Device and method for forming coating, component and plasma device

Abstract

A device and method for forming a coating, a component, and a plasma device. The device for forming the coating includes: a vacuum chamber; a first target and a second target; a component body disposed opposite the first target and the second target; atoms of the first target and the second target form a composite corrosion-resistant coating on the surface of the component body; a first auxiliary monitor for monitoring a characteristic signal of the first target; a second auxiliary monitor for monitoring a characteristic signal of the second target; and a rate monitor for monitoring the formation rate of the composite corrosion-resistant coating. When the formation rate deviates from the target rate, a deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor and the second auxiliary monitor independently control the rates of their respective targets based on changes in the strength of the characteristic signals of the first and second targets, thereby controlling the stability of the formation rate of the composite corrosion-resistant coating. The resulting composite corrosion-resistant coating has good uniformity.

Description

Technical Field

[0001] The present invention relates to the field of semiconductors, and in particular to a device for forming a composite corrosion-resistant coating, a method for forming a composite corrosion-resistant coating on the surface of a component body, a semiconductor component, and a plasma processing device. Background Art

[0002] In the manufacturing process of semiconductor devices, plasma etching is a key process for processing wafers into designed patterns.

[0003] In a typical plasma etching process, process gases (such as CF4 and O2) are excited by radio frequency (RF) to form plasma. After passing through the electric field (capacitive coupling or inductive coupling) between the upper and lower electrodes, the plasma physically bombards the wafer surface and chemically reacts, etching a wafer with a specific structure.

[0004] For components in the harsh corrosive environment of the plasma etching chamber, they need to have a very high resistance to plasma corrosion. To this end, a patent proposes coating the surface of the internal components of the plasma etching chamber with a corrosion-resistant coating such as an yttrium-containing coating to protect the workpiece and maintain the stability of the plasma etching environment. With the continuous advancement of high-end semiconductor processes (below 10nm), the plasma environment used in the plasma etching process has become more complex. The yttrium-containing coating with a single oxide component has shown an optimization trend towards a composite yttrium-containing coating to adapt to the requirements of the more harsh plasma etching environment for corrosion-resistant coatings.

[0005] However, for composite corrosion-resistant coatings, their own metastability determines the existence of easy decomposition characteristics, making it very difficult to accurately control the uniformity of their composition during the synthesis of composite corrosion-resistant coatings.

[0006] In response to the above needs, how to accurately control the uniformity of each component of the composite corrosion-resistant coating, improve the stability of the corrosion-resistant coating, and further maintain the stability of the etching chamber environment has become an important development direction for further improving the application of plasma etching in advanced processes. Summary of the Invention

[0007] The technical problem solved by the present invention is to provide a device for forming a composite corrosion-resistant coating, a method for forming a composite corrosion-resistant coating on the surface of a component body, a semiconductor component and a plasma processing device to improve the uniformity of the components in the corrosion-resistant coating.

[0008] In order to solve the above technical problems, the present invention provides a device for forming a composite corrosion-resistant coating, comprising: a vacuum chamber; a first target material and a second target material, located in the vacuum chamber; a component body, located in the vacuum chamber and arranged opposite to the first target material and the second target material; a first excitation device, used to excite first target material atoms in the first target material; a second excitation device, used to excite second target material atoms in the second target material, the first target material atoms and the second target material atoms forming a composite corrosion-resistant coating on the surface of the component body; a first auxiliary monitor, located in the vacuum chamber, used to monitor the characteristic signal of the first target material; a second Two auxiliary monitors are located in the vacuum chamber and are used to monitor the characteristic signal of the second target material; a rate monitor is located in the vacuum chamber and is used to monitor the formation rate of the composite corrosion-resistant coating. When the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor and the second auxiliary monitor independently control the rates of their respective targets according to the strength changes of the characteristic signals of the first target material and the second target material, so as to control the stability of the formation rate of the composite corrosion-resistant coating and maintain high uniformity of the various components of the composite corrosion-resistant coating in the thickness direction.

[0009] Optionally, the characteristic signal is a spectral signal, and the spectral signal includes: the strongest peak intensity, the spectral integrated area or the characteristic wavelength light power, and the first auxiliary monitor and the second auxiliary monitor are spectrometers.

[0010] Optionally, the characteristic signal is temperature, and the first auxiliary monitor and the second auxiliary monitor are infrared thermometers.

[0011] Optionally, the material of the composite corrosion-resistant coating is a rare earth element oxygen-fluorine crystalline compound, and the rare earth element oxygen-fluorine crystalline compound includes: YOF, Y5O4F7, Y6O5F8, Y7O6F9, Y 17 O 14 F 23 , at least one of LaOF, CeOF, CeO6F2, PrOF, NdOF, SmOF, EuOF, Eu3O2F5, Eu5O4F7, GdOF, Gd5O4F7, TbOF, DyOF, HoOF, ErOF, Er3O2F5, Er5O4F7, TmOF, YbOF, Yb5O4F7, Yb6O5F8, LuO, Lu3O2F5, Lu5O4F7 or Lu7O6F9.

