Method for disassembling protective film assembly and device for disassembling protective film assembly

Abstract

The object of the present invention is to provide a method for disassembling a protective film assembly that is excellent in suppressing contamination of a photomask. A method for disassembling a protective film assembly is provided, which includes the following steps: a step of preparing a stacked body, wherein the stacked body is provided with a photomask (805), a protective film assembly frame (803), and a protective film (802) in the following order; a step of preparing an electrode (810); and a disassembly step of arranging the stacked body and the electrode (810) so that the protective film (802) in the stacked body is opposed to the electrode (810), and applying a voltage to the electrode (810) to generate an electrostatic attraction, and the generated electrostatic attraction attracts the protective film (802) in the direction of the electrode (810), thereby removing the protective film (802) from the photomask (805) in the stacked body.

Description

Technical Field

[0001] The invention relates to a disassembly method and a disassembly device of a protective membrane assembly. Background Art

[0002] The high integration and miniaturization of semiconductor devices are accelerating year by year.

[0003] For example, currently, excimer exposure is used to form patterns with a line width of about 45nm, but in recent years, with the further miniaturization of semiconductor devices, it is required to form patterns with a line width of less than 32nm. The previous excimer exposure is difficult to cope with such fine processing. Therefore, research has been conducted to replace the exposure light with EUV (Extreme UltraViolet) light with a shorter wavelength.

[0004] EUV light has the property of being easily absorbed by any substance. In photolithography using EUV light as exposure light (hereinafter also referred to as "EUV lithography"), exposure is performed using a reflective optical system. Specifically, EUV light is reflected by a photomask (such as a reticle) that reflects an exposure pattern, and the resist is exposed by the EUV light as reflected light.

[0005] During the photolithography process, if foreign matter adheres to the photomask, EUV light is absorbed by the foreign matter and scattered, so it may not be exposed to the desired pattern. Therefore, a pellicle assembly is installed (i.e., mounted) on the EUV light irradiation side of the photomask to protect the photomask.

[0006] The pellicle assembly is configured to include a pellicle for protecting the EUV light irradiation surface of the photomask and a pellicle assembly frame for supporting the pellicle.

[0007] The pellicle attached to the photomask may be contaminated by dust, etc., degraded by light, etc. In such cases, the pellicle may need to be replaced, and therefore, the pellicle attached to the photomask may need to be disassembled (ie, removed).

[0008] As a conventional method for removing a pellicle from a photomask, for example, a pellicle removal method described in Patent Document 1 is known.

[0009] Patent Document 1 discloses a method for removing a pellicle assembly from a photomask by bringing at least a pellicle and a sheet of the pellicle assembly disposed on the photomask into close contact with each other and then removing the pellicle assembly from the photomask.

[0010] Patent Document 1: Japanese Patent Application Publication No. 2016-206527 Summary of the invention

[0011] Problems to be solved by the invention

[0012] An object of the embodiments of the present disclosure is to provide a method for disassembling a pellicle that is excellent in suppressing contamination of a photomask.

[0013] Solutions to Solve Problems

[0014] Means for solving the above-mentioned problems include the following.

[0015] <1> A method for disassembling a protective membrane assembly, comprising the following steps:

[0016] A step of preparing a laminated body, the laminated body comprising a photomask, a pellicle assembly frame, and a pellicle arranged in the following order;

[0017] The step of preparing electrodes; and

[0018] The disassembly process comprises configuring the stack and the electrode in such a manner that the protective film in the stack is opposed to the electrode, and applying a voltage to the electrode to generate an electrostatic attraction, thereby attracting the protective film in the direction of the electrode through the electrostatic attraction, thereby removing the protective film from the photomask in the stack.

[0019] <2> The method for disassembling a pellicle assembly according to <1>, wherein the disassembly step comprises disposing a thin film between the pellicle and the electrode in the stacked body, and removing the pellicle by attracting the pellicle to a surface of the thin film using the electrostatic attraction.

[0020] <3> The pellicle disassembly method according to <1> or <2>, wherein the laminate further includes a mask adhesive layer between the photomask and the pellicle frame.

[0021] <4> The method for disassembling the pellicle assembly according to <3>,

[0022] When the above-mentioned laminate is used as a first laminate,

[0023] The above disassembly process includes:

[0024] The pellicle assembly frame is left on the photomask side of the first stacked body, and the pellicle is removed by utilizing the electrostatic attraction, thereby obtaining a second stacked body including the photomask, the mask adhesive layer, and the pellicle assembly frame;

[0025] heat treating the second laminate; and

[0026] The pellicle frame is removed from the photomask in the second stack.

[0027] <5> The pellicle assembly disassembly method according to any one of <1> to <4>, further comprising a step of heat treating the stacked body before the disassembly step.

[0028] <6> The pellicle assembly disassembly method according to any one of <1> to <5>, wherein at least one of a recess and a notch is provided on an outer peripheral surface of the pellicle assembly frame.

[0029] <7> A pellicle assembly disassembly device for performing the disassembly step in the pellicle assembly disassembly method according to any one of <1> to <6>, comprising:

[0030] A holding member for holding the stacked body; and

[0031] The above-mentioned electrode.

[0032] <8> The pellicle assembly removal device according to <7>, wherein the holding member holds the stacked body in an orientation with the photomask facing up and the pellicle facing down, and has an opening that exposes a self-supporting portion of the pellicle.

[0033] <9> The pellicle assembly removal device according to <8>, wherein the holding member and the electrode are arranged so that the opening and the electrode face each other, or

[0034] At least one of the holding member and the electrode is movable so that the opening and the electrode are arranged to face each other.

[0035] <10> The pellicle assembly removal device according to <9>, wherein an area of ​​the electrode is larger than an area of ​​the opening.

[0036] <11> The pellicle assembly removal device according to <9> or <10>, further comprising a film transport unit that moves the resin film between the opening and the electrode that face each other.

[0037] <12> In the pellicle assembly removal device according to any one of <7> to <11>, the holding member includes a pellicle assembly frame fixing member that fixes the pellicle assembly frame.

[0038] Effects of the Invention

[0039] According to the present disclosure, a method for disassembling a pellicle that is excellent in suppressing contamination of a photomask can be provided. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Figure 1This is a schematic cross-sectional view schematically showing an example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0041] Figure 2 This is a schematic cross-sectional view schematically showing an example of disassembly of the pellicle assembly in the present disclosure.

[0042] Figure 3 This is a schematic cross-sectional view schematically showing another example of disassembly of the pellicle assembly in the present disclosure.

[0043] Figure 4 This is a schematic cross-sectional view showing an example of a laminated body in which the pellicle membrane and the pellicle assembly frame are provided with holes having a depth direction in the thickness direction of the pellicle membrane and the pellicle assembly frame.

[0044] Figure 5A This is a schematic cross-sectional view showing an example of a laminate including a pellicle frame having a recessed portion on its outer peripheral surface.

[0045] Figure 5B This is a schematic cross-sectional view showing an example of a laminate including a pellicle frame having a notch provided on the outer peripheral surface.

[0046] Figure 6 This is a schematic cross-sectional view schematically showing another example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0047] Figure 7 This is a schematic cross-sectional view schematically showing still another example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0048] Figure 8 This is a schematic cross-sectional view schematically showing still another example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0049] Fig. 9 This is a schematic cross-sectional view schematically showing an example of a pellicle assembly removal device according to an embodiment of the present disclosure.

[0050] Fig.10 This is a schematic cross-sectional view schematically showing another example of a pellicle assembly removal device according to an embodiment of the present disclosure.

[0051] Fig.11 This is a schematic cross-sectional view schematically showing still another example of the pellicle assembly removal device according to the embodiment of the present disclosure. DETAILED DESCRIPTION

[0052] In this specification, the numerical range represented by "~" refers to the range in which the numerical values ​​recorded before and after "~" are respectively the minimum and maximum values, or the lower limit and the upper limit value. In the numerical range recorded in stages in this specification, the upper limit value or the lower limit value recorded in a certain numerical range can be replaced by the upper limit value or the lower limit value of the numerical range recorded in other stages. In addition, in the numerical range recorded in this specification, the upper limit value or the lower limit value recorded in a certain numerical range can also be replaced by the value shown in the embodiment.

[0053] In the present specification, a combination of preferred aspects is a more preferred aspect.

[0054] In the present specification, the term "process" includes not only an independent process but also a process that cannot be clearly distinguished from other processes as long as the intended purpose of the process is achieved.

[0055] In the present disclosure, EUV (Extreme Ultra Violet) light refers to light with a wavelength of 5 nm to 30 nm. The wavelength of EUV light is preferably 5 nm to 13.5 nm.

[0056] In the present disclosure, EUV light and light having a wavelength shorter than EUV light are sometimes collectively referred to as “EUV light, etc.”

