A vacuum pumping device, a vacuum pumping method, and a single crystal furnace system

Abstract

The present application discloses a vacuum pumping device, a vacuum pumping method, and a single crystal furnace system, which relate to the field of photovoltaic technologies. The vacuum pumping device is used to cooperate with a vacuum pump to achieve vacuum pumping during the feeding of the single crystal furnace. The single crystal furnace includes a single crystal furnace body, and the vacuum pumping device is arranged outside the single crystal furnace body. The vacuum pumping device includes a vacuum pumping pipeline and a vacuum pumping device. The vacuum pumping pipeline has a first connection state and a second connection state, and the single crystal furnace has a first feeding state and a second feeding state. When the single crystal furnace is in the first feeding state, the vacuum pumping pipeline is in the first connection state; when the single crystal furnace is in the second feeding state, the vacuum pumping pipeline is in the second connection state. It is used to improve the vacuum pumping efficiency during feeding and reduce the waste of working hours.

Description

Technical Field

[0001] The present application relates to the field of photovoltaic technology, and more specifically, to a vacuum pumping device, a vacuum pumping method, and a single crystal furnace system. Background Art

[0002] A single crystal furnace is a commonly used device for large-scale production of single crystal rods.

[0003] During the production process of single crystal rods, it is necessary to feed materials into the furnace. When the feeding machine feeds materials into the furnace, it is necessary to use the evacuation system of the single crystal furnace to evacuate it. Currently, an auxiliary pump is connected to multiple single crystal furnaces and operates simultaneously. Therefore, when the feeding machine needs to use the auxiliary pump for evacuation during feeding, conflicts in use are likely to occur, resulting in a large waste of working hours. In addition, currently, the oxides in the single crystal furnace can only be extracted through the evacuation pipeline at the bottom of the furnace, and the evacuation effect is limited, which has a greater impact on the oxygen content of the crystal rod. Summary of the Invention

[0004] In view of this, the present application provides a vacuum pumping device, a vacuum pumping method, and a single crystal furnace system, which are used to improve the evacuation efficiency during feeding and reduce the waste of working hours.

[0005] In a first aspect, the present application provides a vacuum pumping device, which is used to cooperate with a vacuum pump to achieve evacuation during feeding of a single crystal furnace; the single crystal furnace includes a single crystal furnace body, and the vacuum pumping device is arranged outside the single crystal furnace body; the vacuum pumping device includes an evacuation pipeline and an evacuation device, the evacuation pipeline has a first connection state and a second connection state, and the single crystal furnace has a first feeding state and a second feeding state;

[0006] When the single crystal furnace is in the first feeding state, the evacuation pipeline is in the first connection state;

[0007] When the single crystal furnace is in the second feeding state, the evacuation pipeline is in the second connection state.

[0008] Optionally, among them:

[0009] The evacuation pipeline is respectively connected to the evacuation device, the vacuum pump, and the single crystal furnace, and the single crystal furnace has a vacuum pipeline directly connected to the vacuum pump;

[0010] When the evacuation pipeline is in the first connection state, the evacuation device is connected to the single crystal furnace through the evacuation pipeline, the evacuation device is not connected to the vacuum pump, and the single crystal furnace is not connected to the vacuum pump;

[0011] When the evacuation pipeline is in the second connection state, the evacuation device is connected to the vacuum pump through the evacuation pipeline, and the vacuum pump is connected to the single crystal furnace through the vacuum pipeline.

[0012] Optionally, among them:

[0013] The evacuation pipeline further includes a first air-blocking member and a second air-blocking member, and the vacuum pipeline includes a third air-blocking member. The first air-blocking member is located at one end of the evacuation pipeline close to the single crystal furnace, and the second air-blocking member is located at one end of the evacuation pipeline close to the evacuation device;

[0014] When the evacuation pipeline is in the first connection state, the first air-blocking member and the second air-blocking member are opened, and the third air-blocking member is closed;

[0015] When the evacuation pipeline is in the second connection state, the second air-blocking member and the third air-blocking member are opened, and the first air-blocking member is closed.

[0016] Optionally, among them:

[0017] The first air-blocking member, the second air-blocking member or the third air-blocking member is one of an air-blocking plug or an air valve.

[0018] Optionally, among them:

[0019] The single crystal furnace further includes a feeding device located on one side of the single crystal furnace body. The feeding device is connected to the side wall of the single crystal furnace body through a connecting valve, and the evacuation pipeline is connected to the feeding device; The first feeding state includes a feeding start state and a feeding balance state;

[0020] When the single crystal furnace is in the feeding start state, the connecting valve is closed, the evacuation pipeline is communicated with the feeding device, and the evacuation pipeline is not communicated with the single crystal furnace body;

[0021] When the single crystal furnace is in the feeding balance state, the connecting valve is opened, the feeding device is communicated with the single crystal furnace body, and the evacuation device is communicated with the feeding device and the single crystal furnace body respectively through the evacuation pipeline.

[0022] Optionally, among them:

[0023] The single crystal furnace body further includes a single crystal furnace auxiliary chamber. The vacuum pump is connected to the single crystal furnace auxiliary chamber through a vacuum pipeline. When the evacuation pipeline is in the second connection state, the evacuation pipeline is communicated with the vacuum pipeline, and the evacuation device is connected to the vacuum pump and the single crystal furnace auxiliary chamber through the evacuation pipeline and the vacuum pipeline.

[0024] In a second aspect, the present application further provides a single crystal furnace system, which includes at least one single crystal furnace, a vacuum pump, and the vacuum extraction device described in the first aspect.

