Display panel and manufacturing method thereof, and display device

Abstract

A display panel and its manufacturing method and display device are disclosed. The display panel includes a substrate (10), which includes a display area (200) and a peripheral area (300) surrounding the display area (200). The substrate (10) includes a first substrate layer (110), a third substrate layer (130), and a second substrate layer (120) stacked sequentially, wherein the material of the second substrate layer (120) includes amorphous silicon. The display area (200) includes a transparent display area (221), which includes a pixel area (2210) and a light-transmitting area (2211). The thickness of the second substrate layer (120) located in the light-transmitting area (2211) is less than the thickness of at least a portion of the second substrate layer (120) located outside the transparent display area (221). By setting the thickness of the second substrate layer (120) at the location of the light-transmitting area (2211) to be less than the thickness of the second substrate layer (120) located outside the transparent display area (221), the transmittance of blue light in the transparent display area (221) can be improved.

Description

Technical Field

[0001] At least one embodiment of the present disclosure relates to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] The concept of full-screen mobile phones using organic light-emitting diodes has attracted widespread attention in the mobile phone market and is also a future development trend. In this full-screen mobile phone, functional components such as the camera can be hidden so that the front visible area is almost entirely the screen, giving users a better display effect. Summary of the invention

[0003] Embodiments of the present disclosure provide a display panel and a manufacturing method thereof, and a display device.

[0004] The embodiment of the present disclosure provides a display panel, comprising: a substrate, comprising a display area and a peripheral area surrounding the display area, the substrate comprising a first substrate layer, a third substrate layer, and a second substrate layer stacked in sequence, the material of the second substrate layer comprising amorphous silicon. The display area comprises a transparent display area, the transparent display area comprises a pixel area and a light-transmitting area, the thickness of the second substrate layer located in the light-transmitting area is less than the thickness of at least a portion of the second substrate layer located outside the transparent display area.

[0005] In some examples, the display panel further includes: a plurality of pixel units located in the display area of ​​the substrate. The display area includes a first pixel density area and a second pixel density area, the pixel density of the plurality of pixel units located in the first pixel density area is greater than the pixel density of the plurality of pixel units located in the second pixel density area, and the transparent display area is located in the second pixel density area.

[0006] In some examples, each of the pixel units includes an organic light-emitting layer and a first electrode and a second electrode located on both sides of the organic light-emitting layer. The display panel includes a thin film transistor, the thin film transistor is located on a side of the third substrate layer away from the second substrate layer, the second electrode is connected to the thin film transistor, and the second electrode of the pixel unit located in the light-transmitting display area is located in the pixel area.

[0007] In some examples, the second substrate layer located in the transparent display area includes a first pattern, and an orthographic projection of the first pattern on the first substrate layer coincides with an orthographic projection of the second electrode on the first substrate layer.

[0008] In some examples, the second substrate layer located in the transparent display area further includes an opening, and the opening is located in the light-transmitting area.

[0009] In some examples, the thickness of the first pattern is the same as the thickness of at least a portion of the second substrate layer located outside the transparent display area.

[0010] In some examples, the second pixel density area also includes a transition area located at the periphery of the transparent display area, and the second substrate layer located in the transition area includes a second pattern, and the orthographic projection of the second pattern on the first substrate layer coincides with the orthographic projection of the second electrode on the first substrate layer.

[0011] In some examples, the second substrate layer is not disposed in the transparent display area.

[0012] In some examples, the thickness of the second substrate layer at each position within the transparent display area is uniform, and the thickness of the second substrate layer located in the transparent display area is less than the thickness of at least a portion of the second substrate layer located outside the transparent display area.

[0013] In some examples, the thickness of the second substrate layer outside the transparent display area is uniform.

[0014] In some examples, the thickness of the second substrate layer at each position in the display area is uniform, and the thickness of the second substrate layer in the peripheral area is greater than the thickness of the second substrate layer in the display area.

[0015] In some examples, the thickness of the second substrate layer located in the transparent display area is 1 to 3 nanometers.

[0016] In some examples, the second substrate layer is not disposed in the display area.

[0017] In some examples, the material of the first substrate layer includes polyimide, and the material of the third substrate layer includes silicon oxide or silicon nitride.

[0018] In some examples, the substrate substrate further includes a fourth substrate layer located on a side of the second substrate layer away from the third substrate layer, and a material of the fourth substrate layer includes polyimide.

[0019] The embodiment of the present disclosure provides a display panel, comprising: a substrate, comprising a display area and a peripheral area surrounding the display area, the substrate comprising a first substrate layer, a second substrate layer and a third substrate layer stacked in sequence, the material of the second substrate layer comprising amorphous silicon, the thickness of the second substrate layer at each position in the display area and the peripheral area being equal and not greater than 10 nanometers.

[0020] In some examples, the second substrate layer has a thickness of 1 to 3 nanometers.

[0021] In some examples, the display panel further includes: a plurality of pixel units located in the display area of ​​the substrate. The display area includes a first pixel density area and a second pixel density area, the pixel density of the plurality of pixel units located in the first pixel density area is greater than the pixel density of the plurality of pixel units located in the second pixel density area, and the transparent display area is located in the second pixel density area.

[0022] In some examples, each of the pixel units includes an organic light-emitting layer and a first electrode and a second electrode located on both sides of the organic light-emitting layer.

[0023] The display panel includes a thin film transistor, and the thin film transistor is located on a side of the third substrate layer away from the second substrate layer.

[0024] The embodiment of the present disclosure provides a method for manufacturing the above-mentioned display panel, comprising: forming the first substrate layer; forming the third substrate layer on the first substrate layer; forming a second substrate material layer on a side of the third substrate layer away from the first substrate layer; and patterning the second substrate material layer located in the transparent display area using a mask to form the first pattern. The mask is a mask for forming the second electrode located in the transparent display area.

[0025] An embodiment of the present disclosure provides a display device, comprising: the above-mentioned display panel; and a functional component located in the transparent display area and on the non-light-emitting side of the display panel, wherein the functional component is configured to emit or receive light passing through the transparent display area. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, but are not intended to limit the present disclosure.

