thereby preventing the material in the first reactor R1 from being contaminated. Figure 1 As shown, as a preferred embodiment, the exhaust port 2b of the first high-level tank H1 is provided with a valve, namely the fourth valve 5d, and the pipeline switch from the first high-level tank H1 to the second reactor R2 can be quickly controlled by adjusting the fourth valve 5d. Figure 1 As shown, as a preferred embodiment, the air inlet 2a of the first high-level tank H1 is arranged at the top of the first high-level tank H1.

[0065] As a preferred embodiment, Figure 1 As shown, the air inlet 3a of the second reactor R2 is equipped with a first one-way valve 6a, which only allows air to pass from the first high-level tank H1 to the second reactor R2, and restricts air from passing from the second reactor R2 to the first high-level tank H1. The first one-way valve 6a can further prevent the absorption liquid from being sucked back into the pipeline, thereby preventing the pipeline from being contaminated.

[0066] like Figure 1As shown, the second reactor R2 also has a feed port 3e for inputting the absorption liquid, a discharge port 3d for outputting the absorption liquid, and a stirring device for stirring the absorption liquid. Figure 1 The stirring blade in the second reactor R2 is shown in FIG. The tail gas discharged from the first bottom-insulated pipe port is first absorbed by the absorption liquid in the second reactor. The stirring device can promote the absorption efficiency of the toxic gas. Figure 1 As shown in FIG. 1 , as a preferred embodiment, the air inlet 3a of the second reactor R2 is located at the top of the second reactor R2. Figure 1 As shown in FIG. 1 , as a preferred embodiment, the discharge port 3d of the second reactor R2 is located at the bottom of the second reactor R2, which is conducive to the material in the reactor being discharged from the reactor by gravity. Figure 1 As shown in FIG. 1 , as a preferred embodiment, the feed port 3e of the second reactor R2 is located at the top of the second reactor R2, which is convenient for the feeding operation. Figure 1 As shown, as a preferred embodiment, the liquid exchange port 3f of the second reactor R2 is located at the top of the second reactor R2, which is conducive to the transported absorption liquid flowing into the second reactor R2 by gravity.

[0067] like Figure 1 As shown, as a preferred embodiment, the second reactor R2 has a nitrogen inlet 3g for inputting nitrogen. Nitrogen can be input into the second reactor R2 through the nitrogen inlet 3g, so as to achieve the purpose of guiding the residual toxic gas in the second reactor R2 to the second header tank H2 for absorption. The nitrogen inlet 3g is mainly used when the absorption liquid in the second reactor R2 is replaced. When the absorption liquid in the second reactor R2 is replaced, first keep the second valve 5b open and the third valve 5c closed, use the nitrogen inlet 3g to purge nitrogen into the second reactor R2, and purge the residual toxic gas in the second reactor R2 into the second high-level tank H2 for absorption; then, stop purging nitrogen, close the second valve 5b and open the third valve 5c, so that the absorption liquid in the second high-level tank H2 flows into the second reactor R2 to achieve the replacement of the absorption liquid; finally, open the second valve 5b and close the third valve 5c, and re-inject the absorption liquid into the second high-level tank H2, and the second reactor R2 can also restart the tail gas absorption operation. The method of purging nitrogen into the second reactor R2 using the nitrogen inlet 3g can further promote the adsorption of residual toxic gases and prevent the leakage of toxic gases when replacing the absorption liquid.

[0068] like Figure 1As shown, the second high-level tank H2 is located above the second reactor R2 in the vertical direction. The discharge port 4d of the second high-level tank H2 is higher than the liquid exchange port 3f of the second reactor R2. The absorption liquid in the second high-level tank H2 can be transported to the second reactor R2 through the pipeline between the discharge port 4d of the second high-level tank H2 and the liquid exchange port 3f of the second reactor R2 by the weight of the material itself. Figure 1 As shown in FIG. 1 , as a preferred embodiment, the air inlet 4a of the second high-level tank H2 is located at the top of the second high-level tank H2. Figure 1 As shown in the figure, as a preferred embodiment, the air inlet of the second high-level tank H2 is equipped with a second one-way valve 6b, which allows air to pass from the exhaust port 3b of the second reactor R2 to the air inlet 4a of the second high-level tank H2, but prevents air from passing from the air inlet 4a of the second high-level tank H2 to the exhaust port 3b of the second reactor R2. The second one-way valve 6b can prevent the absorption liquid in the second high-level tank H2 from being sucked back into the pipeline or the second reactor R2. Figure 1 As shown, as a preferred embodiment, the second high-level tank H2 also has a feed port 4e for inputting the absorption liquid, and a stirring device for stirring the absorption liquid.

[0069] As a preferred embodiment, in the tail gas absorption device of this embodiment, the pipelines between the first reactor R1 and the first high-level tank H1, between the first high-level tank H1 and the second reactor R2, and between the second reactor R2 and the second high-level tank H2 are hard pipelines. The hard pipeline should be able to withstand a pressure of 0.5-1.0Mpa. As a preferred embodiment, the hard pipeline is made of steel-lined polytetrafluoroethylene pipes.

