Compound, antireflection film including the same, and display device

Abstract

Provided are a compound represented by Chemical Formula 1, an antireflection film including the same, and a display device including the antireflection film.

Description

Technical Field

[0001] This disclosure relates to a compound, an antireflective film including the same, and a display device including the antireflective film. Background Technology

[0002] In a typical liquid crystal display (LCD), light emitted from a white light source passes through the RGB color filter of each pixel to form sub-pixels of each color, and colors within the RGB range can be produced by combining these sub-pixels.

[0003] In recent years, new types of displays have been developed that use light-emitting materials such as quantum dots and organic-inorganic phosphors that emit color for each sub-pixel. Methods using ultraviolet (UV) light sources and blue light sources have been proposed as ways to excite these blue, green, and red light sources.

[0004] When using a UV light source, each color is generated and implemented by blue, green, and red light emitters. However, when using a blue light source, green and red are colors generated by individual light emitters, while blue pixels transmit the light source as is.

[0005] In the recent commercialization or development of display materials including quantum dots, light emission from green and red quantum dots using blue or white light sources is employed. Quantum dot-based display devices aim to improve color reproduction and brightness through the use of quantum dot materials, and panels utilizing various types of light sources to emit light from quantum dots are continuously being developed. Furthermore, viewing angles can be improved depending on the position of the quantum dot materials in the panel configuration. To improve the luminous efficiency of quantum dots, next-generation quantum dot display devices are being developed by increasing the intensity of the light source or by developing light sources with extended blue regions.

[0006] In quantum dot display devices, the spectrum of the light source reaching the quantum dot material has a very close influence on the efficiency of the quantum dots. Since the characteristics of each light source differ depending on the type of light source, efforts continue across various fields to introduce new methods to improve the efficiency of each type of light source.

[0007] On the other hand, in the case of new displays using light emitters, it is necessary to reduce the reflectivity of external light or adjust the panel color caused by scattered reflection. To solve this problem, attempts have been made to use dyes in the optical components that make up the panel. When quantum dots are used as light emitters, it is difficult to reduce the reflectivity of external light or adjust the panel color.

[0008] Therefore, in the case of new displays, anti-reflective films are being introduced to improve brightness loss or color correction, and recently, attempts have been made to use cyanide or azo dyes as dyes that can absorb light of specific wavelengths in order to maximize the low reflectivity of the anti-reflective film.

[0009] However, while cyanide or azo dyes can absorb light in the short wavelength region, they have the problem of reducing lightfastness and reliability, making them difficult to apply to antireflective films. Summary of the Invention

[0010] Technical issues

[0011] The embodiment provides a compound capable of absorbing light in the blue long-wavelength region and the green short-wavelength region of a light source.

[0012] Another embodiment provides an antireflective film comprising the compound.

[0013] Another embodiment provides a display device including the anti-reflective film.

[0014] Problem-solving methods

[0015] Examples provide compounds represented by chemical formula 1.

[0016] [Chemical Formula 1]

[0017]

[0018] In chemical formula 1,

[0019] R 1 R 3 R 4 and R 6 Each is independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group.

[0020] R 2 and R 5 Each can be independently a hydrogen atom or a cyano group, provided that R 2 and R 5 At least one of them is cyano.

[0021] X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group, and

[0022] L is a divalent ligand.

[0023] R 2 and R 5 Each can be an independent cyano group.

[0024] L can be a catechol ligand, a 2,3-naphthol ligand, or a 1,1'-bi-2-naphthol ligand.

[0025] Chemical formula 1 can be represented by chemical formula A or chemical formula B:

[0026] [Chemical Formula A]

[0027]

[0028] [Chemical Formula B]

[0029]

[0030] In chemical formulas A and B

[0031] R 1 R 3 R 4 and R 6 Each is independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group.

[0032] R 2 and R 5 Each can be independently a hydrogen atom or a cyano group, provided that R 2 and R 5 At least one of them is cyano.

[0033] X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group, and

[0034] C1 and C2 are each independently substituted or unsubstituted aromatic rings.

[0035] X may be a substituted or unsubstituted C1 to C20 alkoxy group, an unsubstituted or substituted C1 to C20 alkyl group, a halogen-substituted C1 to C10 alkyl group, a C1 to C10 alkyl group substituted with a C1 to C5 alkyl group, an unsubstituted C1 to C10 alkoxy group, or a combination thereof, or an unsubstituted or substituted C6 to C20 aryl group.

[0036] X can be an unsubstituted C1 to C20 alkoxy group, an unsubstituted C1 to C20 alkyl group, an unsubstituted C6 to C20 aryl group, a C6 to C20 aryl group substituted with an unsubstituted C1 to C10 alkyl group, a C6 to C20 aryl group substituted with a halogen atom, a C6 to C20 aryl group substituted with a halogen atom, or a C6 to C20 aryl group substituted with an unsubstituted C1 to C10 alkoxy group.

[0037] C1 and C2 can each be independently a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring.

[0038] C1 and C2 can each be an unsubstituted benzene ring or a benzene ring substituted with "halogen atom, cyano group, C1 to C10 alkyl group, *-C(=O)R' (R' is C1 to C10 alkyl group) or a combination thereof", or an unsubstituted naphthalene ring or a naphthalene ring substituted with "halogen atom, cyano group, C1 to C10 alkyl group, *-C(=O)R' (R' is C1 to C10 alkyl group) or a combination thereof".

[0039] The compound may be represented by one of the chemical formulas 1-1-1 to 1-1-8.

[0040] [Chemical Formula 1-1-1]

[0041]

[0042] [Chemical Formula 1-1-2]

[0043]

[0044] [Chemical Formula 1-1-3]

[0045]

[0046] [Chemical Formula 1-1-4]

[0047]

[0048] [Chemical Formula 1-1-5]

[0049]

[0050] [Chemical Formula 1-1-6]

[0051]

[0052] [Chemical Formula 1-1-7]

[0053]

[0054] [Chemical Formula 1-1-8]

[0055]

[0056] The compound represented by chemical formula 1 can exhibit an absorption wavelength in the range of 400 nm to 530 nm, and can have a maximum absorption wavelength in the range of 490 nm to 520 nm of the absorption wavelength.

[0057] The compound may be a dye.

[0058] Another embodiment provides an antireflective film comprising the compound represented by chemical formula 1.

[0059] The antireflective film includes an adhesive layer and an antireflective layer located on the adhesive layer, and the compound represented by chemical formula 1 may be contained in the adhesive layer.

[0060] The antireflective film includes an adhesive layer, a dye-containing layer, and an antireflective layer located on the dye-containing layer, and the compound represented by chemical formula 1 may be included in the dye-containing layer.

[0061] Another embodiment provides a display device including the anti-reflective film.

[0062] The display device may also include a content sub-dot layer.

[0063] The display device may also include a light source, a color filter, and a substrate.

[0064] In the display device, the content dot layer may be disposed on the light source, the color filter may be disposed on the content dot layer, the substrate may be disposed on the color filter, and the anti-reflective film may be disposed on the substrate.

[0065] The light source can be a white light source or a blue light source.

[0066] The substrate may include a glass substrate.

[0067] Other embodiments of the invention are included in the following detailed description.

[0068] The effects of the invention

[0069] By using compounds that have absorption in the long blue wavelength region and the short green wavelength region, with a maximum absorption wavelength of 490 nm to 520 nm, and more specifically 500 nm to 510 nm, there is no fluorescence, and the lightfastness reliability can be improved by reducing the reflectivity of the display device to external light, and brightness loss and color reproduction can also be improved. Attached Figure Description

[0070] FIG. 1 and FIG. 2Each of these is a schematic diagram showing an antireflective film according to an embodiment.

[0071] FIG. 3 and FIG. 4 Each of these is a schematic diagram showing a display device according to an embodiment.

[0072] [Symbol Explanation]

[0073] 10: Blue light source

[0074] 20: Content Sub-point Layer

[0075] 30: Color Filter

[0076] 40:Substrate

[0077] 50: Adhesive layer

[0078] 60: Contains dye layer

[0079] 70: Anti-reflective layer

[0080] 80: Anti-reflective coating

[0081] 100: Display device Detailed Implementation

[0082] Embodiments of the invention are described in detail below. However, these embodiments are exemplary, and the invention is not limited thereto, and the scope of the claims defines the invention.

[0083] As used herein, unless otherwise specifically defined, “alkyl” refers to C1 to C20 alkyl, “alkenyl” refers to C2 to C20 alkenyl, “cycloalkenyl” refers to C3 to C20 cycloalkenyl, “heterocyclic alkenyl” refers to C3 to C20 heterocyclic alkenyl, “aryl” refers to C6 to C20 aryl, “arylalkyl” refers to C6 to C20 arylalkyl, “alkylene” refers to C1 to C20 alkylene, “arylene” refers to C6 to C20 arylene, “alkylarylene” refers to C6 to C20 alkylarylene, “heteroarylene” refers to C3 to C20 heteroarylene, and “alkoxy” refers to C1 to C20 alkoxy.

