A vacuum pumping system for pre-evacuation of reduction heat in the preparation of zirconium sponge or hafnium sponge

Abstract

The invention relates to a vacuum pumping system for pre-pumping reduction heat in the preparation of sponge zirconium or sponge hafnium, comprising a water tank, a vacuum device, a maintenance device, and a refrigeration device, wherein the vacuum device comprises a water ejector and a vacuum pump, wherein the water ejector, the water tank, and the vacuum pump are all connected to each other through a pipeline, and the water ejector is used to be connected to a reduction furnace; the maintenance device comprises a heat exchange circulation pump, a heat exchanger, a temperature detection mechanism, a pH detection mechanism, a water volume detection mechanism, a water inlet mechanism, and a drainage mechanism, wherein the temperature detection mechanism, the pH detection mechanism, the water volume detection mechanism, the water inlet mechanism, and the drainage mechanism are all arranged on the water tank, wherein the water tank and the heat exchange circulation pump, the heat exchange circulation pump and the heat exchanger, and the heat exchanger and the water tank are all connected by pipelines, wherein the temperature detection mechanism, the pH detection mechanism, and the water volume detection mechanism are respectively used to detect the pH value, the temperature, and the water volume of water in the water tank, and the refrigeration device is connected to the heat exchanger.

Description

Technical Field

[0001] The invention relates to the field of vacuum equipment, and in particular to a vacuum pumping system for pre-pumping reduction heat in the preparation of zirconium sponge or hafnium sponge. Background Art

[0002] During the heat pre-pumping process of the preparation of zirconium sponge or hafnium sponge reduction, a large amount of hot waste gas containing zirconium tetrachloride or hafnium tetrachloride particles will be pumped out of the reduction furnace by the vacuum system. These waste gases containing zirconium tetrachloride or hafnium tetrachloride particles are highly corrosive and contain a large amount of heat. Existing designs often use conventional vacuum generating equipment such as compressed air vacuum generators, mechanical vacuum pumps, and Roots vacuum pumps. The waste gas during the working process will cause serious corrosion to these vacuum generating equipment, requiring frequent replacement of equipment or parts, seriously affecting the production process. When a water ejector is used for vacuuming, the zirconium tetrachloride or hafnium tetrachloride in the waste gas discharged by the heat pre-pumping will dissolve in water and produce hydrochloric acid. At the same time, the heat brought out will increase the water temperature and increase the saturated vapor pressure of water, thereby affecting the work of the water ejector, reducing the vacuum degree of the reduction furnace, and extending the working time of the heat pre-pumping. Summary of the invention

[0003] In view of the above-mentioned shortcomings of the prior art, the technical problem to be solved by the present invention is to provide a vacuum pumping system for pre-evacuation of reduction heat in the preparation of zirconium sponge or hafnium sponge, which can continuously ensure the vacuum pumping effect and work stably and reliably.

[0004] To achieve the above-mentioned purpose, the present invention provides a vacuum pumping system for pre-pumping reduction heat in the preparation of sponge zirconium or sponge hafnium, comprising a water tank, a vacuum device, a maintenance device, and a refrigeration device, wherein the vacuum device comprises a water ejector and a vacuum circulation pump, wherein the water ejector, the water tank and the vacuum circulation pump are connected to each other through a pipeline to form a circulation loop, and the water ejector is used to be connected to a reduction furnace; the maintenance device comprises a heat exchange circulation pump, a heat exchanger, a temperature detection mechanism, a pH detection mechanism, a water volume detection mechanism, a water inlet mechanism and a drainage mechanism, wherein the temperature detection mechanism, the pH detection mechanism, the water volume detection mechanism, the water inlet mechanism and the drainage mechanism are all arranged on the water tank, wherein the water tank and the heat exchange circulation pump, the heat exchange circulation pump and the heat exchanger, and the heat exchanger and the water tank are all connected by pipelines, wherein the temperature detection mechanism, the pH detection mechanism and the water volume detection mechanism are respectively used to detect the pH value, the temperature and the water volume of the water in the water tank, and the refrigeration device is connected to the heat exchanger to provide a refrigerant to the heat exchanger.

