Adjustment method and production method of mask

Abstract

The present invention relates to the field of mask technology, and discloses a mask adjustment method and a mask manufacturing method. By determining the difference between the actual deformation amount and the theoretical deformation amount of the mask frame, the magnitude of the theoretical reaction force is adjusted to obtain a target reaction force and apply it to the mask manufacturing. The adjustment amplitude of the theoretical reaction force matches the difference value, so that the target reaction force can offset the pulling force applied to the frame by the mask unit as much as possible, thereby alleviating the deviation of the mask opening on the mask, which is beneficial to improving the pixel position accuracy of the manufactured pixels.

Description

Technical Field

[0001] The present invention relates to the technical field of mask plates, and in particular to a mask plate adjustment method and a mask plate manufacturing method. Background Art

[0002] OLED (Organic Light-Emitting Diode) display technology is widely used due to its self-luminous effect, thin thickness, flexibility, no distortion of the picture at a wide viewing angle, and high luminous efficiency.

[0003] In the process of manufacturing products using OLED display technology, it is necessary to use a fine metal mask (FMM) to achieve the evaporation of light-emitting materials. However, the mask openings on the fine metal mask after stretching the mesh are currently offset to varying degrees, resulting in a low pixel position accuracy (PPA) of the produced pixels. Summary of the invention

[0004] In view of this, the main technical problem to be solved by the present invention is to provide a method for adjusting and manufacturing a mask plate, which can alleviate the deviation of the mask opening on the mask plate.

[0005] In order to solve the above technical problems, a technical solution adopted by the present invention is to provide a method for adjusting a mask. The adjustment method includes: determining the difference between the actual deformation amount and the theoretical deformation amount of the frame of the mask; wherein the actual deformation amount is the deformation amount generated by the frame after the theoretical reaction force acts on it and the mask unit of the mask is installed; adjusting the magnitude of the theoretical reaction force to obtain a target reaction force; wherein the adjustment amplitude of the theoretical reaction force matches the difference value.

[0006] In one embodiment of the present invention, the step of determining the difference between the actual deformation amount and the theoretical deformation amount of the frame includes: determining the ratio of the actual deformation amount to the theoretical deformation amount; adjusting the magnitude of the theoretical reaction force, and the step of obtaining the target reaction force includes: multiplying the theoretical reaction force by the ratio to obtain the target reaction force.

[0007] In one embodiment of the present invention, the step of determining the ratio of the actual deformation variable to the theoretical deformation variable includes: determining the difference between the actual deformation variable and the theoretical deformation variable; calculating the actual deformation variable; wherein, when the actual deformation variable is greater than the theoretical deformation variable, the actual deformation variable is the sum of the theoretical deformation variable and the difference, and when the actual deformation variable is less than the theoretical deformation variable, the actual deformation variable is the difference between the theoretical deformation variable and the difference; calculating the ratio of the actual deformation variable to the theoretical deformation variable.

[0008] In one embodiment of the present invention, the step of adjusting the magnitude of the theoretical reaction force to obtain the target reaction force includes: when the actual deformation amount is greater than the theoretical deformation amount, And when the actual deformation is smaller than the theoretical deformation, Among them, F is the target reaction force, f is the theoretical reaction force, a is the theoretical deformation, and b is the difference.

[0009] In one embodiment of the present invention, the mask plate is divided into at least two mask areas, and a plurality of mask units are distributed in the at least two mask areas; the step of determining the difference between the actual deformation amount and the theoretical deformation amount of the frame includes: determining the difference between the actual deformation amount and the theoretical deformation amount of the frame corresponding to each mask unit in the mask area; obtaining a target difference value from the determined difference value by statistical analysis; the magnitude of the theoretical reaction force is adjusted, and the step of obtaining the target reaction force includes: adjusting the theoretical reaction force of the frame corresponding to each mask unit in the mask area respectively, and obtaining the target reaction force of the frame corresponding to each mask unit in the mask area respectively; wherein the adjustment amplitude of the theoretical reaction force corresponding to each mask unit in the mask area matches the target difference value.

