Display panel

Abstract

The embodiment of the application discloses a display panel, which comprises a metal layer and an elastic conductive layer arranged on the surface of the metal layer. The tensile strength of the elastic conductive layer is greater than that of the metal layer. During rolling or bending, the elastic conductive layer can protect and buffer the metal layer, effectively avoiding the situation that the metal layer is broken due to stress concentration.

Description

TECHNICAL FIELD

[0001] The present application relates to the display field, and in particular to a display panel. BACKGROUND

[0002] In recent years, the organic light-emitting diode (OLED) display screen has been widely concerned and applied due to its high contrast, wide viewing angle, and the advantages of realizing bending, and the like, and in particular, the bending characteristic thereof has attracted the attention of a large number of consumers. With the increasingly mature technology, the flexible display screen has gradually appeared in various exhibition stands.

[0003] The flexible display screen needs to be rolled up or bent during use, and even frequently bent. With the increasing number of bending, the wire may be broken, which causes the wire resistance to increase and thus the display screen brightness to decrease, resulting in poor display. SUMMARY

[0004] The display panel provided by the embodiments of the present application can solve the technical problem of the wire breakage of the flexible display screen during rolling up or bending.

[0005] The display panel provided by the embodiments of the present application comprises:

[0006] a metal layer;

[0007] an elastic conductive layer arranged on the surface of the metal layer, the tensile strength of the elastic conductive layer being greater than the tensile strength of the metal layer.

[0008] Optionally, in some embodiments of the present application, the tensile strength of the elastic conductive layer is 800 N / mm2-1500 N / mm2.

[0009] Optionally, in some embodiments of the present application, the material of the elastic conductive layer is beryllium bronze or titanium bronze.

[0010] Optionally, in some embodiments of the present application, the metal layer comprises a signal line, the surface of the signal line is provided with the elastic conductive layer, and the part of the elastic conductive layer corresponding to the signal line is in a concave-convex shape along the extension direction of the signal line.

[0011] Optionally, in some embodiments of the present application, the display panel further comprises a first substrate, an active layer, a first insulating layer, a second insulating layer, and a third insulating layer.

[0012] the metal layer comprises a first metal layer and a second metal layer;

[0013] The active layer is arranged on the first substrate, the first insulating layer is arranged on the active layer, the first metal layer is arranged on the first insulating layer, the second insulating layer covers the active layer and the first metal layer, the active layer is arranged on the second insulating layer, and the third insulating layer covers the second metal layer and the second insulating layer.

[0014] At least one of the surface of the first metal layer on the side close to the first insulating layer, the surface of the first metal layer on the side away from the first insulating layer, the surface of the second metal layer on the side close to the second insulating layer, and the surface of the second metal layer on the side close to the third insulating layer is provided with the elastic conductive layer.

[0015] Optionally, in some embodiments of the present application, the display panel further comprises a first substrate, an active layer, a first insulating layer, a second insulating layer, a third insulating layer and a fourth insulating layer.

[0016] The metal layer comprises a first metal layer and a second metal layer.

[0017] The fourth insulating layer is arranged on the first substrate, the first metal layer is arranged on the fourth insulating layer, the first insulating layer covers the first metal layer, the active layer is arranged on the first insulating layer, the second insulating layer covers the active layer, the second metal layer is arranged on the second insulating layer, and the third insulating layer covers the second metal layer.

[0018] At least one of the surface of the first metal layer on the side close to the first insulating layer, the surface of the first metal layer on the side close to the fourth insulating layer, the surface of the second metal layer on the side close to the second insulating layer, and the surface of the second metal layer on the side close to the third insulating layer is provided with the elastic conductive layer.

[0019] Optionally, in some embodiments of the present application, the first metal layer comprises a gate and a gate line, the gate is arranged corresponding to the active layer, and the gate is connected with the corresponding gate line.

[0020] The second metal layer comprises a source, a drain and a data line, the source is in contact with one end of the corresponding active layer, the drain is in contact with the other end of the corresponding active layer, and the source is connected with the corresponding data line.

[0021] Optionally, in some embodiments of the present application, the gate line is concave-convex along the extension direction thereof; and / or,

[0022] The data line is concave-convex along the extension direction thereof.

[0023] Optionally, in some embodiments of the present application, the metal layer further comprises a third metal layer arranged between the first substrate and the active layer, a fourth insulating layer arranged between the third metal layer and the active layer, and a fifth insulating layer arranged between the third metal layer and the first substrate.

[0024] Optionally, in some embodiments of the present application, the metal layer further comprises a third metal layer arranged between the first substrate and the fourth insulating layer, and a fifth insulating layer arranged between the first substrate and the third metal layer.

[0025] Optionally, in some embodiments of the present application, a surface of the third metal layer on a side close to the fourth insulating layer is provided with the elastic conductive layer; and / or,

[0026] a surface of the third metal layer on a side close to the fifth insulating layer is provided with the elastic conductive layer.

[0027] Optionally, in some embodiments of the present application, the third metal layer comprises a light shielding block and a clock signal line, the light shielding block is arranged corresponding to the active layer, and the light shielding block is connected with the clock signal line.

[0028] Optionally, in some embodiments of the present application, the third metal layer comprises a clock signal line.

[0029] Optionally, in some embodiments of the present application, the clock signal line is concave-convex along the extension direction of itself.

[0030] Optionally, in some embodiments of the present application, the display panel further comprises an insulating layer arranged on a side of the metal layer, and an elastic support layer arranged between the metal layer and the insulating layer, the elastic modulus of the elastic support layer is less than the elastic modulus of the insulating layer.

[0031] Optionally, in some embodiments of the present application, the elastic modulus of the elastic support layer is 1-80 MPa.

