Gas bath device and photolithography machine

Abstract

The present invention provides an air bath device and a photolithography machine. A diverter plate is provided within the body of the air bath device, corresponding to an air inlet and extending away from the air inlet. This allows airflow entering from the air inlet to be redistributed through an airflow channel, evenly discharging from an air outlet. The diverter plate is bent away from the air inlet, thereby adjusting the diameter and direction of the airflow, effectively preventing vortices from forming within the airflow channel. Furthermore, a guide plate is provided to extend the airflow channel, further preventing the formation of vortices.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a gas bath device and a photolithography machine. Background Art

[0002] Temperature control technology is the focus of environmental control technology applied to ultra-precision equipment. For temperature-sensitive areas, constant temperature coolant or constant temperature air spray (air bath) is usually used to achieve high-precision control of temperature and other environmental parameters in the area to avoid the influence of temperature and other parameter fluctuations caused by the external environment or other parts of the equipment itself.

[0003] A photolithography machine is a high-precision device, and the cleanliness of its internal environment and the temperature of its components significantly impact lithography accuracy. Currently, an air bath is one of the primary methods for controlling contamination and temperature. Specifically, an air bath delivers a constant-temperature and constant-pressure airflow to key areas and components, such as the workpiece stage, mask stage, and wafer transfer system, to control the particle size and temperature of the space and components. However, existing air baths can cause vortices and uneven airflow. Summary of the Invention

[0004] The object of the present invention is to provide an air bath device and a photolithography machine to solve the problems of vortex and uneven air discharge in the mirror air bath device and the photolithography machine in the prior art.

[0005] In order to solve the above problems, the present invention provides an air bath device, which includes:

[0006] A main body, wherein the main body has an air bath cavity, and the main body also has at least one air inlet and at least one air outlet, wherein the air outlet is arranged at the bottom of the main body, and the air inlet and the air outlet are connected to the air bath cavity;

[0007] At least one diverter plate is disposed in the air bath chamber, wherein at least one diverter plate is disposed corresponding to one of the air inlets, and the diverter plate is bent at an end away from the air inlet and extends in a direction away from the air inlet to divert the airflow flowing in from the air inlet into at least two airflow channels, and the airflow flows out of the air outlet after being diverted by the airflow channels;

[0008] At least one guide plate is located above the air outlet and fixedly connected to the end of the diverter plate away from the air inlet, and extends in a direction away from the air inlet to extend the air flow channel.

[0009] Optionally, the shape of the bend of the diverter plate is non-right-angled.

[0010] Optionally, the shape of the bending portion of the diverter plate is an arc, wherein the central angle corresponding to the arc line of the arc is 30° to 90°.

[0011] Optionally, the diverter plate includes a first baffle and a bent plate connected in sequence, the first baffle is arranged close to the air inlet, and the bent plate is fixedly connected to the end of the first baffle away from the air inlet.

[0012] Optionally, the guide plate includes a second partition, which is fixedly connected to an end of the bending plate away from the air inlet and extends in a direction away from the air inlet, and the length of the second partition is greater than the length of the first partition.

[0013] Optionally, the guide plate further includes at least one third partition plate, and the third partition plate is arranged in the extension direction of the second partition plate and is spaced apart from the second partition plate.

[0014] Optionally, the spacing distance between the third partition and the second partition is greater than the length of the second partition.

[0015] Optionally, there are at least two third partitions, and at least two of the third partitions are arranged at intervals.

[0016] Optionally, the spacing distance between adjacent third partitions is equal to the spacing distance between the third partition and the second partition.

[0017] Optionally, there are at least two diverter plates and at least two guide plates respectively, at least two of the diverter plates are spaced apart in sequence, and at least two of the guide plates are spaced apart in sequence.

[0018] Optionally, the spacing distance between two adjacent guide plates is equal, and the spacing distance between two adjacent diverter plates is equal.

[0019] Optionally, the main body includes a bottom plate, side walls formed on the bottom plate, and a top plate covering the side walls, the bottom plate, the side walls, and the top plate surround the air bath cavity, the air inlet is formed on the side walls, the air outlet is formed on the bottom plate, and is at least located below the guide plate.

[0020] Optionally, the air outlet comprises a plurality of air outlets, the plurality of air outlets are arranged at intervals, and the intervals between adjacent air outlets are equal.

[0021] In order to solve the above problems, the present invention also provides a photolithography machine, comprising a gas bath device as described in any one of the above items.