[0025] In a third aspect, the present application further provides a vacuum extraction method applied to the single crystal furnace system described in the second aspect. The vacuum extraction method includes:

[0026] When the single crystal furnace is in the first feeding state, adjust the evacuation pipeline to the first connection state;

[0027] When the single crystal furnace is in the second feeding state, adjust the evacuation pipeline to the second connection state.

[0028] Optionally, wherein:

[0029] The evacuation pipeline is respectively connected to an evacuation device and a single crystal furnace. The evacuation device is connected to a vacuum pump through the evacuation pipeline and a vacuum pipeline, and the single crystal furnace is directly connected to the vacuum pump through the vacuum pipeline. The evacuation pipeline further includes a first air blocking member and a second air blocking member, and the vacuum pipeline includes a third air blocking member. The first air blocking member is located at one end of the evacuation pipeline close to the single crystal furnace, and the second air blocking member is located at one end of the evacuation pipeline close to the evacuation device;

[0030] When the single crystal furnace is in the first feeding state, adjusting the evacuation pipeline to the first communication state includes:

[0031] When the single crystal furnace is in the first feeding state, opening the first air blocking member and the second air blocking member, and closing the third air blocking member;

[0032] When the single crystal furnace is in the second feeding state, adjusting the evacuation pipeline to the second communication state includes:

[0033] When the single crystal furnace is in the second feeding state, opening the second air blocking member and the third air blocking member, and closing the first air blocking member.

[0034] Optionally, wherein:

[0035] The single crystal furnace includes a single crystal furnace body and a feeding device located on one side of the single crystal furnace body. The feeding device is connected to the side wall of the single crystal furnace through a connection valve, and the evacuation pipeline is connected to the feeding device; The first feeding state includes a feeding start state and a feeding balance state;

[0036] When the single crystal furnace is in the first feeding state, opening the first air blocking member and the second air blocking member, and closing the third air blocking member further includes:

[0037] When the single crystal furnace is in the feeding start state, closing the connection valve, opening the first air blocking member and the second air blocking member, and closing the third air blocking member;

[0038] Detect and compare the pressure in the feeding device and the pressure in the single crystal furnace body. When the pressure difference between the pressure in the feeding device and the pressure in the single crystal furnace body is less than or equal to 3 Torr, the single crystal furnace is in the feeding balance state, and the connection valve is opened.

[0039] Optionally, wherein:

[0040] The single crystal furnace body further includes a single crystal furnace auxiliary chamber. The vacuum pump is connected to the single crystal furnace auxiliary chamber through a vacuum pipeline; When the single crystal furnace is in the second feeding state, the evacuation pipeline is communicated with the vacuum pipeline, and the evacuation device is connected to the vacuum pump and the single crystal furnace auxiliary chamber through the evacuation pipeline and the vacuum pipeline.

[0041] Compared with the prior art, a vacuum pumping device, a vacuum pumping method, and a single crystal furnace system provided by the present application achieve at least the following beneficial effects:

[0042] The vacuum pumping device provided by the present application can be incorporated into an existing evacuation system. When the single crystal furnace is being charged, it is used in cooperation with a vacuum pump to achieve vacuum pumping during the charging of the single crystal furnace. On the one hand, the additional vacuum pumping device can evacuate the single crystal furnace together with the existing evacuation system during charging, improving the evacuation efficiency of the single crystal furnace. For different charging methods of the single crystal furnace, the evacuation pipeline can be adjusted to different connected states, enabling reasonable arrangement of the startup and shutdown of the evacuation device and the vacuum pump, reducing the waste of working hours caused by waiting for evacuation, further improving the evacuation efficiency of the single crystal furnace, and enhancing the production efficiency. On the other hand, it enables the oxides in the single crystal furnace to be discharged outward through the vacuum pumping device in addition to the original discharge method of the single crystal furnace, accelerating the discharge efficiency of the oxides in the single crystal furnace, reducing the content of oxides in the single crystal furnace, and thus reducing the oxygen content of the single crystal silicon rod and improving the quality of the silicon rod. In addition, the vacuum pumping device provided by the present application is arranged outside the single crystal furnace body and is independent of the single crystal furnace body, facilitating disassembly, installation, and movement. When other single crystal furnaces need to be evacuated or the power of the auxiliary pump is sufficient to meet the requirements of multiple single crystal furnaces, the vacuum pumping device can be moved near the target single crystal furnace.

[0043] Of course, it is not necessarily required that any product implementing the present application simultaneously achieves all the above technical effects.

[0044] Other features and advantages of the present application will become clear from the following detailed description of the exemplary embodiments of the present application with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0045] The drawings incorporated in and constituting a part of this specification illustrate embodiments of the present application and, together with the description, are used to explain the principles of the present application.

[0046] Figure 1 Shown is a schematic diagram of the vacuum pumping device, single crystal furnace, and vacuum pump provided by an embodiment of the present application;

[0047] Figure 2 Shown is a flowchart of the vacuum pumping method provided by an embodiment of the present application. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0048] Now, various exemplary embodiments of the present application will be described in detail with reference to the accompanying drawings. It should be noted that: Unless otherwise specifically stated, the relative arrangements of components and steps, numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present application.

[0049] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way a limitation on the present application, its application, or its use.

[0050] Technologies, methods, and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, such technologies, methods, and devices should be considered as part of the specification.

[0051] In all examples shown and discussed herein, any specific values should be construed as merely exemplary and not as a limitation. Thus, other examples of the exemplary embodiments may have different values.

