Cleaning Component Mounting Mechanism and Substrate Cleaning Device

Abstract

A cleaning component mounting mechanism and a substrate cleaning apparatus, the cleaning component mounting mechanism having: a cleaning component holding portion (200) capable of mounting a cleaning component assembly (100) having a cleaning component for cleaning a substrate (W); a component rotating portion (180) that rotates the cleaning component assembly (100) held by the cleaning component holding portion (200); and a moving portion (150) that moves the cleaning component holding portion (200) axially in a state where the cleaning component assembly (100) is removed and positions it at a rotation fixing position that restricts rotation of the cleaning component holding portion (200).

Description

Technical Field

[0001] The present invention relates to a cleaning component mounting mechanism and a substrate cleaning device having a cleaning component holding portion capable of mounting a cleaning component assembly and capable of rotating in a state where the cleaning component assembly is mounted. Background Art

[0002] Conventionally, as a method for cleaning a substrate such as a wafer after polishing with a high degree of cleanliness, it is known that after performing scrubbing (primary cleaning) by rubbing the cleaning surface of the substrate with a cleaning component composed of a brush or a sponge, high-pressure water (high-speed jet flow) is sprayed toward the substrate, and fine cleaning (secondary cleaning) is performed by generating bubbles through cavitation.

[0003] As the cleaning component, for example, a roll-type cleaning component and a pen-type cleaning component are known. As an example, Japanese Patent Application Laid-Open No. 2000-301079 discloses a substrate cleaning device including: a substrate holding portion that rotates and holds the substrate substantially in a horizontal plane; a cleaning member that scrubs the surface to be cleaned of the substrate; and a cleaning member holding portion that holds the cleaning member so as to be rotatable about the axis of the cleaning member. Although cleaning components such as roll-type cleaning components and pen-type cleaning components are appropriately cleaned and used, they are also replaced at a certain cycle. When replacing the cleaning component, although the cleaning component assembly including the cleaning component is mounted on the cleaning component holding portion, since the cleaning component holding portion is rotatable, the mounting operation takes time. Summary of the Invention

[0004] Technical Problem to be Solved by the Invention

[0005] The present invention has been made in view of the above circumstances, and an object thereof is to provide a cleaning component mounting mechanism and a substrate cleaning device capable of easily mounting a cleaning component assembly on a cleaning component holding portion.

[0006] Technical Means for Solving the Technical Problem

[0007] [Concept 1]

[0008] A cleaning component mounting mechanism of the present invention may include:

[0009] a cleaning component holding portion that can mount a cleaning component assembly having a cleaning component for cleaning a substrate;

[0010] a component rotating portion that rotates the cleaning component assembly held by the cleaning component holding portion; and

[0011] A moving part that moves the cleaning part holding part axially with the cleaning part assembly disassembled and is positioned at a rotation-fixed position that restricts the rotation of the cleaning part holding part.

[0012] [Concept 2]

[0013] In the cleaning part mounting mechanism of Concept 1,

[0014] It is also possible that the moving part is an elastic part.

[0015] [Concept 3]

[0016] In the cleaning part mounting mechanism of Concept 1 or 2,

[0017] It is also possible that the cleaning part holding part has: a driving part side cleaning part holding part that rotates through the part rotating part and a driven part side cleaning part holding part that rotates in a driven manner,

[0018] The moving part is provided on the driven part side cleaning part holding part.

[0019] [Concept 4]

[0020] In the cleaning part mounting mechanism of any one of Concepts 1 to 3,

[0021] It is also possible that the cleaning part holding part has a peripheral protrusion that protrudes outside the periphery,

[0022] The peripheral protrusion is in surface contact with the inner surface of the housing part that houses at least a part of the cleaning part holding part, and the peripheral protrusion is pressed against the inner surface of the housing part, thereby restricting the rotation of the cleaning part holding part.

[0023] [Concept 5]

[0024] In the cleaning part mounting mechanism of Concept 4,

[0025] It is also possible that the peripheral protrusion has one or more groove parts.

[0026] [Concept 6]

[0027] In the cleaning part mounting mechanism of Concept 4 or 5,

[0028] It is also possible that in a longitudinal section, the thickness of the cleaning part side of the peripheral protrusion is thicker than the thickness of the opposite side of the cleaning part.

[0029] [Concept 7]

[0030] In the cleaning part mounting mechanism of any one of Concepts 1 to 6,

[0031] Alternatively, the cleaning component holding part has a first protruding part protruding outward from the outer periphery, and the inner surface of the accommodating part that accommodates at least a part of the cleaning component holding part has a first concave part that accommodates the first protruding part, or the inner surface of the accommodating part that accommodates at least a part of the cleaning component holding part has a second protruding part, and the cleaning component holding part has a second concave part that accommodates the second protruding part.

[0032] [Concept 8]

[0033] In the cleaning component mounting mechanism of Concept 7,

[0034] Alternatively, when the first protruding part is provided, a plurality of the first concave parts are provided, or when the second protruding part is provided, a plurality of the second concave parts are provided.

[0035] [Concept 9]

[0036] A substrate cleaning device may alternatively include:

[0037] A substrate support part for supporting a substrate;

[0038] A cleaning component holding part that can mount a cleaning component assembly having a cleaning component for cleaning the substrate;

[0039] A component rotating part that rotates the cleaning component assembly held by the cleaning component holding part; and

[0040] A moving part that moves the cleaning component holding part in the axial direction with the cleaning component assembly removed and positions it at a rotation-fixed position that restricts the rotation of the cleaning component holding part.

[0041] Effects of the present invention

[0042] According to the present invention, the cleaning component assembly can be easily mounted on the cleaning component holding part. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] Figure 1 is a schematic top view showing the overall structure of a substrate processing device according to an embodiment of the present invention.

[0044] Figure 2 is a perspective view showing a substrate cleaning device that can be used in an embodiment of the present invention.

[0045] Figure 3 is a schematic diagram showing a substrate cleaning device used as an example of an embodiment of the present invention.

[0046] Figure 4It is a schematic diagram of a substrate cleaning device used as another example of an embodiment of the present invention.

[0047] Figure 5 It is a side cross-sectional view showing the structure when a cleaning component assembly is installed on a cleaning component holding part that can be used in an embodiment of the present invention.

[0048] Figure 6 It is a side cross-sectional view showing the structure when the cleaning component assembly is disassembled from the cleaning component holding part that can be used in an embodiment of the present invention.