[0027] Figure 1 is a schematic diagram of the effect of the amorphous silicon layer in the substrate on the light transmittance;

[0028] Figure 2 A schematic diagram of a partial planar structure of a display panel provided according to an embodiment of the present disclosure;

[0029] Figure 3A In an example of an embodiment of the present disclosure, Figure 2 A schematic diagram of a local cross-sectional structure cut along line AA shown;

[0030] Figure 3B In another example of an embodiment of the present disclosure, Figure 2 A schematic diagram of a local cross-sectional structure cut along line AA shown;

[0031] Figure 4A A schematic diagram of a partial cross-sectional structure of a pixel unit in an area outside a transparent display area of ​​a display panel provided in an embodiment of the present disclosure;

[0032] Figure 4B A schematic diagram of a light emitting area of ​​a pixel in a pixel unit located in a second pixel density area provided by an embodiment of the present disclosure;

[0033] Figure 4C A schematic diagram of a light emitting area of ​​a pixel in a pixel unit located in a first pixel density area provided by an embodiment of the present disclosure;

[0034] Figure 5 for Figure 3B A schematic diagram of the planar structure of a second substrate layer located in a transparent display area of ​​a display panel shown;

[0035] Figure 6 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure;

[0036] Figure 7 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure;

[0037] Figure 8 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure;

[0038] Fig. 9 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure;

[0039] Fig.10 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure; and

[0040] Fig.11 A schematic diagram of a partial cross-sectional structure of a display device provided in another embodiment of the present disclosure. DETAILED DESCRIPTION

[0041] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0042] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The words "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. The words "include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0043] The base substrate of the organic light emitting diode display panel includes a multi-layer structure, for example, the multi-layer structure may include an organic layer, an amorphous silicon layer, and an inorganic layer stacked in sequence. The camera is located on the non-light-emitting side of the organic light emitting diode display panel, that is, the organic light emitting diode display panel includes an organic light emitting element, and the camera is located on the side of the base substrate away from the organic light emitting element. As a result, the external ambient light passes through the base substrate and is incident on the camera of the camera set in the mobile phone.

[0044] Figure 1 Schematic diagram of the effect of the amorphous silicon layer in the substrate on the light transmittance. Figure 1 As shown, compared with the case where an amorphous silicon layer is provided in the substrate, the transmittance of blue light is significantly improved after the amorphous silicon layer in the substrate is removed. Figure 1 The horizontal axis of the schematic diagram shown is wavelength, and the vertical axis is transmittance. The transmittance of blue light within the wavelength of 478 nanometers to 492 nanometers can be increased by about 10%, and the overall transmittance of the substrate in the visible light band can be increased by about 2% to 4%. In the study, the inventors of the present application found that the thickness of the amorphous silicon layer of the organic light emitting diode display panel is relatively large, for example, the thickness is greater than 15 nanometers. The thick amorphous silicon layer will weaken the blue light in the external ambient light incident thereon, resulting in uneven light received by the camera, which in turn causes the light received by the camera to be yellowish.

[0045] Embodiments of the present disclosure provide a display panel and a method for manufacturing the same, and a display device. The display panel includes a substrate substrate, the substrate substrate includes a display area and a peripheral area surrounding the display area. The substrate substrate includes a first substrate layer, a third substrate layer, and a second substrate layer stacked in sequence, and the material of the second substrate layer includes amorphous silicon. The display area includes a transparent display area, the transparent display area includes a pixel area and a light-transmitting area, and the thickness of the second substrate layer located in the light-transmitting area is less than the thickness of at least a portion of the second substrate layer located outside the transparent display area. In the embodiment of the present disclosure, by setting the thickness of the second substrate layer at the light-transmitting area to be less than the thickness of the second substrate layer located outside the transparent display area, the transmittance of blue light in the transparent display area can be improved.

[0046] The display panel and its manufacturing method, and the display device provided by the embodiments of the present disclosure are described below with reference to the accompanying drawings.

[0047] Figure 2 is a schematic diagram of a partial planar structure of a display panel provided according to an embodiment of the present disclosure, Figure 3A An example of an embodiment of the present disclosure is provided along Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Figure 2 As shown, the display panel includes a base substrate 10, which includes a display area 200 and a peripheral area 300 surrounding the display area 200. For example, the display area 200 is an area for displaying images, that is, a light emitting area; the peripheral area 300 is an area where images are not displayed, that is, a non-light emitting area.

[0048] like Figure 3A As shown, the substrate 10 includes a first substrate layer 110, a third substrate layer 130 and a second substrate layer 120 which are stacked in sequence, and the material of the second substrate layer 120 includes amorphous silicon. Figure 2 and Figure 3A As shown, the display area 200 includes a transparent display area 221, and the transparent display area 221 includes a pixel area 2210 and a light-transmitting area 2211. The thickness of the second substrate layer 120 located in the light-transmitting area 2211 is less than the thickness of at least a portion of the second substrate layer 120 located outside the transparent display area 221. In the embodiment of the present disclosure, by setting the thickness of the second substrate layer in the light-transmitting area to be less than the thickness of the second substrate layer outside the transparent display area, the transmittance of blue light in the second substrate layer located in the light-transmitting area can be increased. It should be noted that the thickness of the second substrate layer located in the light-transmitting area can be zero. In other words, the second substrate layer may not be provided in the light-transmitting area. For example, the thickness of the second substrate layer in the entire transparent display area is less than the thickness of the second substrate layer outside the transparent display area, or the second substrate layer in the transparent display area is patterned so that the second substrate layer in the light-transmitting area is thinned (including thinning to zero).

[0049] For example, Figure 3B Another example of the present disclosure provides an embodiment of the Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Figure 3B The example shown is similar to Figure 3A The example shown differs in that Figure 3A In the example shown, the second substrate layer 120 is located between the first substrate layer 110 and the third substrate layer 130; Figure 3B In the example shown, the second substrate layer 120 is located on a side of the third substrate layer 130 away from the first substrate layer 110. In the following embodiments, the second substrate layer 120 is located on a side of the third substrate layer 130 away from the first substrate layer 110 as an example for description.

[0050] For example, Figure 1 As shown, the display panel also includes a plurality of pixel units 140 located in a display area 200 of the base substrate 10. The display area 200 includes a first pixel density area 210 and a second pixel density area 220. The pixel density (Pixels Per Inch, PPI) of the plurality of pixel units 140 located in the first pixel density area 210 is greater than the pixel density of the plurality of pixel units 140 located in the second pixel density area 220, that is, the first pixel density area 210 may be a high pixel density area, and the second pixel density area 220 may be a low pixel density area. The transparent display area 221 is located in the second pixel density area 220, that is, the transparent display area 221 is a part of the low pixel density area.

[0051] For example, the first pixel density zone 210 may also be called a normal pixel zone, and the second pixel density zone 220 may also be called an abnormal pixel zone. The light-emitting area of ​​the pixel units in the second pixel density zone 220 may be 1 / 4 of the light-emitting area of ​​the pixel units in the first pixel density zone 210, and the pixel density of the pixel units in the second pixel density zone 220 may be 1 / 2 of the pixel density of the pixel units in the first pixel density zone 210.

