A device and method for multiple exposure alignment of flexible substrates
By using a vacuum stage and adjustment mechanism in a roll-to-roll exposure machine, combined with a camera and a three-axis moving module, the problem of insufficient alignment accuracy during multiple exposures of flexible materials was solved, achieving high-precision alignment of film materials and photomasks, thus improving product quality and market competitiveness.
Patent Information
- Application Number
- CN202210624783.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-06-02
- Publication Date
- 2026-01-13
- Estimated Expiration
- 2042-06-02
AI Technical Summary
Existing roll-to-roll exposure machines cannot effectively control the film material's twisting and shrinkage during multiple exposures on flexible materials, resulting in insufficient alignment accuracy, especially for secondary alignment accuracy exceeding 50µm, which affects product quality.
The design employs a vacuum stage and photomask, combined with a camera and multiple adjustment mechanisms, including a film gripper and a three-axis moving module. By calculating the movement direction and distance of the adjustment mechanisms, precise alignment of the film and photomask is achieved.
This improved the alignment accuracy of flexible materials, enhanced product yield and market competitiveness, and achieved precision control of 5–10 micrometers.
Smart Images

Figure CN115202159B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of roll-to-roll exposure technology, and more specifically relates to an alignment device and method suitable for multiple exposures of flexible substrates. Background Technology
[0002] In the touch screen industry, contact roll-to-roll exposure machines, such as the roll-to-roll exposure device disclosed in Chinese Patent Application No. 2020231111730, include an exposure section comprising an exposure suction element, a alignment lens, and an exposure lens. The exposure suction element is located below the roll material and is used to suction and fix the roll material during exposure. The alignment lens and the exposure lens are both located above the roll material, with the alignment lens positioned to one side of the exposure lens. Each section of the roll material includes an exposure start point, an exposure end point, an exposure area located between the exposure start point and the exposure end point, and four marker points. The exposure area is rectangular, and the four marker points are located on the periphery of the exposure area, with each marker point positioned close to one of the four vertices of the exposure area. The two alignment lenses above the roll material correspond to two marker points in the width direction on one side of the exposure area. The alignment lenses identify the positions of these four marker points to determine the exposure parameters of the roll material. The exposure parameters specifically include the roll material's positional error, angular error, and expansion / contraction deviation. The exposure image data is adjusted based on these exposure parameters.
[0003] However, during exposure, multiple exposures are often performed on a single-layer film. Due to differences in film thickness and material, the film cannot be completely flat during exposure, resulting in a certain degree of distortion in the pattern exposed on the first exposure. During the second alignment exposure, the distortion cannot be maintained in the same way as the first, significantly impacting the alignment accuracy. Currently, contact roll-to-roll exposure machines on the market require a secondary registration accuracy of ≥50µm, which negatively affects the alignment accuracy of single-layer / multi-layer films and the performance and appearance of touch products.
[0004] like Figure 1 As shown, it illustrates the images of four sets of alignment marks that were completed but not aligned accurately (as seen by four cameras through a mask when the membrane material was twisted and deformed.)
[0005] The main reasons for low alignment accuracy are as follows:
[0006] Reason 1: During the first exposure of flexible materials, the film cannot be guaranteed to be completely flat, resulting in a certain degree of distortion in the exposed pattern. During the second alignment exposure, the same degree of distortion cannot be maintained, significantly affecting the alignment accuracy.
[0007] Reason 2: When overlaying and aligning flexible materials, problems such as film expansion and contraction caused by temperature and process are often encountered. Or, when the film is transported onto the mask, it is impossible to ensure that the film is completely flat. It is difficult to accurately align the pattern on the original film with the pattern on the photomask, making it difficult to control the alignment accuracy. Summary of the Invention
[0008] To address the shortcomings of existing technologies, this invention provides an alignment device suitable for vacuum contact roll-to-roll exposure of flexible substrates, which can prevent excessive registration errors and low accuracy during roll-to-roll exposure.
