Display panel, display panel manufacturing method and display device

Abstract

The present application provides a display panel, a method for manufacturing a display panel, and a display device, wherein the light-emitting area of ​​the display panel includes: a substrate; a planarization layer, which is arranged on the surface of one side of the substrate; an anode layer, which is arranged on the planarization layer; a pixel definition layer, which is arranged on the anode layer, and the pixel definition layer includes a pixel opening, and the anode layer is partially exposed in the pixel opening; an organic light-emitting layer, which is arranged in the pixel opening, and the organic light-emitting layer is located on the anode layer. The present application can effectively reduce the distance between the organic light-emitting layer and the substrate when the organic light-emitting layer emits light toward the substrate side, that is, it can effectively shorten the light emission path of the light emitted by the organic light-emitting layer, reduce the absorption or reflection of the light emitted by the organic light-emitting layer by other film layers, and reduce light loss, which is beneficial to improve the light-emitting brightness of the organic light-emitting layer, and then help improve the light-emitting efficiency of the display panel and save the power consumption of the display panel.

Description

Technical Field

[0001] The present application relates to the technical field of display devices, and in particular to a display panel, a method for manufacturing a display panel, and a display device. Background Art

[0002] Organic Light Emitting Display (OLED) has many advantages, such as white light emission, low driving voltage, high luminous efficiency, short response time, high clarity and contrast, nearly 180-degree viewing angle, wide operating temperature range, flexible display and large-area full-color display, etc. It is recognized by the industry as the display device with the most development potential.

[0003] When the display panel in the prior art is working, the light emitted by the organic light-emitting unit needs to pass through the flat layer, multiple insulating layers (such as a passivation layer, an interlayer dielectric layer, and a buffer layer) and other film layers in sequence. Since each film layer has a certain absorption of the light emitted by the organic light-emitting unit, the brightness of the light emitted by the organic light-emitting unit is attenuated, which is not conducive to improving the display brightness of the OLED. Summary of the invention

[0004] The present application provides a display panel, a method for manufacturing the display panel, and a display device to solve the problem of low light extraction efficiency of an organic light emitting unit.

[0005] In one aspect, the present application provides a display panel having a light-emitting area and a switch area, wherein the light-emitting area of ​​the display panel includes:

[0006] substrate substrate;

[0007] A planarization layer is disposed on a surface of one side of the substrate;

[0008] an anode layer, disposed on the planarization layer;

[0009] A pixel definition layer, disposed on the anode layer, the pixel definition layer comprising a pixel opening, and the anode layer is partially exposed in the pixel opening;

[0010] The organic light emitting layer is arranged in the pixel opening, and the organic light emitting layer is located on the anode layer.

[0011] In a possible implementation of the present application, the display panel further includes:

[0012] An insulating layer, disposed in the light emitting area and the switch area on the base substrate, wherein the insulating layer comprises a groove located in the light emitting area;

[0013] The planarization layer is disposed on the insulating layer and is located in the groove. The pixel definition layer is located on the side wall of the groove to form the pixel opening.

[0014] In a possible implementation of the present application, the planarization layer further includes:

[0015] The first flat layer is disposed on the surface of the base substrate, and the first flat layer is a transparent flat layer.

[0016] In a possible implementation of the present application, the planarization layer further includes:

[0017] The second flat layer is connected to the end surface of the first flat layer, and the second flat layer is arranged on the side surfaces of the pixel definition layer and the anode layer.

[0018] The switch area includes a thin film transistor, and the second planar layer is made of a light absorbing material.

[0019] In a possible implementation of the present application, the switch area includes a thin film transistor, the pixel definition layer is arranged on a side of the anode layer, and the pixel definition layer is made of a light absorbing material.

[0020] In a possible implementation of the present application, the thickness of the pixel definition layer is less than or equal to 1 μm.

[0021] In a possible implementation of the present application, the display panel further includes:

[0022] The cathode layer is located in the light-emitting area and is disposed on the organic light-emitting layer and the pixel definition layer. The cathode is a transparent electrode or a light-shielding electrode.

[0023] In a possible implementation of the present application, the switch area of ​​the display panel includes an auxiliary cathode, the transparent electrode extends from the light emitting area to the switch area, and the transparent electrode is connected to the auxiliary cathode in the switch area.