[0049] Figure 7 It is a perspective view showing an example of a roller-type cleaning component that can be used in an embodiment of the present invention.

[0050] Figure 8 It is a perspective view showing another example of a roller-type cleaning component that can be used in an embodiment of the present invention.

[0051] Figure 9 It is a view showing the shape when observing the cleaning component holding part that can be used in an embodiment of the present invention along the rotation axis of the cleaning component assembly.

[0052] Figure 10 It is a view showing the shape when observing the first example of the cleaning component holding part with a peripheral protrusion that can be used in an embodiment of the present invention along the rotation axis of the cleaning component assembly.

[0053] Figure 11 It is a view showing the shape when observing the second example of the cleaning component holding part with a peripheral protrusion that can be used in an embodiment of the present invention along the rotation axis of the cleaning component assembly.

[0054] Figure 12 It is a view showing the shape when observing the third example of the cleaning component holding part with a peripheral protrusion that can be used in an embodiment of the present invention along the rotation axis of the cleaning component assembly.

[0055] Figure 13 It is a view showing the first example of the shape when observing the cleaning component holding part with a first protrusion and a receiving part with a first recess for receiving the first protrusion that can be used in an embodiment of the present invention along the rotation axis of the cleaning component assembly.

[0056] Figure 14 It is a view showing the second example of the shape when observing the cleaning component holding part with a first protrusion and a receiving part with a first recess for receiving the first protrusion that can be used in an embodiment of the present invention along the rotation axis of the cleaning component assembly.

[0057] Figure 15FIG. 0 is a first example of a view showing a form when observing a housing portion having a second protrusion and a cleaning member holding portion having a second recess for housing the second protrusion, which can be used in an embodiment of the present invention, along the rotation axis of the cleaning member assembly.

[0058] Figure 16 FIG. 4 is a second example of a view showing a form when observing a housing portion having a second protrusion and a cleaning member holding portion having a second recess for housing the second protrusion, which can be used in an embodiment of the present invention, along the rotation axis of the cleaning member assembly.

[0059] Figure 17 FIG. 8 is a view showing a form when observing a cleaning member holding portion having a peripheral protrusion and a first protrusion and a housing portion having a first recess for housing the first protrusion, which can be used in an embodiment of the present invention, along the rotation axis of the cleaning member assembly.

[0060] Figure 18 FIG. 12 is a view showing a form when observing a housing portion having a second protrusion and a cleaning member holding portion having a second recess for housing the peripheral protrusion and the second protrusion, which can be used in an embodiment of the present invention, along the rotation axis of the cleaning member assembly.

[0061] Figure 19A FIG. 16 is a third example of a view showing a form when observing a cleaning member holding portion having a first protrusion and a housing portion having a first recess for housing the first protrusion, along the rotation axis of the cleaning member assembly.

[0062] Figure 19B is Figure 19A a side cross-sectional view of the form shown.

[0063] Figure 20A FIG. 26 is a third example of a view showing a form when observing a housing portion having a second protrusion and a cleaning member holding portion having a second recess for housing the second protrusion, which can be used in an embodiment of the present invention, along the rotation axis of the cleaning member assembly.

[0064] Figure 20B is Figure 20A a side cross-sectional view of the form shown.

[0065] Figure 21A FIG. 36 is a fourth example of a view showing a form when observing a cleaning member holding portion having a first protrusion and a housing portion having a first recess for housing the first protrusion, along the rotation axis of the cleaning member assembly.

[0066] Figure 21B is Figure 21A a side cross-sectional view of the form shown.

[0067] Figure 22AFIG. 4 shows a fourth example of the shape when observing the housing portion having the second protrusion and the cleaning member holding portion having the housing peripheral protrusion and the second recess along the rotation axis of the cleaning member assembly.

[0068] Figure 22B It is Figure 22A a side cross-sectional view of the shape shown.

[0069] Figure 23A FIG. shows a shape in which the thickness of the peripheral protrusion that can be used in the embodiment of the present invention is uniform when observed along the rotation axis of the cleaning member assembly.

[0070] Figure 23B It is Figure 23A a side cross-sectional view of the shape shown.

[0071] Figure 24 FIG. is a side cross-sectional view showing a shape in which a mark such as a notch is provided in the mounting portion of the cleaning member holding portion that can be used in the embodiment of the present invention.

[0072] Figure 25A FIG. is a side cross-sectional view showing a shape in which the peripheral protrusion that can be used in the embodiment of the present invention has an elastic member, and is a side cross-sectional view showing a case where the elastic member does not contact the housing portion.

[0073] Figure 25B FIG. is a side cross-sectional view showing a shape in which the peripheral protrusion that can be used in the embodiment of the present invention has an elastic member, and is a side cross-sectional view showing a case where the elastic member does not contact the housing portion.

[0074] Figure 26 FIG. is a block diagram of a substrate processing apparatus according to an embodiment of the present invention.

[0075] Symbol Explanation

[0076] 40 Support column (substrate support portion)

[0077] 100 Cleaning member assembly

[0078] 120 Housing portion

[0079] 150 Moving portion

[0080] 180 Member rotating portion

[0081] 190 First recess

[0082] 195 Second protrusion

[0083] 200 Cleaning member holding portion

[0084] 220 Peripheral protrusion

[0085] Slot portion 220a

[0086] First protrusion 230

[0087] Second recess 240

[0088] Substrate W Detailed implementation manner

[0089] "Structure"

[0090] An implementation manner of a substrate processing apparatus including a substrate cleaning apparatus and the like will be described.

[0091] As Figure 1 shown, the substrate processing apparatus of the present implementation manner has a substantially rectangular housing 310 and a loading port 312 for placing a substrate cassette storing most of the substrates W. The loading port 312 is arranged adjacent to the housing 310. An open cassette, a SMIF (Standard Mechanical Interface) pod, or a FOUP (Front Opening Unified Pod) can be loaded at the loading port 312. The SMIF pod and the FOUP are sealed containers that can accommodate a substrate cassette inside and can maintain an environment independent of the external space by covering with a partition. Substrates W such as semiconductor wafers can be cited as examples.

