Photolithography apparatus and substrate transfer method therein

Abstract

The present invention discloses a photolithography apparatus and a substrate transfer method therein. The photolithography apparatus includes a workpiece stage and a substrate transfer device for transferring substrates. The substrate transfer device includes a substrate transfer fork, which includes a fork arm, a suction assembly, and a drive assembly. The fork arm is provided with at least two suction assemblies. This configuration of multiple suction assemblies on the fork arm allows for the transfer of multiple substrates without increasing the length of the fork arm, effectively improving the productivity of the photolithography apparatus.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography, and in particular to a photolithography device and a substrate transmission method therein. Background Art

[0002] In many semiconductor devices such as lithography machines, substrates need to be handed over through a transfer station when they are transferred to the exposure station. Generally, a transfer station needs to be set up in front of the exposure station to transfer the substrate to the exposure position. In existing lithography machines, the substrate transfer fork mostly transfers 1500mm*1850mm substrates and does not have the ability to transfer two 1500mm*925mm substrates. Due to the current level of technology, the evaporation machine on the production line can only process substrates with a maximum size of 1500mm*925mm. In order to improve the overall efficiency of the production line, the lithography machine needs to be able to directly expose 1500mm*925mm substrates.

[0003] In addition, due to differences in demand or process requirements, the production line and the roller table only transfer a single 1500mm*925mm substrate each time, which requires the substrate transfer plate fork to be able to transfer two 1500mm*925mm substrates to the workpiece table in two batches. Therefore, it is necessary for the substrate transfer plate fork to be able to transfer two 1500mm*925mm substrates to the workpiece table for exposure. In order to be able to transfer two substrates, if the existing technical solution is used, the length of the plate fork arm can only be increased, which makes the total length of the cantilever longer; due to spatial size constraints and high movement speed, the plate fork cannot be designed with a leveling mechanism, and the far end of the cantilever is greatly deformed, making it difficult to ensure the consistency of the far end suction cup height; moreover, the lengthened plate fork arm will collide with the workpiece table, which will seriously damage the workpiece table or the plate fork itself.

[0004] Therefore, it is necessary to propose a solution for simultaneously conveying two substrates without increasing the length of the plate fork arm. Summary of the Invention

[0005] The purpose of the present invention is to provide a lithography device and a substrate transmission method therein, which is used to solve the problem in the prior art that the solution of transferring two substrates by increasing the length of the plate fork arm will collide with the workpiece table and seriously damage the workpiece table or the plate fork itself.

[0006] In order to solve the above technical problems, the present invention provides a photolithography apparatus, comprising a workpiece stage and a substrate conveying device, wherein the substrate conveying device is used to convey a substrate, and the substrate conveying device comprises a substrate conveying plate fork;

[0007] The substrate transport plate fork comprises a plate fork arm, an adsorption component and a driving component;

[0008] The driving assembly is arranged on the plate fork arm, the adsorption assembly is arranged on the driving assembly, the adsorption assembly is used to adsorb or release the substrate, and the driving assembly is used to drive the adsorption assembly so that the adsorption assembly is located at the adsorption position or the avoidance position. When the adsorption assembly is located at the adsorption position, the adsorption assembly adsorbs the substrate, and when the adsorption assembly is located at the avoidance position, the adsorption assembly releases the substrate;

[0009] The number of the adsorption components is at least two, and at least two of the adsorption components are spaced apart and arranged on the plate fork arm, and each of the adsorption components or at least two adsorption components cooperate to adsorb or release one substrate;

[0010] Each driving component is used to drive a corresponding adsorption component.

[0011] Optionally, the workpiece table has several workstations, and the substrate transfer plate fork is used to transfer the substrate to the corresponding workstation on the workpiece table, or to transfer the substrate away from the workpiece table, or when the substrate is not located at the corresponding workstation, to move the substrate so that the substrate can be transferred to the corresponding workstation.

[0012] Optionally, the number of the plate fork arms is two, and the adsorption assembly is arranged along the Y direction, which is the same as the extension direction of the plate fork arms.

[0013] Optionally, the driving assembly includes a limit plate, a limit screw and a lifting cylinder;

[0014] The limit plate is arranged on the mounting plate, and the limit screw is arranged on the limit plate to adjust the extension distance of the lifting cylinder;

[0015] Optionally, the adsorption assembly includes a suction cup, a suction cup seat and an air path connector;

[0016] The suction cup seat is arranged on the slider of the lifting cylinder and moves up and down along with the slider;

[0017] The suction cup is arranged on the suction cup seat and is used to absorb the substrate;

[0018] The air path connector is arranged on the suction cup seat and is used to provide vacuum adsorption for the suction cup.

[0019] Optionally, the adsorption assembly includes a first front substrate adsorption assembly;

[0020] The first front substrate adsorption assembly further includes an interlock sensor;

[0021] The interlock sensor is used to determine whether the first front substrate adsorption assembly enters the workpiece table. When the side wall of the workpiece table is detected, the substrate transfer fork stops moving in the X direction, and the X direction is perpendicular to the extension direction of the fork arm.

[0022] Optionally, the adsorption assembly further includes a second front substrate adsorption assembly;

[0023] The second front substrate adsorption assembly further includes an anti-collision sensor;

[0024] The anti-collision sensor is used to determine whether the base transport fork is aligned with the fork slot position of the workpiece table, and when misalignment is detected, the base transport fork stops moving in the Y direction, and the Y direction is the same as the extension direction of the fork arm.

[0025] Optionally, the number of the anti-collision sensors is two;

[0026] The two anti-collision sensors are respectively arranged on both sides of the plate fork arm. When any one of the two anti-collision sensors is triggered, it is determined that the base conveying plate fork is not aligned with the plate fork slot position of the workpiece table.

[0027] Based on the same inventive concept, the present invention further provides a substrate transfer method in a lithography apparatus, including a substrate loading step of transferring the substrate from a loading stage to a workpiece stage, the loading step comprising:

[0028] The substrate transfer fork absorbs a plurality of substrates and places the plurality of substrates on the upper platen;

[0029] The substrate transfer plate fork moves to the workpiece table station;

[0030] The substrate transfer fork releases a plurality of substrates;

[0031] The substrate conveying plate fork returns to the upper plate platform;

[0032] In each of the loading steps, one substrate or at least two substrates or substrates less than the number of stations in the workbench are transferred, and only the adsorption components involved in adsorbing the substrates are located at the adsorption stations, and all other adsorption components are located at the avoidance stations.

[0033] Optionally, the step of placing the board further includes:

[0034] If there is a substrate to be adjusted among the substrates on the workpiece stage, a secondary adjustment is performed, and the substrate to be adjusted is a substrate that has not been transferred to a corresponding workstation.

[0035] Optionally, the secondary adjustment includes:

[0036] The substrate transfer plate fork drives the substrate to be adjusted to move between the workpiece positions of the workpiece table to transfer the substrate to be adjusted to the corresponding workstation on the workpiece table;

[0037] Wherein, during the secondary adjustment process, except for the adsorption component for adsorbing the substrate to be adjusted which is located at the adsorption station, all other adsorption components on the substrate conveying plate fork are located at the avoidance station.

[0038] Optionally, at least two substrates are transferred in each of the loading steps;

[0039] Wherein, in each of the board loading steps, all the adsorption components on the substrate transfer plate fork are extended to adsorb all the substrates and transfer all the substrates to the corresponding stations on the workpiece table.

[0040] Optionally, when the substrate includes a first substrate and a second substrate, the step of placing a substrate includes:

[0041] The front substrate adsorption component of the substrate transfer plate fork extends to adsorb the first substrate, and the rear substrate adsorption component extends to adsorb the second substrate;

[0042] The substrate transfer plate fork moves to the workpiece table station;

[0043] The front substrate adsorption assembly and the rear substrate adsorption assembly release the first substrate and the second substrate, the first substrate is transferred to the front substrate station of the workpiece stage, and the second substrate is transferred to the rear substrate station of the workpiece stage;

[0044] The front substrate adsorption assembly and the rear substrate adsorption assembly are retracted;

[0045] The substrate transfer plate fork returns to the roller table.

[0046] Optionally, only one substrate is transferred in each loading step;

[0047] Among them, during each loading step, only the adsorption component on the substrate transfer plate fork that places the substrate extends to adsorb the current substrate, and all other adsorption components retract and transfer the substrate to the corresponding workstation on the workpiece table.