[0009] To achieve the above objectives, the present invention provides the following technical solution: a device for aligning multiple exposures of flexible substrates, comprising a vacuum stage and a photomask, wherein a camera is provided on the side of the photomask facing away from the vacuum stage, and the photomask has multiple alignment marks; several adjustment mechanisms are arranged around the vacuum stage, and the adjustment mechanisms are located on the path of the film material; the adjustment mechanism includes a film material gripper and a three-axis moving module, wherein the film material gripper is fixed on the three-axis moving module.
[0010] Furthermore, the membrane material gripper includes a vacuum suction cup connected to a vacuum generator.
[0011] Furthermore, the membrane gripper includes grippers.
[0012] The further three-axis motion module includes:
[0013] The X-axis module has an X-axis motor and an X-axis mounting plate.
[0014] The Y-axis module has a Y-axis motor and a Y-axis mounting plate, with the Y-axis motor fixed to the X-axis mounting plate.
[0015] The Z-axis module has a Z-axis cylinder, which is fixed to the Y-axis mounting plate.
[0016] The membrane material gripper is fixed on the Z-axis cylinder.
[0017] The further three-axis motion module includes:
[0018] The X-axis module has an X-axis motor and an X-axis mounting plate.
[0019] The Y-axis module has a Y-axis motor and a Y-axis mounting plate, with the Y-axis motor fixed to the X-axis mounting plate.
[0020] The Z-axis module has a Z-axis motor and a Z-axis mounting plate. The Z-axis and the Z-axis motor are fixed to the Y-axis mounting plate.
[0021] The membrane material gripper is fixed to the Z-axis fixing plate.
[0022] Furthermore, four alignment marks are provided, located near the four corners of the photomask, and four adjustment mechanisms are provided, located near the four corners of the vacuum stage.
[0023] Furthermore, the number of cameras is the same as the alignment mark, and their positions correspond one-to-one.
[0024] A method for alignment suitable for multiple exposures of flexible substrates includes the following steps:
[0025] S1: Transport the film material onto the vacuum stage, and adjust the photomask to a position close to the film material at a fixed distance. This position ensures that the photomask does not contact the film material, and that the photomask and the alignment mark on the film material after one exposure are in the same monitoring field of view of the camera.
[0026] S2: Extend the Z-axis module of the adjustment mechanism and grasp the membrane material through the membrane material gripper connected thereon;
[0027] S3: The system analyzes the relative distance between the alignment marks of the photomask and the film material in the same frame of the camera. Taking the center of the alignment marks of the four photomasks as the 0 point as the coordinate axis, the coordinates of the alignment marks on the film material deviating from the center of the alignment marks of the photomask are (X1, Y1), (X2, Y2), (X3, Y3), (X4, Y4), respectively.
[0028] The system analyzes the relative position difference of the four sets of alignment marks. If the relative position difference is within the set allowable range, it proceeds to step S5; if the relative position difference is not within the set allowable range, it proceeds to step S4.
[0029] S4: Calculate the distance and direction of the adjustment mechanism's movement, move the adjustment mechanism carrying the membrane material to adjust, and then return to step S3;
[0030] S5: After adjustment, the membrane material is held in place by the vacuum stage; at this time, the four alignment marks of the membrane material are the same in distance and position relative to the alignment marks of the photomask, that is, the coordinates of the alignment marks of the membrane material are X1=X2=X3=X4=X', Y1=Y2=Y3=Y4=Y';
[0031] S6: Then the photomask will be aligned with the film material a second time. The photomask will be moved to the exposure position so that the relative offset coordinates between the photomask and the alignment mark on the film material are (0,0). After the vacuum stage is evacuated to the set vacuum value, the exposure will be performed.
[0032] S7: After exposure is complete, the film gripper releases the film, and the adjustment mechanism returns to the set origin.