[0084] As used herein, unless otherwise specifically defined, “substituted” means that at least one hydrogen atom is replaced by one of the following substituents: halogen atom (F, Cl, Br, I), hydroxyl, C1 to C20 alkoxy, nitro, cyano, amino, imino, azide, amido, hydrazine, hydrazone, carbonyl, carbamoyl, thiol, ester, ether, carboxyl or a salt thereof, sulfonic acid or a salt thereof, phosphoric acid or a salt thereof, C1 to C20 alkyl, C2 to C20 alkenyl, C2 to C20 alkynyl, C6 to C20 aryl, C3 to C20 cycloalkyl, C3 to C20 cycloalkenyl, C3 to C20 cycloalkynyl, C2 to C20 heterocyclic alkyl, C2 to C20 heterocyclic alkenyl, C2 to C20 heterocyclic alkynyl, C3 to C20 heterocyclic aryl, or a combination thereof.

[0085] As used herein, unless otherwise specifically defined, “heterogeneous” means a chemical formula that includes at least one heteroatom of N, O, S and P.

[0086] As used herein, unless otherwise specifically defined, “meth)acrylate” means both “acrylate” and “methacrylate”, and “(meth)acrylic acid” means both “acrylic acid” and “methacrylic acid”.

[0087] As used in this article, unless otherwise defined, the term "combination" refers to a mixture or copolymer.

[0088] As used herein, unless otherwise specifically defined, hydrogen atom bonds are at the locations where they should be drawn when chemical bonds are not drawn.

[0089] When describing numerical ranges in this specification, "X to Y" means "greater than or equal to X and less than or equal to Y" (X ≤ and ≤ Y).

[0090] In descriptions that are not numerical ranges in this specification, “X to Y” means “from X to Y”.

[0091] In this specification, the "maximum absorption wavelength (λ)" of the compound (dye) is specified. max "" refers to the wavelength at which the maximum absorbance occurs when measuring the absorbance of a solution of the compound (dye) at a concentration of 10 parts per million (10 ppm) in cyclohexanone. The maximum absorbance can be measured using methods known to those skilled in the art.

[0092] The “lightfastness reliability” used in this article is evaluated by changes in light transmittance. The light transmittance of the display device was measured before and after irradiation at the maximum absorption wavelength of the dye under the conditions of a xenon test chamber (Q-SUN) [light source: xenon lamp, irradiation intensity: 0.35 W / cm², irradiation temperature: 63°C, irradiation time: 500 hours, and irradiation direction: irradiation from the antireflective film side].

[0093] Furthermore, as used herein, unless otherwise specifically defined, “*” means the part connected to the same or different atoms or chemical formulas.

[0094] According to an embodiment, a compound represented by chemical formula 1 is provided.

[0095] [Chemical Formula 1]

[0096]

[0097] In chemical formula 1,

[0098] R 1 R 3 R 4 and R 6 Each is independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group.

[0099] R 2 and R 5 Each can be independently a hydrogen atom or a cyano group, provided that R 2 and R 5 At least one of them is cyano.

[0100] X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group, and

[0101] L is a divalent ligand.

[0102] Traditionally, attempts have been made to improve the color purity of display devices by using specific compounds to absorb fluorescent colors and block specific wavelengths of light sources. However, display devices including quantum dots serve a different purpose due to the use of scatterers. Quantum dot display devices can reduce reflectivity to improve the reflection of external light caused by scatterers, which helps improve the visibility of blacks. Specifically, to reduce reflectivity and minimize the reduction in RGB color purity of the panel, it is effective to use an anti-reflective film that can absorb dyes that absorb mixed colors (violet / cyan / fluorescent / near-infrared ray (IR)). Specifically, absorbing external light with an absorption wavelength range of 480 nm to 520 nm for cyan and 530 nm to 670 nm for fluorescent colors is effective in reducing reflectivity. However, it is difficult to achieve neutral black in a display device when only dyes that absorb cyan and fluorescent colors are used. Therefore, it is necessary to use violet with an absorption wavelength range of 350 nm to 450 nm and near-infrared (red) with an absorption wavelength range of 605 nm to 790 nm. By using mixtures of absorbing dyes, it is possible to achieve color correction in antireflective films and display devices. That is, by using dyes capable of absorbing mixed colors (violet / cyan / fluorescent / near-infrared), reflectivity can be reduced, black visibility can be improved, and color reproducibility can be increased. On the other hand, compounds represented by Formula 1 can improve lightfastness reliability, which is one of the drawbacks of conventional compounds (dyes) that absorb specific wavelength ranges. In other words, when the compound represented by Formula 1 according to the embodiments is applied to an antireflective film, the lightfastness reliability of the film can be ensured. Specifically, in display devices using quantum dot emitters, attempts to improve color reproducibility by using specific compounds to absorb mixed colors are previously unknown. For example, in the case of fluorescent colors, the absorption wavelength range is 530 nm to 670 nm, and in the case of near-infrared colors, the absorption wavelength range is 605 nm to 790 nm. However, since the compound represented by Chemical Formula 1 according to the embodiments exhibits an absorption wavelength of 400 nm to 530 nm, and has a maximum absorption wavelength of 490 nm to 520 nm, and more specifically 500 nm to 510 nm, in the case of antireflective films and display devices including compounds represented by Chemical Formula 1 as dyes, lightfastness reliability can be easily ensured while minimizing the degradation of blue brightness.

[0103] As will be described later, when considering the spectrum of the light source applied to a display device, it is necessary to effectively absorb the long-wavelength blue region and the short-wavelength green region (approximately 490 nm to 520 nm) of the light source to effectively improve the color reproduction of the panel. For example, when the maximum absorption wavelength of the compound applied to the antireflective film is shorter than 500 nm or longer than 520 nm and the full width at half maximum (FWHM) is wide, the long-wavelength blue region and the short-wavelength green region cannot be effectively absorbed, thus making it difficult to achieve the effect of improving the color reproduction of the panel. Therefore, when the maximum absorption wavelength of the compound applied to the antireflective film is between 500 nm and 510 nm, the long-wavelength blue region and the short-wavelength green region can be effectively absorbed. The compound represented by Formula 1 according to the embodiment has a maximum absorption wavelength of 490 nm to 520 nm, and more specifically 500 nm to 510 nm, due to its structural specificity, and therefore can effectively absorb the long-wavelength blue region and the short-wavelength green region, ensuring lightfastness reliability and effectively improving the color reproduction of the panel.

[0104] In chemical formula 1, R 2 and R 5 At least one of them must be cyano.

[0105] In chemical formula 1, when R 2 and R 5 At least one of them is not necessarily cyano (e.g., when R 2 and R 5 When each atom is independently a hydrogen atom and / or an alkyl group, it is difficult to ensure excellent lightfastness reliability. Similarly, in Formula 1, the cyano group should be located at R. 2 and R 5 At least one of them. Specifically, in the case of a display containing sub-dots, excellent lightfastness reliability can only be ensured when an antireflective film containing a compound represented by chemical formula 1 is applied. Even if it is a compound used in antireflective films that exhibit excellent lightfastness in conventional LCDs, the lightfastness may deteriorate when it is applied as is to a display containing sub-dots.

[0106] For example, in chemical formula 1, R 2 and R 5 Each can be an independent cyano group. When R 2 and R 5 When both are cyano groups, compared to R 2 and R 5 When only one of the components is cyano, the maximum absorption wavelength and full width at half maximum (FWHM) change less, and at the same time, the lightfastness reliability itself can be greatly improved.

[0107] For example, in chemical formula 1, L can be a catechol ligand, a 2,3-naphthol ligand, or a 1,1'-bi-2-naphthol ligand.

[0108] When L is not a catechol-based ligand, a 2,3-naphthol-based ligand, or a 1,1'-bi-2-naphthol-based ligand (e.g., in the case of F, etc.), it exhibits fluorescent properties and therefore cannot be applied to the antireflective film according to the embodiments. Traditionally, catechol-based ligands have been used as ligands to address this problem. However, while non-fluorescent properties can be achieved by using catechol-based ligands, excellent lightfastness reliability cannot be guaranteed. Therefore, efforts have long been made to improve lightfastness reliability while maintaining non-fluorescent properties by using catechol-based ligands. While maintaining non-fluorescent properties, there have been reports of slightly improved lightfastness reliability, but all of these reports are based on applications in conventional LCDs. When the compounds or antireflective films mentioned in the above reports are applied to quantum dot displays (which is a recent trend in the display market), a decrease in lightfastness reliability has reappeared, and therefore, the demand for compounds for antireflective films is rapidly increasing in the context of quantum dot displays.

[0109] As described above, the inventors accurately recognized the latest market trends and demands, and after careful analysis of traditional problems and numerous attempts, the inventors invented a compound that absorbs in a quantum dot display at 400 nm to 520 nm (as in a conventional LCD display), has a maximum absorption wavelength at 490 nm to 520 nm, and ensures excellent lightfastness and reliability.

[0110] For example, chemical formula 1 can be represented by chemical formula A or chemical formula B.

