Photomask cleaning tools, photomask cleaning methods, and photomask cleaning devices

Abstract

A photomask cleaning tool includes various components for automatically removing particles from a pellicle, such as a multi-beam nozzle for standardizing and controlling the removal of particles using a gas, an ultrasonic probe for loosening particles from the surface of the pellicle, multiple multi-beam nozzles for directing gas toward particles from different directions, a control system for controlling an automated blower for photomasks of various sizes and shapes and for optimized particle removal techniques, and / or the like. In this manner, the photomask cleaning tool is capable of removing particles from a pellicle of a photomask in a manner that increases the efficiency of removing particles and reduces the likelihood of damaging the pellicle, which would otherwise result in expensive and time-consuming rework of the photomask.

Description

Technical Field

[0001] Embodiments of the present invention relate to a photomask cleaning tool, a photomask cleaning method and a photomask cleaning device. Background Art

[0002] A photomask is a device for transferring a pattern (eg, a die layer pattern, an integrated circuit pattern, and / or the like) to a wafer. The photomask may include a substrate on which a pattern is formed and a pellicle layer for protecting the pattern from damage. Summary of the invention

[0003] Some embodiments of the present invention provide a photomask cleaning tool, characterized in that it includes: a nozzle for blowing gas onto a protective film of a photomask to remove particles from the surface of the protective film; an ultrasonic probe for directing ultrasonic waves toward the surface of the protective film, wherein vibration of the surface of the protective film caused by the ultrasonic waves reduces the surface adhesion between the particles and the surface of the protective film; and a tray motor for moving a slidable tray for supporting the photomask while at least one of the following is being performed: the nozzle blowing gas onto the protective film, or the ultrasonic probe directing the ultrasonic waves toward the surface of the protective film.

[0004] In addition, other embodiments of the present invention provide a photomask cleaning method, characterized in that it includes: a controller of the photomask cleaning tool causes the first nozzle of the photomask cleaning tool to blow gas onto a protective film of the photomask located on the tray while the tray moves in a first direction; and after causing the first nozzle to blow gas onto the protective film while the tray moves in the first direction, the controller causes the second nozzle of the photomask cleaning tool to blow gas onto the protective film while the tray moves in a second direction opposite to the first direction, wherein the first nozzle blows gas onto the protective film in a first direction to apply a first removal force to particles on the protective film, and wherein the second nozzle blows gas onto the protective film in a second direction to apply a second removal force to the particles.

[0005] In addition, other embodiments of the present invention provide a photomask cleaning device, characterized in that it includes: one or more memories; and one or more processors, communicatively coupled to the one or more memories, the one or more memories and the one or more processors being used to: determine one or more first parameters of a slidable tray associated with a photomask cleaning tool; determine one or more second parameters of one or more nozzles of the photomask cleaning tool; determine one or more third parameters of an ultrasonic probe of the photomask cleaning tool; and based on the one or more first parameters, the one or more second parameters and the one or more third parameters, cause the photomask cleaning tool to attempt to remove particles from a protective film of a photomask located on the slidable tray. BRIEF DESCRIPTION OF THE DRAWINGS

[0006] The various aspects of the present disclosure will be best understood by reading the following detailed description in conjunction with the accompanying drawings. It should be noted that, in accordance with standard practice in the industry, the various features are not drawn to scale. In fact, the size of the various features may be arbitrarily increased or reduced for clarity of discussion.

[0007] Figure 1A to Figure 1E is a diagram of an exemplary photomask cleaning tool described herein.

[0008] Figure 2 and FIG. 3A to FIG. 3C is a diagram of an exemplary embodiment described herein.

[0009] Figure 4 yes Figure 1A to Figure 1E A diagram of exemplary components of one or more apparatus of a photomask cleaning tool.

[0010] Figure 5 and Figure 6 is a flow chart of an exemplary process for removing particles from a pellicle of a photomask. DETAILED DESCRIPTION

[0011] The following disclosure provides many different embodiments or examples for implementing the different features of the provided subject matter. Specific examples of components and arrangements are set forth below to simplify the present disclosure. Of course, these are merely examples and are not intended to be limiting. For example, the following description in which a first feature is formed on or on a second feature may include an embodiment in which the first feature and the second feature are formed to be in direct contact, and may also include an embodiment in which an additional feature may be formed between the first feature and the second feature so that the first feature and the second feature may not be in direct contact. In addition, the present disclosure may reuse reference numbers and / or letters in various examples. This repetition is for the purpose of brevity and clarity, rather than indicating the relationship between the various embodiments and / or configurations discussed by itself.

[0012] Additionally, for ease of description, spatially relative terms such as "beneath," "below," "lower," "above," "upper," etc. may be used herein to describe the relationship of one element or feature to another (other) element or feature as shown in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatially relative descriptors used herein may be interpreted accordingly.

[0013] During the manufacturing process of a photomask, the surface of the pellicle may be inspected for particles (e.g., dust and / or other foreign matter) that may negatively impact the transfer of a pattern from the photomask to a wafer. Particles on the surface of the pellicle may, for example, cause the focus of the photomask to change, which may distort the pattern transferred to the wafer. If particles are identified on the surface of the pellicle, attempts may be made to remove the particles. If the particles cannot be removed, the photomask may be transferred to a rework location where other more extensive techniques may be used to repair the photomask.

[0014] Various techniques may be used to remove particles from a photomask. For example, a technician may use a compressed gas tool to attempt to blow particles off the surface of the pellicle using compressed gas. As another example, a technician may use alcohol drops to attempt to loosen and remove particles from the photomask. However, these techniques are inconsistent, are prone to human error, may cause tears and / or damage to the pellicle, may leave chemical residues on the surface of the pellicle, and / or the like.

[0015] Some embodiments described herein provide techniques and apparatus for removing particles from a photomask pellicle. In some embodiments, a photomask cleaning tool described herein includes various components for automatically removing particles from a pellicle, such as a multi-jet nozzle for standardizing and controlling the removal of particles using a gas, an ultrasonic probe for loosening particles from the surface of the pellicle, a plurality of multi-jet nozzles for directing gas toward particles from different directions, a control system for controlling an automatic blower for photomasks of various sizes and shapes and for optimized particle removal techniques, and / or similar components. In this way, the photomask cleaning tool is capable of removing particles from a pellicle of a photomask in a manner that increases the efficiency of removing particles and reduces the likelihood of damaging the pellicle, which would otherwise result in expensive and time-consuming rework of the photomask.

[0016] Figure 1A to Figure 1Eis a diagram of an exemplary photomask cleaning tool 100 described herein. The photomask cleaning tool 100 may be capable of cleaning a pellicle by removing particles, debris, and / or other foreign matter from the pellicle of a photomask 102. The photomask 102 may include: various types of lithography-based photomasks that transfer device patterns to wafers or semiconductor devices. In some embodiments, the photomask cleaning tool 100 may be capable of being mounted or positioned on a table or bench (e.g., in a clean room, in a semiconductor fabrication and / or testing environment, and / or the like). In some embodiments, the photomask cleaning tool 100 may be capable of being mounted or positioned in a cabinet or another type of enclosure.

[0017] Figure 1A 1 is a perspective view of a photomask cleaning tool 100. Figure 1A As shown in , the photomask cleaning tool 100 may include a housing 104, which is shown as transparent for clarity and visibility of other components and / or devices of the photomask cleaning tool 100. The housing 104 may be formed of one or more metals, plastics, and / or other materials (e.g., aluminum, stainless steel, polycarbonate, and / or the like).

[0018] like Figure 1A As further shown in , the photomask cleaning tool 100 may include one or more nozzles 106. In some embodiments, the photomask cleaning tool 100 includes a single nozzle 106. In some embodiments, the photomask cleaning tool 100 includes a plurality of nozzles 106, such as nozzle 106a and nozzle 106b. The nozzle 106 may be capable of blowing a gas (e.g., air or another type of gas) onto the photomask 102 to remove particles from the pellicle of the photomask 102. The nozzle 106 may be mounted to and / or supported by a support structure 108. The support structure 108 may include a bracket, a stand, a leg, and / or the like. In some embodiments, the nozzle 106 may be mounted to and / or supported by a set of support structures 108. In these cases, the nozzle 106 may be mounted to and / or supported by a first support structure 108 at a first end of the nozzle 106, and supported by a second support structure 108 at a second end of the nozzle 106.

