A helium-3 gas purification device

Abstract

The present invention discloses a helium-3 gas purification device, which relates to the fields of cryogenic technology, energy, and safety detection technology. The helium-3 gas purification device includes a main body, a gas processing unit, a primary cooling unit, and a secondary cooling unit. The main body defines a vacuum chamber. The two ends of the gas processing unit are arranged outside the main body, and the middle part of the gas processing unit is arranged in the vacuum chamber. The gas processing unit is used to purify the helium-3 gas mixture. The primary cooling unit is arranged in the vacuum chamber, and the primary cooling unit is used to cool the helium-3 gas mixture to a first preset temperature. The secondary cooling unit is arranged in the vacuum chamber, and the secondary cooling unit is used to cool the helium-3 gas mixture to a second preset temperature, which is lower than the first preset temperature, and the second preset temperature is not greater than 10K. The helium-3 gas purification device of the present invention can achieve multiple and efficient helium-3 purifications, and the device is simpler, requires fewer supporting auxiliary equipment, and the working process is less time-consuming, thereby saving manpower and equipment costs.

Description

Technical Field

[0001] The present invention relates to the fields of cryogenic technology, energy, and safety detection technology, and in particular to a helium-3 gas purification device. Background Art

[0002] Helium-3 gas is an isotope of helium. Its content in nature is very rare. Existing helium-3 is generally obtained through the decay of products of nuclear reactions. Helium-3 also plays a very important role in low-temperature physics experiments, cryogenic engineering, etc. After the tritium produced by the nuclear reaction decays after a half-life of 12.5 years, helium-3 gas can be obtained. However, at this time, the helium-3 is also mixed with the radioactive gas tritium and cannot be used directly. In the existing technology, a filter membrane made of metal palladium is often used to repeatedly clean the mixed gas containing tritium. However, the number of filtration and cleaning times of this method is limited, making it difficult to completely filter out tritium. In addition, the entire filtration and cleaning process is time-consuming, labor-intensive, and very costly.

[0003] Therefore, there is an urgent need for a helium-3 gas purification device that can improve the purification effect and efficiency of helium-3 and reduce the purification cost of helium-3. Summary of the Invention

[0004] The purpose of the present invention is to provide a helium-3 gas purification device that can improve the purification effect and efficiency of helium-3 and reduce the purification cost of helium-3.

[0005] In order to achieve the above technical effects, the technical solutions of the present invention are as follows:

[0006] A helium-3 gas purification device comprises: a main body, the main body defining a vacuum chamber; a gas processing unit, two ends of the gas processing unit being arranged outside the main body, a middle portion of the gas processing unit being arranged in the vacuum chamber, the gas processing unit being used to purify the helium-3 gas mixture; a first-stage cooling unit, the first-stage cooling unit being arranged in the vacuum chamber, the first-stage cooling unit being used to cool the helium-3 gas mixture to a first preset temperature; and a second-stage cooling unit, the second-stage cooling unit being arranged in the vacuum chamber, the second-stage cooling unit being used to cool the helium-3 gas mixture to a second preset temperature, the second preset temperature being lower than the first preset temperature and not greater than 10K.

[0007] Furthermore, the gas processing unit includes a filter cold trap, in which an adsorption structure is provided. The adsorption structure is used to adsorb particles in the helium-tri-gas mixture that are solidified at the second preset temperature. The filter cold trap is provided in the secondary cooling unit.

[0008] Furthermore, the secondary cooling unit includes: a secondary thermal radiation insulation cavity, which is arranged in the primary cooling unit; a secondary cold plate, which is arranged on the top wall of the secondary thermal radiation insulation cavity, and the filtered cold trap is passed through the secondary cold plate and extends into the secondary thermal radiation insulation cavity.

[0009] Furthermore, the first-level cooling unit includes: a first-level thermal radiation insulation cavity; a first-level cold plate, the first-level cold plate is arranged on the top wall of the first-level thermal radiation insulation cavity, and the gas processing unit also includes a refrigeration body, the refrigeration body is passed through the first-level cold plate and extends into the first-level thermal radiation insulation cavity.