[0092] Inside the housing 310, there are accommodated: a plurality of ( Figure 1 in the form shown, four) polishing units 314a to 314d; a first cleaning unit 316 and a second cleaning unit 318 for cleaning the polished substrate W; and a drying unit 320 for drying the cleaned substrate W. The polishing units 314a to 314d are arranged along the length direction of the substrate processing apparatus, and the cleaning units 316, 318, and the drying unit 320 are also arranged along the length direction of the substrate processing apparatus. The substrate processing apparatus of the present implementation manner can perform polishing processing on various substrates W in the manufacturing processes of semiconductor wafers with a diameter of 300 mm or 450 mm, flat panels, image sensors such as CMOS (Complementary Metal Oxide Semiconductor) and CCD (Charge Coupled Device), and magnetic films of MRAM (Magnetoresistive Random Access Memory). In addition, it can also be a substrate processing apparatus of another implementation manner that performs cleaning processing and drying processing on the substrate W without providing a polishing unit for polishing the substrate W in the housing 310.

[0093] A first transfer robot 322 is disposed in a region surrounded by a loading port 312, a grinding unit 314a on the side of the loading port 312, and a drying unit 320. In addition, a transfer unit 324 is disposed in parallel with the grinding units 314a to 314d, the cleaning units 316 and 318, and the drying unit 320. The first transfer robot 322 receives the substrate W before grinding from the loading port 312 and transfers the substrate W before grinding to the transfer unit 324, or receives the dried substrate W taken out from the drying unit 320 from the transfer unit 324.

[0094] A second transfer robot 326 is disposed between the first cleaning unit 316 and the second cleaning unit 318. The second transfer robot 326 transfers the substrate W between the first cleaning unit 316 and the second cleaning unit 318. In addition, a third transfer robot 328 is disposed between the second cleaning unit 318 and the drying unit 320. The third transfer robot 328 transfers the substrate W between the second cleaning unit 318 and the drying unit 320. Moreover, a control unit 350 for controlling the operations of the respective devices of the substrate processing apparatus is disposed inside the housing 310. In the present embodiment, although the form in which the control unit 350 is disposed inside the housing 310 has been described, it is not limited thereto, and the control unit 350 may be disposed outside the housing 310, and the control unit 350 may also be provided at a remote location.

[0095] A roll-type cleaning device may be used as the first cleaning unit 316. In the presence of a cleaning liquid, the roll-type cleaning device brings a roll-type cleaning member 110 that linearly extends almost the entire length across the diameter of the substrate W into contact with the substrate W, and brushes the surface of the substrate W while rotating around a central axis parallel to the substrate W. In addition, a pen-type cleaning device may be used as the second cleaning unit 318. In the presence of a cleaning liquid, the pen-type cleaning device brings the contact surface of a cylindrical pen-type cleaning member that extends in the vertical direction into contact with the substrate W, and brushes the surface of the substrate W while rotating the pen-type cleaning member and moving it in one direction. In addition, a rotary drying unit may be used as the drying unit 320. The rotary drying unit dries the substrate W by ejecting IPA vapor from a moving spray nozzle toward the substrate W held horizontally and rotating, and further dries the substrate W by rotating the substrate W at high speed to generate centrifugal force.

[0096] In addition, instead of using the roll-type cleaning device, a pen-type cleaning device identical to the second cleaning unit 318 may be used, or a two-fluid jet cleaning device that cleans the surface of the substrate W by two-fluid jetting may be used as the first cleaning unit 316. Further, instead of using the pen-type cleaning device, a roll-type cleaning device identical to the first cleaning unit 316 may be used, or a two-fluid jet cleaning device that cleans the surface of the substrate W by two-fluid jetting may be used as the second cleaning unit 318.

[0097] The cleaning liquid in the present embodiment includes rinsing liquids such as pure water (DIW), ammonia hydrogen peroxide (SC1), hydrochloric acid hydrogen peroxide (SC2), sulfuric acid hydrogen peroxide (SPM), sulfuric acid with water, or hydrofluoric acid and other chemical liquids. Additionally, it may be a mixed liquid or a diluted liquid with these as the main components. In the present embodiment, unless otherwise specified, the cleaning liquid refers to a rinsing liquid, a chemical liquid, or both a rinsing liquid and a chemical liquid. Furthermore, the cleaning in the present embodiment includes a form in which cleaning components such as the roll-type cleaning member 110 rotate while contacting the substrate and supply the cleaning liquid to the substrate for scrubbing, and a form in which the cleaning liquid is supplied without the component contacting the substrate.

[0098] As Figure 2 shown, the substrate cleaning device may also have a plurality of (in Figure 2 , four) struts (substrate support portions) 40 that support the peripheral portion of the substrate W such as a semiconductor wafer and rotate the substrate W horizontally. As Figure 2 indicated by the arrow, these struts 40 can move in the horizontal direction. Additionally, the substrate cleaning device may also have an upper-side roll arm 42 that is disposed above the substrate W so as to be movable up and down and a lower-side roll arm 44 that is disposed below the substrate W so as to be movable up and down.

[0099] The strut 40 may also have a roll 80 as a substrate support portion at the upper part. A fitting groove 80a is formed on the outer peripheral side surface of the roll 80. And the peripheral portion of the substrate W is positioned within the fitting groove 80a, thereby pressing the roll 80 against the substrate W and rotating it. As a result, the substrate W rotates horizontally as Figure 2 indicated by the arrow E. In the embodiment illustrated here, all four rolls 80 are connected to a drive mechanism (not shown) to apply a rotational force to the substrate W. Additionally, it may be that two of the four rolls 80 apply a rotational force to the substrate W (the drive mechanism is not shown), and the other two rolls 80 function as bearings that receive the rotation of the substrate W.

[0100] In Figure 2 the upper-side roll arm 42 shown, a cylindrically shaped roll-type cleaning member (roll-type sponge) 110 that extends horizontally is supported so as to be rotatable. This roll-type cleaning member 110 rotates, for example, as Figure 2 indicated by the arrow F 1 shown. InFigure 2 As shown in the lower roller arm 44, a horizontally extending cylindrical roller-shaped cleaning member (roller-shaped sponge) 110 is rotatably supported. The roller-shaped cleaning member 110 rotates as shown by the arrow F Figure 2 shown 2 shown. Alternatively, the upper roller arm 42 may be provided via a load cell 54 on a support arm 58 extending in the horizontal direction. Alternatively, an inclination mechanism 70 that supports the upper roller arm 42 so as to be tiltable may be provided between the load cell 54 and the free end of the support arm 58. Such an inclination mechanism may also be provided on the lower roller arm 44.