[0111] [Chemical Formula A]

[0112]

[0113] [Chemical Formula B]

[0114]

[0115] In chemical formulas A and B

[0116] R 1 R 3 R 4 and R 6 Each is independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group.

[0117] R 2 and R 5Each can be independently a hydrogen atom or a cyano group, provided that R 2 and R 5 At least one of them is cyano.

[0118] X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alkyl group, or a substituted or unsubstituted C6 to C20 aryl group, and

[0119] C1 and C2 are each independently substituted or unsubstituted aromatic rings.

[0120] For example, X may be a substituted or unsubstituted C1 to C20 alkoxy group, an unsubstituted or substituted C1 to C20 alkyl group, a halogen-substituted C1 to C10 alkyl group, a C1 to C10 alkyl group substituted with a C1 to C5 alkyl group, an unsubstituted C1 to C10 alkoxy group, or a combination thereof, or an unsubstituted or substituted C6 to C20 aryl group.

[0121] For example, X may be an unsubstituted C1 to C20 alkyl, an unsubstituted C6 to C20 aryl, a C6 to C20 aryl substituted with an unsubstituted C1 to C10 alkyl, a C6 to C20 aryl substituted with a halogen-substituted C1 to C10 alkyl, or a C6 to C20 aryl substituted with an unsubstituted C1 to C10 alkoxy.

[0122] For example, C1 and C2 can each be independently a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring, but other aromatic rings besides benzene rings or naphthalene rings can be used.

[0123] For example, C1 and C2 may each be an unsubstituted benzene ring or a benzene ring substituted with "halogen atom, cyano group, C1 to C10 alkyl group, *-C(=O)R' (R' is C1 to C10 alkyl group) or a combination thereof", or a naphthalene ring or a substituted naphthalene ring or a naphthalene ring substituted with "halogen atom, cyano group, C1 to C10 alkyl group, *-C(=O)R' (R' is C1 to C10 alkyl group) or a combination thereof", but are not limited to these.

[0124] For example, a compound represented by chemical formula 1 may be one of chemical formulas 1-1-1 to 1-1-8, but is not necessarily limited to this.

[0125] [Chemical Formula 1-1-1]

[0126]

[0127] [Chemical Formula 1-1-2]

[0128]

[0129] [Chemical Formula 1-1-3]

[0130]

[0131] [Chemical Formula 1-1-4]

[0132]

[0133] [Chemical Formula 1-1-5]

[0134]

[0135] [Chemical Formula 1-1-6]

[0136]

[0137] [Chemical Formula 1-1-7]

[0138]

[0139] [Chemical Formula 1-1-8]

[0140]

[0141] The compound represented by Formula 1 exhibits an absorption wavelength in the range of 400 nm to 520 nm, and has a maximum absorption wavelength in the range of 490 nm to 520 nm, and more specifically, 500 nm to 510 nm. As described above, when the compound represented by Formula 1 has a maximum absorption wavelength in the above range, it can effectively absorb the long-wavelength blue region and the short-wavelength green region, thus effectively improving the lightfastness reliability and color reproduction of the panel.

[0142] For example, a compound represented by chemical formula 1 can be a dye.

[0143] Another embodiment provides an antireflective film comprising the compound.

[0144] The anti-reflective film may comprise 0.001% to 0.5% by weight of a compound represented by Chemical Formula 1, based on solid content. When a compound represented by Chemical Formula 1 is included within this range, neutral black is effectively improved by easily adjusting the panel color of the display device to which the anti-reflective film is applied.

[0145] The antireflective film includes an adhesive layer and an antireflective layer formed on the adhesive layer, and a compound represented by chemical formula 1 may be included in the adhesive layer.

[0146] Furthermore, the antireflective film includes an adhesive layer, a dye-containing layer, and an antireflective layer formed on the dye-containing layer, and a compound represented by chemical formula 1 may be included in the dye-containing layer.

[0147] That is, in the laminated structure of the antireflective film according to the embodiment, the compound represented by chemical formula 1 may be included in the adhesive layer, or may be included in a separate dye-containing layer. (See also...) FIG. 1 and FIG. 2 )

[0148] The anti-reflective layer may consist of only a low-refractive layer, or it may include a low-refractive layer.

[0149] Due to the difference in refractive index between the substrate and / or the high-refractive layer described later, the low-refractive layer can reduce the reflectivity of the antireflective film.

[0150] The low-refractive-index layer may comprise a curable adhesive resin, a monomer containing fluorine atoms, and fine particles with an average particle diameter of 5 nanometers to 300 nanometers (e.g., hollow silica), and the thickness of the low-refractive-index layer may be 0.01 micrometers to 0.15 micrometers. The refractive index of the low-refractive-index layer may be 1.20 to 1.40.

[0151] Additional functionality can be imparted to the antireflective film by further forming a functional coating on one surface of the low-refractive layer (i.e., on the upper surface of the low-refractive layer). Functional coatings may include, but are not limited to, anti-fingerprint layers, antistatic layers, hard coatings, anti-flash layers, blocking layers, etc.

[0152] The anti-reflective layer may also include a high-refractive layer.

[0153] The high-refractive-index layer is formed between the substrate and the low-refractive-index layer, as described later, and has a refractive index between the substrate and the low-refractive-index layer, thus reducing the reflectivity of the anti-reflective layer. The high-refractive-index layer is formed directly with both the substrate and the low-refractive-index layer. "Directly formed" means that no other layers exist between the layers.

[0154] The high-refractive-index layer has a thickness of 0.05 micrometers to 20 micrometers, a refractive index of 1.45 to 2, and a haze value specified in JIS-K7361 that is no different from the haze value of the base material or has a difference of 10% or less from the haze value of the substrate. It has excellent transparency and excellent anti-reflective properties.

[0155] The hard coating increases the rigidity of the anti-reflective layer, preventing scratches even when applied to the outermost surface of the display device. The hard coating is not mandatory. It can be omitted if the desired rigidity is achieved within a high- or low-refractive-index layer.

[0156] The hard coating can be formed between the substrate and the high-refractive layer or between the substrate and the low-refractive layer.

[0157] The hard coating can be a cured layer formed by uniformly mixing ultrafine metal oxide particles with an average particle diameter of 1 nanometer to 30 nanometers and a particle size distribution range of less than or equal to ±5 nanometers in a curing adhesive. The hard coating can have a thickness of 1 micrometer to 15 micrometers, and the refractive index of the hard coating can be greater than or equal to 1.54.

[0158] The anti-reflective layer can have a thickness of 50 micrometers to 500 micrometers, for example 50 micrometers to 300 micrometers, or for example 50 micrometers to 150 micrometers. When the thickness of the anti-reflective layer is within the above range, it can be easily applied to display devices.

[0159] An adhesive layer may be formed on the lower surface of the antireflective layer to adhere optical components, such as displays, to a panel or the like. As described above, the adhesive layer may contain a compound (dye) represented by Chemical Formula 1.

[0160] The adhesive layer may have a glass transition temperature of -70°C to 0°C, for example -65°C to -20°C. When the glass transition temperature of the adhesive layer is within the above range, the adhesion to the panel can be improved.

[0161] The adhesive layer can be a thermosetting adhesive layer or a photocurable adhesive layer. Preferably, since the adhesive layer becomes a thermosetting adhesive layer, it is not necessary to consider the effects of ultraviolet light caused by the absorption wavelength of the compound (dye) represented by Formula 1, thus facilitating the manufacture of the adhesive layer. "Thermosetting adhesive layer" can include not only adhesive layers cured by a predetermined heat treatment at 40°C to 100°C, but also adhesive layers cured at room temperature (e.g., 20°C to 30°C).

[0162] The adhesive layer may be formed from a composition for use in the adhesive layer, the composition comprising an adhesive resin and a curing agent.

[0163] The type of adhesive resin is not limited, as long as it can ensure the glass transition temperature of the adhesive layer. For example, the adhesive resin can be a silicone-based resin, a urethane-based resin, a (meth)acrylic resin, or a similar resin, but preferably, a (meth)acrylic adhesive resin can be used.

[0164] The adhesive resin may have a glass transition temperature of -70°C to 0°C, or preferably -65°C to -20°C. When the glass transition temperature of the adhesive resin is within the above range, the adhesion to the panel can be improved.

[0165] The weight-average molecular weight of the adhesive resin can be from 500,000 g / mol to 2,000,000 g / mol, for example from 800,000 g / mol to 1,500,000 g / mol. When the weight-average molecular weight of the adhesive resin is within the above range, the adhesion to the panel can be improved.

[0166] The adhesive resin may include copolymers, preferably random copolymers of at least one of the following: (meth)acrylic monomers having alkyl groups; (meth)acrylic monomers having hydroxyl groups; and (meth)acrylic monomers having aromatic groups, (meth)acrylic monomers having alicyclic groups, and (meth)acrylic monomers having heterocyclic groups.

[0167] Alkyl-based (meth)acrylate monomers may include (meth)acrylates having unsubstituted C1 to C10 alkyl groups. Specifically, alkyl-based (meth)acrylate monomers may include, but are not limited to, one or more of methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate, tributyl (meth)acrylate, isobutyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, and decyl (meth)acrylate. These monomers may be included individually or in combination of two or more. The content of alkyl-based (meth)acrylate monomers may be from 60% to 99.99% by weight of the monomer mixture, for example, from 60% to 90% by weight, for example, from 80% to 99.9% by weight.