[0012] Optionally, the material of the composite corrosion-resistant coating is a crystalline compound formed by rare earth elements and alumina, and the crystalline compound formed by rare earth elements and alumina includes: Y4Al2O9, YAlO3, Y3Al5O 12, LaAlO3, CeAlO3, Ce6AlO3, Pr4Al2O9, PrAlO3, PrAl 11 O 18 ,Nd4Al2O9,NdAlO3,NdAl 11 O 18 , Sm4Al2O9, SmAlO3, Eu4Al2O9, EuAlO3, Eu3Al5O 12 , Gd4Al2O9, GdAlO3, Gd3Al5O 12 ,Tb4Al2O9,TbAlO3,Tb3Al5O 12 , Dy4Al2O9, DyAlO3, Dy3Al5O 12 , Ho4Al2O9, HoAlO3, Ho3Al5O 12 , Er4Al2O9, ErAlO3, Er3Al5O 12 , Tm4Al2O9, TmAlO3, Tm3Al5O 12 , Yb4Al2O9, Yb6Al 10 O 24 , Lu4Al2O9, LuAlO3 or Lu3Al5O 12 At least one of .

[0013] Optionally, the material of the composite corrosion-resistant coating is a crystalline compound formed by rare earth elements and silicon oxide, and the crystalline compound formed by rare earth elements and silicon oxide includes: Y2SiO5, Y2Si2O7, La2SiO5, La2Si2O7, Ce2SiO5, Pr2SiO5, Pr2Si2O7, Nd2SiO5, Nd4Si3O 12 , Nd2Si2O7, Sm2SiO5, Sm4Si3O 12 , Sm2Si2O7, Eu2SiO5, EuSiO3, Eu2Si2O7, Gd2SiO5, Gd4Si3O 12 , Gd2Si2O7, Tb2SiO5, Tb2Si2O7, Dy2SiO5, Dy4Si3O 12 , Dy2Si2O7, Ho2SiO5, Er2Si2O7, Er2SiO5, Er4Si3O 12 , Er2Si2O7, Tm2SiO5, Tm2Si2O7, Yb2SiO5, Yb4Si3O 12 , Yb2Si2O7, Lu2SiO5, Lu4Si3O 12 Or at least one of Lu2Si2O7.

[0014] Optionally, the material of the composite corrosion-resistant coating is at least one of fluoride oxides of rare earth elements, and amorphous compounds formed with silicon oxide and aluminum oxide.

[0015] Optionally, the composite corrosion-resistant coating has a uniform composition, and a composition fluctuation range in the thickness direction is less than 5%.

[0016] Optionally, the composite corrosion-resistant coating has a uniform composition, and a composition fluctuation range in the thickness direction is less than 1%.

[0017] Correspondingly, the present invention also provides a method for forming a composite corrosion-resistant coating on the surface of a component body using a device for forming a composite corrosion-resistant coating, comprising: providing the above-mentioned device for forming a composite corrosion-resistant coating; using a first excitation device to excite first target material atoms in a first target material; using a second excitation device to excite second target material atoms in a second target material, the first target material atoms and the second target material atoms form a composite corrosion-resistant coating on the surface of the component body; using a rate monitor to monitor the formation rate of the composite corrosion-resistant coating, when the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor, the first auxiliary monitor and the second auxiliary monitor independently control the rate of their respective targets according to the strength changes of the characteristic signals of the first target material and the second target material, so as to control the stability of the formation rate of the composite corrosion-resistant coating.

[0018] Optionally, the rate monitor includes a quartz crystal oscillator; when a composite corrosion-resistant coating is formed on the surface of the component body, it also includes: forming a composite corrosion-resistant coating on the surface of the quartz crystal oscillator; by measuring the change in the resonant frequency of the quartz crystal oscillator, the change in the formation rate of the composite corrosion-resistant coating can be monitored in real time.

[0019] Correspondingly, the present invention also provides a semiconductor component comprising the corrosion-resistant coating, comprising: a component body; the composite corrosion-resistant coating, located on the surface of the component body, with uniform composition along its thickness direction.

[0020] Correspondingly, the present invention also provides a plasma processing device, comprising: a reaction chamber, which contains a plasma environment; the above-mentioned semiconductor components are located in the reaction chamber and exposed to the plasma environment.

[0021] Optionally, the plasma environment contains at least one of fluorine, chlorine, oxygen, or hydrogen plasma. Optionally, the plasma processing apparatus is a plasma etching apparatus or a plasma cleaning apparatus. Optionally, when the plasma processing apparatus is an inductively coupled plasma processing apparatus, the components include at least one of a ceramic plate, an inner liner, a gas nozzle, a gas distribution plate, a gas pipe flange, an electrostatic chuck assembly, a cover ring, a focusing ring, an insulating ring, or a plasma confinement device.

[0022] Optionally, when the plasma processing device is a capacitively coupled plasma processing device, the components include: a shower head, an upper grounding ring, a moving ring, a gas distribution plate, a gas buffer plate, an electrostatic suction cup assembly, a lower grounding ring, a covering ring, a focusing ring, an insulating ring or at least one of a plasma confinement device.