[0057] In this specification, the term “pellicle assembly” refers to a member including a pellicle assembly frame and a pellicle supported on one end surface in the thickness direction of the pellicle assembly frame.

[0058] In this specification, the "method for removing the pellicle assembly" refers to a method for removing (ie, removing) at least the pellicle from a photomask to which the pellicle assembly is attached.

[0059] The concept of "method for disassembling the protective film assembly" includes the following two:

[0060] A method for removing the pellicle while leaving the pellicle assembly frame on the photomask to which the pellicle assembly is attached; and

[0061] A method for removing both the pellicle and the pellicle frame (ie, the entire pellicle) from a photomask to which the pellicle is attached.

[0062] The concept of "method for disassembling the pellicle assembly" also includes methods for disassembling only the pellicle assembly or both the pellicle assembly and the pellicle assembly frame, and other elements (for example, adhesive layers, etc.).

[0063] The concept of "method for removing the pellicle assembly" also includes a method for removing the pellicle assembly from the photomask while destroying the pellicle assembly.

[0064] [How to remove the protective film assembly]

[0065] The disassembly method of the protective film assembly disclosed in the present invention comprises the following steps:

[0066] A step of preparing a laminated body, the laminated body comprising a photomask, a pellicle assembly frame, and a pellicle arranged in the following order;

[0067] The step of preparing electrodes; and

[0068] The removal process is to configure the stack and the electrode so that the protective film in the stack is opposite to the electrode, and apply voltage to the electrode to generate electrostatic attraction, so that the protective film is attracted toward the electrode by the generated electrostatic attraction, thereby removing the protective film from the photomask in the stack.

[0069] The method for disassembling the pellicle assembly of the present disclosure is excellent in suppressing contamination of the photomask. That is, according to the method for disassembling the pellicle assembly of the present disclosure, contamination of the photomask can be suppressed. The reason why such an effect can be achieved is presumed to be as follows.

[0070] The protective film is an extremely thin film. For example, the thickness of the protective film used in EUV lithography is at the nanometer level. Therefore, when the protective film assembly is removed from the photomask, the protective film is easily damaged. Sometimes, the protective film piece produced by the damage of the protective film (including the concept of destruction. The same applies below) adheres to the photomask, causing the photomask to be contaminated. In particular, the self-supporting part of the protective film (that is, the part located on the opening formed by the inner peripheral surface of the protective film assembly frame and not supported by the protective film assembly frame) is easy to be damaged.

[0071] With regard to these problems, in the pellicle assembly disassembly method of the present disclosure, the pellicle is removed from the photomask in a stacked body including a photomask, a pellicle assembly frame, and a pellicle in the following order as follows.

[0072] The stack and the electrode are arranged so that the protective film in the stack is opposite to the electrode, and a voltage is applied to the electrode to generate an electrostatic attraction. The protective film is attracted toward the electrode by the electrostatic attraction, thereby removing the protective film from the photomask in the stack. At this time, it does not matter even if the protective film is damaged. In the case of damage to the protective film, the protective film piece generated by the damage is attracted toward the electrode.

[0073] Thus, in the method for disassembling the pellicle assembly of the present disclosure, even if the pellicle is damaged, the pellicle produced by the damage to the pellicle is directed toward the electrode, thereby preventing the pellicle from adhering to the photomask (i.e., contamination of the photomask by the pellicle).

[0074] In the present disclosure, "the protective film and the electrode in the laminate are opposed to each other" means that the electrode is arranged on the protective film side (non-photomask side) in the laminate. As long as this condition is met, other objects (for example, components other than the electrodes in the electrostatic chuck described later (for example, resin components), thin films described later, etc.) may be interposed between the protective film and the electrode.

[0075] Hereinafter, an example of the present disclosure will be described with reference to the attached drawings as appropriate. Figure 1 While explaining.

[0076] However, the present disclosure is not limited to the specific examples such as the following drawings.

[0077] The same reference numerals are given to common elements in the drawings, and duplicate descriptions may be omitted.

[0078] In addition, in the drawings, in order to make the structure easier to see, part of the hidden lines may be omitted.

[0079] Figure 1 This is a schematic cross-sectional view schematically showing an example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0080] like Figure 1 As shown, the laminated body according to this example includes a photomask 105 , a pellicle frame 103 , and a pellicle membrane 102 arranged in the following order.

[0081] The laminated body according to this example can be obtained by, for example, attaching pellicle 101 including pellicle 102 and pellicle frame 103 to photomask 105 .

[0082] The pellicle assembly frame 103 supports the pellicle 102 at one end surface side in the thickness direction thereof. In other words, the portion of the pellicle 102 that overlaps with the pellicle assembly frame 103 when viewed from above is supported by the pellicle assembly frame 103. The portion of the pellicle 102 that overlaps with the opening defined by the inner peripheral surface of the pellicle assembly frame 103 when viewed from above is not supported but becomes a self-supporting portion (i.e., a portion that is not formed on the substrate but exists as a separate film).

[0083] Figure 2 This is a schematic cross-sectional view schematically showing an example of disassembly of the pellicle assembly in the present disclosure.

[0084] like Figure 2 As shown in the figure, in the removal of the pellicle assembly involved in this example, the pellicle assembly frame 103 is left in Figure 1The protective film 102 is removed from the state on the photomask 105 in the stacked body shown in the figure. The removal is performed by using electrostatic attraction to move the protective film 102 in the direction of an electrode (for example, Figure 2 (the middle is above) to attract.

[0085] In this example, pellicle membrane 102 maintains its shape after being removed, but pellicle membrane 102 may be destroyed during removal.

[0086] Figure 3 This is a schematic cross-sectional view schematically showing another example of disassembly of the pellicle assembly in the present disclosure.

[0087] like Figure 3 As shown, in the disassembly of the protective film assembly involved in this example, Figure 1 In the illustrated laminated body, both pellicle 102 and pellicle frame 103 (ie, pellicle 101 as a whole) are removed from photomask 105. The removal is performed by attracting pellicle 101 toward an electrode (not shown) disposed opposite pellicle 102 by electrostatic attraction.

[0088] In this example, pellicle membrane 102 in disassembled pellicle membrane assembly 101 also maintains its membrane shape, but pellicle membrane 102 may be destroyed during disassembly.

[0089] Hereinafter, each step that may be included in the pellicle assembly disassembly method of the present disclosure will be described in more detail.

[0090] <Step of Preparing Laminated Body>

[0091] The pellicle assembly disassembly method disclosed herein includes a step of preparing a stacked body.

[0092] The laminated body referred to here is a laminated body including a photomask, a pellicle assembly frame, and a pellicle arranged in the following order (for example, see the above Figure 1 ).

[0093] The step of preparing a laminated body may be a step of manufacturing the above-mentioned laminated body, or may be a step of simply preparing the above-mentioned laminated body manufactured in advance.

[0094] (Protective film)

[0095] The laminated body prepared in this step includes a pellicle.

[0096] As the pellicle membrane, a known pellicle membrane can be used.

[0097] The material contained in the pellicle membrane is not particularly limited, and may be an organic material, an inorganic material, or a mixed material of an organic material and an inorganic material.

[0098] Examples of the organic material include fluorine-based polymers and the like.

[0099] Examples of the inorganic material include crystalline silicon (for example, single crystal silicon, polycrystalline silicon, etc.), diamond-like carbon (DLC), graphite, amorphous carbon, graphene, silicon carbide, silicon nitride, aluminum nitride, and the like.

[0100] The pellicle membrane may contain one of the above materials alone, or may contain two or more of them.

[0101] The pellicle membrane may be a single-layer structure or may be a structure composed of two or more layers.

[0102] The thickness of the pellicle membrane (the total thickness when formed of two or more layers) is preferably 2 nm to 200 nm, more preferably 2 nm to 100 nm, further preferably 2 nm to 70 nm, and particularly preferably 2 nm to 50 nm. The lower limit of the thickness of the pellicle membrane may be 5 nm or 10 nm.

[0103] Regarding the configuration of the pellicle membrane, for example, the configuration of a known pellicle membrane such as Japanese Patent Application Publication No. 2014-021217 or International Publication No. 2015 / 174412 can be appropriately referred to.

[0104] (Protective film assembly frame)

[0105] The laminated body prepared in this step includes a pellicle assembly frame.

[0106] As the pellicle frame, a well-known pellicle frame as a member having a frame shape can be used.

[0107] As the material of the pellicle assembly frame, a general material used for a pellicle assembly frame can be applied.

[0108] Specifically, the material of the pellicle assembly frame includes aluminum, aluminum alloys (5000 series, 6000 series, 7000 series, etc.), stainless steel, silicon, silicon alloys, iron, iron alloys, carbon steel, tool steel, ceramics, metal-ceramic composite materials, resins, etc. Among them, aluminum or aluminum alloys are more preferred in terms of lightness and rigidity.

[0109] Furthermore, the pellicle assembly frame may have a protective film on its surface.