[0168] Hydroxyl-containing (meth)acrylate monomers may include one or more of the following: (meth)acrylate monomers having at least one hydroxyl group and a C1 to C20 alkyl group; (meth)acrylate monomers having at least one hydroxyl group and a C3 to C20 cycloalkyl group; and (meth)acrylate monomers having at least one hydroxyl group and a C6 to C20 aromatic group. Specifically, hydroxyl-containing (meth)acrylate monomers preferably include (meth)acrylate monomers having at least one hydroxyl group and a C1 to C20 alkyl group, one or more of the following: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, and 1-chloro-2-hydroxypropyl (meth)acrylate. These monomers may be included individually or in a combination of two or more. The content of hydroxyl-containing (meth)acrylic monomers may be from 0.01% to 20% by weight of the monomer mixture, for example, from 0.1% to 10% by weight.

[0169] (Meth)acrylate monomers having an aromatic group may include (meth)acrylates having a C6 to C20 aryl or a C7 to C20 arylalkyl group. Specifically, (meth)acrylate monomers having an aromatic group may include, but are not limited to, phenyl (meth)acrylate, benzyl (meth)acrylate, and the like. The content of (meth)acrylate monomers having an aromatic group may be from 0% to 50% by weight of the monomer mixture, for example, from 0% to 20% by weight.

[0170] In this specification, when alicyclic groups and alkyl groups are mixed in a monomer, it is classified as a (meth)acrylic monomer having alicyclic groups.

[0171] The (meth)acrylate monomers having alicyclic groups can be (meth)acrylates having C5 to C20 monocyclic or heterocyclic alicyclic groups, and may include at least one of cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentyl (meth)acrylate, methylcyclohexyl (meth)acrylate, and dicyclopentenyl (meth)acrylate. The content of the (meth)acrylate monomers having alicyclic groups can be from 0% to 50% by weight of the monomer mixture, for example, from 1% to 30% by weight, or from 1% to 20% by weight.

[0172] (Meth)acrylate monomers having a heterocyclic group may include (meth)acrylates having a C4 to C9 heterocyclic group, wherein the C4 to C9 heterocyclic group includes at least one of nitrogen, oxygen, or sulfur. Specifically, (meth)acrylate monomers having a heterocyclic group may include (meth)acryloylmorpholine, but are not limited thereto. The content of (meth)acrylate monomers having a heterocyclic group may be from 0% to 50% by weight of the monomer mixture, for example, from 0% to 10% by weight.

[0173] The adhesive resin may comprise a monomer mixture of (meth)acrylic copolymers, said monomer mixture comprising 70% to 99.99% by weight, for example 90% to 99.5% by weight, of alkyl-containing (meth)acrylic monomers, and 0.01% to 30% by weight, for example 0.5% to 10% by weight, of hydroxyl-containing (meth)acrylic monomers. When each monomer constituting the adhesive resin has the above-mentioned range, adhesive strength can be easily ensured.

[0174] The curing agent may include an isocyanate-based curing agent. The content of the curing agent may be from 0.01 parts by weight to 20 parts by weight, for example from 0.01 parts by weight to 10 parts by weight, or for example from 0.1 parts by weight to 4 parts by weight, based on 100 parts by weight of the adhesive resin. When the curing agent has the above range, the composition can crosslink to form an adhesive layer and prevent reduced transparency and poor reliability due to overuse.

[0175] The composition may also include conventional additives such as silane coupling agents, antioxidants, tackifying resins, plasticizers, antistatic agents, rework agents, and curing catalysts. The content of the silane coupling agent can be from 0.01 parts by weight to 20 parts by weight, for example, from 0.01 parts by weight to 10 parts by weight, or from 0.1 parts by weight to 4 parts by weight, based on 100 parts by weight of the adhesive resin. When the silane coupling agent has the above range, adhesion can be controlled, and reliability defects can be prevented.

[0176] The composition used for the adhesive layer can be solvent-free, or it may include conventional organic solvents to enhance the coating properties.

[0177] The adhesive layer can have a thickness of 1 micrometer to 50 micrometers, for example, 5 micrometers to 25 micrometers. When the thickness of the adhesive layer is within the above range, it can be easily used in display devices.

[0178] According to another embodiment, a display device including an anti-reflective film is provided. For example, a display device including an anti-reflective film and a sub-dot layer can be provided.

[0179] For example, the display device may also include a light source, a color filter, and a substrate.

[0180] For example, the display device may have a stacked structure, wherein a quantum dot layer may be disposed on a light source, a color filter may be disposed on the quantum dot layer, a substrate may be disposed on the color filter, and an anti-reflective film may be disposed on the substrate. (See also) FIG. 3 and FIG. 4 )

[0181] For example, the light source could be a blue light source.

[0182] For example, the substrate can be a glass substrate.

[0183] In addition to quantum dots, the components constituting the quantum dot layer may also include binder resins, reactive unsaturated compounds, photopolymerization initiators, diffusing agents, and other additives, which will be described later.

[0184] Quantum dots exhibit maximum fluorescence emission wavelengths (fluorescence λ) in the 400-500 nm range within the 350-550 nm wavelength range. max ).

[0185] Quantum dots can have a full width at half maximum (FWHM) in the range of 20 nanometers to 100 nanometers, for example, 20 nanometers to 50 nanometers. When quantum dots have a FWHM in the range described above, they have high color purity and therefore have the effect of increasing color reproducibility when used as color materials in color filters.

[0186] Quantum dots can be organic materials, inorganic materials, or mixtures of organic and inorganic materials.

[0187] Quantum dots may each independently comprise a core and a shell surrounding the core, and herein, the core and the shell may have, for example, cores of groups II-IV, III-V and similar groups, core / shell, core / first shell / second shell, alloy, alloy / shell and similar structures, but are not limited thereto.

[0188] For example, the core may comprise at least one material selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof, but is not limited thereto. The shell surrounding the core may comprise at least one material selected from CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not limited thereto.

[0189] In this embodiment, due to the recent increase in global environmental concerns and the strengthening of regulations on toxic materials, a cadmium-free luminescent material (InP / ZnS) with slightly lower quantum efficiency (quantum yield) but no harm to the environment is used to replace the luminescent material with a cadmium-based core, but it is not limited to this.

[0190] Quantum dots with a core / shell structure can have a total size (average particle diameter) including the shell, ranging from 1 nanometer to 15 nanometers, for example, from 5 nanometers to 15 nanometers, but their structure is not particularly restricted.

[0191] For example, quantum dots can be red quantum dots, green quantum dots, or a combination thereof. For example, quantum dots can include both green and red quantum dots. In this case, the content of green quantum dots can be greater than the content of red quantum dots. Red quantum dots can have an average particle diameter of 10 nanometers to 15 nanometers. Green quantum dots can have an average particle diameter of 5 nanometers to 8 nanometers.

[0192] Simultaneously, a dispersant can be used to ensure the dispersion stability of quantum dots. The dispersant helps to uniformly disperse the light conversion material (e.g., quantum dots) within the curable composition and includes nonionic, anionic, or cationic dispersants. Specifically, the dispersant may comprise polyalkylene glycols or their esters, polyoxyolefins, polyol ester alkylene oxide addition products, alcohol alkylene oxide addition products, sulfonates, sulfonates, carboxylic esters, carboxylates, alkylamide alkylene oxide addition products, and alkylamines. The dispersant can be used alone or in mixtures of two or more. Based on the solids content of the light conversion material (e.g., quantum dots), the dispersant can be used in amounts from 0.1% by weight to 100% by weight, for example, from 10% by weight to 20% by weight.

[0193] Based on 100 parts by weight of the components constituting the quantum dot layer, the quantum dot content can be 1 to 40 parts by weight, for example, 1 to 10 parts by weight. When quantum dots are included within the above range, the light conversion efficiency is improved, and the patterning and developing properties are not impaired, resulting in excellent processability.

[0194] Adhesive resins may include acrylic resins, epoxy resins, or combinations thereof.

[0195] Acrylic resins are copolymers of a first olefinic unsaturated monomer and a second olefinic unsaturated monomer that can be copolymerized therewith, and are resins containing at least one acrylic repeating unit.

[0196] The first olefinic unsaturated monomer is an olefinic unsaturated monomer containing at least one carboxyl group. Examples of said monomer include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or combinations thereof.

[0197] The content of the first olefinic unsaturated monomer can be 5% to 50% by weight, for example, 10% to 40% by weight, based on the total amount of acrylic resin.