[0033] In further step S4, the direction and distance of movement of the mechanism are calculated as follows:
[0034] X-direction adjustment target point = (X1 + X3 + X2 + X4) / 4;
[0035] Adjust the target point in the Y direction = (Y1 + Y2 + Y3 + Y4) / 4;
[0036] X1 axis motor running distance and direction = X direction adjustment target point - X1;
[0037] Y1 axis motor running distance and direction = Y direction adjustment target point - Y1;
[0038] X2 axis motor running distance and direction = X direction adjustment target point - X2;
[0039] Y2 axis motor running distance and direction = Y direction adjustment target point - Y2;
[0040] X3 axis motor running distance and direction = X direction adjustment target point - X3;
[0041] Y3 axis motor running distance and direction = Y direction adjustment target point - Y3;
[0042] X4 axis motor running distance and direction = X direction adjustment target point - X4;
[0043] Y4 axis motor running distance and direction = Y direction adjustment target point - Y4.
[0044] A device for aligning flexible substrates after multiple exposures includes a vacuum stage and a photomask. A camera is located on the side of the photomask facing away from the vacuum stage. The photomask has multiple alignment marks. Several adjustment mechanisms are arranged around the vacuum stage, and the adjustment mechanisms are located on the path of the film material. Each adjustment mechanism includes a film material gripper. The film material gripper of one adjustment mechanism is connected to a Z-axis module, and the film material grippers of the other adjustment mechanisms are all connected to a three-axis motion module.
[0045] Compared with the prior art, the beneficial effects of the present invention are:
[0046] 1. This adjustment mechanism can support the production of common roll-to-roll flexible substrate materials such as polyethylene terephthalate (PET), transparent polyimide (CPI), cyclic olefin polymer (COP), super delayed film (SRF), polycarbonate (PC), polyethylene naphthalate (PEN), and polymethyl methacrylate (PMMA);
[0047] 2. It can solve the problem of poor alignment accuracy between the mask and the film material caused by the twisting, deformation and expansion and contraction of the film material during the exposure of flexible materials;
[0048] 3. Improved alignment accuracy between the photomask and the film material will significantly improve product yield and market competitiveness;
[0049] 4. It can achieve good accuracy, which can be controlled at 5 to 10 micrometers. Attached Figure Description
[0050] Figure 1 The images are of four sets of alignment marks seen by four cameras through a photomask when the membrane material is twisted and deformed, but the accuracy is too low.
[0051] Figure 2 This is a three-dimensional structural diagram of the adjustment mechanism in this invention;
[0052] Figure 3 This is a schematic diagram showing the view from the mask side during alignment;
[0053] Figure 4 This is a three-dimensional structural diagram of the present invention;
[0054] Figure 5 This refers to the relative positions of the alignment marks of the mask and the film material as seen in the camera image during the alignment method of this invention.
[0055] Reference numerals in the attached figures: 1. Vacuum stage; 2. Photomask; 3. Adjustment mechanism; 31. X-axis module; 311. X-axis motor; 312. X-axis fixing plate; 321. Y-axis motor; 322. Y-axis fixing plate; 33. Z-axis module; 34. Vacuum suction cup; 4. Camera; 5. Film material; 6. Alignment mark. Detailed Implementation
[0056] Reference Figures 2 to 5 The embodiments of the present invention applicable to the alignment device and alignment method for multiple exposures of flexible substrates are further described below.
[0057] In the description of this invention, it should be noted that the directional terms such as "center", "horizontal (X)", "longitudinal (Y)", "vertical (Z)", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", and "counterclockwise" indicate the orientation and positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. They should not be construed as limiting the specific protection scope of this invention.
[0058] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features. Thus, the use of "first" and "second" to define a feature may explicitly or implicitly include one or more of that feature. In the description of this invention, "several" or "a number" means two or more, unless otherwise explicitly specified.