[0048] Optionally, when the substrate includes a first substrate and a second substrate, the step of placing a substrate includes:

[0049] The rear substrate adsorption component of the substrate transfer plate fork is retracted, and the front substrate adsorption component is extended to adsorb the first substrate on the front substrate station of the roller stage;

[0050] The substrate transfer plate fork moves to the workpiece table station;

[0051] The front substrate adsorption assembly releases the first substrate, the first substrate is transferred to the front substrate station of the workpiece table, and the second substrate is transferred to the front substrate station of the roller table;

[0052] The front substrate adsorption assembly is retracted;

[0053] The substrate conveying plate fork returns to the roller table;

[0054] The front substrate adsorption assembly extends to adsorb the second substrate;

[0055] The substrate transfer plate fork moves to drive the front substrate adsorption assembly to move to the rear substrate station on the workpiece table;

[0056] The front substrate adsorption assembly releases the second substrate, and the second substrate is transferred to the rear substrate station on the workpiece table;

[0057] The front substrate adsorption assembly is retracted;

[0058] The substrate transfer plate fork returns to the roller table.

[0059] Optionally, when the substrate includes a first substrate and a second substrate, the step of placing a substrate includes:

[0060] The front substrate adsorption component of the substrate transfer plate fork is retracted, and the rear substrate adsorption component is extended to adsorb the first substrate on the rear substrate station of the roller stage;

[0061] The substrate transfer plate fork moves to the workpiece table station;

[0062] The rear substrate adsorption assembly releases the first substrate, and the first substrate is transferred to the rear substrate station of the workpiece stage;

[0063] The rear substrate adsorption assembly is retracted;

[0064] The substrate transfer plate fork moves to the position between the front substrate adsorption assembly and the rear substrate station on the workpiece table, and the second substrate is transferred to the rear substrate station on the roller table;

[0065] The front substrate adsorption component extends out and adsorbs the first substrate;

[0066] The substrate transfer plate fork moves to the workpiece table station;

[0067] The front substrate adsorption assembly releases the first substrate, and the first substrate is transferred from the rear substrate station on the workpiece table to the front substrate station on the workpiece table;

[0068] The front substrate adsorption assembly is retracted;

[0069] The substrate conveying plate fork returns to the roller table;

[0070] The rear substrate adsorption assembly extends to adsorb the second substrate;

[0071] The substrate transfer plate fork moves to the workpiece table station;

[0072] The rear substrate adsorption assembly releases the second substrate, and the second substrate is transferred to the rear substrate station on the workpiece table;

[0073] The rear substrate adsorption assembly is retracted;

[0074] The substrate transfer plate fork returns to the roller table.

[0075] Optionally, the substrate transfer method further includes a lowering step of transferring the substrate from the workpiece stage to the lowering stage, the lowering step including:

[0076] The base conveyor plate fork moves to the workpiece table station;

[0077] The substrate transfer plate fork absorbs a plurality of the substrates;

[0078] The substrate conveying plate fork returns to the lower plate platform;

[0079] The adsorption component of the substrate transfer plate fork releases a plurality of the substrates, and the plurality of the substrates are transferred to the lower plate;

[0080] The production line sequentially removes the plurality of substrates from the lower platen.

[0081] Optionally, during the movement of the substrate transfer fork to the workpiece table station, the interlocking sensor determines whether the first front substrate adsorption assembly enters the workpiece table. When the side wall of the workpiece table is detected, the substrate transfer fork stops moving in the X direction, and the X direction is perpendicular to the extension direction of the fork arm.

[0082] Optionally, during the movement of the substrate transport fork to the workpiece table station, the anti-collision sensor determines whether the substrate transport fork is aligned with the fork slot position of the workpiece table, and when misalignment is detected, the substrate transport fork stops moving in the Y direction, and the Y direction is the same as the extension direction of the fork arm.

[0083] Compared with the prior art, the present invention has the following beneficial effects:

[0084] 1. The photolithography apparatus disclosed herein includes a workpiece stage and a substrate transport device for transporting substrates. The substrate transport device includes a substrate transport fork, which includes a fork arm, a suction assembly, and a drive assembly. The fork arm is provided with at least two suction assemblies. This configuration of multiple suction assemblies on the fork arm allows for transporting multiple substrates without increasing the length of the fork arm, effectively improving the productivity of the photolithography apparatus.

[0085] 2. Each group of adsorption components is correspondingly provided with a driving component, that is, each adsorption component can be raised and lowered independently, and the suction cup seat of each adsorption component on the substrate transfer plate fork can be raised and lowered independently. For example, when there is already a substrate at the front substrate station on the workpiece table, and the rear substrate adsorption component transfers the substrate from the rear substrate station on the roller table to the rear substrate station on the workpiece table, the suction cup seat of the front substrate adsorption component can be retracted so that the upper surface of the suction cup is lower than the lower surface of the substrate, thereby effectively preventing the suction cup from scratching the substrate and effectively improving the safety of the handover.

[0086] 3. An interlocking sensor is added to the first front substrate adsorption assembly to determine whether the first front substrate adsorption assembly enters the workpiece table, and when the side wall of the workpiece table is detected, the substrate transfer plate fork stops moving in the X direction, further improving the safety of the handover.

[0087] 4. An anti-collision sensor is added to the second front substrate adsorption assembly to determine whether the substrate transport fork is aligned with the fork slot of the workpiece stage. If misalignment is detected, the substrate transport fork stops its Y-direction movement. For example, when the anti-collision sensor is triggered, it indicates that the fork slot of the workpiece stage and the substrate transport fork are not aligned, and a collision may occur. The triggering signal of the anti-collision sensor can be fed back to the control software of the substrate transport system, at which point the Y-axis of the motion platform immediately stops Y-direction movement, preventing the substrate transport fork from colliding with the workpiece stage, thereby further improving the safety of the handover.

[0088] The present invention also provides a substrate transfer method in a lithography apparatus, which belongs to the same inventive concept as the lithography apparatus and thus has the same beneficial effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0089] Figure 1 A schematic structural diagram of a substrate transfer fork in a lithography apparatus according to an embodiment of the present invention;

[0090] Figure 2 Schematic diagram of the structure of the first front substrate adsorption component;

[0091] Figure 3 Schematic diagram of the structure of the second front substrate adsorption assembly;

[0092] Figure 4 Schematic diagram of the structure of the rear substrate adsorption component;

[0093] Figure 5 This is a schematic diagram of the workpiece table fork groove and the plate fork arm when there is no interference;

[0094] Figure 6 This is a schematic diagram of the interference state between the workpiece table fork groove and the plate fork arm;

[0095] Figure 7 This is a schematic diagram of the base transfer plate fork interfacing with the workpiece table;

[0096] Figure 8 A schematic structural diagram of a photolithography apparatus proposed in an embodiment of the present invention;

[0097] Figure 9 It is a structural diagram of the motion platform;

[0098] Figure 10 A schematic flow chart of a substrate transfer method in a lithography apparatus according to another embodiment of the present invention;

[0099] Figure 11 Schematic diagram of the process of simultaneously transferring two substrates to designated positions on the workpiece table;

[0100] Figure 12 A schematic diagram of the process of simultaneously transferring two substrates to designated workstations on a workpiece table;

[0101] Figure 13 This is a schematic diagram of the process of transferring two substrates from the substrate station behind the roller table to the workpiece table in two steps;

[0102] Figure 14 This is a schematic diagram of the process of transferring two substrates from the substrate station behind the roller table to the workpiece table in two steps;

[0103] Figure 15 This is a schematic diagram of the process of transferring two substrates from the substrate station in front of the roller table to the workpiece table in two steps;

[0104] Figure 16 Schematic diagram of the process of simultaneously transferring two vertical substrates to the workpiece table;

[0105] Figure 17 Schematic diagram of the process of simultaneously transferring four substrates to the workpiece table;

[0106] Figure 18 Schematic diagram of the process of unloading the plate;

[0107] Among them: 10-motion platform, 20-substrate transfer plate fork, 20-1-mounting base plate, 20-2-support, 20-3-plate fork arm, 20-4-rear substrate adsorption assembly, 20-5-first front substrate adsorption assembly, 20-6-second front substrate adsorption assembly, 20-7-mounting plate, 20-8-limiting plate, 20-9-limiting screw, 20-10-lifting cylinder, 20-11-suction cup, 20-12-suction cup seat, 20-13-air line connector, 20-5-1-interlocking sensor, 20-5-2-sensor pad, 20-6-2-anti-collision sensor, 30-roller table, 30-1-air floating block, 30-2-roller, 40-transition air floating block, 50-workpiece table. DETAILED DESCRIPTION

[0108] The following is a more detailed description of the specific embodiments of the present invention with reference to schematic diagrams. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are not to exact scale, and are only used for the purpose of conveniently and clearly illustrating the embodiments of the present invention.