[0019] In some embodiments, an opening 110 can be formed through the support structure 108, and a fastener 112 can be inserted through the opening 110 to secure the nozzle 106 to the support structure 108. In some embodiments, the fastener 112 securing the nozzle 106 to a set of support structures 108 can be loosened so that the height and / or angle of the nozzle 106 (e.g., relative to the height and / or angle of the photomask 102) can be manually adjusted. In some embodiments, the height and / or angle of the nozzle 106 can be automatically adjusted by one or more motors included in the photomask cleaning tool 100.

[0020] like Figure 1A As further shown in , the photomask cleaning tool 100 may include a tray 114. The tray 114 may be configured to hold and / or support the photomask 102 before, during, and / or after the photomask cleaning tool 100 cleans the pellicle of the photomask 102. In some embodiments, the tray 114 includes a substantially flat structure on which the photomask 102 is placed and / or fixed. In some embodiments, the tray 114 includes a clamping mechanism (fixture) on which the photomask 102 is mounted. In some embodiments, the tray 114 is a slidable tray that can move, translate, and / or slide on a horizontal (or substantially horizontal) axis. In some embodiments, the tray 114 may be able to move, translate, and / or slide on a vertical (or substantially vertical) axis. The tray 114 can move along the axis in one or more directions while the nozzle 106 blows gas onto the pellicle of the photomask 102. In this manner, the photomask 102 can be moved so that all or a specific portion of the pellicle can be blown with a gas, thereby removing particles on the pellicle.

[0021] like Figure 1A As further shown in FIG. 1 , the photomask cleaning tool 100 may include an ultrasonic probe 116. The ultrasonic probe 116 may be (or may include) a transmitter device that receives an electrical signal (e.g., an ultrasonic electrical signal) and converts the electrical signal into ultrasonic energy. The ultrasonic energy may travel through the air (or another medium) toward the photomask 102 in the form of an ultrasonic wave. The ultrasonic wave may collide with the pellicle, causing a force to be applied to the pellicle. The force may cause the pellicle to vibrate, which may reduce the surface adhesion between the particle and the surface of the pellicle. This may reduce the amount of removal force required to remove the particle from the surface of the pellicle.

[0022] like Figure 1AAs further shown in FIG. 1 , the ultrasound probe 116 can be positioned and / or mounted substantially perpendicular and / or orthogonal to the tray 114 and the photomask 102 on the tray 114. The ultrasound probe 116 can be mounted to, held in place by, and / or secured by a mounting plate 118. The mounting plate 118 can include an opening through which the ultrasound probe 116 is inserted. In some embodiments, the mounting plate 118 is integrated into the ultrasound probe 116. In some embodiments, the mounting plate 118 and the ultrasound probe 116 are separate components.

[0023] The mounting plate 118 can be attached to, connected to, and / or mounted to another mounting plate 120. In some embodiments, the mounting plate 118 and the mounting plate 120 can be positioned substantially orthogonal. In some embodiments, the mounting plate 118 is attached to the mounting plate 120 by pins, clamps, fasteners, and / or other components. In some embodiments, the mounting plate 118 can be moved relative to the mounting plate 120 so that the height of the ultrasound probe 116 can be adjusted.

[0024] The mounting plate 120 can be attached to, connected to, and / or mounted to a support structure 122. The support structure 122 can include rails, brackets, tubes, and / or other types of support structures. In some embodiments, the mounting plate 120 is attached to the support structure 122 by pins, clamps, fasteners, and / or other components. In some embodiments, the mounting plate 120 can be moved along the support structure 122 so that the position of the ultrasound probe 116 can be adjusted in a plane parallel to the tray 114 and the photomask 102.

[0025] Figure 1B to Figure 1D A detailed view of the nozzle 106 is shown. Figure 1B As shown in , nozzle 106 may include multiple parts, which may also be referred to as shells, halves, and / or the like. The multiple parts may include part 124 and part 126. In some embodiments, part 124 may be an upper shell or upper half, and part 126 may be a lower shell or lower half. In some embodiments, part 124 may be a lower shell or lower half, and part 126 may be an upper shell or upper half. Figure 1BAs further shown in , the nozzle 106 may include a plurality of openings 128, which may also be referred to as a gas jet or another type of opening through which the nozzle 106 blows or discharges gas. In some embodiments, the openings 128 are formed in the portion 124. In some embodiments, the openings 128 are formed in the portion 126. In some embodiments, the openings 128 are formed by mating or coupling the portion 124 with the portion 126. In these cases, one or more sides of the openings 128 may be formed in the portion 124, one or more sides of the openings 128 may be formed in the portion 126, and when the portion 124 is connected to the portion 126, the openings 128 may be completed or formed.

[0026] like Figure 1C As shown in , the opening 128 can be located along the front face of the portion 124. In addition, the portion 124 can include a cavity 130 through which the gas can be distributed along the width of the nozzle 106 to uniformly (or substantially uniformly) supply the gas to the opening 128. Figure 1C As further shown in FIG. 1 , the portion 124 may include a gas supply port 134 that may be an opening through the portion 124, and the gas is supplied to the nozzle 106 through the opening through the portion 124. In some embodiments, the gas supply port 134 may be a threaded opening, the gas supply port 134 may be configured for a bayonet-style mounting, or may be configured to connect to a gas supply line using another connection technology. In some embodiments, the gas supply port 134 may be positioned at another location on the portion 124, such as the back of the portion 124, the side of the portion 124, and / or the like.

[0027] like Figure 1C As further shown in FIG. 1 , portion 124 may also include a plurality of connection points 132 (e.g., screw holes, countersunk holes, counterbores, and / or the like) by which portion 124 is connected to, affixed to, or otherwise coupled to portion 126. In some embodiments, portion 126 may also include a cavity through which gas may be distributed along the width of nozzle 106 to uniformly (or substantially uniformly) supply gas to opening 128. In some embodiments, portion 126 is a flat component and / or a solid component without a cavity.

[0028] like Figure 1DAs shown in, the opening 128 may be rectangular in shape. In some embodiments, the opening 128 may be another shape, such as a square shape, a circular shape, and / or a similar shape. The number of openings 128 and / or the size of each opening 128 may be configured to provide a stable and concentrated flow (e.g., a gas flow with relatively low distribution, dispersion, or fanning out), and to provide a high gas flow pressure difference. For example, the length (e.g., x dimension), width (e.g., y dimension) and height (e.g., z dimension) may be configured to provide a relatively low flow width and high pressure flow. In some embodiments, the length, width, and / or height of each opening 128 may be configured to provide a gas flow width that is substantially equal to the spacing (e.g., j dimension) between the openings 128, so as to minimize the overlap of the gas flow paths of adjacent openings 128 while providing an overlapping blowing pattern (which will make the gas flow pressure in some areas uneven). The overlapping blowing pattern may include a blowing pattern that spans the width of the nozzle 106 such that there are no (or minimal) gaps in the gas flow path between adjacent openings 128. In addition, based on the expected width or length of the pellicle of the photomask 102, the openings 128 closest to the side of the portion 124 may be spaced apart (e.g., k dimension) from the side of the portion 124 to provide blowing coverage substantially across the entire width of the pellicle while reducing or minimizing gas blowing onto portions of the photomask 102 other than the pellicle. This reduces the likelihood that the gas will cause particles and / or other types of debris to become airborne and land on the pellicle. Examples of the above dimensions include an x ​​dimension in the range of 5 millimeters (mm) to 15 mm, a y dimension in the range of 0.1 mm to 3 mm, a z dimension in the range of 0.1 mm to 3 mm, a j dimension in the range of 5 mm to 10 mm, and a k dimension in the range of 10 mm to 30 mm. An exemplary range for the number of openings 128 may include 10 to 20 openings.