[0052] It should be noted that like reference numerals and letters refer to like items in the following figures, and thus, once an item is defined in one figure, further discussion thereof is not required in subsequent figures.

[0053] A single crystal furnace is a commonly used device for large-scale production of single crystal rods.

[0054] During the production process of single crystal rods, it is necessary to add materials into the furnace. When the feeding machine adds materials into the furnace, it is necessary to use the evacuation system of the single crystal furnace to evacuate it. Currently, a secondary pump is connected to multiple single crystal furnaces and operates simultaneously. Therefore, when the feeding machine needs to use the secondary pump for evacuation, usage conflicts are likely to occur, resulting in a large waste of working hours. In addition, currently, the oxides in the single crystal furnace can only be extracted through the evacuation pipeline at the bottom of the furnace, and the evacuation effect is limited, which has a greater impact on the oxygen content of the crystal rod.

[0055] To solve the above technical problems, the present application proposes a vacuum pumping device, which is used in cooperation with a vacuum pump to achieve vacuum pumping during the feeding of a single crystal furnace, and can improve the evacuation efficiency during feeding and reduce the waste of working hours.

[0056] Figure 1 Shown is a schematic diagram of the vacuum pumping device, single crystal furnace, and vacuum pump provided by the embodiments of the present application.

[0057] As Figure 1 shown, the single crystal furnace 3 includes a single crystal furnace body 30, and the vacuum pumping device 1 is disposed outside the single crystal furnace body 30; the vacuum pumping device 1 includes an evacuation pipeline 11 and an evacuation device 10, the evacuation pipeline 11 has a first connection state and a second connection state, and the single crystal furnace 3 has a first feeding state and a second feeding state;

[0058] When the single crystal furnace 3 is in the first feeding state, the evacuation pipeline 11 is in the first connection state;

[0059] When the single crystal furnace 3 is in the second feeding state, the evacuation pipeline 11 is in the second connection state.

[0060] During specific implementation, when the single crystal furnace 3 is in the first feeding state, the evacuation pipeline 11 is adjusted to the first connection state, and when the single crystal furnace 3 is in the second feeding state, the evacuation pipeline 11 is adjusted to the second connection state.

[0061] As Figure 1 shown, from the composition structure and specific implementation process of the above-mentioned vacuum pumping device 1, it can be seen that the vacuum pumping device 1 provided in the embodiment of the present application can incorporate the vacuum pumping device 1 into the existing evacuation system. When the single crystal furnace 3 is performing a feeding operation, it is used in cooperation with the vacuum pump 2 to achieve vacuum pumping during the feeding of the single crystal furnace 3. On the one hand, the additionally added vacuum pumping device 1 can evacuate the single crystal furnace 3 together with the existing evacuation system during feeding, improving the evacuation efficiency of the single crystal furnace 3; different feeding methods of the single crystal furnace 3 have different requirements for the evacuation system, and it is easy to cause conflicts in use and waste of working hours during feeding. The vacuum pumping device 1 provided in the embodiment of the present application includes an evacuation pipeline 11 and an evacuation device 10. The evacuation pipeline 11 has a first connection state and a second connection state, corresponding to the first feeding state and the second feeding state of the single crystal furnace 3 respectively. By adjusting the evacuation pipeline 11 to different connection states for different feeding methods of the single crystal furnace 3, the start and stop of the evacuation device 10 and the vacuum pump 2 can be reasonably arranged, reducing the waste of working hours caused by waiting for evacuation, further improving the evacuation efficiency of the single crystal furnace 3, and improving the production efficiency. On the other hand, it enables the oxides in the single crystal furnace 3 to be discharged outward through the vacuum pumping device 1 in addition to the original discharge method of the single crystal furnace 3, accelerating the discharge efficiency of the oxides in the single crystal furnace 3, reducing the content of oxides in the single crystal furnace 3, and further reducing the oxygen content of the single crystal silicon rod, improving the quality of the silicon rod. In addition, the vacuum pumping device 1 provided in the embodiment of the present application is arranged outside the single crystal furnace body 30 and is independent of the single crystal furnace body 30. It can not only evacuate the single crystal furnace 3 in cooperation with the vacuum pump 2 without causing too much interference to the evacuation system of the single crystal furnace 3 itself, with little modification to the single crystal furnace 3 itself, but also be convenient for disassembly, installation and movement. When other single crystal furnaces 3 need to be evacuated or the power of the auxiliary pump is sufficient to meet multiple single crystal furnaces 3, the vacuum pumping device 1 can be moved to the vicinity of the target single crystal furnace 3.

[0062] As a possible implementation manner, as Figure 1 shown, the evacuation pipeline 11 is respectively connected to the evacuation device 10, the vacuum pump 2 and the single crystal furnace 3. The single crystal furnace 3 has a vacuum pipeline 31 directly connected to the vacuum pump 2;

[0063] When the evacuation pipeline 11 is in the first connection state, the evacuation device 10 is connected to the single crystal furnace 3 through the evacuation pipeline 11, the evacuation device 10 is not connected to the vacuum pump 2, and the single crystal furnace 3 is not connected to the vacuum pump 2;

[0064] When the evacuation pipeline 11 is in the second connection state, the evacuation device 10 is connected to the vacuum pump 2 through the evacuation pipeline 11 , and the vacuum pump 2 is connected to the single crystal furnace 3 through the vacuum pipeline 31 .