[0109] In the description of the present invention, it should be understood that the terms "center", "up", "down", "left", "right", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation on the present invention.

[0110] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly defined. Please refer to Figures 1 to 9An embodiment of the present invention provides a photolithography apparatus comprising a workpiece stage 50 and a substrate conveying device, wherein the substrate conveying device is used to convey a substrate and comprises a substrate conveying fork 20. The substrate conveying fork 20 comprises a fork arm 20-3, an adsorption assembly, and a drive assembly. The drive assembly is disposed on the fork arm 20-3, the adsorption assembly is disposed on the drive assembly, the adsorption assembly is used to adsorb or release the substrate, and the drive assembly is used to drive the adsorption assembly so that the adsorption assembly is located at an adsorption station or an avoidance station. When the adsorption assembly is located at the adsorption station, the adsorption assembly adsorbs the substrate. When the adsorption assembly is located at the avoidance station, the adsorption assembly releases the substrate. There are at least two adsorption assemblies, and at least two adsorption assemblies are spaced apart on the fork arm 20-3. Each adsorption assembly or at least two adsorption assemblies cooperate to adsorb or release one substrate. Each drive assembly is used to drive a corresponding adsorption assembly.

[0111] Unlike the prior art, the photolithography apparatus proposed in the present invention includes a workpiece stage and a substrate transfer device for transferring substrates. The substrate transfer device includes a substrate transfer fork, which includes a fork arm, a suction assembly, and a drive assembly. The fork arm 20-3 is provided with at least two suction assemblies. This configuration of multiple suction assemblies on the fork arm 20-3 allows for the transfer of multiple substrates without increasing the length of the fork arm 20-3, effectively improving the productivity of the photolithography apparatus.

[0112] Please refer to Figure 8 , the workpiece table has a plurality of workstations, and the substrate transfer plate fork is used to transfer the substrate to the corresponding workstation on the workpiece table, or to transfer the substrate from the workpiece table, or to move the substrate when the substrate is not located at the corresponding workstation so as to transfer the substrate to the corresponding workstation. In this embodiment, the workpiece table has two workstations, namely, a rear substrate workstation close to the substrate transfer device and a front substrate workstation away from the substrate transfer device. It can be understood that in other embodiments, the workpiece table can also have more workstations, which is not limited here. When there are other numbers of workstations, the way the substrate transfer device transfers the substrate is similar to the case when there are two workstations on the workpiece table, and will not be described in detail here.

[0113] Specifically, please refer to Figure 1In an embodiment of the present invention, two adsorption assemblies are spaced apart on the plate fork arm 20-3. The two adsorption assemblies are disposed on the plate fork arm 20-3 at one end away from the connecting mechanism and at the other end near the connecting mechanism, and the extension direction of the adsorption assemblies is the same as the extension direction of the plate fork arm 20-3. The adsorption assembly includes a connection unit and an adsorption assembly. The connection unit is used to connect the adsorption assembly to the plate fork arm 20-3, and the adsorption assembly is used to adsorb or release the substrate. It should be noted that for the convenience of explaining the technical solution of this application, the embodiments of the present invention are described as follows: two adsorption assemblies are disposed on each plate fork arm 20-3. In other embodiments, other numbers of adsorption assemblies may be disposed on each plate fork arm 20-3. For example, three, four, or even more adsorption assemblies may be disposed on each plate fork arm 20-3 at intervals. This is not a limitation and can be selected based on actual needs. It will be understood by those skilled in the art that the multiple adsorption assemblies on each plate fork arm 20-3 may be disposed at equal or unequal intervals. This is not a limitation. The adsorption component is used to adsorb the substrate. The corresponding relationship between the substrate and the adsorption component can be that two adsorption components adsorb one substrate, or one adsorption component adsorbs a corresponding substrate, or more adsorption components adsorb one substrate, which will not be elaborated here.

[0114] For further information, please refer to Figures 2 to 4 Each adsorption assembly is provided with a driving assembly, and the driving assembly of each adsorption assembly drives the corresponding adsorption assembly to move up and down. Each group of adsorption assemblies is provided with a corresponding driving assembly, that is, each adsorption assembly can be raised and lowered independently, and the suction cup seat 20-12 of each adsorption assembly on the substrate transfer plate fork 20 can be raised and lowered independently. Two 1500mm*925mm substrates can be simultaneously transferred to the designated workstation on the workpiece table, such as Figure 11 and Figure 12 As shown; you can also transfer two 1500mm*925mm substrates to the designated workstations on the workpiece table in two batches, such as Figure 13 and Figure 14 For example, when there is already a substrate at the front substrate station on the workpiece table, and the rear substrate adsorption assembly 20-4 transfers the substrate from the rear substrate station on the roller table 30 to the rear substrate station on the workpiece table, the suction cup seat 20-12 of the front substrate adsorption assembly can be retracted, so that the upper surface of the suction cup 20-11 is lower than the lower surface of the substrate (i.e., the avoidance position), thereby effectively preventing the suction cup 20-11 from scratching the substrate, and effectively improving the safety of the handover.

[0115] In an embodiment of the present invention, each of the adsorption components is provided with a drive component. In other embodiments, the number of the drive component can also be only one, and the drive component is used to simultaneously drive all of the adsorption components to perform lifting movements. This structure cannot achieve the individual control of the lifting movement of a certain adsorption component, but it is low in cost and easy to implement. It can be implemented as an alternative solution in some applications where it is not necessary to individually control each adsorption component. Whether to choose to provide a drive component on each of the adsorption components or to choose to have only one drive component can be selected according to actual needs and will not be elaborated here.

[0116] For details, please refer to Figures 2 to 4 The adsorption assembly, the drive assembly, and the plate fork arm 20-3 are connected via a mounting plate 20-7. The mounting plate 20-7 is disposed on the plate fork arm. The drive assembly includes a limit plate 20-8, a limit screw 20-9, and a lifting cylinder 20-10. The adsorption assembly includes a suction cup 20-11, a suction cup seat 20-12, and an air line connector 20-13. The mounting plate 20-7 is disposed on the plate fork arm 20-3. The limit plate 20-8 is disposed on the mounting plate 20-7. The limit screw 20-9 is disposed on the limit plate 20-8 to adjust the extension distance of the lifting cylinder 20-10. The lifting cylinder 20-10 is disposed on the mounting plate 20-7. The suction cup seat 20-12 is disposed on the slider of the lifting cylinder 20-10 and moves up and down with the slider. The suction cup 20-11 is arranged on the suction cup seat 20-12 and is used to adsorb the substrate. The air path connector 20-13 is arranged on the suction cup seat 20-12 and is used to provide vacuum adsorption for the suction cup 20-11.

[0117] Please continue to refer to Figures 2 to 4 In the embodiment of the present invention, each adsorption assembly is provided with three suction cups 20-11, and the three suction cups 20-11 are sequentially and closely arranged on the suction cup seat 20-12. In other embodiments, the number of suction cups 20-11 can also be one, two, four, or even more. The specific number can be selected according to actual needs and is not limited here. It will be understood by those skilled in the art that the size of the suction cup 20-11 can be adjusted according to actual needs, and no further details will be given.

[0118] Furthermore, the two adsorption components are a front substrate adsorption component and a rear substrate adsorption component 20-4. The front substrate adsorption component is arranged on the end of the plate fork arm 20-3 away from the connecting mechanism, and the rear substrate adsorption component 20-4 is arranged on the end of the plate fork arm 20-3 close to the connecting mechanism.

[0119] Please refer to Figure 4 The structure of the rear substrate adsorption assembly 20-4 is as follows: the mounting plate 20-7 is fixed on the plate fork arm 20-3, and plays a basic supporting role in the adsorption assembly; the limit plate 20-8 is fixed on the mounting plate 20-7, and the limit screw 20-9 is fixed on the limit plate 20-8, which plays a role in adjusting the extension distance of the lifting cylinder 20-10, ensuring that the suction cup 20-11 of the adsorption assembly contacts the lower surface of the substrate and smoothly adsorbs the substrate; the base of the lifting cylinder 20-10 is fixed on the adsorption assembly mounting plate 20-7, and the suction cup seat 20-12 is fixed on the slider of the lifting cylinder 20-10, and moves up and down with the cylinder slider; the suction cup 20-11 is fixed on the suction cup seat 20-12, and is used to adsorb the substrate; the air path connector 20-13 is fixed on the suction cup seat 20-12, and is used to provide vacuum adsorption for the suction cup 20-11.