[0024] On the other hand, the present application further provides a method for manufacturing a display panel, wherein the display panel has a light-emitting area and a switch area, and the manufacturing method comprises:

[0025] Forming a planarization layer on a surface of one side of the light emitting region of the base substrate;

[0026] forming an anode layer on the planarization layer;

[0027] forming a pixel definition layer on the anode layer, and etching a pixel opening on the pixel definition layer so that a portion of the anode layer is exposed in the pixel opening;

[0028] A light emitting material is prepared on the anode layer in the pixel opening to form an organic light emitting layer.

[0029] On the other hand, the present application also provides a display device, comprising the display panel.

[0030] The present application provides a display panel, a method for manufacturing a display panel, and a display device. In the light-emitting area of ​​the display panel, a planarization layer is arranged on the surface of one side of the base substrate, and then an anode layer and a pixel definition layer are arranged in sequence on the planarization layer, and an organic light-emitting layer is arranged in the pixel opening. Therefore, when the organic light-emitting layer emits light toward the side of the base substrate, the distance between the organic light-emitting layer and the base substrate can be effectively reduced, that is, the light emission path of the light emitted by the organic light-emitting layer can be effectively shortened, and the absorption or reflection of the light emitted by the organic light-emitting layer by other film layers is reduced, and the light loss is reduced, which is beneficial to improving the light-emitting brightness of the organic light-emitting layer, and further, it is beneficial to enable users to obtain a better visual experience while improving the light-emitting efficiency of the display panel and saving the power consumption of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] The technical solution and other beneficial effects of the present application will be made apparent by describing in detail the specific implementation methods of the present application in conjunction with the accompanying drawings.

[0032] Figure 1 A schematic diagram of the structure of a display panel provided in an embodiment of the present application.

[0033] Figure 2 A schematic diagram of the structure of the switch area of ​​the display panel provided in an embodiment of the present application.

[0034] Figure 3 A schematic structural diagram of a display panel provided in yet another embodiment of the present application.

[0035] Figure 4 A schematic diagram of the structure of an auxiliary cathode of a display panel provided in an embodiment of the present application.

[0036] Figure 5 A schematic diagram of the manufacturing process of a display panel provided in an embodiment of the present application.

[0037] Figure 6 Schematic diagram of the manufacturing process of steps S201 - S203 of the method for manufacturing a display panel according to an embodiment of the present application. DETAILED DESCRIPTION

[0038] The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0039] In the description of the present application, it should be understood that the features of the terms "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise clearly and specifically defined. It should be noted that, unless otherwise clearly specified and defined, the terms "connected" and "connected" should be understood in a broad sense. For example, it can be directly connected or indirectly connected through an intermediate medium. It can be the internal connection of two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0040] The disclosure below provides many different embodiments or examples to realize the different structures of the present application. In order to simplify the disclosure of the present application, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeat reference numbers and / or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, which itself does not indicate the relationship between the various embodiments and / or settings discussed. In addition, the various specific processes and material examples provided by the present application, but those of ordinary skill in the art can appreciate the application of other processes and / or the use of other materials.

[0041] The embodiments of the present application provide a display panel, a method for manufacturing a display panel, and a display device, which are described in detail below.

[0042] Please refer to Figure 1-Figure 4 An embodiment of the present application provides a display panel. The organic light-emitting display panel provided in the embodiment of the present application can be a bottom emission display panel or a double-sided emission display panel.

[0043] Combination Figure 1 and Figure 2 As shown, the display panel of the present application has a light-emitting area 110 and a switching area 120 , and the light-emitting area 110 of the display panel includes a base substrate 10 , a planarization layer 20 , an anode layer 30 , a pixel definition layer 40 and an organic light-emitting layer 50 .

[0044] The base substrate 10 may be a hard substrate or a flexible substrate. The base substrate 10 may be made of one or more of glass, silicon dioxide, polyethylene, polypropylene, polystyrene, polylactic acid, polyethylene terephthalate, polyimide or polyurethane, and is not specifically limited here.

[0045] The planarization layer 20 is disposed on the surface of one side of the base substrate 10. The planarization layer 20 is used to ensure the flatness of the anode. The planarization layer 20 may include one or more of acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyacrylate, polycarbonate, polyimide, polystyrene, and the like, and is not specifically limited thereto.

