A continuous electroplating production line

Abstract

This invention provides a continuous electroplating production line, belonging to the field of coating technology, comprising: an electroplating system, a washing system, and a drying system. The inlet and outlet of the washing system and the drying system are respectively equipped with upper and lower cooperating drive roller groups, each connected to a controllable drive motor. A base film sequentially passes through the electroplating system, the washing system, and the drying system. The tension of the base film in both the washing system and the drying system is adjusted by the controllable drive motors. In this continuous electroplating production line, drive roller groups are provided at the inlet and outlet of the washing system and the drying system. By controlling these drive roller groups separately, the tension of the base film in the washing system and the drying system can be adaptively adjusted according to process requirements, thereby achieving better results during washing and drying.

Description

Technical Field

[0001] This invention relates to the field of coating technology, and more specifically to a continuous electroplating production line. Background Technology

[0002] Electroplating is the process of depositing a thin layer of another metal or alloy onto the surface of certain metals using the principle of electrolysis.

[0003] In a continuous electroplating production line, the tension of the product to be plated is generally kept the same in different process areas of the production line.

[0004] However, in continuous electroplating, if the product to be coated is kept under different tensions in different process areas according to different product needs, the coating effect of the product to be coated can be improved. Summary of the Invention

[0005] Therefore, in order to overcome the defect of the same tension in different process areas of the existing continuous electroplating production line, the present invention provides a continuous electroplating production line.

[0006] To solve the above-mentioned technical problems, the present invention provides a continuous electroplating production line, comprising: an electroplating system, a washing system, and a drying system. The electroplating system has two sets of steel belts arranged in parallel for conveying electroplating clamps, which connect the two sides of the base film to the electroplating clamps for horizontal conveying. The inlet and outlet of the washing system and the drying system are respectively provided with upper and lower cooperating drive roller groups, and each drive roller group is connected to a controllable drive motor.

[0007] The base film passes sequentially through the electroplating system, the washing system, and the drying system. The tension of the base film in the washing system and the drying system is adjusted by the controllable drive motor.

[0008] Optionally, in the electroplating system, the distance between the inlet ends of the two sets of steel strips arranged in parallel is smaller than the distance between the outlet ends, and the distance between the inlet ends and / or outlet ends of the two sets of steel strips is adjustable.

[0009] Optionally, the outlet of the electroplating system and / or the water washing system is provided with a water removal structure, the water removal structure including: a pressure roller and a support roller arranged in parallel, the base film passing between the pressure roller and the support roller to remove residual liquid;

[0010] The support roller is a stainless steel roller with a chrome-plated surface, and the pressure roller has an elastic surface.

[0011] Optionally, the base film is pre-plated before entering the electroplating system.

[0012] Optionally, the electroplating system has pre-plating anodes on both sides of the inlet, which are used to electroplat the two sides of the base film in the width direction.

[0013] Optionally, the electroplating system includes an electroplating tank and an electroplating anode box disposed within the electroplating tank, wherein multiple electroplating anode boxes are arranged sequentially along the conveying direction of the base film.

[0014] Optionally, the electroplating anode box has several small anode plates arranged horizontally in sequence, and each of the small anode plates is connected to a power source.

[0015] Optionally, two adjacent small anode plates are separated by an insulating plate, and the angle between the insulating plate and the conveying direction of the base film is set to between 10° and 80°.

[0016] Optionally, the bottom of the electroplating tank has a chemical inlet, and the chemical inlet is covered with a buffer cover, with openings on both sides of the buffer cover facing the base film in the lateral direction.

[0017] Optionally, a pressure plate is provided above the front end of the electroplating anode box, the pressure plate has a liquid containing cavity, and the lower surface of the pressure plate has a plurality of liquid outlet holes.

[0018] Optionally, the drying system includes an air knife, which has an upper cavity and a lower cavity inside. The upper cavity and the lower cavity are connected by a bent channel. The upper cavity is connected to an air source, and the lower cavity is provided with an air outlet.

[0019] Optionally, a film-pulling mechanism is provided on both sides of the base film. The film-pulling mechanism includes an upper clamping roller and a lower clamping roller that cooperate with each other. The base film passes between the upper clamping roller and the lower clamping roller, and the upper clamping roller and the lower clamping roller are inclined towards the material feeding direction of the base film.

[0020] Optionally, it also includes a winding device, wherein at least one set of film stretching mechanisms is provided before the winding device.

[0021] The technical solution of this invention has the following advantages:

[0022] 1. The continuous electroplating production line provided by the present invention uses horizontal conveying of the base film in the electroplating system. Drive roller groups are respectively provided at the inlet and outlet of the washing system and the drying system. By controlling the drive roller groups separately, the tension of the base film in the washing system and the drying system can be adaptively adjusted according to the process requirements of the base film, so that the base film can achieve better results when washing and drying.