[0010] In one embodiment of the present invention, the step of obtaining a target difference value from the determined difference values ​​by statistical analysis includes: taking an average value of the determined difference values ​​to obtain the target difference value; or taking a median of the determined difference values ​​to obtain the target difference value.

[0011] In one embodiment of the present invention, at least two mask regions are divided into a first mask region and at least one mask region combination, so that each mask region combination includes two second mask regions symmetrically distributed on both sides of the first mask region and corresponding to the same target difference value.

[0012] In one embodiment of the present invention, in the same mask area, the difference between the actual deformation amounts of the frames corresponding to the mask units is within a first preset range.

[0013] In one embodiment of the present invention, the first preset range is 0 μm to 1 μm.

[0014] In one embodiment of the present invention, after the step of determining the difference between the actual deformation variable and the theoretical deformation variable of the frame, the step includes: judging whether the difference between the actual deformation variable and the theoretical deformation variable is within a second preset range; if not, executing the step of adjusting the magnitude of the theoretical reaction force to obtain the target reaction force.

[0015] In one embodiment of the present invention, the second preset range is 0 μm to 1 μm.

[0016] To solve the above technical problems, another technical solution adopted by the present invention is to provide a method for manufacturing a mask. The manufacturing method includes: providing a frame; applying a target reaction force to the frame; wherein the target reaction force is adjusted by the adjustment method described in the above embodiment; and installing the mask unit on the frame.

[0017] The beneficial effect of the present invention is that, different from the prior art, the present invention provides a mask adjustment method and a manufacturing method. By determining the difference between the actual deformation amount and the theoretical deformation amount of the frame, the magnitude of the theoretical reaction force is adjusted to obtain the target reaction force and apply it to the mask manufacturing. The adjustment amplitude of the theoretical reaction force matches the difference value, so that the target reaction force can offset the tension applied to the frame by the mask unit as much as possible, thereby alleviating the deviation of the mask opening on the mask, which is conducive to improving the pixel position accuracy of the manufactured pixels. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The accompanying drawings herein are incorporated into and constitute a part of the specification, illustrate embodiments consistent with the present invention, and together with the specification are used to explain the principles of the present invention. In addition, these drawings and text descriptions are not intended to limit the scope of the present invention in any way, but to illustrate the concept of the present invention for those skilled in the art by reference to specific embodiments.

[0019] Figure 1 It is a structural schematic diagram of a mask in the prior art;

[0020] Figure 2 It is a structural schematic diagram of an embodiment of a mask of the present invention;

[0021] Figure 3 is a schematic flow chart of a first embodiment of a method for adjusting a mask according to the present invention;

[0022] Figure 4 is a schematic flow chart of a second embodiment of a method for adjusting a mask according to the present invention;

[0023] Figure 5 is a schematic diagram of an embodiment of a frame deformation of the present invention;

[0024] Figure 6 is a schematic diagram of another embodiment of the frame deformation of the present invention;

[0025] Figure 7 is a schematic flow chart of a third embodiment of a method for adjusting a mask according to the present invention;

[0026] Figure 8 It is a schematic diagram of a process of an embodiment of a method for manufacturing a mask of the present invention. DETAILED DESCRIPTION

[0027] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in combination with the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0028] See also Figure 1 , Figure 1 It is a schematic diagram of the structure of the mask plate in the prior art.

[0029] The mask plate 10 includes a frame 11 and a mask unit 12. The mask unit 12 has a mask opening 13 for evaporating a light-emitting material to make a pixel. The mask unit 12 is mounted on the frame 11, and the frame 11 plays a role in supporting the mask unit 12. The mask plate 10 can be a fine metal mask plate 10, etc. Correspondingly, the mask unit 12 can be a strip mask unit 12 (FMM sheet) of the fine metal mask plate 10.