[0046] The anode layer 30 is disposed on the planarization layer 20. Among them, the anode layer 30 can be made of transparent metal oxide, a laminate of metal and transparent metal oxide. The materials used for transparent metal oxide include indium gallium zinc oxide, indium zinc tin oxide, indium gallium zinc tin oxide, indium tin oxide (ITO), indium zinc oxide, indium aluminum zinc oxide, indium gallium tin oxide or antimony tin oxide. The above materials have good conductivity and transparency, and the thickness is small, and will not affect the overall thickness of the display panel. The material used for the metal layer is any one of silver (Ag), aluminum (Al) or copper (Cu). Exemplarily, the anode layer 30 can be a laminate of ITO / Ag / ITO or a laminate of IZO / Ag / IZO. Metals such as silver, aluminum, and copper have good conductivity and low cost, which can reduce production costs while ensuring the conductivity of the anode.

[0047] The pixel definition layer 40 is disposed on the anode layer 30, and the pixel definition layer 40 includes a pixel opening 401, and a portion of the anode layer 30 is exposed in the pixel opening 401. The pixel definition layer 40 can be made of a transparent material, and the transparent material is selected from one or more of polyimide, polyethylene naphthalate, polyethylene terephthalate, polycarbonate (PC), polyetherimide (PEI) and polyether sulfone (PES), and is not specifically limited here.

[0048] The organic light emitting layer 50 is disposed in the pixel opening 401, and the organic light emitting layer 50 is located on the anode layer 30. The organic light emitting layer 50 may include a red organic light emitting layer 50, a green organic light emitting layer 50, and a blue organic light emitting layer 50, and the pixel openings 401 corresponding to the red organic light emitting layer 50, the green organic light emitting layer 50, and the blue organic light emitting layer 50 are respectively red sub-pixel openings 401, green sub-pixel openings 401, and blue sub-pixel openings 401. Among them, the organic light emitting layer 50 can be formed by an inkjet printing process (IJP). Correspondingly, the side of the pixel definition layer 40 facing away from the organic light emitting layer 50 is hydrophilic, and the side of the pixel definition layer 40 facing the organic light emitting layer 50 is hydrophobic. Hydrophilicity refers to the fact that the surface of a material is easily wetted or dissolved by a liquid medium. Hydrophobicity (also known as liquid repellency) is opposite to hydrophilicity, and hydrophobicity refers to the fact that the surface of a material is not easily wetted or dissolved by a liquid medium. The lyophilic and lyophobic properties of a material surface are mainly determined by the properties of its surface structure or functional groups. The use of inkjet printing (IJP) can help save costs.

[0049] The display panel of the embodiment of the present application is configured by setting a planarization layer 20 on the surface of one side of the base substrate 10 in the light-emitting area 110 of the display panel, and then sequentially setting an anode layer 30 and a pixel definition layer 40 on the planarization layer 20, and setting the organic light-emitting layer 50 in the pixel opening 401, so that when the organic light-emitting layer 50 emits light toward the side of the base substrate 10, the distance between the organic light-emitting layer 50 and the base substrate 10 can be effectively reduced, that is, the light emission path of the light emitted by the organic light-emitting layer 50 can be effectively shortened, and the absorption or reflection of the light emitted by the organic light-emitting layer 50 by other film layers is reduced, thereby reducing light loss, which is beneficial to improving the light-emitting brightness of the organic light-emitting layer 50, and further beneficial to enabling users to obtain a better visual experience while improving the light-emitting efficiency of the display panel and saving power consumption of the display panel.

[0050] In some embodiments, Figure 3As shown, the display panel further includes an insulating layer 70. The insulating layer 70 is disposed in the light-emitting area 110 and the switch area 120 on the base substrate 10. Specifically, the insulating layer 70 may be a single-layer structure or a stacked structure including multiple layers, which is not specifically limited here. Exemplarily, the insulating layer 70 may include at least one insulating film layer such as a passivation layer, an interlayer dielectric layer or a buffer layer, and the insulating layer 70 includes a groove 701 located in the light-emitting area 110. Among them, the groove 701 is connected to the pixel opening 401. The planarization layer 20 is disposed on the insulating layer 70 and the planarization layer 20 is located in the groove 701, and the pixel definition layer 40 is located on the side wall of the groove 701 to form the pixel opening 401. Since the pixel opening 401 is formed by the pixel definition layer 40 being located on the side wall of the groove 701, the pixel definition layer 40 does not need to form a dam-like structure, so that the thickness of the pixel definition layer 40 can be reduced, thereby improving the luminous efficiency of the organic light-emitting layer 50 on the side toward the base substrate 10 while facilitating the overall thinning of the display panel.

[0051] In some embodiments, please refer to Figure 3 , the planarization layer 20 includes a first planarization layer 21 .