[0010] Furthermore, the helium-3 gas purification device also includes a precooling unit, which is arranged in the vacuum chamber and located between the first-level cooling unit and the second-level cooling unit. The precooling unit is used to precool the gas in the gas processing unit.

[0011] Furthermore, the pre-cooling unit includes: a cold head and a pre-cooling heat exchanger, the cold head is arranged on the main body, the pre-cooling heat exchanger is arranged in the vacuum chamber and connected to the cold head, and the gas processing unit includes an air supply pipe wound around the pre-cooling heat exchanger.

[0012] Furthermore, the helium-3 gas purification device also includes a collecting mechanism, which is connected to the gas outlet end of the gas processing unit and is used to collect the gas discharged from the gas processing unit.

[0013] Furthermore, the helium-3 gas purification device also includes a radiation shield, the main body is arranged on the inner side of the radiation shield, and both ends of the gas processing unit extend out of the outer side of the radiation shield.

[0014] Furthermore, the helium-3 gas purification device also includes a safety pressure relief valve, and the main body and the gas processing unit are respectively provided with the safety pressure relief valve.

[0015] Furthermore, the helium-3 gas purification device also includes a bypass pipeline, which is arranged on the outside of the main body, and the two ends of the bypass pipeline are respectively connected to the two ends of the gas processing unit, and a bypass valve is provided in the bypass pipeline.

[0016] The beneficial effects of the present invention are as follows: The helium-3 gas purification device of the present invention, through treatment with a primary cooling unit and a secondary cooling unit, can solidify various impurity elements such as nitrogen and tritium in the helium-3 gas mixture, thereby producing relatively pure and safe commercial helium-3 gas. Compared to the prior art method of using a multi-layer palladium filter membrane to filter tritium to purify helium-3, the helium-3 gas purification device of this embodiment can achieve multiple and efficient helium-3 purifications. Furthermore, the device is simpler, requires less supporting equipment, and consumes less time during operation, thereby saving manpower and equipment costs.

[0017] Additional aspects and advantages of the present invention will be set forth in part in the description which follows and, in part, will be obvious from the description which follows, or may be learned by practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural schematic diagram of a helium-3 gas purification device provided in a specific embodiment of the present invention.

[0019] Reference numerals

[0020] 1. Main body; 11. Vacuum chamber;

[0021] 2. Gas processing unit; 21. Filter cold trap; 22. Refrigeration body; 23. Air supply pipe; 24. Air inlet valve; 25. Air outlet pipe;

[0022] 3. First-level cooling unit; 31. First-level heat radiation insulation cavity; 32. First-level cold plate;

[0023] 4. Secondary cooling unit; 41. Secondary thermal radiation insulation cavity; 42. Secondary cold plate;

[0024] 51. Cold head; 52. Pre-cooling heat exchanger; 53. Thermal conductivity switch; 54. Temperature controller;

[0025] 6. Collection agencies;

[0026] 71. Radiation shield; 72. Radiation monitor;

[0027] 8. Safety pressure relief valve;

[0028] 9. Bypass line; 91. Bypass pipe; 92. Bypass valve; 93. Pressure gauge. DETAILED DESCRIPTION

[0029] In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved more clear, the technical solutions of the present invention are further described below with reference to the accompanying drawings and through specific implementation methods.

[0030] In the description of the present invention, unless otherwise expressly specified or limited, the terms "connected," "connected," and "fixed" should be understood in a broad sense. For example, they may refer to fixed connections, detachable connections, or integration; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention in specific circumstances.

[0031] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Furthermore, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0032] It should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In the description of the present invention, unless otherwise specified, "multiple" means two or more. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0033] Reference below Figure 1 The specific structure of the helium-3 gas purification device according to an embodiment of the present invention is described.