[0198] Second-order olefinic unsaturated monomers may be: aromatic vinyl compounds, such as styrene, α-methylstyrene, vinyltoluene, vinyl benzyl methyl ether, and the like; unsaturated carboxylic acid ester compounds, such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, and the like; unsaturated carboxylic acid aminoalkyl ester compounds, such as 2-aminoethyl (meth)acrylate, 2-dimethylaminoethyl (meth)acrylate, and the like; carboxylic acid vinyl ester compounds, such as vinyl acetate, vinyl benzoate, and the like; unsaturated carboxylic acid glycidyl ester compounds, such as glycidyl (meth)acrylate and the like; vinyl cyanide compounds, such as (meth)acrylonitrile and the like; unsaturated amide compounds, such as (meth)acrylamide and the like; and so on. These compounds may be used alone or in mixtures of two or more.

[0199] Specific examples of acrylic resins include, but are not limited to, polybenzyl methacrylate, (meth)acrylic acid / benzyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, and the like. These acrylic resins may be used alone or in mixtures of two or more.

[0200] The acrylic resin may have a weight average molecular weight of 1,000 g / mol to 15,000 g / mol. When the weight average molecular weight of the acrylic resin is within this range, the close contact properties with the substrate and the physical and chemical formation are improved, and the viscosity is appropriate.

[0201] Epoxy resins can be thermopolymerizable monomers or oligomers, and may include compounds having carbon-carbon unsaturated bonds and carbon-carbon cyclic bonds.

[0202] Epoxy resins may also include bisphenol A epoxy resins, bisphenol F epoxy resins, phenolic epoxy resins, cyclic aliphatic epoxy resins, and aliphatic polyglycidyl ethers, but are not necessarily limited to these.

[0203] Commercially available products of the compounds may include YX4000, YX4000H, YL6121H, YL6640, or YL6677 from Yuka Shell Epoxy Co., Ltd.; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, or EOCN-1027 from Nippon Kayaku Co., Ltd.; and epoxy resins (EPIKOTE) 180S75 from Yuka Shell Epoxy Co., Ltd.; bisphenol A epoxy resins, such as EPIKOTE 1001, 1002, 1003, 1004, 1007, 1009, 1010, and 828 from Yuka Shell Epoxy Co., Ltd.; and bisphenol F epoxy resins, such as EPIKOTE from Yuka Shell Epoxy Co., Ltd. 807 and 834; phenolic epoxy resins, such as EPIKOTE 152, 154 or 157H65 from Yuxiang Shell Epoxy Co., Ltd., and EPPN 201, 202 from Nippon Kayaku Co., Ltd.; cyclic aliphatic epoxy resins, such as CY175, CY177 and CY179 from Ciba-Geigy AG Corp., ERL-4234, ERL-4299, ERL-4221 and ERL-4206 from Union Carbide Corporation (UCC), Showdyne 509 from Showa Denko K.K., Araldite CY-182 from Ciba-Geigy, and Dainippon Ink & Chemicals Co., Ltd. CY-192 and CY-184 of Shell Epoxy Co., Ltd., EPICLON 200 and 400, EPIKOTE 871 and 872 of Shell Epoxy Co., Ltd., and EP1032H60, ED-5661 and ED-5662 of Celanese Coating Corporation; aliphatic polyglycidyl ethers may be EPIKOTE 190P and 191P of Shell Epoxy Co., Ltd., EPOLITE 100MF of Kyoeisha Yushi Kagaku Kogyo Co., Ltd., EPIOL TMP of Nihon Yushi KK Co., Ltd., and similar products.

[0204] Based on 100 parts by weight of the constituent components of the sub-dot layer, the content of the adhesive resin can be 1 to 40 parts by weight, for example 5 to 20 parts by weight. When the adhesive resin is included within the above range, excellent sensitivity, developability, resolution, and linearity of the pattern can be obtained.

[0205] Reactive unsaturated compounds can be used by mixing monomers or oligomers commonly used in conventional photocurable and thermosetting compositions.

[0206] The reactive unsaturated compound may be an acrylate compound. For example, at least one of ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, phenolic epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanediol dimethacrylate, or a mixture thereof.

[0207] Reactive unsaturated compounds can be treated with acid anhydrides to improve their developability.

[0208] Based on 100 parts by weight of the components constituting the dot layer, the content of the reactive unsaturated compound can be 1 to 10 parts by weight, for example, 1 to 5 parts by weight. When the reactive unsaturated compound is included within the above range, sufficient curing occurs during exposure in the patterning process, resulting in excellent reliability, heat resistance, light resistance, chemical resistance, resolution, and contact properties of the pattern.

[0209] Photopolymerization initiators can be acetophenone compounds, benzophenone compounds, thioxanone compounds, benzoin compounds, oxime compounds, and similar compounds.

[0210] Examples of acetophenone compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinoprop-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-but-1-one, and the like.

[0211] Examples of benzophenone compounds include benzophenone, benzoyl benzoate, benzoyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, benzoyl acrylate, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

[0212] Examples of thioxanthone compounds include thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and the like.

[0213] Examples of benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, and the like.

[0214] Examples of triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(p-tolyl)-4,6-bis(trichloromethyl)-s- Triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine and the like.

[0215] Examples of oxime compounds include O-acyloxime compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]acetone, O-ethoxycarbonyl-α-oxyamino-1-phenylprop-1-one, and the like. Specific examples of O-acyloxime compounds include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-but-1-one, 1-(4-phenylthiophenyl)-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octane-1-one-oxime-O-acetate, 1-(4-phenylthiophenyl)-but-1-one-oxime-O-acetate, and the like.

[0216] In addition to the compounds mentioned above, the photopolymerization initiator may also include carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, imidazole compounds, biimidazole compounds, fluorene compounds, and the like.

[0217] Photopolymerization initiators can be used with photosensitizers that can induce a chemical reaction by absorbing light, become excited, and subsequently transfer their energy.

[0218] Examples of photosensitizers include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetra-3-mercaptopropionate, dipentaerythritol tetra-3-mercaptopropionate, and the like.

[0219] Based on 100 parts by weight of the components constituting the sub-dot layer, the content of the photopolymerization initiator can be from 0.1 parts by weight to 10 parts by weight, for example, from 0.1 parts by weight to 5 parts by weight. When the photopolymerization initiator is included within the above range, the balance between sensitivity and developability during exposure is improved, resulting in the acquisition of patterns with excellent resolution and no residual film.

[0220] The content of the quantum dot layer may also contain a dispersant.

[0221] For example, dispersants may include barium sulfate (BaSO4), calcium carbonate (CaCO3), titanium dioxide (TiO2), zirconium oxide (ZrO2), or combinations thereof.

[0222] The diffusing agent reflects light that was not absorbed by the aforementioned quantum dots, allowing the reflected light to be absorbed again within the quantum dots. In other words, the diffusing agent increases the amount of light absorbed by the quantum dots, and thus increases the light conversion efficiency of the curable composition.

[0223] The average particle diameter (D) of the dispersant 50 The light scattering effect can be obtained in the range of 150 nm to 250 nm, and more specifically, in the range of 180 nm to 230 nm. When the diffuser has an average particle diameter within the range described above, a better light scattering effect can be obtained, and the light conversion efficiency can be increased.

[0224] The content of the diffusing agent can be from 0.1 wt% to 20 wt%, for example, from 0.1 wt% to 5 wt%, based on the solid content of the components constituting the sub-dot layer per 100 parts by weight. When the content of the diffusing agent is less than 0.1 wt% based on the components constituting the sub-dot layer per 100 parts by weight, it is difficult to expect to improve the light conversion efficiency by using the diffusing agent, while when the content of the diffusing agent is greater than 5 wt%, the pattern characteristics may deteriorate.

[0225] To improve the stability and dispersibility of quantum dots, the quantum dot layer may also include thiol-based additives.

[0226] Thiol-based additives can replace the shell surface of quantum dots, improve the dispersion stability of quantum dots in solvents, and stabilize quantum dots.

[0227] Thiol-based additives may have one or more, for example 2 to 10, or for example 2 to 4 thiol groups (-SH) at the end, depending on their structure.

[0228] For example, thiol additives may contain at least two functional groups represented by chemical formula 2.

[0229] [Chemical Formula 2]

[0230]

[0231] In chemical formula 2,

[0232] L 7 and L 8 Each of them is independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group.

[0233] For example, thiol additives can be represented by chemical formula 3.

[0234] [Chemical Formula 3]

[0235]

[0236] In chemical formula 3,

[0237] L 7 and L 8 Each of them is independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group, and

[0238] u1 and u2 are each an independent integer, either 0 or 1.

[0239] For example, in chemical formulas 2 and 3, L 7 and L 8 Each can be a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

[0240] Specific examples of thiol-based additives may include pentaerythritol tetrakis(3-mercaptopropionate) represented by chemical formula 2a, trimethylolpropane tris(3-mercaptopropionate) represented by chemical formula 2b, pentaerythritol tetrakis(mercaptoacetate) represented by chemical formula 2c, trimethylolpropane tris(2-mercaptoacetate) represented by chemical formula 2d, diol di-3-mercaptopropionate represented by chemical formula 2e, and combinations thereof.