[0120] Preferably, please refer to Figure 2 The front substrate adsorption assembly includes a first front substrate adsorption assembly 20-5. The first front substrate adsorption assembly 20-5 also includes an interlock sensor 20-5-1. The interlock sensor 20-5-1 is used to determine whether the first front substrate adsorption assembly 20-5 has entered the workpiece stage. When the interlock sensor 20-5-1 detects the side wall of the workpiece stage, the substrate transfer fork 20 stops moving in the X direction, where the X direction is perpendicular to the extension direction of the fork arm 20-3.

[0121] Please refer to Figure 2 and Figure 7 The structure of the first front substrate adsorption assembly 20-5 is basically the same as that of the rear substrate adsorption assembly 20-4, except that an interlocking sensor 20-5-1 and a sensor pad 20-5-2 are installed on the suction cup seat 20-12. When the substrate conveying plate fork 20 moves to the handover station with the workpiece table, the interlocking sensor 20-5-1 detects the side wall of the workpiece table. The interlocking sensor 20-5-1 triggers a signal and feeds back to the control software of the substrate transmission system. At this time, the X-axis of the motion platform 10 cannot move in the X direction, playing the role of station interlocking. The interlocking sensor 20-5-1 in the first front substrate adsorption assembly 20-5 can further improve the safety of the handover. The interlocking sensor 20-5-1 is mainly used to determine whether the first front substrate adsorption assembly 20-5 has entered the workpiece table. Therefore, the interlocking sensor 20-5-1 can use a distance sensor to determine the distance from the side wall of the workpiece table, or use an image sensor with distance recognition capability to achieve it, or other sensors with similar effects can be used to achieve it, which will not be described in detail here.

[0122] Preferably, please refer to Figure 3 、 Figure 5 and Figure 6, the front substrate adsorption assembly also includes a second front substrate adsorption assembly 20-6. The second front substrate adsorption assembly 20-6 also includes an anti-collision sensor 20-6-2, which is used to determine whether the substrate conveying plate fork 20 is aligned with the plate fork slot position of the workpiece stage, and when misalignment is detected, the substrate conveying plate fork 20 stops moving in the Y direction, and the Y direction is the same as the extension direction of the plate fork arm 20-3. The anti-collision sensor 20-6-2 is added to the second front substrate adsorption assembly 20-6 to determine whether the substrate conveying plate fork 20 is aligned with the plate fork slot position of the workpiece stage, and when misalignment is detected, the substrate conveying plate fork 20 stops moving in the Y direction. For example, when the anti-collision sensor 20-6-2 is triggered, it means that the plate fork groove of the workpiece table is not aligned with the position of the base transfer plate fork 20, and a collision will occur. The signal of the triggered anti-collision sensor 20-6-2 can be fed back to the control software of the base transmission system. At this time, the Y-axis of the motion platform 10 immediately stops the Y-axis motion to avoid the base transfer plate fork 20 from colliding with the workpiece table, thereby further improving the safety of the handover.

[0123] Please refer to Figure 3 The structure of the second front substrate adsorption assembly 20-6 is basically the same as that of the rear substrate adsorption assembly 20-4, except that an anti-collision sensor 20-6-2 is added to the suction cup seat 20-12. When the substrate transfer fork 20 moves close to the workpiece table, if the anti-collision sensor 20-6-2 is triggered, it means that the fork slot of the workpiece table and the position of the substrate transfer fork 20 are not aligned, and a collision will occur. The triggering signal of the anti-collision sensor 20-6-2 is fed back to the control software of the substrate transmission system, and the Y-axis of the motion platform 10 immediately stops Y-axis motion to prevent the substrate transfer fork 20 from colliding with the workpiece table.

[0124] The number of the anti-collision sensors 20-6-2 is preferably two, please continue to refer to Figure 3The two anti-collision sensors 20-6-2 are respectively disposed on either side of the plate fork arm 20-3. When either of the two anti-collision sensors 20-6-2 is triggered, it is determined that the base transport plate fork 20 is misaligned with the plate fork slot of the workpiece platform. The number of anti-collision sensors 20-6-2 can be set to 3, 4, or more, or only 1. The specific number can be selected based on actual needs, as long as the detection range of the anti-collision sensor 20-6-2 can cover the plate fork slot of the workpiece platform. The specific number is not limited here. In addition, the anti-collision sensor 20-6-2 is primarily used to determine whether the base transport plate fork 20 is aligned with the plate fork slot of the workpiece platform. Therefore, the anti-collision sensor 20-6-2 can use a distance sensor to determine the position difference of the plate fork slot of the workpiece platform, or use an image sensor with distance recognition capability to achieve this, or other sensors with similar effects can be used to achieve this, which will not be detailed here.

[0125] Optionally, refer to Figure 1 ,from Figure 1 It can be seen that there are two plate fork arms 20-3, and the two plate fork arms 20-3 are respectively arranged at the two ends of the connecting mechanism, and the two plate fork arms 20-3 are arranged in parallel and aligned. The first front substrate adsorption component 20-5 is provided on the end of one of the plate fork arms 20-3 away from the connecting mechanism, and the second front substrate adsorption component 20-6 is provided on the end of the other plate fork arm 20-3 away from the connecting mechanism, and the other ends of the two plate fork arms 20-3 are respectively provided with a rear substrate adsorption component 20-4. The first front substrate adsorption component 20-5, the second front substrate adsorption component 20-6 and the rear substrate adsorption component 20-4 are all used to adsorb the substrate, and the placement relationship of the substrate on the plate fork arm 20-3 can include but is not limited to the following methods:

[0126] 1. Two substrates are placed on the plate fork arm 20-3, wherein the first front substrate adsorption assembly 20-5 and the second front substrate adsorption assembly 20-6 adsorb one substrate together, and the two rear substrate adsorption assemblies 20-4 adsorb one substrate together. Figure 11 ;

[0127] 2. Two substrates are placed on the plate fork arm 20-3, wherein the first front substrate adsorption component 20-5 and the rear substrate adsorption component 20-4 on one plate fork arm 20-3 adsorb one substrate together, and the second front substrate adsorption component 20-6 and the rear substrate adsorption component 20-4 on the other plate fork arm 20-3 adsorb one substrate together. Please refer to Figure 16 ;

[0128] 3. Four substrates are placed on the plate fork arm 20-3, wherein the first front substrate adsorption component 20-5, the second front substrate adsorption component 20-6 and the two rear substrate adsorption components 20-4 adsorb one substrate respectively. Figure 17 .

[0129] Those skilled in the art should understand that the above are only a few examples given to facilitate understanding of the technical solution of the present application, and are not any limitation to the application. There are many other placement relationships in other embodiments, which are not detailed here.

[0130] In the embodiment of the present invention, the number of the plate fork arms 20-3 is two. In other embodiments, the number of the plate fork arms 20-3 may be other numbers, for example, the number of the plate fork arms 20-3 may be 1. In addition, in order to achieve the transfer of a larger number of substrates or to make the transfer process of the substrates more stable and improve the safety of the transfer process, the number of the plate fork arms 20-3 may be increased. For example, in some embodiments, the number of the plate fork arms 20-3 may be set to 3, 4, or even more.

[0131] For details, please refer to Figure 1 The connection mechanism includes a mounting base 20-1 and a support 20-2. The mounting base 20-1 is connected to the slider of the motion platform 10, and the support 20-2 is set on the mounting base 20-1 and connected to the plate fork arm 20-3.

[0132] Please refer to Figure 8 , the substrate conveying device also includes a moving platform 10 and a plurality of roller stages 30, the plurality of roller stages 30 are arranged along the X direction, and the roller stages 30 are used to convey the substrate along the Y direction. The moving platform 10 includes a fixed platform and a plurality of moving platforms movably connected to the fixed platform, each of the roller stages 30 is respectively connected to one of the moving platforms and reciprocates along the X direction through the moving platform. The moving platform 10 also includes a Y-direction moving axis arranged on the moving platform, and the substrate conveying plate fork 20 is connected to the Y-direction moving axis, and the Y-direction moving axis is used to drive the substrate conveying plate fork 20 to reciprocate along the Y direction. Wherein, the X direction is perpendicular to the extension direction of the plate fork arm 20-3, and the Y direction is the same as the extension direction of the plate fork arm 20-3. The fixed platform and the moving platform are preferably both frame structures.

[0133] Optionally, the roller platform 30 includes a plurality of upper platforms and a plurality of lower platforms, and the number of the upper platform and the lower platform is preferably one.

[0134] Optionally, a conveying assembly is provided on the roller stage 30, and the conveying assembly is used to cooperate with the substrate transfer plate fork 20 to transfer the substrate on the upper stage to the workpiece stage or to transfer the processed substrate from the workpiece stage to the lower stage. The conveying assembly is preferably a roller 30-2.