[0052] The first flat layer 21 is disposed on the surface of the base substrate 10, and the first flat layer 21 is a transparent flat layer. By setting the first flat layer 21 as a transparent flat layer, the light generated by the organic light-emitting layer 50 can be emitted toward the side of the base substrate 10. The thickness of the first flat layer 21 can be less than or equal to 2 μm. By setting the thickness of the first flat layer 21 to a smaller thickness, it is beneficial to save materials, and at the same time further shorten the light emission path of the organic light-emitting layer 50, thereby further improving the light luminance and light emitting efficiency of the organic light-emitting layer 50.

[0053] In some embodiments, the pixel definition layer 40 is disposed on the side of the anode layer 30, and the pixel definition layer 40 can also be made of a black light-absorbing material. Specifically, the black light-absorbing material can be formed by adding black pigment to form black acrylic or black polyimide. Since the active layer of the thin film transistor 12 can be made of IGZO. Since the organic light-emitting layer 50 and the thin film transistor 12 are respectively disposed on both sides of the pixel definition layer 40, the light emitted downward by the bottom-emitting OLED device will more or less pass through the thin film transistor 12, and the active layer in the thin film transistor 12 is sensitive to light and is prone to electrical abnormalities. Therefore, by making the pixel definition layer 40 located on the side of the anode layer 30 with a black light-absorbing material, the light emitted from the organic light-emitting layer 50 to the side can be prevented from being emitted to the thin film transistor 12, thereby ensuring that the active layer of the thin film transistor 12 will not be affected by light, thereby ensuring that the thin film transistor 12 works normally. At the same time, the side of the anode layer 30 does not need to add an additional process for light shielding, which is conducive to saving process and reducing costs.

[0054] In some embodiments, the switch region 120 includes a thin film transistor 12, and a thin film transistor 12 (TFT) is provided in the switch region 120 as a driving device. The TFT includes an active layer 122, a gate electrode 123, and a source-drain electrode layer 124. A gate insulating layer may be provided between the gate electrode 123 and the active layer 122 to insulate the gate electrode 123 from the active layer 122. In order to further prevent the influence of light on the thin film transistor 12, a black light shielding layer 121 may be provided below the active layer 122 to shield light.

[0055] The planarization layer 20 may further include a second planarization layer 22. The second planarization layer 22 is connected to the end surface of the first planarization layer 21, and is disposed on the side of the pixel definition layer 40 and the anode layer 30, that is, the second planarization layer 22 is formed on the side wall of the groove 701, and the second planarization layer 22 is made of a light absorbing material. The organic light emitting layer 50 and the thin film transistor 12 are respectively disposed on both sides of the second planarization layer 22. At this time, even if the pixel definition layer 40 is made of a transparent material, it can prevent the light emitted from the organic light emitting layer 50 to the side from irradiating into the thin film transistor 12, thereby ensuring that the active layer of the thin film transistor 12 will not be affected by light, thereby ensuring that the thin film transistor 12 works normally.

[0056] In some embodiments, the display panel further includes a cathode layer 60. The cathode layer 60 is located in the light emitting area 110 and is disposed on the organic light emitting layer 50 and the pixel definition layer 40. The anode layer 30 and the cathode layer 60 are used to control the light emission of the organic light emitting layer 50.

[0057] Specifically, the cathode layer 60 is a transparent electrode or a light shielding electrode. When the organic light emitting display panel of the embodiment of the present application is a bottom emission display panel, the cathode layer 60 is a reflective electrode; when the organic light emitting display panel is a double-sided emission display panel, the cathode layer 60 is a transparent electrode to ensure that the light emitted by the organic light emitting display panel can be emitted in the direction of the cathode electrode.

[0058] In some embodiments, Figure 4As shown, when the organic light emitting display panel is a double-sided emission display panel, that is, the cathode layer 60 is a transparent electrode, the switch area 120 of the display panel may further include an auxiliary cathode 61, the cathode layer 60 extends from the light emitting area 110 to the switch area 120, and the cathode layer 60 is connected to the auxiliary cathode 61 in the switch area 120. In this embodiment, the auxiliary cathode 61 is a metal layer, which is arranged in the same layer as the source and drain electrode layer 124 of the thin film transistor 12, and the auxiliary cathode 61 and the cathode layer 60 are connected through the via 601, wherein the via 601 penetrates the film layer between the cathode layer 60 and the auxiliary cathode 61, and illustratively, the via 601 penetrates the pixel definition layer 40, the anode layer 30 and the second flat layer 22. Since in the display panel of this embodiment, the cathode layer 60 is arranged on the whole surface and is not patterned, and in order to ensure that the light emitted by the organic light emitting display panel can be emitted in the direction of the cathode layer 60, that is, to ensure the light transmittance, the thickness of the cathode layer 60 is set very thin. In this case, the voltage drop (IR drop) generated when the current flows through the cathode layer 60 is large, which can easily cause uneven light emission of the display panel. In order to weaken the influence of the IR drop of the cathode layer 60, an auxiliary cathode 61 is provided to be connected to the cathode layer 60 through the via 601, thereby reducing the IR drop of the cathode layer 60 and ensuring the uniformity of light emission of the display panel.