[0023] 2. The continuous electroplating production line provided by the present invention sets the distance between the outlet ends of two sets of parallel steel strips to be greater than the distance between their inlet ends in the electroplating system. This setting stretches the conveyed base film, ensuring its tension. The tension of the base film can be adjusted by changing the ratio of the distance between the inlet and outlet ends of the two sets of parallel steel strips. This allows for adaptive adjustments based on the different process requirements of different base films to meet varying tension needs and achieve better electroplating results.

[0024] 3. The continuous electroplating production line provided by the present invention has a water removal structure to solve the problem of residual liquid on the base film. The support roller of the water removal structure is made of stainless steel roller with chrome plating. The chrome plating increases the hardness and eliminates the dark lines on the stainless steel surface, thus avoiding the problem of wrinkles when the base film passes through the support roller. The pressure roller of the water removal structure has an elastic surface. Through the cooperation between the pressure roller and the support roller, the surface of the base film passing through is squeezed, thereby eliminating the residual liquid on the base film.

[0025] 4. The continuous electroplating production line provided by the present invention has a film stretching mechanism on both sides of the base film. When the base film passes through the film stretching mechanism, it can be flattened towards both sides, thereby avoiding the problem of the base film sagging in the middle due to gravity. Attached Figure Description

[0026] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0027] Figure 1 A flowchart illustrating one embodiment of the continuous electroplating production line provided in the embodiments of the present invention;

[0028] Figure 2 This is a schematic diagram of the water removal structure;

[0029] Figure 3 for Figure 2 Side sectional view;

[0030] Figure 4 This is a schematic diagram of the pre-plated anode;

[0031] Figure 5 This is a schematic diagram of the internal structure of an electroplating tank;

[0032] Figure 6 Bit Figure 5 Schematic diagram of the electroplating anode box;

[0033] Figure 7 This is a schematic diagram of the bottom of the electroplating tank;

[0034] Figure 8 for Figure 7 Side sectional view;

[0035] Figure 9 This is a schematic diagram of the air knife inside the drying system;

[0036] Figure 10 for Figure 9 Side sectional view;

[0037] Figure 11 This is a schematic diagram of a membrane stretching mechanism.

[0038] Explanation of reference numerals in the attached figures:

[0039] 1. Pressure roller; 2. Support roller; 3. Pre-plated anode; 4. Electroplating tank; 5. Electroplating anode box; 6. Small anode plate; 7. Insulating plate; 8. Pressure plate; 9. Buffer cover; 10. Chemical inlet; 11. Air knife; 12. Air inlet; 13. Upper cavity; 14. Lower cavity; 15. Bending channel; 16. Air outlet; 17. Upper clamping roller; 18. Lower clamping roller. Detailed Implementation

[0040] The technical solution of the present invention will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0041] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0042] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0043] Furthermore, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0044] like Figure 1 As shown in the figure, this embodiment provides a specific implementation of a continuous electroplating production line, including: an electroplating system, a washing system, and a drying system. The electroplating system has two sets of steel belts arranged in parallel for conveying electroplating clamps. The electroplating clamps connect to both sides of the base film to horizontally convey the base film. The inlet and outlet of the washing system and the drying system are respectively provided with upper and lower cooperating drive roller groups. Each drive roller group is connected to a controllable drive motor. The base film passes through the electroplating system, the washing system, and the drying system in sequence. The tension of the base film in the washing system and the drying system is adjusted by the controllable drive motors.

[0045] The continuous electroplating production line provided in this embodiment uses horizontal conveying of the base film in the electroplating system. Drive roller groups are respectively provided at the inlet and outlet of the washing system and the drying system. By controlling the drive roller groups separately, the tension of the base film in the washing system and the drying system can be adaptively adjusted according to the process requirements, so that the base film can achieve better results when washing and drying.

[0046] Specifically, such as Figure 1 As shown, the continuous electroplating production line provided in this embodiment includes, from start to finish, an unwinding system, a copper plating system, a washing system, an anti-oxidation system, a drying system, a slitting system, and a rewinding system. The copper plating system is a subsystem of the electroplating system; it could also be a silver plating system, etc. The anti-oxidation system and the slitting system can be removed or replaced according to different practical requirements. Furthermore, in the continuous electroplating production line provided in this embodiment, the base film undergoes comprehensive pre-plating before entering the electroplating system. Comprehensive pre-plating facilitates improvements to subsequent processes, reduces reaction time, and increases production efficiency. The comprehensive pre-plating can be performed using magnetron sputtering or vapor deposition, etc.