[0135] Optionally, the roller stage 30 is provided with an air flotation block 30 - 1 at one end close to the workpiece stage, and a roller 30 - 2 at one end away from the workpiece stage.

[0136] Optionally, a transition air flotation block 40 is provided on the fixed platform to provide air flotation support for the substrate located between the workpiece platform and the roller platform 30. Before a processed substrate is moved from the workpiece platform to the lower platform, and before the base is transferred from the upper platform to the workpiece platform, the lifting structure drives the transition air flotation block 40 upward to provide transitional support for the substrate located between the workpiece platform and the upper or lower platforms. This provides better support for large substrates, prevents cracking of the substrate, and provides a higher safety factor. Furthermore, after the processed substrate is transferred, the lifting structure drives the transition air flotation block 40 downward. This allows the workpiece platform to better prevent collisions with the transition air flotation block 40 the next time the substrate is transferred closer to the motion platform 10, thus improving safety.

[0137] Optionally, a lifting structure for lifting the transition air floating block 40 is provided on the transition air floating block 40 , and the lifting structure is connected to the fixing platform.

[0138] Preferably, the conveyor assembly includes a Y-axis drive roller and a universal wheel adjustment group. The Y-axis drive roller is used to support the substrate for movement along the Y direction, and the universal wheel adjustment group is used to support the substrate along the Z direction, wherein the Z direction is perpendicular to the plane formed by the X and Y directions. When the conveyor assembly drags the substrate, the bottom end of the substrate is rotationally supported by the Y-axis drive roller. This supports the substrate and prevents it from cracking, while also minimizing wear on the substrate.

[0139] The motion platform 10 is the basic carrier of the substrate transfer plate fork 20. Figure 8 and Figure 9As shown, it enables movement in both the X and Y directions while also providing overall support. The two Y-axis motion axes of the motion platform 10 are mounted on the motion platform, which is connected to the fixed frame of the motion platform 10 via linear motor sliders and guide rails. The substrate transfer fork 20 is mounted on the Y-axis motion axis of the motion platform 10, which drives the fork to reciprocate in the Y direction. A roller stage 30 is mounted on the motion platform 10. An air-floating block 30-1 is positioned at the front end of the roller stage 30, and rollers are positioned at the rear end. The air-floating block 30-1 covers the entire front substrate (located at the front substrate station) in the Y direction and extends a certain distance to the rear substrate (located at the rear substrate station). This allows the rear substrate to smoothly transition to the air-floating block 30-1 at the roller portion, ensuring smooth transfer of both substrates by the substrate transfer fork 20. The motion platform 10 drives the substrate transfer fork 20 and roller stage 30 to reciprocate in the X direction. When the worktable reaches the substrate station, the transition air-floating block 40 rises to a level with the air-floating block 30-1, allowing the substrate to be smoothly transferred to the worktable. The worktable has a fork slot, which is longer than the Y dimension of the rear substrate, ensuring that the fork arm 20-3 can extend into the space. This worktable can be used in a photolithography apparatus to carry a substrate for exposure, alignment measurement, or focal plane position measurement.

[0140] To facilitate understanding of the technical solution of the lithography apparatus proposed in this application, a more specific solution is provided below:

[0141] The substrate transfer plate fork 20 includes a mounting base 20-1, a support 20-2, a plate fork arm 20-3, a rear substrate adsorption assembly 20-4, a first front substrate adsorption assembly 20-5, and a second front substrate adsorption assembly 20-6. The rear substrate adsorption assembly 20-4 is composed of a mounting plate 20-7, a limit plate 20-8, a limit screw 20-9, a lifting cylinder 20-10, a suction cup 20-11, a suction cup seat 20-12, and an air line connector 20-13. The first front substrate adsorption assembly 20-5 is based on the rear substrate adsorption assembly 20-4 and has an interlocking sensor 20-5-1 and a sensor pad 20-5-2. The second front substrate adsorption assembly 20-6 is based on the rear substrate adsorption assembly 20-4 and has two anti-collision sensors 20-6-2 on the suction cup seat 20-12. Please refer to Figures 2 to 4 .

[0142] The mounting base 20-1 is connected to the Y-axis slider of the motion platform 10, enabling the substrate transport fork 20 to reciprocate along the Y-direction with the substrate. The support 20-2 is fixed to the mounting base 20-1, and the fork arm 20-3 is fixed to the support 20-2. The rear substrate suction assembly 20-4 is mounted at the rear end of the fork arm 20-3, and the first and second front substrate suction assemblies 20-5 and 20-6 are mounted at the front end of the fork arm 20-3. The rear substrate suction assembly 20-4 is used to suction the rear substrate, while the first and second front substrate suction assemblies 20-5 and 20-6 are used to suction the front substrate.

[0143] The suction cup seats 20-12 of each adsorption component can be raised and lowered independently, and two 1500mm*925mm substrates can be simultaneously transferred to the designated positions on the workpiece table, such as Figure 11 As shown; you can also transfer two 1500mm*925mm substrates to the designated workstations on the workpiece table in two batches, such as Figure 13 As shown, the suction cup seats 20-12 of each adsorption assembly on the substrate transfer plate fork 20 can be raised and lowered independently. When a substrate is already at the front substrate station on the workpiece table, and the rear substrate adsorption assembly 20-4 transfers the substrate from the rear substrate station on the roller table 30 to the rear substrate station on the workpiece table, the suction cup seats 20-12 of the front substrate adsorption assembly retract, so that the upper surface of the suction cup 20-11 is lower than the lower surface of the substrate, thereby preventing the suction cup 20-11 from scratching the substrate.

[0144] Among them, the structure of the rear substrate adsorption assembly 20-4 is as follows: the mounting plate 20-7 is fixed on the plate fork arm 20-3, and plays a basic support role in the substrate adsorption assembly; the limit plate 20-8 is fixed on the mounting plate 20-7, and the limit screw 20-9 is fixed on the limit plate 20-8, which plays a role in adjusting the extension distance of the lifting cylinder 20-10 to ensure that the suction cup 20-11 of the substrate adsorption assembly contacts the lower surface of the substrate and smoothly adsorbs the substrate; the base of the lifting cylinder 20-10 is fixed on the adsorption assembly mounting plate 20-7, and the suction cup seat 20-12 is fixed on the slider of the lifting cylinder 20-10, and moves up and down with the cylinder slider; the suction cup 20-11 is fixed on the suction cup seat 20-12, and is used to adsorb the substrate; the air path connector 20-13 is fixed on the suction cup seat 20-12 to provide vacuum adsorption for the suction cup 20-11.

[0145] The structure of the first front substrate adsorption component 20-5 is as follows: the structure is basically the same as the rear substrate adsorption component 20-4, except that the suction cup seat 20-12 is equipped with an interlocking sensor 20-5-1 and a sensor pad 20-5-2. When the substrate conveying plate fork 20 opens to the intersection with the workpiece table, the interlocking sensor 20-5-1 detects the side wall of the workpiece table, and the signal is triggered and fed back to the substrate transmission system control software. At this time, the motion platform 10X axis cannot move in the X direction, which plays a role in station interlocking. Figure 7 .

[0146] The structure of the second front substrate adsorption assembly 20-6 is as follows: the structure is basically the same as the rear substrate adsorption assembly 20-4, except that the suction cup seat 20-12 is replaced with a suction cup seat 20-12 and two anti-collision sensors 20-6-2 are added. When the substrate transfer plate fork 20 moves close to the workpiece table, any one of the two anti-collision sensors 20-6-2 is triggered, which means that the workpiece table fork slot and the substrate transfer plate fork 20 are not aligned, and a collision will occur. The signal of the anti-collision sensor 20-6-2 being triggered is fed back to the substrate transmission system control software, and at this time the Y axis of the motion platform 10 immediately stops the Y direction movement to avoid the collision between the substrate transfer plate fork 20 and the workpiece table. Figure 5 and Figure 6 .

[0147] Based on the same inventive concept, another embodiment of the present invention further provides a substrate transmission method in a lithography apparatus, using the substrate transmission system described above, please refer to Figure 10 , including a step of transferring the substrate from the upper plate stage to the workpiece stage, the step of transferring the substrate from the upper plate stage to the workpiece stage including:

[0148] S100: The substrate transfer fork 20 absorbs a plurality of substrates and places the plurality of substrates on the upper platen;

[0149] S200: The substrate transfer plate fork 20 moves to the workpiece table station;

[0150] S300: the substrate transfer fork 20 releases a plurality of substrates;

[0151] S400: The substrate transfer fork 20 returns to the upper plate platform;

[0152] In each of the loading steps, one substrate or at least two substrates or substrates less than the number of stations in the workbench are transferred, and only the adsorption components involved in adsorbing the substrates are located at the adsorption stations, and all other adsorption components are located at the avoidance stations.