[0065] Based on this, Figure 1 As shown, the single crystal furnace 3 has a vacuum pipeline 31 directly connected to the vacuum pump 2. The vacuum pipeline 31 is a part of the existing evacuation system. The current single crystal furnace 3 needs to be evacuated during the feeding operation, that is, the single crystal furnace 3 is evacuated by using the vacuum pump 2 and the vacuum pipeline 31. The vacuum pumping equipment 1 provided in the embodiment of the present application is respectively connected to the evacuation device 10, the vacuum pump 2 and the single crystal furnace 3 through the evacuation pipeline 11. On the one hand, the evacuation device 10, the vacuum pump 2 and the single crystal furnace 3 are interconnected through the evacuation pipeline 11 to form another evacuation system independent of the existing evacuation system. The new evacuation system is in parallel with the existing evacuation system and will not interfere with each other. They can be turned on at the same time to increase the evacuation efficiency of the single crystal furnace 3 during the feeding stage, and can also be turned on in time. When there are multiple evacuations in the existing evacuation system, When a single crystal furnace 3 is in the feeding stage and needs to be evacuated, the newly formed evacuation system and the existing evacuation system can evacuate different single crystal furnaces 3 respectively, reducing the time waste during feeding, further improving the evacuation efficiency of the single crystal furnace 3 during feeding, and thus improving the production efficiency; on the other hand, the evacuation pipeline 11 can be adjusted to different connection states by controlling the conduction state between the evacuation pipeline 11 and the evacuation device 10, the vacuum pump 2 and the single crystal furnace 3 to adapt to different feeding methods of the single crystal furnace 3. For example, when the single crystal furnace 3 is in the first In the first feeding state, the evacuation device 10 can be connected to the single crystal furnace 3 through the evacuation pipeline 11, and the evacuation device 10 is not connected to the vacuum pump 2. The single crystal furnace 3 is not connected to the vacuum pump 2 through the evacuation pipeline 11, nor is it connected through the vacuum pipeline 31, so that the evacuation pipeline 11 is adjusted to the first connection state, and the evacuation device 10 is used to evacuate the single crystal furnace 3 in the first feeding state through the evacuation pipeline 11. The additional evacuation device can perform one-to-one evacuation of the single crystal furnace 3 during feeding, without waiting for the vacuum pump 2 to evacuate. The vacuum pump 2 and the vacuum line 31 are connected to the single crystal furnace 3, so that the vacuum pump 2 and the vacuum line 31 are connected to each other, and the vacuum line 32 is connected to the single crystal furnace 3. The vacuum pump 2 and the vacuum device 10 are connected to the vacuum pump 2 and the vacuum line 31, so that the vacuum pump 2 and the vacuum device 10 are connected to each other through the vacuum line 1 ...

[0066] As a possible implementation, Figure 1As shown, the evacuation pipeline 11 further includes a first air-blocking member 111 and a second air-blocking member 112, and the vacuum pipeline 31 includes a third air-blocking member 311. The first air-blocking member 111 is located at one end of the evacuation pipeline 11 close to the single crystal furnace 3, and the second air-blocking member 112 is located at one end of the evacuation pipeline 11 close to the evacuation device 10;

[0067] When the evacuation pipeline 11 is in the first communication state, the first air-blocking member 111 and the second air-blocking member 112 are opened, and the third air-blocking member 311 is closed;

[0068] When the evacuation pipeline 11 is in the second communication state, the second air-blocking member 112 and the third air-blocking member 311 are opened, and the first air-blocking member 111 is closed.

[0069] Based on this, as Figure 1As shown, the evacuation pipeline 11 can be divided into multiple evacuation branches. For example, the part of the evacuation pipeline 11 connecting the evacuation device 10 and the single crystal furnace 3 can be defined as a first evacuation branch, and the part of the evacuation pipeline 11 connecting the evacuation device 10 and the vacuum pump 2 can be defined as a second evacuation branch, wherein both the first evacuation branch and the second evacuation branch have a part connected to the evacuation device 10, and this part can be set as a common pipeline, and the first evacuation branch connected to the single crystal furnace 3 and the second evacuation branch connected to the vacuum pump 2 extend from the common pipeline, and the evacuation device 10 is connected to the vacuum pump 2 through the connected second evacuation branch and the vacuum pipeline 31. The vacuum pumping equipment 1 provided in the embodiment of the present application controls the conduction of each branch by setting a gas barrier on each branch. For example, a first gas barrier 111 can be set on the end of the first evacuation branch close to the single crystal furnace 3, and a second gas barrier 112 can be set on the end of the common pipeline close to the evacuation device 10. The vacuum pipeline 31 has a third gas barrier 311 to control whether the vacuum pump 2 is directly connected to the single crystal furnace 3. After the second evacuation branch is connected to the vacuum pipeline 31, the third gas barrier 311 can control whether the second evacuation branch and the vacuum pipeline 31 are connected. When the single crystal furnace 3 is in the first feeding state, the first air barrier 111 and the second air barrier 112 can be opened, and the third air barrier 311 can be closed, so that the first evacuation branch is connected, and the second evacuation branch and the vacuum pipeline 31 are not connected. At this time, the evacuation device 10 is connected with the single crystal furnace 3 through the first evacuation branch, the evacuation device 10 is not connected with the vacuum pump 2, and the single crystal furnace 3 is not connected with the vacuum pump 2, that is, the evacuation pipeline 11 is in the first connected state, and the single crystal furnace 3 can be evacuated one by one, which reduces the waste of feeding time caused by waiting for evacuation and improves production efficiency. When the single crystal furnace 3 is in the second feeding state, the second gas barrier 112 and the third gas barrier 311 can be opened and the first gas barrier 111 can be closed, so that the first evacuation branch is not conductive and the second evacuation branch is conductive to the vacuum pipeline 31. At this time, the evacuation device 10 is connected to the single crystal furnace 3 through the second evacuation branch and the vacuum pipeline 31, and the vacuum pump 2 is connected to the vacuum pump 2 through the vacuum pipeline 31, that is, the evacuation pipeline 11 is in the second connected state, and the evacuation device 10 and the vacuum pump 2 evacuate the single crystal furnace 3 at the same time, thereby improving the evacuation efficiency and thus improving the production efficiency.