[0030] Specifically, after the mask unit 12 is stretched, the net is welded to the frame 11 of the mask plate 10. Since the mask unit 12 in the stretched state is welded to the frame 11, the mask unit 12 will apply a tensile force SF to the frame 11. Therefore, during the stretching process of the mask plate 10, a counter force CF (Counter Force) is usually applied to the frame 11, so that the frame 11 is deformed in advance before the mask unit 12 is installed. At this time, the frame 11 has a force to restore to the undeformed state (the restoring force is equal to the counter force CF, Figure 1 After the reaction force is removed, the restoring force of the frame 11 is used to offset the pulling force SF applied to the frame 11 by the mask unit 12, so that the mask opening 13 on the mask unit 12 is in the theoretical position to ensure that the light-emitting material is evaporated in the correct position, that is, to ensure the pixel position accuracy of the produced pixel.

[0031] However, in the conventional stretching process of the mask 10, the reaction force CF is usually obtained through simulation calculation, and the parameters used in the calculation are all standard values. In the actual stretching process, because the actual material parameters of the mask 10, the force conditions of the mask unit 12 in the stretching mechanism, etc. are easily different from the standard values, the reaction force CF obtained by simulation calculation often cannot completely offset the pulling force SF of the mask unit 12, resulting in different degrees of deviation of the mask opening 13 on the mask 10 after the stretching, which leads to low pixel position accuracy of the produced pixels.

[0032] Figure 1The figure shows the deviation of the mask opening 13 of the mask plate 10 in the prior art. Figure 1 As shown in the region A, the reaction force CF is smaller than the pulling force SF of the mask unit 12, and the mask unit 12 is retracted relative to the theoretical state, that is, the mask opening 13 is retracted; and as shown in FIG. Figure 1 As shown in the middle B area, the reaction force CF is greater than the pulling force SF of the mask unit 12 , and the mask unit 12 is expanded relative to the theoretical state, that is, the mask opening 13 is expanded.

[0033] In view of this, an embodiment of the present invention provides a method for adjusting a mask, which can solve the technical problems existing in the above-mentioned prior art.

[0034] See also Figure 2 , Figure 2 It is a structural schematic diagram of an embodiment of a mask plate of the present invention.

[0035] In one embodiment, the mask 20 includes a frame 21 and a mask unit 22. The mask unit 22 has a mask opening 23 for evaporating a light-emitting material to make a pixel. The mask unit 22 is mounted on the frame 21, and the frame 21 plays a role in supporting the mask unit 22. The mask 20 can be a fine metal mask 20, etc. Correspondingly, the mask unit 22 can be a strip mask unit 22 (FMM sheet) of the fine metal mask 20.

[0036] Specifically, after the mask unit 22 is stretched, the stretching net is welded to the frame 21 of the mask plate 20. Since the mask unit 22 in the stretched state will apply a tensile force SF to the frame 21 after being welded to the frame 21, a reaction force CF is usually applied to the frame 21 during the stretching process of the mask plate 20, so that the frame 21 is deformed in advance before the mask unit 22 is installed. At this time, the frame 21 has a force to restore to the undeformed state (the restoring force is equal to the reaction force CF). After the reaction force is removed, the restoring force of the frame 21 is used to offset the tensile force SF applied to the frame 21 by the mask unit 22, so that the mask opening 23 on the mask unit 22 is in the theoretical position, so as to ensure that the light-emitting material is evaporated in the correct position, that is, to ensure the pixel position accuracy of the produced pixel.

[0037] See also Figure 3 , Figure 3 It is a flow chart of the first embodiment of the mask adjustment method of the present invention.

[0038] S101: Determine a difference between an actual deformation amount and a theoretical deformation amount of a frame of a mask.

[0039] In this embodiment, the reaction force obtained by simulation calculation is the theoretical reaction force. In the simulation calculation process, the deformation amount of the frame after the theoretical reaction force is applied and the mask unit of the mask is installed is the theoretical deformation amount. In the actual mask production process, the deformation amount of the frame after the theoretical reaction force is applied and the mask unit is installed is the actual deformation amount.

[0040] Since the actual material parameters of the mask and the stress of the mask unit in the tensioning mechanism are easily different from the standard values, the actual deformation of the actual frame is often quite different from the theoretical deformation. In addition, the deformation of the frame is equivalent to the deformation of the mask unit. The actual deformation of the frame is quite different from the theoretical deformation, which means that the actual deformation of the mask unit is quite different from the corresponding theoretical deformation, resulting in a large degree of deviation of the mask opening on the mask unit.