[0101] In Figure 2 the form shown, two upper supply nozzles 50 are arranged above the substrate W supported and rotated by the support column 40, and supply a chemical solution and pure water (rinsing liquid) to the front surface (upper surface) of the substrate W. Alternatively, one of the two upper supply nozzles 50 may supply a chemical solution and the other may supply pure water. In addition, two lower supply nozzles 52 may be arranged below the substrate W supported and rotated by the support column 40, and supply a chemical solution and pure water (rinsing liquid) to the back surface (lower surface) of the substrate W. Alternatively, one of the two lower supply nozzles 52 may supply a chemical solution and the other may supply pure water.

[0102] The support column 40 is an example of a substrate support portion that supports the substrate W, but the substrate support portion may also hold the substrate W extending in the horizontal direction, may hold the substrate extending in the vertical direction, or may hold the substrate inclined from the horizontal direction. Alternatively, a form different from the support column 40 as described above, which holds and rotates the substrate W by clamping or adsorbing it, may be adopted as the substrate support portion.

[0103] As Figure 3 and Figure 4 shown, the substrate cleaning device includes: a cleaning member holding portion 200 that can mount a cleaning member assembly 100 having a cleaning member such as a roller-shaped cleaning member 110 for cleaning the substrate W and can rotate in a state where the cleaning member assembly 100 is mounted; and a member rotating portion 180 that rotates the cleaning member assembly 100 held by the cleaning member holding portion 200.

[0104] The cleaning member assembly 100 may also have a cleaning member mounting portion 105 and a cleaning member mounted on the surface of the cleaning member mounting portion 105. Hereinafter, the roller-shaped cleaning member 110 will be described as an example of the cleaning member. As Figure 7 shown, the roller-shaped cleaning member 110 may be made of a sponge having a plurality of small pieces (protrusion members) 115. The area of the top of the small piece 115 may be set to 5 cm2 Below, PVDF or PTFE can also be used as the material for the cleaning component mounting portion 105. Additionally, as Figure 8 shown, the roller-type cleaning component 110 can also be in a form without small pieces (protruding components) 115.

[0105] Figure 8 As shown, the cleaning component mounting portion 105 has a pair of protruding portions 105a at the end as the mounting portion, and a key recess 105b is formed between the pair of protruding portions 105a. In Figure 8 and Figure 9 the shown form, the cleaning component assembly 100 is mounted on the cleaning component holding portion 200 by inserting the key protrusion 205b of the cleaning component holding portion 200 into the key recess 105b. At this time, the protruding portion 205a provided with the key protrusion 205b is positioned between the paired protruding portions 105a. In forms like this Figure 8 and Figure 9 shown, the cleaning component mounting portion 105 and the cleaning component holding portion 200 have direction characteristics and are structured such that they cannot be mounted unless in a specified direction.

[0106] The cleaning component assembly 100 can also be formed by integrating the cleaning component mounting portion 105 and the roller-type cleaning component 110, or the roller-type cleaning component 110 can be formed on the cleaning component mounting portion 105. Additionally, the cleaning component mounting portion 105 and the roller-type cleaning component 110 can also be formed as separate components and be detachable. The roller-type cleaning component 110 can also be made of PVA (polyvinyl alcohol) sponge material and PVFM (polyvinyl formal) formed by reacting PVA. This PVA sponge material can be adjusted using homopolymers of polyvinyl acetate, etc. As the material for the roller-type cleaning roller 110, nylon, polyurethane, or a combination of polyurethane and PVA, or other copolymerizable materials such as other materials that do not scratch the surface of the substrate W and provide appropriate material removal for the process can be used.

[0107] As Figure 3 and Figure 4 shown, the substrate cleaning device can also have an internal cleaning liquid supply portion 410 for supplying cleaning liquid into the roller-type cleaning component 110 and an external cleaning liquid supply portion 420 for supplying cleaning liquid from the outside of the roller-type cleaning component 110. The rotational speed of the roller-type cleaning component 110 is, for example, 50 rpm (revolutions per minute) to 400 rpm.

[0108] Although the internal cleaning liquid supply unit 410 and the external cleaning liquid supply unit 420 can supply the same cleaning liquid, it is not limited to such a form. It is also possible that the internal cleaning liquid supply unit 410 and the external cleaning liquid supply unit 420 supply different cleaning liquids.

[0109] When supplying the cleaning liquid for the internal cleaning liquid and the external cleaning liquid, filters 412, 422 (refer to Figure 3 and Figure 4 ) composed of meshes of about 10 nm can also be used. By using such filters 412, 422, the garbage contained in the cleaning liquid can be removed. The external cleaning liquid supply unit 420 may also have an external cleaning liquid supply component composed of the above nozzles 50, 52, etc., and an external cleaning liquid storage unit 424 connected to the external cleaning liquid supply component and supplying the cleaning liquid to the external cleaning liquid supply component. In this case, a filter 422 may also be provided between the external cleaning liquid storage unit 424 and the external cleaning liquid supply component. In addition, a filter 412 may also be provided between the internal cleaning liquid supply unit 410 and the cleaning component holding unit 200.

[0110] As Figure 3 and Figure 4 shown, the cleaning component mounting portion 105 may also have a main body 130, a cleaning liquid introduction portion (gap) 135 extending inside the main body 130, and a plurality of cleaning liquid supply holes 140 communicating with the cleaning liquid introduction portion 135. The cleaning component mounting portion 105 may also be formed in a cylindrical shape having a hollow region. It is also possible that this hollow region is the cleaning liquid introduction portion 135 and the cleaning liquid supply holes 140 communicate with the cleaning liquid introduction portion 135, and the cleaning liquid supplied to the cleaning liquid introduction portion 135 soaks into the roller-type cleaning component 110 and is thus utilized when cleaning the substrate W. Figure 3 and Figure 4 are cross-sections in which the roller-type cleaning component 110 etc. are cut at positions where the small pieces 115 are not provided.

[0111] It is also possible that the cleaning liquid is introduced into the cleaning liquid introduction portion 135 via a supply pipe 215 provided inside the cleaning component holding unit 200.

[0112] As Figure 5 and Figure 6 shown, the substrate cleaning device has a moving portion 150. In a state where the cleaning component assembly 100 is disassembled, the moving portion 150 moves the cleaning component holding unit 200 in the axial direction and positions it at a rotation fixing position that restricts the rotation of the cleaning component holding unit 200. The moving portion 150 may also be an elastic member 150a such as a spring. It is also possible that the elastic member 150a is housed in the housing portion 120 and is provided on the side opposite to the side where the roller-type cleaning component 110 is held (in Figure 5 and Figure 6In the case where the end portion (on the left side in the figure) is provided with such an elastic member 150a, when the cleaning member assembly 100 is detached from the cleaning member holding portion 200, the cleaning member holding portion 200 is elastically forced by the elastic member 150a and moves axially, so as to be positioned at Figure 6 the rotational fixed position shown. However, it is not limited to such a form. The moving portion 150 may also have a driving portion (not shown) such as a motor, and the driving portion moves the cleaning member holding portion 200 axially.