[0110] The protective film is preferably a protective film having resistance to hydrogen radicals and EUV light present in the exposure atmosphere.

[0111] As the protective film, for example, an oxide film can be cited. The oxide film can be formed by a known method such as anodization. In addition, the oxide film can be colored with a black dye. In the case where the pellicle assembly frame has an oxide film colored with a black dye, it is easier to detect foreign matter on the pellicle assembly frame.

[0112] Regarding the configuration of the pellicle frame, for example, the configuration of a known pellicle frame such as Japanese Patent Application Laid-Open No. 2014-021217 or Japanese Patent Application Laid-Open No. 2010-146027 can be appropriately referred to.

[0113] Preferably, at least one of a recess and a cutout is provided on the outer peripheral surface of the pellicle assembly frame. Thus, after the pellicle is removed from the photomask by electrostatic attraction, it is easier to remove the pellicle assembly frame at the stage of removing the pellicle assembly frame. For example, by inserting or hooking a gripping tool for operating the pellicle assembly frame into the recess or the cutout, the pellicle assembly frame can be easily removed from the photomask.

[0114] The outer peripheral surface of the pellicle frame may include only one or more recesses or cutouts. When multiple recesses are provided, the shapes of the multiple recesses may be the same or different (the same applies to the cutouts).

[0115] Figure 5A This is a schematic cross-sectional view showing an example of a laminated body including a pellicle frame in which a recessed portion is provided on the outer peripheral surface.

[0116] like Figure 5A As shown, the laminated body according to this example includes a photomask 505, and a pellicle assembly 501 including a pellicle assembly frame 503 and a pellicle 502. In this laminated body, the photomask 505, the pellicle assembly frame 503, and the pellicle 502 are arranged in this order.

[0117] Concave portion 509 is provided on the outer peripheral surface of pellicle frame 503. Concave portion 509 extends in a direction parallel to the surface of pellicle 502 starting from the outer peripheral surface of the pellicle frame.

[0118] In the stacked body in this example, for example, after the protective film 502 is removed from the photomask 505 by electrostatic attraction, at the stage of removing the protective film assembly frame 503, the protective film assembly frame 503 can be easily removed from the photomask 505 by inserting or hooking a holding tool for operating the protective film assembly frame into the recess 509.

[0119] Figure 5B for Figure 5A The modified example of the stacked body shown is a schematic cross-sectional view showing an example of a stacked body including a pellicle frame having a cutout provided on the outer peripheral surface.

[0120] Figure 5B In the structure of the laminate shown in FIG. 1 , except that the recess 509 is changed to a cutout 510, the structure is similar to that of the laminate shown in FIG. Figure 5A The structures of the stacked bodies shown are identical.

[0121] In the laminated body of this example, for example, by inserting or hooking a gripper for operating the pellicle frame into the cutout 510 , the pellicle frame 503 can be easily removed from the photomask 505 .

[0122] In addition, a through hole penetrating from the outer peripheral surface to the inner peripheral surface of the pellicle assembly frame may be provided in the pellicle assembly frame. The through hole functions as a vent for ventilating the outside of the stacked body and the inside of the stacked body (i.e., the space surrounded by the inner peripheral surface of the pellicle assembly frame, the pellicle, and the photomask), for example.

[0123] For example, in the disassembly process described later, voltage is applied to the electrode to generate electrostatic attraction, and gas is introduced into the interior of the stack through the above-mentioned vent provided in the protective film assembly frame, so that the interior of the stack is at a positive pressure, causing the protective film to expand outward (i.e., in the direction of the electrode) to damage the protective film, and the protective film pieces produced by the damage are attracted to the electrode side, thereby enabling the protective film to be removed.

[0124] In addition, a hole having a thickness direction of the pellicle assembly frame as a depth direction (hereinafter, also referred to as a "thickness direction hole of the pellicle assembly frame") may be provided in the pellicle assembly frame. Thus, after the pellicle is removed from the photomask by electrostatic attraction, it is easier to remove the pellicle assembly frame at the stage of removing the pellicle assembly frame. For example, by inserting or hooking a gripping tool for operating the pellicle assembly frame through the thickness direction hole of the pellicle assembly frame, the pellicle assembly frame can be easily removed from the photomask.

[0125] In order to facilitate removal of the pellicle assembly frame, the pellicle membrane and the pellicle assembly frame in the laminate may be provided with holes whose depth direction is the thickness direction of the pellicle membrane and the pellicle assembly frame.

[0126] Figure 4 This is a schematic cross-sectional view showing an example of a laminated body in which the pellicle membrane and the pellicle assembly frame are provided with holes having a depth direction in the thickness direction of the pellicle membrane and the pellicle assembly frame.

[0127] like Figure 4 As shown, the laminated body according to this example includes a photomask 405 , and a pellicle assembly 401 including a pellicle assembly frame 403 and a pellicle 402 .

[0128] In the laminated body, pellicle membrane 402 and pellicle membrane assembly frame 403 are provided with holes 409 whose depth direction is the thickness direction thereof.

[0129] The recess or cutout provided on the outer peripheral surface of the pellicle assembly frame, the hole whose depth direction is the thickness direction of the pellicle assembly frame, and the hole whose depth direction is the thickness direction of the pellicle and the pellicle assembly frame (hereinafter collectively referred to as "space") described above can be only one or more. In addition, the shape or size of these spaces can be different for each space.

[0130] (Protective film adhesive layer)

[0131] The laminated body prepared in this step may further include a pellicle adhesive layer between the pellicle membrane and the pellicle assembly frame.

[0132] The laminated body in such an embodiment can be produced, for example, by attaching a pellicle assembly including a pellicle membrane, a pellicle adhesive layer, and a pellicle assembly frame to a photomask.

[0133] Here, the pellicle membrane adhesive layer refers to a layer interposed between the pellicle membrane and the pellicle membrane assembly frame and used to adhere the pellicle membrane to the pellicle membrane assembly frame.

[0134] The pellicle adhesive layer can contain a known adhesive.

[0135] Examples of the adhesive that may be contained in the pellicle adhesive layer include acrylic resin adhesives, epoxy resin adhesives, silicone resin adhesives, fluorine-containing silicone adhesives, and fluorine-containing ether adhesives.

[0136] (Photomask)

[0137] The laminated body prepared in this step includes a photomask.

[0138] The photomask is not particularly limited as long as it has a light irradiation surface to which light is irradiated.

[0139] As the photomask, for example, a photomask including a supporting substrate, a reflective layer stacked on the supporting substrate, and an absorber layer formed on the reflective layer can be used.

[0140] In the photomask, the surface on the side where the reflective layer and the absorber layer are provided becomes the light irradiation surface. When the light irradiation surface is irradiated with light such as EUV light, the absorber layer on the light irradiation surface absorbs at least a part of the irradiated light, and the remaining part of the light is reflected by the reflective layer. The reflected light is irradiated to the sensitive substrate (for example, a semiconductor substrate with a photoresist film). As a result, a desired image is formed on the sensitive substrate.

[0141] As the reflective layer, a multilayer film of molybdenum (Mo) and silicon (Si) can be preferably used.

[0142] The absorber layer is preferably made of a material having high absorption properties for EUV light, such as chromium (Cr) or tantalum nitride.

[0143] (Mask Adhesive Layer)

[0144] The laminated body prepared in this step may further include a mask adhesive layer between the photomask and the pellicle frame.

[0145] Such a laminate can be produced, for example, by attaching a pellicle assembly including a pellicle, a pellicle assembly frame, and a mask adhesive layer arranged in the following order to a photomask in an orientation such that the mask adhesive layer contacts the photomask.

[0146] Here, the mask adhesive layer refers to a layer interposed between the photomask and the pellicle frame and used to bond the photomask and the pellicle frame.

[0147] The mask adhesive layer can contain a known adhesive.

[0148] Examples of the adhesive that may be contained in the mask adhesive layer include double-sided adhesive tapes, silicone resin adhesives, acrylic adhesives, rubber adhesives, vinyl adhesives, and epoxy adhesives.

[0149] The laminated body prepared in this step may include both the mask adhesive layer and the pellicle adhesive layer.

[0150] Figure 6 To schematically illustrate another example of a stacked body (i.e., a stacked body) prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure. Figure 1 A schematic cross-sectional view of another example (different from the one shown).

[0151] like Figure 6 As shown, the laminated body according to this example includes a photomask 605, a mask adhesive layer 607, a pellicle assembly frame 603, a pellicle adhesive layer 606, and a pellicle 602 arranged in the following order.

[0152] The laminated body in this example can be produced using, for example, pellicle assembly 601 including mask adhesive layer 607 , pellicle assembly frame 603 , pellicle adhesive layer 606 , and pellicle 602 arranged in the following order.