[0041] Therefore, this embodiment adjusts the theoretical reaction force to reduce the difference between the actual deformation amount and the theoretical deformation amount of the frame, thereby alleviating the deviation of the mask opening on the mask. Specifically, this embodiment needs to determine the difference between the actual deformation amount and the theoretical deformation amount of the frame, and the difference value reflects the difference between the actual deformation amount and the theoretical deformation amount of the frame, and then adjusts the theoretical reaction force to match the difference value.

[0042] S102: Adjust the magnitude of the theoretical reaction force to obtain a target reaction force.

[0043] In this embodiment, after determining the difference between the actual deformation amount and the theoretical deformation amount of the frame, the magnitude of the theoretical reaction force is adjusted to obtain the target reaction force. The adjustment amplitude of the theoretical reaction force matches the difference value, and the target reaction force is applied to the production of the mask plate, so that the target reaction force can offset the tension applied to the frame by the mask unit as much as possible, so that the actual deformation amount of the frame is as close to the theoretical deformation amount as possible, that is, the difference between the actual deformation amount of the mask unit and the corresponding theoretical deformation amount is reduced, thereby alleviating the deviation of the mask opening on the mask plate, which is conducive to improving the pixel position accuracy of the produced pixels.

[0044] As can be seen from the above, this embodiment adjusts the magnitude of the theoretical reaction force by determining the difference between the actual deformation amount and the theoretical deformation amount of the frame, obtains the target reaction force and applies it to the production of the mask. The adjustment amplitude of the theoretical reaction force matches the difference value, so that the target reaction force can offset the pulling force applied to the frame by the mask unit as much as possible, thereby alleviating the deviation of the mask opening on the mask, which is conducive to improving the pixel position accuracy of the produced pixels.

[0045] See also Figure 4 , Figure 4It is a flow chart of a second embodiment of a method for adjusting a mask according to the present invention.

[0046] S201: Determine the difference between the actual deformation amount and the theoretical deformation amount of the frame.

[0047] In this embodiment, the difference between the actual deformation variable and the theoretical deformation variable of the frame is preferably the ratio of the actual deformation variable of the frame to the theoretical deformation variable. Specifically, in this embodiment, the difference between the actual deformation variable and the theoretical deformation variable of the frame is determined in advance, and then the ratio of the actual deformation variable of the frame to the theoretical deformation variable is calculated to obtain the target reaction force.

[0048] S202: Calculate and obtain the actual deformation of the frame.

[0049] In this embodiment, since the theoretical deformation of the frame is determined during the design of the mask, it is known. The actual deformation of the frame can be calculated by the difference between the actual deformation of the frame determined in the above steps and the theoretical deformation of the frame.

[0050] Specifically, when the actual deformation variable is greater than the theoretical deformation variable, the actual deformation variable is the sum of the theoretical deformation variable and the difference; and when the actual deformation variable is less than the theoretical deformation variable, the actual deformation variable is the difference between the theoretical deformation variable and the difference.

[0051] S203: Calculate and obtain the ratio of the actual deformation amount of the frame to the theoretical deformation amount.

[0052] In this embodiment, after calculating the actual deformation of the frame, combined with the theoretical deformation of the frame, the ratio of the actual deformation of the frame to the theoretical deformation can be calculated, wherein the ratio reflects the difference between the actual deformation of the frame and the theoretical deformation, and is used for subsequent adjustment of the theoretical reaction force.

[0053] It should be noted that, in other embodiments of the present invention, the expression of the difference between the actual deformation variable and the theoretical deformation variable of the frame is not limited to the ratio of the actual deformation variable and the theoretical deformation variable of the frame. For example, it can be the difference between the actual deformation variable and the theoretical deformation variable of the frame, etc., which is not limited here.