[0113] The cleaning member holding portion 200 may also have a holding main body portion 210 and a peripheral edge protruding portion 220 that protrudes outward from the holding main body portion 210 toward the peripheral edge. The holding main body portion 210 and the peripheral edge protruding portion 220 may be integrally formed. The peripheral edge protruding portion 220 may protrude about 2 mm to 5 mm outward from the holding main body portion 210 toward the peripheral edge.

[0114] Although Figure 5 it is the state where the cleaning member assembly 100 is mounted on the cleaning member holding portion 200, in this state, the elastic member 150a is pressed by the cleaning member assembly 100 to the opposite side of the cleaning member assembly 100, and the peripheral edge protruding portion 220 is in a state of being separated from the housing portion 120. Although Figure 6 it is the state where the cleaning member assembly 100 is detached from the cleaning member holding portion 200, in this state, the cleaning member holding portion 200 is pressed by the elastic member 150a, and the peripheral edge protruding portion 220 is in a state of abutting against the housing portion 120.

[0115] As Figure 6 shown, it may also be that the peripheral edge protruding portion 220 is in surface contact with the inner surface of the housing portion 120 that houses at least a part of the cleaning member holding portion 200. By pressing the peripheral edge protruding portion 220 against the inner surface of the housing portion 120, the rotation of the cleaning member holding portion 200 is restricted (fixed). When the moving portion 150 is composed of an elastic member 150a such as a spring, the peripheral edge protruding portion 220 is in surface contact with the inner surface of the housing portion 120 by receiving the elastic force from the elastic member 150a, thereby restricting the rotation of the cleaning member holding portion 200. Although the peripheral edge protruding portion 220 may protrude integrally in the peripheral direction with respect to the rotation axis of the roller-type cleaning member 110 (refer to Figure 10 ), it may also be that a plurality of peripheral edge protruding portions 220 are arranged at intervals (refer to Figure 11 ). However, from the viewpoint that the one with a larger contact area with the inner surface of the housing portion 120 is more likely to restrict the rotation of the cleaning member holding portion 200, the form in which the peripheral edge protruding portion 220 protrudes integrally in the peripheral direction with respect to the rotation axis of the roller-type cleaning member 110 is beneficial.

[0116] The surface of the peripheral protrusion 220 that is in surface contact with the inner surface of the housing portion 120 may also have an uneven shape or may be a rough surface. Additionally, it may be that an elastic member 220a such as rubber is provided on the surface of the peripheral protrusion 220 that is in surface contact with the inner surface of the housing portion 120, and when the peripheral protrusion 220 is pressed against the inner surface of the housing portion 120, the elastic member 220a such as rubber deforms (refer to Figure 25A and Figure 25B ). By adopting such a configuration, the resistance value between the inner surface of the housing portion 120 can be increased. Additionally, when the moving portion 150 is composed of an elastic member 150a such as a spring, it is not necessary to use a member with an extremely high spring constant as the elastic member 150a. As the spring constant, for example, a spring with a spring constant of 0.03 kg / mm to 0.10 kg / mm can be considered.

[0117] The surface of the peripheral protrusion 220 that is in surface contact with the inner surface of the housing portion 120 may also be composed of a flat surface. In this case, the force from the moving portion 150 can be uniformly transmitted to the inner surface of the housing portion 120, and frictional force can be generated between the entire inner surface of the housing portion 120 and the peripheral protrusion 220. Additionally, by adopting such a flat surface, it is possible to prevent the generation of unexpected dust, etc. when the peripheral protrusion 220 comes into contact with the inner surface of the housing portion 120.

[0118] It may also be that one end portion of the cleaning member assembly 100 is drivenly held by the cleaning member holding portion 200, and the other end portion is driven by a member rotating portion 180 having a driving portion such as a motor (refer to Figure 3 ). In this case, the cleaning member holding portion 200 has a second cleaning member holding portion 205b driven by the member rotating portion 180 and a first cleaning member holding portion 200a driven in a driven manner. In such a configuration, the moving portion 150 composed of the elastic member 150a, etc. may also be provided on the driven portion.

[0119] The roller - type cleaning member 110 does not need to be a double - supported structure and may also be a cantilever - type structure as shown in Figure 4 . In this case, the member rotating portion 180 is provided on the side where the roller - type cleaning member 110 is held.

[0120] The peripheral protrusion 220 may also be such that in a longitudinal section, the thickness on the cleaning member assembly 100 side (in Figure 5 and Figure 6 , it is the right side) is thicker than the thickness on the opposite side of the roller - type cleaning member 110 (in Figure 5 and Figure 6 , it is the left side). In Figure 5 and Figure 6In the illustrated form, in the longitudinal section, the thickness of the peripheral protrusion 220 becomes thicker as it approaches the cleaning component assembly 100 side. However, it is not limited to such a form, and it may also be a form in which the thickness of the peripheral protrusion 220 becomes thicker intermittently (e.g., stepwise) as it approaches the cleaning component assembly 100 side. Additionally, as Figure 23A and Figure 23B show, it may also be that the cross-section of the peripheral protrusion 220 is rectangular and its thickness is uniform.

[0121] As Figure 13 shows, it may also be that the cleaning component holding part 200 has a first protrusion 230 protruding outward from the periphery, and the receiving part 120 that houses the cleaning component holding part 200 has a first recess 190 on its inner surface for receiving the first protrusion 230. In this case, the rotation of the cleaning component holding part 200 is restricted by the first protrusion 230 being received in the first recess 190. Additionally, when one or more first protrusions 230 are provided, multiple first recesses 190 may also be provided (refer to Figure 14 ). The number of the first protrusions 230 does not need to be the same as the number of the first recesses 190, as long as the number of the first recesses 190 is greater than the number of the first protrusions 230. In this case, the rotation of the cleaning component holding part 200 is restricted by the first protrusion 230 being received in a certain first recess 190. The first protrusion 230 may also be in the shape of a pin, and its length may also be about 2 mm to 5 mm.