[0059] A device for aligning multiple exposures of flexible substrates includes a vacuum stage 1 and a photomask 2. A camera 4 is located on the side of the photomask 2 facing away from the vacuum stage 1. The photomask 2 has multiple alignment marks 6. Several adjustment mechanisms 3 are arranged around the vacuum stage 1, and the adjustment mechanisms 3 are located on the path of the film material 5. The adjustment mechanism 3 includes a film material 5 gripper and a three-axis moving module. The film material 5 gripper is fixed to the three-axis moving module.
[0060] The flexible substrates applicable in this invention include single-layer and multi-layer membrane materials 5.
[0061] During operation, the film material 5 passes between the photomask 2 and the vacuum stage 1; more specifically, it passes along the surface of the vacuum stage 1. The surface of the film material 5 after one exposure also has alignment marks 6, such as... Figure 3 and 5 As shown, the circular structure is the alignment mark 6 on the photomask 2, and the cross structure is the alignment mark 6 on the surface of the film material 5. For specific pre-exposure preparations, please refer to the alignment method below.
[0062] like Figure 3 As shown, in this preferred embodiment, four alignment marks 6 are provided, and the four alignment marks 6 are located near the four corners of the mask 2. Here, the alignment marks 6 refer to those on the mask 2. Four adjustment mechanisms 3 are provided, and the four adjustment mechanisms 3 are located near the four corners of the vacuum stage 1. The adjustment mechanism 3 and the vacuum stage 1 may not be directly connected. The adjustment mechanism 3 may be fixed to the machine base of the exposure machine.
[0063] In this embodiment, the alignment marks 6 on the surface of the film material 5 are arranged around the position to be exposed. In the design, the alignment marks 6 on the surface of the film material 5 can be aligned one by one with the alignment marks 6 on the photomask 2.
[0064] like Figure 4 As shown, the number of cameras 4 is the same as that of the alignment mark 6, and their positions correspond one-to-one.
[0065] In one embodiment, the membrane material 5 gripper includes a vacuum suction cup 34, which is connected to a vacuum generator. The vacuum suction cup 34 and the vacuum generator are connected by an air pipe. For easy control, a vacuum solenoid valve can be arranged on the air pipe to control the movement of the vacuum suction cup 34. The vacuum suction cup 34 can hold the membrane material 5.
[0066] In another embodiment, the membrane material 5 gripper can also be a claw, which can be a pneumatic claw or an electric claw, in which case it needs to grip the edge of the membrane material 5.
[0067] like Figure 2 As shown, in one embodiment, the three-axis motion module includes:
[0068] X-axis module 31, which has an X-axis motor 311 and an X-axis mounting plate 312;
[0069] The Y-axis module has a Y-axis motor 321 and a Y-axis fixing plate 322, with the Y-axis motor 321 fixed on the X-axis fixing plate 312.
[0070] Z-axis module 33, which has a Z-axis cylinder, is fixed on Y-axis mounting plate 322;
[0071] The membrane material 5 gripper is fixed on the Z-axis cylinder.
[0072] In another embodiment, the three-axis motion module includes:
[0073] X-axis module 31, which has an X-axis motor 311 and an X-axis mounting plate 312;
[0074] The Y-axis module has a Y-axis motor 321 and a Y-axis fixing plate 322, with the Y-axis motor 321 fixed on the X-axis fixing plate 312.
[0075] Z-axis module 33, which has a Z-axis motor and a Z-axis mounting plate, the Z-axis and the Z-axis motor are fixed on the Y-axis mounting plate 322;
[0076] The membrane material 5 gripper is fixed to the Z-axis fixing plate;
[0077] The only difference between it and the previous embodiment is the implementation method of the Z-axis module 33.
[0078] In a new embodiment, the X-axis module 31, Y-axis module and Z-axis module 33 of the three-axis motion module can be connected in any sequential combination, as long as the membrane material 5 gripper is fixed to the last connected module.