[0059] The auxiliary cathode 61 can be arranged at the edge of the pixel opening 401, that is, the auxiliary cathode 61 is arranged outside the pixel opening 401 near the pixel definition layer 40. The auxiliary cathode 61 can also be arranged inside the pixel opening 401, and the anode is arranged around the auxiliary cathode 61, and there is a gap between the anode and the auxiliary cathode 61. In other words, the auxiliary cathode 61 can be arranged at any position inside the pixel opening 401. The auxiliary cathode 61 can be made of any one of silver, aluminum, silver alloy, aluminum alloy or silver-aluminum alloy, and the material of the auxiliary cathode 61 is not specifically limited here.

[0060] In order to better implement the display panel of the present application, Figure 5 As shown, the embodiment of the present application further provides a method for manufacturing a display panel, wherein the display panel has a light-emitting area 110 and a switch area 120, and the manufacturing method comprises the following steps S101-S104:

[0061] S101, forming a planarization layer 20 on a surface of one side of the light emitting area 110 of the base substrate 10;

[0062] S102, forming an anode layer 30 on the planarization layer 20;

[0063] S103, forming a pixel definition layer 40 on the anode layer 30, and etching to form a pixel opening 401 on the pixel definition layer 40, so that a portion of the anode layer 30 is exposed in the pixel opening 401;

[0064] S104 , preparing a light-emitting material on the anode layer 30 in the pixel opening 401 to form an organic light-emitting layer 50 .

[0065] The manufacturing method of the display panel of the embodiment of the present application is to set the planarization layer 20 on the surface of one side of the base substrate 10 in the light-emitting area 110 of the display panel, and then sequentially set the anode layer 30 and the pixel definition layer 40 on the planarization layer 20, and set the organic light-emitting layer 50 in the pixel opening 401, so that when the organic light-emitting layer 50 emits light toward the side of the base substrate 10, the distance between the organic light-emitting layer 50 and the base substrate 10 can be effectively reduced, that is, the light emission path of the light emitted by the organic light-emitting layer 50 can be effectively shortened, and the absorption or reflection of the light emitted by the organic light-emitting layer 50 by other film layers is reduced, and the light loss is reduced, which is beneficial to improve the light-emitting brightness of the organic light-emitting layer 50, and further, it is beneficial to enable users to obtain a better visual experience while improving the light-emitting efficiency of the display panel and saving the power consumption of the display panel.

[0066] In some embodiments, Figure 6 As shown, before step S101, forming a planarization layer 20 on the surface of one side of the light emitting area 110 of the base substrate 10, the following steps S201-S203 are also included:

[0067] S201 , forming an insulating layer 70 on the entire surface of the light emitting region 110 and the switch region 120 of the base substrate 10 .

[0068] The insulating layer 70 may be formed on the surface of the base substrate 10 .

[0069] S202 , etching the insulating layer 70 in the light emitting region 110 to form a groove 701 .

[0070] Specifically, the insulating layer 70 may be a single-layer structure or a stacked-layer structure including multiple layers, which is not specifically limited herein. Exemplarily, the insulating layer 70 may include at least one insulating film layer such as a passivation layer, an interlayer dielectric layer, or a buffer layer. The groove 701 is connected to the pixel opening 401.

[0071] S203 , forming a planarization layer 20 on the insulating layer 70 , wherein the planarization layer 20 covers the groove 701 .

[0072] By disposing the planarization layer 20 on the insulating layer 70 and the planarization layer 20 in the groove 701, the pixel definition layer 40 located on the planarization layer 20 is also located on the side wall of the groove 701 to form a pixel opening 401. Since the pixel opening 401 is formed by the pixel definition layer 40 being located on the side wall of the groove 701, the pixel definition layer 40 does not need to form a dam-like structure, so that the thickness of the pixel definition layer 40 can be reduced, thereby improving the luminous efficiency of the organic light-emitting layer 50 emitting light toward the base substrate 10, and at the same time, it is beneficial to reduce the overall thinning of the display panel.