[0047] Furthermore, in the continuous electroplating production line provided in this embodiment, the distance between the inlet ends of the two sets of steel strips arranged side-by-side in the electroplating system is smaller than the distance between their outlet ends, and the distance between the inlet ends and / or outlet ends of the two sets of steel strips is adjustable. This arrangement stretches the conveyed base film, ensuring its tension. Then, by adjusting the ratio of the distance between the inlet and outlet ends of the two sets of parallel steel strips, the tension of the base film can be adjusted. This allows for adaptive adjustments based on the different process requirements of different base films to meet varying tension needs, resulting in better electroplating effects on the base film.

[0048] like Figure 2 , Figure 3 As shown in this embodiment, the continuous electroplating production line provides a horizontally conveyed base film. To address the issue of residual liquid on the base film during horizontal conveying, dewatering structures are provided at the outlets of the electroplating system, the washing system, and the anti-oxidation system. The dewatering structure includes a pressure roller 1 and a support roller 2 arranged parallel to each other. The base film passes between the pressure roller 1 and the support roller 2 to remove residual liquid. The support roller 2 is a stainless steel roller, and its surface is chrome-plated. Chrome plating increases hardness and eliminates dark lines on the stainless steel surface, preventing wrinkles in the base film as it passes over the support roller 2. The surface of the pressure roller 1 is elastic; specifically, a rubber sleeve can be fitted over the pressure roller 1. During operation, the cooperation between the pressure roller 1 and the support roller 2 compresses the surface of the passing base film, thereby eliminating residual liquid. Alternatively, as an alternative implementation, the above-mentioned dewatering structure can be provided only in one of the electroplating system or the washing system.

[0049] like Figure 4 As shown in the continuous electroplating production line provided in this embodiment, the electroplating system has pre-plating anodes 3 on both sides of the inlet. The pre-plating anodes 3 are used to electroplat the two sides of the base film in the width direction. By setting the pre-plating anodes 3, the two sides of the base film can be plated first, so that when the electroplating clamp is connected to the two sides of the base film, it can conduct electricity better.

[0050] like Figure 5 As shown in this embodiment, the continuous electroplating production line includes an electroplating tank 4 and an electroplating anode box 5 disposed within the electroplating tank 4. Multiple electroplating anode boxes 5 are sequentially arranged along the conveying direction of the base film to meet the electroplating time requirements of the base film. A pressure plate 8 is provided above the front end of each electroplating anode box 5. The pressure plate 8 has a liquid-containing cavity, and its lower surface has several liquid outlet holes. During operation, the liquid-containing cavity of the pressure plate 8 is connected to a liquid source, and liquid is continuously sprayed downwards through the liquid outlet holes on the lower surface of the pressure plate 8. This counteracts the upward arching force of the base film, allowing the base film to smoothly enter the electroplating anode box 5 and preventing the upper surface of the base film from contacting and scratching the upper surface inside the electroplating anode box 5.

[0051] like Figure 6 As shown in the continuous electroplating production line provided in this embodiment, the electroplating anode box 5 has several small anode plates 6 arranged horizontally in sequence. Each small anode plate 6 is connected to a power source. By using multiple small anode plates 6, the problem of uneven current distribution caused by using a single anode plate can be reduced. Adjacent small anode plates 6 are separated by an insulating plate 7. The angle between the insulating plate 7 and the conveying direction of the base film is set between 10° and 80°. By setting this angle, the problem of electroplating blank areas appearing between adjacent small anode plates 6 can be avoided.

[0052] like Figure 7 , Figure 8 As shown in the continuous electroplating production line provided in this embodiment, the bottom of the electroplating tank 4 has a chemical inlet 10, and the chemical inlet 10 is covered with a buffer cover 9. The buffer cover 9 has openings on both sides facing the base film in the transverse direction. This arrangement can prevent the replenished chemical solution from directly impacting the bottom surface of the base film, thus avoiding the problem of the base film arching downwards.

[0053] like Figure 9 , Figure 10 As shown in the continuous electroplating production line provided in this embodiment, the drying system includes an air knife 11. The air knife 11 has an upper cavity 13 and a lower cavity 14, which are connected by a bent channel 15. The upper cavity 13 has an air inlet 12 for connecting to an air source, and the lower cavity 14 has an air outlet 16. During operation, the drying gas from the air source first enters the upper cavity 13, then passes through the bent channel 15 before entering the lower cavity 14. The bent channel 15 stabilizes the pressure of the incoming drying gas, making the gas blown out from the air outlet 16 more stable, thereby improving the drying effect on the base film.