[0029] like Figure 1E , the photomask cleaning tool 100 may include a control system 136. The control system 136 may control and / or adjust various parameters and / or components of the photomask cleaning tool 100. For example, the control system 136 may control and / or adjust various parameters of the nozzle 106, the tray 114, the ultrasonic probe 116, and / or similar components. In some embodiments, the control system 136 may include a controller 138, a blower motor 140, a tray motor 142, a signal generator 144, and / or similar components. In some embodiments, the control system 136 may be a device or system separate from the photomask cleaning tool 100. In some embodiments, one or more components of the control system 136 may be separate from the photomask cleaning tool 100, may be included in other devices, and / or the like.

[0030] The controller 138 may receive information (e.g., sensor information) from various components of the photomask cleaning tool 100, may determine one or more parameters of various components of the photomask cleaning tool 100, may provide signals and / or instructions to various components of the photomask cleaning tool 100, and / or the like. For example, the controller 138 may provide signals and / or instructions to the blower motor 140, the tray motor 142, the signal generator 144, and / or one or more other components.

[0031] The blower motor 140 may include various types of motors capable of generating a pressurized gas flow and providing the pressurized gas flow to the nozzle 106. In some embodiments, the controller 138 may provide signals and / or instructions to the blower motor 140 to generate a pressurized gas flow and provide the pressurized gas flow to the nozzle 106 at a specific pressure, a specific flow rate, and / or similar conditions. In some embodiments, the controller 138 may provide signals and / or instructions to enable the blower motor 140 (e.g., to cause the blower motor 140 to generate a pressurized gas flow and provide the pressurized gas flow to the nozzle 106) and / or deactivate the blower motor 140. In some embodiments, the controller 138 may control and / or adjust various parameters of the nozzle 106, such as the height of the nozzle 106 relative to the surface of the pellicle of the photomask 102, the angle of the nozzle 106 relative to the surface of the pellicle of the photomask 102, and / or similar parameters.

[0032] The tray motor 142 may include various types of motors capable of moving, sliding, and / or translating the tray 114 along a horizontal axis, along a vertical axis, and / or the like. For example, the tray motor 142 may be capable of moving, sliding, and / or translating the tray 114 along one or more support rails, support members, support tracks, and / or the like. This allows the nozzle 106 to blow gas along the surface of the pellicle of the photomask 102 in a scanning pattern (e.g., from one side of the surface of the pellicle of the photomask 102 to the other side of the surface of the pellicle of the photomask 102) while maintaining the nozzle 106 in a stationary position. In some embodiments, the tray motor 142 may be capable of moving, sliding, and / or translating the tray 114 in multiple directions. For example, the tray motor 142 may be capable of moving, sliding, and / or translating the tray 114 in a first direction so that the first nozzle 106 (e.g., nozzle 106a) blows gas onto the surface of the pellicle of the photomask 102 while the photomask 102 moves in the first direction, and may be capable of moving, sliding, and / or translating the tray 114 in a second (opposite) direction so that the second nozzle 106 (e.g., nozzle 106b) blows gas onto the surface of the pellicle of the photomask 102 while the photomask 102 moves in the second direction. In some embodiments, the controller 138 may provide signals and / or instructions to enable the tray motor 142, disable the tray motor 142, cause the tray motor 142 to move the tray 114 in a particular direction, and / or the like.

[0033] The signal generator 144 includes various types of electrical signal generators that can generate electrical signals at ultrasonic frequencies (e.g., 20 kilohertz (kHz) to several gigahertz (GHz)) and provide the electrical signals to the ultrasound probe 116. For example, the signal generator 144 includes a frequency generator, a function generator, an ultrasonic signal generator, and / or another type of device capable of generating an ultrasonic electrical signal. In some embodiments, the controller 138 can provide signals and / or instructions to enable the signal generator 144, disable the signal generator 144, cause the signal generator 144 to generate an ultrasonic electrical signal of a specific frequency, cause the signal generator 144 to generate an ultrasonic electrical signal of a specific power setting (e.g., signal power or amplitude), cause the signal generator 144 to generate an ultrasonic electrical signal of a specific signal configuration (e.g., various components that can configure the ultrasonic electrical signal), and / or the like. In some embodiments, the controller 138 may control and / or adjust various parameters of the ultrasound probe 116 , such as the height of the ultrasound probe 116 relative to the surface of the pellicle of the photomask 102 , the horizontal position of the ultrasound probe 116 , and / or the like.

[0034] Figure 1A to Figure 1E The number and arrangement of components shown in FIG. 1 are provided as examples. In practice, the photomask cleaning tool 100 may include Figure 1A to Figure 1E In some embodiments, the photomask cleaning tool 100 may include additional components and / or devices, fewer components and / or devices, different components and / or devices, and / or differently arranged components and / or devices compared to the components and / or devices shown in . Additionally or alternatively, one set of components and / or devices (e.g., one or more components and / or devices) of the photomask cleaning tool 100 may perform one or more functions described as being performed by another set of components of the photomask cleaning tool 100.

[0035] Figure 2 is a diagram of an exemplary embodiment 200 described herein. Figure 2 As shown in , exemplary embodiment 200 may include photomask cleaning tool 100 and / or one or more components of photomask cleaning tool 100. Exemplary embodiment 200 may be an exemplary embodiment of photomask cleaning tool 100 for cleaning photomask 202. Figure 2 As shown in FIG. 1 , a photomask 202 may include a substrate 204 on which a pattern 206 is formed. The pattern 206 may be protected by a protective film 208. Figure 2 As further shown in FIG. 1 , the photomask cleaning tool 100 can clean the photomask 202 by removing particles 210 from the surface of the pellicle 208 .

[0036] To remove particles from the pellicle 208, the nozzle 106 may blow a gas 212 onto the surface of the pellicle 208. The gas 212 may exert a force (F P Controller 138 may determine and configure the force (F) to be applied by gas 212 to particle 210. P In some embodiments, the controller 138 determines the force (F ) to be applied to the particle 210 based on the estimated removal force for removing the particle 210 from the overcoat 208 and the estimated surface adhesion force between the particle 210 and the overcoat 208. P ) magnitude. The estimated removal force may be based on the thickness of the overcoat 208, the size of the particle 210, the shape of the particle 210, the orientation of the particle 210, and / or one or more other parameters. Specifically, the controller 138 may determine the force (F) to be applied to the particle 210. P ) such that the estimated removal force is equal to or exceeds the estimated surface adhesion force. For example, the controller 138 may determine the force (F) based on the following equation: P ):

[0037] F D ·R+F L ·a+F P ·R+M D ≥F V ·a

[0038] where F D·R+F L , ·a+F P ·R+M D represents the estimated removal force, and F V a represents the estimated surface adhesion. In addition, F D may represent the viscous drag force on the particle 210, R may represent the radius of the particle 210, and F L , may represent the vitality of the particle 210, a may represent the contact radius of the particle 210 (the contact radius may be the radius of the surface area of ​​the particle 210 in contact with the surface of the protective film 208), M D can represent the moment of surface stress of particle 210, and F V π may represent the Vander Waals forces on the particles (eg, the attractive force between the surface of the particle 210 and the surface of the overcoat 208 ).

[0039] In some embodiments, the force (F) applied by the gas 212 to the particle 210 P ) may also be based on one or more parameters of the nozzle 106 and / or the gas 212. In these cases, the controller 138 may determine and / or configure the one or more parameters so that the gas 212 exerts a force (F) on the particles 210. P ). The one or more parameters may include a height of the nozzle 106 relative to the surface of the pellicle 208 (e.g., a distance between the surface of the pellicle 208 and the nozzle 106), an angle of the nozzle 106 relative to the surface of the pellicle 208, a gas pressure of the gas 212, a gas flow rate of the gas 212, and / or the like. In some embodiments, the controller 138 may determine a specific combination or scheme of the one or more parameters of the nozzle 106 and / or the gas 212 to derive a force (F) to be applied by the gas 212 to the particle 210. P ). Exemplary ranges include an angle of the nozzle 106 of 20° to 30°, a height of the nozzle 106 of 1 mm to 15 mm, and / or a gas pressure of the gas 212 of 0.5 bar to 1 bar.