[0022] The present invention provides an air bath device in which a diverter plate is provided within the body of the air bath device, corresponding to the air inlet and extending away from the air inlet. This allows the airflow entering from the air inlet to be redistributed through the airflow channel, allowing it to flow evenly out of the air outlet. The diverter plate is bent away from the air inlet to adjust the fluid diameter and direction of the airflow, effectively preventing the formation of vortices in the airflow passing through the airflow channel. Furthermore, the provision of a guide plate extends the airflow channel, further preventing the formation of vortices. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a structural diagram of an air bath device according to one embodiment of the present invention;

[0024] Figure 2 1 is a schematic structural diagram of a guide plate in an air bath device according to an embodiment of the present invention;

[0025] Figure 3 This is another structural schematic diagram of an air bath device according to one embodiment of the present invention;

[0026] The reference numerals are as follows:

[0027] 1-Ontology;

[0028] 11- bottom plate; 12- side wall;

[0029] 2- manifold;

[0030] 21-first partition; 22-bent plate;

[0031] 3- deflector;

[0032] 31- second partition; 32- third partition;

[0033] 4-intake pipe;

[0034] 100-air bath chamber; 101-air flow channel;

[0035] 201-air inlet; 202-air outlet. DETAILED DESCRIPTION

[0036] The gas bath device and photolithography machine proposed in the present invention are further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become clearer based on the following description. It should be noted that the drawings are all in a very simplified form and are not in precise proportions, and are only used to conveniently and clearly assist in illustrating the purpose of the embodiments of the present invention. In addition, the structures shown in the drawings are often part of the actual structure. In particular, different drawings may need to display different focuses and sometimes use different proportions.

[0037] Figure 11 is a schematic structural diagram of an air bath device according to an embodiment of the present invention. Figure 2 FIG. 1 is a schematic structural diagram of a diverter plate in an air bath device according to an embodiment of the present invention. Figure 1 and Figure 2 As shown, the air bath device of this embodiment includes: a body 1 and at least one diverter plate 2 and at least one guide plate 3 arranged in the body 1.

[0038] The main body 1 has an air bath cavity 100 therein, and the main body 1 also has at least one air inlet 201 and at least one air outlet 202 . The air outlet 202 is arranged at the bottom of the main body 1 . The air inlet 201 and the air outlet 202 are connected to the air bath cavity 100 .

[0039] In addition, the diverter plate 2 is arranged in the air bath chamber 100, wherein at least one of the diverter plates 2 is arranged corresponding to one of the air inlets 201, and the diverter plate 2 is bent away from the end of the air inlet 201 and extends in a direction away from the search air inlet 201 to divert the airflow flowing in from the air inlet 201 into at least two of the airflow channels 101, and the airflow flows out from the air outlet 202 after being diverted by the airflow channel 101.

[0040] The guide plate 3 is located above the air outlet 202 and is fixedly connected to the end of the diverter plate 2 away from the air inlet 201 , and extends in a direction away from the air inlet 201 to extend the air flow channel 101 .

[0041] In this embodiment, a diverter plate 2 is provided within the body 1 of the air bath device, corresponding to the air inlet 201 and extending away from the air inlet 201, so that the airflow entering from the air inlet 201 can be redistributed through the airflow channel 101 and evenly flows out from the air outlet 202. The diverter plate 2 is bent away from the air inlet 201 to adjust the flow diameter and direction of the airflow, effectively preventing the airflow flowing through the airflow channel 101 from generating vortices. At the same time, a guide plate 3 is provided to extend the airflow channel 101 and further prevent the generation of vortices.

[0042] Continue to participate Figure 1 As shown, in this embodiment, the body 1 includes: a bottom plate 11, side walls 12 formed on the bottom plate 11, and a top plate (not shown in the figure) covering the side walls 12. The bottom plate 11, the side walls 12, and the top plate enclose the air bath chamber 100. The bottom plate 11, the side walls 12, and the top plate are rectangular in shape, and there are four side walls 12. The four side walls 12, the bottom plate 11, and the top plate enclose the air bath chamber 100, which is a rectangular chamber.

[0043] Continue to participate Figure 1 As shown, the air bath device also includes an air inlet pipe 4 formed on the main body 1. The air inlet pipe 4 is fixed on the side wall 12 and is connected to the air inlet 201 formed on the side wall 12. The air outlet 202 is formed on the bottom plate 11, and the air outlet 202 is at least partially located below the guide plate 3, so that the air flow flows out from below the main body 1. Optionally, the air outlet 202 can be only partially located below the guide plate 3, and the bottom plate 11 can also be provided with the air outlet 202 on the entire surface. In addition, in this embodiment, the shape of the air inlet 201 is circular, rectangular or triangular, and there is one air outlet 202. The shape of the air outlet 202 is rectangular, and the air flow passing through all the air flow channels 101 flows out from one air outlet 202.