[0054] Furthermore, in other embodiments of the present invention, the actual deformation of the frame can be directly obtained to calculate the ratio of the actual deformation of the frame to the theoretical deformation. It is not limited to the above-mentioned method of obtaining the difference between the actual deformation of the frame and the theoretical deformation and then calculating the actual deformation of the frame.

[0055] S204: Determine whether the difference between the actual deformation amount and the theoretical deformation amount of the frame is within a second preset range.

[0056] In this embodiment, if the difference between the actual deformation amount and the theoretical deformation amount of the frame is not within the second preset range, step S205 is executed; if the difference between the actual deformation amount and the theoretical deformation amount of the frame is within the second preset range, the process ends.

[0057] The second preset range is defined as the error allowable range of the difference between the actual deformation variable and the theoretical deformation variable of the frame. This embodiment judges the difference between the actual deformation variable and the theoretical deformation variable of the frame. Specifically, if the difference between the actual deformation variable and the theoretical deformation variable of the frame is within the second preset range, it means that the difference is small, which means that the deviation of the mask opening on the mask is not significant, and there is no need to adjust the theoretical reaction force; and if the difference between the actual deformation variable and the theoretical deformation variable of the frame is not within the second preset range, it means that the difference is large, which means that the mask opening on the mask has a more serious deviation, and the theoretical reaction force needs to be adjusted.

[0058] Optionally, the second preset range may be 0 μm to 1 μm. By properly setting the second preset range, it is possible to ensure that the actual deformation of the frame is slightly different from the theoretical deformation, thereby greatly alleviating the deviation of the mask opening on the mask and improving the pixel position accuracy of the produced pixels.

[0059] S205: Multiply the theoretical reaction force by the ratio of the actual deformation amount of the frame to the theoretical deformation amount to obtain the target reaction force.

[0060] In this embodiment, the difference between the actual deformation variable and the theoretical deformation variable of the frame is not within the second preset range, and the magnitude of the theoretical reaction force needs to be adjusted to obtain the target reaction force. Among them, the adjustment amplitude of the theoretical reaction force matches the difference between the actual deformation variable and the theoretical deformation variable of the frame, that is, the larger the difference value, the larger the adjustment amplitude of the theoretical reaction force, and the smaller the difference value, the smaller the adjustment amplitude of the theoretical reaction force. In this embodiment, the adjustment amplitude of the theoretical reaction force matches the ratio of the actual deformation variable of the frame to the theoretical deformation variable. Applying the target reaction force to the production of the mask plate can make the target reaction force offset the tension applied to the frame by the mask unit as much as possible, so that the actual deformation variable of the frame is as close to the theoretical deformation variable as possible, that is, reducing the difference between the actual deformation variable of the mask unit and its corresponding theoretical deformation variable, thereby alleviating the deviation of the mask opening on the mask plate, which is conducive to improving the pixel position accuracy of the produced pixels.

[0061] For details, please refer to Figure 5 and Figure 6 , Figure 5 and Figure 6 The middle arc line exemplarily shows the frame 21, and Figure 5 and Figure 6The solid arc line shows the actual deformation of the frame 21, and the dotted arc line shows the theoretical deformation of the frame 21.

[0062] Figure 5 It is shown that when the actual deformation of the frame 21 is greater than the theoretical deformation, it means that the actual pulling force applied by the mask unit to the frame 21 is greater than the theoretical reaction force, and the mask unit shrinks. In this case, the adjustment method for the theoretical reaction force is to increase the theoretical reaction force, that is, the target reaction force is greater than the theoretical reaction force. Specifically, Wherein, F is the target reaction force, f is the theoretical reaction force, a is the theoretical deformation, and b is the difference between the actual deformation of the frame 21 and the theoretical deformation.

[0063] Figure 6 When the actual deformation of the frame 21 is smaller than the theoretical deformation, it means that the actual pulling force applied by the mask unit to the frame 21 is smaller than the theoretical reaction force, and the mask unit expands outward. In this case, the adjustment method for the theoretical reaction force is to reduce the theoretical reaction force, that is, the target reaction force is smaller than the theoretical reaction force. Specifically, Wherein, F is the target reaction force, f is the theoretical reaction force, a is the theoretical deformation, and b is the difference between the actual deformation of the frame 21 and the theoretical deformation.