[0241] [Chemical Formula 2a]

[0242]

[0243] [Chemical Formula 2b]

[0244]

[0245] [Chemical formula 2c]

[0246]

[0247] [Chemical formula 2d]

[0248]

[0249] [Chemical formula 2e]

[0250]

[0251] Based on 100 parts by weight of the components constituting the quantum dot layer, the content of thiol-based additives can be from 0.1 parts by weight to 10 parts by weight, for example, from 0.1 parts by weight to 5 parts by weight. When thiol-based additives are included within the range described above, the stability of light conversion materials such as quantum dots can be improved. The thiol groups in the components react with the acrylic groups of the resin or monomer to form covalent bonds, and thus the heat resistance of light conversion materials such as quantum dots can be improved.

[0252] The quantum dot layer may also include a polymerization inhibitor, which includes hydroquinone compounds, catechol compounds, or combinations thereof. Because the quantum dot layer also includes hydroquinone compounds, catechol compounds, or combinations thereof, crosslinking at room temperature can be prevented during exposure after printing (coating) the quantum dot-containing composition.

[0253] For example, hydroquinone compounds, catechol compounds, or combinations thereof may include hydroquinone, methylhydroquinone, methoxyhydroquinone, tributylhydroquinone, 2,5-di-tert-butylhydroquinone, 2,5-bis(1,1-dimethylbutyl)hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl)hydroquinone, catechol, tributylcatechol, 4-methoxyphenol, gallnutol, 2,6-di-tert-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylamine-O,O')aluminum, or combinations thereof, but are not necessarily limited to these.

[0254] Based on 100 parts by weight of a layer comprising quantum dots and fluorescent dyes, or a component containing a quantum dot layer (excluding fluorescent dyes), hydroquinone compounds, catechol compounds, or combinations thereof may be used in the form of a dispersion, and the content of the polymerization inhibitor in the dispersion form may be from 0.001 parts by weight to 1 part by weight, for example, from 0.01 parts by weight to 0.1 parts by weight. When a stabilizer is included within the above range, the problem of aging at room temperature can be solved, and the reduction in sensitivity and surface peeling can be prevented.

[0255] In addition to thiol-based additives and polymerization inhibitors, the content sub-dot layer may include: malonic acid; 3-amino-1,2-propanediol; silane-based coupling agent; leveling agent; fluorine-based surfactant; or combinations thereof.

[0256] In addition, the content sub-dot layer may also contain a silane coupling agent having reactive substituents such as carboxyl, methacryloyl, isocyanate, epoxy and similar groups to improve the tight contact properties with the substrate.

[0257] Examples of silane coupling agents may include trimethoxysilylbenzoic acid, γ-methacrylate oxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanate propyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-(epoxycyclohexyl)ethyltrimethoxysilane, and the like. These silane coupling agents may be used alone or in mixtures of two or more.

[0258] Based on 100 parts by weight of the components constituting the sub-dot layer, the content of the silane coupling agent can be from 0.01 parts by weight to 10 parts by weight. When the silane coupling agent is included within the range described above, the close contact properties, storage properties, and similar properties can be improved.

[0259] In addition, the content sub-dot layer may also contain surfactants such as fluorinated surfactants to improve coating and prevent defects when necessary.

[0260] An example of a fluorinated surfactant is BM Chemie Inc. and MEGAFACE F from Dainippon Ink Kagaku Kogyo Co., Ltd. F F and F FULORAD of Sumitomo 3M Co., Ltd. Florard Florard and Florard SURFLON from Asahi Glass Co., Ltd. Shafulong Shafulong Shafulong and Shafulong ; and Toray Silicone Co., Ltd. and And similar products; F-482, F-484, F-478, F-554 and similar products of DIC Co., Ltd.

[0261] Based on 100 parts by weight of the components constituting the sub-dot layer, the content of fluorinated surfactant can be from 0.001 parts by weight to 5 parts by weight. When fluorinated surfactant is included within this range, excellent wettability and coating uniformity on the glass substrate can be ensured, but stains may not be generated.

[0262] In addition, a certain amount of other additives, such as antioxidants and stabilizers, can be added to the content sub-dot layer without impairing its physical properties.

[0263] The method of manufacturing each content sub-dot layer may include coating a curable composition containing the above-mentioned components and the like onto a substrate by an inkjet printing method to form a pattern (S1); and curing the pattern (S2).

[0264] (S1) Pattern Formation

[0265] Curable components are coated onto a substrate with a thickness of 0.5 to 10 micrometers using an inkjet dispersion method. Depending on the inkjet dispersion, patterns can be formed by repeatedly dispersing the desired colors one by one or by dispersing the desired colors simultaneously, thus simplifying the process.

[0266] (S2) Curing

[0267] A cured resin film can be obtained by curing the pattern. In this case, a thermosetting process is preferred as the curing method. The thermosetting process can be a process in which the solvent in the curable component is first removed by heating at a temperature of about 100°C or higher for about 3 minutes, and then cured by heating at a temperature of 160°C to 300°C (and more preferably at a temperature of 180°C to 250°C) for about 30 minutes.

[0268] Furthermore, each content sub-dot layer can be manufactured without inkjet printing. The manufacturing method in this case includes: applying a curable composition containing the aforementioned components to a substrate that has undergone predetermined pretreatment using a suitable method (e.g., spin coating, roll coating, spray coating, etc.) to a thickness of 0.5 to 10 micrometers; and irradiating the result with light to form the pattern required for the color filter. As the light source for irradiation, UV, electron beam, or X-rays can be used, and for example, UV light in the range of 190 nm to 450 nm, specifically 200 nm to 400 nm, can be used. A photoresist mask can be further used during the irradiation process. After performing the irradiation process in this manner, the composition layer irradiated by the light source is treated with a developing solution. At this time, the unexposed portions of the composition layer are dissolved to form the pattern required for the color filter. By repeating this process according to the desired number of colors, a color filter with the desired pattern can be obtained. Furthermore, when the image pattern obtained through development in the above process is reheated or cured by irradiation with photochemical rays, crack resistance and solvent resistance can be improved.

[0269] Curable components may also contain solvents.

[0270] Solvents may include the following compounds: alcohols, such as methanol, ethanol, and the like; glycol ethers, such as ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether, and the like; cellolytic acetates, such as methyl cellolytic acetate, ethyl cellolytic acetate, diethyl cellolytic acetate, and the like; carbitol, such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and the like; and propylene glycol alkyl ether acetates, such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, etc. Esters and esters; ketones, such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-pentanone, 2-heptanone and the like; saturated aliphatic monocarboxylic acid alkyl esters, such as ethyl acetate, n-butyl acetate, isobutyl acetate and the like; lactic acid alkyl esters, such as methyl lactate, ethyl lactate and the like; glycolic acid alkyl esters, such as methyl glycolate, ethyl glycolate, butyl glycolate and the like; alkoxyalkyl acetate esters, such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, etc. Methyl ethoxyacetate, ethyl ethoxyacetate, and the like; alkyl 3-hydroxypropionic acid esters, such as methyl 3-hydroxypropionic acid, ethyl 3-hydroxypropionic acid, and the like; alkyl 3-alkoxypropionic acid esters, such as methyl 3-methoxypropionic acid, ethyl 3-methoxypropionic acid, ethyl 3-ethoxypropionic acid, methyl 3-ethoxypropionic acid, and the like; alkyl 2-hydroxypropionic acid esters, such as methyl 2-hydroxypropionic acid, ethyl 2-hydroxypropionic acid, propyl 2-hydroxypropionic acid, and the like; alkyl 2-alkoxypropionic acid esters, such as methyl 2-methoxypropionic acid, ethyl 2-methoxypropionic acid, ethyl 2-ethoxypropionic acid, alkyl ... Ethyl oxypropionate, methyl 2-ethoxypropionate and the like; alkyl 2-hydroxy-2-methylpropionate, such as methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate and the like; alkyl 2-alkoxy-2-methylpropionate, such as methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate and the like; esters, such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, 2-hydroxy-3-methylmethyl butyrate and the like; or keto esters, such as ethyl pyruvate and the like. In addition, N-methylformamide, N,N-dimethylformamide, N-methylformaniline, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, and dimethyl oxalate may also be used, but are not limited to these.

[0271] For example, the solvent may preferably be a glycol ether, such as ethylene glycol monoethyl ether, ethylene glycol methyl ethyl ether and the like; ethylene glycol alkyl ether acetate, such as ethyl cellosolve acetate and the like; ester, such as 2-hydroxyethyl propionate and the like; carbitol, such as diethylene glycol monomethyl ether and the like; propylene glycol alkyl ether acetate, such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate and the like; alcohol, such as ethanol and the like; or combinations thereof.

[0272] For example, solvents may include propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, diethylene glycol dimethyl ether, dimethylacetamide, 2-butoxyethanol, N-methylpyrrolidone, N-ethylpyrrolidone, propylene carbonate, γ-butyrolactone, dimethyl oxalate, or combinations thereof.

[0273] The remaining amount of solvent may be included based on the total amount of curable components.

[0274] Invention Embodiments

[0275] Examples of the present invention are described below. However, these examples should not be construed in any way as limiting the scope of the invention.