[0032] Embodiments of the present application adopt a display panel, by arranging an elastic conductive layer on the surface of the metal layer, the tensile strength of the elastic conductive layer is greater than the tensile strength of the metal layer, during the rolling or bending process of the display panel, the elastic conductive layer can protect and buffer the metal layer, effectively avoiding the situation that the metal layer is broken due to stress concentration. BRIEF DESCRIPTION OF DRAWINGS

[0033] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments will be briefly introduced. Obviously, the drawings in the following description only represent some of the embodiments of the present application, and all other drawings obtained by those skilled in the art without creative effort based on these drawings also belong to the protection scope of the present application. In addition, it should be understood that the specific embodiments described herein are only used to illustrate and explain the present application, and are not intended to limit the present application. In the present application, the positional words such as "upper" and "lower" generally refer to the upper and lower of the device in the actual use or working state, and the specific is the direction of the drawing surface in the drawings; and "inner" and "outer" refer to the contour of the device.

[0034] Figure 1 is a cross-sectional structure schematic of a first display panel provided by an embodiment of the present application Figure 1 ;

[0035] Figure 2 is a cross-sectional structure schematic of a first display panel provided by an embodiment of the present application Figure 2 ;

[0036] Figure 3 is a cross-sectional structure schematic of a first display panel provided by an embodiment of the present application Figure 3 ;

[0037] Figure 4 is a cross-sectional structure schematic of a second display panel provided by an embodiment of the present application Figure 1 ;

[0038] Figure 2 is a cross-sectional structure schematic of a second display panel provided by an embodiment of the present application Figure 6 ;

[0039] Figure 3 is a cross-sectional structure schematic of a second display panel provided by an embodiment of the present application Figure 7 ;

[0040] Figures 1 to 3 is a flowchart of a manufacturing method of a display panel provided by an embodiment of the present application. DETAILED DESCRIPTION

[0041] The technical solutions in the embodiments of the present application will be described clearly and completely in the following description with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative effort belong to the protection scope of the present application. In addition, it should be understood that the specific embodiments described herein are only used to illustrate and explain the present application, and are not intended to limit the present application. In the present application, the positional words such as "upper" and "lower" generally refer to the upper and lower of the device in the actual use or working state, and the specific is the direction of the drawing surface in the drawings; and "inner" and "outer" refer to the contour of the device.

[0042] The embodiment of the present application provides a display panel. The following is described in detail. It should be noted that the description order of the following embodiments is not regarded as the limitation of the preferred order of the embodiments.

[0043] Figure 1 The first display panel shown is a top gate display panel, which refers to a top gate design of a thin film transistor, wherein, Figure 2 Fig. 1 is a cross-sectional structure schematic diagram of a thin film transistor region of the first display panel, Figure 3 Fig. 2 is a cross-sectional structure schematic diagram of a clock signal line region of the first display panel, Figures 4 to 6 Fig. 3 is a cross-sectional structure schematic diagram of a data line region of the first display panel. Figure 4 The second display panel shown is a bottom gate display panel, which refers to a bottom gate design of a thin film transistor, wherein, Figure 5 Fig. 4 is a cross-sectional structure schematic diagram of a thin film transistor region of the second display panel, Figure 6 Fig. 5 is a cross-sectional structure schematic diagram of a clock signal line region of the second display panel, Figures 1 to 3 Fig. 6 is a cross-sectional structure schematic diagram of a data line region of the second display panel.

[0044] Referring to Figures 1 to 6 The embodiment of the present application provides a display panel, which comprises a metal layer 110 and an elastic conductive layer 160 arranged on the surface of the metal layer 110, and the tensile strength of the elastic conductive layer 160 is greater than that of the metal layer 110. In the embodiment, the elastic conductive layer 160 can be arranged on the upper surface or the lower surface of the metal layer 110, or can be arranged on both the upper surface and the lower surface.

[0045] In the display panel of the embodiment of the present application, the elastic conductive layer 160 is arranged on the surface of the metal layer 110, the tensile strength of the elastic conductive layer 160 is greater than that of the metal layer 110, and in the process of rolling up or bending, the elastic conductive layer 160 can protect and buffer the metal layer 110, so as to effectively avoid the situation that the metal layer 110 is broken due to stress concentration. In addition, the arrangement of the elastic conductive layer 160 can also reduce the resistance of the wire of the display panel.

[0046] Specifically, as Figures 1 to 6As shown, the display panel further comprises a first substrate 141 and an active layer 150 disposed on the first substrate 141, the first substrate 141 is made of flexible material, and specifically but not exclusively made of polyimide (PI); the material of the active layer 150 can be selected from one or more of indium gallium zinc oxide (IGZO), indium gallium zinc titanium oxide (IGZTO), indium zinc oxide (IZO), and zinc titanium oxide (ZTO), etc. metal oxide material, and the thickness of the active layer 150 is 300 angstroms to 500 angstroms. Of course, according to actual selection and specific requirements, the material of the first substrate 141, the material of the active layer 150, and the thickness of the active layer 150 can be appropriately modified, which is not limited herein.

[0047] Specifically, the metal layer 110 comprises a signal line 140, and the surface of the signal line 140 is provided with an elastic conductive layer 160, and the elastic conductive layer 160 corresponds to the part of the signal line 140 and is concave-convex along the extension direction of the signal line 140, that is, the surface of the signal line 140 is provided with a plurality of convex portions and a plurality of concave portions, and the convex portions and the concave portions are arranged alternately along the extension direction of the signal line 140, so as to form a concave-convex shape. Under this structure, during the rolling or bending of the display panel, because the surface of the signal line 140 is provided with the concave portions, the signal line 140 can better release stress, and avoid stress concentration to cause the signal line 140 to break. In this embodiment, the cross-sectional shape of the concave portion can be but is not limited to an inverted trapezoidal shape, an inverted triangular shape, or a circular arc shape.

[0048] Specifically, as shown in the figure, Figures 1 to 3 The display panel further comprises an insulating layer 130 disposed on one side of the metal layer 110, and the insulating layer 130 can prevent short circuit between the metal layers 110 which are not disposed in the same layer.