[0005] Further, the water inlet mechanism includes a water inlet valve with an on-off controller connected to the water tank, the drainage mechanism includes a drainage valve with an on-off controller connected to the water tank, the temperature detection mechanism includes a temperature sensor, and the temperature sensor is signal-connected to the heat exchange circulation pump, the pH detection mechanism includes a pH sensor, and the pH sensor is signal-connected to the on-off controller of the drainage valve, the water volume detection mechanism includes a liquid level switch, and the liquid level switch is signal-connected to the on-off controller of the drainage valve, and the liquid level switch is signal-connected to the on-off controller of the water inlet valve.

[0006] Furthermore, the water tank includes a vacuum water tank portion and a heat exchange water tank portion which are connected to each other, the water ejector and the vacuum circulation pump of the vacuum device are both connected to the vacuum water tank portion, the temperature detection mechanism, the pH detection mechanism, the water volume detection mechanism, the water inlet mechanism and the drainage mechanism of the maintenance device are all arranged on the heat exchange water tank portion, and the heat exchange circulation pump is connected to the heat exchange water tank portion, and the heat exchange circulation pump is connected to the vacuum water tank portion.

[0007] Furthermore, the vacuum device also includes a buffer tank disposed between the reduction furnace and the water ejector, and the buffer tank is connected to the reduction furnace and the water ejector respectively through pipelines.

[0008] Furthermore, the vacuum device also includes a vacuum tank disposed between the buffer tank and the water ejector, and the vacuum tank is connected to the buffer tank and the water ejector respectively through pipelines.

[0009] Furthermore, the buffer tank is provided with a pressure gauge.

[0010] Furthermore, the refrigeration device includes a refrigeration buffer tank, a refrigeration circulation pump and a chiller. The heat exchanger and the refrigeration buffer tank, the refrigeration buffer tank and the refrigeration circulation pump, the refrigeration circulation pump and the chiller, and the chiller and the heat exchanger are all connected by pipelines to form a circulation loop.

[0011] Furthermore, a flow control valve is provided between the refrigeration device and the heat exchanger.

[0012] Furthermore, the maintenance device also includes a post-heat exchange temperature sensor, which is arranged on a pipeline connecting the heat exchanger and the water tank, and the post-heat exchange temperature sensor is connected to a controller signal of the flow control valve.

[0013] As described above, the vacuum pumping system according to the present invention has the following beneficial effects:

[0014] By setting up a water tank, a vacuum device, a maintenance device, and a refrigeration device, the vacuum device is used to pre-heat the reduction furnace, and the vacuum circulation pump continuously sends the water in the water tank to the water ejector. The water ejector generates vacuum suction to vacuum the reduction furnace, and the exhaust gas in the reduction furnace enters the water tank along with the water. The zirconium tetrachloride or hafnium tetrachloride in the exhaust gas dissolves in the water, and then the exhaust gas is discharged from the water tank, and the water remains in the water tank to form a cycle. During the continuous working process, the pH of the water in the water tank decreases and the water temperature rises. At this time, according to the pH value detected by the pH detection mechanism, when the pH value reaches the preset low value, the drainage mechanism is opened, and then according to the water volume detection mechanism, when the water volume in the water tank reaches the preset low value, the drainage valve is closed, and the water inlet valve is opened to replenish water to complete the water replacement process, ensuring that the pH value of the water in the water tank is above the specified value; at the same time, the temperature of the water in the water tank is detected by the temperature detection mechanism, and the heat exchange circulation pump is started to transport the water in the water tank to the heat exchanger, and the water is exchanged with the refrigerant provided by the refrigeration device. After cooling, the water flows back to the water tank, thereby ensuring that the water in the water tank is kept within the specified temperature. The vacuum system of the present invention can continuously and effectively evacuate the reduction furnace through the vacuum device, and ensure that the pH value and temperature in the water tank can be maintained within the specified range through the maintenance device and the refrigeration device, avoiding the unstable operation of the water ejector due to the acidic substances and heat in the exhaust gas, ensuring that the working efficiency of the vacuum device can be stable and reliable, and the vacuuming efficiency is high, and the problem of the equipment being easily corroded can be solved at the same time. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic structural diagram of the vacuum pumping system of the present invention.