[0034] like Figure 1 As shown, Figure 1Disclosed is a helium-3 gas purification device, comprising a main body 1, a gas processing unit 2, a primary cooling unit 3, and a secondary cooling unit 4. The main body 1 defines a vacuum chamber 11. Both ends of the gas processing unit 2 are disposed outside the main body 1, and the middle portion of the gas processing unit 2 is disposed within the vacuum chamber 11. The gas processing unit 2 is configured to purify a helium-3 gas mixture. The primary cooling unit 3 is disposed within the vacuum chamber 11 and is configured to cool the helium-3 gas mixture to a first preset temperature. The secondary cooling unit 4 is disposed within the vacuum chamber 11 and is configured to cool the helium-3 gas mixture to a second preset temperature, the second preset temperature being lower than the first preset temperature and not greater than 10K.

[0035] It can be understood that the vacuum chamber 11 defined by the main body 1 can accommodate the gas processing unit 2, the first-stage cooling unit 3 and the second-stage cooling unit 4, thereby providing a relatively safe and reliable operating space for the purification of helium-3 gas. The first-stage cooling unit 3 and the second-stage cooling unit 4 can refrigerate the helium-3 mixture in the gas processing unit 2 in sections, and can solidify other gases in the helium-3 mixture in sequence. For example, impurities such as nitrogen can be solidified at the first-stage cooling unit 3 to improve the purity of the helium-3 mixture entering the second-stage cooling unit 4. It is also beneficial to ensure that the helium-3 mixture can reach below 10K under the refrigeration of the second-stage cooling unit 4, thereby facilitating the refrigeration of the helium-3 mixture. In addition, the first-stage cooling unit 3 and the second-stage cooling unit 4 are only provided with two refrigeration processes, which can reduce the refrigeration process of the helium-3 mixture and simplify the overall structure of the device. When the helium-trimix is cooled to the second preset temperature under the action of the secondary cooling unit 4, since the second preset temperature is not greater than 10K and the solidification temperature of tritium in the helium-trimix is 19K, the tritium in the helium-trimix within the gas processing unit 2 located in the secondary cooling unit 4 will be solidified in the gas processing unit 2. Therefore, the gas in the gas processing unit 2 output from the secondary cooling unit 4 only includes helium-trigas, thereby better achieving the purification of helium-trigas in the helium-trimix.

[0036] The helium-3 gas purification device of this embodiment, through treatment by the primary cooling unit 3 and the secondary cooling unit 4, can solidify various impurity elements such as nitrogen and tritium in the helium-3 gas mixture, thereby producing relatively pure and safe commercial helium-3 gas. Compared to the prior art method of using multi-layer palladium membranes to filter tritium to purify helium-3, the helium-3 gas purification device of this embodiment can achieve multiple and efficient helium-3 purifications. It is also simpler, requires less supporting equipment, and consumes less time during the operation, thus saving labor and equipment costs.

[0037] In some embodiments, as Figure 1As shown, the gas processing unit 2 includes a filter cold trap 21, in which an adsorption structure is provided. The adsorption structure is used to adsorb particles in the helium-tricarbone gas that have solidified at a second preset temperature. The filter cold trap 21 is provided in the secondary cooling unit 4.

[0038] It is understood that an additional filter cold trap 21 is provided in the gas processing unit 2, and an adsorption structure capable of adsorbing and solidifying impurity elements such as tritium is disposed within the filter cold trap 21. Furthermore, when the adsorption capacity of the adsorption structure approaches its upper limit, the user can re-ensure the adsorption of tritium in the gas processing unit 2 by replacing the filter cold trap 21. This conveniently enables repeated adsorption of impurity elements such as tritium, ensuring multiple uses of the helium-3 gas purification device. Furthermore, the cost of replacing the adsorption structure is low, which also reduces the cost of helium-3 purification.

