A low energy pulsed ion beam generating device and method

Abstract

The present invention relates to a low-energy pulsed ion beam generating device and method, which comprises: a deflection electrode, which is arranged on the flange of the ion transmission pipeline of an accelerator and is located inside the ion transmission pipeline of the accelerator; a two-dimensional adjustable slit, which is arranged on the same flange in parallel with the deflection electrode; a deflection electrode power supply connection end, which is passed through the flange, the deflection electrode power supply connection end located inside the ion transmission pipeline of the accelerator is connected to the deflection electrode, and the deflection electrode power supply connection end located outside the ion transmission pipeline of the accelerator is connected to an external deflection electrode power supply. The present invention can convert the low-energy heavy ion continuous beam generated by the accelerator into a pulse beam and an extremely narrow nanometer pulse beam, and reduce the influence of the high-voltage power supply performance on the pulse beam. The present invention can be widely used in the field of accelerator ion beam pulse technology.

Description

Technical Field

[0001] The present invention relates to the technical field of accelerator ion beam pulse technology, and in particular to a low-energy pulse ion beam generating device and method. Background Art

[0002] The 320kV high-charge ion comprehensive research platform is a large-scale electrostatic accelerator device that can provide low-energy, high-current, high-charge heavy ion beams. The ion beams it produces are used for experimental research in the fields of low-energy high-charge ion-matter interactions, and early exploration of low-energy astro-nuclear physics. With the deepening and refinement of research and the requirements for experimental methods and measurements, the platform urgently needs to build a low-energy ion beam pulse system to provide technical support for the study of ion-matter interactions under extreme conditions.

[0003] In recent years, a lot of research and experimental attempts on ion pulse technology have been made both at home and abroad, and there have also been a large number of reports, but the methods adopted are limited by actual conditions and technology, have a small scope of application, and poor reference value. Summary of the invention

[0004] In view of the above problems, the purpose of the present invention is to provide a low-energy pulsed ion beam generating device and method, which can convert the low-energy heavy ion continuous beam generated by the accelerator into a pulse beam and an extremely narrow nano-pulse beam, thereby reducing the influence of the high-voltage power supply performance on the pulse beam.

[0005] To achieve the above-mentioned purpose, the present invention adopts the following technical scheme: a low-energy pulsed ion beam generating device, comprising: a deflection electrode, which is arranged on the flange of the ion transmission pipeline of the accelerator and is located inside the ion transmission pipeline of the accelerator; a two-dimensional adjustable slit, which is arranged on the same flange in parallel with the deflection electrode; a deflection electrode power supply connection end, which is passed through the flange, the deflection electrode power supply connection end located inside the ion transmission pipeline of the accelerator is connected to the deflection electrode, and the deflection electrode power supply connection end located outside the ion transmission pipeline of the accelerator is connected to an external deflection electrode power supply.

[0006] Furthermore, the deflection electrodes are configured as two pairs of electrode plates, and the electrode plates are horizontally and symmetrically mounted on the flange.

[0007] Furthermore, the electrode plate adopts a T-shaped structure, a square plate is used at the T-shaped head, and a long strip plate is used at one end connected to the deflection electrode power supply, and the square plate and the long strip plate are integrally formed.

[0008] Furthermore, the two-dimensional adjustable slit includes a water-cooled target seat, a target plate, a connecting rod and a water-cooled pipe;

[0009] The water-cooled target seat is symmetrically arranged with the square plate of the electrode plate, and the target plate is arranged at the center position of the water-cooled target seat; one side of the water-cooled target seat is fixed to the inner side surface of the flange through the connecting rod, and is symmetrically arranged with the deflection electrode; the water-cooling pipe connected to the water-cooled target seat is respectively arranged above and below the connecting rod, and one end of the water-cooling pipe passes through the flange and is connected to an external water cooling system.

[0010] A method for generating a low-energy pulsed ion beam based on the above device includes: periodically loading a DC high voltage on the electrode plate, thereby generating a periodically changing electrostatic field between the electrode plates. The ion beam entering the electrode plate is deflected periodically by the electric field, deviates from the central orbit, and forms a pulsed ion beam; after the pulsed ion beam is generated, the width and flow intensity of the pulsed ion beam are adjusted by adjusting the two-dimensional adjustable slit, and the quality and waveform of the pulsed ion beam are adjusted in combination with the power supply high voltage and the trigger signal delay time.

[0011] Furthermore, when the pulse generator trigger signal is at a high level, the high-voltage power supply output is zero voltage, the ion beam passes through the electrode plate normally, and the ion beam intensity at the rear end is normal; when the pulse generator trigger signal is at a low level, the high-voltage power supply output is high voltage, the ion beam passes through the electrode plate and is deflected, the ion beam intensity at the rear end is zero, the pulse generator signal changes periodically, and the ion beam forms the pulsed ion beam at the rear end.

[0012] Furthermore, the pulse width of the narrow pulse beam is adjusted by modulating the delay between the trigger signals of the two electrode plates.