[0016] Component number description

[0017] 1 Reduction furnace

[0018] 2 Water tank

[0019] 2a Vacuum water tank

[0020] 2b Heat exchange tank

[0021] 3 Water jets

[0022] 4 Vacuum circulation pump

[0023] 5. Heat exchange circulation pump

[0024] 6 Heat exchanger

[0025] 7 pH Sensor

[0026] 8 Liquid level switch

[0027] 9 Temperature sensor

[0028] 10 Water inlet valve

[0029] 11 Drain valve

[0030] 12 Flow control valve

[0031] 13. Temperature sensor after heat exchange

[0032] 14 Chiller

[0033] 15 Refrigeration circulation pump

[0034] 16 Refrigeration buffer tank

[0035] 17 Buffer tank

[0036] 18 Vacuum tank

[0037] 19. Pressure gauge

[0038] 20. Pressure gauge DETAILED DESCRIPTION

[0039] The following is a description of the implementation of the present invention by means of specific embodiments. Those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.

[0040] It should be noted that the structures, proportions, sizes, etc. drawn in the drawings of this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the present invention, so they have no substantial technical significance. Any modification of the structure, change of the proportional relationship or adjustment of the size should still fall within the scope of the technical content disclosed by the present invention without affecting the effects and purposes that can be achieved by the present invention. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and so on quoted in this specification are only for the convenience of description, and are not used to limit the scope of the implementation of the present invention. The change or adjustment of their relative relationship should also be regarded as the scope of the implementation of the present invention without substantially changing the technical content.

[0041] See also Figure 1The present invention provides a vacuum pumping system for pre-pumping reduction heat in the preparation of sponge zirconium or sponge hafnium, comprising a water tank 2, a vacuum device, a maintenance device, and a refrigeration device, wherein the vacuum device comprises a water ejector 3 and a vacuum circulation pump 4, wherein the water ejector 3, the water tank 2 and the vacuum circulation pump 4 are connected to each other through a pipeline to form a circulation loop, and the water ejector 3 is used to be connected to a reduction furnace 1; the maintenance device comprises a heat exchange circulation pump 5, a heat exchanger 6, a temperature detection mechanism, a pH detection mechanism, a water volume detection mechanism, a water inlet mechanism and a drainage mechanism, wherein the temperature detection mechanism, the pH detection mechanism, the water volume detection mechanism, the water inlet mechanism and the drainage mechanism are all arranged on the water tank 2, wherein the water tank 2 and the heat exchange circulation pump 5, the heat exchange circulation pump 5 and the heat exchanger 6, and the heat exchanger 6 and the water tank 2 are all connected by pipelines to form a circulation loop, wherein the temperature detection mechanism, the pH detection mechanism and the water volume detection mechanism are respectively used to detect the pH value, the temperature and the water volume of the water in the water tank 2, and the refrigeration device is connected to the heat exchanger 6 to provide a refrigerant to the heat exchanger 6.