[0153] The substrate transfer system and the substrate transfer fork 20 can be used to implement various loading steps. For example, multiple substrates can be transferred during each loading step, or only one substrate can be transferred during each loading step, as desired. In other embodiments, many other scenarios are possible, which are not described in detail here. In the embodiments of the present invention, the example of transferring at least two substrates during each loading step and transferring only one substrate during each loading step will be specifically described. Other scenarios are similar and are not described in detail here.

[0154] Preferably, the step of placing the plate further comprises: if there is a substrate to be adjusted among the substrates on the workpiece table, performing a secondary adjustment, wherein the substrate to be adjusted is a substrate that has not been transferred to the corresponding workstation. Specifically, the secondary adjustment includes:

[0155] The substrate transfer plate fork drives the substrate to be adjusted to move between the workpiece positions of the workpiece table to transfer the substrate to be adjusted to the corresponding workstation on the workpiece table;

[0156] Wherein, during the secondary adjustment process, except for the adsorption component for adsorbing the substrate to be adjusted which is located at the adsorption station, all other adsorption components on the substrate conveying plate fork are located at the avoidance station.

[0157] Furthermore, at least two substrates are transferred during each loading step. During each loading step, all suction components on the substrate transfer fork 20 extend to suction all substrates and transfer all substrates to corresponding workstations on the worktable. As can be seen from the previous description of the substrate transfer fork 20 and the substrate transfer system, the substrate transfer fork 20 can transfer multiple substrates at a time. Using the substrate transfer fork 20, at least two substrates can be transferred during each loading step, effectively improving substrate transfer efficiency compared to the prior art.

[0158] Specifically, please refer to Figure 11 and Figure 12 When the substrate includes a first substrate and a second substrate, the step of placing the substrate includes:

[0159] Step 1: The front substrate adsorption component of the substrate transfer plate fork 20 extends to adsorb the first substrate, and the rear substrate adsorption component 20-4 extends to adsorb the second substrate;

[0160] Step 2: The substrate transfer plate fork 20 moves to the workpiece table station;

[0161] Step 3: The front substrate adsorption assembly and the rear substrate adsorption assembly 20-4 release the first substrate and the second substrate, and the first substrate is transferred to the front substrate station of the workpiece stage, and the second substrate is transferred to the rear substrate station of the workpiece stage;

[0162] Step 4: The front substrate adsorption assembly and the rear substrate adsorption assembly 20 - 4 are retracted;

[0163] Step 5: The substrate transfer plate fork 20 returns to the roller stage 30 .

[0164] Furthermore, only one substrate is transferred during each loading step; wherein, during each loading step, only the suction assembly on the substrate transfer fork 20 that is to hold the substrate is extended to hold the current substrate, while all other suction assemblies are retracted, and the substrate is transferred to the corresponding station on the work table. For example, when there is already a substrate at the front substrate station on the work table, and the rear substrate suction assembly 20-4 is transferring the substrate from the rear substrate station on the roller table 30 to the rear substrate station on the work table, the suction cup seat 20-12 of the front substrate suction assembly can be retracted, so that the upper surface of the suction cup 20-11 is lower than the lower surface of the substrate, thereby effectively preventing the suction cup 20-11 from scratching the substrate and effectively improving the safety of the transfer.

[0165] Specifically, please refer to Figure 15 When the substrate includes a first substrate and a second substrate, and only one substrate is transferred in each loading step, the loading step includes:

[0166] Step 1: The rear substrate adsorption assembly 20 - 4 of the substrate transfer plate fork 20 is retracted, and the front substrate adsorption assembly is extended to adsorb the first substrate at the front substrate station on the roller table 30 ;

[0167] Step 2: The substrate transfer plate fork 20 moves to the workpiece table station;

[0168] Step 3: The front substrate adsorption assembly releases the first substrate, and the first substrate is transferred to the front substrate station on the workpiece table, and the second substrate is transferred to the front substrate station on the roller table 30;

[0169] Step 4: the front substrate adsorption assembly is retracted;

[0170] Step 5: The substrate transfer plate fork 20 returns to the roller stage 30;

[0171] Step 6: the front substrate adsorption component extends to adsorb the second substrate;

[0172] Step 7: The substrate transfer plate fork 20 moves to drive the front substrate adsorption assembly to move to the rear substrate station on the workpiece table;

[0173] Step 8: the front substrate adsorption assembly releases the second substrate, and the second substrate is transferred to the rear substrate station on the workpiece table;

[0174] Step 9: The front substrate adsorption assembly is retracted;

[0175] Step 10: The substrate transfer plate fork 20 returns to the roller stage 30 .

[0176] The above-mentioned board loading step is to transfer the substrate from the front substrate station of the roller table 30 to the workpiece table in two steps. During the transfer process, the suction cup 20-11 of the rear substrate adsorption assembly 20-4 is retracted and the suction cup 20-11 of the front substrate adsorption assembly is extended, which can effectively prevent the suction cup 20-11 from interfering with the substrate. In addition, in the third step, when the first substrate is transferred to the front substrate station of the workpiece table, the second substrate is synchronously transferred to the front substrate station on the roller table 30. In this way, through a circular and simultaneous processing method, the transfer of the new substrate and the removal of the processed substrate can be carried out simultaneously, which greatly saves processing time and improves processing efficiency. In addition to the above-mentioned transfer of the substrate from the front substrate station of the roller table 30 to the workpiece table in two steps, the substrate can also be transferred from the rear substrate station of the roller table 30 to the workpiece table in two steps.

[0177] Specifically, please refer to Figure 13 and Figure 14 When the substrate includes a first substrate and a second substrate, the step of placing the substrate includes:

[0178] Step 1: The front substrate adsorption assembly of the substrate transfer plate fork 20 is retracted, and the rear substrate adsorption assembly 20-4 is extended to adsorb the first substrate at the rear substrate station on the roller table 30;

[0179] Step 2: The substrate transfer plate fork 20 moves to the workpiece table station;

[0180] Step 3: The rear substrate adsorption assembly 20 - 4 releases the first substrate, and the first substrate is transferred to the rear substrate station of the workpiece table;

[0181] Step 4: The rear substrate adsorption assembly 20-4 is retracted;

[0182] Step 5: The substrate transfer plate fork 20 moves to the position between the front substrate adsorption assembly and the rear substrate station on the workpiece table, and the second substrate is transferred to the rear substrate station on the roller table 30;

[0183] Step 6: The front substrate adsorption component extends and adsorbs the first substrate;

[0184] Step 7: The substrate transfer plate fork 20 moves to the workpiece table station;

[0185] Step 8: the front substrate adsorption assembly releases the first substrate, and the first substrate is transferred from the rear substrate station on the workpiece table to the front substrate station on the workpiece table;

[0186] Step 9: The front substrate adsorption assembly is retracted;

[0187] Step 10: The substrate transfer plate fork 20 returns to the roller stage 30;

[0188] Step 11: The rear substrate adsorption component 20-4 extends to adsorb the second substrate;

[0189] Step 12: The substrate transfer plate fork 20 moves to the workpiece table station;

[0190] Step 13: The rear substrate adsorption assembly 20 - 4 releases the second substrate, and the second substrate is transferred to the rear substrate station on the workpiece table;

[0191] Step 14: The rear substrate adsorption assembly 20-4 is retracted;

[0192] Step 15: The substrate transfer plate fork 20 returns to the roller stage 30 .

[0193] The aforementioned loading step involves transferring the substrate from the rear substrate station of the roller table 30 to the workpiece table in two steps. During the transfer process, the suction cup 20-11 of the front substrate adsorption assembly is retracted, and the suction cup 20-11 of the rear substrate adsorption assembly 20-4 is extended, effectively preventing the suction cup 20-11 from interfering with the substrate. Furthermore, in the fifth step, when the substrate transfer fork 20 moves to the position between the front substrate adsorption assembly and the rear substrate station on the workpiece table, the second substrate is synchronously transferred to the rear substrate station on the roller table 30. This allows for the simultaneous transfer of new substrates and the removal of processed substrates through a cycle and simultaneous processing, significantly reducing processing time and improving processing efficiency.