[0044] Of course, in other embodiments, there may be multiple air outlets 202, and the intervals between adjacent air outlets 202 are equal. The shape of the air outlet 202 may be circular, rectangular, triangular, etc.

[0045] Further, continue to participate Figure 1 As shown, in this embodiment, there are at least two diverter plates 2, which are spaced apart from each other. The spacing between two adjacent diverter plates 2 is equal. This ensures that the airflow rate and diameter within each airflow channel 101 are equal, further uniformizing the airflow within the entire air bath chamber 100.

[0046] Furthermore, at least one diverter plate 2 is provided for each air inlet 201. For example, in this embodiment, if two air inlets 201 are provided on the sidewall 12, three diverter plates 2 may be provided for the corresponding air inlets, thereby forming five air flow channels 101. One diverter plate 2 is provided for each air inlet 201, and the diverter plate 2 provided for each air inlet 201 is located in the middle of the air inlet 201. Another diverter plate 2 is located between two adjacent air inlets 201. In this way, the three diverter plates 2 and the sidewall 12 form four air flow channels 101.

[0047] Continue to participate Figure 1 and Figure 2As shown, the shape of the bend at the end of the diverter plate 2 of this embodiment is non-right-angled. The shape of the bend of the diverter plate 2 can be, for example, arc-shaped, wavy, or the bend has an angle, and the angle of the angle is not 90°. When the shape of the bend of the diverter plate 2 is smooth, the bend of the diverter plate 2 has a better effect of adjusting the fluid diameter and direction of the airflow, and avoids the generation of vortices. In addition, when the bend of the diverter plate 2 is arc-shaped, the effect of the diverter plate 2 on adjusting the fluid diameter and direction of the airflow is best. And, when the shape of the bend of the diverter plate 2 is arc-shaped, the angle of the central angle corresponding to the arc line of the arc is 30°~90°.

[0048] Furthermore, in this embodiment, the bending directions of the bent portions of all the diverter plates 2 are the same, so that the diameters of all the airflow channels corresponding to the bent portions of the guide plates do not differ significantly, thereby further improving the uniformity of the airflow.

[0049] In addition, the diameter corresponding to the arc line of the diverter plate 2 can be determined according to the position of the air inlet 201 corresponding to the diverter plate 2, and the position of the portion of the diverter plate 2 extending toward the air outlet 202. For example, in this embodiment, the point of the diverter plate 2 close to the air inlet 201 is determined as the first point, and a point at the 1 / 4 position along the direction perpendicular to the side wall 12 where the air inlet 201 is provided is determined as the second point. First, assuming that the diverter plate 2 is an arc-shaped diverter plate 2, the two points can determine the diameter and the center of the arc-shaped bent portion. Then, according to the actual situation, determine the arc length of the arc-shaped bent plate 22 and its corresponding center angle. Among them, the specific values of the arc length and center angle are not specifically limited here, and are subject to the actual situation.

[0050] Continue to participate Figure 1 and Figure 2 As shown, in this embodiment, the diverter plate 2 includes a first baffle 21 and a bent plate 22 connected in sequence. The first baffle 21 is arranged near the air inlet 201, and the bent plate 22 is fixedly connected to the end of the first baffle 21 away from the air inlet 201.

[0051] Further, continue to participate Figure 1 and Figure 2As shown, the deflector 3 includes a second baffle 31, which is fixedly connected to the end of the bent plate 22 away from the air inlet 201 and extends in a direction away from the air inlet 21. The length of the second baffle 31 is greater than the length of the first baffle 21. In this embodiment, the airflow flowing in from the air inlet 201 is diverted by the first baffle 21, adjusted by the bent plate 22, and then buffered by the second baffle 31 to eliminate the inertia of the airflow before flowing out of the air outlet 202, thereby further preventing the generation of vortices in the airflow.

[0052] Optionally, the diverter plate 2 further includes at least one third baffle 33, which is arranged in the extension direction of the second baffle 32 and is spaced apart from the second baffle 31. In this way, the airflow in the two adjacent airflow channels 101 can exchange energy through the spacing area, avoiding vortices caused by the guide plate being too long. The spacing distance between the third baffle 32 and the second baffle 31 is greater than the length of the second baffle 31. In addition, there are at least two third baffles 32, and at least two third baffles 32 are spaced apart. And the spacing distance between adjacent third baffles 32 is equal to the spacing distance between the third baffle 32 and the second baffle 31. In this way, the energy exchange of the airflow is more uniform, so as to avoid the generation of vortices in the airflow.