[0153] Figure 7 This is a schematic cross-sectional view schematically showing still another example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0154] Figure 7 The example shown in the laminated body has a protective film support frame 608 and a support frame adhesive layer 609 between the protective film adhesive layer 606 and the protective film assembly frame 603 (here, the protective film support frame 608 is connected to the protective film adhesive layer 606, and the support frame adhesive layer 609 is connected to the protective film assembly frame 603). Figure 6 The structure of the laminated body according to the example shown is the same.

[0155] The laminated body in this example can be produced using, for example, a pellicle assembly 611 including a mask adhesive layer 607 , a pellicle assembly frame 603 , a support frame adhesive layer 609 , a pellicle support frame 608 , a pellicle adhesive layer 606 , and a pellicle 602 arranged in the following order.

[0156] Figure 8 This is a schematic cross-sectional view schematically showing still another example of a stacked body prepared in the step of preparing a stacked body in the pellicle assembly disassembly method of the present disclosure.

[0157] Figure 8 The structure of the laminated body according to the example shown is similar to that of the laminated body except that the protective film adhesive layer 606 is not present. Figure 7 The structure of the laminated body according to the example shown is the same.

[0158] The laminated body in this example can be produced, for example, using pellicle assembly 612 including mask adhesive layer 607 , pellicle assembly frame 603 , support frame adhesive layer 609 , pellicle support frame 608 , and pellicle 602 arranged in the following order.

[0159] As above Figure 6 to Figure 8 As shown, within the scope of the protective membrane assembly in the present disclosure,

[0160] It includes not only a method in which the pellicle membrane is directly supported (that is, not via other elements) on one end surface side in the thickness direction of the pellicle membrane assembly frame (see Figure 1 ),

[0161] It also includes a method in which the pellicle is supported on one end surface side of the pellicle assembly frame in the thickness direction via other elements (e.g., a pellicle adhesive layer, a pellicle support frame, a support frame adhesive layer, etc.) Figure 6 to Figure 8 ).

[0162] <Electrode preparation process>

[0163] The method for disassembling the pellicle assembly disclosed herein includes a step of preparing electrodes.

[0164] The electrode is a member used to remove the pellicle membrane in the removal step described later.

[0165] The step of preparing electrodes may be a step of manufacturing electrodes, or may be a step of simply preparing electrodes manufactured in advance.

[0166] The size, shape, and number of the electrodes are not particularly limited and can be appropriately set.

[0167] From the viewpoint of the recyclability of the pellicle membrane, the size of the electrode is preferably larger than the self-supporting portion of the pellicle membrane (e.g. Figure 6 The area in A) is large.

[0168] The step of preparing the electrode may be a step of preparing a member including the electrode (for example, an electrostatic chuck).

[0169] In this case, in the removal step described later, a voltage is applied to the electrode in the member including the electrode, and the pellicle membrane is removed by utilizing the electrostatic attraction generated.

[0170] The material of the portion other than the electrode in the member including the electrode is not particularly limited, and examples thereof include glass, ceramics, and resins having insulating properties.

[0171] Furthermore, the structure of the electrode in the member including the electrode is not particularly limited, and may be a monopolar type or a bipolar type.

[0172] An electrostatic chuck as an example of a member including an electrode may be a Coulomb force type electrostatic chuck or a Johnson-Rabbeck force type (JR type) electrostatic chuck.

[0173] Here, the Coulomb force type electrostatic chuck is an electrostatic chuck in which the material disposed between the electrode and the object on which the electrostatic attraction acts is an insulator, and the JR type electrostatic chuck is an electrostatic chuck in which the material disposed between the electrode and the object on which the electrostatic attraction acts is a conductive ceramic compound.

[0174] The Coulomb force type electrostatic chuck is not particularly limited, and examples thereof include:

[0175] The Coulomb force type electrostatic chuck shown in Japanese Patent Publication No. 53-77489 is a polyimide sheet of insulating polymer material attached to a metal plate by an adhesive;

[0176] Coulomb force type electrostatic chucks in which electrodes are provided between two insulating ceramic plates as shown in Japanese Patent Laid-Open Nos. 63-95644, 4-206545 and 5-36819;

[0177] As disclosed in Japanese Patent Application Laid-Open No. 59-152636, there is a Coulomb force type electrostatic chuck in which electrodes on an insulating ceramic plate are coated with insulating ceramic by thermal spraying.

[0178] In the JR type electrostatic chuck, the volume resistivity of the conductive ceramic disposed between the electrode and the object is an important factor.

[0179] The JR type electrostatic chuck is not particularly limited, and examples thereof include:

[0180] A JR type electrostatic chuck using conductive ceramics formed of aluminum nitride, TiN, and Ce as described in Japanese Patent Publication No. 2000-143349;

[0181] A JR type electrostatic chuck using conductive ceramics formed of aluminum oxide and titanium oxide as described in Japanese Patent Application Laid-Open No. 2006-049356;

[0182] Japanese Patent Application Publication No. 2008-087988 discloses a JR type electrostatic chuck using a conductive ceramic in which one or more of titanium carbide, titanium nitride, tungsten carbide, tantalum carbide, molybdenum carbide, niobium carbide, and vanadium carbide are dispersed in an insulating ceramic formed of aluminum oxide, zirconium oxide, silicon nitride, or aluminum nitride.

[0183] Among these, as the electrostatic chuck, from the viewpoint of suppressing contamination of the photomask, a Coulomb force type electrostatic chuck is preferable.

[0184] <Disassembly process>

[0185] The method for disassembling a pellicle assembly disclosed herein includes a disassembly step of disassembling the pellicle from the photomask in the stacked body.

[0186] The disassembly in this step is performed by arranging the stack and the electrode so that the protective film in the stack faces the electrode, applying voltage to the electrode to generate electrostatic attraction, and attracting the protective film toward the electrode by the generated electrostatic attraction. Thus, the protective film is recovered.

[0187] The protective film can be destroyed during this process. In the case where the protective film is destroyed, the protective film piece is guided toward the electrode and recovered.

[0188] From the viewpoint of the recoverability of the pellicle membrane, the electrostatic attraction generated by applying a voltage to the electrodes is preferably 9.8 mN / cm 2 (i.e. 1gf / cm 2 ) or more, more preferably 49 mN / cm 2 (i.e. 5gf / cm 2 )above.

[0189] As described above, when the protective film is removed by utilizing electrostatic attraction in this process, other objects (for example, components other than the electrodes in the above-mentioned electrostatic chuck (for example, resin components), the film described later, etc.) may or may not be present between the protective film and the electrode.

[0190] In the absence of any other object, the pellicle (including the case of a pellicle sheet; the same shall apply hereinafter) drawn toward the electrode is adsorbed to the surface of the electrode and recovered.

[0191] When another object is interposed, the pellicle film drawn toward the electrode is adsorbed onto the surface of the other object interposed therebetween and is recovered.

[0192] In either case, the pellicle membrane moves in a direction away from the photomask, so that the pellicle membrane can be prevented from being attached to the photomask (ie, contamination).

[0193] (film)

[0194] In the removal step, preferably, a thin film is disposed between the pellicle membrane and the electrode in the stacked body, and the pellicle membrane is attracted to the surface of the thin film by the electrostatic attraction, thereby removing the pellicle membrane. This makes it easier to recover the pellicle membrane.

[0195] There is no particular limitation on the thin film.

[0196] The concept of "film" in the present disclosure includes not only an article generally referred to as "film" but also an article referred to as "sheet" and an article referred to as "paper".

[0197] The thickness of the film is not particularly limited, but is preferably 5 μm to 200 μm, more preferably 5 μm to 100 μm, from the viewpoint of durability.

[0198] Examples of the material of the thin film include at least one selected from the group consisting of resin, rubber, paper, metallic glass, and ceramics.

[0199] Examples of the resin in the film containing a resin as a main component (hereinafter also referred to as a "resin film") include polyethylene, polypropylene (PP), polyester (for example, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), etc.), and the like.

[0200] The resin film may include only one of the above-mentioned materials, or may include two or more of them.

[0201] Here, the film containing a resin as a main component refers to a film in which the content of the resin is 50% by mass or more based on the entire film.

[0202] An adhesive layer may be formed on one or both sides of the film.

[0203] That is, in the disassembly process, the film with the adhesive layer can be placed between the protective film and the electrode in the stacked body in such a way that the protective film and the adhesive layer face each other. In this state, the protective film is attracted to the surface of the adhesive layer of the film with the adhesive layer by the above-mentioned electrostatic attraction and adsorbed on the surface, thereby being disassembled. According to this method, the recovery of the protective film becomes easier.

[0204] As the film with an adhesive, a resin film with an adhesive layer is preferable.

[0205] The adhesive layer in the film with an adhesive layer (preferably a resin film with an adhesive layer, the same shall apply hereinafter) preferably contains an adhesive. Preferred adhesives will be described later.