[0064] It should be noted that the above formula That is, the difference between the actual deformation variable and the theoretical deformation variable of the frame. Its specific meaning is the ratio of the actual deformation variable to the theoretical deformation variable of the frame.

[0065] As can be seen from the above, this embodiment adjusts the magnitude of the theoretical reaction force by determining the difference between the actual deformation amount and the theoretical deformation amount of the frame, obtains the target reaction force and applies it to the production of the mask. The adjustment amplitude of the theoretical reaction force matches the difference value, so that the target reaction force can offset the pulling force applied to the frame by the mask unit as much as possible, thereby alleviating the deviation of the mask opening on the mask, which is conducive to improving the pixel position accuracy of the produced pixels.

[0066] Please continue reading Figure 2 In one embodiment, the mask plate 20 is divided into at least two mask areas (including Figure 2 The mask regions Q1 to Q3 in the at least two mask regions are provided with a plurality of mask units 22. Specifically, the at least two mask regions are arranged along a first direction (such as Figure 2 As shown by the arrow X in the middle, the same below) are distributed in sequence, and each mask unit 22 is along the second direction (such as Figure 2 The first direction is perpendicular to the second direction.

[0067] It should be noted that the deformation amount of the frame 21 (including the actual deformation amount and the theoretical deformation amount) is the deformation amount of the frame 21 in the second direction.

[0068] In the same mask area, the actual deformation amounts of the frames 21 corresponding to the mask units 22 (the frames 21 corresponding to the mask units 22 are the parts of the frames 21 to which the mask units 22 are connected) are relatively close, that is, the offset conditions of the mask units 22 in the same mask area are relatively consistent. Therefore, by adjusting the theoretical reaction force of the frames 21 corresponding to the mask units 22 in the same mask area using the same difference value, the offset conditions of the mask units 22 in the same mask area can be made to meet the requirements, without calculating the difference value and adjusting the theoretical reaction force for each mask unit 22, which is conducive to improving the adjustment efficiency of the reaction force and shortening the process time of making the mask plate 20.

[0069] Further, in the same mask area, the difference between the actual deformation amounts of the frame 21 corresponding to each mask unit 22 is within a first preset range. Optionally, the first preset range may be 0 μm to 1 μm. By reasonably setting the first preset range, the offset conditions of each mask unit 22 in the same mask area can meet the requirements, while ensuring a high reaction force adjustment efficiency, and shortening the process time of making the mask plate 20 as much as possible.

[0070] See also Figure 7 , Figure 7 It is a flow chart of the third embodiment of the method for adjusting the mask of the present invention. It should be noted that, in this embodiment, each mask area of ​​the mask performs the following steps respectively.

[0071] S301: Determine the difference between the actual deformation amount and the theoretical deformation amount of the frame corresponding to each mask unit in the mask area.

[0072] In this embodiment, although the actual deformation amounts of the frames corresponding to the mask units in the same mask area are relatively close, the actual deformation amounts of the frames corresponding to different mask units are inevitably different. In this embodiment, the target reaction force of the frames corresponding to the mask units in the mask area is obtained by determining the difference between the actual deformation amount and the theoretical deformation amount of the frames corresponding to the mask units in the mask area.

[0073] It should be noted that the method for obtaining the difference value corresponding to each mask unit in this embodiment has been described in detail in the above embodiment, and will not be repeated here.

[0074] S302: Obtain a target difference value from the determined difference values ​​through statistical analysis.

[0075] In this embodiment, the theoretical reaction force of the frame corresponding to each mask unit in the same mask area is adjusted using the same difference value, that is, the target difference value. In this embodiment, the target difference value is obtained from the determined difference value, which is applied to the subsequent adjustment of the theoretical reaction force of the frame corresponding to each mask unit in the same mask area.