[0194] In addition to the above-mentioned boarding steps, in other embodiments, there are many other boarding steps. For example, in one embodiment, please refer to Figure 16 , two substrates can also be arranged along the X direction on the substrate transfer plate fork 20, and two vertically placed substrates can be simultaneously transferred in each loading step, and the process is similar to simultaneously transferring two horizontally placed substrates; in addition, in one embodiment, please refer to Figure 17 , 4 substrates can be placed on the substrate transfer plate fork 20, and 4 substrates can be transferred simultaneously in each loading step. There are many other ways, which are not described here one by one.

[0195] Furthermore, after the substrate is processed on the workpiece stage, it needs to be moved from the workpiece stage to the lower stage. This process is called an unloading step. That is, the substrate transfer method in the lithography apparatus further includes an unloading step of transferring the substrate from the workpiece stage to the lower stage. The unloading step includes:

[0196] Step 1: The substrate transfer plate fork 20 moves to the workpiece table station;

[0197] Step 2: The substrate transfer fork 20 absorbs a plurality of the substrates;

[0198] Step 3: The substrate transfer fork 20 returns to the lower platform;

[0199] Step 4: The adsorption component of the substrate transfer fork 20 releases a plurality of substrates, and the plurality of substrates are transferred to the lower plate;

[0200] Step 5: The production line sequentially removes the plurality of substrates from the lower platen.

[0201] Please refer to Figure 18 , Figure 18 The process diagram of the plate removal step is as follows. Figure 18 The structure shown in FIG is used as an example to describe the steps of placing the plate in detail, as follows:

[0202] Step 1: The initial positions of the two substrates are respectively located at the front substrate station and the rear substrate station of the workpiece stage. After the two substrates complete a series of inspections or processing at the workpiece stage, all the adsorption components on the substrate transfer fork 20 are retracted;

[0203] Step 2: The substrate transfer plate fork 20 moves to the workstation position, and the front substrate adsorption assembly and the rear substrate adsorption assembly 20-4 are both extended to adsorb two substrates;

[0204] Step 3: The substrate transfer plate fork 20 moves onto the roller table 30;

[0205] Step 4: the rear substrate adsorption assembly 20 - 4 releases the substrate located on the rear substrate station of the roller stage 30 , and the rear substrate adsorption assembly 20 - 4 retracts;

[0206] Step 5: The production line takes away the substrate located on the rear substrate station of the roller table 30;

[0207] Step 6: The substrate transfer fork 20 moves and moves the substrate located on the front substrate station of the roller table 30 to the rear substrate station of the roller table 30;

[0208] Step 7: The front substrate adsorption assembly releases the substrate;

[0209] Step 8: The production line takes away the substrate located on the rear substrate station of the roller table 30 .

[0210] It is understandable that the production line can also first remove the substrate located on the front substrate station of the roller table 30. There are many other ways, which are not limited here.

[0211] Preferably, during the movement of the substrate transport fork 20 to the worktable station, the interlocking sensor 20-5-1 determines whether the first front substrate adsorption assembly 20-5 has entered the worktable. When the side wall of the worktable is detected, the substrate transport fork 20 stops moving in the X direction, where the X direction is perpendicular to the extension direction of the fork arm 20-3. When the substrate transport fork 20 moves to the handover station with the worktable, the interlocking sensor 20-5-1 detects the side wall of the worktable. The interlocking sensor 20-5-1 triggers a signal and feeds back to the control software of the substrate transport system. At this time, the X-axis of the motion platform 10 cannot move in the X direction, which plays a role in station interlocking. The interlocking sensor 20-5-1 in the first front substrate adsorption assembly 20-5 can further improve the safety of the handover.

[0212] Preferably, during the movement of the substrate conveying fork 20 to the workpiece table station, the anti-collision sensor 20-6-2 determines whether the substrate conveying fork 20 is aligned with the fork slot position of the workpiece table, and when misalignment is detected, the substrate conveying fork 20 stops moving in the Y direction, and the Y direction is the same as the extension direction of the fork arm 20-3. When the anti-collision sensor 20-6-2 is triggered, it means that the fork slot of the workpiece table is not aligned with the position of the substrate conveying fork 20, and a collision will occur. The signal of the anti-collision sensor 20-6-2 being triggered can be fed back to the control software of the substrate transmission system. At this time, the Y-axis of the motion platform 10 immediately stops moving in the Y direction to avoid the substrate conveying fork 20 from colliding with the workpiece table, thereby further improving the safety of the handover.

[0213] Based on the same inventive concept, an embodiment of the present invention further proposes a lithography apparatus, characterized in that it includes a workpiece table and a substrate transfer plate fork 20 described in any one of the above-mentioned feature descriptions or a substrate transfer system described in any one of the above-mentioned feature descriptions.

[0214] Based on the same inventive concept, an embodiment of the present invention further proposes a photolithography method, which uses the substrate transmission method in the photolithography apparatus described in any one of the above feature descriptions to transfer the substrate.

[0215] In summary, the present invention has the following beneficial effects:

[0216] 1. The photolithography apparatus disclosed herein includes a workpiece stage and a substrate transport device for transporting substrates. The substrate transport device includes a substrate transport fork, which includes a fork arm, a suction assembly, and a drive assembly. The fork arm is provided with at least two suction assemblies. This configuration of multiple suction assemblies on the fork arm allows for transporting multiple substrates without increasing the length of the fork arm, effectively improving the productivity of the photolithography apparatus.

[0217] 2. Each group of adsorption components is correspondingly provided with a driving component, that is, each adsorption component can be raised and lowered independently, and the suction cup seat of each adsorption component on the substrate transfer plate fork can be raised and lowered independently. For example, when there is already a substrate at the front substrate station on the workpiece table, and the rear substrate adsorption component transfers the substrate from the rear substrate station on the roller table to the rear substrate station on the workpiece table, the suction cup seat of the front substrate adsorption component can be retracted so that the upper surface of the suction cup is lower than the lower surface of the substrate, thereby effectively preventing the suction cup from scratching the substrate and effectively improving the safety of the handover.

[0218] 3. An interlocking sensor is added to the first front substrate adsorption assembly to determine whether the first front substrate adsorption assembly enters the workpiece table, and when the side wall of the workpiece table is detected, the substrate transfer plate fork stops moving in the X direction, further improving the safety of the handover.

[0219] 4. An anti-collision sensor is added to the second front substrate adsorption assembly to determine whether the substrate transport fork is aligned with the fork slot of the workpiece stage. If misalignment is detected, the substrate transport fork stops its Y-direction movement. For example, when the anti-collision sensor is triggered, it indicates that the fork slot of the workpiece stage and the substrate transport fork are not aligned, and a collision may occur. The triggering signal of the anti-collision sensor can be fed back to the control software of the substrate transport system, at which point the Y-axis of the motion platform immediately stops Y-direction movement, preventing the substrate transport fork from colliding with the workpiece stage, thereby further improving the safety of the handover.

[0220] The present invention also provides a substrate transfer method in a lithography apparatus, which belongs to the same inventive concept as the lithography apparatus and thus has the same beneficial effects.

[0221] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "example," or "specific example" means that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments. Furthermore, those skilled in the art may combine and reconcile different embodiments or examples described in this specification.

[0222] The above description is merely a preferred embodiment of the present invention and does not limit the present invention in any way. Any person skilled in the art who, without departing from the scope of the present invention, makes any equivalent substitution, modification, or other changes to the technical solution and technical content disclosed in the present invention shall be deemed to be within the scope of the present invention and still fall within the scope of protection of the present invention.

Claims

1. A photolithography apparatus, characterized in that: It includes a workpiece table and a substrate conveying device, wherein the substrate conveying device is used to convey the substrate, and the substrate conveying device includes a substrate conveying plate fork; The substrate transport plate fork comprises a plate fork arm, an adsorption component and a driving component; The driving assembly is arranged on the plate fork arm, the adsorption assembly is arranged on the driving assembly, the adsorption assembly is used to adsorb or release the substrate, the driving assembly is used to drive the adsorption assembly to contact the lower surface of the substrate so that the adsorption assembly is located at the adsorption position or the avoidance position, when the adsorption assembly is located at the adsorption position, the adsorption assembly adsorbs the substrate, and when the adsorption assembly is located at the avoidance position, the adsorption assembly releases the substrate; The number of the adsorption components is at least two, and at least two of the adsorption components are spaced apart and arranged on the plate fork arm, and each of the adsorption components or at least two adsorption components cooperate to adsorb or release one substrate; Each driving component is used to drive a corresponding adsorption component.

2. The lithographic apparatus according to claim 1, wherein: There are several workstations on the worktable, and the substrate transfer plate fork is used to transfer the substrate to the corresponding workstation on the worktable, or to transfer the substrate away from the worktable, or when the substrate is not located at the corresponding workstation, to move the substrate so that the substrate can be transferred to the corresponding workstation.