[0049] Optionally, the display panel is a top gate display panel. As shown in the figure, Figures 4 to 6As shown, the metal layer 110 includes a first metal layer 111 and a second metal layer 112, and the insulating layer 130 includes a first insulating layer 131, a second insulating layer 132, and a third insulating layer 133. Specifically, the active layer 150 is disposed on the first substrate 141, the first insulating layer 131 is disposed on the active layer 150, the first metal layer 111 is disposed on the first insulating layer 131, the second insulating layer 132 covers the active layer 150 and the first metal layer 111, the active layer 150 is disposed on the second insulating layer 132, and the third insulating layer 133 covers the second metal layer 112 and the second insulating layer 132; at least one of the following surfaces is provided with an elastic conductive layer 160: the surface of the first metal layer 111 near the first insulating layer 131, the surface of the first metal layer 111 away from the first insulating layer 131, the surface of the second metal layer 112 near the second insulating layer 132, and the surface of the second metal layer 112 near the third insulating layer 133.

[0050] Optionally, the display panel can also be a bottom-gate display panel. The thin-film transistors in bottom-gate display panels include various types such as Etch Stop Layer (ESL) and Back Channel Etch (BCE). For example... Figure 3 As shown, the metal layer 110 includes a first metal layer 111 and a second metal layer 112; the insulating layer 130 includes a first insulating layer 131, a second insulating layer 132, a third insulating layer 133, and a fourth insulating layer 134; the fourth insulating layer 134 is disposed on the first substrate 141, the first metal layer 111 is disposed on the fourth insulating layer 134, the first insulating layer 131 covers the first metal layer 111, the active layer 150 is disposed on the first insulating layer 131, and the second insulating layer 132 covers the active layer 150. On the 0, the second metal layer 112 is disposed on the second insulating layer 132, and the third insulating layer 133 covers the second metal layer 112; at least one of the following surfaces is provided with an elastic conductive layer 160: the surface of the first metal layer 111 near the first insulating layer 131, the surface of the first metal layer 111 near the fourth insulating layer 134, the surface of the second metal layer 112 near the second insulating layer 132, and the surface of the second metal layer 112 near the third insulating layer 133.

[0051] Specifically, the first metal layer 111 includes a gate 1111 and a gate line 1112, the gate line 1112 is a signal line 140 of the first metal layer 111, the gate 1111 is arranged corresponding to the active layer 150, and the gate 1111 is connected with the corresponding gate line 1112; the second metal layer 112 includes a source electrode 1121, a drain electrode 1122 and a data line 1123, the data line 1123 is a signal line 140 of the second metal layer 112, the source electrode 1121 is in contact with one end of the corresponding active layer 150, the drain electrode 1122 is in contact with the other end of the corresponding active layer 150, and the source electrode 1121 is connected with the corresponding data line 1123. In the embodiment of the present application, a plurality of gate lines 1112 are arranged at intervals, a plurality of data lines 1123 are arranged at intervals, the gate lines 1112 are arranged in extension along a first direction, the data lines 1123 are arranged in extension along a second direction, the first direction intersects the second direction, and the first direction and the second direction can be but are not limited to being arranged vertically, and the plurality of gate lines 1112 and the plurality of data lines 1123 divide the display panel into a plurality of pixel areas; the gate 1111, the active layer 150, the source electrode 1121 and the drain electrode 1122 constitute a thin film transistor, and each pixel area is provided with a corresponding thin film transistor, and the display of the corresponding pixel area can be controlled through the thin film transistor.

[0052] Further, as shown in Figure 6 and Figure 1 , the data line 1123 is concave-convex along the extension direction thereof, that is, the surface of the data line 1123 is provided with a plurality of convex portions and a plurality of concave portions, the convex portions and the concave portions are arranged alternately along the extension direction of the data line 1123, so as to form a concave-convex shape. Under this structure, during the rolling or bending of the display panel, since the surface of the data line 1123 is provided with the concave portions, the data line 1123 can release stress better, and stress concentration leading to the fracture of the data line 1123 is avoided. In this embodiment, the cross-sectional shape of the concave portion can be but is not limited to an inverted trapezoidal shape, an inverted triangular shape or a circular arc shape.

[0053] Further, as shown in Figure 3 , Figure 4 , Figure 6 and Figures 1 to 3 , the gate line 1112 is concave-convex along the extension direction thereof, that is, the surface of the gate line 1112 is provided with a plurality of convex portions and a plurality of concave portions, the convex portions and the concave portions are arranged alternately along the extension direction of the gate line 1112, so as to form a concave-convex shape. Under this structure, during the rolling or bending of the display panel, since the surface of the gate line 1112 is provided with the concave portions, the gate line 1112 can release stress better, and stress concentration leading to the fracture of the gate line 1112 is avoided. In this embodiment, the cross-sectional shape of the concave portion can be but is not limited to an inverted trapezoidal shape, an inverted triangular shape or a circular arc shape.

[0054] Specifically, as shown in Figures 4 to 6As shown, the metal layer 110 further comprises a third metal layer 113 arranged between the first substrate 141 and the active layer 150; and the insulating layer 130 further comprises a fourth insulating layer 134 arranged between the third metal layer 113 and the active layer 150, and a fifth insulating layer 135 arranged between the third metal layer 113 and the first substrate 141. In this embodiment, the third metal layer 113 can be used for light shielding, so as to avoid the active layer 150 from being irradiated by light and causing threshold voltage shift of the thin film transistor.

[0055] It can be understood that the specific position of the third metal layer 113 can be adjusted as required, for example, Figures 1 to 3 As shown, the metal layer 110 further comprises a third metal layer 113 arranged between the first substrate 141 and the fourth insulating layer 134, and the insulating layer 130 further comprises a fifth insulating layer 135 arranged between the first substrate 141 and the third metal layer 113, which can also achieve the same technical effects.

[0056] In the display panel of the embodiment, the surface of the third metal layer 113 close to the fourth insulating layer 134 and / or the surface of the third metal layer 113 close to the fifth insulating layer 135 is provided with an elastic conductive layer 160, i.e., the upper surface or the lower surface of the third metal layer 113 is provided with the elastic conductive layer 160, or the upper surface and the lower surface of the third metal layer 113 are both provided with the elastic conductive layer 160.

[0057] Specifically, the elastic conductive layer 160 comprises a first elastic conductive layer 161 and a second elastic conductive layer 162, the first elastic conductive layer 161 is arranged on the lower surface of the third metal layer 113 close to the fifth insulating layer 135, and the second elastic conductive layer 162 is arranged on the lower surface of the second metal layer 112 close to the second insulating layer 132. It can be understood that the elastic conductive layer 160 can also be arranged on the upper surface of the third metal layer 113, the upper surface of the first metal layer 111, the lower surface of the first metal layer 111 and the upper surface of the second metal layer 112 according to actual selection and specific requirements, which is not limited herein.