[0206] The thickness of the adhesive layer in the adhesive layer-attached film is not particularly limited, but is preferably in the range of about 50 μm to 200 μm from the viewpoint of recovery of the pellicle.

[0207] The method for producing the film with an adhesive layer is not particularly limited, and a known production method can be used.

[0208] As a method for producing a film with an adhesive layer, for example:

[0209] A method of applying an adhesive solution or the like for forming an adhesive layer on at least one side of a film and drying the coating;

[0210] A method in which an adhesive solution for forming an adhesive layer is applied onto a release liner to form an adhesive layer, and then the adhesive layer is transferred to a film.

[0211] The release liner is not particularly limited as long as it can be easily released from the adhesive layer, and for example, a resin film (for example, a polyester film such as PET) whose surface has been subjected to a release treatment with a fluorine compound or the like can be used.

[0212] (Heat treatment during disassembly process)

[0213] When the laminate further includes a mask adhesive layer between the photomask and the pellicle assembly frame, the laminate (i.e., a laminate including a photomask, a mask adhesive layer, a pellicle assembly frame, and a pellicle arranged in the following order) is set as the first laminate,

[0214] Disassembly procedures may include:

[0215] In a state where the pellicle assembly frame remains on the photomask side of the first stacked body formed with the adhesive layer, the pellicle is removed by the electrostatic attraction to obtain a second stacked body including the photomask, the mask adhesive layer, and the pellicle assembly frame;

[0216] heat treating the second laminate; and

[0217] The pellicle frame is removed from the photomask in the second stack.

[0218] According to this aspect, the adhesive force of the mask adhesive layer can be reduced by heat treating the second stacked body, thereby making it easier to remove the pellicle frame.

[0219] In the above-mentioned heat treatment, the entire second laminate may be heat-treated, or a portion of the second laminate (for example, a portion including the mask adhesive layer) may be heat-treated.

[0220] The apparatus used for the heat treatment is not particularly limited, and a heater, a hot plate, an oven, or the like can be used.

[0221] As a temperature of heat treatment, 50 degreeC - 140 degreeC is mentioned, for example.

[0222] The heat treatment time may be, for example, 10 seconds to 300 seconds.

[0223] <Step of heat treating the laminate>

[0224] The pellicle assembly disassembly method of the present disclosure may further include a step of heat treating the stacked body (ie, the stacked body including the photomask, the pellicle assembly frame, and the pellicle) before the disassembly step.

[0225] In the case where the laminate includes at least one of a pellicle adhesive layer and a mask adhesive layer, a method including a step of heat treating the laminate is particularly effective. In this case, by heat treating the laminate, the adhesive force of at least one of the pellicle adhesive layer and the mask adhesive layer can be reduced, thereby preventing damage to the pellicle and making it easier to disassemble.

[0226] In the heat treatment, the entire laminate may be heat treated, or a portion of the laminate (for example, a portion including at least one of the pellicle adhesive layer and the mask adhesive layer) may be heat treated.

[0227] The apparatus used for the heat treatment is not particularly limited, and a heater, a hot plate, an oven, or the like can be used.

[0228] As a temperature of heat treatment, 50 degreeC - 140 degreeC is mentioned, for example.

[0229] The heat treatment time may be, for example, 10 seconds to 300 seconds.

[0230] <Adhesive layer forming step>

[0231] The step of forming an adhesive layer is a step of forming an adhesive layer on the pellicle film in the above-mentioned laminated body.

[0232] From the viewpoint of further reducing the load applied to the protective film when forming the adhesive layer, the step of forming the adhesive layer is preferably a step of forming the adhesive layer by spray coating, spin coating, inkjet, screen printing or dip coating.

[0233] More preferably, the adhesive layer is formed by spray coating or spin coating.

[0234] In particular, a step of forming the adhesive layer by a spray coating method is preferred.

[0235] The adhesive layer can be formed by the spray coating method using a known spray coating device.

[0236] Examples of the spray coating apparatus include a spray gun, an ultrasonic spray coating apparatus, a two-fluid spray coating apparatus, and a one-fluid spray coating apparatus.

[0237] The adhesive layer preferably contains at least one adhesive.

[0238] From the viewpoint of suppressing contamination of the photomask, the adhesive layer preferably contains:

[0239] At least one adhesive selected from the group consisting of silicone adhesives, acrylic adhesives, urethane adhesives, polyamide adhesives, polyester adhesives, ethylene vinyl acetate copolymers, olefin adhesives, polybutadiene adhesives, rubber adhesives and styrene adhesives,

[0240] More preferably, the adhesive comprises at least one adhesive selected from the group consisting of acrylic adhesives, polybutadiene adhesives, rubber adhesives and styrene adhesives.

[0241] More preferably, at least one adhesive selected from the group consisting of acrylic adhesives, polybutadiene adhesives, and rubber adhesives is contained.

[0242] The adhesive may be used alone or in combination of two or more.

[0243] The silicone adhesive is preferably an adhesive containing a silicone resin as a main component. The silicone adhesive is not particularly limited, and examples thereof include addition reaction type silicone adhesives, peroxide curing type silicone adhesives, and condensation type silicone adhesives.

[0244] Among these, from the viewpoint of holding the pellicle with the adhesive, an addition-curable silicone-based adhesive having a large holding power is preferred.

[0245] In the present disclosure, the main component of the adhesive refers to a component that occupies 50% by mass or more with respect to the total mass of the adhesive.

[0246] The acrylic adhesive is preferably an adhesive containing an acrylic resin as a main component. The acrylic resin contained in the acrylic adhesive is not particularly limited, and examples thereof include alkyl (meth)acrylate adhesives, urethane (meth)acrylates, epoxy (meth)acrylates, and the like.

[0247] The acrylic adhesive may contain an acrylic rubber resin as a main component. Examples of the acrylic rubber resin include a block copolymer of methyl methacrylate and butyl acrylate.

[0248] The urethane adhesive is preferably an adhesive containing a polyurethane resin as a main component. The polyurethane contained in the urethane adhesive is not particularly limited, and examples thereof include polyester polyurethane and polycarbonate polyurethane.

[0249] The polyamide adhesive is preferably an adhesive having a polyamide resin as a main component. The polyamide resin contained in the polyamide adhesive is not particularly limited, and examples thereof include polyamide (amide 11) obtained by ring-opening polycondensation of undecane lactam and polyamide (amide 12) obtained by ring-opening polycondensation of lauryl lactam.

[0250] The polyester-based adhesive is preferably an adhesive containing a polyester resin as a main component. The polyester resin is not particularly limited, and examples thereof include polycondensates of polycarboxylic acids and polyols.

[0251] Specific examples of the polyester include polyethylene terephthalate and polybutylene terephthalate.

[0252] The olefin-based adhesive is preferably an adhesive having an olefin resin as a main component. The olefin is not particularly limited and may be a polymer obtained by homopolymerizing an olefin or a copolymer obtained by polymerizing an olefin and other monomers. The olefin is preferably an olefin having 2 to 6 carbon atoms, and examples thereof include ethylene, propylene, butene, methylpentene, and hexene. Other monomers used in the copolymer include, for example, vinyl acetate.

[0253] The rubber adhesive is preferably an adhesive containing rubber as a main component, and for example, natural rubber adhesives and synthetic rubber adhesives can be appropriately cited. As synthetic rubber adhesives, for example, styrene-butadiene copolymers (SBR, SBS), styrene-isoprene copolymers (SIS), acrylonitrile-butadiene copolymers (NBR), chloroprene polymers, isobutylene-isoprene copolymers (butyl rubber), etc. can be cited.

[0254] Among these, as the rubber-based adhesive, from the viewpoint of facilitating formation of an adhesive layer and facilitating retention of a pellicle, a synthetic rubber-based adhesive is preferred, and an adhesive containing a styrene-butadiene copolymer as a main component is more preferred.

[0255] The polybutadiene adhesive is an adhesive other than the rubber adhesive, preferably an adhesive having polybutadiene as a main component. As the polybutadiene, there is no particular limitation as long as it contains a structural unit formed by butadiene, and it can be a homopolymer or a copolymer with a monomer other than butadiene.

[0256] The styrene adhesive is an adhesive other than the above-mentioned rubber adhesive, and is an adhesive having a polystyrene resin as a main component. The polystyrene resin is not particularly limited, and may include homopolymers of styrene monomers (e.g., styrene, methylstyrene, ethylstyrene, isopropylstyrene, dimethylstyrene, p-methylstyrene, chlorostyrene, bromostyrene, vinyltoluene, vinylxylene), and copolymers of styrene monomers and monomers copolymerizable with styrene monomers.

[0257] Examples of the monomer copolymerizable with the styrene-based monomer include vinyl monomers (eg, acrylonitrile, methacrylonitrile, acrylic acid, methacrylic acid, methyl methacrylate, maleic anhydride, and butadiene).