[0052] When the camera is located on the non-display side of the display panel, the camera acquires external light signals transmitted through the transparent display area to perform imaging. The disclosed embodiment designs the pixel density of the transparent display area to be lower than the pixel density of the first pixel density area, which can increase the light transmittance of the transparent display area while taking into account the display to achieve the camera function.

[0053] For example, Figure 2 As shown, the area of ​​the first pixel density region 210 is greater than the area of ​​the second pixel density region 220 to achieve normal display.

[0054] For example, Figure 2 As shown, the shape of the first pixel density area 210 and the second pixel density area 220 combined can be a rectangle, that is, the shape of the display area 200 can be a rectangle. For example, the shape of the display area 200 can be a regular shape such as a rectangle, a circle, or an irregular shape. For example, the shape of the second pixel density area 220 can be a regular shape such as a rectangle, a circle, or an irregular shape. For example, the shape of the transparent display area 221 can be a regular shape such as a rectangle, a circle, or an irregular shape, and the embodiments of the present disclosure are not limited to this.

[0055] For example, the first pixel density area 210 may surround the second pixel density area 220, and the second pixel density area 220 may also be located at a side edge of the first pixel density area 210. The embodiment of the present disclosure does not limit the positional relationship between the first pixel density area and the second pixel density area.

[0056] For example, Figure 4A FIG. 1 is a schematic diagram of a partial cross-sectional structure of a pixel unit in an area outside the transparent display area of ​​a display panel provided by an embodiment of the present disclosure. Figure 1 and Figure 4A As shown, each pixel unit 140 located outside the transparent display area 221 may include a plurality of sub-pixels, each sub-pixel includes an organic light-emitting element and a pixel circuit electrically connected to the organic light-emitting element. The organic light-emitting element includes an organic light-emitting layer 143, a first electrode 141 and a second electrode 142 located on both sides of the organic light-emitting layer 143, and the organic light-emitting layer 143 may be driven to emit light by applying an electrical signal to the first electrode 141 and the second electrode 142.

[0057] For example, in the embodiment of the present disclosure, the second electrode 142 is an independent electrode of each sub-pixel, and the first electrode 141 is a common electrode shared by each sub-pixel. However, the present invention is not limited thereto.

[0058] For example, the pixel unit 140 may include sub-pixels of different colors, such as red sub-pixels, green sub-pixels, and blue sub-pixels. The embodiment of the present disclosure is not limited to this and can be set according to actual product requirements.

[0059] For example, Figure 4A As shown, the display panel includes a pixel defining layer 146, and the pixel defining layer 146 includes a plurality of openings to define light emitting areas of sub-pixels.

[0060] For example, Figure 4A As shown, each pixel unit 140 may further include a thin film transistor 144 electrically connected to the second electrode 142 , and the thin film transistor 144 is located on a side of the second substrate layer 120 away from the third substrate layer 130 . Figure 4A The second substrate layer 120 is schematically shown as a patterned structure (including the first pattern 121 ), but is not limited thereto and may also be a whole film layer, or a film layer located only outside the transparent display area.

[0061] For example, Figure 4A As shown, the thin film transistor 144 includes an active layer 1440 , and the material of the active layer 1440 includes amorphous silicon. The thin film transistor 144 also includes a source electrode 1441 and a drain electrode 1442 , and one of the source electrode 1441 and the drain electrode 1442 is electrically connected to the second electrode 142 .

[0062] For example, Figure 4A As shown, the second electrode 142 is electrically connected to one of the source electrode 1441 and the drain electrode 1442 through the passivation layer 108 located between the second electrode 142 and the source and drain electrodes and the via hole provided in the planar layer 109 .

[0063] Figure 4AOnly a thin film transistor electrically connected to the second electrode is schematically shown, and the thin film transistor may be a light emitting control transistor in a pixel circuit included in the display panel. For example, the pixel circuit in the embodiment of the present disclosure may include a 7T1C (i.e., seven transistors and one capacitor) structure, but is not limited thereto, and may also include a 7T2C structure, a 6T1C structure, a 6T2C structure, or a 9T2C structure.

[0064] For example, when the pixel circuit includes a 7T1C structure, it may include a driving transistor T1, a data writing transistor T2, a threshold compensation transistor T3, a first light emission control transistor T4, a second light emission control transistor T5, a first reset transistor T6 and a second reset transistor T7. Figure 4A The thin film transistor shown can be a second light-emitting control transistor, which is electrically connected to the driving transistor and the second electrode of the organic light-emitting element, and is configured to realize the connection between the driving transistor and the organic light-emitting element. The control end of the driving transistor is connected to the data line included in the display panel, and the first end or the second end of the driving transistor is electrically connected to the second electrode of the organic light-emitting element to provide the organic light-emitting element with a driving current to drive it to emit light. Figure 4A The pixel unit shown includes a pixel circuit, and the pixel unit located in the transparent display area is Figure 4A The difference between the pixel units shown is that the pixel units in the transparent display area do not include pixel circuits.

[0065] For example, Figure 2 As shown, the area outside the transparent display area 221 includes the first pixel density area 210 and the area of ​​the second pixel density area 220 except the transparent display area 221. For example, the second pixel density area 220 also includes a transition area 222 located around the transparent display area 221. The embodiment of the present disclosure takes the area of ​​the second pixel density area 220 except the transparent display area 221 as the transition area 222 as an example, but is not limited thereto. The second pixel density area may also include other areas.

[0066] For example, the pixel units 140 respectively located in the transition area 222 and the first pixel density area 210 both include organic light-emitting elements and pixel circuits, and the pixel density of the pixel units 140 located in the transition area 222 is lower than the pixel density of the pixel units located in the first pixel density area 220 .

[0067] For example, the pixel unit 140 located in the transparent display area 221 includes only an organic light-emitting element, but does not include a pixel circuit. For example, each pixel unit 140 located in the transparent display area 221 includes an organic light-emitting layer 143, a first electrode 141, and a second electrode 142. For example, the second electrode 142 included in the organic light-emitting element is only located in the pixel area 2210, and is not located in the light-transmitting area 2211. Only an organic light-emitting element is provided in the pixel area 2210, and no pixel circuit is provided. For example, the pixel unit located in the transparent display area includes only an organic light-emitting element, which can better ensure the light transmittance at the camera position and achieve a better photo effect.

