A gradual photolithography process

Abstract

The present invention relates to the field of photolithography technology, and specifically to a gradual implicit photolithography process, comprising the following steps: S1, making a pattern according to demand; S2, separating the platinum part and the color part in the pattern to obtain two images, one image being stored as a corresponding format pattern required by the platinum system of the photolithography machine, and the other being stored as a format pattern required by the ordinary photolithography system; S3, inputting the two images into the corresponding photolithography system for photolithography; S4, after the photolithography is completed, taking out the rubber plate, developing it with a developer, drying it, and electroforming it to obtain a photolithography master; S5, transferring the pattern of the photolithography master to a positioning transfer film, electroplated aluminum, composite paper or film according to a printing carrier. The implicit photolithography process of the present invention perfectly integrates ordinary photolithography technology and platinum photolithography technology, so that the obtained product has stronger anti-counterfeiting performance and a wider range of applications. The platinum photolithography has a beautiful platinum luster, outstanding display effect, delicate platinum photolithography texture and high resolution.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography, and in particular to a gradual photolithography process. Background Art

[0002] Platinum lithography technology is an intuitive anti-counterfeiting technology that uses laser embossing platemaking technology combined with molding technology. The platinum embossed patterns produced have the advantages of strong three-dimensional sense, good logo brightness and high precision level. However, the existing dot matrix lithography technology often has a single light spot and an immutable pattern, which makes it impossible for the light spot to change too much.

[0003] Currently, due to technological limitations, people can only choose one process: conventional lithography or platinum lithography. Seamlessly combining the advantages of both technologies becomes very difficult. Later, through technical design improvements, it was possible to integrate the two lithography systems into the same coordinate system. Summary of the Invention

[0004] In order to overcome the shortcomings and deficiencies in the prior art, the purpose of the present invention is to provide a gradual implicit photolithography process, which perfectly integrates ordinary photolithography technology and platinum photolithography technology, so that the resulting product has stronger anti-counterfeiting performance and a wider range of applications. The platinum photolithography has a beautiful platinum luster, outstanding display effect, delicate platinum photolithography texture and high resolution.

[0005] The object of the present invention is achieved by the following technical solution: A gradual lithography process comprises the following steps:

[0006] S1. Use the corresponding software to make the corresponding pattern according to the needs;

[0007] S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system;

[0008] S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography;

[0009] S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern;

[0010] S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier.

[0011] The implicit lithography process in the present invention perfectly integrates ordinary lithography technology and platinum lithography technology, so that the resulting product has stronger anti-counterfeiting performance and a wider range of applications. The platinum lithography has a beautiful platinum luster, outstanding display effect, delicate platinum lithography texture and high resolution.

[0012] Preferably, in step S3, the platinum part is engraved first, and the coordinates of the lithography machine are adjusted to the initial coordinates x=0, y=0, and the lithography of this part is waited for to be completed. After completion, do not move the plate, and then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step.

[0013] Preferably, the developer comprises the following raw materials in parts by weight: 10-20 parts of a main developer, 1-3 parts of an antioxidant, 4-8 parts of EDTA, 1-5 parts of tetrahydrofuran, 1-3 parts of sodium carbonate, 1-3 parts of ethylene glycol, 1-3 parts of a first surfactant, 0.5-1.0 parts of a second surfactant, and 2-6 parts of a solvent.

[0014] The developer of the present invention can maintain good printing reproducibility and suppress adhesion and aggregation of dispersed matter in the developer during repeated use, thereby having high image reproducibility.

[0015] Preferably, the first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 0.8-1.2:0.6-1.0. More preferably, the silanol nonionic surfactant is GSK-588 produced by Dongguan Gaosijin Fine Chemical Co., Ltd., and the anionic surfactant is ammonium dodecylbenzenesulfonate (1331-61-9) produced by Hubei Wonder Chemical Co., Ltd.

[0016] Preferably, the second surfactant is a repeating unit polymer having the following general formula, wherein R represents a hydrogen atom or a methyl group. The second surfactant has a good enhancing effect on maintaining the adsorption and dispersibility of the dispersion, and can effectively improve the uniformity of the development.

[0017] The first surfactant in this invention is a mixed solution of a silanol nonionic surfactant and an anionic surfactant, which exhibits excellent wettability and dispersion uniformity, improving development uniformity. This composite surfactant system, comprising both anionic and nonionic surfactants, effectively resolves the issue of developer sediment dispersion, while also offering advantages such as wide development latitude and minimal damage to the image and text area.