[0258] From the viewpoint of suppressing contamination of the photomask, the glass transition temperature of the adhesive is preferably -60°C to -20°C, more preferably -60°C to -40°C.

[0259] From the viewpoint of suppressing contamination of the photomask, the weight average molecular weight of the base polymer of the adhesive is preferably 10,000 to 1,500,000, and more preferably 50,000 to 1,000,000. In addition, base polymers having different weight average molecular weights may be mixed.

[0260] When the adhesive is applied to the protective film to form an adhesive layer (for example, the amount of adhesive applied by spray coating) the applied amount after drying is preferably 1 g / m 2 ~500 mg / m 2 , more preferably 5 mg / m 2 ~200g / m 2 .

[0261] The adhesive layer can be formed by applying an adhesive solution containing an adhesive and a solvent onto the protective film.

[0262] As the solvent in the adhesive solution, a known solvent can be used.

[0263] Examples of the solvent in the adhesive solution include acetone, methyl ethyl ketone (2-butanone), cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 1-methoxy-2-propanol, 3-methoxy-1-propanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N,N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, methyl lactate, ethyl lactate, and the like.

[0264] The solvent in the adhesive solution may be only one kind or two or more kinds.

[0265] The solid content concentration in the adhesive solution (that is, the content of the adhesive relative to the total amount of the adhesive solution) is preferably about 1% by mass to 50% by mass.

[0266] The viscosity (25° C.) of the adhesive solution is preferably 1 mPa·s to 1,000 mPa·s, and more preferably 100 mPa·s to 800 mPa·s, from the viewpoint of further improving the adhesion between the pellicle and the adhesive.

[0267] The viscosity of the adhesive solution can be appropriately adjusted by the type and / or amount of the above-mentioned solvent.

[0268] The thickness of the adhesive layer is more preferably 1 μm or more and 1 mm or less, and further preferably 50 μm or more and 1 mm or less.

[0269] The thickness of the adhesive layer can be adjusted by a known method.

[0270] For example, when the adhesive layer is formed by a spray coating method, the thickness of the adhesive layer can be adjusted by adjusting the amount of adhesive solution sprayed from a spray coating device (eg, a spray gun).

[0271] The thickness of the adhesive layer can be determined by cutting the laminate in a vertical direction and observing the cross section with a scanning electron microscope.

[0272] The adhesive layer may have grooves of a lattice structure. The adhesive layer has grooves of a lattice structure, and when the protective film described later is laminated on the adhesive layer, for example, when the protective film and the protective film are attached to each other, the gas entering between the protective film and the protective film can be easily discharged to the outside from the lattice structure, thereby preventing the protective film from being broken.

[0273] An apparatus for implementing the step of forming an adhesive layer (for example, an apparatus for disassembling a protective film assembly described later) may include a cover for preventing the adhesive discharged onto the self-supporting portion of the protective film from adhering to portions other than the self-supporting portion of the protective film and portions other than the protective film.

[0274] <Protective film attaching process>

[0275] The method for disassembling a pellicle assembly in the embodiment including the step of forming the adhesive layer may further include, after the step of forming the adhesive layer and before the step of disassembling, the step of adhering a protective film to the adhesive layer in the laminate having the adhesive layer formed thereon.

[0276] The protective film is not particularly limited, and suitable examples thereof include polyethylene terephthalate (PET) film, polypropylene (PP) film, and polycarbonate (PC) film.

[0277] The thickness of the protective film is not particularly limited, but is preferably 50 μm to 500 μm, and more preferably 100 μm to 200 μm, from the viewpoint of having appropriate strength.

[0278] The protective film may be laminated on the pellicle film in the form of a two-layer film co-extruded with the above-mentioned adhesive layer.

[0279] The method for disassembling the pellicle assembly disclosed in the present invention may include other steps besides the above steps as needed.

[0280] Embodiment 1 is described below as a specific embodiment of the method for disassembling the pellicle assembly of the present disclosure. However, the method for disassembling the pellicle assembly of the present disclosure is not limited to the following embodiment.

[0281] <Implementation method 1>

[0282] Regarding implementation mode 1, while referring to Figure 6 While explaining.

[0283] about Figure 6 , as described above.

[0284] In implementation mode 1, Figure 6 The stacked body having the same structure as the stacked body shown in FIG. 1 and the electrostatic chuck (not shown) as a member including electrodes are arranged in a direction in which the protective film 602 in the stacked body and the electrodes in the electrostatic chuck are opposed to each other. Figure 6 The posture shown is arranged in the up-down direction (ie, the direction in which the pellicle 602 is on the lower side and the photomask 605 is on the upper side). Under the pellicle 602 in the stacked body, an electrostatic chuck is arranged so that the electrode faces upward.

[0285] Next, a resin film with an adhesive layer (not shown) is disposed between the protective film 602 in the laminate and the electrode in the electrostatic chuck so that the protective film 602 and the adhesive layer (not shown) face each other with a predetermined gap therebetween.

[0286] In this state, a voltage is applied to the electrodes in the electrostatic chuck to generate electrostatic attraction, and the pellicle 602 is attracted toward the electrodes (ie, downward) by the generated electrostatic attraction, thereby removing the pellicle 602 from the photomask 605 in the stacked body.

[0287] After being disassembled, the protective film 602 is adsorbed on the adhesive layer of the resin film with the adhesive layer and recovered. At this time, if the protective film 602 is damaged, the protective film piece produced by the damage can be adsorbed on the above-mentioned adhesive layer and recovered. During the above-mentioned disassembly, air can be introduced into the interior of the stack through the through hole (i.e., the vent; not shown) that passes from the outer peripheral surface to the inner peripheral surface of the protective film assembly frame 603, so that the interior of the stack is positively pressurized, and the protective film 602 is expanded outward (i.e., in the direction of the electrode) to damage the protective film.

[0288] After the protective film 602 is removed, the remaining second stack (i.e., the stack including the photomask 605, the mask adhesive layer 607, the protective film assembly frame 603 and the protective film adhesive layer 606) is placed on the hot plate in the direction in which the photomask 605 contacts the hot plate, and heated so that the temperature of the mask adhesive layer becomes approximately 50°C, thereby reducing the adhesion of the mask adhesive layer 607.

[0289] Next, the mask adhesive layer 607, the protective film assembly frame 603 and the protective film adhesive layer 606 are removed from the photomask 605 by inserting or hooking a holding tool for operating the protective film assembly frame into the recessed portion and / or cutout (not shown) provided on the outer peripheral surface of the protective film assembly frame 603 in the second stack.

[0290] [Removal device for protective film assembly]

[0291] Next, an embodiment of a pellicle assembly disassembly apparatus suitable for carrying out the pellicle assembly disassembly method of the present disclosure will be described.

[0292] The pellicle assembly disassembly device according to the present embodiment is a pellicle assembly disassembly device for carrying out the above-mentioned disassembly step in the pellicle assembly disassembly method of the present disclosure, and comprises:

[0293] A holding member for holding the stacked body described in the pellicle assembly disassembly method of the present disclosure; and

[0294] An electrode described in the method for disassembling the pellicle assembly of the present disclosure.

[0295] The pellicle assembly disassembly device according to this embodiment can implement the pellicle assembly disassembly method of the present disclosure described above.

[0296] Therefore, according to the pellicle assembly removal device according to the present embodiment, similar to the pellicle assembly removal method of the present disclosure, it is possible to achieve an effect of suppressing contamination of the photomask due to the pellicle sheet.

[0297] The holding member in the pellicle disassembly apparatus according to the present embodiment is a member that holds the stacked body described in the pellicle disassembly method of the present disclosure (ie, a stacked body including a photomask, a pellicle frame, and a pellicle arranged in the following order).

[0298] The electrode in the protective film assembly disassembly device involved in this embodiment is the electrode described in the protective film assembly disassembly method disclosed in the present invention (that is, an electrostatic force is generated by applying a voltage, and the generated electrostatic force is utilized to attract the protective film, thereby generating electricity for removing the protective film from the photomask in the stack).

[0299] As described above, the pellicle assembly removal device according to the present embodiment may include an electrostatic chuck as a member including an electrode. In this case, the pellicle can be removed using the electrode in the electrostatic chuck.

[0300] The holding member in this embodiment preferably holds the laminated body in an orientation with the photomask on the upper side and the pellicle membrane on the lower side, and has an opening that exposes at least a self-supporting portion of the pellicle membrane.

[0301] According to this aspect, the detached pellicle and / or pellicle sheet falls downward (ie, in the direction of gravity) through the opening, thereby more effectively suppressing contamination of the photomask due to adhesion of the pellicle sheet.

[0302] Here, the concept of the opening portion that exposes at least the self-supporting portion of the protective film includes:

[0303] The opening is arranged below the protective film; and

[0304] The opening is arranged on the upper side of the pellicle (that is, the pellicle is exposed from the opening to the lower side) (for example, see Fig. 9 and Fig.10 ).