[0068] For example, the pixel circuit electrically connected to the organic light-emitting element in the transparent display area 221 is not arranged in the transparent display area 221, but is arranged in an area outside the transparent display area 221, for example, it can be located in the transition area 222. For example, the wiring connected to the organic light-emitting element in the transparent display area 221 can be made of transparent conductive material to ensure that the signal can be transmitted while having a high light transmittance.

[0069] For example, Figure 2 -3, the second substrate layer 120 located in the transparent display area 221 includes a first pattern 121, and the orthographic projection of the first pattern 121 on the first substrate layer 110 coincides with the orthographic projection of the second electrode 142 on the first substrate layer 110, that is, the first pattern 121 is located in the pixel area 2210. That is, the second substrate layer 120 can be patterned with the second electrode 142 in the organic light-emitting element using the same mask to save the mask process. For example, the first substrate layer 110 and the third substrate layer 130 in the embodiment of the present disclosure are both continuous whole film layers so that the substrate substrate is a continuous film layer. The coincidence of the orthographic projection of the above-mentioned first pattern and the second electrode on the first substrate layer can include that the orthographic projections of the two completely coincide and roughly coincide, and the orthographic projections of the two roughly coincide means that the coincidence rate of the orthographic projections of the two is greater than 95%.

[0070] For example, Figure 4AAs shown, the display panel further includes a first buffer layer 101, a second buffer layer 102, and a first gate insulating layer 103 sequentially located on the fourth substrate layer 150. The first gate insulating layer 103 covers the active layer 1440, a first gate layer 104 is disposed on the first gate insulating layer 103, a second gate insulating layer 105 is disposed on the first gate layer 104, a second gate layer 106 is disposed on the second gate insulating layer 105, an interlayer insulating layer 107 is disposed on the second gate layer 106, and source-drain electrodes 1441 and 1442 are disposed on the interlayer insulating layer 107, and the source-drain electrodes 1441 and 1442 are electrically connected to the active layer 1440 through vias on the interlayer insulating layer 107 and the second gate insulating layer 107. A first inorganic encapsulation layer 147, an organic encapsulation layer 148, and a second inorganic encapsulation layer 149 are sequentially disposed on the side of the first electrode 141 away from the first substrate layer 110.

[0071] For example, Figure 4B A schematic diagram of a light emitting area of ​​a pixel in a pixel unit located in a second pixel density area provided by an embodiment of the present disclosure; Figure 4C A schematic diagram of a light emitting area of ​​a pixel in a pixel unit located in a first pixel density area provided by an embodiment of the present disclosure. Figure 4B and Figure 4C As shown, the area of ​​the light-emitting region 1400 of the sub-pixel 1401 included in the pixel unit in the second pixel density area is greater than the area of ​​the light-emitting region 1400 of the sub-pixel 1402 included in the pixel unit in the first pixel density area.

[0072] For example, the opening area of ​​the pixel defining layer in the first pixel density zone can be set to be smaller than the opening area of ​​the pixel defining layer in the second pixel density zone, so that the area of ​​the light-emitting area of ​​the sub-pixel 1401 in the second pixel density zone is larger than the area of ​​the light-emitting area of ​​the sub-pixel in the first pixel density zone.

[0073] For example, the area of ​​the second electrode of the sub-pixel in the first pixel density area may be set smaller than the area of ​​the second electrode of the sub-pixel in the second pixel density area, so that the area of ​​the light-emitting area of ​​the sub-pixel in the second pixel density area is larger than the area of ​​the light-emitting area of ​​the sub-pixel in the first pixel density area. In this case, compared with the case where the area of ​​the second electrode of the sub-pixel in the first pixel density area is equal to the area of ​​the second electrode of the sub-pixel in the second pixel density area, the area of ​​the first pattern of the second substrate layer becomes larger, and the area of ​​the opening in the light-transmitting area is correspondingly reduced.

[0074] For example, Figure 5 for Figure 3B The schematic diagram of the planar structure of the second substrate layer located in the transparent display area of ​​the display panel shown in FIG. Figure 2-5As shown, here, the sub-pixels included in the pixel unit are arranged as a GGRB pixel arrangement structure as an example, that is, one pixel group includes two green sub-pixels, one red sub-pixel and one blue sub-pixel. The four second electrodes included in the four sub-pixels in the same pixel group are separated from each other, and there is also a certain interval between adjacent pixel groups. The embodiments of the present disclosure are not limited to this, and the multiple sub-pixels included in the display panel can be arranged in various pixel arrangements.

[0075] For example, Figure 2-4A As shown, the second substrate layer 120 located in the transparent display area 221 further includes an opening 123, and the orthographic projection of the opening 123 on the first substrate layer 110 does not overlap with the orthographic projection of the second electrode 142 on the first substrate layer 110, that is, the opening 123 is located in the light-transmitting area 2211. That is, the second substrate layer 120 located in the transparent display area 221 may include a first pattern 121 and an opening 123, the first pattern 121 is located in the pixel area, and the opening 123 is located in the light-transmitting area. For example, the orthographic projection of the opening 123 on the first substrate layer 110 may coincide with the orthographic projection of the interval between the second electrodes 142 on the first substrate layer 110. For example, the planar shapes of the first pattern 121 and the opening 123 may be complementary shapes.

[0076] In one embodiment of the present disclosure, the second substrate layer located in the transparent display area includes a first pattern and an opening, and the second substrate layer located in the transparent display area may include two different thicknesses, namely, the thickness at the first pattern position and the thickness at the opening position. The thickness of the second substrate layer at the opening position is 0, and therefore, the thickness of the second substrate layer at the opening position is less than the thickness of at least a portion of the second substrate layer outside the transparent display area.

[0077] For example, Figure 2-4A As shown, the thickness of the first pattern 121 may be the same as the thickness of at least a portion of the second substrate layer 120 located outside the transparent display area 221. For example, the thickness of the second substrate layer 120 located outside the transparent display area 221 may be the same as the thickness of the amorphous silicon layer included in the substrate substrate in a general display panel, for example, greater than 15 nanometers, and the thickness of the first pattern 121 is the same as the thickness of the second substrate layer 120 located outside the transparent display area 221 to save a mask. The disclosed embodiments are not limited thereto, and the thickness of the first pattern may also be thinner than the thickness of at least a portion of the second substrate layer located outside the transparent display area, thereby further improving the transmittance of blue light in the transparent display area.

[0078] The embodiment of the present disclosure can improve the transmittance of the base substrate in the transparent display area to blue light by patterning the second base layer in the transparent display area to form openings.