[0276] (Example)

[0277] (synthesis example)

[0278] Each compound was diluted to a concentration of 10 parts per million (ppm) using cyclohexanone solvent, and the maximum absorption wavelength was measured using a UV / VIS spectrophotometer (Lamda 25, PerkinElmer, Inc.).

[0279] Synthesis Example 1: Synthesis of a compound represented by Chemical Formula 1-1

[0280] (Reaction Scheme 1)

[0281]

[0282] 10 g (105 mmol), benzaldehyde (2.79 g, 26.28 mmol), and 500 mL of dichloromethane (DCM) were placed in a 2 L round-bottom flask and stirred at room temperature for 30 min. 0.2 mL of trifluoroacetic acid was added dropwise, and the mixture was stirred at room temperature for 16 h. A solution prepared by dissolving 5.94 g (26.28 mmol) of 2,3-dichloro-5,6-dicyano-1,4-benzoquinone (DDQ) in 50 mL of toluene was added dropwise, and the mixture was stirred for another 4 h. After solvent removal, the residue was purified by column chromatography with a mixture of ethyl acetate / hexane / TEA (20% / 80% / 0.2%) and dried. (Yield: 40%, 3 g)

[0283] (Reaction Scheme 2)

[0284]

[0285] 3 g (11 mmol) of the product from reaction scheme 1, 300 mL of toluene, and 4.6 mL (33 mmol) of triethylamine were sequentially placed into a 2 L round-bottom flask and stirred. 6.7 mL (55 mol) of BF3·Et2O was added, and the mixture was stirred at 100 °C for 4 h. After solvent removal, the residue was purified by column chromatography with a mixture of dichloromethane / hexane / TEA (80% / 20% / 0.2%) and then dried. (Yield: 85%, 3 g)

[0286] (Reaction Scheme 3)

[0287]

[0288] 3 g (9.25 mmol) of the product from reaction scheme 2 and 300 mL of dichloromethane were placed in a 2 L round-bottom flask and stirred. 3.1 g (23 mmol) of aluminum chloride was added, and the mixture was stirred for 5 minutes. A solution prepared by dissolving 4.1 g (37 mmol) of catechol in 30 mL of acetonitrile was added to the reactants, and the mixture was stirred at room temperature for 30 minutes. After washing the reactants with water and removing the solvent, methanol was added, and the mixture was stirred. The precipitated solid was filtered and dried to obtain the compound represented by formula 1-1. (Yield: 50%, 1.82 g)

[0289] [Chemical Formula 1-1]

[0290]

[0291] Synthesis Example 2: Synthesis of a compound represented by Chemical Formula 1-2

[0292] Except that 2,4,6-trimethylbenzaldehyde was used instead of benzaldehyde, compounds represented by chemical formulas 1-2 were synthesized according to the same synthetic method as in Synthesis Example 1.

[0293] [Chemical Formula 1-2]

[0294]

[0295] Synthesis Example 3: Synthesis of a compound represented by Chemical Formula 1-3

[0296] Except that 4-(trifluoromethyl)benzaldehyde was used instead of benzaldehyde, compounds represented by chemical formulas 1-3 were synthesized according to the same synthetic method as in Synthesis Example 1.

[0297] [Chemical Formula 1-3]

[0298]

[0299] Synthesis Example 4: Synthesis of a compound represented by Chemical Formula 1-4

[0300] Except that 4-(1-ethoxyvinyl)benzaldehyde was used instead of benzaldehyde, compounds represented by chemical formulas 1-4 were synthesized according to the same synthetic method as in Synthesis Example 1.

[0301] [Chemical Formulas 1-4]

[0302]

[0303] Synthesis Example 5: Synthesis of a compound represented by Chemical Formula 1-5

[0304] Except that acetaldehyde was used instead of benzaldehyde, compounds represented by chemical formulas 1-5 were synthesized using the same synthetic method as in Synthesis Example 1.

[0305] [Chemical Formula 1-5]

[0306]

[0307] Synthesis Example 6: Synthesis of a compound represented by Chemical Formula 1-6

[0308] Except that 2-ethylhexanal was used instead of benzaldehyde, compounds represented by chemical formulas 1-6 were synthesized according to the same synthetic method as in Synthesis Example 1.

[0309] [Chemical Formula 1-6]

[0310]

[0311] Synthesis Example 7: Synthesis of a compound represented by Chemical Formula 1-7

[0312] Except that 2,3-dihydroxynaphthalene was used instead of catechol, compounds represented by chemical formulas 1-7 were synthesized according to the same synthetic method as in Synthesis Example 1.

[0313] [Chemical Formula 1-7]

[0314]

[0315] Synthesis Example 8: Synthesis of a compound represented by Chemical Formula 1-8

[0316] Except that 4-tertiary butylcatechol was used instead of catechin, compounds represented by chemical formulas 1-8 were synthesized according to the same synthetic method as in Synthesis Example 1.

[0317] [Chemical Formula 1-8]

[0318]

[0319] Synthesis Example 9: Synthesis of a compound represented by Chemical Formula 1-1-1

[0320] (Reaction Scheme 4)

[0321]

[0322] (1) The compound represented by chemical formula 1-1 (1 g, 2.54 mmol), dichloromethane (MC, 20 mL), and N-bromosuccinimide (NBS, 0.90 g, 5.07 mmol) were sequentially placed into a round flask and stirred at room temperature for 1 hour. The reaction product obtained after stirring was purified by column chromatography and dried to synthesize 1.37 g (yield: 98%) of the intermediate.

[0323] (2) The intermediate (1 g, 1.81 mmol), zinc cyanide (0.47 g, 4.0 mmol), palladium acetate (0.02 g, 0.09 mmol), tri-tert-butylphosphine (0.035 g, 0.36 mmol), potassium carbonate (0.75 g, 5.43 mmol), and toluene (20 mL) were sequentially placed into a round flask. The mixture was stirred at 100 °C for 24 hours, cooled to room temperature, purified by column chromatography, and dried to synthesize 0.38 g (yield: 47%) of the compound represented by chemical formula 1-1-1.

[0324] [Chemical Formula 1-1-1]

[0325]

[0326] [M+H] + 444.3, λ max =504 nanometers

[0327] Synthesis Example 10: Synthesis of a compound represented by Chemical Formula 1-1-2

[0328] (Reaction Scheme 5)

[0329]

[0330] Except that the compound represented by chemical formula 1-2 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-2 was synthesized according to the same synthetic method as in synthetic example 9.

[0331] [Chemical Formula 1-1-2]

[0332]

[0333] [M+H] + 486.4, λ max =505 nanometers

[0334] Synthesis Example 11: Synthesis of a compound represented by Chemical Formula 1-1-3

[0335] (Reaction Scheme 6)

[0336]

[0337] Except that the compound represented by chemical formula 1-3 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-3 was synthesized according to the same synthetic method as in synthetic example 9.

[0338] [Chemical Formula 1-1-3]

[0339]

[0340] [M+H] + 512.3, λ max =507 nanometers

[0341] Synthesis Example 12: Synthesis of a compound represented by Chemical Formula 1-1-4

[0342] (Reaction Scheme 7)

[0343]

[0344] Except that the compound represented by chemical formula 1-4 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-4 was synthesized according to the same synthetic method as in synthetic example 9.

[0345] [Chemical Formula 1-1-4]

[0346]

[0347] [M+H] + 516.4, λ max =506 nanometers

[0348] Synthesis Example 13: Synthesis of a compound represented by Chemical Formula 1-1-5

[0349] (Reaction Scheme 8)

[0350]

[0351] Except that the compound represented by chemical formula 1-5 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-5 was synthesized according to the same synthetic method as in synthetic example 9.

[0352] [Chemical Formula 1-1-5]

[0353]

[0354] [M+H] + 382.2, λ max =503 nanometers

[0355] Synthesis Example 14: Synthesis of a compound represented by Chemical Formula 1-1-6

[0356] (Reaction Scheme 9)

[0357]

[0358] Except that the compound represented by chemical formula 1-6 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-6 was synthesized according to the same synthetic method as in synthetic example 9.

[0359] [Chemical Formula 1-1-6]

[0360]

[0361] [M+H] + 480.4, λ max =504 nanometers

[0362] Synthesis Example 15: Synthesis of a compound represented by Chemical Formula 1-1-7

[0363] (Reaction Scheme 10)

[0364]

[0365] Except that the compound represented by chemical formula 1-7 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-7 was synthesized according to the same synthetic method as in synthetic example 9.

[0366] [Chemical Formula 1-1-7]

[0367]

[0368] [M+H] + 494.4, λ max =507 nanometers

[0369] Synthesis Example 16: Synthesis of a compound represented by Chemical Formula 1-1-8

[0370] (Reaction Scheme 11)

[0371]

[0372] Except that the compound represented by chemical formula 1-8 was used instead of the compound represented by chemical formula 1-1, the compound represented by chemical formula 1-1-8 was synthesized according to the same synthetic method as in synthetic example 9.

[0373] [Chemical Formula 1-1-8]

[0374]

[0375] [M+H] + 500.4, λ max =507 nanometers

[0376] Comparative Synthesis Examples 1 to 3: Synthesis of compounds represented by Chemical Formulas C-1 to C-3

[0377] Referring to examples such as Synthesis Example 1 and Synthesis Example 9, compounds having the following three structures were synthesized.