[0023] Compared with the prior art, the technical solution of the embodiment of the present invention has the following beneficial effects:

[0024] In the device for forming a composite corrosion-resistant coating provided by the technical solution of the present invention, a rate monitor, a first auxiliary monitor and a second auxiliary monitor are provided in the vacuum chamber, wherein the rate monitor is used to monitor the formation rate of the composite corrosion-resistant coating, and when the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor, and the first auxiliary monitor and the second auxiliary monitor independently control the rates of their respective targets according to the strength changes of the characteristic signals of the first target material and the second target material, respectively. In this way, the composition uniformity of the composite corrosion-resistant coating formed by using the device is better, so as to improve the stability of the composite corrosion-resistant coating in the plasma environment in terms of resistance to plasma corrosion and maintain the stability of the plasma etching environment. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 This is a schematic structural diagram of a plasma processing device according to the present invention;

[0026] Figure 2 It is a structural schematic diagram of another plasma processing device of the present invention;

[0027] Figure 3 A schematic diagram of a device for forming a composite corrosion-resistant coating according to the present invention;

[0028] Figure 4 Schematic diagram of the thermal radiation spectrum and wavelength of the first target and the second target of the present invention;

[0029] Figure 5 Schematic diagram of the relationship between the formation rate of the composite corrosion-resistant coating of the present invention, the thermal radiation spectra of the first target material and the second target material and time;

[0030] Figure 6 Schematic diagram of the relationship between the formation rate of the composite corrosion-resistant coating of the present invention, the temperature of the first target and the second target, and time;

[0031] Figure 7 A process flow chart of forming the composite corrosion-resistant coating using the apparatus for forming the composite corrosion-resistant coating according to the present invention;

[0032] Figure 8 It is a structural schematic diagram of the semiconductor component of the present invention. DETAILED DESCRIPTION

[0033] As described in the background art, there is an urgent need to prepare a composite corrosion-resistant coating with high composition uniformity on the surface of a component body to meet the requirements of advanced manufacturing processes. To this end, the present invention is dedicated to providing an apparatus for forming a composite corrosion-resistant coating, a method for forming a composite corrosion-resistant coating on the surface of a component body, a semiconductor component, and a plasma processing device, which are described in detail below:

[0034] Figure 1 This is a schematic structural diagram of a plasma processing device according to the present invention.

[0035] Please refer to Figure 1 The plasma processing apparatus includes: a reaction chamber 100, wherein the reaction chamber 100 is a plasma environment, wherein semiconductor components and the inner wall of the reaction chamber 100 are exposed to the plasma environment, and the plasma includes at least one of F-containing plasma, Cl-containing plasma, H-containing plasma, or O-containing plasma.

[0036] The plasma processing apparatus further includes a base 101, with an electrostatic chuck 103 disposed above the base 101. Electrodes (not shown) are disposed within the electrostatic chuck 103 and are electrically connected to a DC power supply (DC) for generating an electrostatic force to secure a substrate W to be processed. The plasma is used to process the substrate W. Because plasma is highly corrosive, a corrosion-resistant coating is applied to the surface of semiconductor components to prevent corrosion.

[0037] In this embodiment, the plasma processing device is a capacitively coupled plasma reaction device. Accordingly, the semiconductor components exposed to the plasma environment include: a shower head 102, an upper grounding ring 104, a moving ring, a gas distribution plate 105, a gas buffer plate, an electrostatic suction cup assembly 103, a lower grounding ring 106, a cover ring 107, a focusing ring 108, an insulating ring, and at least one of a plasma confinement device 109.

[0038] Figure 2 It is a structural schematic diagram of another plasma processing device of the present invention.

[0039] In this embodiment, the plasma reaction device is an inductively coupled plasma reaction device. Accordingly, the semiconductor components exposed to the plasma environment include: a ceramic plate, an inner sleeve 200, a gas nozzle 201, a gas distribution plate, a gas pipe flange, an electrostatic suction cup assembly 202, a cover ring 203, a focusing ring 204, an insulating ring and at least one of a plasma confinement device 205.

[0040] In other embodiments, the plasma processing device may also be a plasma cleaning device.

[0041] With the continuous advancement of high-end semiconductor processes (below 10nm), the plasma environment used in the plasma etching process has become more complex. The yttrium-containing coating with a single oxide component has shown a trend towards optimization of a composite corrosion-resistant coating to adapt to the requirements of the more harsh plasma etching environment for corrosion-resistant coatings.

[0042] The following is a detailed description of the device for forming the composite corrosion-resistant coating:

[0043] Figure 3 This is a schematic diagram of a device for forming a composite corrosion-resistant coating according to the present invention.

[0044] Please refer to Figure 3 , used to form a composite corrosion-resistant coating, including: a vacuum chamber 300; a first target material 301a and a second target material 301b, located in the vacuum chamber 300; a component body 400, located in the vacuum chamber 300, and arranged opposite to the first target material 301a and the second target material 301b; a first excitation device, used to excite the first target material atoms in the first target material 301a; a second excitation device, used to excite the second target material atoms in the second target material 301b, and the first target material atoms and the second target material atoms form a composite corrosion-resistant coating 401 on the surface of the component body; a first auxiliary monitor 303a, located in the vacuum chamber 300, and used to monitor the characteristic signal of the first target material 301a; a second ...b, used to monitor the characteristic signal of the first target material 301b; a first auxiliary monitor 303a, used to monitor the characteristic signal of the first target material 301a; a second auxiliary monitor 303b, used to monitor the characteristic signal of the first target material 301b. The auxiliary monitor 303b is located in the vacuum chamber 300 and is used to monitor the characteristic signal of the second target material 303b; the rate monitor 302 is located in the vacuum chamber 300 and is used to monitor the formation rate of the composite corrosion-resistant coating 401. When the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor 303a and the second auxiliary monitor 303b. The first auxiliary monitor 303a and the second auxiliary monitor 303b independently control the rate of their respective targets according to the strength changes of the characteristic signals of the first target material 301a and the second target material 301b, so as to control the stability of the rate during the formation of the composite corrosion-resistant coating 401 and achieve the uniformity of each component in the composite coating.