[0039] It should be noted that, in this embodiment, the filter cold trap 21 refers to a structure for adsorbing and filtering solid tritium gas, which can be detachably arranged in the gas processing unit 2, so as to facilitate user replacement to ensure that the radiation of the solid tritium gas in the filter cold trap 21 will not cause harm to the human body.

[0040] Specifically, in this embodiment, the adsorption structure includes activated carbon, and the porous sponge in the activated carbon can have a good adsorption effect on the solidified tritium. Of course, in other embodiments of the present invention, the adsorption structure can also be made of other materials without being specifically limited.

[0041] In some embodiments, as Figure 1 As shown, the secondary cooling unit 4 includes a secondary heat radiation insulation cavity 41 and a secondary cold plate 42. The secondary heat radiation insulation cavity 41 is provided in the primary cooling unit 3. The secondary cold plate 42 is provided on the top wall of the secondary heat radiation insulation cavity 41. The filter cold trap 21 is provided through the secondary cold plate 42 and extends into the secondary heat radiation insulation cavity 41.

[0042] It can be understood that the secondary cold plate 42 can play a cooling role in the secondary thermal radiation insulation cavity 41, thereby reducing the temperature in the secondary thermal radiation insulation cavity 41 to the second preset temperature. Since the filter cold trap 21 is fitted in the secondary thermal radiation insulation cavity 41, it can better ensure that the temperature of the helium-3 mixture in the filter cold trap 21 reaches the second preset temperature, thereby better ensuring the solidification of tritium in the filter cold trap 21, thereby improving the purification effect of helium-3.

[0043] In some embodiments, as Figure 1 As shown, the primary cooling unit 3 includes a primary heat radiation insulation cavity 31 and a primary cold plate 32. The primary cold plate 32 is disposed on the top wall of the primary heat radiation insulation cavity 31. The gas processing unit 2 also includes a refrigeration body 22, which is disposed in the primary cold plate 32 and extends into the primary heat radiation insulation cavity 31.

[0044] It can be understood that the first-level cold plate 32 can play a cooling role in the first-level thermal radiation insulation cavity 31, thereby reducing the temperature in the first-level thermal radiation insulation cavity 31 to the first preset temperature. At the same time, since the refrigeration body 22 is fitted in the first-level thermal radiation insulation cavity 31, it can better ensure that the temperature of the helium-tri-gas mixture in the filtered cold trap 21 reaches the first preset temperature, which can not only play a first-stage cooling role on the helium-tri-gas mixture, but also can pre-filter out impurity gases such as nitrogen in the helium-tri-gas mixture, which is beneficial to the cooling of the helium-tri-gas mixture in the secondary cooling unit 4.

[0045] In addition, it should be noted that the cooling principle of the secondary cold plate 42, the secondary thermal radiation insulation cavity 41, the primary cold plate 32 and the primary thermal radiation insulation cavity 31 can be obtained based on relevant knowledge of the existing technology, and there is no need to elaborate on the cooling principle here.

[0046] In some specific embodiments, the gas processing unit 2 also includes an air inlet valve 24 and an air outlet pipe 25. The air outlet pipe 25 is connected to the filter cold trap 21. The air inlet valve 24 is arranged on the main body 1. The air inlet valve 24 can control the air supply switch of the gas processing unit 2. The air outlet pipe 25 can facilitate the delivery of gas to the outside of the main body 1, thereby better realizing the air supply function of the gas processing unit 2.

[0047] In some embodiments, as Figure 1 As shown, the helium-3 gas purification device also includes a precooling unit, which is arranged in the vacuum chamber 11 and located between the first-level cooling unit 3 and the second-level cooling unit 4. The precooling unit is used to precool the gas in the gas processing unit 2.

[0048] It can be understood that the pre-cooling unit can pre-cool the helium-3 mixture so that the temperature of the helium-3 mixture is between the first preset temperature and the second preset temperature, which can not only ensure that the secondary cooling unit 4 reduces the temperature of the helium-3 mixture to the second preset temperature, but also further filter out the impurity gas that is not completely filtered in the primary cooling unit 3 during the pre-cooling process, and better ensure that the helium-3 mixture entering the secondary cooling unit 4 is mainly composed of helium-3 and tritium, so as to improve the purification accuracy of helium-3.