[0040] In some embodiments, the controller 138 can cause the nozzle 106 to blow the gas 212 in a pulsating manner. In these cases, the controller 138 can determine and configure the duration and / or frequency of each pulse so that each pulse of the gas 212 provides a high pressure differential gas flow.

[0041] like Figure 2As further shown in FIG. 1 , to increase the effectiveness of the gas 212 in removing the particles 210 from the pellicle 208, the ultrasonic probe 116 may emit and direct ultrasonic waves 214 toward the pellicle 208. The ultrasonic waves 214 may collide with the pellicle 208, thereby causing the surface of the pellicle 208 to vibrate. The vibration of the surface of the pellicle 208 may reduce the surface adhesion force on the particles 210, which may reduce the force (F) applied by the gas 212 to the particles 210. P ). The force (F) applied by the gas 212 to the particle 210 P ) will reduce the likelihood that the gas 212 will cause damage (e.g., tearing, corrugation, and / or the like) to the pellicle 208. In some embodiments, the controller 138 may cause the ultrasonic probe 116 to emit and direct ultrasonic waves 214 toward the pellicle 208 while the nozzle 106 blows the gas 212 onto the pellicle 208. In some embodiments, the controller 138 may cause the ultrasonic probe 116 and the nozzle 106 to cycle between directing the ultrasonic waves 214 toward the pellicle 208 and blowing the gas 212 onto the pellicle 208.

[0042] In some embodiments, the controller 138 may determine and configure one or more parameters of the ultrasonic probe 116 and / or the ultrasonic waves 214 to reduce surface adhesion without causing vibration levels that may cause damage to the overcoat 208. In these cases, the controller 138 may determine and configure the height of the ultrasonic probe 116 relative to the surface of the overcoat 208 (e.g., the distance between the ultrasonic probe 116 and the surface of the overcoat 208), the configuration of the ultrasonic waves 214 (e.g., the frequency components of the ultrasonic waves 214), the power or amplitude of the ultrasonic waves 214, and / or similar parameters. In some embodiments, the controller 138 may determine and configure one or more parameters of the ultrasonic probe 116 and / or the ultrasonic waves 214 based on the size of the particles 210, the shape of the particles 210, the orientation of the particles 210, the thickness of the overcoat 208, the material used for the overcoat 208, and / or similar parameters.

[0043] As mentioned above, Figure 2 are provided as examples. Other examples may be different for Figure 2 The examples described are different.

[0044] FIG. 3A to FIG. 3C is a diagram of one or more exemplary implementations 300 described herein. FIG. 3A to FIG. 3C As shown in , exemplary embodiment 300 may include photomask cleaning tool 100 and / or one or more components of photomask cleaning tool 100. Exemplary embodiment 300 may be an exemplary embodiment in which photomask cleaning tool 100 cleans photomask 302. FIG. 3A to FIG. 3CAs further shown in FIG. 3 , the photomask 302 may include a substrate 304 and a pellicle 306 for protecting a pattern formed on the substrate 304. The exemplary embodiment 300 may include one or more instances in which the photomask cleaning tool 100 cleans the photomask 302 by removing particles 308 from a surface of the pellicle 306 using a multi-nozzle configuration.

[0045] like Figure 3A As shown in FIG. 1 and indicated by reference number 310, the controller 138 may determine one or more first parameters of the tray 114, one or more second parameters of the nozzles 106 (e.g., nozzles 106a and 106b), and one or more third parameters of the ultrasound probe 116. The one or more first parameters may include the number of cycles of the tray 114 (e.g., the number of consecutive passes of the photomask 302 under the nozzles 106a and 106b), the direction of travel of the tray 114, the order of travel of the tray 114 (e.g., the order of passes of the tray 114 under the nozzles 106a and 106b, and the direction of each pass), the travel speed of the tray 114 (e.g., the speed may be a constant travel speed or may be a variable travel speed), and / or the like.

[0046] The one or more second parameters may include the angle of each of the nozzles 106a and 106b (the angle may be the same angle or different angles), the height of each of the nozzles 106a and 106b (the height may be the same height or different heights), the gas pressure of each of the nozzles 106a and 106b (the gas pressure may be the same gas pressure or different gas pressures), the gas flow rate of each of the nozzles 106a and 106b (the gas flow rate may be the same gas flow rate or different gas flow rates), the on time of each of the nozzles 106a and 106b (the on time may be the same on duration or different on duration), and the off time of each of the nozzles 106a and 106b (the off time may be the same off duration or different off duration). The on time may refer to the duration that the nozzle (e.g., nozzle 106a and / or nozzle 106b) is blowing gas, and the off time may refer to the duration that the nozzle (e.g., nozzle 106a and / or nozzle 106b) is deactivated and does not blow gas. In some embodiments, the controller 138 may determine the one or more second parameters so that the nozzles 106a and 106b are turned on and blow gas during the alternating on time. In these cases, the nozzle 106a may be turned on and blow gas during the on time, and the nozzle 106b may be deactivated during the corresponding off time. Then, the nozzles 106a and 106b may be used alternately so that the nozzle 106b may be turned on and blow gas during the on time, and the nozzle 106a may be deactivated during the corresponding off time. In some embodiments, the controller 138 may determine the one or more second parameters so that the nozzles 106a and 106b are turned on at the same time (e.g., so that the nozzles 106a and 106b have overlapping on durations) and / or are turned off at the same time (e.g., so that the nozzles 106a and 106b have overlapping off durations).

[0047] In some embodiments, the on-time and / or off-time of the nozzle 106a and / or the nozzle 106b can be configured as an on-time and / or an off-time. For example, the controller 138 can configure the on-time and / or the off-time of the nozzle 106a and / or the nozzle 106b based on the movement speed of the tray 114, based on the size and / or shape of the pellicle 306, and / or similar parameters. In some embodiments, the controller 138 can determine the on-time and / or the off-time of the nozzle 106a and / or the nozzle 106b "on the fly" during the cleaning of the photomask 302. In these cases, the controller 138 can determine the on-time or off-time of the activated nozzle based on sensor information. For example, the controller 138 can receive sensor information from one or more sensors (e.g., one or more proximity sensors, one or more magnetic or Hall effect sensors, one or more image sensors, and / or similar sensors) included in the photomask cleaning tool 100. The controller 138 may determine that the protective film 306 is within the gas blowing range of the nozzle, and may start the nozzle on-time to enable the nozzle to blow gas based on the determination that the protective film 306 is within the gas blowing range of the nozzle. As another example, the controller 138 may determine that the protective film 306 is not within the gas blowing range of the nozzle, and may start the nozzle off-time to disable the nozzle from blowing gas based on the determination that the protective film 306 is not within the gas blowing range of the nozzle.

[0048] The one or more third parameters may include a height of the ultrasound probe 116 , a power setting or amplitude of ultrasound waves to be emitted by the ultrasound probe 116 , a configuration of ultrasound waves, an on-duration of the ultrasound probe 116 , an off-duration of the ultrasound probe 116 , and / or the like.

[0049] like Figure 3B and Figure 3C As shown in , the controller 138 may cause the tray 114, the nozzles 106a and 106b, the ultrasonic probe 116, and / or one or more other components of the photomask cleaning tool 100 to operate based on the one or more first parameters, the one or more second parameters, and / or the one or more third parameters to remove particles 308 from the surface of the pellicle 306. Figure 3B, and indicated by reference number 312, the controller 138 may cause the nozzle 106a to blow gas onto the pellicle 306 while the tray 114 moves in the first direction. For example, the controller 138 may cause the blower motor 140 to generate a gas flow to the nozzle 106a, which causes the nozzle 106a to blow gas onto the pellicle 306. In addition, the controller 138 may cause the tray motor 142 to move the tray 114 in the first direction. In some embodiments, the controller 138 further causes the signal generator 144 to generate an ultrasonic electrical signal that is provided to the ultrasonic probe 116. The ultrasonic probe 116 may receive the ultrasonic electrical signal and may convert the ultrasonic electrical signal into an ultrasonic wave, directing the ultrasonic wave toward the pellicle 306 while the nozzle 106a blows gas onto the pellicle 306 and while the tray 114 moves in the first direction.