[0045] The first target material 301a excites the atoms in the first target material 301a under the action of the first excitation device, and the second target material 301b excites the atoms in the second target material 301b under the action of the second excitation device. The atoms of the first target material 301a and the atoms of the second target material 301b form a composite corrosion-resistant coating 401 on the surface of the component body 401.

[0046] After being excited, the target material emits certain characteristic signals into the environment, such as a thermal radiation spectrum. The thermal radiation spectrum is related to the material of each target material, and different materials have different thermal radiation spectra. Since the first target material 301a and the second target material 301b are made of different materials, the thermal radiation spectra emitted by the first target material 301a and the second target material 301b after being excited are different. Specifically, Figure 4 As shown, Figure 4 1 represents a schematic diagram of the thermal radiation spectrum and wavelength of the first target material 301a, and 2 represents a schematic diagram of the thermal radiation spectrum and wavelength of the second target material 301b. Here, yttrium oxide is used as the first target material and yttrium fluoride is used as the second target material for explanation. A spectrometer can be used to measure the radiation intensity of each band, and a control characteristic signal is selected as the control signal, such as: the strongest peak intensity, the integrated intensity or the characteristic wavelength light power.

[0047] The characteristic wavelength optical power is selected as the control signal for detailed description as follows.

[0048] Please refer to Figure 5 , (a) represents a schematic diagram of the relationship between the formation rate of the composite corrosion-resistant coating and time; (b) represents a schematic diagram of the relationship between the characteristic wavelength light power and time of the first target material when the thermal radiation spectrum emitted after the first target material is excited is the characteristic wavelength light power; (c) represents a schematic diagram of the relationship between the characteristic wavelength light power and time of the second target material when the thermal radiation spectrum emitted after the second target material is excited is the characteristic wavelength light power.

[0049] from Figure 5 It can be seen from the figure that: the rate monitor monitors that the formation rate of the composite corrosion-resistant coating decreases within the time t1~t2, and by comparing with the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor monitors that the characteristic wavelength light power of the first target material decreases within the time t1~t2, and the second auxiliary monitor monitors that the characteristic wavelength light power of the second target material increases within the time t1~t2. The first auxiliary monitor increases the rate of the first target material and reduces the rate of the second target material according to the feedback information of the characteristic wavelength light power of the first target material to maintain the stability of the overall rate and further improve the uniformity of each component of the composite corrosion-resistant coating.

[0050] Figure 5The example of the formation rate of the composite corrosion-resistant coating decreasing during the time period t1 to t2, the first auxiliary monitor detecting that the characteristic wavelength optical power of the first target decreases during the time period t1 to t2, and the second auxiliary monitor detecting that the characteristic wavelength optical power of the second target increases during the time period t1 to t2 is used for illustration, is actually not limited to this. As long as the rate monitor monitors the formation rate of the composite corrosion-resistant coating, when the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor, and the first auxiliary monitor and the second auxiliary monitor independently control the rate of each target according to the strength changes of the characteristic signals of the first target and the second target, respectively, the uniformity of the components in the composite corrosion-resistant coating can be improved. The uniformity of the components in the composite corrosion-resistant coating improves the stability of the composite corrosion-resistant coating in a plasma environment and the stability of the plasma etching performance. In other words, when the formation rate of the composite corrosion-resistant coating decreases within the time period t1 to t2, the first auxiliary monitor detects that the characteristic wavelength optical power of the first target decreases within the time period t1 to t2, and the second auxiliary monitor detects that the characteristic wavelength optical power of the second target increases within the time period t1 to t2. If there is no first auxiliary detector and the second auxiliary detector, and control is performed only based on the total rate, it will be mistakenly judged that the rates of the two targets need to be increased at the same time, which actually causes the composition of the second target in the composite corrosion-resistant coating to fluctuate greatly. The effect of using the present invention is that the rate of each target can be independently controlled according to the actual changes of each target, maintaining the uniformity of the composition of each target in the composite corrosion-resistant coating.

[0051] In addition to the thermal radiation spectrum, the temperature of the target material itself will also change after being excited. Generally, the higher the temperature, the greater the rate of the target material. Therefore, the temperature of each target material can be used as an auxiliary detection signal. During the formation process of the composite corrosion-resistant coating, an infrared thermometer is used to monitor the first target material and the second target material in real time.

[0052] Please refer to Figure 6 , (d) represents a schematic diagram of the relationship between the formation rate of the composite corrosion-resistant coating and time; (e) represents a schematic diagram of the relationship between the temperature and time after the first target material is excited; (f) represents a schematic diagram of the relationship between the temperature and time after the second target material is excited.