[0054] like Figure 11 As shown, the continuous electroplating production line provided in this embodiment has a film stretching mechanism installed before the winding device. The film stretching mechanism is located on both sides of the base film and includes an upper clamping roller 17 and a lower clamping roller 18 that cooperate with each other. The base film passes between the upper clamping roller 17 and the lower clamping roller 18, which are inclined towards the incoming direction of the base film. This inclined arrangement allows the two sides of the base film to be stretched to both sides by the film stretching mechanism when it passes through, thus avoiding wrinkles in the base film during winding.

[0055] Working principle

[0056] like Figure 1As shown, in the continuous electroplating production line provided in this embodiment, the base film to be electroplated is first pre-plated by magnetron sputtering, and then horizontally laid out into the electroplating system by an unwinding device. Pre-plating anodes 3 are provided on both sides of the front end of the electroplating system to pre-plat the two sides of the base film, thereby improving the conductivity at the electroplating clamp position. After horizontal electroplating in the electroplating system, the base film is conveyed out of the electroplating system. A dewatering structure is provided at the rear end of the electroplating system to remove the electroplating solution remaining on the base film. The base film is then conveyed to a washing system for washing. A dewatering structure is also provided at the rear end of the washing system. After dewatering, the base film enters an anti-oxidation system, and after further dewatering, it enters a drying system. In the drying system, it is dried by the combined action of infrared radiation and an air knife 11. Then it enters a slitting system, is flattened by a film stretching mechanism, and is then wound up by a winding system.

[0057] Obviously, the above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the scope of protection of this invention.

Claims

1. A continuous electroplating production line, characterized in that, The application relates to an electroplating system, a water washing system and a drying system. The base film is sequentially sent through the electroplating system, the water washing system and the drying system, and the tension of the base film in the water washing system and the drying system is adjusted by the controllable driving motor. The electroplating system comprises an electroplating tank (4) and an electroplating anode box (5) arranged in the electroplating tank (4), and a plurality of electroplating anode boxes (5) are sequentially arranged along the conveying direction of the base film. The front end of the electroplating anode box (5) is provided with a pressing plate (8) above the front end, the pressing plate (8) has a liquid containing cavity, and the lower surface of the pressing plate (8) has a plurality of liquid outlet holes. The base film is provided with a film pulling mechanism on the two sides, the film pulling mechanism comprises mutually matched upper clamping rollers (17) and lower clamping rollers (18), the base film passes between the upper clamping rollers (17) and the lower clamping rollers (18), and the upper clamping rollers (17) and the lower clamping rollers (18) are arranged to be inclined towards the incoming direction of the base film. The inlet end spacing of the two groups of steel belts arranged in parallel in the electroplating system is smaller than the outlet end spacing, and the inlet end and / or outlet end spacing of the two groups of steel belts is adjustable. The outlet of the electroplating system and / or the water washing system is provided with a water removing structure, the water removing structure comprises upper and lower parallel pressing rollers (1) and supporting rollers (2), and the base film removes residual liquid between the pressing rollers (1) and the supporting rollers (2).

2. The continuous electroplating line of claim 1, wherein, The supporting roller (2) is a stainless steel roller, the surface of the supporting roller (2) is chrome-plated, and the surface of the pressing roller (1) is elastic.

3. The continuous electroplating line of claim 1, wherein, The base film is fully pre-plated before entering the electroplating system. The electroplating anode box (5) has a plurality of small anode plates (6) arranged in the transverse direction, each small anode plate (6) is in communication with a power supply.

4. The continuous electroplating line of claim 1, wherein, The adjacent two small anode plates (6) are separated by an insulating plate (7), and the included angle between the insulating plate (7) and the conveying direction of the base film is 10-80 degrees.

5. The continuous electroplating line of claim 1, wherein, The bottom of the electroplating tank (4) is provided with a liquid inlet (10), the liquid inlet (10) is covered with a buffer cover (9), and the two sides of the buffer cover (9) towards the transverse direction of the base film are respectively provided with openings.

6. The continuous electroplating line of claim 5, wherein, The drying system is provided with an air knife (11), the air knife (11) has an upper cavity (13) and a lower cavity (14) in the inside, the upper cavity (13) and the lower cavity (14) are communicated through a bending channel (15), the upper cavity (13) is communicated with a gas source, and the lower cavity (14) is provided with a blowing port (16).

7. The continuous electroplating line of claim 1, wherein, The application further relates to a winding device, and the film pulling mechanism is arranged before the winding device.

8. The continuous electroplating line according to any one of claims 1-7, characterized in that, ​ 9. The continuous electroplating line of claim 1, wherein, ​ ​

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