[0050] like Figure 3B As further shown in FIG. 1 , the tray 114 may move from a starting position to an ending position in a first direction, which may be referred to as a pass. During the pass, the nozzle 106a may start in an off-time, during which the nozzle 106a is prohibited from blowing gas. The nozzle 106a may remain in the off-time while the pellicle 306 is not within the gas blowing range of the nozzle 106a, so that the nozzle 106a is prohibited from blowing gas onto some portions of the photomask 302 other than the pellicle 306. Once the position of the tray 114 reaches a point where the pellicle 306 is within the gas blowing range of the nozzle 106a, the nozzle 106a may switch from the off-time to the on-time, during which the nozzle 106a blows gas onto the pellicle 306 to remove the particles 308. The nozzle 106a may remain in the on-time while the tray 114 moves toward the ending position until the gas blowing range of the nozzle 106a reaches the end of the pellicle 306. Thus, the nozzle 106a can be switched from an on-time to another off-time during which the nozzle 106a is prohibited from blowing gas onto some portions of the photomask 302 other than the pellicle 306. In some embodiments, the ultrasonic probe 116 can be operated in an on-time / off-time configuration similar to the nozzle 106a. In some embodiments, the nozzle 106b can remain in the off-time while the tray 114 moves in the first direction.

[0051] like Figure 3C, and indicated by reference number 314, the controller 138 may cause the nozzle 106b to blow gas onto the pellicle 306 while the tray 114 moves in the second direction. The controller 138 may cause the tray 114 to move in the second direction based on the tray 114 reaching an end position during a passage in which the tray 114 moves in the first direction. In some embodiments, the second direction may be a direction traveling opposite to the first direction, so that the pellicle 306 passes under the nozzle 106a, the nozzle 106b, and the ultrasonic probe 116 while moving in the second direction. The controller 138 may cause the blower motor 140 to generate a gas flow toward the nozzle 106b, which causes the nozzle 106b to blow gas onto the pellicle 306. In some embodiments, the controller 138 further causes the signal generator 144 to generate an ultrasonic electrical signal that is provided to the ultrasonic probe 116. The ultrasonic probe 116 may receive the ultrasonic electrical signal and may convert the ultrasonic electrical signal into ultrasonic waves directed toward the pellicle 306 while the nozzle 106 b blows the gas onto the pellicle 306 and while the tray 114 moves in the second direction.

[0052] like Figure 3C As further shown in FIG. 1 , the tray 114 may be moved from the starting position to the ending position in the second direction, which may be referred to as another pass. During the another pass, the nozzle 106 b may start in the off time, during which the nozzle 106 b is prohibited from blowing gas. The nozzle 106 b may remain in the off time while the pellicle 306 is not within the gas blowing range of the nozzle 106 b, so that the nozzle 106 b is prohibited from blowing gas onto some portions of the photomask 302 other than the pellicle 306. Once the position of the tray 114 reaches a point where the pellicle 306 is within the gas blowing range of the nozzle 106 b, the nozzle 106 b may switch from the off time to the on time, during which the nozzle 106 b blows gas onto the pellicle 306 to remove the particles 308. The nozzle 106 b may remain in the on time while the tray 114 moves toward the ending position until the gas blowing range of the nozzle 106 b reaches the end of the pellicle 306. Thus, the nozzle 106b may switch from an on-time to another off-time during which the nozzle 106b is prohibited from blowing gas onto some portions of the photomask 302 other than the pellicle 306. In some embodiments, the ultrasonic probe 116 may direct ultrasonic waves toward the pellicle 306 while the nozzle 106b blows gas onto the pellicle 306. In some embodiments, the ultrasonic probe 116 may operate in an on-time / off-time configuration similar to the nozzle 106. In some embodiments, the nozzle 106a may remain in the off-time while the tray 114 moves in the second direction.

[0053] like Figure 3B and Figure 3CAs shown in , nozzle 106a and nozzle 106b can blow gas from different directions. In some embodiments, nozzle 106a and nozzle 106b blow gas at opposite or mirrored angles. In this way, nozzle 106a blows gas to apply a first removal force to particle 308, and nozzle 106b blows gas to apply an opposite second removal force to particle 308 to increase the probability that particle 308 will be removed from pellicle 306.

[0054] In some embodiments, a combination of a pass in the first direction and a pass in the second direction may be referred to as a cycle. As described above, the controller 138 may cause the photomask cleaning tool 100 to subject the photomask 302 to additional cycles based on the number of cycles determined as part of the one or more first parameters. Each additional cycle may include the techniques and / or actions described above in conjunction with reference numbers 312 and 314 and / or other techniques and / or actions. In some embodiments, the controller 138 may adjust the one or more first parameters, the one or more second parameters, and / or the one or more third parameters during and / or between cycles.

[0055] As mentioned above, FIG. 3A to FIG. 3C is provided as one or more instances. Additional instances may be available for FIG. 3A to FIG. 3C The examples described are different.

[0056] Figure 4 400. The device 400 may correspond to the controller 138, the blower motor 140, the tray motor 142, and / or the signal generator 144. In some embodiments, the controller 138, the blower motor 140, the tray motor 142, and / or the signal generator 144 may include one or more devices 400 and / or one or more components of the device 400. Figure 4 As shown in , device 400 may include a bus 410 , a processor 420 , a memory 430 , a storage component 440 , an input component 450 , an output component 460 , and a communication interface 470 .

[0057] The bus 410 includes components that allow communication between multiple components of the device 400. The processor 420 is implemented in hardware, firmware, and / or a combination of hardware and software. The processor 420 is a central processing unit (CPU), a graphics processing unit (GPU), an accelerated processing unit (APU), a microprocessor, a microcontroller, a digital signal processor (DSP), a field-programmable gate array (FPGA), an application-specific integrated circuit (ASIC), or another type of processing component. In some embodiments, the processor 420 includes one or more processors that can be programmed to perform functions. The memory 430 includes a random access memory (RAM), a read only memory (ROM), and / or another type of dynamic or static storage device (e.g., flash memory, magnetic memory, and / or optical memory) that stores information and / or instructions for use by the processor 420.

[0058] The storage component 440 stores information and / or software related to the operation and use of the device 400. For example, the storage component 440 may include a hard disk (e.g., a magnetic disk, an optical disk, and / or a magneto-optical disk), a solid state drive (SSD), a compact disc (CD), a digital versatile disc (DVD), a floppy disk, a cartridge, a magnetic tape, and / or another type of non-transitory computer-readable medium, and a corresponding drive.

[0059] Input components 450 include components that allow device 400 to receive information, for example, via user input (e.g., a touch screen display, a keyboard, a keypad, a mouse, a button, a switch, and / or a microphone). Additionally or alternatively, input components 450 may include components for determining location (e.g., a global positioning system (GPS) component) and / or sensors (e.g., an accelerometer, a gyroscope, an actuator, another type of position or environmental sensor, and / or similar components). Output components 460 include components that provide output information from device 400 (via, for example, a display, a speaker, a haptic feedback component, an audio or visual indicator, and / or similar components).

[0060] The communication interface 470 includes transceiver-like components (e.g., a transceiver, a separate receiver, a separate transmitter, and / or the like) that enable the device 400 to communicate with other devices, for example, via a wired connection, a wireless connection, or a combination of a wired connection and a wireless connection. The communication interface 470 may allow the device 400 to receive information from another device and / or provide information to another device. For example, the communication interface 470 may include an Ethernet interface, an optical interface, a coaxial interface, an infrared interface, a radio frequency (RF) interface, a universal serial bus (USB) interface, a wireless fidelity (Wi-Fi) interface, a cellular network interface, and / or the like.

[0061] The device 400 may implement one or more processes described herein. The device 400 may implement these processes based on the processor 420 executing software instructions stored by a non-transitory computer-readable medium such as a memory 430 and / or a storage component 440. As used herein, the term "computer-readable medium" refers to a non-transitory memory device. The memory device includes storage space within a single physical storage device or storage space distributed across multiple physical storage devices.