[0018] Preferably, the primary developer is a mixture of sodium hydroxide, potassium hydroxide and sodium silicate in a weight ratio of 0.8-1.2:0.4-0.8:0.6-1.0.

[0019] The main developer of the present invention adopts a mixed solvent of potassium hydroxide and sodium silicate as a developer, which is a weak alkaline developer, has reduced corrosion performance, reduced waste liquid discharge, and has a fast developing speed, relatively stable performance and a long service life.

[0020] Preferably, the antioxidant is one or more of L-ascorbic acid, D-isoascorbic acid, and sodium ascorbate.

[0021] Preferably, the solvent is one or more of benzyl alcohol, ethylene glycol phenyl ether, and propylene glycol phenyl ether.

[0022] The use of the solvent in the present invention can reduce the corrosive performance of the developer, reduce the discharge of waste liquid, and has a fast developing speed, relatively stable performance and a long service life.

[0023] Preferably, the developer is prepared by the following steps:

[0024] 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use;

[0025] 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 25-35° C. and stirring uniformly to obtain a developer.

[0026] The developer of the present invention is prepared by the above method. The developer prepared by the above method has good printing reproducibility and inhibits the adhesion and aggregation of dispersed matter in the developer during repeated use, thereby having high image reproducibility.

[0027] The beneficial effects of the present invention are: the implicit lithography process of the present invention perfectly integrates ordinary lithography technology and platinum lithography technology, so that the anti-counterfeiting performance of the obtained product is stronger and the application range is wider. The platinum lithography has a beautiful platinum luster, outstanding display effect, delicate platinum lithography texture and high resolution. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1-3 The figure is a finished product effect diagram obtained by using a gradual etching process of the present invention. DETAILED DESCRIPTION

[0029] In order to facilitate the understanding of those skilled in the art, the following embodiments and accompanying drawings are provided. Figure 1-3 The present invention is further described, and the contents mentioned in the embodiment are not intended to limit the present invention.

[0030] Example 1

[0031] A gradual photolithography process comprises the following steps:

[0032] S1. Use the corresponding software to make the corresponding pattern according to the needs;

[0033] S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system;

[0034] S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography;

[0035] S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern;

[0036] S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier.

[0037] In step S3, first engrave the platinum part, adjust the coordinates of the lithography machine to the initial coordinates x=0, y=0, wait for this part of the lithography to be completed, do not move the plate after completion, then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step.

[0038] The developer comprises the following raw materials in parts by weight: 10 parts of a main developer, 1 part of an antioxidant, 4 parts of EDTA, 1 part of tetrahydrofuran, 1 part of sodium carbonate, 1 part of ethylene glycol, 1 part of a first surfactant, 0.5 parts of a second surfactant and 2 parts of a solvent.

[0039] Preferably, the second surfactant is a repeating unit polymer having the following general formula, wherein R represents a hydrogen atom or a methyl group.

[0040] The primary developer is a mixture of sodium hydroxide, potassium hydroxide, and sodium silicate in a weight ratio of 0.8:0.4:0.6. The antioxidant is L-ascorbic acid; and the solvent is benzyl alcohol.

[0041] The first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 0.8:0.6. The silanol nonionic surfactant is GSK-588 produced by Dongguan Gaosijin Fine Chemical Co., Ltd., and the anionic surfactant is ammonium dodecylbenzenesulfonate (1331-61-9) produced by Hubei Wonder Chemical Co., Ltd.

[0042] The developer is prepared by the following steps:

[0043] 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use;

[0044] 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 25° C. and stirring uniformly to obtain a developer.

[0045] Example 2

[0046] A gradual photolithography process comprises the following steps:

[0047] S1. Use the corresponding software to make the corresponding pattern according to the needs;

[0048] S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system;

[0049] S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography;

[0050] S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern;

[0051] S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier.

[0052] In step S3, first engrave the platinum part, adjust the coordinates of the lithography machine to the initial coordinates x=0, y=0, wait for this part of the lithography to be completed, do not move the plate after completion, then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step.

[0053] The developer comprises the following raw materials in parts by weight: 13 parts of a main developer, 1.5 parts of an antioxidant, 5 parts of EDTA, 2 parts of tetrahydrofuran, 1.5 parts of sodium carbonate, 1.5 parts of ethylene glycol, 1.5 parts of a first surfactant, 0.6 parts of a second surfactant, and 3 parts of a solvent.