[0053] from Figure 6It can be seen from the figure that the rate monitor detects that the formation rate of the composite corrosion-resistant coating decreases within the time t1 to t2. By comparing with the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor detects that the temperature of the first target material decreases within the time t1 to t2, and the second auxiliary monitor detects that the temperature of the second target material increases within the time t1 to t2. Then, the first auxiliary monitor increases the rate of the first target material and reduces the rate of the second target material according to the temperature information of the first target material to maintain the stability of the overall rate and further control the uniformity of the components of the composite coating.

[0054] Figure 6 This example illustrates a situation where the formation rate of the composite corrosion-resistant coating decreases during time period t1-t2, the first auxiliary monitor detects a decrease in the temperature of the first target during time period t1-t2, and the second auxiliary monitor detects an increase in the temperature of the second target during time period t1-t2. However, the present invention is not limited to this example. As long as the rate monitor monitors the formation rate of the composite corrosion-resistant coating, and when the formation rate deviates from the target rate, a deviation signal is fed back to the first and second auxiliary monitors. The first and second auxiliary monitors independently control the composition of the composite corrosion-resistant coating based on the temperature fluctuations of the first and second targets, respectively, thereby improving the compositional uniformity of the composite corrosion-resistant coating. This improved compositional uniformity in the composite corrosion-resistant coating improves both the stability of the composite corrosion-resistant coating's resistance to plasma corrosion in a plasma environment and the stability of its plasma etching performance. Without the first and second auxiliary monitors, control based solely on the total rate could lead to an incorrect determination that the rates of both targets need to be increased simultaneously, resulting in significant fluctuations in the composition of the second target in the composite corrosion-resistant coating. The effect of using the present invention is that the rate of each target material can be independently controlled according to the actual change of each target material, thereby maintaining the uniformity of the components of each target material in the composite coating.

[0055] Figure 7 The present invention is a process flow chart of forming the composite corrosion-resistant coating using the device for forming the composite corrosion-resistant coating.

[0056] Please refer to Figure 7Step S1: providing the above-mentioned device for forming a composite corrosion-resistant coating; step S2: using a first excitation device to excite first target material atoms in a first target material, and using a second excitation device to excite second target material atoms in a second target material, the first target material atoms and the second target material atoms form a composite corrosion-resistant coating on the surface of the component body; step S3: using a rate monitor to monitor the formation rate of the composite corrosion-resistant coating, when the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor, the first auxiliary monitor and the second auxiliary monitor independently control the rate of each target material according to the strength changes of the characteristic signals of the first target material and the second target material, so as to control the stability of the formation rate of the composite corrosion-resistant coating.

[0057] The rate monitor includes a quartz crystal oscillator. During the process of forming a composite corrosion-resistant coating on the surface of the component body using the first excitation device and the second excitation device, a composite corrosion-resistant coating is also formed on the surface of the quartz crystal oscillator. As the thickness of the composite corrosion-resistant coating changes, the resonant frequency of the quartz crystal oscillator shifts. Therefore, by measuring changes in the resonant frequency of the quartz crystal oscillator, changes in the rate of formation of the composite corrosion-resistant coating can be reflected, thereby enabling real-time monitoring of the rate of formation of the composite corrosion-resistant coating.

[0058] In one embodiment, the rate ratio of the first target material to the second target material is 10:1. Although the rate of the first target material is significantly different from that of the second target material, the device for forming the composite corrosion-resistant coating is provided with a first auxiliary monitor and a second auxiliary monitor. When the rate monitor detects that the formation rate of the composite corrosion-resistant coating deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor and the second auxiliary monitor independently control the adjustment deviation amount of each target material rate according to the strength changes of the characteristic signals of the first target material and the second target material, respectively, to quickly control the stability of the formation rate of the composite corrosion-resistant coating, thereby further improving the uniformity of the components in the composite corrosion-resistant coating. Figure 8 This is a schematic structural diagram of a semiconductor component of the present invention.

[0059] Please refer to Figure 8 The semiconductor component includes: a component body 400, a composite corrosion-resistant coating 401, which is located on the surface of the component body 400 and has a uniform composition along its thickness direction.

[0060] In one embodiment, the material of the composite corrosion-resistant coating 401 is a rare earth element oxygen fluoride crystalline compound, and the rare earth element oxygen fluoride crystalline compound includes: YOF (yttrium oxyfluoride), Y5O4F7 (yttrium heptafluoride tetraoxide), Y6O5F8 (yttrium octafluoride pentoxide), Y7O6F9 (yttrium hexafluoride nonafluoride), Y 17O 14 F 23 (yttrium twentiethodecytridecanoate), LaOF (lanthanum oxyfluoride), CeOF (cerium oxyfluoride), CeO6F2 (cerium hexafluoride), PrOF (praseodymium oxyfluoride), NdOF (neodymium oxyfluoride), SmOF (samarium oxyfluoride), EuOF (europium oxyfluoride), Eu3O2F5 (europium trioxide pentafluoride), Eu5O4F7 (europium tetraoxide heptafluoride), GdOF (gadolinium oxyfluoride), Gd5O4F7 (gadolinium tetraoxide heptafluoride), TbOF (terbium oxyfluoride), DyOF (dysprosium oxyfluoride), At least one of HoOF (holmium oxyfluoride), ErOF (erbium oxyfluoride), Er3O2F5 (erbium trioxide pentafluoride), Er5O4F7 (erbium pentafluoride tetraoxide), TmOF (thulium oxyfluoride), YbOF (ytterbium oxyfluoride), Yb5O4F7 (ytterbium pentafluoride tetraoxide), Yb6O5F8 (ytterbium hexafluoride pentoxide), LuO (lutetium oxide), Lu3O2F5 (lutetium trioxide pentafluoride), Lu5O4F7 (lutetium heptafluoride tetraoxide), or Lu7O6F9 (lutetium hexaoxide nonafluoride).