[0079] A method for alignment suitable for multiple exposures of flexible substrates includes the following steps:
[0080] S1: The film material 5 is transported to the vacuum stage 1, and the mask 2 is adjusted to move to a position close to the film material 5 at a fixed distance. This position ensures that the mask 2 does not contact the film material 5, and the mask 2 and the alignment mark 6 on the film material 5 after one exposure are in the same monitoring field of view of the camera 4.
[0081] S2: Extend the Z-axis module 33 of the adjustment mechanism 3 and grasp the membrane material 5 through the membrane material 5 gripper connected thereon;
[0082] S3: The system analyzes the relative distance between the alignment marks 6 of the mask 2 and the film material 5 in the same frame of the camera 4. Taking the center of the alignment marks 6 of the four mask 2 as the 0 point as the coordinate axis, the coordinates of the alignment marks 6 on the film material 5 deviating from the center of the alignment marks 6 of the mask are (X1, Y1), (X2, Y2), (X3, Y3), (X4, Y4), respectively.
[0083] The system analyzes the relative position difference of the four sets of alignment marks 6. If the relative position difference is within the set allowable range, proceed to step S5; if the relative position difference is not within the set allowable range, proceed to step S4.
[0084] S4: Calculate the distance and direction of the adjustment mechanism 3 to move, so that the adjustment mechanism 3 moves and adjusts the membrane material 5, and then return to step S3;
[0085] S5: After the adjustment is completed, the membrane material 5 is held in place by the vacuum stage 1; at this time, the four alignment marks 6 of the membrane material 5 are the same in distance and position relative to the alignment marks 6 of the mask 2, that is, the coordinates of the alignment marks 6 of the membrane material 5 are X1=X2=X3=X4=X', Y1=Y2=Y3=Y4=Y'.
[0086] After step S5 is completed, the difference between the two alignment marks 6 is not necessarily (0, 0), but is offset by the same position (X', Y') relative to the photomask alignment marks 6, so step S6 will be entered.
[0087] S6: Then the photomask 2 will be aligned with the film material 5 for the second time. The photomask 2 will be moved to the exposure position so that the relative offset coordinates between the photomask 2 and the alignment mark 6 on the film material 5 are (0,0). After the vacuum stage 1 is evacuated to the set vacuum value, the exposure will be performed.
[0088] S7: After exposure is complete, the film material 5 gripper releases the film material 5, and the adjustment mechanism 3 returns to the set origin.
[0089] In this preferred embodiment, in step S4, the moving direction and distance of the adjustment mechanism 3 are calculated in the following manner:
[0090] X-direction adjustment target point = (X1 + X3 + X2 + X4) / 4;
[0091] Adjust the target point in the Y direction = (Y1 + Y2 + Y3 + Y4) / 4;
[0092] X1 axis motor running distance and direction = X direction adjustment target point - X1;
[0093] Y1 axis motor running distance and direction = Y direction adjustment target point - Y1;
[0094] X2 axis motor running distance and direction = X direction adjustment target point - X2;
[0095] Y2 axis motor running distance and direction = Y direction adjustment target point - Y2;
[0096] X3 axis motor running distance and direction = X direction adjustment target point - X3;
[0097] Y3 axis motor running distance and direction = Y direction adjustment target point - Y3;
[0098] X4 axis motor running distance and direction = X direction adjustment target point - X4;
[0099] Y4 axis motor running distance and direction = Y direction adjustment target point - Y4.
[0100] In a new embodiment, a alignment device suitable for multiple exposures of flexible substrates includes a vacuum stage 1 and a photomask 2. A camera 4 is located on the side of the photomask 2 facing away from the vacuum stage 1. The photomask 2 has multiple alignment marks 6. Several adjustment mechanisms 3 are arranged around the vacuum stage 1, and the adjustment mechanisms 3 are located on the path of the film material 5. The adjustment mechanism 3 includes a film material 5 gripper. The film material 5 gripper of one adjustment mechanism 3 is connected to a Z-axis module 33, and the film material 5 grippers of the other adjustment mechanisms 3 are all connected to a three-axis movement module.