[0013] The present invention adopts the above technical solution, which has the following advantages:

[0014] 1. The present invention uses a deflection electrode to load a pulsed high voltage to periodically deflect the ion beam passing through the electrode plates to generate a pulsed ion beam. At present, the width of the pulse beam in the world mainly depends on the rising edge time and the falling edge time of the high voltage power supply, and it is difficult to generate a narrow pulse beam. The present invention can be used to convert the low-energy heavy ion continuous ion beam generated by the accelerator into a pulsed ion beam and an extremely narrow nano-pulsed ion beam, thereby reducing the influence of the high voltage power supply performance on the pulsed ion beam.

[0015] 2. The present invention adopts dual electrodes and dual slits to convert the continuous beam generated by the ion source or accelerator into a pulsed ion beam. The electrodes and the slits are integrated on the same flange and can be arbitrarily installed on the ion beam transmission pipeline without changing the optical and electronic design of the ion beam transmission. The slit center is detachable and the slit size can be changed arbitrarily as needed. The electrodes are loaded with pulsed high voltage, and the continuous ion beam generated by the ion source or accelerator is converted into a pulsed ion beam after passing through the electrode plate. The dual-electrode pulsed high voltage, pulse signal delay time, and slit coordination adjustment can adjust the quality and width of the pulsed ion beam, and the minimum pulse width can be 1 nanosecond.

[0016] 3. The low-energy heavy ion pulsing system of the present invention converts the continuous ion beam generated by the 320kV high-voltage platform into a pulsed ion beam with a pulse width and duty cycle within a certain range, effectively solving the problems existing in the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a schematic diagram of the overall structure of the integrated electrode and the slit in an embodiment of the present invention;

[0018] Figure 2 yes Figure 1 A top view of

[0019] Figure 3 yes Figure 1 Side view of

[0020] Figure 4 yes Figure 1 The main view;

[0021] Figure 5 is a rendering of the effect of installing a low-energy pulsed ion beam generating device in an accelerator beam transmission pipeline in an embodiment of the present invention;

[0022] Figure 6 yes Figure 5 The enlarged schematic diagram at A in the middle;

[0023] Figure 7 is a pulse generating system in an embodiment of the present invention;

[0024] Figure 8 It is a schematic diagram of ultra-narrow beam pulsing in an embodiment of the present invention. DETAILED DESCRIPTION

[0025] In order to make the purpose, technical solution and advantages of the embodiment of the present invention clearer, the technical solution of the embodiment of the present invention will be clearly and completely described below in conjunction with the drawings of the embodiment of the present invention. Obviously, the described embodiment is a part of the embodiment of the present invention, not all of the embodiments. Based on the described embodiment of the present invention, all other embodiments obtained by ordinary technicians in this field belong to the scope of protection of the present invention.

[0026] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0027] The present invention provides a low-energy pulsed ion beam generating device, comprising: a deflection electrode, which is arranged on the flange of an accelerator beam transmission pipeline and is located inside the accelerator beam transmission pipeline; a two-dimensional adjustable slit, which is arranged on the same flange in parallel with the deflection electrode; a deflection electrode power supply connection end, which is passed through the flange, the deflection electrode power supply connection end located inside the accelerator beam transmission pipeline is connected to the deflection electrode, and the deflection electrode power supply connection end located outside the accelerator beam transmission pipeline is connected to the external deflection electrode power supply. The present invention can convert the low-energy heavy ion continuous beam generated by the accelerator into a pulse beam and an extremely narrow nanometer pulse beam, and reduce the influence of the high-voltage power supply performance on the pulse beam.

[0028] In one embodiment of the present invention, a low-energy pulsed ion beam generating device is provided. In this embodiment, the device is arranged on an accelerator beam transmission pipeline, such as Figures 1 to 6 As shown, the device comprises:

[0029] A deflection electrode 1 is arranged on a flange 3 of an accelerator beam transmission pipeline 2 and is located inside the accelerator beam transmission pipeline 2;

[0030] A two-dimensionally adjustable slit 4 is arranged parallel to the deflection electrode 1 on the same flange 3;

[0031] The deflection electrode power supply connection terminal 5 is passed through the flange 3. The deflection electrode power supply connection terminal 5 located inside the accelerator beam transmission pipeline 2 is connected to the deflection electrode 1, and the deflection electrode power supply connection terminal 5 located outside the accelerator beam transmission pipeline 2 is connected to the external deflection electrode power supply.

[0032] In the above embodiment, the deflection electrodes 1 are configured as two pairs of electrode plates 11 , and the electrode plates 11 are horizontally and symmetrically mounted on the flange 3 .

[0033] In this embodiment, the electrode plate 11 adopts a T-shaped structure, a square plate is used at the T-shaped head, and a long strip plate is used at the end connected to the deflection electrode power supply, and the square plate and the long strip plate are integrally formed.

[0034] Preferably, the size of the electrode plate 11 is determined according to the geometric size of the accelerator vacuum tube, ion type, ion energy, beam envelope size, installation position and other factors, and is not specifically limited here. It can be set according to the corresponding actual situation when used.