[0070] In summary, the above embodiments are only preferred embodiments of the present invention and are not intended to limit the protection scope of the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A tail gas absorption device, characterized in that: include: The first reactor, the second reactor, the first high-level tank and the second high-level tank; wherein, The first reactor is used for chemical reaction; an exhaust port is provided at the top of the first reactor, the exhaust port of the first reactor is connected to the air inlet of the first high-level tank through a pipeline, and a first valve is installed at the exhaust port of the first reactor; The air inlet of the first high-level tank is located at the upper part of the first high-level tank, and an exhaust port is provided at the bottom of the first high-level tank; the exhaust port of the first high-level tank is connected to the air inlet of the second reactor through a pipeline; The second reactor is filled with an absorption liquid, which is responsible for tail gas absorption; the air inlet of the second reactor is located at the upper part of the second reactor, and the air inlet of the second reactor extends to the bottom of the second reactor through a pipeline in the second reactor to form a first bottom-inserted pipe port; the upper part of the second reactor is provided with an exhaust port and a liquid replacement port; the exhaust port of the second reactor is connected to the air inlet of the second high-level tank through a pipeline, and the exhaust port of the second reactor is installed with a second valve; The second high-level tank is filled with absorption liquid, which is responsible for tail gas absorption and replacement of absorption liquid; the air inlet of the second high-level tank is located at the upper part of the second high-level tank, and the air inlet of the second high-level tank extends to the bottom of the second high-level tank through a pipeline in the second high-level tank to form a second bottom-inserted pipe port; a discharge port is provided at the bottom of the second high-level tank; the discharge port of the second high-level tank is connected to the liquid replacement port of the second reactor through a pipeline, and a third valve is installed at the discharge port of the second high-level tank; The first high-level tank is located above the first reactor and the second reactor in the vertical direction; The second reactor has a nitrogen inlet for inputting nitrogen; The second high-level tank is located above the second reactor in the vertical direction; the discharge port of the second high-level tank is higher than the liquid replacement port of the second reactor.

2. The tail gas absorption device according to claim 1, characterized in that: The exhaust gas generated in the first reactor is guided from the exhaust port of the first reactor to the air inlet of the first high-level tank through a pipeline, and enters the first high-level tank; then guided from the exhaust port of the first high-level tank to the air inlet of the second reactor through a pipeline, and discharged from the first bottom pipe port, and absorbed by the absorption liquid in the first reactor.

3. The tail gas absorption device according to claim 1, characterized in that: The air inlet of the second reactor is equipped with a first one-way valve, which allows air to pass from the exhaust port of the first high-level tank to the air inlet of the second reactor, but blocks air from the air inlet of the second reactor to the exhaust port of the first high-level tank.

4. The tail gas absorption device according to claim 1, characterized in that: The second reaction kettle also has a feed port for inputting the absorption liquid, a discharge port for outputting the absorption liquid, and a stirring device for stirring the absorption liquid.

5. The tail gas absorption device according to claim 1, characterized in that: The air inlet of the second high-level tank is installed with a second one-way valve, which allows air to pass from the exhaust port of the second reactor to the air inlet of the second high-level tank, but prevents air from passing from the air inlet of the second high-level tank to the exhaust port of the second reactor.

6. The tail gas absorption device according to claim 1, characterized in that: The second high-level tank also has a feed inlet for inputting the absorption liquid and a stirring device for stirring the absorption liquid.

7. The tail gas absorption device according to claim 1, characterized in that: The pipelines between the first reactor and the first high-level tank, between the first high-level tank and the second reactor, and between the second reactor and the second high-level tank are made of hard pipelines.

8. The tail gas absorption device according to claim 7, characterized in that: The hard pipeline is made of steel-lined polytetrafluoroethylene pipe.

9. A tail gas absorption method, the method being carried out using the tail gas absorption device according to claim 1, characterized in that: The method comprises: The toxic gas generated in the first reactor is transported to the first high-level tank through a pipeline, and then transported to the second reactor through a pipeline to be absorbed by the absorption liquid in the second reactor; When the absorption liquid in the second reactor approaches or reaches absorption saturation, the first valve is closed to discharge the absorption liquid in the second reactor from the discharge port of the second reactor; Then, the second valve is closed and the third valve is opened to transport the absorption liquid in the second high-level tank to the second reactor; Then close the third valve and open the second valve and the first valve to continue the tail gas absorption operation.

10. The method according to claim 9, characterized in that The second reactor has a nitrogen inlet for inputting nitrogen; when the first valve is closed, nitrogen is input into the second reactor through the nitrogen inlet, and the residual toxic gas in the second reactor is guided to the second high-level tank for absorption, and then the absorption liquid in the second reactor is discharged from the discharge port of the second reactor.

11. The method according to claim 9, characterized in that When the tail gas absorption operation is continued, the absorption liquid can be re-injected into the second high-level tank for the next absorption liquid replacement operation.

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