[0070] In some examples, the first air-blocking member, the second air-blocking member, or the third air-blocking member is one of an air-blocking plug or an air valve. Based on this, by arranging the air-blocking member in the evacuation pipeline and the vacuum pipeline, it is very convenient to control the on / off of the evacuation pipeline and the vacuum pipeline, simplifying the adjustment process of different connection states of the evacuation pipeline. In actual use, both the air-blocking plug and the air valve can be manually controlled or controlled by an actuator or a controller, and can be specifically adjusted according to production needs; the specific selection of the first air-blocking member, the second air-blocking member, and the third air-blocking member as an air-blocking plug or an air valve and the specific type and model can also be adjusted according to production needs, which are not limited here.

[0071] As a possible implementation, as Figure 1 shown, the single crystal furnace 3 further includes a feeding device 32 located on one side of the single crystal furnace body 30. The feeding device 32 is connected to the side wall of the single crystal furnace 3 through a connection valve 301, and the evacuation pipeline 11 is connected to the feeding device 32; the first feeding state includes a feeding start state and a feeding balance state;

[0072] When the single crystal furnace 3 is in the feeding start state, the connection valve 301 is closed, the evacuation pipeline 11 is communicated with the feeding device 32, and the evacuation pipeline 11 is not communicated with the single crystal furnace body 30;

[0073] When the single crystal furnace 3 is in the feeding balance state, the connection valve 301 is opened, the feeding device 32 is communicated with the single crystal furnace body 30, and the evacuation device 10 is communicated with the feeding device 32 and the single crystal furnace body 30 respectively through the evacuation pipeline 11.

[0074] Based on this, as Figure 1As shown in the figure, since the original evacuation system of the single crystal furnace 3 is composed of a sub-pump connected to multiple single crystal furnaces 3, but the power of the sub-pump can generally only meet the evacuation of two devices at the same time. If there are more evacuation devices at the same time, conflicts will occur. For the single crystal furnace 3 using the outter Czochralski (OCZ) technology, after adding a feeding device 32 arranged outside the single crystal furnace body 30, the probability of evacuation conflict is even greater. The vacuum pumping device 1 provided in the embodiment of the present application can be directly connected to the feeding device 32, specifically by connecting the evacuation pipeline 11 to the feeding device 32. Since the feeding device 32 is connected to the side wall of the single crystal furnace body 30 through a connection valve 301, the connection between the evacuation device 10 and the single crystal furnace body 30 through the feeding device 32 is realized, which is convenient for subsequent one-to-one evacuation of the single crystal furnace 3. When the single crystal furnace 3 is in the first feeding state, that is, when feeding into the single crystal furnace body 30 through the external feeding device 32, at the beginning stage of feeding, the connection valve 301 is in the closed state, and the feeding device 32 is evacuated first. At this time, the evacuation pipeline 11 is communicated with the feeding device 32. Since the connection valve 301 is closed, the feeding device 32 is not communicated with the single crystal furnace body 30, and the evacuation pipeline 11 is not communicated with the single crystal furnace body 30. The evacuation device 10 evacuates the feeding device 32 one by one, without conflicting with the existing evacuation system, reducing the waste of working hours caused by waiting for evacuation, improving the evacuation efficiency, and thus improving the production efficiency. When the pressure difference between the feeding device 32 and the single crystal furnace body 30 is less than or equal to 3 Torr, the single crystal furnace 3 enters the feeding balance state. In the feeding balance stage, the connection valve 301 is opened, and feeding operation is carried out on the single crystal furnace body 30 through the feeding device 32. At this time, since the connection valve 301 is opened, the feeding device 32 is communicated with the single crystal furnace body 30, and the evacuation device 10 is thus communicated with the feeding device 32 and the single crystal furnace body 30 through the evacuation pipeline 11 respectively. The evacuation device 10 evacuates the single crystal furnace body 30. During the evacuation process, the oxides in the single crystal furnace 3 will also be discharged from the side wall of the single crystal furnace body 30 along with the air flow, accelerating the discharge efficiency of the oxides in the single crystal furnace 3, reducing the content of oxides in the single crystal furnace 3, and thus reducing the oxygen content of the single crystal silicon rod and improving the quality of the silicon rod.

[0075] In some examples, as Figure 1 shown, the vacuum pumping device 1 can be arranged outside the single crystal furnace body 30 or inside the feeding device 32.

[0076] As a possible implementation manner, as Figure 1As shown, the single crystal furnace body 30 further includes a secondary chamber of the single crystal furnace. The vacuum pump 2 is connected to the secondary chamber of the single crystal furnace through a vacuum pipeline 31. When the evacuation pipeline 11 is in the second communication state, the evacuation pipeline 11 is communicated with the vacuum pipeline 31, and the evacuation device 10 is connected to the vacuum pump 2 and the secondary chamber of the single crystal furnace through the evacuation pipeline 11 and the vacuum pipeline 31.