[0305] When the holding member in this embodiment holds the stacked body, from the viewpoint of suppressing unintentional damage to the pellicle when mounting the stacked body to the holding member, the holding member preferably holds the stacked body by supporting at least one of the pellicle assembly frame and the photomask in the stacked body (for example, see Fig. 9 and Fig.10 ).

[0306] In the case where the holding member has the above-mentioned opening, the holding member and the electrode are preferably:

[0307] (1) The opening of the holding member is arranged to face the electrode, or

[0308] (2) At least one of the holding member and the electrode can be moved so that the opening of the holding member and the electrode are arranged to face each other.

[0309] In these aspects, the electrostatic attraction can be made to act more effectively on the pellicle membrane during removal, so that the pellicle membrane can be removed more easily using the electrostatic attraction.

[0310] The method of (1) means that the opening of the holding member and the electrode are always opposite to each other. The method of (1) is not limited to the case where the holding member and the electrode are fixedly arranged, but also includes a method in which at least one of the holding member and the electrode can be moved in a manner that changes the distance between the holding member and the electrode.

[0311] The aspect (2) is an aspect in which at least one of the holding member and the electrode is movable, thereby being able to adopt both a configuration in which the opening of the holding member faces the electrode and a configuration in which the opening of the holding member and the electrode do not face each other.

[0312] The method (2) also includes, for example, a method in which a conveying member capable of conveying the stacked body while holding the stacked body is used as the holding member, and the conveying member as the holding member can move in both the above-mentioned opposing configuration and the above-mentioned non-opposing configuration relative to the electrode.

[0313] In the above-mentioned mode (1) or mode (2), the area of ​​the electrode is preferably larger than the area of ​​the opening. This allows the entire self-supporting portion of the pellicle to be drawn toward the electrode and removed, thereby more effectively suppressing contamination of the photomask.

[0314] In such a preferred embodiment, for example, when the pellicle includes a 6-inch×6-inch square self-supporting portion, the size of the opening is a rectangle (including a square) of 6 inches or more×6 inches or more.

[0315] In the above-mentioned method (1) or the above-mentioned method (2), the disassembly device of the protective film assembly is preferably further equipped with a film transport unit that allows the resin film to move between the opening portion and the electrode that are opposite to each other (that is, in the above-mentioned method (2), between the opening portion and the electrode when the opening portion and the electrode are opposite to each other).

[0316] In this method, the pellicle and / or pellicle sheet is removed from the opening onto the resin film, and the pellicle and / or pellicle sheet can be recovered by the movement of the resin film. Therefore, the pellicle can be removed more efficiently while suppressing contamination of the photomask.

[0317] As a method of transporting the resin film in the film transport unit, the following can be used:

[0318] A twin-roll method capable of continuously transporting the film; and

[0319] The single sheet method is to transport the film discontinuously one by one.

[0320] Among them, the twin-roll method is preferred from the viewpoint of disassembly efficiency.

[0321] The holding member in the pellicle detaching device preferably includes a pellicle frame fixing member for fixing the pellicle frame.

[0322] According to this aspect, it is possible to suppress positional deviation of the pellicle assembly frame when the pellicle is removed.

[0323] The pellicle assembly removal device according to the present embodiment may include other components besides the above-mentioned components as necessary.

[0324] Three specific examples of the pellicle assembly removal device according to the present embodiment are shown below, but the pellicle assembly removal device according to the present embodiment is not limited to the following three examples.

[0325] Fig. 9 This is a schematic cross-sectional view schematically showing an example of a pellicle assembly removal device according to the present embodiment.

[0326] like Fig. 9 As shown, pellicle assembly disassembly device 800 according to this example includes: a holding member 820 for holding a stacked body including a photomask 805, a pellicle assembly frame 803, and a pellicle 802 arranged in the following order; and an electrode 810 arranged below holding member 820.

[0327] The holding member 820 includes a box-shaped housing 822 having an opening OP1, and further includes a pellicle assembly frame fixing pin 824 as a pellicle assembly frame fixing member. The holding member 820 holds the laminated body in an orientation in which the photomask 805 is on the upper side and the pellicle 802 is on the lower side, through these elements, while exposing the pellicle assembly film 802 from the opening OP1. The main surface and side surfaces of the photomask 805 on which the pellicle assembly is not mounted are surrounded by the housing 822.

[0328] The holding member 820 holds the stacked body by fixing the pellicle assembly frame 803 in the stacked body with the pellicle assembly frame fixing needle 824. One end of the pellicle assembly frame fixing needle 824 is connected to the inner surface of the housing 822. The other end of the pellicle assembly frame fixing needle 824 fixes the pellicle assembly frame 803. The fixing method is not particularly limited, and for example, a method of inserting or hooking the other end of the pellicle assembly frame fixing needle 824 into a recess or cutout (not shown) provided on the outer peripheral surface of the pellicle assembly frame 803 can be cited.

[0329] The holding member 820 is movable in the horizontal direction H1.

[0330] Thus, in pellicle assembly removal apparatus 800 , it is possible to adopt both a configuration in which opening OP1 of the holding member and electrode 810 face each other and a configuration in which opening OP1 of the holding member and electrode 810 do not face each other.

[0331] The holding member 820 is also movable in the vertical direction V1 (ie, the gravity direction G and the opposite direction thereof).

[0332] The electrode 810 can also move in the vertical direction V2 (ie, the gravity direction G and the opposite direction thereof).

[0333] According to these structures, by adjusting the distance (ie, the interval) between the electrode 810 and the pellicle membrane 802 during removal, it is possible to adjust the electrostatic attraction acting on the pellicle membrane 802 .

[0334] The electrode 810 is connected to a power source (not shown) for applying a voltage to the electrode 810 .

[0335] As described above, instead of the electrode 810 in this example, an electrostatic chuck as a member including an electrode may be used.

[0336] The area of ​​electrode 810 is larger than the area of ​​opening OP1 in holding member 820 (specifically, housing 822). Thus, the entire self-supporting portion of pellicle 802 can be removed by being directed toward electrode 810, thereby more effectively suppressing contamination of the photomask.

[0337] Next, an example of the operation of removal device 800 (ie, removal of the pellicle assembly) will be described.

[0338] First, as described above, the stacked body is held by the holding member 820. This operation can be performed in a configuration where the opening OP1 of the holding member and the electrode 810 do not face each other.

[0339] Next, the holding member 820 is moved in the horizontal direction H1 and adjusted to a configuration in which the opening OP1 of the holding member faces the electrode 810 .

[0340] In this state, a voltage is supplied from a power source (not shown) to the electrode 810 to generate electrostatic attraction. At this time, the distance between the electrode 810 and the protective film 802 is adjusted to adjust the generated electrostatic attraction.

[0341] The protective film 802 is attracted toward the electrode 810 by electrostatic attraction. At this time, the protective film 802 can also be destroyed by electrostatic attraction. The protective film 802 or the protective film piece generated by the destruction of the protective film 802 is attracted to the electrode 810. As a result, the protective film 802 or the protective film piece is removed in a direction away from the photomask 805, so that the protective film can be prevented from being adsorbed to the photomask (i.e., contamination).

[0342] In this example, since the electrode is disposed below the pellicle membrane 802, the pellicle membrane 802 or the pellicle sheet is also attracted to the electrode 810 by gravity. Therefore, contamination of the photomask can be further suppressed.

[0343] Furthermore, in this example, since pellicle assembly frame 803 is fixed by pellicle assembly frame fixing pins 824 , positional displacement of pellicle assembly frame 803 when pellicle 802 is removed can be suppressed.

[0344] As described above, the pellicle membrane 802 is removed from the photomask 805 in the stacked body. Then, the pellicle membrane assembly frame 803 is removed from the photomask 805 by a conventional method as needed.

[0345] Fig.10 This is a schematic cross-sectional view schematically showing another example of the pellicle assembly removal device according to the present embodiment.

[0346] about Fig.10 The structure of the protective membrane assembly removal device 840 shown in FIG. 1 is similar to that of the protective membrane assembly removal device 840 shown in FIG. 1 except that the structure of the holding member holding the stack is different. Figure 8 The structure of the disassembly device 800 of the protective film assembly is the same.

[0347] Therefore, according to the pellicle assembly disassembly device 840, the same effect as the pellicle assembly disassembly device 800 can be achieved.

[0348] The retaining member 830 in the protective membrane assembly disassembly device 840 includes a housing 832 and does not include a protective membrane assembly frame fixing pin.

[0349] The housing 832 is a box-shaped housing having an opening OP2, which is different from the housing 822 ( Fig. 9 ) is the same as the housing 822 ( Fig. 9 )different.

[0350] The holding member 830 in the pellicle assembly removal device 840 holds the stacked body by supporting the photomask 805 using the protrusions 833 .