[0073] In order to better implement the display panel of the present application, the present application also provides a display device, and the display device includes a display panel. Since the display device has the above-mentioned display panel, it has all the same beneficial effects, and this embodiment is not repeated here. The embodiment of the present application does not specifically limit the applicability of the display device, wherein the display device can be a handheld device (smartphone, tablet computer, etc.), a wearable device (smart bracelet, wireless headset, smart watch, smart glasses, etc.), a vehicle-mounted device (navigator, auxiliary reversing system, driving recorder, car refrigerator, etc.), a virtual reality device, an augmented reality device, a terminal device (Terminal Device), etc., which are not limited here.

[0074] In the above embodiments, the description of each embodiment has its own emphasis. For parts not described in detail in a certain embodiment, please refer to the relevant description of other embodiments. In specific implementation, the above units or structures can be implemented as independent entities, or can be arbitrarily combined and implemented as the same or several entities. The specific implementation of the above units or structures can refer to the previous method embodiments, which will not be repeated here.

[0075] The above is a detailed introduction to a display panel, a method for manufacturing a display panel, and a display device provided in the embodiments of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the embodiments of the present application. The description of the above embodiments is only used to help understand the technical solutions and core ideas of the embodiments of the present application. Ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some of the technical features therein with equivalents; and these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A display panel, characterized in that: The display panel has a light-emitting area and a switch area, and the light-emitting area of ​​the display panel includes: substrate substrate; A planarization layer is disposed on a surface of one side of the substrate; an anode layer, disposed on the planarization layer; A pixel definition layer, disposed on the anode layer, the pixel definition layer comprising a pixel opening, and the anode layer is partially exposed in the pixel opening; An organic light-emitting layer is disposed in the pixel opening, and the organic light-emitting layer is located on the anode layer; The planarization layer comprises: A first flat layer, disposed on the surface of the base substrate, wherein the first flat layer is a transparent flat layer; The planarization layer further comprises: A second flat layer connected to an end surface of the first flat layer, the second flat layer being arranged on the side surfaces of the pixel definition layer and the anode layer; The switch area includes a thin film transistor, and the material of the second planar layer is a light absorbing material.

2. The display panel according to claim 1, characterized in that: The display panel further includes: An insulating layer, disposed in the light emitting area and the switch area on the base substrate, wherein the insulating layer comprises a groove located in the light emitting area; The planarization layer is disposed on the insulating layer and is located in the groove. The pixel definition layer is located on the side wall of the groove to form the pixel opening.

3. The display panel according to claim 1, characterized in that: The switch area includes a thin film transistor. The pixel definition layer is arranged on the side of the anode layer. The pixel definition layer is made of a light absorbing material.

4. The display panel according to claim 1, characterized in that: The thickness of the pixel definition layer is less than or equal to 1 μm.

5. The display panel according to any one of claims 1 to 4, characterized in that: The display panel further includes: The cathode layer is located in the light-emitting area and is disposed on the organic light-emitting layer and the pixel definition layer. The cathode is a transparent electrode or a light-shielding electrode.

6. The display panel according to claim 5, characterized in that: The switching area of ​​the display panel includes an auxiliary cathode, the transparent electrode extends from the light emitting area to the switching area, and the transparent electrode is connected to the auxiliary cathode in the switching area.

7. A method for manufacturing a display panel, characterized in that: The display panel has a light-emitting area and a switch area, and the manufacturing method includes: Forming a planarization layer on a surface of one side of the light emitting region of the base substrate; forming an anode layer on the planarization layer; forming a pixel definition layer on the anode layer, and etching a pixel opening on the pixel definition layer so that a portion of the anode layer is exposed in the pixel opening; preparing a light-emitting material on the anode layer in the pixel opening to form an organic light-emitting layer; The planarization layer comprises: A first flat layer, disposed on the surface of the base substrate, wherein the first flat layer is a transparent flat layer; The planarization layer further comprises: A second flat layer connected to an end surface of the first flat layer, the second flat layer being arranged on the side surfaces of the pixel definition layer and the anode layer; The switch area includes a thin film transistor, and the second planar layer is made of a light absorbing material.

8. A display device, characterized in that: A display panel comprising any one of claims 1 to 6.

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