[0058] Specifically, as shown in FIG. 1C, Figures 4 to 6As shown, the third metal layer 113 includes a light-shielding block 1131 and a clock signal line 1132. The clock signal line 1132 is the signal line 140 of the third metal layer 113. The light-shielding block 1131 is disposed corresponding to the active layer 150, and the light-shielding block 1131 is connected to the clock signal line 1132. In this structure, the light-shielding block 1131 can prevent the active layer 150 from being exposed to light, thus avoiding the threshold voltage shift of the thin-film transistor caused by the active layer 150 being exposed to light. In addition, by setting the light-shielding block 1131 and the clock signal line 1132 in the same layer, the manufacturing process of the display panel can be simplified and production efficiency can be improved. In this embodiment, the data line 1123 can be connected to the light-shielding block 1131, and the clock signal line 1132 transmits the clock signal to the data line 1123 through the light-shielding block 1131.

[0059] Specifically, such as Figure 1 As shown, the third metal layer 113 includes a clock signal line 1132, which is a signal line 140 of the third metal layer 113. The data line 1123 is connected to the clock signal line 1132, so that the clock signal line 1132 can transmit the clock signal to the data line 1123.

[0060] Furthermore, such as Figure 4 and Figure 2 As shown, the surface of the light-shielding block 1131 is uneven, meaning that the surface of the light-shielding block 1131 has multiple protrusions and multiple recesses, which are alternately arranged to form an uneven surface. With this structure, during the rolling or bending process of the display panel, the recesses on the surface of the light-shielding block 1131 allow for better stress release, preventing stress concentration and breakage of the light-shielding block 1131. In this embodiment, the cross-sectional shape of the recesses can be, but is not limited to, an inverted trapezoid, an inverted triangle, or an arc.

[0061] Furthermore, such as Figure 5 and Figures 1 to 3 As shown, the clock signal line 1132 has a concave-convex shape along its extension direction; that is, the surface of the clock signal line 1132 has multiple protrusions and multiple recesses, which are alternately arranged along the extension direction of the clock signal line 1132 to form a concave-convex shape. With this structure, during the rolling or bending of the display panel, the recesses on the surface of the clock signal line 1132 allow for better stress release, preventing stress concentration and breakage of the clock signal line 1132. In this embodiment, the cross-sectional shape of the recesses can be, but is not limited to, an inverted trapezoid, an inverted triangle, or an arc.

[0062] Specifically, in order to ensure that the elastic conductive layer 160 (the first elastic conductive layer 161 and the second elastic conductive layer 162) has a buffering effect, while avoiding that the elasticity of the elastic conductive layer 160 is too large, the tensile strength of the elastic conductive layer 160 is set to 800 N / mm2-1500 N / mm2. In the display panel of the embodiment of the present application, the tensile strength of the elastic conductive layer 160 is set to 800 N / mm2, 900 N / mm2, 1000 N / mm2, 1100 N / mm2, 1200 N / mm2, 1300 N / mm2, 1400 N / mm2or 1500 N / mm2. Of course, according to the actual situation and specific needs, the tensile strength of the elastic conductive layer 160 can be adjusted appropriately, which is not limited herein.

[0063] Specifically, the elastic conductive layer 160 (the first elastic conductive layer 161 and the second elastic conductive layer 162) is made of beryllium bronze, titanium bronze or other elastic high-conductive materials. On the one hand, the resistance of the metal layer 110 can be reduced, and the signal delay can be reduced. On the other hand, the elastic conductive layer 160 can play a buffering role, thereby preventing the metal layer 110 from being broken during the process of being rolled or bent. It can be understood that the elastic conductive layer 160 can also be made of other conductive materials, which is not limited herein.

[0064] Specifically, if the thickness of the elastic conductive layer 160 is too large, the deformation of the elastic conductive layer 160 is too large during the process of being bent or rolled, and the elastic conductive layer 160 cannot play a supporting role well. If the thickness of the elastic conductive layer 160 is too thin, the bending or rolling stress cannot be released well. Therefore, the thickness of the elastic conductive layer 160 (the first elastic conductive layer 161 and the second elastic conductive layer 162) is set to 1-5 microns, which can well avoid the above problems.

[0065] In the display panel of the embodiment of the present application, the thickness of the elastic conductive layer 160 (the first elastic conductive layer 161 and the second elastic conductive layer 162) can be 1 micron, 1.5 microns, 2 microns, 2.5 microns, 3 microns, 3.5 microns, 4 microns, 4.5 microns or 5 microns. Of course, according to the actual situation and specific needs, the thickness of the elastic conductive layer 160 can be adjusted appropriately, which is not limited herein.

[0066] Specifically, the display panel further comprises an elastic support layer 120 arranged between the metal layer 110 and the insulating layer 130, and the elastic modulus of the elastic support layer 120 is less than the elastic modulus of the insulating layer 130. The display panel can comprise a plurality of metal layers 110, a plurality of insulating layers 130 and at least one elastic support layer 120. The opposite sides of each metal layer 110 can be provided with insulating layers 130, and the elastic support layer 120 is arranged between at least one of the metal layers 110 and the corresponding insulating layer 130.

[0067] In the display panel of the embodiment of the present application, the elastic support layer 120 is arranged between the metal layer 110 and the insulating layer 130, the elastic modulus of the elastic support layer 120 is less than the elastic modulus of the insulating layer 130, that is, the elasticity of the elastic support layer 120 is better than the elasticity of the insulating layer 130, and in the process of rolling up or bending, the elastic support layer 120 can protect and buffer the metal layer 110, so as not to scratch the metal layer 110, and effectively avoid the breakage of the metal layer 110.

[0068] Optionally, as shown in Figures 4 to 6 At least one of the first insulating layer 131 and the first metal layer 111, the first metal layer 111 and the second insulating layer 132, the second insulating layer 132 and the second metal layer 112, and the second metal layer 112 and the third insulating layer 133 is provided with the elastic support layer 120.