[0049] In some embodiments, as Figure 1 As shown, the pre-cooling unit includes a cold head 51 and a pre-cooling heat exchanger 52. The cold head 51 is provided on the main body 1, the pre-cooling heat exchanger 52 is provided in the vacuum chamber 11 and connected to the cold head 51, and the gas processing unit 2 includes an air supply pipe 23 wound around the pre-cooling heat exchanger 52.

[0050] It is understood that the cold head 51 can cool the pre-cooling heat exchanger 52, and the air supply pipe 23 wound around the pre-cooling heat exchanger 52 can increase the contact area between the gas processing unit 2 and the pre-cooling heat exchanger 52, thereby improving the pre-cooling effect of the helium trimix. Specifically, in this embodiment, the pre-cooling heat exchanger 52 is located within the primary cooling unit 3.

[0051] In some specific embodiments, such as Figure 1 As shown, the pre-cooling unit further includes a thermal conductivity switch 53 and a temperature controller 54 arranged in the first-stage cooling unit 3, which can facilitate the adjustment of the pre-cooling temperature of the pre-cooling heat exchanger 52.

[0052] In some embodiments, as Figure 1 As shown, the helium-3 gas purification device further includes a collecting mechanism 6 , which is connected to the gas outlet end of the gas processing unit 2 , and is used to collect the gas discharged from the gas processing unit 2 .

[0053] It is understood that the collection mechanism 6 can collect the gas exhausted from the gas processing unit 2, namely, the helium-3 gas purified by the primary cooling unit 3 and the secondary cooling unit 4, thereby effectively collecting the pure helium-3 gas. Specifically, the collection mechanism 6 can be configured as a storage tank or as a pipeline connected to other processing equipment. The specific type of the collection mechanism 6 can be determined based on actual needs.

[0054] In some embodiments, as Figure 1 As shown, the helium-3 gas purification device further includes a radiation shield 71 , the main body 1 is arranged on the inner side of the radiation shield 71 , and both ends of the gas processing unit 2 extend out of the outer side of the radiation shield 71 .

[0055] It is understandable that since the helium-3 gas mixture is usually obtained through decay of the product of a nuclear reaction, it has a certain degree of radioactivity. After the main body 1 is covered with a radiation shield 71, the safety of the helium-3 purification can be improved.

[0056] In some specific embodiments, such as Figure 1 As shown, the helium-3 gas purification device further includes a radiation monitor 72 , which is provided on the radiation shield 71 . The radiation monitor 72 can monitor the radiation intensity inside the radiation shield 71 in real time to further improve the purification safety.

[0057] In some embodiments, as Figure 1 As shown, the helium-3 gas purification device further includes a safety pressure relief valve 8 , and the main body 1 and the gas processing unit 2 are respectively provided with a safety pressure relief valve 8 .

[0058] It is understandable that the pressure in the vacuum chamber 11 in the main body 1 and the air supply pipe 23 may change, and there may be a situation where the pressure in the vacuum chamber 11 and the air supply pipe 23 is too high. The safety pressure relief valve 8 can connect the vacuum chamber 11 and the gas processing unit 2 with the space in the radiation shield 71, thereby preventing safety problems caused by excessive pressure and further improving the safety of helium-3 gas purification.

[0059] In some embodiments, as Figure 1 As shown, the helium-3 gas purification device also includes a bypass pipeline 9, which is arranged on the outside of the main body 1. The two ends of the bypass pipeline 9 are respectively connected to the two ends of the gas processing unit 2. A bypass valve 92 is provided in the bypass pipeline 9.