[0077] Based on this, when the single crystal furnace 3 is in the second feeding state, that is, when feeding into the single crystal furnace body 30 through the secondary chamber of the single crystal furnace, the evacuation pipeline 11 can be adjusted to the second communication state, and the evacuation pipeline 11 is communicated with the vacuum pipeline 31. Through the connected evacuation pipeline 11 and vacuum pipeline 31, the communication among the evacuation device 10, the vacuum pump 2 and the secondary chamber of the single crystal furnace is realized, and the secondary chamber of the single crystal furnace is evacuated simultaneously by using the evacuation device 10 and the vacuum pump 2, improving the evacuation efficiency and thus the production efficiency.

[0078] Based on the same inventive concept, the present application further provides a single crystal furnace system, which includes at least one single crystal furnace, a vacuum pump and the vacuum evacuation device described in the above embodiment.

[0079] Compared with the prior art, the beneficial effects of the single crystal furnace system provided in the embodiments of the present application are the same as those of the vacuum evacuation device described in the above embodiments, and will not be elaborated here.

[0080] As a possible implementation manner, when the number of single crystal furnaces included in the single crystal furnace system is greater than or equal to two, the vacuum pump is connected to each single crystal furnace in the single crystal furnace system in a one-to-many manner. Since the newly formed evacuation system between the vacuum evacuation device and the single crystal furnace is in a parallel relationship with the original evacuation system, when other single crystal furnaces without a vacuum evacuation device need to be evacuated or the evacuation power of the vacuum pump is insufficient, the first air blocking member can be closed, or the current vacuum evacuation device can be disassembled and moved near the target single crystal furnace, so that the evacuation device can evacuate other single crystal furnaces together with the vacuum pump, improving the evacuation efficiency and thus the production efficiency.

[0081] Figure 2 The figure shows the flowchart of the vacuum evacuation method provided in the embodiments of the present application.

[0082] Based on the same inventive concept, as Figure 2 shown, the present application further provides a vacuum evacuation method applied to the single crystal furnace system described in the above embodiments. The vacuum evacuation method includes:

[0083] S10, when the single crystal furnace is in the first feeding state, adjust the evacuation pipeline to the first communication state;

[0084] S20, when the single crystal furnace is in the second feeding state, adjust the evacuation pipeline to the second communication state.

[0085] Compared with the prior art, the beneficial effects of the vacuuming method provided in the embodiment of the present application are the same as the beneficial effects of the vacuuming equipment described in the above embodiment, which will not be repeated here.

[0086] As a possible implementation, the evacuation pipeline is connected to the evacuation device and the single crystal furnace respectively, the evacuation device is connected to the vacuum pump through the evacuation pipeline and the vacuum pipeline, and the single crystal furnace is directly connected to the vacuum pump through the vacuum pipeline; the evacuation pipeline also includes a first gas barrier and a second gas barrier, the vacuum pipeline includes a third gas barrier, the first gas barrier is located at one end of the evacuation pipeline close to the single crystal furnace, and the second gas barrier is located at one end of the evacuation pipeline close to the evacuation device;

[0087] When the single crystal furnace is in the first charging state, adjusting the evacuation pipeline to the first connected state includes:

[0088] When the single crystal furnace is in the first charging state, the first gas barrier and the second gas barrier are opened, and the third gas barrier is closed;

[0089] When the single crystal furnace is in the second charging state, adjusting the evacuation pipeline to the second connected state includes:

[0090] When the single crystal furnace is in the second charging state, the second gas barrier and the third gas barrier are opened, and the first gas barrier is closed.

[0091] Based on this, the single crystal furnace has a vacuum pipeline directly connected to the vacuum pump. The vacuum pumping device is connected to the vacuum pump, the vacuum pump and the single crystal furnace respectively through the vacuum pipeline. The vacuum pump, the vacuum pump and the single crystal furnace are connected to each other through the vacuum pipeline, so that the hole extraction device can be activated simultaneously or separately with the vacuum pump, thereby improving the vacuum efficiency and reducing the waste of working hours. When the single crystal furnace uses different feeding methods, the connection state of the vacuum pipeline can be adjusted by the air barrier. When the single crystal furnace is in the first feeding state, the first air barrier and the second air barrier can be opened and the third air barrier can be closed, so that the first vacuum branch is connected and the second vacuum branch is not connected to the vacuum pipeline. At this time, the vacuum device is connected to the single crystal furnace through the first vacuum branch, the vacuum device is not connected to the vacuum pump, and the single crystal furnace is not connected to the vacuum pump, that is, the vacuum pipeline is in the first connection state, and the single crystal furnace can be vacuumed one by one, which reduces the waste of feeding time caused by waiting for vacuuming and improves production efficiency. When the single crystal furnace is in the second feeding state, the second gas barrier can be opened and the first gas barrier can be closed, so that the first evacuation branch is not conductive and the second evacuation branch is conductive to the vacuum pipeline. At this time, the evacuation device is connected to the single crystal furnace through the second evacuation branch and the vacuum pipeline, and the vacuum pump is connected to the vacuum pump through the vacuum pipeline, that is, the evacuation pipeline is in the second connected state, and the evacuation device and the vacuum pump evacuate the single crystal furnace at the same time, which improves the vacuum extraction efficiency and thus improves the production efficiency.

[0092] As a possible implementation, the single crystal furnace includes a single crystal furnace body and a feeding device located on one side of the single crystal furnace body. The feeding device is connected to the side wall of the single crystal furnace through a connection valve, and an evacuation pipeline is connected to the feeding device; the first feeding state includes a feeding start state and a feeding balance state.