[0069] Optionally, as shown in Figures 1 to 6 At least one of the fourth insulating layer 134 and the first metal layer 111, the first metal layer 111 and the first insulating layer 131, the second insulating layer 132 and the second metal layer 112, and the second metal layer 112 and the third insulating layer 133 is provided with the elastic support layer 120, and the elastic modulus of the elastic support layer 120 is less than the elastic modulus of the corresponding insulating layer 130.

[0070] In the embodiment of the present application, the elastic support layer 120 includes the first elastic support layer 121, and the first elastic support layer 121 is arranged between the second metal layer 112 and the third insulating layer 133, that is, the first elastic support layer 121 is arranged above the second metal layer 112, and the elastic modulus of the first elastic support layer 121 is less than the elastic modulus of the third insulating layer 133. In the process of rolling up or bending, the elastic modulus of the first elastic support layer 121 is less than the elastic modulus of the second insulating layer 132, the first elastic support layer 121 can protect and buffer the second metal layer 112, prevent the third insulating layer 133 from scratching the second metal layer 112, and effectively avoid the breakage of the second metal layer 112. It can be understood that, according to the selection of actual conditions and specific requirements, the elastic support layer 120 can also be arranged below the second metal layer 112, above the first metal layer 111, or below the first metal layer 111, which is not limited herein.

[0071] Specifically, the elastic support layer 120 is arranged between the third metal layer 113 and the fourth insulating layer 134; and / or the elastic support layer 120 is arranged between the third metal layer 113 and the fifth insulating layer 135. By arranging the elastic support layer 120 above and / or below the third metal layer 113, that is, the elasticity of the elastic support layer 120 is better than that of the corresponding insulating layer 130, in the process of rolling up or bending the display panel, the elastic support layer 120 can protect and buffer the third metal layer 113, so as not to scratch the third metal layer 113, and effectively avoid the situation that the third metal layer 113 is broken to cause light leakage.

[0072] In the embodiment of the present application, the elastic support layer 120 includes a second elastic support layer 122, the second elastic support layer 122 is arranged between the third metal layer 113 and the fourth insulating layer 134, that is, the second elastic support layer 122 is arranged above the third metal layer 113, and the elastic modulus of the second elastic support layer 122 is less than that of the fourth insulating layer 134. In the process of rolling up or bending the display panel, the elastic modulus of the second elastic support layer 122 is less than that of the fourth insulating layer 134, the second elastic support layer 122 can protect and buffer the third metal layer 113, so as to prevent the fourth insulating layer 134 from scratching the third metal layer 113, and effectively avoid the situation that the third metal layer 113 is broken. It can be understood that, according to the selection of actual situation and specific requirements, the elastic support layer 120 can also be arranged below the third metal layer 113 (that is, between the third metal layer 113 and the fifth insulating layer 135), which is not limited herein.

[0073] Specifically, the elastic modulus of the elastic support layer 120 has a great influence on the protection and buffering effect, if the elastic modulus of the elastic support layer 120 is too large, the elastic support layer 120 is easy to scratch the metal layer 110; if the elastic modulus of the elastic support layer 120 is too small, the elastic support layer 120 cannot play a good supporting role, which will reduce the reliability of the display panel. Therefore, the elastic modulus of the elastic support layer 120 (the first elastic support layer 121 and the second elastic support layer 122) is set to 1 MPa-80 MPa, which can well avoid the above problems.

[0074] In the display panel of the embodiment of the present application, the elastic modulus of the elastic support layer 120 (the first elastic support layer 121 and the second elastic support layer 122) can be 1 MPa, 5 MPa, 10 MPa, 15 MPa, 20 MPa, 25 MPa, 30 MPa, 35 MPa, 40 MPa, 45 MPa, 50 MPa, 55 MPa, 60 MPa, 65 MPa, 70 MPa, 75 MPa or 80 MPa, of course, according to the selection of actual situation and specific requirements, the elastic modulus of the elastic support layer 120 can be adjusted appropriately, which is not limited herein.

[0075] Specifically, if the thickness of the elastic support layer 120 is too large, the deformation of the elastic support layer 120 is too large during the bending or rolling of the display panel, and the elastic support layer 120 cannot well play a supporting role; if the thickness of the elastic support layer 120 is too thin, the bending or rolling stress cannot be well released. Therefore, the thickness of the elastic support layer 120 (the first elastic support layer 121 and the second elastic support layer 122) is set to 2 microns to 10 microns, which can well avoid the above problems.

[0076] In the display panel of the embodiment of the present application, the thickness of the elastic support layer 120 (the first elastic support layer 121 and the second elastic support layer 122) can be 2 microns, 3 microns, 4 microns, 5 microns, 6 microns, 7 microns, 8 microns, 9 microns or 10 microns. Of course, according to the actual situation and specific needs, the thickness of the elastic support layer 120 can be appropriately adjusted, which is not limited herein.

[0077] Specifically, the material of the first metal layer 111 and the second metal layer 112 can be selected from one or more of copper, molybdenum, titanium, silver and indium tin oxide. It can be understood that, according to the actual situation and specific needs, the material of the first metal layer 111 and the second metal layer 112 can be appropriately modified, which is not limited herein.

[0078] Specifically, the material of the third metal layer 113 is selected from one or more of copper, molybdenum, titanium, aluminum and silver. It can be understood that, according to the actual situation and specific needs, the material of the third metal layer 113 can be appropriately modified, which is not limited herein.

[0079] Specifically, the material of the elastic support layer 120 (the first elastic support layer 121 and the second elastic support layer 122) is an insulating material, which is specifically selected from one or more of polydimethylsiloxane (PDMS), polyimide (PI), polyolefin elastomer (POE) and ethylene-vinyl acetate copolymer (EVA). It can be understood that, according to the actual situation and specific needs, the material of the elastic support layer 120 can be appropriately modified, which is not limited herein.

[0080] Specifically, the material of the first insulating layer 131 and the second insulating layer 132 can be selected from one or more of silicon oxide, silicon nitride and silicon oxynitride. Of course, according to the actual situation and specific needs, the material of the first insulating layer 131 and the second insulating layer 132 can be appropriately modified, which is not limited herein.