[0060] It is understandable that during the operation of the helium-3 gas purification device, the gas purified by the secondary cooling unit 4 may still be impure. In this embodiment, by providing a bypass line 9, the helium-3 mixed gas that does not meet the required purity can be transported to the end connecting the gas processing unit 2 and the primary cooling unit 3, thereby achieving a recycling function and expanding the applicability of the helium-3 gas purification device.

[0061] Specifically, in this embodiment, the bypass line 9 includes a bypass pipe 91 , a bypass valve 92 disposed in the bypass pipe 91 , and a pressure gauge 93 disposed in the bypass pipe 91 for real-time monitoring of the pressure in the bypass pipe 91 .

[0062] Example:

[0063] Reference below Figure 1 A helium-3 gas purification device according to a specific embodiment of the present invention is described.

[0064] The helium-3 gas purification device of this embodiment includes a main body 1, a gas processing unit 2, a primary cooling unit 3, a secondary cooling unit 4, a pre-cooling unit, a radiation shield 71, a bypass line 99, a collection mechanism 6 and a safety pressure relief valve 8.

[0065] The main body 1 defines a vacuum chamber 11 .

[0066] The gas processing unit 2 has two ends disposed outside the main body 1 and a central portion disposed within the vacuum chamber 11. The gas processing unit 2 is used to purify the helium-tricrystal gas. The gas processing unit 2 includes a filter cold trap 21, which has an adsorption structure disposed therein. The adsorption structure is used to adsorb particles in the helium-tricrystal gas that have solidified at a second preset temperature. The filter cold trap 21 is disposed within the secondary cooling unit 4.

[0067] The primary cooling unit 3 is disposed within the vacuum chamber 11 and is used to cool the helium-tri-gas mixture to a first preset temperature. The primary cooling unit 3 comprises a primary thermal radiation insulation chamber 31 and a primary cold plate 32. The primary cold plate 32 is disposed on the top wall of the primary thermal radiation insulation chamber 31. The gas processing unit 2 also includes a refrigeration element 22, which is disposed within the primary cold plate 32 and extends into the primary thermal radiation insulation chamber 31.

[0068] The secondary cooling unit 4 is disposed within the vacuum chamber 11 and is used to cool the helium-tri-gas mixture to a second preset temperature, which is lower than the first preset temperature and no greater than 10K. The secondary cooling unit 4 includes a secondary thermal radiation insulation chamber 41 and a secondary cold plate 42. The secondary thermal radiation insulation chamber 41 is disposed within the primary cooling unit 3. The secondary cold plate 42 is located on the top wall of the secondary thermal radiation insulation chamber 41. The filter cold trap 21 is disposed within the secondary cold plate 42 and extends into the secondary thermal radiation insulation chamber 41.

[0069] The precooling unit is located within the vacuum chamber 11, between the primary cooling unit 3 and the secondary cooling unit 4. It is used to precool the gas within the gas processing unit 2. The precooling unit includes a cold head 51 and a precooling heat exchanger 52. The cold head 51 is located on the main body 1, and the precooling heat exchanger 52 is located within the vacuum chamber 11 and connected to the cold head 51. The gas processing unit 2 includes an air supply pipe 23 that is wound around the precooling heat exchanger 52.

[0070] The main body 1 is arranged inside the radiation shield 71, and both ends of the gas processing unit 2 extend outside the radiation shield 71. The main body 1 and the gas processing unit 2 are respectively provided with a safety pressure release valve 8.

[0071] The bypass pipeline 9 is provided outside the main body 1 , and both ends of the bypass pipeline 9 are respectively connected to both ends of the gas processing unit 2 . A bypass valve 92 is provided in the bypass pipeline 9 .

[0072] Throughout this specification, references to "some embodiments," "other embodiments," and the like indicate that the specific features, structures, materials, or characteristics described in connection with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, schematic representations of these terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0073] The above contents are only preferred embodiments of the present invention. For ordinary technicians in this field, according to the concept of the present invention, there may be changes in the specific implementation methods and application scopes. The contents of this specification should not be understood as limiting the present invention.