[0101] In this embodiment, three corners use active moving adjustment mechanisms 3, while the other corner uses a fixed adjustment mechanism 3. This fixed adjustment mechanism 3 contains only one Z-axis motor or cylinder Z-axis module 33, achieving the same improvement effect. During adjustment, the alignment deviation value at the fixed adjustment mechanism 3 is set as the target adjustment value for the other three corners. For example, if the alignment deviation value at the fixed adjustment mechanism 3 is X... M Y N The alignment deviation values of the other three movable adjustment mechanisms 3 with X and Y adjustment functions are based on the alignment deviation value X of the fixed adjustment mechanism 3. M Y N Adjustments were made, specifically adjusting the alignment deviation values of the remaining three to X. M Y N (including X)M Y N Based on the allowable deviation range, the same alignment effect can be achieved.
[0102] The above description is merely a preferred embodiment of the present invention. The scope of protection of the present invention is not limited to the above embodiments. All technical solutions falling within the scope of the present invention's concept are within the scope of protection of the present invention. It should be noted that for those skilled in the art, any improvements and modifications made without departing from the principles of the present invention should also be considered within the scope of protection of the present invention.
Claims
1. A device for aligning multiple exposures of flexible substrates, comprising a vacuum stage and a photomask, wherein a camera is located on the side of the photomask facing away from the vacuum stage, and the photomask has multiple alignment marks, characterized in that: The device is used for vacuum contact roll-to-roll exposure of flexible substrates. Several adjustment mechanisms are arranged around the vacuum stage, and these mechanisms are located along the path of the film material. Each adjustment mechanism includes a film gripper and a three-axis moving module. The film gripper is fixed to the three-axis moving module. The X-axis, Y-axis, and Z-axis modules of the three-axis moving module are connected in any sequential combination, so that the film gripper is fixed to the last connected module. Three corners use active moving adjustment mechanisms, and the other corner uses a fixed adjustment mechanism. The fixed adjustment mechanism has only one Z-axis module with a Z-axis motor or cylinder. During adjustment, the alignment deviation value at the fixed adjustment mechanism is set as the target adjustment value for the other three corners. The alignment deviation value at the fixed adjustment mechanism is X. M Y N The alignment deviation values of the other three movable adjustment mechanisms with X and Y adjustment functions are based on the alignment deviation value X of the fixed adjustment mechanism. M Y N Adjustments were made, and the alignment deviation values of the remaining three were all adjusted to X. M Y N .
2. The alignment device for multiple exposures of flexible substrates according to claim 1, characterized in that: The membrane material gripper includes a vacuum suction cup, which is connected to a vacuum generator.
3. The alignment device for multiple exposures of flexible substrates according to claim 1, characterized in that: The membrane gripper includes grippers.
4. The alignment apparatus for multiple exposures of flexible substrates according to claim 2 or 3, characterized in that: The three-axis moving module includes: an X-axis module, which has an X-axis motor and an X-axis fixing plate; The Y-axis module has a Y-axis motor and a Y-axis mounting plate, with the Y-axis motor fixed to the X-axis mounting plate. The Z-axis module has a Z-axis cylinder, which is fixed to the Y-axis fixing plate; the film gripper is fixed on the Z-axis cylinder.
5. The alignment apparatus for multiple exposures of flexible substrates according to claim 2 or 3, characterized in that: The three-axis moving module includes: an X-axis module, which has an X-axis motor and an X-axis fixing plate; The Y-axis module has a Y-axis motor and a Y-axis mounting plate, with the Y-axis motor fixed to the X-axis mounting plate. The Z-axis module has a Z-axis motor and a Z-axis mounting plate. The Z-axis and the Z-axis motor are fixed to the Y-axis mounting plate. The membrane material gripper is fixed to the Z-axis fixing plate.