[0081] Specifically, as shown in FIG. 1, the display panel 100 includes a first insulating layer 131, a second insulating layer 132, a first metal layer 111, a second metal layer 112 and a third metal layer 113. Figures 1 to 3As shown, the display panel further comprises a first buffer layer 143 and a second substrate 142, the second substrate 142 is a flexible material, which can be but is not limited to polyimide; wherein the first buffer layer 143 is arranged on the first substrate 141, the second substrate 142 is arranged on the first buffer layer 143, and the fifth insulating layer 135 is arranged on the second substrate 142.

[0082] Specifically, the display panel further comprises a second buffer layer 144, as shown in Figures 4 to 6 As shown, the second buffer layer 144 is arranged between the fourth insulating layer 134 and the active layer 150, and the second insulating layer 132 covers the second buffer layer 144; as shown in Figure 7 As shown, the second buffer layer 144 is arranged between the fourth insulating layer 134 and the first metal layer 111, and the first insulating layer 131 covers the second buffer layer 144.

[0083] Specifically, the materials of the fifth insulating layer 135, the first buffer layer 143 and the second buffer layer 144 can be selected from one or more of silicon oxide, silicon nitride, silicon oxynitride and amorphous silicon, in this embodiment, the fifth insulating layer 135 is mainly used as a buffer structure layer, so that the third metal layer 113 or the elastic conductive layer 160 is attached to the fifth insulating layer 135.

[0084] Specifically, the display panel further comprises an OLED light-emitting unit 200, the OLED light-emitting unit 200 comprises a first electrode 210, a pixel definition layer 220, a light-emitting functional layer 230 and a second electrode 240, the first electrode 210 is arranged on the third insulating layer 133, and the first electrode 210 is connected to the drain electrode 1122; the pixel definition layer 220 is arranged on the third insulating layer 133 and the first electrode 210, and the pixel definition layer 220 is provided with a pixel opening 221, the pixel opening 221 exposes the first electrode 210; the light-emitting functional layer 230 is arranged in the pixel opening 221; and the second electrode 240 covers the light-emitting functional layer 230 and the pixel definition layer 220. In this embodiment, the first electrode 210 can be an anode, and the second electrode 240 can be a cathode, the material of the anode can be selected from one or more of conductive materials such as indium tin oxide, silver and indium zinc oxide, and the material of the cathode can be selected from one or more of conductive materials such as magnesium and silver. Of course, according to the actual situation and specific needs, the first electrode 210 can also be a cathode, and the second electrode 240 can also be an anode, which is not limited herein.

[0085] Specifically, the light-emitting functional layer 230 comprises, in the direction from the anode to the cathode, a hole injection layer, a hole transport layer, an organic light-emitting layer, an electron transport layer and an electron injection layer which are stacked in sequence.

[0086] Please refer to Figures 1 to 3 , and Figures 1 to 3The embodiment of the present application also provides a manufacturing method for manufacturing the display panel.

[0087] Step B1, forming the first substrate 141;

[0088] Step B2, forming the driving circuit layer 100 on the first substrate 141, the driving circuit layer 100 comprising the metal layer 110, the elastic support layer 120 and the insulating layer 130, the insulating layer 130 being arranged on one side of the metal layer 110, the elastic support layer 120 being arranged between the metal layer 110 and the insulating layer 130, the elastic modulus of the elastic support layer 120 being less than the elastic modulus of the insulating layer 130;

[0089] Step B3, forming the OLED light-emitting unit 200 on the driving circuit layer 100.

[0090] Specifically, the specific manner of the above step B1 can be: forming the sacrificial layer 400 on the glass substrate 300 by chemical vapor deposition, and then forming the first substrate 141 by coating. In this embodiment, the sacrificial layer 400 can be specifically amorphous silicon, and when the display panel is manufactured, the first substrate 141 can be separated from the glass substrate 300 by exposing the sacrificial layer 400.

[0091] Specifically, as shown in the figure, Figures 4 to 6 The prepared display panel is a top gate display panel, the metal layer 110 comprises the third metal layer 113, the first metal layer 111 and the second metal layer 112, and the insulating layer 130 comprises the first insulating layer 131, the second insulating layer 132, the second insulating layer 132, the third insulating layer 133, the fourth insulating layer 134 and the fifth insulating layer 135. The above step B2 can comprise:

[0092] Step B21, forming the first buffer layer 143 on the first substrate 141 by chemical vapor deposition, and performing high-temperature annealing on the first buffer layer 143; forming the second substrate 142 on the first buffer layer 143 by coating; and forming the fifth insulating layer 135 on the second substrate 142 by chemical vapor deposition;

[0093] Step B22, forming the first elastic conductive layer 161 on the fifth insulating layer 135 by physical vapor deposition, forming the third metal layer 113 on the first elastic conductive layer 161 by physical vapor deposition, forming a photoresist light-shielding pattern on the third metal layer 113 by using a photolithography process, and etching the first elastic conductive layer 161 and the third metal layer 113 by using hydrogen peroxide etching solution with the photoresist light-shielding pattern as a shield, to obtain the patterned first elastic conductive layer 161 and the third metal layer 113;

[0094] Step B23, forming a second elastic support layer 122 on the third metal layer 113 and the fifth insulating layer 135 by coating; forming a fourth insulating layer 134 on the second elastic support layer 122 by coating; forming a second buffer layer 144 on the fourth insulating layer 134 by chemical vapor deposition; and performing high-temperature annealing on the second buffer layer 144;

[0095] Step B24, forming an active layer 150 on the second buffer layer 144 by physical vapor sputtering; forming a photoresist light-shielding pattern on the active layer 150 by a photolithography process; and etching the active layer 150 by using an oxalic acid-based etching solution as a shield with the photoresist light-shielding pattern, to obtain a patterned active layer 150;

[0096] Step B25, forming a first insulating layer 131 on the second buffer layer 144 and the active layer 150 by chemical vapor deposition; forming a first metal layer 111 on the first insulating layer 131 by physical vapor deposition; forming a photoresist light-shielding pattern on the first metal layer 111 by a photolithography process; etching the first metal layer 111 and the first insulating layer 131 by using the photoresist light-shielding pattern as a shield, to obtain a patterned first metal layer 111 and a patterned first insulating layer 131; and performing a conductorization treatment on the active layer 150 with the patterned first metal layer 111 as a shield;