3. The lithographic apparatus according to claim 1, wherein: The number of the plate fork arms is two, and the adsorption components are arranged along the Y direction, which is the same as the extension direction of the plate fork arms.

4. The lithographic apparatus according to claim 1, wherein: The driving assembly includes a limit plate, a limit screw and a lifting cylinder; The limit plate is arranged on the mounting plate, and the limit screw is arranged on the limit plate to adjust the extension distance of the lifting cylinder.

5. The lithographic apparatus according to claim 1, wherein: The adsorption assembly includes a suction cup, a suction cup seat and an air path connector; The suction cup seat is arranged on the slider of the lifting cylinder and moves up and down along with the slider; The suction cup is arranged on the suction cup seat and is used to absorb the substrate; The air path connector is arranged on the suction cup seat and is used to provide vacuum adsorption for the suction cup.

6. The lithographic apparatus according to claim 1, wherein: The adsorption assembly includes a first front substrate adsorption assembly; The first front substrate adsorption assembly further includes an interlock sensor; The interlock sensor is used to determine whether the first front substrate adsorption assembly enters the workpiece table. When the side wall of the workpiece table is detected, the substrate transfer fork stops moving in the X direction, and the X direction is perpendicular to the extension direction of the fork arm.

7. The lithographic apparatus according to claim 1, wherein: The adsorption assembly further includes a second front substrate adsorption assembly; The second front substrate adsorption assembly further includes an anti-collision sensor; The anti-collision sensor is used to determine whether the base transport fork is aligned with the fork slot position of the workpiece table, and when misalignment is detected, the base transport fork stops moving in the Y direction, and the Y direction is the same as the extension direction of the fork arm.

8. The lithographic apparatus according to claim 7, wherein: The number of the anti-collision sensors is two; The two anti-collision sensors are respectively arranged on both sides of the plate fork arm. When any one of the two anti-collision sensors is triggered, it is determined that the base conveying plate fork is not aligned with the plate fork slot position of the workpiece table.

9. A substrate transfer method in a lithography apparatus, characterized in that: The method includes transferring the substrate from the upper plate stage to the workpiece stage, wherein the upper plate step includes: The substrate transfer fork absorbs a plurality of substrates and places the plurality of substrates on the upper platen; The substrate transfer plate fork moves to the workpiece table station; The substrate transfer fork releases a plurality of substrates; The substrate conveying plate fork returns to the upper plate platform; In which, the adsorption component contacts the lower surface of the substrate to adsorb or release the substrate, and each time the loading step is performed, one substrate or at least two substrates or substrates less than the number of stations in the worktable are transferred, and only the adsorption component involved in adsorbing the substrate is located at the adsorption station, and all other adsorption components are located at the avoidance station.

10. The substrate transfer method in a lithography apparatus according to claim 9, wherein: The step of placing the board further comprises: If there is a substrate to be adjusted among the substrates on the workpiece stage, a secondary adjustment is performed, and the substrate to be adjusted is a substrate that has not been transferred to a corresponding workstation.

11. The substrate transfer method in a lithography apparatus according to claim 10, wherein: The secondary adjustments include: The substrate transfer plate fork drives the substrate to be adjusted to move between the workpiece positions of the workpiece table to transfer the substrate to be adjusted to the corresponding workstation on the workpiece table; Wherein, during the secondary adjustment process, except for the adsorption component for adsorbing the substrate to be adjusted which is located at the adsorption station, all other adsorption components on the substrate conveying plate fork are located at the avoidance station.

12. The substrate transfer method in a lithography apparatus according to claim 9, wherein: transferring at least two substrates in each of the loading steps; Wherein, in each of the board loading steps, all the adsorption components on the substrate transfer plate fork are extended to adsorb all the substrates and transfer all the substrates to the corresponding stations on the workpiece table.

13. The substrate transfer method in a lithography apparatus according to claim 12, wherein: When the substrate includes a first substrate and a second substrate, the step of placing a substrate includes: The front substrate adsorption component of the substrate transfer plate fork extends to adsorb the first substrate, and the rear substrate adsorption component extends to adsorb the second substrate; The substrate transfer plate fork moves to the workpiece table station; The front substrate adsorption assembly and the rear substrate adsorption assembly release the first substrate and the second substrate, the first substrate is transferred to the front substrate station of the workpiece stage, and the second substrate is transferred to the rear substrate station of the workpiece stage; The front substrate adsorption assembly and the rear substrate adsorption assembly are retracted; The substrate transfer plate fork returns to the roller table.

14. The substrate transfer method in a lithography apparatus according to claim 9, wherein: Only one substrate is transferred in each loading step; Among them, during each loading step, only the adsorption component on the substrate transfer plate fork that places the substrate extends to adsorb the current substrate, and all other adsorption components retract and transfer the substrate to the corresponding workstation on the workpiece table.

15. The substrate transfer method in a lithography apparatus according to claim 14, wherein: When the substrate includes a first substrate and a second substrate, the step of placing a substrate includes: The rear substrate adsorption component of the substrate transfer plate fork is retracted, and the front substrate adsorption component is extended to adsorb the first substrate on the front substrate station of the roller stage; The substrate transfer plate fork moves to the workpiece table station; The front substrate adsorption assembly releases the first substrate, the first substrate is transferred to the front substrate station of the workpiece table, and the second substrate is transferred to the front substrate station of the roller table; The front substrate adsorption assembly is retracted; The substrate conveying plate fork returns to the roller table; The front substrate adsorption assembly extends to adsorb the second substrate; The substrate transfer plate fork moves to drive the front substrate adsorption assembly to move to the rear substrate station on the workpiece table; The front substrate adsorption assembly releases the second substrate, and the second substrate is transferred to the rear substrate station on the workpiece table; The front substrate adsorption assembly is retracted; The substrate transfer plate fork returns to the roller table.

16. The substrate transfer method in a lithography apparatus according to claim 14, wherein: When the substrate includes a first substrate and a second substrate, the step of placing a substrate includes: The front substrate adsorption component of the substrate transfer plate fork is retracted, and the rear substrate adsorption component is extended to adsorb the first substrate on the rear substrate station of the roller stage; The substrate transfer plate fork moves to the workpiece table station; The rear substrate adsorption assembly releases the first substrate, and the first substrate is transferred to the rear substrate station of the workpiece stage; The rear substrate adsorption assembly is retracted; The substrate transfer plate fork moves to the position between the front substrate adsorption assembly and the rear substrate station on the workpiece table, and the second substrate is transferred to the rear substrate station on the roller table; The front substrate adsorption component extends out and adsorbs the first substrate; The substrate transfer plate fork moves to the workpiece table station; The front substrate adsorption assembly releases the first substrate, and the first substrate is transferred from the rear substrate station on the workpiece table to the front substrate station on the workpiece table; The front substrate adsorption assembly is retracted; The substrate conveying plate fork returns to the roller table; The rear substrate adsorption assembly extends to adsorb the second substrate; The substrate transfer plate fork moves to the workpiece table station; The rear substrate adsorption assembly releases the second substrate, and the second substrate is transferred to the rear substrate station on the workpiece table; The rear substrate adsorption assembly is retracted; The substrate transfer plate fork returns to the roller table.

17. The substrate transfer method in a lithography apparatus according to claim 9, wherein: The substrate transfer method further includes a lowering step of transferring the substrate from the workpiece stage to the lowering stage, wherein the lowering step includes: The base conveyor plate fork moves to the workpiece table station; The substrate transfer plate fork absorbs a plurality of the substrates; The substrate conveying plate fork returns to the lower plate platform; The adsorption component of the substrate transfer plate fork releases a plurality of the substrates, and the plurality of the substrates are transferred to the lower plate; The production line sequentially removes the plurality of substrates from the lower platen.

18. The substrate transport method in a lithography apparatus according to any one of claims 9 to 17, wherein: During the movement of the substrate transfer fork to the workpiece table station, the interlocking sensor determines whether the first front substrate adsorption assembly enters the workpiece table. When the side wall of the workpiece table is detected, the substrate transfer fork stops moving in the X direction, and the X direction is perpendicular to the extension direction of the fork arm.

19. The substrate transport method in a lithography apparatus according to any one of claims 9 to 17, wherein: During the process of the base conveying fork moving to the workpiece table station, the anti-collision sensor determines whether the base conveying fork is aligned with the fork slot position of the workpiece table, and when misalignment is detected, the base conveying fork stops moving in the Y direction, and the Y direction is the same as the extension direction of the fork arm.

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