[0076] Further, a target difference value is obtained from the determined difference values, specifically, the determined difference values ​​are averaged to obtain the target difference value. In other words, the target difference value is the average of the determined difference values, so that after adjusting the theoretical reaction force, the deviation of each mask unit in the same mask area can meet the requirements.

[0077] Of course, in other embodiments of the present invention, the target difference value is not limited to being the average value of the determined difference values, for example, it may also be a weighted average value of the determined difference values, or a median of the determined difference values, etc., which is not limited here.

[0078] S303: adjusting the theoretical reaction forces of the frames corresponding to the respective mask units in the mask area respectively, and obtaining the target reaction forces of the frames corresponding to the respective mask units in the mask area respectively.

[0079] In this embodiment, the target difference values ​​obtained in the above steps are used to adjust the theoretical reaction forces of the frames corresponding to the respective mask units in the mask area, respectively, to obtain the target reaction forces of the frames corresponding to the respective mask units in the mask area.

[0080] The adjustment amplitude of the theoretical reaction force corresponding to each mask unit in the mask area matches the target difference value, that is, the theoretical reaction force of the frame corresponding to each mask unit in the same mask area is adjusted using the same target difference value. In the above embodiment, in the case where the difference value is represented by the ratio of the actual deformation amount of the frame to the theoretical deformation amount, the theoretical reaction force corresponding to each mask unit in the same mask area is multiplied by the target difference value, and then the target reaction force of the frame corresponding to each mask unit in the same mask area is obtained.

[0081] Furthermore, since two sets of net stretching mechanisms are usually set on the production line, the two sets of net stretching mechanisms can perform the net stretching work of different mask units at the same time. Therefore, the present embodiment divides the above-mentioned at least two mask areas into a first mask area and at least one set of mask area combinations. Let each mask area combination include two second mask areas that are symmetrically distributed on both sides of the first mask area and have the same corresponding target difference value. In other words, the mask area of ​​the mask plate of the present embodiment includes a first mask area and at least one set of mask area combinations, and the mask area combination includes two second mask areas. The first mask area is centered, and the two second mask areas belonging to the same mask area combination are symmetrically distributed on both sides of the first mask area, specifically, symmetrically distributed on both sides of the first mask area in the first direction.

[0082] The two second mask areas belonging to the same mask area combination can be stretched by different stretching mechanisms at the same time, which means that the offset of the mask units in the two second mask areas belonging to the same mask area combination is relatively consistent. Therefore, the target difference values ​​corresponding to the two second mask areas belonging to the same mask area combination are the same, that is, the theoretical reaction forces corresponding to the respective mask units in the two second mask areas are adjusted using the same target difference value, which can ensure that after adjusting the theoretical reaction forces, the offset of the respective mask units in the two second mask areas can meet the requirements, and further help to improve the adjustment efficiency of the reaction forces and shorten the process time of making the mask.

[0083] For example, the first mask area is Figure 2 As shown in the middle mask area Q1, the number of the first mask area is not limited to Figure 2 One shown, it may be one or more. Figure 2 Two sets of mask area combinations are also exemplarily shown, wherein one set of mask area combinations includes two sets of second mask areas Q2, and the other set of mask area combinations includes two sets of second mask areas Q3. The two sets of second mask areas Q2 are symmetrically distributed on both sides of the first mask area Q1, and the two sets of second mask areas Q3 are symmetrically distributed on both sides of the first mask area Q1.

[0084] See also Figure 8 , Figure 8 It is a schematic diagram of a process of an embodiment of a method for manufacturing a mask of the present invention.

[0085] S401: Provide a framework.

[0086] In this embodiment, a frame is provided, and the frame is used to support subsequent mask units.

[0087] S402: Apply a target reaction force to the frame.

[0088] In this embodiment, a target reaction force is applied to the frame in advance so that the frame is deformed before the mask unit is installed. At this time, the frame has a force to recover to an undeformed state, so that after the target reaction force is removed, the recovery force of the frame can be used to offset the tension applied to the frame by the mask unit.

[0089] It should be noted that the target reaction force of this embodiment is obtained by adjusting the reaction force adjustment method described in the above embodiment, which will not be described in detail here.