[0061] In another embodiment, the material of the composite corrosion-resistant coating 401 is a crystalline compound formed by rare earth elements and aluminum oxide, and the crystalline compound formed by rare earth elements and aluminum oxide includes: Y4Al2O9 (yttrium oxide of aluminum oxide), YAlO3 (yttrium oxide of aluminum oxide), Y3Al5O 12 (yttrium oxide pentaaluminum), LaAlO3 (lanthanum oxide), CeAlO3 (cerium oxide), Ce6AlO3 (cerium oxide), Pr4Al2O9 (praseodymium oxide), PrAlO3 (praseodymium oxide), PrAl 11 O 18 (undecaluminum octadecyridine), Nd4Al2O9 (aluminum nonaluminum tetradymium oxide), NdAlO3 (aluminum trialuminum neodymium oxide), NdAl 11 O 18 (undecanediol neodymium octadecanodimium), Sm4Al2O9 (aluminum tetradecadienanoxide), SmAlO3 (aluminum samarium trioxide), Eu4Al2O9 (aluminum tetradecadienanoxide), EuAlO3 (aluminum europium trioxide), Eu3Al5O 12 (pentaluminum dodeca-europium oxide), Gd4Al2O9 (aluminum tetragadolinium nonaluminum oxide), GdAlO3 (aluminum trigadolinium oxide), Gd3Al5O 12 (pentaluminum gadolinium dodecaoxide), Tb4Al2O9 (terbium tetraoxide), TbAlO3 (terbium trioxide), Tb3Al5O 12 (pentaluminum terbium oxide), Dy4Al2O9 (aluminum dysprosium oxide), DyAlO3 (aluminum dysprosium oxide), Dy3Al5O12 (pentaluminum dodecaoxide), Ho4Al2O9 (aluminum tetraoxide), HoAlO3 (aluminum trioxide), Ho3Al5O 12 (pentaluminum dodecaoxide), Er4Al2O9 (erbium dioxide), ErAlO3 (erbium trioxide), Er3Al5O 12 (pentaluminum tantalum oxide), Tm4Al2O9 (tantalum oxide), TmAlO3 (tantalum oxide), Tm3Al5O 12 (thulium pentaaluminum dodecaoxide), Yb4Al2O9 (ytterbium dialuminum nonaoxide), Yb6Al 10 O 24 (ytterbium tetradecanoate), Lu4Al2O9 (lutetium nonaluminum oxide), LuAlO3 (lutetium trioxide) or Lu3Al5O 12 At least one of (pentaluminum trilutetium dodecaoxide).

[0062] In another embodiment, the material of the composite corrosion-resistant coating 401 is a crystalline compound formed by a rare earth element and silicon oxide. The crystalline compound formed by the rare earth element and silicon oxide includes: Y2SiO5 (yttrium silicon pentoxide), Y2Si2O7 (yttrium disiloxane heptoxide), La2SiO5 (lanthanum silicon pentoxide), La2Si2O7 (lanthanum disiloxane heptoxide), Ce2SiO5 (cerium silicon pentoxide), Pr2SiO5 (praseodymium silicon pentoxide), Pr2Si2O7 (praseodymium disiloxane heptoxide), Nd2SiO5 (neodymium silicon pentoxide), Nd4Si3O 12 (Trisilicon neodymium oxide), Nd2Si2O7 (disiloxane neodymium oxide), Sm2SiO5 (silicon samarium pentoxide), Sm4Si3O 12 (Trisilicon tetrasamarium dodecaoxide), Sm2Si2O7 (disiloxane samarium heptoxide), Eu2SiO5 (silicon europium pentoxide), EuSiO3 (silicon europium trioxide), Eu2Si2O7 (disiloxane europium heptoxide), Gd2SiO5 (silicon gadolinium pentoxide), Gd4Si3O 12 (Gadolinium trisilicon dodecaoxide), Gd2Si2O7 (Gadolinium disiloxane heptoxide), Tb2SiO5 (Terbium monosilicon pentoxide), Tb2Si2O7 (Terbium disiloxane heptoxide), Dy2SiO5 (Dysprosium monosilicon pentoxide), Dy4Si3O 12 (Dysprosium trioxide), Dy2Si2O7 (Dysprosium disiloxide), Ho2SiO5 (Holmium pentoxide), Er2Si2O7 (Erbium disiloxide), Er2SiO5 (Erbium pentoxide), Er4Si3O 12(Trisilicon tetraerbium dodecaoxide), Tm2SiO5 (silicon thulium pentoxide), Tm2Si2O7 (silicon thulium heptoxide), Yb2SiO5 (silicon ytterbium pentoxide), Yb4Si3O 12 (Ytterbium trioxide), Yb2Si2O7 (ytterbium disilicon heptoxide), Lu2SiO5 (lutetium monosilicon pentoxide), Lu4Si3O 12 At least one of (tetralutetium trisilicon dodecaoxide) or Lu2Si2O7 (lutetium disilicon heptoxide).