[0122] Additionally, different from the above form, as Figure 15 shows, it may also be that the receiving part 120 that houses the cleaning component holding part 200 has a second protrusion 195 on its inner surface, and the cleaning component holding part 200 has a second recess 240 for receiving the second protrusion 195. In this case, the rotation of the cleaning component holding part 200 is restricted by the second protrusion 195 being received in the second recess 240. Additionally, when one or more second protrusions 195 are provided, multiple second recesses 240 may also be provided (refer to Figure 16 ). The number of the second protrusions 195 does not need to be the same as the number of the second recesses 240, and as long as the number of the second recesses 240 is greater than the number of the second protrusions 195. The second protrusion 195 may also be in the shape of a pin, and its length may also be about 2 mm to 5 mm.

[0123] Additionally, the above forms may be combined. For example, a combination of the peripheral protrusion 220, the first protrusion 230, and the first recess 190 may be adopted, or a combination of the peripheral protrusion 220, the second protrusion 195, and the second recess 240 may be adopted.

[0124] InFigure 17 In the illustrated form, a form is shown in which a combination of a peripheral protrusion 220, a first protrusion 230, and a first recess 190 is employed. In Figure 18 the illustrated form, a form is shown in which a combination of a peripheral protrusion 220, a second protrusion 195, and a second recess 240 is employed.

[0125] In addition, in the case of employing a combination of a peripheral protrusion 220, a first protrusion 230, and a first recess 190, it may also be Figure 19A and Figure 19B the illustrated form. In addition, as Figure 21A and Figure 21B shown, a plurality of first protrusions 230 and first recesses 190 may also be employed.

[0126] In addition, in the case of employing a combination of a peripheral protrusion 220, a second protrusion 195, and a second recess 240, it may also be Figure 20A and Figure 20B the illustrated form. In addition, as Figure 22A and Figure 22B shown, a plurality of second protrusions 195 and second recesses 240 may also be employed.

[0127] As Figure 5 and Figure 6 shown, the bearing 260 may also have two or more bearing members 261. It may also be that a lubricating fluid for wetting the bearing 260 is supplied between the axials of the bearing members 261. This lubricating fluid may be composed of a cleaning liquid, and in particular, it may also be a rinsing liquid. In addition, it may also be that a sealing portion 290 is provided on the outer periphery of the inner member 280. This sealing portion may also have a first sealing portion 291 and a second sealing portion 292 provided adjacent to the first sealing portion 291. Each of the first sealing portion 291 and the second sealing portion 292 may also be an O-ring.

[0128] As Figure 12 shown, the peripheral protrusion 220 may also have one or more groove portions 220a. The lubricating fluid for wetting the bearing 260 can flow toward the cleaning component assembly 100 side of the accommodating portion 120 via this groove portion 220a.

[0129] Using Figure 5 , Figure 6 , Figure 8 and Figure 9 shown, the steps for installing the cleaning component assembly 100 on the cleaning component holding portion 200 and removing the cleaning component assembly 100 from the cleaning component holding portion 200 are described.

[0130] When the cleaning component assembly 100 is installed in the cleaning component holding portion 200, the elastic component 150a is contracted by pressing the cleaning component assembly 100 into the cleaning component holding portion 200 on the driven portion side. In Figure 8 and Figure 9 In the form shown, after the protruding portion 205a is positioned between the pair of protruding portions 105a, the key convex portion 205b is inserted into the key concave portion 105b, thereby pressing the cleaning component assembly 100 into the cleaning component holding portion 200 side. In this state, since the mounting portion 201 of the cleaning component holding portion 200 is rotatable, the cleaning component assembly 100 is rotated to an appropriate position, and the other end of the cleaning component assembly 100 is mounted on the cleaning component holding portion 200 on the driving portion side (component rotating portion 180 side). In addition, in the cleaning component holding portion 200 on the driving portion side, after the protruding portion 205a is located between the pair of protruding portions 105a, the key convex portion 205b is inserted into the key concave portion 105b.

[0131] When the cleaning component assembly 100 is disassembled from the cleaning component holding portion 200, after the elastic component 150a is contracted by pressing the cleaning component assembly 100 into the cleaning component holding portion 200 on the driven portion side, the other end of the cleaning component assembly 100 is disassembled from the cleaning component holding portion 200 on the driving portion side (component rotating portion 180 side). Subsequently, one end of the cleaning component assembly 100 is disassembled from the cleaning component holding portion 200 on the driven portion side. By disassembling the cleaning component assembly 100 from the cleaning component holding portion 200 in this way, the peripheral protruding portion 220 is in surface contact with the inner surface of the housing portion 120 that houses the cleaning component holding portion 200 through the elastic component 150a. By pressing the peripheral protruding portion 220 against the inner surface of the housing portion 120 in this way, the rotation of the cleaning component holding portion 200 is restricted (fixed).

[0132] In addition, in the case of the cleaning component assembly 100 in which the cleaning component mounting portion 105 and the roller-type cleaning component 110 are separated, by disassembling the mounting components such as nuts for fixing the roller-type cleaning component 110 to the cleaning component mounting portion 105 and installing a new or cleaned roller-type cleaning component 110 on the cleaning component mounting portion 105, the roller-type cleaning component 110 can be replaced.

[0133] As Figure 26 shown, the internal cleaning liquid supply portion 410, the external cleaning liquid supply portion 420, the component rotating portion 180, the support column 40 as the substrate support portion, the input portion 400 for the operator to input information, etc. are connected to the control portion 350 by wire or wirelessly, and are configured to receive information from these components and give instructions to these components. In addition, in Figure 26In this case, conveying mechanisms such as the first conveying robot 322, the conveying unit 324, the second conveying robot 326, and the third conveying robot 328 are collectively referred to as the conveying section 300.

[0134] 《Effect》

[0135] Next, the effects of the present embodiment configured as described above and the effects not yet described will be mainly described. Even if not described in the "Structure", all the structures described in the "Effect" can be adopted in the present invention.