[0062] The software instructions may be read from another computer-readable medium or from another device into the memory 430 and / or storage component 440 via the communication interface 470. The software instructions stored in the memory 430 and / or storage component 440, when executed, may cause the processor 420 to perform one or more processes described herein. Additionally or alternatively, hardware circuitry may be used in place of or in conjunction with software instructions to perform one or more processes described herein. Therefore, the embodiments described herein are not limited to any specific combination of hardware circuitry and software.

[0063] Figure 4 The number and arrangement of components shown in FIG. 4 are provided as examples. In practice, the device 400 may include Figure 4 400. In some embodiments, the present invention may include additional components, fewer components, different components, or differently arranged components compared to the components shown in . Additionally or alternatively, one set of components (e.g., one or more components) of device 400 may implement one or more functions that are described as being implemented by another set of components of device 400.

[0064] Figure 5 is a flow chart of an exemplary process 500 associated with removing particles from a pellicle of a photomask. In some embodiments, Figure 5 One or more process blocks of may be implemented by a controller of a photomask cleaning tool (eg, controller 138 of photomask cleaning tool 100). In some embodiments, Figure 5 One or more process blocks of may be performed by another device or set of devices separate from or including the photomask cleaning tool, such as a blower motor (e.g., blower motor 140), a tray motor (e.g., tray motor 142), a signal generator (e.g., signal generator 144), and / or the like. Additionally or alternatively, Figure 5 One or more process blocks may be implemented by one or more components of the apparatus 400 (eg, the processor 420, the memory 430, the storage component 440, the input component 450, the output component 460, the communication interface 470, and / or the like).

[0065] like Figure 5 As shown in , process 500 may include causing a first nozzle of a photomask cleaning tool to blow a gas onto a pellicle of a photomask located on a tray while the tray moves in a first direction (block 510). For example, a controller may cause a first nozzle (e.g., nozzle 106a) of a photomask cleaning tool (e.g., photomask cleaning tool 100) to blow a gas onto a pellicle (e.g., pellicle 208, pellicle 306, and / or a similar pellicle) of a photomask (e.g., photomask 102, photomask 202, photomask 302, and / or a similar photomask) located on a tray (e.g., tray 114) while the tray moves in a first direction, as described above.

[0066] like Figure 5As further shown in , process 500 may include causing a second nozzle of a photomask cleaning tool to blow gas onto the pellicle while the tray is moved in a second direction opposite to the first direction after causing the first nozzle to blow gas onto the pellicle while the tray is moved in a first direction, wherein the first nozzle blows gas onto the pellicle in the first direction to apply a first removal force to particles on the pellicle, and wherein the second nozzle blows gas onto the pellicle in the second direction to apply a second removal force to the particles (block 520). For example, after causing the first nozzle to blow gas onto the pellicle while the tray is moved in the first direction, the controller may cause a second nozzle (e.g., nozzle 106b) of the photomask cleaning tool to blow gas onto the pellicle while the tray is moved in a second direction opposite to the first direction, as described above. In some embodiments, the first nozzle blows gas onto the pellicle in the first direction to apply a first removal force to particles (e.g., particles 210, particles 308, and / or similar particles) on the pellicle. In some embodiments, the second nozzle blows gas onto the pellicle in the second direction to apply a second removal force to the particles.

[0067] Process 500 may include additional embodiments, such as any single embodiment or any combination of embodiments set forth below and / or in combination with one or more other processes set forth elsewhere herein.

[0068] In a first embodiment, process 500 includes determining one or more parameters of the first nozzle based on at least one of: the size of the particle; the shape of the particle; or the contact radius of the particle. In a second embodiment, alone or in combination with the first embodiment, the one or more parameters include at least one of: a blowing area of ​​the first nozzle; a gas flow rate of the first nozzle; or a gas pressure of the first nozzle. In a third embodiment, alone or in combination with one or more of the first and second embodiments, process 500 includes directing an ultrasonic probe (e.g., ultrasonic probe 116) of a photomask cleaning tool to the pellicle while the tray moves in a first direction; and directing the ultrasonic probe to the pellicle while the tray slides in a second direction, wherein the ultrasonic wave reduces the surface adhesion force applied to the particle while the first removal force is applied to the particle and while the second removal force is applied to the particle.

[0069] In a fourth embodiment, alone or in combination with one or more of the first to third embodiments, the process 500 includes determining one or more parameters of the ultrasonic probe based on at least one of the following: the size of the pellicle; the shape of the pellicle; or the direction of travel of the tray. In a fifth embodiment, alone or in combination with one or more of the first to fourth embodiments, the one or more parameters of the ultrasonic probe include at least one of the following: the on-time of the ultrasonic probe; and the off-time of the ultrasonic probe, the ultrasonic probe is used to guide ultrasonic waves to the pellicle during the on-time, and the ultrasonic probe is used to prohibit guiding ultrasonic waves to the pellicle during the off-time. In a sixth embodiment, alone or in combination with one or more of the first to fifth embodiments, causing the first nozzle to blow gas onto the pellicle includes: determining that the pellicle is located within the gas blowing range of the first nozzle based on the size and shape of the pellicle; and causing the first nozzle to blow gas onto the pellicle based on determining that the pellicle is located within the gas blowing range of the first nozzle.

[0070] although Figure 5 Exemplary blocks of process 500 are shown, but in some embodiments, process 500 may include Figure 5 Additional blocks, fewer blocks, different blocks, or differently arranged blocks than those depicted in process 500. Additionally or alternatively, two or more blocks of process 500 may be performed in parallel.

[0071] Figure 6 is a flow chart of an exemplary process 600 associated with removing particles from a pellicle of a photomask. In some embodiments, Figure 6 One or more process blocks of may be implemented by a controller of a photomask cleaning tool (eg, controller 138 of photomask cleaning tool 100). In some embodiments, Figure 6 One or more process blocks of may be performed by another device or set of devices separate from or including the photomask cleaning tool, such as a blower motor (e.g., blower motor 140), a tray motor (e.g., tray motor 142), a signal generator (e.g., signal generator 144), and / or the like. Additionally or alternatively, Figure 6 One or more process blocks may be implemented by one or more components of the apparatus 400 (eg, the processor 420, the memory 430, the storage component 440, the input component 450, the output component 460, the communication interface 470, and / or the like).

[0072] like Figure 6As shown in , the process 600 may include determining one or more first parameters of a slidable tray associated with a photomask cleaning tool (block 610). For example, the controller may determine one or more first parameters of a slidable tray (e.g., tray 114) associated with a photomask cleaning tool (e.g., photomask cleaning tool 100), as described above.

[0073] like Figure 6 As further shown in FIG. 6 , process 600 may include determining one or more second parameters of one or more nozzles of a photomask cleaning tool (block 620). For example, the controller may determine one or more second parameters of one or more nozzles of a photomask cleaning tool (e.g., nozzle 106a, nozzle 106b, and / or similar nozzles), as described above.

[0074] like Figure 6 As further shown in FIG. 6 , process 600 may include determining one or more third parameters of an ultrasonic probe of a photomask cleaning tool (block 630 ). For example, the controller may determine one or more third parameters of an ultrasonic probe of a photomask cleaning tool (eg, ultrasonic probe 116 ), as described above.

[0075] like Figure 6 As further shown in , process 600 may include causing a photomask cleaning tool to attempt to remove particles from a pellicle of a photomask located on a slidable tray based on the one or more first parameters, the one or more second parameters, and the one or more third parameters (block 640). For example, the controller may cause a photomask cleaning tool to attempt to remove particles (e.g., particles 210, particles 308, and / or similar particles) from a pellicle (e.g., pellicle 208, pellicle 306, and / or similar pellicles) of a photomask (e.g., photomask 102, photomask 202, photomask 302, and / or similar photomasks) located on a slidable tray based on the one or more first parameters, the one or more second parameters, and the one or more third parameters, as described above.

[0076] Process 600 may include additional embodiments, such as any single embodiment or any combination of embodiments set forth below and / or in combination with one or more other processes set forth elsewhere herein.