[0042] The basic working principle of the vacuum system involved in the present invention is: when in use, the water ejector 3 is connected to the reduction furnace 1, the vacuum device is used to perform thermal pre-evacuation on the reduction furnace 1 for preparing sponge zirconium or sponge hafnium, the vacuum circulation pump 4 continuously pumps the water in the water tank 2 to the water ejector 3, and the medium water with a certain pressure enters the water ejector 3 to form a high-speed jet, the high-speed jet carries air to form a gas-liquid mixed flow, and then returns to the water tank 2, the water ejector 3 generates vacuum suction to evacuate the reduction furnace 1, the exhaust gas in the reduction furnace 1 enters the water tank 2 along with the water, the gas-liquid mixed flow is separated in the water tank 2, the zirconium tetrachloride or hafnium tetrachloride in the exhaust gas is dissolved in the water, and then the exhaust gas is discharged from the water tank 2, and the water remains in the water tank 2 to form a cycle. During the continuous operation, zirconium tetrachloride or hafnium tetrachloride is dissolved in the water tank 2 to form corrosive hydrochloric acid, which causes the pH value of the water in the water tank 2 to drop, and the heat carried by the exhaust gas will cause the water temperature to rise. When the pH value drops to a certain value, and the temperature rises to a certain value, it will affect the vacuuming effect of the water ejector 3. At this time, according to the pH value detected by the pH detection mechanism, when the pH value reaches a preset low value, the drainage mechanism is opened, and then according to the water volume detection, when the water volume in the water tank 2 reaches a preset low value, the drainage valve 11 is closed, and the water inlet valve 10 is opened. When the water volume reaches a preset high value, the water inlet valve 10 is closed to complete the water exchange process, ensuring that the pH value of the water in the water tank 2 is above the specified value; at the same time, the temperature of the water in the water tank 2 is detected by the temperature detection mechanism. When the temperature rises to the set value, the heat exchange circulation pump 5 is started to transport the water in the water tank 2 to the heat exchanger 6, and the water is exchanged with the refrigerant provided by the refrigeration device. After cooling, the water flows back to the water tank 2 to form a cycle, thereby ensuring that the water in the water tank 2 is kept within the specified temperature.

[0043] In the present invention, the water ejector 3 is an existing device, and its structure and working principle are known. Specifically, working medium water with a certain pressure is ejected at high speed into its suction chamber through the nozzle of the water ejector 3, and the pressure energy of the water is converted into kinetic energy to form a high-speed jet. The gas in the suction chamber is forced to be carried by the high-speed jet and mixed with it to form a gas-liquid mixed flow that enters the diffuser, thereby reducing the pressure in the suction chamber and forming a vacuum. In the expansion section of the diffuser, the kinetic energy of the mixed jet is converted into pressure energy, the speed is reduced and the pressure is increased, and the gas is further compressed and discharged from the water ejector 3 together with the water.

[0044] The vacuum pumping system involved in the present invention can continuously and effectively vacuum the reduction furnace 1 through a vacuum device, and ensure that the pH value and temperature in the water tank 2 can be maintained within a specified range through a maintenance device and a refrigeration device, thereby avoiding unstable operation of the water ejector 3 due to acidic substances and heat in the exhaust gas, ensuring that the working efficiency of the vacuum device can be stable and reliable, and the vacuum pumping efficiency is high, while solving the problem that the equipment is easily corroded.

[0045] In the present invention, the parts in direct contact with water in the water tank 2, the vacuum device and the maintenance device must have a certain acid corrosion resistance. Preferably, the water tank 2 is welded with PPH material plates or molded with PPH powder, the water ejector 3 is molded with glass fiber reinforced plastics in one step, and the vacuum circulation pump 4 and the heat exchange circulation pump 5 are chemical corrosion-resistant pumps with good corrosion resistance.

[0046] See also Figure 1 The present invention is further described below with reference to a specific embodiment.