[0093] When the single crystal furnace is in the first feeding state, opening the first air blocking member and the second air blocking member, and closing the third air blocking member further includes:

[0094] When the single crystal furnace is in the feeding start state, closing the connection valve, opening the first air blocking member and the second air blocking member, and closing the third air blocking member;

[0095] Detect and compare the pressure in the feeding device and the pressure in the single crystal furnace body. When the pressure difference between the pressure in the feeding device and the pressure in the single crystal furnace body is less than or equal to 3 Torr, the single crystal furnace is in the feeding balance state, and the connection valve is opened.

[0096] Based on this, for a single crystal furnace using the Outter Czochralski (OCZ) technology with multiple external feedings, after additionally adding a feeding device arranged outside the single crystal furnace body, the probability of evacuation conflict is greater. The vacuum pumping device provided by the embodiments of the present application can connect the evacuation pipeline to the feeding device, realizing the connection between the evacuation device and the single crystal furnace body through the feeding device, which is convenient for subsequent one-to-one vacuum pumping of the single crystal furnace. In the initial stage of feeding, the connection valve is in the closed state, and the feeding device is evacuated first. At this time, the evacuation pipeline is connected to the feeding device. Since the connection valve is closed, the feeding device is not connected to the single crystal furnace body, and the evacuation pipeline is not connected to the single crystal furnace body. The evacuation device evacuates the feeding device one by one without conflicting with the existing evacuation system, reducing the waste of working hours caused by waiting for evacuation, improving the evacuation efficiency, and thus improving the production efficiency. When the pressure difference between the pressure in the feeding device and the pressure in the single crystal furnace body is less than or equal to 3 Torr, the single crystal furnace enters the feeding balance state. In the feeding balance stage, the connection valve is opened, and feeding operation is carried out from the feeding device to the single crystal furnace body. At this time, since the connection valve is opened, the feeding device is connected to the single crystal furnace body, and the evacuation device is thus connected to the feeding device and the single crystal furnace body respectively through the evacuation pipeline. The evacuation device evacuates the single crystal furnace body. During the evacuation process, the oxides in the single crystal furnace will also be discharged from the side wall of the single crystal furnace body along with the air flow, accelerating the discharge efficiency of the oxides in the single crystal furnace, reducing the content of oxides in the single crystal furnace, and thus reducing the oxygen content of the single crystal silicon rod and improving the quality of the silicon rod.

[0097] As a possible implementation, the single crystal furnace body further includes a secondary chamber of the single crystal furnace, and the vacuum pump is connected to the secondary chamber of the single crystal furnace through a vacuum pipeline; when the single crystal furnace is in the second feeding state, the evacuation pipeline is communicated with the vacuum pipeline, and the evacuation device is connected to the vacuum pump and the secondary chamber of the single crystal furnace through the evacuation pipeline and the vacuum pipeline.

[0098] Based on this, when the single crystal furnace is in the second feeding state, that is, when feeding into the single crystal furnace body through the secondary chamber of the single crystal furnace, the evacuation pipeline can be adjusted to the second communication state, and the evacuation pipeline is communicated with the vacuum pipeline. Through the connected evacuation pipeline and vacuum pipeline, the communication among the evacuation device, the vacuum pump and the secondary chamber of the single crystal furnace is realized, and the evacuation device and the vacuum pump are used to evacuate the secondary chamber of the single crystal furnace at the same time, improving the evacuation efficiency and further improving the production efficiency.

[0099] In summary, a vacuum pumping device, a vacuum pumping method, and a single crystal furnace system provided by the present application at least achieve the following beneficial effects:

[0100] The vacuum pumping device provided by the present application can incorporate the vacuum pumping device into the existing evacuation system and cooperate with the vacuum pump during the feeding operation of the single crystal furnace to achieve vacuum pumping during the feeding of the single crystal furnace. On the one hand, the additional vacuum pumping device can evacuate the single crystal furnace together with the existing evacuation system during the feeding of the single crystal furnace, improving the evacuation efficiency of the single crystal furnace; for different feeding methods of the single crystal furnace, the evacuation pipeline can be adjusted to different communication states, and the start and stop of the evacuation device and the vacuum pump can be reasonably arranged, reducing the waste of working hours caused by waiting for evacuation, further improving the evacuation efficiency of the single crystal furnace and the production efficiency. On the other hand, the oxides in the single crystal furnace can be discharged outwards through the vacuum pumping device in addition to the original discharge method of the single crystal furnace, accelerating the discharge efficiency of the oxides in the single crystal furnace, reducing the content of oxides in the single crystal furnace, and further reducing the oxygen content of the single crystal silicon rod, improving the quality of the silicon rod. In addition, the vacuum pumping device provided by the present application is arranged outside the single crystal furnace body and is independent of the single crystal furnace body, which is convenient for disassembly, installation and movement. When other single crystal furnaces need to be evacuated or the power of the auxiliary pump is sufficient to meet multiple single crystal furnaces, the vacuum pumping device can be moved to the vicinity of the target single crystal furnace.

[0101] Although some specific embodiments of the present application have been described in detail by way of examples, those skilled in the art should understand that the above examples are only for illustration and not for limiting the scope of the present application. Those skilled in the art should understand that the above embodiments can be modified without departing from the scope and spirit of the present application. The scope of the present application is defined by the appended claims.