[0378] [Chemical formula C-1]

[0379]

[0380] [M+H] + 463.2, λ max =532 nanometers

[0381] Comparative Synthesis Example 2: Synthesis of a compound represented by Chemical Formula C-2 (intermediate of Reaction Scheme 4)

[0382] [Chemical formula C-2]

[0383]

[0384] [M+H] + 552.07, λ max =528 nanometers

[0385] Comparative Example 3: A compound represented by Chemical Formula 1-1

[0386] [Chemical Formula 1-1]

[0387]

[0388] [M+H] + 395, λ max =507 nanometers

[0389] (Evaluation 1: Wavelength Matching)

[0390] Based on the structures of the compounds according to Synthetic Examples 9 to 16 and the maximum absorption wavelength of each compound, the compounds according to the examples exhibit a maximum absorption wavelength between 500 nm and 510 nm due to the presence of a structure represented by Chemical Formula 1.

[0391] (Manufacturing of anti-reflective coating)

[0392] Example 1

[0393] A monomer mixture comprising 99 parts by weight of n-butyl acrylate and 1 part by weight of 2-hydroxyethyl acrylate, comprising 100 parts by weight of ethyl acetate, was placed in a 1-liter reactor equipped with a condenser for convenient temperature control. Nitrogen was refluxed into the reactor, and nitrogen was injected into the reactor for 1 hour while stirring the flask to replace the oxygen in the reactor with nitrogen. The reactor was then maintained at 70°C. 0.06 parts by weight of 2,2'-azobisisobutyronitrile (2,2'-Azobisisobutyronitrile) was added as an initiator, and the reaction was then carried out for 8 hours to prepare a solution containing a (meth)acrylic acid copolymer. The (meth)acrylic acid copolymer had a Tg of -46°C and a weight average molecular weight of 1,100,000 g / mol. Subsequently, ethyl acetate was added to prepare a 19.4% by weight (meth)acrylic acid copolymer solution. Based on the solids content of 100 parts by weight of the (meth)acrylic copolymer, 0.193 parts by weight of an XDI-based isocyanate crosslinking agent (75% solids, TD-75, Soken Chemical Co., Ltd.), 0.154 parts by weight of 3-glycidoxypropyltrimethoxysilane (KBM-403, Shin-Etsu Chemical Co.), as a silane coupling agent, and 0.06 parts by weight of the compound according to Synthesis Example 9 (represented by chemical formula 1-1-1) were mixed. Subsequently, 25 parts by weight of methyl ethyl ketone were added to prepare the adhesive layer composition.

[0394] The adhesive layer composition is directly coated onto the bottom surface of the PET film, which serves as the base film for the anti-reflective layer (an anti-reflective layer formed by sequentially stacking a hard coating layer, a high-refractive layer, and a low-refractive layer on the upper surface of the PET film, with a reflectivity of 0.2%, DNP, LLC), using a doctor blade coater, and then dried in a 90°C oven for 4 minutes to form a 20-micron-thick anti-reflective film.

[0395] Example 2

[0396] Except that the compound of Synthesis Example 10 (represented by chemical formula 1-1-2) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0397] Example 3

[0398] Except that the compound of Synthesis Example 11 (represented by chemical formula 1-1-3) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0399] Example 4

[0400] Except that the compound of Synthesis Example 12 (represented by chemical formula 1-1-4) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0401] Example 5

[0402] Except that the compound of Synthetic Example 13 (represented by chemical formula 1-1-5) was used instead of the compound of Synthetic Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0403] Example 6

[0404] Except that the compound of Synthesis Example 14 (represented by chemical formula 1-1-6) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0405] Example 7

[0406] Except that the compound of Synthesis Example 15 (represented by chemical formula 1-1-7) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0407] Example 8

[0408] Except that the compound of Synthesis Example 16 (represented by chemical formula 1-1-8) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0409] Comparative Example 1

[0410] Except that the compound of Comparative Synthesis Example 1 (represented by chemical formula C-1) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0411] Comparative Example 2

[0412] Except that the compound of Comparative Synthesis Example 2 (represented by chemical formula C-2) was used instead of the compound of Synthesis Example 9 (represented by chemical formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0413] Comparative Example 3

[0414] Except that the compound of Comparative Synthesis Example 3 (represented by Chemical Formula 1-1) was used instead of the compound of Synthesis Example 9 (represented by Chemical Formula 1-1-1), the antireflective film was formed according to the same method as in Example 1.

[0415] (Evaluation 3: Lightfastness Reliability)

[0416] To evaluate whether the lightfastness reliability of the film used in a panel formed by applying quantum dots was improved, an optical component was fabricated (by stacking an antireflective film on the other surface of glass with a quantum dot layer on one surface). The lightfastness reliability was then evaluated by measuring the transmittance of the compound at its maximum absorption wavelength before and after irradiation in a xenon test chamber (Q-SUN) under the following conditions: light source: xenon lamp; irradiation intensity: 0.35 W / cm²; irradiation temperature: 63°C; irradiation time: 500 hours; irradiation direction: irradiation of the antireflective film itself). The results are shown in Table 1. The change in transmittance is the absolute value of the difference in transmittance before and after irradiation.

[0417] [Table 1]

[0418] Light resistance reliability (ΔT%) Example 1 3.3 Example 2 3.5 Example 3 3.0 Example 4 3.7 Example 5 5.2 Example 6 4.9 Example 7 4.2 Example 8 3.9 Comparative Example 1 17.3 Comparative Example 2 14.1 Comparative Example 3 25.4

[0419] Referring to Table 1, Examples 1 to 8 show improved lightfastness reliability compared to Comparative Examples 1 to 3. In other words, the antireflective film of the dye compound according to the embodiments and the display device containing quantum dots effectively absorb light in the blue long-wavelength region and the green short-wavelength region, thereby improving the color reproduction of the quantum dot application panel.

[0420] Although the invention has been described in conjunction with exemplary embodiments now considered practical, it should be understood that the invention is not limited to the disclosed embodiments, but rather is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Therefore, the above embodiments should be understood as exemplary and not as limiting the invention in any way.

Claims

1.A compound represented by Chemical Formula A: [Chemical Formula A] In Chemical Formula A, X is C1 to C20 alkyl unsubstituted or substituted with “C1 to C10 alkyl unsubstituted, C1 to C10 alkyl substituted with a halogen atom, or a combination thereof”, or C6 to C20 aryl unsubstituted or substituted with “C1 to C10 alkyl unsubstituted, C1 to C10 alkyl substituted with a halogen atom, or a combination thereof”, and 2.The compound according to claim 1, wherein the compound is represented by one of Chemical Formulas 1-1-1 to 1-1-3 and 1-1-5 to 1-1-8: [Chemical Formula 1-1-1] [Chemical Formula 1-1-2] [Chemical Formula 1-1-3] [Chemical Formula 1-1-5] [Chemical Formula 1-1-6] [Chemical Formula 1-1-7] [Chemical Formula 1-1-8] wherein 3.The compound according to claim 1, wherein the compound exhibits an absorption wavelength at 400 nm to 530 nm, and has a maximum absorption wavelength at 490 nm to 520 nm of the absorption wavelength. R 1 , R 3 , R 4 , and R 6 are each independently unsubstituted C1to C20alkyl, R 2 and R 5 each independently is cyano, 4.The compound according to claim 1, wherein the compound is a dye. C1 is an unsubstituted or altered group consisting of a halogen atom, a cyano group, or a C1 to C10 alkyl group. "or combinations thereof" of substituted benzene rings, or unsubstituted or substituted benzene rings with halogen atoms, cyano groups, C1 to C10 alkyl groups, "or combinations thereof" of substituted naphthalene rings, wherein Ci to C10 alkyl. 5.A compound represented by Chemical Formula 1-1-4: [Chemical Formula 1-1-4] 6.An anti-reflection film comprising the compound according to any one of claims 1 to 5. 7.The anti-reflection film according to claim 6, wherein the anti-reflection film comprises an adhesive layer and an anti-reflection layer on the adhesive layer, and the compound is contained in the adhesive layer. 8.The anti-reflection film according to claim 6, wherein the anti-reflection film comprises an adhesive layer, a dye-containing layer, and an anti-reflection layer on the dye-containing layer, and the compound is contained in the dye-containing layer. 9.A display device comprising the anti-reflection film according to claim 6. 10.The display device according to claim 9, wherein the display device further comprises a quantum dot-containing layer. 11.The display device according to claim 10, wherein the display device further comprises a light source, a color filter, and a substrate. 12.The display device according to claim 11, wherein in the display device, the quantum dot-containing layer is disposed on the light source, the color filter is disposed on the quantum dot-containing layer, the substrate is disposed on the color filter, and the anti-reflection film is disposed on the substrate. 。 13.The display device according to claim 11, wherein the light source is a white light source or a blue light source. 14.The display device according to claim 11, wherein the substrate comprises a glass substrate. ​ ​ 。 ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​

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