[0047] In this embodiment, see Figure 1As a preferred design, in the maintenance device, the water inlet mechanism includes a water inlet valve 10 with an opening and closing controller connected to the water tank 2, the drainage mechanism includes a drainage valve 11 with an opening and closing controller connected to the water tank 2, the temperature detection mechanism includes a temperature sensor 9, and the temperature sensor 9 is connected to the heat exchange circulation pump 5 by signal, and the two are interlocked and controlled, the pH detection mechanism includes a pH sensor 7, and the pH sensor 7 is connected to the opening and closing controller of the drainage valve 11 by signal, and the two are interlocked and controlled, the water volume detection mechanism includes a liquid level switch 8, which detects the water volume by detecting the liquid level height, the liquid level switch 8 is connected to the opening and closing controller of the drainage valve 11 by signal, and the two are interlocked and controlled, and the liquid level switch 8 is also connected to the opening and closing controller of the water inlet valve 10 by signal, and the two are interlocked and controlled. In this way, when the maintenance device is working, when the pH value of the water reaches the set low value, the pH sensor 7 can automatically control the action of the drain valve 11, when the liquid level in the water tank 2 reaches the set value, the liquid level switch 8 automatically controls the action of the water inlet valve 10 or the drain valve 11, and when the temperature reaches the set value, the temperature sensor 9 automatically controls the opening and closing of the heat exchange circulation pump 5, and the degree of automation is high. Of course, in other embodiments, a central controller can also be used, and the pH sensor 7, the liquid level switch 8, the temperature sensor 9, the opening and closing controller of the water inlet valve 10, the opening and closing controller of the drain valve 11, and the heat exchange circulation pump 5 are all connected to the central controller to achieve automatic control.

[0048] In this embodiment, see Figure 1 As a preferred design, the water tank 2 is of a split type, including a vacuum water tank portion 2a and a water exchange tank portion 2b, the two are connected by a pipeline, the water ejector 3 and the vacuum circulation pump 4 of the vacuum device are both connected to the vacuum water tank portion 2a, the temperature detection mechanism, pH detection mechanism, water volume detection mechanism, water inlet mechanism and drainage mechanism of the maintenance device are all arranged on the water exchange tank portion 2b, and the heat exchange circulation pump 5 is connected to the water exchange tank portion 2b, and the heat exchanger 6 is connected to the vacuum water tank portion 2a. The water tank 2 adopts this split type. When it is necessary to evacuate multiple reduction furnaces 1 at the same time, each reduction furnace 1 is equipped with a vacuum device. At this time, the water tank 2 includes multiple vacuum water tank parts 2a and a heat exchange tank part 2b. One vacuum water tank part 2a is used in conjunction with a vacuum device to form a vacuum unit. All vacuum water tank parts 2a are connected to the heat exchange tank part 2b. A maintenance device is used in conjunction with a heat exchange tank part 2b to form a maintenance unit for water exchange and heat exchange. In this way, it is possible to use a maintenance device in conjunction with multiple vacuum devices to evacuate multiple reduction furnaces 1 at the same time, simplify the mechanism, and reduce production costs. When there is only one reduction furnace 1, the water tank 2 of the vacuum system can be an integrated type.

[0049] In this embodiment, see Figure 1As a preferred design, the vacuum device also includes a buffer tank 17 disposed between the reduction furnace 1 and the water ejector 3. The buffer tank 17 is connected to the reduction furnace 1 and the water ejector 3 through pipelines, and an isolation cut-off valve (not shown in the drawings) is provided on the pipeline between the buffer tank 17 and the reduction furnace 1. The exhaust gas from the reduction furnace 1 is buffered and cooled in the buffer tank 17 to separate steam and water. When the vacuum system fails or stops, the isolation cut-off valve is closed to prevent the water generated by the steam and water separation in the buffer tank 17 from flowing back into the reduction furnace 1 due to negative pressure, thereby protecting the reduction furnace 1. Further, the vacuum device also includes a vacuum tank 18 disposed between the buffer tank 17 and the water ejector 3. The vacuum tank 18 is connected to the buffer tank 17 and the water ejector 3 through pipelines, and the vacuum tank 18 and the buffer tank 17 can both buffer the suction pressure on the reduction furnace 1. In addition, a pressure gauge 19 is provided on the buffer tank 17 and on the pipeline between the buffer tank 17 and the reduction furnace 1 to monitor the vacuum effect.