[0079] For example, Figure 1-4AAs shown, the second substrate layer 120 located in the transition region 222 includes a second pattern 122 , and the orthographic projection of the second pattern 122 on the first substrate layer 110 coincides with the orthographic projection of the second electrode 142 on the first substrate layer 110 .

[0080] For example, the second substrate layer 120 located in the transition region 222 further includes an opening pattern (not labeled), and the orthographic projection of the opening pattern on the first substrate layer 110 does not overlap with the orthographic projection of the second electrode 142 on the first substrate layer 110 .

[0081] For example, the first pattern 121 may include a plurality of first sub-patterns, each of which may be the same as the pattern of the second electrode included in each pixel group located in the transparent display area 221. The second pattern 122 may also include a plurality of second sub-patterns, each of which may be the same as the pattern of the second electrode included in each pixel unit located in the transition area 222.

[0082] For example, a planar shape of the first sub-pattern is the same as a planar shape of the second sub-pattern, and a size of the first sub-pattern is also the same as a size of the second sub-pattern.

[0083] For example, the first pattern 121 and the second pattern 122 may be patterns formed by patterning the same mask in the same process.

[0084] The pixel density of the pixel units located in the second pixel density area is uniform, and the pixel density of the pixel units located in the transparent display area and the transition area is equal. Therefore, the mask area for patterning the second electrode located in the transparent display area and the mask area for patterning the second electrode located in the transition area are two areas of the same mask plate. That is, a mask plate is used to simultaneously form the second electrode of the organic light-emitting element located in the transparent display area and the transition area, and the mask area for forming the second electrode in the transparent display area is a part of the above-mentioned mask plate. While the mask plate for forming the second electrode located in the transparent display area is used to pattern the first pattern, the second pattern can be formed to save process.

[0085] For example, the material of the first substrate layer 110 may include an organic material such as polyimide, and the material of the third substrate layer 130 may include an inorganic material such as silicon oxide or silicon nitride.

[0086] For example, Figure 3B As shown, the substrate 10 further includes a fourth substrate layer 150 located on a side of the second substrate layer 120 away from the third substrate layer 130, and the material of the fourth substrate layer 150 includes polyimide. In the embodiment of the present disclosure, by arranging a second substrate layer made of amorphous silicon between the fourth substrate layer and the third substrate layer, the interface adhesion effect between the fourth substrate layer and the third substrate layer can be increased.

[0087] For example, the thickness of the fourth substrate layer 150 is at the micron level, and the thickness of the second substrate layer 120 is at the nanometer level, for example, not greater than 10 nanometers. Even if the second substrate layer 120 located in the transparent display area 221 is patterned to form an opening 123, it will not cause the side of the base substrate 10 facing the organic light-emitting element to be uneven.

[0088] For example, the thin film transistor 144 may be located on a side of the fourth substrate layer 150 away from the second substrate layer 120 .

[0089] For example, Figure 6 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure. Figure 6 Can be along Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Figure 6 As shown, this embodiment and Figure 3B The difference between the illustrated embodiment is that in this embodiment, the second substrate layer 120 is not disposed in the transparent display area 221 , that is, the thickness of the second substrate layer 120 in the transparent display area 221 is 0.

[0090] In the disclosed embodiment, by removing the second substrate layer in the substrate in the transparent display area, that is, not providing the second substrate layer in the transparent display area, the transmittance of blue light in the transparent display area can be increased, thereby achieving the purpose of improving the camera shooting effect.

[0091] For example, Figure 2 and Figure 6 As shown, in the display area 200 , the thickness of the second substrate layer 120 at locations other than the transparent display area 221 is uniform to ensure a better adhesion effect between the fourth substrate layer 150 and the third substrate layer 130 .

[0092] For example, Figure 2 and Figure 6 As shown, the thickness of the second substrate layer 120 outside the transparent display area 221 is uniform to ensure a better adhesion effect between the fourth substrate layer 150 and the third substrate layer 130. That is, the thickness of the second substrate layer 120 in the display area 200 outside the transparent display area 221 and the second substrate layer 120 in the peripheral area 300 are uniform to facilitate manufacturing.

[0093] For example, Figure 2 and Figure 6 As shown, the thickness of the second substrate layer 120 outside the transparent display area 221 may be greater than 15 microns.

[0094] For example, the thickness of the second substrate layer located in the peripheral area may be greater than the thickness of the second substrate layer located in the display area.

[0095] Figure 6The material, shape, thickness and other characteristics of the substrate substrate in the embodiment shown are similar to those of the first substrate layer 110, the third substrate layer 130 and the fourth substrate layer 150. Figure 3A The three film layers included in the base substrate in the illustrated embodiment have the same features and will not be described in detail herein.

[0096] Figure 6 The pixel unit in the embodiment shown includes the structure, arrangement and position relationship with the transparent display area, etc. Figure 3B The features of the pixel units in the illustrated embodiments are the same and will not be described in detail herein.

[0097] For example, Figure 7 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure. Figure 7 Can be along Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Figure 7 As shown, this embodiment and Figure 3B The difference between the illustrated embodiments is that, in this embodiment, the thickness of the second substrate layer 120 at each position within the transparent display area 221 is uniform, and the thickness of the second substrate layer 120 within the transparent display area 221 is less than the thickness of at least a portion of the second substrate layer 120 located outside the transparent display area 221.

[0098] For example, the thickness of the second substrate layer 120 located in the transparent display area 221 is 1-3 nanometers, and the thickness of at least a portion of the second substrate layer 120 located outside the transparent display area 221 is greater than 15 nanometers.

[0099] For example, the thickness of the second substrate layer 120 located in the transparent display area 221 is 1.5-2.5 nanometers.

[0100] In the disclosed embodiment, by reducing the thickness of the second substrate layer in the substrate in the transparent display area, the transmittance of blue light in the transparent display area can be increased, thereby achieving the purpose of improving the camera shooting effect.

[0101] For example, Figure 7 As shown, in the display area 200 , the thickness of the second substrate layer 120 at locations other than the transparent display area 221 is uniform to ensure a better adhesion effect between the fourth substrate layer 150 and the third substrate layer 130 .

[0102] For example, Figure 7 As shown, the thickness of the second substrate layer 120 outside the transparent display area 221 is uniform to ensure a better adhesion effect between the fourth substrate layer 150 and the third substrate layer 130. That is, the thickness of the second substrate layer 120 in the display area 200 outside the transparent display area 221 and the second substrate layer 120 in the peripheral area 300 are uniform to facilitate manufacturing.

[0103] For example, the thickness of the second substrate layer located in the peripheral area may be greater than the thickness of the second substrate layer located in the display area.