[0035] In the above embodiment, the two-dimensional adjustable slit 4 includes a water-cooled target seat 41, a target plate 42, a connecting rod 43 and a water-cooling pipe 44. The water-cooled target seat 41 is symmetrically arranged with the square plate of the electrode plate 11, and the target plate 42 is arranged at the center of the water-cooled target seat 41; one side of the water-cooled target seat 41 is fixed to the inner side of the flange 3 by a connecting rod 43, and is symmetrically arranged with the long strip plate of the deflection electrode 1. Water-cooling pipes 44 connected to the water-cooled target seat 41 are respectively arranged above and below the connecting rod 43, and one end of the water-cooling pipe 44 passes through the flange 3 and is connected to the external water cooling system. In this embodiment, the water cooling system can adopt existing mature technology, which will not be described here.

[0036] In one embodiment of the present invention, a method for generating a low-energy pulsed ion beam is provided. In this embodiment, Figure 7 As shown, the method comprises the following steps:

[0037] 1) A DC high voltage is periodically loaded on the electrode plate 11, thereby generating a periodically changing electrostatic field between the plates. The ion beam entering the electrode plate 11 is periodically deflected by the electric field, deviates from the central orbit, and forms a pulsed ion beam.

[0038] 2) After the pulsed ion beam is generated, the width and current of the pulsed ion beam are adjusted by adjusting the two-dimensional adjustable slit 4, and the quality and waveform of the pulsed ion beam are adjusted in conjunction with the power supply high voltage and the trigger signal delay time.

[0039] In a preferred embodiment, when the pulse generator trigger signal is high level, the high voltage power supply output is zero voltage, the ion beam flows normally through the electrode plate, and the ion beam current intensity at the rear end is normal; when the pulse generator trigger signal is low level, the high voltage power supply output is high voltage, the ion beam flows through the electrode plate and is deflected, the ion beam current intensity at the rear end is zero, the pulse generator signal changes periodically, and the ion beam flows at the rear end to form the pulsed ion beam

[0040] By modulating the delay between the trigger signals of the first electrode plate and the second electrode plate 11, the pulse width of the narrow pulse beam can be adjusted, such as Figure 8 shown.

[0041] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A low energy pulsed ion beam generating device, characterized in that: include: A deflection electrode is arranged on the flange of the ion transmission pipeline of the accelerator and is located inside the ion transmission pipeline of the accelerator; A two-dimensional adjustable slit is arranged parallel to the deflection electrode on the same flange; A deflection electrode power supply connection end is provided on the flange, the deflection electrode power supply connection end located inside the accelerator ion transmission pipeline is connected to the deflection electrode, and the deflection electrode power supply connection end located outside the accelerator ion transmission pipeline is connected to an external deflection electrode power supply; The deflection electrodes are provided as two pairs of electrode plates, and the electrode plates are horizontally and symmetrically mounted on the flange; The two-dimensional adjustable slit includes a water-cooled target seat, a target plate, a connecting rod and a water-cooled pipe; The water-cooled target seat is symmetrically arranged with the square plate of the electrode plate, and the target plate is arranged at the center position of the water-cooled target seat; one side of the water-cooled target seat is fixed to the inner side surface of the flange through the connecting rod, and is symmetrically arranged with the deflection electrode; the water-cooling pipe connected to the water-cooled target seat is respectively arranged above and below the connecting rod, and one end of the water-cooling pipe passes through the flange and is connected to an external water cooling system.

2. The low energy pulsed ion beam generating device according to claim 1, characterized in that: The electrode plate adopts a T-shaped structure, a square plate is used at the T-shaped head, and a long strip plate is used at one end connected to the deflection electrode power supply, and the square plate and the long strip plate are formed in one piece.

3. A method for generating a low-energy pulsed ion beam based on the device according to claim 1 or 2, characterized in that: include: A DC high voltage is periodically loaded on the electrode plates, thereby generating a periodically changing electrostatic field between the plates. The ion beam entering the electrode plates is periodically deflected by the electric field, deviating from the central orbit, and forming a pulsed ion beam. After the pulsed ion beam is generated, the width and current of the pulsed ion beam are adjusted by adjusting the two-dimensional adjustable slit, and the quality and waveform of the pulsed ion beam are adjusted in conjunction with the power supply high voltage and the trigger signal delay time.

4. The method for generating a low energy pulsed ion beam as claimed in claim 3, characterized in that: When the pulse generator trigger signal is at a high level, the high-voltage power supply output is zero voltage, the ion beam passes through the electrode plate normally, and the ion beam intensity at the rear end is normal; when the pulse generator trigger signal is at a low level, the high-voltage power supply output is high voltage, the ion beam passes through the electrode plate and is deflected, the ion beam intensity at the rear end is zero, the pulse generator signal changes periodically, and the ion beam forms the pulsed ion beam at the rear end.

5. The method for generating a low-energy pulsed ion beam as claimed in claim 3, characterized in that: The pulse width of the narrow pulse beam is adjusted by modulating the delay between the trigger signals of the two electrode plates.

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