Claims

1. A vacuum pumping device, characterized in that, The evacuation device is used to cooperate with a vacuum pump to achieve evacuation during the feeding of a single crystal furnace; the single crystal furnace includes a single crystal furnace body, and the evacuation device is arranged outside the single crystal furnace body; the evacuation device includes an evacuation pipeline and an evacuation device, the evacuation pipeline has a first connection state and a second connection state, and the single crystal furnace has a first feeding state and a second feeding state; When the single crystal furnace is in the first feeding state, the evacuation pipeline is in the first connection state; When the single crystal furnace is in the second feeding state, the evacuation pipeline is in the second connection state; The evacuation pipeline is respectively connected to the evacuation device, the vacuum pump and the single crystal furnace, and the single crystal furnace has a vacuum pipeline directly connected to the vacuum pump; when the evacuation pipeline is in the second connection state, the evacuation device is communicated with the vacuum pump through the evacuation pipeline, and the vacuum pump is communicated with the single crystal furnace through the vacuum pipeline; The single crystal furnace body includes a single crystal furnace auxiliary chamber, the vacuum pump is connected to the single crystal furnace auxiliary chamber through the vacuum pipeline, when the evacuation pipeline is in the second connection state, the evacuation pipeline is communicated with the vacuum pipeline, and the evacuation device is connected to the vacuum pump and the single crystal furnace auxiliary chamber through the evacuation pipeline and the vacuum pipeline.

2. The vacuum extraction device according to claim 1, wherein When the evacuation pipeline is in the first connection state, the evacuation device is communicated with the single crystal furnace through the evacuation pipeline, the evacuation device is not communicated with the vacuum pump, and the single crystal furnace is not communicated with the vacuum pump.

3. The vacuum extraction device according to claim 2, characterized in that, The evacuation pipeline further includes a first air blocking member and a second air blocking member, the vacuum pipeline includes a third air blocking member, the first air blocking member is located at one end of the evacuation pipeline close to the single crystal furnace, and the second air blocking member is located at one end of the evacuation pipeline close to the evacuation device; When the evacuation pipeline is in the first connection state, the first air blocking member and the second air blocking member are opened, and the third air blocking member is closed; When the evacuation pipeline is in the second connection state, the second air blocking member and the third air blocking member are opened, and the first air blocking member is closed.

4. The vacuum extraction device according to claim 3, characterized in that, The first air blocking member, the second air blocking member or the third air blocking member is one of an air blocking plug or an air valve.

5. The vacuum extraction device according to claim 1, characterized in that, The single crystal furnace further includes a feeding device located on one side of the single crystal furnace body, the feeding device is connected to the side wall of the single crystal furnace body through a connection valve, and the evacuation pipeline is connected to the feeding device; the first feeding state includes a feeding start state and a feeding balance state; When the single crystal furnace is in the feeding start state, the connection valve is closed, the evacuation pipeline is communicated with the feeding device, and the evacuation pipeline is not communicated with the single crystal furnace body; When the single crystal furnace is in the feeding balance state, the connection valve is opened, the feeding device is communicated with the single crystal furnace body, and the evacuation device is communicated with the feeding device and the single crystal furnace body respectively through the evacuation pipeline.

6. A single crystal furnace system, characterized in that, The single crystal furnace system includes at least one single crystal furnace, a vacuum pump and the evacuation device according to any one of claims 1 to 5.

7. A vacuum pumping method applied to the single crystal furnace system described in claim 6, characterized in that, The evacuation method includes: When the single crystal furnace is in the first feeding state, adjust the evacuation pipeline to the first connected state; when the single crystal furnace is in the second feeding state, adjust the evacuation pipeline to the second connected state; The evacuation pipeline is respectively connected to the evacuation device and the single crystal furnace. The evacuation device is connected to the vacuum pump through the evacuation pipeline and the vacuum pipeline, and the single crystal furnace is directly connected to the vacuum pump through the vacuum pipeline; The single crystal furnace includes a single crystal furnace body, and the single crystal furnace body includes a single crystal furnace auxiliary chamber. The vacuum pump is connected to the single crystal furnace auxiliary chamber through the vacuum pipeline; when the single crystal furnace is in the second feeding state, the evacuation pipeline is communicated with the vacuum pipeline, and the evacuation device is connected to the vacuum pump and the single crystal furnace auxiliary chamber through the evacuation pipeline and the vacuum pipeline.

8. The vacuum pumping method according to claim 7, characterized in that, The evacuation pipeline further includes a first air blocking member and a second air blocking member, and the vacuum pipeline includes a third air blocking member. The first air blocking member is located at one end of the evacuation pipeline close to the single crystal furnace, and the second air blocking member is located at one end of the evacuation pipeline close to the evacuation device; When the single crystal furnace is in the first feeding state, adjusting the evacuation pipeline to the first connected state includes: When the single crystal furnace is in the first feeding state, open the first air blocking member and the second air blocking member, and close the third air blocking member; When the single crystal furnace is in the second feeding state, adjusting the evacuation pipeline to the second connected state includes: When the single crystal furnace is in the second feeding state, open the second air blocking member and the third air blocking member, and close the first air blocking member.

9. The vacuum pumping method according to claim 8, characterized in that The single crystal furnace further includes a feeding device located on one side of the single crystal furnace body. The feeding device is connected to the side wall of the single crystal furnace through a connecting valve, and the evacuation pipeline is connected to the feeding device; the first feeding state includes a feeding start state and a feeding balance state; When the single crystal furnace is in the first feeding state, opening the first air blocking member and the second air blocking member, and closing the third air blocking member further includes: When the single crystal furnace is in the feeding start state, close the connecting valve, open the first air blocking member and the second air blocking member, and close the third air blocking member; Detect and compare the pressure in the feeding device and the pressure in the single crystal furnace body. When the pressure difference between the pressure in the feeding device and the pressure in the single crystal furnace body is less than or equal to 3 Torr, the single crystal furnace is in the feeding balance state, and open the connecting valve.

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