[0104] Figure 7 The material, shape, thickness and other characteristics of the substrate substrate in the embodiment shown are similar to those of the first substrate layer 110, the third substrate layer 130 and the fourth substrate layer 150. Figure 3B The three film layers included in the base substrate in the illustrated embodiment have the same features and will not be described in detail herein.

[0105] Figure 7 The pixel unit in the embodiment shown includes the structure, arrangement and position relationship with the transparent display area, etc. Figure 3B The features of the pixel units in the illustrated embodiments are the same and will not be described in detail herein.

[0106] For example, Figure 8 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure. Figure 8 Can be along Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Figure 8 As shown, this embodiment and Figure 3B The difference of the illustrated embodiment is that the thickness of the second substrate layer 120 at various positions in the display area 200 is uniform, and the thickness of the second substrate layer 120 in the peripheral area 300 is greater than the thickness of the second substrate layer 120 in the display area 200 .

[0107] For example, the thickness of the second substrate layer 120 located in the display area 200 is 1-3 nanometers, and the thickness of the second substrate layer 120 located in the peripheral area 300 is greater than 15 nanometers.

[0108] For example, the thickness of the second substrate layer 120 located in the display area 200 is 1.5-2.5 nanometers.

[0109] In the embodiment of the present disclosure, by reducing the thickness of the second substrate layer in the substrate in the display area, the transmittance of blue light in the transparent display area can be increased, thereby achieving the purpose of improving the camera shooting effect.

[0110] For example, Figure 8 As shown, the thickness in the peripheral area 300 is uniform to ensure a better adhesion effect between the fourth substrate layer 150 and the third substrate layer 130 .

[0111] Figure 8 The material, shape, thickness and other characteristics of the substrate substrate in the embodiment shown are similar to those of the first substrate layer 110, the third substrate layer 130 and the fourth substrate layer 150. Figure 3B The three film layers included in the base substrate in the illustrated embodiment have the same features and will not be described in detail herein.

[0112] Figure 8 The pixel unit in the embodiment shown includes the structure, arrangement and position relationship with the transparent display area, etc. Figure 3B The features of the pixel units in the illustrated embodiments are the same and will not be described in detail herein.

[0113] For example, Fig. 9 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure. Fig. 9 Can be along Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Fig. 9 As shown, this embodiment and Figure 3B The difference between the illustrated embodiment is that in this embodiment, the second substrate layer 120 is not disposed in the display area 200 , that is, the thickness of the second substrate layer 120 in the display area 200 is 0.

[0114] In the embodiment of the present disclosure, by removing the second substrate layer in the substrate in the display area, the transmittance of blue light in the transparent display area can be increased, thereby achieving the purpose of improving the camera shooting effect.

[0115] For example, Figure 2 and Fig. 9 As shown, the thickness of the second substrate layer 120 in the peripheral area 300 is uniform to ensure a better adhesion effect between the fourth substrate layer 150 and the third substrate layer 130 .

[0116] For example, the thickness of the second substrate layer 120 located in the peripheral region 300 may be greater than 15 nanometers.

[0117] Fig. 9 The material, shape, thickness and other characteristics of the substrate substrate in the embodiment shown are similar to those of the first substrate layer 110, the third substrate layer 130 and the fourth substrate layer 150. Figure 3B The three film layers included in the base substrate in the illustrated embodiment have the same features and will not be described in detail herein.

[0118] Fig. 9 The pixel unit in the embodiment shown includes the structure, arrangement and position relationship with the transparent display area, etc. Figure 3B The features of the pixel units in the illustrated embodiments are the same and will not be described in detail herein.

[0119] Figure 6-Figure 9 The transparent display area in the embodiment shown may be located at Figure 2 The second pixel density area 220 (i.e., low pixel density area) shown may also be located at Figure 2 The first pixel density area 210 (i.e., high pixel density area) shown in FIG. Figure 6-Figure 9 The transparent display area in the illustrated embodiment is located Figure 2 Taking the second pixel density area 220 as an example, the light transmittance of the transparent display area can be increased to achieve the camera function while taking into account the display.

[0120] For example, Fig.10 A schematic diagram of a partial cross-sectional structure of a display panel provided in another embodiment of the present disclosure. Fig.10 Can be along Figure 2 The schematic diagram of the local cross-section structure cut by the AA line shown in FIG. Figure 2 and Fig.10 As shown, the display panel includes a base substrate 10 , and the base substrate 10 includes a display area 200 and a peripheral area 300 surrounding the display area 200 .

[0121] like Figure 2 and Fig.10 As shown, the base substrate 10 includes a first base layer 110, a third base layer 130 and a second base layer 120 stacked in sequence, and the material of the second base layer 120 includes amorphous silicon. The thickness of the second base layer 120 at each position of the display area 200 and the peripheral area 300 is uniform and not greater than 10 nanometers. In the embodiment of the present disclosure, by setting the thickness of the second base layer in the base substrate to be thinner, the transmittance of blue light in the transparent display area can be improved.

[0122] For example, the thickness of the second substrate layer 120 may be 1-3 nanometers.

[0123] For example, the thickness of the second substrate layer 120 may be 1.5-2.5 nanometers.

[0124] Compared with the case where the thickness of the second substrate layer in a general substrate is greater than 15 nanometers, the thickness of the second substrate layer in the embodiment of the present disclosure is no more than 10 nanometers. By setting the thickness of the second substrate layer in the substrate to be thinner, the transmittance of blue light in the transparent display area can be improved.

[0125] The disclosed embodiment can directly deposit to form a second substrate layer with a relatively thin thickness, for example, 1 to 3 mm, without patterning, and can improve the blue light transmittance of the transparent display area without increasing the process cost.

[0126] For example, Figure 2 and Fig.10As shown, the display panel also includes a plurality of pixel units 140 located in a display area 200 of the base substrate 10. The display area 200 includes a first pixel density area 210 and a second pixel density area 220. The pixel density (Pixels Per Inch, PPI) of the plurality of pixel units 140 located in the first pixel density area 210 is greater than the pixel density of the plurality of pixel units 140 located in the second pixel density area 220, that is, the first pixel density area 210 may be a high pixel density area, and the second pixel density area 220 may be a low pixel density area. The transparent display area 221 is located in the second pixel density area 220, that is, the transparent display area 221 is a part of the low pixel density area.

[0127] When the camera is located on the non-display side of the display panel, the camera performs imaging by acquiring external light signals transmitted through the transparent display area. The disclosed embodiment designs the pixel density of the transparent display area to be lower than the pixel density of the first pixel density area. This can increase the light transmittance of the transparent display area while taking into account the display to achieve the camera function.