[0063] In another embodiment, the material of the composite corrosion-resistant coating 401 includes at least one of fluoride oxides of rare earth elements, and amorphous compounds formed with silicon oxide and aluminum oxide.

[0064] Since the composition of the composite corrosion-resistant coating 401 is relatively uniform, in one embodiment, the fluctuation range of the composition of the composite corrosion-resistant coating 401 in its thickness direction is less than 5%, so that the corrosion resistance of the composite corrosion-resistant coating 401 is relatively stable, which is beneficial to improving the stability of plasma etching.

[0065] In another embodiment, the composition of the composite corrosion-resistant coating 401 fluctuates within a range of less than 1% in the thickness direction, making the composition of the composite corrosion-resistant coating 401 more uniform, which is beneficial to further improve the stability of the corrosion-resistant coating performance.

[0066] It should be pointed out that the method of the present invention is not limited to the case of only two targets. For the case of multiple targets and multiple corresponding auxiliary detectors, it still falls within the scope of the present invention unless those skilled in the art make creative inventions.

[0067] At the same time, the method of the present invention can further provide a method for non-destructive indirect quantitative detection of the uniformity deviation of each component in the composite corrosion-resistant coating, namely: 1. Provide a standard sample, apply the composite corrosion-resistant coating on the standard sample, and record the changes in the characteristic signals of each target material during the formation of the composite corrosion-resistant coating; 2. Characterize the deviation of the component uniformity of the standard sample (such as EDS, XPS, etc.), and establish a standard correspondence between the deviation of the characteristic signal and the deviation of the component; 3. Provide a component to be coated, apply the composite corrosion-resistant coating on the component, and record the changes in the characteristic signals of each target material during the formation of the composite corrosion-resistant coating; 4. Proportion the deviation of the characteristic signal with the standard correspondence, thereby inferring the deviation of each component. Utilizing this method, non-destructive measurement and quantitative measurement of the sample components can be achieved. It is suitable for components with larger shapes (which are not convenient for direct measurement by EDS, XPS, etc.), and is also suitable for quality control of composite coatings during the production of parts.

[0068] Although the present invention is disclosed above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be based on the scope defined by the claims.

Claims

1. A device for forming a composite corrosion-resistant coating, characterized in that: include: vacuum chamber; A first target and a second target, wherein the first target and the second target are made of different materials and are located in the vacuum chamber; A component body is located in the vacuum chamber and is arranged opposite to the first target and the second target; A first excitation device, used to excite first target material atoms in the first target material; a second excitation device for exciting second target material atoms in the second target material, wherein the first target material atoms and the second target material atoms form a composite corrosion-resistant coating on the surface of the component body, wherein the material of the composite corrosion-resistant coating is at least one of a fluoride oxide of a rare earth element, a compound formed with silicon oxide, and aluminum oxide; a first auxiliary monitor, located in the vacuum chamber, for monitoring a characteristic signal of the first target material; a second auxiliary monitor, located in the vacuum chamber, for monitoring a characteristic signal of the second target; The rate monitor is located in the vacuum chamber and is used to monitor the formation rate of the composite corrosion-resistant coating. When the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor and the second auxiliary monitor are independently controlled according to the strength changes of the characteristic signals of the first target material and the second target material, so as to stably control the formation rate of the composite corrosion-resistant coating.

2. The device for forming a composite corrosion-resistant coating according to claim 1, wherein: The characteristic signal is a spectral signal, which includes: the strongest peak intensity, the spectral integrated area or the characteristic wavelength light power. The first auxiliary monitor and the second auxiliary monitor are spectrometers.

3. The device for forming a composite corrosion-resistant coating according to claim 2, wherein: The characteristic signal is temperature, and the first auxiliary monitor and the second auxiliary monitor are infrared thermometers.

4. The device for forming a composite corrosion-resistant coating according to claim 1, wherein: The material of the composite corrosion-resistant coating is a rare earth element oxygen-fluorine crystalline compound, and the rare earth element oxygen-fluorine crystalline compound includes: YOF, Y5O4F7, Y6O5F8, Y7O6F9, Y 17 O 14 F 23 , LaOF, CeOF, CeO6F2, PrOF, NdOF, SmOF, EuOF, Eu3O2F5, Eu5O4F7, GdOF, Gd5O4F7, TbOF, DyOF, HoOF, ErOF, Er3O2F5, Er5O4F7, TmOF, YbOF, Yb5O4F7, Yb6O5F8, LuO, Lu3O2F5, Lu5O4F7 or Lu7O6F9.