[0090] S403: Install the mask unit on the frame.

[0091] In this embodiment, a target reaction force is applied to the frame so that after the frame is deformed before the mask unit is installed, the target reaction force is maintained to be applied to the frame, and the mask unit is stretched. The mask unit is then installed on the frame (by welding, bonding, etc.), and the target reaction force is removed at the same time. At this time, the restoring force of the frame offsets the pulling force applied to the frame by the mask unit, so that the mask opening on the mask unit is in a theoretical position, thereby ensuring that the light-emitting material is evaporated in the correct position, that is, ensuring the pixel position accuracy of the produced pixels.

[0092] In addition, in the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", "stacked" and the like should be understood in a broad sense, for example, it can be fixedly connected, detachably connected, or integrated; it can be directly connected, or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0093] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for making a mask, characterized in that: The method comprises: Provide a framework; applying a target reaction force to the frame; Mounting the mask unit on the frame; Wherein, the target reaction force is obtained according to the following adjustment method, and the adjustment method includes: Determine the difference between the actual deformation amount and the theoretical deformation amount of the frame of the mask; wherein the actual deformation amount is the deformation amount of the frame after the theoretical reaction force is applied and the mask unit of the mask is installed during the actual mask production process; the theoretical deformation amount is the deformation amount of the frame after the theoretical reaction force is applied and the mask unit of the mask is installed during the simulation calculation process; Adjusting the magnitude of the theoretical reaction force to obtain a target reaction force; The mask is divided into at least two mask areas, and a plurality of the mask units are distributed in the at least two mask areas; the step of determining the difference between the actual deformation amount and the theoretical deformation amount of the frame of the mask includes: Determine the difference between the actual deformation amount and the theoretical deformation amount of the frame corresponding to each of the mask units in the mask area; Obtaining a target difference value from the determined difference value through statistical analysis; And, the step of adjusting the magnitude of the theoretical reaction force to obtain the target reaction force includes: The theoretical reaction forces of the frames corresponding to the respective mask units in the mask area are adjusted respectively, so as to obtain the target reaction forces of the frames corresponding to the respective mask units in the mask area; The difference between the actual deformation amount and the theoretical deformation amount of the frame corresponding to the mask unit is determined according to the following steps: Determine the difference between the actual deformation amount and the theoretical deformation amount; When the actual deformation amount is greater than the theoretical deformation amount, the actual deformation amount is updated to the sum of the theoretical deformation amount and the difference; and when the actual deformation amount is less than the theoretical deformation amount, the actual deformation amount is updated to the difference between the theoretical deformation amount and the difference; The ratio of the actual deformation amount to the theoretical deformation amount is calculated to obtain the difference value of the frame corresponding to the mask unit; And, the target reaction force of the frame corresponding to the mask unit is obtained according to the following steps: The target reaction force of the frame corresponding to the mask unit is obtained by multiplying the theoretical reaction force of the frame corresponding to the mask unit by the target difference value.

2. The method according to claim 1, characterized in that The step of obtaining a target difference value from the determined difference values ​​by statistical analysis comprises: averaging the determined difference values ​​to obtain the target difference value; or The median of the determined difference values ​​is taken to obtain the target difference value.

3. The method according to claim 2, characterized in that The at least two mask regions are divided into a first mask region and at least one mask region combination, so that each of the mask region combinations includes two second mask regions that are symmetrically distributed on both sides of the first mask region and have the same corresponding target difference values.

4. The method according to claim 2, characterized in that: In the same mask area, the difference between the actual deformation amounts of the frames corresponding to the mask units is within a first preset range.

5. The method according to claim 4, characterized in that The first preset range is 0 μm to 1 μm.

6. The method according to claim 1, characterized in that The step of determining the difference between the actual deformation amount and the theoretical deformation amount of the frame comprises: Determining whether the difference between the actual deformation amount and the theoretical deformation amount is within a second preset range; If not, the step of adjusting the magnitude of the theoretical reaction force to obtain the target reaction force is performed.

7. The method according to claim 6, characterized in that The second preset range is 0 μm to 1 μm.

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