[0050] In this embodiment, see Figure 1 The refrigeration device includes a refrigeration buffer tank 16, a refrigeration circulation pump 15 and a chiller 14. The refrigerant is water. The heat exchanger 6 and the refrigeration buffer tank 16, the refrigeration buffer tank 16 and the refrigeration circulation pump 15, the refrigeration circulation pump 15 and the chiller 14, and the chiller 14 and the heat exchanger 6 are all connected by pipelines to form a refrigeration cycle. The chiller 14 can be a conventional device, specifically, an air-cooled chiller 14, including an air-cooled screw compressor, a condenser, an evaporator and an expansion valve, etc. The refrigeration buffer tank 16 plays the role of buffering the refrigerant water.

[0051] In this embodiment, see Figure 1 As a preferred design, a flow control valve 12 is provided between the refrigeration device and the heat exchanger 6, which is used to control the amount of refrigerant flowing to the heat exchanger 6. Specifically, the flow control valve 12 is arranged on the pipeline between the chiller 14 and the heat exchanger 6. Further, the maintenance device also includes a post-heat exchange temperature sensor 13, which is arranged on the pipeline connecting the heat exchanger 6 and the water tank 2, and the post-heat exchange temperature sensor 13 is connected to the controller signal of the flow control valve 12, so that the opening degree of the flow control valve 12 is automatically controlled according to the temperature detected by the post-heat exchange temperature sensor 13, so as to control the amount of refrigerant entering the heat exchanger 6, ensure the cooling effect of the heat exchanger 6 on the water, and thus control the temperature of the water in the water tank 2.

[0052] When the vacuum system in this embodiment is used to vacuumize the reduction furnace 1, the hot pre-exhaust gas from the reduction furnace 1 first enters the buffer tank 17, then enters the vacuum tank 18, and then enters the vacuum unit water tank 2 through the water ejector 3 at high speed. When the maintenance device is not working, the heat brought by the exhaust gas can gradually increase the water temperature of the water tank 2 to above 40°C. At the same time, the zirconium tetrachloride or hafnium tetrachloride in the exhaust gas dissolves in water to form hydrochloric acid, which will gradually reduce the pH value to below 2. Due to the increase in water temperature, the saturated vapor pressure of water increases, and the partial pressure of hydrogen chloride in the water, the vacuum degree decreases when the water ejector 3 forms a vacuum, reducing the vacuum effect. By cooling the water in the water tank 2 and regularly changing the water through the maintenance device, the water temperature can be maintained below 20°C, the pH value can be maintained above the specified value, and the vacuum degree can be effectively improved. The generated vacuum degree can be maintained below 88kPa for a long time, and the hot pre-exhaust is more thorough, improving the safety of the subsequent reduction process and the product quality, and shortening the hot pre-exhaust working time. In addition, by recycling water and changing water regularly, the amount of fresh water can be reduced, so that wastewater discharge can be reduced, which has a good energy-saving and emission-reduction effect and good environmental performance. At the same time, the corrosion problem of vacuum system equipment in the hot pre-pumping process of sponge zirconium or sponge hafnium preparation can be solved.

[0053] In summary, the present invention effectively overcomes various shortcomings in the prior art and has high industrial utilization value.

[0054] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed by the present invention shall still be covered by the claims of the present invention.