5. The device for forming a composite corrosion-resistant coating according to claim 1, wherein: The material of the composite corrosion-resistant coating is a crystalline compound formed by rare earth elements and alumina, and the crystalline compound formed by rare earth elements and alumina includes: Y4Al2O9, YAlO3, Y3Al5O 12 , LaAlO3, CeAlO3, Ce6AlO3, Pr4Al2O9, PrAlO3, PrAl 11 O 18 ,Nd4Al2O9,NdAlO3, NdAl 11 O 18 , Sm4Al2O9, SmAlO3, Eu4Al2O9, EuAlO3, Eu3Al5O 12 , Gd4Al2O9, GdAlO3, Gd3Al5O 12 , Tb4Al2O9, TbAlO3, Tb3Al5O 12 , Dy4Al2O9, DyAlO3, Dy3Al5O 12 , Ho4Al2O9, HoAlO3, Ho3Al5O 12 , Er4Al2O9, ErAlO3, Er3Al5O 12 , Tm4Al2O9, TmAlO3, Tm3Al5O 12 , Yb4Al2O9, Yb6Al 10 O 24 , Lu4Al2O9, LuAlO3 or Lu3Al5O 12 At least one of .

6. The device for forming a composite corrosion-resistant coating according to claim 1, wherein: The material of the composite corrosion-resistant coating is a crystalline compound formed by rare earth elements and silicon oxide, and the crystalline compound formed by rare earth elements and silicon oxide includes: Y2SiO5, Y2Si2O7, La2SiO5, La2Si2O7, Ce2SiO5, Pr2SiO5, Pr2Si2O7, Nd2SiO5, Nd4Si3O 12 , Nd2Si2O7, Sm2SiO5, Sm4Si3O 12 , Sm2Si2O7, Eu2SiO5, EuSiO3, Eu2Si2O7, Gd2SiO5, Gd4Si3O 12 , Gd2Si2O7, Tb2SiO5, Tb2Si2O7, Dy2SiO5, Dy4Si3O 12 , Dy2Si2O7, Ho2SiO5, Er2Si2O7, Er2SiO5, Er4Si3O 12 , Er2Si2O7, Tm2SiO5, Tm2Si2O7, Yb2SiO5, Yb4Si3O 12 , Yb2Si2O7, Lu2SiO5, Lu4Si3O 12 Or at least one of Lu2Si2O7.

7. The device for forming a composite corrosion-resistant coating according to claim 1, wherein: The material of the composite corrosion-resistant coating is at least one of fluoride oxides of rare earth elements and amorphous compounds formed with silicon oxide and aluminum oxide.

8. The device for forming a composite corrosion-resistant coating according to claim 1, wherein: The composite corrosion-resistant coating has uniform composition, and the fluctuation range of its composition in the thickness direction is less than 5%.

9. The device for forming a composite corrosion-resistant coating according to claim 8, wherein: The composite corrosion-resistant coating has uniform composition, and the fluctuation range of the composition in the thickness direction is less than 1%.

10. A method for forming a composite corrosion-resistant coating on the surface of a component body, characterized in that: include: Providing an apparatus for forming a composite corrosion-resistant coating according to any one of claims 1 to 9; Using a first excitation device to excite first target material atoms in the first target material, and using a second excitation device to excite second target material atoms in the second target material, the first target material atoms and the second target material atoms form a composite corrosion-resistant coating on the surface of the component body; A rate monitor is used to monitor the formation rate of the composite corrosion-resistant coating. When the formation rate deviates from the target rate, the deviation signal is fed back to the first auxiliary monitor and the second auxiliary monitor. The first auxiliary monitor and the second auxiliary monitor independently control the rate of their respective targets according to the strength changes of the characteristic signals of the first target material and the second target material, so as to control the stability of the formation rate of the composite corrosion-resistant coating.

11. The method for forming a composite corrosion-resistant coating according to claim 10, wherein: The rate monitor includes a quartz crystal oscillator; when a composite corrosion-resistant coating is formed on the surface of a component body, it also includes: forming a composite corrosion-resistant coating on the surface of the quartz crystal oscillator; by measuring the change in the resonant frequency of the quartz crystal oscillator, the formation rate of the composite corrosion-resistant coating can be monitored.

12. A semiconductor component, characterized in that: include: Component body; The composite corrosion-resistant coating formed by the method according to claim 10 or 11 is located on the surface of the component body and has a uniform composition along its thickness direction.

13. A plasma processing device, characterized in that: include: a reaction chamber, wherein the interior of the chamber contains a plasma environment; The semiconductor component according to claim 12, located in the reaction chamber and exposed to the plasma environment.

14. The plasma processing apparatus according to claim 13, wherein: The plasma environment contains at least one of fluorine, chlorine, oxygen or hydrogen plasma.

15. The plasma processing apparatus according to claim 13, wherein: The plasma processing device is a plasma etching device or a plasma cleaning device.

16. The plasma processing apparatus according to claim 15, wherein: When the plasma processing apparatus is an inductively coupled plasma processing apparatus, the components include: at least one of a ceramic plate, an inner liner, a gas nozzle, a gas distribution plate, a gas pipe flange, an electrostatic chuck assembly, a cover ring, a focusing ring, an insulating ring or a plasma confinement device.

17. The plasma processing apparatus according to claim 15, wherein: When the plasma processing apparatus is a capacitively coupled plasma processing apparatus, the components include: at least one of a shower head, an upper grounding ring, a moving ring, a gas distribution plate, a gas buffer plate, an electrostatic chuck assembly, a lower grounding ring, a cover ring, a focusing ring, an insulating ring, or a plasma confinement device.

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