[0077] In a first embodiment, the one or more first parameters include a speed at which the slidable tray moves based on the position of the slidable tray. In a second embodiment, alone or in combination with the first embodiment, the one or more first parameters include a number of cycles of the slidable tray. In a third embodiment, alone or in combination with one or more of the first and second embodiments, the one or more second parameters include an on-time of a nozzle of the one or more nozzles and an off-time of the nozzle, the nozzle being used to blow gas onto the pellicle during the on-time, and the nozzle being used to prohibit blowing gas onto the pellicle during the off-time.

[0078] In a fourth embodiment, alone or in combination with one or more of the first to third embodiments, the process 600 includes determining the on-time and the off-time based on: the direction of travel of the slidable tray; and the position of the slidable tray. In a fifth embodiment, alone or in combination with one or more of the first to fourth embodiments, the one or more third parameters include a distance between the ultrasound probe and the pellicle, a power setting of the ultrasound probe, or a configuration of ultrasound waves provided by the ultrasound probe.

[0079] although Figure 6 Exemplary blocks of process 600 are shown, but in some embodiments, process 600 may include Figure 6 Additional blocks, fewer blocks, different blocks, or differently arranged blocks than those depicted in . Additionally or alternatively, two or more blocks of process 600 may be performed in parallel.

[0080] In this manner, a photomask cleaning tool (e.g., photomask cleaning tool 100) includes various components for automatically removing particles from a pellicle, such as a multi-beam nozzle for standardizing and controlling the removal of particles using a gas, an ultrasonic probe for loosening particles from the surface of the pellicle, a plurality of multi-beam nozzles for directing gas toward particles from different directions, a control system for controlling the various components for photomasks of various sizes and shapes and for optimized particle removal techniques, and / or the like. In this manner, the photomask cleaning tool is capable of removing particles from a pellicle of a photomask in a manner that increases the efficiency of removing particles and reduces the likelihood of damaging the pellicle, which would otherwise result in expensive and time-consuming rework of the photomask.

[0081] As described in more detail above, some embodiments described herein provide a photomask cleaning tool. The photomask cleaning tool includes: a nozzle that blows gas onto a pellicle of a photomask to remove particles from the surface of the pellicle. The photomask cleaning tool includes: an ultrasonic probe that directs ultrasonic waves toward the surface of the pellicle. The vibration of the surface of the pellicle caused by the ultrasonic waves reduces the surface adhesion between the particles and the surface of the pellicle. The photomask cleaning tool includes: a tray motor that moves a slidable tray for supporting the photomask while at least one of the following is being performed: the nozzle blows gas onto the pellicle; or the ultrasonic probe directs the ultrasonic waves toward the surface of the pellicle.

[0082] In an embodiment of the present invention, wherein the nozzle comprises a plurality of openings through which the gas is blown; and wherein the spacing between the plurality of openings is such as to form a blowing pattern, the blowing pattern substantially covering the width of the protective film.

[0083] In an embodiment of the present invention, the nozzle comprises a plurality of openings through which the gas is to be blown; and wherein the lengths of the openings in the plurality of openings are such that the gas flow through the openings has a flow width substantially equal to the spacing between the plurality of openings.

[0084] In an embodiment of the present invention, the photomask cleaning tool further includes: a controller, which performs at least one of the following: causes the tray motor to move the slidable tray in a specific direction, causes the tray motor to move the slidable tray at a specific speed, causes the nozzle to blow gas onto the protective film, causes the nozzle to stop blowing gas onto the protective film, causes the nozzle to blow gas at a specific flow rate, causes the nozzle to blow gas at a specific angle relative to the surface of the protective film, causes the ultrasonic probe to direct the ultrasonic wave toward the surface of the protective film, or causes the ultrasonic probe to stop directing the ultrasonic wave toward the surface of the protective film.

[0085] In an embodiment of the present invention, the nozzle is a first nozzle; and the photomask cleaning tool further comprises: a second nozzle for blowing gas onto the pellicle of the photomask to remove the particles from the surface of the pellicle.

[0086] In an embodiment of the present invention, the first nozzle is used to blow gas onto the protective film at a first angle; and the second nozzle is used to blow gas onto the protective film at a second angle opposite to the first angle.

[0087] In an embodiment of the present invention, the first nozzle is used to blow gas onto the protective film in a first direction; and the second nozzle is used to blow gas onto the protective film in a second direction opposite to the first direction.

[0088] As described in more detail above, some embodiments described herein provide a method. The method includes causing a controller of a photomask cleaning tool to cause a first nozzle of the photomask cleaning tool to blow gas onto a pellicle of a photomask located on a tray while a tray moves in a first direction. The method includes causing a second nozzle of the photomask cleaning tool to blow gas onto the pellicle while the tray moves in a second direction opposite to the first direction after causing the first nozzle to blow gas onto the pellicle while the tray moves in the first direction. The first nozzle blows gas onto the pellicle in a first direction to apply a first removal force to particles on the pellicle. The second nozzle blows gas onto the pellicle in a second direction to apply a second removal force to the particles.

[0089] In an embodiment of the present invention, the photomask cleaning method further includes: determining one or more parameters of the first nozzle based on at least one of the following: the size of the particles, the shape of the particles, or the contact radius of the particles.

[0090] In an embodiment of the present invention, the one or more parameters include at least one of the following: a blowing area of ​​the first nozzle, a gas flow rate of the first nozzle, or a gas pressure of the first nozzle.

[0091] In an embodiment of the present invention, the photomask cleaning method further includes: causing the ultrasonic probe of the photomask cleaning tool to guide ultrasonic waves to the protective film while the tray moves in the first direction; and causing the ultrasonic probe to guide the ultrasonic waves to the protective film while the tray slides in the second direction, wherein the ultrasonic waves reduce the surface adhesion force applied to the particles while the first removal force is applied to the particles and while the second removal force is applied to the particles.

[0092] In an embodiment of the present invention, the photomask cleaning method further includes: determining one or more parameters of the ultrasonic probe based on at least one of the following: the size of the protective film, the shape of the protective film, or the moving direction of the tray.

[0093] In an embodiment of the present invention, the one or more parameters of the ultrasound probe include at least one of the following: a turn-on time of the ultrasound probe, and a turn-off time of the ultrasound probe, wherein the ultrasound probe is used to guide the ultrasound to the protective membrane during the turn-on time, and wherein the ultrasound probe is used to prohibit guiding the ultrasound to the protective membrane during the turn-off time.

[0094] In an embodiment of the present invention, causing the first nozzle to blow gas onto the protective film comprises: determining, based on the size and shape of the protective film, that the protective film is located within the gas blowing range of the first nozzle; and causing the first nozzle to blow gas onto the protective film based on determining that the protective film is located within the gas blowing range of the first nozzle.

[0095] As described in more detail above, some embodiments described herein provide a device. The device includes: one or more memories; and one or more processors, communicatively coupled to the one or more memories. The one or more memories and the one or more processors are used to determine one or more first parameters of a slidable tray associated with a photomask cleaning tool. The one or more memories and the one or more processors are used to determine one or more second parameters of one or more nozzles of the photomask cleaning tool. The one or more memories and the one or more processors are used to determine one or more third parameters of an ultrasonic probe of the photomask cleaning tool. The one or more memories and the one or more processors are used to cause the photomask cleaning tool to attempt to remove particles from a pellicle of a photomask located on the slidable tray based on the one or more first parameters, the one or more second parameters, and the one or more third parameters.

[0096] In an embodiment of the present invention, wherein the one or more first parameters include a speed at which the slidable tray is to move based on the position of the slidable tray.

[0097] In an embodiment of the present invention, wherein the one or more first parameters include the number of cycles of the slidable tray.

[0098] In an embodiment of the present invention, the one or more second parameters include: the on-time of a nozzle among the one or more nozzles, and the off-time of the nozzle, wherein the nozzle is used to blow gas onto the protective film during the on-time, and wherein the nozzle is used to prohibit blowing gas onto the protective film during the off-time.