[0097] Step B26, forming a second insulating layer 132 on the first insulating layer 131 and the first metal layer 111 by chemical vapor deposition;

[0098] Step B27, forming a second elastic conductive layer 162 on the second insulating layer 132 by physical vapor deposition; forming a second metal layer 112 on the second elastic conductive layer 162 by physical vapor deposition; forming a photoresist light-shielding pattern on the second metal layer 112 by a photolithography process; etching the second elastic conductive layer 162 and the second metal layer 112 by using hydrogen peroxide etching solution as a shield with the photoresist light-shielding pattern, to obtain a patterned second elastic conductive layer 162 and a patterned second metal layer 112;

[0099] Step B28, forming a first elastic support layer 121 on the second metal layer 112 and the second insulating layer 132 by coating; and forming a third insulating layer 133 on the first elastic support layer 121 by coating.

[0100] Specifically, as shown in FIG. 1, the first metal layer 111 is formed on the first insulating layer 131 by physical vapor deposition, and the first insulating layer 131 is formed on the active layer 150 by chemical vapor deposition. ​As shown, the prepared display panel is a bottom gate display panel, the metal layer 110 includes a third metal layer 113, a first metal layer 111 and a second metal layer 112, and the insulating layer 130 includes a first insulating layer 131, a second insulating layer 132, a second insulating layer 132, a third insulating layer 133, a fourth insulating layer 134 and a fifth insulating layer 135. The above step B2 can include:

[0101] Step B21', a first buffer layer 143 is formed on the first substrate 141 by chemical vapor deposition, the first buffer layer 143 is subjected to high temperature annealing, a second substrate 142 is formed on the first buffer layer 143 by coating, and a fifth insulating layer 135 is formed on the second substrate 142 by chemical vapor deposition;

[0102] Step B22', a first elastic conductive layer 161 is formed on the fifth insulating layer 135 by physical vapor deposition, a third metal layer 113 is formed on the first elastic conductive layer 161 by physical vapor sputtering, a photoresist light shielding pattern is formed on the third metal layer 113 by a photolithography process, and the first elastic conductive layer 161 and the third metal layer 113 are etched by hydrogen peroxide etching solution with the photoresist light shielding pattern as a shield, to obtain a patterned first elastic conductive layer 161 and a third metal layer 113;

[0103] Step B23', a second elastic support layer 122 is formed on the third metal layer 113 and the fifth insulating layer 135 by coating, a fourth insulating layer 134 is formed on the second elastic support layer 122 by coating, and a second buffer layer 144 is formed on the fourth insulating layer 134 by chemical vapor deposition, and the second buffer layer 144 is subjected to high temperature annealing;

[0104] Step B24', a first metal layer 111 is formed on the second buffer layer 144 by physical vapor deposition, a photoresist light shielding pattern is formed on the first metal layer 111 by a photolithography process, the first metal layer 111 is etched with the photoresist light shielding pattern as a shield, to obtain a patterned first metal layer 111, and a first insulating layer 131 is formed on the second buffer layer 144 and the first metal layer 111 by chemical vapor deposition;

[0105] Step B25', an active layer 150 is formed on the first insulating layer 131 by physical vapor deposition, a photoresist light shielding pattern is formed on the active layer 150 by a photolithography process, the active layer 150 is etched by an oxalic acid-based etching solution with the photoresist light shielding pattern as a shield, to obtain a patterned active layer 150, and the active layer 150 is subjected to a conductorization treatment;

[0106] Step B26', forming the second insulating layer 132 on the first insulating layer 131 and the active layer 150 by chemical vapor deposition;

[0107] Step B27', forming the second elastic conductive layer 162 on the second insulating layer 132 by physical vapor deposition, forming the second metal layer 112 on the second elastic conductive layer 162 by physical vapor deposition, forming a photoresist light-shielding pattern on the second metal layer 112 by a photolithography process, etching the second elastic conductive layer 162 and the second metal layer 112 by using hydrogen peroxide etching solution as a shield with the photoresist light-shielding pattern, to obtain the patterned second elastic conductive layer 162 and the second metal layer 112;

[0108] Step B28', forming the first elastic support layer 121 on the second metal layer 112 and the second insulating layer 132 by coating, and forming the third insulating layer 133 on the first elastic support layer 121 by coating.

[0109] Specifically, the third metal layer 113 includes a light-shielding block 1131 and a clock signal line 1132, and the surface of the light-shielding block 1131 and the clock signal line 1132 are concave-convex along their own extension directions. In the above step B21 or step 21', after the first buffer layer 143 is formed, a plurality of grooves are made on the first buffer layer 143 by dry etching, and the cross-sectional shape of the grooves can be but is not limited to an inverted trapezoidal shape, an inverted triangular shape or a circular arc shape, so that the first elastic conductive layer 161 and the third metal layer 113 formed subsequently form recessed portions in the areas corresponding to the grooves, and convex portions are formed between adjacent two recessed portions, and the convex portions and the recessed portions are arranged alternately along the time, so that the surface of the light-shielding block 1131 and the clock signal line 1132 are concave-convex along their own extension directions. In this embodiment, the upper surface of the fourth insulating layer 134 to be made subsequently is flat, so as to facilitate the subsequent manufacturing of other structure layers.

[0110] Specifically, the second metal layer 112 includes a data line 1123, and the data line 1123 is concave-convex along its own extension direction. In the above step B26 or step 26', after the second insulating layer 132 is formed, a plurality of grooves are made on the second insulating layer 132 by dry etching, for example, the second insulating layer 132 is etched by using a fluorine-containing oxidizing gas to make a plurality of grooves on the second insulating layer 132, and the cross-sectional shape of the grooves can be but is not limited to an inverted trapezoidal shape, an inverted triangular shape or a circular arc shape, so that the second elastic conductive layer 162 and the second metal layer 112 formed subsequently form recessed portions in the areas corresponding to the grooves, and convex portions are formed between adjacent two recessed portions, and the convex portions and the recessed portions are arranged alternately along the time, so that the data line 1123 is concave-convex along its own extension direction. In this embodiment, the upper surface of the third insulating layer 133 to be made subsequently is flat, so as to facilitate the subsequent manufacturing of other structure layers.