[0351] Even in pellicle assembly disassembly device 840 , the area of ​​electrode 810 is wider than the area of ​​opening OP2 in holding member 830 (specifically, housing 832 ).

[0352] Fig.11 This is a schematic cross-sectional view schematically showing another example of the pellicle assembly removal device according to the present embodiment.

[0353] Fig.11 The structure of the protective film assembly removal device 860 shown is similar to that of Fig.10 The structure of the disassembly device 840 of the protective film assembly is the same.

[0354] Therefore, according to the pellicle assembly disassembly device 860, the same effect as that of the pellicle assembly disassembly devices 800 and 840 can be achieved.

[0355] Fig.11 The pellicle assembly removal device 860 shown in the figure further includes a film transport unit (specifically, a film delivery device R1 and a film winding device R2 for transporting the film by a double roller transport method) for moving the resin film F1 between the opening OP2 and the electrode 810 that are opposed to each other. Thus, the pellicle removed from the photomask is recovered onto the resin film F1. Therefore, the pellicle can be removed more efficiently while suppressing contamination of the photomask.

[0356] An adhesive layer may be formed on the side of the resin film F1 that faces the opening OP2 , thereby making it easier to recover the pellicle.

[0357] The pellicle assembly removal device 860 includes a partition member 850 on the upstream side of the holding member 830 and the electrode 810 in the direction in which the resin film is transported.

[0358] The partition member 850 has an opening for allowing the resin film to pass therethrough.

[0359] The pellicle assembly removal device 860 includes a partition member 851 on the downstream side of the holding member 830 and the electrode 810 in the direction in which the resin film is transported.

[0360] The partition member 851 also has an opening for allowing the resin film to pass therethrough.

[0361] In the diaphragm assembly disassembly device 860, the area between the partition members 850 and 851 is defined as a disassembly area.

[0362] By removing the pellicle membrane within the removal area, it is possible to suppress the pellicle membrane from scattering outside the removal area.

[0363] Furthermore, by making the air pressure in the removal area lower than the air pressure outside the removal area, it is possible to further suppress the pellicle film from scattering outside the removal area.

[0364] Example

[0365] Hereinafter, the present invention will be specifically described by way of examples, but the present disclosure is not limited to these examples.

[0366] [Example 1]

[0367] The pellicle assembly is disassembled by performing the following steps. The details are shown below.

[0368] <Step of Preparing Laminated Body>

[0369] A protective film assembly is prepared, the protective film assembly comprising:

[0370] SiN film protective film;

[0371] a pellicle assembly frame supporting the SiN film pellicle on one end surface side;

[0372] a pellicle bonding layer between the SiN film pellicle and the pellicle assembly frame; and

[0373] A mask adhesive layer is provided on the end surface of the pellicle frame opposite to the end surface supporting the SiN film pellicle.

[0374] An operation hole is provided as a recessed portion on the outer peripheral surface of the pellicle assembly frame. The operation hole functions as a point of action when a lever is used for removal.

[0375] The pellicle frame is further provided with a ventilation through hole penetrating from the outer peripheral surface to the inner peripheral surface.

[0376] The pellicle assembly was pressed against the light shielding film layer side of the photomask including the light shielding film layer with a load of 98 N for 30 seconds in a direction such that the light shielding film layer side of the photomask was in contact with the mask adhesive layer in the pellicle assembly. Thus, the pellicle assembly was attached to the photomask to obtain a laminated body.

[0377] <Electrode preparation process>

[0378] As a member including an electrode, an electrostatic chuck (specifically, an 8-inch electrostatic chuck manufactured by Nippon Tokushige Co., Ltd.) was prepared.

[0379] <Disassembly process>

[0380] The stacked body is suspended and fixed on a Z-axis driven overhang type precision stage (hereinafter also referred to as a "overhang type Z drive stage") with the pellicle facing downward.

[0381] The electrostatic chuck is arranged below the suspended laminate. That is, the laminate and the electrostatic chuck are arranged so that the protective film in the laminate and the electrode in the electrostatic chuck are opposite to each other. At this time, the surface of the protective film and the surface of the electrode are made parallel, and the distance between the two is adjusted to 50 mm.

[0382] Next, a resin film (specifically, a PET film manufactured by Toray Industries, Ltd., trade name: Lumirror (registered trademark), thickness 50 μm) was placed on the electrostatic chuck. In this state, a voltage of 800 V was applied to the electrodes of the electrostatic chuck for 1 minute, thereby generating a voltage of about 7 gf / cm 2 (i.e., 68.6 mN / cm 2 )'s electrostatic attraction (i.e., horizontal holding force) causes the PET film to be adsorbed onto the electrostatic chuck.

[0383] Next, the stacked body suspended and fixed on the suspended Z drive stage is slowly moved downward so that the protective film in the stacked body comes into contact with the PET film arranged on the electrostatic chuck. After maintaining this state for 5 minutes, the stacked body is slowly moved upward to damage the protective film, and the damaged protective film is adsorbed on the PET film arranged on the electrostatic chuck by electrostatic attraction. In the above operation, the protective film is removed from the photomask.

[0384] Next, the second laminate (i.e., the laminate including the photomask, the mask adhesive layer, and the pellicle assembly frame) remaining after the removal of the pellicle was placed on the hot plate in a direction in which the photomask was in contact with the hot plate, and the second laminate was heated at about 70° C. for 5 minutes. Thus, the adhesive force of the mask adhesive layer was reduced.

[0385] Next, the pellicle frame is removed from the second stack by using a lever with the operation hole provided on the outer peripheral surface of the pellicle frame as an action point.

[0386] After the above operation, the surface of the photomask was visually observed, and adhesion of foreign matter (ie, contamination) was not confirmed.

[0387] The entire disclosure of Japanese Patent Application No. 2019-225700 filed on December 13, 2019 is incorporated into this specification by reference.

[0388] All documents, patent applications, and technical standards described in this specification are incorporated into this specification by reference to the same extent as if each document, patent application, and technical standard was specifically and individually described as being incorporated into this specification by reference.

Claims

1. A method for disassembling a protective membrane assembly, comprising the following steps: A step of preparing a laminated body, the laminated body comprising a photomask, a pellicle assembly frame, and a pellicle arranged in the following order; The step of preparing electrodes; and The disassembly process comprises configuring the stack and the electrode in such a manner that the protective film in the stack is opposed to the electrode, and applying a voltage to the electrode to generate an electrostatic attraction, and the protective film is attracted toward the electrode by the generated electrostatic attraction, thereby removing the protective film from the photomask in the stack.

2. The method for disassembling a protective film assembly according to claim 1, wherein the disassembly step is to dispose a thin film between the protective film and the electrode in the stacked body, and to remove the protective film by attracting the protective film to the surface of the thin film using the electrostatic attraction. 3 . The pellicle assembly disassembly method according to claim 1 , wherein the laminate further comprises a mask adhesive layer between the photomask and the pellicle assembly frame.

4. The method for disassembling the protective membrane assembly according to claim 3, When the stacked body is set as a first stacked body, The disassembly process includes: The pellicle assembly frame is left on the photomask side of the first stacked body, and the pellicle assembly frame is removed by using the electrostatic attraction to obtain a second stacked body including the photomask, the mask adhesive layer, and the pellicle assembly frame. heat treating the second laminate; and The pellicle frame is removed from the photomask in the second stack. 5 . The method for disassembling a pellicle assembly according to claim 1 , further comprising a step of heat treating the stacked body before the disassembly step. 6 . The method for disassembling a pellicle according to claim 1 , wherein at least one of a recess and a cutout is provided on an outer peripheral surface of the pellicle frame.

7. A pellicle assembly disassembly device for carrying out the disassembly step in the pellicle assembly disassembly method according to any one of claims 1 to 6, comprising: a holding member for holding the stacked body; and The electrode.

8. According to the disassembly device of the protective film assembly according to claim 7, the retaining member holds the stacked body in an orientation such that the photomask is on the upper side and the protective film is on the lower side, and has an opening portion that exposes at least a self-supporting portion of the protective film, and the self-supporting portion is a portion located on the opening portion formed by the inner peripheral surface of the protective film assembly frame and is not supported by the protective film assembly frame.

9. The pellicle assembly disassembly device according to claim 8, The holding member and the electrode are arranged so that the opening and the electrode face each other, or At least one of the holding member and the electrode is movable so that the opening and the electrode are arranged to face each other. 10 . The pellicle assembly removal device according to claim 9 , wherein an area of ​​the electrode is wider than an area of ​​the opening. 11 . The pellicle assembly removal device according to claim 9 , further comprising a film transport unit that allows the resin film to move between the opening and the electrode that face each other. 12 . The pellicle diaphragm removal device according to claim 7 , wherein the holding member includes a pellicle diaphragm frame fixing member that fixes the pellicle diaphragm frame.

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