[0128] For example, Figure 2 As shown, the shape of the first pixel density area 210 and the second pixel density area 220 combined can be a rectangle, that is, the shape of the display area 200 can be a rectangle. For example, the shape of the display area 200 can be a regular shape such as a rectangle, a circle, or an irregular shape. For example, the shape of the second pixel density area 220 can be a regular shape such as a rectangle, a circle, or an irregular shape. For example, the shape of the transparent display area 221 can be a regular shape such as a rectangle, a circle, or an irregular shape, and the embodiments of the present disclosure are not limited to this.

[0129] For example, the first pixel density area 210 may surround the second pixel density area 220, and the second pixel density area 220 may also be located at a side edge of the first pixel density area 210. The embodiment of the present disclosure does not limit the positional relationship between the first pixel density area and the second pixel density area.

[0130] For example, Figure 2 As shown, the area outside the transparent display area 221 includes the first pixel density area 210 and the area of ​​the second pixel density area 220 except the transparent display area 221. For example, the second pixel density area 220 also includes a transition area 222 located around the transparent display area 221. The embodiment of the present disclosure takes the area of ​​the second pixel density area 220 except the transparent display area 221 as the transition area 222 as an example, but is not limited thereto. The second pixel density area may also include other areas.

[0131] The pixel unit included in the embodiment of the present disclosure can be Figure 4A The pixel units shown have the same features, which will not be described in detail here.

[0132] For example, another embodiment of the present disclosure provides a method for making Figure 3B The manufacturing method of the display panel shown in FIG. Figure 3B As shown, the manufacturing method provided by the embodiment of the present disclosure includes:

[0133] S10: forming a first substrate layer 110 .

[0134] For example, the material of the first substrate layer 110 may include organic materials such as polyimide.

[0135] For example, the first substrate layer 110 may be a whole continuous film layer.

[0136] S20 : ​​forming a third substrate layer 130 on the first substrate layer 110 .

[0137] For example, the third substrate layer 130 may be a whole continuous film layer.

[0138] For example, the material of the third substrate layer 130 may include inorganic materials such as silicon oxide or silicon nitride.

[0139] S30 : forming a second substrate material layer on a side of the third substrate layer 130 away from the first substrate layer 110 .

[0140] For example, the material of the second substrate material layer includes amorphous silicon.

[0141] S40 : patterning the second substrate material layer located in the transparent display area 221 using a mask plate to form a first pattern 121 , wherein the mask plate is a mask plate for forming the second electrode 142 located in the transparent display area 221 .

[0142] For example, after forming the second substrate material layer on the third substrate layer, the second substrate material layer can be etched by dry etching or wet etching. Since the material of the first substrate layer is an organic material and the material of the second substrate material layer is an inorganic material, during wet etching, the inorganic material can be selectively etched by selecting a suitable etching solution, while the effect on the organic material is relatively low. For example, the etching solution has a relatively large etching selectivity for the materials of the second substrate material layer and the first substrate layer, so as to prevent the etching solution from etching the first substrate layer.

[0143] For example, the second substrate material layer in the transparent display area 221 is etched to form the first pattern 121 using the mask plate for forming the second electrode 142 in the transparent display area 221 as a mask, which can improve the blue light transmittance of the transparent display area while ensuring that no additional mask plates are added.

[0144] For example, Figure 3BAs shown, while forming the first pattern 121 , the second substrate material layer located in the transition region 222 may be patterned using the mask to form the second pattern 122 .

[0145] The pixel density of the pixel units located in the second pixel density area is uniform, and the pixel density of the pixel units located in the transparent display area and the transition area is equal. Therefore, the mask area for patterning the second electrode located in the transparent display area and the mask area for patterning the second electrode located in the transition area are two areas of the same mask plate. That is, a mask plate is used to simultaneously form the second electrode of the organic light-emitting element located in the transparent display area and the transition area, and the mask area for forming the second electrode in the transparent display area is a part of the above-mentioned mask plate. When the mask plate for forming the second electrode located in the transparent display area is used to pattern the first pattern, the second pattern is formed, which can save process.

[0146] For example, Figure 3B As shown, after the first pattern 121 and the second pattern 122 are formed, the fourth substrate layer 150 is formed on a side of the second substrate layer 120 away from the third substrate layer 110 .

[0147] For example, the fourth substrate layer 150 may be made of organic materials such as polyimide. The embodiment of the disclosure can increase the interface adhesion effect between the fourth substrate layer and the third substrate layer by forming a second substrate layer made of amorphous silicon between the fourth substrate layer and the third substrate layer.

[0148] For example, the fourth substrate layer 150 may be a whole continuous film layer.

[0149] For example, the fourth substrate layer 150 may be formed by coating.

[0150] For example, the thickness of the fourth substrate layer 150 is at the micron level, and the thickness of the second substrate layer 120 is at the nanometer level, for example, not greater than 10 nanometers. Even if the second substrate layer 120 located in the transparent display area 221 is patterned to form an opening 123, it will not cause the side of the base substrate 10 facing the organic light-emitting element to be uneven.

[0151] For example, Fig.11 FIG. 1 is a schematic diagram of a partial cross-sectional structure of a display device provided by another embodiment of the present disclosure. Fig.11 As shown, the display device provided by the embodiment of the present disclosure includes any of the above-mentioned display panels. Fig.11 The display panel is schematically shown to include Figure 3B The display panel shown, but not limited thereto, may also include Figure 3A , Figure 6-Figure 10 The display panel shown in any of the embodiments shown. Fig.11As shown, the display device includes a functional component 20 located in a transparent display area 221 and on a non-light-exiting side of the display panel, and the functional component 20 is configured to emit or receive light passing through the transparent display area. For example, ambient light from the outside can be injected into the functional component 20 through the transparent display area 221. The embodiment of the present disclosure can improve the transmittance of blue light in the transparent display area by setting the thickness of at least part of the second substrate layer at the position of the transparent display area to be less than the thickness of the second substrate layer outside the transparent display area, so that the functional component can receive more blue light to improve performance.

[0152] For example, the functional component 20 is located on a side of the base substrate 10 away from the organic light emitting element.

[0153] For example, the orthographic projection of the functional component 20 on the base substrate 10 does not overlap with the transition area 222 and the first pixel density area 210 .

[0154] For example, the functional component 20 includes at least one of a camera module (e.g., a front camera module), a 3D structured light module (e.g., a 3D structured light sensor), a time-of-flight 3D imaging module (e.g., a time-of-flight sensor), an infrared sensing module (e.g., an infrared sensing sensor), etc.