Claims

1. A vacuum pumping system for pre-evacuation of reduction heat in the preparation of zirconium sponge or hafnium sponge, characterized in that: The invention comprises a water tank (2), a vacuum device, a maintenance device, and a refrigeration device. The vacuum device comprises a water ejector (3) and a vacuum circulation pump (4). The water ejector (3), the water tank (2), and the vacuum circulation pump (4) are connected to each other via a pipeline to form a circulation loop. The water ejector (3) is used to be connected to the reduction furnace (1). The maintenance device comprises a heat exchange circulation pump (5), a heat exchanger (6), a temperature detection mechanism, a pH detection mechanism, a water volume detection mechanism, a water inlet mechanism, and a water discharge mechanism. The temperature detection mechanism, the pH detection mechanism, the water volume detection mechanism, the water inlet mechanism, and the water discharge mechanism are all arranged on the water tank (2). The water tank (2) and the heat exchange circulation pump (5), between the heat exchange circulation pump (5) and the heat exchanger (6), and between the heat exchanger (6) and the water tank (2) are all connected by pipelines; the temperature detection mechanism, the pH detection mechanism and the water volume detection mechanism are used to detect the pH value, temperature and water volume of the water in the water tank (2), respectively; the refrigeration device is connected to the heat exchanger (6) and is used to provide refrigerant to the heat exchanger (6); the water inlet mechanism includes a water inlet valve (10) connected to the water tank (2) and having an on-off controller; the water discharge mechanism includes a water discharge valve (11) connected to the water tank (2) and having an on-off controller; the temperature detection mechanism includes a temperature sensor (9), and the temperature sensor (9) is connected to the heat exchange circulation pump ( 5), the pH detection mechanism comprises a pH sensor (7), and the pH sensor (7) is signal-connected to the on / off controller of the drain valve (11), the water volume detection mechanism comprises a liquid level switch (8), and the liquid level switch (8) is signal-connected to the on / off controller of the drain valve (11), and the liquid level switch (8) is signal-connected to the on / off controller of the water inlet valve (10); the water tank (2) comprises a vacuum water tank portion (2a) and a heat exchange water tank portion (2b) which are connected to each other, the water ejector (3) and the vacuum circulation pump (4) of the vacuum device are both connected to the vacuum water tank portion (2a), the temperature detection mechanism, the pH detection mechanism, and the water volume detection mechanism of the maintenance device The mechanism, water inlet mechanism and drainage mechanism are all arranged on the heat exchange tank part (2b), and the heat exchange circulation pump (5) is connected to the heat exchange tank part (2b), and the heat exchanger (6) is connected to the vacuum water tank part (2a); there are multiple vacuum devices, and each vacuum device is used to be connected to and used in conjunction with a reduction furnace (1); the water tank (2) includes multiple vacuum water tank parts (2a) and a heat exchange tank part (2b); a vacuum water tank part (2a) is used in conjunction with a vacuum device to form a vacuum unit; all vacuum water tank parts (2a) are connected to the heat exchange tank part (2b); a maintenance device is used in conjunction with a heat exchange tank part (2b) to form a maintenance unit.

2. The vacuum pumping system according to claim 1, characterized in that: The vacuum device further comprises a buffer tank (17) disposed between the reduction furnace (1) and the water ejector (3); the buffer tank (17) is connected to the reduction furnace (1) and the water ejector (3) respectively through pipelines, and an isolation shut-off valve is provided on the pipeline between the buffer tank (17) and the reduction furnace (1).

3. The vacuum pumping system according to claim 2, characterized in that: The vacuum device further comprises a vacuum tank (18) arranged between the buffer tank (17) and the water ejector (3); the vacuum tank (18) is connected to the buffer tank (17) and the water ejector (3) respectively through pipelines.

4. The vacuum pumping system according to claim 2, characterized in that: The buffer tank (17) is provided with a pressure gauge (19).

5. The vacuum pumping system according to claim 1, characterized in that: The refrigeration device comprises a refrigeration buffer tank (16), a refrigeration circulation pump (15) and a water chiller (14); the heat exchanger (6) and the refrigeration buffer tank (16), the refrigeration buffer tank and the refrigeration circulation pump (15), the refrigeration circulation pump (15) and the water chiller (14), and the water chiller (14) and the heat exchanger (6) are all connected by pipelines to form a circulation loop.

6. The vacuum system according to claim 1, characterized in that: A flow control valve (12) is provided between the refrigeration device and the heat exchanger (6).

7. The vacuum pumping system according to claim 6, characterized in that: The maintenance device further comprises a post-heat exchange temperature sensor (13), wherein the post-heat exchange temperature sensor (13) is arranged on a pipeline connecting the heat exchanger (6) and the water tank (2), and the post-heat exchange temperature sensor (13) is connected to a controller signal of the flow control valve (12).

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