[0053] In addition, in this embodiment, there are at least two diverter plates 2, and the at least two diverter plates 2 are arranged in sequence and spaced apart.

[0054] Continue to participate Figure 1 As shown, the first partition plate 21 and the second partition plate 31 are not parallel to each other. Preferably, the first partition plate 21 and the second partition plate 23 are perpendicular to each other.

[0055] However, in other embodiments, the first partition plate 21 and the second partition plate 31 are parallel to each other. For example, Figure 3 This is a schematic structural diagram of an air bath device according to an embodiment of the present invention. Figure 3 In the structure shown, the first partition plate 21 and the second partition plate 31 are arranged parallel to each other.

[0056] also, Figure 3 In the illustrated structure, there is one air inlet 201 and two diverter plates 2. The two diverter plates 2 divide the airflow flowing in from one air inlet 201 into three parts, forming three airflow channels 101 enclosed by the diverter plates 2 and the sidewalls 12. The structure and design principle of the diverter plates 2 are not described in detail here.

[0057] Furthermore, this embodiment also provides a photolithography machine, comprising any one of the gas bath devices described above.

[0058] The above description is only a description of the preferred embodiments of the present invention and does not limit the scope of the present invention. Any changes and modifications made by ordinary technicians in the field of the present invention based on the above disclosure shall fall within the scope of protection of the claims.

Claims

1. An air bath device, characterized in that: The air bath device comprises: A main body, wherein the main body has an air bath cavity, and the main body also has at least one air inlet and at least one air outlet, wherein the air outlet is arranged at the bottom of the main body, and the air inlet and the air outlet are connected to the air bath cavity; At least one diverter plate is disposed in the air bath chamber, wherein at least one diverter plate is disposed corresponding to one of the air inlets, and the diverter plate is bent at an end away from the air inlet and extends in a direction away from the air inlet to divert the airflow flowing in from the air inlet into at least two airflow channels, and the airflow flows out of the air outlet after being diverted by the airflow channels; At least one guide plate is located above the air outlet and fixedly connected to the end of the diverter plate away from the air inlet, and extends in a direction away from the air inlet to extend the air flow channel.

2. The air bath device according to claim 1, wherein The shape of the bend of the diverter plate is non-right angle.

3. The air bath device according to claim 2, characterized in that The shape of the bending part of the diverter plate is an arc, wherein the central angle corresponding to the arc line of the arc is 30° to 90°.

4. The air bath device according to claim 1, wherein The diverter plate includes a first baffle and a bent plate connected in sequence. The first baffle is arranged close to the air inlet, and the bent plate is fixedly connected to the end of the first baffle away from the air inlet.

5. The air bath device according to claim 4, characterized in that The guide plate includes a second baffle, which is fixedly connected to an end of the bending plate away from the air inlet and extends in a direction away from the air inlet. The length of the second baffle is greater than that of the first baffle.

6. The air bath device according to claim 5, characterized in that The guide plate further includes at least one third partition plate, which is arranged in the extension direction of the second partition plate and spaced apart from the second partition plate.

7. The air bath device according to claim 6, characterized in that The spacing distance between the third partition plate and the second partition plate is greater than the length of the second partition plate.

8. The air bath device according to claim 6, wherein: There are at least two third partitions, and at least two third partitions are arranged at intervals.

9. The air bath device according to claim 8, characterized in that The spacing distance between adjacent third partitions is equal to the spacing distance between the third partition and the second partition.

10. The air bath device according to claim 1, wherein There are at least two diverter plates and at least two guide plates respectively, at least two of the diverter plates are arranged in sequence and at intervals, and at least two of the guide plates are arranged in sequence and at intervals.

11. The air bath device according to claim 10, wherein: The spacing between two adjacent guide plates is equal, and the spacing between two adjacent splitter plates is equal.

12. The air bath device according to claim 1, wherein The main body includes a bottom plate, side walls formed on the bottom plate, and a top plate covering the side walls. The bottom plate, the side walls, and the top plate surround the air bath cavity. The air inlet is formed on the side walls, and the air outlet is formed on the bottom plate and is at least located below the guide plate.

13. The air bath device according to claim 1, wherein The air outlets include a plurality of air outlets, the plurality of air outlets are arranged at intervals, and the intervals between adjacent air outlets are equal.

14. A photolithography machine, characterized in that: The invention comprises the gas bath device according to any one of claims 1 to 13.

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