[0054] Preferably, the second surfactant is a repeating unit polymer having the following general formula, wherein R represents a hydrogen atom or a methyl group.

[0055] The primary developer is a mixture of sodium hydroxide, potassium hydroxide and sodium silicate in a weight ratio of 0.9:0.5:0.7.

[0056] The antioxidant is D-isoascorbic acid; and the solvent is ethylene glycol phenyl ether.

[0057] The first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 0.9:0.7. The silanol nonionic surfactant is GSK-588 produced by Dongguan Gaosijin Fine Chemical Co., Ltd., and the anionic surfactant is ammonium dodecylbenzenesulfonate (1331-61-9) produced by Hubei Wonder Chemical Co., Ltd.

[0058] The developer is prepared by the following steps:

[0059] 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use;

[0060] 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 28° C. and stirring uniformly to obtain a developer.

[0061] Example 3

[0062] A gradual photolithography process comprises the following steps:

[0063] S1. Use the corresponding software to make the corresponding pattern according to the needs;

[0064] S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system;

[0065] S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography;

[0066] S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern;

[0067] S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier.

[0068] In step S3, first engrave the platinum part, adjust the coordinates of the lithography machine to the initial coordinates x=0, y=0, wait for this part of the lithography to be completed, do not move the plate after completion, then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step.

[0069] The developer comprises the following raw materials in parts by weight: 15 parts of a main developer, 2 parts of an antioxidant, 6 parts of EDTA, 3 parts of tetrahydrofuran, 2 parts of sodium carbonate, 2 parts of ethylene glycol, 2 parts of a first surfactant, 0.7 parts of a second surfactant, and 4 parts of a solvent.

[0070] Preferably, the second surfactant is a repeating unit polymer having the following general formula, wherein R represents a hydrogen atom or a methyl group.

[0071] The primary developer is a mixture of sodium hydroxide, potassium hydroxide and sodium silicate in a weight ratio of 1.0:0.6:0.8.

[0072] The antioxidant is sodium ascorbate; and the solvent is propylene glycol phenyl ether.

[0073] The first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 1.0:0.8. The silanol nonionic surfactant is GSK-588 produced by Dongguan Gaosijin Fine Chemical Co., Ltd., and the anionic surfactant is ammonium dodecylbenzenesulfonate (1331-61-9) produced by Hubei Wonder Chemical Co., Ltd.

[0074] The developer is prepared by the following steps:

[0075] 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use;

[0076] 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 30° C. and stirring uniformly to obtain a developer.

[0077] Example 4

[0078] A gradual photolithography process comprises the following steps:

[0079] S1. Use the corresponding software to make the corresponding pattern according to the needs;

[0080] S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system;

[0081] S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography;

[0082] S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern;

[0083] S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier.

[0084] In step S3, first engrave the platinum part, adjust the coordinates of the lithography machine to the initial coordinates x=0, y=0, wait for this part of the lithography to be completed, do not move the plate after completion, then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step.

[0085] The developer comprises the following raw materials in parts by weight: 18 parts of a main developer, 2.5 parts of an antioxidant, 7 parts of EDTA, 4 parts of tetrahydrofuran, 2.5 parts of sodium carbonate, 2.5 parts of ethylene glycol, 2.5 parts of a first surfactant, 0.9 parts of a second surfactant, and 5 parts of a solvent.

[0086] Preferably, the second surfactant is a repeating unit polymer having the following general formula, wherein R represents a hydrogen atom or a methyl group.

[0087] The main developer is a mixture of sodium hydroxide, potassium hydroxide and sodium silicate in a weight ratio of 0.8-1.2:0.4-0.8:0.6-1.0.

[0088] The antioxidant is L-ascorbic acid; and the solvent is benzyl alcohol.

[0089] The first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 0.8-1.2:0.6-1.0. The silanol nonionic surfactant is GSK-588 produced by Dongguan Gaosijin Fine Chemical Co., Ltd., and the anionic surfactant is ammonium dodecylbenzenesulfonate (1331-61-9) produced by Hubei Wonder Chemical Co., Ltd.

[0090] The developer is prepared by the following steps:

[0091] 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use;

[0092] 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 33° C. and stirring uniformly to obtain a developer.

[0093] Example 5

[0094] A gradual photolithography process comprises the following steps:

[0095] S1. Use the corresponding software to make the corresponding pattern according to the needs;

[0096] S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system;

[0097] S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography;

[0098] S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern;

[0099] S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier.