[0155] When the functional component includes a camera, the color deviation can be reduced by adjusting the thickness or shape of the second substrate layer located in the transparent display area, thereby achieving the purpose of improving the camera shooting effect.

[0156] For example, the front camera module is usually enabled when the user takes a selfie or makes a video call, and the pixel display area of ​​the display device displays the image obtained by the selfie for the user to watch. The front camera module includes, for example, a lens, an image sensor, an image processing chip, etc. The optical image of the scene generated by the lens is projected onto the surface of the image sensor (the image sensor includes CCD and CMOS) and converted into an electrical signal, which is converted into a digital image signal through the image processing chip after analog-to-digital conversion, and then sent to the processor for processing, and the image of the scene is output on the display screen.

[0157] For example, a 3D structured light sensor and a time of flight (ToF) sensor may be used for face recognition to unlock a display device, etc.

[0158] For example, the functional component 20 may only include a camera module to realize the function of selfie or video call; for example, the functional component 20 may further include a 3D structured light module or a time-of-flight 3D imaging module to realize face recognition unlocking, etc. This embodiment includes but is not limited to this.

[0159] There are a few points to note:

[0160] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can refer to the general design.

[0161] (2) In the absence of conflict, features in the same embodiment or in different embodiments of the present disclosure may be combined with each other.

[0162] The above description is merely an exemplary embodiment of the present disclosure and is not intended to limit the protection scope of the present disclosure. The protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display panel, comprising: A substrate substrate comprises a display area and a peripheral area surrounding the display area, wherein the substrate substrate comprises a first substrate layer, a third substrate layer and a second substrate layer stacked in sequence, wherein the material of the second substrate layer comprises amorphous silicon, The display area includes a transparent display area, the transparent display area includes a pixel area and a light-transmitting area, and a thickness of the second substrate layer located in the light-transmitting area is less than a thickness of at least a portion of the second substrate layer located outside the transparent display area; The display panel further includes: A plurality of pixel units are located in the display area of ​​the base substrate, Each of the pixel units includes an organic light-emitting layer and a first electrode and a second electrode located on both sides of the organic light-emitting layer. The display panel includes a thin film transistor located on a side of the second substrate layer away from the third substrate layer.

2. The display panel according to claim 1, wherein: The display area includes a first pixel density area and a second pixel density area, the pixel density of the multiple pixel units located in the first pixel density area is greater than the pixel density of the multiple pixel units located in the second pixel density area, and the transparent display area is located in the second pixel density area.

3. The display panel according to claim 2, wherein: The second electrode is connected to the thin film transistor, and the second electrode of the pixel unit located in the transparent display area is located in the pixel area.

4. The display panel according to claim 3, wherein: The second substrate layer located in the transparent display area includes a first pattern, and an orthographic projection of the first pattern on the first substrate layer coincides with an orthographic projection of the second electrode on the first substrate layer.

5. The display panel according to claim 4, wherein: The second substrate layer located in the transparent display area further includes an opening, and the opening is located in the light-transmitting area.

6. The display panel according to claim 4, wherein: The thickness of the first pattern is the same as the thickness of at least a portion of the second substrate layer located outside the transparent display area.

7. The display panel according to any one of claims 4 to 6, wherein: The second pixel density area also includes a transition area located around the transparent display area. The second substrate layer located in the transition area includes a second pattern. The orthographic projection of the second pattern on the first substrate layer coincides with the orthographic projection of the second electrode on the first substrate layer.

8. The display panel according to any one of claims 1 to 3, wherein: The second substrate layer is not disposed in the transparent display area.

9. The display panel according to any one of claims 1 to 3, wherein: The thickness of the second substrate layer at each position in the transparent display area is uniform, and the thickness of the second substrate layer in the transparent display area is smaller than the thickness of at least a portion of the second substrate layer outside the transparent display area.

10. The display panel according to claim 8, wherein: The thickness of the second substrate layer outside the transparent display area is uniform.

11. The display panel according to any one of claims 1 to 3, wherein: The thickness of the second substrate layer at each position in the display area is uniform, and the thickness of the second substrate layer in the peripheral area is greater than the thickness of the second substrate layer in the display area.

12. The display panel according to claim 9, wherein: The thickness of the second substrate layer located in the transparent display area is 1-3 nanometers.

13. The display panel according to any one of claims 1 to 3, wherein: The second substrate layer is not disposed in the display area.

14. The display panel according to any one of claims 1 to 6, wherein: The material of the first substrate layer includes polyimide, and the material of the third substrate layer includes silicon oxide or silicon nitride.

15. The display panel according to any one of claims 1 to 6, wherein: The substrate base also includes a fourth substrate layer located on a side of the second substrate layer away from the third substrate layer, and a material of the fourth substrate layer includes polyimide.

16. A display panel, comprising: A substrate substrate comprises a display area and a peripheral area surrounding the display area, wherein the display area comprises a transparent display area, the substrate substrate comprises a first substrate layer, a second substrate layer and a third substrate layer which are stacked in sequence, the material of the second substrate layer comprises amorphous silicon, Wherein, the thickness of the second substrate layer at each position in the display area and the peripheral area is equal and not greater than 10 nanometers; The display panel further comprises: a plurality of pixel units located in the display area of ​​the base substrate, Each of the pixel units includes an organic light-emitting layer and a first electrode and a second electrode located on both sides of the organic light-emitting layer. The display panel includes a thin film transistor located on a side of the second substrate layer away from the third substrate layer.

17. The display panel according to claim 16, wherein: The thickness of the second substrate layer is 1-3 nanometers.

18. The display panel according to claim 16 or 17, wherein: The display area includes a first pixel density area and a second pixel density area, the pixel density of the multiple pixel units located in the first pixel density area is greater than the pixel density of the multiple pixel units located in the second pixel density area, and the transparent display area is located in the second pixel density area.

19. A method for manufacturing the display panel according to any one of claims 4 to 7, comprising: forming the first substrate layer; forming the third substrate layer on the first substrate layer; forming a second substrate material layer on a side of the third substrate layer away from the first substrate layer; as well as The second substrate material layer located in the transparent display area is patterned using a mask to form the first pattern, Wherein, the mask is a mask for forming the second electrode located in the transparent display area.

20. A display device, comprising: The display panel according to any one of claims 1 to 18; as well as A functional component located in the transparent display area and on the non-light-exiting side of the display panel, wherein the functional component is configured to emit or receive light passing through the transparent display area.

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