6. The alignment apparatus for multiple exposures of flexible substrates according to claim 2 or 3, characterized in that: Four alignment marks are provided, located near the four corners of the photomask. Four adjustment mechanisms are provided, located near the four corners of the vacuum stage.
7. The alignment device for multiple exposures of flexible substrates according to claim 5, characterized in that: The number of cameras is the same as the alignment mark, and their positions correspond one-to-one.
8. A method for alignment suitable for multiple exposures of flexible substrates, characterized in that, The method is used for vacuum contact roll-to-roll exposure of flexible substrates, and includes the following steps: S1: Transport the film material onto the vacuum stage, and adjust the photomask to a position close to the film material at a fixed distance. This position ensures that the photomask does not contact the film material, and that the photomask and the alignment mark on the film material after one exposure are in the same monitoring field of view of the camera. S2: Extend the Z-axis module of the adjustment mechanism and grasp the membrane material through the membrane material gripper connected thereon; S3: The system analyzes the relative distance between the alignment marks of the photomask and the film material in the same frame of the camera. Taking the center of the alignment marks of the four photomasks as the 0 point as the coordinate axis, the coordinates of the alignment marks on the film material deviating from the center of the alignment marks of the photomask are (X1, Y1), (X2, Y2), (X3, Y3), (X4, Y4), respectively. The system analyzes the relative position difference of the four sets of alignment marks. If the relative position difference is within the set allowable range, then proceed to step S5. If the relative position difference is not within the set allowable range, proceed to step S4; S4: Calculate the distance and direction of the adjustment mechanism's movement, move the adjustment mechanism carrying the membrane material to adjust, and then return to step S3; S5: After adjustment, the membrane material is held in place by the vacuum stage; at this time, the four alignment marks of the membrane material are the same in distance and position relative to the alignment marks of the photomask, that is, the coordinates of the alignment marks of the membrane material are X1=X2=X3=X4=X', Y1=Y2=Y3=Y4=Y'; S6: Then the photomask will be aligned with the film material a second time. The photomask will be moved to the exposure position so that the relative offset coordinates between the photomask and the alignment mark on the film material are (0,0). After the vacuum stage is evacuated to the set vacuum value, the exposure will be performed. S7: After exposure is complete, the film gripper releases the film and the adjustment mechanism returns to the set origin; The X-axis, Y-axis, and Z-axis modules of the three-axis moving module are connected in any sequential combination, fixing the membrane gripper to the last connected module. Three corners use active moving adjustment mechanisms, while the other corner uses a fixed adjustment mechanism. The fixed adjustment mechanism contains only one Z-axis motor or cylinder module. During adjustment, the alignment deviation value at the fixed adjustment mechanism is set as the target adjustment value for the other three corners. The alignment deviation value at the fixed adjustment mechanism is X. M Y N The alignment deviation values of the other three movable adjustment mechanisms with X and Y adjustment functions are based on the alignment deviation value X of the fixed adjustment mechanism. M Y N Adjustments were made, and the alignment deviation values of the remaining three were all adjusted to X. M Y N .
9. The alignment method for multiple exposures of flexible substrates according to claim 8, characterized in that: In step S4, the direction and distance of movement of the adjustment mechanism are calculated as follows: X-direction adjustment target point = (X1 + X3 + X2 + X4) / 4; Adjust the target point in the Y direction = (Y1 + Y2 + Y3 + Y4) / 4; X1 axis motor running distance and direction = X direction adjustment target point - X1; Y1 axis motor running distance and direction = Y direction adjustment target point - Y1; X2 axis motor running distance and direction = X direction adjustment target point - X2; Y2 axis motor running distance and direction = Y direction adjustment target point - Y2; X3 axis motor running distance and direction = X direction adjustment target point - X3; Y3 axis motor running distance and direction = Y direction adjustment target point - Y3; X4 axis motor running distance and direction = X direction adjustment target point - X4; Y4 axis motor running distance and direction = Y direction adjustment target point - Y4.
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