[0099] In an embodiment of the present invention, when determining the one or more second parameters, the one or more processors are configured to: determine the on-time and the off-time based on: the direction of travel of the slidable tray, and the position of the slidable tray.

[0100] In an embodiment of the present invention, the one or more third parameters include: the distance between the ultrasound probe and the protective membrane, the power setting of the ultrasound probe, or the configuration of the ultrasound waves provided by the ultrasound probe.

[0101] The features of several embodiments are summarized above so that those skilled in the art can better understand the various aspects of the embodiments of the present disclosure. Those skilled in the art will understand that they can easily use the embodiments of the present disclosure as a basis for designing or modifying other processes and structures to implement the same purposes and / or achieve the same advantages as the embodiments described herein. Those skilled in the art will also recognize that these equivalent constructions do not depart from the spirit and scope of the embodiments of the present disclosure, and that they can make various changes, substitutions and modifications herein without departing from the spirit and scope of the embodiments of the present disclosure.

Claims

1. A photomask cleaning tool, characterized in that: include: a plurality of nozzles for blowing gas onto a same surface of a pellicle of a photomask to remove particles from the same surface of the pellicle; wherein the plurality of nozzles include a first nozzle, which is at a first angle relative to the photomask, and a second nozzle, which is at a second angle relative to the photomask and is different from the first angle; a transmitter device, which converts the received electrical signal into ultrasonic waves and directs the ultrasonic waves toward the surface of the protective film, wherein vibration of said same surface of said overcoat caused by said emitter means reduces surface adhesion between said particles and said same surface of said overcoat; and a tray motor, wherein the tray motor is used to move a slidable tray supporting the photomask in a first direction while the first nozzle blows the gas onto the pellicle, and Wherein, the tray motor is used to move the slidable tray in a second direction opposite to the first direction, while the second nozzle blows the gas onto the protective film, and the transmitter device directs the ultrasonic wave to the same surface of the protective film.

2. The photomask cleaning tool according to claim 1, characterized in that: wherein at least one of the first nozzle or the second nozzle comprises a plurality of openings through which the gas is to be blown, and The spacing between the plurality of openings is such as to form a blowing pattern that substantially covers the width of the protective film.

3. The photomask cleaning tool according to claim 1, characterized in that: wherein at least one of the first nozzle or the second nozzle comprises a plurality of openings through which the gas is to be blown, and The length of an opening among the plurality of openings is such that a gas flow passing through the opening has a flow width substantially equal to a spacing between the plurality of openings.

4. The photomask cleaning tool according to claim 1, characterized in that: Also includes: A controller performs at least one of the following: causing the tray motor to move the slidable tray in at least one of the first direction or the second direction, causing at least one of the first nozzle or the second nozzle to blow the gas onto the protective film, stopping at least one of the first nozzle or the second nozzle from blowing the gas onto the protective film, directing said transmitter means towards said same surface of said pellicle, or The transmitter device is caused to stop directing the ultrasonic waves toward the same surface of the pellicle.

5. The photomask cleaning tool according to claim 1, characterized in that: Also includes a housing supporting the slidable tray; and A plurality of support structures connected to the housing support the plurality of nozzles.

6. A photomask cleaning method, characterized in that: include: When a tray supporting the photomask moves in a first direction, a controller of the photomask cleaning tool causes a first nozzle of the photomask cleaning tool at a first angle relative to the photomask to blow gas onto a pellicle of the photomask on the tray with a first removal force to remove particles on the pellicle; as well as When the tray moves in a second direction opposite to the first direction, the controller causes a second nozzle of the photomask cleaning tool, which is at a second angle relative to the photomask and different from the first angle, to blow the gas onto the pellicle with a second removal force to remove the particles on the pellicle, as well as wherein the first nozzle and the second nozzle blow the gas onto the same surface of the pellicle of the photomask, and The transmitter device of the photomask cleaning tool located between the first nozzle and the second nozzle converts the received electrical signal into ultrasonic waves and directs the ultrasonic waves to the pellicle.

7. The photomask cleaning method according to claim 6, characterized in that: Also includes: One or more parameters of at least one of the first nozzle or the second nozzle are determined based on at least one of: The size of the particles, The shape of the particles, or The contact radius of the particles.

8. The photomask cleaning method according to claim 7, characterized in that: The one or more parameters include at least one of the following: a blowing area of ​​at least one of the first nozzle or the second nozzle, a gas flow rate of at least one of the first nozzle or the second nozzle, or A gas pressure of at least one of the first nozzle or the second nozzle.

9. The photomask cleaning method according to claim 6, characterized in that: The ultrasonic wave reduces the surface adhesive force applied to the particles while the first removal force is applied to the particles and while the second removal force is applied to the particles.

10. The photomask cleaning method according to claim 6, characterized in that: Also includes: Determining one or more parameters of the transmitter device based on at least one of: The size of the cuticle, The shape of the cuticle, or The first direction or the second direction of the tray.

11. The photomask cleaning method according to claim 10, characterized in that: wherein the one or more parameters of the transmitter device include at least one of the following: the on-time of the transmitter device, and the disconnection time of the transmitter device, wherein the transmitter means is used to direct the ultrasonic waves to the pellicle during the on-time, and The transmitter device is used to prohibit the ultrasonic wave from being directed to the protective film during the off time.

12. The photomask cleaning method according to claim 6, characterized in that: The step of causing the first nozzle to blow the gas onto the protective film comprises: Determining, based on the size and shape of the protective film, that the protective film is located within the gas blowing range of the first nozzle; and Based on the determination that the pellicle is located within the gas blowing range of the first nozzle, the first nozzle is caused to blow the gas onto the pellicle.

13. The photomask cleaning method according to claim 8, characterized in that: Also includes: moving the tray along the first direction; and, After moving the tray in the first direction, the tray is moved in the second direction.

14. A photomask cleaning device, characterized in that: include: one or more memories; as well as One or more processors coupled to the one or more memories, the one or more memories and the one or more processors configured to: determining one or more first parameters of a slidable tray of a photomask cleaning tool; determining one or more second parameters of a plurality of nozzles of the photomask cleaning tool, wherein The one or more second parameters include: a first angle of a first nozzle of the plurality of nozzles relative to the photomask, a second angle of a second nozzle of the plurality of nozzles relative to the photomask, and a turn-on time for each of the first nozzle and the second nozzle to blow gas onto the same surface of the pellicle of the photomask; determining one or more third parameters of an emitter device of the photomask cleaning tool, wherein the emitter device converts received electrical signals into ultrasonic waves and directs the ultrasonic waves to the pellicle of the photomask on the slidable tray; and Based on the one or more first parameters, the one or more second parameters and the one or more third parameters: When the slidable tray moves in a first direction, the first nozzle blows the gas onto the protective film. When the slidable tray moves in a second direction opposite to the first direction, the second nozzle blows the gas onto the pellicle, and the transmitter device guides the ultrasonic wave onto the pellicle.

15. The photomask cleaning device according to claim 14, characterized in that: Wherein the one or more first parameters include a speed at which the slidable tray is to move based on the position of the slidable tray.

16. The photomask cleaning device according to claim 14, characterized in that: Wherein the one or more first parameters include a number of cycles of the slidable tray.

17. The photomask cleaning device according to claim 14, characterized in that: The one or more second parameters further include: The off time of at least one of the first nozzle or the second nozzle is to prohibit the gas from being blown onto the protective film.

18. The photomask cleaning device according to claim 17, characterized in that: Wherein when determining the one or more second parameters, the one or more processors are configured to: The on-time and the off-time are determined based on: the first direction or the second direction of the slidable tray, and The position of the slidable tray.

19. The photomask cleaning device according to claim 14, characterized in that: The one or more third parameters include: The distance between the emitter device and the pellicle, the power setting of the transmitter device, or The configuration of the ultrasonic waves provided by the transmitter means.

20. The photomask cleaning device according to claim 14, characterized in that: The one or more second parameters include: at least one of the height of the first nozzle or the height of the second nozzle, at least one of the gas pressure of the first nozzle or the gas pressure of the second nozzle, At least one of a gas velocity of the first nozzle or a gas velocity of the second nozzle.

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