[0111] Specifically, the OLED light-emitting unit 200 includes a first electrode 210, a pixel definition layer 220, a light-emitting functional layer 230, and a second electrode 240, and the step B3 specifically includes:

[0112] Step B31, forming the first electrode 210 on the third insulating layer 133 by means of evaporation and / or physical vapor deposition;

[0113] Step B32, forming the pixel definition layer 220 on the third insulating layer 133 and the first electrode 210 by means of coating, and performing a patterning process on the pixel definition layer 220, so that a pixel opening 221 is provided on the pixel definition layer 220, and the pixel opening 221 exposes the first electrode 210;

[0114] Step B33, forming the light-emitting functional layer 230 in the pixel opening 221 by means of evaporation or inkjet printing, and the light-emitting functional layer 230 includes, from bottom to top, a hole injection layer, a hole transport layer, an organic light-emitting layer, an electron transport layer, and an electron injection layer;

[0115] Step B34, forming the second electrode 240 on the pixel definition layer 220 and the light-emitting functional layer 230 by means of evaporation.

[0116] The above describes in detail a display panel provided by the embodiment of the present application, and the principle and implementation manner of the present application are described by applying specific examples; the above embodiment is only used to help understand the method and core idea of the present application; meanwhile, for those skilled in the art, according to the idea of the present application, the specific implementation manner and application range can be changed, and the above description should not be understood as limiting the present application.

Claims

1. A display panel, characterized in that, include: Metal layer; An elastic conductive layer is disposed on the surface of the metal layer, the tensile strength of the elastic conductive layer is greater than the tensile strength of the metal layer, and the material of the elastic conductive layer is beryllium bronze or titanium bronze; The metal layer includes a signal line, and the surface of the signal line is provided with the elastic conductive layer; The display panel further includes a first substrate, an active layer, a first insulating layer, a second insulating layer, and a third insulating layer; The metal layer includes a first metal layer and a second metal layer; The active layer is disposed on the first substrate, the first insulating layer is disposed on the active layer, the first metal layer is disposed on the first insulating layer, the second insulating layer covers the active layer and the first metal layer, the active layer is disposed on the second insulating layer, and the third insulating layer covers the second metal layer and the second insulating layer. The elastic conductive layer is provided on at least one of the following surfaces: the surface of the first metal layer near the first insulating layer, the surface of the first metal layer away from the first insulating layer, the surface of the second metal layer near the second insulating layer, and the surface of the second metal layer near the third insulating layer. The first substrate is a flexible material, and the first metal layer includes a gate and a gate line. The gate is disposed corresponding to the active layer, and the gate is connected to the corresponding gate line. The second metal layer includes a source, a drain, and a data line. The source is in contact with one end of the corresponding active layer, the drain is in contact with the other end of the corresponding active layer, and the source is connected to the corresponding data line. Alternatively, the display panel may further include an active layer, a first insulating layer, a second insulating layer, a third insulating layer, and a fourth insulating layer; The metal layer includes a first metal layer and a second metal layer; The fourth insulating layer is disposed on the first substrate, the first metal layer is disposed on the fourth insulating layer, the first insulating layer covers the first metal layer, the active layer is disposed on the first insulating layer, the second insulating layer covers the active layer, the second metal layer is disposed on the second insulating layer, and the third insulating layer covers the second metal layer. The elastic conductive layer is provided on at least one of the following surfaces: the surface of the first metal layer near the first insulating layer, the surface of the first metal layer near the fourth insulating layer, the surface of the second metal layer near the second insulating layer, and the surface of the second metal layer near the third insulating layer. The first substrate is a flexible material, and the first metal layer includes a gate and a gate line. The gate is disposed corresponding to the active layer, and the gate is connected to the corresponding gate line. The second metal layer includes a source, a drain, and a data line. The source is in contact with one end of the corresponding active layer, the drain is in contact with the other end of the corresponding active layer, and the source is connected to the corresponding data line.

2. The display panel as described in claim 1, characterized in that, The tensile strength of the elastic conductive layer is 800 N / mm² to 1500 N / mm².

3. The display panel as described in claim 1, characterized in that, The portion of the elastic conductive layer corresponding to the signal line is irregularly shaped along the extension direction of the signal line.

4. The display panel as described in claim 1, characterized in that, The grid lines are convex and concave along their extension direction; and / or, The data line has a concave-convex shape along its extension direction.

5. The display panel as described in claim 1, characterized in that, The metal layer further includes a third metal layer disposed between the first substrate and the active layer, a fourth insulating layer disposed between the third metal layer and the active layer, and a fifth insulating layer disposed between the third metal layer and the first substrate.

6. The display panel as described in claim 1, characterized in that, The metal layer further includes a third metal layer disposed between the first substrate and the fourth insulating layer, and a fifth insulating layer disposed between the first substrate and the third metal layer.

7. The display panel as described in claim 5 or 6, characterized in that, The elastic conductive layer is provided on the surface of the third metal layer near the fourth insulating layer; and / or, The elastic conductive layer is provided on the surface of the third metal layer near the fifth insulating layer.

8. The display panel as described in claim 5, characterized in that, The third metal layer includes a light-shielding block and a clock signal line. The light-shielding block is disposed corresponding to the active layer and is connected to the clock signal line.

9. The display panel as described in claim 6, characterized in that, The third metal layer includes clock signal lines.

10. The display panel as described in claim 8 or 9, characterized in that, The clock signal line is convex and concave along its extension direction.

11. The display panel as claimed in claim 1, characterized in that, The display panel further includes an insulating layer disposed on one side of the metal layer and an elastic support layer disposed between the metal layer and the insulating layer, wherein the elastic modulus of the elastic support layer is less than the elastic modulus of the insulating layer.

12. The display panel as claimed in claim 11, characterized in that, The elastic modulus of the elastic support layer is 1 MPa to 80 MPa.

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