Claims

1. A helium-3 gas purification device, characterized in that: include: A main body (1), wherein the main body (1) defines a vacuum chamber (11); A gas processing unit (2), wherein both ends of the gas processing unit (2) are arranged outside the main body (1), and the middle portion of the gas processing unit (2) is arranged in the vacuum chamber (11), and the gas processing unit (2) is used for purifying helium-tri-gas; A first-stage cooling unit (3), the first-stage cooling unit (3) being arranged in the vacuum chamber (11), the first-stage cooling unit (3) being used to cool the helium-tri-gas mixture to a first preset temperature, and the nitrogen gas being solidified at the first-stage cooling unit (3); a secondary cooling unit (4), the secondary cooling unit (4) being arranged in the vacuum chamber (11), the secondary cooling unit (4) being used to cool the helium-tri-gas mixture to a second preset temperature, the second preset temperature being lower than the first preset temperature, and the second preset temperature being no greater than 10K; The gas processing unit (2) comprises a filter cold trap (21), an adsorption structure is provided in the filter cold trap (21), the adsorption structure is used to adsorb particles in the helium-tri-gas mixture that have solidified at the second preset temperature, and the filter cold trap (21) is provided in the secondary cooling unit (4); The helium-3 gas purification device further comprises a precooling unit, the precooling unit being arranged in the vacuum chamber (11), the precooling unit being located between the primary cooling unit (3) and the secondary cooling unit (4), and being used for precooling the gas in the gas processing unit (2); The pre-cooling unit comprises: a cold head (51) and a pre-cooling heat exchanger (52), wherein the cold head (51) is arranged on the main body (1), the pre-cooling heat exchanger (52) is arranged in the vacuum chamber (11) and connected to the cold head (51), and the gas processing unit (2) comprises an air supply pipe (23) wound around the pre-cooling heat exchanger (52); The helium-3 gas purification device further comprises a radiation shield (71), the main body (1) is arranged on the inner side of the radiation shield (71), and both ends of the gas processing unit (2) extend out of the outer side of the radiation shield (71).

2. The helium-3 gas purification device according to claim 1, characterized in that: The secondary cooling unit (4) comprises: A secondary heat radiation insulation cavity (41), the secondary heat radiation insulation cavity (41) being arranged in the primary cooling unit (3); A secondary cold plate (42) is provided on the top wall of the secondary heat radiation insulation cavity (41); the filter cold trap (21) is passed through the secondary cold plate (42) and extends into the secondary heat radiation insulation cavity (41).

3. The helium-3 gas purification device according to claim 1, characterized in that: The first-level cooling unit (3) comprises: a first-level thermal radiation insulation cavity (31); A first-level cold plate (32), the first-level cold plate (32) is arranged on the top wall of the first-level heat radiation insulation cavity (31), and the gas processing unit (2) also includes a refrigeration body (22), the refrigeration body (22) is passed through the first-level cold plate (32) and extends into the first-level heat radiation insulation cavity (31).

4. The helium-3 gas purification device according to claim 1, characterized in that: The helium-3 gas purification device further comprises a collecting mechanism (6), the collecting mechanism (6) being in communication with the gas outlet end of the gas processing unit (2), and the collecting mechanism (6) being used to collect the gas discharged from the gas processing unit (2).

5. The helium-3 gas purification device according to claim 1, characterized in that: The helium-3 gas purification device further comprises a safety pressure release valve (8), and the main body (1) and the gas processing unit (2) are respectively provided with the safety pressure release valve (8).

6. The helium-3 gas purification device according to claim 1, characterized in that: The helium-3 gas purification device further comprises a bypass pipeline (9), wherein the bypass pipeline (9) is arranged outside the main body (1), and the two ends of the bypass pipeline (9) are respectively connected to the two ends of the gas processing unit (2), and a bypass valve (92) is provided in the bypass pipeline (9).

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