[0136] Generally, since the cleaning component holding portion 200 has a bearing 260, it has a rotatable structure. Therefore, in the case of not adopting the form of the present embodiment, the portion of the cleaning component holding portion 200 on the cleaning component assembly 100 side ( Figure 5 the right portion) will be rotatable. At the installation site, since the rotational position of the cleaning component holding portion 200 cannot be visually observed, it will take time to install the roller-type cleaning component 110 on the cleaning component holding portion 200. As an example, in Figure 8 and Figure 9 the structure shown, although the cleaning component assembly 100 is installed on the cleaning component holding portion 200 by fitting the key convex portion 205b into the key concave portion 105b, since the installation portion 201 of the cleaning component holding portion 200 will be rotatable in a non-visible state, it will take time to position the protruding portion 205a between the pair of protruding portions 105a. In addition, different from the form provided with the protruding portion 205a and the pair of protruding portions 105a as shown in Figure 8 and Figure 9 when adopting a form in which these protruding portions 205a and the pair of protruding portions 105a are not provided and the cleaning component assembly 100 can be installed in any direction of the cleaning component holding portion 200 (a form having no direction characteristics at all), although the problem regarding the installation time is solved, other problems will occur, such as the inability to appropriately transmit rotational power from the cleaning component holding portion 200 to the cleaning component assembly 100.

[0137] In the present embodiment, a moving part 150 is adopted. The moving part 150 moves the cleaning part holding part 200 axially in a state where the cleaning part assembly 100 is disassembled, and is positioned at a rotation fixing position that restricts the rotation of the cleaning part holding part 200. In this case, in a state where the cleaning part assembly 100 is disassembled, the rotation of the cleaning part holding part 200 can be restricted (fixed). Therefore, the cleaning part assembly 100 can be easily attached to the cleaning part holding part 200. In the conventional form, as described above, since the cleaning part holding part 200 can rotate freely, even when the cleaning part assembly 100 is attached to the cleaning part holding part 200, it takes time and effort. According to this form, such a problem can be solved. In addition, when it takes time to attach the cleaning part assembly 100 to the cleaning part holding part 200, the roller-type cleaning part 110 will be contaminated, resulting in a problem of reduced cleaning degree.

[0138] When the moving part 150 is composed of an elastic part 150a such as a spring, the rotation of the cleaning part holding part 200 can be restricted without introducing a driving part such as a motor. Therefore, the rotation of the cleaning part holding part 200 can be restricted simply and at low cost.

[0139] Since there is no locking mechanism caused by a component rotating part 180 such as a motor on the driven part side of the cleaning part holding part 200, the problem that the cleaning part holding part 200 can rotate freely easily occurs. In this regard, by providing a moving part 150 that restricts the rotation of the cleaning part holding part 200 on the driven part, this problem can be solved. On the other hand, in the component rotating part 180, since the rotation is restricted by a locking mechanism such as a servo lock, it will not rotate freely. However, when the locking mechanism such as the servo lock is released, since the cleaning part holding part 200 on the driving part side (component rotating part 180 side) can also rotate freely, a moving part 150 that positions the cleaning part holding part 200 at the rotation fixing position can also be provided on the driving part side (component rotating part 180 side).

[0140] As Figure 10 and Figure 11As shown, the cleaning component holding part 200 has a peripheral protruding part 220 that protrudes outside the periphery. The peripheral protruding part 220 is in surface contact with the inner surface of the accommodating part 120 that accommodates the cleaning component holding part 200, and the rotation of the cleaning component holding part 200 is restricted by pressing the peripheral protruding part 220 against the inner surface of the accommodating part 120. In the case of adopting this form, the rotation of the cleaning component holding part 200 can be restricted by the resistance (sliding resistance) at the surface of the peripheral protruding part 220. When using the elastic component 150a as the moving part 150, in order to restrict the selection of the cleaning component holding part 200, although an elastic component 150a with a larger spring constant is considered, it is beneficial in that the rotation of the cleaning component holding part 200 can be restricted without using an elastic component 150a with an extremely large spring constant by bringing the peripheral protruding part 220 into surface contact with the inner surface of the accommodating part 120.

[0141] As Figure 12 shown, in the case of adopting a form in which the peripheral protruding part 220 has one or more groove parts 220a, the lubricating fluid supplied to the bearing 260 via the groove parts 220a can be guided to the cleaning component assembly 100 side. Therefore, even if garbage or the like adheres to the surface of the peripheral protruding part 220 on the cleaning component assembly 100 side, it can be rinsed with the lubricating fluid. When the cleaning component assembly 100 is installed and the substrate W is cleaned, since the peripheral protruding part 220 separates from the accommodating part 120 and is rotatable, the surface of the peripheral protruding part 220 on the cleaning component assembly 100 side can be easily cleaned with the lubricating fluid.

[0142] As Figure 5 and Figure 6 shown, in the case of adopting a form in which the thickness of the peripheral protruding part 220 on the cleaning component assembly 100 side in the longitudinal section is thicker than the thickness on the opposite side of the roller-type cleaning component 110, the lubricating fluid supplied from the lubricating fluid supply pipe 121 easily passes over the peripheral protruding part 220 and is guided to the cleaning component assembly 100 side. Therefore, as described above, even if garbage or the like adheres to the surface of the peripheral protruding part 220 on the cleaning component assembly 100 side, it can be rinsed with the lubricating fluid. In addition, in the case of adopting this form, the thickness of the rotation axis side (root) of the peripheral protruding part 220 can be thickened, thereby improving the strength.

[0143] As Figure 13 and Figure 14As shown, in the case where the cleaning component holding part 200 has a first protruding part 230 protruding outward from the peripheral edge, and the housing part 120 housing the cleaning component holding part 200 has a first concave part 190 on the inner surface for housing the first protruding part 230, by housing the first protruding part 230 in the first concave part 190, the rotation of the cleaning part holding part 200 can be restricted. In this case, it is possible to more reliably prevent the end part (mounting part) of the cleaning component holding part 200 on the cleaning component assembly 100 side from rotating. However, in this form, since it is necessary to house the first protruding part 230 in the first concave part 190, the convenience is poorer compared with the form in which the peripheral protruding part 220 protrudes from the periphery of the holding main body part 210. In addition, by rotating the end part (mounting part 201) of the cleaning component holding part 200 on the cleaning component assembly 100 side, the first protruding part 230 is automatically housed in the first concave part 190 to house the first protruding part 230 in the first concave part 190.

[0144] In the case where a plurality of first concave parts 190 are provided, since the number of first concave parts 190 that can house the first protruding part 230 can be increased, the effort to house the first protruding part 230 in the first concave part 190 can be made simpler when disassembling the cleaning component assembly 100. In the case where one first protruding part 230 and one first concave part 190 are provided respectively, when disassembling the cleaning component assembly 100, the cleaning component holding part 200 can always be positioned at the same position. Therefore, in the case of adopting Figure 8 and Figure 9 the structure shown, when disassembling the cleaning component assembly 100, the protruding part 205a can be positioned approximately at the same position, so that it is easy to position the protruding part 205a between the pair of protruding parts 105a.