[0100] In step S3, first engrave the platinum part, adjust the coordinates of the lithography machine to the initial coordinates x=0, y=0, wait for this part of the lithography to be completed, do not move the plate after completion, then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step.

[0101] The developer comprises the following raw materials in parts by weight: 20 parts of a main developer, 3 parts of an antioxidant, 8 parts of EDTA, 5 parts of tetrahydrofuran, 3 parts of sodium carbonate, 3 parts of ethylene glycol, 3 parts of a first surfactant, 1.0 part of a second surfactant, and 6 parts of a solvent.

[0102] Preferably, the second surfactant is a repeating unit polymer having the following general formula, wherein R represents a hydrogen atom or a methyl group.

[0103] The primary developer is a mixture of sodium hydroxide, potassium hydroxide, and sodium silicate in a weight ratio of 1.2:0.8:1.0.

[0104] The antioxidant is L-ascorbic acid; and the solvent is benzyl alcohol.

[0105] The first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 1.2:1.0. The silanol nonionic surfactant is GSK-588 produced by Dongguan Gaosijin Fine Chemical Co., Ltd., and the anionic surfactant is ammonium dodecylbenzenesulfonate (1331-61-9) produced by Hubei Wonder Chemical Co., Ltd.

[0106] The developer is prepared by the following steps:

[0107] 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use;

[0108] 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 35° C. and stirring uniformly to obtain a developer.

[0109] The above embodiments are preferred implementation schemes of the present invention. In addition, the present invention can also be implemented in other ways. Any obvious replacement without departing from the concept of the present invention is within the scope of protection of the present invention.

Claims

1. A gradual lithography process, characterized in that: The steps include: S1. Use the corresponding software to make the corresponding pattern according to the needs; S2. Separate the platinum portion and the color portion of the pattern obtained in step S1 using the separation function in the photolithography software to obtain two images, one of which is saved as a pattern format corresponding to the platinum system of the photolithography machine, and the other is saved as a pattern format required by the ordinary photolithography system; S3, inputting the two image information obtained in step S2 into corresponding lithography systems for lithography; S4, after the two patterns in step S3 are photolithographically completed, the slab is taken out, developed with a developer, dried, and electroformed to obtain a master slab with a gradual-effect photolithography pattern; S5. Transfer the pattern of the photoresist obtained in step S4 to a positioning transfer film, anodized aluminum, composite paper or film according to the printing carrier; In step S3, first engrave the platinum part, adjust the coordinates of the lithography machine to the initial coordinates x=0, y=0, wait for this part of the lithography to be completed, and do not move the plate after completion. Then open the ordinary lithography system, adjust the lithography starting coordinates to the starting point of the ordinary lithography part pattern x=10, y=10, click Start, wait for the lithography to be completed, and then proceed to the next step; The developer comprises the following raw materials in parts by weight: 10-20 parts of a main developer, 1-3 parts of an antioxidant, 4-8 parts of EDTA, 1-5 parts of tetrahydrofuran, 1-3 parts of sodium carbonate, 1-3 parts of ethylene glycol, 1-3 parts of a first surfactant, 0.5-1.0 parts of a second surfactant and 2-6 parts of a solvent.

2. The stealth lithography process according to claim 1, wherein: The second surfactant is a repeating unit polymer having the following general formula: wherein R represents a hydrogen atom or a methyl group.

3. The stealth lithography process according to claim 1, wherein: The main developer is a mixture of sodium hydroxide, potassium hydroxide and sodium silicate in a weight ratio of 0.8-1.2:0.4-0.8:0.6-1.

0.

4. The stealth lithography process according to claim 1, wherein: The antioxidant is one or more of L-ascorbic acid, D-isoascorbic acid, and sodium ascorbate.

5. The stealth lithography process according to claim 1, wherein: The first surfactant is a mixture of a silanol nonionic surfactant and an anionic surfactant in a weight ratio of 0.8-1.2:0.6-1.

0.

6. The stealth lithography process according to claim 1, wherein: The solvent is one or more of benzyl alcohol, ethylene glycol phenyl ether, and propylene glycol phenyl ether.

7. The stealth lithography process according to any one of claims 1 to 6, characterized in that: The developer is prepared by the following steps: 1) Mix and dissolve the primary developer, EDTA, tetrahydrofuran, sodium carbonate, ethylene glycol, and solvent according to parts by weight to obtain a mixed solution A for later use; 2) Adding the first surfactant, the second surfactant and the antioxidant to the mixed solution A obtained in step 1) and heating to 25-35° C. and stirring uniformly to obtain a developer.

Images