[0145] As Figure 15 and Figure 16 shown, in the case where the housing part 120 housing the cleaning component holding part 200 has a second protruding part 195 on the inner surface, and the cleaning component holding part 200 has a second concave part 240 for housing the second protruding part 195, by housing the second protruding part 195 in the second concave part 240, the rotation of the cleaning component holding part 200 can be restricted. However, in this form, since it is necessary to house the second protruding part 195 in the second concave part 240, when disassembling the cleaning component assembly 100, it is necessary to confirm the positions of the second protruding part 195 and the second concave part 240. In this regard, the convenience is poorer compared with the form in which the peripheral protruding part 220 protrudes from the periphery of the holding main body part 210. In the case where one second concave part 240 and one second protruding part 195 are provided respectively, the cleaning component holding part 200 can always be positioned at the same position when disassembling the cleaning component assembly 100, the same as in the above form. Therefore, in the case of adopting Figure 8and Figure 9 In the case of the structure shown, when disassembling and cleaning the component assembly 100, the protruding portion 205a can be roughly positioned at the same position, so that the protruding portion 205a can be easily positioned between the pair of protruding portions 105a.

[0146] As Figure 24 shown, in the form adopting the peripheral protruding portion 220, the mounting portion 201 of the cleaning component holding portion 200 can also be provided with a mark 270 such as a notch. The mark 270 can be provided only in one place, or a pair can be provided in a 180-degree positional relationship. By providing such a mark 270, the mounting portion 201 of the cleaning component holding portion 200 can be positioned at a specified position, the cleaning component holding portion 200 can be positioned at any position in the rotation direction, and the mounting portion 201 can be positioned at an easily mountable position according to the relationship with the cleaning component holding portion 200 on the drive unit side (component rotating portion 180 side).

[0147] In the case where a plurality of second recesses 240 are provided, since the number of second recesses 240 that can accommodate the second protruding portion 195 can be increased, the effort of accommodating the second protruding portion 195 in the second recess 240 can be made simple when disassembling the cleaning component assembly 100.

[0148] From the viewpoint of ease of manufacturing, the combination of the first protruding portion 230 and the first recess 190 is superior to the combination of the second protruding portion 195 and the second recess 240.

[0149] In addition, the object to be processed cleaned by the cleaning component of one embodiment is not limited to a semiconductor wafer, and may also be a silicon wafer, a glass substrate, a printed wiring board, a liquid crystal panel, and a solar panel. In addition, the planar shape of the object to be processed may be circular or rectangular, and the planar thickness may also be a thickness that allows flexure within the plane. The substrates to be processed include square substrates and circular substrates. In addition, the square substrates include polygonal glass substrates such as rectangles, liquid crystal substrates, printed substrates, and other polygonal plating objects. The circular substrates include semiconductor wafers, glass substrates, and other circular plating objects.

[0150] High-temperature pure water, APM (Ammonium Hydrogen-peroxide Mixture, a mixture of ammonia and hydrogen peroxide water), SPM (Sulfuric-Acid Hydrogen Peroxide Mixture, a mixture of sulfuric acid and hydrogen peroxide water), carbonated water, ultrasonic water, ozone water, etc. can be applied as the cleaning liquid.

[0151] The descriptions of the above embodiments and the disclosures of the drawings are only examples for explaining the invention to be protected, and the invention to be protected is not limited to the descriptions of the above embodiments or the disclosures of the drawings. In addition, the description of the scope of the invention to be protected at the time of application is only an example, and the description of the invention to be protected can be appropriately changed based on the descriptions in the specification and the drawings.

Claims

1. A cleaning component mounting mechanism, characterized in that, it comprises: a cleaning component holding part that can mount a cleaning component assembly having a cleaning component for cleaning a substrate; a component rotating part that rotates the cleaning component assembly held by the cleaning component holding part; and a moving part that moves the cleaning component holding part axially in a state where the cleaning component assembly is removed and positions it at a rotation fixing position that restricts the rotation of the cleaning component holding part, the cleaning component holding part has a peripheral protruding part that protrudes outside the periphery, the peripheral protruding part is in surface contact with the inner surface of a housing part that houses at least a part of the cleaning component holding part, and the peripheral protruding part is pressed against the inner surface of the housing part, thereby restricting the rotation of the cleaning component holding part.

2. The cleaning component mounting mechanism according to claim 1, characterized in that, the moving part is an elastic component.

3. The cleaning component mounting mechanism according to claim 1 or 2, characterized in that, the cleaning component holding part has a driving part side cleaning component holding part that rotates by the component rotating part and a driven part side cleaning component holding part that rotates in a driven manner, the moving part is provided on the driven part side cleaning component holding part.

4. The cleaning component mounting mechanism according to claim 1 or 2, characterized in that, the peripheral protruding part has one or more groove parts.

5. The cleaning component mounting mechanism according to claim 1 or 2, characterized in that, in a longitudinal section, the thickness of the cleaning component side of the peripheral protruding part is thicker than the thickness of the opposite side of the cleaning component.

6. The cleaning component mounting mechanism according to claim 1 or 2, characterized in that, the cleaning component holding part has a first protruding part that protrudes outside the periphery, the housing part that houses at least a part of the cleaning component holding part has a first recess on the inner surface for housing the first protruding part, or the housing part that houses at least a part of the cleaning component holding part has a second protruding part on the inner surface, and the cleaning component holding part has a second recess for housing the second protruding part.

7. The cleaning component mounting mechanism according to claim 6, characterized in that, when the first protruding part is provided, a plurality of the first recesses are provided, or when the second protruding part is provided, a plurality of the second recesses are provided.

8. A substrate cleaning device, characterized in that, it has: a substrate supporting part for supporting a substrate; a cleaning component holding part that can mount a cleaning component assembly having a cleaning component for cleaning the substrate; a component rotating part that rotates the cleaning component assembly held by the cleaning component holding part; and a moving part that moves the cleaning component holding part axially in a state where the cleaning component assembly is removed and positions it at a rotation fixing position that restricts the rotation of the cleaning component holding part the cleaning component holding part has a peripheral protruding part that protrudes outside the periphery, The peripheral protrusion is in surface contact with the inner surface of the housing portion that houses at least a part of the cleaning member holding portion, and the peripheral protrusion is pressed against the inner surface of the housing portion, thereby restricting the rotation of the cleaning member holding portion.

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